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USD799437S1 - Substrate retaining ring - Google Patents

Substrate retaining ring Download PDF

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Publication number
USD799437S1
USD799437S1 US29/555,718 US201629555718F USD799437S US D799437 S1 USD799437 S1 US D799437S1 US 201629555718 F US201629555718 F US 201629555718F US D799437 S USD799437 S US D799437S
Authority
US
United States
Prior art keywords
retaining ring
substrate retaining
view
substrate
taken along
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/555,718
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English (en)
Inventor
Osamu Nabeya
Hozumi Yasuda
Makoto Fukushima
Shingo Togashi
Keisuke Namiki
Satoru Yamaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FUKUSHIMA, MAKOTO, NABEYA, OSAMU, NAMIKI, KEISUKE, TOGASHI, SHINGO, YAMAKI, SATORU, YASUDA, HOZUMI
Application granted granted Critical
Publication of USD799437S1 publication Critical patent/USD799437S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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US29/555,718 2015-08-25 2016-02-24 Substrate retaining ring Active USD799437S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-018612 2015-02-02
JP2015018612 2015-08-25

Publications (1)

Publication Number Publication Date
USD799437S1 true USD799437S1 (en) 2017-10-10

Family

ID=59981668

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/555,718 Active USD799437S1 (en) 2015-08-25 2016-02-24 Substrate retaining ring

Country Status (2)

Country Link
US (1) USD799437S1 (zh)
TW (1) TWD179095S (zh)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD836573S1 (en) * 2017-01-31 2018-12-25 Hitachi High-Technologies Corporation Ring for a plasma processing apparatus
USD845568S1 (en) * 2015-05-14 2019-04-09 Ebara Corporation Pad holder for polishing apparatus
USD861449S1 (en) * 2018-02-05 2019-10-01 QuickCinch, LLC Wire repair and refurbishment tool
USD940670S1 (en) * 2019-09-26 2022-01-11 Willbe S&T Co., Ltd. Retainer ring for chemical mechanical polishing device
USD947789S1 (en) * 2020-05-22 2022-04-05 Hosiden Corporation Electric connection terminal
USD949116S1 (en) * 2019-05-03 2022-04-19 Lumileds Holding B.V. Flexible circuit board with connectors
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1013841S1 (en) * 2020-04-20 2024-02-06 Reliance Worldwide Corporation Retaining ring
USD1040304S1 (en) * 2018-12-17 2024-08-27 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD1062662S1 (en) * 2023-03-30 2025-02-18 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring

Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6068548A (en) * 1997-12-17 2000-05-30 Intel Corporation Mechanically stabilized retaining ring for chemical mechanical polishing
US6186880B1 (en) * 1999-09-29 2001-02-13 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
US20030070757A1 (en) * 2001-09-07 2003-04-17 Demeyer Dale E. Method and apparatus for two-part CMP retaining ring
US20030089697A1 (en) * 2000-04-20 2003-05-15 Yicheng Li Thermal processing system and thermal processing method
US20040065412A1 (en) * 2002-10-02 2004-04-08 Ensinger Kunststofftechnologie Gbr Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus
US20040077167A1 (en) * 2002-10-11 2004-04-22 Willis George D. Retaining ring for use on a carrier of a polishing apparatus
US20050191947A1 (en) * 2003-11-13 2005-09-01 Chen Hung C. Retaining ring with shaped surface
US20050277375A1 (en) * 2004-06-10 2005-12-15 Young Richard T Retaining ring assembly for use in chemical mechanical polishing
US20070224864A1 (en) * 2005-05-24 2007-09-27 John Burns CMP retaining ring
US20080096467A1 (en) * 2006-10-13 2008-04-24 Shaun Van Der Veen Stepped retaining ring
USD605206S1 (en) * 2008-05-07 2009-12-01 Komatsu Ltd. Fan shroud for construction machinery
US20110092142A1 (en) * 2009-10-21 2011-04-21 Frank Jr George J Retaining Rings
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
US8491267B2 (en) * 2010-08-27 2013-07-23 Pratt & Whitney Canada Corp. Retaining ring arrangement for a rotary assembly
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
US20140123469A1 (en) * 2012-11-05 2014-05-08 Sang Hyo Han Method of manufacturing retainer ring for polishing wafer
CN302820523S (zh) 2014-05-14
USD709536S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
US20150133038A1 (en) 2013-11-13 2015-05-14 Ebara Corporation Substrate holder, polishing apparatus, polishing method, and retaining ring
US20160158910A1 (en) * 2013-07-11 2016-06-09 Will Be S & T Co., Ltd. Retainer ring for chemical-mechanical polishing device
US20160256981A1 (en) * 2015-03-03 2016-09-08 Disco Corporation Grinding wheel, grinding apparatus, and method of grinding wafer
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN302820523S (zh) 2014-05-14
US6068548A (en) * 1997-12-17 2000-05-30 Intel Corporation Mechanically stabilized retaining ring for chemical mechanical polishing
US6186880B1 (en) * 1999-09-29 2001-02-13 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
US20030089697A1 (en) * 2000-04-20 2003-05-15 Yicheng Li Thermal processing system and thermal processing method
US20030070757A1 (en) * 2001-09-07 2003-04-17 Demeyer Dale E. Method and apparatus for two-part CMP retaining ring
US20040065412A1 (en) * 2002-10-02 2004-04-08 Ensinger Kunststofftechnologie Gbr Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus
US20040077167A1 (en) * 2002-10-11 2004-04-22 Willis George D. Retaining ring for use on a carrier of a polishing apparatus
US20050191947A1 (en) * 2003-11-13 2005-09-01 Chen Hung C. Retaining ring with shaped surface
US20050277375A1 (en) * 2004-06-10 2005-12-15 Young Richard T Retaining ring assembly for use in chemical mechanical polishing
US20070224864A1 (en) * 2005-05-24 2007-09-27 John Burns CMP retaining ring
US20080096467A1 (en) * 2006-10-13 2008-04-24 Shaun Van Der Veen Stepped retaining ring
USD605206S1 (en) * 2008-05-07 2009-12-01 Komatsu Ltd. Fan shroud for construction machinery
US20110092142A1 (en) * 2009-10-21 2011-04-21 Frank Jr George J Retaining Rings
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
US8491267B2 (en) * 2010-08-27 2013-07-23 Pratt & Whitney Canada Corp. Retaining ring arrangement for a rotary assembly
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD709536S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
US20140123469A1 (en) * 2012-11-05 2014-05-08 Sang Hyo Han Method of manufacturing retainer ring for polishing wafer
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
US20160158910A1 (en) * 2013-07-11 2016-06-09 Will Be S & T Co., Ltd. Retainer ring for chemical-mechanical polishing device
US20150133038A1 (en) 2013-11-13 2015-05-14 Ebara Corporation Substrate holder, polishing apparatus, polishing method, and retaining ring
US20160256981A1 (en) * 2015-03-03 2016-09-08 Disco Corporation Grinding wheel, grinding apparatus, and method of grinding wafer
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD845568S1 (en) * 2015-05-14 2019-04-09 Ebara Corporation Pad holder for polishing apparatus
USD836573S1 (en) * 2017-01-31 2018-12-25 Hitachi High-Technologies Corporation Ring for a plasma processing apparatus
USD861449S1 (en) * 2018-02-05 2019-10-01 QuickCinch, LLC Wire repair and refurbishment tool
USD1040304S1 (en) * 2018-12-17 2024-08-27 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD949116S1 (en) * 2019-05-03 2022-04-19 Lumileds Holding B.V. Flexible circuit board with connectors
USD940670S1 (en) * 2019-09-26 2022-01-11 Willbe S&T Co., Ltd. Retainer ring for chemical mechanical polishing device
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1013841S1 (en) * 2020-04-20 2024-02-06 Reliance Worldwide Corporation Retaining ring
USD947789S1 (en) * 2020-05-22 2022-04-05 Hosiden Corporation Electric connection terminal
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1062662S1 (en) * 2023-03-30 2025-02-18 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring

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Publication number Publication date
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