WO2000046423A1 - Cleaner composition and method of use thereof - Google Patents
Cleaner composition and method of use thereof Download PDFInfo
- Publication number
- WO2000046423A1 WO2000046423A1 PCT/US2000/000513 US0000513W WO0046423A1 WO 2000046423 A1 WO2000046423 A1 WO 2000046423A1 US 0000513 W US0000513 W US 0000513W WO 0046423 A1 WO0046423 A1 WO 0046423A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mercaptan
- ethoxylated
- oxidized
- composition
- ethoxylated mercaptan
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims abstract description 91
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical class SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims abstract description 162
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000000243 solution Substances 0.000 claims description 44
- 238000004140 cleaning Methods 0.000 claims description 38
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 27
- 230000007797 corrosion Effects 0.000 claims description 24
- 238000005260 corrosion Methods 0.000 claims description 24
- -1 ethylcyclohexyl Chemical group 0.000 claims description 15
- 239000003112 inhibitor Substances 0.000 claims description 15
- 238000007046 ethoxylation reaction Methods 0.000 claims description 13
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 claims description 11
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- 239000003638 chemical reducing agent Substances 0.000 claims description 10
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 10
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 claims description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 239000007864 aqueous solution Substances 0.000 claims description 8
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 claims description 8
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 claims description 8
- KJRCEJOSASVSRA-UHFFFAOYSA-N propane-2-thiol Chemical compound CC(C)S KJRCEJOSASVSRA-UHFFFAOYSA-N 0.000 claims description 8
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 claims description 8
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 7
- FRQQKWGDKVGLFI-UHFFFAOYSA-N 2-methylundecane-2-thiol Chemical class CCCCCCCCCC(C)(C)S FRQQKWGDKVGLFI-UHFFFAOYSA-N 0.000 claims description 6
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 6
- MPBLPZLNKKGCGP-UHFFFAOYSA-N 2-methyloctane-2-thiol Chemical compound CCCCCCC(C)(C)S MPBLPZLNKKGCGP-UHFFFAOYSA-N 0.000 claims description 5
- ZMRFRBHYXOQLDK-UHFFFAOYSA-N 2-phenylethanethiol Chemical class SCCC1=CC=CC=C1 ZMRFRBHYXOQLDK-UHFFFAOYSA-N 0.000 claims description 5
- VYMPLPIFKRHAAC-UHFFFAOYSA-N 1,2-ethanedithiol Chemical compound SCCS VYMPLPIFKRHAAC-UHFFFAOYSA-N 0.000 claims description 4
- NUTVORGGYDQIDD-UHFFFAOYSA-N 1-ethylsulfanylethanol Chemical compound CCSC(C)O NUTVORGGYDQIDD-UHFFFAOYSA-N 0.000 claims description 4
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 claims description 4
- SUODCTNNAKSRHB-UHFFFAOYSA-N 2-ethylhexyl 3-sulfanylpropanoate Chemical compound CCCCC(CC)COC(=O)CCS SUODCTNNAKSRHB-UHFFFAOYSA-N 0.000 claims description 4
- SUNXFMPZAFGPFW-UHFFFAOYSA-N 2-methyl-5-(1-sulfanylpropan-2-yl)cyclohexane-1-thiol Chemical compound SCC(C)C1CCC(C)C(S)C1 SUNXFMPZAFGPFW-UHFFFAOYSA-N 0.000 claims description 4
- SHLSSLVZXJBVHE-UHFFFAOYSA-N 3-sulfanylpropan-1-ol Chemical compound OCCCS SHLSSLVZXJBVHE-UHFFFAOYSA-N 0.000 claims description 4
- CIWBSHSKHKDKBQ-DUZGATOHSA-N D-araboascorbic acid Natural products OC[C@@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-DUZGATOHSA-N 0.000 claims description 4
- 229920001174 Diethylhydroxylamine Polymers 0.000 claims description 4
- 239000002211 L-ascorbic acid Substances 0.000 claims description 4
- 235000000069 L-ascorbic acid Nutrition 0.000 claims description 4
- 229920006318 anionic polymer Polymers 0.000 claims description 4
- 229960005070 ascorbic acid Drugs 0.000 claims description 4
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical compound SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 claims description 4
- LOCHFZBWPCLPAN-UHFFFAOYSA-N butane-2-thiol Chemical compound CCC(C)S LOCHFZBWPCLPAN-UHFFFAOYSA-N 0.000 claims description 4
- XEVRDFDBXJMZFG-UHFFFAOYSA-N carbonyl dihydrazine Chemical compound NNC(=O)NN XEVRDFDBXJMZFG-UHFFFAOYSA-N 0.000 claims description 4
- CMKBCTPCXZNQKX-UHFFFAOYSA-N cyclohexanethiol Chemical compound SC1CCCCC1 CMKBCTPCXZNQKX-UHFFFAOYSA-N 0.000 claims description 4
- VTXVGVNLYGSIAR-UHFFFAOYSA-N decane-1-thiol Chemical compound CCCCCCCCCCS VTXVGVNLYGSIAR-UHFFFAOYSA-N 0.000 claims description 4
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 claims description 4
- 239000004318 erythorbic acid Substances 0.000 claims description 4
- 235000010350 erythorbic acid Nutrition 0.000 claims description 4
- 239000003752 hydrotrope Substances 0.000 claims description 4
- 229940026239 isoascorbic acid Drugs 0.000 claims description 4
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 claims description 4
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 claims description 4
- 235000010265 sodium sulphite Nutrition 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 4
- WMXCDAVJEZZYLT-UHFFFAOYSA-N tert-butylthiol Chemical compound CC(C)(C)S WMXCDAVJEZZYLT-UHFFFAOYSA-N 0.000 claims description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 19
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 13
- 229910052742 iron Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 238000004090 dissolution Methods 0.000 description 6
- 230000002401 inhibitory effect Effects 0.000 description 6
- 230000005764 inhibitory process Effects 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 4
- 230000000670 limiting effect Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 150000003462 sulfoxides Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- BDDLHHRCDSJVKV-UHFFFAOYSA-N 7028-40-2 Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O BDDLHHRCDSJVKV-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- KFFQABQEJATQAT-UHFFFAOYSA-N N,N'-dibutylthiourea Chemical compound CCCCNC(=S)NCCCC KFFQABQEJATQAT-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical class N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical group OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical class 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- KYQODXQIAJFKPH-UHFFFAOYSA-N diazanium;2-[2-[bis(carboxymethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [NH4+].[NH4+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O KYQODXQIAJFKPH-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 229960002449 glycine Drugs 0.000 description 1
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical group [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Chemical group 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229940048842 sodium xylenesulfonate Drugs 0.000 description 1
- QUCDWLYKDRVKMI-UHFFFAOYSA-M sodium;3,4-dimethylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1C QUCDWLYKDRVKMI-UHFFFAOYSA-M 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 231100000606 suspected carcinogen Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/19—Iron or steel
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
- G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
- G21F9/004—Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces
Definitions
- the present invention relates to cleaner compositions useful for removing scale from metal surfaces.
- the present invention also relates to cleaner compositions that have reduced base metal loss without inhibiting or significantly inhibiting scale removal from metal surfaces. More particularly, the present invention provides for cleaner compositions for removing magnetite containing scale from metal surfaces, especially in steam generating equipment.
- PWR pressurized water reactor
- the industry accepted chemical cleaning method utilizes a 10 to 25% diammonium EDTA cleaning solution at a solution pH of 7.5 or higher.
- the mild-steel corrosion inhibitor employed is an alkylthiopolyimino-amid with a low sulfur content, which is advantageous in that this lessens the stress corrosion cracking of Inconel ⁇ tubes.
- the cleaning process is typically scheduled to coincide with a refueling outage, and often requires the use of auxiliary heaters to maintain the temperature of the steam generator water at 200°F to 290°F.
- the present inventors have discovered a cleaner composition that avoids these difficulties inherent in the earlier processes.
- the new composition will remove iron-containing deposits at lower temperatures than EDTA-based cleaners.
- the cleaner solution is less aggressive to the base metal being cleaned and will work at a neutral pH. Additionally, the cleaner composition does not contain halogen ions and has a lower sulfur content, as well as being of lower toxicity and easier to handle.
- the present invention provides for compositions comprising 1 -hydroxy-ethylidene- 1 , 1 - diphosphonic acid (HEDP) and ethoxylated mercaptan and/or oxidized ethoxylated mercaptan, especially for removing iron oxide containing deposits from ferrous metal surfaces, especially in steam generators.
- HEDP 1 -hydroxy-ethylidene- 1 , 1 - diphosphonic acid
- the present invention provides a method for cleaning iron oxide containing scale from a metal surface, comprising contacting the metal surface with an aqueous composition containing 1-hydroxyethylidene- 1,1 -diphosphonic acid and at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan.
- a cleaning composition comprising
- the ethoxylated mercaptan can have the formula: H-(-O-CH 2 -CH 2 .) n -S-R, wherein R, is a hydrocarbyl group, n is 1 to 100, preferably 4-20, more preferably 4-12, and the oxidized ethoxylated mercaptan can comprise oxidized derivatives thereof.
- the ethoxylated mercaptan can be prepared from at least one mercaptan having the formula of R,SH, wherein R,SH comprises at least one of benzyl mercaptan, cyclohexyl mercaptan, dipentene dimercaptan, ethyl mercaptan, ethylcyclohexyl dimercaptan, ethylthioethanol, isopropyl mercaptan, n-butyl mercaptan, n-decyl mercaptan, n-dodecyl mercaptan, n-hexyl mercaptan, n-octyl mercaptan, n-propyl mercaptan, pinanyl mercaptan-2, s- butyl mercaptan, t-butyl mercaptan, t-dodecyl mercaptan, t-
- R can preferably have up to 30 carbon atoms, and can be C, to C 30 alkyl or substituted alkyl, the alkyl or substituted alkyl can be branched, or straight chained.
- the ethoxylated mercaptan can comprise ethoxylated tertiary dodecyl mercaptan, such as ethoxylated tertiary dodecyl mercaptan having about 6-10 moles of ethoxylation per mole of mercaptan. or about 8 moles of ethoxylation per mole of mercaptan.
- the ethoxylated mercaptan can comprise ethoxylated n-dodecylmercaptan, such as ethoxylated n-dodecylmercaptan having about 4.9 or 8.2 moles of ethoxylation per mole of mercaptan.
- the ethoxylated mercaptan can comprise ethoxylated 2-phenylethyl mercaptan, such as ethoxylated 2-phenylethyl mercaptan having about 6.7 moles of ethoxylation per mole of mercaptan.
- the metal surface can be ferrous metal, and the metal surface can be in contact with an aqueous system.
- the metal surfaces can be in a nuclear steam generator system.
- the 1 -hydroxyethylidene- 1 , 1 -diphosphonic acid and at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan can be contained in an aqueous solution.
- the aqueous composition can be contacted with the metal surface while off-line, the composition can remain in contact with the metal surface for up to 10 days, or up to 7 days.
- the 1-hydroxyethylidene- 1,1 -diphosphonic acid and at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan can be separately added to the aqueous system.
- the 1-hydroxyethylidene- 1,1 -diphosphonic acid and at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan can be added as a neat composition of 1-hydroxyethylidene- 1,1 -diphosphonic acid and at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan to the aqueous system.
- the aqueous system can comprise from about 0.1 parts to 50,000 parts solution in the system of at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan and from about 1 to 200,000 parts HEDP per million parts solution in the system.
- the aqueous system can comprise from about 0.1 to 20,000 parts ethoxylated mercaptan per million parts of solution in the system, and from about 5,000 to 100,000 parts HEDP per million parts of solution in the system.
- the aqueous system can comprise from about 500 to 10,000 parts ethoxylated mercaptan per million parts of solution in the system, and from about 20,000 to 80,000 parts HEDP per million parts of solution in the system.
- the aqueous system can comprise from about 1,000 to 5,000 parts ethoxylated mercaptan per million parts of solution in the system.
- the aqueous system can comprise about 2,500 parts ethoxylated mercaptan per million parts of solution in the system, and about 43,500 parts HEDP per million parts of solution in the system.
- the weight ratio of 1-hydroxyethylidene- 1,1 -diphosphonic acid to at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptans can range from about 4: 1 to about
- the aqueous composition can further comprise at least one of reducing agents, anionic polymers, surfactants, hydrotropes and corrosion inhibitors.
- the at least one reducing agent can comprise at least one of L-ascorbic acid, hydroquinone, sodium sulfite, diethylhydroxylamine, hydrazine, erythorbic acid and carbohydrazide.
- the pH of the aqueous system can range from about 5 to 12, more preferably about 6 to 12, even more preferably about 6-8. Also, the pH of the aqueous system is at least about 5, at least about 6, and at least about 6.5.
- the temperature of the aqueous composition can range from about 70°F to 250°F.
- the at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan can comprise ethoxylated mercaptan, oxidized ethoxylated mercaptan, or mixtures thereof.
- U.S. Pat. No. 5,614,028, Rodzewich teaches methods for cleaning and passivating a metal surface by incorporating a corrosion inhibitor into an acid cleaner.
- the corrosion inhibitor is ethoxylated tertiary dodecyl mercaptan.
- U.S. Pat. No. 4,810,405, Waller et al. teaches methods for removing iron oxide deposits from iron or steel metal surfaces with a composition comprising a phosphonate such as HEDP, a reducing agent and a corrosion inhibitor exemplified by azoles.
- U.S. Pat. No. 4,666,528, Arlington et al teaches methods for removing iron and copper containing scale from a metal surface using a composition comprising an aminopolycarboxylic acid such as EDTA and a phosphonic acid or salt thereof.
- 3,854,996 discloses methods for removing magnetite scale from metal substrates by contacting the metal with an aqueous solution of a polyphosphonic acid or salt thereof such as HEDP.
- a polyphosphonic acid or salt thereof such as HEDP.
- U.S. Pat. No. 3,806,459, Petrey, Jr. teaches on stream cleaning of iron oxide deposits using a composition comprising HEDP and an aminoacetic acid.
- U.S. Pat. No. 4,637,899, Kennedy, Jr. teaches a corrosion inhibiting composition which can be used to remove rust from metal surfaces.
- the composition comprises an aliphatic pyridinium or quinolinium salt and a sulfur-containing compound.
- a reference to a compound or component includes the compound or component by itself, as well as in combination with other compounds or components, such as mixtures of compounds.
- the present invention relates to methods and compositions for cleaning iron oxide containing deposits from metal surfaces comprising contacting the surfaces with a composition comprising 1 -hydroxy-ethylidene- 1,1 -diphosphonic acid (HEDP) and ethoxylated mercaptan(s) and/or oxidized ethoxylated mercaptan(s).
- HEDP 1 -hydroxy-ethylidene- 1,1 -diphosphonic acid
- HEDP 1 -hydroxy-ethylidene- 1,1 -diphosphonic acid
- the ethoxylated mercaptan generally has the formula: H-(-O-CH 2 -CH 2 -) n -S-R, wherein R, comprises a hydrocarbyl group, and n is 1 to 100, more preferably n is 4 to 20, and even more preferably n is 4 to 12.
- hydrocarbyl is understood to include “aliphatic,” “cycloaliphatic,” and “aromatic.”
- the hydrocarbyl groups are understood to include alkyl, alkenyl, alkynyl, cycloalkyl, aryl, arylalkyl, and alkaryl groups.
- hydrocarbyl is understood to include branched and unbranched compounds, and both non-substituted hydrocarbyl groups, and substituted hydrocarbyl groups, with the latter referring to the hydrocarbon portion bearing additional substituents, besides carbon and hydrogen.
- the number of carbon atoms in R can vary. Without wishing to be bound by theory, R, should have a sufficient number of C atoms to provide activity in the aqueous system to provide corrosion inhibition without significantly inhibiting scale removal. Moreover, the number of C atoms is preferably maintained at an upper limit taking at least into consideration compound expense and/or the ability of the compound to be maintained in a useful state in the aqueous system, such as ensuring sufficient solubility of the compound in the aqueous system.
- the hydrocarbyl group contains less than 30 carbon atoms.
- R is an alkyl or substituted alkyl, preferably containing C, to C, 0 , more preferably C 6 to C, 8 , and even more preferably C 8 to C 14 , which can be branched or straight chain, and the substitutions can preferably include hydroxy, sulfonate, phosphate, amino and aromatic groups.
- ethoxylated mercaptans can be prepared from a reaction of ethylene oxide and mercaptan of the form R,SH, wherein R, is defined as above.
- R,SH include, but are not limited to, benzyl mercaptan, cyclohexyl mercaptan, dipentene dimercaptan, ethyl mercaptan, ethylcyclohexyl dimercaptan, ethylthioethanol, isopropyl mercaptan, n-butyl mercaptan, n-decyl mercaptan, n-dodecyl mercaptan, n-hexyl mercaptan, n-octyl mercaptan, n-propyl mercaptan, pinanyl mercaptan-2, s-butyl mercaptan, t-butyl mercaptan,
- the ethoxylated mercaptan includes, but is not limited to, ethoxylated alkyl mercaptans, most preferably ethoxylated alkyl mercaptans having about 4 to 12 moles of ethoxylation per mole of mercaptan, including ethoxylated tertiary dodecyl mercaptans, such as those having 6 moles of ethoxylation per mole of mercaptan, e.g., ALCODET 260 available from Shibley Chemicals, Elyria, OH, and manufactured by Rhone-Poulenc, those having 8 moles of ethoxylation per mole of mercaptan, e.g., ALCODET SK available from Shibley Chemicals, Elyria, OH, and manufactured by Rhone-Poulenc, and those having 10 moles of ethoxylation per mole of mercaptan, e.g., ALCODET
- Burco TME which is available from Burlington Chemicals, Burlington, N.C., is a particularly preferred ethoxylated alkyl mercaptan.
- Ethoxylated 2-phenylethyl mercaptans having about 6.7 moles ethoxylation per mole of mercaptan are also preferred.
- oxidized ethoxylated mercaptans are utilized in the composition according to the present invention.
- oxidized ethoxylated mercaptans provide exceptional corrosion inhibition without inhibiting scale removal from metal surfaces.
- ethoxylated mercaptans have been found to provide exceptional corrosion inhibition combined with very low levels of metal loss when utilized in conjunction with HEDP, it was further discovered that oxidized ethoxylated mercaptans provide an even greater corrosion inhibition when utilized in conjunction with HEDP
- the ethoxylated mercaptan can be oxidized utilizing various procedures, and one having ordinary skill in the art would be able to oxidize ethoxylated mercaptans following the guidance provided herein. For example, methods such as disclosed in "Advanced Organic Chemistry” by Jerry March, 3rd Edition, pages 1089-1090, 1985, published by John Wiley & Sons, which is incorporated by reference in its entirety.
- the ethoxylated mercaptans can be oxidized using hydrogen peroxide.
- the ethoxylated mercaptans can be reacted with hydrogen peroxide, such as by utilizing an aqueous solution of hydrogen peroxide preferably containing about 1 to 70 wt%, more preferably about 30 to 50 wt%, at a temperature of preferably about 25°C to 100°C, more preferably about 40°C to 60°C, for a sufficient period of time to oxidize the ethoxylated mercaptan, preferably about 30 minutes to 8 hours, more preferably about 1 to 2 hours.
- Residual hydrogen peroxide can be removed utilizing any method for removing the hydrogen peroxide which is not detrimental or which is substantially non-detrimental to the oxidized ethoxylated mercaptan.
- residual hydrogen peroxide can be removed by raising the pH of the reaction composition that contains the oxidized ethoxylated mercaptan and the residual hydrogen peroxide, or a catalyst for hydrogen peroxide can be added to reaction composition.
- the pH of the reaction composition can be raised to at least about 10 and/or a catalyst, such as at least one of platinum, palladium, ferric chloride, cobalt chloride, and cupric chloride can be added to the reaction composition. While there is no upper limit to the pH, preferably the pH is maintained below about 14, with a preferred range being about 10-12.
- the sulfur component of the ethoxylated mercaptan is oxidized in the oxidation reaction to sulfoxide. Moreover, it is believed that at least some of the sulfoxide is further oxidized to sulfone. Thus, it is believed that the oxidized ethoxylated mercaptan contains sulfoxide and/or sulfone groups.
- the term ethoxylated mercaptan can include a mixture of one or more ethoxylated mercaptans
- the term oxidized ethoxylated mercaptan (also alternatively referred to herein as "derivatives of ethoxylated mercaptans") can include mixtures of one or more oxidized ethoxylated mercaptans.
- the cleaning composition of the present invention is typically added to steam generating systems, heat exchangers and other high pressure vessels where heat transfer to an aqueous medium occurs. These systems often have ferrous metal surfaces where magnetite scaling can occur.
- the cleaning composition is preferably employed in the secondary side of Pressurized
- Water Reactor nuclear steam generators which contain bundles of metal tubes held in place by tube sheets and support plates.
- the cleaning composition may be added to systems, such as the above-noted systems, as an active recirculating system, e.g., where the system is undergoing operation to at least partially, and preferably substantially completely or completely achieve usual system performance such as by being on-line.
- the cleaning composition may also be preferably added off-line, such as adding the cleaning composition to an off-line nuclear steam generator. Off-line addition includes static cleaning wherein the cleaning composition is not moving or substantially non- moving, such as wherein the cleaning composition is added to a container and/or a pipe and not circulated therein.
- off-line addition includes scale removal wherein the cleaning composition is caused to flow, such as by being agitated, such as by bubbling with an inert gas, such as nitrogen, or by being circulated, such as by a pump and/or gravity.
- the cleaning composition may be left in contact with the metal surface for extended periods of time, such as long as 7 days, even as long as 10 days, or longer. This period of time will vary depending upon the temperature of the water and the extent and amount of magnetite scale on the surfaces contained therein. In particular, the lower the temperature, the longer the contact time required to removal the scale.
- the cleaning composition can be contacted with the surface to be cleaned for about 3 hours to 10 days.
- the cleaning composition is added as an aqueous solution.
- the individual components of the composition may be added separately or together depending upon the particular system treated.
- the cleaning composition may be added neat to the system to be treated. The total amount of cleaning composition to be added to the system will vary depending upon the amount of magnetite scale and the temperature of the water.
- the cleaning composition may be added to the system to be treated in an amount ranging from about 0.1 to about 50,000 parts ethoxylated mercaptan per million parts of solution in the system, more preferably about 0.1 to about 20,000 parts ethoxylated mercaptan per million parts of solution in the system, more preferably from about 500 to 10,000 parts ethoxylated mercaptan per million part of solution in the system, even more preferably from about 1,000 to 5,000 parts ethoxylated mercaptan per million part of solution in the system, with one preferred value being about 2,500 parts ethoxylated mercaptan per million part of solution in the system.
- the cleaning composition may be added to the system to be treated in an amount ranging from about 1 to
- the weight ratio of HEDP to at least one of ethoxylated mercaptan and oxidized ethoxylated mercaptan will range from about 4 to 1 to 200 to 1 , more preferably from about 4 to 1 to 80 to 1, even more preferably from about 4 to 1 to 50 to 1, with one preferred weight ratio being about 17 to 1.
- the inventive cleaning composition may be added to the system to be treated with additional chemicals serving other purposes in the system. This holds true whether the chemical is added with the cleaning solution or is already present in the aqueous system.
- These other chemicals typically can be reducing agents such as L-ascorbic acid, hydroquinone, sodium sulfite, diethylhydroxylamine, hydrazine, erythorbic acid or carbohydrazide; anionic polymers such as carboxylates (e.g. polyacrylic acid, polymethacrylic acid and copolymers thereof) poly(alkenyl)phosphonic acids; surfactants such as phosphate esters, polyethylene oxide, polypropylene oxide and copolymers thereof, fatty acid amides and ethoxylated alcohols; hydrotropes such as sodium xylene sulfonate ; and corrosion inhibitors, such as copper corrosion inhibitors such as benzotriazoles and tolyltriazole.
- anionic polymers such as carboxylates (e.g. polyacrylic acid, polymethacrylic acid and copolymers thereof) poly(alkenyl)phosphonic acids
- surfactants such as phosphate esters, polyethylene oxide, poly
- compositions and processes of the present invention can include other corrosion inhibitors in addition to the ethoxylated mercaptan and/or oxidized ethoxylated mercaptans of the present invention.
- the cleaning composition of the present invention can be employed at pH's at least about 5 or above, more preferably at least about 6 or above, with a preferred range of about 5 to 12, more preferably about 6 to 12, and even more preferably about 6 to 8.
- the pH of the cleaner composition can be adjusted, preferably to a pH greater than about 5, more preferably to a pH greater than about 6, and more preferably to a pH of about 6 to 8, using various materials that can raise the pH of the system, preferably by using alkali metal hydroxide salts such as NaOH or KOH, organic amines, or ammonia.
- alkali metal hydroxide salts such as NaOH or KOH, organic amines, or ammonia.
- the present inventors anticipate that the cleaning composition will be effective in pre-operational boiler cleaning in fossil fuel systems, off-line and on-line boiler cleaning, cleaning of closed and open loop cooling systems and heat exchangers.
- test cleaner solutions were prepared separately.
- the components of the cleaner solution were added to deionized water (100 mL) in a 250 mL Pyrex beaker.
- the cleaner solution was then titrated to pH indicated in the examples with ammonium hydroxide.
- the beaker volume was increased to 199 mL with deionized water and the solution was heated to the temperature of usually 140°F, or as indicated.
- the process vessel containing the magnetite was positioned on the heater and the cleaning solution was slowly poured into the process vessel, and heated to usually 140°F, or as indicated.
- the resultant solution contained 2000 ppm magnetite as
- a 1010 mild steel coupon of surface area 18.704 c ⁇ r was placed horizontally into the vessel such that it was fully immersed in the cleaning solution.
- the metal coupons were obtained from Metal Samples Inc., Mumford, AL. Prior to use, the metal coupons were sonicated in acetone for ten minutes at room temperature. The coupon surface was prepared with a pumice buff followed by thorough deionized water rinses and drying with compressed nitrogen. The initial coupon weights were recorded. After the coupon was added to the process vessel, the thermometer, air lock and sealed glass adapter were inserted into the process vessel. The date and initial conditions (time, pH, and temperature) were recorded. The solution was then maintained at temperature for the prescribed cleaning time.
- Dissolution performance was determined by filtration of the hot processed cleaner solution through a dried and pre-weighed 0.2 um filter using a vacuum pump set to 10 psig. The used filter paper was dried and reweighed . A sample of the filtrate of the cleaner solution was taken for iron analysis by Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP) and for determination of the final solution pH. Cleaner performance was evaluated using the coupon and filter weights in the equations below. Note that all weights are expressed in grams Dissolution (%)
- Table 1 describes the materials utilized in the examples.
- Table 2 illustrates Comparative Examples 1-4 including EDTA (ethylenediamme tetraacetic acid), CCI-801 (alkylthiopolyamino-amid) and hydrazme
- the inventive composition proved more effective at inhibiting base metal loss without significantly reducing magnetite dissolution than a combination of HEDP and propoxylated mercaptans.
- the addition of CCI-801 to the HEDP resulted in a reduction in corrosion but also a reduction in the dissolution of magnetite.
- dibutylthiourea was also effective but contains 17%> sulfur by weight and is a suspected carcinogen.
- Burco TME for example, only contains 5% > sulfur by weight and is easier to handle.
- Table 4 demonstrates the even further increase in corrosion inhibition/reduced metal loss and excellent dissolution when utilizing oxidized ethoxylated mercaptans as compared to ethoxylated mercaptans.
- Table 5 demonstrates uses of pH's other than 7.1. It is noted that several examples include hydrazine.
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Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU29624/00A AU2962400A (en) | 1999-02-05 | 2000-02-02 | Cleaner composition and method of use thereof |
KR1020017009879A KR20010094757A (en) | 1999-02-05 | 2000-02-02 | Cleaner Composition and Method of Use Thereof |
EP00908240A EP1153160A1 (en) | 1999-02-05 | 2000-02-02 | Cleaner composition and method of use thereof |
JP2000597480A JP2002536545A (en) | 1999-02-05 | 2000-02-02 | Detergent composition and use thereof |
CA002361606A CA2361606A1 (en) | 1999-02-05 | 2000-02-02 | Cleaner composition and method of use thereof |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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US24544099A | 1999-02-05 | 1999-02-05 | |
US09/245,440 | 1999-02-05 | ||
US40717399A | 1999-09-28 | 1999-09-28 | |
US09/407,173 | 1999-09-28 |
Publications (1)
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WO2000046423A1 true WO2000046423A1 (en) | 2000-08-10 |
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PCT/US2000/000513 WO2000046423A1 (en) | 1999-02-05 | 2000-02-02 | Cleaner composition and method of use thereof |
Country Status (6)
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EP (1) | EP1153160A1 (en) |
JP (1) | JP2002536545A (en) |
KR (1) | KR20010094757A (en) |
AU (1) | AU2962400A (en) |
CA (1) | CA2361606A1 (en) |
WO (1) | WO2000046423A1 (en) |
Cited By (7)
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US6348440B1 (en) | 2000-08-02 | 2002-02-19 | Betzdearborn Inc. | Method of cleaning a metal surface |
EP2090676A1 (en) * | 2008-02-01 | 2009-08-19 | Ateco Services AG | Method for removing coatings and deposits |
US7611588B2 (en) | 2004-11-30 | 2009-11-03 | Ecolab Inc. | Methods and compositions for removing metal oxides |
US8192550B2 (en) | 2008-02-01 | 2012-06-05 | Ateco Services Ag | Use of an aqueous neutral cleaning solution and method for removing rouging from stainless steel surfaces |
JP2014502665A (en) * | 2011-01-13 | 2014-02-03 | ビーエーエスエフ ソシエタス・ヨーロピア | Use of optionally oxidized thioethers of alcohol alkoxylates in detergents and detergents |
TWI463007B (en) * | 2012-11-05 | 2014-12-01 | Epoch Material Co Ltd | Aqueous cleaning composition for post chemical mechanical planarization |
DE102015120722A1 (en) * | 2015-11-30 | 2017-06-01 | Areva Gmbh | Nuclear power plant and method for operating a nuclear power plant |
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JP5879699B2 (en) * | 2011-03-04 | 2016-03-08 | 栗田工業株式会社 | Corrosion prevention method for boiler water supply system |
CN105264117B (en) * | 2013-03-15 | 2018-11-27 | 嘉柏微电子材料股份公司 | Aqueous cleaning composition for the planarization of copper post-chemical mechanical |
CN115449712B (en) * | 2022-09-14 | 2023-06-09 | 浙江东南新材科技有限公司 | High-strength pickled plate and preparation method thereof |
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- 2000-02-02 CA CA002361606A patent/CA2361606A1/en not_active Abandoned
- 2000-02-02 KR KR1020017009879A patent/KR20010094757A/en not_active Withdrawn
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US6348440B1 (en) | 2000-08-02 | 2002-02-19 | Betzdearborn Inc. | Method of cleaning a metal surface |
EP1307534A4 (en) * | 2000-08-02 | 2004-08-11 | Betzdearborn Inc | Method of cleaning a metal surface |
US7611588B2 (en) | 2004-11-30 | 2009-11-03 | Ecolab Inc. | Methods and compositions for removing metal oxides |
EP2090676A1 (en) * | 2008-02-01 | 2009-08-19 | Ateco Services AG | Method for removing coatings and deposits |
US8192550B2 (en) | 2008-02-01 | 2012-06-05 | Ateco Services Ag | Use of an aqueous neutral cleaning solution and method for removing rouging from stainless steel surfaces |
JP2014502665A (en) * | 2011-01-13 | 2014-02-03 | ビーエーエスエフ ソシエタス・ヨーロピア | Use of optionally oxidized thioethers of alcohol alkoxylates in detergents and detergents |
TWI463007B (en) * | 2012-11-05 | 2014-12-01 | Epoch Material Co Ltd | Aqueous cleaning composition for post chemical mechanical planarization |
DE102015120722A1 (en) * | 2015-11-30 | 2017-06-01 | Areva Gmbh | Nuclear power plant and method for operating a nuclear power plant |
WO2017093079A1 (en) | 2015-11-30 | 2017-06-08 | Areva Gmbh | Nuclear power plant and method for operating a nuclear power plant |
DE102015120722B4 (en) * | 2015-11-30 | 2017-07-27 | Areva Gmbh | Nuclear power plant and method for operating a nuclear power plant |
CN108352201A (en) * | 2015-11-30 | 2018-07-31 | 法玛通有限公司 | The operating method of nuclear power generating equipment and nuclear power generating equipment |
US11170902B2 (en) | 2015-11-30 | 2021-11-09 | Framatome Gmbh | Nuclear power plant and method for operating a nuclear power plant |
CN108352201B (en) * | 2015-11-30 | 2022-04-22 | 法玛通有限公司 | Nuclear power plant and method for operating a nuclear power plant |
Also Published As
Publication number | Publication date |
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CA2361606A1 (en) | 2000-08-10 |
AU2962400A (en) | 2000-08-25 |
EP1153160A1 (en) | 2001-11-14 |
JP2002536545A (en) | 2002-10-29 |
KR20010094757A (en) | 2001-11-01 |
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