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US3534472A - Method of making an electrical resistor - Google Patents

Method of making an electrical resistor Download PDF

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Publication number
US3534472A
US3534472A US729730A US3534472DA US3534472A US 3534472 A US3534472 A US 3534472A US 729730 A US729730 A US 729730A US 3534472D A US3534472D A US 3534472DA US 3534472 A US3534472 A US 3534472A
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US
United States
Prior art keywords
resistor body
resistance layer
path
resistance
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US729730A
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English (en)
Inventor
Martijn De Jong
Matheus Jeanne Gerardus Knapen
Theodoor Peter Johannes Botden
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US Philips Corp
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US Philips Corp
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Publication date
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Publication of US3534472A publication Critical patent/US3534472A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B7/00—Machines, apparatus or hand tools for branding, e.g. using radiant energy such as laser beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/0823—Devices involving rotation of the workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/242—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by laser
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/04—Electric heat
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base

Definitions

  • This invention relates to a method of processing a resistor body, in which resistance material is removed along a helical path from a resistance layer applied to a cylindrical carrier consisting of insulating material and provided at each end with a connecting cap, until the electrical resistance between the caps acquires a predetermined value; and it also relates to an electrical resistor having a resis tance layer which has been processed in this manner.
  • the resistance material is removed along the path by means of a fastrotating grinding disc with a sharp edge which is moved in the axial direction along the resistor body that is held in a rotary holder.
  • This method has the disadvantage that the edges of the path being ground are crumbly rather than sharp, resulting in a limit being set to the minimum pitch that can be used.
  • the resistance material is liable to expand over the basic surface of the groove ground in the carrier, so that the resistor ultimately obtained may become voltagesensitive.
  • Another disadvantage inherent in this grinding method is that the helical path cannot be made to adjoin directly a terminal cap, with the result that the resistance variation obtainable by the grinding process is less than in the case where the groove could be made to adjoin a terminal cap.
  • An object of the invention is to provide a method of the above-mentioned kind in which the disadvantages of both methods above described are avoided.
  • the method according to the invention is characterized in that the resistance material is removed along the path by means of an electromagnetic beam of rays having an energy of at least several watts and which is focused onto P CC the resistance layer and that, upon relative displacement of the resistance layer and this beam, the beam is continuously emitted by a device for producing the beam by stimulated emission.
  • An advantageous form of the method according to the invention is characterized in that the beam is produced in a device having a gas-discharge space filled with a gas consisting of a mixture of carbon dioxide, nitrogen and at least one of the gases helium and steam, the wavelength of the radiation in the beam being in practice 10.6 microns, while the discharge space is closed by a window occupying almost the entire cross-section, which window is made of a material permeable to infra-red radiation and is at the same time a reflecting member.
  • This method of manufacturing metal film resistors retains the disadvantage inherent in mechanically forming the helical path, while also the use of a beam of rays emitted intermittently requires succeeding impact areas to overlap if the material is to be removed over a continuous region.
  • a continuous portion of the resistance material is automatically removed. Consequently the velocity of movement between the focused beam and the resistance layer can be higher than would be possible with an intermittent beam for obtaining a continuous path.
  • the gas-discharge space may communicate with spaces for the supply and removal of gas.
  • a gasdischarge space which is closed in a gas-tight manner.
  • the present invention also relates to a device for carrying out the method according to the invention described hereinbefore.
  • This device is characterized by a rotary holder for receiving a resistor body to be processed, at gasdischarge device closed in a gas-tight manner for continuously producing a beam of electromagnetic radiation having a wavelength of approximately 10.6 microns by stimulated emission, which device contains a gas consisting of a mixture of carbon dioxide, nitrogen and at least one of the gases helium and steam and is provided with an exit window for the beam; this window is permeable to infia-red radiation and is also a reflecting member.
  • FIG. 1 shows one embodiment of a device for processing a resistor body in accordance with the invention
  • FIG. 2 shows, in part elevational view and in part longitudinal section, a resistor manufactured by this device according to the invention
  • FIG. 3 shows a device similar to that of FIG. 1, but which slightly differs therefrom and is viewed in a direction transverse to that of FIG. 1.
  • resistor bodies 1 each comprising a cylindrical and preferably ceramic carrier 2 (FIG. 2), which is covered with a resistance layer 3 throughout its cylindrical surface and also has metallic terminal caps 4 pressed one onto each end, are supplied successively through a flexible tubing 5 to hollow, rotatably-arranged clamping members 13 and 14 of a clamping device indicated as a whole by 6.
  • the device is movable over a straight guide formed, for example, by a guide path 7, and the device is formed by a carrier plate or slide 8, which co-acts with the guide path 7 and on which two insulating supporting columns 9 are placed, possibly in a mutually displaceable manner, each of which ends into a metallic hollow sleeve 10.
  • the clamping members 13 and 14 are rotatably supported in the sleeves 10 and placed in such manner that their axes are aligned in the direction of movement of the slide 8 over the guide path 7; the distance between their adjacent ends lies between the distances which exist in the resistor body between the adjacent ends and the remote ends respectively, of the terminal caps 4 of a resistor body 1 supplied through the tubing 5.
  • the clamping members 13 and 14 can be opened and closed in the radial direction from without in a manner not shown, for example, by means of control air supplied through tubings 15.
  • a resistor body supplied via tubing 5 by means of compressed air is centrally moved through the clamping member 13 until its front end, which is guided by a supporting plate or supporting groove 16, finds its Way into the clamping member 14 and is stopped there.
  • This stopping may be caused, for example, due to the clamping member 14 having an inner collar which, in the halfopen condition of this clamping member when a terminal cap 4 can be slipped into the aperture of the member 14 adjacent the clamping member 13, further barricades the way to this cap but no longer forms an obstacle in the fully-open condition of the member 14.
  • a resistor body once being fed into the clamping device the clamping members 13 and 14 are closed and caused to rotate by a driving device (not shown). It is to be noted that it sufiices if only one of the clamping members 13 and 14 is driven. The sense of rotation is indicated in FIG. 1, when viewed from the left, in the clockwise direction.
  • the device of FIG. 1 includes a device for continuously producing a high-energy beam 21 of electromagnetic radiation having a wavelength of approximately 10.6 microns, the device 20 being indicated hereinafter as iraser for the sake of simplicity.
  • the iraser 20 is formed by a fully closed discharge tube 22 filled with a gas mixture consisting of carbon dioxide, nitrogen and at least one of the gases hydrogen and helium.
  • Electrodes 23 and 24 Inside the tube are two electrodes 23 and 24, for example, of platinum, the electrical connections of which are led through the cylindrical part of tube 22, which consists of quartz. This tube is closed at one end by a concave mirror 25 having a maximum reflection factor and at the other end where the beam 21 emerges, by a plane mirror 26 which transmits the radiation to a certain proportion, for example, 50%.
  • an adjustable voltage source 27 which can supply a voltage between 20 kv. and 30 kv.
  • a radiation field is built up in the iraser 20 by continuously stimulated emission, resulting in the substantially parallel beam 21.
  • the beam 21, which may have a diameter between 5 mm. and 10 mm.
  • a lens 29 made of, for example, intrinsic germanium and having a focal length of, for example, 5 cm.
  • the axis of said beam is directed to the axis of the clamping members 13 and 14, the lens 29 provided with anti-reflection layers being adjustable by means of an adjustable fitting 33 so that, if the point of intersection of said axes lies between the clamping members 13 and 14, the smallest diameter of the focused beam 30 coincides more or less with that portion of the resistance layer on a resistor body held in the clamping members which is struck by the beam.
  • a resistor body 1 received in the clamping device 6 after being supplied through the tubing 5 is now processed by the beam 30 as follows:
  • the slide 8 is coupled to a driving mechanism 18 shown diagrammatically, which displaces the slide '8 from an initial position in which the focused beam 30 is directed to that part of the terminal cap of a resistor body 1 held in the clamping device which projects from the clamping member 14, at constant speed along the guide path 7 in the direction to the left in FIG. 1, so that the resistor body 1 is explored as it were by the focused beam 30 from the clamping member 14 towards the clamping member 13.
  • the beam 30 Since the resistor body 1 follows the rotation of the clamping members -13 and 14 present in the sleeves 10, the beam 30 describes a helical line across the resistor body having a pitch which is given by the ratio between the rotational speed of the clamping members 13 and 14 and the speed of the rectilinear movement of the slide 8.
  • the material of the resistance layer 3 which is struck by the beam absorbs energy from the beam 30, this material thus being locally evaporated, which process is determined not only by the conversion of heat supplied to the surface of the resistor body 1, but also by the velocity of movement of the resistance layer 3 relative to the beam 30.
  • the terminal caps 4 consist of a metal having a thickness of 0.1 mm. or more, which is thus great relative to the depth of penetration of the beam of rays.
  • the cap to which the beam 30 is directed at the beginning of the processing thus absorbs so little energy from the beam that it is not influenced.
  • the local removal of the resistance layer begins. This local removal takes place along a steadily lengthening, helical narrow path 19 which adjoins the relevant cap (see FIG. 2), whereby the electrical resistance between the terminal caps 4 of the resistor body is raised.
  • This resistance is measured with the aid of a measuring bridge 31 in a measuring device 32, which is electrically connected to the sleeves 10.
  • the measuring device includes means which are not shown but known per se, which provides an indication signal when a predetermined resistance value is reached. This indication signal is used to stop the processing of the resistance layer 3 on the resistor body in the clamping device 6 and also to initiate further manipulations for the purpose of feeding a subsequent resistor body 1 through the tubing 5 to the clamping device 6.
  • the processing of the resistance layer 3 by the beam 30 may be stopped in different ways, for example, by switching off, wholly or in part, the electrical supply for the iraser 20, which is shown in FIG, 1 by an electrical connection for a control signal between the measuring device 32 and the supply voltage source 27, or intercepting the beam 30 or the beam 21 by means of a screen which is movable, for example, electromagnetically and which transmits the beam of rays only to a limited extent, if at all.
  • an electrically controllable light valve such as a Kerr-cell, can be used.
  • a third possibility is neither to switch off the iraser wholly or in part, nor to intercept the beam of rays emerging therefrom, but to ensure by tilting the mirror 28 or dis placing the lens 29 in the axial direction, for example upwards in FIG. 1, that the beam 30 insofar it can still strike the resistor body '1, is defocused locally to such an extent, that the material of the resistance layer 3 is no longer influenced because of the low energy density.
  • the indication signal from the measuring device 32- is also used in a manner not shown in FIG. 1, to reverse the movement of the slide 8, so that the slide returns to the initial position shown, and is used further to open the two clamping members 13 and 14 so that the resistor body 1 just processed is removed through a flexible tubing connected to the member 1 4. Furthermore a subsequent resistor body is supplied through the tubing 5 to the clamping device 6 and held in it to undergo thereafter a similar processing as the previous resistor body which has in the meantime been removed.
  • the whole process can be automated without fundamental difficulty.
  • the beam 30 if the resistance layer 3 consists of a carbon layer of approximately 1,000 Angstrom thick which has been deposited in known manner by dissociation of a hydrocarbon compound, the beam 30 if having an energy of approximately 25 watts permits of forming in this resistance layer a continuous helical path 19 having a width between 1507/. and 200 at a velocity of approximately 0.5 metre per second, that is to say the velocity of the relative displacement of the resistance layer 3 and the focused beam 30 may be 0.5 metre per second.
  • FIG. 2 A resistor body 1 which has been processed by the device of FIG. 1 is shown in FIG. 2, in which 19 indicates the helical path along which the material has been removed from the resistance layer 3 by the beam.
  • the width of this path which may be, for example, 200 microns, is adjustable by adjusting the lens 29, that is to say by focussing the beam 30 more or less sharply on the resistance layer 3.
  • the method described affords the advantage that the edges of the remaining portions of the resistance layer which bound the path 19 are smooth and hence not crumbly, such as occurs in grinding.
  • the surface of the carrier 2 is clean and smooth at the path 19, the surface of the ceramic carrier 2 has fused in situ and the molten material may slightly cover the edges just mentioned. All these factors con tribute to obtaining good reproducibility of the method and to advantageous electrical properties of the resistor manufactured. Due to the smoothness of the edges bounding the path 19, this path may be given a pitch which is lower than is permissible in the known grinding method. This implies that, starting from resistor bodies having specific dimensions and a given resistance layer, the greater possibility of varying the pitch as well as the direct connection of the path 19 to the terminal cap permits of obtaining an assortment of resistors of diiferent ohmic values which is larger than that obtainable with the known grinding method.
  • the method according to the invention aflords several advantages: There is no need to work in vacuo, considerably lower operating voltages are permissible, resulting in a less bulky equipment, greater energy densities can be used without a risk of X-rays ocurring, so that the rate of processing can be increased, which is advantageous for bulk production.
  • FIG. 3 shows diagrammatically a portion of a device which differs from that of FIG. 1 only in a few details, the same reference numerals having been used for corresponding elements.
  • the rotary clamping members 13 and 14 are now fitted on insulating supporting arms 40 and 41 which can rotate about a spindle '44 supported by the slide 8, through an angle bounded by stop cams 42 and 43 and in a plane transverse to the axis of the resistor body 1.
  • the resistor body 1 finds itself wholly outside the beam 30, in the other position the said beam is exactly focused on the resistance layer 3.
  • the processing of this layer by means of the beam 30 can be stopped in this device in a similar manner as in the device of FIG. 1.
  • a further possibility is the use of an electromagnetic operating device 45 coupled to the supporting arms, which device is controlled by the indicating signal from the measuring device 32 and then pushes the resistor body 1 as it were out of the beam 30.
  • the iraser is arranged transversely instead of parallel to the direction of movement of the slide 8. The mirror indicated by 28 in FIG. 1 may then be dispensed with.
  • the material referred to above for the resistance layer '3 is carbon.
  • the method accordinging to the invention is not limited thereto.
  • the resistance layer 3 may consist of metal, such as nickel or nickel chromium, insofar the metal layer is not unduly thick.
  • the local thermal capacity and dissipation of heat must not be such as to prevent the temperature rise necessary for the evaporation of the metal.
  • a nickel-chromium layer of approximately 1000 Angstrom thick can excellently be processed in the described manner by the beam 30 having an energy of 30 watts at a velocity of movement of the beam across the nickel-chromium layer of -approxi-' mately 0.5 metre per second.
  • a method of processing a resistor body initially formed of a resistance layer upon a cylindrical carrier consisting of insulating material with a connecting cap on each end comprising: (a) directing along a helical path on said resistance layer an electro-magnetic beam of rays continuously emitted by a device for producing the beam by simulated emission, (b) focusing the beam onto the re sistance layer, (c) relatively displacing the resistance layer and the beam to traverse said path, and (d) thereby removing resistance material along said path until the electrical resistance between the caps acquires a predetermined value.
  • resistance layer consists of carbon deposited on the insulating carrier.
  • the resistance layer is formed by a metal layer, for example, a nickel-chromium alloy, having a thickness between approximately 20 Angstrom and 3000 Angstrom.
  • a method as defined in claim 1 comprising the further step of varying the energy of the beam uponthe resistor body at the beginning and end of the method.
  • a method as defined in claim 6 comprising the further steps at the beginning and termination of the method of defocusing the beam such that a transition occurs on the resistance layer.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Lasers (AREA)
  • Prostheses (AREA)
US729730A 1967-05-30 1968-05-16 Method of making an electrical resistor Expired - Lifetime US3534472A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6707448A NL6707448A (da) 1967-05-30 1967-05-30

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US3534472A true US3534472A (en) 1970-10-20

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US729730A Expired - Lifetime US3534472A (en) 1967-05-30 1968-05-16 Method of making an electrical resistor

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US (1) US3534472A (da)
DE (1) DE1765142A1 (da)
DK (1) DK127026B (da)
ES (1) ES354386A1 (da)
FR (1) FR1557600A (da)
GB (1) GB1198227A (da)
NL (1) NL6707448A (da)
SE (1) SE334659B (da)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3675317A (en) * 1970-05-13 1972-07-11 Welwya Canada Ltd Method for spiralling electrical resistors
US3699649A (en) * 1969-11-05 1972-10-24 Donald A Mcwilliams Method of and apparatus for regulating the resistance of film resistors
US3768157A (en) * 1971-03-31 1973-10-30 Trw Inc Process of manufacture of semiconductor product
US3772496A (en) * 1971-10-26 1973-11-13 Western Electric Co Methods of forming a conductive path using an oxygen plasma to reduce reflectivity prior to laser machining
US3827142A (en) * 1972-12-11 1974-08-06 Gti Corp Tuning of encapsulated precision resistor
USB346210I5 (da) * 1973-03-29 1975-01-28
US3874075A (en) * 1972-10-31 1975-04-01 Siemens Ag Method for the production of an inductive component element
US3916144A (en) * 1973-04-19 1975-10-28 Crl Electronic Bauelemente Method for adjusting resistors by lasers
US3953706A (en) * 1974-03-29 1976-04-27 Martin Marietta Corporation Laser bent beam controlled dwell wire stripper
US4100393A (en) * 1977-02-08 1978-07-11 Luther Ronald B Method for making a cannula using a laser and the cannula made thereby
US4288330A (en) * 1973-04-03 1981-09-08 Filtrox Maschinenbau Ag Support with rotary symmetric openings for filter aid, method and apparatus
US4329562A (en) * 1977-09-22 1982-05-11 Centre De Recherches Metallurgiques-Centrum Voor Research In Metallurgie Method and device for improving the properties of thin steel plates
US4467311A (en) * 1983-05-02 1984-08-21 Dale Electronics, Inc. Electrical resistor
US4529958A (en) * 1983-05-02 1985-07-16 Dale Electronics, Inc. Electrical resistor
US4539463A (en) * 1984-02-24 1985-09-03 Continental Packaging Company, Inc. Trimming of polyester containers using a laser
EP0168374A2 (fr) * 1984-07-11 1986-01-15 CENTRE DE RECHERCHES METALLURGIQUES CENTRUM VOOR RESEARCH IN DE METALLURGIE Association sans but lucratif Procédé de marquage d'un objet métallique cylindrique, tel qu'un cylindre de laminoir
US4670734A (en) * 1984-11-14 1987-06-02 Caddock Richard E Method of making a compact, high-voltage, noninductive, film-type resistor
EP0399376A2 (en) * 1989-05-24 1990-11-28 Onoda Cement Company, Ltd. Heat fixing roll for copying machine, method of producing the same and electronic copying machine provided with the same
WO2003052776A2 (de) * 2001-12-19 2003-06-26 Elias Russegger Verfahren zum herstellen eier elektrisch leitenden widerstandsschicht sowie heiz- und/oder kühlvorrichtung
US20120205353A1 (en) * 2011-02-10 2012-08-16 Honda Motor Co., Ltd. Cylindrical workpiece cutting apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2161327A (en) * 1984-07-03 1986-01-08 Dale Electronics Laser trimmed plate resistor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3289139A (en) * 1964-02-24 1966-11-29 Dale Electronics Film resistance unit
US3293587A (en) * 1965-10-20 1966-12-20 Sprague Electric Co Electrical resistor and the like
US3388461A (en) * 1965-01-26 1968-06-18 Sperry Rand Corp Precision electrical component adjustment method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3289139A (en) * 1964-02-24 1966-11-29 Dale Electronics Film resistance unit
US3388461A (en) * 1965-01-26 1968-06-18 Sperry Rand Corp Precision electrical component adjustment method
US3293587A (en) * 1965-10-20 1966-12-20 Sprague Electric Co Electrical resistor and the like

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3699649A (en) * 1969-11-05 1972-10-24 Donald A Mcwilliams Method of and apparatus for regulating the resistance of film resistors
US3675317A (en) * 1970-05-13 1972-07-11 Welwya Canada Ltd Method for spiralling electrical resistors
US3768157A (en) * 1971-03-31 1973-10-30 Trw Inc Process of manufacture of semiconductor product
US3772496A (en) * 1971-10-26 1973-11-13 Western Electric Co Methods of forming a conductive path using an oxygen plasma to reduce reflectivity prior to laser machining
US3874075A (en) * 1972-10-31 1975-04-01 Siemens Ag Method for the production of an inductive component element
US3827142A (en) * 1972-12-11 1974-08-06 Gti Corp Tuning of encapsulated precision resistor
USB346210I5 (da) * 1973-03-29 1975-01-28
US3916142A (en) * 1973-03-29 1975-10-28 Gte Automatic Electric Lab Inc Method of static trimming of film deposited resistors
US4288330A (en) * 1973-04-03 1981-09-08 Filtrox Maschinenbau Ag Support with rotary symmetric openings for filter aid, method and apparatus
US3916144A (en) * 1973-04-19 1975-10-28 Crl Electronic Bauelemente Method for adjusting resistors by lasers
US3953706A (en) * 1974-03-29 1976-04-27 Martin Marietta Corporation Laser bent beam controlled dwell wire stripper
US4100393A (en) * 1977-02-08 1978-07-11 Luther Ronald B Method for making a cannula using a laser and the cannula made thereby
US4329562A (en) * 1977-09-22 1982-05-11 Centre De Recherches Metallurgiques-Centrum Voor Research In Metallurgie Method and device for improving the properties of thin steel plates
US4529958A (en) * 1983-05-02 1985-07-16 Dale Electronics, Inc. Electrical resistor
US4467311A (en) * 1983-05-02 1984-08-21 Dale Electronics, Inc. Electrical resistor
US4539463A (en) * 1984-02-24 1985-09-03 Continental Packaging Company, Inc. Trimming of polyester containers using a laser
AU581200B2 (en) * 1984-02-24 1989-02-16 Continental Packaging Co. Inc. Trimming of polyester containers using a laser
EP0168374A2 (fr) * 1984-07-11 1986-01-15 CENTRE DE RECHERCHES METALLURGIQUES CENTRUM VOOR RESEARCH IN DE METALLURGIE Association sans but lucratif Procédé de marquage d'un objet métallique cylindrique, tel qu'un cylindre de laminoir
EP0168374A3 (en) * 1984-07-11 1988-08-03 Centre De Recherches Metallurgiques Centrum Voor Research In De Metallurgie Association Sans But Lucratif Method for marking a cylindrical metal object, such as a roll of a rolling mill
US4670734A (en) * 1984-11-14 1987-06-02 Caddock Richard E Method of making a compact, high-voltage, noninductive, film-type resistor
EP0399376A2 (en) * 1989-05-24 1990-11-28 Onoda Cement Company, Ltd. Heat fixing roll for copying machine, method of producing the same and electronic copying machine provided with the same
EP0399376A3 (en) * 1989-05-24 1992-06-10 Onoda Cement Company, Ltd. Heat fixing roll for copying machine, method of producing the same and electronic copying machine provided with the same
WO2003052776A2 (de) * 2001-12-19 2003-06-26 Elias Russegger Verfahren zum herstellen eier elektrisch leitenden widerstandsschicht sowie heiz- und/oder kühlvorrichtung
WO2003052776A3 (de) * 2001-12-19 2004-03-04 Elias Russegger Verfahren zum herstellen eier elektrisch leitenden widerstandsschicht sowie heiz- und/oder kühlvorrichtung
US20060108354A1 (en) * 2001-12-19 2006-05-25 Watlow Electric Manufacturing Company Method for the production of an electrically conductive resistive layer and heating and/or cooling device
EP2009648A1 (de) * 2001-12-19 2008-12-31 Watlow Electric Manufacturing Company Heiz- und/oder Kühlvorrichtung mit mehreren Schichten
US9029742B2 (en) 2001-12-19 2015-05-12 Watlow Electric Manufacturing Company Method for the production of an electrically conductive resistive layer and heating and/or cooling device
US20120205353A1 (en) * 2011-02-10 2012-08-16 Honda Motor Co., Ltd. Cylindrical workpiece cutting apparatus
US10052718B2 (en) * 2011-02-10 2018-08-21 Honda Motor Co., Ltd. Cylindrical workpiece cutting apparatus

Also Published As

Publication number Publication date
ES354386A1 (es) 1970-02-16
DE1765142A1 (de) 1971-07-01
GB1198227A (en) 1970-07-08
FR1557600A (da) 1969-02-14
NL6707448A (da) 1968-12-02
DK127026B (da) 1973-09-10
SE334659B (da) 1971-05-03

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