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USD1042731S1 - Gas nozzle for semiconductor manufacturing equipment - Google Patents

Gas nozzle for semiconductor manufacturing equipment Download PDF

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Publication number
USD1042731S1
USD1042731S1 US29/861,210 US202229861210F USD1042731S US D1042731 S1 USD1042731 S1 US D1042731S1 US 202229861210 F US202229861210 F US 202229861210F US D1042731 S USD1042731 S US D1042731S
Authority
US
United States
Prior art keywords
semiconductor manufacturing
gas nozzle
manufacturing equipment
view
elevational view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/861,210
Inventor
Atsushi Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HIRANO, ATSUSHI
Application granted granted Critical
Publication of USD1042731S1 publication Critical patent/USD1042731S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a front, top and left side perspective view of a gas nozzle for semiconductor manufacturing equipment, showing my new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a rear elevational view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2 .
The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a gas nozzle for semiconductor manufacturing equipment, as shown and described.
US29/861,210 2022-05-30 2022-11-28 Gas nozzle for semiconductor manufacturing equipment Active USD1042731S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-011412D 2022-05-30
JP2022011412F JP1731676S (en) 2022-05-30 2022-05-30

Publications (1)

Publication Number Publication Date
USD1042731S1 true USD1042731S1 (en) 2024-09-17

Family

ID=84322281

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/861,210 Active USD1042731S1 (en) 2022-05-30 2022-11-28 Gas nozzle for semiconductor manufacturing equipment

Country Status (3)

Country Link
US (1) USD1042731S1 (en)
JP (1) JP1731676S (en)
TW (1) TWD231991S (en)

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
US5135170A (en) * 1990-09-26 1992-08-04 Kabushiki Kaisha Arikawa Seisakusho Cleaning nozzle
USD336096S (en) * 1990-11-26 1993-06-01 Aktiebolaget Electrolux Gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
US20120167824A1 (en) * 2011-01-04 2012-07-05 Jong Sun Maeng Cvd apparatus
JP1534651S (en) 2015-01-28 2015-10-05
USD771543S1 (en) * 2014-09-02 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
JP1563524S (en) 2016-03-30 2016-11-21
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
JP1605945S (en) 2017-12-27 2018-06-04
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
USD847301S1 (en) * 2017-04-14 2019-04-30 Kokusai Electric Corporation Return nozzle
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
USD937385S1 (en) 2019-03-20 2021-11-30 Kokusai Electric Corporation Return nozzle
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
US5135170A (en) * 1990-09-26 1992-08-04 Kabushiki Kaisha Arikawa Seisakusho Cleaning nozzle
USD336096S (en) * 1990-11-26 1993-06-01 Aktiebolaget Electrolux Gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
US20120167824A1 (en) * 2011-01-04 2012-07-05 Jong Sun Maeng Cvd apparatus
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD771543S1 (en) * 2014-09-02 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
USD771772S1 (en) 2015-01-28 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
JP1534651S (en) 2015-01-28 2015-10-05
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
JP1563524S (en) 2016-03-30 2016-11-21
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
USD847301S1 (en) * 2017-04-14 2019-04-30 Kokusai Electric Corporation Return nozzle
JP1605945S (en) 2017-12-27 2018-06-04
USD889596S1 (en) 2017-12-27 2020-07-07 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD937385S1 (en) 2019-03-20 2021-11-30 Kokusai Electric Corporation Return nozzle
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
WaveTopSign Laser Machine Gas Nozzle Air Regulating Diameter 6mm 8mm 2Pcs / Lots for Co2 Laser Head and Air Nozzle,https://www.aliexpress.us/item/2251832773301553.html?src=google&gatewayAdapt=glo2usa, 2024. (Year: 2024). *

Also Published As

Publication number Publication date
TWD231991S (en) 2024-07-01
JP1731676S (en) 2022-12-08

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