US20100212544A1 - Fabrication of electrically active films based on multiple layers - Google Patents
Fabrication of electrically active films based on multiple layers Download PDFInfo
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- US20100212544A1 US20100212544A1 US12/769,960 US76996010A US2010212544A1 US 20100212544 A1 US20100212544 A1 US 20100212544A1 US 76996010 A US76996010 A US 76996010A US 2010212544 A1 US2010212544 A1 US 2010212544A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
- C01G15/006—Compounds containing gallium, indium or thallium, with or without oxygen or hydrogen, and containing two or more other elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- H10P14/265—
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- H10P14/3436—
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- H10P14/3461—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to thin-film materials, their fabrication, and devices made therefrom; and in particular to graded and multi-junction thin-film semiconductor structures.
- Thin-film technologies are currently being developed for the purpose of reducing the cost of semiconductor devices, in particular photovoltaic (PV) cells.
- PV photovoltaic
- conventional solar cells are made of slices of solid crystalline silicon wafers, which have thicknesses of typically a few hundred microns
- thin-film materials can be directly deposited onto a substrate to form layers of ⁇ 2 ⁇ m or less, resulting in lower material as well as lower manufacturing costs.
- thin-film technologies allow for monolithic integration, i.e. the in situ creation of electrical connections, which further reduces production costs.
- Thin-film materials include cadmium-telluride (CdTe), copper indium diselenide (CIS) and variants thereof, amorphous silicon, and polycrystalline silicon ( ⁇ 50 ⁇ m).
- CdTe cadmium-telluride
- CIS copper indium diselenide
- amorphous silicon amorphous silicon
- polycrystalline silicon ⁇ 50 ⁇ m.
- Both materials have high absorptivities, so that most of the incident radiation can be absorbed within 1-2 ⁇ m of the film. Used as the absorber layer, in which incoming photons create electron-hole pairs, these materials can be paired with, for instance, a layer of CdS, to form heterojunctions, and sandwiched between front and back contacts to form a solar cell.
- thin-film PV cells must exhibit high conversion efficiencies of photon energy to electric current, and operate reliably in an outdoor environment over many years, ideally no less than 30 years.
- Technologies based on CdTe and CIS have demonstrated long-term stability; however, performance degradation has also been observed.
- Efficiencies of current thin-film devices reach 65% of the theoretical maximum (75% in the laboratory), still lagging behind some monocrystalline silicon and GaAs cells, which have demonstrated 90% of their ultimate achievable performance. Improvements in efficiency of thin-film technologies can be achieved through multijunctions and graded materials. For example, studies on CIS have revealed that doping with gallium, to form compounds referred to as CIGS and exhibiting gradients in the concentrations of Ga and In, lead to better efficiencies.
- the present invention provides methods for fabricating a continuous film by successively printing and annealing two or more dispersions of prefabricated nanoparticles.
- some embodiments of the invention facilitate manufacture of graded and multijunction semiconductor films, which can be used in PV cells and other semiconductor devices. Since the method requires no vacuum, it is cheaper and more conveniently practiced than vacuum-based techniques.
- Nanoparticles according to this invention are particles of specified elemental composition and no more than 100 nm, and preferably no more than 20 nm, in diameter.
- Typical nanoparticles include metal-oxide particles, which collectively form a powder.
- Some nanoparticle compositions suitable for semiconductor thin films comprise two or more of the chemical elements Cu, Ag, In, Ga, Al, Te, Se, S, Cd, and As. It should be stressed, however, that the invention is not limited to said elements, but that the method generally applies to any composition of nanoparticles suitable for dispersion, and subsequently printing.
- One of the advantages of techniques in accordance with the present invention lies in the ability to optimize the composition of the thin film by providing compositional control over the precursor nanoparticles.
- Dispersions according to the invention include any (homogeneous) mixture of nanoparticles and a suitable flowable carrier comprising solvents or dispersing agents, whether the mixture is a solution, a colloid, or a suspension. These dispersions of nanoparticles are termed “printing compositions” or “nanoparticle-based inks” herein.
- compositions according to the invention can be implemented using a variety of printing techniques and the corresponding printing equipment, including, but not limited to, techniques such as inkjet printing, pneumatic spray printing, screen printing, pad printing, laser printing, dot matrix printing, thermal printing lithography, or 3D printing.
- This versatility contributes to feasibility and cost-effectiveness.
- the composition of the nanoparticles can vary through the various deposition and annealing steps.
- the different printable compositions comprise nanoparticles of the same elements in different proportions, for example, the nanoparticles may have the formula CuIn 1-x Ga x Se 2 , wherein x varies between 0 and 1, resulting in a concentration gradient of at least one element (in the example In and Ga) through the film.
- the invention provides a method of fabricating a film, which includes the steps of providing a substrate and flowable printing compositions with different dispersions of prefabricated nanoparticles, and successively printing and annealing layers of these printing compositions into one continuous film.
- two or more layers are successively printed before they are annealed.
- an etching step precedes annealing.
- Some of the individual printed layers may have thicknesses smaller than 1 ⁇ m.
- the printing compositions contain the same types of nanoparticles in different proportions, or nanoparticles composed of the same elements in different proportions, so that the annealed layers form a film with a concentration gradient of at least one material.
- each printing composition includes different types of nanoparticles.
- the nanoparticles have a size no greater than 20 nm and a low size dispersity.
- the film includes a semiconductor material and interacts electrically with the substrate.
- this structure can be complemented by an electrically conductive superstrate to form a semiconductor device.
- the device is a solar cell.
- the invention provides flowable printing compositions with a substantially viscosity-independent flow rate.
- These printing compositions contain a carrier and a dispersion of nanoparticles; the nanoparticles include Cu and/or Ag as a first component and Se, Te, and/or S as a second component. Additionally, the printing compositions may contain In, Ga, and/or Al as a third component.
- FIG. 1 is a flow diagram detailing the steps of a method to manufacture a film by successive printing and annealing.
- FIG. 2 schematically depicts a system and method for manufacturing the film in accordance with an embodiment of the invention.
- FIG. 3A is a schematic elevational view of a representative solar cell manufactured in accordance with the invention.
- FIG. 3B is a schematic elevational view of a graded CIGS film, manufactured by first depositing all constituting layers and then annealing once to produce a continuous film, and of a solar cell made therefrom.
- FIGS. 1 and 2 illustrate, respectively, a representative process sequence 100 and operative equipment implementing embodiments of the present invention.
- the process sequence comprises the steps detailed in the flow diagram of FIG. 1 , utilizing the equipment and resulting in the intermediate and final structures illustrated in FIG. 2 .
- a substrate 200 and a plurality of flowable printing compositions comprising different dispersions of prefabricated nanoparticles, as further described below, are provided.
- a printing composition 202 a is selected for the first layer in step 112 , and in step 114 , this composition is printed onto the substrate 200 using a printer 204 .
- an etch step 116 is performed after printing.
- the deposited layer is dried and annealed using a heat source 206 to form a continuous film 208 .
- annealing is meant heating of a deposited layer at a sufficient temperature and for a sufficient time that the nanoparticles fuse into a continuous layer of uniform composition. Whether annealing is performed after deposition of a particular layer depends on the specifics of the printing composition, the layer thickness, and desired film characteristics. In general, however, the composition will be dried before a subsequent composition is deposited thereon.
- Annealing source 206 may be any suitable heat source, e.g., an oven, vacuum oven, furnace, IR lamp, laser, or hot plate, and suitable annealing times and temperatures, which depend on nanoparticle size and composition as well as ink composition, may be obtained without undue experimentation by means of calibration as described below in the context of printing equipment. Anneal temperatures are generally above 200° C.
- the steps 112 , 114 , and optionally steps 116 , 118 are repeated to print a second printing composition 202 b , which generally differs from the composition 202 a , resulting in a film 208 that now contains two layers.
- This repetition may involve the same printing and annealing equipment 204 , 206 , in which case the new printing composition is substituted (e.g., in the form of a cartridge) in printer 204 .
- the process sequence 100 may be carried out in a assembly-line configuration with separate printing and annealing equipment dedicated to each deposition and annealing step. Utilizing the same equipment for multiple steps may be more practical where numerous films are fabricated in parallel (i.e., the same steps are simultaneously performed on multiple substrates); while a line configuration may be preferred where individual substrates 200 are processed serially.
- Steps 110 - 118 may (but need not) be repeated a plurality of times to form a film having three or more layers 202 a , 202 b , 202 c .
- a particular printing composition can be utilized once or more than once, although in the case of graded films, the composition will change progressively with each deposition step.
- an etching step 120 is again optional, but a final annealing step 122 must take place, whether previous anneals 116 have been performed or not, to form a continuous final film 210 from the deposited layers.
- the number of layers deposited and annealed in this way is at least two, and is limited only by the desired thickness and composition of the final film 210 . Accordingly, while FIG. 2 illustrates the manufacturing of a film with three layers, this is merely for illustration.
- Each layer may contain a single type of nanoparticle, in which case different layers typically contain nanoparticles having different chemical compositions; or alternatively (or in addition), each layer may contain a plurality of nanoparticle types, in which case the same set of nanoparticles may be used in different proportions in the different layers.
- the method 100 is employed to produce a high-efficiency graded film by using a variety of printing compositions with nanoparticles comprising the same elements, but in different proportions.
- a CIGS film may be produced with the varying chemical composition CuIn 1-x Ga x Se 2 , where x varies progressively among successively deposited layers (i.e., successive printing compositions).
- x may be the distance of a certain location within the film from a boundary surface of the film (e.g., the top surface of the structure or the boundary surface in contact with the substrate), divided by the thickness of the film.
- Such films have been manufactured by means of chemical vapor deposition (CVD) and used as the absorption layer in a PV cell with the gallium concentration increasing towards a molybdenum back contact, resulting in a particularly high efficiency of 19.5%—a consequence of reduced back-surface recombination due to the quasi-electric field established by the concentration and corresponding bandgap gradient.
- the method 100 provides an alternative to the CVD process: using a suitable substrate, such as Mo-covered glass, CuInSe 2 may be deposited for the first layer, followed by printing compositions in which the Ga content is progressively (in a linear or nonlinear fashion) increased in each layer, until the composition of the nanoparticles is primarily CuGaSe 2 . Once the layers are printed in the desired sequence, they are annealed to form a high-performance graded CIGS film. Other nanoparticle-based inks may also be introduced as intermediate layers to further tune the band structure of the material in order to optimize the performance of the cell. Techniques in accordance with the present invention offer the additional advantage, compared with CVD, of avoiding the need for vacuum equipment.
- the printing compositions comprise different types of nanoparticles.
- the method 100 can, for instance, be used to manufacture a CdS/CdTe thin film.
- the approach of the invention can be applied to any material for which a suitable nanoparticle source is available.
- the printing step 114 a variety of well-characterized printing processes can be used to advantage, including, but not limited to, inkjet printing, pneumatic spraying, screen printing, pad printing, laser printing, dot matrix printing, thermal printing, lithography, and 3D printing.
- Computer-controlled inkjet printers are readily available and particularly attractive for practice of the invention because of the level of control they provide.
- a commercially available inkjet printer can be used with little or no modification to print nanoparticle-based inks (the printing compositions) as described herein.
- the viscosities of nanoparticle-based inks can be adjusted to those of inks produced by the printer's manufacturer, as detailed below in the context of printing compositions.
- the amenability of the method 100 to readily available, low-cost equipment, such as inkjet printers, constitutes one of its advantages.
- the printer can be calibrated as follows. For each printing composition, a sequence of print runs is carried out, each print run involving a different number of printing passes. Drying and annealing are performed after each printing pass or at the end of a run. The thickness of the film resulting from each of the runs is different, and is determined via scanning electron microscopy (SEM) or transmission electron microscopy (TEM), or any other suitable technique. As a result, a layer having a desired thickness may be made by reference to the number of printing passes corresponding to that thickness. Similar calibration techniques can be used to determine optimal annealing temperatures and times for desired film properties.
- SEM scanning electron microscopy
- TEM transmission electron microscopy
- Particulate precursor materials simplify compositional control for multi-component materials such as, for example, CIGS, since key components (e.g., Cu, In, Ga) can be precisely mixed in the precursor powders.
- One method of fabricating these powders involves mixing the constituent elements at the required ratios, dissolving them in acid to form an aqueous mixture, using hydroxide precipitation to form a gelatinous mixture of hydroxides of the elements, and drying the mixture to obtain a fine powder of mixed oxides.
- Nanoparticle synthesis can also be carried out using techniques described, for example, in U.S. Pat. No. 6,379,635 and co-pending U.S. patent application Ser. Nos. 11/579,050 and 11/588,880, the entire disclosures of which are hereby incorporated by reference.
- a method for producing CIGS nanoparticles of any desirable stoichiometry employing a selenol compound is disclosed in U.S. Provisional Application Ser. No. 60/991,510.
- Embodiments of the method involve dispersing at least a first portion of a nanoparticle precursor composition (comprising sources of at least one of Al, Ga, and/or In, and at least one of Cu, Ag, Zn, and/or Cd) in a solvent (e.g., a long-chain hydrocarbon solvent); heating the solvent to a first temperature for an appropriate length of time; adding a selenol compound to the solvent and heating the solvent; adding a second portion of the nanoparticle precursor composition to the reaction mixture; heating the mixture to a second temperature higher than the first temperature over an appropriate length of time; and maintaining the temperature for up to 10 hours.
- a solvent e.g., a long-chain hydrocarbon solvent
- the surface atoms of the particles will typically be coordinated to a capping agent, which can comprise the selenol compound employed in the method. If a volatile selenol compound is used, this capping agent can be driven off with heating to yield ‘naked’ nanoparticles amenable to capping with other coordinating ligands and further processing. Examples 1 and 2 provide further details regarding the implementation of this method:
- a stock solution of TOPSe was prepared by dissolving Se powder (10.9, 138 mmol) in TOP (60 mL) under nitrogen. To dry, degassed ODE was added Cu(I) acetate (7.89 g, 64.4 mmol) and In(III) acetate (20.0 g, 68.5 mmol). The reaction vessel was evacuated and heated at 140° C. for 10 min, backfilled with N 2 and cooled to room temp. 1-Octane selenol (200 mL) was added to produce a bright orange suspension. The temperature of the flask was raised to 140° C. and acetic acid distilled from the reaction at 120° C. On reaching 140° C. the TOPSe solution was added dropwise over the course of 1 hour.
- the nanoparticles can be characterized with respect to their composition, size, and charge by conventional techniques including x-ray diffraction (XRD), UV/Vis/Near-IR spectrometry, scanning or transmission electron microscopy (SEM/TEM), energy dispersive x-ray microanalysis (EDAX), photoluminescence spectrometry, and/or elemental analysis.
- XRD x-ray diffraction
- UV/Vis/Near-IR spectrometry UV/Vis/Near-IR spectrometry
- SEM/TEM scanning or transmission electron microscopy
- EDAX energy dispersive x-ray microanalysis
- photoluminescence spectrometry and/or elemental analysis.
- ICPAES Inductively coupled plasma atomic-emission spectroscopy
- the nanoparticles have average sizes not greater than 20 nm, and low size dispersities of around ⁇ 2 nm or less. Conformance to these constraints facilitates printing of thin films with control over the band structure through the film, resulting in high conversion efficiencies. Moreover, low size dispersities allow for good packing of the nanoparticles, and uniform melting temperature of the nanoparticle films, which contributes to proper film formation.
- the nanoparticles are dispersed in a carrier comprising solvents, such as toluene, and dispersing agents to form the printing composition.
- the dispersion may take the form of a solution, colloid, or suspension, generally depending on the particle size, and may have the consistency of a liquid, paste, or other viscoelastic material, as long as it is flowable. Its viscosity should be within the range from 0.158 ⁇ 10 11 cP to 2.3 ⁇ 10 11 cP.
- surface area and charge of the particles drive the selection of dispersants suitable for ink formulation.
- the overall charge the particles acquire i.e., the zeta potential
- the average agglomerate size should be minimized.
- particle sizes of over 500 nm may cause plugging of the inkjet nozzles, compromising print quality.
- nanoparticles can be coated in water-solubilizing capping agents, such as a mercaptocarboxylic acid (e.g., mercaptoacetic acid).
- a mercaptocarboxylic acid e.g., mercaptoacetic acid
- U.S. Pat. No. 6,114,0308 the entire disclosure of which is hereby incorporated by reference, teaches how to exchange the coating groups of water-insoluble, pyridine-capped nanocrystals with a large excess of neat mercaptocarboxylic acid to obtain water-soluble capped nanocrystals.
- the pyridine-capped nanocrystals are precipitated with hexanes and centrifuged; the residue is dissolved in neat mercaptoacetic acid and incubated at room temperature for at least six hours; chloroform is added to precipitate the nanocrystals and wash away excess thiol; and the nanocrystals are again centrifuged, washed with chloroform and hexane, and dried with argon.
- the viscosity of the printing composition is desirably adjusted to achieve plastic flow behavior, i.e., where viscosity is essentially independent of flow rate. This facilitates control over coating characteristics.
- Capping agents needed for solubilization or suspension can be removed to stop the formation of carbon deposits within the film. In some cases, this removal occurs naturally as a result of annealing at elevated temperatures, but if does not, it can be aided by a prior etching step 116 , 120 .
- FIG. 3A illustrates a representative structure of a solar cell with a CIGS absorber film.
- the substrate 305 comprises molybdenum on glass, and the submicron Mo layer also provides the back contact of the cell 300 .
- the absorber film 307 comprises a series of annealed layers of CIGS, and exhibits increasing Ga and decreasing In concentration towards the Mo contact 300 . This film can be manufactured by printing and annealing each layer consecutively. Alternatively, as illustrated in FIG.
- a buffer layer 312 forms the junction with the CIGS film. Conventionally, this junction comprises CdS.
- preferred PV cells are cadmium-free, using ZnS, ZnO(O,OH), or In 2 S 3 instead. Accordingly, a ZnO layer 314 over a glass cover 316 provides the superstrate of the cell 300 .
- CIGS variants e.g., as shown in the following Table 1 in which Se is replaced by S or Te, Cu by Ag, or In or Ga by Al, for example, can be used to manipulate the energies of the valence and conduction bands to aid in electron-hole capture.
- Embodiments of the invention provide a convenient means to integrate these additional layers.
- these layers can likewise be integrated into the device by printing and annealing, as long as none of the required annealing temperatures is detrimental to the other layers within the device.
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Abstract
A continuous film of desired electrical characteristics is obtained by successively printing and annealing two or more dispersions of prefabricated nanoparticles.
Description
- This application is a divisional of U.S. patent application Ser. No. 12/104,902 filed on Apr. 17, 2008, which claims priority to and the benefits of U.S. Provisional Application Ser. Nos. 60/923,984, filed on Apr. 18, 2007, and 60/991,510, filed on Nov. 30, 2007, the entire disclosures of which are hereby incorporated by reference.
- The present invention relates to thin-film materials, their fabrication, and devices made therefrom; and in particular to graded and multi-junction thin-film semiconductor structures.
- Thin-film technologies are currently being developed for the purpose of reducing the cost of semiconductor devices, in particular photovoltaic (PV) cells. Whereas conventional solar cells are made of slices of solid crystalline silicon wafers, which have thicknesses of typically a few hundred microns, thin-film materials can be directly deposited onto a substrate to form layers of ˜2 μm or less, resulting in lower material as well as lower manufacturing costs. Moreover, thin-film technologies allow for monolithic integration, i.e. the in situ creation of electrical connections, which further reduces production costs.
- Thin-film materials include cadmium-telluride (CdTe), copper indium diselenide (CIS) and variants thereof, amorphous silicon, and polycrystalline silicon (<50 μm). In recent years, technical progress has occurred particularly in thin-film technologies based on CdTe and CIS. Both materials have high absorptivities, so that most of the incident radiation can be absorbed within 1-2 μm of the film. Used as the absorber layer, in which incoming photons create electron-hole pairs, these materials can be paired with, for instance, a layer of CdS, to form heterojunctions, and sandwiched between front and back contacts to form a solar cell.
- To gain widespread acceptance, thin-film PV cells must exhibit high conversion efficiencies of photon energy to electric current, and operate reliably in an outdoor environment over many years, ideally no less than 30 years. Technologies based on CdTe and CIS have demonstrated long-term stability; however, performance degradation has also been observed. Efficiencies of current thin-film devices reach 65% of the theoretical maximum (75% in the laboratory), still lagging behind some monocrystalline silicon and GaAs cells, which have demonstrated 90% of their ultimate achievable performance. Improvements in efficiency of thin-film technologies can be achieved through multijunctions and graded materials. For example, studies on CIS have revealed that doping with gallium, to form compounds referred to as CIGS and exhibiting gradients in the concentrations of Ga and In, lead to better efficiencies.
- The complexities of thin-film technologies, which are essential for high efficiencies, adversely affect cost and manufacturability, establishing a need for improved techniques—in particular low-cost techniques amenable to practice with off-the-shelf equipment. Challenges to the development of low-cost and reliable CIGS and CdTe devices include the standardization of equipment for layer deposition, absorber layers having thicknesses less than 1 μm, and control of film uniformity over large areas.
- In various embodiments, the present invention provides methods for fabricating a continuous film by successively printing and annealing two or more dispersions of prefabricated nanoparticles. In particular, some embodiments of the invention facilitate manufacture of graded and multijunction semiconductor films, which can be used in PV cells and other semiconductor devices. Since the method requires no vacuum, it is cheaper and more conveniently practiced than vacuum-based techniques.
- Nanoparticles according to this invention are particles of specified elemental composition and no more than 100 nm, and preferably no more than 20 nm, in diameter. Typical nanoparticles include metal-oxide particles, which collectively form a powder. Some nanoparticle compositions suitable for semiconductor thin films comprise two or more of the chemical elements Cu, Ag, In, Ga, Al, Te, Se, S, Cd, and As. It should be stressed, however, that the invention is not limited to said elements, but that the method generally applies to any composition of nanoparticles suitable for dispersion, and subsequently printing. One of the advantages of techniques in accordance with the present invention lies in the ability to optimize the composition of the thin film by providing compositional control over the precursor nanoparticles. This facilitates the fabrication of a continuous film comprised of layers of specified chemical composition, which allows for the compositional optimization of these layers, and, as a result thereof, for improved control over the electric characteristics of the film and, in particular, over the variation of these characteristics throughout the thickness of the film.
- Dispersions according to the invention include any (homogeneous) mixture of nanoparticles and a suitable flowable carrier comprising solvents or dispersing agents, whether the mixture is a solution, a colloid, or a suspension. These dispersions of nanoparticles are termed “printing compositions” or “nanoparticle-based inks” herein.
- Methods according to the invention can be implemented using a variety of printing techniques and the corresponding printing equipment, including, but not limited to, techniques such as inkjet printing, pneumatic spray printing, screen printing, pad printing, laser printing, dot matrix printing, thermal printing lithography, or 3D printing. This versatility contributes to feasibility and cost-effectiveness. Furthermore, the composition of the nanoparticles can vary through the various deposition and annealing steps. For example, in one embodiment of the invention, the different printable compositions comprise nanoparticles of the same elements in different proportions, for example, the nanoparticles may have the formula CuIn1-xGaxSe2, wherein x varies between 0 and 1, resulting in a concentration gradient of at least one element (in the example In and Ga) through the film.
- Accordingly, in a first aspect, the invention provides a method of fabricating a film, which includes the steps of providing a substrate and flowable printing compositions with different dispersions of prefabricated nanoparticles, and successively printing and annealing layers of these printing compositions into one continuous film. In some embodiments, two or more layers are successively printed before they are annealed. Further, in some embodiments an etching step precedes annealing. Some of the individual printed layers may have thicknesses smaller than 1 μm.
- In certain embodiments, the printing compositions contain the same types of nanoparticles in different proportions, or nanoparticles composed of the same elements in different proportions, so that the annealed layers form a film with a concentration gradient of at least one material. In alternative embodiments, each printing composition includes different types of nanoparticles. In preferred embodiments, the nanoparticles have a size no greater than 20 nm and a low size dispersity.
- In some embodiments, the film includes a semiconductor material and interacts electrically with the substrate. Moreover, this structure can be complemented by an electrically conductive superstrate to form a semiconductor device. In a particular embodiment, the device is a solar cell.
- In a second aspect, the invention provides flowable printing compositions with a substantially viscosity-independent flow rate. These printing compositions contain a carrier and a dispersion of nanoparticles; the nanoparticles include Cu and/or Ag as a first component and Se, Te, and/or S as a second component. Additionally, the printing compositions may contain In, Ga, and/or Al as a third component.
- It should be stressed that embodiments of methods in accordance with the invention are not limited to the printing compositions described above.
- The foregoing discussion will be understood more readily from the following detailed description of the invention when taken in conjunction with the accompanying drawings.
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FIG. 1 is a flow diagram detailing the steps of a method to manufacture a film by successive printing and annealing. -
FIG. 2 schematically depicts a system and method for manufacturing the film in accordance with an embodiment of the invention. -
FIG. 3A is a schematic elevational view of a representative solar cell manufactured in accordance with the invention. -
FIG. 3B is a schematic elevational view of a graded CIGS film, manufactured by first depositing all constituting layers and then annealing once to produce a continuous film, and of a solar cell made therefrom. - Refer first to
FIGS. 1 and 2 , which illustrate, respectively, arepresentative process sequence 100 and operative equipment implementing embodiments of the present invention. The process sequence comprises the steps detailed in the flow diagram ofFIG. 1 , utilizing the equipment and resulting in the intermediate and final structures illustrated inFIG. 2 . In afirst step 110, asubstrate 200 and a plurality of flowable printing compositions comprising different dispersions of prefabricated nanoparticles, as further described below, are provided. Aprinting composition 202 a is selected for the first layer instep 112, and instep 114, this composition is printed onto thesubstrate 200 using aprinter 204. In some cases, which will be described below, anetch step 116 is performed after printing. In anoptional step 118, the deposited layer is dried and annealed using aheat source 206 to form acontinuous film 208. By “annealing” is meant heating of a deposited layer at a sufficient temperature and for a sufficient time that the nanoparticles fuse into a continuous layer of uniform composition. Whether annealing is performed after deposition of a particular layer depends on the specifics of the printing composition, the layer thickness, and desired film characteristics. In general, however, the composition will be dried before a subsequent composition is deposited thereon. Annealingsource 206 may be any suitable heat source, e.g., an oven, vacuum oven, furnace, IR lamp, laser, or hot plate, and suitable annealing times and temperatures, which depend on nanoparticle size and composition as well as ink composition, may be obtained without undue experimentation by means of calibration as described below in the context of printing equipment. Anneal temperatures are generally above 200° C. - The
112, 114, and optionally steps 116, 118, are repeated to print asteps second printing composition 202 b, which generally differs from thecomposition 202 a, resulting in afilm 208 that now contains two layers. This repetition may involve the same printing and 204, 206, in which case the new printing composition is substituted (e.g., in the form of a cartridge) inannealing equipment printer 204. Alternatively, theprocess sequence 100 may be carried out in a assembly-line configuration with separate printing and annealing equipment dedicated to each deposition and annealing step. Utilizing the same equipment for multiple steps may be more practical where numerous films are fabricated in parallel (i.e., the same steps are simultaneously performed on multiple substrates); while a line configuration may be preferred whereindividual substrates 200 are processed serially. - Steps 110-118 may (but need not) be repeated a plurality of times to form a film having three or
202 a, 202 b, 202 c. Once again, a particular printing composition can be utilized once or more than once, although in the case of graded films, the composition will change progressively with each deposition step. After the last layer has been printed, anmore layers etching step 120 is again optional, but afinal annealing step 122 must take place, whether previous anneals 116 have been performed or not, to form a continuousfinal film 210 from the deposited layers. The number of layers deposited and annealed in this way is at least two, and is limited only by the desired thickness and composition of thefinal film 210. Accordingly, whileFIG. 2 illustrates the manufacturing of a film with three layers, this is merely for illustration. - Each layer may contain a single type of nanoparticle, in which case different layers typically contain nanoparticles having different chemical compositions; or alternatively (or in addition), each layer may contain a plurality of nanoparticle types, in which case the same set of nanoparticles may be used in different proportions in the different layers. In some embodiments of the invention, the
method 100 is employed to produce a high-efficiency graded film by using a variety of printing compositions with nanoparticles comprising the same elements, but in different proportions. For example, a CIGS film may be produced with the varying chemical composition CuIn1-xGaxSe2, where x varies progressively among successively deposited layers (i.e., successive printing compositions). For example, x may be the distance of a certain location within the film from a boundary surface of the film (e.g., the top surface of the structure or the boundary surface in contact with the substrate), divided by the thickness of the film. Such films have been manufactured by means of chemical vapor deposition (CVD) and used as the absorption layer in a PV cell with the gallium concentration increasing towards a molybdenum back contact, resulting in a particularly high efficiency of 19.5%—a consequence of reduced back-surface recombination due to the quasi-electric field established by the concentration and corresponding bandgap gradient. Themethod 100 provides an alternative to the CVD process: using a suitable substrate, such as Mo-covered glass, CuInSe2 may be deposited for the first layer, followed by printing compositions in which the Ga content is progressively (in a linear or nonlinear fashion) increased in each layer, until the composition of the nanoparticles is primarily CuGaSe2. Once the layers are printed in the desired sequence, they are annealed to form a high-performance graded CIGS film. Other nanoparticle-based inks may also be introduced as intermediate layers to further tune the band structure of the material in order to optimize the performance of the cell. Techniques in accordance with the present invention offer the additional advantage, compared with CVD, of avoiding the need for vacuum equipment. - In other embodiments of the invention, the printing compositions comprise different types of nanoparticles. The
method 100 can, for instance, be used to manufacture a CdS/CdTe thin film. In general, the approach of the invention can be applied to any material for which a suitable nanoparticle source is available. - For the implementation of the
printing step 114, a variety of well-characterized printing processes can be used to advantage, including, but not limited to, inkjet printing, pneumatic spraying, screen printing, pad printing, laser printing, dot matrix printing, thermal printing, lithography, and 3D printing. Computer-controlled inkjet printers are readily available and particularly attractive for practice of the invention because of the level of control they provide. A commercially available inkjet printer can be used with little or no modification to print nanoparticle-based inks (the printing compositions) as described herein. To avoid problems such as clogging of the printer head or other incompatibilities, the viscosities of nanoparticle-based inks can be adjusted to those of inks produced by the printer's manufacturer, as detailed below in the context of printing compositions. The amenability of themethod 100 to readily available, low-cost equipment, such as inkjet printers, constitutes one of its advantages. - To facilitate control over the thicknesses of the individual layers and the film as a whole, the printer can be calibrated as follows. For each printing composition, a sequence of print runs is carried out, each print run involving a different number of printing passes. Drying and annealing are performed after each printing pass or at the end of a run. The thickness of the film resulting from each of the runs is different, and is determined via scanning electron microscopy (SEM) or transmission electron microscopy (TEM), or any other suitable technique. As a result, a layer having a desired thickness may be made by reference to the number of printing passes corresponding to that thickness. Similar calibration techniques can be used to determine optimal annealing temperatures and times for desired film properties.
- Printing compositions in accordance herewith are flowable dispersions of nanoparticles. Particulate precursor materials simplify compositional control for multi-component materials such as, for example, CIGS, since key components (e.g., Cu, In, Ga) can be precisely mixed in the precursor powders. One method of fabricating these powders involves mixing the constituent elements at the required ratios, dissolving them in acid to form an aqueous mixture, using hydroxide precipitation to form a gelatinous mixture of hydroxides of the elements, and drying the mixture to obtain a fine powder of mixed oxides. Nanoparticle synthesis can also be carried out using techniques described, for example, in U.S. Pat. No. 6,379,635 and co-pending U.S. patent application Ser. Nos. 11/579,050 and 11/588,880, the entire disclosures of which are hereby incorporated by reference.
- A method for producing CIGS nanoparticles of any desirable stoichiometry employing a selenol compound is disclosed in U.S. Provisional Application Ser. No. 60/991,510. Embodiments of the method involve dispersing at least a first portion of a nanoparticle precursor composition (comprising sources of at least one of Al, Ga, and/or In, and at least one of Cu, Ag, Zn, and/or Cd) in a solvent (e.g., a long-chain hydrocarbon solvent); heating the solvent to a first temperature for an appropriate length of time; adding a selenol compound to the solvent and heating the solvent; adding a second portion of the nanoparticle precursor composition to the reaction mixture; heating the mixture to a second temperature higher than the first temperature over an appropriate length of time; and maintaining the temperature for up to 10 hours. Once the particles have been formed, the surface atoms of the particles will typically be coordinated to a capping agent, which can comprise the selenol compound employed in the method. If a volatile selenol compound is used, this capping agent can be driven off with heating to yield ‘naked’ nanoparticles amenable to capping with other coordinating ligands and further processing. Examples 1 and 2 provide further details regarding the implementation of this method:
- Cu(I) acetate (1 mmol) and In(III) acetate (1 mmol) are added to a clean and dry RB-flask. Octadecene ODE (5 mL) is added the reaction mixture heated at 100° C. under vacuum for 30 mins. The flask is back-filled with nitrogen and the temperature raised to 140° C. 1-octane selenol is injected and the temperature falls to 120° C. The resulting orange suspension is heated with stirring and a transparent orange/red solution is obtained when the temperature has reached 140° C. This temperature is maintained for 30 minutes, then 1M tri-octyl-phoshine selenide TOPSe (2 mL, 2 mmol) is added dropwise and the solution heated at 160° C. The PL is monitored until it reaches the desired wavelength, after which it is cooled and the resulting oil washed with methanol/acetone (2:1) 4-5 times and finally isolated by precipitation with acetone.
- A stock solution of TOPSe was prepared by dissolving Se powder (10.9, 138 mmol) in TOP (60 mL) under nitrogen. To dry, degassed ODE was added Cu(I) acetate (7.89 g, 64.4 mmol) and In(III) acetate (20.0 g, 68.5 mmol). The reaction vessel was evacuated and heated at 140° C. for 10 min, backfilled with N2 and cooled to room temp. 1-Octane selenol (200 mL) was added to produce a bright orange suspension. The temperature of the flask was raised to 140° C. and acetic acid distilled from the reaction at 120° C. On reaching 140° C. the TOPSe solution was added dropwise over the course of 1 hour. After 3 hours the temperature was raised to 160° C. The progress of the reaction was monitored by taking aliquots from the reaction periodically and measuring the UV/Visible and photoluminescence spectra. After 7 hours the reaction was cooled to room temperature and the resulting black oil washed with methanol. Methanol washing was continued until it was possible to precipitate a fine black material from the oil by addition of acetone. The black precipitate was isolated by centrifugation, washed with acetone and dried under vacuum. Yield: 31.97 g.
- To optimize particle properties or the selection of suitable dispersants, the nanoparticles can be characterized with respect to their composition, size, and charge by conventional techniques including x-ray diffraction (XRD), UV/Vis/Near-IR spectrometry, scanning or transmission electron microscopy (SEM/TEM), energy dispersive x-ray microanalysis (EDAX), photoluminescence spectrometry, and/or elemental analysis. Inductively coupled plasma atomic-emission spectroscopy (ICPAES) analysis of representative Cu/In/Se core particles, prepared in a 1-octane selenol capping agent which was subsequently removed, provided the following suitable nanoparticle composition: Cu 16.6%; In 36.6%; Se 48.3%, corresponding to Cu1.00, In1.22, Se2.34, and a Cu/In ratio of 0.82.
- In preferred embodiments of this invention, the nanoparticles have average sizes not greater than 20 nm, and low size dispersities of around ±2 nm or less. Conformance to these constraints facilitates printing of thin films with control over the band structure through the film, resulting in high conversion efficiencies. Moreover, low size dispersities allow for good packing of the nanoparticles, and uniform melting temperature of the nanoparticle films, which contributes to proper film formation.
- The nanoparticles are dispersed in a carrier comprising solvents, such as toluene, and dispersing agents to form the printing composition. The dispersion may take the form of a solution, colloid, or suspension, generally depending on the particle size, and may have the consistency of a liquid, paste, or other viscoelastic material, as long as it is flowable. Its viscosity should be within the range from 0.158×1011 cP to 2.3×1011 cP.
- In embodiments in which water-based inks are formed with non-soluble nanoparticles, surface area and charge of the particles drive the selection of dispersants suitable for ink formulation. For example, in pigment-based inkjet printing, the overall charge the particles acquire (i.e., the zeta potential) in the medium in which they are dispersed should be sufficiently high to ensure dispersion stability; but excessive dispersion stability can result in flocculation and consequent clogging of the printer head. To ensure the jetting potential of the ink through the nozzle, the average agglomerate size should be minimized. In the printing industry, it is generally recognized that particle sizes of over 500 nm may cause plugging of the inkjet nozzles, compromising print quality.
- To mitigate print-head blocking concerns, nanoparticles can be coated in water-solubilizing capping agents, such as a mercaptocarboxylic acid (e.g., mercaptoacetic acid). For example, U.S. Pat. No. 6,114,038, the entire disclosure of which is hereby incorporated by reference, teaches how to exchange the coating groups of water-insoluble, pyridine-capped nanocrystals with a large excess of neat mercaptocarboxylic acid to obtain water-soluble capped nanocrystals. In brief, the pyridine-capped nanocrystals are precipitated with hexanes and centrifuged; the residue is dissolved in neat mercaptoacetic acid and incubated at room temperature for at least six hours; chloroform is added to precipitate the nanocrystals and wash away excess thiol; and the nanocrystals are again centrifuged, washed with chloroform and hexane, and dried with argon. The viscosity of the printing composition (nanoparticle-based ink) is desirably adjusted to achieve plastic flow behavior, i.e., where viscosity is essentially independent of flow rate. This facilitates control over coating characteristics. Capping agents needed for solubilization or suspension can be removed to stop the formation of carbon deposits within the film. In some cases, this removal occurs naturally as a result of annealing at elevated temperatures, but if does not, it can be aided by a
116, 120.prior etching step - Semiconductor thin-film structures manufactured according to the method illustrated in
FIG. 1 can be used in photovoltaic cells, LEDs, transistors, and other semiconductor devices.FIG. 3A illustrates a representative structure of a solar cell with a CIGS absorber film. Thesubstrate 305 comprises molybdenum on glass, and the submicron Mo layer also provides the back contact of thecell 300. Theabsorber film 307 comprises a series of annealed layers of CIGS, and exhibits increasing Ga and decreasing In concentration towards theMo contact 300. This film can be manufactured by printing and annealing each layer consecutively. Alternatively, as illustrated inFIG. 3B , which exemplifies the In and Ga contents of individual layers, it can be manufactured by first depositing all the layers, and subsequently fusing these layers into one continuous film in one annealing step. Abuffer layer 312 forms the junction with the CIGS film. Conventionally, this junction comprises CdS. However, due to environmental and health concerns associated with Cd, preferred PV cells are cadmium-free, using ZnS, ZnO(O,OH), or In2S3 instead. Accordingly, aZnO layer 314 over aglass cover 316 provides the superstrate of thecell 300. The performance of a ZnO/ZnO(O,OH)/CIGS/Mo cell can be improved or optimized by introducing layers of other semiconductor materials within theabsorber film 307. CIGS variants (e.g., as shown in the following Table 1) in which Se is replaced by S or Te, Cu by Ag, or In or Ga by Al, for example, can be used to manipulate the energies of the valence and conduction bands to aid in electron-hole capture. Embodiments of the invention provide a convenient means to integrate these additional layers. Moreover, if nanoparticle sources are available for the junction layer and/or the substrate or superstrate, these layers can likewise be integrated into the device by printing and annealing, as long as none of the required annealing temperatures is detrimental to the other layers within the device. -
TABLE 1 Low Bandgap High Bandgap Material Eg (eV) Material Eg (eV) CuInSe2 1.0 CuAlSe2 2.71 CuInTe2 1.0-1.15 CuInS2 1.53 CuGaTe2 1.23 CuAlTe2 2.06 CuGaSe2 1.70 CuGaS2 2.50 AgInSe2 1.20 AgGaSe2 1.80 AgGaTe2 1.1-1.3 AgAlSe2 1.66 AgAlTe2 0.56 AgInS2 1.80 AgGaSe2 1.80 AgGaS2 2.55 AgAlS2 3.13 - Although the present invention has been described with reference to specific details, it is not intended that such details should be regarded as limitations upon the scope of the invention, except as and to the extent that they are included in the accompanying claims.
Claims (19)
1. A flowable printing composition comprising a carrier and a dispersion of nanoparticles therein, the nanoparticles comprising first and second components, the first component comprising at least one of Cu or Ag, and the second component comprising at least one of Se, Te, or S, the composition having a viscosity substantially independent of flow rate.
2. The printing composition of claim 1 , wherein the first component comprises Cu or Ag, but not both.
3. The printing composition of claim 1 , wherein the second component comprises exactly one of the elements Se, Te, or S.
4. The printing composition of claim 1 , wherein the nanoparticles comprise a third component comprising at least one of In, Ga, or Al.
5. The printing composition of claim 4 , wherein the nanoparticles have the formula CuIn1-xGaxSe2 where x varies between 1 and 0.
6. The printing composition of claim 1 , wherein the composition is adapted for use in a printing method selected from the group consisting of inkjet printing, pneumatic spraying, screen printing, pad printing, laser printing, dot matrix printing, thermal printing, lithography and 3D printing.
7. The printing composition of claim 1 , wherein the nanoparticles have an average size not greater than 20 nm.
8. The printing composition of claim 1 , wherein the nanoparticles have a size dispersity of ±2 nm or less.
9. The printing composition of claim 1 , wherein the carrier comprises at least one of a solvent or a dispersing agent.
10. The printing composition of claim 9 , wherein the solvent is an organic solvent.
11. The printing composition of claim 10 , wherein the solvent is toluene.
12. The printing composition of claim 1 , wherein the dispersion has a form selected from the group consisting of a solution, a colloid and a suspension.
13. The printing composition of claim 1 , wherein the composition has a viscosity in the range from 0.158×1011 cP to 2.3×1011 cP.
14. The printing composition of claim 1 , wherein the nanoparticles are coated with a capping agent.
15. The printing composition of claim 14 , wherein the capping agent is a water solubilising capping agent.
16. The printing composition of claim 14 , wherein the capping agent is mercaptoacetic acid.
17. A flowable printing composition comprising a carrier and a dispersion of nanoparticles therein, the nanoparticles each comprising first, second, and third components, the first component comprising at least one of Cu or Ag, the second component comprising at least one of Se, Te, or S, and the third component comprising at least one of In, Ga, or Al, the composition having a viscosity substantially independent of flow rate.
18. The printing composition of claim 17 , wherein the first component comprises Cu or Ag, but not both.
19. The printing composition of claim 17 , wherein the second component comprises exactly one of the elements Se, Te, or S.
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Citations (65)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2769838A (en) * | 1953-11-20 | 1956-11-06 | Ciba Pharm Prod Inc | Polyglycol ether acid anilides |
| US3524771A (en) * | 1969-04-03 | 1970-08-18 | Zenith Radio Corp | Semiconductor devices |
| US4609689A (en) * | 1984-04-27 | 1986-09-02 | Becton, Dickinson And Company | Method of preparing fluorescently labeled microbeads |
| US6114038A (en) * | 1998-11-10 | 2000-09-05 | Biocrystal Ltd. | Functionalized nanocrystals and their use in detection systems |
| US6207229B1 (en) * | 1997-11-13 | 2001-03-27 | Massachusetts Institute Of Technology | Highly luminescent color-selective materials and method of making thereof |
| US6221602B1 (en) * | 1998-11-10 | 2001-04-24 | Bio-Pixels Ltd. | Functionalized nanocrystals and their use in labeling for strand synthesis or sequence determination |
| US6261779B1 (en) * | 1998-11-10 | 2001-07-17 | Bio-Pixels Ltd. | Nanocrystals having polynucleotide strands and their use to form dendrimers in a signal amplification system |
| US6326144B1 (en) * | 1998-09-18 | 2001-12-04 | Massachusetts Institute Of Technology | Biological applications of quantum dots |
| US6333110B1 (en) * | 1998-11-10 | 2001-12-25 | Bio-Pixels Ltd. | Functionalized nanocrystals as visual tissue-specific imaging agents, and methods for fluorescence imaging |
| US6379635B2 (en) * | 1995-09-15 | 2002-04-30 | Imperial College Of Science, Technology & Medicine | Process for preparing a nanocrystalline material |
| US6423551B1 (en) * | 1997-11-25 | 2002-07-23 | The Regents Of The University Of California | Organo luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| US6426513B1 (en) * | 1998-09-18 | 2002-07-30 | Massachusetts Institute Of Technology | Water-soluble thiol-capped nanocrystals |
| US20030017264A1 (en) * | 2001-07-20 | 2003-01-23 | Treadway Joseph A. | Luminescent nanoparticles and methods for their preparation |
| US20030106488A1 (en) * | 2001-12-10 | 2003-06-12 | Wen-Chiang Huang | Manufacturing method for semiconductor quantum particles |
| US20030148024A1 (en) * | 2001-10-05 | 2003-08-07 | Kodas Toivo T. | Low viscosity precursor compositons and methods for the depositon of conductive electronic features |
| US6607829B1 (en) * | 1997-11-13 | 2003-08-19 | Massachusetts Institute Of Technology | Tellurium-containing nanocrystalline materials |
| US6660379B1 (en) * | 1999-02-05 | 2003-12-09 | University Of Maryland, Baltimore | Luminescence spectral properties of CdS nanoparticles |
| US20040007169A1 (en) * | 2002-01-28 | 2004-01-15 | Mitsubishi Chemical Corporation | Semiconductor nanoparticles and thin film containing the same |
| US20040036130A1 (en) * | 2001-08-02 | 2004-02-26 | Lee Howard Wing Hoon | Methods of forming quantum dots of group iv semiconductor materials |
| US6699723B1 (en) * | 1997-11-25 | 2004-03-02 | The Regents Of The University Of California | Organo luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| US20040110002A1 (en) * | 2002-08-13 | 2004-06-10 | Sungjee Kim | Semiconductor nanocrystal heterostructures |
| US20040110347A1 (en) * | 2002-05-28 | 2004-06-10 | Matsushita Electric Industrial Co. Ltd. | Method of production of nanoparticle and nanoparticle produced by the method of production |
| US20040178390A1 (en) * | 2002-09-05 | 2004-09-16 | Nanosys, Inc. | Organic species that facilitate charge transfer to or from nanostructures |
| US20040250745A1 (en) * | 2003-03-31 | 2004-12-16 | Nof Corporation | Polyethylene glycol-modified semiconductor nanoparticles, method for producing the same, and material for biological diagnosis |
| US6855551B2 (en) * | 1998-09-18 | 2005-02-15 | Massachusetts Institute Of Technology | Biological applications of quantum dots |
| US20050098204A1 (en) * | 2003-05-21 | 2005-05-12 | Nanosolar, Inc. | Photovoltaic devices fabricated from nanostructured template |
| US20050129947A1 (en) * | 2003-01-22 | 2005-06-16 | Xiaogang Peng | Monodisperse core/shell and other complex structured nanocrystals and methods of preparing the same |
| US6914264B2 (en) * | 2002-09-20 | 2005-07-05 | Formosa Epitaxy Incorporation | Structure and manufacturing method for GaN light emitting diodes |
| US20050145853A1 (en) * | 2002-12-19 | 2005-07-07 | Hitachi Software Engineering Co., Ltd. | Semiconductor nanoparticle and method for producing same |
| US20050183767A1 (en) * | 2004-02-19 | 2005-08-25 | Nanosolar, Inc. | Solution-based fabrication of photovoltaic cell |
| US20060019098A1 (en) * | 2004-07-26 | 2006-01-26 | Chan Yinthai | Microspheres including nanoparticles |
| US6992202B1 (en) * | 2002-10-31 | 2006-01-31 | Ohio Aerospace Institute | Single-source precursors for ternary chalcopyrite materials, and methods of making and using the same |
| US20060062902A1 (en) * | 2004-09-18 | 2006-03-23 | Nanosolar, Inc. | Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells |
| US20060061017A1 (en) * | 2004-09-20 | 2006-03-23 | The Regents Of The University Of California | Method for synthesis of colloidal nanoparticles |
| US20060068154A1 (en) * | 2004-01-15 | 2006-03-30 | Nanosys, Inc. | Nanocrystal doped matrixes |
| US20060110279A1 (en) * | 2002-12-16 | 2006-05-25 | Mingyong Han | Ternary and quarternary nanocrystals, processes for their production and uses thereof |
| US20060118757A1 (en) * | 2004-12-03 | 2006-06-08 | Klimov Victor I | Multifunctional nanocrystals |
| US20060130741A1 (en) * | 2001-07-30 | 2006-06-22 | Xiaogang Peng | High quality colloidal nanocrystals and methods of preparing the same in non-coordinating solvents |
| US7151047B2 (en) * | 2004-04-28 | 2006-12-19 | Warren Chan | Stable, water-soluble quantum dot, method of preparation and conjugates thereof |
| US20070012941A1 (en) * | 2005-07-13 | 2007-01-18 | Kwang-Ohk Cheon | Light emitting diode comprising semiconductor nanocrystal complexes |
| US20070034833A1 (en) * | 2004-01-15 | 2007-02-15 | Nanosys, Inc. | Nanocrystal doped matrixes |
| US20070059705A1 (en) * | 2003-08-08 | 2007-03-15 | Huachang Lu | Fluorescent magnetic nanoparticles and process of preparation |
| US20070104865A1 (en) * | 2005-10-28 | 2007-05-10 | Nanoco Technologies Limited | Controlled preparation of nanoparticle materials |
| US20070110816A1 (en) * | 2005-11-11 | 2007-05-17 | Jun Shin-Ae | Method of coating nanoparticles |
| US20070114520A1 (en) * | 2005-09-02 | 2007-05-24 | Osram Opto Semiconductors Gmbh | Radiation emitting device and method of manufacturing the same |
| US20070131905A1 (en) * | 2005-01-06 | 2007-06-14 | Hitachi Software Engineering Co., Ltd. | Semiconductor nanoparticle surface modification method |
| US20070199109A1 (en) * | 2006-02-21 | 2007-08-23 | Samsung Electronics Co., Ltd. | Nanocomposite material and method of manufacturing the same |
| US20070202333A1 (en) * | 2004-04-30 | 2007-08-30 | Nanoco Technologies Limited | Preparation Of Nanoparticle Materials |
| US7264527B2 (en) * | 1998-04-01 | 2007-09-04 | Lumileds Lighting U.S., Llc | Quantum dot white and colored light-emitting devices |
| US20070238126A1 (en) * | 2006-04-05 | 2007-10-11 | Nanoco Technologies Limited | Labelled beads |
| US20080107911A1 (en) * | 2006-11-06 | 2008-05-08 | Evident Technologies, Inc. | Water-stable semiconductor nanocrystal complexes and methods of making same |
| US20080122877A1 (en) * | 2004-06-15 | 2008-05-29 | Koji Aoyama | Image Processing Device And Method, Storage Medium, And Program |
| US20080121844A1 (en) * | 2006-08-21 | 2008-05-29 | Samsung Electronics Co., Ltd. | Composite light-emitting material and light-emitting device comprising the same |
| US20080160306A1 (en) * | 2004-04-30 | 2008-07-03 | Nanoco Technologies Limited | Preparation of Nanoparticle Materials |
| US20080220593A1 (en) * | 2005-08-12 | 2008-09-11 | Nanoco Technologies Limited | Nanoparticles |
| US20080257201A1 (en) * | 2007-04-18 | 2008-10-23 | James Harris | Fabrication of Electrically Active Films Based on Multiple Layers |
| US20080264479A1 (en) * | 2007-04-25 | 2008-10-30 | Nanoco Technologies Limited | Hybrid Photovoltaic Cells and Related Methods |
| US20090139574A1 (en) * | 2007-11-30 | 2009-06-04 | Nanoco Technologies Limited | Preparation of nanoparticle material |
| US20090190483A1 (en) * | 2008-01-25 | 2009-07-30 | Inventec Corporation | Network transmission system and a testing method thereof |
| US20090212258A1 (en) * | 2008-02-25 | 2009-08-27 | Nanoco Technologies Limited | Semicondcutor nanoparticle capping agents |
| US20100059721A1 (en) * | 2008-07-19 | 2010-03-11 | Nanoco Technologies Limited | Method for Producing Aqueous Compatible Nanoparticles |
| US20100068522A1 (en) * | 2008-08-07 | 2010-03-18 | Nanoco Technologies Limited | Surface Functionalised Nanoparticles |
| US20100113813A1 (en) * | 2008-11-04 | 2010-05-06 | Nanoco Technologies Limited | Surface functionalised nanoparticles |
| US20100123155A1 (en) * | 2008-11-19 | 2010-05-20 | Nanoco Technologies Limited | Semiconductor nanoparticle-based light-emitting devices and associated materials and methods |
| US20100193767A1 (en) * | 2009-02-05 | 2010-08-05 | Imad Naasani | Encapsulated nanoparticles |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3249407B2 (en) * | 1996-10-25 | 2002-01-21 | 昭和シェル石油株式会社 | Thin-film solar cells composed of chalcopyrite-based multi-compound semiconductor thin-film light-absorbing layers |
| EP1113986A2 (en) | 1998-09-18 | 2001-07-11 | Massachusetts Institute Of Technology | Inventory control |
| WO2002004527A2 (en) | 2000-07-11 | 2002-01-17 | Sri International | Encoding methods using up-converting phosphors for high-throughput screening of catalysts |
| EP1176646A1 (en) | 2000-07-28 | 2002-01-30 | Ecole Polytechnique Féderale de Lausanne (EPFL) | Solid state heterojunction and solid state sensitized photovoltaic cell |
| WO2002024623A2 (en) | 2000-09-22 | 2002-03-28 | Glaxo Group Limited | Novel alkanoic acid derivatives |
| EP1337695B1 (en) | 2000-10-04 | 2010-12-08 | The Board Of Trustees Of The University Of Arkansas | Synthesis of colloidal metal chalcogenide nanocrystals |
| CN1394599A (en) | 2001-07-06 | 2003-02-05 | 中国科学院上海原子核研究所 | Preparation method of medicinal antimony sulfide nano colloidal particles |
| WO2004008550A2 (en) | 2002-07-15 | 2004-01-22 | Advanced Research And Technology Institute, Inc. | Rapid low-temperature synthesis of quantum dots |
| US7563507B2 (en) | 2002-08-16 | 2009-07-21 | University Of Massachusetts | Pyridine and related ligand compounds, functionalized nanoparticulate composites and methods of preparation |
| WO2004033366A1 (en) | 2002-09-20 | 2004-04-22 | Matsushita Electric Industrial Co., Ltd. | Method for preparing nano-particle and nano-particle prepared by said preparation method |
| EP1556902A4 (en) * | 2002-09-30 | 2009-07-29 | Miasole | APPARATUS AND METHOD FOR MANUFACTURING CON CURRENT FOR LARGE SCALE PRODUCTION OF THIN FILM SOLAR CELLS |
| WO2005021150A2 (en) | 2003-09-01 | 2005-03-10 | The University Of Manchester | Labelled polymeric materials |
| JP2005139389A (en) | 2003-11-10 | 2005-06-02 | Sumitomo Osaka Cement Co Ltd | Semiconductor of ultrafine particle |
| WO2006001848A2 (en) | 2004-02-12 | 2006-01-05 | Advanced Research And Technology Institute, Inc. | Quantum dots as high-sensitivity optical sensors and biocompatible imaging probes, compositions thereof, and related methods |
| US20080044340A1 (en) | 2004-06-10 | 2008-02-21 | Ohio University | Method for Producing Highly Monodisperse Quantum Dots |
| US20070045777A1 (en) | 2004-07-08 | 2007-03-01 | Jennifer Gillies | Micronized semiconductor nanocrystal complexes and methods of making and using same |
| US7655768B2 (en) | 2004-08-26 | 2010-02-02 | Nippon Shinyaku Co., Ltd. | Galactose derivative, drug carrier and medicinal composition |
| EP1848995A4 (en) | 2005-01-17 | 2010-09-29 | Agency Science Tech & Res | WATER SOLUBLE NANOCRYSTALS AND PROCESSES FOR PREPARING THE SAME |
| TWI389897B (en) | 2005-02-22 | 2013-03-21 | Chugai Pharmaceutical Co Ltd | 1- (2H) -isoquinolinone derivatives |
| WO2006101986A2 (en) | 2005-03-16 | 2006-09-28 | Nanosolar, Inc. | Mettalic dispersion and formation of compound film for photovoltaic device active layer |
| WO2006118543A1 (en) | 2005-05-04 | 2006-11-09 | Agency For Science, Technology And Research | Novel water-soluble nanocrystals comprising a low molecular weight coating reagent, and methods of preparing the same |
| JP5137825B2 (en) | 2005-06-15 | 2013-02-06 | イッサム リサーチ デベロップメント カンパニー オブ ザ ヘブライ ユニバーシティ オブ エルサレム | III-V semiconductor core-heteroshell nanocrystal |
| DE202005021785U1 (en) * | 2005-08-05 | 2010-02-25 | Epoq Gmbh | Apparatus for conducting telephone campaigns |
| JP2009532851A (en) | 2006-02-16 | 2009-09-10 | ソレクサント・コーポレイション | Nanoparticle-sensitized nanostructure solar cell |
| WO2007149835A2 (en) * | 2006-06-20 | 2007-12-27 | Konarka Technologies, Inc. | Photovoltaic cells |
| US20080112877A1 (en) | 2006-11-14 | 2008-05-15 | Toyota Engineering & Manufacturing North America, Inc. | Metal telluride nanocrystals and synthesis thereof |
| US20080190483A1 (en) * | 2007-02-13 | 2008-08-14 | Carpenter R Douglas | Composition and method of preparing nanoscale thin film photovoltaic materials |
| GB0714865D0 (en) | 2007-07-31 | 2007-09-12 | Nanoco Technologies Ltd | Nanoparticles |
-
2008
- 2008-04-17 US US12/104,902 patent/US8563348B2/en not_active Expired - Fee Related
- 2008-04-18 TW TW097114381A patent/TWI364848B/en not_active IP Right Cessation
-
2010
- 2010-04-29 US US12/769,960 patent/US20100212544A1/en not_active Abandoned
Patent Citations (77)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2769838A (en) * | 1953-11-20 | 1956-11-06 | Ciba Pharm Prod Inc | Polyglycol ether acid anilides |
| US3524771A (en) * | 1969-04-03 | 1970-08-18 | Zenith Radio Corp | Semiconductor devices |
| US4609689A (en) * | 1984-04-27 | 1986-09-02 | Becton, Dickinson And Company | Method of preparing fluorescently labeled microbeads |
| US6379635B2 (en) * | 1995-09-15 | 2002-04-30 | Imperial College Of Science, Technology & Medicine | Process for preparing a nanocrystalline material |
| US6207229B1 (en) * | 1997-11-13 | 2001-03-27 | Massachusetts Institute Of Technology | Highly luminescent color-selective materials and method of making thereof |
| US6607829B1 (en) * | 1997-11-13 | 2003-08-19 | Massachusetts Institute Of Technology | Tellurium-containing nanocrystalline materials |
| US6322901B1 (en) * | 1997-11-13 | 2001-11-27 | Massachusetts Institute Of Technology | Highly luminescent color-selective nano-crystalline materials |
| US6699723B1 (en) * | 1997-11-25 | 2004-03-02 | The Regents Of The University Of California | Organo luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| US6423551B1 (en) * | 1997-11-25 | 2002-07-23 | The Regents Of The University Of California | Organo luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| US7264527B2 (en) * | 1998-04-01 | 2007-09-04 | Lumileds Lighting U.S., Llc | Quantum dot white and colored light-emitting devices |
| US6326144B1 (en) * | 1998-09-18 | 2001-12-04 | Massachusetts Institute Of Technology | Biological applications of quantum dots |
| US7235361B2 (en) * | 1998-09-18 | 2007-06-26 | Massachusetts Institute Of Technology | Biological applications of quantum dots |
| US6426513B1 (en) * | 1998-09-18 | 2002-07-30 | Massachusetts Institute Of Technology | Water-soluble thiol-capped nanocrystals |
| US6855551B2 (en) * | 1998-09-18 | 2005-02-15 | Massachusetts Institute Of Technology | Biological applications of quantum dots |
| US6261779B1 (en) * | 1998-11-10 | 2001-07-17 | Bio-Pixels Ltd. | Nanocrystals having polynucleotide strands and their use to form dendrimers in a signal amplification system |
| US6333110B1 (en) * | 1998-11-10 | 2001-12-25 | Bio-Pixels Ltd. | Functionalized nanocrystals as visual tissue-specific imaging agents, and methods for fluorescence imaging |
| US6221602B1 (en) * | 1998-11-10 | 2001-04-24 | Bio-Pixels Ltd. | Functionalized nanocrystals and their use in labeling for strand synthesis or sequence determination |
| US6114038A (en) * | 1998-11-10 | 2000-09-05 | Biocrystal Ltd. | Functionalized nanocrystals and their use in detection systems |
| US6660379B1 (en) * | 1999-02-05 | 2003-12-09 | University Of Maryland, Baltimore | Luminescence spectral properties of CdS nanoparticles |
| US20030017264A1 (en) * | 2001-07-20 | 2003-01-23 | Treadway Joseph A. | Luminescent nanoparticles and methods for their preparation |
| US20070125983A1 (en) * | 2001-07-20 | 2007-06-07 | Invitrogen Corporation | Methods for the preparation of luminescent nanoparticles using two solvents |
| US20060057382A1 (en) * | 2001-07-20 | 2006-03-16 | Treadway Joseph A | Luminescent nanoparticles and methods for their preparation |
| US6815064B2 (en) * | 2001-07-20 | 2004-11-09 | Quantum Dot Corporation | Luminescent nanoparticles and methods for their preparation |
| US20060130741A1 (en) * | 2001-07-30 | 2006-06-22 | Xiaogang Peng | High quality colloidal nanocrystals and methods of preparing the same in non-coordinating solvents |
| US20040036130A1 (en) * | 2001-08-02 | 2004-02-26 | Lee Howard Wing Hoon | Methods of forming quantum dots of group iv semiconductor materials |
| US20030148024A1 (en) * | 2001-10-05 | 2003-08-07 | Kodas Toivo T. | Low viscosity precursor compositons and methods for the depositon of conductive electronic features |
| US20030106488A1 (en) * | 2001-12-10 | 2003-06-12 | Wen-Chiang Huang | Manufacturing method for semiconductor quantum particles |
| US20040007169A1 (en) * | 2002-01-28 | 2004-01-15 | Mitsubishi Chemical Corporation | Semiconductor nanoparticles and thin film containing the same |
| US20040110347A1 (en) * | 2002-05-28 | 2004-06-10 | Matsushita Electric Industrial Co. Ltd. | Method of production of nanoparticle and nanoparticle produced by the method of production |
| US20040110002A1 (en) * | 2002-08-13 | 2004-06-10 | Sungjee Kim | Semiconductor nanocrystal heterostructures |
| US20040178390A1 (en) * | 2002-09-05 | 2004-09-16 | Nanosys, Inc. | Organic species that facilitate charge transfer to or from nanostructures |
| US6914264B2 (en) * | 2002-09-20 | 2005-07-05 | Formosa Epitaxy Incorporation | Structure and manufacturing method for GaN light emitting diodes |
| US6992202B1 (en) * | 2002-10-31 | 2006-01-31 | Ohio Aerospace Institute | Single-source precursors for ternary chalcopyrite materials, and methods of making and using the same |
| US20060110279A1 (en) * | 2002-12-16 | 2006-05-25 | Mingyong Han | Ternary and quarternary nanocrystals, processes for their production and uses thereof |
| US20050145853A1 (en) * | 2002-12-19 | 2005-07-07 | Hitachi Software Engineering Co., Ltd. | Semiconductor nanoparticle and method for producing same |
| US20050129947A1 (en) * | 2003-01-22 | 2005-06-16 | Xiaogang Peng | Monodisperse core/shell and other complex structured nanocrystals and methods of preparing the same |
| US20040250745A1 (en) * | 2003-03-31 | 2004-12-16 | Nof Corporation | Polyethylene glycol-modified semiconductor nanoparticles, method for producing the same, and material for biological diagnosis |
| US20050098204A1 (en) * | 2003-05-21 | 2005-05-12 | Nanosolar, Inc. | Photovoltaic devices fabricated from nanostructured template |
| US20070059705A1 (en) * | 2003-08-08 | 2007-03-15 | Huachang Lu | Fluorescent magnetic nanoparticles and process of preparation |
| US20060068154A1 (en) * | 2004-01-15 | 2006-03-30 | Nanosys, Inc. | Nanocrystal doped matrixes |
| US20070034833A1 (en) * | 2004-01-15 | 2007-02-15 | Nanosys, Inc. | Nanocrystal doped matrixes |
| US20050183767A1 (en) * | 2004-02-19 | 2005-08-25 | Nanosolar, Inc. | Solution-based fabrication of photovoltaic cell |
| US7151047B2 (en) * | 2004-04-28 | 2006-12-19 | Warren Chan | Stable, water-soluble quantum dot, method of preparation and conjugates thereof |
| US20070202333A1 (en) * | 2004-04-30 | 2007-08-30 | Nanoco Technologies Limited | Preparation Of Nanoparticle Materials |
| US7803423B2 (en) * | 2004-04-30 | 2010-09-28 | Nanoco Technologies Limited | Preparation of nanoparticle materials |
| US7588828B2 (en) * | 2004-04-30 | 2009-09-15 | Nanoco Technologies Limited | Preparation of nanoparticle materials |
| US20080160306A1 (en) * | 2004-04-30 | 2008-07-03 | Nanoco Technologies Limited | Preparation of Nanoparticle Materials |
| US20080122877A1 (en) * | 2004-06-15 | 2008-05-29 | Koji Aoyama | Image Processing Device And Method, Storage Medium, And Program |
| US20060019098A1 (en) * | 2004-07-26 | 2006-01-26 | Chan Yinthai | Microspheres including nanoparticles |
| US20060062902A1 (en) * | 2004-09-18 | 2006-03-23 | Nanosolar, Inc. | Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells |
| US20060061017A1 (en) * | 2004-09-20 | 2006-03-23 | The Regents Of The University Of California | Method for synthesis of colloidal nanoparticles |
| US20060118757A1 (en) * | 2004-12-03 | 2006-06-08 | Klimov Victor I | Multifunctional nanocrystals |
| US20070131905A1 (en) * | 2005-01-06 | 2007-06-14 | Hitachi Software Engineering Co., Ltd. | Semiconductor nanoparticle surface modification method |
| US20070012941A1 (en) * | 2005-07-13 | 2007-01-18 | Kwang-Ohk Cheon | Light emitting diode comprising semiconductor nanocrystal complexes |
| US7867557B2 (en) * | 2005-08-12 | 2011-01-11 | Nanoco Technologies Limited | Nanoparticles |
| US20080220593A1 (en) * | 2005-08-12 | 2008-09-11 | Nanoco Technologies Limited | Nanoparticles |
| US20070114520A1 (en) * | 2005-09-02 | 2007-05-24 | Osram Opto Semiconductors Gmbh | Radiation emitting device and method of manufacturing the same |
| US7867556B2 (en) * | 2005-10-28 | 2011-01-11 | Nanoco Technologies Limited | Controlled preparation of nanoparticle materials |
| US20070104865A1 (en) * | 2005-10-28 | 2007-05-10 | Nanoco Technologies Limited | Controlled preparation of nanoparticle materials |
| US20070110816A1 (en) * | 2005-11-11 | 2007-05-17 | Jun Shin-Ae | Method of coating nanoparticles |
| US20070199109A1 (en) * | 2006-02-21 | 2007-08-23 | Samsung Electronics Co., Ltd. | Nanocomposite material and method of manufacturing the same |
| US20070238126A1 (en) * | 2006-04-05 | 2007-10-11 | Nanoco Technologies Limited | Labelled beads |
| US7674844B2 (en) * | 2006-04-05 | 2010-03-09 | Nanoco Technologies Limited | Labelled beads |
| US20090263816A1 (en) * | 2006-04-05 | 2009-10-22 | Nanoco Technologies Limited | Labelled beads |
| US7544725B2 (en) * | 2006-04-05 | 2009-06-09 | Nanoco Technologies Limited | Labelled beads |
| US20080121844A1 (en) * | 2006-08-21 | 2008-05-29 | Samsung Electronics Co., Ltd. | Composite light-emitting material and light-emitting device comprising the same |
| US20080107911A1 (en) * | 2006-11-06 | 2008-05-08 | Evident Technologies, Inc. | Water-stable semiconductor nanocrystal complexes and methods of making same |
| US20080257201A1 (en) * | 2007-04-18 | 2008-10-23 | James Harris | Fabrication of Electrically Active Films Based on Multiple Layers |
| US20080264479A1 (en) * | 2007-04-25 | 2008-10-30 | Nanoco Technologies Limited | Hybrid Photovoltaic Cells and Related Methods |
| US20090139574A1 (en) * | 2007-11-30 | 2009-06-04 | Nanoco Technologies Limited | Preparation of nanoparticle material |
| US20090190483A1 (en) * | 2008-01-25 | 2009-07-30 | Inventec Corporation | Network transmission system and a testing method thereof |
| US20090212258A1 (en) * | 2008-02-25 | 2009-08-27 | Nanoco Technologies Limited | Semicondcutor nanoparticle capping agents |
| US20100059721A1 (en) * | 2008-07-19 | 2010-03-11 | Nanoco Technologies Limited | Method for Producing Aqueous Compatible Nanoparticles |
| US20100068522A1 (en) * | 2008-08-07 | 2010-03-18 | Nanoco Technologies Limited | Surface Functionalised Nanoparticles |
| US20100113813A1 (en) * | 2008-11-04 | 2010-05-06 | Nanoco Technologies Limited | Surface functionalised nanoparticles |
| US20100123155A1 (en) * | 2008-11-19 | 2010-05-20 | Nanoco Technologies Limited | Semiconductor nanoparticle-based light-emitting devices and associated materials and methods |
| US20100193767A1 (en) * | 2009-02-05 | 2010-08-05 | Imad Naasani | Encapsulated nanoparticles |
Non-Patent Citations (2)
| Title |
|---|
| "Tapping Mode Atomic Force Microscopy for Nanoparticle Sizing: Tip-Sample Interaction Effects"Yuval Ebenstein ; Nano Letters, 2002, 2 (9), pp 945-950 * |
| Malik et al. "A Novel Route for the Preparation of CuSe and CuInSe2 Nanoparticles"; Advanced MaterialsVolume 11, Issue 17, pages 1441-1444, December, * |
Cited By (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110070147A1 (en) * | 2004-04-30 | 2011-03-24 | Nanoco Technologies Limited | Preparation of Nanoparticle Materials |
| US8524365B2 (en) | 2004-04-30 | 2013-09-03 | Nanoco Technologies Ltd. | Preparation of nanoparticle materials |
| US8062703B2 (en) | 2004-04-30 | 2011-11-22 | Nanoco Technologies Ltd. | Preparation of nanoparticle materials |
| US7985446B2 (en) | 2004-04-30 | 2011-07-26 | Nanoco Technologies Limited | Preparation of nanoparticle materials |
| US20110070443A1 (en) * | 2004-04-30 | 2011-03-24 | Nanoco Technologies Limited | Preparation of Nanoparticle Materials |
| US20110108799A1 (en) * | 2005-08-12 | 2011-05-12 | Nigel Pickett | Nanoparticles |
| US8563348B2 (en) | 2007-04-18 | 2013-10-22 | Nanoco Technologies Ltd. | Fabrication of electrically active films based on multiple layers |
| US20080257201A1 (en) * | 2007-04-18 | 2008-10-23 | James Harris | Fabrication of Electrically Active Films Based on Multiple Layers |
| US8394663B2 (en) | 2007-04-25 | 2013-03-12 | Nanoco Technologies, Ltd. | Hybrid photovoltaic cells and related methods |
| US9251922B2 (en) | 2007-11-30 | 2016-02-02 | Nanoco Technologies, Ltd. | Preparation of nanoparticle material |
| US8784701B2 (en) | 2007-11-30 | 2014-07-22 | Nanoco Technologies Ltd. | Preparation of nanoparticle material |
| US20090139574A1 (en) * | 2007-11-30 | 2009-06-04 | Nanoco Technologies Limited | Preparation of nanoparticle material |
| US20090212258A1 (en) * | 2008-02-25 | 2009-08-27 | Nanoco Technologies Limited | Semicondcutor nanoparticle capping agents |
| US8337720B2 (en) | 2008-02-25 | 2012-12-25 | Nanoco Technologies, Ltd. | Semiconductor nanoparticle capping agents |
| US20100059721A1 (en) * | 2008-07-19 | 2010-03-11 | Nanoco Technologies Limited | Method for Producing Aqueous Compatible Nanoparticles |
| US8741177B2 (en) | 2008-07-19 | 2014-06-03 | Nanoco Technologies Ltd. | Method for producing aqueous compatible nanoparticles |
| US20100068522A1 (en) * | 2008-08-07 | 2010-03-18 | Nanoco Technologies Limited | Surface Functionalised Nanoparticles |
| US8597730B2 (en) | 2008-08-07 | 2013-12-03 | Nanoco Technologies Ltd. | Surface functionalised nanoparticles |
| US8394976B2 (en) | 2008-11-04 | 2013-03-12 | Nanoco Technologies, Ltd. | Surface functionalised nanoparticles |
| US20100113813A1 (en) * | 2008-11-04 | 2010-05-06 | Nanoco Technologies Limited | Surface functionalised nanoparticles |
| US8921827B2 (en) | 2008-11-19 | 2014-12-30 | Nanoco Technologies, Ltd. | Semiconductor nanoparticle-based light-emitting devices and associated materials and methods |
| US20100123155A1 (en) * | 2008-11-19 | 2010-05-20 | Nanoco Technologies Limited | Semiconductor nanoparticle-based light-emitting devices and associated materials and methods |
| US20100193767A1 (en) * | 2009-02-05 | 2010-08-05 | Imad Naasani | Encapsulated nanoparticles |
| US8847197B2 (en) | 2009-09-23 | 2014-09-30 | Nanoco Technologies Ltd. | Semiconductor nanoparticle-based materials |
| US20110068321A1 (en) * | 2009-09-23 | 2011-03-24 | Nanoco Technologies Limited | Semiconductor nanoparticle-based materials |
| US8957401B2 (en) | 2009-09-23 | 2015-02-17 | Nanoco Technologies, Ltd | Semiconductor nanoparticle-based materials |
| US20110068322A1 (en) * | 2009-09-23 | 2011-03-24 | Nanoco Technologies Limited | Semiconductor Nanoparticle-Based Materials |
| US9543481B2 (en) | 2009-09-23 | 2017-01-10 | Nanoco Technologies Ltd. | Semiconductor nanoparticle-based materials |
| US8859442B2 (en) | 2010-04-01 | 2014-10-14 | Nanoco Technologies Ltd. | Encapsulated nanoparticles |
| US9159590B2 (en) | 2010-04-01 | 2015-10-13 | Nanoco Technologies, Ltd. | Encapsulated nanoparticles |
| WO2018071847A1 (en) * | 2016-10-14 | 2018-04-19 | Bulk Nano Processing Llc | Rotary filter apparatus for roll-to-roll nanomaterial dispersion papermaking |
| CN106392066A (en) * | 2016-11-11 | 2017-02-15 | 湖北万佳宏铝业股份有限公司 | Method for preparing aluminum alloy section bar by 3D printing |
Also Published As
| Publication number | Publication date |
|---|---|
| US8563348B2 (en) | 2013-10-22 |
| US20080257201A1 (en) | 2008-10-23 |
| TW200908359A (en) | 2009-02-16 |
| TWI364848B (en) | 2012-05-21 |
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