US6330262B1 - Organic semiconductor lasers - Google Patents
Organic semiconductor lasers Download PDFInfo
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- US6330262B1 US6330262B1 US09/073,843 US7384398A US6330262B1 US 6330262 B1 US6330262 B1 US 6330262B1 US 7384398 A US7384398 A US 7384398A US 6330262 B1 US6330262 B1 US 6330262B1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/36—Structure or shape of the active region; Materials used for the active region comprising organic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
- H01S3/0635—Thin film lasers in which light propagates in the plane of the thin film provided with a periodic structure, e.g. using distributed feed-back, grating couplers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/168—Solid materials using an organic dye dispersed in a solid matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/041—Optical pumping
Definitions
- the present invention relates to the field of light emitting devices, in particular, to organic semiconductor lasers.
- the present invention is directed to organic thin film lasers with high efficiency and very low threshold lasing. Both optically- and electrically-pumped embodiments are disclosed.
- the lasers of the present invention make use of novel laser materials for the efficient lasing of various colors.
- the lasers of the present invention general comprise a substrate and a layer of organic material over the substrate.
- the organic material includes host and dopant materials that together result in the laser emission of a desired color when pumped by any means, such as by optical or electrical energy.
- the host material of the organic material comprises carbazole biphenyl (“CBP”).
- CBP carbazole biphenyl
- various dopant materials are used for the lasing of corresponding colors.
- the dopant is coumarin-47, resulting in a lasing wavelength of approximately 460 nm.
- the dopant is perylene, resulting in a lasing wavelength of approximately 485 nm.
- the dopant is coumarin-30, resulting in a lasing wavelength of approximately 510 nm.
- the host material of the organic materials comprises tris-(8-hydroxyquinoline) aluminum.
- the dopant is rhodamine-6G, resulting in a lasing wavelength of approximately 610-625 nm.
- the dopant is DCM, resulting in a lasing wavelength of approximately 615-660 nm.
- the dopant is DCM2, resulting in a lasing wavelength of approximately 655-700 nm.
- the dopant is pyrromethane-546, resulting in a lasing wavelength of approximately 560 nm.
- FIG. 1 shows an arrangement including an embodiment of a laser device according to the present invention.
- FIGS. 2 a - 2 h show the chemical formulae for DCM, Alq 3 CBP, DCM2, rhodamine-6G, coumarin-47, perylene, and pyrromethane-546, respectively.
- FIG. 3 shows an arrangement including an embodiment of a laser device according to the present invention.
- FIG. 4 is a graphical representation of the relationship between peak output power and pump energy density for an embodiment of the present invention.
- FIG. 5 shows the polarization of the emission of an embodiment of the present invention, as a function of the angle between a plane orthogonal to the film surface and the plane of a polarizer.
- FIGS. 6 a and 6 b show electrically-pumped laser device embodiments of the present invention.
- FIG. 7 shows emission spectra for an optically-pumped laser device, in accordance with an embodiment of the present invention.
- the general structure of the optically-pumped OSL device 100 of the present invention is shown in FIG. 1 .
- the OSL device 100 includes a substrate 110 and a waveguiding layer 112 of organic material 112 .
- the organic material of layer 112 includes host and dopant materials, which are deposited by any suitable technique onto substrate 110 .
- the substrate 110 is optionally pre-coated with a cladding layer 111 comprising a material having an index of refraction less than the organic material of layer 112 .
- the cladding layer 111 may not be required, for example, where the substrate 110 is transparent for laser emission.
- the OSL device 100 produces laser beam 116 of a predetermined color.
- one of the desired properties of OSL materials used in layer 112 is the efficient energy transfer between host and dopant organic materials.
- the emission spectrum of the host must overlap with the absorption spectrum of the dopant.
- the optical pump energy is absorbed by the CBP materials within layer 112 .
- This energy is non-radiatively transferred by a dipole-dipole transition to the dopant materials. Because the energy transfer shifts the emission away from the absorption band of the material, it leads to low lasing thresholds and extends the operational lifetime of the OSL.
- CBP CBP
- the CBP is used to cause the efficient laser emission of various colors.
- Other embodiments of the present invention make use of tris-(8-hydroxyquinoline) aluminum (“Alq 3 ”) as organic host material.
- DCM Exciton Inc.
- FIGS. 2 a - 2 h respectively.
- the organic materials used in the present invention are deposited by any suitable technique, such as by vacuum thermal evaporation.
- Layers 111 and 112 are of any suitable thickness.
- layers 111 and 112 in the embodiment shown in FIG. 1 are approximately 2 ⁇ m and 120 nm, respectively.
- the thickness of the cladding layer 111 is preferably chosen to provide optical isolation of the waveguiding layer 112 from the opaque substrate 110 .
- the thickness of the layer 112 is chosen to provide uniform pumping and to optimize the ability of the layer to function as an optical waveguide between the cladding layer 111 and the surrounding environment.
- layer 112 comprises CBP
- cladding layer 111 has an index of refraction less than layer 112 and serves to increase optical confinement in layer 112 in the direction normal to the surface of the device.
- the cladding layer 111 comprises SiO 2 (having a refractive index, “n” of about 1.5) when the layer 112 comprises CBP as host organic material (n ⁇ 1.8).
- layer 112 preferably includes two reflective facets 113 and 114 that are substantially parallel to each other, thereby forming an optical resonator in layer 112 .
- Layers 111 and 112 are deposited onto substrate 110 by any suitable technique, such as by plasma enhanced chemical vapor deposition and vacuum thermal evaporation, respectively.
- concentration of the dopant in the layer 112 is typically less than 10% by mass, but can be as low as 0.01%. It is generally preferred that layer 112 is deposited by thermal co-evaporation of host and dopant materials at a respective mass ratio of approximately 100:1.
- the laser devices of the present invention are grown on any substrate to which the organic layer 112 will adhere and which has a lower index of refraction (n) than the organic layer material.
- Acceptable substrates include plastics, glass and silicon coated with SiO 2 .
- a preferred substrate is polished InP.
- a typical length for a device in accordance with the present invention is 5 mm, although devices of shorter length, such as 0.5 mm, are possible.
- optically smooth, sharp facets 113 and 114 at opposing edges of the layer 112 is a natural advantage of vacuum-deposited films.
- the shape of the facets 113 and 114 mimic the shape of the corresponding facets of the underlying substrate 110 . As such, it is important that the sides of the substrate 110 be smooth and parallel to each other. Facet reflectivities of 7% are obtained via vacuum deposition of layer 112 , which is sufficient to provide the necessary optical feedback.
- Optical feedback is also achieved with other structures, such as an optical grating placed underneath the optically pumped region of the organic film to thereby form a distributed feedback structure.
- layer 112 can be deposited onto the substrate 110 by any other suitable method, and the combination is then cleaved to form smooth, sharp facets.
- the device 100 of the present invention is optically pumped using any light source emitting light of sufficient intensity which can be absorbed by the host material molecular species of layer 112 .
- the device 100 is optically pumped using a nitrogen laser 118 which generates 500 psec pulses with a wavelength of 337 nm at a 50 Hz repetition rate.
- the pump beam is focused, such as by a cylindrical lens 117 , into a stripe 115 on the film surface oriented orthogonal to the facets 113 and 114 .
- the width of the stripe 115 is any suitable dimension, such as 100 ⁇ m, for example.
- the pump beam is waveguided in layer 112 , thereby producing laser beam 116 , which is emitted from the facet 113 and/or 114 of the device 100 .
- FIG. 3 shows an embodiment 200 of an optically-pumped laser in accordance with the present invention in which it is not necessary to form stripe 115 on layer 112 .
- the layer 111 forms a ridge on the substrate 110 on which the layer 112 of organic material is deposited.
- the optical mode is thus confined in both the z- and y-directions.
- the width of the layers 111 and 112 should preferably be narrow enough to support only a single lateral optical mode (e.g., 1-10 ⁇ m).
- the thickness of the active organic layer 112 should be approximately equal to the reciprocal of the absorption coefficient of the host material at the wavelength of the light with which the device is pumped.
- the thickness of the organic layer 112 should be approximately half the reciprocal of the absorption coefficient of the host material at the wavelength of the light with which the device is pumped.
- the device is optionally overcoated with a transparent material (not shown) whose index of refraction is lower than that of the layer 112 .
- FIG. 4 An example of the dependence of the peak output power of device 100 to the pump energy density is shown in FIG. 4 . From this relationship, the lasing threshold is clearly discerned. Each line segment in the graph of FIG. 4 is a linear fit to empirically measured points. The slopes of the two line segments emphasize a change in differential quantum efficiency, from 0.2% (below the lasing threshold) to 10% (above the lasing threshold). It is to be noted, however, that measured differential quantum efficiencies represent a considerable underestimation since the lasing region in an optically pumped gain-guided device is only a small fraction of the material which is being pumped. Hence, most of the pump power is lost in non-lasing regions. The differential quantum efficiency decreases to 7% at excitation levels above 10 ⁇ J/cM 2 (not shown), corresponding to peak output powers exceeding 4 W.
- FIG. 5 shows the intensity of the emission from an embodiment of the present invention, as passing through a polarizer as a function of angle between the plane orthogonal to the film surface and the plane of the polarizer.
- the emission is strongly linearly polarized, as is expected for laser emission.
- the degree of polarization measured is 15 dB, although it should be noted that this result is limited by the measurement arrangement.
- the solid line which is a fit of the empirically measured points, follows sin 2 ( ⁇ ), where a is the polarizer angle.
- the present invention also provides electrically-pumped organic semiconductor laser embodiments. Such embodiments make use of electroluminescent materials that emit light when excited by electric current.
- FIG. 6 a shows a cross-sectional view of an electrically-pumped laser device embodiment of the present invention.
- Device 300 includes a bottom electrode 31 , a bottom cladding layer 32 , an organic active layer 33 , a top cladding layer 34 and a top electrode 35 , which are deposited in sequence over a substrate 30 .
- the degree of optical confinement in the active layer 33 depends on factors such as the indices of refraction of the cladding layers 32 and 34 .
- the active layer 33 comprises any suitable organic electroluminescent material, such as doped Alq 3 .
- Either one of the cladding layers 32 , 34 is composed of a hole conducting material, such as MgF 2 doped with TPD. To get good hole mobility, a 10% concentration of TPD will suffice.
- the other one of the cladding layers is composed of an electron conducting material, such as Alq 3 or MgF 2 doped with Alq 3 .
- the MgF 2 can be replaced with another alkali halide such as LiF, KF or KI or with a transparent, low index of refraction, conducting organic material. Electrons and holes are injected into the active layer 33 where the energy is transferred from the conducting host material to the dopant materials, which emit light.
- An optical resonator is formed by the edges of the film, i.e., mirror facets M 1 and M 2 . At least one of the electrodes 31 and 35 is patterned into a stripe oriented in the x-direction. That portion of the active material which is electrically pumped experiences a change in optical gain, thus forming a waveguide in the lateral direction (i.e., the gain-guiding effect).
- the index of refraction of the active layer 33 is preferably higher than that of the cladding layers 32 and 34 . This ensures that most of the mode overlaps with the gain layer.
- the indices of refraction of the cladding layers 32 and 34 should be substantially equal to provide optimal optical confinement.
- the cladding layers 32 and 34 should be thick enough to substantially prevent absorption of the optical mode at the electrodes 31 and 35 and to allow for efficient current injection.
- the thicknesses of the cladding layers can be determined in a known manner.
- the thickness of the active layer 33 should be substantially equal to the lasing wavelength divided by twice the index of refraction of the active layer.
- the thickness of the active layer 33 should be accordingly greater.
- Optical confinement is also achieved by photo-bleaching the active layer 33 to define a waveguide in the active layer.
- a photomask is applied which partially covers the active layer 33 and the layer is exposed to intense UV light in an O 2 environment.
- the unmasked portions of the active layer 33 are thus bleached, lowering their index of refraction.
- the masked portion of the active layer 33 retains its original, higher index of refraction and is thus optically confined in a lateral direction.
- Optical confinement is also achieved by patterning the substrate or bottom cladding layer to achieve index guiding.
- photo-bleaching can be used on the bottom cladding layer 32 to create an index modulated distributed Bragg reflector under the active layer 33 .
- An optical resonator is optionally formed in the z-direction.
- the top and bottom electrodes also serve as optical mirrors, or, if the electrodes are transparent to light, high reflectivity mirrors can be added on both sides of the structure.
- the maximum of the optical mode of this structure should spatially match the position of the optical layer. Furthermore, the wavelength of the optical mode should overlap with the gain spectrum of the dopant material.
- FIG. 6 b shows a further embodiment of an electrically-pumped laser device in accordance with the present invention.
- the bottom electrode 31 extends beyond the laser structure so as to provide a contact surface.
- an insulator 37 is provided on a side of the laser structure and a contact 36 extending from the upper electrode 35 to the surface of the substrate 30 is deposited on the insulator.
- An OSL was formed by vacuum-depositing a 120 nm organic film containing perylene-doped CBP onto the ( 100 ) crystallographic surface of a polished InP substrate.
- the substrate was pre-coated with a 2 ⁇ m layer of SiO 2 , deposited by plasma enhanced chemical vapor deposition.
- the inset in FIG. 7 shows the output pulse energy of the OSL as a function of pump pulse energy, clearly indicating the presence of a lasing threshold at a pump pulse energy of 5 nJ (which corresponds to an energy density of 5 ⁇ J/cm 2 .
- the OSL exhibited an operational lifetime in excess of 10 5 laser pulses.
- An OSL was formed by vacuum-depositing an organic film containing coumarin-47-doped CBP onto the ( 100 ) crystallographic surface of a polished InP substrate.
- the substrate was pre-coated with a 2 ⁇ m layer of SiO 2 , deposited by plasma enhanced chemical vapor deposition.
- the optically-pumped OSL resulted in a lasing wavelength of approximately 455 nm and a lasing threshold of 15 ⁇ J/cm 2 . Moreover, the OSL exhibited an operational lifetime on the order of 10 3 laser pulses.
- An OSL was formed by vacuum-depositing an organic film containing coumarin-30-doped CBP onto the ( 100 ) crystallographic surface of a polished InP substrate.
- the substrate was pre-coated with a 2 ⁇ m layer of Sio 2 , deposited by plasma enhanced chemical vapor deposition.
- the optically-pumped OSL resulted in a lasing wavelength of approximately 510 nm and a lasing threshold of 13 ⁇ J/cm 2 . Moreover, the OSL exhibited an operational lifetime on the order of 10 2 laser pulses.
- An OSL was formed by vacuum-depositing an organic film containing DCM2-doped Alq 3 onto a polished InP substrate.
- the substrate was pre-coated with a 2 ⁇ m layer of SiO 2 , deposited by plasma enhanced chemical vapor deposition.
- the optically-pumped OSL resulted in a lasing wavelength of approximately 670 nm and a lasing threshold of 2.5 ⁇ J/cm 2 . Moreover, the OSL exhibited an operational lifetime in excess of 10 6 laser pulses and a differential quantum efficiency of approximately 30%.
- An OSL was formed by vacuum-depositing an organic film containing DCM-doped Alq 3 onto a polished InP substrate.
- the substrate was pre-coated with a 2 ⁇ m layer of SiO 2 , deposited by plasma enhanced chemical vapor deposition.
- the optically-pumped OSL resulted in a lasing wavelength of approximately 650 nm and a lasing threshold of approximately 3 ⁇ J/cm 2 . Moreover, the OSL exhibited an operational lifetime in excess of 10 6 laser pulses and a differential quantum efficiency of approximately 30%.
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Abstract
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Claims (38)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/073,843 US6330262B1 (en) | 1997-05-09 | 1998-05-07 | Organic semiconductor lasers |
PCT/US1998/009480 WO1998050989A2 (en) | 1997-05-09 | 1998-05-08 | Organic lasers |
JP54855798A JP4289512B2 (en) | 1997-05-09 | 1998-05-08 | Organic laser |
EP98922166A EP0980595B1 (en) | 1997-05-09 | 1998-05-08 | Organic lasers |
AT98922166T ATE281011T1 (en) | 1997-05-09 | 1998-05-08 | ORGANIC LASERS |
DE69827246T DE69827246T2 (en) | 1997-05-09 | 1998-05-08 | ORGANIC LASER |
JP2008324625A JP5726399B2 (en) | 1997-05-09 | 2008-12-19 | Organic laser |
Applications Claiming Priority (2)
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US4606197P | 1997-05-09 | 1997-05-09 | |
US09/073,843 US6330262B1 (en) | 1997-05-09 | 1998-05-07 | Organic semiconductor lasers |
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Cited By (23)
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US20020051479A1 (en) * | 2000-11-02 | 2002-05-02 | Mitsubishi Denki Kabushiki Kaisha | Solid state laser device and solid state laser device system |
US6498802B1 (en) * | 1999-12-02 | 2002-12-24 | Electronics And Telecommunications Research Institute | Organic micro-cavity laser |
US6529539B1 (en) * | 1998-03-17 | 2003-03-04 | Hitachi, Ltd. | Molecular light emission device |
US6621840B2 (en) * | 2000-03-22 | 2003-09-16 | Fuji Photo Film Co., Ltd. | Organic light-emitting device |
US20030206145A1 (en) * | 2002-05-02 | 2003-11-06 | Eastman Kodak Company | Scanned display systems using color laser light sources |
US20040090599A1 (en) * | 2002-10-16 | 2004-05-13 | Eastman Kodak Company | Light modulation apparatus using a VCSEL array with an electromechanical grating device |
US20040213308A1 (en) * | 2003-04-23 | 2004-10-28 | Hiroko Abe | Laser oscillator |
US20050008052A1 (en) * | 2003-07-01 | 2005-01-13 | Ryoji Nomura | Light-emitting device |
US20050025025A1 (en) * | 2003-06-30 | 2005-02-03 | Ryoji Nomura | Optical pick-up device |
US20050277234A1 (en) * | 2003-04-15 | 2005-12-15 | Erik Brandon | Flexible carbon-based ohmic contacts for organic transistors |
US20070086180A1 (en) * | 2005-03-28 | 2007-04-19 | Fuji Photo Film Co., Ltd. | Light emitting apparatus and light emitting method |
US20070185386A1 (en) * | 2006-02-07 | 2007-08-09 | Eric Cheng | Medical device light source |
US20080067530A1 (en) * | 2006-08-29 | 2008-03-20 | Stephen Forrest | Organic laser |
EP1906497A1 (en) * | 2006-09-27 | 2008-04-02 | OSRAM Opto Semiconductors GmbH | Semi-conductor laser device and method for its manufacture |
DE102007002303A1 (en) * | 2006-09-27 | 2008-04-03 | Osram Opto Semiconductors Gmbh | Semiconductor laser device, has monolithically integrated pump radiation source for optical pumping of vertical emitter and arranged for emitting pumping radiation, where emitter has layer which contains organic material |
EP1950855A1 (en) * | 2007-01-25 | 2008-07-30 | OSRAM Opto Semiconductors GmbH | Organic semiconductor laser and method for its production |
US20090012367A1 (en) * | 2003-12-17 | 2009-01-08 | Boston Scientific Scimed, Inc. | Medical device with oled illumination light source |
US20090052491A1 (en) * | 2003-06-27 | 2009-02-26 | Semiconductor Energy Laboratory Co., Ltd. | Organic laser apparatus |
US20090323747A1 (en) * | 2005-09-06 | 2009-12-31 | Hajime Nakanotani | Organic solid-state dye laser |
US20100142582A1 (en) * | 2008-10-21 | 2010-06-10 | Sandstrom Richard L | Gas discharge laser chamber |
US20150303651A1 (en) * | 2013-10-18 | 2015-10-22 | Bae Systems Information And Electronic Systems Integration Inc. | Ultra fast semiconductor laser |
KR20160024686A (en) * | 2014-08-26 | 2016-03-07 | 삼성전자주식회사 | Organic photoelectronic device and image sensor |
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