WO2006052310A2 - Nickel electroplating bath designed to replace monovalent copper strike solutions - Google Patents
Nickel electroplating bath designed to replace monovalent copper strike solutions Download PDFInfo
- Publication number
- WO2006052310A2 WO2006052310A2 PCT/US2005/028628 US2005028628W WO2006052310A2 WO 2006052310 A2 WO2006052310 A2 WO 2006052310A2 US 2005028628 W US2005028628 W US 2005028628W WO 2006052310 A2 WO2006052310 A2 WO 2006052310A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- nickel
- concentration
- zinc
- group
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 64
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 32
- 238000009713 electroplating Methods 0.000 title claims abstract description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 13
- 239000010949 copper Substances 0.000 title claims abstract description 13
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 21
- 239000011701 zinc Substances 0.000 claims abstract description 21
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 claims abstract description 14
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 claims abstract description 13
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000654 additive Substances 0.000 claims abstract description 10
- 230000000996 additive effect Effects 0.000 claims abstract description 9
- 229910001297 Zn alloy Chemical group 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 7
- 229960004889 salicylic acid Drugs 0.000 claims abstract description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 239000011651 chromium Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims abstract 5
- 238000000034 method Methods 0.000 claims description 20
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 8
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 7
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 5
- 239000004327 boric acid Substances 0.000 claims description 5
- 229910001453 nickel ion Inorganic materials 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- 150000002314 glycerols Chemical class 0.000 claims description 4
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 3
- 239000005711 Benzoic acid Substances 0.000 claims description 3
- 229910001369 Brass Inorganic materials 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 3
- 235000010233 benzoic acid Nutrition 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000010951 brass Substances 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 239000001630 malic acid Substances 0.000 claims description 3
- 235000011090 malic acid Nutrition 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 150000003628 tricarboxylic acids Chemical class 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims 4
- 125000005619 boric acid group Chemical group 0.000 claims 2
- 150000002763 monocarboxylic acids Chemical class 0.000 claims 2
- 239000004094 surface-active agent Substances 0.000 claims 2
- 229920003169 water-soluble polymer Polymers 0.000 claims 2
- 150000007513 acids Chemical class 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 24
- YHMRKVGUSQWDGZ-UHFFFAOYSA-N 1-phenylmethoxypropan-2-one Chemical compound CC(=O)COCC1=CC=CC=C1 YHMRKVGUSQWDGZ-UHFFFAOYSA-N 0.000 abstract description 3
- 150000007524 organic acids Chemical class 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 7
- -1 alkali metal salt Chemical class 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- 150000002815 nickel Chemical class 0.000 description 5
- 230000001464 adherent effect Effects 0.000 description 4
- 238000004512 die casting Methods 0.000 description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000003841 chloride salts Chemical class 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- MDIWJQAICDQIEM-UHFFFAOYSA-L nickel(2+);oxido hydrogen carbonate Chemical compound [Ni+2].OC(=O)O[O-].OC(=O)O[O-] MDIWJQAICDQIEM-UHFFFAOYSA-L 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Definitions
- This invention details a process, which can be used to electroplate a nickel deposit directly onto zinc or zinc alloy die-castings, thereby eliminating the need to use traditional cyanide based plating baths.
- Zinc parts are often produced as zinc based die-castings. It is common for these to be plated with other metals to improve cosmetic appearance and improve corrosion resistance.
- This coating generally consists of one or more of the following: copper, nickel, chromium, tin and brass. Traditionally these articles are base plated with a thin layer of monovalent copper from a copper cyanide bath. Because of the toxicity of cyanide and it's impact on the environment and hence, expense of treatment and disposal - it is desirable that an alternative plating solution be found.
- cyanide-free copper electroplating processes detailed in the literature. For example, U.S. Patent No.
- 4,521,282 to Tremmel discloses a divalent copper system which utilises organo-phosphate chelating agents.
- phosphonic acid based cupric baths have also been disclosed by Tomaszewski et al in U.S. Patent No. 4,469,569 and Martin in U.S. Patent No. 6,054,037 which also details a divalent copper bath with phosphonic acid complexants and copper acetate and halogen based salts.
- Other patents describe similar processes including U.S. Patent Nos. 4,904,354; 4,469,569; 5,266,212, 5,006,262 and 4,462,872.
- nickel baths are generally run at low pH which is an unsuitable medium for plating zinc based die-castings since the acidic nature of the electrolyte destroys the article before it can be plated, leading to blistering and poor adhesion of subsequent plated layers.
- the inventors have formulated an additive system which overcomes these difficulties. When added to the nickel salt plating bath, this additive system allows complete coverage plating over a full range of current densities.
- the additive system is applied to a near neutral pH bath which is suitable for the application of a plated nickel surface directly onto zinc and zinc alloys.
- This invention describes the use of a nickel plating bath and method which provide for plating an adherent base layer on zinc and in particular zinc based die-castings. This method comprises the following steps:
- This invention describes a method of treating zinc articles to produce an adherent base coating suitable for the plating of subsequent metallic layers.
- the process of the invention generally includes the steps of:
- the cleaning and activating step is preferred to provide a surface of the article that is suitable for plating. Defects such as lack of adhesion, porosity, roughness, dark spots and non-uniform coatings are likely to occur on poorly prepared parts.
- the surface preparation process also serves to activate the surface of the part so that it is optimally receptive to the deposition of the metal coating.
- the zinc die-cast articles are first cleaned in a standard alkaline cleaning solution.
- the articles are then activated by a short immersion dip in an acid solution. Thorough rinsing is required between cleaning stages and prior to plating on the surface of the zinc article.
- the main source of nickel in the present invention are nickel salts. Of particular interest are nickel chloride and nickel sulphate.
- concentration of nickel salt in the aqueous solution is generally between about 150 and about 300 grams per liter.
- the chloride present in the solution may come from nickel salt or alkali metal salt.
- the concentration of chloride salt in aqueous solution should be sufficient to cause effective dissolution of the nickel anodes in the bath.
- the solution contains a quantity of buffer material in the form of one or more of the following: boric acid, mono-, di- and tri-carboxylic acids such as, but not limited to, acetic acid, malic acid, succinic acid, citric acid or suitable salts thereof. These are present in the aqueous solution at a concentration of about 5 to about 70 grams per liter.
- the nickel plating solution is optimally maintained at a temperature between room temperature and about 65 degrees Celsius.
- the articles are generally immersed in the solution for a minimum time of one minute, at a current density of 1.5 to 8.0 amps per square decimeter.
- an additive system is added.
- the additive system is comprised of one or more of the following: a quantity of sulphonic acid or alkali metal salt of a sulphonic acid preferably at a level between about 0.2 and 2 grams per liter; a sulfonated alkoxylate to act as a brightener, preferably added at a level of about 0.1 to about 1.5 grams per liter; a glycerol compound preferably added at a level of about 0.4 grams to about 4 grams per liter, and a quantity of organic acid of one or more of the following: tolylacetic acid, salicylic acid, hydroxybenzoic acid and/or benzyloxyacetone, preferably added at a level of 0 to about 25 grams per liter.
- the additive system also preferably comprises an ionic surfactant.
- the sulphonic acid or sulphonic acid salt are preferably naphthalene sulphonic acids or salts thereof, such as 4-acetomido-5-hydroxy-2,7-naphthalene-disulphonic acid- disodium salt.
- the sulphonated alkoxylate is preferably selected from the group consisting of alkoxylated bis-phenols, and sulphonated alkoxylates, such as 2- ethylhexanol ethoxylated sulfopropylate.
- the glycerol or glycerol derivative is preferably selected from the group consisting of alkoxylated glycols, polyols and polyoxy alkoxylated glycols such as Macol® ETG 3590, available from the Chemax Company, and is a polyoxyethylated glycerol deriviative.
- the aromatic carboxylic acid is preferably selected from the group consisting of tolylacetic acid, salicylic acid, benzoic acid, hydroxy benzoic acid, and benzyloxyacetone.
- the articles are again rinsed.
- the resulting nickel coating is sufficiently noble and continuous as to allow subsequent plating of further metallic layers as required.
- the bath runs at a pH of between 5 and 6. This is sufficiently alkaline as to prevent the corrosion and dissolution of the zinc on contact with the invention.
- the pH is maintained using nickel hydroxy carbonate paste and sulphuric acid.
- the bath requires filtration after the addition of the nickel hydroxy carbonate paste, which also serves as a secondary nickel source in the bath.
- the nickel electroplated coating on the zinc article is carried out by standard electroplating techniques and also applicable for use in barrel plating techniques. Barrel plating is suitable for plating many small articles at one time. Parts are tumbled in a cascading motion inside a rotating vessel in the plating bath.
- the process of the present invention forms a firmly adherent and uniform coating of nickel onto zinc articles, allowing subsequent metal layers to be plated onto it.
- the bath provides full coverage of the electroplated article and hence eliminates the need to use cyanide based copper electrolytes to base cover zinc based die cast parts.
- a zinc-plated steel panel was plated in a hull cell containing 267 ml of nickel plating solution, prepared as stated.
- the panel was plated at 1 Amp for ten minutes.
- the thickness of the deposit was measured by x-ray fluorescence spectroscopy.
- Adherence was checked by heating the plated article to a temperature of 160 0 C for one hour and then plunging it into cold water at a temperature of approximately 10 0 C. Lack of adhesion was evident when blistering, cracking and peeling of the deposit was observed on contact with the cold water.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/985,134 | 2004-11-10 | ||
US10/985,134 US20060096868A1 (en) | 2004-11-10 | 2004-11-10 | Nickel electroplating bath designed to replace monovalent copper strike solutions |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006052310A2 true WO2006052310A2 (en) | 2006-05-18 |
WO2006052310A3 WO2006052310A3 (en) | 2006-12-21 |
Family
ID=36315195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/028628 WO2006052310A2 (en) | 2004-11-10 | 2005-08-10 | Nickel electroplating bath designed to replace monovalent copper strike solutions |
Country Status (2)
Country | Link |
---|---|
US (1) | US20060096868A1 (en) |
WO (1) | WO2006052310A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2342370A4 (en) * | 2008-10-02 | 2014-09-10 | Macdermid Inc | Novel cyanide-free electroplating process for zinc and zinc alloy die-cast components |
EP2683853B1 (en) | 2011-03-09 | 2017-10-11 | MacDermid Acumen, Inc. | Semi-bright nickel plating bath and method of using same |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2143828B1 (en) * | 2008-07-08 | 2016-12-28 | Enthone, Inc. | Electrolyte and method for the deposition of a matt metal layer |
KR101058635B1 (en) * | 2008-12-23 | 2011-08-22 | 와이엠티 주식회사 | Electroless Nickel Plating Solution Composition, Flexible Printed Circuit Board and Manufacturing Method Thereof |
DE102012216011A1 (en) * | 2012-09-10 | 2014-03-13 | Dr. Hesse GmbH & Cie. KG | Boric acid-free zinc-nickel electrolyte |
CN102965697B (en) * | 2012-12-18 | 2015-06-24 | 南通广联实业有限公司 | Electroplating process for flexible nickel |
JP6024714B2 (en) | 2013-10-03 | 2016-11-16 | トヨタ自動車株式会社 | Nickel solution for film formation and film forming method using the same |
DE102013113129A1 (en) * | 2013-11-27 | 2015-05-28 | RIAG Oberflächentechnik AG | Process for the galvanic deposition of nickel and corresponding electrolyte |
DE102014118614A1 (en) * | 2014-12-15 | 2016-06-16 | Harting Kgaa | Boric acid-free nickel bath |
PT3642396T (en) * | 2017-06-23 | 2021-09-10 | Atotech Deutschland Gmbh | Nickel electroplating bath for depositing a decorative nickel coating on a substrate |
TWI658174B (en) * | 2017-09-22 | 2019-05-01 | 明志科技大學 | Electroplating equipment |
KR102589924B1 (en) * | 2018-08-16 | 2023-10-17 | 현대자동차주식회사 | Method of manufacturing electrocatalyst through one step electrodeposition and manufactured electrocatalyst therefrom |
CN112522685A (en) * | 2020-12-03 | 2021-03-19 | 江苏思瑞奕精密科技有限公司 | Zinc alloy surface treatment method |
CN113073364A (en) * | 2021-03-26 | 2021-07-06 | 深圳市崇辉表面技术开发有限公司 | Electroplating solution for LED bracket and preparation method thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2100971B2 (en) * | 1971-01-11 | 1975-04-17 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Process and bath for the production of micro-cracked chrome layers over intermediate layers |
AU561654B2 (en) * | 1981-08-21 | 1987-05-14 | Rosemount Analytical Inc | Solid electrolyte gas sensor |
US4469569A (en) * | 1983-01-03 | 1984-09-04 | Omi International Corporation | Cyanide-free copper plating process |
US4521282A (en) * | 1984-07-11 | 1985-06-04 | Omi International Corporation | Cyanide-free copper electrolyte and process |
US4904354A (en) * | 1987-04-08 | 1990-02-27 | Learonal Inc. | Akaline cyanide-free Cu-Zu strike baths and electrodepositing processes for the use thereof |
US5006262A (en) * | 1989-11-21 | 1991-04-09 | Met. Rev. Inc. | Process for recovering copper from copper ion containing aqueous solutions |
US5266212A (en) * | 1992-10-13 | 1993-11-30 | Enthone-Omi, Inc. | Purification of cyanide-free copper plating baths |
US6054037A (en) * | 1998-11-11 | 2000-04-25 | Enthone-Omi, Inc. | Halogen additives for alkaline copper use for plating zinc die castings |
DE10222962A1 (en) * | 2002-05-23 | 2003-12-11 | Atotech Deutschland Gmbh | Acidic galvanic bath electrolyte and process for the electrolytic deposition of satin-shining nickel deposits |
-
2004
- 2004-11-10 US US10/985,134 patent/US20060096868A1/en not_active Abandoned
-
2005
- 2005-08-10 WO PCT/US2005/028628 patent/WO2006052310A2/en active Application Filing
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2342370A4 (en) * | 2008-10-02 | 2014-09-10 | Macdermid Inc | Novel cyanide-free electroplating process for zinc and zinc alloy die-cast components |
EP2683853B1 (en) | 2011-03-09 | 2017-10-11 | MacDermid Acumen, Inc. | Semi-bright nickel plating bath and method of using same |
Also Published As
Publication number | Publication date |
---|---|
US20060096868A1 (en) | 2006-05-11 |
WO2006052310A3 (en) | 2006-12-21 |
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