WO2007074798A1

WO2007074798A1 - Method of conveying substrate to substrate processing device

Info

Publication number: WO2007074798A1
Application number: PCT/JP2006/325833
Authority: WO
Inventors: Hideo Taniguchi; Shigeyuki Yamada; Taimi Oketani
Original assignee: Sharp Kabushiki Kaisha
Priority date: 2005-12-27
Filing date: 2006-12-26
Publication date: 2007-07-05

Abstract

A substrate conveyance method capable of continuously conveying substrates to a substrate processing device, the method being capable of processing the substrates while conveying them to a processing unit fixed to the substrate processing device. The substrate conveyance method has a reception/delivery/conveyance table (2) for placing a not-yet-processed substrate (D) that is to be conveyed to a substrate loading section (3a) of the substrate processing device (3) and also has a reception/conveyance table (4) on which a processed substrate (B) conveyed from a substrate discharge section (3b) of the substrate processing device (3) is placed. Conveyance of the not-yet-processed substrate (D) from the reception/delivery/conveyance table (2) is started before the processed substrate (B) is conveyed and placed on the reception/conveyance table (4).

Description

Specification

Substrate transport method to substrate processing apparatus

Technical field

The present invention relates to a substrate transfer method to a substrate processing apparatus that performs processing while transferring a substrate to a processing unit fixed to the apparatus.

Background art

In recent years, for example, a pattern following type exposure apparatus 3 as shown in FIG. 6 has been proposed as a substrate processing apparatus that performs processing while transporting a substrate to a processing unit fixed to the apparatus. In this pattern following type exposure apparatus 3, a plurality of exposure units 3c each having a camera 3d are arranged, and the camera 3d recognizes an image of a pattern such as a wiring formed in advance on the substrate, and the pattern and the mask of the exposure unit 3c are used. Exposure is performed while correcting misalignment during substrate transport. In this way, each exposure unit 3c is configured to perform force exposure without following each existing pattern on the substrate, so conventionally, it was performed in a stationary state using alignment marks attached to the substrate before the exposure process, This eliminates the need for precise alignment adjustments.

[0003] As a method of transporting a substrate to such a pattern following type exposure apparatus 3, a procedure as shown in FIG. 6 has been conventionally employed. As shown in FIG. 6 (a), on the substrate loading side of the exposure apparatus 3, a transfer conveyance table 2 on which a substrate to be conveyed to the substrate loading unit 3a of the apparatus is placed, and the transfer conveyance table 2 is conveyed. A stock transfer table 1 on which a substrate to be mounted is placed, and a loading robot (not shown) for mounting the substrate on the stock transfer table 1 are provided.

[0004] Further, on the substrate discharge side of the exposure apparatus 3, a receiving transfer table 4 on which a substrate transferred from the substrate discharge unit 3b of the apparatus is mounted, and a substrate mounted on the receiving transfer table 4 is a cassette or the like A discharge robot (not shown) is provided for storage and transportation to the next process step.

In the conventional transfer method, as shown in FIGS. 6 (a) to 6 (c), it is confirmed that there is no substrate on the transfer table or the like on the downstream side in the transfer direction, and then the transfer is performed. It was. In other words, the substrate transfer from the stock transfer table 1, the transfer transfer table 2, and the substrate discharge unit 3b must be free from the transfer transfer table 2, the substrate loading unit 3a, and the receiving transfer table 4 that are the transfer destinations. This is an intermittent conveyance method that confirms the above and conveys force. It should be noted that the preceding related to the present invention As technical literatures, JP-A-2002-176091 and JP-A-2005-119818 can be mentioned.

Disclosure of the invention

Problems to be solved by the invention

[0006] In the method of carrying out the next substrate conveyance after confirming that there is no substrate at the conveyance destination downstream in the conveyance direction, however, as shown in the drawing, There is a problem that the interval becomes wide and the processing tact becomes worse.

[0007] Therefore, the problem to be solved by the present invention is that the substrate transport capable of continuously transporting the substrate to the substrate processing apparatus that performs processing while transporting the substrate to the processing unit fixed to the apparatus. Is to provide a method.

Means for solving the problem

[0008] In order to solve the above problems, a substrate transport method to a substrate processing apparatus according to the present invention includes a post-process substrate from a substrate discharge unit of a substrate processing apparatus that performs processing while transporting a substrate to a processing unit. The gist of the present invention is to start the introduction of the pre-treatment substrate into the substrate loading portion of the substrate processing apparatus before the substrate is discharged.

[0009] In this case, the post-process substrate is transported and mounted from the transfer transport table on which the unprocessed substrate transported to the substrate loading unit of the substrate processing apparatus is placed, and the substrate discharge unit of the substrate processing apparatus. It is preferable to have a configuration in which the transfer of the unprocessed substrate from the transfer transfer table is started before the processed substrate is transferred to and placed on the receiving transfer table.

[0010] Further, a stock transport table on which a pre-process substrate to be transported to the delivery transport table is placed, and before the pre-process substrate is transported to and placed on the substrate loading unit. The substrate may be transferred from the stock transfer table before being processed. Further, the delivery / conveying platform may be provided with a positioning portion, and the positioning of the substrate may be adjusted by the positioning portion.

[0011] It is preferable that the unprocessed substrate is transferred to the substrate loading unit, the transfer transfer table, and the stock transfer table by floating the unprocessed substrate.

[0012] In this case, the transfer performed by levitating the unprocessed substrate is performed on both end portions of the unprocessed substrate. It is preferable to adopt a configuration in which the substrate holding portion to be held is moved. In addition, it is preferable that the transport performed by floating the pre-treatment substrate is performed by moving a substrate holding unit that holds one end of the pre-treatment substrate.

[0013] The substrate holding portion may be held by the substrate holding portion by suction.

The invention's effect

[0014] According to the substrate transfer method to the substrate processing apparatus having the above-described configuration, before the processed substrate is discharged from the substrate discharge portion of the substrate processing apparatus that performs processing while transferring the substrate to the processing unit. Since the configuration is such that the introduction of the substrate before processing into the substrate loading unit of the substrate processing apparatus is started, the substrate is continuously loaded into the substrate processing apparatus. Thereby, the processing tact time by the substrate processing apparatus can be shortened.

[0015] In this case, the post-process substrate is transported and mounted from the transfer transport table on which the pre-process substrate transported to the substrate loading unit of the substrate processing apparatus is mounted, and the substrate discharge unit of the substrate processing apparatus. A transfer carrier, and before the processed substrate is transferred to and placed on the receiving carrier, the transfer of the pre-process substrate from the transfer carrier is started. Since the unprocessed substrates are transferred one after another to the substrate loading portion of the apparatus, the processing tact time in the substrate processing apparatus can be shortened.

[0016] Furthermore, a stock transport table on which the pre-processed substrate to be transported to the delivery transport table is placed, and before the pre-process substrate is transported to and placed on the substrate loading unit. If the configuration is such that the transfer of the pre-process substrate from the stock transfer table is started, the pre-process substrates are transferred from the stock transfer table to the transfer transfer table one after another, so that the distance between the substrate and the substrate in the transfer is reduced. Therefore, the processing tact time in the substrate processing apparatus can be shortened.

[0017] Furthermore, if the positioning / conveying platform is provided with a positioning portion and the positioning of the substrate is adjusted by the positioning portion, the substrate is usually moved in the substrate loading portion of the substrate processing apparatus. Position adjustment can be performed prior to position adjustment, enabling highly accurate positioning (alignment adjustment).

[0018] Then, the substrate loading unit, the transfer transport table and the stock transport table to the stock transport table If the unprocessed substrate is transported by floating the unprocessed substrate, the substrate can be transported smoothly.

[0019] In this case, if the transport performed by levitating the unprocessed substrate is performed by moving the substrate holding unit that holds both end portions in the width direction of the unprocessed substrate, Holding is stable. Further, if the transport that is performed by levitating the unprocessed substrate is made by moving the substrate holding section that holds one end portion in the width direction of the unprocessed substrate, for example, the first substrate is on the left side thereof. It is possible to carry while carrying the edge, and the next second substrate can be carried while holding the right edge, simplifying the mechanism for moving in the direction opposite to the carrying direction. become.

[0020] Further, if the substrate holding section is configured to hold the unprocessed substrate end by adsorption, damage to the substrate during holding can be reduced.

Brief Description of Drawings

FIG. 1 is a diagram schematically showing a schematic configuration when a transport method according to the present invention is applied to a pattern following type exposure apparatus.

2 is a diagram showing a schematic configuration of the substrate transfer mechanism of FIG. 1 and its transfer procedure.

3 is a diagram showing a schematic configuration of a substrate holding unit included in the substrate transport mechanism of FIG.

4 is a diagram showing a first modification of the transport procedure by the substrate transport mechanism of FIG. 2. FIG.

FIG. 5 is a diagram showing a second modification of the transport procedure by the substrate transport mechanism in FIG. 2.

FIG. 6 is a diagram showing a procedure of a substrate transfer method to a substrate processing apparatus conventionally used. BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, an embodiment of a method for transporting a substrate to a substrate processing apparatus according to the present invention will be described with reference to the drawings. FIG. 1 is a view schematically showing a schematic configuration when the substrate transport method according to the present invention is applied as a substrate processing apparatus to, for example, a pattern following type exposure apparatus 3 as shown. Note that the same components as those described in the prior art in FIG. 6 are denoted by the same reference numerals, description thereof is omitted, and different points will be mainly described.

[0023] The substrate transport method shown in FIGS. 1 (a) to 1 (c) is performed by discharging the substrate of the pattern following type exposure apparatus 3 that performs exposure while transporting the substrate to the exposure unit 3c fixed to the apparatus. Part 3b Thus, before the substrate B is discharged, the substrate D is started to be input into the substrate input portion 3a of the pattern following type exposure apparatus 3.

As shown in FIG. 1 (a), the substrate C before the exposure processing is placed on the substrate loading unit 3a of the exposure apparatus 3. A substrate D to be exposed next to the substrate C is placed on the transfer carrier 2. A substrate E to be exposed next to the substrate D is placed on the stock transfer table 1.

In the exposure apparatus 3, the substrate B after the exposure processing is placed on the substrate discharge unit 3b. Further, the substrate A subjected to the exposure process before the substrate B is placed on the receiving carrier 4.

Then, as shown in FIG. 1 (b), when the exposure processing of the substrate C placed on the substrate loading unit 3a is started, the substrate B is received from the substrate discharge unit 3b and transferred to the transfer table 4. Then, the substrate A placed on the receiving / transporting table 4 is transported by a discharge robot (not shown). In addition, the substrate D placed on the transfer carrier 2 is transferred to the substrate loading unit 3a, and the substrate E placed on the stock carrier 1 is transferred to the transfer carrier 2. Then, the next substrate F is transferred to the stock transfer table 1 by a loading robot (not shown).

At this time, as shown in the figure, before the substrate B is discharged from the substrate discharge portion 3a of the exposure apparatus 3, the loading of the substrate D into the substrate loading portion 3a is started. As a result, the distance between the substrates in the substrate conveyance can be narrowed, and the processing tact can be shortened by the almost continuous conveyance.

2 and 3 are used for transporting the substrate from the stock transport table 1 to the transfer transport table 2 and for transporting the substrate from the transfer transport table 2 to the substrate loading unit 3a of the exposure apparatus 3. The schematic structure of the transport mechanism is shown.

[0029] The substrate loading unit 3a, the transfer carrier 2 and the stock carrier 1 shown in the figure are equipped with a mechanism for placing the substrate in a floating state. Specifically, as shown in FIG. 3, air is placed on the upper surface (substrate mounting surface) of the surface plate 10 constituting the substrate mounting portion of the substrate loading unit 3a, the delivery transfer table 2, and the stock transfer table 1. A plurality of holes 10a through which air is blown are formed, and has a mechanism for floating the substrate. In addition, the dimensions of the substrate loading part 3a, the transfer carrier 2 and the stock carrier 1 in the width direction (the direction perpendicular to the conveyance direction) are shorter than the width of the substrate. The substrate loading part 3a, the transfer carrier 2, the stock A predetermined length is projected from the carrier 1.

[0030] For transporting, substrate holding portions 11, 11 and substrate holding portions 12, 12 for sucking and holding the both end portions in the width direction of the substrate by suction are connected by connecting plates 11a, 12a, respectively. . The substrate holder 12 is provided so as to reciprocate from the transfer carrier 2 to the substrate loading part 3a, and the substrate holder 11 is provided so as to reciprocate from the stock carrier 1 to the transfer carrier 2. It has been. As shown in FIG. 3, the substrate holding portions 11 and 12 are formed with a plurality of suction holes l ib and 12b on the upper surface, and suck and hold the lower surface of the substrate end protruding from the surface plate 10. Is possible. The substrate holders 11 and 12 are lifted and lowered by the lifting devices 11c and 12c, respectively, and can be lowered when the substrate suction is not performed.

[0031] In addition, positioning units 13 and 14 are provided at a position in front of the exposure unit 3c, that is, a front position in the transport direction of the substrate loading unit 3a and a front position in the transport direction of the transfer transport base 2, respectively. In each of the positioning portions 13 and 14, the substrate is positioned by an external reference stopper (not shown).

Next, a procedure for transporting the substrate will be described with reference to FIGS. 2 (a) to 2 (d). First, as shown in FIG. 2 (a), the substrate C before the exposure processing is placed on the substrate loading unit 3a of the exposure apparatus 3. A substrate D to be exposed next to the substrate C is placed on the transfer carrier 2. A substrate E to be exposed next to the substrate D is placed on the stock transfer table 1.

[0034] Then, as shown in FIG. 2 (b), when the exposure processing of the substrate C placed on the substrate loading unit 3a is started, the substrate B is received from the substrate discharge unit 3b and transferred to the transfer table 4. Then, the substrate A placed on the receiving / transporting table 4 is transported by a discharge robot (not shown).

At this time, the substrate D placed on the delivery carrier 2 is brought into a floating state and is transported by the substrate holder 12 to the substrate loading unit 3a. In addition, the substrate E placed on the stock transfer table 1 is also floated and received by the substrate holding unit 11 and transferred to the transfer table 2. Then, the next substrate F is transferred to the stock transfer table 1 by a loading robot (not shown). Then, as shown in FIG. 2 (c), when the substrates D and E are placed on the substrate loading unit 3a and the transfer carrier 2, respectively, positioning is performed by the positioning units 14 and 13, respectively. After that, as shown in FIGS. 2 (c) to 2 (d), the substrate holders 12 and 11 stop the substrate suction operation and move to positions where the next substrates E and F are transferred, respectively. Start suction operation. Thereafter, the substrate is transferred to the exposure apparatus 3 in the same procedure.

[0037] As described above, since the substrate transfer to the substrate loading unit 3a, the transfer transfer table 2 and the stock transfer table 1 is performed by floating the substrate, smooth substrate transfer can be performed. Further, since the substrate end portions are held by the substrate holding portions 11 and 12 by adsorption, damage to the substrate during holding is reduced.

[0038] Further, since the position of the substrate is adjusted by the positioning unit 13 provided on the delivery carrier 2, the position adjustment of the substrate is usually performed in the positioning unit 14 of the substrate loading unit 3a of the exposure apparatus 3. Since the position of the substrate can be adjusted, the substrate can be positioned (alignment adjustment) with high accuracy by the two positioning portions 13 and 14.

FIG. 4 shows a modified example of the movement of the substrate holders 12 and 11 in FIG. 2 described above, and only the differences will be described. In this case, as shown in FIGS. 4 (c) to 4 (d), the substrate holding unit 12 stops the substrate suction operation, moves to the position where the next substrate F is transported, and performs the suction operation. The substrate holding unit 11 does not move while continuing the suction operation. Then, as shown in FIG. 4 (e), when the exposure processing of the substrate D placed on the substrate loading unit 3a is started, the substrate E placed on the transfer carrier 2 is held on the substrate. The substrate F transferred to the substrate loading unit 3a by the unit 11 and placed on the stock transfer table 1 is received by the substrate holding unit 12 and transferred to the transfer table 2.

That is, as shown in FIG. 4 (a) to FIG. 4 (e) in order, the substrate E is carried by the substrate holding unit 11 as part of the conveyance from the stock conveyance table 1 to the substrate loading unit 3a. It will be. As described above, since the movement of the substrate holders 11 and 12 in the direction opposite to the conveyance direction only needs to move one of the substrate holders, the number of suction operations by the substrate holder can be reduced and the conveyance can be performed. The displacement of the substrate at the time is suppressed.

Next, FIG. 5 shows a configuration in which the substrate holding portions 12 and 11 of FIG. 2 described above are provided only at one end portion of the substrate. Using these Fig. 5 (a) to Fig. 5 (e), the procedure for transporting the substrate is described. And explain. First, as shown in FIG. 5A, the substrate C before exposure processing is placed on the substrate loading unit 3a of the exposure apparatus 3. A substrate D to be exposed next to the substrate C is placed on the transfer carrier 2. A substrate E to be exposed next to the substrate D is placed on the stock transfer table 1.

Then, as shown in FIG. 5 (b), when the exposure processing of the substrate C placed on the substrate loading unit 3a is started, the substrate B is received from the substrate discharge unit 3b and transferred to the transfer table 4. Then, the substrate A placed on the receiving / transporting table 4 is transported by a discharge robot (not shown).

[0044] At this time, the substrate D placed on the transfer carrier 2 is brought into a floating state and is transferred to the substrate loading unit 3a by the substrate holding unit 12 provided only on the lower side. In addition, the substrate E placed on the stock transfer table 1 is also floated, and is received and transferred to the transfer table 2 by the substrate holder 11 provided only on the upper side. Then, the next substrate F is transferred to the stock transfer table 1 by a transfer port bot (not shown).

Then, as shown in FIG. 5 (c), when the substrates D and E are placed on the substrate loading unit 3a and the transfer carrier 2, respectively, positioning is performed by the positioning units 14 and 13, respectively. Thereafter, as shown in FIGS. 5 (c) to 5 (d), the substrate holding unit 12 stops the substrate suction operation, moves to a position where the next substrate F is transported, and starts the suction operation. However, the substrate holder 11 should not move while the suction operation is stopped or continued.

Then, as shown in FIG. 5 (e), when the exposure processing of the substrate D placed on the substrate loading unit 3a is started, the substrate placed on the delivery carrier 2 E is transferred to the substrate loading unit 3a by the substrate holding unit 11, and the substrate F placed on the stock transfer table 1 is received by the substrate holding unit 12 and transferred to the transfer table 2.

That is, as shown in FIGS. 5 (a) to 5 (e) in order, the substrate E is transported by the substrate holder 11 from the stock transport table 1 to the substrate loading unit 3a as a part. It will be. In this way, the substrate holding part is provided only on one end of the substrate, and the positions where the board holding parts are provided on the front and rear substrates are reversed so that the substrate holding parts 11 and 12 are transported in the opposite direction. This movement can be achieved by moving either one of the substrate holders, and the mechanism for movement can be simplified. Easy. As a result, the number of suction operations by the substrate holder is reduced, and displacement of the substrate during transport is suppressed.

Although one embodiment of the present invention has been described above, the present invention is of course not limited to such embodiment and can be implemented in various modes without departing from the gist of the present invention. For example, in the above-described embodiment, the description has been given using the pattern following type exposure apparatus as an example of the substrate processing apparatus to which the substrate transport method of the present invention is applied, but the substrate follows the existing pattern on the substrate. The substrate transfer method according to the present invention is applicable to any pattern following type substrate processing apparatus that performs processing. For example, a coloring layer forming apparatus for a color filter used in a liquid crystal panel, and a pattern following type drawing apparatus for discharging colored ink to a black matrix opening while following a black matrix pattern by an ink jet method. It can be applied and is not limited to the pattern following type exposure apparatus described above.

Claims

The scope of the claims

[1] Before the processed substrate is discharged from the substrate discharge unit of the substrate processing apparatus that performs processing while transporting the substrate to the processing unit, the substrate processing unit is loaded with the substrate before processing. A substrate transport method to a substrate processing apparatus, characterized by starting.

[2] A transfer carrier on which a pre-processed substrate to be transported to the substrate loading unit of the substrate processing apparatus is placed, and a receiving transport on which the processed substrate is transported and placed from the substrate discharge unit of the substrate processing apparatus 2. The transfer of the pre-process substrate from the transfer transfer table is started before the post-process substrate is transferred to and placed on the receiving transfer table. A substrate transport method to a substrate processing apparatus.

[3] Furthermore, a stock transfer table on which a pre-process substrate to be transferred to the delivery transfer table is placed, and before the pre-process substrate is transferred to and placed on the substrate loading unit, 3. The method for transporting a substrate to a substrate processing apparatus according to claim 2, wherein the transport of the substrate before processing is started from the stock transport table.

4. The method for transporting a substrate to a substrate processing apparatus according to claim 2 or 3, wherein the transfer transport table is provided with a positioning portion, and the position of the substrate is adjusted by the positioning portion.

[5] The transfer of the substrate before processing to the substrate loading unit, the transfer transfer table and the stock transfer table is performed by floating the substrate before processing. Substrate transport method to a substrate processing apparatus.

[6] The substrate processing according to [5], wherein the transfer performed by levitating the unprocessed substrate is performed by movement of a substrate holding unit that holds both end portions in the width direction of the unprocessed substrate. A substrate transport method to the apparatus.

[7] The substrate processing according to [5], wherein the transfer performed by floating the substrate before processing is performed by movement of a substrate holding unit that holds one end portion of the substrate before processing in the width direction. A substrate transport method to the apparatus.

8. The method for transporting a substrate to a substrate processing apparatus according to claim 6, wherein the pre-processing substrate end is held by the substrate holding unit by suction.