WO2003104182A1 - 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same - Google Patents
2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same Download PDFInfo
- Publication number
- WO2003104182A1 WO2003104182A1 PCT/KR2003/001151 KR0301151W WO03104182A1 WO 2003104182 A1 WO2003104182 A1 WO 2003104182A1 KR 0301151 W KR0301151 W KR 0301151W WO 03104182 A1 WO03104182 A1 WO 03104182A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alkoxyalkyl
- adamantyl
- meth
- acrylate
- adamantanol
- Prior art date
Links
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims abstract description 13
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000007818 Grignard reagent Substances 0.000 claims description 7
- UQQFHQTYYIAZFM-UHFFFAOYSA-N 2-(4-methoxybutyl)adamantan-2-ol Chemical compound C1C(C2)CC3CC1C(CCCCOC)(O)C2C3 UQQFHQTYYIAZFM-UHFFFAOYSA-N 0.000 claims description 5
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- IYKFYARMMIESOX-UHFFFAOYSA-N adamantanone Chemical compound C1C(C2)CC3CC1C(=O)C2C3 IYKFYARMMIESOX-UHFFFAOYSA-N 0.000 claims description 4
- 239000003153 chemical reaction reagent Substances 0.000 claims description 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229910052794 bromium Chemical group 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 150000004795 grignard reagents Chemical class 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 9
- -1 alkoxyalkyl halide Chemical class 0.000 description 7
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 5
- DFLRARJQZRCCKN-UHFFFAOYSA-N 1-chloro-4-methoxybutane Chemical compound COCCCCCl DFLRARJQZRCCKN-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical class C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- PCPVRAXPPQOZFH-UHFFFAOYSA-N [2-(4-methoxybutyl)-2-adamantyl] prop-2-enoate Chemical compound C1C(C2)CC3CC1C(CCCCOC)(OC(=O)C=C)C2C3 PCPVRAXPPQOZFH-UHFFFAOYSA-N 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- KERSTKMRGUUNIJ-UHFFFAOYSA-M magnesium;1-methoxybutane;chloride Chemical compound [Mg+2].[Cl-].COCCC[CH2-] KERSTKMRGUUNIJ-UHFFFAOYSA-M 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- KZYUVRCUOITXBM-UHFFFAOYSA-N [2-(4-methoxybutyl)-2-adamantyl] 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC1C(CCCCOC)(OC(=O)C(C)=C)C2C3 KZYUVRCUOITXBM-UHFFFAOYSA-N 0.000 description 2
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 229940086542 triethylamine Drugs 0.000 description 2
- KOVAQMSVARJMPH-UHFFFAOYSA-N 4-methoxybutan-1-ol Chemical compound COCCCCO KOVAQMSVARJMPH-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 1
- YNZTXTGFUQRXMU-UHFFFAOYSA-N [2-(1-adamantylamino)-2-oxo-1-phenylethyl] propanoate Chemical compound C1C(C2)CC(C3)CC2CC13NC(=O)C(OC(=O)CC)C1=CC=CC=C1 YNZTXTGFUQRXMU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- IYKFYARMMIESOX-SPJNRGJMSA-N adamantanone Chemical compound C([C@H](C1)C2)[C@H]3C[C@@H]1C(=O)[C@@H]2C3 IYKFYARMMIESOX-SPJNRGJMSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000002246 antineoplastic agent Substances 0.000 description 1
- 230000006907 apoptotic process Effects 0.000 description 1
- SPWVRYZQLGQKGK-UHFFFAOYSA-N dichloromethane;hexane Chemical compound ClCCl.CCCCCC SPWVRYZQLGQKGK-UHFFFAOYSA-N 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 229940052761 dopaminergic adamantane derivative Drugs 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000008194 pharmaceutical composition Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/14—Preparation of carboxylic acid esters from carboxylic acid halides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
- C07C2603/74—Adamantanes
Definitions
- the present invention relates to a novel adamantane derivative, 2- alkoxyalkyl-2-adamantyl (meth)acrylate, and a method for preparing same.
- Adamantane derivatives having a vinyl substituent have been used in the production of photocurable resins having excellent optical and mechanical properties suitable for applications in such fields as adhesive, printing ink, photosensitive resin, and optical fiber coat.
- Japanese Laid-open Patent Publication No. Hei9-73173 discloses 2-adamantyl (meth)acrylate useful for the production of chemical amplification resist; and European Laid-open Patent Publication No. 1 000 924 Al, an acid-sensitive polymer having adamantyl moieties which has sufficiently high etching resistance for providing a finer line pattern.
- Adamantyl derivatives have also been used as drug intermediates.
- 6,127,415 discloses apoptosis-inducing adamantyl derivatives and their usage as antitumor agents; and Korean Laid-open Patent Publication No. 1997-42511, a pharmaceutical composition comprising an adamantyl derivative which is active against dermatological diseases.
- adamantane derivative which is useful as a monomer for the production of a photocurable resin or as a drug intermediate. It is another object of the present invention to provide a method for preparing the adamantine derivative.
- FIG. 1 an FT-IR spectrum of 2-(4-methoxybutyl)-2-adamantanol produced in Example 1 of the present invention
- FIG. 2 an NMR spectrum of 2-(4-methoxybutyl)-2-adamantyl acrylate produced in Example 1 of the present invention.
- FIG. 3 an NMR spectrum of 2-(4-methoxybutyl)-2-adamantyl methacrylate produced in Example 2 of the present invention.
- 2-alkoxyalkyl-2-adamantyl (meth)acrylate represented by the following formula I:
- R 1 9 wherein, is hydrogen, C w alkyl or C 3 . 8 cycloalkyl; R is hydrogen or methyl; and n is an integer.
- R 1 is methyl and n is an integer in the range of 1 to 4.
- the inventive 2-adamantyl (meth)acrylate is useful as a resist material suitable for short-wave exposure source (ArF excimer laser) since it is an acid- sensitive compound containing an alkali-soluble group protected with an alicyclic hydrocarbon group.
- a method of preparing the compound of formula I comprising: a) reacting 2-adamantanone with a Grignard reagent of formula R 1 0(CH 2 ) n MgX to obtain a 2-alkoxyalkyl-2-adamantanol, the alkoxyalkyl being R 1 0(CH 2 ) n -; and b) reacting the 2-alkoxyalkyl-2-adamantanol with (meth)acryloyl chloride to obtain 2-alkoxyalkyl-2-adamantyl (meth)acrylate, wherein X is chlorine or bromine.
- step b) is performed in the presence of a basic reagent.
- the method of preparing the compound may further comprise a step of reacting alkoxyalkyl halide with magnesium to obtain alkoxyalkyl Grignard reagent before step a).
- a separation process may be performed after each step is completed.
- the separation process may be performed after all steps are performed in situ. Accordingly, synthesized Grignard reagent may be employed in step a) without further separation.
- an alkoxyalkyl halide is reacted with magnesium to synthesize an alkoxyalkyl magnesium halide (an alkoxyalkyl reagent):
- O' XT X (1)
- R 1 is hydrogen, C ⁇ alkyl or C 3 . 8 cycloalkyl; X is Cl or Br; and n is an integer.
- reaction scheme (2) adamantanone and the alkoxyalkyl Grignard reagent are reacted, to synthesize a 2-alkoxyalkyl-2-adamantanol:
- R 1 and n are the same as defined above.
- R 1 , R 2 and n are the same as defined above.
- the alkoxyalkyl Grignard reagent is employed preferably in an amount ranging from 1.2 to 2.0 equivalents based on the amount of 2-adamantanone, and (meth)acryloyl chloride is employed preferably in an amount ranging from 1.2 to 2.0 mole per mole of 2-alkoxyalkyl-2-adamantanol.
- the basic reagent that may be used in the present invention is a tertiary amine such as triethyl amine or pyridine and is employed in an amount ranging from 1.4 to 2.2 mole per mole of 2-alkoxyalkyl-2-adamantanol.
- the reaction for synthesizing 2-alkoxyalkyl-2-adamantanol is performed at a temperature ranging from -20 to 0°C, for a period ranging from 2 to 3 hours; and the reaction for synthesizing 2-alkoxyal-kyl-2-adamantyl (meth)acrylate, at a temperature ranging from -20 to 0 °C , for a period ranging from 2 to 15 hours.
- the present invention is described in more detail below by referring to the following Examples, and the Examples are given for the purpose of illustration only, and are not intended to limit the scope of the invention.
- 2-Alkoxyalkyl-2-adamantyl (meth)acrylate according to the present invention can be used for various applications e.g. as a monomer of a photocurable resin, a drug intermediate and the like. Also, the inventive method for preparing 2-alkoxyalkyl-2-adamantyl (meth)acrylate is simple, a high yield process suitable for commercial-scale production.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003232680A AU2003232680A1 (en) | 2002-06-11 | 2003-06-11 | 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0032554 | 2002-06-11 | ||
KR1020020032554A KR20030095046A (en) | 2002-06-11 | 2002-06-11 | 2-alkoxy alkyl-2-adamantyl(metha)acrylate and producing method therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003104182A1 true WO2003104182A1 (en) | 2003-12-18 |
Family
ID=29728626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2003/001151 WO2003104182A1 (en) | 2002-06-11 | 2003-06-11 | 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20030095046A (en) |
AU (1) | AU2003232680A1 (en) |
WO (1) | WO2003104182A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006002691A1 (en) * | 2004-07-07 | 2006-01-12 | Lundbeck Pharmaceuticals Italy S.P.A. | Process for the synthesis and purification of (4-methoxybutyl) (4-trifluoromethylphenyl)methanone |
JP2006063061A (en) * | 2004-03-10 | 2006-03-09 | Idemitsu Kosan Co Ltd | Adamantane derivative and method for producing the same |
EP1876209A1 (en) * | 2006-07-03 | 2008-01-09 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
EP1712542A4 (en) * | 2004-02-05 | 2008-01-16 | Idemitsu Kosan Co | ADAMANTAN DERIVATIVES AND METHOD FOR THE PRODUCTION THEREOF |
US8128746B2 (en) | 2006-09-14 | 2012-03-06 | Fujifilm Corporation | Ink composition, ink jet recording method, method for producing planographic printing plate, and planographic printing plate |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111056945A (en) * | 2019-12-25 | 2020-04-24 | 上海博栋化学科技有限公司 | Photoresist resin monomer synthesized from spiro [5.5] undecane-3, 9-dione and synthesis method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6013416A (en) * | 1995-06-28 | 2000-01-11 | Fujitsu Limited | Chemically amplified resist compositions and process for the formation of resist patterns |
EP1020767A1 (en) * | 1999-01-18 | 2000-07-19 | Sumitomo Chemical Company, Limited | Chemical amplification type positive resist composition |
US6222061B1 (en) * | 2000-02-19 | 2001-04-24 | Chem Search Corp. | 2-alkyl-2-adamantyl 5-norbornene-2-carboxylates and method of producing the same |
KR20010081855A (en) * | 2000-02-19 | 2001-08-29 | 김동석 | Producing method for 2-alkyl-2-adamantyl (meth)acrylates |
EP1127870A1 (en) * | 2000-02-26 | 2001-08-29 | Shipley Company LLC | Novel monomers, polymers, methods of synthesis thereof and photoresist compositions |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000229911A (en) * | 1999-02-05 | 2000-08-22 | Mitsubishi Rayon Co Ltd | Method for producing 2-alkyl-2-adamantyl (meth) acrylates |
-
2002
- 2002-06-11 KR KR1020020032554A patent/KR20030095046A/en not_active Ceased
-
2003
- 2003-06-11 AU AU2003232680A patent/AU2003232680A1/en not_active Abandoned
- 2003-06-11 WO PCT/KR2003/001151 patent/WO2003104182A1/en not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6013416A (en) * | 1995-06-28 | 2000-01-11 | Fujitsu Limited | Chemically amplified resist compositions and process for the formation of resist patterns |
EP1020767A1 (en) * | 1999-01-18 | 2000-07-19 | Sumitomo Chemical Company, Limited | Chemical amplification type positive resist composition |
US6222061B1 (en) * | 2000-02-19 | 2001-04-24 | Chem Search Corp. | 2-alkyl-2-adamantyl 5-norbornene-2-carboxylates and method of producing the same |
KR20010081855A (en) * | 2000-02-19 | 2001-08-29 | 김동석 | Producing method for 2-alkyl-2-adamantyl (meth)acrylates |
EP1127870A1 (en) * | 2000-02-26 | 2001-08-29 | Shipley Company LLC | Novel monomers, polymers, methods of synthesis thereof and photoresist compositions |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1712542A4 (en) * | 2004-02-05 | 2008-01-16 | Idemitsu Kosan Co | ADAMANTAN DERIVATIVES AND METHOD FOR THE PRODUCTION THEREOF |
US7528279B2 (en) | 2004-02-05 | 2009-05-05 | Idemitsu Kosan Co., Ltd. | Adamantane derivatives and process for producing the same |
JP2006063061A (en) * | 2004-03-10 | 2006-03-09 | Idemitsu Kosan Co Ltd | Adamantane derivative and method for producing the same |
WO2006002691A1 (en) * | 2004-07-07 | 2006-01-12 | Lundbeck Pharmaceuticals Italy S.P.A. | Process for the synthesis and purification of (4-methoxybutyl) (4-trifluoromethylphenyl)methanone |
EP1876209A1 (en) * | 2006-07-03 | 2008-01-09 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
EP1975213A1 (en) * | 2006-07-03 | 2008-10-01 | FUJIFILM Corporation | Ink composition, injet recording method, printed material, and process for producing lithographic printing plate |
US7553605B2 (en) | 2006-07-03 | 2009-06-30 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
US8128746B2 (en) | 2006-09-14 | 2012-03-06 | Fujifilm Corporation | Ink composition, ink jet recording method, method for producing planographic printing plate, and planographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
KR20030095046A (en) | 2003-12-18 |
AU2003232680A1 (en) | 2003-12-22 |
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