TWI879450B - Packaging die attach film for sdbg process, manufacturing method, and using for the same - Google Patents
Packaging die attach film for sdbg process, manufacturing method, and using for the same Download PDFInfo
- Publication number
- TWI879450B TWI879450B TW113106578A TW113106578A TWI879450B TW I879450 B TWI879450 B TW I879450B TW 113106578 A TW113106578 A TW 113106578A TW 113106578 A TW113106578 A TW 113106578A TW I879450 B TWI879450 B TW I879450B
- Authority
- TW
- Taiwan
- Prior art keywords
- packaging
- epoxy resin
- film
- silane coupling
- coupling agent
- Prior art date
Links
Images
Landscapes
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
本發明涉及一種封裝膜材、其製備方法及其使用方法,特別是應用於SDBG製程的封裝貼合膜、其製備方法及其使用方法。The present invention relates to a packaging film material, a preparation method thereof and a use method thereof, in particular to a packaging bonding film applied to a SDBG process, a preparation method thereof and a use method thereof.
半導體封裝是將半導體前段加工完成之晶圓,經切割(sawing)、取晶(pick-up)、黏晶(die bonding)以及打線接合(wire bonding)等製程之後,對已分切之晶粒(die)披覆包裝材料,以保護完成之積體電路(IC)元件(例如晶片,chip)的耐用性以及其使用壽命,且易於廣泛的電路板裝配應用。Semiconductor packaging is the process of coating the cut dies with packaging materials after the wafers have been processed by the semiconductor front end, such as sawing, pick-up, die bonding and wire bonding, in order to protect the durability and service life of the completed integrated circuit (IC) components (such as chips) and facilitate a wide range of circuit board assembly applications.
隨著5G時代普及,終端電子產品越來越講求輕薄短小之應用,其相關的封裝技術也逐漸朝向微型化高密度、薄型化發展,電流密度增加,熱耗散和絕緣要求隨之增加,對於封裝用材料導熱性要求也逐漸提高。更進一步地,小尺寸產品在切割的過程中極易出現飛料、滲水、崩邊以及殘膠等問題。With the popularization of the 5G era, terminal electronic products are increasingly demanding applications that are thin, light and compact. The related packaging technology is also gradually developing towards miniaturization, high density and thinness. As the current density increases, the requirements for heat dissipation and insulation increase, and the requirements for thermal conductivity of packaging materials are also gradually increasing. Furthermore, small-sized products are very prone to problems such as flying materials, water seepage, edge collapse and residual glue during the cutting process.
現有的封裝用膜材,主要填充物是以微米級SiO 2或Al 2O 3粉末為主,搭配切割膜,進行晶圓切割,再使用頂針使其DAF與切割膜分離。然而,晶圓切割膠帶結合時難以有效密合,造成切割的過程中出現飛料、滲水等狀況。 The existing packaging film materials are mainly filled with micron-grade SiO 2 or Al 2 O 3 powder, which is used with a dicing film to cut the wafer, and then a needle is used to separate the DAF from the dicing film. However, it is difficult to effectively seal the wafer dicing tape, resulting in flying materials and water seepage during the cutting process.
為提高晶圓的使用率,並簡化晶圓切割所產生的狀況,隱形切割SDBG(Stealth Dicing Before Grinding,研磨前隱形切割)進一步導入製程之中。隱形切割技術是將雷射聚光於晶圓內部,在晶圓內部形成變質層,透過擴展膠膜等方法,將晶圓分割成晶粒(die)的切割方法。In order to improve the utilization rate of wafers and simplify the conditions caused by wafer cutting, stealth cutting SDBG (Stealth Dicing Before Grinding) is further introduced into the process. Stealth cutting technology is a cutting method that focuses the laser on the inside of the wafer, forms a metamorphic layer inside the wafer, and divides the wafer into dies through methods such as expanding the adhesive film.
據此,提供一種應用於SDBG製程的封裝貼合膜及其製備方法,提供晶圓黏接力佳、低溫結構易脆斷的封裝貼合膜,乃為本案發明人致力研究的重要課題。Accordingly, providing a packaging bonding film and a preparation method thereof for use in the SDBG process, and providing a packaging bonding film with good wafer adhesion and a brittle structure at low temperatures are important topics that the inventors of this case have devoted themselves to studying.
本發明之主要目的,在於提供一種應用於SDBG製程的封裝貼合膜,具有與晶圓黏接力佳,低溫結構易脆斷等特性,其是由一種封裝貼合膠料所製成,以所述封裝貼合膠料的總重為100wt.%,所述封裝貼合膠料包括:10wt.%至22wt.%的水性樹脂,其包括環氧樹脂、丙烯酸共聚物以及矽烷偶聯劑;以及78wt.%至90wt.%固含量的金屬氧化物粉末,且所述金屬氧化物粉末是選自CuO、Al 2O 3、ZnO或AlN之至少一者或其組合,並經過矽烷偶聯劑表面改質;其中,所述封裝貼合膜的延伸率小於100%且應力小於等於2MPa。 The main purpose of the present invention is to provide a packaging adhesive film used in the SDBG process, which has the characteristics of good adhesion to the wafer and brittle structure at low temperature. The packaging adhesive film is made of a packaging adhesive material, with a total weight of 100wt.%, and the packaging adhesive material includes: 10wt.% to 22wt.% of an aqueous resin, which includes an epoxy resin, an acrylic copolymer and a silane coupling agent; and 78wt.% to 90wt.% of a metal oxide powder with a solid content, and the metal oxide powder is selected from at least one of CuO, Al2O3 , ZnO or AlN or a combination thereof, and is surface-modified with a silane coupling agent; wherein the elongation of the packaging adhesive film is less than 100% and the stress is less than or equal to 2MPa.
於本發明的一具體實施例中,所述環氧樹脂是選自雙酚A型環氧樹脂、雙酚F型環氧樹脂以及三聚氰酸環氧樹脂之至少一者或其組合。In a specific embodiment of the present invention, the epoxy resin is selected from at least one of bisphenol A epoxy resin, bisphenol F epoxy resin and cyanuric acid epoxy resin or a combination thereof.
於本發明的一具體實施例中,所述丙烯酸共聚物是甲基丙烯酸甲酯或聚甲基丙烯酸甲酯。In a specific embodiment of the present invention, the acrylic copolymer is methyl methacrylate or polymethyl methacrylate.
於本發明的一具體實施例中,所述矽烷偶聯劑是選自甲基丙烯醯氧基矽烷、環氧基矽烷、異氰酸酯基矽烷之至少一者或其組合。In a specific embodiment of the present invention, the silane coupling agent is selected from at least one of methacryloxysilane, epoxysilane, isocyanate silane or a combination thereof.
於本發明的一具體實施例中,以水性樹脂總重為100wt.%,環氧樹脂:矽烷偶聯劑:丙烯酸共聚物的重量百分比是介於90~95wt.%:3~5wt.%:1~7wt.%。In a specific embodiment of the present invention, the total weight of the water-based resin is 100wt.%, and the weight percentages of epoxy resin: silane coupling agent: acrylic copolymer are between 90-95wt.%: 3-5wt.%: 1-7wt.%.
為了達成上述之目的,本發明還提供了一種延伸率小於100%且應力小於等於2MPa之封裝貼合膜的製備方法,其包括:混合10wt.%至22wt.%的一水性樹脂與78wt.%至90wt.%固含量的一金屬氧化物粉末得到一混合膠料;以三滾筒研磨、分散所述混合膠料,以得到一封裝貼合膠料;以及,塗佈成形烘乾所述封裝貼合膠料,以得到一封裝貼合膜;其中,所述水性樹脂包括環氧樹脂、矽烷偶聯劑以及丙烯酸共聚物,所述金屬氧化物粉末是選自CuO、Al 2O 3、ZnO或AlN之至少一者或其組合,並經過矽烷偶聯劑表面改質。 In order to achieve the above-mentioned purpose, the present invention also provides a method for preparing a packaging adhesive film with an elongation less than 100% and a stress less than or equal to 2MPa, which comprises: mixing 10wt.% to 22wt.% of a water-based resin and 78wt.% to 90wt.% of a metal oxide powder with a solid content to obtain a mixed adhesive; grinding and dispersing the mixed adhesive with a three-roller to obtain a packaging adhesive; and coating, forming and drying the packaging adhesive to obtain a packaging adhesive film; wherein the water-based resin comprises an epoxy resin, a silane coupling agent and an acrylic copolymer, and the metal oxide powder is selected from at least one of CuO, Al2O3 , ZnO or AlN or a combination thereof, and is surface-modified by a silane coupling agent.
為了達成上述之目的,本發明還提供了一種封裝貼合膜的使用方法,其包括:提供一晶圓,其包括一第一表面以及一第二表面;貼附一基材膜層至所述晶圓之所述第一表面;於所述晶圓之所述第二表面進行隱形雷射切割,以形成複數晶粒及複數晶粒之間的間隙;對所述晶圓之所述第二表面進行研磨;貼附一封裝貼合膜於所述晶圓之所述第二表面,並移除所述基材膜層;以及於低溫下對所述封裝貼合膜以及所述晶圓進行一擴膜裂片步驟,以擴大所述複數晶粒之間的間隙;其中,所述封裝貼合膜的延伸率小於100%且應力小於等於2MPa。In order to achieve the above-mentioned purpose, the present invention also provides a method for using a packaging adhesive film, which includes: providing a wafer, which includes a first surface and a second surface; attaching a substrate film layer to the first surface of the wafer; performing invisible laser cutting on the second surface of the wafer to form a plurality of grains and gaps between the plurality of grains; grinding the second surface of the wafer; attaching a packaging adhesive film to the second surface of the wafer and removing the substrate film layer; and performing a film expansion and splitting step on the packaging adhesive film and the wafer at a low temperature to expand the gaps between the plurality of grains; wherein the elongation of the packaging adhesive film is less than 100% and the stress is less than or equal to 2MPa.
茲就本發明之具體實施例,配合圖式,詳細說明本發明所公開的封裝貼合膜及其製備方法如後。所屬領域具有通常知識者,藉由本說明書所公開的內容可瞭解本發明的優點與效果。本發明亦可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。The packaging laminating film and its preparation method disclosed in the present invention are described in detail with reference to the specific embodiments of the present invention and the accompanying drawings. A person with ordinary knowledge in the relevant field can understand the advantages and effects of the present invention through the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed in various ways based on different viewpoints and applications without departing from the concept of the present invention. The following implementation method will further describe the relevant technical contents of the present invention in detail, but the disclosed contents are not intended to limit the scope of protection of the present invention.
本發明之主要目的,在於提供一種應用於SDBG製程的封裝貼合膜,具有與晶圓黏接力佳,低溫結構易脆斷等特性,其是由一種封裝貼合膠料所製成,以所述封裝貼合膠料的總重為100wt.%,所述封裝貼合膠料包括:10wt.%至22wt.%的水性樹脂,其包括環氧樹脂、丙烯酸共聚物以及矽烷偶聯劑;以及78wt.%至90wt.%固含量的金屬氧化物粉末,且所述金屬氧化物粉末是選自CuO、Al 2O 3、ZnO或AlN之至少一者或其組合,並經過1wt.%至10wt.%的矽烷偶聯劑表面改質。更進一步地,所述封裝貼合膜的延伸率小於100%且應力小於等於2MPa。 The main purpose of the present invention is to provide a packaging adhesive film used in the SDBG process, which has the characteristics of good adhesion to the wafer and brittle structure at low temperature. The packaging adhesive film is made of a packaging adhesive material. The total weight of the packaging adhesive material is 100wt.%, and the packaging adhesive material includes: 10wt.% to 22wt.% of an aqueous resin, which includes an epoxy resin, an acrylic copolymer and a silane coupling agent; and 78wt.% to 90wt.% of a metal oxide powder with a solid content, and the metal oxide powder is selected from at least one of CuO, Al2O3 , ZnO or AlN or a combination thereof, and is surface-modified with 1wt.% to 10wt.% of a silane coupling agent. Furthermore, the elongation of the packaging film is less than 100% and the stress is less than or equal to 2MPa.
為具體比較不同固含量的金屬氧化物粉末的影響,實施例1至2以及比較例1至5以不同固含量的金屬氧化物粉末與20wt.%水性樹脂混合製備導熱膠材,水性樹脂的組成中,選用雙酚F型環氧樹脂90wt.%、環氧基矽烷偶聯劑3wt.%以及甲基丙烯酸甲酯7 wt.%,並進行延伸率、應力以及裂片測試,記錄如表1所示。In order to specifically compare the effects of metal oxide powders with different solid contents, Examples 1 to 2 and Comparative Examples 1 to 5 were used to prepare thermal conductive adhesives by mixing metal oxide powders with different solid contents with 20 wt.% water-based resin. The composition of the water-based resin included 90 wt.% of bisphenol F-type epoxy resin, 3 wt.% of epoxy silane coupling agent, and 7 wt.% of methyl methacrylate. Elongation, stress, and crack tests were performed, and the results are shown in Table 1.
表1
由表1可知,在水性樹脂相同的配比下,金屬氧化物粉末的固含量比例影響了產品裂片操作的可行性。一般而言,在使用高固含量的金屬氧化物粉末混合製作時容易產生粉末難以均勻分散、易產生團聚,本發明的氧化物粉末填料先置入矽烷偶聯劑進行表面改質,能提升樹脂與金屬氧化物粉末相容性,減少粉體團聚產生,在78wt.%至90wt.%固含量的金屬氧化物粉末配比下,可以使得延伸率小於100%、應力大於等於2MPa。As shown in Table 1, under the same ratio of water-based resin, the solid content ratio of metal oxide powder affects the feasibility of product splitting operation. Generally speaking, when using high solid content metal oxide powder for mixed production, it is easy to produce powder that is difficult to disperse evenly and easy to agglomerate. The oxide powder filler of the present invention is first placed in a silane coupling agent for surface modification, which can improve the compatibility of the resin and the metal oxide powder and reduce the generation of powder agglomeration. Under the ratio of 78wt.% to 90wt.% solid content of metal oxide powder, the elongation can be less than 100% and the stress can be greater than or equal to 2MPa.
較佳地,所述金屬氧化物粉末是選自CuO、Al 2O 3、ZnO或AlN之至少一者或其組合。更佳地,所述金屬氧化物粉末是選自CuO 3或ZnO。 Preferably, the metal oxide powder is selected from at least one of CuO, Al 2 O 3 , ZnO or AlN or a combination thereof. More preferably, the metal oxide powder is selected from CuO 3 or ZnO.
環氧樹脂具備優良的電氣性質、低固化收縮率、低揮發性副產物、耐高溫、耐溶劑等特性,廣泛地應用於半導體元件的封裝材料。Epoxy resin has excellent electrical properties, low curing shrinkage, low volatile byproducts, high temperature resistance, solvent resistance and other characteristics, and is widely used as a packaging material for semiconductor components.
於本發明的一具體實施例中,本發明所選用的環氧樹脂是選自雙酚A型環氧樹脂、雙酚F型環氧樹脂以及三聚氰酸環氧樹脂之至少一者或其組合。較佳地,本發明所述環氧樹脂是雙酚F型環氧樹脂。具體來說,雙酚F型環氧樹脂又稱雙酚F二縮水甘油醚,簡稱BPF,其具備低黏度、耐腐性、黏接性、熱穩定性以及絕緣性的特性。In a specific embodiment of the present invention, the epoxy resin used in the present invention is selected from at least one of bisphenol A epoxy resin, bisphenol F epoxy resin and cyanuric acid epoxy resin or a combination thereof. Preferably, the epoxy resin of the present invention is bisphenol F epoxy resin. Specifically, bisphenol F epoxy resin is also called bisphenol F diglycidyl ether, abbreviated as BPF, which has the characteristics of low viscosity, corrosion resistance, adhesion, thermal stability and insulation.
矽烷偶聯劑是由有機物以及矽構成的化合物。矽烷偶聯劑的分子中,具備兩種以上不同的反應基團,能夠與無機材料以及有機材料進行化學反應。具體來說,本發明的矽烷偶聯劑可以提升氧化銅和環氧樹脂連結性,避免界面發生孔洞等缺陷,以維持較佳的熱傳導性。Silane coupling agents are compounds composed of organic matter and silicon. The molecules of silane coupling agents have two or more different reactive groups, which can react chemically with inorganic materials and organic materials. Specifically, the silane coupling agent of the present invention can improve the bonding between copper oxide and epoxy resin, avoid defects such as holes at the interface, and maintain better thermal conductivity.
於本發明的一具體實施例中,所述矽烷偶聯劑是選自甲基丙烯醯氧基矽烷、環氧基矽烷、異氰酸酯基矽烷之至少一者或其組合。更具體來說,本發明的矽烷偶聯劑可以是商業購得的產品,舉例來說,甲基丙烯醯氧基矽烷可以是3-甲基丙烯醯氧丙基與其他矽烷的組合,如甲基二甲氧基矽烷、三甲氧基矽烷、甲基二乙氧基矽烷以及三乙氧基矽烷;環氧基矽烷可以是2-(3,4環氧環己基乙基三甲氧基矽烷、(3-環氧丙氧基丙基)三甲氧基矽烷、(3-環氧丙氧基丙基)甲基二乙氧基矽烷以及(3-氧丙氧基丙基三乙氧基矽烷;異氰酸酯基矽烷可以是3-異氰酸酯丙基三乙氧基矽烷。In a specific embodiment of the present invention, the silane coupling agent is selected from at least one of methacryloxysilane, epoxysilane, isocyanate silane or a combination thereof. More specifically, the silane coupling agent of the present invention can be a commercially available product. For example, the methacryloxysilane can be a combination of 3-methacryloxypropyl and other silanes, such as methyldimethoxysilane, trimethoxysilane, methyldiethoxysilane and triethoxysilane; the epoxysilane can be 2-(3,4-epoxyhexylethyltrimethoxysilane, (3-glycidoxypropyl)trimethoxysilane, (3-glycidoxypropyl)methyldiethoxysilane and (3-glycidoxypropyltriethoxysilane; the isocyanate silane can be 3-isocyanatepropyltriethoxysilane.
為具體比較本發明所選用的矽烷偶聯劑的所製備的導熱膠料的導熱性差異,以固含量80 wt.%的金屬氧化物粉末與20wt.%水性樹脂混合製備導熱膠材實施例4至6,水性樹脂的組成選用雙酚F型環氧樹脂以及甲基丙烯酸甲酯,並進行粗糙度測試,水性樹脂的組成及比例如表2所示。In order to specifically compare the difference in thermal conductivity of the thermally conductive adhesives prepared by the silane coupling agents selected in the present invention, a metal oxide powder with a solid content of 80 wt.% was mixed with 20 wt.% of a water-based resin to prepare thermally conductive adhesive Examples 4 to 6. The composition of the water-based resin was bisphenol F-type epoxy resin and methyl methacrylate. A roughness test was performed. The composition and ratio of the water-based resin are shown in Table 2.
表2
參閱表3,環氧基矽烷可呈現最佳的粗糙度。更詳細地,搭配(3-環氧丙氧基丙基)三甲氧基矽烷所製作之封裝貼合膜,可呈現最佳粗糙度。若粗糙度過大,即代表粉末分散不均,會導致DAF與晶圓黏結力不佳,影響裂片情形。See Table 3, epoxysilane can show the best roughness. More specifically, the packaging bonding film made with (3-glycidoxypropyl)trimethoxysilane can show the best roughness. If the roughness is too large, it means that the powder is not evenly dispersed, which will lead to poor adhesion between DAF and wafer, affecting the cracking situation.
丙烯酸共聚物可以是衍生自丙烯酸系單體的樹脂聚合物,所述丙烯酸系單體可以選自丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丁酯和甲基丙烯酸甲酯、甲基丙烯酸正丁酯等。丙烯酸系樹脂可視需求選自熱固性丙烯酸樹脂或熱塑性丙烯酸樹脂。The acrylic copolymer may be a resin polymer derived from an acrylic monomer, which may be selected from methyl acrylate, ethyl acrylate, n-butyl acrylate, methyl methacrylate, n-butyl methacrylate, etc. The acrylic resin may be selected from a thermosetting acrylic resin or a thermoplastic acrylic resin as required.
具體來說,熱固性丙烯酸樹脂是以丙烯酸系單體為基本成分,經交聯成網絡結構的不熔丙烯酸系聚合物,除具有丙烯酸樹脂的一般性能以外,耐熱性、耐水性、耐溶劑性,耐磨性、耐劃性(抗劃傷性)更優良,且具有本體澆鑄造材料、溶液型、乳液型、水基型多種形態。更具體來說,熱塑性丙烯酸樹脂可以由丙烯酸、甲基丙烯酸及其衍生物(如酯類、腈類、醯胺類)聚合製成的一類熱塑性樹脂。可反覆受熱軟化和冷卻凝固。一般為線型高分子化合物,可以是均聚物,也可以是共聚物,具有較好的物理機械性能,耐候性、耐化學品性及耐水性優異,保光與保色性高。塗料工業用的熱塑性丙烯酸樹脂分子量一般為75000~120000,常用硝酸纖維素、乙酸丁酸纖維素和過氯乙烯樹脂等與其並用,以改進塗膜性能。熱塑性丙烯酸樹脂是溶劑型丙烯酸樹脂的一種,可以熔融、在適當溶劑中溶解,由其配製的塗料靠溶劑揮發後大分子的聚集成膜,成膜時沒有交聯反應發生,屬非反應型塗料。為了實現較好的物化性能,應將樹脂的分子量做大,但為了保證不揮發物質的總量不至於太低且分子量又不能過大,一般在幾萬分子量時,物化性能和施工性能比較平衡。Specifically, thermosetting acrylic resin is an infusible acrylic polymer with acrylic monomers as the basic components and cross-linked into a network structure. In addition to the general properties of acrylic resin, it has better heat resistance, water resistance, solvent resistance, wear resistance, and scratch resistance (anti-scratch resistance), and has a variety of forms such as bulk casting materials, solution type, emulsion type, and water-based type. More specifically, thermoplastic acrylic resin is a type of thermoplastic resin made by polymerizing acrylic acid, methacrylic acid and its derivatives (such as esters, nitriles, and amides). It can be repeatedly softened by heat and solidified by cooling. It is generally a linear polymer compound, which can be a homopolymer or a copolymer, with good physical and mechanical properties, excellent weather resistance, chemical resistance and water resistance, and high gloss and color retention. The molecular weight of thermoplastic acrylic resin used in the coating industry is generally 75,000 to 120,000. Cellulose nitrate, cellulose acetate butyrate and perchloroethylene resin are often used together with it to improve the coating performance. Thermoplastic acrylic resin is a type of solvent-type acrylic resin. It can be melted and dissolved in a suitable solvent. The coating prepared by it forms a film by the aggregation of macromolecules after the solvent evaporates. No cross-linking reaction occurs during film formation, and it is a non-reactive coating. In order to achieve better physical and chemical properties, the molecular weight of the resin should be increased, but in order to ensure that the total amount of non-volatile substances is not too low and the molecular weight is not too large, generally at a molecular weight of tens of thousands, the physical and chemical properties and construction performance are more balanced.
在本發明之所述實施例中,丙烯酸共聚物可以是甲基丙烯酸甲酯(methyl methacrylate, MMA)或聚甲基丙烯酸甲酯(poly methyl methacrylate, PMMA)。In the embodiments of the present invention, the acrylic copolymer may be methyl methacrylate (MMA) or poly methyl methacrylate (PMMA).
本發明所使用的水性樹脂包括環氧樹脂、矽烷偶聯劑以及丙烯酸共聚物。於本發明的一具體實施例中,水性樹脂具備特定比例,以水性樹脂總重為100wt.%,環氧樹脂:矽烷偶聯劑:丙烯酸共聚物的重量百分比是介於90~95wt.%:3~5wt.%:1~7wt.%。The water-based resin used in the present invention includes epoxy resin, silane coupling agent and acrylic copolymer. In a specific embodiment of the present invention, the water-based resin has a specific ratio, with the total weight of the water-based resin being 100wt.%, the weight percentage of epoxy resin: silane coupling agent: acrylic copolymer is between 90-95wt.%: 3-5wt.%: 1-7wt.%.
為具體比較本發明水性樹脂配方的比例表面粗糙度差異,以固含量80%的金屬氧化物粉末與20wt.%水性樹脂混合製備導熱膠材實施例6至14,水性樹脂的組成選用雙酚F型環氧樹脂、環氧基矽烷偶聯劑(KBM-403)以及丙烯酸共聚物(甲基丙烯酸甲酯),並進行表面粗糙度(Ra)測試,水性樹脂的組成比例以及粗糙度如表3所示。In order to specifically compare the difference in surface roughness of the water-based resin formulation of the present invention, a metal oxide powder with a solid content of 80% was mixed with 20wt.% of a water-based resin to prepare thermal conductive adhesive Examples 6 to 14. The composition of the water-based resin selected bisphenol F type epoxy resin, epoxy silane coupling agent (KBM-403) and acrylic copolymer (methyl methacrylate), and the surface roughness (Ra) test was performed. The composition ratio and roughness of the water-based resin are shown in Table 3.
表3
由表3可見得,實施例7的配比具備較佳的粗糙度。最佳地,環氧樹脂:矽烷偶聯劑:丙烯酸共聚物的重量百分比是90 wt.%:3wt.%:7wt.%。It can be seen from Table 3 that the ratio of Example 7 has better roughness. Optimally, the weight percentage of epoxy resin: silane coupling agent: acrylic copolymer is 90 wt.%: 3 wt.%: 7 wt.%.
為了達成上述之目的,本發明還提供了一種封裝貼合膜的製備方法,參閱圖1,其為本發明的封裝貼合膜的製備方法的步驟S102至S106。In order to achieve the above-mentioned purpose, the present invention further provides a method for preparing a packaging laminating film. Referring to FIG. 1 , it shows steps S102 to S106 of the method for preparing a packaging laminating film of the present invention.
S102混合10wt.%至22wt.%的一水性樹脂與78wt.%至90wt.%固含量的一金屬氧化物粉末得到一混合膠料。水性樹脂包括環氧樹脂、矽烷偶聯劑以及丙烯酸共聚物。該等組成物的選擇如本發明說明書所述,在此不再贅述。更具體地,本發明的金屬氧化物粉末是選自CuO、Al 2O 3、ZnO或AlN之至少一者或其組合,並經過矽烷偶聯劑表面改質,通過表面改質,增加了樹脂與金屬氧化物粉末顆粒的相容性,減少粉體團聚產生,有效降低成品粗糙度。 S102: Mix 10wt.% to 22wt.% of a water-based resin and 78wt.% to 90wt.% of a metal oxide powder with a solid content to obtain a mixed rubber material. The water-based resin includes an epoxy resin, a silane coupling agent and an acrylic copolymer. The selection of these components is as described in the specification of the present invention and will not be repeated here. More specifically, the metal oxide powder of the present invention is selected from at least one of CuO, Al2O3 , ZnO or AlN or a combination thereof, and is surface-modified by a silane coupling agent. Through the surface modification, the compatibility of the resin and the metal oxide powder particles is increased, the generation of powder agglomeration is reduced, and the roughness of the finished product is effectively reduced.
S104以三滾筒研磨、分散所述混合膠料,以得到一封裝貼合膠料。三滾筒研磨機通過使用三個平行的滾筒彼此以相反的方向及不同速度旋轉產生剪力的機器,藉以達到混和、提煉、分散,或使物體的黏度均勻化的目的。S104 grinds and disperses the mixed adhesive material with a three-drum grinder to obtain a packaging adhesive material. The three-drum grinder uses three parallel drums that rotate in opposite directions and at different speeds to generate shear force, thereby achieving the purpose of mixing, refining, dispersing, or making the viscosity of the object uniform.
S106塗佈成形烘乾所述封裝貼合膠料,以得到一封裝貼合膜。S106: coating, forming and drying the packaging adhesive material to obtain a packaging adhesive film.
更進一步地,本發明還提供了一種封裝貼合膜的使用方法,其包括:Furthermore, the present invention also provides a method for using the packaging laminating film, comprising:
S201提供一晶圓,其包括一第一表面以及一第二表面;S201 provides a wafer, which includes a first surface and a second surface;
S202貼附一基材膜層至所述晶圓之所述第一表面;S202 attaching a substrate film layer to the first surface of the wafer;
S203於所述晶圓之所述第二表面進行隱形雷射切割,以形成複數晶粒及複數晶粒之間的間隙;S203: performing invisible laser cutting on the second surface of the wafer to form a plurality of dies and gaps between the plurality of dies;
S204對所述晶圓之所述第二表面進行研磨;S204: grinding the second surface of the wafer;
S205貼附一封裝貼合膜於所述晶圓之所述第二表面,並移除所述基材膜層;以及S205: attaching a packaging film to the second surface of the wafer and removing the substrate film layer; and
S206於低溫下對所述封裝貼合膜以及所述晶圓進行一擴膜裂片步驟,以擴大所述複數晶粒之間的間隙。S206: performing a film expansion and splitting step on the packaging bonding film and the wafer at a low temperature to expand the gap between the plurality of dies.
本發明的其中一有益效果在於,本發明所提供的應用於SDBG製程的封裝貼合膜通過“10wt.%至22wt.%的水性樹脂,其包括環氧樹脂、矽烷偶聯劑以及丙烯酸共聚物;以及78wt.%至90wt.%固含量的金屬氧化物粉末”的特定組成及配方比例,獲得延伸率小於100%且應力小於等於2MPa的封裝貼合膜。One of the beneficial effects of the present invention is that the packaging bonding film provided by the present invention for use in the SDBG process has a specific composition and formula ratio of "10wt.% to 22wt.% of a water-based resin, which includes an epoxy resin, a silane coupling agent and an acrylic copolymer; and 78wt.% to 90wt.% of a metal oxide powder with a solid content" to obtain a packaging bonding film with an elongation less than 100% and a stress less than or equal to 2MPa.
進一步來說,本發明的組成及配方比例有效降低本發明所製備的封裝貼合膜的粗糙度,再者,本發明的封裝貼合膜更通過改良金屬氧化物粉末的流動性、增加接觸面積,提高金屬氧化物粉末在組成中的固含量。Furthermore, the composition and formula ratio of the present invention effectively reduce the roughness of the packaging laminating film prepared by the present invention. Moreover, the packaging laminating film of the present invention improves the fluidity of the metal oxide powder and increases the contact area, thereby increasing the solid content of the metal oxide powder in the composition.
再者,本發明的封裝貼合膜及其製備方法有效改善粉末接觸性、減少粉體團聚以及降低貼合膜的表面粗糙度,以利後續切割的過程避免出現飛料、滲水等狀況。Furthermore, the packaging laminating film and the preparation method thereof of the present invention effectively improve the powder contact, reduce powder agglomeration and reduce the surface roughness of the laminating film, so as to avoid flying materials, water seepage and the like in the subsequent cutting process.
此外,本發明的封裝貼合膜具備優良的晶圓黏結力,可有效維持晶粒的整列性,以及低溫易脆斷的特性,適合應用於SDBG製程。本發明的封裝貼合膜的使用方法利用隱形雷射切割,在低溫下擴膜裂片,改善晶圓劃片製程中產生飛料與滲水與毛邊等問題。In addition, the packaging film of the present invention has excellent wafer adhesion, can effectively maintain the alignment of the die, and has the characteristics of being brittle at low temperatures, and is suitable for application in the SDBG process. The method of using the packaging film of the present invention utilizes invisible laser cutting to expand the film and split it at low temperature, thereby improving the problems of flying materials, water seepage, and burrs generated in the wafer dicing process.
以上所述僅為本發明之較佳具體實例,非因此即侷限本發明之專利範圍,故舉凡運用本發明內容所為之等效變化,均同理皆包含於本發明之範圍內,合予陳明。The above description is only a preferred specific example of the present invention, and does not limit the patent scope of the present invention. Therefore, all equivalent changes made by applying the contents of the present invention are also included in the scope of the present invention and are appropriately stated.
S102~S106:步驟 S201~S206:步驟 S102~S106: Steps S201~S206: Steps
圖1為本發明之封裝貼合膜的製備方法的流程圖;以及FIG1 is a flow chart of a method for preparing a packaging laminating film of the present invention; and
圖2為本發明之封裝貼合膜使用方法的流程圖。FIG. 2 is a flow chart of the method for using the packaging laminating film of the present invention.
S102~S106:步驟 S102~S106: Steps
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW113106578A TWI879450B (en) | 2024-02-23 | 2024-02-23 | Packaging die attach film for sdbg process, manufacturing method, and using for the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW113106578A TWI879450B (en) | 2024-02-23 | 2024-02-23 | Packaging die attach film for sdbg process, manufacturing method, and using for the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI879450B true TWI879450B (en) | 2025-04-01 |
Family
ID=96142245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW113106578A TWI879450B (en) | 2024-02-23 | 2024-02-23 | Packaging die attach film for sdbg process, manufacturing method, and using for the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI879450B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201704395A (en) * | 2015-02-24 | 2017-02-01 | 琳得科股份有限公司 | Film-like adhesive agent, adhesive sheet, and method for manufacturing semiconductor device |
TW202028321A (en) * | 2018-11-22 | 2020-08-01 | 日商琳得科股份有限公司 | Heat-curable protective-membrane-forming film, composite sheet for forming protective film, and manufacturing method of chip |
TW202104485A (en) * | 2019-06-21 | 2021-02-01 | 日商琳得科股份有限公司 | Composite sheet for forming protective film and method for manufacturing semiconductor chip having protective film including an antifouling sheet and a film for forming a protective film formed on one side of the antifouling sheet |
TW202342670A (en) * | 2022-02-18 | 2023-11-01 | 日商琳得科股份有限公司 | Film for forming protective membrane, composite sheet for forming protective membrane, semiconductor chip and semiconductor device equipped with protective membrane |
-
2024
- 2024-02-23 TW TW113106578A patent/TWI879450B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201704395A (en) * | 2015-02-24 | 2017-02-01 | 琳得科股份有限公司 | Film-like adhesive agent, adhesive sheet, and method for manufacturing semiconductor device |
TW202028321A (en) * | 2018-11-22 | 2020-08-01 | 日商琳得科股份有限公司 | Heat-curable protective-membrane-forming film, composite sheet for forming protective film, and manufacturing method of chip |
TW202104485A (en) * | 2019-06-21 | 2021-02-01 | 日商琳得科股份有限公司 | Composite sheet for forming protective film and method for manufacturing semiconductor chip having protective film including an antifouling sheet and a film for forming a protective film formed on one side of the antifouling sheet |
TW202342670A (en) * | 2022-02-18 | 2023-11-01 | 日商琳得科股份有限公司 | Film for forming protective membrane, composite sheet for forming protective membrane, semiconductor chip and semiconductor device equipped with protective membrane |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8110066B2 (en) | Adhesive composition suitable to be applied by screen printing | |
JP4809355B2 (en) | Epoxy resin composition and die-bonding agent containing the composition | |
JP5019363B2 (en) | Epoxy resin adhesive composition | |
TWI232467B (en) | Paste for circuit connection, anisotropic conductive paste and uses thereof | |
JP5345313B2 (en) | Film adhesive, semiconductor package using the same, and manufacturing method thereof | |
JP2017105883A (en) | Liquid resin composition, die attach method using the composition, and semiconductor device having cured product of the composition | |
JP6733394B2 (en) | Adhesive sheet and method for manufacturing semiconductor device. | |
TWI879450B (en) | Packaging die attach film for sdbg process, manufacturing method, and using for the same | |
CN114286848B (en) | Semiconductor adhesive composition and semiconductor adhesive film comprising cured product thereof | |
JP7067570B2 (en) | Manufacturing method of semiconductor devices, film-like adhesives and adhesive sheets | |
KR102571498B1 (en) | Epoxy resin compositions for molding | |
WO2023210427A1 (en) | Adhesive composition, film-like adhesive, semiconductor package using film-like adhesive, and method for manufacturing same | |
CN120025754A (en) | Non-conductive and high thermal conductivity laminating film and preparation method thereof | |
TW202521648A (en) | Non-conductive and highly thermally conductive lamination film and manufacturing method thereof | |
JP2006073811A (en) | Die bonding paste | |
JP5637069B2 (en) | Adhesive sheet | |
JP2010132884A (en) | Adhesive sheet and semiconductor element using the same | |
TW202523795A (en) | Highly termal conductive packaging laminating film and manufacturing method thereof | |
TWI871096B (en) | Non-conductive and highly thermal conductive cuo attach adhesive and manufacturing method thereof | |
CN115247038B (en) | Adhesive composites and methods of use thereof | |
CN118685139B (en) | A nano silver high thermal conductivity conductive adhesive for chip and preparation method thereof | |
JP6160431B2 (en) | Epoxy resin composition, die attach method using the same, and semiconductor device having cured product of the composition | |
KR102643484B1 (en) | Granule type resin composition for encapsulating a semiconductor device | |
TW202521658A (en) | Non-conductive and highly thermal conductive cuo attach adhesive and manufacturing method thereof | |
KR102179472B1 (en) | Composition for epoxy molding, and epoxy molding film comprising the same |