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US3473926A - Negative material for converting from letterpress to lithography - Google Patents

Negative material for converting from letterpress to lithography Download PDF

Info

Publication number
US3473926A
US3473926A US364799A US3473926DA US3473926A US 3473926 A US3473926 A US 3473926A US 364799 A US364799 A US 364799A US 3473926D A US3473926D A US 3473926DA US 3473926 A US3473926 A US 3473926A
Authority
US
United States
Prior art keywords
layer
light sensitive
ink
letterpress
silver halide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US364799A
Other languages
English (en)
Inventor
Thomas I Abbott
Hugo F Huedepohl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of US3473926A publication Critical patent/US3473926A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/81—Photosensitive materials characterised by the base or auxiliary layers characterised by anticoiling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Definitions

  • the second layer comprises an alkyl acrylate-acrylic acid copolymer representing 5 0-90% of an alkyl acrylate and 1050% of acrylic acid.
  • the alkyl group in the alkyl acrylate may contain from 1-4 carbon atoms.
  • an ethyl acrylate-acrylic acid copolymer representing ethyl acrylate and 20% acrylic acid is used.
  • Typical copolymers are disclosed in US. Patent No. 3,062,674, issued Nov. 6 1962 to Houck et al. Cellulose ether phthalate or cellulose acetate phthalate may also be used.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
US364799A 1964-05-04 1964-05-04 Negative material for converting from letterpress to lithography Expired - Lifetime US3473926A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36479964A 1964-05-04 1964-05-04

Publications (1)

Publication Number Publication Date
US3473926A true US3473926A (en) 1969-10-21

Family

ID=23436126

Family Applications (1)

Application Number Title Priority Date Filing Date
US364799A Expired - Lifetime US3473926A (en) 1964-05-04 1964-05-04 Negative material for converting from letterpress to lithography

Country Status (4)

Country Link
US (1) US3473926A (sv)
BE (1) BE663380A (sv)
DE (1) DE1266644B (sv)
GB (1) GB1103914A (sv)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647454A (en) * 1970-02-09 1972-03-07 Eastman Kodak Co Title-backed photosensitive microfiche
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1124594A (en) * 1914-06-11 1915-01-12 James G Coffin Art of printing.
US1302919A (en) * 1919-05-06 Process of producing printing-plates
US1700262A (en) * 1927-05-06 1929-01-29 Heinecke William Method of making negatives
US1992965A (en) * 1932-09-19 1935-03-05 Multigraph Co Method of preserving colloid films
US2322037A (en) * 1939-07-07 1943-06-15 Eastman Kodak Co Photographic film
US2734298A (en) * 1952-06-21 1956-02-14 Mechanical negative process and resist
US2760863A (en) * 1951-08-20 1956-08-28 Du Pont Photographic preparation of relief images
US2760431A (en) * 1952-06-19 1956-08-28 Dick Co Ab Lithographic plates and methods for manufacturing same
US2798004A (en) * 1954-01-26 1957-07-02 Eastman Kodak Co Film lacquer
US2810341A (en) * 1949-01-13 1957-10-22 Azoplate Corp Reproduction in flat and offset printing
US2903964A (en) * 1955-01-24 1959-09-15 Eastman Kodak Co Photographic spirit duplicating process
US2927023A (en) * 1956-08-27 1960-03-01 Du Pont Photopolymerizable compositions
US3016823A (en) * 1958-06-11 1962-01-16 Fitchburg Paper Lithographic printing plate and method of making the same
US3062648A (en) * 1960-02-09 1962-11-06 Eastman Kodak Co Photographically sensitive lithographic printing plate
US3136637A (en) * 1958-11-26 1964-06-09 Minnesota Mining & Mfg Presensitized lithographic light-sensitive sheet construction
US3284201A (en) * 1961-12-21 1966-11-08 Grinten Chem L V D Three layered light-sensitive diazotype material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3062674A (en) * 1959-01-12 1962-11-06 Eastman Kodak Co Photographic product having layer containing bisepoxy ether crosslinked ethyl acrylate-acrylic acid copolymer
NL276914A (sv) * 1961-04-10

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1302919A (en) * 1919-05-06 Process of producing printing-plates
US1124594A (en) * 1914-06-11 1915-01-12 James G Coffin Art of printing.
US1700262A (en) * 1927-05-06 1929-01-29 Heinecke William Method of making negatives
US1992965A (en) * 1932-09-19 1935-03-05 Multigraph Co Method of preserving colloid films
US2322037A (en) * 1939-07-07 1943-06-15 Eastman Kodak Co Photographic film
US2810341A (en) * 1949-01-13 1957-10-22 Azoplate Corp Reproduction in flat and offset printing
US2760863A (en) * 1951-08-20 1956-08-28 Du Pont Photographic preparation of relief images
US2760431A (en) * 1952-06-19 1956-08-28 Dick Co Ab Lithographic plates and methods for manufacturing same
US2734298A (en) * 1952-06-21 1956-02-14 Mechanical negative process and resist
US2798004A (en) * 1954-01-26 1957-07-02 Eastman Kodak Co Film lacquer
US2903964A (en) * 1955-01-24 1959-09-15 Eastman Kodak Co Photographic spirit duplicating process
US2927023A (en) * 1956-08-27 1960-03-01 Du Pont Photopolymerizable compositions
US3016823A (en) * 1958-06-11 1962-01-16 Fitchburg Paper Lithographic printing plate and method of making the same
US3136637A (en) * 1958-11-26 1964-06-09 Minnesota Mining & Mfg Presensitized lithographic light-sensitive sheet construction
US3062648A (en) * 1960-02-09 1962-11-06 Eastman Kodak Co Photographically sensitive lithographic printing plate
US3284201A (en) * 1961-12-21 1966-11-08 Grinten Chem L V D Three layered light-sensitive diazotype material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647454A (en) * 1970-02-09 1972-03-07 Eastman Kodak Co Title-backed photosensitive microfiche
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography

Also Published As

Publication number Publication date
GB1103914A (en) 1968-02-21
BE663380A (sv)
DE1266644B (de) 1968-04-18

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