USD473354S1 - Vacuum processing equipment configuration - Google Patents
Vacuum processing equipment configuration Download PDFInfo
- Publication number
- USD473354S1 USD473354S1 US29/099,071 US9907199F USD473354S US D473354 S1 USD473354 S1 US D473354S1 US 9907199 F US9907199 F US 9907199F US D473354 S USD473354 S US D473354S
- Authority
- US
- United States
- Prior art keywords
- processing equipment
- vacuum processing
- equipment configuration
- side elevational
- elevational view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Images
Description
FIG. 1 is front, top and right side perspective view of cassettes storage eguipment in relation to a conveyor equipped robot and load and unload chambers showing our new design;
FIG. 2 is a top plan view;
FIG. 3 is a front side elevational view;
FIG. 4 is a right side elevational view;
FIG. 5 is a rear side elevational view;
FIG. 6 is a left side elevational view;
FIG. 7 is a bottom plan view; and,
FIG. 8 is a right side elevational view along line 8—8 of FIG. 2.
The details shown in broken lines in all views is for illustrative purposes only and form no part of the claimed design.
Claims (1)
- The ornamental design for a vacuum processing equipment configuration, as shown and described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/099,071 USD473354S1 (en) | 1990-08-29 | 1999-01-12 | Vacuum processing equipment configuration |
Applications Claiming Priority (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22532190 | 1990-08-29 | ||
| JP02-225321 | 1990-08-29 | ||
| US75195191 | 1991-08-29 | ||
| US9625693 | 1993-07-26 | ||
| US30244394 | 1994-09-09 | ||
| US44303995 | 1995-05-17 | ||
| US59387096 | 1996-01-30 | ||
| US88273197 | 1997-06-26 | ||
| US6106298 | 1998-04-16 | ||
| US29/099,071 USD473354S1 (en) | 1990-08-29 | 1999-01-12 | Vacuum processing equipment configuration |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD473354S1 true USD473354S1 (en) | 2003-04-15 |
Family
ID=27573495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/099,071 Expired - Lifetime USD473354S1 (en) | 1990-08-29 | 1999-01-12 | Vacuum processing equipment configuration |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD473354S1 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD818226S1 (en) * | 2015-12-03 | 2018-05-15 | Lg Electronics Inc. | Robot vacuum cleaner |
| USD828660S1 (en) * | 2016-06-08 | 2018-09-11 | Lg Electronics Inc. | Robot vacuum cleaner |
| USD840620S1 (en) * | 2016-11-18 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD840618S1 (en) * | 2016-11-30 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD840619S1 (en) * | 2016-11-23 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD877994S1 (en) * | 2018-01-12 | 2020-03-10 | Lg Electronics Inc. | Robot for cleaning |
| USD901110S1 (en) * | 2018-11-08 | 2020-11-03 | Beijing Xiaomi Mobile Software Co., Ltd. | Robot cleaner |
| USD929690S1 (en) * | 2019-03-18 | 2021-08-31 | Beijing Xiaomi Mobile Software Co., Ltd. | Sweeper |
| USD936719S1 (en) * | 2019-02-20 | 2021-11-23 | Lg Electronics Inc. | Home hub robot |
| USD940771S1 (en) * | 2019-08-15 | 2022-01-11 | Beijing Xiaomi Mobile Software Co., Ltd. | Robot vacuum cleaner |
Citations (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3652444A (en) | 1969-10-24 | 1972-03-28 | Ibm | Continuous vacuum process apparatus |
| US3981791A (en) | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| US4138306A (en) | 1976-08-31 | 1979-02-06 | Tokyo Shibaura Electric Co., Ltd. | Apparatus for the treatment of semiconductors |
| US4226897A (en) | 1977-12-05 | 1980-10-07 | Plasma Physics Corporation | Method of forming semiconducting materials and barriers |
| US4311427A (en) | 1979-12-21 | 1982-01-19 | Varian Associates, Inc. | Wafer transfer system |
| US4313783A (en) | 1980-05-19 | 1982-02-02 | Branson International Plasma Corporation | Computer controlled system for processing semiconductor wafers |
| US4313815A (en) | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| US4318767A (en) | 1979-11-27 | 1982-03-09 | Tokyo Ohka Kogyo Kabushiki Kaisha | Apparatus for the treatment of semiconductor wafers by plasma reaction |
| US4449885A (en) | 1982-05-24 | 1984-05-22 | Varian Associates, Inc. | Wafer transfer system |
| US4457661A (en) | 1981-12-07 | 1984-07-03 | Applied Materials, Inc. | Wafer loading apparatus |
| US4534314A (en) | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
| US4563240A (en) | 1983-08-10 | 1986-01-07 | Hitachi, Ltd. | Method and apparatus for plasma process |
| US4576698A (en) | 1983-06-30 | 1986-03-18 | International Business Machines Corporation | Plasma etch cleaning in low pressure chemical vapor deposition systems |
| US4634331A (en) | 1982-05-24 | 1987-01-06 | Varian Associates, Inc. | Wafer transfer system |
| US4705951A (en) | 1986-04-17 | 1987-11-10 | Varian Associates, Inc. | Wafer processing system |
| EP0246453A2 (en) | 1986-04-18 | 1987-11-25 | General Signal Corporation | Novel multiple-processing and contamination-free plasma etching system |
| US4715764A (en) | 1986-04-28 | 1987-12-29 | Varian Associates, Inc. | Gate valve for wafer processing system |
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| US4836905A (en) | 1987-07-16 | 1989-06-06 | Texas Instruments Incorporated | Processing apparatus |
| US4851101A (en) | 1987-09-18 | 1989-07-25 | Varian Associates, Inc. | Sputter module for modular wafer processing machine |
| US4895107A (en) | 1987-07-06 | 1990-01-23 | Kabushiki Kaisha Toshiba | Photo chemical reaction apparatus |
| US4902934A (en) | 1987-03-30 | 1990-02-20 | Sumitomo Metal Industries, Ltd. | Plasma apparatus |
| US4903937A (en) | 1987-09-24 | 1990-02-27 | Varian Associates, Inc. | Isolation valve for vacuum and non-vacuum application |
| US4909695A (en) | 1986-04-04 | 1990-03-20 | Materials Research Corporation | Method and apparatus for handling and processing wafer-like materials |
| US4911597A (en) | 1985-01-22 | 1990-03-27 | Applied Materials, Inc. | Semiconductor processing system with robotic autoloader and load lock |
| US4915564A (en) | 1986-04-04 | 1990-04-10 | Materials Research Corporation | Method and apparatus for handling and processing wafer-like materials |
| US4917556A (en) | 1986-04-28 | 1990-04-17 | Varian Associates, Inc. | Modular wafer transport and processing system |
| US4924890A (en) | 1986-05-16 | 1990-05-15 | Eastman Kodak Company | Method and apparatus for cleaning semiconductor wafers |
| US4936329A (en) | 1989-02-08 | 1990-06-26 | Leybold Aktiengesellschaft | Device for cleaning, testing and sorting of workpieces |
| US4951601A (en) | 1986-12-19 | 1990-08-28 | Applied Materials, Inc. | Multi-chamber integrated process system |
| US4969790A (en) | 1987-08-12 | 1990-11-13 | Leybold Aktiengesellschaft | Apparatus on the carousel principle for the coating of substrates |
| US5007981A (en) | 1989-02-27 | 1991-04-16 | Hitachi, Ltd. | Method of removing residual corrosive compounds by plasma etching followed by washing |
| US5014217A (en) | 1989-02-09 | 1991-05-07 | S C Technology, Inc. | Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
| US5292393A (en) | 1986-12-19 | 1994-03-08 | Applied Materials, Inc. | Multichamber integrated process system |
| EP0381338B1 (en) | 1989-01-28 | 1994-06-22 | Kokusai Electric Co., Ltd. | Method and apparatus for the transfer of wafers in a vertical cvd diffusion apparatus |
| US5351415A (en) | 1992-05-18 | 1994-10-04 | Convey, Inc. | Method and apparatus for maintaining clean articles |
| US5452166A (en) | 1993-10-01 | 1995-09-19 | Applied Magnetics Corporation | Thin film magnetic recording head for minimizing undershoots and a method for manufacturing the same |
| US5462397A (en) | 1993-03-16 | 1995-10-31 | Tokyo Electron Limited | Processing apparatus |
| US5504347A (en) | 1994-10-17 | 1996-04-02 | Texas Instruments Incorporated | Lateral resonant tunneling device having gate electrode aligned with tunneling barriers |
| US5504033A (en) | 1992-08-26 | 1996-04-02 | Harris Corporation | Method for forming recessed oxide isolation containing deep and shallow trenches |
| US5509771A (en) | 1992-07-29 | 1996-04-23 | Tokyo Electron Limited | Vacuum processing apparatus |
| US5556714A (en) | 1989-08-28 | 1996-09-17 | Hitachi, Ltd. | Method of treating samples |
| US5651858A (en) | 1995-03-06 | 1997-07-29 | Motorola Inc. | Method for forming a tapered opening in silicon |
| US5685684A (en) | 1990-11-26 | 1997-11-11 | Hitachi, Ltd. | Vacuum processing system |
-
1999
- 1999-01-12 US US29/099,071 patent/USD473354S1/en not_active Expired - Lifetime
Patent Citations (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3652444A (en) | 1969-10-24 | 1972-03-28 | Ibm | Continuous vacuum process apparatus |
| US3981791A (en) | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| US4138306A (en) | 1976-08-31 | 1979-02-06 | Tokyo Shibaura Electric Co., Ltd. | Apparatus for the treatment of semiconductors |
| US4226897A (en) | 1977-12-05 | 1980-10-07 | Plasma Physics Corporation | Method of forming semiconducting materials and barriers |
| US4313815A (en) | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| US4318767A (en) | 1979-11-27 | 1982-03-09 | Tokyo Ohka Kogyo Kabushiki Kaisha | Apparatus for the treatment of semiconductor wafers by plasma reaction |
| US4311427A (en) | 1979-12-21 | 1982-01-19 | Varian Associates, Inc. | Wafer transfer system |
| US4313783A (en) | 1980-05-19 | 1982-02-02 | Branson International Plasma Corporation | Computer controlled system for processing semiconductor wafers |
| US4457661A (en) | 1981-12-07 | 1984-07-03 | Applied Materials, Inc. | Wafer loading apparatus |
| US4634331A (en) | 1982-05-24 | 1987-01-06 | Varian Associates, Inc. | Wafer transfer system |
| US4449885A (en) | 1982-05-24 | 1984-05-22 | Varian Associates, Inc. | Wafer transfer system |
| US4576698A (en) | 1983-06-30 | 1986-03-18 | International Business Machines Corporation | Plasma etch cleaning in low pressure chemical vapor deposition systems |
| US4563240A (en) | 1983-08-10 | 1986-01-07 | Hitachi, Ltd. | Method and apparatus for plasma process |
| US4534314A (en) | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
| US4911597A (en) | 1985-01-22 | 1990-03-27 | Applied Materials, Inc. | Semiconductor processing system with robotic autoloader and load lock |
| US4909695A (en) | 1986-04-04 | 1990-03-20 | Materials Research Corporation | Method and apparatus for handling and processing wafer-like materials |
| US4915564A (en) | 1986-04-04 | 1990-04-10 | Materials Research Corporation | Method and apparatus for handling and processing wafer-like materials |
| US4705951A (en) | 1986-04-17 | 1987-11-10 | Varian Associates, Inc. | Wafer processing system |
| EP0246453A2 (en) | 1986-04-18 | 1987-11-25 | General Signal Corporation | Novel multiple-processing and contamination-free plasma etching system |
| US4715764A (en) | 1986-04-28 | 1987-12-29 | Varian Associates, Inc. | Gate valve for wafer processing system |
| US4836733A (en) | 1986-04-28 | 1989-06-06 | Varian Associates, Inc. | Wafer transfer system |
| US4917556A (en) | 1986-04-28 | 1990-04-17 | Varian Associates, Inc. | Modular wafer transport and processing system |
| US4924890A (en) | 1986-05-16 | 1990-05-15 | Eastman Kodak Company | Method and apparatus for cleaning semiconductor wafers |
| US5292393A (en) | 1986-12-19 | 1994-03-08 | Applied Materials, Inc. | Multichamber integrated process system |
| US4951601A (en) | 1986-12-19 | 1990-08-28 | Applied Materials, Inc. | Multi-chamber integrated process system |
| US4902934A (en) | 1987-03-30 | 1990-02-20 | Sumitomo Metal Industries, Ltd. | Plasma apparatus |
| US4895107A (en) | 1987-07-06 | 1990-01-23 | Kabushiki Kaisha Toshiba | Photo chemical reaction apparatus |
| US4836905A (en) | 1987-07-16 | 1989-06-06 | Texas Instruments Incorporated | Processing apparatus |
| US4969790A (en) | 1987-08-12 | 1990-11-13 | Leybold Aktiengesellschaft | Apparatus on the carousel principle for the coating of substrates |
| US4851101A (en) | 1987-09-18 | 1989-07-25 | Varian Associates, Inc. | Sputter module for modular wafer processing machine |
| US4903937A (en) | 1987-09-24 | 1990-02-27 | Varian Associates, Inc. | Isolation valve for vacuum and non-vacuum application |
| EP0381338B1 (en) | 1989-01-28 | 1994-06-22 | Kokusai Electric Co., Ltd. | Method and apparatus for the transfer of wafers in a vertical cvd diffusion apparatus |
| US4936329A (en) | 1989-02-08 | 1990-06-26 | Leybold Aktiengesellschaft | Device for cleaning, testing and sorting of workpieces |
| US5014217A (en) | 1989-02-09 | 1991-05-07 | S C Technology, Inc. | Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
| US5007981A (en) | 1989-02-27 | 1991-04-16 | Hitachi, Ltd. | Method of removing residual corrosive compounds by plasma etching followed by washing |
| US5556714A (en) | 1989-08-28 | 1996-09-17 | Hitachi, Ltd. | Method of treating samples |
| US5685684A (en) | 1990-11-26 | 1997-11-11 | Hitachi, Ltd. | Vacuum processing system |
| US5351415A (en) | 1992-05-18 | 1994-10-04 | Convey, Inc. | Method and apparatus for maintaining clean articles |
| US5509771A (en) | 1992-07-29 | 1996-04-23 | Tokyo Electron Limited | Vacuum processing apparatus |
| US5504033A (en) | 1992-08-26 | 1996-04-02 | Harris Corporation | Method for forming recessed oxide isolation containing deep and shallow trenches |
| US5462397A (en) | 1993-03-16 | 1995-10-31 | Tokyo Electron Limited | Processing apparatus |
| US5675461A (en) | 1993-10-01 | 1997-10-07 | Applied Magnetics Corporation | Thin film magnetic recording head for minimizing undershoots |
| US5452166A (en) | 1993-10-01 | 1995-09-19 | Applied Magnetics Corporation | Thin film magnetic recording head for minimizing undershoots and a method for manufacturing the same |
| US5504347A (en) | 1994-10-17 | 1996-04-02 | Texas Instruments Incorporated | Lateral resonant tunneling device having gate electrode aligned with tunneling barriers |
| US5651858A (en) | 1995-03-06 | 1997-07-29 | Motorola Inc. | Method for forming a tapered opening in silicon |
Non-Patent Citations (3)
| Title |
|---|
| R.P.H. Chang, "Multipurpose plasma reactor for materials research and processing", J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 278-280. |
| Semiconductor Equipment Association of Japan, "Semiconductor News", vol. 4, pp. 38-43, Apr. 10, 1987 (w/translation). |
| Semiconductor Equipment Association of Japan, Terminological Dictionary of Semiconductor Equipment), front, table, p. 183, back, Nov. 20, 1987. |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD818226S1 (en) * | 2015-12-03 | 2018-05-15 | Lg Electronics Inc. | Robot vacuum cleaner |
| USD828660S1 (en) * | 2016-06-08 | 2018-09-11 | Lg Electronics Inc. | Robot vacuum cleaner |
| USD840620S1 (en) * | 2016-11-18 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD840619S1 (en) * | 2016-11-23 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD840618S1 (en) * | 2016-11-30 | 2019-02-12 | Lg Electronics Inc. | Robot for cleaning |
| USD877994S1 (en) * | 2018-01-12 | 2020-03-10 | Lg Electronics Inc. | Robot for cleaning |
| USD901110S1 (en) * | 2018-11-08 | 2020-11-03 | Beijing Xiaomi Mobile Software Co., Ltd. | Robot cleaner |
| USD936719S1 (en) * | 2019-02-20 | 2021-11-23 | Lg Electronics Inc. | Home hub robot |
| USD929690S1 (en) * | 2019-03-18 | 2021-08-31 | Beijing Xiaomi Mobile Software Co., Ltd. | Sweeper |
| USD940771S1 (en) * | 2019-08-15 | 2022-01-11 | Beijing Xiaomi Mobile Software Co., Ltd. | Robot vacuum cleaner |
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