US2979631A - Process for the production of ion-emitting surfaces, particularly for halogen leak detectors - Google Patents
Process for the production of ion-emitting surfaces, particularly for halogen leak detectors Download PDFInfo
- Publication number
- US2979631A US2979631A US735327A US73532758A US2979631A US 2979631 A US2979631 A US 2979631A US 735327 A US735327 A US 735327A US 73532758 A US73532758 A US 73532758A US 2979631 A US2979631 A US 2979631A
- Authority
- US
- United States
- Prior art keywords
- ion
- production
- anode
- emitting surfaces
- leak detectors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052736 halogen Inorganic materials 0.000 title description 11
- 150000002367 halogens Chemical class 0.000 title description 11
- 238000000034 method Methods 0.000 title description 8
- 238000004519 manufacturing process Methods 0.000 title description 6
- 150000002500 ions Chemical class 0.000 description 25
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 150000003112 potassium compounds Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
Definitions
- Ion sources are known in which suitable materials, chiefly alkali or alkaline earth metals and/or their compounds, are used as ion-forming activated materials, which are suspended in a suitably shaped storage chamber.
- a suitably shaped storage chamber preferably a ceramic tube
- Such a chamber preferably a ceramic tube, is heated by a special heating device,perhaps by a current-carrying wire coil.
- the activated materials to be volatilized are deposited on the material of a small ceramic tube.
- the tube is then surrounded with aheating coil, which causes the evaporation of the volatile substances.
- aheating coil which causes the evaporation of the volatile substances.
- alkali or alkaline earth metals are evaporated from a storage chamber further removed from the anode, so that the atoms of the metal vapor formed at the aperture are ionized by the perforated or porous anode surface.
- ion sources in so-called halogen leak detectors as they are used in chemical apparatus for the locating of'leaks.
- an ion source is necessary which is resistant to air penetration with suflicient temporary stability.
- the ion source must, moreover, show a high sensitivity to halogens so that very small traces provoke at once a marked change of ion emission.
- ions are released by the ion source and are absorbed by a preferably cold cathode. If halogen vapor (for example CFzCl-z) is formed around such an ion source, the stream of ions is altered and an attached meter indicates the presence of the halide.
- a vacuum For detection a vacuum must iirst be produced in the apparatus' and after this the outer surfaces of the seal are swept for possible leak points with a halogen containing test gas, for example CF2C12.
- a halogen containing test gas for example CF2C12.
- CF2C12 halogen containing test gas
- There the iniiuence of the halogen vapor produces a correspondnig change of emission at the anode. In this way leaks in extensive and complicated apparatus of the large chemical industries can be located in a short time.
- a known method of making an ion source for halogen leak detector is shown in the sketch.
- a small ceramic tube 1 which contains a suitable supply of activated material (for example potassium compounds) is arranged a PatentedvApr. 11, 1961 in a discharge gap which the ions arising from the yanode areabsorbed by a cold cathode 4.
- the method of "operating suchaion source is as follows: First the vaporized metallic atoms emerge from the surface of the small ceramic tube and diffuse subsequently, preferably along the grain boundaries of the polycrystalline metal casing of the covering 3, to its outer surface where in the charging field ions of the activated substance are formed.
- the present new invention discloses a process for the production of ion-emitting surfaces, especially for halogen leak detectors, in which the activated substance, vaporizing from a supply source, passes through a plate-shaped anode and comprises depositing foreign atoms in measured amount on the crystalline getterer of the anode sheets and in the crystalline interstices.
- the structure of the grain boundaries of the anode plates are so aiected that practically with no waste there can be accomplished the production of ion sources which show a high and uniform emission of ions and marked sensitivity of the electrode toward halogens.
- the foreign atoms which are to be embedded must be so supplied that an expansion of the gettering structure and of the ntergranular space occurs. They are furthermore so selected that the process of causing the appropriate sensitivity at the anode is not lessened. With an anode plate of platinum the deposit of carbon as the foreign atoms has worked well.
- the carbon atoms are embedded in the platinum Y sheet by thermal diffusion.
- the platinum sheet designed as a tube, is mounted on a suitable carbon arc lamp, and it is embedded for a certain period at elevated temperature, preferably in a reducing atmosphere. Temperatures between about 500 C. and 1000 C. preferably about 700 C. can be suitably employed. In place of deposition in the reducing atmosphere, embedding can be done in a vacuum. According to the duration of the annealing, annealing temperature and raw material, one obtains different high ion' currents from the ion source produced and different high diffusion coefficients of the activated material through the anode metal. These parameters can be varied within broad limits and thus it is possible to produce ion sources which are adjusted to the most different requirements with respect to duration, yield, and sensitivity.
- a detector for a linely divided atmospheric substance capable of inducing the formation of positive ions at a conductive surface comprising an electrical discharge device including a pair of electrodes, means for causing a quantity of an atmosphere containing said substance to pass between said electrodes, means for imposing an electric potential difference between said electrodes, and means for detecting changes in the current between said electrodes caused by the formation of positive ions at one of said electrodes due to the presence of said substance, the electrode at which said ions are formed comprising a platinum sheet-like anode having adjacent thereto a ceramic container for activated material, said anode having carbon embedded therein so that said activated maten'al may penetrate said anode through interstices present in said platinum carbon material.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Description
Aplll 11, MOESTA PROCESS FOR THE PRODUCTION OF ION-EMITTING SURFACES. PRTICULARLY FOR HALOGEN LEAK DETECTORS Filed May 14, 1958 INVENTOR. Hass o M0 csfa.
United States Patent() Hasso Moesta, Koln-Weidenpesch, Germany, assignor to y National Research Corporation, Cambridge, Mass., a corporation of Massachusetts Filed May 14, 1958, Ser. No. 735,327
1 Claim. (Cl. 313-63) Ion sources are known in which suitable materials, chiefly alkali or alkaline earth metals and/or their compounds, are used as ion-forming activated materials, which are suspended in a suitably shaped storage chamber. Such a chamber, preferably a ceramic tube, is heated by a special heating device,perhaps by a current-carrying wire coil.
In a known method of performance the activated materials to be volatilized are deposited on the material of a small ceramic tube. The tube is then surrounded with aheating coil, which causes the evaporation of the volatile substances. At a slight distance from this evaporation set-up formed from the small ceramic tube and the heating coil belonging to it there is another coil which serves as the anode.r
In another known construction of an ion source alkali or alkaline earth metals are evaporated from a storage chamber further removed from the anode, so that the atoms of the metal vapor formed at the aperture are ionized by the perforated or porous anode surface.
Special problems arise with the use of ion sources in so-called halogen leak detectors as they are used in chemical apparatus for the locating of'leaks. In these instruments an ion source is necessary which is resistant to air penetration with suflicient temporary stability. The ion source must, moreover, show a high sensitivity to halogens so that very small traces provoke at once a marked change of ion emission. On operating such a halogen leak detector ions are released by the ion source and are absorbed by a preferably cold cathode. If halogen vapor (for example CFzCl-z) is formed around such an ion source, the stream of ions is altered and an attached meter indicates the presence of the halide. For detection a vacuum must iirst be produced in the apparatus' and after this the outer surfaces of the seal are swept for possible leak points with a halogen containing test gas, for example CF2C12. Under the effect of the surrounding air test gas diffuses through the unsealed points linto the inside of the apparatus and is passed on into the attached leak detector tube with the ion source. There the iniiuence of the halogen vapor produces a correspondnig change of emission at the anode. In this way leaks in extensive and complicated apparatus of the large chemical industries can be located in a short time. t
A known method of making an ion source for halogen leak detector is shown in the sketch. In a small ceramic tube 1 which contains a suitable supply of activated material (for example potassium compounds) is arranged a PatentedvApr. 11, 1961 in a discharge gap which the ions arising from the yanode areabsorbed by a cold cathode 4. The method of "operating suchaion source is as follows: First the vaporized metallic atoms emerge from the surface of the small ceramic tube and diffuse subsequently, preferably along the grain boundaries of the polycrystalline metal casing of the covering 3, to its outer surface where in the charging field ions of the activated substance are formed.
The duration and sensitivity of such an ion source depend now on the size and the time constant of the diffusion process of the metal atoms through the covering 3. In the practical production of such ion sources great diiiiculties arise since the structure of the grain boundary of the platinum sheet varies from lot to lot and since likewise varying porosity acts in a similar way. After the discovery that the elfectiveness of such ion sources depends on the diffusion of the activated material along the grain boundaries and through porous places, porous sintered metal has been used for the covering 3. Such porous sintered shapes of platinum are uneconomical.
The present new invention discloses a process for the production of ion-emitting surfaces, especially for halogen leak detectors, in which the activated substance, vaporizing from a supply source, passes through a plate-shaped anode and comprises depositing foreign atoms in measured amount on the crystalline getterer of the anode sheets and in the crystalline interstices. By this preparative process the structure of the grain boundaries of the anode plates are so aiected that practically with no waste there can be accomplished the production of ion sources which show a high and uniform emission of ions and marked sensitivity of the electrode toward halogens. The foreign atoms which are to be embedded must be so supplied that an expansion of the gettering structure and of the ntergranular space occurs. They are furthermore so selected that the process of causing the appropriate sensitivity at the anode is not lessened. With an anode plate of platinum the deposit of carbon as the foreign atoms has worked well.
In a particularly favorable embodiment of the new process the carbon atoms are embedded in the platinum Y sheet by thermal diffusion. For this purpose the platinum sheet, designed as a tube, is mounted on a suitable carbon arc lamp, and it is embedded for a certain period at elevated temperature, preferably in a reducing atmosphere. Temperatures between about 500 C. and 1000 C. preferably about 700 C. can be suitably employed. In place of deposition in the reducing atmosphere, embedding can be done in a vacuum. According to the duration of the annealing, annealing temperature and raw material, one obtains different high ion' currents from the ion source produced and different high diffusion coefficients of the activated material through the anode metal. These parameters can be varied within broad limits and thus it is possible to produce ion sources which are adjusted to the most different requirements with respect to duration, yield, and sensitivity. fy
What is claimed is:
A detector for a linely divided atmospheric substance capable of inducing the formation of positive ions at a conductive surface comprising an electrical discharge device including a pair of electrodes, means for causing a quantity of an atmosphere containing said substance to pass between said electrodes, means for imposing an electric potential difference between said electrodes, and means for detecting changes in the current between said electrodes caused by the formation of positive ions at one of said electrodes due to the presence of said substance, the electrode at which said ions are formed comprising a platinum sheet-like anode having adjacent thereto a ceramic container for activated material, said anode having carbon embedded therein so that said activated maten'al may penetrate said anode through interstices present in said platinum carbon material.
References Cited in the tile of this patent UNITEDfsTATE-s PATENTS yYllilliams Feb. 14, 1950 Rice Apr. 24, 1951 Morgan Sept. 29, 1953 De Juren Aug. 16, 1955 Zemany Apr. 17, 1956 Bouty July 10, 1956 Bouty May 20, 1958
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US735327A US2979631A (en) | 1958-05-14 | 1958-05-14 | Process for the production of ion-emitting surfaces, particularly for halogen leak detectors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US735327A US2979631A (en) | 1958-05-14 | 1958-05-14 | Process for the production of ion-emitting surfaces, particularly for halogen leak detectors |
Publications (1)
Publication Number | Publication Date |
---|---|
US2979631A true US2979631A (en) | 1961-04-11 |
Family
ID=24955307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US735327A Expired - Lifetime US2979631A (en) | 1958-05-14 | 1958-05-14 | Process for the production of ion-emitting surfaces, particularly for halogen leak detectors |
Country Status (1)
Country | Link |
---|---|
US (1) | US2979631A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3439262A (en) * | 1964-12-04 | 1969-04-15 | Gen Electric | Electrical vapor detector with indirectly heated cathode |
US3535088A (en) * | 1966-07-01 | 1970-10-20 | Bodenseewerk Perkin Elmer Co | Halogen vapor detector |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1852865A (en) * | 1927-02-21 | 1932-04-05 | Westinghouse Electric & Mfg Co | Carbonized nonemissive electrode |
US2497109A (en) * | 1946-02-04 | 1950-02-14 | Eitel Mccullough Inc | Electrode for electron tubes |
US2550498A (en) * | 1947-06-14 | 1951-04-24 | Gen Electric | Method and apparatus for electrically detecting vapors and the like |
US2653620A (en) * | 1949-01-04 | 1953-09-29 | Phillips Petroleum Co | Process and means for regulating the gas pressure in containers |
US2715695A (en) * | 1947-06-19 | 1955-08-16 | Juren James A De | Ion producing mechanism |
US2742585A (en) * | 1952-08-22 | 1956-04-17 | Gen Electric | Electrical vapor detector |
US2754442A (en) * | 1954-05-25 | 1956-07-10 | Hartford Nat Bank & Trust Co | Ion source |
-
1958
- 1958-05-14 US US735327A patent/US2979631A/en not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1852865A (en) * | 1927-02-21 | 1932-04-05 | Westinghouse Electric & Mfg Co | Carbonized nonemissive electrode |
US2497109A (en) * | 1946-02-04 | 1950-02-14 | Eitel Mccullough Inc | Electrode for electron tubes |
US2550498A (en) * | 1947-06-14 | 1951-04-24 | Gen Electric | Method and apparatus for electrically detecting vapors and the like |
US2715695A (en) * | 1947-06-19 | 1955-08-16 | Juren James A De | Ion producing mechanism |
US2653620A (en) * | 1949-01-04 | 1953-09-29 | Phillips Petroleum Co | Process and means for regulating the gas pressure in containers |
US2742585A (en) * | 1952-08-22 | 1956-04-17 | Gen Electric | Electrical vapor detector |
US2754442A (en) * | 1954-05-25 | 1956-07-10 | Hartford Nat Bank & Trust Co | Ion source |
US2835835A (en) * | 1954-05-25 | 1958-05-20 | Philips Corp | Ion source |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3439262A (en) * | 1964-12-04 | 1969-04-15 | Gen Electric | Electrical vapor detector with indirectly heated cathode |
US3535088A (en) * | 1966-07-01 | 1970-10-20 | Bodenseewerk Perkin Elmer Co | Halogen vapor detector |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5892364A (en) | Trace constituent detection in inert gases | |
US5105123A (en) | Hollow electrode plasma excitation source | |
US8119208B2 (en) | Apparatus and method for focused electric field enhanced plasma-based ion implantation | |
US4203726A (en) | Thermionic detector | |
Akbi et al. | Work function measurements of contact materials for industrial use | |
US3852037A (en) | Selective ionization detector | |
US4524047A (en) | Thermionic detector with multiple layered ionization source | |
FR70862E (en) | Advanced electric detector for gases, vapors, fumes and the like | |
US2979631A (en) | Process for the production of ion-emitting surfaces, particularly for halogen leak detectors | |
GB929883A (en) | Improvements in or relating to the detection and/or analysis of low concentrations of gases and vapour | |
US2742585A (en) | Electrical vapor detector | |
Gandrud et al. | Investigation of the Hollow Cathode Discharge as an Atomic Absorption Medium | |
US3626179A (en) | High temperature method and apparatus for analyzing gaseous samples | |
US4477778A (en) | Hydrogen detector | |
US4264813A (en) | High intensity ion source using ionic conductors | |
CA2001237A1 (en) | Hollow electrode plasma excitation source | |
Okano | Field-Emission-Current Fluctuations from a (100) Vicinal Plane of Tungsten with Adsorbed Xenon Molecules | |
US3139746A (en) | Gas density measuring | |
Holland | “Tunnel” magnetron characteristics and discharge diagnostics | |
JP2771310B2 (en) | Ultra-high vacuum measurement method and apparatus | |
Liu et al. | Experimental investigation of an atmospheric pressure plasma jet as an ion source for on-site mass-spectrometry analysis of nonvolatile solid samples: the integration effect of thermal desorption and ionization | |
JPS5597467A (en) | Ion plating equipment | |
JP3125002B2 (en) | Field emission vacuum gauge | |
Jones et al. | The sparking potential of mercury vapour | |
SU375548A1 (en) | ELECTRON CAPTURE DETECTOR |