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WO2006037494A3 - Vorrichtung zur temperierung von elementen - Google Patents

Vorrichtung zur temperierung von elementen Download PDF

Info

Publication number
WO2006037494A3
WO2006037494A3 PCT/EP2005/010351 EP2005010351W WO2006037494A3 WO 2006037494 A3 WO2006037494 A3 WO 2006037494A3 EP 2005010351 W EP2005010351 W EP 2005010351W WO 2006037494 A3 WO2006037494 A3 WO 2006037494A3
Authority
WO
WIPO (PCT)
Prior art keywords
temperature
adjusting
elements
projection lens
jacket
Prior art date
Application number
PCT/EP2005/010351
Other languages
English (en)
French (fr)
Other versions
WO2006037494A2 (de
Inventor
Tilman Schwertner
Ulrich Bingel
Klaus Zimmer
Original Assignee
Zeiss Carl Smt Ag
Tilman Schwertner
Ulrich Bingel
Klaus Zimmer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Tilman Schwertner, Ulrich Bingel, Klaus Zimmer filed Critical Zeiss Carl Smt Ag
Priority to US11/576,349 priority Critical patent/US20070252959A1/en
Publication of WO2006037494A2 publication Critical patent/WO2006037494A2/de
Publication of WO2006037494A3 publication Critical patent/WO2006037494A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)

Abstract

Eine Vorrichtung zur Temperierung von Elementen, insbesondere zur Temperierung eines Projektionsobjektives (1) oder von Teilen eines Projektionsobjektives (1) in der Halbleiterlithographie, weist einen Temperiermantel (18), der mit wenigstens einer Tem­ perierleitung (19) versehen ist, auf. Die wenigstens eine Tempe­rierleitung (19) ist in den Temperiermantel (18) eingeformt.
PCT/EP2005/010351 2004-09-30 2005-09-24 Vorrichtung zur temperierung von elementen WO2006037494A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/576,349 US20070252959A1 (en) 2004-09-30 2005-09-24 Device for Controlling the Temperature of Elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004047533.4 2004-09-30
DE102004047533A DE102004047533A1 (de) 2004-09-30 2004-09-30 Vorrichtung zur Temperierung von Elementen

Publications (2)

Publication Number Publication Date
WO2006037494A2 WO2006037494A2 (de) 2006-04-13
WO2006037494A3 true WO2006037494A3 (de) 2006-07-20

Family

ID=35207652

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/010351 WO2006037494A2 (de) 2004-09-30 2005-09-24 Vorrichtung zur temperierung von elementen

Country Status (3)

Country Link
US (1) US20070252959A1 (de)
DE (1) DE102004047533A1 (de)
WO (1) WO2006037494A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009045223A1 (de) * 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Optische Anordnung in einer Projektionsbelichtungsanlage für die EUV-Lithographie
KR102678312B1 (ko) 2018-10-18 2024-06-25 삼성전자주식회사 Euv 노광 장치와 노광 방법, 및 그 노광 방법을 포함한 반도체 소자 제조 방법
DE102022203593A1 (de) 2022-04-08 2023-10-12 Carl Zeiss Smt Gmbh Optisches Element und EUV-Lithographiesystem
CN116859683B (zh) * 2023-08-31 2023-11-28 光科芯图(北京)科技有限公司 显微镜物镜热稳定性的控制装置及方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939046A (en) * 1975-04-29 1976-02-17 Westinghouse Electric Corporation Method of electroforming on a metal substrate
GB1490641A (en) * 1974-04-19 1977-11-02 Messerschmitt Boelkow Blohm Heat exchangers for use under conditions of high thermal and mechanical loading
JPH033316A (ja) * 1989-05-31 1991-01-09 Nec Kyushu Ltd 縮小投影型露光装置
JPH06308294A (ja) * 1993-04-28 1994-11-04 Kyocera Corp Ｘ線反射用ミラー
US5812242A (en) * 1995-10-03 1998-09-22 Nikon Corporation Projection exposure apparatus including a temperature control system for the lens elements of the optical system
JP2002005586A (ja) * 2000-06-23 2002-01-09 Canon Inc 物体温度調節用熱交換装置、該熱交換装置を使用して製造した投影レンズ及び該熱交換装置を使用した光学系を具備する装置
US20020074115A1 (en) * 2000-10-11 2002-06-20 Thomas Dieker Temperature compensation apparatus for thermally loaded bodies of low thermal conductivity
JP2004095993A (ja) * 2002-09-03 2004-03-25 Nikon Corp 光学部品冷却方法、光学部品冷却装置及びそれを有するｅｕｖ露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2418841C3 (de) * 1974-04-19 1979-04-26 Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen Wärmetauscher, insbesondere regenerativ gekühlte Brennkammern für Flüssigkeitsraketentriebwerke und Verfahren zu ihrer Herstellung
US5716510A (en) * 1995-10-04 1998-02-10 Sms Schloemann-Siemag Inc. Method of making a continuous casting mold
JPH1131647A (ja) * 1997-07-11 1999-02-02 Oki Electric Ind Co Ltd 投影露光装置
WO1999012194A1 (fr) * 1997-08-29 1999-03-11 Nikon Corporation Procede de reglage de la temperature et graveur a projection auquel il est applique

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1490641A (en) * 1974-04-19 1977-11-02 Messerschmitt Boelkow Blohm Heat exchangers for use under conditions of high thermal and mechanical loading
US3939046A (en) * 1975-04-29 1976-02-17 Westinghouse Electric Corporation Method of electroforming on a metal substrate
JPH033316A (ja) * 1989-05-31 1991-01-09 Nec Kyushu Ltd 縮小投影型露光装置
JPH06308294A (ja) * 1993-04-28 1994-11-04 Kyocera Corp Ｘ線反射用ミラー
US5812242A (en) * 1995-10-03 1998-09-22 Nikon Corporation Projection exposure apparatus including a temperature control system for the lens elements of the optical system
JP2002005586A (ja) * 2000-06-23 2002-01-09 Canon Inc 物体温度調節用熱交換装置、該熱交換装置を使用して製造した投影レンズ及び該熱交換装置を使用した光学系を具備する装置
US20020074115A1 (en) * 2000-10-11 2002-06-20 Thomas Dieker Temperature compensation apparatus for thermally loaded bodies of low thermal conductivity
JP2004095993A (ja) * 2002-09-03 2004-03-25 Nikon Corp 光学部品冷却方法、光学部品冷却装置及びそれを有するｅｕｖ露光装置

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 110 (E - 1046) 15 March 1991 (1991-03-15) *
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 02 31 March 1995 (1995-03-31) *
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 05 3 May 2002 (2002-05-03) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *

Also Published As

Publication number Publication date
WO2006037494A2 (de) 2006-04-13
DE102004047533A1 (de) 2006-04-06
US20070252959A1 (en) 2007-11-01

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