WO2007013293A1 - Hybrid laser processing system - Google Patents
Hybrid laser processing system Download PDFInfo
- Publication number
- WO2007013293A1 WO2007013293A1 PCT/JP2006/313751 JP2006313751W WO2007013293A1 WO 2007013293 A1 WO2007013293 A1 WO 2007013293A1 JP 2006313751 W JP2006313751 W JP 2006313751W WO 2007013293 A1 WO2007013293 A1 WO 2007013293A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid
- liquid column
- workpiece
- processing head
- partition member
- Prior art date
Links
- 239000007788 liquid Substances 0.000 claims abstract description 130
- 238000005192 partition Methods 0.000 claims abstract description 29
- 238000002347 injection Methods 0.000 claims description 30
- 239000007924 injection Substances 0.000 claims description 30
- 238000004891 communication Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 238000003754 machining Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26F—PERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
- B26F3/00—Severing by means other than cutting; Apparatus therefor
- B26F3/004—Severing by means other than cutting; Apparatus therefor by means of a fluid jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/146—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing a liquid
Definitions
- the present invention relates to a hybrid laser cafe apparatus, and more particularly to a hybrid laser processing apparatus that ejects liquid from an ejection hole into a liquid column and ejects the liquid to the outside and guides laser light to the liquid column.
- a processing head having an injection hole, a liquid supply unit that supplies a high-pressure liquid to the processing head, and a laser oscillator that oscillates laser light, the liquid supplied from the liquid supply unit is provided.
- a hybrid laser processing apparatus for processing a workpiece by making a liquid column from an injection hole to be ejected to the outside and guiding a laser beam to the liquid column.
- Patent Document 1 Japanese Patent Publication No. 10-500903
- the present invention provides a laser beam processing apparatus capable of forming a stable liquid column long even when an injection hole and a workpiece are close to each other. Means for solving the problem
- the hybrid laser carriage device oscillates laser light, a processing head having an injection hole, a liquid supply means for supplying high-pressure liquid to the processing head, and the like.
- a laser oscillator, and the liquid supplied from the liquid supply means is ejected to the outside as a liquid column from the ejection hole, and the laser beam is guided to the liquid column to process the object to be coated.
- the hybrid laser carriage system In the hybrid laser carriage system,
- a partition member with a passage hole through which the liquid column passes is provided between the processing head and the workpiece, and the partition member prevents the liquid bounced off the workpiece from reaching the processing head.
- a gas passage is formed between the processing head and the partition member.
- the partition member by providing the partition member, the liquid that has bounced off the workpiece does not reach the periphery of the spray hole, and the inside of the gas passage formed between the heating head and the partition member Since the airflow flowing through the pipe is not disturbed, a stable liquid column can be formed long even if the injection hole and the workpiece are brought close to each other.
- FIG. 1 shows a hybrid laser processing apparatus 1 that works according to the present invention, and guides a laser beam L to a liquid column W formed by jetting a liquid, thereby processing the workpiece.
- This is a device that cuts object 2 into the required shape.
- the hybrid laser carriage apparatus 1 includes a processing table 3 that supports the above-described object 2, a laser oscillator 4 that oscillates laser light L, and a liquid supply means that supplies liquid such as high-pressure water. 5 and a processing head 6 for injecting the liquid as a liquid column W toward the object 2 and guiding the laser beam L to the liquid column W. These are controlled by control means (not shown). To be controlled.
- the machining table 3 is conventionally known and will not be described in detail. However, the workpiece 2 is moved in the horizontal direction with respect to the machining head 6, and the machining head 6 is Not shown, moved vertically by lifting and lowering means!
- a thin semiconductor wafer is cut as the above-described object 2 and, in addition, a composite material such as an epoxy resin board and a resin can be cut. it can.
- grooving can also be performed on the surface of the workpiece 2.
- the laser oscillator 4 is a YAG laser oscillator, which can perform CW oscillation or pulse oscillation according to processing, and can adjust processing conditions such as its output and pulse oscillation period as appropriate. .
- a shotter means 11 for blocking the laser light L, a reflection mirror 12 for reflecting the laser light L toward the processing head 6, and the irradiated laser light L are collected.
- a condensing lens 13 is provided.
- the shatter means 11 is controlled by the control means, and a reflection mirror 11a that reciprocates on and off the optical path of the laser light L by driving means (not shown), and the energy of the laser light L reflected by the reflection mirror 11a. It is equipped with 1 lb of damper that absorbs.
- the reflection mirror 11a When the reflection mirror 11a is positioned on the optical path of the laser light L, the laser light L is reflected by the reflection mirror 11a, and the energy of the laser light is absorbed by the damper ib.
- the reflecting mirror 11a is moved out of the optical path of the laser beam L, the laser beam L is reflected by the reflecting mirror 12 and then irradiated to the processing head 6 through the condenser lens 13.
- Other laser oscillators such as semiconductor lasers and CO laser oscillators are used.
- the laser light L oscillated like a CO laser oscillator is absorbed by water.
- the liquid ejected from the heating head 6 may be a liquid that is difficult for laser light to absorb.
- the liquid supply means 5 includes a water storage tank 21 for storing water, and a pump 22 for feeding the water stored in the water storage tank 21 toward the carriage head 6, which includes a conduit 23 Are connected to each other.
- the water storage tank 21 is connected to a water supply source 24.
- a conduit 23 connecting the water supply source 24 and the water storage tank 21 has an on-off valve 25 for controlling the supply of water from the water supply source 24, and a water supply source 24.
- a spillage filter 26 for removing foreign substances contained in the water supplied from the water.
- a check valve 27 for preventing the backflow of water to the pump 22, and the pulsation of the water to be fed are prevented, and the processing head
- An accumulator 28 for supplying high-pressure water, a filter 29 for removing foreign substances in the water, and a first electromagnetic valve 30 whose opening / closing is controlled by the control means are provided in 6.
- conduit 23 from the water supply source 24 to the water storage tank 21 and the conduit 23 from the pump 22 to the processing head 6 are connected by two parallel conduits 23, and one conduit 23 is connected to the second electromagnetic
- the valve 31 is provided, and the other conduit 23 is provided with a pressure regulating valve 32.
- the second solenoid valve 31 is used to return the liquid from the pump 22 to the water storage tank 21 when stopping the hybrid laser carriage device 1, and the pressure regulating valve 32 is used from the pump 22 to the carriage head. Up to 6 is provided to keep the pressure inside the conduit 23 constant.
- FIG. 2 shows an enlarged view of the machining head 6.
- the machining head 6 includes a housing 41 that is moved by the moving means, an injection nozzle 42 that is provided below the housing 41, and an injection nozzle 42. And a transparent glass plate 43 provided between the condenser lens 13 and a partition member 44 provided below the injection nozzle 42.
- a side surface of the housing 41 is provided with a connection port 41a that communicates with a liquid passage 45 formed between the glass plate 43 and the injection nozzle 42 and is connected to the conduit 23.
- the liquid supplied from the means 5 flows into the liquid passage 45 from the connection port 41a and is then ejected as the liquid column W from the ejection nozzle 42.
- the injection nozzle 42 is fixed to the center of a stay 46 fitted to the lower end portion of the housing 41, and the stay 46 is fixed to the lower surface of the housing 41 with a ring-shaped fixing member 47.
- An injection hole 48 is formed in the center of the injection nozzle 42.
- the injection hole 48 is formed on the condensing lens 13 side and has a first inclined surface 48a having a diameter reduced toward the workpiece 2, and the first It is composed of a second inclined surface 48c whose diameter is expanded from the minimum diameter portion 48b of the inclined surface 48a toward the workpiece 2 side.
- Under the injection nozzle 42 through holes 46a and 47a that penetrate the stay 46 and the fixing member 47 are formed.
- the diameters of the through holes 46a and 47a are smaller than the outer diameter of the injection nozzle 42.
- the diameter is set larger than the diameter of the lower end portion of the second inclined surface 48c.
- the glass plate 43 is located between the spray nozzle 42 and the condenser lens 13 and is fixed to the housing 41 with a nut 49, so that the liquid in the liquid passage 45 is more liquid than the glass plate 43. The leakage of light into the upper space is prevented, and the laser light L collected by the condenser lens 13 is transmitted.
- the partition member 44 is a circular plate-like member having a passage hole 44a formed in the center.
- the partition member 44 is formed on the lower surface of the fixing member 47 with bolts 51 via four cylindrical spacers 50. It is fixed.
- the partition member 44 forms a gas passage 52 between the partition member 44 and the fixing member 47, and the gas passage 52 communicates with the atmosphere through the space between the adjacent spacers 50. It is like that.
- the passage hole 44a has a chamfered shape that expands downward, and the diameter of the passage hole 44a on the side of the injection nozzle 42 is directed toward the object 2 along the liquid column W. It is set so that it does not block the airflow that circulates! In the present embodiment, when the diameter of the liquid column to be ejected is 50 / z m, the diameter of the passage hole 44a is set to 0.5 mm to 5 mm.
- the control means controls the liquid supply means 5 and starts feeding the water in the water storage tank 21 toward the carriage head 6 by the pump 22.
- a sufficient amount of water is supplied to the water storage tank 21 from a water supply source 24 in advance.
- the water fed by the pump 22 passes through the check valve 27 and then flows into the accumulator 28.
- the filter 29 and It passes through the first solenoid valve 30 and flows into the liquid passage 45 via the connection port 41a of the above-described cache head 6.
- control means controls the laser oscillator 4 and the laser oscillator 4 starts oscillation of the laser light L.
- the reflection mirror 11a of the shirter means 11 is positioned on the optical path of the oscillated laser beam L, and the laser beam L is guided to the damper l ib by the reflection mirror 11a, and the energy of the laser beam L is Absorbed.
- the control means When the liquid column W ejected from the ejection hole 48 becomes stable, the control means immediately controls the shutter means 11 to move the reflecting mirror 11a out of the optical path of the laser light L, thereby causing the laser light L Is reflected by the reflecting mirror 12 and then condensed by the condenser lens 13.
- the condensed laser beam L passes through the liquid in the glass plate 43 and the liquid passage 45, is further reflected by the first inclined surface 48a of the injection hole 48, and is guided into the liquid column W, and then in the liquid column W.
- the target object 2 is irradiated while repeating reflection.
- a space is formed around the liquid column W ejected from the ejection hole 48 between the stay 46 and the inner wall surface of the through holes 46a and 47a formed in the fixing member 47.
- This space functions as a so-called air pocket P.
- the liquid column W injected from the injection hole 48 is not diffused for a while and remains stable for a while due to the airflow flowing toward the target object 2 along the liquid column W, while the laser beam L Reflects well in the liquid column W.
- the liquid column W ejected from the ejection hole 48 in this way is a force that reaches the workpiece 2.
- the liquid column W is processed. If the object 2 does not penetrate, the liquid column W will collide with the object 2 and the scattered liquid will bounce upward.
- the liquid that bounces up to the bottom reaches the lower surface of the fixing member.
- the bounced liquid is blocked by the partition member 44, and therefore reaches the lower surface of the fixing member 47.
- the distance between the processing head 6 and the workpiece 2 is made longer than the height at which the rebounding liquid reaches, and the liquid column W is thickened by that amount.
- the distance that W reaches stably has to be increased, and the cutting width becomes wider, which has been a factor in reducing the yield of semiconductor wafers.
- the partition member 44 of the present embodiment is a bottomed cylindrical member, and is fixed so as to cover the lower surface of the processing head 6.
- the partition member 44 has a lower surface center in the same manner as in the first embodiment.
- the passage hole 44a is formed.
- a plurality of communication ports 44b are formed in the side surface of the partition member 44 so that the gas passage 52 formed in the partition member 44 communicates with the atmosphere.
- the workpiece 2 can be machined while the machining head 6 and the workpiece 2 are brought close to each other.
- FIG. 1 is a layout view of a hybrid laser carriage device in the present embodiment.
- FIG. 2 An enlarged cross-sectional view of the machining head.
- FIG. 3 is an enlarged cross-sectional view of a machining head in a second embodiment.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Laser Beam Processing (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
Abstract
A hybrid laser processing system (1) comprises a laser oscillator (4) for oscillating laser light (L) to a processing head (6), and a liquid supplying means (5) for supplying a high pressure liquid to the processing head. In the hybrid laser processing system, a liquid column (W) is ejected from an ejection hole (48) provided at the distal end of the processing head and a workpiece (2) is cut by guiding laser light to the liquid column. The liquid column collides against the workpiece and bounces toward the processing head but since the liquid is blocked by a partition member (44), an air flow flowing toward the liquid column (W) in a gas passage between the processing head and the partition member is not disturbed and the liquid column can reach the workpiece without being diffused since an air flow is flowing along the liquid column. A long stabilized liquid column can be formed even if the ejection hole and the workpiece are located closely to each other.
Description
明 細 書 Specification
ハイブリッドレーザ加工装置 Hybrid laser processing equipment
技術分野 Technical field
[0001] 本発明はハイブリッドレーザカ卩ェ装置に関し、詳しくは液体を噴射孔から液柱にし て外部に噴射させると共に、上記液柱にレーザ光を導光するハイブリッドレーザ加工 装置に関する。 TECHNICAL FIELD [0001] The present invention relates to a hybrid laser cafe apparatus, and more particularly to a hybrid laser processing apparatus that ejects liquid from an ejection hole into a liquid column and ejects the liquid to the outside and guides laser light to the liquid column.
背景技術 Background art
[0002] 従来、噴射孔を有する加工ヘッドと、当該加工ヘッドに高圧の液体を供給する液体 供給手段と、レーザ光を発振するレーザ発振器とを備え、上記液体供給手段から供 給された液体を噴射孔から液柱にして外部に噴射させると共に、上記液柱にレーザ 光を導光して、被加工物の加工を行うハイブリッドレーザ加工装置が知られている。 ( 特許文献 1) Conventionally, a processing head having an injection hole, a liquid supply unit that supplies a high-pressure liquid to the processing head, and a laser oscillator that oscillates laser light, the liquid supplied from the liquid supply unit is provided. There is known a hybrid laser processing apparatus for processing a workpiece by making a liquid column from an injection hole to be ejected to the outside and guiding a laser beam to the liquid column. (Patent Document 1)
そしてこのようなハイブリッドレーザカ卩ェ装置では、噴射した液柱を拡散させずに安 定した状態のまま被加工物に到達させる必要があり、噴射孔と被加工物との間隔は、 噴射される液柱が安定して 、る範囲内で定めなければならな 、。 In such a hybrid laser cage apparatus, it is necessary to reach the work piece in a stable state without diffusing the injected liquid column, and the interval between the injection hole and the work piece is set to be injected. The liquid column must be determined within a certain range.
特許文献 1:特表平 10— 500903号公報 Patent Document 1: Japanese Patent Publication No. 10-500903
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0003] ここで、液柱を安定して形成するには、該液柱に沿って被カ卩ェ物に向力う気流が必 要であり、この気流は、液柱の噴射により液柱の周囲の気体が該液柱に沿って移動 することで発生し、またこの気流が発生すると、その周囲の気体が液柱に向けて引つ 張られ、液柱に向力う気流が発生する。 [0003] Here, in order to stably form the liquid column, an air flow directed toward the workpiece along the liquid column is required, and this air flow is generated by jetting the liquid column. When the gas around this is moved along the liquid column and this air flow is generated, the surrounding gas is pulled toward the liquid column, and an air current directed toward the liquid column is generated. .
また、ハイブリッドレーザ加工装置を用いて半導体ウェハなどを切断する際におい て、噴射する液柱の径を細くして切断幅を狭くすることが求められている力 液柱の 径に対して液柱を安定した状態で保つことのできる長さには相関関係があり、このた め液柱の径を細くするには噴射孔と被加工物とを接近させなければならない。 In addition, when cutting a semiconductor wafer or the like using a hybrid laser processing apparatus, it is required to reduce the diameter of the liquid column to be sprayed to reduce the cutting width. There is a correlation between the length that can be maintained in a stable state, and therefore, in order to reduce the diameter of the liquid column, the injection hole and the workpiece must be brought close to each other.
し力しながら、あまりに噴射孔と被カ卩ェ物とを接近させてしまうと、被カ卩ェ物に衝突
した液柱が跳ね返り、跳ね返った液体が噴射孔の周囲に到達して、液柱に向けて流 れる噴射孔近傍の気流が乱れ、その結果、液柱に沿って流れる気流も乱れてしまうこ とから、安定した液柱を得ることができなくなってしまう。 However, if the injection hole and the object to be moved are brought too close to each other, the collision with the object to be covered will occur. The splashed liquid column bounces, the bounced liquid reaches the periphery of the injection hole, and the airflow in the vicinity of the injection hole flowing toward the liquid column is disturbed. As a result, the airflow flowing along the liquid column is also disturbed. Therefore, a stable liquid column cannot be obtained.
このような問題に鑑み、本発明は噴射孔と被加工物とが接近していても、安定した 液柱を長く形成することの可能なノ、イブリツドレーザ加工装置を提供するものである。 課題を解決するための手段 In view of such a problem, the present invention provides a laser beam processing apparatus capable of forming a stable liquid column long even when an injection hole and a workpiece are close to each other. Means for solving the problem
[0004] すなわち、本発明におけるノ、イブリツドレーザカ卩ェ装置は、噴射孔を有する加工へ ッドと、当該加工ヘッドに高圧の液体を供給する液体供給手段と、レーザ光を発振す るレーザ発振器とを備え、上記液体供給手段から供給された液体を噴射孔から液柱 にして外部に噴射させると共に、上記液柱にレーザ光を導光して、被カ卩ェ物の加工 を行うハイブリッドレーザカ卩ェ装置において、 [0004] That is, the hybrid laser carriage device according to the present invention oscillates laser light, a processing head having an injection hole, a liquid supply means for supplying high-pressure liquid to the processing head, and the like. A laser oscillator, and the liquid supplied from the liquid supply means is ejected to the outside as a liquid column from the ejection hole, and the laser beam is guided to the liquid column to process the object to be coated. In the hybrid laser carriage system,
上記加工ヘッドと被加工物との間に、上記液柱の通過する通過孔を穿設した仕切 部材を設けて、上記被加工物から跳ね返った液体が加工ヘッドに到達するのを仕切 部材で防止するとともに、該加工ヘッドと仕切部材との間に気体通路を形成すること を特徴としている。 A partition member with a passage hole through which the liquid column passes is provided between the processing head and the workpiece, and the partition member prevents the liquid bounced off the workpiece from reaching the processing head. In addition, a gas passage is formed between the processing head and the partition member.
発明の効果 The invention's effect
[0005] 本発明によれば、上記仕切部材を設けることで、被加工物に跳ね返った液体が噴 射孔の周囲に到達しなくなり、加ェヘッドと仕切部材との間に形成された気体通路内 を流通する気流が乱されることはないので、噴射孔と被加工物とを接近させても、安 定した液柱を長く形成することが可能となる。 [0005] According to the present invention, by providing the partition member, the liquid that has bounced off the workpiece does not reach the periphery of the spray hole, and the inside of the gas passage formed between the heating head and the partition member Since the airflow flowing through the pipe is not disturbed, a stable liquid column can be formed long even if the injection hole and the workpiece are brought close to each other.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0006] 以下図示実施例について説明すると、図 1には本発明に力かるハイブリッドレーザ 加工装置 1を示し、液体の噴射により形成した液柱 Wにレーザ光 Lを導光することで 、被加工物 2を所要形状に切断加工する装置となって 、る。 [0006] The illustrated embodiment will be described below. FIG. 1 shows a hybrid laser processing apparatus 1 that works according to the present invention, and guides a laser beam L to a liquid column W formed by jetting a liquid, thereby processing the workpiece. This is a device that cuts object 2 into the required shape.
このハイブリッドレーザカ卩ェ装置 1は、上記被力卩ェ物 2を支持する加工テーブル 3と 、レーザ光 Lを発振するレーザ発振器 4と、高圧にした水等の液体を供給する液体供 給手段 5と、被力卩ェ物 2に向けて液体を液柱 Wとして噴射するとともに、レーザ光 Lを 上記液柱 Wに導光する加工ヘッド 6とを備え、これらは図示しない制御手段によって
制御されるようになっている。 The hybrid laser carriage apparatus 1 includes a processing table 3 that supports the above-described object 2, a laser oscillator 4 that oscillates laser light L, and a liquid supply means that supplies liquid such as high-pressure water. 5 and a processing head 6 for injecting the liquid as a liquid column W toward the object 2 and guiding the laser beam L to the liquid column W. These are controlled by control means (not shown). To be controlled.
上記加工テーブル 3は従来公知であるので詳細な説明をしな 、が、上記被加工物 2を加工ヘッド 6に対して水平方向に移動させるようになっており、また上記加工へッ ド 6は図示しな 、昇降手段によって垂直方向に移動するようにされて!、る。 The machining table 3 is conventionally known and will not be described in detail. However, the workpiece 2 is moved in the horizontal direction with respect to the machining head 6, and the machining head 6 is Not shown, moved vertically by lifting and lowering means!
本実施例では、上記被力卩ェ物 2として板厚の薄い半導体ウェハを切断加工し、この 他にもエポキシ榭脂板ゃ榭脂と金属カゝらなる複合材料なども切断加工することができ る。また、切断加工や穴明け力卩ェのほかにも、被加工物 2表面に対して溝加工を行う ことも可能である。 In the present embodiment, a thin semiconductor wafer is cut as the above-described object 2 and, in addition, a composite material such as an epoxy resin board and a resin can be cut. it can. In addition to cutting and drilling force, grooving can also be performed on the surface of the workpiece 2.
[0007] 上記レーザ発振器 4は YAGレーザ発振器であり、加工に応じて CW発振又はパル ス発振が可能であり、またその出力やパルスの発振周期等の加工条件を適宜調整 できるようになつている。 [0007] The laser oscillator 4 is a YAG laser oscillator, which can perform CW oscillation or pulse oscillation according to processing, and can adjust processing conditions such as its output and pulse oscillation period as appropriate. .
レーザ発振器 4と加工ヘッド 6との間には、レーザ光 Lを遮断するシャツタ手段 11と 、レーザ光 Lを加工ヘッド 6に向けて反射させる反射ミラー 12と、照射されたレーザ光 Lを集光する集光レンズ 13とが設けられている。 Between the laser oscillator 4 and the processing head 6, a shotter means 11 for blocking the laser light L, a reflection mirror 12 for reflecting the laser light L toward the processing head 6, and the irradiated laser light L are collected. And a condensing lens 13 is provided.
上記シャツタ手段 11は上記制御手段によって制御され、図示しない駆動手段によ りレーザ光 Lの光路上と光路外とを往復動する反射ミラー 11aと、当該反射ミラー 11a によって反射したレーザ光 Lのエネルギーを吸収するダンバ 1 lbとを備えて 、る。 上記反射ミラー 11 aをレーザ光 Lの光路上に位置させると、レーザ光 Lは当該反射 ミラー 11aに反射し、当該レーザ光のエネルギーが上記ダンバ l ibに吸収される。 一方、反射ミラー 11aをレーザ光 Lの光路外に移動させると、レーザ光 Lは上記反 射ミラー 12で反射した後、集光レンズ 13を介して上記加工ヘッド 6へと照射される。 なお、レーザ発振器 4としてこの他にも半導体レーザや COレーザ発振器等を用い The shatter means 11 is controlled by the control means, and a reflection mirror 11a that reciprocates on and off the optical path of the laser light L by driving means (not shown), and the energy of the laser light L reflected by the reflection mirror 11a. It is equipped with 1 lb of damper that absorbs. When the reflection mirror 11a is positioned on the optical path of the laser light L, the laser light L is reflected by the reflection mirror 11a, and the energy of the laser light is absorbed by the damper ib. On the other hand, when the reflecting mirror 11a is moved out of the optical path of the laser beam L, the laser beam L is reflected by the reflecting mirror 12 and then irradiated to the processing head 6 through the condenser lens 13. Other laser oscillators such as semiconductor lasers and CO laser oscillators are used.
2 2
ることも可能であるが、 COレーザ発振器のように発振されるレーザ光 Lが水に吸収さ Although it is possible, the laser light L oscillated like a CO laser oscillator is absorbed by water.
2 2
れやす 、波長である場合には、加ェヘッド 6より噴射される液体をレーザ光 が吸収 にくい液体にすればよい。 In the case of a wavelength, the liquid ejected from the heating head 6 may be a liquid that is difficult for laser light to absorb.
[0008] 次に、液体供給手段 5は、水を貯溜する貯水タンク 21と、貯水タンク 21に貯溜され た水をカ卩ェヘッド 6に向けて送液するポンプ 22とを備え、これらは導管 23によって相 互に接続されている。
上記貯水タンク 21は給水源 24に接続されており、給水源 24と貯水タンク 21とを接 続する導管 23には、給水源 24からの水の供給を制御する開閉弁 25と、給水源 24か ら供給される水に含有される異物を除去する余水フィルタ 26とを備えている。 [0008] Next, the liquid supply means 5 includes a water storage tank 21 for storing water, and a pump 22 for feeding the water stored in the water storage tank 21 toward the carriage head 6, which includes a conduit 23 Are connected to each other. The water storage tank 21 is connected to a water supply source 24. A conduit 23 connecting the water supply source 24 and the water storage tank 21 has an on-off valve 25 for controlling the supply of water from the water supply source 24, and a water supply source 24. And a spillage filter 26 for removing foreign substances contained in the water supplied from the water.
上記ポンプ 22と加工ヘッド 6との間には、上流側のポンプ 22側から順に、ポンプ 22 への水の逆流を防止する逆止弁 27、送液される水の脈動を防止し、加工ヘッド 6内 に高圧の水を供給するアキュムレータ 28、水内の異物を除去するフィルタ 29、上記 制御手段によって開閉が制御される第 1電磁弁 30が設けられている。 Between the pump 22 and the processing head 6, in order from the upstream pump 22 side, a check valve 27 for preventing the backflow of water to the pump 22, and the pulsation of the water to be fed are prevented, and the processing head An accumulator 28 for supplying high-pressure water, a filter 29 for removing foreign substances in the water, and a first electromagnetic valve 30 whose opening / closing is controlled by the control means are provided in 6.
また、給水源 24から貯水タンク 21までの導管 23と、ポンプ 22から加工ヘッド 6まで の導管 23とは、平行する 2本の導管 23によって接続されており、一方の導管 23には 第 2電磁弁 31が、他方の導管 23には圧力調整弁 32が設けられている。 In addition, the conduit 23 from the water supply source 24 to the water storage tank 21 and the conduit 23 from the pump 22 to the processing head 6 are connected by two parallel conduits 23, and one conduit 23 is connected to the second electromagnetic The valve 31 is provided, and the other conduit 23 is provided with a pressure regulating valve 32.
上記第 2電磁弁 31はハイブリッドレーザカ卩ェ装置 1を停止させる際などに、ポンプ 2 2からの液体を貯水タンク 21に戻すために使用され、また圧力調整弁 32はポンプ 22 からカ卩ェヘッド 6までの導管 23内部の圧力を一定に保っために設けられている。 図 2は加工ヘッド 6の拡大図を示しており、該加工ヘッド 6は、上記移動手段によつ て移動するハウジング 41と、ハウジング 41の下部に設けられた噴射ノズル 42と、噴 射ノズル 42と上記集光レンズ 13との間に設けられた透明なガラス板 43と、上記噴射 ノズル 42の下方に設けられた仕切部材 44とを備えている。 The second solenoid valve 31 is used to return the liquid from the pump 22 to the water storage tank 21 when stopping the hybrid laser carriage device 1, and the pressure regulating valve 32 is used from the pump 22 to the carriage head. Up to 6 is provided to keep the pressure inside the conduit 23 constant. FIG. 2 shows an enlarged view of the machining head 6. The machining head 6 includes a housing 41 that is moved by the moving means, an injection nozzle 42 that is provided below the housing 41, and an injection nozzle 42. And a transparent glass plate 43 provided between the condenser lens 13 and a partition member 44 provided below the injection nozzle 42.
上記ハウジング 41の側面には、上記ガラス板 43および噴射ノズル 42との間に形成 された液体通路 45に連通すると共に、上記導管 23に接続される接続口 41aが設け られており、上記液体供給手段 5から供給された液体は接続口 41aから液体通路 45 内に流入した後、上記噴射ノズル 42から液柱 Wとなって噴射されることとなる。 A side surface of the housing 41 is provided with a connection port 41a that communicates with a liquid passage 45 formed between the glass plate 43 and the injection nozzle 42 and is connected to the conduit 23. The liquid supplied from the means 5 flows into the liquid passage 45 from the connection port 41a and is then ejected as the liquid column W from the ejection nozzle 42.
上記噴射ノズル 42は、ハウジング 41の下端部に嵌合するステー 46の中央に固定 されており、このステー 46は上記ハウジング 41の下面にリング状の固定部材 47によ つて固定されている。 The injection nozzle 42 is fixed to the center of a stay 46 fitted to the lower end portion of the housing 41, and the stay 46 is fixed to the lower surface of the housing 41 with a ring-shaped fixing member 47.
この噴射ノズル 42の中央には噴射孔 48が形成され、この噴射孔 48は集光レンズ 1 3側に形成されて被加工物 2に向けて縮径する第 1傾斜面 48aと、この第 1傾斜面 48 aの最小径部 48bより被加工物 2側に向けて拡径する第 2傾斜面 48cとから構成され ている。
そして、上記噴射ノズル 42の下方には上記ステー 46および固定部材 47を貫通す る貫通孔 46a、 47aが形成され、この貫通孔 46a、 47aの径は噴射ノズル 42の外径よ りも小径で、かつ上記第 2傾斜面 48cの下端部の径よりも大径に設定されて 、る。 上記ガラス板 43は上記噴射ノズル 42と集光レンズ 13との間に位置し、上記ハウジ ング 41にナット 49を用いて固定されており、上記液体通路 45の液体が該ガラス板 4 3よりも上方の空間に漏出するのを防止し、また集光レンズ 13によって集光されたレ 一ザ光 Lが透過するようになって 、る。 An injection hole 48 is formed in the center of the injection nozzle 42. The injection hole 48 is formed on the condensing lens 13 side and has a first inclined surface 48a having a diameter reduced toward the workpiece 2, and the first It is composed of a second inclined surface 48c whose diameter is expanded from the minimum diameter portion 48b of the inclined surface 48a toward the workpiece 2 side. Under the injection nozzle 42, through holes 46a and 47a that penetrate the stay 46 and the fixing member 47 are formed. The diameters of the through holes 46a and 47a are smaller than the outer diameter of the injection nozzle 42. In addition, the diameter is set larger than the diameter of the lower end portion of the second inclined surface 48c. The glass plate 43 is located between the spray nozzle 42 and the condenser lens 13 and is fixed to the housing 41 with a nut 49, so that the liquid in the liquid passage 45 is more liquid than the glass plate 43. The leakage of light into the upper space is prevented, and the laser light L collected by the condenser lens 13 is transmitted.
[0010] 上記仕切部材 44は、中央に通過孔 44aの穿設された円形の板状部材であり、上記 固定部材 47の下面に 4本の円筒状のスぺーサ 50を介してボルト 51によって固定さ れている。 [0010] The partition member 44 is a circular plate-like member having a passage hole 44a formed in the center. The partition member 44 is formed on the lower surface of the fixing member 47 with bolts 51 via four cylindrical spacers 50. It is fixed.
この仕切部材 44により、該仕切部材 44と固定部材 47との間には気体通路 52が形 成され、この気体通路 52は、上記隣接するスぺーサ 50の間を介して大気に連通す るようになっている。 The partition member 44 forms a gas passage 52 between the partition member 44 and the fixing member 47, and the gas passage 52 communicates with the atmosphere through the space between the adjacent spacers 50. It is like that.
上記通過孔 44aは下方に向けて拡径する面取形状を有し、このうち通過孔 44aに おける噴射ノズル 42側の径は、上記液柱 Wに沿つて被カ卩ェ物 2に向けて流通する 気流を阻止しな!、程度の径で、かつその径が大きくなり過ぎな 、ように設定されて!、 る。本実施例では噴射される液柱の径が 50 /z mの場合、該通過孔 44aの径を 0. 5m m〜5mmとして ヽ 。 The passage hole 44a has a chamfered shape that expands downward, and the diameter of the passage hole 44a on the side of the injection nozzle 42 is directed toward the object 2 along the liquid column W. It is set so that it does not block the airflow that circulates! In the present embodiment, when the diameter of the liquid column to be ejected is 50 / z m, the diameter of the passage hole 44a is set to 0.5 mm to 5 mm.
また、通過孔 44aを下方に向けて拡径する面取形状とすることで、仕切部材 44に 付着した液体が通過孔 44aに沿って下方に移動する際に、次第に液柱 Wから離隔し て液柱 Wに触れな!/、ようにされて!、る。 In addition, by adopting a chamfered shape in which the diameter of the passage hole 44a is expanded downward, the liquid adhering to the partition member 44 is gradually separated from the liquid column W when moving downward along the passage hole 44a. Do not touch the liquid column W!
[0011] このような構成を有するハイブリッドレーザカ卩ェ装置 1の動作について説明する。 The operation of the hybrid laser carriage apparatus 1 having such a configuration will be described.
最初に、ハイブリッドレーザ加工装置 1を始動させると、制御手段は液体供給手段 5 を制御し、上記ポンプ 22によって貯水タンク 21内の水をカ卩ェヘッド 6に向けて送液を 開始する。なお、貯水タンク 21には予め給水源 24より十分な量の水が供給されてい る。 First, when the hybrid laser processing apparatus 1 is started, the control means controls the liquid supply means 5 and starts feeding the water in the water storage tank 21 toward the carriage head 6 by the pump 22. A sufficient amount of water is supplied to the water storage tank 21 from a water supply source 24 in advance.
そして、上記ポンプ 22によって送液された水は、逆止弁 27を通過した後、アキュム レータ 28内に流入し、アキュムレータ 28が水で充満されると、さらにフィルタ 29及び
第 1電磁弁 30を通過し、上記カ卩ェヘッド 6の接続口 41aを介して液体通路 45に流入 する。 Then, the water fed by the pump 22 passes through the check valve 27 and then flows into the accumulator 28. When the accumulator 28 is filled with water, the filter 29 and It passes through the first solenoid valve 30 and flows into the liquid passage 45 via the connection port 41a of the above-described cache head 6.
その後、水が液体通路 45内に充満すると、水は上記噴射ノズル 42の噴射孔 48か ら噴射され、噴射された水は液柱 Wとなって被加工物 2に到達する。 Thereafter, when the liquid passage 45 is filled with water, the water is injected from the injection hole 48 of the injection nozzle 42, and the injected water reaches the workpiece 2 as a liquid column W.
これと並行して、制御手段はレーザ発振器 4を制御し、レーザ発振器 4はレーザ光 Lの発振を開始する。このとき、上記シャツタ手段 11の反射ミラー 11aは発振されたレ 一ザ光 Lの光路上に位置しており、レーザ光 Lは反射ミラー 11aによってダンバ l ib に案内され、レーザ光 Lのエネルギーは吸収される。 In parallel with this, the control means controls the laser oscillator 4 and the laser oscillator 4 starts oscillation of the laser light L. At this time, the reflection mirror 11a of the shirter means 11 is positioned on the optical path of the oscillated laser beam L, and the laser beam L is guided to the damper l ib by the reflection mirror 11a, and the energy of the laser beam L is Absorbed.
噴射孔 48より噴射される液柱 Wが安定した状態となると、制御手段は直ちにシャツ タ手段 11を制御して反射ミラー 11aをレーザ光 Lの光路外に移動させ、これによりレ 一ザ光 Lは反射ミラー 12に反射した後、集光レンズ 13によって集光される。 When the liquid column W ejected from the ejection hole 48 becomes stable, the control means immediately controls the shutter means 11 to move the reflecting mirror 11a out of the optical path of the laser light L, thereby causing the laser light L Is reflected by the reflecting mirror 12 and then condensed by the condenser lens 13.
集光されたレーザ光 Lはガラス板 43および液体通路 45内の液体を通過し、さらに 噴射孔 48の第 1傾斜面 48aで反射して液柱 W内に導光され、その後液柱 W内で反 射を繰り返しながら、被力卩ェ物 2に照射される。 The condensed laser beam L passes through the liquid in the glass plate 43 and the liquid passage 45, is further reflected by the first inclined surface 48a of the injection hole 48, and is guided into the liquid column W, and then in the liquid column W. The target object 2 is irradiated while repeating reflection.
ここで、上記噴射孔 48より噴射された液柱 Wの周囲には、上記ステー 46および固 定部材 47に形成された貫通孔 46a、 47aの内壁面との間に空間が形成されており、 この空間はいわゆるエアポケット Pとして機能する。 Here, a space is formed around the liquid column W ejected from the ejection hole 48 between the stay 46 and the inner wall surface of the through holes 46a and 47a formed in the fixing member 47. This space functions as a so-called air pocket P.
つまり、液柱 Wが噴射孔 48より噴射されると、液柱 Wの周囲には液柱 Wに沿って被 加工物 2へと流れる気流が発生し、これに伴って固定部材 47の下方には液柱 Wに 向けて流れる気流が発生する。 That is, when the liquid column W is ejected from the ejection hole 48, an airflow is generated around the liquid column W to the workpiece 2 along the liquid column W, and accordingly, below the fixing member 47. The air stream flowing toward the liquid column W is generated.
この固定部材 47の下方に発生した気流の一部は、矢印 Aのようにー且上記エアポ ケット P内に流入すると該エアポケット Pの上端部で反転し、その後液柱 Wに沿って被 加工物 2側へと流れてゆく。 When a part of the airflow generated below the fixing member 47 flows into the air pocket P as indicated by the arrow A, it is reversed at the upper end of the air pocket P, and then processed along the liquid column W. It flows to the object 2 side.
そして、この液柱 Wに沿って被力卩ェ物 2に向けて流れる気流により、噴射孔 48から 噴射された液柱 Wはしばらくの間拡散せずに安定した状態を保ち、その間レーザ光 Lは液柱 W内で良好に反射する。 The liquid column W injected from the injection hole 48 is not diffused for a while and remains stable for a while due to the airflow flowing toward the target object 2 along the liquid column W, while the laser beam L Reflects well in the liquid column W.
ここで、上記液柱 Wの太さと、噴射孔 48から噴射された液柱 Wが拡散するまでの距 離 (安定長)とを実際に測定したところ、噴射される液柱 Wの圧力を 13MPaとしたとき
、液柱径= 100 μ mで安定長 =約 90mm、液柱径 = 70 μ mで安定長 =約 60mm、 液柱径 = 50 mで安定長 =約 40mmであった。なおこの安定長は、液柱 Wの圧力 を高くすることで伸ばすことができる。 Here, when the thickness of the liquid column W and the distance (stable length) until the liquid column W injected from the injection hole 48 diffuses were actually measured, the pressure of the injected liquid column W was 13 MPa. When Liquid column diameter = 100 μm, stable length = about 90 mm, liquid column diameter = 70 μm, stable length = about 60 mm, liquid column diameter = 50 m, stable length = about 40 mm. This stable length can be increased by increasing the pressure of the liquid column W.
[0013] このようにして噴射孔 48より噴射された液柱 Wは被力卩ェ物 2に到達する力 このとき 、被加工物 2に溝加工を行う場合や、当該液柱 Wが被加工物 2を貫通していない場 合、液柱 Wは被力卩ェ物 2で衝突して飛散した液体は上方に跳ね返ってしまう。 [0013] The liquid column W ejected from the ejection hole 48 in this way is a force that reaches the workpiece 2. At this time, when the workpiece 2 is subjected to grooving, the liquid column W is processed. If the object 2 does not penetrate, the liquid column W will collide with the object 2 and the scattered liquid will bounce upward.
従って、本来ならば跳ね返った液体は固定部材の下面にまで到達することとなるが 、本実施例の場合、跳ね返った液体は上記仕切部材 44によって阻まれるので、固定 部材 47の下面まで到達することはな 、。 Therefore, the liquid that bounces up to the bottom reaches the lower surface of the fixing member. However, in this embodiment, the bounced liquid is blocked by the partition member 44, and therefore reaches the lower surface of the fixing member 47. Flower ,.
このように、上記仕切部材 44によって跳ね返る液体が固定部材 47に到達してしまう のを防止することで、上述した液柱 Wに向けて流れる気流が当該液体によって乱れ るのを防止することができ、液柱 Wに沿って流れる気流が乱れて液柱 Wが拡散してし まうのを防止することができる。 In this way, by preventing the liquid bounced off by the partition member 44 from reaching the fixing member 47, the airflow flowing toward the liquid column W can be prevented from being disturbed by the liquid. Thus, the airflow flowing along the liquid column W is disturbed and the liquid column W can be prevented from diffusing.
これに対し、特許文献 1のように仕切部材 44を設けないで液柱 Wを噴射すると、被 加工物 2で跳ね返った液体が固定部材 47の下面にまで達し、この液体により液柱 W に向けて流れる気流が乱れ、液柱 Wに沿って流れる気流も乱れることから、安定した 液柱 Wを噴射することができなくなってしまう。 On the other hand, when the liquid column W is ejected without providing the partition member 44 as in Patent Document 1, the liquid bounced off the workpiece 2 reaches the lower surface of the fixing member 47 and is directed toward the liquid column W by this liquid. Therefore, the airflow flowing along the liquid column W is disturbed, and the airflow flowing along the liquid column W is also disturbed, so that the stable liquid column W cannot be ejected.
このため、従来のハイブリッドレーザ加工装置 1では、加工ヘッド 6と被加工物 2との 距離を、跳ね返る液体の到達する高さよりも長くし、その分液柱 Wの太さを太くして液 柱 Wが安定して到達する距離を長くしなければならず、切断幅が広くなつて半導体ゥ ェハの歩留まりを低下させる要因となっていた。 For this reason, in the conventional hybrid laser processing apparatus 1, the distance between the processing head 6 and the workpiece 2 is made longer than the height at which the rebounding liquid reaches, and the liquid column W is thickened by that amount. The distance that W reaches stably has to be increased, and the cutting width becomes wider, which has been a factor in reducing the yield of semiconductor wafers.
しカゝも、上記仕切部材 44と固定部材 47との間に形成された気体通路 52は、隣接 するスぺーサ 50の間によつて大気と連通しているので、気体通路 52内の気流を安 定して得ることができ、気体の流量不足により気流が乱れて液柱 Wが拡散してしまうと V、つた問題が生じることはな 、。 In addition, since the gas passage 52 formed between the partition member 44 and the fixing member 47 communicates with the atmosphere between the adjacent spacers 50, the air flow in the gas passage 52 is also reduced. If the gas flow is disturbed and the liquid column W diffuses due to insufficient gas flow, V will not cause the same problem.
[0014] 次に、図 3に示す本発明の第 2の実施例について説明する。なお、この第 2の実施 例では、上記仕切部材 44の構成が異なるだけであるので、第 1の実施例と同じ部材 等については説明を省略する。
本実施例の仕切部材 44は、有底筒状の部材であって、上記加工ヘッド 6の下面を 覆うように固定され、当該仕切部材 44の下面中央には、上記第 1の実施例と同様の 通過孔 44aが穿設されて 、る。 Next, a second embodiment of the present invention shown in FIG. 3 will be described. In the second embodiment, only the configuration of the partition member 44 is different, so the description of the same members and the like as in the first embodiment will be omitted. The partition member 44 of the present embodiment is a bottomed cylindrical member, and is fixed so as to cover the lower surface of the processing head 6. The partition member 44 has a lower surface center in the same manner as in the first embodiment. The passage hole 44a is formed.
また、仕切部材 44の側面には複数の連通口 44bが穿設されており、仕切部材 44 内部に形成された気体通路 52を大気に連通させるようになって 、る。 In addition, a plurality of communication ports 44b are formed in the side surface of the partition member 44 so that the gas passage 52 formed in the partition member 44 communicates with the atmosphere.
このような構成により、上記噴射孔 48より液柱 Wが噴射されると、気体通路 52の気 体が液柱 Wに沿って被力卩ェ物 2へと流れる気流となり、このとき上記連通口 44bより 気体通路 52へと大気が流入するので、気体の流量不足によって、気流が乱れて液 柱 Wが拡散してしまうこともな 、。 With such a configuration, when the liquid column W is ejected from the ejection hole 48, the gas in the gas passage 52 becomes an air flow that flows along the liquid column W to the target object 2, and at this time, the communication port Since the atmosphere flows into the gas passage 52 from 44b, the air flow is disturbed and the liquid column W is diffused due to insufficient gas flow rate.
そして、通過孔 44aを通過した液柱 Wが被力卩ェ物 2に衝突しても、跳ね返った液体 は仕切部材 44の下面に当るので、気体通路 52の気流は乱れず、上記第 1の実施例 と同様、加工ヘッド 6と被加工物 2とを接近させた状態で被加工物 2の加工をすること ができる。 Even if the liquid column W that has passed through the passage hole 44a collides with the target object 2, the bounced liquid hits the lower surface of the partition member 44. Therefore, the air flow in the gas passage 52 is not disturbed, and the first Similar to the embodiment, the workpiece 2 can be machined while the machining head 6 and the workpiece 2 are brought close to each other.
図面の簡単な説明 Brief Description of Drawings
[図 1]本実施例におけるハイブリッドレーザカ卩ェ装置の配置図。 FIG. 1 is a layout view of a hybrid laser carriage device in the present embodiment.
[図 2]加工ヘッドにっ 、ての拡大断面図。 [Fig. 2] An enlarged cross-sectional view of the machining head.
[図 3]第 2の実施例における加工ヘッドの拡大断面図。 FIG. 3 is an enlarged cross-sectional view of a machining head in a second embodiment.
符号の説明 Explanation of symbols
1 ハイブリッドレーザ加工装置 2 被加工物 1 Hybrid laser processing equipment 2 Workpiece
4 レーザ発振器 5 高圧ポンプ 4 Laser oscillator 5 High pressure pump
6 加工ヘッド 42 噴射ノズル 6 Processing head 42 Injection nozzle
44 仕切部材 44a 通過孔 44 Partition member 44a Passing hole
48 噴射孔 52 気体通路 48 Injection hole 52 Gas passage
L レーザ光 P エアポケット L Laser beam P Air pocket
W 液柱
W liquid column
Claims
[1] 噴射孔を有する加工ヘッドと、当該加工ヘッドに高圧の液体を供給する液体供給 手段と、レーザ光を発振するレーザ発振器とを備え、上記液体供給手段から供給さ れた液体を噴射孔から液柱にして外部に噴射させると共に、上記液柱にレーザ光を 導光して、被加工物の加工を行うハイブリッドレーザ加工装置において、 [1] A processing head having an injection hole, a liquid supply unit that supplies a high-pressure liquid to the processing head, and a laser oscillator that oscillates laser light, and the liquid supplied from the liquid supply unit In a hybrid laser processing apparatus for processing a workpiece by guiding a laser beam to the liquid column and injecting the laser beam to the outside,
上記加工ヘッドと被加工物との間に、上記液柱の通過する通過孔を穿設した仕切 部材を設けて、上記被加工物から跳ね返った液体が加工ヘッドに到達するのを仕切 部材で防止するとともに、該加工ヘッドと仕切部材との間に気体通路を形成すること を特徴とするハイブリッドレーザ加工装置。 A partition member with a passage hole through which the liquid column passes is provided between the processing head and the workpiece, and the partition member prevents the liquid bounced off the workpiece from reaching the processing head. And a gas path is formed between the processing head and the partition member.
[2] 上記仕切部材を上記加工ヘッドの先端を覆う有底筒状の部材とし、該仕切部材側 面に大気と連通する連通口を形成したことを特徴とする請求項 1に記載のハイブリツ ドレーザ加工装置。 [2] The hybrid laser according to claim 1, wherein the partition member is a bottomed cylindrical member that covers the tip of the processing head, and a communication port that communicates with the atmosphere is formed on a side surface of the partition member. Processing equipment.
[3] 上記加工ヘッドの下端部に噴射孔よりも被加工物側に上記液柱を囲繞する壁面を 形成し、上記液柱と上記壁面とによって形成された空間をエアポケットとすることを特 徴とする請求項 1または請求項 2のいずれかに記載のハイブリッドレーザ加工装置。
[3] A wall surface surrounding the liquid column is formed at the lower end of the processing head on the workpiece side with respect to the injection hole, and a space formed by the liquid column and the wall surface is used as an air pocket. The hybrid laser processing apparatus according to claim 1 or 2, wherein
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JP2005215394A JP2007029980A (en) | 2005-07-26 | 2005-07-26 | Hybrid laser beam machining apparatus |
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