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TWM662572U - Cleaning robot system - Google Patents

Cleaning robot system Download PDF

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Publication number
TWM662572U
TWM662572U TW113202486U TW113202486U TWM662572U TW M662572 U TWM662572 U TW M662572U TW 113202486 U TW113202486 U TW 113202486U TW 113202486 U TW113202486 U TW 113202486U TW M662572 U TWM662572 U TW M662572U
Authority
TW
Taiwan
Prior art keywords
cleaning
cleaning element
self
base station
moving
Prior art date
Application number
TW113202486U
Other languages
Chinese (zh)
Inventor
陳澤
王曉亮
王蒙
劉曉明
趙建豪
Original Assignee
大陸商北京石頭世紀科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商北京石頭世紀科技股份有限公司 filed Critical 大陸商北京石頭世紀科技股份有限公司
Publication of TWM662572U publication Critical patent/TWM662572U/en

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Classifications

    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/28Floor-scrubbing machines, motor-driven
    • A47L11/282Floor-scrubbing machines, motor-driven having rotary tools
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/29Floor-scrubbing machines characterised by means for taking-up dirty liquid
    • A47L11/292Floor-scrubbing machines characterised by means for taking-up dirty liquid having rotary tools
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/29Floor-scrubbing machines characterised by means for taking-up dirty liquid
    • A47L11/292Floor-scrubbing machines characterised by means for taking-up dirty liquid having rotary tools
    • A47L11/293Floor-scrubbing machines characterised by means for taking-up dirty liquid having rotary tools the tools being disc brushes
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers

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  • Electric Vacuum Cleaner (AREA)

Abstract

This new model provides a cleaning robot system, which includes a self-moving cleaning device. The self-moving cleaning device comprises a machine body, cleaning components, and a motion mechanism. The motion mechanism connects the machine body and the cleaning components to drive the cleaning components to move relative to the machine body for lifting and lowering. The cleaning components are detachably connected to the motion mechanism through a first magnetic suction component, and a first magnetic piece is also provided on the cleaning components. Additionally, a base station is included, with an electromagnet installed on it. In this system, when the electromagnet is powered on, the magnetic attraction between the powered electromagnet and the first magnetic piece is greater than the magnetic attraction between the first magnetic suction component and the gravity of the cleaning components. Therefore, automatic disassembly and separation of the cleaning components from the motion mechanism can be achieved without the need for manual operation by the user, thereby enhancing the operational experience of disassembling the cleaning components.

Description

清潔機器人系統 Cleaning Robotic System

本新型涉及智慧家居技術領域,尤其涉及一種清潔機器人系統。The invention relates to the field of smart home technology, and in particular to a cleaning robot system.

隨著技術的迭代更新與發展,自移清潔設備已經進入到普通家庭生活當中,如並逐漸實現了普及。在當前的自移清潔設備中,拖地機、掃拖一體機因具備拖地功能,廣受人們喜愛。With the iterative update and development of technology, self-moving cleaning equipment has entered the lives of ordinary families and has gradually become popular. Among the current self-moving cleaning equipment, mopping machines and sweeping and mopping machines are widely loved by people because they have the function of mopping the floor.

其中,為了使拖盤在不拖地時能夠抬起,通常會設置運動機構對拖盤進行升降操作,但是,通常情況下,拖盤和運動機構的連接結構較為複雜,拆卸不便。In order to enable the tray to be lifted when not mopping the floor, a motion mechanism is usually provided to lift the tray. However, usually, the connection structure between the tray and the motion mechanism is complicated and inconvenient to disassemble.

在本新型內容部分中引入了一系列簡化形式的概念,這將在具體實施方式部分中進一步詳細說明。本新型的此部分並不意味著要試圖限定出所要求保護的技術方案的關鍵特徵和必要技術特徵,更不意味著試圖確定所要求保護的技術方案的保護範圍。A series of simplified concepts are introduced in the content section of the present invention, which will be further described in detail in the specific implementation section. This part of the present invention does not mean to attempt to limit the key features and essential technical features of the technical solution claimed for protection, nor does it mean to attempt to determine the scope of protection of the technical solution claimed for protection.

本新型第一方面的實施例,提供了一種清潔機器人系統,包括:自移清潔設備,自移清潔設備包括機器主體、清潔元件、運動機構,運動機構連接機器主體和清潔元件以驅動清潔元件相對於機器主體升降,清潔元件與運動機構通過第一磁吸組件可拆卸連接,清潔元件上還設置有第一磁性件;基站,基站上設置有電磁鐵;其中,通電的電磁鐵與第一磁性件的磁吸力大於第一磁吸組件的磁吸力與清潔元件的重力的差。An embodiment of the first aspect of the present invention provides a cleaning robot system, comprising: a self-moving cleaning device, the self-moving cleaning device comprising a machine body, a cleaning element, and a moving mechanism, the moving mechanism connecting the machine body and the cleaning element to drive the cleaning element to rise and fall relative to the machine body, the cleaning element and the moving mechanism being detachably connected via a first magnetic attraction component, and a first magnetic component being further provided on the cleaning element; a base station, the base station being provided with an electromagnet; wherein the magnetic attraction force between the energized electromagnet and the first magnetic component is greater than the difference between the magnetic attraction force of the first magnetic attraction component and the gravity of the cleaning element.

進一步地,基站設置有用於容納自移清潔設備的容納腔,電磁鐵設置在容納腔底壁上;第一磁性件位於第一磁吸組件的下方。Furthermore, the base station is provided with a receiving chamber for receiving the self-moving cleaning device, and the electromagnet is arranged on the bottom wall of the receiving chamber; the first magnetic member is located below the first magnetic attraction assembly.

進一步地,第一磁吸組件包括第一配合件和第二配合件,第一配合件設置在運動機構上,第二配合件設置在清潔元件上,第一配合件和第二配合件中的一個為磁吸件,另一個為磁吸件或磁性件。Furthermore, the first magnetic attraction component includes a first matching piece and a second matching piece, the first matching piece is arranged on the moving mechanism, the second matching piece is arranged on the cleaning element, one of the first matching piece and the second matching piece is a magnetic attraction piece, and the other is a magnetic attraction piece or a magnetic piece.

進一步地,運動機構的輸出端包括套筒,第一配合件設置在套筒的內部,套筒的開口朝下;清潔元件包括適於延伸至套筒內的連接部,第二配合件設置在連接部的頂端;其中,吸合的第一配合件和第二配合件均位於套筒內。Furthermore, the output end of the motion mechanism includes a sleeve, the first matching piece is arranged inside the sleeve, and the opening of the sleeve faces downward; the cleaning element includes a connecting portion suitable for extending into the sleeve, and the second matching piece is arranged at the top end of the connecting portion; wherein the attracted first matching piece and the second matching piece are both located in the sleeve.

進一步地,運動機構的輸出端還包括延伸至套筒內的旋轉部,第一配合件安裝在旋轉部的下方端面上。Furthermore, the output end of the motion mechanism also includes a rotating portion extending into the sleeve, and the first matching piece is installed on the lower end surface of the rotating portion.

進一步地,套筒內設置有導向部,導向部用於引導第二配合件與第一配合件貼合。Furthermore, a guide portion is arranged in the sleeve, and the guide portion is used to guide the second matching piece to fit with the first matching piece.

進一步地,導向部為凸台,第一配合件位於凸台遠離套筒開口的一側,凸台背離第一配合件的一側設置為導向斜面。Furthermore, the guiding portion is a boss, the first matching piece is located on a side of the boss away from the sleeve opening, and a side of the boss away from the first matching piece is set as a guiding inclined surface.

進一步地,基站還包括:清洗盤,清洗盤設置在容納腔的底壁上,清洗盤用於與自移清潔設備的清潔元件干涉以將清潔元件上的髒污去除;其中,清洗盤蓋設在電磁鐵的上方;清洗盤與容納腔的底壁可拆卸連接。Furthermore, the base station also includes: a cleaning plate, which is arranged on the bottom wall of the accommodating chamber, and is used to interfere with the cleaning element of the self-moving cleaning device to remove dirt on the cleaning element; wherein the cleaning plate cover is arranged above the electromagnet; the cleaning plate is detachably connected to the bottom wall of the accommodating chamber.

進一步地,清洗盤包括:清潔腔、以及設置於清潔腔內的清洗部,清洗部用於與自移清潔設備的清潔元件干涉,清潔腔用於容納髒污;容納腔的底壁開設有安裝槽,清洗盤的外緣形狀與安裝槽的形狀相匹配,清洗盤可受限於安裝槽內以對清洗盤相對於基站在水平方向的運動進行限位。Furthermore, the cleaning plate includes: a cleaning cavity and a cleaning part arranged in the cleaning cavity, the cleaning part is used to interfere with the cleaning element of the self-moving cleaning device, and the cleaning cavity is used to contain dirt; a mounting groove is opened on the bottom wall of the containing cavity, and the outer edge shape of the cleaning plate matches the shape of the mounting groove. The cleaning plate can be restricted in the mounting groove to limit the horizontal movement of the cleaning plate relative to the base station.

進一步地,清潔腔內設置有污水槽,設置於基站上的污水管的一段延伸至污水槽。Furthermore, a sewage tank is arranged in the cleaning chamber, and a section of the sewage pipe arranged on the base station extends to the sewage tank.

上述說明僅是本新型技術方案的概述,為了能夠更清楚瞭解本新型的技術手段,而可依照說明書的內容予以實施,並且為了讓本新型的上述和其它目的、特徵和優點能夠更明顯易懂,以下特舉本新型的具體實施方式。The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention, it can be implemented according to the contents of the specification. In order to make the above and other purposes, features and advantages of the present invention more obvious and easy to understand, the specific implementation method of the present invention is specifically listed below.

本新型的下列圖式在此作為本新型實施例的一部分用於理解本新型。圖式中示出了本新型的實施例及其描述,用來解釋本新型的原理。The following drawings of the present invention are used as a part of the embodiments of the present invention to understand the present invention. The embodiments of the present invention and their description are shown in the drawings to explain the principle of the present invention.

相關申請的交叉引用Cross-references to related applications

本申請要求於2023年3月21日提交中國專利局,申請號為202320566267.1,新型名稱為“清潔機器人系統”的中國專利申請的優先權,其全部內容通過引用結合在本申請中。This application claims priority to a Chinese patent application filed with the China Patent Office on March 21, 2023, application number 202320566267.1, entitled “Cleaning Robot System,” the entire contents of which are incorporated by reference into this application.

在下文的描述中,給出了大量具體的細節以便提供對本新型所提供的技術方案更為徹底的理解。然而,對於本領域技術人員而言顯而易見的是,本新型所提供的技術方案可以無需一個或多個這些細節而得以實施。In the following description, a large number of specific details are given in order to provide a more thorough understanding of the technical solution provided by the novel invention. However, it is obvious to those skilled in the art that the technical solution provided by the novel invention can be implemented without one or more of these details.

應予以注意的是,這裡所使用的術語僅是為了描述具體實施例,而非意圖限制根據本新型的示例性實施例。如在這裡所使用的,除非上下文另外明確指出,否則單數形式也意圖包括複數形式。此外,還應當理解的是,當在本說明書中使用術語“包含”和/或“包括”時,其指明存在所述特徵、整體、步驟、操作、元件和/或組件,但不排除存在或附加一個或多個其他特徵、整體、步驟、操作、元件、組件和/或它們的組合。It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should also be understood that when the terms "comprise" and/or "include" are used in this specification, it indicates the presence of the features, wholes, steps, operations, elements and/or components, but does not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and/or combinations thereof.

現在,將參照圖式更詳細地描述根據本新型的示例性實施例。然而,這些示例性實施例可以多種不同的形式來實施,並且不應當被解釋為只限於這裡所闡述的實施例。應當理解的是,提供這些實施例是為了使得本新型的公開徹底且完整,並且將這些示例性實施例的構思充分傳達給本領域具有通常知識者。Now, exemplary embodiments according to the present invention will be described in more detail with reference to the drawings. However, these exemplary embodiments can be implemented in many different forms and should not be interpreted as being limited to the embodiments described herein. It should be understood that these embodiments are provided to make the disclosure of the present invention thorough and complete, and to fully convey the concepts of these exemplary embodiments to those having ordinary knowledge in the art.

如1圖至圖8所示,本新型的實施例提供了一種清潔機器人系統,其中,清潔機器人系統包括自移清潔設備100和基站200,即基站200與自移清潔設備100配合使用。As shown in FIG. 1 to FIG. 8 , the embodiment of the present invention provides a cleaning robot system, wherein the cleaning robot system includes a self-moving cleaning device 100 and a base station 200 , that is, the base station 200 is used in conjunction with the self-moving cleaning device 100 .

進一步地,如圖1和圖2所示,自移清潔設備100可以包括機器主體110、感知系統120、控制模組、驅動系統140、清潔系統150、能源系統和人機交互系統170。可以理解的是,自移清潔設備100可以為自動清潔設備或滿足要求的其他自移清潔設備100。自移清潔設備100是在無用戶操作的情況下,在某一待清潔區域自動進行清潔操作的設備。其中,當自移清潔設備100開始工作時,自移清潔設備100從基站200出發進行清潔任務。當自移清潔設備100完成清潔任務或其他需要中止清潔任務的情況時,自移清潔設備100可以返回基站200進行充電、和/或補水、和/或清洗、和/或集塵等操作。Further, as shown in FIG. 1 and FIG. 2 , the self-moving cleaning device 100 may include a machine body 110, a sensing system 120, a control module, a drive system 140, a cleaning system 150, an energy system, and a human-computer interaction system 170. It is understandable that the self-moving cleaning device 100 may be an automatic cleaning device or other self-moving cleaning devices 100 that meet the requirements. The self-moving cleaning device 100 is a device that automatically performs cleaning operations in a certain area to be cleaned without user operation. Among them, when the self-moving cleaning device 100 starts working, the self-moving cleaning device 100 starts from the base station 200 to perform the cleaning task. When the self-moving cleaning device 100 completes the cleaning task or other situations require the termination of the cleaning task, the self-moving cleaning device 100 can return to the base station 200 to perform operations such as charging, and/or water replenishment, and/or cleaning, and/or dust collection.

如1圖所示,機器主體110包括前向部分111和後向部分112,具有近似圓形形狀,也可具有其他形狀,包括但不限於前方後圓的近似D形形狀及前方後方的矩形或正方形形狀。As shown in FIG. 1 , the machine body 110 includes a forward portion 111 and a rearward portion 112, and has an approximately circular shape. It may also have other shapes, including but not limited to an approximately D-shaped shape with a front and rear circle and a rectangular or square shape with a front and rear circle.

如1圖所示,感知系統120包括位於機器主體110上的位置確定裝置121、設置於機器主體110的前向部分111的緩衝器122上的碰撞感測器、近距離感測器,設置於機器主體110下部的懸崖感測器,以及設置於機器主體110內部的磁力計、加速度計、陀螺儀、里程計等感測裝置,用於向控制模組提供機器的各種位置資訊和運動狀態資訊。位置確定裝置121包括但不限於攝像頭、雷射測距裝置(LDS,全稱Laser Distance Sensor)。As shown in FIG. 1 , the sensing system 120 includes a position determination device 121 located on the machine body 110, a collision sensor and a proximity sensor disposed on a buffer 122 of the forward portion 111 of the machine body 110, a cliff sensor disposed at the lower portion of the machine body 110, and sensing devices such as a magnetometer, an accelerometer, a gyroscope, and an odometer disposed inside the machine body 110, for providing the control module with various position information and motion status information of the machine. The position determination device 121 includes but is not limited to a camera and a laser distance sensor (LDS, full name Laser Distance Sensor).

如1圖所示,機器主體110的前向部分111可承載緩衝器122,在清潔過程中驅動輪模組141推進自移清潔設備100在地面行走時,緩衝器122經由設置在其上的感測器系統,例如紅外感測器,檢測自移清潔設備100的行駛路徑中的一個或多個事件,自移清潔設備100可通過由緩衝器122檢測到的事件,例如障礙物、牆壁,而控制驅動輪模組141使自移清潔設備100來對事件做出回應,例如遠離障礙物。As shown in FIG. 1 , the forward portion 111 of the machine body 110 can carry the buffer 122. During the cleaning process, when the driving wheel module 141 propels the self-propelled cleaning device 100 to walk on the ground, the buffer 122 detects one or more events in the driving path of the self-propelled cleaning device 100 via a sensor system, such as an infrared sensor, disposed thereon. The self-propelled cleaning device 100 can control the driving wheel module 141 through the events detected by the buffer 122, such as obstacles and walls, so that the self-propelled cleaning device 100 responds to the events, such as staying away from the obstacles.

控制模組設置在機器主體110內的電路主機板上,包括與非暫時性記憶體,例如硬碟、快閃記憶體、隨機存取記憶體,通信的計算處理器,例如中央處理單元、應用處理器,應用處理器根據雷射測距裝置回饋的障礙物資訊利用定位演算法,例如即時定位與地圖構建(SLAM,全稱Simultaneous Localization And Mapping),繪製自移清潔設備100所在環境中的即時地圖。並且結合緩衝器122上所設置感測器、懸崖感測器、磁力計、加速度計、陀螺儀、里程計等感測裝置回饋的距離資訊、速度資訊綜合判斷自移清潔設備100當前處於何種工作狀態、位於何位置,以及自移清潔設備100當前位姿等,如過門檻,上地毯,位於懸崖處,上方或者下方被卡住,塵盒滿,被拿起等等,還會針對不同情況給出具體的下一步動作策略,使得自移清潔設備100有更好的清掃性能和用戶體驗。The control module is disposed on a circuit board in the machine body 110, and includes a computing processor, such as a central processing unit and an application processor, that communicates with a non-temporary memory, such as a hard disk, a flash memory, or a random access memory. The application processor utilizes a positioning algorithm, such as a real-time positioning and mapping (SLAM) algorithm, based on obstacle information fed back by a laser ranging device to draw a real-time map of the environment in which the self-moving cleaning device 100 is located. In addition, the distance information and speed information fed back by the sensors, cliff sensors, magnetometers, accelerometers, gyroscopes, odometers and other sensing devices installed on the buffer 122 are combined to comprehensively judge the current working state and position of the self-moving cleaning device 100, as well as the current posture of the self-moving cleaning device 100, such as passing a threshold, being on a carpet, being on a cliff, being stuck above or below, the dust box being full, being picked up, etc., and specific next-step action strategies are given for different situations, so that the self-moving cleaning device 100 has better cleaning performance and user experience.

如圖2所示,驅動系統140可基於具有距離和角度資訊例如x、y及θ分量的驅動命令而操縱機器主體110跨越地面行駛。驅動系統140包含驅動輪模組141,驅動輪模組141可以同時控制左輪和右輪,為了更為精確地控制機器的運動,優選驅動輪模組141分別包括左驅動輪模組和右驅動輪模組。左、右驅動輪模組沿著由機器主體110界定的橫向軸設置。為了自移清潔設備100能夠在地面上更為穩定地運動或者更強的運動能力,自移清潔設備100可以包括一個或者多個從動輪142,從動輪142包括但不限於萬向輪。驅動輪模組141包括行走輪和驅動馬達以及控制驅動馬達的控制電路,驅動輪模組141還可以連接測量驅動電流的電路和里程計。驅動輪可具有偏置下落式懸掛系統,以可移動方式緊固,例如以可旋轉方式附接到機器主體110,且接收向下及遠離機器主體110偏置的彈簧偏置。彈簧偏置允許驅動輪以一定的著地力維持與地面的接觸及牽引,同時自移清潔設備100的清潔元件183也以一定的壓力接觸地面。As shown in FIG2 , the drive system 140 can control the machine body 110 to travel across the ground based on a drive command having distance and angle information, such as x, y and θ components. The drive system 140 includes a drive wheel module 141, which can control the left wheel and the right wheel at the same time. In order to more accurately control the movement of the machine, it is preferred that the drive wheel module 141 includes a left drive wheel module and a right drive wheel module. The left and right drive wheel modules are arranged along the transverse axis defined by the machine body 110. In order to enable the self-propelled cleaning device 100 to move more stably or have stronger mobility on the ground, the self-propelled cleaning device 100 may include one or more driven wheels 142, and the driven wheels 142 include but are not limited to universal wheels. The driving wheel module 141 includes a travel wheel and a driving motor and a control circuit for controlling the driving motor. The driving wheel module 141 can also be connected to a circuit and an odometer for measuring the driving current. The driving wheel can have a biased drop-down suspension system, which is fastened in a movable manner, for example, attached to the machine body 110 in a rotatable manner, and receives a spring bias that is biased downward and away from the machine body 110. The spring bias allows the drive wheel to maintain contact and traction with the ground with a certain ground force, while the cleaning element 183 of the self-propelled cleaning device 100 also contacts the ground with a certain pressure.

能源系統包括充電電池,例如鎳氫電池和鋰電池。充電電池可以連接有充電控制電路、電池組充電溫度檢測電路和電池欠壓監測電路,充電控制電路、電池組充電溫度檢測電路、電池欠壓監測電路再與單片機控制電路相連。主機通過設置在機身側方或者下方的充電電極與基站200連接進行充電。The energy system includes a rechargeable battery, such as a nickel-metal hydride battery and a lithium battery. The rechargeable battery can be connected to a charging control circuit, a battery pack charging temperature detection circuit, and a battery undervoltage monitoring circuit, and the charging control circuit, the battery pack charging temperature detection circuit, and the battery undervoltage monitoring circuit are further connected to the single-chip microcomputer control circuit. The host is charged by connecting to the base station 200 through a charging electrode arranged on the side or bottom of the fuselage.

人機交互系統170包括主機面板上的按鍵,按鍵供用戶進行功能選擇;還可以包括顯示屏和/或指示燈和/或喇叭,顯示屏、指示燈和喇叭向用戶展示當前機器所處狀態或者功能選擇項;還可以包括手機客戶端程式。對於路徑導航型自移清潔設備100,在手機客戶端可以向用戶展示設備所在環境的地圖,以及機器所處位置,可以向用戶提供更為豐富和人性化的功能項。The human-machine interaction system 170 includes buttons on the host panel, which are used by the user to select functions; it may also include a display screen and/or an indicator light and/or a speaker, which display the current state of the machine or function options to the user; it may also include a mobile client program. For the path navigation type self-moving cleaning device 100, a map of the environment where the device is located and the location of the machine can be displayed to the user on the mobile client, which can provide the user with more abundant and humanized functions.

清潔系統150包括濕式清潔系統,即自移清潔設備100可以為拖地機,或者,清潔系統150包括濕式清潔系統和乾式清潔系統151,即自移清潔設備100可以為掃拖一體機。The cleaning system 150 includes a wet cleaning system, that is, the self-propelled cleaning device 100 can be a mopping machine, or the cleaning system 150 includes a wet cleaning system and a dry cleaning system 151, that is, the self-propelled cleaning device 100 can be a sweeping and mopping machine.

如圖2所示,本新型實施例所提供的乾式清潔系統151可以包括滾刷、塵盒、風機、出風口。與地面具有一定干涉的滾刷將地面上的垃圾掃起並卷帶到滾刷與塵盒之間的吸塵口前方,然後被風機產生並經過塵盒的有吸力的氣體吸入塵盒。乾式清潔系統151還可包括具有旋轉軸的邊刷152,旋轉軸相對於地面成一定角度,以用於將碎屑移動到清潔系統150的滾刷區域中。As shown in FIG2 , the dry cleaning system 151 provided by the novel embodiment may include a roller brush, a dust box, a fan, and an air outlet. The roller brush that has a certain interference with the ground sweeps up the garbage on the ground and rolls it to the front of the dust suction port between the roller brush and the dust box, and then the suction gas generated by the fan and passing through the dust box is sucked into the dust box. The dry cleaning system 151 may also include a side brush 152 with a rotating shaft, and the rotating shaft is at a certain angle relative to the ground to move the debris into the roller brush area of the cleaning system 150.

其中,濕式清潔系統可以包括:清潔元件180、送水機構、儲液箱等。其中,清潔元件180可以設置於儲液箱下方,儲液箱內部的清潔液通過送水機構傳輸至清潔元件180,以使清潔元件180對待清潔平面進行濕式清潔。在本新型其他實施例中,儲液箱內部的清潔液也可以直接噴灑至待清潔平面,清潔元件180通過將清潔液塗抹均勻實現對平面的清潔。可以理解的是,自移清潔設備100設置有與儲液箱連通的注水口,利用注水口,能夠將自移清潔設備100外部的液體補充至儲液箱中,以實現對儲液箱的補水操作。The wet cleaning system may include: a cleaning element 180, a water supply mechanism, a liquid storage tank, etc. The cleaning element 180 may be disposed below the liquid storage tank, and the cleaning liquid inside the liquid storage tank is transmitted to the cleaning element 180 through the water supply mechanism, so that the cleaning element 180 performs wet cleaning on the surface to be cleaned. In other embodiments of the present invention, the cleaning liquid inside the liquid storage tank may also be directly sprayed onto the surface to be cleaned, and the cleaning element 180 cleans the surface by evenly applying the cleaning liquid. It can be understood that the self-moving cleaning device 100 is provided with a water injection port connected to the liquid storage tank, and the liquid outside the self-moving cleaning device 100 can be replenished into the liquid storage tank by using the water injection port to realize the water replenishment operation of the liquid storage tank.

如7和圖8所示,本新型實施例提供的清潔元件180,包括設置於機器主體110上的運動機構181和清潔元件183,即整個清潔元件180可以通過運動機構181安裝在機器主體110上,清潔元件180隨著機器主體110的移動而移動,以實現拖地功能。其中,運動機構181用於驅動清潔元件183動作,如運動機構181可以驅動清潔元件183升降、運動機構181也可以驅動清潔元件183旋轉,由此,可以根據清潔元件183是否與待清潔表面接觸的需求,通過運動機構181,即可實現清潔元件183的升降和旋轉操作,以滿足清潔元件183的不同功能需求,即能夠實現清潔元件183的區分策略的處理,提高了自清潔設備的清潔性能,提高了清潔效率和使用體驗。As shown in Figures 7 and 8, the cleaning element 180 provided in the present novel embodiment includes a moving mechanism 181 and a cleaning element 183 disposed on the machine body 110, that is, the entire cleaning element 180 can be installed on the machine body 110 through the moving mechanism 181, and the cleaning element 180 moves with the movement of the machine body 110 to achieve the mopping function. Among them, the motion mechanism 181 is used to drive the cleaning element 183 to move, such as the motion mechanism 181 can drive the cleaning element 183 to rise and fall, and the motion mechanism 181 can also drive the cleaning element 183 to rotate. Therefore, according to the requirement of whether the cleaning element 183 is in contact with the surface to be cleaned, the lifting and rotating operations of the cleaning element 183 can be realized through the motion mechanism 181 to meet the different functional requirements of the cleaning element 183, that is, the processing of the differentiation strategy of the cleaning element 183 can be realized, thereby improving the cleaning performance of the self-cleaning equipment, and improving the cleaning efficiency and usage experience.

其中,在自移清潔設備100的前進方向上,清潔元件183位於乾式清潔系統151的後部,清潔元件183通常可以是織物、海綿等具有吸水性的柔性物質。在本方案中,清潔元件183可以為至少一個旋轉的轉盤,自移機器人儲液箱中的水引導至清潔元件183,浸濕的清潔元件183通過旋轉運動將地面上的污漬清除。In the forward direction of the self-propelled cleaning device 100, the cleaning element 183 is located at the rear of the dry cleaning system 151. The cleaning element 183 can generally be a flexible material with water absorption such as fabric or sponge. In this solution, the cleaning element 183 can be at least one rotating turntable. The water in the liquid storage tank of the self-propelled robot is guided to the cleaning element 183. The wet cleaning element 183 removes the dirt on the ground through the rotating motion.

進一步地,當自移清潔設備100在移動的過程中,在一些不需要拖地的場景,如往返基站200、或者進行地毯清潔的情況下,可以利用控制模組控制運動機構181驅動清潔元件183升起,可以理解的是,清潔元件183升起可以為清潔元件183的最低下表面高於驅動輪的最低下表面,使得在該種情況下,驅動輪帶動自移清潔設備100移動的過程中,清潔元件183不會與待清潔表面接觸,由此可以避免在不需要拖地的場景下,清潔元件183與待清潔表面接觸而使待清潔表面二次污染的情況,有利於提高自移清潔設備100的清潔性,提高清潔效率和使用體驗。Furthermore, when the self-propelled cleaning device 100 is moving, in some scenarios where mopping is not required, such as traveling to and from the base station 200 or cleaning a carpet, the control module can be used to control the motion mechanism 181 to drive the cleaning element 183 to rise. It can be understood that the cleaning element 183 can be raised when the lowest lower surface of the cleaning element 183 is higher than the lowest lower surface of the driving wheel. So that in this case, during the process of the driving wheel driving the self-moving cleaning device 100 to move, the cleaning element 183 will not contact the surface to be cleaned, thereby avoiding the situation where the cleaning element 183 contacts the surface to be cleaned and causes secondary contamination of the surface to be cleaned in a scene where mopping is not required, which is beneficial to improving the cleaning performance of the self-moving cleaning device 100, improving the cleaning efficiency and the usage experience.

當在自移清潔設備100移動的過程中,在一些需要拖地的場景,如對地面進行濕式處理的情況下,可以利用控制模組控制運動機構181驅動清潔元件183下降,使清潔元件183的最低下表面與待清潔表面干涉接觸,同時,利用控制模組控制運動機構181驅動清潔元件183旋轉,由此,使得驅動輪帶動自移清潔設備100移動的過程中,清潔元件183會與待清潔表面接觸干涉,以實現對待清潔表面的拖地操作。When the self-moving cleaning device 100 is moving, in some scenarios where mopping is required, such as wet treatment of the floor, the control module can be used to control the motion mechanism 181 to drive the cleaning element 183 to descend, so that the lowest lower surface of the cleaning element 183 interferes with the surface to be cleaned. At the same time, the control module is used to control the motion mechanism 181 to drive the cleaning element 183 to rotate, thereby making the driving wheel drive the self-moving cleaning device 100 to move, and the cleaning element 183 will contact and interfere with the surface to be cleaned, so as to realize the mopping operation of the surface to be cleaned.

如圖7和圖8所示,在本新型提供的一些可能實現的實施例中,自移清潔設備100的清潔元件183與運動機構181通過第一磁吸組件可拆卸連接,由此,能夠快速、便利地將清潔元件183與運動機構181分離,以分別對清潔元件183和運動機構181進行維修或清理,操作方便。需要說明的是,由於清潔元件183本身存在向下的重力,第一磁吸組件之間的至少部分磁吸力能夠克服清潔元件183的自身重力、清潔元件183在進行拖地操作時的阻力、震動等,即第一磁吸組件之間的磁吸力中的一部分,能夠抵消清潔元件183的自身重力、清潔元件183在進行拖地操作時的阻力、震動等,使得通過第一磁吸組件連接在運動機構181上的清潔元件183,可以正常進行拖地、升降、旋轉等操作。也就是說,為了確保清潔元件183能夠可靠安裝在運動機構上並正常工作,第一磁吸組件的磁吸力是大於清潔元件183自身重力的,第一磁吸組件利用其大於清潔元件183自身重力的部分磁吸力,將清潔元件183可靠地吸附在運動機構181上。As shown in Figures 7 and 8, in some possible embodiments provided by the present invention, the cleaning element 183 and the moving mechanism 181 of the self-moving cleaning device 100 are detachably connected via a first magnetic attraction assembly, thereby enabling the cleaning element 183 to be quickly and conveniently separated from the moving mechanism 181 so as to perform maintenance or cleaning on the cleaning element 183 and the moving mechanism 181 separately, which is easy to operate. It should be noted that, due to the downward gravity of the cleaning element 183 itself, at least part of the magnetic attraction force between the first magnetic components can overcome the self-gravity of the cleaning element 183, the resistance and vibration of the cleaning element 183 during the mopping operation, that is, part of the magnetic attraction force between the first magnetic components can offset the self-gravity of the cleaning element 183, the resistance and vibration of the cleaning element 183 during the mopping operation, so that the cleaning element 183 connected to the motion mechanism 181 through the first magnetic component can perform mopping, lifting, rotation and other operations normally. That is to say, in order to ensure that the cleaning element 183 can be reliably installed on the moving mechanism and work normally, the magnetic force of the first magnetic component is greater than the weight of the cleaning element 183 itself. The first magnetic component uses the partial magnetic force that is greater than the weight of the cleaning element 183 itself to reliably adsorb the cleaning element 183 on the moving mechanism 181.

如圖8所示,在上述實施例中,清潔元件183上還設置有第一磁性件1831,基站200上設置有電磁鐵230,可以理解的是,電磁鐵230是通電產生電磁的一種裝置。其中,通電的電磁鐵230與第一磁性件1831的磁吸力大於第一磁吸組件的磁吸力與清潔元件183的重力的差,由此,當自移清潔設備100停靠在基站200上,基站200上的電磁鐵230通電,由於通電的電磁鐵230與清潔元件183上的第一磁性件1831之間的磁吸力大於第一磁吸組件的磁吸力與清潔元件183的自身重力的差,使得原來吸附在運動機構181上的清潔元件183能夠可靠地被基站200上的電磁鐵230所吸附,即清潔元件183由與運動機構181吸附連接轉變為與基站200上的通電的電磁鐵230吸附連接,進而移動運動機構181,可以使運動機構181與清潔元件183之間能夠克服第一磁吸組件的磁吸力而分離,實現清潔元件183與運動機構181的自動拆卸分離,整個過程無需用戶手動操作,解放了用戶的雙手,提升清潔元件183拆卸的操作體驗。As shown in FIG. 8 , in the above embodiment, a first magnetic member 1831 is further disposed on the cleaning element 183, and an electromagnetic iron 230 is disposed on the base station 200. It can be understood that the electromagnetic iron 230 is a device that generates electromagnetic when powered. The magnetic attraction between the powered electromagnetic iron 230 and the first magnetic component 1831 is greater than the difference between the magnetic attraction between the first magnetic attraction component and the gravity of the cleaning element 183. Therefore, when the self-moving cleaning device 100 is docked on the base station 200, the electromagnetic iron 230 on the base station 200 is powered. Since the magnetic attraction between the powered electromagnetic iron 230 and the first magnetic component 1831 on the cleaning element 183 is greater than the difference between the magnetic attraction between the first magnetic attraction component and the gravity of the cleaning element 183, the cleaning element 183 originally adsorbed on the moving mechanism 181 can be moved. The cleaning element 183 can be reliably adsorbed by the electromagnet 230 on the base station 200, that is, the adsorption connection with the moving mechanism 181 is changed to the adsorption connection with the energized electromagnet 230 on the base station 200, and then the moving mechanism 181 is moved, so that the moving mechanism 181 and the cleaning element 183 can overcome the magnetic attraction of the first magnetic attraction component and separate, thereby realizing the automatic disassembly and separation of the cleaning element 183 and the moving mechanism 181. The entire process does not require manual operation by the user, freeing the user's hands and improving the operational experience of disassembling the cleaning element 183.

可以理解的是,當需要將位於基站200上的清潔元件183連接在運動機構181上時,將電磁鐵230斷電,由於斷電的電磁鐵230不會產生電磁,即斷電的電磁鐵230與第一磁性件1831之間沒有吸附力,清潔元件183相當於無限制的放置在基站200上,由此,可以將運動機構181移動至清潔元件183的合適位置處,在第一磁吸組件的作用下,清潔元件183能夠順利、可靠地吸附連接在運動機構181上,該過程同樣無需用戶手動操作,解放了用戶的雙手,提升清潔元件183與運動機構181連接的操作體驗。It can be understood that when the cleaning element 183 located on the base station 200 needs to be connected to the moving mechanism 181, the electromagnet 230 is de-energized. Since the de-energized electromagnet 230 does not generate electromagnetic force, that is, there is no adsorption force between the de-energized electromagnet 230 and the first magnetic member 1831, the cleaning element 183 is equivalent to being placed on the base station 200 without restriction. Therefore, the moving mechanism 181 can be moved to a suitable position of the cleaning element 183. Under the action of the first magnetic attraction component, the cleaning element 183 can be smoothly and reliably adsorbed and connected to the moving mechanism 181. This process also does not require manual operation by the user, freeing the user's hands and improving the operating experience of connecting the cleaning element 183 with the moving mechanism 181.

在本新型實施例中,第一磁性件1831可以為導磁鐵片、或滿足要求的其他磁性件。例如,當第一磁性件1831為導磁鐵片時,由於鐵片本身並不具體磁吸性能,因此,自移清潔設備在執行清潔任務時,第一磁性件1831不會將地面的鐵屑等雜物吸至清潔元件183上。In the present embodiment, the first magnetic member 1831 can be a magnetic iron sheet or other magnetic member that meets the requirements. For example, when the first magnetic member 1831 is a magnetic iron sheet, since the iron sheet itself does not have a specific magnetic attraction property, when the self-moving cleaning device performs a cleaning task, the first magnetic member 1831 will not attract iron filings and other debris on the ground to the cleaning element 183.

如圖3和圖4所示,本新型實施例提供的基站200,設置有用於容納自移清潔設備100的容納腔211,即當自移清潔設備100需要充電、和/或注水、和/或清洗清潔元件183、和/或集塵時,自移清潔設備100可以停靠在基站200的容納腔211內。As shown in Figures 3 and 4, the base station 200 provided in the present novel embodiment is provided with a receiving chamber 211 for receiving the self-moving cleaning device 100, that is, when the self-moving cleaning device 100 needs to be charged, and/or filled with water, and/or the cleaning element 183 needs to be cleaned, and/or dust is collected, the self-moving cleaning device 100 can be docked in the receiving chamber 211 of the base station 200.

其中,電磁鐵230設置在容納腔211底壁上,第一磁性件1831位於第一磁吸組件的下方,由此,當自移清潔設備100停靠在基站200上,並配合運動機構181驅動清潔元件183相對於機器主體110升降,即可實現清潔元件183的主動拆卸和安裝,操作簡單,使用方便。Among them, the electromagnet 230 is arranged on the bottom wall of the accommodating chamber 211, and the first magnetic member 1831 is located below the first magnetic attraction assembly. Therefore, when the self-moving cleaning device 100 is docked on the base station 200, and cooperates with the moving mechanism 181 to drive the cleaning element 183 to rise and fall relative to the machine body 110, the active disassembly and installation of the cleaning element 183 can be realized, and the operation is simple and easy to use.

具體地,在自移清潔設備100靠近基站200移動和停靠基站200的過程中,運動機構181可以驅動清潔元件183抬升至脫離待清潔表面,以避免清潔元件183與基站200干涉,使得自移清潔設備100能夠準確地停靠在基站200的合適位置處。然後,運動機構181可以驅動清潔元件183下降,由於電磁鐵230位於容納腔211的底壁,第一磁性件1831位於第一磁吸組件的下方,下降後的清潔元件183能夠使第一磁性件1831儘量靠近基站200的容納腔211底壁上的電磁鐵230,電磁鐵230通電後,電磁鐵230與第一磁性件1831之間的磁吸力大於第一磁吸組件的磁性力與清潔元件183的重力的差,所以,此時,清潔元件183被通電的電磁鐵230可靠吸附,運動機構181反向動作,如執行驅動清潔元件183抬升的操作,由於清潔元件183被電磁鐵230可靠吸附,所以,清潔元件183無法隨運動機構181一起抬升,清潔元件183被較大的磁吸力留在了基站200上,從而完成了清潔元件183的拆卸動作。Specifically, in the process of the self-moving cleaning device 100 moving close to the base station 200 and docking at the base station 200, the motion mechanism 181 can drive the cleaning element 183 to be lifted away from the surface to be cleaned to avoid interference between the cleaning element 183 and the base station 200, so that the self-moving cleaning device 100 can accurately dock at a suitable position of the base station 200. Then, the motion mechanism 181 can drive the cleaning element 183 to descend. Since the electromagnet 230 is located on the bottom wall of the receiving chamber 211 and the first magnetic member 1831 is located below the first magnetic attraction assembly, the descending cleaning element 183 can make the first magnetic member 1831 as close as possible to the electromagnet 230 on the bottom wall of the receiving chamber 211 of the base station 200. After the electromagnet 230 is energized, the magnetic attraction force between the electromagnet 230 and the first magnetic member 1831 is greater than the magnetic force of the first magnetic attraction assembly. The cleaning element 183 is reliably adsorbed by the energized electromagnet 230 at this time, and the moving mechanism 181 moves in the opposite direction, such as executing the operation of driving the cleaning element 183 to lift. Since the cleaning element 183 is reliably adsorbed by the electromagnet 230, the cleaning element 183 cannot be lifted together with the moving mechanism 181, and the cleaning element 183 is retained on the base station 200 by the larger magnetic attraction force, thereby completing the disassembly operation of the cleaning element 183.

同樣的道理,清潔元件183與運動機構181安裝過程與上述相反,當自移清潔設備100停靠在基站200的容納腔211內的合適位置後,運動機構181執行驅動清潔元件183下降的操作,使運動機構181的末端儘量靠近清潔元件183或與清潔元件183的頂部接觸,電磁鐵230斷電,在第一磁吸組件的作用下,清潔元件183能夠順利、可靠地吸附連接在運動機構181上,由此,完成清潔元件183與運動機構181的連接。最後,運動機構181可以執行驅動清潔元件183抬升的操作,使清潔元件183儘量靠近機器主體110的底部,由此,便於自移清潔設備100能夠順利離開基站200。By the same token, the installation process of the cleaning element 183 and the motion mechanism 181 is opposite to that described above. When the self-moving cleaning device 100 is docked at a suitable position in the accommodating cavity 211 of the base station 200, the motion mechanism 181 drives the cleaning element 183 to descend, so that the end of the motion mechanism 181 is as close as possible to the cleaning element 183 or contacts the top of the cleaning element 183. The electromagnet 230 is de-energized, and under the action of the first magnetic attraction component, the cleaning element 183 can be smoothly and reliably adsorbed and connected to the motion mechanism 181, thereby completing the connection between the cleaning element 183 and the motion mechanism 181. Finally, the motion mechanism 181 can drive the cleaning element 183 to lift up, so that the cleaning element 183 is as close to the bottom of the machine body 110 as possible, thereby facilitating the self-moving cleaning device 100 to leave the base station 200 smoothly.

如圖8所示,在本新型提供的一些可能實現的實施例中,第一磁吸組件包括第一配合件1812和第二配合件1832,第一配合件1812設置在運動機構181上,第二配合件1832設置在清潔元件183上,第一配合件1812和第二配合件1832中的一個為磁吸件,另一個為磁吸件或磁性件。由此,第一配合件1812和第二配合件1832利用磁吸作用,即可實現清潔元件183與運動機構181的拆卸和安裝。As shown in FIG8 , in some possible embodiments provided by the present invention, the first magnetic attraction assembly includes a first matching piece 1812 and a second matching piece 1832. The first matching piece 1812 is disposed on the motion mechanism 181, and the second matching piece 1832 is disposed on the cleaning element 183. One of the first matching piece 1812 and the second matching piece 1832 is a magnetic attraction piece, and the other is a magnetic attraction piece or a magnetic piece. Thus, the first matching piece 1812 and the second matching piece 1832 can realize the disassembly and installation of the cleaning element 183 and the motion mechanism 181 by using the magnetic attraction effect.

進一步地,磁吸件可以為永磁體,磁性件可以為導磁鐵片。其中,永磁體可以設置在清潔元件183上,導磁鐵片設置在運動機構181上,或者,永磁體可以設置在運動機構181上,導磁鐵片設置在清潔元件183上。Furthermore, the magnetic attraction member can be a permanent magnet, and the magnetic member can be a magnetic iron sheet. The permanent magnet can be arranged on the cleaning element 183, and the magnetic iron sheet is arranged on the moving mechanism 181, or the permanent magnet can be arranged on the moving mechanism 181, and the magnetic iron sheet is arranged on the cleaning element 183.

具體地,如8圖所示,永磁體設置在清潔元件183上,導磁鐵片設置在運動機構181上。可以理解的是,可以合理設置清潔元件183上的永磁體與第一磁性件1831的距離,使永磁體與第一磁性件1831之間的沒有磁性作用,或者磁性作用較弱。Specifically, as shown in FIG8 , the permanent magnet is disposed on the cleaning element 183, and the magnetic iron sheet is disposed on the moving mechanism 181. It is understandable that the distance between the permanent magnet on the cleaning element 183 and the first magnetic member 1831 can be reasonably set so that there is no magnetic effect between the permanent magnet and the first magnetic member 1831, or the magnetic effect is weak.

進一步地,如圖8所示,運動機構181的輸出端包括套筒1811,可以理解的是,運動機構181還包括驅動部1814、傳動部1815,驅動部1814通過傳動部1815帶動套筒1811運動,如驅動部1814可以通過傳動部1815帶動套筒1811升降運動,即套筒1811可以理解為運動機構181的一個輸出端。其中,第一配合件1812設置在套筒1811的內部,套筒1811的開口朝下,清潔元件183包括適於延伸至套筒1811內的連接部,第二配合件1832設置在連接部的頂端。由此,當第一配合件1812和第二配合件1832吸附在一起後,清潔元件183可以隨著套筒1811同步運動,進而能夠實現清潔元件183的升降操作。Further, as shown in FIG8 , the output end of the motion mechanism 181 includes a sleeve 1811. It can be understood that the motion mechanism 181 also includes a driving part 1814 and a transmission part 1815. The driving part 1814 drives the sleeve 1811 to move through the transmission part 1815. For example, the driving part 1814 can drive the sleeve 1811 to move up and down through the transmission part 1815, that is, the sleeve 1811 can be understood as an output end of the motion mechanism 181. Among them, the first matching piece 1812 is arranged inside the sleeve 1811, and the opening of the sleeve 1811 faces downward. The cleaning element 183 includes a connecting part suitable for extending into the sleeve 1811, and the second matching piece 1832 is arranged at the top end of the connecting part. Therefore, when the first matching piece 1812 and the second matching piece 1832 are adsorbed together, the cleaning element 183 can move synchronously with the sleeve 1811, thereby realizing the lifting operation of the cleaning element 183.

進一步地,由於第一配合件1812位於套筒1811的內部,第二配合件1832設置在連接部的頂端,在第一配合件1812和第二配合件1832吸附在一起後,吸合的第一配合件1812和第二配合件1832均位於套筒1811內,由此利用套筒1811能夠對第一配合件1812和第二配合件1832起到良好的保護作用,避免第一配合件1812和第二配合件1832與外物碰撞而錯位或分離的情況,有利於提高第一配合件1812和第二配合件1832連接的可靠性和準確性,進而提高清潔元件183與套筒1811連接的可靠性和準確性。Furthermore, since the first fitting part 1812 is located inside the sleeve 1811 and the second fitting part 1832 is arranged at the top end of the connecting part, after the first fitting part 1812 and the second fitting part 1832 are adsorbed together, the attracted first fitting part 1812 and the second fitting part 1832 are both located inside the sleeve 1811. Therefore, the sleeve 1811 can play a good protective role for the first fitting part 1812 and the second fitting part 1832, avoiding the first fitting part 1812 and the second fitting part 1832 from colliding with foreign objects and being misplaced or separated, which is beneficial to improving the reliability and accuracy of the connection between the first fitting part 1812 and the second fitting part 1832, and further improving the reliability and accuracy of the connection between the cleaning element 183 and the sleeve 1811.

在上述實施例中,運動機構181的輸出端還包括延伸至套筒1811內的旋轉部1816,可以理解的是,旋轉部1816與傳動部1815連接,驅動部1814通過傳動部1815能夠帶動旋轉部1816轉動,由此,當第一配合件1812和第二配合件1832吸附後,能夠帶動清潔元件183旋轉,以實現拖地操作。In the above-mentioned embodiment, the output end of the motion mechanism 181 further includes a rotating portion 1816 extending into the sleeve 1811. It can be understood that the rotating portion 1816 is connected to the transmission portion 1815, and the driving portion 1814 can drive the rotating portion 1816 to rotate through the transmission portion 1815. Therefore, when the first matching member 1812 and the second matching member 1832 are adsorbed, they can drive the cleaning element 183 to rotate to realize the mopping operation.

其中,第一配合件1812安裝在旋轉部1816的下方端面上,由此,便於第一配合件1812與第二配合件1832可靠貼合,確保良好的吸附性,提高清潔元件183與運動機構181連接的可靠性。The first matching piece 1812 is installed on the lower end surface of the rotating portion 1816, thereby facilitating reliable fitting of the first matching piece 1812 and the second matching piece 1832, ensuring good adsorption and improving the reliability of the connection between the cleaning element 183 and the motion mechanism 181.

可以理解的是,在一具體示例中,運動機構181可以包括一個驅動部1814,利用一個驅動部1814通過傳動部1815同時驅動套筒1811升降、旋轉部1816旋轉,即清潔元件183的升降操作和旋轉操作是同一個驅動部1814驅動的,由此,可以簡化運動機構181的結構,降低成本,且能夠滿足運動機構181結構緊湊、體積較小的設計需求。It can be understood that, in a specific example, the motion mechanism 181 may include a driving part 1814, which drives the sleeve 1811 to rise and fall and the rotating part 1816 to rotate through the transmission part 1815 at the same time. That is, the lifting and rotating operations of the cleaning element 183 are driven by the same driving part 1814. In this way, the structure of the motion mechanism 181 can be simplified, the cost can be reduced, and the design requirements of the motion mechanism 181 with a compact structure and a small size can be met.

在另一具體示例中(圖中未示出),運動機構可以包括兩個驅動部,一個驅動部通過傳動部驅動套筒升降,另一個驅動部通過另一個傳動部驅動旋轉部旋轉,以分別實現套筒的升降操作、旋轉部的旋轉操作,即清潔元件的升降操作和旋轉操作是兩個驅動部分別驅動的。In another specific example (not shown in the figure), the moving mechanism may include two driving parts, one driving part drives the sleeve to rise and fall through the transmission part, and the other driving part drives the rotating part to rotate through another transmission part, so as to respectively realize the lifting operation of the sleeve and the rotation operation of the rotating part, that is, the lifting operation and the rotation operation of the cleaning element are driven by the two driving parts respectively.

在上述實施例中,套筒1811的內部設置有導向部1813,導向部1813用於引導第二配合件1832與第一配合件1812貼合。也就是說,在導向部1813的引導下,第二配合件1832能夠可靠、準確與第一配合件1812貼合,進而提高第一配合件1812和第二配合件1832連接的可靠性和準確性,提高清潔元件183與套筒1811連接的可靠性和準確性。In the above embodiment, the sleeve 1811 is provided with a guide portion 1813 inside, and the guide portion 1813 is used to guide the second matching piece 1832 to fit with the first matching piece 1812. In other words, under the guidance of the guide portion 1813, the second matching piece 1832 can fit with the first matching piece 1812 reliably and accurately, thereby improving the reliability and accuracy of the connection between the first matching piece 1812 and the second matching piece 1832, and improving the reliability and accuracy of the connection between the cleaning element 183 and the sleeve 1811.

其中,導向部1813為凸台,第一配合件1812位於凸台遠離套筒1811開口的一側,凸台背離第一配合件1812的一側設置為導向斜面,其中,凸台便於加工,導向斜面也便於加工,有利於降低製造成本。The guiding portion 1813 is a boss, the first matching piece 1812 is located on the side of the boss away from the opening of the sleeve 1811, and the side of the boss away from the first matching piece 1812 is set as a guiding slope. The boss is easy to process, and the guiding slope is also easy to process, which is beneficial to reducing manufacturing costs.

通過將第一配合件1812設置在凸台遠離套筒1811開口的一側,使得運動機構181在靠近與其分離的清潔元件183的過程中,清潔元件183會依次經過套筒1811的開口、凸台,然後與第一配合件1812吸附連接,由此,使得清潔元件183的第二配合件1832在凸台的導向斜面的作用下,能夠順利、可靠地與第一配合件1812貼合,確保清潔元件183與套筒1811連接的可靠性和準確性。By arranging the first fitting part 1812 on the side of the boss away from the opening of the sleeve 1811, when the moving mechanism 181 approaches the cleaning element 183 separated from it, the cleaning element 183 will pass through the opening and the boss of the sleeve 1811 in sequence, and then be adsorbed and connected with the first fitting part 1812. As a result, the second fitting part 1832 of the cleaning element 183 can be smoothly and reliably fitted with the first fitting part 1812 under the action of the guiding slope of the boss, thereby ensuring the reliability and accuracy of the connection between the cleaning element 183 and the sleeve 1811.

如圖5和圖6所示,在本新型提供的一些可能實現的實施例中,基站200還包括清洗盤220,清洗盤220設置在容納腔211的底壁上,清洗盤220用於與自移清潔設備100的清潔元件183干涉以將清潔元件183上的髒污去除。由此當自移清潔設備100停靠在基站200的容納腔211時,利用清洗盤220能夠實現對清潔元件183的清洗操作,以使髒污的清潔元件183變為乾淨的清潔元件183,以供下次拖地使用。As shown in FIG. 5 and FIG. 6 , in some possible implementations provided by the present invention, the base station 200 further includes a cleaning plate 220, which is disposed on the bottom wall of the receiving chamber 211. The cleaning plate 220 is used to interfere with the cleaning element 183 of the self-moving cleaning device 100 to remove dirt from the cleaning element 183. Therefore, when the self-moving cleaning device 100 is docked in the receiving chamber 211 of the base station 200, the cleaning plate 220 can be used to clean the cleaning element 183, so that the dirty cleaning element 183 becomes a clean cleaning element 183 for the next mopping.

進一步地,清洗盤220蓋設在電磁鐵230的上方,需要說明的是,電磁具有良好的穿透力,通電的電磁鐵230產生的電磁可以穿透清洗盤220與合適位置處的第一磁性件1831進行吸合作用,即清洗盤220並不會阻礙電磁的穿透。通過將清洗盤220蓋設在電磁鐵230的上方,利用清洗盤220對電磁鐵230起到良好的保護作用,避免電磁鐵230直接暴露在外部環境容易污染或損壞的問題,有利於提高電磁鐵230的使用壽命。Furthermore, the cleaning plate 220 is disposed above the electromagnetic iron 230. It should be noted that the electromagnetic has good penetrating power. The electromagnetic generated by the energized electromagnetic iron 230 can penetrate the cleaning plate 220 and react with the first magnetic member 1831 at a suitable position, that is, the cleaning plate 220 does not hinder the penetration of the electromagnetic. By covering the cleaning plate 220 above the electromagnetic iron 230, the cleaning plate 220 is used to provide good protection for the electromagnetic iron 230, avoiding the problem that the electromagnetic iron 230 is directly exposed to the external environment and is easily contaminated or damaged, which is conducive to improving the service life of the electromagnetic iron 230.

如圖5、圖6所示,在本新型提供的一些可能實現的實施例中,清洗盤220與基站200可拆卸連接,由此,可以將清洗盤220整體上從基站200上拆卸下來,對清洗盤220進行清洗,有利於提高清洗盤220清洗的徹底性,避免清洗盤220清洗不徹底、或不方便清洗而使髒污長時間殘留在清洗盤220上存在產生異味的可能性,有利於提高清洗盤220的清洗體驗,提高用戶使用的滿意度。同時,清洗盤220與基站200可拆卸連接,有利於提高維修效率。As shown in FIG. 5 and FIG. 6 , in some possible embodiments provided by the present invention, the cleaning plate 220 is detachably connected to the base station 200, so that the cleaning plate 220 can be removed from the base station 200 as a whole to clean the cleaning plate 220, which is conducive to improving the thoroughness of cleaning the cleaning plate 220, avoiding the possibility of the cleaning plate 220 not being thoroughly cleaned or inconveniently cleaned, and causing dirt to remain on the cleaning plate 220 for a long time and produce odor, which is conducive to improving the cleaning experience of the cleaning plate 220 and improving the user's satisfaction. At the same time, the cleaning plate 220 is detachably connected to the base station 200, which is conducive to improving maintenance efficiency.

其中,如圖5、圖6所示,清洗盤220包括清潔腔2211、以及設置於清潔腔2211內部的清洗部222,清洗部222用於與自移清潔設備100的清潔元件183干涉以將清潔元件183上的髒污去除,由此實現對清潔元件183的清潔操作,如當清潔元件183為拖盤時,通過拖盤與清潔腔2211內的清洗部222干涉實現對拖盤的清洗操作。由於清潔腔2211用於容納髒污,使得清洗部222將清潔元件183上的髒污去除後可以聚集在清潔腔2211內。As shown in FIG. 5 and FIG. 6 , the cleaning tray 220 includes a cleaning cavity 2211 and a cleaning portion 222 disposed inside the cleaning cavity 2211. The cleaning portion 222 is used to interfere with the cleaning element 183 of the self-moving cleaning device 100 to remove dirt from the cleaning element 183, thereby achieving a cleaning operation on the cleaning element 183. For example, when the cleaning element 183 is a tray, the cleaning operation on the tray is achieved by the interference between the tray and the cleaning portion 222 in the cleaning cavity 2211. Since the cleaning cavity 2211 is used to accommodate dirt, the cleaning portion 222 can collect dirt on the cleaning element 183 after removing it and then gather it in the cleaning cavity 2211.

通過清洗盤220設置為與基站200可拆卸連接,使得清洗盤220作為一個整體能夠與基站200進行可拆卸連接,由此用戶可以根據需求將清洗盤220安裝在基站200上,或者從基站200上拆卸下來。如用戶可以將整個清洗盤220從基站200上拆卸下來,便於對清洗盤220進行清洗,提高清洗盤220清洗的便利性,並能夠提高清洗盤220清洗的徹底性,能夠避免髒污長時間聚集或殘留在清潔腔2211內而產生異味,有利於提高用戶使用的滿意度。The cleaning plate 220 is configured to be detachably connected to the base station 200, so that the cleaning plate 220 as a whole can be detachably connected to the base station 200, so that the user can install the cleaning plate 220 on the base station 200 or remove it from the base station 200 as needed. For example, the user can remove the entire cleaning plate 220 from the base station 200, which is convenient for cleaning the cleaning plate 220, improves the convenience of cleaning the cleaning plate 220, and can improve the thoroughness of cleaning the cleaning plate 220, can prevent dirt from accumulating or remaining in the cleaning cavity 2211 for a long time to generate odor, and is conducive to improving user satisfaction.

可以理解的是,當需要對自移清潔設備100的清潔元件183進行清洗操作時,可以將清洗盤220安裝在基站200上即可。It is understandable that when it is necessary to clean the cleaning element 183 of the self-moving cleaning device 100 , the cleaning plate 220 can be installed on the base station 200 .

進一步地,可以通過卡接結構、限位結構、螺紋結構、榫卯結構、磁吸結構等實現清洗盤220與基站200的可拆卸連接。其中,清洗部222可以通過黏結、焊接、或其他結構連接在清洗盤220的清潔腔2211內,或者,清洗部222可以與清潔腔2211的腔壁一體成型,如清洗部222可以與清洗盤220一體成型。其中,清洗部222去除的清潔元件183上的髒污可以包括污液、毛髮、固體殘渣等。Furthermore, the cleaning plate 220 and the base station 200 can be detachably connected by means of a snap-fit structure, a limit structure, a threaded structure, a mortise and tenon structure, a magnetic structure, etc. The cleaning portion 222 can be connected to the cleaning cavity 2211 of the cleaning plate 220 by bonding, welding, or other structures, or the cleaning portion 222 can be integrally formed with the cavity wall of the cleaning cavity 2211, such as the cleaning portion 222 can be integrally formed with the cleaning plate 220. The dirt on the cleaning element 183 removed by the cleaning portion 222 can include dirty liquid, hair, solid residue, etc.

在本新型提供的一些可能實現的實施例中,當自移清潔設備100的清潔元件183髒污需要清洗時,自移清潔設備100可以停靠在基站200的容納腔211內,以利於清洗盤220對清潔元件183進行清洗操作。In some possible embodiments provided by the present invention, when the cleaning element 183 of the self-moving cleaning device 100 is dirty and needs to be cleaned, the self-moving cleaning device 100 can be docked in the receiving cavity 211 of the base station 200 to facilitate the cleaning disk 220 to clean the cleaning element 183.

其中,清洗盤220安裝在容納腔211的底壁上,使得自移清潔設備100容納在基站200的容納腔211內時,位於容納腔211底部的清洗盤220可以對位於機器主體110底部的清潔元件183進行清洗操作。The cleaning plate 220 is installed on the bottom wall of the receiving chamber 211, so that when the self-moving cleaning device 100 is received in the receiving chamber 211 of the base station 200, the cleaning plate 220 at the bottom of the receiving chamber 211 can clean the cleaning element 183 at the bottom of the machine body 110.

其中,如圖5所示,容納腔211的底壁上設置有安裝槽2111,清洗盤220的外緣形狀與安裝槽2111的形狀相匹配,清洗盤220可受限於安裝槽2111內以對清洗盤220相對於基站200在水平方向的運動進行限位。由此,通過合理設置安裝槽2111的形狀和清洗盤220外緣的形狀,使得清洗盤220放置在安裝槽2111內,如清洗盤220由安裝槽2111的上方插入安裝槽2111,即可實現整個清洗盤220與基站200的安裝,當清洗盤220由安裝槽2111的上方取出,即可實現整個清洗盤220與基站200的拆卸,操作簡單,使用方便,且簡化了卡接結構、限位結構、螺紋結構、榫卯結構、磁吸結構等連接清洗盤220和基站200的結構的設置,有利於降低成本。As shown in FIG. 5 , a mounting groove 2111 is provided on the bottom wall of the accommodating chamber 211, and the outer edge shape of the cleaning plate 220 matches the shape of the mounting groove 2111. The cleaning plate 220 can be confined in the mounting groove 2111 to limit the horizontal movement of the cleaning plate 220 relative to the base station 200. Therefore, by reasonably setting the shape of the mounting groove 2111 and the shape of the outer edge of the cleaning plate 220, the cleaning plate 220 can be placed in the mounting groove 2111. When the cleaning plate 220 is inserted into the mounting groove 2111 from the top of the mounting groove 2111, the installation of the entire cleaning plate 220 and the base station 200 can be achieved. When the cleaning plate 220 is taken out from the top of the mounting groove 2111, the disassembly of the entire cleaning plate 220 and the base station 200 can be achieved. The operation is simple and easy to use. The setting of the structures connecting the cleaning plate 220 and the base station 200, such as the snap-on structure, the limit structure, the threaded structure, the mortise and tenon structure, and the magnetic attraction structure, is simplified, which is conducive to reducing costs.

如圖5和圖6所示,在本新型提供的一些可能實現的實施例中,清潔腔2211的底壁上設置有位於清潔腔2211內部的污水槽2212,污水槽2212的槽底可以低於清潔腔2211的底壁的上表面,使得清洗部222將清潔元件183上的髒污去除後,髒污在重力的作用下會聚集在污水槽2212內。其中,基站200還包括污水管223,污水管223的一端延伸至該污水槽2212內,具體地,污水管223的第一端與污水槽2212連通,污水管223的第二端延伸至清潔腔2211的外部。由此,利用污水管223能夠將污水槽2212內的髒污排出,進而能夠及時將清潔腔2211內的髒污排出,使得清潔腔2211可以繼續容納髒污,以實現對清潔元件183的繼續清洗,有利於提高清洗效果。同時,能夠避免清潔腔2211內的髒污未及時排出而溢出造成二次污染,有利於提高用戶使用的滿意度。在本新型實施例中,污水管223可由彈性材質構成,便於清洗盤220的拆卸。As shown in FIG. 5 and FIG. 6 , in some possible embodiments provided by the present invention, a sewage tank 2212 located inside the cleaning chamber 2211 is provided on the bottom wall of the cleaning chamber 2211, and the bottom of the sewage tank 2212 may be lower than the upper surface of the bottom wall of the cleaning chamber 2211, so that after the cleaning part 222 removes the dirt on the cleaning element 183, the dirt will be gathered in the sewage tank 2212 under the action of gravity. Among them, the base station 200 further includes a sewage pipe 223, one end of which extends into the sewage tank 2212. Specifically, the first end of the sewage pipe 223 is connected to the sewage tank 2212, and the second end of the sewage pipe 223 extends to the outside of the cleaning chamber 2211. Thus, the sewage pipe 223 can be used to discharge the dirt in the sewage tank 2212, and then the dirt in the cleaning chamber 2211 can be discharged in time, so that the cleaning chamber 2211 can continue to contain the dirt, so as to achieve the continuous cleaning of the cleaning element 183, which is beneficial to improve the cleaning effect. At the same time, it can avoid the dirt in the cleaning chamber 2211 not being discharged in time and overflowing to cause secondary pollution, which is beneficial to improve the user's satisfaction. In this new embodiment, the sewage pipe 223 can be made of elastic material to facilitate the disassembly of the cleaning plate 220.

如圖7所示,在上述實施例中,清潔腔2211的側壁開設有缺口2213,即缺口2213開設在清洗盤220上,污水管223通過缺口2213固定在清洗盤220上並延伸至污水槽2212內。其中,基站200包括污水箱214,污水管223的第二端與污水箱214連通,可以將髒污收集在污水箱214內。可以理解的是,連通污水管223和污水箱214的管路上可以設置水泵,以實現污水的收集。As shown in FIG. 7 , in the above embodiment, a notch 2213 is provided on the side wall of the cleaning chamber 2211, that is, the notch 2213 is provided on the cleaning plate 220, and the sewage pipe 223 is fixed on the cleaning plate 220 through the notch 2213 and extends into the sewage tank 2212. The base station 200 includes a sewage tank 214, and the second end of the sewage pipe 223 is connected to the sewage tank 214, so that the sewage can be collected in the sewage tank 214. It is understandable that a water pump can be provided on the pipeline connecting the sewage pipe 223 and the sewage tank 214 to collect the sewage.

其中,如圖3所示,基站200的污水箱214可以位於容納腔211的上方,利用污水管223的第二端可以便利地將污水管223與污水箱214連通,進而通過污水管223將污水槽2212與位於容納腔211上方的污水箱214連通,由此,可以將清洗盤220的清潔腔2211內的污水及時收集在污水箱214內。可以理解的是,在另一些可能實現的實施例中,污水管223的第二端也可以延伸至基站200的外部,直接與排污管道連通。具體地,污水管223設置為彎折結構,與污水管223的第二端連接的部分向上彎折,以使污水管223能夠可靠與污水箱214連通。As shown in FIG. 3 , the sewage tank 214 of the base station 200 can be located above the receiving chamber 211. The sewage pipe 223 can be conveniently connected to the sewage tank 214 by using the second end of the sewage pipe 223, and then the sewage tank 2212 can be connected to the sewage tank 214 located above the receiving chamber 211 through the sewage pipe 223, so that the sewage in the cleaning chamber 2211 of the washing plate 220 can be collected in the sewage tank 214 in time. It can be understood that in other possible embodiments, the second end of the sewage pipe 223 can also extend to the outside of the base station 200 and be directly connected to the sewage pipe. Specifically, the sewage pipe 223 is set as a bent structure, and the part connected to the second end of the sewage pipe 223 is bent upward so that the sewage pipe 223 can be reliably connected to the sewage tank 214.

其中,污水管223可以通過黏結劑黏結在清洗盤220的缺口處,或者,污水管223可以通過焊接的方式焊接在清洗盤220的缺口處,或者,污水管223可以與清洗盤220一體成型。The sewage pipe 223 may be bonded to the notch of the washing plate 220 by an adhesive, or the sewage pipe 223 may be welded to the notch of the washing plate 220 by welding, or the sewage pipe 223 may be formed integrally with the washing plate 220.

如圖5和圖6所示,在本新型提供的一些可能實現的實施例中,清洗部222設置於清潔腔2211的底壁上,並凸出於清潔腔2211的表面,清洗部222包括連接端和自由端,連接端與清潔腔的側壁連接,自由端延伸至污水槽2212的周側,即清洗部222可以理解為清洗筋。清洗部222的頂部設置有第一清洗凸起2223,由此,利用清洗部222頂部的第一清洗凸起2223與自移清潔設備100的清潔元件183干涉,能夠將清潔元件183上的髒污去除。As shown in FIG. 5 and FIG. 6 , in some possible embodiments provided by the present invention, the cleaning portion 222 is disposed on the bottom wall of the cleaning chamber 2211 and protrudes from the surface of the cleaning chamber 2211. The cleaning portion 222 includes a connecting end and a free end. The connecting end is connected to the side wall of the cleaning chamber, and the free end extends to the periphery of the sewage tank 2212, that is, the cleaning portion 222 can be understood as a cleaning rib. A first cleaning protrusion 2223 is disposed on the top of the cleaning portion 222. Thus, the first cleaning protrusion 2223 on the top of the cleaning portion 222 interferes with the cleaning element 183 of the self-moving cleaning device 100, so that dirt on the cleaning element 183 can be removed.

由於清洗部222的連接端與清潔腔2211的側壁連接,清洗部222的自由端延伸至污水槽2212的周側,使得清洗部222同時起到了良好的引導作用,利用清洗部222能夠將髒污引導至污水槽2212內,進而有利於提高清洗盤220排污效率,提高清洗盤220的清洗效率。其中,清洗部222凸出於清潔腔2211的表面,使得清洗部222上的第一清洗凸起2223能夠可靠與清潔元件183干涉,以確保良好的清潔效果。Since the connection end of the cleaning portion 222 is connected to the side wall of the cleaning cavity 2211, and the free end of the cleaning portion 222 extends to the periphery of the sewage tank 2212, the cleaning portion 222 also plays a good guiding role. The cleaning portion 222 can guide the dirt into the sewage tank 2212, thereby improving the drainage efficiency of the cleaning plate 220 and improving the cleaning efficiency of the cleaning plate 220. Among them, the cleaning portion 222 protrudes from the surface of the cleaning cavity 2211, so that the first cleaning protrusion 2223 on the cleaning portion 222 can reliably interfere with the cleaning element 183 to ensure a good cleaning effect.

其中,清洗部222的數量為至少兩個,如清洗部222的數量為兩個、三個、四個或多個,通過合理設置清洗部222的數量,能夠確保清洗部222的第一清洗凸起2223與清潔元件183具有足夠的接觸面積,以確保良好的清潔效果,同時,能夠確保清潔腔2211內具有足夠的空間供髒污順暢流通至污水槽2212,以確保良好的清洗效率。Among them, the number of cleaning parts 222 is at least two, such as the number of cleaning parts 222 is two, three, four or more. By reasonably setting the number of cleaning parts 222, it can be ensured that the first cleaning protrusion 2223 of the cleaning part 222 has a sufficient contact area with the cleaning element 183 to ensure a good cleaning effect. At the same time, it can be ensured that there is sufficient space in the cleaning cavity 2211 for dirt to flow smoothly to the sewage tank 2212 to ensure good cleaning efficiency.

可以理解的是,在對清潔元件183進行清洗過程中,清潔元件183與第一清洗凸起2223干涉,同時,自移清潔設備100的運動機構驅動清潔元件183旋轉,使得整個清潔元件183做旋轉運動,以循環與第一清洗凸起2223干涉,進而實現對清潔元件183的清洗操作。It can be understood that during the cleaning process of the cleaning element 183, the cleaning element 183 interferes with the first cleaning protrusion 2223. At the same time, the moving mechanism of the self-moving cleaning device 100 drives the cleaning element 183 to rotate, so that the entire cleaning element 183 rotates to cyclically interfere with the first cleaning protrusion 2223, thereby realizing the cleaning operation of the cleaning element 183.

如圖5和圖6所示,在本新型提供的一些可能實現的實施例中,清洗盤220還包括:導水部224,導水部224設置於清潔腔2211的內底壁上並凸出於清潔腔2211的表面,即導水部224可以理解為導水筋,導水部224的頂部開設有導水槽2241,導水槽2241與基站200上的出水口2112連通,導水槽2241用於容納清潔液並能夠與清潔元件183干涉。由此,清潔液從基站200的出水口2112流入導水槽2241,當清潔元件183與導水槽2241干涉,能夠利用導水槽2241中的清潔液將自身蘸濕,然後清潔元件183與清洗部222干涉,即可實現對清潔元件183的清潔,這樣的設置,有利於提高清潔元件183的清潔效果。其中,導水部224凸出於清潔腔2211的表面,使得導水部224上的導水槽2241能夠可靠與清潔元件183干涉,以確保導水槽2241的水能夠順利被清潔元件183蘸取。As shown in Figures 5 and 6, in some possible embodiments provided by the present invention, the cleaning plate 220 further includes: a water guide portion 224, which is arranged on the inner bottom wall of the cleaning cavity 2211 and protrudes from the surface of the cleaning cavity 2211, that is, the water guide portion 224 can be understood as a water guide rib, and a water guide groove 2241 is opened on the top of the water guide portion 224, and the water guide groove 2241 is connected to the water outlet 2112 on the base station 200. The water guide groove 2241 is used to contain cleaning liquid and can interfere with the cleaning element 183. Thus, the cleaning liquid flows from the water outlet 2112 of the base station 200 into the water guide groove 2241. When the cleaning element 183 interferes with the water guide groove 2241, it can be wetted by the cleaning liquid in the water guide groove 2241. Then, the cleaning element 183 interferes with the cleaning portion 222 to clean the cleaning element 183. Such a configuration is beneficial to improving the cleaning effect of the cleaning element 183. Among them, the water guide portion 224 protrudes from the surface of the cleaning cavity 2211, so that the water guide groove 2241 on the water guide portion 224 can reliably interfere with the cleaning element 183 to ensure that the water in the water guide groove 2241 can be smoothly dipped by the cleaning element 183.

其中,導水部224的數量為至少兩個,如導水部224的數量為兩個、三個、四個或多個,通過合理設置導水部224的數量,能夠確保導水部224的導水槽2241內的清潔液較為均勻、全面地將清潔元件183蘸濕。其中,導水部224和清洗部222間隔分佈在清潔腔2211內。The number of the water guide parts 224 is at least two, such as two, three, four or more water guide parts 224. By properly setting the number of the water guide parts 224, it can be ensured that the cleaning liquid in the water guide groove 2241 of the water guide part 224 can more evenly and comprehensively wet the cleaning element 183. The water guide part 224 and the cleaning part 222 are spaced apart and distributed in the cleaning chamber 2211.

可以理解的是,在對清潔元件183進行清洗過程中,清潔元件183與導水部224的導水槽2241干涉,同時,自移清潔設備100的運動機構驅動清潔元件183旋轉,使得整個清潔元件183做旋轉運動,以循環與導水槽2241干涉,進而使得清潔元件183能夠均勻被蘸濕,蘸濕後的清潔元件183與清洗部222干涉以提高清洗效果。It can be understood that during the cleaning process of the cleaning element 183, the cleaning element 183 interferes with the water guide groove 2241 of the water guide portion 224. At the same time, the motion mechanism of the self-moving cleaning device 100 drives the cleaning element 183 to rotate, so that the entire cleaning element 183 rotates to circulate and interfere with the water guide groove 2241, so that the cleaning element 183 can be evenly wetted. The wetted cleaning element 183 interferes with the cleaning portion 222 to improve the cleaning effect.

如圖3和圖4所示,其中,基站200包括清水箱213,清水箱213位於容納腔211的上方用於容納清潔液,容納腔211的腔壁開設有出水口2112,出水口2112與清水箱213連通,通過出水口2112可以將清水箱213中的清潔液輸入至導水槽2241內。其中,出水口2112可以位於容納腔211的頂部,出水口2112與導水部224的導水槽2241正對,如此,通過閥等部件控制出水口2112的開閉情況,即可使清水箱213中的清潔液在重力作用下輸入至導水槽2241內。可以理解的是,出水口2112也可以位於容納腔211的側壁,通過管路連通出水口2112和導水槽2241,將清洗箱中的清潔液流入導水槽2241內。As shown in FIG3 and FIG4, the base station 200 includes a clean water tank 213, which is located above the receiving chamber 211 and is used to receive cleaning liquid. The cavity wall of the receiving chamber 211 is provided with a water outlet 2112, which is connected to the clean water tank 213. The cleaning liquid in the clean water tank 213 can be input into the water guide groove 2241 through the water outlet 2112. The water outlet 2112 can be located at the top of the receiving chamber 211, and the water outlet 2112 is directly opposite to the water guide groove 2241 of the water guide part 224. In this way, the opening and closing of the water outlet 2112 can be controlled by a valve or other components, so that the cleaning liquid in the clean water tank 213 can be input into the water guide groove 2241 under the action of gravity. It is understandable that the water outlet 2112 may also be located on the side wall of the accommodating chamber 211 , and the water outlet 2112 and the water guide groove 2241 are connected by a pipeline to allow the cleaning liquid in the cleaning box to flow into the water guide groove 2241 .

如圖8所示,在本新型提供的一些可能實現的實施例中,導水部224上開設有與導水槽2241連通的漏液口2242,由於清潔液進入導水部224的導水槽2241後,自移清潔設備100的清潔元件183無法將導水槽2241中的清潔液蘸取徹底,存在導水槽2241內殘留清潔液的情況,通過在導水部224上開設與導水槽2241連通的漏液口2242,使得導水槽2241內剩餘的清潔液可以從漏液口2242排出,能夠避免導水槽2241中長時間殘留液體而產生異味的情況,進而有利於提高導水槽2241的清潔性。可以理解的是,在將清洗盤220從基站200上取下來進行清洗的過程中,也可以對導水部224和清洗部222進行清洗。As shown in FIG. 8 , in some possible embodiments provided by the present invention, a liquid leakage port 2242 is provided on the water guide portion 224 and communicates with the water guide groove 2241. After the cleaning liquid enters the water guide groove 2241 of the water guide portion 224, the cleaning element 183 of the self-moving cleaning device 100 cannot completely soak up the cleaning liquid in the water guide groove 2241. In the case where cleaning liquid is retained in the water guide groove 2241, a liquid leakage port 2242 connected to the water guide groove 2241 is provided on the water guide portion 224, so that the cleaning liquid remaining in the water guide groove 2241 can be discharged from the liquid leakage port 2242, which can avoid the situation where the liquid is retained in the water guide groove 2241 for a long time and produces odor, thereby helping to improve the cleanliness of the water guide groove 2241. It can be understood that when the cleaning plate 220 is removed from the base station 200 for cleaning, the water guide portion 224 and the cleaning portion 222 can also be cleaned.

其中,漏液口2242與導水槽2241的槽底連通,使得導水槽2241中的殘留液體能夠經漏液口2242較為徹底的排出,進而能夠提高導水槽2241排液的徹底性。The liquid leakage port 2242 is connected to the bottom of the water channel 2241 , so that the residual liquid in the water channel 2241 can be discharged more thoroughly through the liquid leakage port 2242 , thereby improving the thoroughness of the liquid drainage of the water channel 2241 .

本新型已經通過上述實施例進行了說明,但應當理解的是,上述實施例只是用於舉例和說明的目的,而非意在將本新型限制於所描述的實施例範圍內。此外本領域技術人員可以理解的是,本新型並不局限於上述實施例,根據本新型的教導還可以做出更多種的變型和修改,這些變型和修改均落在本新型所要求保護的範圍以內。本新型的保護範圍由附屬的申請專利範圍及其等效範圍所界定。The present invention has been described through the above embodiments, but it should be understood that the above embodiments are only for the purpose of example and description, and are not intended to limit the present invention to the described embodiments. In addition, it can be understood by those skilled in the art that the present invention is not limited to the above embodiments, and more variations and modifications can be made according to the teachings of the present invention, and these variations and modifications are within the scope of protection claimed by the present invention. The protection scope of the present invention is defined by the attached application scope and its equivalent scope.

100:自移清潔設備100: Self-moving cleaning equipment

110:機器主體110: Machine body

111:前向部分111: Forward part

112:後向部分112: Backward part

120:感知系統120: Perception System

121:確定裝置121: Confirm device

122:緩衝器122: Buffer

140:驅動系統140:Drive system

141:驅動輪模組141:Drive wheel module

142:從動輪142: driven wheel

150:清潔系統150:Cleaning system

151:乾式清潔系統151:Dry cleaning system

152:邊刷152:Side brush

170:人機交互系統170:Human-computer interaction system

180:清潔元件180: Cleaning components

181:運動機構181:Sports Organization

1811:套筒1811: Sleeve

1812:第一配合件1812: First matching piece

1813:導向部1813: Guidance Department

1814:驅動部1814: Drive Department

1815:傳動部1815: Transmission

1816:旋轉部1816: Rotating part

183:清潔元件183: Cleaning components

1831:第一磁性件1831: The first magnetic element

1832:第二配合件1832: Second matching piece

200:基站200: Base Station

211:容納腔211: Accommodation chamber

2111:安裝槽2111:Mounting slot

2112:出水口2112: Water outlet

213:清水箱213: Clean water tank

214:污水箱214: Sewage tank

220:清洗盤220: Washing plate

2211:清潔腔2211: Clean cavity

2212:污水槽2212: Sewage Tank

222:清洗部222: Cleaning Department

2223:第一清洗凸起2223: First cleaning protrusion

223:污水管223: Sewage pipe

224:導水部224: Water supply department

2241:導水槽2241: Water channel

2242:漏液口2242: Leakage port

230:電磁鐵230: Magnet

圖1為根據本新型的一個可選實施例的自移清潔設備的結構示意圖; 圖2為圖1所示實施例的一個視角的結構示意圖; 圖3為根據本新型的一個可選實施例的基站的結構示意圖; 圖4為圖3所示實施例的一個視角的部分結構示意圖; 圖5為根據本新型的一個可選實施例的部分基站和清洗盤的結構示意圖; 圖6為根據本新型的一個可選實施例的清洗盤的結構示意圖; 圖7為根據本新型的一個可選實施例的自移清潔設備的清潔元件與部分基站的結構示意圖; 圖8為圖7所示實施例的一個視角的剖視圖。 Figure 1 is a structural schematic diagram of a self-moving cleaning device according to an optional embodiment of the present invention; Figure 2 is a structural schematic diagram of a viewing angle of the embodiment shown in Figure 1; Figure 3 is a structural schematic diagram of a base station according to an optional embodiment of the present invention; Figure 4 is a partial structural schematic diagram of a viewing angle of the embodiment shown in Figure 3; Figure 5 is a structural schematic diagram of a part of a base station and a cleaning plate according to an optional embodiment of the present invention; Figure 6 is a structural schematic diagram of a cleaning plate according to an optional embodiment of the present invention; Figure 7 is a structural schematic diagram of a cleaning element and a part of a base station of a self-moving cleaning device according to an optional embodiment of the present invention; Figure 8 is a cross-sectional view of a viewing angle of the embodiment shown in Figure 7.

181:運動機構 181:Sports organizations

1811:套筒 1811: Sleeve

1812:第一配合件 1812: First matching piece

1813:導向部 1813: Guidance Department

1814:驅動部 1814: Drive Department

1815:傳動部 1815: Transmission Department

1816:旋轉部 1816: Rotating part

183:清潔元件 183: Cleaning components

1831:第一磁性件 1831: The first magnetic part

1832:第二配合件 1832: Second matching piece

200:基站 200: Base station

220:清洗盤 220: Cleaning plate

230:電磁鐵 230: Magnet

Claims (10)

一種清潔機器人系統,包括:自移清潔設備,所述自移清潔設備包括機器主體、清潔元件、運動機構,所述運動機構連接所述機器主體和所述清潔元件以驅動所述清潔元件相對於所述機器主體升降,所述清潔元件與所述運動機構通過第一磁吸組件可拆卸連接,所述清潔元件上還設置有第一磁性件;基站,所述基站上設置有電磁鐵,所述基站與所述自移清潔設備配合使用;其中,通電的所述電磁鐵與所述第一磁性件的磁吸力大於所述第一磁吸組件的磁吸力與所述清潔元件的重力的差。 A cleaning robot system includes: a self-moving cleaning device, the self-moving cleaning device includes a machine body, a cleaning element, and a motion mechanism, the motion mechanism connects the machine body and the cleaning element to drive the cleaning element to rise and fall relative to the machine body, the cleaning element and the motion mechanism are detachably connected through a first magnetic attraction component, and the cleaning element is also provided with a first magnetic component; a base station, the base station is provided with an electromagnet, and the base station is used in conjunction with the self-moving cleaning device; wherein the magnetic attraction between the energized electromagnet and the first magnetic component is greater than the difference between the magnetic attraction of the first magnetic attraction component and the gravity of the cleaning element. 如請求項1所述的清潔機器人系統,其中,所述基站設置有用於容納所述自移清潔設備的容納腔,所述電磁鐵設置在所述容納腔底壁上;所述第一磁性件位於所述第一磁吸組件的下方。 The cleaning robot system as described in claim 1, wherein the base station is provided with a receiving chamber for receiving the self-moving cleaning device, the electromagnet is provided on the bottom wall of the receiving chamber; and the first magnetic member is located below the first magnetic attraction assembly. 如請求項2所述的清潔機器人系統,其中,所述第一磁吸組件包括第一配合件和第二配合件,所述第一配合件設置在所述運動機構上,所述第二配合件設置在所述清潔元件上,所述第一配合件和所述第二配合件中的一個為磁吸件,另一個為磁吸件或磁性件。 The cleaning robot system as described in claim 2, wherein the first magnetic attraction component includes a first matching component and a second matching component, the first matching component is arranged on the motion mechanism, the second matching component is arranged on the cleaning element, one of the first matching component and the second matching component is a magnetic attraction component, and the other is a magnetic attraction component or a magnetic component. 如請求項3所述的清潔機器人系統,其中,所述運動機構的輸出端包括套筒,所述第一配合件設置在所述套筒的內部,所述套筒的開口朝下;所述清潔元件包括適於延伸至所述套筒內的連接部,所述第二配合件設置在所述連接部的頂端; 其中,吸合的所述第一配合件和所述第二配合件均位於所述套筒內。 A cleaning robot system as described in claim 3, wherein the output end of the motion mechanism includes a sleeve, the first matching piece is arranged inside the sleeve, and the opening of the sleeve faces downward; the cleaning element includes a connecting portion suitable for extending into the sleeve, and the second matching piece is arranged at the top end of the connecting portion; Wherein, the first matching piece and the second matching piece that are attracted are both located in the sleeve. 如請求項4所述的清潔機器人系統,其中,所述運動機構的輸出端還包括延伸至所述套筒內的旋轉部,所述第一配合件安裝在所述旋轉部的下方端面上。 As described in claim 4, the output end of the motion mechanism further includes a rotating portion extending into the sleeve, and the first matching member is mounted on the lower end surface of the rotating portion. 如請求項4所述的清潔機器人系統,其中,所述套筒內設置有導向部,所述導向部用於引導所述第二配合件與所述第一配合件貼合。 A cleaning robot system as described in claim 4, wherein a guide portion is provided in the sleeve, and the guide portion is used to guide the second mating piece to fit with the first mating piece. 如請求項6所述的清潔機器人系統,其中,所述導向部為凸台,所述第一配合件位於所述凸台遠離所述套筒開口的一側,所述凸台背離所述第一配合件的一側設置為導向斜面。 A cleaning robot system as described in claim 6, wherein the guide portion is a boss, the first mating piece is located on a side of the boss away from the sleeve opening, and a side of the boss away from the first mating piece is provided as a guide slope. 如請求項2所述的清潔機器人系統,其中,所述基站還包括:清洗盤,所述清洗盤設置在所述容納腔的底壁上,所述清洗盤用於與所述自移清潔設備的所述清潔元件干涉以將所述清潔元件上的髒污去除;其中,所述清洗盤蓋設在所述電磁鐵的上方;所述清洗盤與所述容納腔的底壁可拆卸連接。 The cleaning robot system as described in claim 2, wherein the base station further comprises: a cleaning plate, the cleaning plate is arranged on the bottom wall of the receiving chamber, the cleaning plate is used to interfere with the cleaning element of the self-moving cleaning device to remove dirt on the cleaning element; wherein the cleaning plate cover is arranged above the electromagnet; the cleaning plate is detachably connected to the bottom wall of the receiving chamber. 如請求項8所述的清潔機器人系統,其中,所述清洗盤包括:清潔腔、以及設置於所述清潔腔內的清洗部,所述清洗部用於與所述自移清潔設備的所述清潔元件干涉,所述清潔腔用於容納髒污;所述容納腔的底壁開設有安裝槽,所述清洗盤的外緣形狀與所述安裝槽的形狀相匹配,所述清洗盤可受限於所述安裝槽內以對所述清洗盤相對於所述基站在水平方向的運動進行限位。 The cleaning robot system as described in claim 8, wherein the cleaning plate comprises: a cleaning cavity, and a cleaning part disposed in the cleaning cavity, the cleaning part is used to interfere with the cleaning element of the self-moving cleaning device, and the cleaning cavity is used to contain dirt; the bottom wall of the containing cavity is provided with a mounting groove, the outer edge shape of the cleaning plate matches the shape of the mounting groove, and the cleaning plate can be restricted in the mounting groove to limit the movement of the cleaning plate in the horizontal direction relative to the base station. 如請求項9所述的清潔機器人系統,其中,所述清潔腔內設置有污水槽,設置於所述基站上的污水管的一段延伸至所述污水槽。 A cleaning robot system as described in claim 9, wherein a sewage tank is provided in the cleaning chamber, and a section of the sewage pipe provided on the base station extends to the sewage tank.
TW113202486U 2023-03-21 2024-03-12 Cleaning robot system TWM662572U (en)

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