US3764489A - Electrodeposition of gold alloys - Google Patents
Electrodeposition of gold alloys Download PDFInfo
- Publication number
- US3764489A US3764489A US00238473A US3764489DA US3764489A US 3764489 A US3764489 A US 3764489A US 00238473 A US00238473 A US 00238473A US 3764489D A US3764489D A US 3764489DA US 3764489 A US3764489 A US 3764489A
- Authority
- US
- United States
- Prior art keywords
- gold
- tin
- bath
- alloy
- electrodeposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910001020 Au alloy Inorganic materials 0.000 title abstract description 13
- 239000003353 gold alloy Substances 0.000 title abstract description 10
- 238000004070 electrodeposition Methods 0.000 title abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 25
- 239000002184 metal Substances 0.000 abstract description 25
- 238000007747 plating Methods 0.000 abstract description 21
- 150000002739 metals Chemical class 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 11
- 238000005275 alloying Methods 0.000 abstract description 10
- 230000000737 periodic effect Effects 0.000 abstract description 5
- LVTQULDZLXQIDR-UHFFFAOYSA-N [Au].[Pb].[Sn] Chemical group [Au].[Pb].[Sn] LVTQULDZLXQIDR-UHFFFAOYSA-N 0.000 abstract description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 27
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 24
- 229910052737 gold Inorganic materials 0.000 description 24
- 239000010931 gold Substances 0.000 description 24
- 239000008139 complexing agent Substances 0.000 description 13
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- RGHNJXZEOKUKBD-SQOUGZDYSA-N Gluconic acid Natural products OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 235000012208 gluconic acid Nutrition 0.000 description 7
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical class [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 7
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000000174 gluconic acid Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 235000011187 glycerol Nutrition 0.000 description 5
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- 239000001630 malic acid Substances 0.000 description 3
- 235000011090 malic acid Nutrition 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 235000002639 sodium chloride Nutrition 0.000 description 3
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 2
- 235000011167 hydrochloric acid Nutrition 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000001119 stannous chloride Substances 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- OVJWUQFCQCZWHW-UHFFFAOYSA-N OC(CC(O)=O)(CC(O)=O)C(O)=O.[AsH3] Chemical compound OC(CC(O)=O)(CC(O)=O)C(O)=O.[AsH3] OVJWUQFCQCZWHW-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- RLJMLMKIBZAXJO-UHFFFAOYSA-N lead nitrate Chemical compound [O-][N+](=O)O[Pb]O[N+]([O-])=O RLJMLMKIBZAXJO-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
- C07F9/32—Esters thereof
- C07F9/3205—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/3235—Esters of poly(thio)phosphinic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/70—Organo-arsenic compounds
- C07F9/74—Aromatic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Definitions
- This invention relates to a method and composition for the electrodeposition of alloys of gold with one or more metals.
- the metals to be codeposited with gold are those of Groups II-B through VI-B of the Mendelyeev Periodic Table of the Elements.
- the present invention also relates to the electrodeposition of a lead-tin-gold alloy and to the plating bath used for this purpose.
- Still another object of this invention is to produce a bright, gold deposit of heavy thickness having low internal stress.
- gold can be alloyed with any of the metals of Groups lI-B, III-B, lV-B, V-B and VI-B of the Periodic Table of Mendelyeev.
- the alloying metals include cadmium, zinc, indium, lead, tin antimonium, arsenic, bismuth or selenium.
- the metals are added to the bath in quantities of up to about 100 g./l.
- the preferred ratio of the metal content is from about 1 g./l. to about 100 g./l. although lower amounts, e.g. .01 g./l., can also be used particularly when gold is alloyed with more than one other metal. In the latter event it is preferred to include the second metal in a lower quantity than the first metal, say from about 0.01 to 1.0 g./l.
- the preferred alloying metal is tin. It should be understood, however, that the other metals can be used in place of tin. Moreover, whenever tin-gold alloys are referred to hereinafter, it will be understood that such alloys are intended to include not only binary compounds, but also ternary and quaternary compounds are intended. In other words, gold-tin alloys include alloys of gold-tin and optionally one or more of the other metals of the groups of the Periodic Table mentioned above,
- soluble tin anodes permits, for example, a significant reduction in the voltage across the terminals and can result in tin-gold alloys having as much as 50% by weight of tin.
- the electroplating composition of this invention will comprise from about 1 to about 100 g./l. of tin, preferably from about 1 to 40 g./ 1., added in the form of a stable stannous compound, e.g. stannous sulfate, stannous chloride, and from about 1 to about 30 g./l. of gold added to the plating bath in the form of a potassium gold cyanide.
- the plating bath will contain a complexing agentv which serves to complex with the stannous ions.
- the complexing agent can be any of the conventional complexing agents known to the art including weak complexing agents, including polyalcohols, e.g.
- the complexing agent is gluconic acid and/or its salts.
- the complexingagents act as stabilizers and serve to increase the brightness.
- the complexing agent is present from about 5 to 500 g./l. with a preferred minimum amount of about 10 g./l.
- the baths are aqueous.
- the alloying metals are tin and lead used together; the tin being present in amounts from about 1 g./l. to 100 g./l., preferably from about 1 to 40 g./l., and the lead in amounts from about 0.01 g./l. to 1.0 g./l.
- the gold alloy deposit obtained from this bath is bright. Such a deposit is not obtainable by alloying the gold with tin or lead individually.
- the plating baths made as described herein can be electrolyzed and operated according to conditions known to the art, although the following conditions are preferred operating conditions:
- the preferred temperature range is from about 20 C. to about C.
- the preferred current density is from about 0.3 to about 2 A./dm.
- the preferred pH range is from about 3.5 to about 5.5.
- a diaphragm between the cathode and the anode is optional and may be helpful to prevent deposition of gold on the anode when the anode is of relatively low nobility, e.g. an anode of tin itself.
- EXAMPLE 1 A bath was made up containing 10 g./l. of stannous sulfate, 20 ml./l. of sulfuric acid concentrated, g./l. of malonic acid, 8 g./l. of gold as potassium gold cyanide and 0.2 g./l. of antimonium as glycerollate. The pH was brought to 4.0 with potassium hydroxide. The current density was 0.5 A./dm. A soluble tin anode was used. Bright deposits were obtained of a thickness of 20 p.111. The deposits were of unusually low internal stress, exhibiting none of the usual characteristics of stress, e.g. cracking or crumbling. The efliciency of the plating bath was about 55 mg./A. min. The alloy deposit contained about 60% gold.
- EXAMPLE 2 The same bath as in Example 1 was made up but 0.05 g./l. of arsenic as arsenic citrate was added in lieu of the glycerollate of antimonium. The bath was operated at a current density of 0.5 A./dm. Once more, bright, thick coatings of low internal stress, exhibiting none of the usual characteristics of internal stress were obtained. The efliciency of the plating solution was about 95 mg./A. min. and the alloy deposit contained about 75% gold.
- EXAMPLE 3 A bath was prepared containing 20 g./l. of stannous chloride, 100 ml./l. of chlorhydric acid concentrated, 200 g./l. of malic acid, 10 g./l. of gold as potassium gold cyanide and 20 ml./l. of glycerine. The pH was brought to 4.5 with potassium hydroxide. A bright, tlick deposit showing no signs of internal stress was obtained. The plating bath efliciency was about 85 mg./A. min. at 0.5 A./dm. The alloy contained about 70% gold. It was later determined that the soluble tin anode used in this example contained small amounts of lead.
- EXAMPLE 4 The same bath was used as in Example 3 but with one exception, 0.1 g./l. of lead nitrate was substituted for the glycerine. Bright, thick deposits were obtained once more showing none of the usual characteristics of internal stress. The efliciency of the plating solution was about 65 mg./ A. min at a current density of 0.5 A./dm. The alloy contained about 60% of gold.
- EXAMPLE 5 A plating bath was prepared containing 5 g./l. of tin fluoborate, 120 g./l. of sodium gluconate and 4 f./l. of potassium gold cyanide. The pH was adjusted to 3.5 with fluoboric acid. Half bright, thick coatings of tingold alloy was obtained exhibiting none of the usual characteristics of internal stress. The alloy contained about 65% of gold. The eificiency of the plating bath was 80 mg./A. min. at a current density of 0.5 A./dm.
- EXAMPLE 6' The plating bath as described in Example 5 was prepared and 110 g./l. of citric acid and 90 g./l. of potassium citrate was added. The bath was operated under the same conditions as in Example 5. Bright, thick coatings were obtained having low internal stress. The efliciency of the plating bath was about 60 mg./A. min. The alloy contained about 65% gold.
- EXAMPLE 7 A bath was prepared containing 5 g./l. of antimonium chloride, 250 g./l. of gluconic acid, 60 cc./l. of chlorhydric acid concentrated, 40 cc./l. of glycerine and g./l. of gold as potassium gold cyanide. A soluble antimonium anode was used. The pH was adjusted to 5.0 by means of potassium hydroxide. Very good coatings, bright or half bright, according to the variations in the current density, and having practically no internal tension, were obtained. The efliciency of the plating bath was about 55 mg./A. min. at a current density of 0.5 A./dm. The alloy contained about 60% of gold.
- EXAMPLE 8 The same bath as described in Example 7 was prepared with the further addition of 0.1 g./l. of bismuth chloride. Slight variations in current density gave significant variations in gold content. At a current density of about 0.5 A./dm. very good thick deposits of a yellow-grey tint were obtained. Those deposits exhibited virtually no internal stress. The efliciency of the plating bath was about 55 mg./A. min.
- the plating bath was operated at a temperature of about 45 C. to about 55 C. which is a preferred operating temperature. However, it should be understood that each of the above baths is operative at temperatures ranging from about 20 C. to about C.
- a method for the electrodeposition of an alloy of gold with tin and lead onto a conductive surface which comprises immersing the conductive surface into an aqueous acidic plating bath comprising from about 1 to about 30 g./l. of gold as potassium gold cyanide, from about 1 to about g./l. of tin as a water soluble compound, from about 0.01 to about 1.0 g./l. of lead as a water soluble compound, and from about 5 to about 500 g./l. of a complexing agent for tin and electrolyzing said bath with said conductive surface as cathode.
- the complexing agent is a polyalcohol or is selected from the group consisting of malic acid, maleic acid, lactic acid, gluconic acid, and salts thereof.
- An aqueous acidic gold alloy plating bath comprising from about 1 to about 30 g./l. of gold as a water soluble gold cyanide, from about 1 to about 100 g./l. of tin as a tin and a water soluble compound, from about 0.01 to about 1.0 g./l. of lead as a water soluble compound, and about 5 to about 500 g./l. of a complexing agent for tin.
- the bath of claim 8 wherein the complexing agent is selected from the group consisting of malic acid, maleic acid, lactic acid, gluconic acid, and salts thereof.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1771068A CH494284A (en) | 1968-11-28 | 1968-11-28 | Process for the electrolytic deposition of a gold alloy with at least one other common metal and aqueous plating bath for carrying out this process |
US88095069A | 1969-11-28 | 1969-11-28 | |
US23847372A | 1972-03-27 | 1972-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3764489A true US3764489A (en) | 1973-10-09 |
Family
ID=27177642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00238473A Expired - Lifetime US3764489A (en) | 1968-11-28 | 1972-03-27 | Electrodeposition of gold alloys |
Country Status (8)
Country | Link |
---|---|
US (1) | US3764489A (en) |
AT (1) | AT301290B (en) |
BE (1) | BE742173A (en) |
CH (1) | CH494284A (en) |
DE (1) | DE1960047C2 (en) |
FR (1) | FR2032280A1 (en) |
GB (1) | GB1293356A (en) |
NL (1) | NL6917849A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4331518A (en) * | 1981-01-09 | 1982-05-25 | Vulcan Materials Company | Bismuth composition, method of electroplating a tin-bismuth alloy and electroplating bath therefor |
EP0168705A1 (en) * | 1984-07-05 | 1986-01-22 | Siemens Aktiengesellschaft | Bath and process for electroplating hard gold |
DE4406434C1 (en) * | 1994-02-28 | 1995-08-10 | Heraeus Gmbh W C | Bright gold@-tin@ alloy electroplating bath |
US20050252783A1 (en) * | 2004-05-11 | 2005-11-17 | Hana Hradil | Electroplating solution for gold-tin eutectic alloy |
US20060163080A1 (en) * | 2005-01-21 | 2006-07-27 | Hayward Fred C | Pulse plating process for deposition of gold-tin alloy |
US20060237324A1 (en) * | 2003-05-21 | 2006-10-26 | Fred Hayward | Pulse plating process for deposition of gold-tin alloy |
US20150008131A1 (en) * | 2013-07-05 | 2015-01-08 | The Boeing Company | Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4013523A (en) * | 1975-12-24 | 1977-03-22 | Oxy Metal Industries Corporation | Tin-gold electroplating bath and process |
US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
DE3319772A1 (en) * | 1983-05-27 | 1984-11-29 | Schering AG, 1000 Berlin und 4709 Bergkamen | BATH FOR GALVANIC DEPOSITION OF GOLD ALLOYS |
DE4224012C1 (en) * | 1992-07-21 | 1993-12-02 | Heraeus Gmbh W C | Solderable electric contact element - has silver@-tin@ alloy layer below gold@-tin@ solder alloy layer |
EP0666342B1 (en) * | 1994-02-05 | 1998-05-06 | W.C. Heraeus GmbH | Bath for electroplating silver-tin alloys |
DE4440176C2 (en) * | 1994-02-05 | 1996-06-27 | Heraeus Gmbh W C | Bath for the electrodeposition of silver-tin alloys |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1111897B (en) * | 1957-08-13 | 1961-07-27 | Sel Rex Corp | Bath for the galvanic deposition of shiny gold alloy coatings |
-
1968
- 1968-11-28 CH CH1771068A patent/CH494284A/en not_active IP Right Cessation
-
1969
- 1969-11-24 GB GB57431/69A patent/GB1293356A/en not_active Expired
- 1969-11-25 BE BE742173D patent/BE742173A/xx unknown
- 1969-11-26 DE DE1960047A patent/DE1960047C2/en not_active Expired
- 1969-11-26 AT AT1106569A patent/AT301290B/en not_active IP Right Cessation
- 1969-11-27 NL NL6917849A patent/NL6917849A/xx not_active Application Discontinuation
- 1969-11-27 FR FR6940849A patent/FR2032280A1/fr not_active Withdrawn
-
1972
- 1972-03-27 US US00238473A patent/US3764489A/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4331518A (en) * | 1981-01-09 | 1982-05-25 | Vulcan Materials Company | Bismuth composition, method of electroplating a tin-bismuth alloy and electroplating bath therefor |
EP0168705A1 (en) * | 1984-07-05 | 1986-01-22 | Siemens Aktiengesellschaft | Bath and process for electroplating hard gold |
DE4406434C1 (en) * | 1994-02-28 | 1995-08-10 | Heraeus Gmbh W C | Bright gold@-tin@ alloy electroplating bath |
US20060237324A1 (en) * | 2003-05-21 | 2006-10-26 | Fred Hayward | Pulse plating process for deposition of gold-tin alloy |
US7431817B2 (en) * | 2004-05-11 | 2008-10-07 | Technic, Inc. | Electroplating solution for gold-tin eutectic alloy |
WO2005110287A2 (en) * | 2004-05-11 | 2005-11-24 | Technic, Inc. | Electroplating solution for gold-tin eutectic alloy |
WO2005110287A3 (en) * | 2004-05-11 | 2007-03-01 | Technic | Electroplating solution for gold-tin eutectic alloy |
US20050252783A1 (en) * | 2004-05-11 | 2005-11-17 | Hana Hradil | Electroplating solution for gold-tin eutectic alloy |
US20060163080A1 (en) * | 2005-01-21 | 2006-07-27 | Hayward Fred C | Pulse plating process for deposition of gold-tin alloy |
WO2006078549A1 (en) * | 2005-01-21 | 2006-07-27 | Technic, Inc. | Pulse plating process for deposition of gold-tin alloy |
US20150008131A1 (en) * | 2013-07-05 | 2015-01-08 | The Boeing Company | Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold |
CN105378151A (en) * | 2013-07-05 | 2016-03-02 | 波音公司 | Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold |
US10260159B2 (en) * | 2013-07-05 | 2019-04-16 | The Boeing Company | Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold |
CN105378151B (en) * | 2013-07-05 | 2020-08-28 | 波音公司 | Method and apparatus for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold |
Also Published As
Publication number | Publication date |
---|---|
DE1960047C2 (en) | 1983-04-28 |
NL6917849A (en) | 1970-06-01 |
FR2032280A1 (en) | 1970-11-27 |
DE1960047A1 (en) | 1970-11-26 |
GB1293356A (en) | 1972-10-18 |
CH494284A (en) | 1970-07-31 |
AT301290B (en) | 1972-08-25 |
BE742173A (en) | 1970-05-04 |
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