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WO2005021833A3 - Apparatus for the coating and/or conditioning of substrates - Google Patents

Apparatus for the coating and/or conditioning of substrates Download PDF

Info

Publication number
WO2005021833A3
WO2005021833A3 PCT/GB2004/003657 GB2004003657W WO2005021833A3 WO 2005021833 A3 WO2005021833 A3 WO 2005021833A3 GB 2004003657 W GB2004003657 W GB 2004003657W WO 2005021833 A3 WO2005021833 A3 WO 2005021833A3
Authority
WO
WIPO (PCT)
Prior art keywords
coating
substrate
substrates
plasma
coating material
Prior art date
Application number
PCT/GB2004/003657
Other languages
French (fr)
Other versions
WO2005021833A2 (en
Inventor
Luke Ward
Jas Pal Badyal
Original Assignee
Surface Innovations Ltd
Luke Ward
Jas Pal Badyal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0320098A external-priority patent/GB0320098D0/en
Priority claimed from GB0322068A external-priority patent/GB0322068D0/en
Application filed by Surface Innovations Ltd, Luke Ward, Jas Pal Badyal filed Critical Surface Innovations Ltd
Priority to GB0601542A priority Critical patent/GB2419358B/en
Publication of WO2005021833A2 publication Critical patent/WO2005021833A2/en
Publication of WO2005021833A3 publication Critical patent/WO2005021833A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06B—TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS
    • D06B19/00—Treatment of textile materials by liquids, gases or vapours, not provided for in groups D06B1/00 - D06B17/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2201/00—Polymeric substrate or laminate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
    • B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Textile Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention relates to apparatus and a method for the deposition and/or conditioning of coatings which are applied to substrates or a substrate which pass through the apparatus. The apparatus includes at least one coating material deposition means and a means for movement of the substrate to expose at least a portion of said substrate to the coating material in the coating chamber. Plasma generating means are provided and the said portion of substrate and coating material are exposed to the plasma. The coating material deposition means are provided to apply the said material in an atomised form into the coating chamber in which the plasma is generated and the deposited material is exposed to the plasma prior to and/or once applied to the said portion of the substrate. This allows the improved application of coating materials onto the substrates.
PCT/GB2004/003657 2003-08-28 2004-08-26 Apparatus for the coating and/or conditioning of substrates WO2005021833A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0601542A GB2419358B (en) 2003-08-28 2004-08-26 Apparatus for the coating and/or conditioning of substrates

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB0320098.7 2003-08-28
GB0320098A GB0320098D0 (en) 2003-08-28 2003-08-28 Apparatus for the coating and/or conditioning of substrates
GB0322068A GB0322068D0 (en) 2003-09-20 2003-09-20 Apparatus for the application of coating material
GB0322068.8 2003-09-20

Publications (2)

Publication Number Publication Date
WO2005021833A2 WO2005021833A2 (en) 2005-03-10
WO2005021833A3 true WO2005021833A3 (en) 2005-07-07

Family

ID=34276807

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2004/003657 WO2005021833A2 (en) 2003-08-28 2004-08-26 Apparatus for the coating and/or conditioning of substrates

Country Status (2)

Country Link
GB (1) GB2419358B (en)
WO (1) WO2005021833A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0504384D0 (en) 2005-03-03 2005-04-06 Univ Durham Method for producing a composite coating
US20080274298A1 (en) 2005-12-23 2008-11-06 Francesco Parisi Plant for the Plasma Surface Treatment of an Alveolar Sheet of Plastic Material
ITMI20070350A1 (en) 2007-02-23 2008-08-24 Univ Milano Bicocca ATMOSPHERIC PLASMA WASHING METHOD FOR THE TREATMENT OF MATERIALS
EP2168691B1 (en) * 2008-09-26 2011-08-17 Camvac Limited Radiation cured coatings
GB201316113D0 (en) * 2013-09-10 2013-10-23 Europlasma Nv Apparatus and method for applying surface coatings
CN104822859B (en) * 2012-10-09 2019-03-12 欧洲等离子公司 Device and method for applying surface covering
GB201403558D0 (en) * 2014-02-28 2014-04-16 P2I Ltd Coating
US10421876B2 (en) 2015-06-09 2019-09-24 P2I Ltd Coatings
CN114808305B (en) * 2022-05-17 2024-05-17 北京奥润联创微电子科技开发有限公司 Ultrasonic atomizing coating head

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08212545A (en) * 1995-02-08 1996-08-20 Kao Corp Method and apparatus for forming protective layer and lubricating layer of magnetic recording medium
JPH10130851A (en) * 1996-10-25 1998-05-19 Sekisui Chem Co Ltd Continuous treatment of sheet-like substrate and its apparatus
US20010019747A1 (en) * 1997-09-29 2001-09-06 Affinito John D. Plasma enhanced chemical deposition with low vapor pressure compounds
WO2002028548A2 (en) * 2000-10-04 2002-04-11 Dow Corning Ireland Limited Method and apparatus for forming a coating

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08212545A (en) * 1995-02-08 1996-08-20 Kao Corp Method and apparatus for forming protective layer and lubricating layer of magnetic recording medium
JPH10130851A (en) * 1996-10-25 1998-05-19 Sekisui Chem Co Ltd Continuous treatment of sheet-like substrate and its apparatus
US20010019747A1 (en) * 1997-09-29 2001-09-06 Affinito John D. Plasma enhanced chemical deposition with low vapor pressure compounds
WO2002028548A2 (en) * 2000-10-04 2002-04-11 Dow Corning Ireland Limited Method and apparatus for forming a coating

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 12 26 December 1996 (1996-12-26) *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 10 31 August 1998 (1998-08-31) *

Also Published As

Publication number Publication date
GB2419358A (en) 2006-04-26
GB2419358B (en) 2008-01-16
WO2005021833A2 (en) 2005-03-10
GB0601542D0 (en) 2006-03-08

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