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WO2007130295A3 - Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement - Google Patents

Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement Download PDF

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Publication number
WO2007130295A3
WO2007130295A3 PCT/US2007/010003 US2007010003W WO2007130295A3 WO 2007130295 A3 WO2007130295 A3 WO 2007130295A3 US 2007010003 W US2007010003 W US 2007010003W WO 2007130295 A3 WO2007130295 A3 WO 2007130295A3
Authority
WO
WIPO (PCT)
Prior art keywords
calibration
samples
properties
reflectometer
technique
Prior art date
Application number
PCT/US2007/010003
Other languages
French (fr)
Other versions
WO2007130295A2 (en
Inventor
Phillip Walsh
Dale A Harrison
Original Assignee
Metrosol Inc
Phillip Walsh
Dale A Harrison
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/418,846 external-priority patent/US7511265B2/en
Priority claimed from US11/418,827 external-priority patent/US7282703B2/en
Application filed by Metrosol Inc, Phillip Walsh, Dale A Harrison filed Critical Metrosol Inc
Priority to JP2009509605A priority Critical patent/JP2009536354A/en
Publication of WO2007130295A2 publication Critical patent/WO2007130295A2/en
Publication of WO2007130295A3 publication Critical patent/WO2007130295A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration.
PCT/US2007/010003 2006-05-05 2007-04-25 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement WO2007130295A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009509605A JP2009536354A (en) 2006-05-05 2007-04-25 A method and apparatus for precisely calibrating a reflectometer using a specific reflectivity measurement method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/418,846 US7511265B2 (en) 2004-08-11 2006-05-05 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US11/418,827 2006-05-05
US11/418,846 2006-05-05
US11/418,827 US7282703B2 (en) 2004-08-11 2006-05-05 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement

Publications (2)

Publication Number Publication Date
WO2007130295A2 WO2007130295A2 (en) 2007-11-15
WO2007130295A3 true WO2007130295A3 (en) 2009-02-26

Family

ID=38668211

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/010003 WO2007130295A2 (en) 2006-05-05 2007-04-25 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement

Country Status (3)

Country Link
JP (1) JP2009536354A (en)
KR (1) KR20090008454A (en)
WO (1) WO2007130295A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7126131B2 (en) 2003-01-16 2006-10-24 Metrosol, Inc. Broad band referencing reflectometer
US8564780B2 (en) 2003-01-16 2013-10-22 Jordan Valley Semiconductors Ltd. Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces
US7511265B2 (en) * 2004-08-11 2009-03-31 Metrosol, Inc. Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US7663097B2 (en) * 2004-08-11 2010-02-16 Metrosol, Inc. Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US7804059B2 (en) 2004-08-11 2010-09-28 Jordan Valley Semiconductors Ltd. Method and apparatus for accurate calibration of VUV reflectometer
US20080129986A1 (en) 2006-11-30 2008-06-05 Phillip Walsh Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations
US8867041B2 (en) 2011-01-18 2014-10-21 Jordan Valley Semiconductor Ltd Optical vacuum ultra-violet wavelength nanoimprint metrology
US8565379B2 (en) 2011-03-14 2013-10-22 Jordan Valley Semiconductors Ltd. Combining X-ray and VUV analysis of thin film layers
GB2533589A (en) * 2014-12-22 2016-06-29 Ndc Infrared Eng Ltd Measurement of porous film
JP2022147223A (en) * 2021-03-23 2022-10-06 大塚電子株式会社 Optical measurement system, optical measurement method and measurement program

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751643A (en) * 1972-05-23 1973-08-07 Ibm System for performing spectral analyses under computer control
US4029419A (en) * 1975-10-10 1977-06-14 International Business Machines Corporation Textile color analyzer calibration
US6525829B1 (en) * 2001-05-25 2003-02-25 Novellus Systems, Inc. Method and apparatus for in-situ measurement of thickness of copper oxide film using optical reflectivity

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521566A (en) * 1991-07-12 1993-01-29 Dainippon Screen Mfg Co Ltd Measuring method for ion implantation amount in semiconductor crystal
US5408322A (en) * 1993-04-26 1995-04-18 Materials Research Corporation Self aligning in-situ ellipsometer and method of using for process monitoring
JP2001165628A (en) * 1999-12-13 2001-06-22 Sharp Corp Film thickness measuring device
US7126131B2 (en) * 2003-01-16 2006-10-24 Metrosol, Inc. Broad band referencing reflectometer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751643A (en) * 1972-05-23 1973-08-07 Ibm System for performing spectral analyses under computer control
US4029419A (en) * 1975-10-10 1977-06-14 International Business Machines Corporation Textile color analyzer calibration
US6525829B1 (en) * 2001-05-25 2003-02-25 Novellus Systems, Inc. Method and apparatus for in-situ measurement of thickness of copper oxide film using optical reflectivity

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
FIELD GR AND MURPHY E: "Method of Using the Reflectance Ratios of Different Angles of Incidence for the Determination of Optical Constants", APPLIED OPTICS, vol. 10, no. 6, June 1971 (1971-06-01), pages 1402 - 1405 *

Also Published As

Publication number Publication date
KR20090008454A (en) 2009-01-21
JP2009536354A (en) 2009-10-08
WO2007130295A2 (en) 2007-11-15

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