US2823176A - Antimony plating bath and process - Google Patents
Antimony plating bath and process Download PDFInfo
- Publication number
- US2823176A US2823176A US395292A US39529253A US2823176A US 2823176 A US2823176 A US 2823176A US 395292 A US395292 A US 395292A US 39529253 A US39529253 A US 39529253A US 2823176 A US2823176 A US 2823176A
- Authority
- US
- United States
- Prior art keywords
- antimony
- catechol
- per liter
- bath
- grams per
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052787 antimony Inorganic materials 0.000 title claims description 37
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 title claims description 37
- 238000007747 plating Methods 0.000 title claims description 14
- 238000000034 method Methods 0.000 title description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical group OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 30
- 238000009713 electroplating Methods 0.000 claims description 9
- 150000001457 metallic cations Chemical class 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000001464 adherent effect Effects 0.000 claims description 4
- 230000000536 complexating effect Effects 0.000 claims description 4
- 239000008139 complexing agent Substances 0.000 claims description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- 239000002253 acid Substances 0.000 description 12
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical compound F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000006259 organic additive Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- -1 sulfonated hydroxy aromatic compounds Chemical class 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 150000001462 antimony Chemical class 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- VZYDKJOUEPFKMW-UHFFFAOYSA-N 2,3-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=CC(S(O)(=O)=O)=C1O VZYDKJOUEPFKMW-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 238000013019 agitation Methods 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 235000000346 sugar Nutrition 0.000 description 3
- 238000006277 sulfonation reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000002659 electrodeposit Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 2
- 229940059574 pentaerithrityl Drugs 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- IMPKVMRTXBRHRB-MBMOQRBOSA-N (+)-quercitol Chemical compound O[C@@H]1C[C@@H](O)[C@H](O)C(O)[C@H]1O IMPKVMRTXBRHRB-MBMOQRBOSA-N 0.000 description 1
- PGSWEKYNAOWQDF-UHFFFAOYSA-N 3-methylcatechol Chemical compound CC1=CC=CC(O)=C1O PGSWEKYNAOWQDF-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OPFTUNCRGUEPRZ-QLFBSQMISA-N Cyclohexane Natural products CC(=C)[C@@H]1CC[C@@](C)(C=C)[C@H](C(C)=C)C1 OPFTUNCRGUEPRZ-QLFBSQMISA-N 0.000 description 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- SQUHHTBVTRBESD-UHFFFAOYSA-N Hexa-Ac-myo-Inositol Natural products CC(=O)OC1C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C1OC(C)=O SQUHHTBVTRBESD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229930195725 Mannitol Natural products 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- YSFVDVZOGIPGEU-UHFFFAOYSA-N [Sb].OC1=CC=CC=C1O Chemical class [Sb].OC1=CC=CC=C1O YSFVDVZOGIPGEU-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 210000003050 axon Anatomy 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000008121 dextrose Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 229960002737 fructose Drugs 0.000 description 1
- FBPFZTCFMRRESA-GUCUJZIJSA-N galactitol Chemical compound OC[C@H](O)[C@@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-GUCUJZIJSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910001411 inorganic cation Inorganic materials 0.000 description 1
- 229910001410 inorganic ion Inorganic materials 0.000 description 1
- CDAISMWEOUEBRE-GPIVLXJGSA-N inositol Chemical compound O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@@H]1O CDAISMWEOUEBRE-GPIVLXJGSA-N 0.000 description 1
- 229960000367 inositol Drugs 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000594 mannitol Substances 0.000 description 1
- 235000010355 mannitol Nutrition 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002895 organic esters Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 230000029219 regulation of pH Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- CDAISMWEOUEBRE-UHFFFAOYSA-N scyllo-inosotol Natural products OC1C(O)C(O)C(O)C(O)C1O CDAISMWEOUEBRE-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 150000001461 trihydroxyphenols Chemical class 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
Definitions
- This invention relates to improvements in the electrodeposition of antimony and more particularly to an improved electrolyte for the deposition of smooth adherent coatings of antimony.
- electrodeposits ofantimony produced by prior antimony plating solutions and processes have not only been coarse-grained, poorly adherent and extremely brittle but also have had a poor surface quality which has necessitated extensive bufiing and/ or polishing.
- the first type of addition agents of the present invention comprises sulfonated hydroxy aromatic compounds and preferably those which, in addition to a sulfonate radical and hydroxy grouping, have at least one additional substituted grouping which is capable of complexing dissolved metals jtoform five or six membered ring structures.
- Typical of the type of organic addition agents contemplated in the present invention are the compounds obtained by sulfonating substituted phenols, catechol, derivatives of catechol such as 3-5 dihydroxy toluene (orcinol), isomers of catechol such as resorcinol; trihydroxy phenols such as pyrogallol, phloroglucinol; hydroxy aromatic carboxylic acids such as salicylic acid or B-resorcyclic acid; hydroxy aromatic aldehydes such as salicylaldehyde; 8-hydroxy quinoline; and naphthols such as 1-3 or 1-8 dihydr'oxy naphthalene.
- mannitol sorbitol, dulcitol, erythritol, or pentaerythritol
- unsulfonated sugars such as dextrose, levulose or sucrose
- additives of the present invention form various complex organo-metallic salts which regulate the availabilty of metallic ions in solution.
- the actual chemical and electrochemical reactions occurring during plating using the additives of the present invention are not clearly understood at present.
- the following discussion, indicating sulfonated catechol as an additive, is set forth to aid in understanding the invention.
- Sulfonated catechols may be used effectively in either acid or alkaline antimony plating baths. It will be under-. stood, of course, that in the sulfonation of catechol, mono, di and tri sulfonic acids are obtained, the amounts of "ice in the following reactions, although a mono-sulfonic acid is illustrated, similar reactions occur usingdi-sulfonic acid, tri-sulfonic acid or a mixture of these acids.
- the efiectiveness of the sulfonated catechol is thought 6 to depend primarily on the complexing of antimonious hy- Compound Formula Antimony Catechol CtHiOtSbOH Antimony Pyrogallol CrHtOa-S'DOH SCHZCOOH AntlmonylTbloglycolllc Acld..-. --eab 1 I l i r r isomc o oon. i g s-t'3-00011 AntimonylThiolacttc Acid sb P's-0410011. CH:
- S.' F l r antimony complexes may be formed lISlBg poly- 40 Temperature ty r oa hydroxy aldehydes and ketones-,;polyhy.dric alcoholsiof the 'Anodes l T B g antimony cycl-ohexane type such as quercitol and inositol, as well Agitation Ca h d das various sugar acids.
- organic antimony complexes formed in ac- Example cordance with'the-present invention may be characterized 220 go afltlm'ofly fluoride as organic esters and/orvthioesters having the following structure:
- the second type ofadditive',wbicli maybe iised'rloii' preferably are provideclby the additionto-therplating solution of water s oluble :salts of the desired metals such as sulfates, nitrates, acetates or chlorides although satisfactory resultsalsoi 'a're obtained by employing salts which are relatively orzs'ubstantially insoluble,inavater rsuflicient dissolution being obtained in the plating solution.
- the following tabulation sets forth a number of inorganic eations whichlmay be employed in thepra'etice of "the presena-invention.
- Anodes Bagged antimony.
- the above baths may be operated satisfactorily within a pH range from about 1 to 5, the upper pH limit generally being that at which precipitation of antimony occurs. It is preferred to operate the bath using a current density within the range of from to 25 amperes per The preferred bath temperature is 120 F. although the baths generally may be operated at a temperature Within the range from room temperature, i. e., 70 F. to 75 F., to about 165 F.
- a metallic salt of an organic additive such for example, as nickel catechol sulfonate or cobalt catechol sulfonate.
- an organic additive such for example, as nickel catechol sulfonate or cobalt catechol sulfonate.
- Such a salt provides additional organic additive in solution while supplying the desired inorganic cation without introducing undesired foreign ions into the bath.
- Acid baths of the present invention as illustrated by the foregoing examples generally may contain from about 20 to 300 grams per liter of dissolved antimony, 150 grams per liter being preferred and about 20 to 300 grams per liter of total organic additive. Using antimony fluoride, 110 to 265 grams per liter produce superior results, 220 grams per liter being preferred.
- the amount of potassium hydroxide to be employed is determined by the amount of free acid present in the organic additive, the concentration of antimony, and, of course, the pH desired.
- the quantity of a particular metal salt (source of the cationic additive) to be used generally may vary from a small but effective amount, i. e. a few milligrams of metal per liter, to an upper limit determined by the solubility of the salt in the plating solution.
- Illustrative of an alkaline bath embodying the invention is the following in which the quantities expressed are per liter of water:
- Example VI 90 g. antimony fluoride 150 g. potassium hydroxide 95 cc. catechol sulfonate (57 g. catechol) 10 g. aluminum sulfate Current density 24 A. S. F. Temperature 120 F.
- Anodes Bagged antimony. Agitation Cathode rod.
- Alkaline plating solutions embodying the present invention may be operated at various pH values although it is preferred to employ a pH of 10 or higher, the upper practical limit or pH being that at which undesirable precipitates form.
- the amounts of the alkaline bath ingredients can, of course, be varied, the organic additive content varying from about to 390 grams per liter.
- the maximum antimony content is generally dictated by the solubility of the antimony compound in the bath, the amount increasing with an increase in pH. To employ a maximum amount of antimony, it is essential that the molar ratio of antimony to the organic additive be at least 1:1.
- the amount of potassium hydroxide depends on the pH regulation necessary.
- the quantity of inorganic ions utilized may vary from a very small amount, such as a few milligrams of metal per liter up to the limit of solubility of the source of the cations in the plating solution.
- antimony salts in addition to antimony fluoride, such as antimony oxide, antimony sulfonate, antimony pentafluoride, antimony pentoxide, potassium meta antimonite, butyl amine antimonyl tartrate, urea antimonyl tartrate, aniline antimonyl tartrate, benzyl amine antimonyl tartrate, phenyl hydrazine antimonyl tartrate, ammonium antimonyl citrate, potassium antimonyl glycollate, potassium antimonyl citrate, sodium antimonyl citrate, antimony potassium tartrate, antimony sodium tartrate, and antimony tartrate also may be employed.
- antimony fluoride such as antimony oxide, antimony sulfonate, antimony pentafluoride, antimony pentoxide, potassium meta antimonite, butyl amine antimonyl tartrate, urea antimonyl tartrate, aniline antimonyl tartrate, benzyl amine antimonyl tartrate, phenyl hydrazine anti
- the pH may be regulated using ammonia, or organic amines, such as I butyl amine, trimethylamine or ethanolamine.
- catechol As an example of the preparation of a plating bath embodying the invention, 890 grams of catechol were added slowly to 1568 grams of C. P. sulfuric acid while maintaining the temperature of the reaction mass within the range from 85 C. to 95 C. for two hours after the last catechol was added.
- the resultant catechol sulfonic acid contained approximately .62 gram of catechol per cubic centimeter of crude sulfonation mass.
- 241 cc. of the sulfonation mass was then added to an antimony fluoride solution containing about 165 grams per liter of antimony, and 50 grams per liter of aluminum sulfate, the pH being adjusted to about 5 using sodium hydroxide.
- An electroplating bath comprising approximately 20 to 300 grams per liter of solution of antimony, a metallic cation in addition to antimony in a small amount effective to provide a smooth, adherent, non-brittle antimony plate up to the maximum amount soluble in the plating bath, and a complexing agent capable of complexing dissolved antimony to form a five-membered ring, wherein said ring-forming complexing agent is sulfonated catechol present in approximately 20 .to 300 grams per liter of solution.
- An electroplating process which comprises passing electric current from an anode to a cathode through the bath of claim 1.
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Description
2,823,176 ANTIMONY PLATING BATH AND PROCESS Elmer R. Breining, Warren, Cleveland'F. Nixon, Detroit, and William R. Vincent, Birmingham, Mich., assignors to General Motors Corporation, Detroit, Mich., acorporation of Delaware a No Drawing. Application November 30, 1953 Serial No. 395,292
8 Claims. (Cl. 20445) This invention relates to improvements in the electrodeposition of antimony and more particularly to an improved electrolyte for the deposition of smooth adherent coatings of antimony.
In many instances electrodeposits ofantimony produced by prior antimony plating solutions and processes have not only been coarse-grained, poorly adherent and extremely brittle but also have had a poor surface quality which has necessitated extensive bufiing and/ or polishing.
We have now discovered that an improved electrodeposit of antimony is obtained fromelectrolyt'es utilizing a combination of certain addition agents. The first type of addition agents of the present invention comprises sulfonated hydroxy aromatic compounds and preferably those which, in addition to a sulfonate radical and hydroxy grouping, have at least one additional substituted grouping which is capable of complexing dissolved metals jtoform five or six membered ring structures. Typical of the type of organic addition agents contemplated in the present invention are the compounds obtained by sulfonating substituted phenols, catechol, derivatives of catechol such as 3-5 dihydroxy toluene (orcinol), isomers of catechol such as resorcinol; trihydroxy phenols such as pyrogallol, phloroglucinol; hydroxy aromatic carboxylic acids such as salicylic acid or B-resorcyclic acid; hydroxy aromatic aldehydes such as salicylaldehyde; 8-hydroxy quinoline; and naphthols such as 1-3 or 1-8 dihydr'oxy naphthalene.
In certain applications, it is advantageous to'employ,'in addition to, or in lieu of the above-mentioned additives, certain unsulfonated compounds including p'olyhydric alcohols such as glycerol, ethylene glycol, propylene glycol,
mannitol, sorbitol, dulcitol, erythritol, or pentaerythritol;
unsulfonated sugars such as dextrose, levulose or sucrose;
as well as unsulfonated sugar acids such as gluconic mucic, and saccharic acids. It will be understood, of course, that the present invention contemplates the use of the above addition agents as well as mixtures thereof. Moreover, sodium, potassium, ammonium, amine, or antimony salts of the various compounds also may be used.
In general, additives of the present invention form various complex organo-metallic salts which regulate the availabilty of metallic ions in solution. The actual chemical and electrochemical reactions occurring during plating using the additives of the present invention are not clearly understood at present. However, the following discussion, indicating sulfonated catechol as an additive, is set forth to aid in understanding the invention.
Sulfonated catechols may be used effectively in either acid or alkaline antimony plating baths. It will be under-. stood, of course, that in the sulfonation of catechol, mono, di and tri sulfonic acids are obtained, the amounts of "ice in the following reactions, although a mono-sulfonic acid is illustrated, similar reactions occur usingdi-sulfonic acid, tri-sulfonic acid or a mixture of these acids.
The efiectiveness of the sulfonated catechol is thought 6 to depend primarily on the complexing of antimonious hy- Compound Formula Antimony Catechol CtHiOtSbOH Antimony Pyrogallol CrHtOa-S'DOH SCHZCOOH AntlmonylTbloglycolllc Acld..-. --eab 1 I l i r r isomc o oon. i g s-t'3-00011 AntimonylThiolacttc Acid sb P's-0410011. CH:
AntimonylThioglycollamlde.......... 7 Sb(SCHiG 0NHr)r Ethylene ilycoLun n, liege-on i i 4.;miotzi'ij each depending upon the technique ofsulfonation. Hence,
droxide which, in an acid solution, is indicated as follows:
The following reactions indicate the ensuing formation of mono-sulfonated antimony-catechol complex:
Sb-OH BF :1,- Sb-F 11.0 son; 0 SOaHOO (3) on o sbF. :2 SbF 2111 son: on son; 0
SbF axon 2* SM mo 503K 0 sonzo In an alkaline bath a similar series of equilibrium reactions occur as summarized in the following equation:
sb-o-K 3KF 411.0 soil: 0
It will be understood, of course, that analogous antimony complexes can be formed using other additives of the present invention. The following table summarizes by compound and corresponding formula some of the antimony complexes formed in accordance with the present invention.
- 2,823,176 v V r p F Compound Formula Metal Constituent Source of Metal Solubility C Al2(S04)a.9H2O Soluble.
BaFz Slight. Pr pylene Glycol sboH Very; Slight.
O. C linkage Slight.
Soluble Slight.
Do. Trimethylene Glycol sb -0H 113o. 2 o. (J "liri'kag'e' Do. Do. p D0.
Soluble. lycermen :sb-o:H. Very Slight.
Soluble. -C 'llnkage" Do. Do.
Erythfltol Sb0H The fol levying are examples of antim ny "baths in 1 cordance with the present invention as used in acid media in which-the'quantities'expressed are:per liter of water: Penta Erythritol I E p I 4c -g 125 g. antimony fluoride 135 cc. sulfonated catechol (81.0 g. catechol) 175 g. potassium hydroxide Sorbitol sb-OH 10 g; alumihu'mz-sulfate O linkage 0 pH .-1-4.0. Current"densit-y..;... v15425 A. S. F. Mannltol Sb=0H 0 Temperature; 115 125" F.
' hnka-ga 3 Anodes :Bagged antimony.
Agitation..-. Cathode rod. Arabltol I H il ixam'ple' II 220 g. 'a'ntu'n'o'ny fluoride v *0 'lmkage 241 cc. st'ilfonated catechol (144.5 'g. catechol) 0 50g. magnesium'sulfate .heptahyfdrate Dumml n 300 potassium hydroxide iliikjagv pH 3:2 i I Current densi 15-25 A. S.' F l r antimony complexes may be formed lISlBg poly- 40 Temperature ty r oa hydroxy aldehydes and ketones-,;polyhy.dric alcoholsiof the 'Anodes l T B g antimony cycl-ohexane type such as quercitol and inositol, as well Agitation Ca h d das various sugar acids.
In general, organic antimony complexes formed in ac- Example cordance with'the-present invention may be characterized 220 go afltlm'ofly fluoride as organic esters and/orvthioesters having the following structure:
The second type ofadditive',wbicli maybe iised'rloii' preferably are provideclby the additionto-therplating solution of water s oluble :salts of the desired metals such as sulfates, nitrates, acetates or chlorides although satisfactory resultsalsoi 'a're obtained by employing salts which are relatively orzs'ubstantially insoluble,inavater rsuflicient dissolution being obtained in the plating solution. The following tabulation :sets forth a number of inorganic eations whichlmay be employed in thepra'etice of "the presena-invention.
241 cc. sulfonated catechol'i'(.l44.5 g. catechol) 325 g. potassium.:hydroxide 50 g. zirconiumfluoride Current density 20 A18. F.
Temperature 130 F.
Anodes Bagged antimony.
Agitation Cathode rod.
Example? IV 220 --;g; antimony fluoride 235 cc..sulfona ted c'atechdl (141.0 300 g. potassium hydroxide 25 g. nickelwcatechol sulfonate g. catechol) 220 antimony fluoride V 235 cc. sulfon'atedzcatechol (141.0 gi catechol) 300 .g. -potassium-.;hydronide 7 Agitime;-TI:IIIIIIIIII. Ca'th'o'de'rod.
' square foot.
The above baths may be operated satisfactorily within a pH range from about 1 to 5, the upper pH limit generally being that at which precipitation of antimony occurs. It is preferred to operate the bath using a current density within the range of from to 25 amperes per The preferred bath temperature is 120 F. although the baths generally may be operated at a temperature Within the range from room temperature, i. e., 70 F. to 75 F., to about 165 F.
In many instances it is preferred to employ a metallic salt of an organic additive such for example, as nickel catechol sulfonate or cobalt catechol sulfonate. Such a salt provides additional organic additive in solution while supplying the desired inorganic cation without introducing undesired foreign ions into the bath.
Acid baths of the present invention as illustrated by the foregoing examples generally may contain from about 20 to 300 grams per liter of dissolved antimony, 150 grams per liter being preferred and about 20 to 300 grams per liter of total organic additive. Using antimony fluoride, 110 to 265 grams per liter produce superior results, 220 grams per liter being preferred. The amount of potassium hydroxide to be employed is determined by the amount of free acid present in the organic additive, the concentration of antimony, and, of course, the pH desired. The quantity of a particular metal salt (source of the cationic additive) to be used generally may vary from a small but effective amount, i. e. a few milligrams of metal per liter, to an upper limit determined by the solubility of the salt in the plating solution.
Illustrative of an alkaline bath embodying the invention is the following in which the quantities expressed are per liter of water:
Example VI 90 g. antimony fluoride 150 g. potassium hydroxide 95 cc. catechol sulfonate (57 g. catechol) 10 g. aluminum sulfate Current density 24 A. S. F. Temperature 120 F.
Anodes Bagged antimony. Agitation Cathode rod.
Alkaline plating solutions embodying the present invention may be operated at various pH values although it is preferred to employ a pH of 10 or higher, the upper practical limit or pH being that at which undesirable precipitates form. The amounts of the alkaline bath ingredients can, of course, be varied, the organic additive content varying from about to 390 grams per liter. The maximum antimony content is generally dictated by the solubility of the antimony compound in the bath, the amount increasing with an increase in pH. To employ a maximum amount of antimony, it is essential that the molar ratio of antimony to the organic additive be at least 1:1. The amount of potassium hydroxide depends on the pH regulation necessary. As in the case of acid baths, the quantity of inorganic ions utilized may vary from a very small amount, such as a few milligrams of metal per liter up to the limit of solubility of the source of the cations in the plating solution.
Various antimony salts, in addition to antimony fluoride, such as antimony oxide, antimony sulfonate, antimony pentafluoride, antimony pentoxide, potassium meta antimonite, butyl amine antimonyl tartrate, urea antimonyl tartrate, aniline antimonyl tartrate, benzyl amine antimonyl tartrate, phenyl hydrazine antimonyl tartrate, ammonium antimonyl citrate, potassium antimonyl glycollate, potassium antimonyl citrate, sodium antimonyl citrate, antimony potassium tartrate, antimony sodium tartrate, and antimony tartrate also may be employed.
Similarly, instead of the sodium hydroxide or potassium hydroxide indicated in the examples, the pH may be regulated using ammonia, or organic amines, such as I butyl amine, trimethylamine or ethanolamine.
5 In the electrodeposition of antimony, as in other plating processes, proper preparation of the surface to be coated is essential. In depositing antimony on copper, for example, we have found that it is desirable to electrolytically etch the surface to be coated for about one to five minutes at a current density of approximately 5 amperes per square foot in a 63% by volume solution of phosphoric acid. In depositing antimony on steel it is generally advantageous to etch the steel in nitric acid, preferably diluted 1:3.
As an example of the preparation of a plating bath embodying the invention, 890 grams of catechol were added slowly to 1568 grams of C. P. sulfuric acid while maintaining the temperature of the reaction mass within the range from 85 C. to 95 C. for two hours after the last catechol was added. The resultant catechol sulfonic acid contained approximately .62 gram of catechol per cubic centimeter of crude sulfonation mass. To complete preparation of the bath, 241 cc. of the sulfonation mass was then added to an antimony fluoride solution containing about 165 grams per liter of antimony, and 50 grams per liter of aluminum sulfate, the pH being adjusted to about 5 using sodium hydroxide.
It is to be understood that, although the invention has been described with specific reference to particular embodiments thereof, it is not to be so limited since changes and alterations therein may be made which are within the full intended scope of this invention as defined by the appended claims.
What is claimed is:
1. An electroplating bath comprising approximately 20 to 300 grams per liter of solution of antimony, a metallic cation in addition to antimony in a small amount effective to provide a smooth, adherent, non-brittle antimony plate up to the maximum amount soluble in the plating bath, and a complexing agent capable of complexing dissolved antimony to form a five-membered ring, wherein said ring-forming complexing agent is sulfonated catechol present in approximately 20 .to 300 grams per liter of solution.
2. An electroplating bath as in claim 1 in which the metallic cation other than antimony is aluminum.
3. An electroplating bath as in claim 1 in which the metallic cation other than antimony is zirconium.
4. An electroplating bath as in claim 1 in which the metallic cation other than antimony is magnesium.
5. An electroplating bath as in claim 1 in which the metallic cation other'than antimony is nickel.
6. An electroplating bath as in claim 1 in which the metallic cation other than antimony is copper.
7. An electroplating process which comprises passing electric current from an anode to a cathode through the bath of claim 1.
8. An electroplating bath as in claim 1 in which the 60 antimony is present in the form of antimony fluoride.
References Cited in the file of this patent UNITED STATES PATENTS 2,461,350 Schaefer et al Feb. 8, 1949 FOREIGN PATENTS 130,302 Great Britain July 29, 1919 OTHER REFERENCES Monthly Review American Electroplaters Society, vol. 29 (1942), page 870.
Soderberg et al., Plating, vol. 37 (1950), pp. 254-259.
Claims (1)
1. AN ELECTROPLATING BATH COMPRISING APPROXIMATELY 20 TO 300 GRAMS PER LITER OF SOLUTION OF ANTIMONY, A METALLIC CATION IN ADDITION TO ANTIMONY IN A SMALL AMOUNT EFFECTIVE TO PROVIDE A SMOOTH, ADHERENT, NON-BRITTLE ANTIMONY PLATE UP TO THE MAXIMUM AMOUNTSOLUBLE IN THE PLATING BATH, AND A COMPLEXING AGENT CAPABLE OF COMPLEXING DISSOLVED ANTIMONY TO FORM A FIVE-MEMBERED RING, WHEREIN SAID RING-FORMING COMPLETXING AGENT IS SULFONATED CATECHOL PRESENT IN APPROXIMATELY 20 TO 300 GRAMS PER LITER OF SOLUTION.
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2973308A (en) * | 1958-08-25 | 1961-02-28 | Acme Steel Co | Complexed plating electrolyte and method of plating therewith |
US2979448A (en) * | 1958-10-13 | 1961-04-11 | Diamond Alkali Co | Process for chlorinating aliphatic chain substituted aromatic hydrocarbons |
US3020217A (en) * | 1956-10-19 | 1962-02-06 | Sel Rex Precious Metals Inc | Mirror bright gold alloy electroplating |
US4199417A (en) * | 1978-11-13 | 1980-04-22 | Mariano Borruso | Electrodeposition of black deposit and electrolytes therefor |
US4518469A (en) * | 1984-08-31 | 1985-05-21 | At&T Technologies, Inc. | Method of making non-precious metal electrical contacts by electroplating |
US4566953A (en) * | 1984-12-24 | 1986-01-28 | At&T Technologies, Inc. | Pulse plating of nickel-antimony films |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB130302A (en) * | 1918-04-29 | 1919-07-29 | Quintin Marino | An Electrolytic Process for Coating Iron or Steel with Lead or Antimony or an Alloy of Lead and Antimony. |
US2461350A (en) * | 1943-11-06 | 1949-02-08 | Cleveland Graphite Bronze Co | Electrodeposition of leadantimony-tin alloys |
-
1953
- 1953-11-30 US US395292A patent/US2823176A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB130302A (en) * | 1918-04-29 | 1919-07-29 | Quintin Marino | An Electrolytic Process for Coating Iron or Steel with Lead or Antimony or an Alloy of Lead and Antimony. |
US2461350A (en) * | 1943-11-06 | 1949-02-08 | Cleveland Graphite Bronze Co | Electrodeposition of leadantimony-tin alloys |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3020217A (en) * | 1956-10-19 | 1962-02-06 | Sel Rex Precious Metals Inc | Mirror bright gold alloy electroplating |
US2973308A (en) * | 1958-08-25 | 1961-02-28 | Acme Steel Co | Complexed plating electrolyte and method of plating therewith |
US2979448A (en) * | 1958-10-13 | 1961-04-11 | Diamond Alkali Co | Process for chlorinating aliphatic chain substituted aromatic hydrocarbons |
US4199417A (en) * | 1978-11-13 | 1980-04-22 | Mariano Borruso | Electrodeposition of black deposit and electrolytes therefor |
US4518469A (en) * | 1984-08-31 | 1985-05-21 | At&T Technologies, Inc. | Method of making non-precious metal electrical contacts by electroplating |
US4566953A (en) * | 1984-12-24 | 1986-01-28 | At&T Technologies, Inc. | Pulse plating of nickel-antimony films |
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