US11173258B2 - Using piezoelectric electrodes as active surfaces for electroplating process - Google Patents
Using piezoelectric electrodes as active surfaces for electroplating process Download PDFInfo
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- US11173258B2 US11173258B2 US16/270,481 US201916270481A US11173258B2 US 11173258 B2 US11173258 B2 US 11173258B2 US 201916270481 A US201916270481 A US 201916270481A US 11173258 B2 US11173258 B2 US 11173258B2
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- 238000009713 electroplating Methods 0.000 title abstract description 14
- 238000000034 method Methods 0.000 title description 25
- 239000012528 membrane Substances 0.000 claims abstract description 51
- 229910052751 metal Inorganic materials 0.000 claims description 59
- 239000002184 metal Substances 0.000 claims description 59
- 239000006199 nebulizer Substances 0.000 claims description 34
- 239000010409 thin film Substances 0.000 claims description 32
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 4
- 239000003814 drug Substances 0.000 abstract description 12
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000004070 electrodeposition Methods 0.000 description 6
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Definitions
- the present application relates to microelectromechanical systems (MEMS) devices.
- MEMS microelectromechanical systems
- Nebulizers for healthcare applications are devices that convert liquid drugs into medical aerosol.
- the aerosol is inhaled into the lungs and directly absorbed into the blood stream.
- the control of droplet size is a crucial parameter in delivering the drug to the lungs.
- Some nebulizers are fabricated by manual assembly of a number of discrete components, including a mesh membrane, a holder, and a lead zirconate titanate (PZT) ring.
- the mesh membrane and the PZT ring are attached or mechanically coupled to the holder. Actuation of the PZT ring in a radial direction causes the holder to oscillate radially, which in turn causes the mesh membrane to vibrate. Vibration of the mesh membrane leads to generation of aerosol from a liquid drug placed below the holder.
- a nebulizer may include a piezoelectric MEMS device having a piezoelectric layer and an electrode serving as a foundation for electroplating.
- a metal layer deposited on the electrode can facilitate out-of-plane motion (in an up-down direction) of the piezoelectric layer and pump liquid droplets at a desired pump volume.
- a MEMS mesh membrane nebulizer comprises a thin film piezoelectric active layer comprising a plurality of openings, first and second electrodes on opposite sides of the thin film piezoelectric active layer, and a metal layer on the second electrode having a thickness greater than the second electrode.
- a MEMS nebulizer device comprising a piezoelectric layer comprising a plurality of openings, a first electrode on the piezoelectric layer, and a metal layer on the first electrode.
- a method of fabricating a MEMS mesh membrane comprises forming a plurality of openings in a thin film piezoelectric active layer and an electrode on the thin film piezoelectric active layer, and electroplating a metal on the electrode.
- FIG. 1A illustrates a cross-section of an example MEMS mesh membrane device according to a non-limiting embodiment.
- FIG. 1B illustrates the MEMS mesh membrane device of FIG. 1A along with a liquid sample.
- FIGS. 2A-2J illustrate a fabrication process for fabricating the MEMS mesh membrane device of FIG. 1A according to a non-limiting embodiment.
- FIGS. 3A-3J illustrate an alternative fabrication process for fabricating the MEMS mesh membrane device of FIG. 1A according to a non-limiting embodiment.
- FIGS. 4A-4B illustrate examples of electrode configurations according to a non-limiting embodiment.
- FIG. 5 depicts an example nebulizer that uses the MEMS mesh membrane device of FIG. 1A according to a non-limiting embodiment.
- the MEMS mesh membrane nebulizer includes a thin film piezoelectric layer and an electrode coupled to the thin film piezoelectric layer and serving as a foundation for electroplating. A plurality of openings are formed in the piezoelectric layer and the electrode to create the mesh structure. A metal layer is deposited on the electrode using electrodeposition. The electroplated metal layer can facilitate actuation of the piezoelectric layer in an out-of-plane mode for dispensing liquid droplets from a sample liquid source in close proximity to the mesh membrane.
- MEMS microelectromechanical systems
- microfabrication techniques are used to manufacture a MEMS mesh membrane nebulizer.
- the microfabrication techniques may include thin film processing, for example of a thin film piezoelectric layer, and electrodeposition.
- Piezoelectric materials can be used as actuators or sensing elements in MEMS devices. In both cases an active piezoelectric material may be sandwiched between a top metal electrode and a bottom metal electrode.
- one of the two electrodes can also be used as an active or base layer for electroplating an additional metal.
- aspects of the present disclosure combine the piezoelectric actuation with the unique shapes that can be achieved with electrodeposition. Use of such techniques provides for creation of small, integrated MEMS mesh membrane nebulizers.
- FIG. 1A illustrates a cross-section of an example MEMS mesh membrane device 100 that can be used in nebulizers, according to an aspect of the disclosure.
- the MEMS mesh membrane device 100 includes at least a piezoelectric active layer 102 , a top electrode 104 , a bottom electrode 106 , an electrodeposited metal layer 108 , and a thermal oxide layer 110 .
- the piezoelectric active layer 102 may include Aluminum Nitride (AlN).
- AlN Aluminum Nitride
- thin film sputtered Aluminum Nitride may be used as the piezoelectric active layer 102 .
- doped Aluminum Scandium Nitride AlScN
- the piezoelectric active layer 102 may be sandwiched between the top electrode 104 and the bottom electrode 106 .
- the electrodes may be formed from a suitable conductive material.
- the electrodes may be formed of Molybdenum.
- MEMS mesh membrane device 100 may be biocompatible in at least some embodiments.
- the materials may lack lead, or other materials harmful to humans.
- the stack of piezoelectric active layer 102 , top electrode 104 , and bottom electrode 106 may be small due to the microfabrication techniques used to form them.
- the stack may have a combined thickness T 1 between 1 and 10 microns, such as 2.4 microns. However, any value within that range, or any other suitable value may be used.
- the piezoelectric active layer 102 may have a thickness T 2 of between 1 and 5 microns, such as 2 microns or any other suitable value.
- Each of the top electrode 104 and bottom electrode 106 may have a thickness T 3 of between 0.1 and 1 microns, such as 0.2 microns. However, other thicknesses may be used for any of those components or the combined stack.
- the piezoelectric active layer 102 and the electrodes 104 , 106 may be patterned to form a plurality of openings 111 to create the mesh structure.
- the openings may have any suitable size for creating liquid droplets of a desired size, as described further below with respect to the operation of the device.
- each opening may have a diameter D 1 in the range of 1-6 ⁇ m, that enable aerosol droplets of optimal size to be dispensed.
- a plurality of the openings have a diameter D 1 in the range of 1-6 ⁇ m, but not necessarily each opening may be of that size.
- the droplet size of 1 ⁇ m to 6 ⁇ m in some embodiments ensures an efficient and high absorption of the drug into the blood stream. While larger particles are trapped in the throat or in the delivery apparatus, smaller particles are normally exhaled and can't be absorbed in the lungs.
- the piezoelectric stack (including the piezoelectric active layer 102 and the two electrodes 104 , 106 ) serves as a substrate for electroplating.
- the top electrode 104 may be used as an active layer to enable the electroplating deposition of the metal layer 108 . Electrodeposition allows for the metal layer 108 to be in direct contact with the top electrode 104 .
- Nickel-Palladium alloys or any other metals e.g., Chromium, Aluminum
- alloys suitable for nebulizers e.g., being biocompatible
- the thick metal layer 108 deposited on the top electrode 104 can facilitate out-of-plane motion (in the up-down direction) of the piezoelectric active layer 102 and pump liquid droplets at a desired pump volume (e.g., 130 kHz).
- the thick metal layer 108 not only allows for the desired pump volume to the attained (which may not be possible with only the piezoelectric stack), but also protects the piezoelectric stack from corrosion that can be caused by certain liquid drugs.
- the metal layer 108 may have a thickness T 4 greater than thickness T 3 of the top electrode 104 .
- the thickness T 4 of the metal layer may be in a range of 40 ⁇ m-100 ⁇ m. According to a non-limiting embodiment, the thickness T 4 of the metal layer 108 may be about 200 times the thickness T 3 of the top electrode 104 (i.e., thickness ratio 200:1). Other suitable thickness ratios may be used.
- the thickness T 4 of the metal layer 108 may be greater than thickness T 2 of the piezoelectric active layer 102 .
- the thickness T 4 of the metal layer 108 may be greater than a combined thickness of the piezoelectric active layer 102 and the top electrode 104 .
- the thickness T 4 of the metal layer 108 may be greater than a thickness of the piezoelectric stack.
- the MEMS mesh membrane device 100 may have a diameter (or in-plane long dimension) of several mm.
- the diameter may be between 3-4 mm, or less than 9 mm.
- the liquid sample 112 shown in FIG. 1B
- the mesh membrane device 100 is excited to exhibit out-of-plane vibration in the y direction.
- Out-of-plane vibration of the piezoelectric stack builds up pressure pushing the liquid through the openings 111 and ejecting aerosol droplets 114 (e.g., in a ⁇ y direction) on the other side of the mesh membrane device.
- FIGS. 2A-2J illustrate a fabrication process 200 for fabricating the MEMS mesh membrane device 100 according to a non-limiting embodiment.
- the fabrication process 200 may begin by growing a thermal oxide layer 204 on a substrate 202 shown in FIG. 2A .
- the substrate 202 may be a silicon substrate.
- the substrate 202 may have a thickness of several microns to hundreds of microns.
- the substrate may be a wafer, and may have any suitable diameter, such as being an 8 inch wafer.
- the thermal oxide layer 204 may be grown on the substrate 202 .
- the thermal oxide layer may have a thickness of approximately 0.2 ⁇ m, although other thicknesses are possible.
- the bottom electrode 106 may be formed by depositing a suitable conductive material layer and then patterning the conductive material layer.
- a suitable conductive material layer may be deposited on the thermal oxide layer 204 .
- the first conductive material layer 206 may be formed of Molybdenum.
- other suitable conductive materials including other metals (e.g., Aluminum, Platinum, Titanium-Tungstun (TiW)) may be used.
- the first conductive material layer 206 may have a thickness of approximately 0.2 ⁇ m, although other thicknesses are possible. In FIG.
- the first conductive material layer 206 may be patterned to form the bottom electrode 106 .
- the patterning may be performed in any suitable manner.
- the patterning used to form the bottom electrode 106 may include a lithography and etching process.
- a thin film piezoelectric layer 102 may be deposited on the bottom electrode 106 .
- thin film sputtered AN may be used as the thin film piezoelectric active layer 102 .
- a second conductive material layer 208 may be deposited on the thin film piezoelectric layer 102 .
- the second conductive material layer 208 may be formed of Molybdenum.
- other suitable conductive materials including other metals (e.g., Aluminum, Platinum, Titanium-Tungstun (TiW)) may be used.
- the thin film piezoelectric layer 102 may have a thickness of approximately 2 ⁇ m and the second conductive material layer 206 may have a thickness of approximately 0.2 ⁇ m.
- the second conductive material layer 208 may be patterned to form the top electrode 104 .
- the patterning may be performed in any suitable manner.
- the patterning used to form the top electrode 104 may include a lithography and etching process.
- the thin film piezoelectric layer 102 may be etched to form a via 210 to provide a connection to the bottom electrode 106 . In this manner, in FIG. 2G , a piezoelectric stack including the thin film piezoelectric active layer 102 and the two electrodes 104 , 106 is formed.
- the piezoelectric stack may be patterned to form a plurality of openings 111 to create a mesh structure.
- the thin film piezoelectric active layer 102 , the two electrodes 104 , 106 , and the thermal oxide layer 204 are patterned to form the openings 111 .
- the patterning is performed such that edges of the top electrode 104 and the piezoelectric active layer 102 on either side of each opening are aligned in cross-section.
- the patterning may be performed in any suitable manner.
- the patterning used to form the openings 111 may include a lithography and etching process. It will be appreciated that the number and diameter of the openings may be selected based on a desired pump volume and droplet size suitable for nebulizers.
- the piezoelectric stack (with the openings 111 ) may serve as a substrate for electroplating in FIG. 2I .
- the structure depicted in FIG. 2H may be placed in a electroplating solution and voltage may be applied to the top electrode 104 , which results in a metal layer 108 being deposited on the top electrode 104 of the piezoelectric stack.
- Nickel-Palladium alloys or any other metals e.g., Chromium, Aluminum
- alloys suitable for nebulizers e.g., being biocompatible
- the shape of the top electrode 104 and the time period for which the structure is kept in the electroplating solution i.e., time period for electrodeposition
- a portion of the substrate 202 may be removed until a bottom surface 212 of the thermal oxide layer 204 and the openings 111 are exposed. Removal of the portion of the substrate may be performed using any suitable technique, for example, chemical-mechanical polishing (CMP) and deep reactive ion etching (DRIE).
- CMP chemical-mechanical polishing
- DRIE deep reactive ion etching
- fabrication process 200 may be used for fabricating the MEMS mesh membrane device 100 with a piezoelectric stack and thick metal layer on the piezoelectric stack.
- FIGS. 3A-3J illustrate an alternative fabrication process for fabricating the MEMS mesh-membrane device 100 according to a non-limiting embodiment.
- the fabrication process 300 (shown in FIGS. 3A-3J ) is similar to the fabrication process 200 described above with respect to FIGS. 2A-2J , with the exception of the patterning of the top electrode shown in FIGS. 3H-3I .
- the fabrication process 300 is briefly described below, but it will be appreciated that the processing steps and materials described above with respect FIGS. 2A-2J apply to FIGS. 3A-3J as well.
- the fabrication process 300 may begin by growing a thermal oxide layer 304 ( FIG. 3B ) on a substrate 302 shown in FIG. 3A .
- a first conductive material layer 306 may be deposited on the thermal oxide layer 304 .
- the first conductive material layer 306 may be patterned to form the bottom electrode 106 .
- a thin film piezoelectric layer 102 may be deposited on the bottom electrode 106 .
- a second conductive material layer 308 may be deposited on the thin film piezoelectric layer 102 .
- the second conductive material layer 308 may be patterned to form the top electrode 104 .
- the thin film piezoelectric layer 102 may be etched to form a via 310 to provide a connection to the bottom electrode 106 .
- the thin film piezoelectric active layer 102 , the two electrodes 104 , 106 , and the thermal oxide layer 204 are patterned to form a plurality of openings 111 , but the patterning is different than that of FIG. 2H .
- the patterning is performed such that edges of the top electrode 104 and the piezoelectric active layer 102 on either side of each opening are not aligned in cross-section.
- An exploded view 320 of the edges of the top electrode 104 and the piezoelectric active layer 102 is shown in FIG. 3I .
- the top electrode 104 may be narrower than the bottom electrode 106 in the in-plane direction.
- the patterning may be performed in any suitable manner.
- the patterning used to form the openings 111 may include a lithography and etching process.
- the structure depicted in FIG. 3H may be placed in a electroplating solution and voltage may be applied to the top electrode 104 , which results in a metal layer 108 being deposited on the top electrode 104 as shown in FIG. 3I .
- the metal layer 108 is deposited only on the top electrode 104 and not on an exposed region 322 of the piezoelectric active layer 102 .
- Nickel-Palladium alloys or any other metals e.g., Chromium, Aluminum
- alloys suitable for nebulizers e.g., being biocompatible
- fabrication process 300 may be alternatively used for fabricating the MEMS mesh membrane device 100 with a piezoelectric stack and thick metal layer on the piezoelectric stack.
- fabrication process 200 or 300 used for fabricating the MEMS mesh membrane device 100 may beneficially be readily scalable, as opposed to processes requiring assembly of discrete components to make the nebulizer.
- the MEMS mesh membrane device 100 may be fabricated using relatively low cost materials, as opposed to devices requiring costly materials such as Palladium.
- the electroplated metal layer 108 may have a rounded contour between adjacent openings of the piezoelectric stack in cross-section. Electrodeposition allows for the metal layer 108 to be fabricated with the rounded counter rather than straight edges that are susceptible to cracking. The metal layer 108 with its rounded contour may form a funnel-like shape that can facilitate the flow of the liquid sample through the openings.
- the electroplated metal layer 108 may function as a bimorph structure to prompt out-of-plane motion (in the up-down direction) of the piezoelectric active layer 102 and pump the liquid droplets at a desired pump volume. It may not be possible to prompt out-of-plane motion with only the piezoelectric stack, but the presence of the electroplated metal layer 108 prompts required strains upon actuation of the piezoelectric active layer, thereby resulting in out-of-plane motion of the piezoelectric stack. In operation, out-of-plane motion of the piezoelectric stack builds up pressure pushing the sample liquid drug placed in proximity to the metal layer through the openings and ejecting the liquid droplets from the bottom surface of the thermal oxide layer.
- FIGS. 4A-4B illustrate examples of electrode configurations according to non-limiting embodiments.
- FIGS. 4A and 4B provide examples of placement and configuration of the bottom electrode 106 on the piezoelectric active layer 102 .
- Different configurations of the bottom electrode 106 provide for different vibration patterns of the piezoelectric active layer 102 .
- the bottom electrode 106 may be patterned in different ways to actuate different modeshapes of the piezoelectric active layer 102 .
- the dashed line in FIGS. 4A and 4B indicates an opening 240 , 340 that is created by removal of the substrate as shown in FIGS. 2J and 3J .
- FIG. 5 depicts an example nebulizer 500 that uses the MEMS mesh membrane device of FIG. 1A - FIG. 1B according to a non-limiting embodiment.
- the nebulizer 500 converts liquid drugs into medical aerosol or droplets that can be inhaled by a user of the nebulizer 500 .
- different types of nebulizers having different shapes may use the MEMS mesh membrane device of FIG. 1A - FIG. 1B .
- FIG. 5 depicts a nebulizer with a mouth piece 502 through which the medical aerosol can be inhaled.
- nebulizers with face masks or other devices used for inhalation may be used without departing from the scope of this disclosure.
- Nebulizer 500 may include a reservoir 504 for holding a liquid drug.
- the MEMS mesh membrane device 100 may be positioned in a variety of locations within the nebulizer 500 .
- the MEMS mesh membrane device 100 may be placed in a region 506 above the reservoir 504 .
- the MEMS mesh membrane device 100 may be oriented such that the metal layer 108 is facing downwards (e.g., in a ⁇ y direction) towards the reservoir 504 and the bottom surface of the thermal oxide layer is facing upwards (e.g., in a y direction) towards the mouth piece 502 .
- the MEMS mesh membrane device 100 may be placed inside or in proximity to the mouth piece 502 .
- the MEMS mesh membrane device 100 may be oriented such that the bottom surface of the thermal oxide layer faces the mouth piece 502 (e.g., in a ⁇ x direction). It will be appreciated that the MEMS mesh membrane device 100 may be placed in different locations and oriented in different ways based on the placement as long as the bottom surface of the thermal oxide layer faces towards the mouth piece 502 for aerosol delivery.
- actuation of the nebulizer by the user causes an electrical signal to be supplied to the top and bottom electrodes 104 , 106 of the MEMS mesh membrane device 100 , which in turn actuates the piezoelectric active layer 102 .
- Actuation of the piezoelectric active layer 102 results in an out-of-plane motion of the piezoelectric stack.
- the out-of-plane motion of the piezoelectric stack builds up pressure drawing the liquid drug from the reservoir 504 and pushing the liquid drug through the openings in the form of aerosol droplets towards the mouth piece 502 .
- the openings may each have a diameter in the range of 1-6 ⁇ m so as to create aerosol droplets having droplet size 1-6 ⁇ m, thereby ensuring efficient and high absorption of the drug into the blood stream.
- the terms “approximately” and “about” may be used to mean within ⁇ 20% of a target value in some embodiments, within ⁇ 10% of a target value in some embodiments, within ⁇ 5% of a target value in some embodiments, and yet within ⁇ 2% of a target value in some embodiments.
- the terms “approximately” and “about” may include the target value.
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US12134557B2 (en) * | 2021-02-12 | 2024-11-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Arched membrane structure for MEMS device |
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US11714102B2 (en) | 2021-06-08 | 2023-08-01 | Analog Devices, Inc. | Fully differential accelerometer |
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Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1408551A (en) | 2001-09-29 | 2003-04-09 | 飞赫科技股份有限公司 | Inner connection structure and technology of piezoelectric inkjet printing head |
US20040050947A1 (en) | 2002-05-20 | 2004-03-18 | Aerogen, Inc. | Apparatus for providing aerosol for medical treatment and methods |
US7178906B2 (en) | 2000-09-26 | 2007-02-20 | Xaar Technology Limited | Droplet deposition apparatus |
US7545246B2 (en) | 2006-03-30 | 2009-06-09 | Samsung Electronics Co., Ltd. | Piezoelectric MEMS switch and method of fabricating the same |
US20090244203A1 (en) | 2008-03-28 | 2009-10-01 | Tsuyoshi Mita | Method of manufacturing piezoelectric actuator, and liquid ejection head |
US20100079523A1 (en) | 2008-09-30 | 2010-04-01 | Fujifilm Dimatix, Inc. | Control of Velocity Through a Nozzle |
WO2013155513A1 (en) | 2012-04-13 | 2013-10-17 | President And Fellows Of Harvard College | Devices and methods for in vitro aerosol delivery |
WO2013186031A2 (en) | 2012-06-11 | 2013-12-19 | Stamford Devices Limited | A method of producing an aperture plate for a nebulizer |
US8684980B2 (en) | 2010-07-15 | 2014-04-01 | Corinthian Ophthalmic, Inc. | Drop generating device |
US20150075521A1 (en) | 2013-09-13 | 2015-03-19 | Delta Electronics, Inc. | Nebulizer and medicament storage module thereof |
US20160058960A1 (en) | 2013-04-04 | 2016-03-03 | The United State of America, as represented by the Secretary, Department of Health and Human Service | Nasal aerosol delivery system |
WO2017149165A1 (en) | 2016-03-04 | 2017-09-08 | University College Cork - National University Of Ireland, Cork | A monolithic integrated mesh device for fluid dispensers and method of making same |
US9814098B2 (en) | 2014-06-20 | 2017-11-07 | The Procter & Gamble Company | Microfluidic delivery system for releasing fluid compositions |
US20170368828A1 (en) * | 2016-06-28 | 2017-12-28 | Seiko Epson Corporation | Mems device, liquid ejecting head, manufacturing method of mems device, and manufacturing method of liquid ejecting head |
US20170373242A1 (en) | 2016-06-24 | 2017-12-28 | Seiko Epson Corporation | Mems device, piezoelectric actuator, and ultrasonic motor |
US20180086077A1 (en) | 2016-09-23 | 2018-03-29 | Toshiba Tec Kabushiki Kaisha | Droplet ejecting head and droplet ejecting apparatus |
US20200220520A1 (en) * | 2016-11-15 | 2020-07-09 | Global Communication Semiconductors, Llc | Film Bulk Acoustic Resonator with Spurious Resonance Suppression |
-
2019
- 2019-02-07 US US16/270,481 patent/US11173258B2/en active Active
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7178906B2 (en) | 2000-09-26 | 2007-02-20 | Xaar Technology Limited | Droplet deposition apparatus |
CN1408551A (en) | 2001-09-29 | 2003-04-09 | 飞赫科技股份有限公司 | Inner connection structure and technology of piezoelectric inkjet printing head |
US20040050947A1 (en) | 2002-05-20 | 2004-03-18 | Aerogen, Inc. | Apparatus for providing aerosol for medical treatment and methods |
US7545246B2 (en) | 2006-03-30 | 2009-06-09 | Samsung Electronics Co., Ltd. | Piezoelectric MEMS switch and method of fabricating the same |
US20090244203A1 (en) | 2008-03-28 | 2009-10-01 | Tsuyoshi Mita | Method of manufacturing piezoelectric actuator, and liquid ejection head |
US20100079523A1 (en) | 2008-09-30 | 2010-04-01 | Fujifilm Dimatix, Inc. | Control of Velocity Through a Nozzle |
US8684980B2 (en) | 2010-07-15 | 2014-04-01 | Corinthian Ophthalmic, Inc. | Drop generating device |
WO2013155513A1 (en) | 2012-04-13 | 2013-10-17 | President And Fellows Of Harvard College | Devices and methods for in vitro aerosol delivery |
US20150079670A1 (en) | 2012-04-13 | 2015-03-19 | President And Fellows Of Harvard College | Devices and methods for in vitro aerosol delivery |
WO2013186031A2 (en) | 2012-06-11 | 2013-12-19 | Stamford Devices Limited | A method of producing an aperture plate for a nebulizer |
US20160058960A1 (en) | 2013-04-04 | 2016-03-03 | The United State of America, as represented by the Secretary, Department of Health and Human Service | Nasal aerosol delivery system |
US20150075521A1 (en) | 2013-09-13 | 2015-03-19 | Delta Electronics, Inc. | Nebulizer and medicament storage module thereof |
US9814098B2 (en) | 2014-06-20 | 2017-11-07 | The Procter & Gamble Company | Microfluidic delivery system for releasing fluid compositions |
WO2017149165A1 (en) | 2016-03-04 | 2017-09-08 | University College Cork - National University Of Ireland, Cork | A monolithic integrated mesh device for fluid dispensers and method of making same |
US20170373242A1 (en) | 2016-06-24 | 2017-12-28 | Seiko Epson Corporation | Mems device, piezoelectric actuator, and ultrasonic motor |
US20170368828A1 (en) * | 2016-06-28 | 2017-12-28 | Seiko Epson Corporation | Mems device, liquid ejecting head, manufacturing method of mems device, and manufacturing method of liquid ejecting head |
US20180086077A1 (en) | 2016-09-23 | 2018-03-29 | Toshiba Tec Kabushiki Kaisha | Droplet ejecting head and droplet ejecting apparatus |
US20200220520A1 (en) * | 2016-11-15 | 2020-07-09 | Global Communication Semiconductors, Llc | Film Bulk Acoustic Resonator with Spurious Resonance Suppression |
Non-Patent Citations (4)
Title |
---|
[No Author Listed], Nebulizer Plates. Veco Precision Metal Website. Retrieved from the internet: https://www.vecoprecision.com/precision-products/nebulizer-plates. (Last accessed Mar. 21, 2019). 4 pages. |
Choi et al., Fabrication and Characterization of Medical Mesh-Nebulizer for Aerosol drug Delivery. Applied Sciences. 2018; 8(4):604. 12 pages. |
Tadigadapa, Piezoelectric Microelectromechanical Systems—Challenges and Opportunities. Procedia Engineering. 2010; 5:468-471. |
Wang, Investigation for Improvement and Application of MEMS-Based Micro-Electro-Discharge Machining (M3EDM). Thesis Submitted in Partial Fulfillment of the Requirements for the Degree of Master of Applied Science. The University of British Columbia, Jan. 2011. 84 pages. |
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