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US2206020A - Apparatus for cathode disintegration - Google Patents

Apparatus for cathode disintegration Download PDF

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Publication number
US2206020A
US2206020A US198557A US19855738A US2206020A US 2206020 A US2206020 A US 2206020A US 198557 A US198557 A US 198557A US 19855738 A US19855738 A US 19855738A US 2206020 A US2206020 A US 2206020A
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US
United States
Prior art keywords
cathode
crucible
disintegration
disintegrated
metallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US198557A
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English (en)
Inventor
Berghaus Bernhard
Burkhardt Wilhelm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of US2206020A publication Critical patent/US2206020A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3428—Cathode assembly for sputtering apparatus, e.g. Target using liquid targets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Definitions

  • the invention relates to a method of cathode disintegration and it mainly consists in that the cathode-material is disintegrated in a liquid state.
  • the cathode material is fused in a metallic or non-metallic crucible, which is preferably arranged on a metallic cathode carrier,
  • the cathode carrier is surrounded at a small distance by a metallic covering which protects it and the insulation against disintegration.
  • the crucible is also surrounded at a short distance by a metallic covering.
  • the distance of the screen for the cathode carrier and the crucible must be smaller than the distance of the glow fringe formed around the cathode.
  • a distance of the order of 26 1.5 to 3 mm. has been found suitable in practical operation.
  • This arrangement allows of a very large power being applied to the path of discharge, so that the coating material can be fused solely by the glow current.
  • a mag- 30 netic field may be provided for the orientation of the particles disintegrated from the cathode onwards.
  • the material to be disintegrated may be fused in the crucible additionally by other known heating methods, for instance, by means of resistance heating or high frequency heating etc. Additional heating is an advantage when it is desired. to fuse large amounts of cathode material at the 10 same time.
  • chromium, vanadium, platinum, titanium, rhodium etc. which form very easily an alloy with other metals, more especially with those which come into question as crucible material, are disintegrated in non-metallic crucibles, for instance, sintered alumina, beryllium oxide, magnesium oxide, aluminium oxide, zirconium oxide, etc.
  • the bottom of the crucible is provided with a hole and is placed on a tungsten rod, which efiects the contact with the melt or with the material in a solid state.
  • Figure 1 is a section through a portion of a cathode disintegrating apparatus, taken more particularly through the cathode and crucible, and
  • Figure 2 is a cross-section through the cathode with a special method of fixing of a non-metallic 40 crucible.
  • I is the bottom plate and 2 the side wall of the cathode disintegration vessel which is shown only in part.
  • 22 is the hollow cathode, preferably made of crucible shape, for 5 instance a metallic crucible of molybdenum which is carried by the supporting member 6.
  • I8 is the metal covering and I9 is the cap which is adapted to the form of the crucible. These two parts are arranged at a small distance from the supporting member 6 and from the metal crucible 22 respectively.
  • 23 is the metal to be disintegrated which is placed in the crucible
  • 24 is an insulating disc,
  • 25 and 26 are sealing rings, for instance, of lead, and 21 is an insulating ring, which is pressed on by screws 28.
  • 29 is the leading-in pipe for compressed air cooling and 30 is the current incoming lead for the cathode, 3
  • a metal pin 32 is provided on the cathode support 6, which metal pin is inserted through a hole in the bottom of the non-metallic crucible 33, and supports the crucible 33 by means of a saucerlike member 34.
  • the metal saucer 34 is arranged to lie at a distance from the surface of the cathode support 6, so that the transmission of heat to the cathode support shall be as small as possible.
  • the covering 18 and the cap I 9 serve as an insulation in the same manner as in the arrangement first above described.
  • 20 is an inlet pipe for the water cooling.
  • Disintegration crucibles according to the invention as above described may also be mounted in a large number in thebottom of a disintegrated chamber, in order to provide articles having large suriacesfsuch as, for instance, metal sheets, with a protecting or improved cover.
  • the shape of the crucible or crucibles may be adapted to conform to the article to be covered, so that a clearlyorm cover is obtained.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrolytic Production Of Metals (AREA)
US198557A 1937-03-25 1938-03-28 Apparatus for cathode disintegration Expired - Lifetime US2206020A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE835661X 1937-03-25

Publications (1)

Publication Number Publication Date
US2206020A true US2206020A (en) 1940-07-02

Family

ID=6760969

Family Applications (1)

Application Number Title Priority Date Filing Date
US198557A Expired - Lifetime US2206020A (en) 1937-03-25 1938-03-28 Apparatus for cathode disintegration

Country Status (3)

Country Link
US (1) US2206020A (fr)
FR (1) FR835661A (fr)
GB (1) GB505135A (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2431887A (en) * 1940-01-16 1947-12-02 Penning Frans Michel Electric device and method for heating materials
US2772318A (en) * 1952-12-31 1956-11-27 Holland Leslie Arthur Apparatus for vaporization of metals and metalloids
US3018409A (en) * 1953-12-09 1962-01-23 Berghaus Elektrophysik Anst Control of glow discharge processes
US3056740A (en) * 1956-10-12 1962-10-02 Edwards High Vacuum Ltd Vapourisation of metals
US3210263A (en) * 1962-01-11 1965-10-05 Nuclear Materials & Equipment Electric discharge apparatus for etching
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US5688382A (en) * 1994-03-01 1997-11-18 Applied Science And Technology, Inc. Microwave plasma deposition source and method of filling high aspect-ratio features on a substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA941781A (en) * 1970-05-13 1974-02-12 United Aircraft Corporation Metal deposition by liquid phase sputtering

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2431887A (en) * 1940-01-16 1947-12-02 Penning Frans Michel Electric device and method for heating materials
US2772318A (en) * 1952-12-31 1956-11-27 Holland Leslie Arthur Apparatus for vaporization of metals and metalloids
US3018409A (en) * 1953-12-09 1962-01-23 Berghaus Elektrophysik Anst Control of glow discharge processes
US3056740A (en) * 1956-10-12 1962-10-02 Edwards High Vacuum Ltd Vapourisation of metals
US3210263A (en) * 1962-01-11 1965-10-05 Nuclear Materials & Equipment Electric discharge apparatus for etching
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US5688382A (en) * 1994-03-01 1997-11-18 Applied Science And Technology, Inc. Microwave plasma deposition source and method of filling high aspect-ratio features on a substrate

Also Published As

Publication number Publication date
GB505135A (en) 1939-05-05
FR835661A (fr) 1938-12-28

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