US5837169A - Creation of bragg reflactive gratings in waveguides - Google Patents
Creation of bragg reflactive gratings in waveguides Download PDFInfo
- Publication number
- US5837169A US5837169A US08/752,699 US75269996A US5837169A US 5837169 A US5837169 A US 5837169A US 75269996 A US75269996 A US 75269996A US 5837169 A US5837169 A US 5837169A
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- United States
- Prior art keywords
- section
- mask
- writing
- grating
- optical waveguide
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- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
- G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
- G02B6/02095—Long period gratings, i.e. transmission gratings coupling light between core and cladding modes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
- G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02152—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
Definitions
- This invention relates to the creation of Bragg reflective gratings in optical waveguides, typically optical fibre waveguides, by irradiation, typically irradiation with ultra-violet light, through a mask, typically a phase mask, or alternatively by holographic means.
- a mask typically a phase mask
- holographic means One particular application for such reflective gratings is for chromatic dispersion equalisation in optical transmission systems. Such a use is described in the specification of U.S. Pat. No. 4,953,939.
- Bragg reflective gratings require a grating length which is longer than it is convenient to make a single mask for creating such a grating. There may, for instance, be a requirement to make a Bragg grating in the region of a meter long, whereas there are considerable difficulties in making an electron-beam fabricated mask much longer than about one hundred millimeters.
- a solution that has been proposed for overcoming this problem is to create the long grating step-wise in a success of sections arranged end-to-end. Each section, except for the first to be created section, is created to commence at, or just beyond, the end of the next previously created section.
- the long grating is designed for use in a wavelength division multiplexed (WDM) environment in which each section has a spectral bandwidth covering the whole spectrum of a single channel of the WDM signal, then it may be possible to arrange matters such that the reflection bands of the individual sections of the grating are spectrally separated by guard bands lying entirely within the spectral guard bands that separate the individual channels of the WDM signal. Under these circumstances any physical separation between adjacent sections of the grating is largely immaterial.
- WDM wavelength division multiplexed
- a drawback to this approach to lining up the sections is that it specifically requires a spacing between adjacent sections, and hence the delay time, the time taken by light of any particular wavelength to propagate from one end of the waveguide containing the Bragg grating to its point of reflection and back to the same end, is not a smoothly varying function of wavelength, but a function that contains as many steps, or more complicated discontinuities, as there are spaces between adjacent sections of grating, the delay in these discontinuous regions being affected by Fabry Perot type resonance effects between components of the same wavelength being reflected by the two adjacent grating sections.
- the present invention is directed to a method of lining up the sections of an optical waveguide Bragg reflective grating as it is created section-by-section, the method having the particular property that it does not require there to be any spacing between adjacent sections that allows their direct abutment.
- the method of the invention relies upon the fact that the irradiation, that is employed to create a fringe pattern of refractive index (real part) changes in the waveguide that co-operate to form the Bragg reflective grating, does not change exclusively the real part of the refractive index, but changes also the imaginary part, i.e. produces a concomitant optical absorption fringe pattern.
- the method of the present invention makes use of this fact to provide a method of aligning a mask ready for creating a specific section of the Bragg grating relative an adjacent section of the grating that has already been created.
- the mask is provided with an overlap portion that creates a fringe pattern with a periodicity that effectively matches a corresponding adjacent end portion of the already created adjacent grating section.
- This overlap portion is used only for mask alignment purposes, and is not irradiated when the mask is actually being used to create its corresponding section of the Bragg grating.
- the alignment process involves projecting light through the series combination of the overlap portion of the mask and the adjacent end portion of the already created adjacent grating section. This light should be at a wavelength that is differentially absorbed by the optical absorption fringe pattern present in the already created adjacent grating section, but should be of an intensity low enough to enable the alignment process to be completed without risk of significant photorefractive effect disturbance of that fringe pattern.
- the bright portions of the fringes created by its alignment portion are precisely aligned with the least absorbing regions of the optical absorption fringe pattern present in the corresponding already created section of the Bragg grating, and hence the transmission of the projected light is at a maximum. If the fringe patterns were to both to have the same uniform pitch, then the transmission would be cyclically modulated between a maximum value and a minimum value as the mask and grating are moved progressively further out of precise registry with each other. If the fringe patterns were to have the same uniformly chirped pitch there would be a principal maximum associated with perfect registry, and progressively reduced magnitude maxima with increasing departure from perfect registry.
- the mask is a phase mask designed so as to minimise power launch into the zero diffraction order, in which case the transmission is monitored by locating a photodetector to collect light launched into another diffraction order, typically the first.
- FIG. 1 is a schematic diagram of the apparatus employed to create the Bragg reflective grating
- FIG. 2 is a schematic diagram of the grating
- FIGS. 3 to 5 are scrap views of a portion of the fibre during successive stages of the creation of a section of the Bragg reflective grating within it.
- FIGS. 6 to 8 illustrate the alignment procedure employed to align a mask employed for creating the next adjacent section of the Bragg reflective grating.
- a portion of a length 11 of single mode optical fibre in which the grating is to be created is lightly tensioned between two supports 12 and 13 so as to be almost in contact with a phase grating 10a, which is oriented so that its grating lines extend transversely of the fibre axis, preferably at right angles to that axis.
- An argon ion laser 14 providing a frequency doubled ultraviolet light output at 244 nm has this output directed on to the phase grating 10a via a telescope 15, an aperture 16, a mirror 17 and a cylindrical lens 18.
- the mirror 15 is attached to a stepper drive 19 by means of which the mirror can be translated in a controlled manner in the axial direction of the fibre 11 so as to track the light beam across the phase grating 10a in the axial direction of the fibre 11.
- the phase mask 10a is a phase contrast diffraction grating created in a thin sheet of silica.
- the silica sheet was coated with a layer of chromium that was itself patterned by electron beam lithography to form a mask for reactive ion etching of the underlying silica.
- the depth of the etch was chosen to suppress the zero order diffraction of light normally incident upon the phase mask.
- the laser has a cw output of approximately 100 mW at 244 nm, of which approximately half is concentrated by the optical system at the phase mask in a substantially rectangular zone measuring approximately 3 mm by 150 ⁇ m with its long axis aligned with the fibre axis.
- the pitch of the grating is not uniform, but is monotonically chirped from one end to the other as schematically represented by the lines 20 in the diagram of FIG. 2.
- a different one of a set of masks is used for the creation of each section.
- this set has been represented in FIG. 2 as the set of six masks 10a to 10f.
- mask 10a is employed to create the lines 20 in the range from a to b for creating those in the range b to c, and so on.
- Mask 10a covers the range from a to b, but each of the other masks 10b to 10f covers a range that also extends over a portion of the preceding range.
- mask 10b covers the range b to c, the range that it writes into the fibre, but also the portion b' to b of the range a to b written using mask 10a. It is this portion b' to b, and the corresponding portions c' to c, d' to d, e' to e and f' to f that, according to the method of this invention, are used for alignment purposes.
- phase masks which, instead of being smoothly graded in pitch, were step-graded, typically with between two- and three-hundred steps. Within each step the pitch is constant, but there is a smooth progression of pitch from step to step within phase mask from one end to the other.
- the precision of the E-beam was sufficient to preclude indexing problems between the component steps of any individual phase mask.
- FIG. 2 shows the masks 10a to 10f arranged in echelon but, when each is actually being used for creating its associated section of Bragg grating, it is in the same close-spaced relationship with the fibre 11 as described earlier with particular reference to FIG. 1 concerning the positional relationship between mask 10a and fibre 11.
- each mask 10b to 10f is placed, in its turn, in the position formerly occupied by mask 10a, and the fibre 11 is indexed along in its axial direction by approximately the required amount to obtain the requisite alignment between this mask and the Bragg grating already created in the fibre 11.
- indexing can achieve an accuracy of typically about 1 to 2 ⁇ m, but a greater precision is required.
- This is achieved by following the dead-reckoning indexing by a fine adjustment of relative position.
- This fine adjustment is achieved using a high precision translation stage 21 (FIG. 1), for instance a piezo-electric or electrostrictive translation stage, to which either the mask is mounted, or the fibre supports 12 and 13.
- FIG. 1 depicts the fibre supports 12 and 13 as being mounted on the translation stage.
- FIGS. 3 to 8 depict a portion of the fibre 11 lying between b' and b of FIG. 2.
- FIG. 3 shows a portion of the fibre 11, with its doped core 11a, and also a portion of the mask 10a in position preparatory for creating a section of Bragg reflective grating in the fibre 11.
- FIG. 4 depicts the actual creation of that section of grating. This is achieved by directing the intense ultraviolet light from laser 14 through the mask 10a to form a fringe pattern of intense spots 23 of light which, by the photorefractive effect produce corresponding volumes of increased refractive index and reduced absorption in the core 11a.
- FIG. 5 depicts the fibre 11 after removal of mask 10a.
- FIG. 6 depicts the situation once mask 10b has been index into approximately correct position relative the fibre, and while a portion of the region of mask 10b lying between b' and b is illuminated with interrogation illumination to produce a fringe pattern of spots 25 of light. This region of the mask 10b is an exact replica of the region of mask 10a lying between b' and b.
- the relative disposition of the enhanced index, reduced absorption volumes 24, which exactly matches the relative disposition of the fringe pattern of intense spots 23 produced by mask 10a, is itself exactly matched by the relative disposition of the fringe pattern of spots 25 produced by mask 10b.
- the region lying between b' and b may typically and conveniently comprise a single one of those steps.
- the interrogation illumination to produce the fringe pattern of spots 25 must be of a wavelength and intensity that does not produce any significant photorefractive effect changes of its own upon the fibre 11, but on the other hand must be at a wavelength for which there is differential absorption, i.e. for which the absorption presented to it by the volumes 24 of reduced absorption differs noticeably from that presented to it by the intervening regions of core 11 a.
- a wavelength for which there is differential absorption i.e. for which the absorption presented to it by the volumes 24 of reduced absorption differs noticeably from that presented to it by the intervening regions of core 11 a.
- the interrogation spots 25 will be lined up, as depicted in FIG. 6, with the higher absorption regions lying between adjacent reduced absorption regions 24. If it missed by approximately a quarter of a fringe period, the situation would be as depicted in FIG. 7, with the interrogation spots 25 only half registering with that reduced absorption regions 24. If it fortuitously provided the exactly required alignment, then the interrogation spots 25 would be fully registered with the reduced absorption regions 24, as depicted in FIG. 8.
- the piezo-electric translation stage 21 is therefore operated to cycle the relative positioning of mask 10b and fibre 11 while at the same time monitoring the output of a photodetector 22 (FIG. 1) positioned to intercept a portion of this transmitted light. Because the mask 10b has been designed to suppress zero order diffracted light, the photodetector 22 is preferably placed in a position to intercept first order diffracted light.
- the piezo-electric translation stage is then set to the position corresponding to the maximum output of the photodetector 22 and, while this position is maintained, the second section of the grating, the section from b to c is created in fibre 11.
- the portion of the grating from b' to b, having already been written (created) using mask 10a is not overwritten using mask 10b, and hence the corresponding portion of the mask 10b may itself be masked during the writing of the section from b to c.
- a chopper-blade (not shown) temporarily in the path of the light between the laser 14 and telescope 15 so that a phase-locked loop detection system may be employed for detecting the portion of light intercepted by the photodetector 22.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (9)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/752,699 US5837169A (en) | 1996-11-19 | 1996-11-19 | Creation of bragg reflactive gratings in waveguides |
US08/856,959 US5945261A (en) | 1996-11-19 | 1997-05-15 | Creation of Bragg reflective gratings in waveguides |
EP97308007A EP0843186B1 (en) | 1996-11-19 | 1997-10-10 | Creation of Bragg reflective gratings in waveguides |
DE69709039T DE69709039T2 (en) | 1996-11-19 | 1997-10-10 | Manufacture of Bragg reflection gratings in waveguides |
CA002219530A CA2219530C (en) | 1996-11-19 | 1997-10-22 | Creation of bragg reflective gratings in waveguides |
JP9316940A JPH10239537A (en) | 1996-11-19 | 1997-11-18 | Method for preparing bragg reflection grating in wave guide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/752,699 US5837169A (en) | 1996-11-19 | 1996-11-19 | Creation of bragg reflactive gratings in waveguides |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/856,959 Continuation-In-Part US5945261A (en) | 1996-11-19 | 1997-05-15 | Creation of Bragg reflective gratings in waveguides |
Publications (1)
Publication Number | Publication Date |
---|---|
US5837169A true US5837169A (en) | 1998-11-17 |
Family
ID=25027412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/752,699 Expired - Fee Related US5837169A (en) | 1996-11-19 | 1996-11-19 | Creation of bragg reflactive gratings in waveguides |
Country Status (5)
Country | Link |
---|---|
US (1) | US5837169A (en) |
EP (1) | EP0843186B1 (en) |
JP (1) | JPH10239537A (en) |
CA (1) | CA2219530C (en) |
DE (1) | DE69709039T2 (en) |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000026703A1 (en) * | 1998-10-30 | 2000-05-11 | Corning Incorporated | Wavelength tuning of photo-induced gratings |
US6072926A (en) * | 1995-05-16 | 2000-06-06 | Cole; Martin | Optical waveguide grating |
WO2000043817A1 (en) * | 1999-01-20 | 2000-07-27 | Nu-Wave Photonics Inc. | Optical waveguides, optical circuits and method and apparatus for producing optical waveguides and optical circuits |
AU728779B2 (en) * | 1997-05-15 | 2001-01-18 | Nortel Networks Corporation | Creation of Bragg reflective gratings in waveguides |
US6275331B1 (en) | 1999-06-30 | 2001-08-14 | Nortel Networks Limited | Optical amplifiers |
US6310996B1 (en) * | 1997-09-22 | 2001-10-30 | Nortel Networks Limited | Writing Bragg gratings in optical waveguides |
US6347171B1 (en) | 1999-03-31 | 2002-02-12 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming a diffraction grating |
US6438287B1 (en) | 1999-06-23 | 2002-08-20 | Nortel Networks Limited | Dispersion compensation |
WO2003003084A1 (en) * | 2001-06-27 | 2003-01-09 | Japan Science And Technology Corporation | Method of producing optical fiber grating and production device therefor |
US20030142915A1 (en) * | 2001-07-26 | 2003-07-31 | Paul Lefebvre | Method and apparatus for aligning a waveguide with a radiation source |
US20030174947A1 (en) * | 2002-03-15 | 2003-09-18 | Sweetser John N. | Method and apparatus for fabricating a waveguide bragg grating using pulsed light |
US6690685B1 (en) * | 1999-09-29 | 2004-02-10 | Corning O.T.I., Spa | Method for producing a fiber laser |
US20040173921A1 (en) * | 2003-03-07 | 2004-09-09 | Konica Minolta Holdings, Inc. | Electron beam depicting method, production method of mother die, mother die, production method of metallic mold, metallic mold, optical element and electron beam depicting apparatus |
US6800401B2 (en) | 2000-04-27 | 2004-10-05 | Petersen Advanced Lithography, Inc. | Method for phase shift mask design, fabrication, and use |
US6832023B1 (en) * | 2000-05-19 | 2004-12-14 | Georgia Tech Research Corporation | Optical fiber gratings with azimuthal refractive index perturbation, method of fabrication, and devices for tuning, attenuating, switching, and modulating optical signals |
US20060044539A1 (en) * | 2004-08-27 | 2006-03-02 | Asml Holding N.V. | Adjustable resolution interferometric lithography system |
US20060127031A1 (en) * | 2002-09-06 | 2006-06-15 | Charles Harry K Jr | Transitions in refractive index using electro-optic polymers |
US8520176B2 (en) | 2011-02-01 | 2013-08-27 | Industrial Technology Research Institute | Stereoscopic display module, method for manufacturing the same and manufacturing system thereof |
US9897433B2 (en) * | 2015-10-30 | 2018-02-20 | KLA—Tencor Corporation | Method and system for regional phase unwrapping with pattern-assisted correction |
US10976487B2 (en) | 2016-03-25 | 2021-04-13 | Fujikura Ltd. | Manufacturing device and manufacturing method of optical fiber grating |
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US6035083A (en) * | 1997-10-02 | 2000-03-07 | 3M Innovative Company | Method for writing arbitrary index perturbations in a wave-guiding structure |
US6728444B2 (en) | 1997-10-02 | 2004-04-27 | 3M Innovative Properties Company | Fabrication of chirped fiber bragg gratings of any desired bandwidth using frequency modulation |
US6160261A (en) * | 1998-01-20 | 2000-12-12 | Hoshino; Hiroyuki | Method for producing chired in-fiber Bragg grating |
AUPP381698A0 (en) * | 1998-05-29 | 1998-06-25 | University Of Sydney, The | Electro-, magneto- or acousto- optically controlled UV writing set up for bragg grating fabrication |
AUPP425898A0 (en) | 1998-06-22 | 1998-07-16 | University Of Sydney, The | An improved grating writing system |
GB2365992B (en) | 2000-08-14 | 2002-09-11 | Univ Southampton | Compound glass optical fibres |
US6803335B2 (en) | 2001-08-03 | 2004-10-12 | The University Of Southampton | Gallium lanthanum sulfide glasses and optical waveguides and devices using such glasses |
JP4222141B2 (en) * | 2003-07-25 | 2009-02-12 | 沖電気工業株式会社 | Manufacturing method and manufacturing apparatus for superstructure fiber Bragg grating |
CN109739027B (en) * | 2019-01-16 | 2021-07-27 | 北京华捷艾米科技有限公司 | Dot Matrix Projection Module and Depth Camera |
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-
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- 1997-10-10 DE DE69709039T patent/DE69709039T2/en not_active Expired - Fee Related
- 1997-10-10 EP EP97308007A patent/EP0843186B1/en not_active Expired - Lifetime
- 1997-10-22 CA CA002219530A patent/CA2219530C/en not_active Expired - Fee Related
- 1997-11-18 JP JP9316940A patent/JPH10239537A/en active Pending
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US6072926A (en) * | 1995-05-16 | 2000-06-06 | Cole; Martin | Optical waveguide grating |
AU728779B2 (en) * | 1997-05-15 | 2001-01-18 | Nortel Networks Corporation | Creation of Bragg reflective gratings in waveguides |
US6310996B1 (en) * | 1997-09-22 | 2001-10-30 | Nortel Networks Limited | Writing Bragg gratings in optical waveguides |
WO2000026703A1 (en) * | 1998-10-30 | 2000-05-11 | Corning Incorporated | Wavelength tuning of photo-induced gratings |
US6269208B1 (en) * | 1998-10-30 | 2001-07-31 | Corning Incorporated | Wavelength tuning of photo-induced gratings |
US6429932B1 (en) | 1999-01-20 | 2002-08-06 | Nu-Wave Photonics Inc. | Optical waveguides, optical circuits and method and apparatus for producing optical waveguides and optical circuits |
WO2000043817A1 (en) * | 1999-01-20 | 2000-07-27 | Nu-Wave Photonics Inc. | Optical waveguides, optical circuits and method and apparatus for producing optical waveguides and optical circuits |
US6347171B1 (en) | 1999-03-31 | 2002-02-12 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming a diffraction grating |
US6438287B1 (en) | 1999-06-23 | 2002-08-20 | Nortel Networks Limited | Dispersion compensation |
US6275331B1 (en) | 1999-06-30 | 2001-08-14 | Nortel Networks Limited | Optical amplifiers |
US6690685B1 (en) * | 1999-09-29 | 2004-02-10 | Corning O.T.I., Spa | Method for producing a fiber laser |
US6800401B2 (en) | 2000-04-27 | 2004-10-05 | Petersen Advanced Lithography, Inc. | Method for phase shift mask design, fabrication, and use |
US6832023B1 (en) * | 2000-05-19 | 2004-12-14 | Georgia Tech Research Corporation | Optical fiber gratings with azimuthal refractive index perturbation, method of fabrication, and devices for tuning, attenuating, switching, and modulating optical signals |
WO2003003084A1 (en) * | 2001-06-27 | 2003-01-09 | Japan Science And Technology Corporation | Method of producing optical fiber grating and production device therefor |
US6973237B2 (en) | 2001-06-27 | 2005-12-06 | Japen Science And Technology Agency | Method of producing optical fiber grating and production device therefor |
US20040218859A1 (en) * | 2001-06-27 | 2004-11-04 | Shinji Yamashita | Method of producing optical fiber grating and production device therefor |
US6778741B2 (en) | 2001-07-26 | 2004-08-17 | Lxsix Photonics Inc. | Method and apparatus for aligning a waveguide with a radiation source |
US20030142915A1 (en) * | 2001-07-26 | 2003-07-31 | Paul Lefebvre | Method and apparatus for aligning a waveguide with a radiation source |
US20030174947A1 (en) * | 2002-03-15 | 2003-09-18 | Sweetser John N. | Method and apparatus for fabricating a waveguide bragg grating using pulsed light |
US6975794B2 (en) * | 2002-03-15 | 2005-12-13 | Intel Corporation | Method and apparatus for fabricating a waveguide Bragg grating using pulsed light |
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Also Published As
Publication number | Publication date |
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EP0843186B1 (en) | 2001-12-12 |
CA2219530C (en) | 2001-02-20 |
JPH10239537A (en) | 1998-09-11 |
DE69709039D1 (en) | 2002-01-24 |
DE69709039T2 (en) | 2002-05-02 |
EP0843186A1 (en) | 1998-05-20 |
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