US8936859B2 - Cyclophosphazene compound, lubricant comprising same, and magnetic disk - Google Patents
Cyclophosphazene compound, lubricant comprising same, and magnetic disk Download PDFInfo
- Publication number
- US8936859B2 US8936859B2 US13/641,508 US201113641508A US8936859B2 US 8936859 B2 US8936859 B2 US 8936859B2 US 201113641508 A US201113641508 A US 201113641508A US 8936859 B2 US8936859 B2 US 8936859B2
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- United States
- Prior art keywords
- lubricant
- molecular weight
- compound
- ether
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000314 lubricant Substances 0.000 title claims abstract description 110
- 150000001875 compounds Chemical class 0.000 title claims abstract description 48
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 38
- 238000009826 distribution Methods 0.000 claims abstract description 15
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 17
- 239000011241 protective layer Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 230000001050 lubricating effect Effects 0.000 claims description 5
- -1 phosphazene compound Chemical class 0.000 description 19
- 239000002904 solvent Substances 0.000 description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 230000001681 protective effect Effects 0.000 description 12
- 238000000354 decomposition reaction Methods 0.000 description 11
- 239000010702 perfluoropolyether Substances 0.000 description 11
- 239000012925 reference material Substances 0.000 description 9
- 230000014759 maintenance of location Effects 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 6
- 125000005907 alkyl ester group Chemical group 0.000 description 6
- 125000005103 alkyl silyl group Chemical group 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 description 5
- 238000004293 19F NMR spectroscopy Methods 0.000 description 5
- UQNHREPHZCGIGX-UHFFFAOYSA-N CC.CCC[Rf]COCC.N1=PN=PN=P1 Chemical compound CC.CCC[Rf]COCC.N1=PN=PN=P1 UQNHREPHZCGIGX-UHFFFAOYSA-N 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- GCUOLJOTJRUDIZ-UHFFFAOYSA-N 2-(2-bromoethoxy)oxane Chemical compound BrCCOC1CCCCO1 GCUOLJOTJRUDIZ-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 125000004036 acetal group Chemical group 0.000 description 3
- 125000005233 alkylalcohol group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- DFXFQWZHKKEJDM-UHFFFAOYSA-N 2-(4-bromobutoxy)oxane Chemical compound BrCCCCOC1CCCCO1 DFXFQWZHKKEJDM-UHFFFAOYSA-N 0.000 description 2
- OITRSGCRONHHTA-UHFFFAOYSA-N CC.CCC[Rf]C.N1=PN=PN=P1 Chemical compound CC.CCC[Rf]C.N1=PN=PN=P1 OITRSGCRONHHTA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical group CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QKAGYSDHEJITFV-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-(trifluoromethyl)pentane Chemical compound FC(F)(F)C(F)(F)C(F)(OC)C(F)(C(F)(F)F)C(F)(F)F QKAGYSDHEJITFV-UHFFFAOYSA-N 0.000 description 1
- XGNUCFTVHROBJF-UHFFFAOYSA-N 1-bromo-12-(ethoxymethoxy)dodecane Chemical compound CCOCOCCCCCCCCCCCCBr XGNUCFTVHROBJF-UHFFFAOYSA-N 0.000 description 1
- VWQHYHIFCIFQJR-UHFFFAOYSA-N 1-bromo-12-(methoxymethoxy)dodecane Chemical compound COCOCCCCCCCCCCCCBr VWQHYHIFCIFQJR-UHFFFAOYSA-N 0.000 description 1
- FPHSEBHPKKKYKD-UHFFFAOYSA-N 1-bromo-2-(ethoxymethoxy)ethane Chemical compound CCOCOCCBr FPHSEBHPKKKYKD-UHFFFAOYSA-N 0.000 description 1
- HRKGXDSPQAOGBB-UHFFFAOYSA-N 1-bromo-2-(methoxymethoxy)ethane Chemical compound COCOCCBr HRKGXDSPQAOGBB-UHFFFAOYSA-N 0.000 description 1
- YZNNAVYLUVKELB-UHFFFAOYSA-N 1-bromo-4-(ethoxymethoxy)butane Chemical compound CCOCOCCCCBr YZNNAVYLUVKELB-UHFFFAOYSA-N 0.000 description 1
- MUOVCWJXYGMSJG-UHFFFAOYSA-N 1-bromo-4-(methoxymethoxy)butane Chemical compound COCOCCCCBr MUOVCWJXYGMSJG-UHFFFAOYSA-N 0.000 description 1
- MCHSMUQZXYRQSL-UHFFFAOYSA-N 1-bromo-6-(ethoxymethoxy)hexane Chemical compound CCOCOCCCCCCBr MCHSMUQZXYRQSL-UHFFFAOYSA-N 0.000 description 1
- BUURWYLLAJQLFA-UHFFFAOYSA-N 1-bromo-8-(ethoxymethoxy)octane Chemical compound CCOCOCCCCCCCCBr BUURWYLLAJQLFA-UHFFFAOYSA-N 0.000 description 1
- AQFIGRIPJAKXJM-UHFFFAOYSA-N 1-bromo-8-(methoxymethoxy)octane Chemical compound COCOCCCCCCCCBr AQFIGRIPJAKXJM-UHFFFAOYSA-N 0.000 description 1
- KOAMTYFLUJPWGJ-UHFFFAOYSA-N 1-chloro-12-(ethoxymethoxy)dodecane Chemical compound CCOCOCCCCCCCCCCCCCl KOAMTYFLUJPWGJ-UHFFFAOYSA-N 0.000 description 1
- PVHFKKLKGQNDIJ-UHFFFAOYSA-N 1-chloro-12-(methoxymethoxy)dodecane Chemical compound COCOCCCCCCCCCCCCCl PVHFKKLKGQNDIJ-UHFFFAOYSA-N 0.000 description 1
- SNTMMQANMQURBP-UHFFFAOYSA-N 1-chloro-2-(ethoxymethoxy)ethane Chemical compound CCOCOCCCl SNTMMQANMQURBP-UHFFFAOYSA-N 0.000 description 1
- PSBSSJLIQVROKY-UHFFFAOYSA-N 1-chloro-2-(methoxymethoxy)ethane Chemical compound COCOCCCl PSBSSJLIQVROKY-UHFFFAOYSA-N 0.000 description 1
- XGTXSXFVDQWIFU-UHFFFAOYSA-N 1-chloro-4-(ethoxymethoxy)butane Chemical compound CCOCOCCCCCl XGTXSXFVDQWIFU-UHFFFAOYSA-N 0.000 description 1
- JYZABKPVIBWMKC-UHFFFAOYSA-N 1-chloro-4-(methoxymethoxy)butane Chemical compound COCOCCCCCl JYZABKPVIBWMKC-UHFFFAOYSA-N 0.000 description 1
- HDVSOWKWSQQOJN-UHFFFAOYSA-N 1-chloro-6-(ethoxymethoxy)hexane Chemical compound CCOCOCCCCCCCl HDVSOWKWSQQOJN-UHFFFAOYSA-N 0.000 description 1
- SIDIWXFDZWRPFB-UHFFFAOYSA-N 1-chloro-6-(methoxymethoxy)hexane Chemical compound COCOCCCCCCCl SIDIWXFDZWRPFB-UHFFFAOYSA-N 0.000 description 1
- IPPBKPSSLPVZGR-UHFFFAOYSA-N 1-chloro-8-(ethoxymethoxy)octane Chemical compound CCOCOCCCCCCCCCl IPPBKPSSLPVZGR-UHFFFAOYSA-N 0.000 description 1
- TUDXKUJRYXLOCR-UHFFFAOYSA-N 1-chloro-8-(methoxymethoxy)octane Chemical compound COCOCCCCCCCCCl TUDXKUJRYXLOCR-UHFFFAOYSA-N 0.000 description 1
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 1
- PSBRNCLELQNORP-UHFFFAOYSA-N 12-bromododecoxy(trimethyl)silane Chemical compound C[Si](C)(C)OCCCCCCCCCCCCBr PSBRNCLELQNORP-UHFFFAOYSA-N 0.000 description 1
- ZWCLSNSEWVZETL-UHFFFAOYSA-N 12-bromododecoxy-tri(propan-2-yl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)OCCCCCCCCCCCCBr ZWCLSNSEWVZETL-UHFFFAOYSA-N 0.000 description 1
- XSAQPMHGBPDGAL-UHFFFAOYSA-N 12-bromododecoxymethoxymethylbenzene Chemical compound BrCCCCCCCCCCCCOCOCC1=CC=CC=C1 XSAQPMHGBPDGAL-UHFFFAOYSA-N 0.000 description 1
- FREDAIYFJOTEPG-UHFFFAOYSA-N 12-bromododecyl acetate Chemical compound CC(=O)OCCCCCCCCCCCCBr FREDAIYFJOTEPG-UHFFFAOYSA-N 0.000 description 1
- WTFDVZBZBFUOFV-UHFFFAOYSA-N 12-bromododecyl benzoate Chemical compound BrCCCCCCCCCCCCOC(=O)C1=CC=CC=C1 WTFDVZBZBFUOFV-UHFFFAOYSA-N 0.000 description 1
- MSBMSWLXUMZRQO-UHFFFAOYSA-N 12-chlorododecoxy(trimethyl)silane Chemical compound C[Si](C)(C)OCCCCCCCCCCCCCl MSBMSWLXUMZRQO-UHFFFAOYSA-N 0.000 description 1
- RSWBTDHYLDYEDX-UHFFFAOYSA-N 12-chlorododecoxy-tri(propan-2-yl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)OCCCCCCCCCCCCCl RSWBTDHYLDYEDX-UHFFFAOYSA-N 0.000 description 1
- YJCDOCLLSIEGTL-UHFFFAOYSA-N 12-chlorododecoxymethoxymethylbenzene Chemical compound ClCCCCCCCCCCCCOCOCC1=CC=CC=C1 YJCDOCLLSIEGTL-UHFFFAOYSA-N 0.000 description 1
- RQEURDOLMGSSEM-UHFFFAOYSA-N 12-chlorododecyl acetate Chemical compound CC(=O)OCCCCCCCCCCCCCl RQEURDOLMGSSEM-UHFFFAOYSA-N 0.000 description 1
- IHXIXORBPDEUTJ-UHFFFAOYSA-N 12-chlorododecyl benzoate Chemical compound ClCCCCCCCCCCCCOC(=O)C1=CC=CC=C1 IHXIXORBPDEUTJ-UHFFFAOYSA-N 0.000 description 1
- QKSJDOOUAJHQRY-UHFFFAOYSA-N 2-bromoethoxy(trimethyl)silane Chemical compound C[Si](C)(C)OCCBr QKSJDOOUAJHQRY-UHFFFAOYSA-N 0.000 description 1
- JBKINHFZTVLNEM-UHFFFAOYSA-N 2-bromoethoxy-tert-butyl-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)OCCBr JBKINHFZTVLNEM-UHFFFAOYSA-N 0.000 description 1
- FAQPJPNRNIMAHZ-UHFFFAOYSA-N 2-bromoethoxy-tri(propan-2-yl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)OCCBr FAQPJPNRNIMAHZ-UHFFFAOYSA-N 0.000 description 1
- VZQXOVOENOPPBR-UHFFFAOYSA-N 2-bromoethoxymethoxymethylbenzene Chemical compound BrCCOCOCC1=CC=CC=C1 VZQXOVOENOPPBR-UHFFFAOYSA-N 0.000 description 1
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- ZLYUKHPOYNGSQB-UHFFFAOYSA-N 2-chloroethoxy-tri(propan-2-yl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)OCCCl ZLYUKHPOYNGSQB-UHFFFAOYSA-N 0.000 description 1
- QLZJJGLOUXLASG-UHFFFAOYSA-N 2-chloroethoxymethoxymethylbenzene Chemical compound ClCCOCOCC1=CC=CC=C1 QLZJJGLOUXLASG-UHFFFAOYSA-N 0.000 description 1
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- ANPPGQUFDXLAGY-UHFFFAOYSA-N 2-chloroethyl benzoate Chemical compound ClCCOC(=O)C1=CC=CC=C1 ANPPGQUFDXLAGY-UHFFFAOYSA-N 0.000 description 1
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- HXPGARMAXPAHSN-UHFFFAOYSA-N 4-bromobutoxymethoxymethylbenzene Chemical compound BrCCCCOCOCC1=CC=CC=C1 HXPGARMAXPAHSN-UHFFFAOYSA-N 0.000 description 1
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- RWTUBDJZGQYBSO-UHFFFAOYSA-N 8-chlorooctoxymethoxymethylbenzene Chemical compound ClCCCCCCCCOCOCC1=CC=CC=C1 RWTUBDJZGQYBSO-UHFFFAOYSA-N 0.000 description 1
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- 125000003118 aryl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000000194 supercritical-fluid extraction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MTQPZXNVDIKRAK-UHFFFAOYSA-N tert-butyl-(4-chlorobutoxy)-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)OCCCCCl MTQPZXNVDIKRAK-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
- C07F9/65812—Cyclic phosphazenes [P=N-]n, n>=3
- C07F9/65815—Cyclic phosphazenes [P=N-]n, n>=3 n = 3
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/74—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing phosphorus
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
- G11B5/7257—Perfluoropolyether lubricant
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/04—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/08—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-nitrogen bonds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
- C10N2020/01—Physico-chemical properties
- C10N2020/04—Molecular weight; Molecular weight distribution
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/06—Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/14—Electric or magnetic purposes
- C10N2040/18—Electric or magnetic purposes in connection with recordings on magnetic tape or disc
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/015—Dispersions of solid lubricants
- C10N2050/02—Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/023—Multi-layer lubricant coatings
- C10N2050/025—Multi-layer lubricant coatings in the form of films or sheets
-
- C10N2220/021—
-
- C10N2230/06—
-
- C10N2240/204—
-
- C10N2250/121—
-
- C10N2250/141—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12229—Intermediate article [e.g., blank, etc.]
- Y10T428/12264—Intermediate article [e.g., blank, etc.] having outward flange, gripping means or interlocking feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
Definitions
- Patent Literature 3 JP 2004-352999A
- C 6-10 aryl groups are phenyl, tolyl and isopropylphenyl.
- the recording layer of the magnetic disk i.e., the magnetic layer is composed of mainly elements capable of forming ferromagnetic bodies, such as iron, cobalt or nickel, alloy or oxide containing chromium, platinum or tantalum in addition to such elements. These materials are applied by, e.g., a plating method or a sputtering method.
- the protective layer is formed of carbon, SiC, SiO 2 or the like. The layer is formed by a sputtering method or CVD method.
- Lubricant layers presently available are up to 30 ⁇ in thickness, so that when a lubricant having a viscosity of higher than about 100 mPa ⁇ s at 20° C. is applied as it is, the resulting film is likely to have an excessively large thickness. Accordingly the lubricant for use in coating is used as dissolved in a solvent.
- the film thickness to be obtained is easy to control in the case where the present compound serves singly as a lubricant and also in the case where the compound is used as mixed with other lubricant.
- the concentration varies with the method and conditions of application, mixing ratio, etc.
- the lubricant film of the present invention is preferably 5 to 15 ⁇ in thickness.
- Rf is —CF 2 O(CF 2 CF 2 O) x (CF 2 O) y CF 2 —.
- Rf is —CF 2 CF 2 O(CF 2 CF 2 CF 2 O) z CF 2 CF 2 —.
- Example 1 The procedure of Example 1 was repeated with the exception of using a fluoropolyether (1836 in number average molecular weight, 1.17 in molecular weight distribution) of the formula HOCH 2 —CF 2 CF 2 O(CF 2 CF 2 CF 2 O) z CF 2 CF 2 CH 2 —OH, and using 2-(4-bromobutoxy)-tetrahydro-2H-pyran in place of 2-(2-bromoethoxy)tetrahydro-2H-pyran, whereby 9 g of the desired Lubricant 4 was obtained.
- a fluoropolyether (1836 in number average molecular weight, 1.17 in molecular weight distribution) of the formula HOCH 2 —CF 2 CF 2 O(CF 2 CF 2 CF 2 O) z CF 2 CF 2 CH 2 —OH
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Abstract
wherein n is 2, 3 or 4, m is an integer of 1 to 12, R is C1-4 fluoroalkyl and Rf is —CF2O(CF2CF2O)x(CF2O)yCF2— or —CF2CF2O(CF2CF2CF2O)zCF2CF2— in which x, y and z are each 0 or a positive real number to give a number average molecular weight of 500 to 4000 to a fluoropolyether of the formula HOCH2—Rf—CH2OH including said Rf, the fluoropolyether having a molecular weight distribution (PD) of 1.0 to 1.5.
Description
wherein n is 2, 3 or 4, m is an integer of 1 to 12, R is C1-4 fluoroalkyl and Rf is —CF2O(CF2CF2O)x(CF2O)yCF2— or —CF2CF2O(CF2CF2CF2O)zCF2CF2— in which x, y and z are each 0 or a positive real number to give a number average molecular weight of 500 to 4000 to a fluoropolyether of the formula HOCH2—Rf—CH2OH including said Rf, the fluoropolyether having a molecular weight distribution (PD) of 1.0 to 1.5.
YCmH2mOCH2ORa
(Y is halogen atom, m is an integer of 1 to 12, Ra is C1-10 alkyl, pyrryl, C6-10 aryl or C6-10 aralkyl), ester compound of the formula
YCmH2mOCORb
(Y is halogen atom, m is an integer of 1 to 12, Rb is C1-10 alkyl, C6-10 aryl or C6-10 aralkyl) and silane compound of the formula
YCmH2mOSi(Rc)(Rd)(Re)
(Y is halogen atom, m is an integer of 1 to 12, Rc, Rd and Re are same or different and are each C1-10 alkyl, C6-10 aryl or C6-10 aralkyl).
Bonded ratio (%)=100×b/f
Lubricant retention ratio (%)=100×c/h
TABLE 1 | ||
Lubricant retention | ||
ratio on disk under | ||
Specimen | Bonded ratio(%) | high-speed rotation (%) |
|
92 | 72 |
(Example 1) | ||
Lubricant 2 | 91 | 71 |
(Example 2) | ||
|
95 | 78 |
(Example 3) | ||
|
94 | 77 |
(Example 4) | ||
Lubricant 5 | 15 | 23 |
(Com. Example) | ||
Lubricant 6 | 65 | 50 |
(Com. Example) | ||
Lubricant 7 | 40 | 71 |
(Com. Example) | ||
Ratio of decrease in | Ratio of decrease in | |
weight (wt %) with | weight (wt %) without | |
Specimen | Al2O3 | Al2O3 |
Lubricant 1 | <1 | <1 |
(Example 1) | ||
Lubricant 2 | <1 | <1 |
(Example 2) | ||
|
<1 | <1 |
(Example 3) | ||
|
<1 | <1 |
(Example 4) | ||
Lubricant 5 | 5 | 6 |
(Com. Example) | ||
Lubricant 6 | <1 | <1 |
(Com. Example) | ||
Lubricant 7 | 39 | 26 |
(Com. Example) | ||
TABLE 2 | |||
Specimen | Film thickness (Å) | ||
|
14 | ||
Lubricant 2 | 13 | ||
|
15 | ||
|
14 | ||
Claims (9)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010-101122 | 2010-04-26 | ||
JP2010101122 | 2010-04-26 | ||
PCT/JP2011/060493 WO2011136379A1 (en) | 2010-04-26 | 2011-04-20 | Cyclophosphazene compound, lubricant comprising same, and magnetic disk |
Publications (2)
Publication Number | Publication Date |
---|---|
US20130034749A1 US20130034749A1 (en) | 2013-02-07 |
US8936859B2 true US8936859B2 (en) | 2015-01-20 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/641,508 Expired - Fee Related US8936859B2 (en) | 2010-04-26 | 2011-04-20 | Cyclophosphazene compound, lubricant comprising same, and magnetic disk |
Country Status (4)
Country | Link |
---|---|
US (1) | US8936859B2 (en) |
EP (1) | EP2565198B1 (en) |
JP (1) | JP5771826B2 (en) |
WO (1) | WO2011136379A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US9023922B2 (en) | 2012-05-24 | 2015-05-05 | Sabic Global Technologies B.V. | Flame retardant compositions, articles comprising the same and methods of manufacture thereof |
US9018286B2 (en) | 2012-05-24 | 2015-04-28 | Sabic Global Technologies B.V. | Flame retardant polycarbonate compositions, methods of manufacture thereof and articles comprising the same |
JP2014047190A (en) * | 2012-09-03 | 2014-03-17 | Moresco Corp | Cyclophosphazene compound, lubricant and magnetic disc containing the same |
JP6142915B2 (en) * | 2013-02-13 | 2017-06-07 | 旭硝子株式会社 | Fluorinated ether composition, surface modifier, surfactant, liquid composition, article |
CN105121610A (en) * | 2013-04-15 | 2015-12-02 | 索尔维特殊聚合物意大利有限公司 | Modified hydrogen-based lubricants |
SG11201601009VA (en) | 2013-08-13 | 2016-03-30 | Asahi Glass Co Ltd | Fluorinated polyether compound, lubricant, liquid composition and article |
EP3081570A4 (en) | 2013-12-09 | 2016-10-19 | Moresco Corp | Fluoropolyether compound, and lubricant and magnetic disc using same |
CN106661489B (en) * | 2014-05-16 | 2020-08-21 | 索尔维特殊聚合物意大利有限公司 | Aromatic compounds with hydroxy-substituted (per) fluoropolyether chains |
US12113279B2 (en) | 2020-09-22 | 2024-10-08 | Oti Lumionics Inc. | Device incorporating an IR signal transmissive region |
CA3240373A1 (en) | 2020-12-07 | 2022-06-16 | Michael HELANDER | Patterning a conductive deposited layer using a nucleation inhibiting coating and an underlying metallic coating |
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- 2011-04-20 WO PCT/JP2011/060493 patent/WO2011136379A1/en active Application Filing
- 2011-04-20 EP EP20110775160 patent/EP2565198B1/en not_active Not-in-force
- 2011-04-20 JP JP2012512931A patent/JP5771826B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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EP2565198A1 (en) | 2013-03-06 |
JP5771826B2 (en) | 2015-09-02 |
JPWO2011136379A1 (en) | 2013-07-22 |
WO2011136379A1 (en) | 2011-11-03 |
EP2565198A4 (en) | 2013-03-06 |
EP2565198B1 (en) | 2014-09-10 |
US20130034749A1 (en) | 2013-02-07 |
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