US5201114A - Analytic method for use in electronic circuit assembly operations - Google Patents
Analytic method for use in electronic circuit assembly operations Download PDFInfo
- Publication number
- US5201114A US5201114A US07/864,821 US86482192A US5201114A US 5201114 A US5201114 A US 5201114A US 86482192 A US86482192 A US 86482192A US 5201114 A US5201114 A US 5201114A
- Authority
- US
- United States
- Prior art keywords
- solder
- cleaning operation
- residue
- flux residue
- solder flux
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/163—Monitoring a manufacturing process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S210/00—Liquid purification or separation
- Y10S210/902—Materials removed
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49144—Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion
Definitions
- This invention relates to methods for assembling electronic circuit devices and, more particularly, to methods for monitoring the quantity of any rosin flux residue left on a circuit assembly after a cleaning operation.
- a key step in the assembly of electronic systems is the attachment and interconnection of electronic devices to bonding pads of a circuit pattern defined on a substrate which can be, for example, ceramic, silicon or FR-4 epoxy.
- solder elements are formed on the bonding pads of the substrate.
- a bonding pad array of the electronic device to be bonded to the substrate is contacted to the solder elements.
- a flux, such as rosin, is required for bonding.
- the assembly is then heated to a temperature sufficient to reflow or melt the solder to effect a bond between the arrays of bonding pads which, after the solder is hardened, constitutes both an electrical interconnection and a structural bond.
- the rosin flux is required to assure a dependable solder bond and, after the solder has been hardened, rosin flux residue is normally cleaned from the electronic assembly.
- the accuracy of detection of the quantity of rosin flux residue left on a patterned substrate after a cleaning operation is improved by using gel permeation chromatography for such detection.
- FIG. 1 is a schematic sectional view of part of a patterned substrate to which contacts of an electronic device are to be bonded;
- FIG. 2 is a schematic view of the apparatus of FIG. 1 at a subsequent stage of assembly
- FIG. 3 is a schematic view of apparatus for extracting residue from an electronic assembly such as that shown in FIG. 2;
- FIG. 4 is a schematic view of gel permeation chromatography apparatus used for analyzing residue-containing solvent taken from the apparatus of FIG. 3;
- FIG. 5 is an example of a chromatograph of the type that can be made by the apparatus of FIG. 4;
- FIG. 6 is a graph showing the relationship of area of the chromatogram of FIG. 5 to the quantity of residue contained on an electronic assembly.
- FIG. 1 there is shown a schematic view of a patterned substrate 11, which can be, for example, ceramic, silicon or FR-4 epoxy containing on an upper surface a conductive pattern including conductive bonding pads 12. It is desired to interconnect and bond an electronic device 13 to the substrate by attaching bonding pads 14 of the electronic device to matching bonding pads 12 of the substrate. As is known in the art, this can be accomplished by applying layers 15 of solder to bonding pads 12 and then applying a layer 16 of rosin flux over the solder layers 15. As shown in FIG. 2, the rosin flux 16 aids in the formation of a dependable solder bond between each matching pair of bonding pads.
- solder bonds are made by bringing the bonding pads 14 into contact with the solder layers 15 and then heating the assembly to reflow or to partially melt the solder layer. With the proper application of heat and pressure, the bonding pads 14 are reliably solder bonded to bonding pads 12 by way of solder interconnections which constitute both electrical conductors and structural elements of the final assembly.
- the soldering operation normally leaves solder flux residue 18 on the assembly which may be removed using any of a variety of known cleaning techniques.
- the cleaning operation should be periodically monitored to make sure that residue left on the assembly after the cleaning operation is below some tolerable maximum.
- each hundredth electronic assembly in a succession that are assembled and cleaned may be subjected to analysis to determine that the cleaning has been sufficiently thorough.
- residue not exceed a specified maximum to prevent possible malfunction due, for example, to static electronic effects and the like. If the maximum is exceeded, the cleaning operation is adjusted to make cleaning more thorough.
- FIG. 3 After cleaning, the first step in the analysis of residue is shown in FIG. 3 in which an electronic assembly comprising a patterned substrate 11 and a plurality of electronic devices 13 is placed within an ultrasonic bath containing a solvent 20.
- the solvent is excited by an ultrasonic source 21 that aids in the extraction of minute particles of rosin flux residue that may be left on the assembly after the cleaning operation.
- the solvent 20 is analyzed to determine the quantity of residue removed, thereby to determine whether the cleaning operation meets specifications.
- solvent 20 is analyzed by processes such as High Performance Liquid Chromatography (HPLC), which we have determined to be significantly less reliable for such purposes than was previously thought to be the case.
- HPLC High Performance Liquid Chromatography
- the residue-containing solvent 20 of FIG. 3 is analyzed by the gel permeation chromatography (GPC) apparatus illustrated in FIG. 4.
- the solvent 20 or a dilution of the solvent is introduced into a sampling injector 27 as indicated by the arrow.
- the sampling injector mixes the solvent with a liquid from a reservoir 22; the liquid is referred to as the mobile phase or the carrier and may, for example, be liquid tetrahydrofuran.
- the mobile phase is pumped by a pump 23 and directed through a line filter to the sampling injector 27.
- the residue-containing solvent in the mobile phase is transmitted through successive GPC columns 28, 29, and 30, and a detector 33 to a collector reservoir 32.
- the output of the detector 33 is directed to a chromatograph recorder 35 and to data handling equipment 36.
- Gel permeation chromatography is a known analytic procedure which is described, for example, in the book, "Modern Size-Exclusion Liquid Chromatography," W. W. Yaw, J. J. Kirkland, and D. D. Bly, John Wiley and Sons, Inc., 1979, hereby incorporated herein by reference, especially pp. 381-449.
- the solvent is directed through the three columns 28, 29, and 30, each of which contains a porous packing material such as highly cross-linked styrene divinylbenzene copolymer.
- the packing material of the different columns has different size pores; for example, the size of the pores in columns 28, 29, and 30 may be one hundred, five hundred, and one thousand angstroms, respectively.
- Detector 33 After transmission through the columns, an ultraviolet light is directed through the exiting material in detector 33.
- Detector 33 generates a signal indicative of light transmitted through the material exiting the column 30, and recorder 35 generates a chromatogram from the signal.
- Molecules that are too large to enter the packing pores move relatively quickly through the three columns and appear first in the chromatogram. Smaller molecules are retained by the column packing pores and move through the column at speeds dependent on their relative size, with the smallest molecules eluting last.
- Tetrahydrofuran may be used as the extracting solvent of FIG. 3 as well as the mobile phase that passes through the three columns.
- the gel permeation chromatography apparatus shown in FIG. 4 was a "Waters 840 Data and Chromatography Control Station," available from the Millipore Corporation, Milford, Mass.
- a large number of chromatograms were obtained, such as that shown in FIG. 5 in which curve 37 represents an envelope of peaks recorded by the chromatograph.
- the ordinate measures the absorbance of light by the eluent which is proportional to the quantity of residue at a given time.
- the curve 37 therefore represents the quantity of residue detected having different molecular weights, the larger molecular weights being recorded first, at the lower retention times, with the higher retention times being indicative of lower molecular weights.
- the curve of FIG. 5 is useful, of course, only to the extent that it accurately reflects the quantity of residue contained on the electronic assembly of FIG. 3.
- a series of standard rosin solutions varying in concentration from ten to four hundred parts per million were also prepared in tetrahydrofuran (weight by weight).
- the area under each of the GPC chromatograms for each of these standard samples was plotted as a function of rosin weight as shown by the points 39 in the graph of FIG. 6.
- this equation has a quality of fit value of 0.970 which indicates a high degree of calibration.
- GPC is normally used for the purpose of determining actual molecular weights. Standards were not used for the determination of the actual molecular weights of the polymerized rosin species because the quantity of interest here is the total amount of residue, rather than the distribution of the individual oligomers.
- the invention has the advantages of the conventional HPLC methods in that it is well suited for use in an assembly factory, but is more accurate than the conventional HPLC method which was shown to severely underestimate rosin concentration, and does not have the disadvantages associated with the various other methods.
- solder paste may be used for solder elements 15, with rosin flux mixed into the solder paste, as is known in the art.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Pathology (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Hardware Design (AREA)
- Health & Medical Sciences (AREA)
- Power Engineering (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
Residue Weight (micrograms)=(75×10.sup.-6 ×peak area)(1)
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/864,821 US5201114A (en) | 1992-04-02 | 1992-04-02 | Analytic method for use in electronic circuit assembly operations |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/864,821 US5201114A (en) | 1992-04-02 | 1992-04-02 | Analytic method for use in electronic circuit assembly operations |
Publications (1)
Publication Number | Publication Date |
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US5201114A true US5201114A (en) | 1993-04-13 |
Family
ID=25344148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US07/864,821 Expired - Lifetime US5201114A (en) | 1992-04-02 | 1992-04-02 | Analytic method for use in electronic circuit assembly operations |
Country Status (1)
Country | Link |
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US (1) | US5201114A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2324374A (en) * | 1997-02-24 | 1998-10-21 | Contamination Studies Lab Inc | measuring residues present on the surface of circuit assemblies |
US20100065320A1 (en) * | 2006-12-07 | 2010-03-18 | Nec Corporation | Wiring board and method for manufacturing the same |
WO2011064239A1 (en) * | 2009-11-25 | 2011-06-03 | Behr Gmbh & Co. Kg | Method for quantitatively determining soldering agent residues |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4244506A (en) * | 1979-11-26 | 1981-01-13 | Aluminum Company Of America | Recovery of flux residues from rinse water in dip brazing |
US4244505A (en) * | 1979-05-17 | 1981-01-13 | Aluminum Company Of America | Recovery of flux residues from rinse water in dip brazing |
JPS6349364A (en) * | 1987-08-13 | 1988-03-02 | Ginya Ishii | Method for checking flame retardance of flame retardant flux |
-
1992
- 1992-04-02 US US07/864,821 patent/US5201114A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4244505A (en) * | 1979-05-17 | 1981-01-13 | Aluminum Company Of America | Recovery of flux residues from rinse water in dip brazing |
US4244506A (en) * | 1979-11-26 | 1981-01-13 | Aluminum Company Of America | Recovery of flux residues from rinse water in dip brazing |
JPS6349364A (en) * | 1987-08-13 | 1988-03-02 | Ginya Ishii | Method for checking flame retardance of flame retardant flux |
Non-Patent Citations (4)
Title |
---|
"Cleaning and Cleanliness Test Program Phase I Test Results", Guidelines Report, IPC, Lincolnwood, Ill., pp. 33-38. |
"Modern Size-Exclusion Liquid Chromatography", W. W. Yaw et al., John Wiley and Sons, Inc., 1979, pp. 381-449. |
Cleaning and Cleanliness Test Program Phase I Test Results , Guidelines Report, IPC, Lincolnwood, Ill., pp. 33 38. * |
Modern Size Exclusion Liquid Chromatography , W. W. Yaw et al., John Wiley and Sons, Inc., 1979, pp. 381 449. * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2324374A (en) * | 1997-02-24 | 1998-10-21 | Contamination Studies Lab Inc | measuring residues present on the surface of circuit assemblies |
GB2324374B (en) * | 1997-02-24 | 2001-01-10 | Contamination Studies Lab Inc | Method and apparatus for the quantitative measurement of the corrosivity effect of residues present on the surface of electronic circuit assemblies |
US20100065320A1 (en) * | 2006-12-07 | 2010-03-18 | Nec Corporation | Wiring board and method for manufacturing the same |
WO2011064239A1 (en) * | 2009-11-25 | 2011-06-03 | Behr Gmbh & Co. Kg | Method for quantitatively determining soldering agent residues |
CN102665992A (en) * | 2009-11-25 | 2012-09-12 | 贝洱两合公司 | Method for quantitatively determining soldering agent residues |
US8499996B2 (en) | 2009-11-25 | 2013-08-06 | Behr Gmbh & Co. Kg | Method for the quantitative determination of soldering agent residues |
CN102665992B (en) * | 2009-11-25 | 2015-11-25 | 马勒国际公司 | For determining the method remaining solder flux quantitatively |
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