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US3483049A - Method of froth etching - Google Patents

Method of froth etching Download PDF

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Publication number
US3483049A
US3483049A US514846A US3483049DA US3483049A US 3483049 A US3483049 A US 3483049A US 514846 A US514846 A US 514846A US 3483049D A US3483049D A US 3483049DA US 3483049 A US3483049 A US 3483049A
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United States
Prior art keywords
reagent
workpiece
froth
etching
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US514846A
Inventor
Raymond J Grubbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Teletype Corp
Original Assignee
Teletype Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of US3483049A publication Critical patent/US3483049A/en
Assigned to AT&T TELETYPE CORPORATION A CORP OF DE reassignment AT&T TELETYPE CORPORATION A CORP OF DE CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE AUG., 17, 1984 Assignors: TELETYPE CORPORATION
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/08Apparatus, e.g. for photomechanical printing surfaces
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching

Definitions

  • ABSTRACT OF THE DISCLOSURE A method of etching workpieces including the steps of bubbling air through a container of liquid etching reagent to form a froth or foam of reagent on the surface of the liquid, attaching the workipece to a buoyant member and floating the buoyant member on the foam with the workpiece in contact with the foam.
  • the workpiece In etching a flat, resist-coated workpiece, the workpiece is usually suspended in a vertical plane in front of a spray of etching reagent. Reagent that is partially spent by etching the areas at the top of the workpiece flows down the face of the workpiece and mixes with fresh reagent sprayed onto the bottom of the workpiece thereby etching the bottom of the workpiece 'with a less-active reagent than that used to etch the top of the workpiece. This results in a workpiece with an uneven amount of etching of the uncoated areas of the workpiece.
  • a container of liquid reagent is provided with a plurality of orifices placed at or near the bottom of the container. Air under pressure is passed through the orifices to bubble up through the body of the liquid reagent, forming a foam or froth of reagent on the top surface of the body of liquid reagent.
  • a tank 10 made of an etch-resistant material is half filled with a liquid etching reagent 11 (such as a ferric chloride solution).
  • a manifold 12 having many minute holes in its upper surface immersed in the liquid reagent 11 and is positioned near the bottom of the tank 10.
  • One end 13 of the manifold is connected by tubing 14 to a pump 15 which pumps atmospheric air to the manifold 12 where it is expelled through the minute holes on the upper surface of the manifold.
  • a workpiece that is coated on at least one side With a pattern of etch-resistant material is secured by clamps 21 to a board 22 which is made of wood or some other buoyant material that is not adversely effected by the reagent 11.
  • the buoyant board 22 is placed on the 3,483,049 Patented Dec. 9, 1969 exposed surface of the reagent with the resist-coated surface of the workpiece 20 facing the surface 25 of the liquid reagent.
  • the buoyant board 22 with the workpiece 20 facing downwardly is allowed to float on this froth formed on the surface of the reagent.
  • the workpiece 20 may be placed on the surface 25 of the reagent 11 before or after the pump 15 is started so long as it is floated on top of the froth most of the time during which etching takes place.
  • the volume of air provided by pump 15 to manifold 12 determines the rate at which bubbles 30' rise through the reagent 11 and thus determines the quantity of froth 31 appearing on surface 25 of the reagent.
  • the thickness of froth between the resist-coated surface of the workpiece and the surface 25 of the reagent 11 is preferably one to two inches.
  • the volume of air provided by the pump 15 is varied until approximately this thickness of froth is obtained.
  • a method of etching a workpiece with a liquid etching reagent comprising:
  • step of forming a froth includes the step of bubbling a gas through the liquid reagent.
  • a method of etching a workpiece with a liquid etching reagent including the steps of:
  • step of forming the froth of reagent includes the steps of:
  • step of holding the workpiece against the froth of reagent includes the steps of:
  • a method of etching a workpiece with a liquid etch- UNITE STATES PATENTS ing reagent including the steps of: 1,313,233 8/1919 Grass 156-5 continuously generating a foam of the reagent, and FOREIGN PATENTS floating the workpiece on the generated foam.
  • the step 566913 1/1945 Gmat Bnmm' of generating a foam includes the step of passing a gas JACOB H STEINBERG Primary Examiner through a quantity of liquid reagent.
  • step 10 US 01 X R of passing a gas through the liquid reagent includes the step of forming the gas into a plurality of bubbles each 345 of small size relative to the workpiece.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Description

Dec. 9, 1969 R. J. GRUBBE METHOD OF FROTH ETCHING Filed Dec. 20, 1965 PUMP INVENTOR RAYMOND J. GRUBBE BY G ATTORN United States Patent 3,483,049 METHOD OF FROTH ETCHING Raymond J. Grubbe, Des Plaines, Ill., assignor to Teletype Corporation, Skokie, Ill., a corporation of Delaware Filed Dec. 20, 1965, Ser. No. 514,846 Int. Cl. C23f N02 US. Cl. 1565 9 Claims ABSTRACT OF THE DISCLOSURE A method of etching workpieces including the steps of bubbling air through a container of liquid etching reagent to form a froth or foam of reagent on the surface of the liquid, attaching the workipece to a buoyant member and floating the buoyant member on the foam with the workpiece in contact with the foam.
In etching a flat, resist-coated workpiece, the workpiece is usually suspended in a vertical plane in front of a spray of etching reagent. Reagent that is partially spent by etching the areas at the top of the workpiece flows down the face of the workpiece and mixes with fresh reagent sprayed onto the bottom of the workpiece thereby etching the bottom of the workpiece 'with a less-active reagent than that used to etch the top of the workpiece. This results in a workpiece with an uneven amount of etching of the uncoated areas of the workpiece.
It is an object of the present invention to vigorously deposit etching reagent uniformly on the surface of a workpiece to be etched.
It is another object of the present invention to maintain a substantially uniform concentration of etching reagent on all portions of the surface of a workpiece.
In accordance with the preferred embodiment of the invention, a container of liquid reagent is provided with a plurality of orifices placed at or near the bottom of the container. Air under pressure is passed through the orifices to bubble up through the body of the liquid reagent, forming a foam or froth of reagent on the top surface of the body of liquid reagent. A workpiece that has been coated with a pattern of etch-resistant material 15 fastened to a buoyant support which is then floated, workpiece down, on the froth of reagent.
A more complete understanding of the invention may be had from the following detailed description when considered in conjunction with the accompanying drawing which shows a cut-away view of a tank of liquid reagent with a workpiece floating on top of the froth formed at the surface of the liquid reagent.
Referring now to the drawing, a tank 10 made of an etch-resistant material is half filled with a liquid etching reagent 11 (such as a ferric chloride solution). A manifold 12 having many minute holes in its upper surface immersed in the liquid reagent 11 and is positioned near the bottom of the tank 10. One end 13 of the manifold is connected by tubing 14 to a pump 15 which pumps atmospheric air to the manifold 12 where it is expelled through the minute holes on the upper surface of the manifold.
A workpiece that is coated on at least one side With a pattern of etch-resistant material is secured by clamps 21 to a board 22 which is made of wood or some other buoyant material that is not adversely effected by the reagent 11. The buoyant board 22 is placed on the 3,483,049 Patented Dec. 9, 1969 exposed surface of the reagent with the resist-coated surface of the workpiece 20 facing the surface 25 of the liquid reagent. When the pump 15 is turned on, the air escaping from the minute holes in the manifold 12 forms bubbles 30 that rise through the liquid reagent 11 and form a foam or froth 31 on the top surface 25 of the reagent 11. The buoyant board 22 with the workpiece 20 facing downwardly is allowed to float on this froth formed on the surface of the reagent. The workpiece 20 may be placed on the surface 25 of the reagent 11 before or after the pump 15 is started so long as it is floated on top of the froth most of the time during which etching takes place.
The volume of air provided by pump 15 to manifold 12 determines the rate at which bubbles 30' rise through the reagent 11 and thus determines the quantity of froth 31 appearing on surface 25 of the reagent. The thickness of froth between the resist-coated surface of the workpiece and the surface 25 of the reagent 11 is preferably one to two inches. The volume of air provided by the pump 15 is varied until approximately this thickness of froth is obtained.
As the bubbles of the froth touch the resist-coated workpiece, they burst. This action causes spent reagent to be wiped from the surface of the workpiece and fresh reagent carried by the bubbles to be deposited uniformly over the workpiece. This keeps a quantity of uniformly concentrated reagent at the surface of the workpiece.
Although only one embodiment of the invention is shown in the drawing and described in the foregoing specification, it will be understood that the invention is not limited to the specific embodiment described, but is capable of modification and rearrangement and substitution of parts and elements without departing from the spirit of the invention.
What is claimed is:
1. A method of etching a workpiece with a liquid etching reagent comprising:
forming a froth of reagent on the surface of the liquid reagent; and
floating the workpiece on the froth.
2. The method according to claim 1 wherein the step of forming a froth includes the step of bubbling a gas through the liquid reagent.
3. The method according to claim 1 wherein the step of floating a workpiece on the froth of reagent is carried out by:
fastening the workpiece to a buoyant member, and
floating the buoyant member on top of the froth with the workpiece engaged with the froth.
4. A method of etching a workpiece with a liquid etching reagent including the steps of:
filling a container with a quantity of liquid reagent;
forming a froth of reagent at the surface of the liquid reagent in the container; and
holding the workpiece against the froth of reagent.
5. The method according to claim 4 wherein the step of forming the froth of reagent includes the steps of:
delivering a gas to the bottom of the container;
forming the gas into a plurality of bubbles, and passing the bubbles through the liquid in the container.
6. The method according to claim 4 wherein the step of holding the workpiece against the froth of reagent includes the steps of:
attaching the workpiece to a buoyant member, and
supporting the buoyant member on the reagent froth 3 4- with the workpiece facing the froth thereby constantly References Cited delivering fresh reagent to the workpiece. D 7. A method of etching a workpiece with a liquid etch- UNITE STATES PATENTS ing reagent including the steps of: 1,313,233 8/1919 Grass 156-5 continuously generating a foam of the reagent, and FOREIGN PATENTS floating the workpiece on the generated foam. 8. The method according to claim 7 wherein the step 566913 1/1945 Gmat Bnmm' of generating a foam includes the step of passing a gas JACOB H STEINBERG Primary Examiner through a quantity of liquid reagent.
9. The method according to claim 8 wherein the step 10 US 01 X R of passing a gas through the liquid reagent includes the step of forming the gas into a plurality of bubbles each 345 of small size relative to the workpiece.
US514846A 1965-12-20 1965-12-20 Method of froth etching Expired - Lifetime US3483049A (en)

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US51484665A 1965-12-20 1965-12-20

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CA (1) CA831488A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2030304A1 (en) * 1970-06-19 1971-12-23 Lemmen W Printed circuit etching - with foamed etchant
US3853647A (en) * 1972-10-02 1974-12-10 Hilgartner Natural Stone Co In Process for creating designs on marble
US4360410A (en) * 1981-03-06 1982-11-23 Western Electric Company, Inc. Electroplating processes and equipment utilizing a foam electrolyte
US4555302A (en) * 1984-08-24 1985-11-26 Urbanik John C Method and apparatus for ultrasonic etching of printing plates
US5334254A (en) * 1992-10-21 1994-08-02 Paul J. Gelardi Non-abrasive disc cleaner
EP0673545A1 (en) * 1993-10-08 1995-09-27 MEMC Electronic Materials, Inc. Process and apparatus for etching semiconductor wafers
US5815942A (en) * 1996-12-13 1998-10-06 Kabushiki Kaisha Toshiba Vapor drying system and method
US20040094268A1 (en) * 2002-11-20 2004-05-20 Brask Justin K. Oxidation inhibitor for wet etching processes
WO2010151471A1 (en) * 2009-06-25 2010-12-29 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1313233A (en) * 1919-08-12 Ernest grass
GB566913A (en) * 1943-08-11 1945-01-18 George Stanley Walpole Improvements in or relating to a method of and means for carrying out acid etching operations

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1313233A (en) * 1919-08-12 Ernest grass
GB566913A (en) * 1943-08-11 1945-01-18 George Stanley Walpole Improvements in or relating to a method of and means for carrying out acid etching operations

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2030304A1 (en) * 1970-06-19 1971-12-23 Lemmen W Printed circuit etching - with foamed etchant
US3853647A (en) * 1972-10-02 1974-12-10 Hilgartner Natural Stone Co In Process for creating designs on marble
US4360410A (en) * 1981-03-06 1982-11-23 Western Electric Company, Inc. Electroplating processes and equipment utilizing a foam electrolyte
US4555302A (en) * 1984-08-24 1985-11-26 Urbanik John C Method and apparatus for ultrasonic etching of printing plates
US5334254A (en) * 1992-10-21 1994-08-02 Paul J. Gelardi Non-abrasive disc cleaner
EP0673545A1 (en) * 1993-10-08 1995-09-27 MEMC Electronic Materials, Inc. Process and apparatus for etching semiconductor wafers
EP0673545A4 (en) * 1993-10-08 1996-05-29 Memc Electronic Materials Process and apparatus for etching semiconductor wafers.
US5815942A (en) * 1996-12-13 1998-10-06 Kabushiki Kaisha Toshiba Vapor drying system and method
US20040094268A1 (en) * 2002-11-20 2004-05-20 Brask Justin K. Oxidation inhibitor for wet etching processes
WO2010151471A1 (en) * 2009-06-25 2010-12-29 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
CN102803562A (en) * 2009-06-25 2012-11-28 3M创新有限公司 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
US8647522B2 (en) 2009-06-25 2014-02-11 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
CN102803562B (en) * 2009-06-25 2015-09-30 3M创新有限公司 The method of Wet-type etching self-assembled monolayer patterned substrate and metal pattern goods

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Publication number Publication date
CA831488A (en) 1970-01-06

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AS Assignment

Owner name: AT&T TELETYPE CORPORATION A CORP OF DE

Free format text: CHANGE OF NAME;ASSIGNOR:TELETYPE CORPORATION;REEL/FRAME:004372/0404

Effective date: 19840817