TWI876316B - Electronic component processing device and electronic component testing device - Google Patents
Electronic component processing device and electronic component testing device Download PDFInfo
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Abstract
〔課題〕 提供可容易對應待測裝置種類變換,且可採用可分別調整複數個待測裝置之溫度或平行度的構造的電子構件處理裝置。 〔解決方法〕 電子構件處理裝置20包括:複數個保持塊40,配置為對應於探頭17且保持待測裝置200;保持板50,具有插入保持塊的複數個開口51,且可浮動地保持複數個保持塊;對準單元70,與保持塊獨立地設置,相對於保持板移動保持塊,相對於探頭定位待測裝置;以及按壓裝置60,藉由相對於探頭移動保持保持塊的保持板,將待測裝置按壓在探頭。 [Topic] Provide an electronic component processing device that can easily cope with the change of the type of device to be tested and can adopt a structure that can adjust the temperature or parallelism of multiple devices to be tested separately. [Solution] The electronic component processing device 20 includes: a plurality of retaining blocks 40, which are configured to correspond to the probe 17 and hold the device to be tested 200; a retaining plate 50, which has a plurality of openings 51 for inserting the retaining blocks and can float and hold the plurality of retaining blocks; an alignment unit 70, which is independently provided with the retaining block, moves the retaining block relative to the retaining plate, and positions the device to be tested relative to the probe; and a pressing device 60, which presses the device to be tested against the probe by moving the retaining plate that holds the retaining block relative to the probe.
Description
本發明是關於一種處理半導體積體電路元件等被測試電子構件(DUT:Device Under Test)的電子構件處理裝置,以及包括上述電子構件處理裝置的電子構件測試裝置。 The present invention relates to an electronic component processing device for processing electronic components under test (DUT: Device Under Test) such as semiconductor integrated circuit elements, and an electronic component testing device including the electronic component processing device.
已知一種電子構件處理裝置,包括保持複數個裸晶的熱敏頭(thermal head)、移動上述熱敏頭的移動裝置,以及在將複數個裸晶分別定位至接觸部之後,將上述複數個裸晶同時壓至接觸部的對準單元。(例如:參照專利文獻l) An electronic component processing device is known, comprising a thermal head for holding a plurality of bare chips, a moving device for moving the thermal head, and an alignment unit for simultaneously pressing the plurality of bare chips to the contact portion after positioning the plurality of bare chips to the contact portion respectively. (For example: refer to patent document 1)
〔專利文獻1〕日本發明公開2016-85203號公報 [Patent Document 1] Japanese Patent Publication No. 2016-85203
在上述電子構件處理裝置中,上述熱敏頭固定在移動裝置。因此,隨著待測裝置(DUT)的種類變更,測試頭上接觸部的節距或排列改變時,必須變換整個對準單元,會有不易對應待測裝置之種類變換的狀況這樣的問題。 In the electronic component processing device, the thermal head is fixed to the moving device. Therefore, when the pitch or arrangement of the contact parts on the test head changes with the type of the device under test (DUT), the entire alignment unit must be replaced, which makes it difficult to cope with the change of the type of the device under test.
此外,在上述電子構件處理裝置中,複數個裸晶保持在熱敏頭之 同一保持面上。因此,會有難以採用可分別調整上述複數個裸晶之溫度或平行度的構造這樣的問題。 In addition, in the above-mentioned electronic component processing device, a plurality of bare crystals are held on the same holding surface of the thermal head. Therefore, there is a problem that it is difficult to adopt a structure that can adjust the temperature or parallelism of the above-mentioned plurality of bare crystals separately.
本發明欲解決的問題是提供一種電子構件處理裝置及電子構件測試裝置,可容易地對應待測裝置的種類變換,同時可採用可分別調整複數個待測裝置之溫度或平行度的構造。 The problem that the present invention aims to solve is to provide an electronic component processing device and an electronic component testing device that can easily respond to changes in the type of device to be tested, and can also adopt a structure that can adjust the temperature or parallelism of multiple devices to be tested separately.
[1]本發明的型態1為一種電子構件處理裝置,將待測裝置移動至接觸部。電子構件處理裝置包括:複數個保持體,配置為各自對應於該接觸部,且各自保持該待測裝置;保持板,具有複數個第一開口,該些保持體各自插入該些第一開口,並以可浮動的方式保持該些保持體;定位裝置,與該些保持體獨立地設置,藉由相對於該保持板移動該些保持體,決定該待測裝置相對於該接觸部的位置;以及按壓裝置,藉由相對於該接觸部移動保持該些保持體的該保持板,將該待測裝置按壓在該接觸部。該定位裝置抵接該些保持體之後,在相對於該保持板的平面方向上移動該些保持體。 [1] Type 1 of the present invention is an electronic component processing device that moves a device to be tested to a contact portion. The electronic component processing device includes: a plurality of retaining bodies, each configured to correspond to the contact portion and each retaining the device to be tested; a retaining plate having a plurality of first openings, each of which is inserted into the first openings and retains the retaining bodies in a floating manner; a positioning device, which is independently provided with the retaining bodies and determines the position of the device to be tested relative to the contact portion by moving the retaining bodies relative to the retaining plate; and a pressing device, which presses the device to be tested against the contact portion by moving the retaining plate that retains the retaining bodies relative to the contact portion. After the positioning device abuts against the retaining bodies, it moves the retaining bodies in a planar direction relative to the retaining plate.
[2]本發明的型態2亦可為一種電子構件處理裝置,在型態1的電子構件處理裝置中,該按壓裝置包括:保持框架,可拆卸地保持該保持板;以及第一移動裝置,用於移動保持該保持板的該保持框架。 [2] Type 2 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 1, the pressing device includes: a holding frame that detachably holds the holding plate; and a first moving device that is used to move the holding frame that holds the holding plate.
[3]本發明的型態3亦可為一種電子構件處理裝置,在型態1或型態2的電子構件處理裝置中,該些保持體分別包括平行度調整裝置,調整該待測裝置相對於該接觸部之平行度。 [3] Type 3 of the present invention may also be an electronic component processing device. In the electronic component processing device of Type 1 or Type 2, the retaining bodies each include a parallelism adjustment device to adjust the parallelism of the device to be tested relative to the contact portion.
[4]本發明的型態4亦可為一種電子構件處理裝置,在型態3的電子構件處理裝置中,該平行度調整裝置包括:第一調整部,以第一軸作為中心傾斜該待測裝置;以及第二調整部,以第二軸作為中心傾斜該待測裝置。該第一軸為實質上與該接觸部之平面方向平行的軸。該第二軸實質上與該接觸部之 平面方向平行,且在該接觸部之法線方向上投影該第二軸的情況下,該第二軸為相對於該第一軸實質上正交的軸。 [4] Type 4 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 3, the parallelism adjustment device includes: a first adjustment part, which tilts the device to be tested with a first axis as the center; and a second adjustment part, which tilts the device to be tested with a second axis as the center. The first axis is an axis substantially parallel to the plane direction of the contact part. The second axis is substantially parallel to the plane direction of the contact part, and when the second axis is projected in the normal direction of the contact part, the second axis is an axis substantially orthogonal to the first axis.
[5]本發明的型態5亦可為一種電子構件處理裝置,在型態3或型態4的電子構件處理裝置中,電子構件處理裝置更包括:平行度檢測裝置,檢測該待測裝置相對於該接觸部之平行度;以及第一控制裝置,基於藉由該平行度檢測裝置檢測出的該平行度,控制該平行度調整裝置。 [5] Type 5 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 3 or type 4, the electronic component processing device further comprises: a parallelism detection device for detecting the parallelism of the device to be tested relative to the contact portion; and a first control device for controlling the parallelism adjustment device based on the parallelism detected by the parallelism detection device.
[6]本發明的型態6亦可為一種電子構件處理裝置,在型態5的電子構件處理裝置中,該平行度檢測裝置包括:第一感測器,檢測該待測裝置中預定位置之高度;第二感測器,檢測該接觸部中預定位置之高度;以及演算部,基於該第一感測器及該第二感測器的檢測結果,演算該待測裝置相對於該接觸部之平行度。 [6] Type 6 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 5, the parallelism detection device includes: a first sensor for detecting the height of a predetermined position in the device to be tested; a second sensor for detecting the height of a predetermined position in the contact portion; and a calculation unit for calculating the parallelism of the device to be tested relative to the contact portion based on the detection results of the first sensor and the second sensor.
[7]本發明的型態7亦可為一種電子構件處理裝置,在型態6的電子構件處理裝置中,電子構件處理裝置更包括:第二移動裝置,移動該第一感測器及該第二感測器。該第二移動裝置包括:第一平行移動部,沿著與該些保持體之排列方向實質上平行的方向,移動該第一感測器及該第二感測器。該第一平行移動部具有使該第一感測器及該第二感測器可面向該些保持體的動作範圍。 [7] Type 7 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 6, the electronic component processing device further includes: a second moving device for moving the first sensor and the second sensor. The second moving device includes: a first parallel moving part for moving the first sensor and the second sensor along a direction substantially parallel to the arrangement direction of the holding bodies. The first parallel moving part has a range of motion that allows the first sensor and the second sensor to face the holding bodies.
[8]本發明的型態8亦可為一種電子構件處理裝置,在型態3至型態7中任一者的電子構件處理裝置中,該些保持體分別包括高度調整裝置,調整該待測裝置相對於該接觸部之高度。 [8] Type 8 of the present invention may also be an electronic component processing device. In any of the electronic component processing devices of types 3 to 7, the retaining bodies each include a height adjustment device for adjusting the height of the device to be tested relative to the contact portion.
[9]本發明的型態9亦可為一種電子構件處理裝置,在型態6或型態7的電子構件處理裝置中,該些保持體分別包括高度調整裝置,調整該待測裝置相對於該接觸部之高度。該電子構件處理裝置更包括:第二控制裝置,基於該第一感測器及該第二感測器之檢測結果,控制該些高度調整裝置。 [9] Type 9 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 6 or type 7, the retaining bodies respectively include height adjustment devices for adjusting the height of the device to be tested relative to the contact portion. The electronic component processing device further includes: a second control device for controlling the height adjustment devices based on the detection results of the first sensor and the second sensor.
[10]本發明的型態10亦可為一種電子構件處理裝置,在型態1至型態9中任一者的電子構件處理裝置中,該些保持體分別包括熱交換器,與該待測裝置進行熱交換。 [10] Type 10 of the present invention may also be an electronic component processing device. In any electronic component processing device of types 1 to 9, the retaining bodies each include a heat exchanger to perform heat exchange with the device to be tested.
[11]本發明的型態11亦可為一種電子構件處理裝置,在型態10的電子構件處理裝置中,該些保持體分別包括平行度調整裝置,調整該待測裝置相對於該接觸部之平行度。該熱交換器接觸且保持該待測裝置。該平行度調整裝置透過該熱交換器調整該待測裝置之平行度。 [11] The type 11 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 10, the retaining bodies respectively include parallelism adjustment devices for adjusting the parallelism of the device to be tested relative to the contact portion. The heat exchanger contacts and holds the device to be tested. The parallelism adjustment device adjusts the parallelism of the device to be tested through the heat exchanger.
[12]本發明的型態12亦可為一種電子構件處理裝置,在型態1至型態11中任一者的電子構件處理裝置中,該定位裝置包括:抵接體,抵接該些保持體;以及第三移動裝置,移動該抵接體。該第三移動裝置包括第二平行移動部,沿著與該些保持體之排列方向實質上平行的方向,移動該抵接體。該第二平行移動部具有使該抵接體可面向該些保持體的動作範圍。 [12] The type 12 of the present invention may also be an electronic component processing device. In any electronic component processing device of type 1 to type 11, the positioning device includes: an abutting body abutting the holding bodies; and a third moving device moving the abutting body. The third moving device includes a second parallel moving part moving the abutting body along a direction substantially parallel to the arrangement direction of the holding bodies. The second parallel moving part has a range of motion that allows the abutting body to face the holding bodies.
[13]本發明的型態13亦可為一種電子構件處理裝置,在型態1至型態12中任一者的電子構件處理裝置中,電子構件處理裝置更包括:位置檢測裝置,檢測該待測裝置相對於該接觸部的相對位置;以及第三控制裝置,基於藉由該位置檢測裝置檢測出的該相對位置,控制該定位裝置。 [13] Type 13 of the present invention may also be an electronic component processing device. In any one of types 1 to 12, the electronic component processing device further comprises: a position detection device for detecting the relative position of the device to be tested relative to the contact portion; and a third control device for controlling the positioning device based on the relative position detected by the position detection device.
[14]本發明的型態14亦可為一種電子構件處理裝置,在型態13的電子構件處理裝置中,該第三控制裝置控制該定位裝置,決定各自保持在該些保持體的複數個該待測裝置相對於該接觸部的順序位置。 [14] The type 14 of the present invention may also be an electronic component processing device. In the electronic component processing device of type 13, the third control device controls the positioning device to determine the sequential positions of the plurality of devices to be tested, each held on the holding bodies, relative to the contact portion.
[15]本發明的型態15亦可為一種電子構件處理裝置,在型態1至型態14中任一者的電子構件處理裝置中,該待測裝置包含:裸晶單體;2.5D元件中間體,配置有並排在矽中介質上的複數個裸晶;或3D元件中間體,由複數個裸晶互相重疊而成。 [15] Type 15 of the present invention may also be an electronic component processing device, in which in any of types 1 to 14, the device under test comprises: a bare die unit; a 2.5D device intermediate, which is configured with a plurality of bare dies arranged side by side on a silicon medium; or a 3D device intermediate, which is formed by a plurality of bare dies stacked on top of each other.
[16]本發明的型態16為一種電子構件測試裝置,用於測試待測裝 置的電氣特性,包括:型態1至型態15中任一者的電子構件處理裝置;以及測試件,與該接觸部電性連接。 [16] Type 16 of the present invention is an electronic component testing device for testing the electrical characteristics of a device under test, comprising: an electronic component processing device of any one of Types 1 to 15; and a test piece electrically connected to the contact portion.
根據本發明,因為定位裝置從保持體獨立,藉由變換保持體與保持該保持體的保持板,可容易地對應待測裝置之種類變換。 According to the present invention, since the positioning device is independent of the holding body, by changing the holding body and the holding plate holding the holding body, it is easy to correspond to the change of the type of the device to be tested.
此外,根據本發明,因為複數個保持體分別被保持在保持板上,且複數個待測裝置被保持在同一保持面上,可採用可分別調整複數個待測裝置之溫度或平行度的構造。 In addition, according to the present invention, since a plurality of retaining bodies are respectively retained on the retaining plate, and a plurality of devices to be tested are retained on the same retaining surface, a structure that can adjust the temperature or parallelism of a plurality of devices to be tested separately can be adopted.
1:電子構件測試裝置 1: Electronic component testing equipment
10:測試件 10: Test piece
11:主框架 11: Main frame
12:測試頭 12: Test head
15:探針卡 15: Probe card
16:電路板 16: Circuit board
17:探針頭 17: Probe head
18:接觸器 18: Contactor
19:殼體 19: Shell
20:處理器 20: Processor
21:上方基座 21: Upper base
22:下方基座 22: Lower base
30:接觸單元 30: Contact unit
40:保持塊 40: Keep block
41:熱敏頭 41: Thermal head
42:平行度調整裝置 42: Parallelism adjustment device
43:高度調整裝置 43: Height adjustment device
44:本體部分 44: Main body
50:保持板 50: Holding board
51:開口 51: Open mouth
60:按壓裝置 60: Pressing device
61:保持框架 61: Keep the frame
62:移動裝置 62: Mobile device
63:支持部件 63: Support components
64:Z方向軌道 64:Z direction track
65:致動器 65:Actuator
70:對準單元 70: Alignment unit
71:抵接塊 71: Butt block
72:移動裝置 72: Mobile device
73:支持部件 73: Support components
80:相機單元 80: Camera unit
81:第一相機 81: First Camera
82:第二相機 82: Second camera
83:稜鏡 83: Prism
84:稜鏡 84: Prism
85:支持部件 85: Support components
90:感測器單元 90:Sensor unit
91:第一感測器 91: First sensor
92:第二感測器 92: Second sensor
93:稜鏡 93: Prism
94:稜鏡 94: Prism
95:支持部件 95: Support components
100:控制裝置 100: Control device
110:圖像處理部 110: Image processing department
120:第一演算部 120: First calculation unit
130:第二演算部 130: Second calculation unit
140:第三演算部 140: The third calculation unit
150:驅動控制部 150: Drive control unit
200:待測裝置 200: Device under test
210:端子 210: Terminal
211:開口 211: Open mouth
411:上表面 411: Upper surface
412:吸附噴嘴 412: Suction nozzle
413:通道 413: Channel
414:通道 414: Channel
415:鰭片 415: Fins
421:第一調整部 421: First Adjustment Department
422:第二調整部 422: Second Adjustment Department
423:第一致動器 423: First actuator
424:第二致動器 424: Second actuator
431:致動器 431:Actuator
441:凸緣 441: flange
442:下側部分 442: Lower part
611:開口 611: Open your mouth
631:開口 631: Open mouth
711:旋轉驅動部 711: Rotary drive unit
721:X方向軌道 721:X direction track
722:X方向平台 722: X-direction platform
723:Y方向軌道 723:Y direction track
724:Y方向平台 724:Y direction platform
725:Z方向軌道 725:Z direction track
726:Z方向致動器 726:Z-direction actuator
II-II:線段 II-II: Line segment
III:部分 Part III:
IX:部分 IX: Part
IVB-IVB:線段 IVB-IVB: Line segment
IVC-IVC:線段 IVC-IVC: Line segment
OA1:光軸 OA 1 : Optical axis
OA2:光軸 OA 2 : Optical axis
OA3:光軸 OA 3 : Optical axis
OA4:光軸 OA 4 : Optical axis
S10:步驟 S10: Step
S20:步驟 S20: Step
S30:步驟 S30: Step
S40:步驟 S40: Step
S50:步驟 S50: Step
S60:步驟 S60: Step
S70:步驟 S70: Step
S80:步驟 S80: Step
第1圖為本發明的實施例中,電子構件測試裝置之內部構造的示意剖面圖。 Figure 1 is a schematic cross-sectional view of the internal structure of the electronic component testing device in an embodiment of the present invention.
第2圖為沿著第1圖之II-II線段的剖面圖。 Figure 2 is a cross-sectional view along line II-II in Figure 1.
第3圖為本發明的實施例中保持塊的剖面圖,為第1圖的III部分之放大圖。 Figure 3 is a cross-sectional view of the retaining block in an embodiment of the present invention, which is an enlarged view of part III of Figure 1.
第4圖(a)為本發明的實施例中,相機單元及感測器單元的平面圖,第4圖(b)為沿著第4圖(a)之IVB-IVB線段的剖面圖,第4圖(c)為沿著第4圖(a)之IVC-IVC線段的剖面圖。 FIG4(a) is a plan view of the camera unit and the sensor unit in an embodiment of the present invention, FIG4(b) is a cross-sectional view along the IVB-IVB line segment of FIG4(a), and FIG4(c) is a cross-sectional view along the IVC-IVC line segment of FIG4(a).
第5圖為本發明的實施例中,電子構件處理裝置之控制系統的示意方塊圖。 Figure 5 is a schematic block diagram of the control system of the electronic component processing device in an embodiment of the present invention.
第6圖為本發明的實施例中,藉由電子構件測試裝置定位之方法的示意流程圖。 Figure 6 is a schematic flow chart of a method for positioning an electronic component testing device in an embodiment of the present invention.
第7圖(a)及第7圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S10的示意圖。 Figure 7 (a) and Figure 7 (b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S10 of Figure 6.
第8圖(a)及第8圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S20的示意圖。 Figures 8(a) and 8(b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S20 of Figure 6.
第9圖為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖 之步驟S30的示意圖,為對應於第8圖之IX部分的放大圖。 FIG. 9 is a schematic cross-sectional view of the operation of the electronic component testing device in an embodiment of the present invention, which is a schematic view of step S30 of FIG. 6 and an enlarged view corresponding to part IX of FIG. 8.
第10圖(a)及第10圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S40的示意圖。 Figures 10(a) and 10(b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S40 of Figure 6.
第11圖(a)及第11圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S50的示意圖。 Figures 11(a) and 11(b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S50 of Figure 6.
第12圖(a)及第12圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S60的示意圖。 Figures 12(a) and 12(b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S60 of Figure 6.
第13圖(a)及第13圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S10的示意圖。 Figures 13(a) and 13(b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S10 of Figure 6.
第14圖(a)及第14圖(b)為本發明的實施例中,電子構件測試裝置之動作的示意剖面圖,為第6圖之步驟S80的示意圖。 Figures 14 (a) and 14 (b) are schematic cross-sectional views of the operation of the electronic component testing device in an embodiment of the present invention, and are schematic views of step S80 of Figure 6.
以下基於圖式來說明本發明的實施例。 The following is an explanation of the embodiments of the present invention based on the drawings.
第1圖為本發明的實施例中,電子構件測試裝置1之內部構造的示意剖面圖。第2圖為沿著第1圖之II-II線段的剖面圖。 Figure 1 is a schematic cross-sectional view of the internal structure of the electronic component testing device 1 in an embodiment of the present invention. Figure 2 is a cross-sectional view along the II-II line segment of Figure 1.
本實施例的電子構件測試裝置1為測試待測裝置200之電氣特性的裝置。如第1圖及第2圖所示,此種電子構件測試裝置1包括測試待測裝置200的測試件10,以及運送待測裝置200且將待測裝置200壓至探針卡15的處理器20。此種處理器20在本發明的型態中相當於「電子構件處理裝置」的一種範例。 The electronic component testing device 1 of this embodiment is a device for testing the electrical characteristics of the device under test 200. As shown in Figures 1 and 2, this electronic component testing device 1 includes a test piece 10 for testing the device under test 200, and a processor 20 for transporting the device under test 200 and pressing the device under test 200 onto the probe card 15. This processor 20 is equivalent to an example of an "electronic component processing device" in the form of the present invention.
作為測試對象的待測裝置200之具體範例,舉例來說,可例示為將半導體晶圓切割後的裸晶(裸晶片)。並且,待測裝置200不限於裸晶單體,舉例來說,待測裝置200亦可為2.5D元件中間體或3D元件中間體。 As a specific example of the device under test 200 as a test object, for example, it can be illustrated as a bare crystal (bare chip) after cutting a semiconductor wafer. In addition, the device under test 200 is not limited to a bare crystal unit. For example, the device under test 200 can also be a 2.5D component intermediate or a 3D component intermediate.
在此,2.5D元件中間體為一種元件中間體,包括矽中介質以及並 排在該矽中介質上的複數個裸晶。舉例來說,此種2.5D元件中間體被安裝在電路基板上且藉由樹脂材料封裝而成為最終製品(即,2.5D裝置(2.5-dimensional device))。 Here, a 2.5D device intermediate is a device intermediate including a silicon interposer and a plurality of bare chips arranged in parallel on the silicon interposer. For example, such a 2.5D device intermediate is mounted on a circuit substrate and packaged by a resin material to form a final product (i.e., a 2.5D device).
另一方面,3D元件中間體為一種元件中間體,包括複數個裸晶,此些裸晶互相堆疊且藉由矽通孔電極(Through-Silicon Via,TSV)電性連接。舉例來說,此種3D元件中間體與上述2.5D元件中間體一樣,被安裝在電路基板上且藉由樹脂材料封裝而成為最終製品(即,3D裝置(Three-dimensional device))。 On the other hand, a 3D device intermediate is a device intermediate that includes a plurality of bare chips stacked on top of each other and electrically connected via through-silicon vias (TSVs). For example, this 3D device intermediate is mounted on a circuit substrate and packaged with a resin material to form a final product (i.e., a 3D device) like the above-mentioned 2.5D device intermediate.
如第1圖及第2圖所示,測試件10包括主框架(測試件本體)11以及測試頭12。主框架11透過電纜(圖未示)連接測試頭12。探針卡15電性連接在測試頭12處。此種探針卡15透過形成在處理器20之上方基座21處的開口211,進入處理器20之內部。 As shown in Figures 1 and 2, the test piece 10 includes a main frame (test piece body) 11 and a test head 12. The main frame 11 is connected to the test head 12 via a cable (not shown). The probe card 15 is electrically connected to the test head 12. This probe card 15 enters the interior of the processor 20 through an opening 211 formed at the upper base 21 of the processor 20.
探針卡15包括電路板16以及安裝在該電路板16上的四個探針頭17。一個探針頭17對應於一個待測裝置200,使得在本實施例中可同時測試四個待測裝置200。此四個待測裝置200沿著圖中的X方向等間隔地在電路板16上配置成一列。此種探針頭17在本發明的型態中相當於「接觸部」的一種範例。 The probe card 15 includes a circuit board 16 and four probe heads 17 mounted on the circuit board 16. One probe head 17 corresponds to one device under test 200, so that four devices under test 200 can be tested simultaneously in this embodiment. The four devices under test 200 are arranged in a row on the circuit board 16 at equal intervals along the X direction in the figure. This probe head 17 is equivalent to an example of a "contact part" in the type of the present invention.
並且,包括探針卡15的探針頭17不特別限於上述之數量,而可根據電子構件測試裝置1中同時測試的待測裝置200數量(同時測定數)而定。此外,包括探針卡15的探針頭17也不特別限於上述之排列。 Furthermore, the number of probe heads 17 including the probe card 15 is not particularly limited to the above-mentioned number, but can be determined according to the number of devices to be tested 200 (simultaneous measurement number) tested simultaneously in the electronic component testing device 1. Furthermore, the number of probe heads 17 including the probe card 15 is not particularly limited to the above-mentioned arrangement.
探針頭17各自包括接觸待測裝置200之端子的接觸器18以及保持該接觸器18的殼體19。作為接觸器18,不特別限定,可例示為單針彈簧連接器、垂直型探針、懸臂型探針、異向導電性橡膠板、設置於膜上的凸塊或利用微機電系統(MEMS)技術製成的接觸器。舉例來說,藉由將殼體19螺栓固定至電路板16,將探針頭17各自固定至電路板16。 Each probe head 17 includes a contactor 18 that contacts the terminal of the device under test 200 and a housing 19 that holds the contactor 18. The contactor 18 is not particularly limited, and examples thereof include a single needle spring connector, a vertical probe, a cantilever probe, an anisotropic conductive rubber sheet, a bump disposed on a film, or a contactor made using micro-electromechanical system (MEMS) technology. For example, the probe heads 17 are each fixed to the circuit board 16 by bolting the housing 19 to the circuit board 16.
如第1圖及第2圖所示,處理器20包括接觸單元30、對準單元70、 相機單元80、感測器單元90以及控制裝置100(參照第5圖)。 As shown in FIG. 1 and FIG. 2, the processor 20 includes a contact unit 30, an alignment unit 70, a camera unit 80, a sensor unit 90, and a control device 100 (see FIG. 5).
接觸單元30為一種單元,將待測裝置200壓至探針頭17。對準單元70為一種定位裝置,藉由水平移動保持待測裝置200的接觸單元30之保持塊40(下文描述),決定待測裝置200相對於探針頭17的位置。 The contact unit 30 is a unit that presses the device under test 200 to the probe head 17. The alignment unit 70 is a positioning device that determines the position of the device under test 200 relative to the probe head 17 by horizontally moving the holding block 40 (described below) of the contact unit 30 that holds the device under test 200.
相機單元80為一種攝影單元,拍攝探針頭17以及被保持在保持塊40的待測裝置200。感測器單元90為一種檢測單元,檢測探針頭17及待測裝置200中各自預定位置的高度。 The camera unit 80 is a photographing unit that photographs the probe head 17 and the device to be tested 200 held in the holding block 40. The sensor unit 90 is a detection unit that detects the height of each predetermined position in the probe head 17 and the device to be tested 200.
控制裝置100為一種控制裝置,控制包括接觸單元30及對準單元70的各種致動器。此外,此種控制裝置100包括對藉由相機單元80取得的圖像資訊進行圖像處理,以及識別待測裝置200相對於探針頭17之相對位置的功能。進一步地,此種控制裝置100包括基於感測器單元90的檢測結果,檢測待測裝置200相對於探針頭17之相對平行度,以及檢測待測裝置200相對於探針頭17之相對高度的功能。 The control device 100 is a control device that controls various actuators including the contact unit 30 and the alignment unit 70. In addition, the control device 100 includes a function of processing the image information obtained by the camera unit 80 and identifying the relative position of the device to be tested 200 relative to the probe head 17. Further, the control device 100 includes a function of detecting the relative parallelism of the device to be tested 200 relative to the probe head 17 and detecting the relative height of the device to be tested 200 relative to the probe head 17 based on the detection result of the sensor unit 90.
在本實施例中,雖然未特別圖示,運送裝置從托盤或板拿取測試前的待測裝置200,並將該待測裝置200運送至接觸單元30的保持塊40。 In this embodiment, although not specifically illustrated, the transport device takes the device to be tested 200 before testing from a tray or a plate and transports the device to be tested 200 to the holding block 40 of the contact unit 30.
作為上述運送裝置的具體範例,雖然不特別限定,可例示為包括吸盤的取放裝置。此外,作為上述托盤的具體範例,雖然不特別限定,舉例來說,可例示為符合JEDEC(Joint Electron Device Engineering Council)規格的訂製托盤。此外,作為上述板的具體範例,雖然不特別限定,舉例來說,可例示為可保持待測裝置200的緩衝板。並且,亦可將測試前的待測裝置200保持在環形框架(晶圓環),來代替上述托盤或板。 As a specific example of the above-mentioned transport device, although not particularly limited, a pick-and-place device including a suction cup can be exemplified. In addition, as a specific example of the above-mentioned tray, although not particularly limited, for example, a customized tray that complies with the JEDEC (Joint Electron Device Engineering Council) specification can be exemplified. In addition, as a specific example of the above-mentioned board, although not particularly limited, for example, a buffer board that can hold the device under test 200 can be exemplified. In addition, the device under test 200 before testing can also be held on a ring frame (wafer ring) instead of the above-mentioned tray or board.
接著,將待測裝置200保持在保持塊40之後,藉由對準單元70調整保持塊40的位置,藉此決定待測裝置200相對於探針頭17的位置。然後,接觸單元30的按壓裝置60將待測裝置200壓至探針頭17,將待測裝置200電性連接至 探針頭17。在此狀態下,測試件10測試待測裝置200的電氣特性。 Next, after the device under test 200 is held in the holding block 40, the position of the holding block 40 is adjusted by the alignment unit 70, thereby determining the position of the device under test 200 relative to the probe head 17. Then, the pressing device 60 of the contact unit 30 presses the device under test 200 to the probe head 17, electrically connecting the device under test 200 to the probe head 17. In this state, the test piece 10 tests the electrical characteristics of the device under test 200.
待測裝置200的測試完成後,上述運送裝置從保持塊40拿取測試完的待測裝置200,運送至托盤或板。並且,運送裝置亦可將測試完的待測裝置200運送至環形框架(晶圓環),來代替上述托盤或板。 After the test of the device to be tested 200 is completed, the transport device takes the tested device to be tested 200 from the holding block 40 and transports it to a tray or a plate. In addition, the transport device can also transport the tested device to be tested 200 to a ring frame (wafer ring) to replace the tray or plate.
在下文中,除了第1圖及第2圖,一併參照第3圖至第5圖詳細描述關於接觸單元30、對準單元70、相機單元80、感測器單元90以及控制裝置100的構造。 In the following, in addition to Figures 1 and 2, Figures 3 to 5 are referred to for a detailed description of the structures of the contact unit 30, the alignment unit 70, the camera unit 80, the sensor unit 90, and the control device 100.
第3圖為本發明的實施例中保持塊40的剖面圖,為第1圖的III部分之放大圖。第4圖(a)為本發明的實施例中,相機單元及感測器單元的平面圖,第4圖(b)為沿著第4圖(a)之IVB-IVB線段的剖面圖,第4圖(c)為沿著第4圖(a)之IVC-IVC線段的剖面圖。第5圖為本發明的實施例中,處理器20之控制系統的示意方塊圖。 FIG. 3 is a cross-sectional view of the retaining block 40 in an embodiment of the present invention, and is an enlarged view of part III of FIG. 1. FIG. 4 (a) is a plan view of the camera unit and the sensor unit in an embodiment of the present invention, FIG. 4 (b) is a cross-sectional view along the IVB-IVB line segment of FIG. 4 (a), and FIG. 4 (c) is a cross-sectional view along the IVC-IVC line segment of FIG. 4 (a). FIG. 5 is a schematic block diagram of the control system of the processor 20 in an embodiment of the present invention.
如第1圖及第2圖所示,接觸單元30包括保持塊40、保持板50以及按壓裝置60。在本實施例中,為了對應上述具有探針卡15的探針頭17之數量,接觸單元30包括四個保持塊40。此種保持塊40在本發明的型態中相當於「保持體」的一種範例。並且,接觸單元30具有的保持塊40不特別限定於上述之數量,可設定為探針卡15所具有的探針頭17數量。 As shown in FIG. 1 and FIG. 2, the contact unit 30 includes a retaining block 40, a retaining plate 50, and a pressing device 60. In this embodiment, in order to correspond to the number of probe heads 17 with the probe card 15, the contact unit 30 includes four retaining blocks 40. Such retaining blocks 40 are equivalent to an example of a "retaining body" in the form of the present invention. In addition, the retaining blocks 40 of the contact unit 30 are not particularly limited to the above-mentioned number, and can be set to the number of probe heads 17 possessed by the probe card 15.
在本實施例中,對準單元70的抵接塊71(下文描述)可抵接在保持塊40,因為保持塊40從對準單元70獨立,藉由將保持塊40變換為適合於種類變換後的待測裝置200之保持塊40,變得可容易地對應待測裝置200的種類變換。 In this embodiment, the abutment block 71 (described below) of the alignment unit 70 can abut against the retaining block 40. Since the retaining block 40 is independent of the alignment unit 70, by changing the retaining block 40 to a retaining block 40 suitable for the device under test 200 after the type change, it becomes easy to correspond to the type change of the device under test 200.
此外,在本實施例中,因為四個保持塊40分別保持在保持板50上,變得可採用可分別調整該四個待測裝置200之溫度或平行度的構造。 In addition, in this embodiment, since the four retaining blocks 40 are respectively retained on the retaining plate 50, a structure that can adjust the temperature or parallelism of the four devices to be tested 200 separately can be adopted.
具體而言,如第3圖所示,保持塊40各自包括熱敏頭41、平行度調整裝置42、高度調整裝置43以及本體部分44。此種熱敏頭41在本發明的型態 中相當於「熱交換器」的一種範例。 Specifically, as shown in FIG. 3, each retaining block 40 includes a thermal head 41, a parallelism adjustment device 42, a height adjustment device 43, and a main body 44. This thermal head 41 is equivalent to an example of a "heat exchanger" in the form of the present invention.
熱敏頭41為一種進行熱交換的部件,在保持待測裝置200的同時,與該待測裝置200進行熱交換。在此種熱敏頭41的上表面411處,承載藉由上述運送裝置(圖未示)運送的待測裝置200。在此種熱敏頭41的上表面411處開有吸附噴嘴412。此種吸附噴嘴412透過在熱敏頭41內形成的通道413,連接至真空泵(圖未示),而可吸附保持待測裝置200。 The thermal head 41 is a component for heat exchange, and while holding the device to be tested 200, it exchanges heat with the device to be tested 200. The device to be tested 200 transported by the above-mentioned transport device (not shown) is carried on the upper surface 411 of the thermal head 41. An adsorption nozzle 412 is opened on the upper surface 411 of the thermal head 41. The adsorption nozzle 412 is connected to a vacuum pump (not shown) through a channel 413 formed in the thermal head 41, and can adsorb and hold the device to be tested 200.
此外,在此種熱敏頭41的內部形成有可流通溫度調整用液體的通道414。舉例來說,在此種通道414中,設有複數個鰭片415,可與液體進行有效率的熱交換。並且,通道414的形狀若是可以有效率地熱交換的形狀則不特別限定於上述形狀。 In addition, a channel 414 is formed inside the thermal head 41 through which the temperature adjustment liquid can flow. For example, in the channel 414, a plurality of fins 415 are provided to efficiently exchange heat with the liquid. Furthermore, the shape of the channel 414 is not particularly limited to the above shape as long as it can efficiently exchange heat.
雖然未特別圖示,在此種通道414處,連接至可供給冷媒及溫媒兩種液體的溫度調整裝置。舉例來說,在待測裝置200之溫度比目標溫度高的情況下,將具有將待測裝置200冷卻之溫度的液體供給至通道414。與此相對地,在待測裝置200之溫度比目標溫度低的情況下,將具有將待測裝置200加熱之溫度的液體供給至通道414。 Although not specifically shown, such a channel 414 is connected to a temperature adjustment device that can supply two liquids, a coolant and a warm medium. For example, when the temperature of the device to be tested 200 is higher than the target temperature, a liquid having a temperature that cools the device to be tested 200 is supplied to the channel 414. On the other hand, when the temperature of the device to be tested 200 is lower than the target temperature, a liquid having a temperature that heats the device to be tested 200 is supplied to the channel 414.
並且,連接至通道414的溫度調整裝置亦可為僅可供給冷媒或溫媒其中一者的裝置。在溫度調整裝置僅供給冷媒至通道414的情況下,熱敏頭41亦可包括加熱器等加熱裝置。或者,在溫度調整裝置僅供給溫媒至通道414的情況下,通道414亦可包括珀耳帖元件等冷卻裝置。或者,熱敏頭41亦可包括加熱裝置及冷卻裝置,來代替上述通道414。 Furthermore, the temperature adjustment device connected to the channel 414 may also be a device that can only supply one of the refrigerant or the warm medium. When the temperature adjustment device only supplies the refrigerant to the channel 414, the thermal head 41 may also include a heating device such as a heater. Alternatively, when the temperature adjustment device only supplies the warm medium to the channel 414, the channel 414 may also include a cooling device such as a Peltier element. Alternatively, the thermal head 41 may also include a heating device and a cooling device to replace the above-mentioned channel 414.
平行度調整裝置42配置在熱敏頭41的下側,該熱敏頭41固定至平行度調整裝置42。此種平行度調整裝置42為一種調整裝置,調整保持在熱敏頭41處的待測裝置200之滾動及俯仰,舉例來說,為包括第一調整部421及第二調整部422的雙軸測角台。雖然不特別限定,在本實施例中,第二調整部422設於 第一調整部421之下方,且第一調整部421及第二調整部422互相固定。 The parallelism adjustment device 42 is disposed at the lower side of the thermal head 41, and the thermal head 41 is fixed to the parallelism adjustment device 42. This parallelism adjustment device 42 is an adjustment device that adjusts the roll and pitch of the device to be measured 200 held at the thermal head 41, for example, a two-axis angle measuring table including a first adjustment part 421 and a second adjustment part 422. Although not particularly limited, in this embodiment, the second adjustment part 422 is disposed below the first adjustment part 421, and the first adjustment part 421 and the second adjustment part 422 are fixed to each other.
第一調整部421為以第一軸作為中心旋轉(傾斜)熱敏頭41的測角台,為調整待測裝置200之滾動的裝置。在此,上述第一軸為實質上平行於探針頭17之平面方向(圖中的XY方向)的軸,在圖中為實質上平行於Y軸的軸。 The first adjustment part 421 is a measuring platform for rotating (tilting) the thermal head 41 with the first axis as the center, and is a device for adjusting the rolling of the device to be tested 200. Here, the first axis is an axis substantially parallel to the plane direction of the probe head 17 (XY direction in the figure), and in the figure, it is an axis substantially parallel to the Y axis.
此種第一調整部421藉由第一致動器423驅動。作為此第一致動器423的具體範例,雖然不特別限定,舉例來說,可例示為包括渦齒輪機構的電動馬達。 The first adjustment unit 421 is driven by the first actuator 423. Although not particularly limited, as a specific example of the first actuator 423, for example, it can be illustrated as an electric motor including a turbine mechanism.
與此相對地,第二調整部422為以第二軸作為中心旋轉(傾斜)熱敏頭41的測角台,為調整待測裝置200之俯仰的裝置。在此,上述第二軸為實質上平行於探針頭17之平面方向(圖中的XY方向)的軸,並且在探針頭17之法線方向(圖中的Z方向)(待測裝置200朝向探針頭17的按壓方向)上投影該第二軸的情況下,該第二軸為與上述第一軸實質上正交的軸,在圖中為實質上平行於X軸的軸。 In contrast, the second adjustment section 422 is a goniometer for rotating (tilting) the thermal head 41 around the second axis, and is a device for adjusting the pitch of the device to be tested 200. Here, the second axis is substantially parallel to the plane direction of the probe head 17 (the XY direction in the figure), and when the second axis is projected on the normal direction of the probe head 17 (the Z direction in the figure) (the pressing direction of the device to be tested 200 toward the probe head 17), the second axis is substantially orthogonal to the first axis, and is substantially parallel to the X axis in the figure.
此種第二調整部422藉由第二致動器424驅動。作為此第二致動器424的具體範例,雖然不特別限定,與上述第一致動器423同樣地,舉例來說,可例示為包括渦齒輪機構的電動馬達。 This second adjustment unit 422 is driven by a second actuator 424. As a specific example of this second actuator 424, although not particularly limited, it can be exemplified as an electric motor including a turbine mechanism, similarly to the first actuator 423 described above.
藉由此第一調整部421以第一軸作為中心旋轉熱敏頭41且藉由第二調整部422以第二軸作為中心旋轉熱敏頭41,藉此可任意地傾斜保持在該熱敏頭41的待測裝置200,而可調整待測裝置200相對於探針頭17的平行度。並且,此種包括平行度調整裝置42的機構若是可任意地傾斜待測裝置200的機構則不限於上述的測角台。 By rotating the thermal head 41 around the first axis by the first adjustment part 421 and rotating the thermal head 41 around the second axis by the second adjustment part 422, the device to be tested 200 held on the thermal head 41 can be tilted arbitrarily, and the parallelism of the device to be tested 200 relative to the probe head 17 can be adjusted. Moreover, if the mechanism including the parallelism adjustment device 42 is a mechanism that can tilt the device to be tested 200 arbitrarily, it is not limited to the above-mentioned angle measuring stage.
高度調整裝置43設於平行度調整裝置42的下側,該平行度調整裝置42固定至高度調整裝置43。此種高度調整裝置43可藉由致動器431在上下方向(圖中的Z軸方向)上移動熱敏頭41及平行度調整裝置42。此種高度調整裝置43可 用於抵消隨著藉由平行度調整裝置42調整待測裝置200之平行度所產生的該待測裝置200高度方向的位移。作為此種高度調整裝置43的致動器431之具體範例,雖然不特別限定,舉例來說,可例示為連接至滾珠螺紋機構的電動馬達。 The height adjustment device 43 is provided at the lower side of the parallelism adjustment device 42, and the parallelism adjustment device 42 is fixed to the height adjustment device 43. Such a height adjustment device 43 can move the thermal head 41 and the parallelism adjustment device 42 in the vertical direction (Z-axis direction in the figure) by means of an actuator 431. Such a height adjustment device 43 can be used to offset the displacement in the height direction of the device to be tested 200 generated by adjusting the parallelism of the device to be tested 200 by means of the parallelism adjustment device 42. As a specific example of the actuator 431 of such a height adjustment device 43, although not particularly limited, for example, it can be exemplified as an electric motor connected to a ball screw mechanism.
並且,在上述平行度調整裝置42的第一軸及第二軸與保持在保持塊40之待測裝置200的重心重合的情況下,亦可省略此種高度調整裝置43。 Furthermore, when the first axis and the second axis of the parallelism adjustment device 42 coincide with the center of gravity of the device to be tested 200 held in the holding block 40, the height adjustment device 43 can be omitted.
本體部分44設於高度調整裝置43的下側,該高度調整裝置43固定至本體部分44。此種本體部分44在其上方部分包括在水平方向(圖中的XY平面方向)上突出的凸緣441。相較於本體部分44中比該凸緣441下側的下側部分442,此種凸緣441具有更大的外徑。上述第一致動器423、第二致動器424及致動器431亦可收納於此本體部分44的內部。 The body part 44 is provided at the lower side of the height adjustment device 43, and the height adjustment device 43 is fixed to the body part 44. The body part 44 includes a flange 441 protruding in the horizontal direction (the XY plane direction in the figure) at its upper part. The flange 441 has a larger outer diameter than the lower side part 442 of the body part 44 below the flange 441. The first actuator 423, the second actuator 424 and the actuator 431 can also be accommodated inside the body part 44.
如第1圖及第2圖所示,接觸單元30的保持板50為包括四個開口51的板狀部件。此四個開口51為了對應上述探針卡15中探針頭17的排列,沿著圖中的X方向等間隔地配置成一列。保持板50亦可包括吸附保持機構,吸附保持插入至開口51的保持塊40。 As shown in FIG. 1 and FIG. 2, the retaining plate 50 of the contact unit 30 is a plate-shaped component including four openings 51. The four openings 51 are arranged in a row at equal intervals along the X direction in the figure to correspond to the arrangement of the probe heads 17 in the probe card 15. The retaining plate 50 may also include an adsorption and retention mechanism to adsorb and retain the retaining block 40 inserted into the opening 51.
並且,保持板50所具有的開口51不特別限定於上述之數量,而可設定為對應探針卡15所具有的探針頭17之數量。同樣地,保持板50中的開口51亦不特別限定於上述之排列,可設定為對應探針卡15中探針頭17之排列。 Furthermore, the openings 51 of the retaining plate 50 are not particularly limited to the above-mentioned number, but can be set to correspond to the number of probe heads 17 of the probe card 15. Similarly, the openings 51 in the retaining plate 50 are not particularly limited to the above-mentioned arrangement, but can be set to correspond to the arrangement of the probe heads 17 in the probe card 15.
開口51各自具有內徑,該內徑小於上述保持塊40之本體部分44之凸緣441的外徑,且大於該本體部分44之下側部分442的外徑。此種開口51在本發明的型態中相當於「第一開口」的一種範例。 Each opening 51 has an inner diameter that is smaller than the outer diameter of the flange 441 of the main body portion 44 of the retaining block 40 and larger than the outer diameter of the lower side portion 442 of the main body portion 44. This opening 51 is equivalent to an example of a "first opening" in the present invention.
接著,四個保持塊40各自從上方插入保持板50的開口51。此時,如第3圖所示,因為此開口51的內徑大於本體部分44之下側部分442的外徑,該下側部分442進入該開口51。與此相對地,因為此開口51的內徑小於本體部分44之凸緣441的外徑,該凸緣441接合在開口51的周緣。 Next, the four retaining blocks 40 are each inserted from above into the opening 51 of the retaining plate 50. At this time, as shown in FIG. 3, because the inner diameter of the opening 51 is larger than the outer diameter of the lower side portion 442 of the main body portion 44, the lower side portion 442 enters the opening 51. Conversely, because the inner diameter of the opening 51 is smaller than the outer diameter of the flange 441 of the main body portion 44, the flange 441 is engaged with the periphery of the opening 51.
因此,保持塊40可浮動地保持在保持板50。換句話說,藉由在推起保持塊40的狀態下水平移動保持塊40,可在開口51的範圍內相對於保持板50相對地水平移動保持塊40。 Therefore, the retaining block 40 can be held in a floating manner on the retaining plate 50. In other words, by horizontally moving the retaining block 40 while the retaining block 40 is pushed up, the retaining block 40 can be horizontally moved relative to the retaining plate 50 within the range of the opening 51.
接觸單元30之按壓裝置60為一種移動裝置,相對於探針卡15在上下方向(圖中的Z軸方向)上移動保持保持塊40的保持板50,將保持在保持塊40的待測裝置200壓至探針頭17。如第1圖及第2圖所示,此種按壓裝置60包括保持保持板50的保持框架61以及移動該保持框架61的移動裝置62。此種移動裝置62在本發明的型態中相當於「第一移動裝置」的一種範例。 The pressing device 60 of the contact unit 30 is a moving device that moves the holding plate 50 holding the holding block 40 in the up-down direction (Z-axis direction in the figure) relative to the probe card 15, and presses the device to be tested 200 held on the holding block 40 to the probe head 17. As shown in Figures 1 and 2, the pressing device 60 includes a holding frame 61 holding the holding plate 50 and a moving device 62 moving the holding frame 61. The moving device 62 is equivalent to an example of a "first moving device" in the present invention.
保持框架61為具有開口611的框形部件。此種開口611具有內徑,該內徑在平面視角中包含保持板50所具有的全部開口51。在保持板50保持在保持框架61時,此種開口611配置為面向保持板50所具有的所有開口51。 The retaining frame 61 is a frame-shaped component having an opening 611. Such an opening 611 has an inner diameter, and the inner diameter includes all the openings 51 of the retaining plate 50 in a planar view. When the retaining plate 50 is retained in the retaining frame 61, such an opening 611 is configured to face all the openings 51 of the retaining plate 50.
並且,保持框架61不特別限定於上述之形狀。舉例來說,在保持框架61亦可設置與保持板50的開口51數量相同的開口611,保持框架61的複數個開口611分別對應於保持板50的複數個開口51。或者,舉例來說,代替上述的框形部件,保持框架61亦可構造為僅保持保持板50中互相相對之短邊的一對部件。 Furthermore, the retaining frame 61 is not particularly limited to the above-mentioned shape. For example, the retaining frame 61 may also be provided with the same number of openings 611 as the openings 51 of the retaining plate 50, and the plurality of openings 611 of the retaining frame 61 respectively correspond to the plurality of openings 51 of the retaining plate 50. Alternatively, for example, instead of the above-mentioned frame-shaped component, the retaining frame 61 may also be constructed as a pair of components that only retain the short sides of the retaining plate 50 that are opposite to each other.
此種保持框架61可拆卸地保持上述保持板50。因此,隨著待測裝置200的種類變換,除了上述的保持塊40之外,藉由變換適合於該種類變換後的待測裝置200之保持板50,可容易地對應待測裝置200的種類變換。 This type of holding frame 61 can detachably hold the holding plate 50. Therefore, as the type of the device to be tested 200 changes, in addition to the above-mentioned holding block 40, by changing the holding plate 50 suitable for the device to be tested 200 after the type change, it is easy to correspond to the type change of the device to be tested 200.
關於保持塊40,舉例來說,變換為具有保持表面(熱敏頭41的上表面411)的保持塊40,該保持表面的大小對應於該種類變換後的待測裝置200之大小。此外,關於保持板50,舉例來說,變換為具有開口51的保持板50,該開口51對應於用於測試該種類變換後的待測裝置200之探針頭17的節距或排列。 Regarding the retaining block 40, for example, it is changed to a retaining block 40 having a retaining surface (upper surface 411 of the thermal head 41), the size of which corresponds to the size of the device to be tested 200 after the type change. In addition, regarding the retaining plate 50, for example, it is changed to a retaining plate 50 having an opening 51, and the opening 51 corresponds to the pitch or arrangement of the probe head 17 used to test the device to be tested 200 after the type change.
移動裝置62包括支持部件63、Z方向軌道64以及致動器65。雖然 未特別圖示,舉例來說,支持部件63固定在處理器20的下方基座22。並且,如下文所述,此種支持部件63亦可相對於下方基座22水平移動。 The moving device 62 includes a supporting member 63, a Z-direction track 64, and an actuator 65. Although not specifically illustrated, for example, the supporting member 63 is fixed to the lower base 22 of the processor 20. Moreover, as described below, such a supporting member 63 can also move horizontally relative to the lower base 22.
此種支持部件63藉由Z方向軌道64支持保持框架61。保持框架61可藉由Z方向軌道64而在上下方向(圖中的Z軸方向)上滑動。此種保持框架61藉由致動器65驅動。作為此致動器65的實施例範例,雖然未特別限定,舉例來說,可例示為包括滾珠螺紋機構的電動馬達等。 This support member 63 supports the holding frame 61 via the Z-direction track 64. The holding frame 61 can slide in the up and down direction (Z-axis direction in the figure) via the Z-direction track 64. This holding frame 61 is driven by an actuator 65. As an example of an embodiment of this actuator 65, although not particularly limited, for example, an electric motor including a ball screw mechanism can be exemplified.
在此種支持部件63亦可形成開口631。與上述保持框架61之開口611相同,此種開口631具有內徑,該內徑在平面視角中包含保持板50所具有的全部開口51。在保持框架61保持在支持部件63時,此種開口631配置為面向保持框架61的開口611。 An opening 631 may also be formed in this support member 63. Like the opening 611 of the retaining frame 61, this opening 631 has an inner diameter that includes all openings 51 of the retaining plate 50 in a planar view. When the retaining frame 61 is retained on the support member 63, this opening 631 is configured to face the opening 611 of the retaining frame 61.
如第1圖及第2圖所示,對準單元70包括抵接塊71以及移動裝置72。此種對準單元70在本發明的型態中相當於「定位裝置」的一種範例。抵接塊71在本發明的型態中相當於「抵接體」的一種範例。移動裝置72在本發明的型態中相當於「第三移動裝置」的一種範例。 As shown in Figures 1 and 2, the alignment unit 70 includes an abutment block 71 and a moving device 72. Such an alignment unit 70 is equivalent to an example of a "positioning device" in the form of the present invention. The abutment block 71 is equivalent to an example of an "abutment body" in the form of the present invention. The moving device 72 is equivalent to an example of a "third moving device" in the form of the present invention.
抵接塊71為一種抵接部件,抵接至接觸單元30的保持塊40。此種抵接塊71亦可包括以Z軸作為中心旋轉保持塊40的旋轉驅動部711(參照第3圖)。並且,在本實施例中,雖然此種抵接塊71接觸保持塊40之本體部分44之下側部分442的底部表面,但不特別限定於此,抵接塊71亦可接觸本體部分44之凸緣441。此外,抵接塊71亦可包括吸附保持機構,用於吸附保持接觸該抵接塊71的保持塊40。 The abutment block 71 is an abutment component that abuts against the retaining block 40 of the contact unit 30. Such abutment block 71 may also include a rotation drive portion 711 (refer to FIG. 3 ) that rotates the retaining block 40 around the Z axis. Moreover, in the present embodiment, although such abutment block 71 contacts the bottom surface of the lower side portion 442 of the body portion 44 of the retaining block 40, it is not particularly limited thereto, and the abutment block 71 may also contact the flange 441 of the body portion 44. In addition, the abutment block 71 may also include an adsorption and holding mechanism for adsorbing and holding the retaining block 40 that contacts the abutment block 71.
移動裝置72為移動抵接塊71的裝置。此種移動裝置72包括X方向軌道721、X方向平台722、Y方向軌道723、Y方向平台724、Z方向軌道725以及Z方向致動器726。X方向軌道721及X方向平台722在本發明的型態中相當於「第二平行移動部」的一種範例。 The moving device 72 is a device for moving the abutment block 71. The moving device 72 includes an X-direction track 721, an X-direction platform 722, a Y-direction track 723, a Y-direction platform 724, a Z-direction track 725, and a Z-direction actuator 726. The X-direction track 721 and the X-direction platform 722 are equivalent to an example of a "second parallel moving part" in the present invention.
X方向軌道721設置於處理器20之下方基座22,沿著X方向延伸。X方向平台722可滑動地保持在此X方向軌道721,可藉由致動器(圖未示)沿著X方向移動。在本實施例中,X方向軌道721在平面視角中,設置在包含保持在保持板50的所有保持塊40之範圍。移動裝置72具有使抵接塊71可面向所有保持塊40的動作範圍。 The X-direction track 721 is disposed on the base 22 below the processor 20 and extends along the X-direction. The X-direction platform 722 can be slidably held on the X-direction track 721 and can be moved along the X-direction by an actuator (not shown). In this embodiment, the X-direction track 721 is disposed in a range including all retaining blocks 40 retained on the retaining plate 50 in a plane view. The moving device 72 has a range of motion that allows the abutment block 71 to face all retaining blocks 40.
Y方向軌道723設置於此X方向平台722,沿著Y方向延伸。Y方向平台724可滑動地保持在此Y方向軌道723,可藉由致動器(圖未示)沿著Y方向移動。 The Y-direction track 723 is disposed on the X-direction platform 722 and extends along the Y-direction. The Y-direction platform 724 can be slidably held on the Y-direction track 723 and can be moved along the Y-direction by an actuator (not shown).
Z方向軌道725設置於此Y方向平台724,沿著Z方向延伸。抵接塊71可滑動地保持在此Z方向軌道725,可藉由Z方向致動器726在Z方向上移動。作為此Z方向致動器726的具體範例,雖然不特別限定,舉例來說,可例示為包括滾珠螺紋機構的電動馬達等。結果,此移動裝置72可在XYZ方向上移動抵接塊71。 The Z-direction track 725 is provided on the Y-direction platform 724 and extends along the Z-direction. The abutment block 71 can be slidably held on the Z-direction track 725 and can be moved in the Z-direction by the Z-direction actuator 726. As a specific example of the Z-direction actuator 726, although not particularly limited, for example, an electric motor including a ball screw mechanism can be exemplified. As a result, the moving device 72 can move the abutment block 71 in the XYZ directions.
此外,在本實施例中,如第2圖所示,支持部件73設置於Y方向平台724,相機單元80及感測器單元90被支持在此支持部件73的上端。此支持部件73配置在Y方向平台724的端部,在抵接塊71位於保持塊40正下方的狀態下,可使相機單元80及感測器單元90從探針頭17及保持塊40之間避開。 In addition, in this embodiment, as shown in FIG. 2, the support component 73 is disposed on the Y-direction platform 724, and the camera unit 80 and the sensor unit 90 are supported on the upper end of the support component 73. The support component 73 is disposed at the end of the Y-direction platform 724, and when the abutment block 71 is located directly below the retaining block 40, the camera unit 80 and the sensor unit 90 can be avoided from between the probe head 17 and the retaining block 40.
如第4圖(a)及第4圖(b)所示,相機單元80包括第一相機81、第二相機82、稜鏡83、稜鏡84以及支持部件85。 As shown in Figure 4 (a) and Figure 4 (b), the camera unit 80 includes a first camera 81, a second camera 82, a prism 83, a prism 84, and a supporting component 85.
稜鏡83支持在支持部件85,使其位於第一相機81的光軸OA1上。此種第一相機81透過該稜鏡83拍攝位於處理器20內的探針卡15之探針頭17。此種第一相機81連接至下文所述的控制裝置100,可將所拍攝的探針頭17之圖像資訊傳送至控制裝置100。 The prism 83 is supported on the support member 85 so as to be located on the optical axis OA1 of the first camera 81. The first camera 81 photographs the probe head 17 of the probe card 15 in the processor 20 through the prism 83. The first camera 81 is connected to the control device 100 described below, and can transmit the image information of the probe head 17 photographed to the control device 100.
稜鏡84亦支持在支持部件85,使其位於第二相機82的光軸OA2 上。此種第二相機82透過該稜鏡84拍攝保持在保持塊40的待測裝置200。此種第二相機82亦連接至下文所述的控制裝置100,可將所拍攝的待測裝置200之圖像資訊傳送至控制裝置100。 The prism 84 is also supported on the support member 85 so that it is located on the optical axis OA2 of the second camera 82. The second camera 82 photographs the device under test 200 held in the holding block 40 through the prism 84. The second camera 82 is also connected to the control device 100 described below, and can transmit the photographed image information of the device under test 200 to the control device 100.
如第4圖(a)及第4圖(c)所示,感測器單元90包括第一感測器91、第二感測器92、稜鏡93、稜鏡94以及支持部件95。 As shown in Figure 4 (a) and Figure 4 (c), the sensor unit 90 includes a first sensor 91, a second sensor 92, a prism 93, a prism 94, and a supporting component 95.
第一感測器91為一種感測器,檢測位於處理器20內之探針卡15之探針頭17的預定位置的高度。作為此種第一感測器91的具體範例,雖然未特別限定,舉例來說,可例示為雷射位移計。 The first sensor 91 is a sensor that detects the height of a predetermined position of the probe head 17 of the probe card 15 in the processor 20. As a specific example of such a first sensor 91, although not particularly limited, for example, a laser displacement meter can be exemplified.
稜鏡93支持在支持部件95,使其位於此第一感測器91的光軸OA3上。第一感測器91透過此稜鏡93檢測探針頭17之預定位置的高度。此種第一感測器91連接至下文所述的控制裝置100,可將所檢測出的探針頭17之預定位置的高度傳送至控制裝置100。 The prism 93 is supported on the support member 95 so as to be located on the optical axis OA3 of the first sensor 91. The first sensor 91 detects the height of the predetermined position of the probe head 17 through the prism 93. The first sensor 91 is connected to the control device 100 described below, and can transmit the detected height of the predetermined position of the probe head 17 to the control device 100.
在此,作為藉由第一感測器91檢測的探針頭17之預定位置的具體範例,可例示為該探針頭17的四個角落。並且,探針頭17之預定位置若是該探針頭17中三個以上互相相異的位置則不特別限定為上述位置。 Here, as a specific example of the predetermined position of the probe head 17 detected by the first sensor 91, the four corners of the probe head 17 can be illustrated. Furthermore, if the predetermined position of the probe head 17 is three or more mutually different positions in the probe head 17, it is not particularly limited to the above positions.
第二感測器92為一種感測器,檢測保持在保持塊40的待測裝置200之預定位置的高度。作為此種第二感測器92的具體範例,雖然未特別限定,與上述第一感測器91相同,舉例來說,可例示為雷射位移計。 The second sensor 92 is a sensor that detects the height of the predetermined position of the device to be tested 200 held in the holding block 40. Although not specifically limited, as a specific example of such a second sensor 92, it can be exemplified as a laser displacement meter, similar to the first sensor 91 mentioned above.
稜鏡94支持在支持部件95,使其位於此第二感測器92的光軸OA4上。第二感測器92透過此稜鏡94檢測待測裝置200之預定位置的高度。與上述第一感測器91相同,此種第二感測器92亦連接至下文所述的控制裝置100,可將所檢測出的待測裝置200之預定位置的高度傳送至控制裝置100。 The prism 94 is supported on the support member 95 so as to be located on the optical axis OA 4 of the second sensor 92. The second sensor 92 detects the height of the predetermined position of the device under test 200 through the prism 94. Similar to the first sensor 91 described above, the second sensor 92 is also connected to the control device 100 described below, and can transmit the detected height of the predetermined position of the device under test 200 to the control device 100.
在此,作為藉由第二感測器92檢測的待測裝置200之預定位置的具體範例,可例示為該待測裝置200的四個角落。並且,待測裝置200之預定位 置若是該待測裝置200中三個以上互相相異的位置則不特別限定為上述位置。 Here, as a specific example of the predetermined position of the device under test 200 detected by the second sensor 92, the four corners of the device under test 200 can be illustrated. Moreover, if the predetermined position of the device under test 200 is three or more mutually different positions in the device under test 200, it is not particularly limited to the above positions.
在本實施例中,相機單元80及感測器單元90透過支持部件73被固定在對準單元70的移動裝置72,因此可藉由移動裝置72在XY方向上移動該相機單元80及感測器單元90。換句話說,在本實施例中,對準單元70的移動裝置72可用作相機單元80及感測器單元90的移動裝置。 In this embodiment, the camera unit 80 and the sensor unit 90 are fixed to the moving device 72 of the alignment unit 70 through the support member 73, so that the camera unit 80 and the sensor unit 90 can be moved in the XY direction by the moving device 72. In other words, in this embodiment, the moving device 72 of the alignment unit 70 can be used as the moving device of the camera unit 80 and the sensor unit 90.
因此,此種移動裝置72在本發明的型態中相當於「第三移動裝置」的一種範例,同時在本發明的型態中亦相當於「第二移動裝置」的一種範例。此外,移動裝置72的X方向軌道721及X方向平台722在本發明的型態中相當於「第二平行移動部」的一種範例,同時在本發明的型態中亦相當於「第一平行移動部」的一種範例。 Therefore, this moving device 72 is equivalent to an example of the "third moving device" in the present invention, and is also equivalent to an example of the "second moving device" in the present invention. In addition, the X-direction track 721 and the X-direction platform 722 of the moving device 72 are equivalent to an example of the "second parallel moving part" in the present invention, and are also equivalent to an example of the "first parallel moving part" in the present invention.
並且,雖然未特別圖示,移動相機單元80及感測器單元90的移動裝置亦可為獨立於對準單元70之移動裝置72的其他移動裝置。在此情況下,移動相機單元80的移動裝置亦可與移動感測器單元90的移動裝置互相獨立。 Furthermore, although not specifically illustrated, the moving device of the moving camera unit 80 and the moving device of the sensor unit 90 may also be another moving device independent of the moving device 72 of the alignment unit 70. In this case, the moving device of the moving camera unit 80 may also be independent of the moving device of the moving sensor unit 90.
舉例來說,控制裝置100由包括處理機的電腦構成,如第5圖,控制裝置100功能性地包括圖像處理部110、第一演算部120、第二演算部130、第三演算部140以及驅動控制部150。此些功能110~150由處理機執行安裝在構成控制裝置100的上述電腦上的軟體來實現。並且,此種控制裝置100亦可由電路基板構成,來代替電腦。 For example, the control device 100 is composed of a computer including a processor. As shown in FIG. 5 , the control device 100 functionally includes an image processing unit 110, a first calculation unit 120, a second calculation unit 130, a third calculation unit 140, and a drive control unit 150. These functions 110 to 150 are implemented by the processor executing software installed on the above-mentioned computer constituting the control device 100. In addition, such a control device 100 can also be composed of a circuit substrate to replace the computer.
圖像處理部110藉由對從第一相機81輸出的圖像資訊進行圖像處理,檢測探針頭17之接觸器18(參照第1圖及第2圖)的位置及姿勢。此外,此種圖像處理部110藉由對從第二相機82輸出的圖像資訊進行圖像處理,檢測待測裝置200之端子210(參照第3圖)的位置及姿勢。此種圖像處理部110與上述第一相機81及第二相機82在本發明的型態中相當於「位置檢測裝置」的一種範例。 The image processing unit 110 detects the position and posture of the contactor 18 (see Figures 1 and 2) of the probe head 17 by performing image processing on the image information output from the first camera 81. In addition, the image processing unit 110 detects the position and posture of the terminal 210 (see Figure 3) of the device to be tested 200 by performing image processing on the image information output from the second camera 82. The image processing unit 110 and the first camera 81 and the second camera 82 are equivalent to an example of a "position detection device" in the form of the present invention.
第一演算部120基於圖像處理部110的檢測結果,算出待測裝置 200相對於探針頭17的位置補正量。 The first calculation unit 120 calculates the position correction amount of the device under test 200 relative to the probe head 17 based on the detection result of the image processing unit 110.
具體而言,此種第一演算部120從圖像處理部110的檢測結果算出待測裝置200之端子210位置相對於探針頭17之接觸器18之位置的位移量,並算出抵銷此位移量的位置補正量。換句話說,此種第一演算部120從圖像處理部110的檢測結果算出位置補正量,使探針頭17之接觸器18的位置與待測裝置200之端子210的位置相對為一致。 Specifically, the first calculation unit 120 calculates the displacement of the terminal 210 of the device under test 200 relative to the position of the contactor 18 of the probe head 17 from the detection result of the image processing unit 110, and calculates the position correction amount to offset the displacement. In other words, the first calculation unit 120 calculates the position correction amount from the detection result of the image processing unit 110 so that the position of the contactor 18 of the probe head 17 is relatively consistent with the position of the terminal 210 of the device under test 200.
第二演算部130基於第一感測器91及第二感測器92的檢測結果,檢測待測裝置200相對於探針頭17的平行度。此種第二演算部130在本發明的型態中相當於「演算部」的一種範例。 The second calculation unit 130 detects the parallelism of the device under test 200 relative to the probe head 17 based on the detection results of the first sensor 91 and the second sensor 92. This second calculation unit 130 is equivalent to an example of a "calculation unit" in the type of the present invention.
具體而言,此種第二演算部130首先從第一感測器91取得探針頭17之預定位置的高度,從此探針頭17之預定位置的高度算出該探針頭17的傾斜。此外,此種第二演算部130從第二感測器92取得待測裝置200之預定位置的高度,從此待測裝置200之預定位置的高度算出該待測裝置200的傾斜。接著,此種第二演算部130從上述探針頭17之傾斜及上述待測裝置200之傾斜算出待測裝置200相對於探針頭17的相對傾斜(平行度),進一步地算出抵銷此相對傾斜的待測裝置200傾斜補正量。 Specifically, the second calculation unit 130 first obtains the height of the predetermined position of the probe head 17 from the first sensor 91, and calculates the tilt of the probe head 17 from the height of the predetermined position of the probe head 17. In addition, the second calculation unit 130 obtains the height of the predetermined position of the device to be tested 200 from the second sensor 92, and calculates the tilt of the device to be tested 200 from the height of the predetermined position of the device to be tested 200. Then, the second calculation unit 130 calculates the relative tilt (parallelism) of the device to be tested 200 relative to the probe head 17 from the tilt of the probe head 17 and the tilt of the device to be tested 200, and further calculates the tilt compensation amount of the device to be tested 200 to offset the relative tilt.
第三演算部140基於第一感測器91及第二感測器92的檢測結果,檢測待測裝置200相對於探針頭17的高度。 The third calculation unit 140 detects the height of the device under test 200 relative to the probe head 17 based on the detection results of the first sensor 91 and the second sensor 92.
具體而言,此種第三演算部140首先從第一感測器91取得探針頭17之預定位置的高度。此外,此種第三演算部140在平行度調整裝置42基於上述傾斜補正量補正待測裝置200之傾斜之後,從第二感測器92取得待測裝置200之預定位置的高度。然後,此種第三演算部140從探針頭17之預定位置的高度及待測裝置200之預定位置的高度算出待測裝置200相對於探針頭17的相對高度。接著,此種第三演算部140算出此相對高度與預定值的差值,且算出抵銷此差值的 待測裝置200高度補正量。 Specifically, the third calculation unit 140 first obtains the height of the predetermined position of the probe head 17 from the first sensor 91. In addition, after the parallelism adjustment device 42 corrects the tilt of the device to be tested 200 based on the above tilt compensation amount, the third calculation unit 140 obtains the height of the predetermined position of the device to be tested 200 from the second sensor 92. Then, the third calculation unit 140 calculates the relative height of the device to be tested 200 relative to the probe head 17 from the height of the predetermined position of the probe head 17 and the height of the predetermined position of the device to be tested 200. Then, the third calculation unit 140 calculates the difference between this relative height and the predetermined value, and calculates the height compensation amount of the device to be tested 200 to offset this difference.
驅動控制部150控制接觸單元30之平行度調整裝置42、高度調整裝置43、按壓裝置60以及對準單元70的驅動。 The drive control unit 150 controls the driving of the parallelism adjustment device 42, the height adjustment device 43, the pressing device 60 and the alignment unit 70 of the contact unit 30.
舉例來說,此種驅動控制部150基於藉由上述第一演算部120算出的位置補正量,控制對準單元70的驅動。此外,此種驅動控制部150基於藉由上述第二演算部130演算的傾斜補正量,控制平行度調整裝置42的驅動。此外,此種驅動控制部150基於藉由上述第三演算部140演算的高度補正量,控制高度調整裝置43的驅動。進一步地,此種驅動控制部150控制按壓裝置60的驅動以將待測裝置200壓至探針頭17。 For example, the drive control unit 150 controls the drive of the alignment unit 70 based on the position compensation amount calculated by the first calculation unit 120. In addition, the drive control unit 150 controls the drive of the parallelism adjustment device 42 based on the tilt compensation amount calculated by the second calculation unit 130. In addition, the drive control unit 150 controls the drive of the height adjustment device 43 based on the height compensation amount calculated by the third calculation unit 140. Further, the drive control unit 150 controls the drive of the pressing device 60 to press the device under test 200 to the probe head 17.
此種驅動控制部150在本發明的型態中相當於「第一控制裝置」及「第三控制裝置」的一種範例。此外,此種驅動控制部150及上述第三演算部140在本發明的型態中相當於「第二控制裝置」的一種範例。 This drive control unit 150 is equivalent to an example of a "first control device" and a "third control device" in the present invention. In addition, this drive control unit 150 and the third calculation unit 140 are equivalent to an example of a "second control device" in the present invention.
在下文中,參照第6圖及第7圖(a)至第14圖(b)說明本實施例中關於藉由電子構件測試裝置1定位待測裝置200的操作。第6圖為本發明的實施例中,藉由電子構件測試裝置1定位之方法的示意流程圖。第7圖(a)至第14圖(b)各自為本發明的實施例中,電子構件測試裝置1之動作的示意剖面圖。 In the following, the operation of positioning the device to be tested 200 by the electronic component testing device 1 in this embodiment is described with reference to FIG. 6 and FIG. 7 (a) to FIG. 14 (b). FIG. 6 is a schematic flow chart of the method of positioning by the electronic component testing device 1 in an embodiment of the present invention. FIG. 7 (a) to FIG. 14 (b) are each schematic cross-sectional views of the operation of the electronic component testing device 1 in an embodiment of the present invention.
首先,在第6圖的步驟S10中,如第7圖(b)所示,將對準單元70之移動裝置72之Y方向平台724在-Y方向上移動,以將相機單元80及感測器單元90介於探針頭17與保持塊40之間。然後,如第7圖(a)所示,移動裝置72將抵接塊71在+X方向上移動至圖中右側的保持塊40。 First, in step S10 of FIG. 6, as shown in FIG. 7(b), the Y-direction platform 724 of the moving device 72 of the alignment unit 70 is moved in the -Y direction to place the camera unit 80 and the sensor unit 90 between the probe head 17 and the retaining block 40. Then, as shown in FIG. 7(a), the moving device 72 moves the abutment block 71 in the +X direction to the retaining block 40 on the right side of the figure.
在此+X方向的移動過程中,藉由第二相機82各自拍攝保持在保持塊40的待測裝置200。接著,由控制裝置100之圖像處理部110對從第二相機82輸出的圖像資訊進行圖像處理,檢測待測裝置200之端子210的位置。在批次開始時或變換探針卡15時等時候,利用第一相機81預先檢測探針頭17之接觸器18 的位置。控制裝置100之第一演算部120從此些檢測結果算出待測裝置200的位置補正量。算出保持在四個保持塊40的所有待測裝置200之位置補正量。 During the movement in the +X direction, the second camera 82 takes pictures of the device to be tested 200 held in the holding block 40. Then, the image processing unit 110 of the control device 100 processes the image information output from the second camera 82 to detect the position of the terminal 210 of the device to be tested 200. At the beginning of a batch or when the probe card 15 is replaced, the first camera 81 is used to pre-detect the position of the contactor 18 of the probe head 17. The first calculation unit 120 of the control device 100 calculates the position correction amount of the device to be tested 200 from these detection results. The position correction amount of all the devices to be tested 200 held in the four holding blocks 40 is calculated.
此外,在此+X方向的移動過程中,藉由移動裝置72之Y方向平台724在Y方向上適當地移動,亦藉由第二感測器92檢測該待測裝置200四個角落的高度。在批次開始時或變換探針卡15時等時候,利用第一感測器91預先檢測探針頭17四個角落的高度。控制裝置100的第二演算部130從此些檢測結果算出待測裝置200的傾斜補正量。算出保持在四個保持塊40的所有待測裝置200之傾斜補正量。並且,在第二演算部130算出待測裝置200之傾斜補正量時,亦可將上述步驟S10所算出的位置補正量列入考慮。 In addition, during the movement process in the +X direction, the Y-direction platform 724 of the moving device 72 is appropriately moved in the Y direction, and the height of the four corners of the device to be tested 200 is detected by the second sensor 92. At the beginning of a batch or when the probe card 15 is changed, the height of the four corners of the probe head 17 is pre-detected by the first sensor 91. The second calculation unit 130 of the control device 100 calculates the tilt correction amount of the device to be tested 200 from these detection results. The tilt correction amount of all the devices to be tested 200 held in the four holding blocks 40 is calculated. In addition, when the second calculation unit 130 calculates the tilt correction amount of the device to be tested 200, the position correction amount calculated in the above step S10 can also be taken into consideration.
並且,藉由此種第二感測器92檢測待測裝置200四個角落的高度若在步驟S50之前則不特別限定於上述之執行時機。舉例來說,在第6圖的步驟S40之後,亦可藉由第二感測器92執行待測裝置200四個角落高度的檢測。 Furthermore, if the height of the four corners of the device under test 200 is detected by the second sensor 92 before step S50, it is not particularly limited to the above-mentioned execution timing. For example, after step S40 in Figure 6, the height of the four corners of the device under test 200 can also be detected by the second sensor 92.
然後,在第6圖的步驟S20中,如第8圖(b)所示,將移動裝置72之Y方向平台724在+Y方向上移動,以將相機單元80及感測器單元90從探針頭17與保持塊40之間避開,同時將抵接塊71面向保持塊40。 Then, in step S20 of FIG. 6, as shown in FIG. 8 (b), the Y-direction platform 724 of the moving device 72 is moved in the +Y direction to avoid the camera unit 80 and the sensor unit 90 from between the probe head 17 and the retaining block 40, and at the same time, the abutment block 71 faces the retaining block 40.
接著,如第8圖(a)及第8圖(b)所示,移動裝置72抬升抵接塊71。藉此,抵接塊71接觸保持塊40,抵接塊71進一步地推起保持塊40,使該保持塊40從保持板50分離。 Next, as shown in FIG. 8 (a) and FIG. 8 (b), the moving device 72 lifts the abutment block 71. Thereby, the abutment block 71 contacts the retaining block 40, and the abutment block 71 further pushes up the retaining block 40, so that the retaining block 40 is separated from the retaining plate 50.
然後,在第6圖的步驟S30中,藉由對準單元70之移動裝置72將抵接塊71在XY平面方向移動上述位置補正量,抵銷待測裝置200相對於探針頭17的相對位置位移。舉例來說,在第9圖所示的範例中,移動裝置72在-X方向上少量移動抵接塊71,使保持在該抵接塊71的保持塊40相對於保持板50相對移動。 Then, in step S30 of FIG. 6, the moving device 72 of the alignment unit 70 moves the abutment block 71 in the XY plane direction by the above position compensation amount to offset the relative position displacement of the device under test 200 relative to the probe head 17. For example, in the example shown in FIG. 9, the moving device 72 moves the abutment block 71 a small amount in the -X direction, so that the retaining block 40 retained on the abutment block 71 moves relative to the retaining plate 50.
然後,在第6圖的步驟S40中,如第10圖(a)及第10圖(b)所示,移 動裝置72降下抵接塊71。藉此,保持塊40保持在保持板50,且抵接塊71從保持塊40分離。 Then, in step S40 of FIG. 6, as shown in FIG. 10(a) and FIG. 10(b), the moving device 72 lowers the abutment block 71. Thereby, the retaining block 40 is retained on the retaining plate 50, and the abutment block 71 is separated from the retaining block 40.
然後,在第6圖的步驟S50中,如第11圖(a)及第11圖(b)所示,驅動保持塊40的平行度調整裝置42,依照上述傾斜補正量傾斜待測裝置200。藉此,抵銷待測裝置200相對於探針頭17的相對傾斜,使待測裝置200相對於探針頭17變成平行。 Then, in step S50 of FIG. 6, as shown in FIG. 11 (a) and FIG. 11 (b), the parallelism adjustment device 42 of the holding block 40 is driven to tilt the device to be tested 200 according to the above tilt compensation amount. In this way, the relative tilt of the device to be tested 200 relative to the probe head 17 is offset, so that the device to be tested 200 becomes parallel to the probe head 17.
然後,在第6圖的步驟S60中,如第12圖(b)所示,將對準單元70之移動裝置72之Y方向平台724在-Y方向上移動。接著,相機單元80及感測器單元90再度介於探針頭17與保持塊40之間,藉由第二感測器92檢測該待測裝置200四個角落的高度。如上述,在批次開始時或變換探針卡15時等時候,利用第一感測器91預先檢測探針頭17四個角落的高度。控制裝置100的第二演算部130從此些檢測結果算出待測裝置200的高度補正量。 Then, in step S60 of FIG. 6, as shown in FIG. 12 (b), the Y-direction platform 724 of the moving device 72 of the alignment unit 70 is moved in the -Y direction. Then, the camera unit 80 and the sensor unit 90 are again placed between the probe head 17 and the retaining block 40, and the height of the four corners of the device to be tested 200 is detected by the second sensor 92. As described above, at the beginning of a batch or when the probe card 15 is replaced, the height of the four corners of the probe head 17 is pre-detected by the first sensor 91. The second calculation unit 130 of the control device 100 calculates the height correction amount of the device to be tested 200 from these detection results.
在此,在本實施例中,因為在此步驟S60中藉由第二感測器92檢測的待測裝置200位置與在上述步驟S10中藉由第二感測器92檢測的待測裝置200位置相同,亦可利用步驟S60中第二感測器92之檢測結果確認是否適當地抵銷了待測裝置200相對於探針頭17的相對傾斜。 Here, in this embodiment, because the position of the device under test 200 detected by the second sensor 92 in this step S60 is the same as the position of the device under test 200 detected by the second sensor 92 in the above step S10, the detection result of the second sensor 92 in step S60 can also be used to confirm whether the relative tilt of the device under test 200 relative to the probe head 17 is appropriately offset.
並且,在此步驟S60中藉由第二感測器92檢測的待測裝置200位置亦可與在上述步驟S10中藉由第二感測器92檢測的待測裝置200位置相異。舉例來說,在上述步驟S10中,可藉由第二感測器92檢測待測裝置200四個角落的高度,而在此步驟S60中,第二感測器92亦可僅檢測待測裝置200中央部分的高度。在此種情況下,在批次開始時或變換探針卡15時等時候,除了探針頭17四個角落的高度,亦利用第一感測器91預先檢測探針頭17中央部分的高度。 Furthermore, the position of the device to be tested 200 detected by the second sensor 92 in this step S60 may be different from the position of the device to be tested 200 detected by the second sensor 92 in the above step S10. For example, in the above step S10, the height of the four corners of the device to be tested 200 may be detected by the second sensor 92, while in this step S60, the second sensor 92 may only detect the height of the central part of the device to be tested 200. In this case, at the beginning of a batch or when the probe card 15 is changed, in addition to the height of the four corners of the probe head 17, the height of the central part of the probe head 17 is also pre-detected by the first sensor 91.
接著,如第12圖(a)及第12圖(b)所示,依照上述高度補正量驅動保持塊40之高度調整裝置43,調整待測裝置200的高度,且抵銷隨著上述步驟S50 中待測裝置200的平行度調整所產生的該待測裝置200高度方向上的位移。 Next, as shown in FIG. 12 (a) and FIG. 12 (b), the height adjustment device 43 of the holding block 40 is driven according to the height compensation amount to adjust the height of the device under test 200 and offset the displacement of the device under test 200 in the height direction caused by the parallelism adjustment of the device under test 200 in the above step S50.
然後,在第6圖的步驟S70中,控制裝置100判斷全部待測裝置200的定位是否完成。 Then, in step S70 of FIG. 6, the control device 100 determines whether the positioning of all the devices to be tested 200 is completed.
在全部待測裝置200的定位並未完成(步驟S70中為否)的情況下,返回步驟S10。如第13圖(a)及第13圖(b)所示,對準單元70之移動裝置72將抵接塊71移動到保持下一個待測裝置200的保持塊40(舉例來說,在圖中從右側數來第二個保持塊)。接著,以與上述步驟S20至步驟S60相同的方式,進行該下一個待測裝置200的定位。 If the positioning of all the devices under test 200 is not completed (No in step S70), return to step S10. As shown in Figures 13(a) and 13(b), the moving device 72 of the alignment unit 70 moves the abutment block 71 to the holding block 40 that holds the next device under test 200 (for example, the second holding block from the right in the figure). Then, the positioning of the next device under test 200 is performed in the same manner as the above steps S20 to S60.
與此相對地,在全部待測裝置200的定位已完成(步驟S70中為是)的情況下,在第6圖的步驟S80中,如第14圖(a)及第14圖(b)所示,按壓裝置60之移動裝置62將保持框架61抬升,將待測裝置200壓至探針頭17。藉此,待測裝置200之端子210與探針頭17之接觸器18電性連接。在此狀態下,測試件10測試待測裝置200的電氣特性。 In contrast, when the positioning of all the devices under test 200 has been completed (Yes in step S70), in step S80 of Figure 6, as shown in Figures 14(a) and 14(b), the moving device 62 of the pressing device 60 lifts the holding frame 61 and presses the device under test 200 to the probe head 17. Thereby, the terminal 210 of the device under test 200 is electrically connected to the contactor 18 of the probe head 17. In this state, the test piece 10 tests the electrical characteristics of the device under test 200.
如上所述,在本實施例中,因為對準單元70獨立於保持塊40,藉由變換保持塊40及保持板50,可容易地對應於待測裝置200的種類變換。 As described above, in this embodiment, since the alignment unit 70 is independent of the retaining block 40, by changing the retaining block 40 and the retaining plate 50, it is easy to correspond to the type change of the device under test 200.
此外,在本實施例中,因為複數個保持塊40分別被保持在保持板50上,且複數個待測裝置200被保持在同一保持面上,可採用可分別調整複數個待測裝置200之溫度或平行度的構造。 In addition, in this embodiment, since a plurality of retaining blocks 40 are respectively retained on the retaining plate 50, and a plurality of devices to be tested 200 are retained on the same retaining surface, a structure that can adjust the temperature or parallelism of a plurality of devices to be tested 200 separately can be adopted.
此外,在本實施例中,因為接觸單元30之保持塊40包括平行度調整裝置42,可抵消待測裝置200相對於探針頭17的相對傾斜,可抑制探針頭17與待測裝置200之間產生接觸誤差。尤其,在具有堆疊構造的2.5D元件中間體或3D元件中間體中,上述抑制接觸誤差的效果顯著。 In addition, in this embodiment, because the holding block 40 of the contact unit 30 includes a parallelism adjustment device 42, the relative tilt of the device under test 200 relative to the probe head 17 can be offset, and the contact error between the probe head 17 and the device under test 200 can be suppressed. In particular, in a 2.5D device intermediate or a 3D device intermediate having a stacked structure, the above-mentioned effect of suppressing the contact error is significant.
此外,在本實施例中,因為接觸單元30之保持塊40包括高度調整裝置43,可抵消隨著藉由平行度調整裝置42調整待測裝置200之平行度所產生的 該待測裝置200高度方向上的位移,可進一步抑制探針頭17與待測裝置200之間產生接觸誤差。 In addition, in this embodiment, since the holding block 40 of the contact unit 30 includes a height adjustment device 43, the displacement of the device to be tested 200 in the height direction caused by adjusting the parallelism of the device to be tested 200 by the parallelism adjustment device 42 can be offset, and the contact error between the probe head 17 and the device to be tested 200 can be further suppressed.
並且,以上說明的實施例是為了易於理解本發明,而非為了限定本發明。因此,在上述實施例揭露的各元件旨在包含屬於本發明技術領域的所有設計變更或均等物。 Furthermore, the embodiments described above are intended to facilitate the understanding of the present invention, rather than to limit the present invention. Therefore, the components disclosed in the above embodiments are intended to include all design changes or equivalents belonging to the technical field of the present invention.
舉例來說,處理器20亦可包括兩個接觸單元30,且接觸單元30各自的按壓裝置60之支持部件63亦可以水平方向可移動的方式支持在下方基座22。藉此,在其中一個接觸單元30執行待測裝置200的測試時,另一個接觸單元30可進行待測裝置200的定位作業,可提高測試過程的效率。 For example, the processor 20 may also include two contact units 30, and the support components 63 of the pressing devices 60 of the contact units 30 may also be supported on the lower base 22 in a horizontally movable manner. Thus, when one of the contact units 30 performs a test on the device under test 200, the other contact unit 30 may perform a positioning operation on the device under test 200, thereby improving the efficiency of the test process.
1:電子構件測試裝置 1: Electronic component testing equipment
10:測試件 10: Test piece
11:主框架 11: Main frame
12:測試頭 12: Test head
15:探針卡 15: Probe card
16:電路板 16: Circuit board
17:探針頭 17: Probe head
18:接觸器 18: Contactor
19:殼體 19: Shell
20:處理器 20: Processor
21:上方基座 21: Upper base
22:下方基座 22: Lower base
30:接觸單元 30: Contact unit
40:保持塊 40: Keep block
41:熱敏頭 41: Thermal head
42:平行度調整裝置 42: Parallelism adjustment device
43:高度調整裝置 43: Height adjustment device
44:本體部分 44: Main body
50:保持板 50: Holding board
51:開口 51: Open mouth
60:按壓裝置 60: Pressing device
61:保持框架 61: Keep the frame
62:移動裝置 62: Mobile device
63:支持部件 63: Support components
64:Z方向軌道 64:Z direction track
65:致動器 65:Actuator
70:對準單元 70: Alignment unit
71:抵接塊 71: Butt block
72:移動裝置 72: Mobile device
200:待測裝置 200: Device under test
211:開口 211: Open mouth
611:開口 611: Open your mouth
631:開口 631: Open mouth
721:X方向軌道 721:X direction track
722:X方向平台 722: X-direction platform
723:Y方向軌道 723:Y direction track
724:Y方向平台 724:Y direction platform
725:Z方向軌道 725:Z direction track
726:Z方向致動器 726:Z-direction actuator
II-II:線段 II-II: Line segment
III:部分 Part III:
Claims (16)
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US20050127898A1 (en) * | 2002-08-07 | 2005-06-16 | Haruhiko Yoshioka | Stage driving apparatus and probe method |
CN1841693A (en) * | 2005-03-31 | 2006-10-04 | 富士通株式会社 | Semiconductor device test device and test method |
US20080238463A1 (en) * | 2007-03-30 | 2008-10-02 | Tokyo Electron Limited | Probe apparatus, probing method and storage medium |
TW201721162A (en) * | 2015-07-23 | 2017-06-16 | 東京精密股份有限公司 | Detector and probe contact method |
TW201908754A (en) * | 2017-06-05 | 2019-03-01 | 日商東京威力科創股份有限公司 | Inspection device, inspection system and position alignment method |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US20050127898A1 (en) * | 2002-08-07 | 2005-06-16 | Haruhiko Yoshioka | Stage driving apparatus and probe method |
CN1841693A (en) * | 2005-03-31 | 2006-10-04 | 富士通株式会社 | Semiconductor device test device and test method |
US20080238463A1 (en) * | 2007-03-30 | 2008-10-02 | Tokyo Electron Limited | Probe apparatus, probing method and storage medium |
TW201721162A (en) * | 2015-07-23 | 2017-06-16 | 東京精密股份有限公司 | Detector and probe contact method |
US20180252765A1 (en) * | 2015-07-23 | 2018-09-06 | Tokyo Seimitsu Co., Ltd. | Prober |
TW201908754A (en) * | 2017-06-05 | 2019-03-01 | 日商東京威力科創股份有限公司 | Inspection device, inspection system and position alignment method |
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