US20010013654A1 - Ball grid package with multiple power/ ground planes - Google Patents
Ball grid package with multiple power/ ground planes Download PDFInfo
- Publication number
- US20010013654A1 US20010013654A1 US09/469,476 US46947699A US2001013654A1 US 20010013654 A1 US20010013654 A1 US 20010013654A1 US 46947699 A US46947699 A US 46947699A US 2001013654 A1 US2001013654 A1 US 2001013654A1
- Authority
- US
- United States
- Prior art keywords
- interposer
- frame
- package
- circuit
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/50—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16235—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a via metallisation of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/85399—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15153—Shape the die mounting substrate comprising a recess for hosting the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Definitions
- This invention is related to an integrated circuit device and more particularly to electrical interconnections in a ball grid array package.
- the integrated circuit packages are constructed with multilayer power and ground planes which can reduce pin count by providing common contacts for several inputs and outputs, and can allow improved electrical and thermal performance of the device.
- a BGA package is a surface mount package which is assembled to an external circuit board using an array of solder balls confined within the area of the package.
- An example of a BGA package is given in FIG. 1.
- the BGA package 100 is in a “cavity up” configuration, indicating that the semiconductor chip 101 is attached to the top surface 103 a (i.e., upward facing surface) of the substrate 103 , and that solder balls 105 which interconnect the package to a printed wiring board are attached to the back side 103 b (i.e., downward facing surface) of the substrate.
- the chip is electrically interconnected to traces on the substrate by wire bonding or by flip chip bump connections 107 , as shown in FIG. 1.
- a lid 108 or other form of encapsulation covers the chip and provides mechanical and environmental protection.
- Substrates of high performance and high pin count BGAs have multiple layers of metal traces separated by dielectric layers and connected through vias to provide power and ground planes, and these structures will be discussed in more detail later.
- a separate conductor and dielectric layer is required for each input/output function, such as a contact layer with routing for signal, power and ground, a ground plane, a power plane for each operating voltage, and a layer for the external contacts.
- Limitations of prior art BGA packages are low thermal dissipation, electrical performance limited by the number of conductor layers, and associated costs of substrates with multiple metal and dielectric layers, and package reliability and susceptibility to moisture.
- a “cavity down” BGA package typically has a die cavity in a multilayer printed circuit board (PCB) substrate.
- the multilayer substrate allows lower parasitic impedance, and inclusion of a metal slug at the bottom of the cavity increases thermal dissipation of the package.
- a chip cavity or recess in the package is required to allow sufficient clearance for the chip and its interconnecting wire bonds when the package has been assembled onto a printed wiring board.
- a “cavity down” BGA package can also be fabricated using a substrate with multilayer PCB technology. Both “cavity up” and “cavity down” BGA packages using such substrates suffer from high cost, and as the pin count increases, the limitations of PCB printing technology force larger package sizes with increased inductance resulting from the longer conductor length.
- a TGA (TAB Grid Array) package 200 was disclosed and a cross section is shown in FIG. 2.
- the TGA uses a TAB (Tape automated bond) flexible tape 202 with fine line interconnections for inner lead bonding of the tape conductors to bumps on the chip.
- the flexible tape 202 has a dielectric layer 209 and 210 on either side of the metal 203 a layer with traces which provide interconnection between the chip contacts and solder balls 211 on the package.
- the tape is attached by an adhesive 208 to a stiffener 206 with a cavity for housing the semiconductor chip 201 .
- the chip is protected by an encapsulating material 204 .
- Solder balls 211 for external connection are attached to the interconnection traces, and in selected locations 213 to the stiffener which acts like a ground plane. While this approach has merits, it is based on TAB or wire bonding of the die, both of which are limited to perimeter bonded integrated circuit chips, and may not be acceptable for very high pin count devices. In addition, TAB bonding has not proved to be an industry accepted, production worthy process, largely because of high costs. Wire bonding adds inductance to the circuit and becomes a limiting feature for very high performance and high pin count devices.
- a cavity down BGA package comprising a flip chip interconnected integrated circuit, a stiffener or package base, an interposer circuit having two conductive metal layers separated by a dielectric layer, and a frame which serves the dual purposes of providing electrical interconnection between the interposer circuit and the external solder ball terminals, and a cavity for housing the integrated circuit chip.
- Routing for signal, power and ground contacts, including one or more power and ground planes are provided on the interposer circuit.
- Metallization on the first surface of the interposer circuit provides routing from the flip chip terminals of the integrated circuit to power planes and /or bus structures, to external bump contacts, and through vias to the ground plane on the second metal layer.
- solder bumps on the first surface of the interposer circuit correspond to metallized vias in the frame.
- the solder bumps provide both mechanical and electrical contact between the interposer circuitry and the external solder ball contacts.
- the second surface of interposer circuit is adhered to the stiffener. Integrity of the small bumps which provide contact between the interposer and stiffener base and the frame, as well as the flip chip bumps on the integrated circuit is enhanced by underfill materials designed to absorb thermal and mechanical stresses between dissimilar materials of the package.
- External solder ball terminals are connected to the frame and contact the flex circuit through vias in the frame.
- the cavity of the package is filled with a polymeric compound for environmental and mechanical protection.
- an interposer circuit having electrical routing for signal, power and ground contacts accomplished on two conductor layers through selective planes and buses with specific boundaries is assembled in a cavity up BGA configuration.
- FIG. 1 is a cross sectional view of a cavity up BGA (ball grid array) package.
- FIG. 2 is a cross-sectional view of a TAB Grid Array package (TGA).
- FIG. 3 a is a cross-sectional view of a flip chip Cavity down BGA of the present invention.
- FIG. 3 b is cut away bottom view of the flip chip Cavity Down BGA of the present invention.
- FIG. 4 a is a detailed cross-sectional view of an interposer circuit.
- FIG. 4 b shows signal, power, and ground contacts and routing, and one power plane on the one surface of the interposer.
- FIG. 4 c shows signal, power, and ground contacts and routing and a second power plane on one surface of the interposer.
- FIG. 5 is a cross-sectional view of a multilayer BGA package. (Prior art)
- FIG. 6 outlines the process flow for assembly of a cavity down flip chip BGA package.
- FIG. 7 is a cross sectional view of a cavity up BGA with an interposer circuit having two conductor surfaces.
- a preferred embodiment of the present invention is shown in a cross-sectional view in FIG. 3 a .
- An integrated circuit chip 301 with flip chip contacts 302 such as solder bumps arrayed on the active surface of the chip 301 a , is electrically connected to metallized contact pads on the first surface 303 a of an interposer circuit 303 .
- the second surface 303 b of the interposer circuit 303 is adhered by an insulating adhesive 314 to a planar stiffener 304 which is the base of the package.
- An interposer circuit includes a core dielectric material which may be a supported BT or FR- 4 resin type polymer, an unsupported polyimide or alternate high temperature polymer, or a ceramic. Electrical conductors are disposed on both major surfaces of the dielectric core, and conductive vias provides interconnection between the surfaces.
- the package outline is defined by the stiffener which provides both mechanical support to the device, and a large thermal dissipation path to the ambient, or to an attached heat sink.
- a frame 305 attached by solder bumps 308 to the interposer circuit 303 on the stiffener, forms the package cavity, and provides support for external BGA solder ball 306 contacts.
- An “underfill” material 307 typically a polymer loaded with electrically insulating particles provides mechanical support to the small solder bumps 302 of the flip chip connections, and to the solder bump connections 308 between the interposer circuit and the frame.
- solder bump is intended to refer to a connector of any shape, such as a sphere, column, or hour glass shaped connector, attached by a solder connection, but neither the connection nor bump are limited to a specific solder composition.
- the package cavity is filled with a polymeric potting compound 309 to protect the chip and interconnections against contaminants, and to add mechanical support to the package.
- FIG. 3 b provides a cut away view of the bottom surface or the package, i.e., the surface which will face and connect to a printed wiring board.
- FIG. 3 b includes a partial representation of the connectors between the package components in the cavity down BGA of the present invention.
- a unique feature of the preferred embodiment of the present invention provides that solder bumps 302 mechanically and electrically connect the flip chip integrated circuit (not shown) to the interposer circuit 303 , and further that a second set of solder bumps 308 , both electrically and mechanically connect the interposer circuit 303 to metallized conductive vias 305 a in the frame 305 .
- solder bumps 308 and connective vias 305 a are shown on one side of the frame in a cut away view.
- the conductive vias 305 a provide electrical contact between the interposer circuit and sites for external solder balls 306 .
- Solder bumps 308 between the frame and interposer circuit are in the same size range as the flip chip bumps 302 , whereas the external solder balls of a BGA are larger, and are typical of industry standards.
- Solder bumps for flip chip and interposer to frame are typically in the range of 0.04 to 0.20 millimeters in diameter, whereas external solder ball contacts on BGA packages are in the range of 0.5 to 1.25 millimeters.
- the frame is thicker than the chip, thereby providing a clearance space atop the chip when the package is attached to a printed wiring board.
- Integrated circuit chips are typically in the range of 0.25 to 0.50 millimeters and the frame thickness is in the range of 0.3 to 0.60 millimeters.
- Core materials for the frame are consistent with those typically used in the industry for integrated circuit packaging. Those with acceptable dielectric properties and with known technology for conductive vias include, but are not limited to FR- 4 , FR- 5 and BT resins. Preferred materials for the stiffener are compatible with the frame in coefficient of thermal expansion, and have high thermal conductivity, or have thermally conductive vias. Such materials include, but are not limited to copper based alloys with protective coatings, or FR- 4 , FR- 5 or BT resin with thermal vias.
- FIGS. 4 a and 4 b explain further the significant electrical routing of the cavity down BGA of this invention.
- the interposer circuit facilitates routing of signal, power and ground through the use of selective planes and buses with specific boundaries on only two conductor layers, as opposed to four or more layers required with multilayer substrates.
- the unique routing of conductors supports the need for a simpler and less costly package for an integrated circuit which requires multiple power and ground planes.
- FIG. 4 a A cross-sectional view of one embodiment of the interposer circuitry of the current invention is the shown in FIG. 4 a , and for comparison, a cross section of circuitry in a multilayer package of existing technology is shown in FIG. 5.
- contacts to the integrated circuit 500 are made on the first metal level 501 and that a ground plane 504 is disposed between dielectric layers of the BGA core 502 , and that a power plane 503 is disposed on a different level.
- Contacts to the signal 501 a , power 503 a and ground 504 a are made through a plurality of vias 505 to external solder balls 520 .
- the external solder balls are on yet another metal layer 506 .
- the levels must be carefully aligned and that sufficiently large openings in the planes be defined to avoid contact with the incorrect plane.
- the via from a ground contact 504 a comes into contact with the ground plane 504 , but cannot touch not the power plane 503 .
- the device of the current invention has only two conductive layers.
- a plurality of power and ground contacts on the integrated circuit 400 located in the center of the flip chip are connected to corresponding contact pads on the first conductive surface of the interposer.
- Ground contacts 404 a made to conductive vias 405 are surrounded by apertures 405 a in the otherwise continuous conductive metal power plane 403 .
- the vias 405 provide contact to the ground plane 404 on the second conductor surface.
- the broad area of metal corresponding to the center of the chip is one power plane 403 .
- a second set of bump contacts 402 a for a different operating voltage on the chip are interconnected by a power bus structures 402 on the interposer.
- Signal contacts 401 a located near the chip perimeter are interconnected by signal traces 401 on the interposer to respective external signal contacts 401 b , as shown in FIG. 4 b .
- contact from the ground plane to external ground solder ball contacts on the frame is made through vias 414 to small solder balls 415 on the frame 410 . From the cross-sectional view in FIG.
- FIG. 4 b a partially populated quarter section of a first metal level of the interposer circuit is shown.
- flip chip bump contacts 404 a to vias (not shown) interconnecting to the ground plane 404 in FIG. 4 a on the second level, and flip chip contacts 403 a for a large power plane 403 on the first metal level.
- the large power plane 403 is selectively routed to each of the package corners where the external contact pads 403 b are located.
- signal contacts 401 a are made to the respective traces 401 interconnecting to the respective external contact pads 401 b.
- Power buses 402 with contacts 402 a to a different on-chip power supply are also located near the chip perimeter.
- FIG. 4 c it can be seen in greater detail that staggered among the signal contacts 401 a are power contacts 402 a for the second operating power level on-chip.
- a plurality of power contacts 402 a are routed to a bus structure 402 which in turn is routed between the signal traces 401 to provide one or more second power planes 402 c and to the external contacts 402 b for planes 402 c . Openings in the metallized power plane isolate the signal interconnection traces.
- Each power plane 402 c is connected to a bus structure 402 , and each bus structure may have a plurality of contacts from the chip for a given operating voltage. Multiple power buses and power planes are possible on a single metal level. In order to provide lower inductance these power planes are preferably designed to occupy the maximum available area between signal routes, and within the routing constraints of the interposer circuit.
- a specific embodiment of the cavity down BGA of the current invention is a high pin count device, about 352 pins, having a flip chip bonded integrated circuit wherein the signal and a first set of power contacts from a 3.3 volt power supply are located near the chip perimeter. The contacts arrayed near the chip center are to ground and to a second set of power contacts from a 1.8 volt power supply.
- a plurality of flip chip solder bumps comprising lead and tin provide electrical and mechanical contact between the chip contact pads and corresponding metallized contact pads on the first surface of a interposer circuit.
- the interposer circuit of the preferred embodiment is a flexible circuit comprising a polyimide based film in the range of 0.005 to 0.015 inches thickness with a thin film of copper interconnection circuitry disposed on both surfaces.
- the metal is photopatterned to provide the circuit design, and the metal traces are plated with the appropriate metals to meet the resistivity requirements of the circuit, and for environmental stability. Vias are punched, etched, or laser drilled, and are filled with a conductive material.
- Flex circuits include some of the same technology as TAB tape technology, but the thicker flex films are sufficiently rigid and dimensionally stable to allow metallization on both sides without distortion. A high density of interconnection is achieved on both sides of film with flex circuit technology, whereas film with TAB interconnect circuitry is typically metallized on a single side.
- Circuitry in the preferred embodiment, on the first surface of the interposer includes signal routing, a plurality of contacts to power buses and two broad power planes, generically as described in the combination of FIGS. 4 b and 4 c .
- a solder mask covers the interconnect circuitry and surrounds the contact pads.
- the second surface of the interposer circuitry includes a large ground plane of copper metallization which is electrically connected to the first surface ground contacts by conductive vias.
- the second surface of the flexible interposer is attached to a stiffener by an insulating adhesive layer.
- the stiffener provides the package base and is comprised of a clad copper alloy in the range of 0.015 to 0.05 inches thickness.
- FIGS. 3 a and 3 b A generic representation of package components for the preferred embodiment is given in FIGS. 3 a and 3 b .
- a frame with conductive vias arrayed to correspond to the BGA package terminals, and to the input/output contacts of the device is attached to the first surface of the flexible circuit by a plurality of solder bumps.
- the solder bump connectors are of similar size and composition to those of the flip chip solder bumps.
- the frame is located within the perimeter of the stiffener, and serves as a cavity for the chip, as well as a support for interconnections between the solder bumps of the interposer circuit and the external solder balls of the BGA package.
- the frame is in the range of 0.020 to 0.030 inches thick and is comprised of FR- 4 material.
- An underfill material of a thixotropic thermosetting polymer surrounds the small solder bumps which connect the flip chip and the frame to the flexible circuit.
- the material absorbs thermally induced stresses on the solder joints, and seals the package edge from ingress of external contamination between the frame and interposer circuit.
- the package cavity is filled with a potting compound, such as a thermosetting epoxy filled with a silica to control the expansion coefficient to about 20 PPM.
- a potting compound such as a thermosetting epoxy filled with a silica to control the expansion coefficient to about 20 PPM.
- FIG. 6 provides a simple process flow diagram for assembly of a flip chip integrated circuit in a cavity down package of the current invention.
- step 1 the second surface of a flexible interposer 603 having two patterned conductive layers with protective solder masks is aligned to one surface of a stiffener 604 or package base, and is adhered by a thin film of thermosetting insulating adhesive 605 .
- the adhesive is cured by heat treatment to form a stable, single component.
- step 2 an array of preformed solder balls 606 is aligned to the perimeter contact pads on the interposer circuit. Heat is applied to the interposer and the temperature is raised sufficiently to initiate reflow of solder balls and hold the solder firmly in place, about 190 degrees centigrade for a few seconds. The heat may be applied by an optical source or by a convection method.
- An integrated circuit 600 with attached solder bump contacts is aligned to and brought into contact with contact pads in the central portion of the interposer in step 3. Heat is supplied by either an optical system, or a convection system to reflow the solder bumps of both the chip and the perimeter bumps.
- a frame 602 is positioned with the outer edge vertically aligned to the stiffener and fine alignment made to bring the solder bumps into contact with vias in the frame. Heat is applied to reflow the solder bumps a second time and secure the frame to the interposer and stiffener assembly.
- An underfill polymeric compound 607 is applied at the chip perimeter and the frame perimeter at the fifth process step.
- the compound is allowed to flow into the spaces between all bumps and provide a seal between the frame and stiffener.
- the compound is thermally cured at about 125 degrees centigrade for 5 to 15 minutes to form a mechanically and chemically stable polymer.
- thermosetting potting compound 608 is applied to fill the package cavity and the polymer is fully cured during the same thermal cycle, which also serves as the final cure of the underfill compound. Convection curing at 150 degrees centigrade for 30 minutes completes the curing process.
- External solder balls 609 are aligned to the exposed contacts on the frame, heat is applied to reflow the balls and complete assembly of the integrated circuit package.
- FIG. 7 it can be seen that an interposer circuit 703 having routing generally as shown in FIGS. 4 b and 4 c with multiple power planes on the first metal layer 703 a and a ground plane on the second metal layer 703 b is inserted into a cavity up BGA package 700 .
- the BGA package 700 includes a stiffener or base 704 with conductive vias 704 c between the external BGA solder ball terminals 705 and contact pads on the upward facing surface 704 a . Connection between the base vias 704 c and the interposer vias 703 c is provided by a plurality of solder bumps 708 on the second surface of the interposer circuit 703 b .
- the ground plane covers the center portion of the second surface of the interposer circuit, and apertures are provided for vias for signal and power contacts near the perimeter.
- Housing for the package is completed by encapsulation in a polymer or by a protective cap 709 attached to the base.
- Routing of complex circuitry on an interposer having only two conductive surfaces allows multiple packaging options.
- a low cost, standardized package base and cap is adaptable to specific circuits customized on the interposer.
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Geometry (AREA)
- Wire Bonding (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
- This invention is related to an integrated circuit device and more particularly to electrical interconnections in a ball grid array package.
- As the semiconductor industry moves toward higher circuit density, the number of input/output pins and the operating speed of the devices is increasing dramatically, as well as the number of circuits with more than one operating voltage. In order to minimize the complexity and the area of circuit boards required for these high pin count, multiple power supply devices, the integrated circuit packages are constructed with multilayer power and ground planes which can reduce pin count by providing common contacts for several inputs and outputs, and can allow improved electrical and thermal performance of the device.
- In response to the demand for IC packages of higher lead count and smaller foot print, Ball Grid Array (BGA) packages continue to be developed. A BGA package is a surface mount package which is assembled to an external circuit board using an array of solder balls confined within the area of the package. An example of a BGA package is given in FIG. 1. Typically the
BGA package 100 is in a “cavity up” configuration, indicating that thesemiconductor chip 101 is attached to thetop surface 103 a (i.e., upward facing surface) of thesubstrate 103, and thatsolder balls 105 which interconnect the package to a printed wiring board are attached to theback side 103 b (i.e., downward facing surface) of the substrate. The chip is electrically interconnected to traces on the substrate by wire bonding or by flipchip bump connections 107, as shown in FIG. 1. Alid 108 or other form of encapsulation covers the chip and provides mechanical and environmental protection. - Substrates of high performance and high pin count BGAs have multiple layers of metal traces separated by dielectric layers and connected through vias to provide power and ground planes, and these structures will be discussed in more detail later. Typically, a separate conductor and dielectric layer is required for each input/output function, such as a contact layer with routing for signal, power and ground, a ground plane, a power plane for each operating voltage, and a layer for the external contacts. Limitations of prior art BGA packages are low thermal dissipation, electrical performance limited by the number of conductor layers, and associated costs of substrates with multiple metal and dielectric layers, and package reliability and susceptibility to moisture.
- The electrical performance and thermal dissipation of a BGA package can be significantly enhanced by a “cavity down” BGA package. A “cavity down” BGA package typically has a die cavity in a multilayer printed circuit board (PCB) substrate. The multilayer substrate allows lower parasitic impedance, and inclusion of a metal slug at the bottom of the cavity increases thermal dissipation of the package. A chip cavity or recess in the package is required to allow sufficient clearance for the chip and its interconnecting wire bonds when the package has been assembled onto a printed wiring board.
- A “cavity down” BGA package can also be fabricated using a substrate with multilayer PCB technology. Both “cavity up” and “cavity down” BGA packages using such substrates suffer from high cost, and as the pin count increases, the limitations of PCB printing technology force larger package sizes with increased inductance resulting from the longer conductor length.
- In an attempt to provide a substrate with higher circuit density and to allow assembly of high pin count devices, a TGA (TAB Grid Array)
package 200 was disclosed and a cross section is shown in FIG. 2. The TGA uses a TAB (Tape automated bond)flexible tape 202 with fine line interconnections for inner lead bonding of the tape conductors to bumps on the chip. Theflexible tape 202 has adielectric layer solder balls 211 on the package. The tape is attached by an adhesive 208 to astiffener 206 with a cavity for housing thesemiconductor chip 201. The chip is protected by anencapsulating material 204.Solder balls 211 for external connection are attached to the interconnection traces, and in selectedlocations 213 to the stiffener which acts like a ground plane. While this approach has merits, it is based on TAB or wire bonding of the die, both of which are limited to perimeter bonded integrated circuit chips, and may not be acceptable for very high pin count devices. In addition, TAB bonding has not proved to be an industry accepted, production worthy process, largely because of high costs. Wire bonding adds inductance to the circuit and becomes a limiting feature for very high performance and high pin count devices. - More advanced integrated circuits are being designed with flip chip interconnections. These circuits often require reliable, high performance BGA packages to support the emerging trends of flip chip interconnection and of chips having multiple operating voltages.
- In accordance with the preferred embodiment of the present invention, a cavity down BGA package is provided comprising a flip chip interconnected integrated circuit, a stiffener or package base, an interposer circuit having two conductive metal layers separated by a dielectric layer, and a frame which serves the dual purposes of providing electrical interconnection between the interposer circuit and the external solder ball terminals, and a cavity for housing the integrated circuit chip.
- Routing for signal, power and ground contacts, including one or more power and ground planes are provided on the interposer circuit. Metallization on the first surface of the interposer circuit provides routing from the flip chip terminals of the integrated circuit to power planes and /or bus structures, to external bump contacts, and through vias to the ground plane on the second metal layer. Through the use of specific boundaries multiple power buses and planes on the same metal layer are achieved, thus supporting a need for packaging an integrated circuit with multiple operating voltages.
- Contact pads with solder bumps on the first surface of the interposer circuit correspond to metallized vias in the frame. The solder bumps provide both mechanical and electrical contact between the interposer circuitry and the external solder ball contacts. The second surface of interposer circuit is adhered to the stiffener. Integrity of the small bumps which provide contact between the interposer and stiffener base and the frame, as well as the flip chip bumps on the integrated circuit is enhanced by underfill materials designed to absorb thermal and mechanical stresses between dissimilar materials of the package. External solder ball terminals are connected to the frame and contact the flex circuit through vias in the frame. The cavity of the package is filled with a polymeric compound for environmental and mechanical protection.
- In an alternate embodiment, an interposer circuit having electrical routing for signal, power and ground contacts accomplished on two conductor layers through selective planes and buses with specific boundaries is assembled in a cavity up BGA configuration.
- FIG. 1 is a cross sectional view of a cavity up BGA (ball grid array) package. Prior Art
- FIG. 2 is a cross-sectional view of a TAB Grid Array package (TGA). Prior Art
- FIG. 3a is a cross-sectional view of a flip chip Cavity down BGA of the present invention.
- FIG. 3b is cut away bottom view of the flip chip Cavity Down BGA of the present invention.
- FIG. 4a is a detailed cross-sectional view of an interposer circuit.
- FIG. 4b shows signal, power, and ground contacts and routing, and one power plane on the one surface of the interposer.
- FIG. 4c shows signal, power, and ground contacts and routing and a second power plane on one surface of the interposer.
- FIG. 5 is a cross-sectional view of a multilayer BGA package. (Prior art)
- FIG. 6 outlines the process flow for assembly of a cavity down flip chip BGA package.
- FIG. 7 is a cross sectional view of a cavity up BGA with an interposer circuit having two conductor surfaces.
- A preferred embodiment of the present invention, a cavity down
BGA package 300, is shown in a cross-sectional view in FIG. 3a. Anintegrated circuit chip 301 withflip chip contacts 302, such as solder bumps arrayed on the active surface of thechip 301 a, is electrically connected to metallized contact pads on thefirst surface 303 a of aninterposer circuit 303. Thesecond surface 303 b of theinterposer circuit 303 is adhered by an insulatingadhesive 314 to aplanar stiffener 304 which is the base of the package. An interposer circuit includes a core dielectric material which may be a supported BT or FR-4 resin type polymer, an unsupported polyimide or alternate high temperature polymer, or a ceramic. Electrical conductors are disposed on both major surfaces of the dielectric core, and conductive vias provides interconnection between the surfaces. - The package outline is defined by the stiffener which provides both mechanical support to the device, and a large thermal dissipation path to the ambient, or to an attached heat sink. A
frame 305, attached bysolder bumps 308 to theinterposer circuit 303 on the stiffener, forms the package cavity, and provides support for externalBGA solder ball 306 contacts. An “underfill”material 307, typically a polymer loaded with electrically insulating particles provides mechanical support to the small solder bumps 302 of the flip chip connections, and to thesolder bump connections 308 between the interposer circuit and the frame. The term solder bump is intended to refer to a connector of any shape, such as a sphere, column, or hour glass shaped connector, attached by a solder connection, but neither the connection nor bump are limited to a specific solder composition. The package cavity is filled with apolymeric potting compound 309 to protect the chip and interconnections against contaminants, and to add mechanical support to the package. - FIG. 3b provides a cut away view of the bottom surface or the package, i.e., the surface which will face and connect to a printed wiring board. FIG. 3b includes a partial representation of the connectors between the package components in the cavity down BGA of the present invention. A unique feature of the preferred embodiment of the present invention provides that solder bumps 302 mechanically and electrically connect the flip chip integrated circuit (not shown) to the
interposer circuit 303, and further that a second set of solder bumps 308, both electrically and mechanically connect theinterposer circuit 303 to metallizedconductive vias 305 a in theframe 305. The solder bumps 308 andconnective vias 305 a are shown on one side of the frame in a cut away view. Theconductive vias 305 a, in turn, provide electrical contact between the interposer circuit and sites forexternal solder balls 306. Solder bumps 308 between the frame and interposer circuit are in the same size range as the flip chip bumps 302, whereas the external solder balls of a BGA are larger, and are typical of industry standards. Solder bumps for flip chip and interposer to frame are typically in the range of 0.04 to 0.20 millimeters in diameter, whereas external solder ball contacts on BGA packages are in the range of 0.5 to 1.25 millimeters. - The
frame 305 attached to the stiffener and interposer, creates a cavity for the integrated circuit chip. The frame is thicker than the chip, thereby providing a clearance space atop the chip when the package is attached to a printed wiring board. Integrated circuit chips are typically in the range of 0.25 to 0.50 millimeters and the frame thickness is in the range of 0.3 to 0.60 millimeters. - Core materials for the frame are consistent with those typically used in the industry for integrated circuit packaging. Those with acceptable dielectric properties and with known technology for conductive vias include, but are not limited to FR-4, FR-5 and BT resins. Preferred materials for the stiffener are compatible with the frame in coefficient of thermal expansion, and have high thermal conductivity, or have thermally conductive vias. Such materials include, but are not limited to copper based alloys with protective coatings, or FR-4, FR-5 or BT resin with thermal vias.
- FIGS. 4a and 4 b explain further the significant electrical routing of the cavity down BGA of this invention. The interposer circuit facilitates routing of signal, power and ground through the use of selective planes and buses with specific boundaries on only two conductor layers, as opposed to four or more layers required with multilayer substrates. The unique routing of conductors supports the need for a simpler and less costly package for an integrated circuit which requires multiple power and ground planes.
- A cross-sectional view of one embodiment of the interposer circuitry of the current invention is the shown in FIG. 4a, and for comparison, a cross section of circuitry in a multilayer package of existing technology is shown in FIG. 5. In FIG. 5, it can be seen that contacts to the
integrated circuit 500 are made on thefirst metal level 501 and that aground plane 504 is disposed between dielectric layers of theBGA core 502, and that apower plane 503 is disposed on a different level. Contacts to thesignal 501 a,power 503 a andground 504 a are made through a plurality ofvias 505 toexternal solder balls 520. The external solder balls are on yet anothermetal layer 506. It should be noted that the levels must be carefully aligned and that sufficiently large openings in the planes be defined to avoid contact with the incorrect plane. For example, the via from aground contact 504 a comes into contact with theground plane 504, but cannot touch not thepower plane 503. - By contrast, the device of the current invention, as shown in FIG. 4a, has only two conductive layers. A plurality of power and ground contacts on the
integrated circuit 400, located in the center of the flip chip are connected to corresponding contact pads on the first conductive surface of the interposer.Ground contacts 404 a made to conductive vias 405 are surrounded byapertures 405 a in the otherwise continuous conductivemetal power plane 403. The vias 405 provide contact to theground plane 404 on the second conductor surface. The broad area of metal corresponding to the center of the chip is onepower plane 403. - Nearer to the chip perimeter a second set of
bump contacts 402 a for a different operating voltage on the chip, are interconnected by apower bus structures 402 on the interposer.Signal contacts 401 a located near the chip perimeter are interconnected by signal traces 401 on the interposer to respectiveexternal signal contacts 401 b, as shown in FIG. 4b. Returning to FIG. 4a, contact from the ground plane to external ground solder ball contacts on the frame is made throughvias 414 tosmall solder balls 415 on theframe 410. From the cross-sectional view in FIG. 4a, it can be seen that multiple power planes, chip contacts to signal, power and ground and contact pads to the external connectors are made on a single selectively patterned level of metal, and that the second level of metal is aground plane 404. The two levels of metal are separated and electrically isolated by acore dielectric layer 420. - In FIG. 4b, a partially populated quarter section of a first metal level of the interposer circuit is shown. In the central area of the interposer are flip
chip bump contacts 404 a to vias (not shown) interconnecting to theground plane 404 in FIG. 4a on the second level, andflip chip contacts 403 a for alarge power plane 403 on the first metal level. Thelarge power plane 403 is selectively routed to each of the package corners where theexternal contact pads 403 b are located. - Near the location corresponding to the
chip 400 perimeter, signalcontacts 401 a are made to therespective traces 401 interconnecting to the respectiveexternal contact pads 401 b. -
Power buses 402 withcontacts 402 a to a different on-chip power supply are also located near the chip perimeter. In FIG. 4c, it can be seen in greater detail that staggered among thesignal contacts 401 a arepower contacts 402 a for the second operating power level on-chip. A plurality ofpower contacts 402 a are routed to abus structure 402 which in turn is routed between the signal traces 401 to provide one or more second power planes 402 c and to theexternal contacts 402 b forplanes 402 c. Openings in the metallized power plane isolate the signal interconnection traces. Eachpower plane 402 c is connected to abus structure 402, and each bus structure may have a plurality of contacts from the chip for a given operating voltage. Multiple power buses and power planes are possible on a single metal level. In order to provide lower inductance these power planes are preferably designed to occupy the maximum available area between signal routes, and within the routing constraints of the interposer circuit. - External contact from signal, power and ground is made through vias in the
frame 410 to external solder balls. - By the use of selective areas for power planes and by busing a plurality of power contacts, it is possible to provide multiple power planes on the same metal level, and thereby support the need of an integrated circuit with different operating voltages for separate power planes. A unique contact system of solder bumps to the frame, and subsequently to external contacts is also provided on the first conductor layer. A need for vias in the interposer circuit is eliminated, except those to the ground plane. A large ground plane in close proximity to the power and signal circuitry is provided on the second metal layer of the interposer circuit. Further, it is possible to eliminate the second level of metal and make use of a conductive stiffener or layer on the stiffener for a broad ground plane.
- A specific embodiment of the cavity down BGA of the current invention is a high pin count device, about352 pins, having a flip chip bonded integrated circuit wherein the signal and a first set of power contacts from a 3.3 volt power supply are located near the chip perimeter. The contacts arrayed near the chip center are to ground and to a second set of power contacts from a 1.8 volt power supply. A plurality of flip chip solder bumps comprising lead and tin provide electrical and mechanical contact between the chip contact pads and corresponding metallized contact pads on the first surface of a interposer circuit.
- The interposer circuit of the preferred embodiment is a flexible circuit comprising a polyimide based film in the range of 0.005 to 0.015 inches thickness with a thin film of copper interconnection circuitry disposed on both surfaces. The metal is photopatterned to provide the circuit design, and the metal traces are plated with the appropriate metals to meet the resistivity requirements of the circuit, and for environmental stability. Vias are punched, etched, or laser drilled, and are filled with a conductive material. Flex circuits include some of the same technology as TAB tape technology, but the thicker flex films are sufficiently rigid and dimensionally stable to allow metallization on both sides without distortion. A high density of interconnection is achieved on both sides of film with flex circuit technology, whereas film with TAB interconnect circuitry is typically metallized on a single side.
- Circuitry, in the preferred embodiment, on the first surface of the interposer includes signal routing, a plurality of contacts to power buses and two broad power planes, generically as described in the combination of FIGS. 4b and 4 c. A solder mask covers the interconnect circuitry and surrounds the contact pads.
- The second surface of the interposer circuitry includes a large ground plane of copper metallization which is electrically connected to the first surface ground contacts by conductive vias. The second surface of the flexible interposer is attached to a stiffener by an insulating adhesive layer. The stiffener provides the package base and is comprised of a clad copper alloy in the range of 0.015 to 0.05 inches thickness.
- A generic representation of package components for the preferred embodiment is given in FIGS. 3a and 3 b.
- A frame with conductive vias arrayed to correspond to the BGA package terminals, and to the input/output contacts of the device is attached to the first surface of the flexible circuit by a plurality of solder bumps. The solder bump connectors are of similar size and composition to those of the flip chip solder bumps. The frame is located within the perimeter of the stiffener, and serves as a cavity for the chip, as well as a support for interconnections between the solder bumps of the interposer circuit and the external solder balls of the BGA package. The frame is in the range of 0.020 to 0.030 inches thick and is comprised of FR-4 material.
- An underfill material of a thixotropic thermosetting polymer surrounds the small solder bumps which connect the flip chip and the frame to the flexible circuit. The material absorbs thermally induced stresses on the solder joints, and seals the package edge from ingress of external contamination between the frame and interposer circuit.
- The package cavity is filled with a potting compound, such as a thermosetting epoxy filled with a silica to control the expansion coefficient to about 20 PPM.
- Assembly of the specific package of the preferred embodiment as described above includes the following series of steps, most of which are known in the industry. FIG. 6 provides a simple process flow diagram for assembly of a flip chip integrated circuit in a cavity down package of the current invention.
- In
step 1, the second surface of aflexible interposer 603 having two patterned conductive layers with protective solder masks is aligned to one surface of astiffener 604 or package base, and is adhered by a thin film of thermosetting insulatingadhesive 605. The adhesive is cured by heat treatment to form a stable, single component. - In
step 2, an array of preformedsolder balls 606 is aligned to the perimeter contact pads on the interposer circuit. Heat is applied to the interposer and the temperature is raised sufficiently to initiate reflow of solder balls and hold the solder firmly in place, about 190 degrees centigrade for a few seconds. The heat may be applied by an optical source or by a convection method. - An
integrated circuit 600 with attached solder bump contacts is aligned to and brought into contact with contact pads in the central portion of the interposer instep 3. Heat is supplied by either an optical system, or a convection system to reflow the solder bumps of both the chip and the perimeter bumps. - At
step 4, aframe 602 is positioned with the outer edge vertically aligned to the stiffener and fine alignment made to bring the solder bumps into contact with vias in the frame. Heat is applied to reflow the solder bumps a second time and secure the frame to the interposer and stiffener assembly. - An
underfill polymeric compound 607 is applied at the chip perimeter and the frame perimeter at the fifth process step. The compound is allowed to flow into the spaces between all bumps and provide a seal between the frame and stiffener. The compound is thermally cured at about 125 degrees centigrade for 5 to 15 minutes to form a mechanically and chemically stable polymer. - A
thermosetting potting compound 608 is applied to fill the package cavity and the polymer is fully cured during the same thermal cycle, which also serves as the final cure of the underfill compound. Convection curing at 150 degrees centigrade for 30 minutes completes the curing process. -
External solder balls 609 are aligned to the exposed contacts on the frame, heat is applied to reflow the balls and complete assembly of the integrated circuit package. - In FIG. 7, a second embodiment of the current invention is demonstrated. A flip chip integrated
circuit 701 on aninterposer circuit 703 having electrical routing for signal, power, and ground contacts, and multiple power planes, is accomplished on two conductor layers through selective planes and buses with specific boundaries, and is packaged in a cavity upBGA 700 configuration. - In FIG. 7 it can be seen that an
interposer circuit 703 having routing generally as shown in FIGS. 4b and 4 c with multiple power planes on thefirst metal layer 703 a and a ground plane on thesecond metal layer 703 b is inserted into a cavity upBGA package 700. TheBGA package 700 includes a stiffener orbase 704 withconductive vias 704 c between the external BGAsolder ball terminals 705 and contact pads on the upward facingsurface 704 a. Connection between the base vias 704 c and theinterposer vias 703 c is provided by a plurality of solder bumps 708 on the second surface of theinterposer circuit 703 b. The ground plane covers the center portion of the second surface of the interposer circuit, and apertures are provided for vias for signal and power contacts near the perimeter. Housing for the package is completed by encapsulation in a polymer or by aprotective cap 709 attached to the base. - Routing of complex circuitry on an interposer having only two conductive surfaces allows multiple packaging options. A low cost, standardized package base and cap is adaptable to specific circuits customized on the interposer.
- The detailed descriptions above are provided to illustrate specific embodiments of the present invention, and are not intended to be limiting of the present invention. Numerous modifications and variations within the scope of the present invention are possible. The present invention is defined by the following claims.
Claims (20)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/469,476 US6396136B2 (en) | 1998-12-31 | 1999-12-22 | Ball grid package with multiple power/ground planes |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11431498P | 1998-12-31 | 1998-12-31 | |
US09/469,476 US6396136B2 (en) | 1998-12-31 | 1999-12-22 | Ball grid package with multiple power/ground planes |
Publications (2)
Publication Number | Publication Date |
---|---|
US20010013654A1 true US20010013654A1 (en) | 2001-08-16 |
US6396136B2 US6396136B2 (en) | 2002-05-28 |
Family
ID=22354490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/469,476 Expired - Lifetime US6396136B2 (en) | 1998-12-31 | 1999-12-22 | Ball grid package with multiple power/ground planes |
Country Status (3)
Country | Link |
---|---|
US (1) | US6396136B2 (en) |
JP (1) | JP2000200860A (en) |
KR (1) | KR100694739B1 (en) |
Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020158335A1 (en) * | 2001-04-30 | 2002-10-31 | Intel Corporation | High performance, low cost microelectronic circuit package with interposer |
US20020173133A1 (en) * | 2001-05-21 | 2002-11-21 | Intel Corporation | Method for packaging a microelectronic device using on-die bond pad expansion |
US6645791B2 (en) * | 2001-04-23 | 2003-11-11 | Fairchild Semiconductor | Semiconductor die package including carrier with mask |
WO2003021674A3 (en) * | 2001-09-05 | 2004-04-15 | Intel Corp | Microelectronic circuit package having die fixed within a package core |
US6770964B2 (en) * | 2000-09-29 | 2004-08-03 | Kabushiki Kaisha Toshiba | Semiconductor device including intermediate wiring element |
US20040211583A1 (en) * | 2003-04-23 | 2004-10-28 | Masaru Kosaka | Surface-mount-type high-frequency module |
US6894399B2 (en) | 2001-04-30 | 2005-05-17 | Intel Corporation | Microelectronic device having signal distribution functionality on an interfacial layer thereof |
US7105923B2 (en) * | 2001-12-28 | 2006-09-12 | Texas Instruments Incorporated | Device and method for including passive components in a chip scale package |
US20070023910A1 (en) * | 2005-07-29 | 2007-02-01 | Texas Instruments Incorporated | Dual BGA alloy structure for improved board-level reliability performance |
US20070254117A1 (en) * | 2006-05-01 | 2007-11-01 | Bhret Graydon | Conductive Stiffener for a Flexible Substrate |
EP1577945A3 (en) * | 2004-02-04 | 2007-11-28 | International Business Machines Corporation | Module power distribution network |
US20090027366A1 (en) * | 2007-07-24 | 2009-01-29 | Samsung Electronics Co., Ltd. | Driving chip, driving chip package having the same, display apparatus having the driving chip, and method thereof |
US20090283901A1 (en) * | 2006-08-28 | 2009-11-19 | National University Corporation Tohoku University | Semiconductor device and multilayer wiring board |
US20100078207A1 (en) * | 2008-09-30 | 2010-04-01 | Chang Li-Tien | Universal bump array structure |
US20110182042A1 (en) * | 2007-07-05 | 2011-07-28 | Occam Portfolio Llc | Electronic Assemblies without Solder and Methods for their Manufacture |
US20110232946A1 (en) * | 2008-10-18 | 2011-09-29 | Andreas Voegerl | Flexible Printed Board |
US20150181739A1 (en) * | 2012-08-03 | 2015-06-25 | Panasonic Corporation | Electronic component module and an assembly including the same |
US20150380337A1 (en) * | 2011-09-02 | 2015-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thermally Enhanced Structure for Multi-Chip Device |
US20180053753A1 (en) * | 2016-08-16 | 2018-02-22 | Freescale Semiconductor, Inc. | Stackable molded packages and methods of manufacture thereof |
US10026723B2 (en) * | 2016-01-04 | 2018-07-17 | Infinera Corporation | Photonic integrated circuit package |
US20190208620A1 (en) * | 2016-09-30 | 2019-07-04 | Intel Corporation | 3d high-inductive ground plane for crosstalk reduction |
US10446530B2 (en) | 2011-08-16 | 2019-10-15 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US11049791B1 (en) * | 2019-12-26 | 2021-06-29 | Intel Corporation | Heat spreading layer integrated within a composite IC die structure and methods of forming the same |
US11227841B2 (en) * | 2018-06-28 | 2022-01-18 | Intel Corporation | Stiffener build-up layer package |
CN114496958A (en) * | 2022-01-25 | 2022-05-13 | 西安微电子技术研究所 | Multi-chip multi-component laminated structure based on silicon substrate flip-chip welding |
US20240133947A1 (en) * | 2011-04-26 | 2024-04-25 | Texas Instruments Incorporated | Interposer instrumentation method and apparatus |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6794743B1 (en) * | 1999-08-06 | 2004-09-21 | Texas Instruments Incorporated | Structure and method of high performance two layer ball grid array substrate |
US6756253B1 (en) * | 1999-08-27 | 2004-06-29 | Micron Technology, Inc. | Method for fabricating a semiconductor component with external contact polymer support layer |
US6570250B1 (en) * | 2000-02-24 | 2003-05-27 | Honeywell International Inc. | Power conditioning substrate stiffener |
US6740962B1 (en) * | 2000-02-24 | 2004-05-25 | Micron Technology, Inc. | Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
US20020020898A1 (en) * | 2000-08-16 | 2002-02-21 | Vu Quat T. | Microelectronic substrates with integrated devices |
US6709898B1 (en) * | 2000-10-04 | 2004-03-23 | Intel Corporation | Die-in-heat spreader microelectronic package |
US20020070443A1 (en) * | 2000-12-08 | 2002-06-13 | Xiao-Chun Mu | Microelectronic package having an integrated heat sink and build-up layers |
JP4883843B2 (en) * | 2000-12-15 | 2012-02-22 | イビデン株式会社 | Printed wiring board |
US6790710B2 (en) * | 2002-01-31 | 2004-09-14 | Asat Limited | Method of manufacturing an integrated circuit package |
JP4387076B2 (en) * | 2001-10-18 | 2009-12-16 | 株式会社ルネサステクノロジ | Semiconductor device |
US6979896B2 (en) * | 2001-10-30 | 2005-12-27 | Intel Corporation | Power gridding scheme |
US7042084B2 (en) * | 2002-01-02 | 2006-05-09 | Intel Corporation | Semiconductor package with integrated heat spreader attached to a thermally conductive substrate core |
JP2003204015A (en) * | 2002-01-10 | 2003-07-18 | Oki Electric Ind Co Ltd | Semiconductor device, method for manufacturing the same and method for manufacturing interposer substrate |
US6787899B2 (en) * | 2002-03-12 | 2004-09-07 | Intel Corporation | Electronic assemblies with solidified thixotropic thermal interface material |
KR100473336B1 (en) * | 2002-05-06 | 2005-03-08 | 앰코 테크놀로지 코리아 주식회사 | semiconductor package |
KR100861508B1 (en) * | 2002-06-07 | 2008-10-02 | 삼성테크윈 주식회사 | Semiconductor package and manufacturing method |
US7199459B2 (en) * | 2003-01-22 | 2007-04-03 | Siliconware Precision Industries Co., Ltd. | Semiconductor package without bonding wires and fabrication method thereof |
TWI241700B (en) * | 2003-01-22 | 2005-10-11 | Siliconware Precision Industries Co Ltd | Packaging assembly with integrated circuits redistribution routing semiconductor die and method for fabrication |
US7208825B2 (en) * | 2003-01-22 | 2007-04-24 | Siliconware Precision Industries Co., Ltd. | Stacked semiconductor packages |
US7268425B2 (en) * | 2003-03-05 | 2007-09-11 | Intel Corporation | Thermally enhanced electronic flip-chip packaging with external-connector-side die and method |
US7126210B2 (en) * | 2003-04-02 | 2006-10-24 | Stmicroelectronics, Inc. | System and method for venting pressure from an integrated circuit package sealed with a lid |
US7303941B1 (en) | 2004-03-12 | 2007-12-04 | Cisco Technology, Inc. | Methods and apparatus for providing a power signal to an area array package |
TWI370843B (en) * | 2004-03-16 | 2012-08-21 | Samsung Corning Prec Mat Co | Ceria slurry for polishing semiconductor thin layer |
US7185799B2 (en) * | 2004-03-29 | 2007-03-06 | Intel Corporation | Method of creating solder bar connections on electronic packages |
US7501341B1 (en) | 2005-05-05 | 2009-03-10 | Xilinx, Inc. | Interconnect array formed at least in part with repeated application of an interconnect pattern |
US7389951B2 (en) * | 2005-10-01 | 2008-06-24 | Viktor Feldman | Misting device |
US8395903B1 (en) | 2006-02-10 | 2013-03-12 | Xilinx, Inc. | Interconnect pattern for semiconductor packaging |
US20070231951A1 (en) * | 2006-03-29 | 2007-10-04 | Mahadevan Suryakumar | Reducing layer count in semiconductor packages |
US8031484B2 (en) * | 2006-06-16 | 2011-10-04 | Hong Kong Applied Science And Technology Research Institute Co., Ltd. | IC packages with internal heat dissipation structures |
US7911040B2 (en) * | 2007-12-27 | 2011-03-22 | Stats Chippac Ltd. | Integrated circuit package with improved connections |
US7910838B2 (en) * | 2008-04-03 | 2011-03-22 | Advanced Interconnections Corp. | Solder ball interface |
US8001434B1 (en) | 2008-04-14 | 2011-08-16 | Netlist, Inc. | Memory board with self-testing capability |
US8198724B1 (en) * | 2008-05-29 | 2012-06-12 | Xilinx, Inc. | Integrated circuit device having a multi-layer substrate and a method of enabling signals to be routed in a multi-layer substrate |
CN201781690U (en) * | 2010-07-21 | 2011-03-30 | 国基电子(上海)有限公司 | Circuit board |
US20130308274A1 (en) * | 2012-05-21 | 2013-11-21 | Triquint Semiconductor, Inc. | Thermal spreader having graduated thermal expansion parameters |
US9754870B2 (en) * | 2013-07-10 | 2017-09-05 | Kinsus Interconnect Technology Corp. | Compound carrier board structure of flip-chip chip-scale package and manufacturing method thereof |
US9406641B2 (en) * | 2013-07-10 | 2016-08-02 | Kinsus Interconnect Technology Corp. | Compound carrier board structure of flip-chip chip-scale package and manufacturing method thereof |
US12094811B2 (en) * | 2016-04-29 | 2024-09-17 | Kulicke And Soffa Industries, Inc. | Connecting electronic components to substrates |
US11164804B2 (en) | 2019-07-23 | 2021-11-02 | International Business Machines Corporation | Integrated circuit (IC) device package lid attach utilizing nano particle metallic paste |
US11158567B2 (en) | 2019-08-09 | 2021-10-26 | Texas Instruments Incorporated | Package with stacked power stage and integrated control die |
US11715679B2 (en) | 2019-10-09 | 2023-08-01 | Texas Instruments Incorporated | Power stage package including flexible circuit and stacked die |
US11302615B2 (en) | 2019-12-30 | 2022-04-12 | Texas Instruments Incorporated | Semiconductor package with isolated heat spreader |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07169872A (en) * | 1993-12-13 | 1995-07-04 | Fujitsu Ltd | Semiconductor device and manufacturing method thereof |
US5530288A (en) * | 1994-10-12 | 1996-06-25 | International Business Machines Corporation | Passive interposer including at least one passive electronic component |
JP3400877B2 (en) * | 1994-12-14 | 2003-04-28 | 三菱電機株式会社 | Semiconductor device and manufacturing method thereof |
US5616958A (en) * | 1995-01-25 | 1997-04-01 | International Business Machines Corporation | Electronic package |
US5801440A (en) * | 1995-10-10 | 1998-09-01 | Acc Microelectronics Corporation | Chip package board having utility rings |
JP3624512B2 (en) * | 1996-01-12 | 2005-03-02 | イビデン株式会社 | Manufacturing method of electronic component mounting board |
SG60099A1 (en) * | 1996-08-16 | 1999-02-22 | Sony Corp | Semiconductor package and manufacturing method of lead frame |
JPH10256429A (en) * | 1997-03-07 | 1998-09-25 | Toshiba Corp | Semiconductor package |
US5835355A (en) * | 1997-09-22 | 1998-11-10 | Lsi Logic Corporation | Tape ball grid array package with perforated metal stiffener |
JP3063846B2 (en) * | 1998-04-28 | 2000-07-12 | 日本電気株式会社 | Semiconductor device |
US6175158B1 (en) * | 1998-09-08 | 2001-01-16 | Lucent Technologies Inc. | Interposer for recessed flip-chip package |
-
1999
- 1999-12-22 US US09/469,476 patent/US6396136B2/en not_active Expired - Lifetime
- 1999-12-28 JP JP11375442A patent/JP2000200860A/en active Pending
- 1999-12-30 KR KR1019990065649A patent/KR100694739B1/en not_active Expired - Lifetime
Cited By (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6770964B2 (en) * | 2000-09-29 | 2004-08-03 | Kabushiki Kaisha Toshiba | Semiconductor device including intermediate wiring element |
US6645791B2 (en) * | 2001-04-23 | 2003-11-11 | Fairchild Semiconductor | Semiconductor die package including carrier with mask |
US7157799B2 (en) | 2001-04-23 | 2007-01-02 | Fairchild Semiconductor Corporation | Semiconductor die package including carrier with mask and semiconductor die |
US6888240B2 (en) | 2001-04-30 | 2005-05-03 | Intel Corporation | High performance, low cost microelectronic circuit package with interposer |
US20020158335A1 (en) * | 2001-04-30 | 2002-10-31 | Intel Corporation | High performance, low cost microelectronic circuit package with interposer |
US6894399B2 (en) | 2001-04-30 | 2005-05-17 | Intel Corporation | Microelectronic device having signal distribution functionality on an interfacial layer thereof |
US7071024B2 (en) | 2001-05-21 | 2006-07-04 | Intel Corporation | Method for packaging a microelectronic device using on-die bond pad expansion |
US20020173133A1 (en) * | 2001-05-21 | 2002-11-21 | Intel Corporation | Method for packaging a microelectronic device using on-die bond pad expansion |
WO2003021674A3 (en) * | 2001-09-05 | 2004-04-15 | Intel Corp | Microelectronic circuit package having die fixed within a package core |
US7183658B2 (en) | 2001-09-05 | 2007-02-27 | Intel Corporation | Low cost microelectronic circuit package |
US7105923B2 (en) * | 2001-12-28 | 2006-09-12 | Texas Instruments Incorporated | Device and method for including passive components in a chip scale package |
US20040211583A1 (en) * | 2003-04-23 | 2004-10-28 | Masaru Kosaka | Surface-mount-type high-frequency module |
EP1577945A3 (en) * | 2004-02-04 | 2007-11-28 | International Business Machines Corporation | Module power distribution network |
US20070023910A1 (en) * | 2005-07-29 | 2007-02-01 | Texas Instruments Incorporated | Dual BGA alloy structure for improved board-level reliability performance |
US20070254117A1 (en) * | 2006-05-01 | 2007-11-01 | Bhret Graydon | Conductive Stiffener for a Flexible Substrate |
US7649254B2 (en) * | 2006-05-01 | 2010-01-19 | Flextronics Ap, Llc | Conductive stiffener for a flexible substrate |
US7977796B2 (en) * | 2006-08-28 | 2011-07-12 | National University Corporation Tohoku University | Semiconductor device and multilayer wiring board |
US20090283901A1 (en) * | 2006-08-28 | 2009-11-19 | National University Corporation Tohoku University | Semiconductor device and multilayer wiring board |
US20110182042A1 (en) * | 2007-07-05 | 2011-07-28 | Occam Portfolio Llc | Electronic Assemblies without Solder and Methods for their Manufacture |
US8395610B2 (en) * | 2007-07-24 | 2013-03-12 | Samsung Display Co., Ltd. | Driving chip, driving chip package having the same, display apparatus having the driving chip, and method thereof |
US20090027366A1 (en) * | 2007-07-24 | 2009-01-29 | Samsung Electronics Co., Ltd. | Driving chip, driving chip package having the same, display apparatus having the driving chip, and method thereof |
US20100078207A1 (en) * | 2008-09-30 | 2010-04-01 | Chang Li-Tien | Universal bump array structure |
US8242608B2 (en) * | 2008-09-30 | 2012-08-14 | Altera Corporation | Universal bump array structure |
US20110232946A1 (en) * | 2008-10-18 | 2011-09-29 | Andreas Voegerl | Flexible Printed Board |
US8853547B2 (en) * | 2008-10-18 | 2014-10-07 | Conti Temic Microelectronic Gmbh | Flexible printed board |
US20240133947A1 (en) * | 2011-04-26 | 2024-04-25 | Texas Instruments Incorporated | Interposer instrumentation method and apparatus |
US10607976B2 (en) * | 2011-08-16 | 2020-03-31 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US11978730B2 (en) | 2011-08-16 | 2024-05-07 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US12107082B2 (en) | 2011-08-16 | 2024-10-01 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US11798932B2 (en) | 2011-08-16 | 2023-10-24 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US10446530B2 (en) | 2011-08-16 | 2019-10-15 | Intel Corporation | Offset interposers for large-bottom packages and large-die package-on-package structures |
US20150380337A1 (en) * | 2011-09-02 | 2015-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thermally Enhanced Structure for Multi-Chip Device |
US9530715B2 (en) * | 2011-09-02 | 2016-12-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thermally enhanced structure for multi-chip device |
US20150181739A1 (en) * | 2012-08-03 | 2015-06-25 | Panasonic Corporation | Electronic component module and an assembly including the same |
US9545026B2 (en) * | 2012-08-03 | 2017-01-10 | Panasonic Corporation | Electronic component module and an assembly including the same |
US10026723B2 (en) * | 2016-01-04 | 2018-07-17 | Infinera Corporation | Photonic integrated circuit package |
US20180053753A1 (en) * | 2016-08-16 | 2018-02-22 | Freescale Semiconductor, Inc. | Stackable molded packages and methods of manufacture thereof |
US20190208620A1 (en) * | 2016-09-30 | 2019-07-04 | Intel Corporation | 3d high-inductive ground plane for crosstalk reduction |
US10973116B2 (en) * | 2016-09-30 | 2021-04-06 | Intel Corporation | 3D high-inductive ground plane for crosstalk reduction |
US11227841B2 (en) * | 2018-06-28 | 2022-01-18 | Intel Corporation | Stiffener build-up layer package |
US11581238B2 (en) * | 2019-12-26 | 2023-02-14 | Intel Corporation | Heat spreading layer integrated within a composite IC die structure and methods of forming the same |
US11049791B1 (en) * | 2019-12-26 | 2021-06-29 | Intel Corporation | Heat spreading layer integrated within a composite IC die structure and methods of forming the same |
CN114496958A (en) * | 2022-01-25 | 2022-05-13 | 西安微电子技术研究所 | Multi-chip multi-component laminated structure based on silicon substrate flip-chip welding |
Also Published As
Publication number | Publication date |
---|---|
KR20000048471A (en) | 2000-07-25 |
JP2000200860A (en) | 2000-07-18 |
KR100694739B1 (en) | 2007-03-14 |
US6396136B2 (en) | 2002-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6396136B2 (en) | Ball grid package with multiple power/ground planes | |
US6339254B1 (en) | Stacked flip-chip integrated circuit assemblage | |
US5291062A (en) | Area array semiconductor device having a lid with functional contacts | |
US6753616B2 (en) | Flip chip semiconductor device in a molded chip scale package | |
US5642261A (en) | Ball-grid-array integrated circuit package with solder-connected thermal conductor | |
US6815254B2 (en) | Semiconductor package with multiple sides having package contacts | |
US5693572A (en) | Ball grid array integrated circuit package with high thermal conductivity | |
US6114763A (en) | Semiconductor package with translator for connection to an external substrate | |
JP4476482B2 (en) | Low profile ball grid array semiconductor package, integrated circuit, printed circuit board, processor system, method for manufacturing low profile ball grid array semiconductor package, and method for mounting semiconductor die | |
JP2910670B2 (en) | Semiconductor mounting structure | |
US20110143499A1 (en) | Vertically packaged MOSFET and IC power devices as integrated module using 3D interconnected laminates | |
US6894229B1 (en) | Mechanically enhanced package and method of making same | |
US6704609B1 (en) | Multi-chip semiconductor module and manufacturing process thereof | |
KR20020061812A (en) | Ball grid array type multi chip package and stack package | |
KR101096330B1 (en) | Package for Semiconductor Devices | |
US20020063331A1 (en) | Film carrier semiconductor device | |
US20070138632A1 (en) | Electronic carrier board and package structure thereof | |
US6963129B1 (en) | Multi-chip package having a contiguous heat spreader assembly | |
JP3486236B2 (en) | Semiconductor device and manufacturing method thereof | |
CN222462894U (en) | Flip chip packaging structure and electronic equipment | |
CN222421956U (en) | Packaging structure and electronic equipment | |
KR100230919B1 (en) | Semiconductor package | |
JP2004072113A (en) | Thermally strengthened integrated circuit package | |
JPH0645763A (en) | Printed wiring board | |
JPH10256420A (en) | Semiconductor device and package thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: TEXAS INSTRUMENTS INCORPORATED, TEXAS Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KALIDAS, NAVINCHANDRA;MURTUZA, MASOOD;THOMPSON, RAYMOND W.;REEL/FRAME:010482/0990 Effective date: 19990730 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
AS | Assignment |
Owner name: NATURAL COMPOUNDS LTD, ISRAEL Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MIRSKY, NITSA;SCHACHTER, ALONA;SHERBAL, SUSSAN;REEL/FRAME:013162/0326;SIGNING DATES FROM 20020510 TO 20020512 |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
FPAY | Fee payment |
Year of fee payment: 12 |