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USD1009816S1 - Collimator for a physical vapor deposition chamber - Google Patents

Collimator for a physical vapor deposition chamber Download PDF

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Publication number
USD1009816S1
USD1009816S1 US29/805,681 US202129805681F USD1009816S US D1009816 S1 USD1009816 S1 US D1009816S1 US 202129805681 F US202129805681 F US 202129805681F US D1009816 S USD1009816 S US D1009816S
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Prior art keywords
collimator
vapor deposition
physical vapor
deposition chamber
view
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US29/805,681
Inventor
Martin Lee Riker
Keith A. Miller
Fuhong Zhang
Luke Vianney Varkey
Kishor Kumar KALATHIPARAMBIL
Xiangjin Xie
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/805,681 priority Critical patent/USD1009816S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KALATHIPARAMBIL, KISHOR KUMAR, MILLER, KEITH A., RIKER, MARTIN LEE, VARKEY, LUKE VIANNEY, ZHANG, FUHONG
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: XIE, XIANGJIN
Priority to TW111300795F priority patent/TWD224691S/en
Priority to JP2022003655F priority patent/JP1719724S/en
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Publication of USD1009816S1 publication Critical patent/USD1009816S1/en
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FIG. 1 is a top perspective view of collimator for a physical vapor deposition chamber showing our new design.
FIG. 2 is a bottom perspective view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a right side elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a front elevation view thereof.
FIG. 8 is a back elevation view thereof; and,
FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3 .
The broken lines in the drawings illustrate environment of the collimator for a physical vapor deposition chamber that form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.
US29/805,681 2021-08-29 2021-08-29 Collimator for a physical vapor deposition chamber Active USD1009816S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/805,681 USD1009816S1 (en) 2021-08-29 2021-08-29 Collimator for a physical vapor deposition chamber
TW111300795F TWD224691S (en) 2021-08-29 2022-02-18 Collimator for use in a physical vapor deposition (pvd) chamber
JP2022003655F JP1719724S (en) 2021-08-29 2022-02-25 Collimator for physical vapor deposition chamber

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US29/805,681 USD1009816S1 (en) 2021-08-29 2021-08-29 Collimator for a physical vapor deposition chamber

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USD1009816S1 true USD1009816S1 (en) 2024-01-02

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JP (1) JP1719724S (en)
TW (1) TWD224691S (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1103950S1 (en) 2024-03-21 2025-12-02 Applied Materials, Inc. Process chamber collimator
USD1110289S1 (en) 2024-10-18 2026-01-27 Applied Materials, Inc. Process chamber collimator
USD1110979S1 (en) 2024-10-18 2026-02-03 Applied Materials, Inc. Process chamber collimator

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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US5401675A (en) 1991-04-19 1995-03-28 Lee; Pei-Ing P. Method of depositing conductors in high aspect ratio apertures using a collimator
US5624536A (en) 1994-06-08 1997-04-29 Tel Varian Limited Processing apparatus with collimator exchange device
US5643428A (en) 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
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US6362097B1 (en) 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
US20030015421A1 (en) 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
US20030029715A1 (en) 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
US20040211665A1 (en) 2001-07-25 2004-10-28 Yoon Ki Hwan Barrier formation using novel sputter-deposition method
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
US20060151115A1 (en) * 2005-01-11 2006-07-13 Hoon-Ho Kim Dry stripping equipment comprising plasma distribution shower head
US20070228302A1 (en) 2006-03-30 2007-10-04 Norman Robert L Jr Adjustable suspension assembly for a collimating lattice
US20080121620A1 (en) 2006-11-24 2008-05-29 Guo G X Processing chamber
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
USD584697S1 (en) * 2008-04-23 2009-01-13 Littelfuse, Inc. Vehicle electrical center subassembly
USD585389S1 (en) * 2008-04-23 2009-01-27 Littelfuse, Inc. Two-leafed vehicle electrical center subassembly
USD598717S1 (en) 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
US20090308739A1 (en) 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
US20090308732A1 (en) 2008-06-17 2009-12-17 Applied Materials, Inc. Apparatus and method for uniform deposition
USD613829S1 (en) * 2006-09-13 2010-04-13 Hayward Industries, Inc. Circular suction outlet assembly cover
USD660645S1 (en) 2010-10-29 2012-05-29 Conopco, Inc. Tea capsule
TWD153743S (en) 2012-01-25 2013-05-21 應用材料股份有限公司 Deposition chamber liner
USD686582S1 (en) * 2012-03-20 2013-07-23 Veeco Instruments Inc. Wafer carrier having pockets
US20130270362A1 (en) * 2010-05-25 2013-10-17 Aventa Technologies, Inc. Showerhead apparatus for a linear batch chemical vapor deposition system
USD695241S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
TWD159676S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159674S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159673S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
USD704155S1 (en) * 2010-08-19 2014-05-06 Epistar Corporation Wafer carrier
USD721417S1 (en) * 2013-04-11 2015-01-20 Canada Pipeline Accessories, Co., Ltd. Flow conditioner
USD722298S1 (en) 2013-07-17 2015-02-10 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
TWD166552S (en) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 Vaporizer for substrate processing equipment
US20150114823A1 (en) 2013-10-24 2015-04-30 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
TWD168790S (en) 2013-10-18 2015-07-01 Semiconductor Energy Lab Portable information terminal
USD741823S1 (en) 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
USD746647S1 (en) 2014-03-13 2016-01-05 Vienar Roaks Strainer
TWD174341S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
TWD174342S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Part of the inner cylinder of the exhaust gas treatment device
USD752528S1 (en) * 2010-04-29 2016-03-29 Brenda M. Leonard Waterproof electronics container
USD753449S1 (en) 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
TWD175853S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Cover rings for plasma processing equipment
TWD175855S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Lower chamber for plasma treatment device
TWD175852S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Upper chamber for plasma treatment device
TWD176440S (en) 2014-12-22 2016-06-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
USD759603S1 (en) 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
TWD178898S (en) 2014-11-01 2016-10-11 米歇爾維尼希股份公司 Kehlmaschine/slotting machine
TWD180288S (en) 2016-02-26 2016-12-21 Hitachi High Tech Corp Upper chamber for plasma treatment device
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
US20170117121A1 (en) 2015-10-27 2017-04-27 Applied Materials, Inc. Biasable flux optimizer / collimator for pvd sputter chamber
CN107305407A (en) * 2016-04-19 2017-10-31 宏达国际电子股份有限公司 Protective shell and manufacturing method thereof
US9892890B2 (en) 2012-04-26 2018-02-13 Intevac, Inc. Narrow source for physical vapor deposition processing
USD821039S1 (en) 2016-06-06 2018-06-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate
US10246777B2 (en) * 2017-06-12 2019-04-02 Asm Ip Holding B.V. Heater block having continuous concavity
USD858468S1 (en) * 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) * 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859484S1 (en) * 2017-06-12 2019-09-10 Asm Ip Holding B.V. Heater block
KR20200048076A (en) * 2018-10-29 2020-05-08 주식회사 스콜피오진 Kit for diagnosing infection due to severe fever with thrombocytopenia syndrome virus
US20210222299A1 (en) * 2018-06-28 2021-07-22 Meidensha Corporation Shower head and processing device
KR20220007158A (en) * 2019-05-10 2022-01-18 가부시키가이샤 알박 Can roller for vacuum processing equipment

Patent Citations (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401675A (en) 1991-04-19 1995-03-28 Lee; Pei-Ing P. Method of depositing conductors in high aspect ratio apertures using a collimator
US5958193A (en) 1994-02-01 1999-09-28 Vlsi Technology, Inc. Sputter deposition with mobile collimator
US5624536A (en) 1994-06-08 1997-04-29 Tel Varian Limited Processing apparatus with collimator exchange device
US5643428A (en) 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5702573A (en) 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
US5705042A (en) 1996-01-29 1998-01-06 Micron Technology, Inc. Electrically isolated collimator and method
US6362097B1 (en) 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
US20030015421A1 (en) 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
USD452257S1 (en) * 2001-07-25 2001-12-18 J M P Industries, Inc. Extruder plate for diamond shaped extruder insert
US20030029715A1 (en) 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
US20040211665A1 (en) 2001-07-25 2004-10-28 Yoon Ki Hwan Barrier formation using novel sputter-deposition method
US20060151115A1 (en) * 2005-01-11 2006-07-13 Hoon-Ho Kim Dry stripping equipment comprising plasma distribution shower head
US20070228302A1 (en) 2006-03-30 2007-10-04 Norman Robert L Jr Adjustable suspension assembly for a collimating lattice
USD613829S1 (en) * 2006-09-13 2010-04-13 Hayward Industries, Inc. Circular suction outlet assembly cover
US20080121620A1 (en) 2006-11-24 2008-05-29 Guo G X Processing chamber
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
USD584697S1 (en) * 2008-04-23 2009-01-13 Littelfuse, Inc. Vehicle electrical center subassembly
USD585389S1 (en) * 2008-04-23 2009-01-27 Littelfuse, Inc. Two-leafed vehicle electrical center subassembly
US20090308739A1 (en) 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
US20090308732A1 (en) 2008-06-17 2009-12-17 Applied Materials, Inc. Apparatus and method for uniform deposition
USD598717S1 (en) 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
USD752528S1 (en) * 2010-04-29 2016-03-29 Brenda M. Leonard Waterproof electronics container
US20130270362A1 (en) * 2010-05-25 2013-10-17 Aventa Technologies, Inc. Showerhead apparatus for a linear batch chemical vapor deposition system
USD704155S1 (en) * 2010-08-19 2014-05-06 Epistar Corporation Wafer carrier
USD660645S1 (en) 2010-10-29 2012-05-29 Conopco, Inc. Tea capsule
TWD153743S (en) 2012-01-25 2013-05-21 應用材料股份有限公司 Deposition chamber liner
USD686582S1 (en) * 2012-03-20 2013-07-23 Veeco Instruments Inc. Wafer carrier having pockets
USD695241S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
US9892890B2 (en) 2012-04-26 2018-02-13 Intevac, Inc. Narrow source for physical vapor deposition processing
TWD159674S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159673S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159676S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD166552S (en) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 Vaporizer for substrate processing equipment
USD721417S1 (en) * 2013-04-11 2015-01-20 Canada Pipeline Accessories, Co., Ltd. Flow conditioner
USD741823S1 (en) 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
USD759603S1 (en) 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
USD722298S1 (en) 2013-07-17 2015-02-10 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
TWD168790S (en) 2013-10-18 2015-07-01 Semiconductor Energy Lab Portable information terminal
US20150114823A1 (en) 2013-10-24 2015-04-30 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
USD746647S1 (en) 2014-03-13 2016-01-05 Vienar Roaks Strainer
TWD178898S (en) 2014-11-01 2016-10-11 米歇爾維尼希股份公司 Kehlmaschine/slotting machine
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
TWD174342S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Part of the inner cylinder of the exhaust gas treatment device
TWD176440S (en) 2014-12-22 2016-06-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
TWD174341S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
USD753449S1 (en) 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
TWD175852S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Upper chamber for plasma treatment device
TWD175855S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Lower chamber for plasma treatment device
TWD175853S (en) 2015-06-12 2016-05-21 Hitachi High Tech Corp Cover rings for plasma processing equipment
US20170117121A1 (en) 2015-10-27 2017-04-27 Applied Materials, Inc. Biasable flux optimizer / collimator for pvd sputter chamber
US9960024B2 (en) 2015-10-27 2018-05-01 Applied Materials, Inc. Biasable flux optimizer / collimator for PVD sputter chamber
TWD180288S (en) 2016-02-26 2016-12-21 Hitachi High Tech Corp Upper chamber for plasma treatment device
CN107305407A (en) * 2016-04-19 2017-10-31 宏达国际电子股份有限公司 Protective shell and manufacturing method thereof
USD821039S1 (en) 2016-06-06 2018-06-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate
US10246777B2 (en) * 2017-06-12 2019-04-02 Asm Ip Holding B.V. Heater block having continuous concavity
USD859484S1 (en) * 2017-06-12 2019-09-10 Asm Ip Holding B.V. Heater block
USD858468S1 (en) * 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) * 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
US20210222299A1 (en) * 2018-06-28 2021-07-22 Meidensha Corporation Shower head and processing device
KR20200048076A (en) * 2018-10-29 2020-05-08 주식회사 스콜피오진 Kit for diagnosing infection due to severe fever with thrombocytopenia syndrome virus
KR20220007158A (en) * 2019-05-10 2022-01-18 가부시키가이샤 알박 Can roller for vacuum processing equipment

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Search Report for Taiwan Design Application No. 107305411, Feb. 21, 2019, 2 pages.

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1110975S1 (en) 2022-01-12 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1103950S1 (en) 2024-03-21 2025-12-02 Applied Materials, Inc. Process chamber collimator
USD1110289S1 (en) 2024-10-18 2026-01-27 Applied Materials, Inc. Process chamber collimator
USD1110979S1 (en) 2024-10-18 2026-02-03 Applied Materials, Inc. Process chamber collimator

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Publication number Publication date
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JP1719724S (en) 2022-07-13

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