US3923070A

US3923070A - Systematic fingernail polishing method

Info

Publication number: US3923070A
Application number: US535653A
Authority: US
Inventors: Sakichi Tsukamoto
Original assignee: Individual
Current assignee: Individual
Priority date: 1974-12-23
Filing date: 1974-12-23
Publication date: 1975-12-02
Anticipated expiration: 1992-12-02

Abstract

A systematic fingernail polishing method is provided. The method comprises the steps of polishing nail surfaces by a nail file having coarse and fine meshed surfaces on both sides thereof; and then polishing same by two kinds of buff members, in repetition of strict unidirectional motions by hand.

Description

United States Patent 1191 1111 3,923,070 Tsukamoto Dec. 2, 1975 [54] SYSTEMATIC FINGERNAIL POLISHING 2,557,175 6/1951 Cortes l32/76.4 METHOD 2,566,688 9/1951 West l32/76.4 3,298,381 l/l967 Adams l32/76.4 [76] Inventor: Sakichi Tsukamoto, 2-3-chome,

Toyotama Nenma Tokyo Japan Pfimary ExaminerG. E. McNeill [22] Filed: Dec. 23, 1974 Attorney, Agent, or Firm-Frank J. Jordan [2]] Appl. No.: 535,653

[57] ABSTRACT U-s. I 6 0| 6 6 A [5 l] II'IL Cl. A451) 29/00 The method comprises the Steps of polishing nail Sun [58] new of Search 132/756 75 faces by a nail file having coarse and fine meshed sur- 132/73; 128/304 faces on both sides thereof; and then polishing same by two kinds of buff members, in repetition of strict [56] References Clted unidirectional motions by hand.

UNITED STATES PATENTS 338,245 3/1886 Broadhurst 132/76.4 2 Glam, 4 Dmwmg Flgures COARSE POLISHING (A) US. Patent Dec. 2, 1975 F I g 2 COARSE POLISHING (B) F i g. I

COARSE POLISHING (A) F Ig. 5 Fig. 4

FINISH POLISHING (A FINISH POLISHING (B') SYSTEMATIC FINGERNAIL POLISHING METHOD BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a systematic fingernail polishing method.

2. Description of the Prior Art Heretofore, the fingernail polishing is conducted by various kinds of manicuring implements in a variety of fashions according to the likings of users of the implements, almost at random, often resulting in damages of their fingernails. This is due to their ignorance of the physiology of the nail and functions of the implements. Or, rather, the manufacturers of such implements have failed to give proper advices to the users from the point of view of physiological protection of fingernails.

The present inventor has invented several fingernail polishing devices including nail files, taking note of the above mentioned points some of which were described and explained in his U.S. patent applications, namely Ser. No. 430,610 filed on Jan. 4, 1974 (A nail file) and allowed on Nov. 1, 1974, and Ser. No. 426,939 filed on Dec. 20,1973 (An automatic fingernail polishing device) which discloses the use of coarse and fine buffs.

SUMMARY OF THE INVENTION The present invention comprises the steps of both coarse and fine polishings by means of a specific nail file substantially same as that described in said U.S. patent application Ser. No. 430,610 and finish polishings by means of both coarse and fine buff members affixed to suitable blocks respectively in strict undirectional motions by hand.

It is an object of the present invention to provide a systematic nail polishing method comprising the steps of coarse and finish polishings respectively by means of specific manicuring implements including a nail file and buff members, in repetition of strict unidirectional motions.

Another object of the present invention is to provide a systematic nail polishing method which accelerates the capillary flow of the nail bed and prevents the nail from being physiologically damaged.

BRIEF DESCRIPTION OF THE DRAWING The present invention will now be explained in detail with reference to the accompanying drawing wherein:

FIG. 1 shows a manner of a first coarse polishing of a fingernail with the use of a nail file of the present invention;

FIG. 2 shows a manner of a second coarse polishing of the fingernail with the use of the nail file of FIG. 1;

FIG. 3 shows a manner of a first finish polishing of the fingernail with the use of a sheet of coarse buff placed over a soft resilient foam material (not shown) attached to one side of a block;

FIG. 4 shows a manner of a second finish polishing with the fingernail with the use of a sheet of fine buff placed over a soft resilient foam material attached to one side of another block.

DESCRIPTION OF THE PREFERRED METHOD The method of the present invention includes as a first step the use of a boat shaped nail file 1 of suitable width (preferrably about I .5 cm), same as the length of the fingernail, having both upper and

rear file surfaces

2 and 3. The upper file surface 2 comprises a sheet of rough emery paper or cloth of coarse mesh (about 400 to 600meshes) for coarse polishing A as shown and the rear file surface 3 for fine polishing B comprises a sheet of fine emery paper or cloth of fine mesh (about 800 to 1.200) both of which are backed by resilient perforated plastic layers 4, respectively.

In polishing the entire surface of a given nail is carefully rubbed by both coarse and fine surfaces of the nail file 1 so that the uneven surface of the nail may be smoothed. In this case, it should be strictly observed that the polishings by both coarse and fine nail surfaces be made in one hand in reciprocating motions as conventionally done but in repetition of strict unidirectional motions (as indicated by an arrow) to thereby protect the fingernail physiologically.

The method according to the present invention includes as a second step the use of both coarse and fine buff members 6 and 6 (preferrably of deer skin) the former being for Finish polishing A and the latter for Finish polishing B and each buff member being stretched over a soft resilient foam material (not shown) affixed to a square wooden or plastic support block 5 (5'). The dimentions of each support block may preferrably be 1.5 cm (width) X 1.2 cm (height) X 8.2 cm (length). The said

buff members

6 and 6 with

support blocks

5 and 5 respectively are similar in shape to A nail buffer as described in the U.S. Pat. No. 3,706,316 filed Dec. 19,1972 by Shogo ISHII although the buffer is made of cloth.

In polishing, the entire surface of the nail is thoroughly cleaned from shavings remaining thereon as a result of the polishing in the aforementioned first step and is carefully rubbed by the coarse buff member 6 with the use of a paste comprising a mixture of diatomaceous earth, glycerin, propylene glycol, stearic acid, food dye and refined water which is to be sprinkled over the nail surface before rubbing. (Finish polishing A). The nail surface is then cleaned from the remains of the paste and are rubbed gently by the fine buff member 6 with the use of a powder comprising a mixture of diatomaceous earth, paraffin, beeswax, lanolin, stearic acid and food dye which is to be sprinkled over the nail surface before rubbing. (Finish polishing B).

As regards the fine polishing A and the use of paste therewith may be dispensed with when the nail surface is considerably smooth and clean.

In the case of the second step polishings it should also be strictly observed that the polishings be made in one hand not in reciprocating motions but in repetition of unidirectional motions (as indicated by an arrow).

The present invention has advantages that due to unidirectional or one way polishings the shavings as a result of the nail file polishing and the paste or power dregs as a result of buff polishings are not brought back on the nail surface while polishing, a smooth finish of the nail surface is accomplished and the rubbings by buffs accelerate the capillary flow of the nail bed.

What is claimed is:

1. A systematic fingernail polishing method comprising the steps of coarse and fine polishing of a fingernail by a nail file having coarse and fine meshed surfaces on both sides thereof, and finish polishing said fingernail by coarse and fine buff members together with the use of a paste and a powder in repetition of unidirectional motions by hand, said paste comprising a mixture of diatomaceous earth, glycerin, propylene glycol, stearic acid, food dye and refined water.

of a paste and a powder in repetition of unidirectional motions by hand, said powder comprising a mixture of diatomaceous earth, paraffin, beeswax, lanolin, stearic acid and food dye.

Claims

1. A SYSTEMATIC FINGERNAIL POLISHING METHOD COMPRISING THE STEP OF COARSE AND FINE POLISHING OF A FINGERNAIL BY A NAIL FILE HAVING COARSE AND FINE MESHED SURFACES ON BOTH SIDES THEREOF, AND FINISH POLISHING SAID FINGERNAIL BY COARSE AND FINE BUFF MEMBERS TOGETHER WITH THE USE OF A PASTE AND A POWDER IN REPETITION OF UNIDIRECTIONAL MOTIONS BY HAND, SAID PASTE COMPRISING A MIXTURE OF DIAMOMACEOUS EARTH, GLYCERIN, PROPYLENE GLYCOL, STEARIC ACID, FOOD DYE AND REFINED WATER.

2. A systematic fingernail polishing method comprising the steps of coarse and fine polishing of a fingernail by a nail file having coarse and fine meshed surfaces on both sides thereof, and finish polishing said fingernail by coarse and fine buff members together with the use of a paste and a powder in repetition of unidirectional motions by hand, said powder comprising a mixture of diatomaceous earth, paraffin, beeSwax, lanolin, stearic acid and food dye.