[go: up one dir, main page]

TWI869502B - Low dielectric stack - Google Patents

Low dielectric stack Download PDF

Info

Publication number
TWI869502B
TWI869502B TW109142531A TW109142531A TWI869502B TW I869502 B TWI869502 B TW I869502B TW 109142531 A TW109142531 A TW 109142531A TW 109142531 A TW109142531 A TW 109142531A TW I869502 B TWI869502 B TW I869502B
Authority
TW
Taiwan
Prior art keywords
adhesive layer
less
filler
acid
laminate
Prior art date
Application number
TW109142531A
Other languages
Chinese (zh)
Other versions
TW202130504A (en
Inventor
入澤隼人
Original Assignee
日商東洋紡Mc股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東洋紡Mc股份有限公司 filed Critical 日商東洋紡Mc股份有限公司
Publication of TW202130504A publication Critical patent/TW202130504A/en
Application granted granted Critical
Publication of TWI869502B publication Critical patent/TWI869502B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/025Electric or magnetic properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J123/00Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
    • C09J123/26Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J123/00Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
    • C09J123/26Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers modified by chemical after-treatment
    • C09J123/30Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers modified by chemical after-treatment by oxidation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/204Di-electric
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

本發明之課題係提供黏接性、介電特性及線膨脹性良好的疊層體。 本發明之解決手段係一種疊層體,係以金屬基材、黏接劑層、樹脂基材之順序疊層,該黏接劑層含有填料(A)、酸改性聚烯烴(B)及環氧樹脂(C)的硬化物;在垂直於該疊層體表面的方向之該黏接劑層之剖面中,從中間點到接近該金屬基材表面側的區域所含有的該填料(A)之個數a1,多於從中間點到接近該樹脂基材表面側的區域所含有的該填料(A)之個數b1。The subject of the present invention is to provide a laminate with good adhesion, dielectric properties and linear expansion. The solution of the present invention is a laminate, which is laminated in order of a metal substrate, an adhesive layer and a resin substrate, wherein the adhesive layer contains a filler (A), an acid-modified polyolefin (B) and a cured epoxy resin (C); in a cross section of the adhesive layer in a direction perpendicular to the surface of the laminate, the number a1 of the filler (A) contained in the region from the midpoint to the side close to the surface of the metal substrate is greater than the number b1 of the filler (A) contained in the region from the midpoint to the side close to the surface of the resin substrate.

Description

低介電疊層體Low dielectric stack

本發明係關於具有低介電特性之疊層體。更詳細的說,係關於可使用於軟性印刷電路板、表覆層薄膜、黏合片之疊層體。The present invention relates to a laminate having low dielectric properties. More specifically, the present invention relates to a laminate that can be used in a flexible printed circuit board, a cover film, or an adhesive sheet.

軟性印刷電路板(FPC)由於具有優秀彎曲性,能夠因應電腦及手機等的多功能化、小型化,因此,為了將電子電路基板組裝進狹小複雜的內部而常被使用。近年來,電子機器的小型化、輕量化、高密度化、高輸出化有所進展,隨著該等潮流,對於配線板(電子電路基板)的性能的要求也漸漸提高。特別是隨著FPC中的傳輸信號的高速化、信號的高頻化有所進展,伴隨於此,對於FPC在高頻區域的低介電特性(低介電常數、低損耗正切)的要求提高。專利文獻1中,揭示了由含有聚烯烴系樹脂、碳二亞胺樹脂、多官能基環氧樹脂及填料之熱硬化性黏接劑組成物所形成,具有熱硬化性黏接劑層之表覆層薄膜(疊層體)。 [先前技術文獻] [專利文獻]Flexible printed circuit boards (FPCs) are often used to assemble electronic circuit boards into small and complex interiors because they have excellent flexibility and can cope with the multifunctionality and miniaturization of computers and mobile phones. In recent years, electronic equipment has been miniaturized, lightweight, high-density, and high-output. With these trends, the performance requirements for wiring boards (electronic circuit boards) have gradually increased. In particular, with the progress of high-speed transmission signals and high-frequency signals in FPCs, the requirements for low dielectric properties (low dielectric constant, low loss tangent) in the high-frequency region of FPCs have increased. Patent document 1 discloses a surface coating film (laminated body) having a thermosetting adhesive layer, which is formed from a thermosetting adhesive composition containing a polyolefin resin, a carbodiimide resin, a multifunctional epoxy resin and a filler. [Prior art document] [Patent document]

[專利文獻1]日本特開2019-127501號公報[Patent Document 1] Japanese Patent Application Publication No. 2019-127501

[發明所欲解決之課題][The problem that the invention wants to solve]

但是,專利文獻1記載的表覆層薄膜(疊層體),雖然含有填料,由於沒有考慮到黏接劑層中之填料的分散性,疊層體的線膨脹性並不足夠。本發明係注目於如上述之問題,目的係提供黏接劑層的黏接性、介電特性及線膨脹性優秀之疊層體。 [解決課題之手段]However, although the coating film (laminated body) described in Patent Document 1 contains fillers, the linear expansion of the laminate is insufficient because the dispersion of the fillers in the adhesive layer is not taken into consideration. The present invention focuses on the above-mentioned problems and aims to provide a laminate having excellent adhesive properties, dielectric properties and linear expansion of the adhesive layer. [Means for Solving the Problem]

一種疊層體,係以金屬基材、黏接劑層、樹脂基材之順序疊層,該黏接劑層含有填料(A)、酸改性聚烯烴(B)及環氧樹脂(C)的硬化物; 在垂直於該疊層體表面的方向之該黏接劑層之剖面中,從中間點到接近該金屬基材表面側的區域所含有的該填料(A)之個數a1,多於從中間點到接近該樹脂基材表面側的區域所含有的該填料(A)之個數b1。A laminated body is a metal substrate, an adhesive layer, and a resin substrate laminated in order, wherein the adhesive layer contains a filler (A), an acid-modified polyolefin (B), and a cured epoxy resin (C); In a cross section of the adhesive layer in a direction perpendicular to the surface of the laminated body, the number a1 of the filler (A) contained in the region from the midpoint to the side close to the surface of the metal substrate is greater than the number b1 of the filler (A) contained in the region from the midpoint to the side close to the surface of the resin substrate.

上述a1與b1的比率,以a1/b1=小於100/大於0~大於50/小於50為佳。The ratio of a1 to b1 is preferably a1/b1=less than 100/greater than 0~greater than 50/less than 50.

上述填料(A),以選自於由含磷阻燃填料、氫氧化鋁、氧化矽、氧化鈦及碳黑構成之群組中之1種以上為佳。更以上述黏接劑層的硬化物成分含有數目平均分子量3000以下的寡聚苯醚(D)及/或是聚碳二亞胺(E)為佳。The filler (A) is preferably selected from the group consisting of phosphorus-containing flame retardant fillers, aluminum hydroxide, silicon oxide, titanium oxide and carbon black. The curing component of the adhesive layer preferably contains oligophenylene ether (D) and/or polycarbodiimide (E) with a numerical average molecular weight of less than 3000.

上述黏接劑層的於1GHz之相對電容率(εc)為3.0以下,損耗正切(tanδ)為0.02以下為佳。The adhesive layer preferably has a relative capacitance (εc) of 3.0 or less and a loss tangent (tanδ) of 0.02 or less at 1 GHz.

一種印刷電路板,含有上述疊層體作為構成要件。 [發明之效果]A printed circuit board comprising the above-mentioned laminate as a constituent element. [Effect of the invention]

本發明之疊層體,由於適當設定黏接劑層中填料的分散性,黏接劑層的黏接性、介電特性優秀,且線膨脹性亦優秀,可提供尺寸安定性良好之疊層體。The laminate of the present invention has excellent adhesion and dielectric properties and linear expansion properties due to the proper setting of the dispersion of the filler in the adhesive layer, and can provide a laminate with good dimensional stability.

以下係根據下述實施的形態對於本發明進行具體說明,本發明並不受下述實施的形態限制,可在符合上述、下述主旨的範圍內施加適當的變更來實施,此等皆包含在本發明的技術範圍內。The present invention is specifically described below based on the following implementation forms. The present invention is not limited to the following implementation forms and can be implemented by applying appropriate changes within the scope of the above and following purposes, all of which are included in the technical scope of the present invention.

<疊層體> 本發明之疊層體,係以金屬基材、黏接劑層及樹脂基材等之順序疊層。可直接疊層金屬基材與黏接劑層,亦可在兩者之間疊層別的基材(層)。以直接疊層金屬基材與黏接劑層為佳。此外,可直接疊層黏接劑層與樹脂基材,亦可在兩者間疊層別的基材(層)。以直接疊層黏接劑層與樹脂基材為佳。意即,以直接疊層金屬基材、黏接劑層及樹脂基材(金屬基材/黏接劑層/樹脂基材之3層)為佳。<Laminated body> The laminated body of the present invention is laminated in the order of metal substrate, adhesive layer and resin substrate. The metal substrate and adhesive layer can be laminated directly, or another substrate (layer) can be laminated between the two. It is preferred to laminate the metal substrate and adhesive layer directly. In addition, the adhesive layer and resin substrate can be laminated directly, or another substrate (layer) can be laminated between the two. It is preferred to laminate the adhesive layer and resin substrate directly. That is, it is best to directly stack the metal substrate, adhesive layer and resin substrate (three layers of metal substrate/adhesive layer/resin substrate).

此外,疊層體更可以介隔著黏接劑層疊層別的基材。例如可舉例為,黏接劑層/金屬基材/黏接劑層/樹脂基材之4層、金屬基材/黏接劑層/樹脂基材/黏接劑層之4層、黏接劑層/金屬基材/黏接劑層/樹脂基材/黏接劑層之5層等。In addition, the laminated body can further be a laminated body of different substrates with adhesive layers interposed therebetween. For example, there can be four layers of adhesive layer/metal substrate/adhesive layer/resin substrate, four layers of metal substrate/adhesive layer/resin substrate/adhesive layer, five layers of adhesive layer/metal substrate/adhesive layer/resin substrate/adhesive layer, etc.

疊層體之示例以圖1表示。圖1之疊層體10,係以金屬基材1、黏接劑層3及樹脂基材2等之順序疊層,黏接劑層3係包含接近金屬基材的表面側之區域3a(以下亦稱為黏接劑層3a。)及接近樹脂基材的表面側之區域3b(以下亦稱為黏接劑層3b。)。An example of a laminate is shown in FIG1 . The laminate 10 of FIG1 is a laminate of a metal substrate 1, an adhesive layer 3, and a resin substrate 2, etc. The adhesive layer 3 includes a region 3a close to the surface side of the metal substrate (hereinafter also referred to as the adhesive layer 3a) and a region 3b close to the surface side of the resin substrate (hereinafter also referred to as the adhesive layer 3b).

疊層體的製作並無特別限制,例如可由以下的方法進行。首先在金屬基材1的表面,塗佈含有填料(A)、酸改性聚烯烴(B)及環氧樹脂(C)之黏接劑組成物a,乾燥後製作黏接劑層3a。接著在該表面塗佈填料(A)的含量少於黏接劑組成物a之黏接劑組成物b,乾燥後製作黏接劑層3b。接著疊層樹脂基材2,加熱處理(硬化)後可得到疊層體。或是相反地亦可以在樹脂基材2的表面塗佈黏接劑組成物b,乾燥製作黏接劑層3b後,塗佈黏接劑組成物a,乾燥後製作黏接劑層3a,接著疊層金屬基材1,加熱處理(硬化)後得到疊層體。The preparation of the laminate is not particularly limited, and can be carried out, for example, by the following method. First, an adhesive composition a containing filler (A), acid-modified polyolefin (B) and epoxy resin (C) is applied to the surface of a metal substrate 1, and an adhesive layer 3a is prepared after drying. Then, an adhesive composition b containing a filler (A) content less than that of the adhesive composition a is applied to the surface, and an adhesive layer 3b is prepared after drying. Then, a resin substrate 2 is laminated, and a laminate can be obtained after heat treatment (hardening). Or conversely, the adhesive composition b can be applied on the surface of the resin substrate 2, dried to form the adhesive layer 3b, and then the adhesive composition a can be applied and dried to form the adhesive layer 3a, and then the metal substrate 1 can be laminated and heat treated (hardened) to obtain a laminate.

使用疊層體作為印刷電路板的構成要件時,以先形成導體電路為佳。When using a laminate as a component of a printed circuit board, it is preferred to form a conductive circuit first.

<黏接劑層> 本發明之黏接劑層,係含有填料(A)、酸改性聚烯烴(B)及環氧樹脂(C)的硬化物,黏接劑層3a之上述填料(A)的個數a1多於黏接劑層3b之上述填料(A)的個數b1。<Adhesive layer> The adhesive layer of the present invention is a hardened material containing filler (A), acid-modified polyolefin (B) and epoxy resin (C), and the number a1 of the filler (A) in the adhesive layer 3a is greater than the number b1 of the filler (A) in the adhesive layer 3b.

黏接劑層3a的個數a1與黏接劑層3b的個數b1之比率(a1/b1),以小於100/大於0~大於50/小於50為佳。由使線膨脹性良好來看,以99/1~51/49為較佳,以98/2~52/48為更佳,以97/3~53/47為更佳,以96/4~54/46為更佳,以95/5~55/45為最佳。The ratio of the number a1 of the adhesive layer 3a to the number b1 of the adhesive layer 3b (a1/b1) is preferably less than 100/greater than 0 to greater than 50/less than 50. In terms of achieving good linear expansion, 99/1 to 51/49 is preferred, 98/2 to 52/48 is more preferred, 97/3 to 53/47 is more preferred, 96/4 to 54/46 is more preferred, and 95/5 to 55/45 is the best.

黏接劑層中的黏接劑層3a及黏接劑層3b之區域係,從垂直於疊層體表面的方向之長度(黏接劑層3的膜厚度)的中間點算起,令接近金屬基材1側為黏接劑層3a,令接近樹脂基材2側為3b。此處中間點意指,黏接劑層中接觸金屬基材1之面及接觸樹脂基材2之面的中間位置,當令黏接劑層的膜厚度為100%時,由金屬基材1算起為50%之位置,且由樹脂基材2算起亦為50%之位置。即,黏接劑層3a之區域為,由黏接劑層3的金屬基材1算起50%以內之範圍。此外黏接劑層3b之區域為,由黏接劑層3的樹脂基材2算起50%以內之範圍。另外黏接劑層3a與黏接劑層3b可有明確之邊界面,亦可為邊界面不明確而一體化。The area of the adhesive layer 3a and the adhesive layer 3b in the adhesive layer is measured from the midpoint of the length (thickness of the adhesive layer 3) in the direction perpendicular to the surface of the laminate, with the side close to the metal substrate 1 being the adhesive layer 3a and the side close to the resin substrate 2 being 3b. The midpoint here means the midpoint between the surface of the adhesive layer contacting the metal substrate 1 and the surface contacting the resin substrate 2, and when the thickness of the adhesive layer is 100%, the position is 50% from the metal substrate 1 and the position is also 50% from the resin substrate 2. That is, the area of the adhesive layer 3a is within 50% of the metal substrate 1 of the adhesive layer 3. In addition, the area of the adhesive layer 3b is within 50% of the resin substrate 2 of the adhesive layer 3. In addition, the adhesive layer 3a and the adhesive layer 3b may have a clear boundary surface, or may be integrated without a clear boundary surface.

黏接劑層之膜厚度(厚度),由使黏接強度良好來看,以5μm以上為佳,以10μm以上為較佳,以15μm以上為更佳,以20μm以上為特佳。此外,由可賦予黏接劑層柔軟性來看,以200μm以下為佳,以150μm以下為較佳,以100μm以下為更佳,以50μm為特佳。The film thickness (thickness) of the adhesive layer is preferably 5 μm or more, more preferably 10 μm or more, more preferably 15 μm or more, and particularly preferably 20 μm or more in order to achieve good bonding strength. In addition, in order to impart flexibility to the adhesive layer, it is preferably 200 μm or less, more preferably 150 μm or less, more preferably 100 μm or less, and particularly preferably 50 μm.

填料(A)之個數可使用電子顯微鏡測定。具體來說,沿垂直於疊層體的表面的方向切割,以目視計算於該剖面中的黏接劑層3a之區域及黏接劑層3b之區域含有的填料(A)的數目。黏接劑層含有的填料(A)之個數,係與塗佈在樹脂基材或是金屬基材之黏接劑組成物中含有的填料(A)之含量成比例。另外,由於長徑小於15nm的填料(A)係線膨脹性的影響微弱,並不列入計算。The number of fillers (A) can be measured using an electron microscope. Specifically, the laminate is cut in a direction perpendicular to the surface, and the number of fillers (A) contained in the adhesive layer 3a and the adhesive layer 3b in the cross section is visually counted. The number of fillers (A) contained in the adhesive layer is proportional to the content of fillers (A) contained in the adhesive composition coated on the resin substrate or the metal substrate. In addition, fillers (A) with a length less than 15nm have a weak influence on linear expansion and are not included in the calculation.

<填料(A)> 本發明使用的填料(A)(以下亦簡稱為(A)成分。),若係適當地設定在黏接劑層內的分散性時,發揮低線膨脹性之效果者,則並無特別限制。其中以選自於由含磷阻燃填料、氫氧化鋁、氧化矽、氧化鈦及碳黑構成之群組中之1種以上為佳。<Filler (A)> The filler (A) used in the present invention (hereinafter also referred to as component (A)) is not particularly limited if it can exert the effect of low linear expansion when the dispersion in the adhesive layer is appropriately set. Preferably, at least one of the group consisting of phosphorus-containing flame retardant fillers, aluminum hydroxide, silicon oxide, titanium oxide and carbon black is selected.

作為含磷阻燃填料,若為構造中含有磷原子之填料則並無特別限制。可舉例為次膦酸衍生物或是膦氮烯(phosphazene)化合物,以次膦酸衍生物為佳,以菲型的次膦酸衍生物為較佳。作為菲型的次膦酸衍生物,可舉例為9,10-二氫-9-氧雜-10磷雜菲-10-氧化物(三光(股)、商品名:HCA)、10-苄基-10-氫-9-氧雜-10-磷雜菲-10-氧化物(三光(股)、商品名:BCA)、10-(2,5-二羥基苯基)-10-H-9-氧雜-10-磷雜菲-10-氧化物(三光(股)、商品名:HCA-HQ)、10-(2,5-二羥基苯基)-10-H-9-氧雜-10-磷雜菲-10-氧化物的微粉碎物(三光(股)、商品名:HCA-HQ-HS)等。此等可單獨使用,或是並用2種以上。其中以HCA-HQ-HS為佳。As the phosphorus-containing flame retardant filler, there is no particular limitation as long as the filler contains phosphorus atoms in its structure. Examples thereof include phosphinic acid derivatives or phosphazene compounds, with phosphinic acid derivatives being preferred, and phenanthrene-type phosphinic acid derivatives being more preferred. Examples of the phenanthrene-type phosphinic acid derivatives include 9,10-dihydro-9-oxo-10-phosphophananthrene-10-oxide (Sanko Co., Ltd., trade name: HCA), 10-benzyl-10-hydro-9-oxo-10-phosphophananthrene-10-oxide (Sanko Co., Ltd., trade name: BCA), 10-(2,5-dihydroxyphenyl)-10-H-9-oxo-10-phosphophananthrene-10-oxide (Sanko Co., Ltd., trade name: HCA-HQ), and a finely pulverized product of 10-(2,5-dihydroxyphenyl)-10-H-9-oxo-10-phosphophananthrene-10-oxide (Sanko Co., Ltd., trade name: HCA-HQ-HS). These may be used alone or in combination of two or more. Among them, HCA-HQ-HS is the best.

市售的氫氧化鋁可舉例為昭和電工(股)製的HYGILITE(註冊商標)H42M、HYGILITE H43M、HYGILITE H42STV、日本輕金屬(股)製的B1403、B1403T等。此等可單獨使用,或是並用2種以上。其中以昭和電工(股份有限公司)製的HYGILITE H42M為佳。Examples of commercially available aluminum hydroxide include HYGILITE (registered trademark) H42M, HYGILITE H43M, HYGILITE H42STV manufactured by Showa Denko Co., Ltd., and B1403 and B1403T manufactured by Nippon Light Metal Co., Ltd. These can be used alone or in combination of two or more. Among them, HYGILITE H42M manufactured by Showa Denko Co., Ltd. is preferred.

市售的氧化矽可舉例為Admatechs(股)製的S0-C1、S0-C2、S0-C3、S0-C4、S0-C5、S0-C6、Denka(股)製的FB-3SDC等。此等可單獨使用,或是並用2種以上。其中以Denka(股)製的FB-3SDC為佳。Examples of commercially available silicon oxide include SO-C1, SO-C2, SO-C3, SO-C4, SO-C5, SO-C6 manufactured by Admatechs, and FB-3SDC manufactured by Denka. These can be used alone or in combination of two or more. Among them, FB-3SDC manufactured by Denka is preferred.

市售的氧化鈦可舉例為石原產業(股)製的TIPAQUE(註冊商標)CR-60、TAYCA(股)製的JR-403等。此等可單獨使用,或是並用2種以上。其中以TAYCA(股份有限公司)製的JR-403為佳。Examples of commercially available titanium oxide include TIPAQUE (registered trademark) CR-60 manufactured by Ishihara Industry Co., Ltd. and JR-403 manufactured by TAYCA Co., Ltd. These can be used alone or in combination of two or more. Among them, JR-403 manufactured by TAYCA Co., Ltd. is preferred.

市售的碳黑可舉例為三菱化學(股)製的良流動性#MA100、泛用色#44等。此等可單獨使用,或是並用2種以上。其中以良流動性#MA100為佳。Examples of commercially available carbon black include the good-flowability #MA100 and the general-purpose #44 manufactured by Mitsubishi Chemical Co., Ltd. These can be used alone or in combination of two or more. Among them, the good-flowability #MA100 is preferred.

填料(A)的含量,相對於酸改性聚烯烴(B)100質量份,以0.1質量份以上為佳。由使線膨脹性良好來看,以0.5質量份以上為較佳,以1質量份以上為更佳。此外,由於黏接性良好,以50質量份以下為佳,以40質量份以下為較佳,以30質量份以下為更佳。The content of the filler (A) is preferably 0.1 parts by mass or more based on 100 parts by mass of the acid-modified polyolefin (B). In order to improve the linear expansion property, it is preferably 0.5 parts by mass or more, and more preferably 1 part by mass or more. In addition, in order to improve the adhesion, it is preferably 50 parts by mass or less, preferably 40 parts by mass or less, and more preferably 30 parts by mass or less.

填料(A)的形狀並無特別限制,以選自於由球狀填料、針狀填料、棒狀填料、纖維狀填料、扁平狀填料、鱗片狀填料、及板狀填料構成之群組中之至少1種為佳。其中,若使用球狀填料可減低應力集中的不均勻,容易減低熱膨脹時的應變。此外,若選自於由球狀填料、針狀填料、棒狀填料、纖維狀填料、扁平狀填料、鱗片狀填料、及板狀填料組成之群組中的話,可使用1種,亦可組合使用多種。The shape of the filler (A) is not particularly limited, and at least one of the fillers selected from the group consisting of spherical fillers, needle-shaped fillers, rod-shaped fillers, fiber-shaped fillers, flat fillers, flaky fillers, and plate-shaped fillers is preferred. Among them, if a spherical filler is used, the unevenness of stress concentration can be reduced, and the strain during thermal expansion can be easily reduced. In addition, if a filler selected from the group consisting of spherical fillers, needle-shaped fillers, rod-shaped fillers, fiber-shaped fillers, flat fillers, flaky fillers, and plate-shaped fillers can be used alone or in combination.

填料(A),以長徑為15nm以上為佳。藉由令長徑為15nm以上,容易改善線膨脹性。因此填料(A)的長徑,以20nm以上為較佳,以50nm以上為更佳,以0.1μm以上為尤佳。另一方面,填料(A)的長徑的上限並無特別限定,例如可為50μm以下、30μm以下、10μm以下、5μm以下、3μm以下。The filler (A) preferably has a major diameter of 15 nm or more. By setting the major diameter to be 15 nm or more, it is easy to improve the linear expansion. Therefore, the major diameter of the filler (A) is preferably 20 nm or more, more preferably 50 nm or more, and particularly preferably 0.1 μm or more. On the other hand, the upper limit of the major diameter of the filler (A) is not particularly limited, and may be, for example, 50 μm or less, 30 μm or less, 10 μm or less, 5 μm or less, or 3 μm or less.

[酸改性聚烯烴(B)] 本發明使用的酸改性聚烯烴(B)(以下亦簡稱為(B)成分。)並無特別限定,宜為藉由對於聚烯烴樹脂接枝α,β-不飽和羧酸及其酸酐中的至少1種而得到者。聚烯烴樹脂意指,舉例為乙烯、丙烯、丁烯、丁二烯、異戊二烯等烯烴單體之均聚合,或是與其他單體之共聚合,及得到的聚合物之氫化物及鹵化物等,以烴骨架為主體之聚合物。即,酸改性聚烯烴,宜為藉由對於聚乙烯、聚丙烯及丙烯-α-烯烴共聚物的至少1種接枝α,β-不飽和羧酸及其酸酐的至少1種而得到者。[Acid-modified polyolefin (B)] The acid-modified polyolefin (B) used in the present invention (hereinafter also referred to as component (B)) is not particularly limited, and is preferably obtained by grafting at least one of α,β-unsaturated carboxylic acid and its anhydride onto a polyolefin resin. Polyolefin resin means a polymer having a hydrocarbon skeleton as the main component, such as a homopolymerization of olefin monomers such as ethylene, propylene, butene, butadiene, isoprene, or a copolymerization with other monomers, and the hydrogenate and halogenide of the obtained polymer. That is, the acid-modified polyolefin is preferably obtained by grafting at least one of α,β-unsaturated carboxylic acid and its anhydride onto at least one of polyethylene, polypropylene and propylene-α-olefin copolymer.

丙烯-α-烯烴共聚物,係以丙烯作為主體與α-烯烴共聚合而得者。α-烯烴例如為乙烯、1-丁烯、1-庚烯、1-辛烯、4-甲基-1-戊烯、乙酸乙烯酯等,可使用1種或是數種。此等α-烯烴之中,以乙烯、1-丁烯為佳。丙烯-α-烯烴共聚物的丙烯成分與α-烯烴成分的比率並無特別限制,以丙烯成分為50莫耳%以上為佳,以70莫耳%以上為較佳。The propylene-α-olefin copolymer is obtained by copolymerizing propylene as the main component with an α-olefin. Examples of the α-olefin include ethylene, 1-butene, 1-heptene, 1-octene, 4-methyl-1-pentene, vinyl acetate, etc., and one or more of them can be used. Among these α-olefins, ethylene and 1-butene are preferred. The ratio of the propylene component to the α-olefin component of the propylene-α-olefin copolymer is not particularly limited, and preferably the propylene component is 50 mol% or more, and more preferably 70 mol% or more.

α,β-不飽和羧酸及其酸酐的至少1種,例如可舉例為馬來酸、伊康酸、檸康酸及它們的酸酐。其中以酸酐為佳,以馬來酸酐為較佳。具體來說可舉例為馬來酸酐改性聚丙烯、馬來酸酐改性丙烯-乙烯共聚物、馬來酸酐改性丙烯-丁烯共聚物、馬來酸酐改性丙烯-乙烯-丁烯共聚物等,此等酸改性聚烯烴可使用1種類或是組合使用2種類以上。At least one of α,β-unsaturated carboxylic acid and its anhydride, for example, maleic acid, itaconic acid, liraconic acid and their anhydrides. Among them, anhydrides are preferred, and maleic anhydride is more preferred. Specifically, maleic anhydride-modified polypropylene, maleic anhydride-modified propylene-ethylene copolymer, maleic anhydride-modified propylene-butene copolymer, maleic anhydride-modified propylene-ethylene-butene copolymer, etc. can be exemplified. Such acid-modified polyolefins can be used alone or in combination of two or more.

酸改性聚烯烴(B)的酸價,從耐熱性、及與樹脂基材、金屬基材的黏接性之觀點來看,以下限為5mgKOH/g以上為佳,以6mgKOH/g以上為較佳,以7mgKOH/g以上為更佳。藉由令酸改性聚烯烴(B)的酸價為上述下限值以上,可使與環氧樹脂(C)的相容性變得良好,展現優秀的黏接強度。此外,交聯密度變高且焊料耐熱性變得良好。上限宜為40mgKOH/g以下,以30mgKOH/g以下為較佳,以20mgKOH/g以下為更佳。藉由使酸改性聚烯烴(B)的酸價為上述上限值以下,則黏接性變得良好。From the viewpoint of heat resistance and adhesion to resin substrates and metal substrates, the acid value of the acid-modified polyolefin (B) is preferably 5 mgKOH/g or more, more preferably 6 mgKOH/g or more, and more preferably 7 mgKOH/g or more. By making the acid value of the acid-modified polyolefin (B) above the above lower limit, the compatibility with the epoxy resin (C) can be improved, and excellent bonding strength can be exhibited. In addition, the crosslinking density becomes higher and the solder heat resistance becomes good. The upper limit is preferably 40 mgKOH/g or less, preferably 30 mgKOH/g or less, and more preferably 20 mgKOH/g or less. By making the acid value of the acid-modified polyolefin (B) below the above upper limit, the adhesion becomes good.

酸改性聚烯烴(B)的數目平均分子量(Mn),以10,000~50,000之範圍為佳。以15,000~45,000之範圍為較佳,以20,000~40000之範圍為更佳,以22,000~38,000之範圍為特佳。藉由令酸改性聚烯烴(B)的數目平均分子量(Mn)為上述下限值以上,則可使凝聚力變得良好,展現優秀的黏接性。此外,為上述上限值以下則使流動性優秀,操作性變得良好。The number average molecular weight (Mn) of the acid-modified polyolefin (B) is preferably in the range of 10,000 to 50,000. It is more preferably in the range of 15,000 to 45,000, more preferably in the range of 20,000 to 40,000, and particularly preferably in the range of 22,000 to 38,000. By making the number average molecular weight (Mn) of the acid-modified polyolefin (B) above the lower limit, the cohesion can be improved and excellent adhesion can be exhibited. In addition, when it is below the upper limit, the fluidity is excellent and the workability is good.

酸改性聚烯烴(B),宜為結晶性的酸改性聚烯烴。本發明之結晶性,意指使用示差掃描型熱量計(DSC),以20℃/分由-100℃升溫至250℃,該升溫過程顯示出明確的熔解峰部者。The acid-modified polyolefin (B) is preferably a crystalline acid-modified polyolefin. The crystalline property in the present invention means that the temperature is increased from -100°C to 250°C at 20°C/min using a differential scanning calorimeter (DSC), and a clear melting peak is shown in the temperature increase process.

酸改性聚烯烴(B)的熔點(Tm),以50℃~120℃之範圍為佳。以60℃~100℃之範圍為較佳,以70℃~90℃之範圍為最佳。藉由令酸改性聚烯烴(B)的熔點(Tm)為上述下限值以上,則使源自結晶的凝聚力變得良好,可表現優秀的黏接性、焊料耐熱性。此外,藉由令酸改性聚烯烴(B)的熔點(Tm)為上述上限值以下則溶液安定性、流動性優秀,黏接時的操作性變得良好。The melting point (Tm) of the acid-modified polyolefin (B) is preferably in the range of 50°C to 120°C. It is more preferably in the range of 60°C to 100°C, and most preferably in the range of 70°C to 90°C. By making the melting point (Tm) of the acid-modified polyolefin (B) above the lower limit, the cohesive force derived from the crystallization becomes good, and excellent adhesion and solder heat resistance can be exhibited. In addition, by making the melting point (Tm) of the acid-modified polyolefin (B) below the upper limit, the solution stability and fluidity are excellent, and the workability during bonding becomes good.

酸改性聚烯烴(B)的熔解熱量(ΔH),以5J/g~60J/g之範圍為佳。以10J/g~50J/g之範圍為較佳,以20J/g~40J/g之範圍為最佳。藉由令酸改性聚烯烴(B)的熔解熱量(ΔH)為上述下限值以上,則源自結晶的凝聚力變得良好,可表現出優秀黏接性及焊料耐熱性。此外,藉由令酸改性聚烯烴(B)的熔解熱量(ΔH)為上述上限值以下,則溶液安定性、流動性優秀,黏接時的操作性變得良好。The fusion heat (ΔH) of the acid-modified polyolefin (B) is preferably in the range of 5 J/g to 60 J/g. It is more preferably in the range of 10 J/g to 50 J/g, and most preferably in the range of 20 J/g to 40 J/g. By making the fusion heat (ΔH) of the acid-modified polyolefin (B) above the lower limit, the cohesive force derived from the crystallization becomes good, and excellent adhesion and solder heat resistance can be exhibited. In addition, by making the fusion heat (ΔH) of the acid-modified polyolefin (B) below the upper limit, the solution stability and fluidity are excellent, and the workability during bonding becomes good.

酸改性聚烯烴(B)的製造方法並無特別限制,可舉例如自由基接枝反應等(即對於作為主鏈之聚合物生成自由基,以該自由基作為聚合起點,使不飽和羧酸及酸酐接枝聚合的反應)。The method for producing the acid-modified polyolefin (B) is not particularly limited, and examples thereof include free radical grafting reaction (i.e., a free radical is generated for a polymer as a main chain, and the free radical is used as a polymerization starting point to graft an unsaturated carboxylic acid and anhydride).

自由基產生劑並無特別限制,宜使用有機過氧化物。有機過氧化物並無特別限制,可舉例為過氧化苯二甲酸二-三級丁酯、三級丁基過氧化氫、過氧化二異丙苯、過氧化苯甲醯、過氧化苯甲酸三級丁酯、過氧化-2-乙基己酸三級丁酯、過氧化新戊酸三級丁酯、過氧化甲乙酮、二-三級丁基過氧化物、過氧化月桂醯等過氧化物;偶氮雙異丁腈、偶氮雙異丙腈等偶氮腈類等。There is no particular limitation on the free radical generator, and an organic peroxide is preferably used. There is no particular limitation on the organic peroxide, and examples thereof include di-tertiary butyl peroxyphthalate, tertiary butyl hydroperoxide, diisopropylbenzene peroxide, benzoyl peroxide, tertiary butyl peroxybenzoate, tertiary butyl peroxy-2-ethylhexanoate, tertiary butyl peroxypivalate, methyl ethyl ketone peroxide, di-tertiary butyl peroxide, lauryl peroxide and the like peroxides; and azonitriles such as azobisisobutylonitrile and azobisisopropionitrile.

[環氧樹脂(C)] 本發明使用的環氧樹脂(C)(以下亦簡稱為(C)成分。),若為分子中含有環氧丙基者,並無特別限制,宜為分子中含有2個以上的環氧丙基者。具體來說,並無特別限制,可以使用選自聯苯型環氧樹脂、萘型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆型環氧樹脂、脂環族環氧樹脂、二環戊二烯型環氧樹脂、四環氧丙基二胺基二苯基甲烷、三環氧丙基對胺基苯酚、四環氧丙基雙胺甲基環己酮、N,N,N’,N’-四環氧丙基間二甲苯二胺,及環氧改性聚丁二烯中之至少1種。宜為聯苯型環氧樹脂、酚醛清漆型環氧樹脂、二環戊二烯型環氧樹脂或是環氧改性聚丁二烯。較宜為二環戊二烯型環氧樹脂或是酚醛清漆型環氧樹脂。[Epoxy resin (C)] The epoxy resin (C) (hereinafter also referred to as component (C)) used in the present invention is not particularly limited as long as it contains a glycidyl group in the molecule, but preferably contains two or more glycidyl groups in the molecule. Specifically, there is no particular limitation, and at least one selected from biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, alicyclic epoxy resin, dicyclopentadiene type epoxy resin, tetracyclyl diamino diphenyl methane, tricyclyl p-aminophenol, tetracyclyl bisamino methyl cyclohexanone, N,N,N',N'-tetracyclyl m-xylene diamine, and epoxy-modified polybutadiene can be used. Preferably, it is a biphenyl type epoxy resin, a novolac type epoxy resin, a dicyclopentadiene type epoxy resin or an epoxy-modified polybutadiene. More preferably, it is a dicyclopentadiene type epoxy resin or a novolac type epoxy resin.

環氧樹脂(C)的含量係,相對於酸改性聚烯烴(B)100質量份,以0.1質量份以上為佳,以0.5質量份以上為較佳,以1質量份以上為更佳,以2質量份以上為特佳。藉由令環氧樹脂(C)的含量為上述下限值以上,可得到足夠的硬化效果,表現出優秀之黏接性、焊料耐熱性。此外,以60質量份以下為佳,以50質量份以下為較佳,以40質量份以下為更佳,以35質量份以下為特佳。藉由令環氧樹脂(C)的含量為上述上限值以下,則低介電特性變得良好。意即,藉由令環氧樹脂(C)的含量為上述範圍內,可得到具有優秀之黏接性、焊料耐熱性及低介電特性之黏接劑層。The content of the epoxy resin (C) is preferably 0.1 parts by mass or more, preferably 0.5 parts by mass or more, more preferably 1 parts by mass or more, and particularly preferably 2 parts by mass or more, relative to 100 parts by mass of the acid-modified polyolefin (B). By making the content of the epoxy resin (C) above the above lower limit, a sufficient curing effect can be obtained, and excellent adhesion and solder heat resistance can be exhibited. In addition, it is preferably 60 parts by mass or less, preferably 50 parts by mass or less, more preferably 40 parts by mass or less, and particularly preferably 35 parts by mass or less. By making the content of the epoxy resin (C) below the above upper limit, the low dielectric properties become good. That is, by setting the content of the epoxy resin (C) within the above range, an adhesive layer having excellent adhesion, solder heat resistance and low dielectric properties can be obtained.

酸改性聚烯烴(B)與環氧樹脂(C)的硬化物(以下亦簡稱為硬化物。),稱為(B)成分與(C)成分反應的硬化物。令黏接劑層全體為100質量%時,以硬化物含有40質量%以上為佳。改善黏接劑層的強度,以50質量%以上為較佳,以60質量%以上為更佳,以70質量%以上為更佳,以75質量%以上為特佳。The cured product of the acid-modified polyolefin (B) and the epoxy resin (C) (hereinafter also referred to as the cured product) is referred to as the cured product of the reaction of the components (B) and (C). When the entire adhesive layer is 100% by mass, it is preferred that the cured product contains 40% by mass or more. In order to improve the strength of the adhesive layer, it is preferred that the cured product contains 50% by mass or more, more preferably 60% by mass or more, more preferably 70% by mass or more, and particularly preferably 75% by mass or more.

(B)成分與(C)成分的硬化條件並無特別限制,以100~200℃為佳,以110~180℃為較佳,以120~150℃為更佳。此外,時間係適當地設定即可,以約1~10小時為佳,以約2~8小時為較佳,以約3~5小時為更佳。The curing conditions of the components (B) and (C) are not particularly limited, but are preferably 100-200°C, more preferably 110-180°C, and more preferably 120-150°C. In addition, the curing time can be appropriately set, preferably about 1-10 hours, more preferably about 2-8 hours, and more preferably about 3-5 hours.

黏接劑層的硬化成分,宜更含有數目平均分子量3000以下的寡聚苯醚(D)及聚碳二亞胺(E)。The curing component of the adhesive layer preferably further contains oligophenylene ether (D) and polycarbodiimide (E) having a number average molecular weight of 3000 or less.

[寡聚苯醚(D)] 本發明使用的寡聚苯醚(D)(以下亦簡稱為(D)成分。),係數目平均分子量(Mn)為3000以下者,較佳可使用具有下述通式表示(1)之結構單元及/或是通式(2)之結構單元的化合物。藉由含有(D)成分,黏接劑層的焊料耐熱性變得良好。[Oligophenyl ether (D)] The oligophenylene ether (D) used in the present invention (hereinafter also referred to as component (D)) has a mesh average molecular weight (Mn) of 3000 or less, and preferably a compound having a structural unit represented by the following general formula (1) and/or a structural unit represented by the general formula (2). By containing component (D), the solder heat resistance of the adhesive layer becomes good.

[化1] 通式(1)中,R1 、R2 、R3 、R4 分別獨立地宜為氫原子、亦可經取代的烷基、亦可經取代的烯基、亦可經取代的炔基、亦可經取代的芳基、亦可經取代的芳烷基或是亦可經取代的烷氧基。亦可經取代的烷基之「烷基」,例如為碳數係1以上6以下,宜為碳數1以上3以下,直鏈狀又或是分支鏈狀的烷基。更具體來說,可舉例為甲基、乙基、丙基、異丙基、丁基、異丁基、二級丁基、三級丁基、戊基、己基等,以甲基或是乙基為佳。亦可經取代的烯基之「烯基」,例如可舉例為乙烯基、1-丙烯基、2-丙烯基、3-丁烯基、戊烯基、己烯基等,以乙烯基或是1-丙烯基為較佳。亦可經取代的炔基之「炔基」,例如可舉例為乙炔基、1-丙炔基、2-丙炔(炔丙)基、3-丁炔基、戊炔基、己炔基等,以乙炔基、1-丙炔基或是2-丙炔(炔丙)基為較佳。亦可經取代的芳基之「芳基」,例如可舉例為苯基、萘基等,以苯基為較佳。亦可經取代的芳烷基之「芳烷基」,例如可舉例為苄基、苯乙基、2-甲基苄基、4-甲基苄基、α-甲基苄基、2-乙烯基苯乙基、4-乙烯基苯乙基等,以苄基為較佳。亦可經取代的烷氧基之「烷氧基」,係例如碳數為1以上6以下,宜為碳數為1以上3以下,直鏈狀或是分支鏈狀的烷氧基。例如可舉例為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、二級丁氧基、三級丁氧基、戊氧基、己氧基等,以甲氧基或是乙氧基為較佳。在上述的烷基、芳基、烯基、炔基、芳烷基、及烷氧基為有經取代時,可具有1或是2以上的取代基。如此取代基,例如可舉例為鹵素原子(例如氟原子、氯原子、溴原子)、碳數1~6的烷基(例如、甲基、乙基、丙基、異丙基、丁基、異丁基、二級丁基、三級丁基、戊基、己基)、芳基(例如、苯基、萘基)、烯基(例如乙烯基、1-丙烯基、2-丙烯基)、炔基(例如乙炔基、1-丙炔基、2-丙炔基)、芳烷基(例如苄基、苯乙基)、烷氧基(例如甲氧基、乙氧基)等。其中以R1 及R4 係甲基,R2 及R3 係氫為佳。[Chemistry 1] In the general formula (1), R1 , R2 , R3 , and R4 are each independently preferably a hydrogen atom, an alkyl group which may be substituted, an alkenyl group which may be substituted, an alkynyl group which may be substituted, an aryl group which may be substituted, an aralkyl group which may be substituted, or an alkoxy group which may be substituted. The "alkyl" of the alkyl group which may be substituted is, for example, an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 3 carbon atoms, in a linear or branched chain. More specifically, examples include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, dibutyl, tertiary butyl, pentyl, hexyl, etc., with methyl or ethyl being preferred. Examples of the "alkenyl" group which may be substituted include vinyl, 1-propenyl, 2-propenyl, 3-butenyl, pentenyl, hexenyl, etc., with vinyl or 1-propenyl being preferred. Examples of the "alkynyl" group which may be substituted include ethynyl, 1-propynyl, 2-propynyl (propargyl), 3-butynyl, pentynyl, hexynyl, etc., with ethynyl, 1-propynyl, or 2-propynyl (propargyl) being preferred. Examples of the "aryl" group which may be substituted include phenyl, naphthyl, etc., with phenyl being preferred. Examples of the "aralkyl" group which may be substituted include benzyl, phenethyl, 2-methylbenzyl, 4-methylbenzyl, α-methylbenzyl, 2-vinylphenethyl, 4-vinylphenethyl, etc., with benzyl being preferred. The "alkoxy" of the alkoxy group which may be substituted is, for example, an alkoxy group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, in a straight chain or branched chain. Examples include methoxy, ethoxy, propoxy, isopropoxy, butoxy, di-butoxy, tertiary butoxy, pentyloxy, hexyloxy, etc., with methoxy or ethoxy being preferred. When the above-mentioned alkyl, aryl, alkenyl, alkynyl, aralkyl, and alkoxy groups are substituted, they may have 1 or more substituents. Examples of such substituents include halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms), alkyl groups having 1 to 6 carbon atoms (e.g., methyl, ethyl, propyl, isopropyl, butyl, isobutyl, dibutyl, tertiary butyl, pentyl, hexyl), aryl groups (e.g., phenyl, naphthyl), alkenyl groups (e.g., vinyl, 1-propenyl, 2-propenyl), alkynyl groups (e.g., ethynyl, 1-propynyl, 2-propynyl), aralkyl groups (e.g., benzyl, phenethyl), alkoxy groups (e.g., methoxy, ethoxy), etc. Among them, R1 and R4 are preferably methyl groups, and R2 and R3 are preferably hydrogen.

[化2] 通式(2)中,R11 、R12 、R13 、R14 、R15 、R16 、R17 、R18 分別獨立地宜為氫原子、亦可經取代的烷基、亦可經取代的烯基、亦可經取代的炔基、亦可經取代的芳基、亦可經取代的芳烷基或是亦可經取代的烷氧基。另外,各取代基的定義,係如上述。烷基可舉例為甲基、乙基、丙基、異丙基、丁基、異丁基、二級丁基、三級丁基、戊基、己基等,以甲基為佳。其中以R13 、R14 、R17 及R18 係甲基,R11 、R12 、R15 及R16 係氫為佳。此外,-A-係以碳數20以下的直鏈狀、分支狀或者是環狀的2價之烴基,或是氧為佳。A的碳數宜為1以上15以下,以2以上10以下為更佳。此外,A的2價之烴基可舉例為亞甲基、伸乙基、伸正丙基、伸正丁基、伸環己基、伸苯基等,其中以伸苯基為佳。以氧為特佳。[Chemistry 2] In the general formula (2), R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 18 are each independently a hydrogen atom, an alkyl group which may be substituted, an alkenyl group which may be substituted, an alkynyl group which may be substituted, an aryl group which may be substituted, an aralkyl group which may be substituted, or an alkoxy group which may be substituted. In addition, the definitions of the substituents are as described above. Examples of the alkyl group include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, dibutyl, tertiary butyl, pentyl, hexyl, etc., with methyl being preferred. Among them, R 13 , R 14 , R 17 and R 18 are methyl groups, and R 11 , R 12 , R 15 and R 16 are preferably hydrogen. In addition, -A- is preferably a linear, branched or cyclic divalent alkyl group with a carbon number of 20 or less, or oxygen. The carbon number of A is preferably 1 to 15, more preferably 2 to 10. In addition, examples of the divalent alkyl group of A include methylene, ethylene, n-propylene, n-butylene, cyclohexylene, phenylene, etc., among which phenylene is preferred. Oxygen is particularly preferred.

(D)成分係一部分又或是全部,亦可為藉由乙烯基苄基等的乙烯性不飽和基、環氧基、胺基、羥基、巰基、羧基、及矽基等經官能基化的改性聚苯醚。進一步地,兩末端以具有羥基、環氧基、或是乙烯性不飽和基為佳。乙烯性不飽和基可舉例為乙烯基、烯丙基、甲基丙烯酸基、丙烯基、丁烯基、己烯基、辛烯基等的烯基、環戊烯基、環己烯基等的環烯基、乙烯基苄基、乙烯基萘基等的烯基芳基。此外,兩末端可為同樣官能基,亦可為不同官能基。從高程度地控制低損耗正切與樹脂殘渣降低之平衡之觀點來看,兩末端以羥基、或是乙烯基苄基為佳,兩末端皆為羥基或是乙烯基苄基為較佳。(D) component is part or all of it, and it can also be a modified polyphenylene ether functionalized by ethylenically unsaturated groups such as vinylbenzyl, epoxy, amino, hydroxyl, alkyl, carboxyl, and silyl. Furthermore, it is preferred that both ends have hydroxyl, epoxy, or ethylenically unsaturated groups. Ethylenically unsaturated groups can be exemplified by alkenyl groups such as vinyl, allyl, methacrylic, propenyl, butenyl, hexenyl, octenyl, cycloalkenyl such as cyclopentenyl, cyclohexenyl, vinylbenzyl, vinylnaphthyl, etc. alkenylaryl. In addition, both ends can be the same functional group or different functional groups. From the viewpoint of achieving a balance between high control of the loss tangent and reduction of the resin residue, it is preferred that both ends are hydroxyl groups or vinyl benzyl groups, and it is more preferred that both ends are hydroxyl groups or vinyl benzyl groups.

就具有以通式(1)表示的結構單元之化合物而言,以通式(3)的化合物為特佳。 [化3] 通式(3)中,n宜為3以上,以5以上為較佳,以23以下為佳,以21以下為較佳,以19以下為更佳。Among the compounds having the structural unit represented by the general formula (1), the compounds of the general formula (3) are particularly preferred. In the general formula (3), n is preferably 3 or more, more preferably 5 or more, preferably 23 or less, more preferably 21 or less, and even more preferably 19 or less.

此外,就具有以通式(2)表示的結構單元之化合物而言,以通式(4)的化合物為特佳。 [化4] 通式(4)中,n宜為2以上,以4以上為較佳,以23以下為佳,以20以下為較佳,以18以下為更佳。In addition, among the compounds having the structural unit represented by the general formula (2), the compounds of the general formula (4) are particularly preferred. In the general formula (4), n is preferably 2 or more, more preferably 4 or more, preferably 23 or less, more preferably 20 or less, and even more preferably 18 or less.

(D)成分之數目平均分子量必須為3000以下,以2700以下為較佳,以2500以下為更佳。此外(D)成分之數目平均分子量以500以上為佳,以700以上為較佳。藉由令(D)成分之數目平均分子量為下限值以上,可使黏接劑層的可撓性良好。另一方面,藉由令(D)成分之數目平均分子量為上限值以下,可使對於有機溶劑的溶解性良好。The number average molecular weight of the component (D) must be 3000 or less, preferably 2700 or less, and more preferably 2500 or less. In addition, the number average molecular weight of the component (D) is preferably 500 or more, and more preferably 700 or more. By making the number average molecular weight of the component (D) above the lower limit, the flexibility of the adhesive layer can be improved. On the other hand, by making the number average molecular weight of the component (D) below the upper limit, the solubility in organic solvents can be improved.

(D)成分之含量,相對於(B)成分100質量份,以5質量份以上為佳,以10質量份以上為較佳,以15質量份以上為更佳。此外,以100質量份以下為佳,以80質量份以下為較佳,以60質量份以下為更佳,以50質量份以下為特佳。藉由令(D)成分之含量在上述範圍內,可獲得黏接性及焊料耐熱性優秀之黏接劑層。The content of the component (D) is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and more preferably 15 parts by mass or more, relative to 100 parts by mass of the component (B). In addition, it is preferably 100 parts by mass or less, more preferably 80 parts by mass or less, more preferably 60 parts by mass or less, and particularly preferably 50 parts by mass or less. By making the content of the component (D) within the above range, an adhesive layer having excellent adhesion and solder heat resistance can be obtained.

<聚碳二亞胺(E)> 本發明使用的聚碳二亞胺(E)(以下亦簡稱為(E)成分。),若為分子內具有碳二亞胺基者則無特別限制。宜為分子內具有2個以上碳二亞胺基之聚碳二亞胺。藉由使用聚碳二亞胺,酸改性聚烯烴(B)的羧基與碳二亞胺基反應,可提高與黏接劑層及基材之相互作用,可改善黏接性。此外,黏接劑層的焊料耐熱性變得良好。<Polycarbodiimide (E)> The polycarbodiimide (E) used in the present invention (hereinafter also referred to as component (E)) is not particularly limited as long as it has a carbodiimide group in the molecule. It is preferably a polycarbodiimide having two or more carbodiimide groups in the molecule. By using polycarbodiimide, the carboxyl group of the acid-modified polyolefin (B) reacts with the carbodiimide group, which can enhance the interaction with the adhesive layer and the substrate, thereby improving the adhesion. In addition, the solder heat resistance of the adhesive layer becomes good.

(E)成分之含量,相對於(B)成分100質量份,以0.5質量份以上為佳,以1質量份以上為較佳,以2質量份以上為更佳。藉由令(E)成分之含量為上述下限值以上,可展現與基材的相互作用,黏接性變得良好。此外,以20質量份以下為佳,以15質量份以下為較佳,以10質量份以下為更佳。藉由令(E)成分之含量為上述上限值以下,可展現優秀之介電特性。即,藉由令(E)成分之含量為上述範圍內,可獲得具有黏接性及焊料耐熱性,且更具有優秀之低介電特性之黏接劑層。The content of component (E) is preferably 0.5 parts by mass or more, preferably 1 part by mass or more, and more preferably 2 parts by mass or more relative to 100 parts by mass of component (B). By making the content of component (E) above the above lower limit, interaction with the substrate can be exhibited, and adhesion becomes good. In addition, it is preferably 20 parts by mass or less, preferably 15 parts by mass or less, and more preferably 10 parts by mass or less. By making the content of component (E) below the above upper limit, excellent dielectric properties can be exhibited. That is, by making the content of component (E) within the above range, an adhesive layer having adhesion and solder heat resistance, and excellent low dielectric properties can be obtained.

本案發明之黏接劑層,以於頻率1GHz的相對電容率(εc)為3.0以下為佳。以2.6以下為較佳,以2.3以下為更佳。下限雖並無特別限制,實用上為2.0。此外,以於頻率1GHz~30GHz的全區域之相對電容率(εc)為3.0以下為佳,以2.6以下為較佳,以2.3以下為更佳。The adhesive layer of the present invention preferably has a relative capacitance (εc) of 3.0 or less at a frequency of 1 GHz. It is more preferably 2.6 or less, and more preferably 2.3 or less. Although the lower limit is not particularly limited, it is 2.0 in practice. In addition, the relative capacitance (εc) in the entire frequency range of 1 GHz to 30 GHz is preferably 3.0 or less, preferably 2.6 or less, and more preferably 2.3 or less.

本案發明之黏接劑層,以於頻率1GHz之損耗正切(tanδ)為0.02以下為佳。以0.01以下為較佳,以0.008以下為更佳。下限雖並無特別限制,實用上為0.0001。此外,以於頻率1GHz~30GHz的全區域之損耗正切(tanδ)為0.02以下為佳,以0.01以下為較佳,以0.05以下為更佳。The adhesive layer of the present invention preferably has a loss tangent (tanδ) of 0.02 or less at a frequency of 1 GHz. It is more preferably 0.01 or less, and more preferably 0.008 or less. Although the lower limit is not particularly limited, it is 0.0001 in practice. In addition, it is preferably 0.02 or less, more preferably 0.01 or less, and more preferably 0.05 or less in the entire frequency range of 1 GHz to 30 GHz.

本發明中,相對電容率(εc)及損耗正切(tanδ)可如以下方法測定。可藉由例如在黏接劑層的兩面以氣相沉積、濺鍍沉積法等的薄膜法,或是塗佈導電性糊劑等手法形成金屬層作為電容器,測定靜電容量,由厚度及面積計算出相對電容率(εc)及損耗正切(tanδ)。此外,由疊層體測定黏接劑層之相對電容率及損耗正切時,可除去金屬基材及/或是樹脂基材後測定,亦可以保持為疊層體、黏接劑層/金屬基材或是黏接劑層/樹脂基材之方式測定,之後再減去金屬基材及/或是樹脂基材之相對電容率及損耗正切之值。In the present invention, the relative capacitance (εc) and the loss tangent (tanδ) can be measured as follows. For example, a metal layer can be formed on both sides of an adhesive layer by a thin film method such as vapor deposition or sputtering deposition, or by coating a conductive paste, etc. to serve as a capacitor, and the electrostatic capacitance can be measured. The relative capacitance (εc) and the loss tangent (tanδ) can be calculated from the thickness and area. In addition, when measuring the relative capacitance and loss tangent of the adhesive layer from a laminate, the metal substrate and/or the resin substrate may be removed for measurement, or the laminate, adhesive layer/metal substrate or adhesive layer/resin substrate may be maintained for measurement, and then the relative capacitance and loss tangent values of the metal substrate and/or the resin substrate may be subtracted.

<樹脂基材> 樹脂基材,若塗佈黏接劑組成物,乾燥後可製作成疊層體之樹脂素材的基材,則無特別限制。例如可舉例為聚酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、液晶聚合物、聚苯硫醚、間規聚苯乙烯、聚烯烴系樹脂、及氟系樹脂等。以膜狀樹脂為佳。<Resin substrate> The resin substrate is not particularly limited to any resin material substrate that can be used to form a laminate after being coated with an adhesive composition and dried. Examples include polyester resins, polyamide resins, polyimide resins, polyamide-imide resins, liquid crystal polymers, polyphenylene sulfide, syndiotactic polystyrene, polyolefin resins, and fluorine resins. Film-like resins are preferred.

樹脂基材的厚度並無特別限制,由改善疊層體之強度來看,以5μm以上為佳,以10μm以上為較佳,以20μm以上為更佳。此外,由改善製作電路時的加工效率等來看,以200μm以下為佳,以100μm以下為較佳,以50μm以下為更佳。The thickness of the resin substrate is not particularly limited. From the perspective of improving the strength of the laminate, it is preferably 5 μm or more, more preferably 10 μm or more, and more preferably 20 μm or more. In addition, from the perspective of improving the processing efficiency when manufacturing the circuit, it is preferably 200 μm or less, more preferably 100 μm or less, and more preferably 50 μm or less.

<金屬基材> 金屬基材,可使用任何能使用在電路基板上之以往公知的導電性材料。素材可舉例為SUS、銅、鋁、鐵、鋼、鋅、鎳等各種金屬,及各別的合金、鍍敷品、以鋅、鉻化合物等其他金屬處理過的金屬等。以金屬箔為佳,以銅箔為較佳。<Metal substrate> The metal substrate can be any conventionally known conductive material that can be used on a circuit board. Examples of the material include various metals such as SUS, copper, aluminum, iron, steel, zinc, nickel, and their respective alloys, plated products, and metals treated with other metals such as zinc and chromium compounds. Metal foil is preferred, and copper foil is more preferred.

金屬基材的厚度並無特別限制,由可獲得電路之充分的電性能來看,以1μm以上為佳,以3μm以上為較佳,以10μm以上為更佳。此外,由改善製作電路時的加工效率等來看,以50μm以下為佳,以30μm以下為較佳,以20μm以下為更佳。The thickness of the metal substrate is not particularly limited. From the perspective of obtaining sufficient electrical performance of the circuit, it is preferably 1 μm or more, more preferably 3 μm or more, and more preferably 10 μm or more. In addition, from the perspective of improving processing efficiency when manufacturing the circuit, it is preferably 50 μm or less, more preferably 30 μm or less, and more preferably 20 μm or less.

金屬基材通常係以卷狀之形態提供。製造本發明之印刷電路板時使用的金屬基材之形態並無特別限制。使用帶狀之形態的金屬基材(金屬箔)時,其長度並無特別限制。此外,其寬度雖然亦無特別限制,以約250~500cm為佳。The metal substrate is usually provided in a roll form. There is no particular restriction on the form of the metal substrate used in manufacturing the printed circuit board of the present invention. When a metal substrate (metal foil) in a strip form is used, there is no particular restriction on its length. In addition, although there is no particular restriction on its width, it is preferably about 250 to 500 cm.

可對於金屬基材施予表面處理。表面處理可舉例為ITRO處理、電漿處理、噴砂處理、底漆處理、固著劑處理等。The metal substrate may be subjected to surface treatment. Examples of surface treatment include ITRO treatment, plasma treatment, sandblasting treatment, primer treatment, and adhesive treatment.

<印刷電路板> 本發明中的印刷電路板,係含有本發明之疊層體作為構成要件。印刷電路板,例如係藉由使用覆金屬疊層體之減去(subtractive)法等的以往公知的方法製造。因應需要,使用表覆膜、網版印刷印墨等被覆部分或全部的由金屬箔所形成導體電路的所謂撓性電路板(FPC)、扁平電纜、捲帶式自動接合(TAB)用電路板等的總稱。<Printed circuit board> The printed circuit board in the present invention includes the laminate of the present invention as a constituent element. The printed circuit board is manufactured by a conventionally known method such as a subtractive method using a metal-clad laminate. It is a general term for so-called flexible printed circuits (FPCs), flat cables, and tape automated bonding (TAB) circuit boards, which are partially or entirely coated with a metal foil conductive circuit using a surface coating, screen printing ink, etc. as needed.

本發明之印刷電路板,能製成可作為印刷電路板所採用之任意的疊層構成。例如,可為疊層體(樹脂基材/黏接劑層/金屬基材)/黏接劑層/表覆膜層所構成的印刷電路板。The printed circuit board of the present invention can be manufactured into any laminated structure that can be used as a printed circuit board. For example, it can be a printed circuit board composed of a laminate (resin substrate/adhesive layer/metal substrate)/adhesive layer/surface coating layer.

<實施例> 以下舉例實施例對本發明進行更詳細說明。但本發明並不限定於實施例。實施例中及比較例中,「質量份」係簡稱為「份」。<Examples> The following examples are given to illustrate the present invention in more detail. However, the present invention is not limited to the examples. In the examples and comparative examples, "parts by mass" is abbreviated as "parts".

(物性評價方法)(Physical property evaluation method)

酸價:酸改性聚烯烴(B) 本發明中之酸價(mgKOH/g)係將酸改性聚烯烴(B)溶解於甲苯,使用酚酞作為指示劑,以甲醇鈉的甲醇溶液進行滴定。Acid value: acid-modified polyolefin (B) The acid value (mgKOH/g) in the present invention is obtained by dissolving the acid-modified polyolefin (B) in toluene, using phenolphthalein as an indicator, and titrating with a methanol solution of sodium methoxide.

數目平均分子量(Mn) 本發明中之數目平均分子量係藉由島津製作所(股)製凝膠層析儀(以下稱GPC,標準物質:聚苯乙烯樹脂、移動相:四氫呋喃、管柱:Shodex KF-802 + KF-804L + KF-806L、管柱溫度:30℃、流速:1.0ml/分、檢測器:RI檢測器)所測定之值。Number average molecular weight (Mn) The number average molecular weight in the present invention is the value measured by a gel chromatograph manufactured by Shimadzu Corporation (hereinafter referred to as GPC, standard material: polystyrene resin, mobile phase: tetrahydrofuran, column: Shodex KF-802 + KF-804L + KF-806L, column temperature: 30°C, flow rate: 1.0 ml/min, detector: RI detector).

熔點、熔解熱量 本發明中之熔點、熔解熱量係使用示差掃描熱量計(以下稱DSC,TA Instruments Japan製、Q-2000),以20℃/分的速度升溫熔解,冷卻使其樹脂化,由再次升溫熔解時熔解峰部的峰頂溫度及面積所測定之值。Melting point, heat of fusion The melting point and heat of fusion in the present invention are measured by using a differential scanning calorimeter (hereinafter referred to as DSC, manufactured by TA Instruments Japan, Q-2000), heating at a rate of 20°C/min to melt, cooling to resinify, and then heating again to melt and measure the peak temperature and area of the melting peak.

剝離強度(黏接性) 以乾燥後的厚度成為12.5μm之方式將下述黏接劑組成物b塗佈在厚度12.5μm的聚醯亞胺薄膜(Kaneka股份有限公司製、APICAL(註冊商標)),以130℃乾燥3分鐘。接著將黏接劑組成物a,以乾燥後厚度成為12.5μm之方式塗佈在黏接劑組成物b面,以130℃乾燥3分鐘。將如此方式得到的黏接性薄膜(B階段品)與厚度18μm的壓延銅箔(JX金屬股份有限公司製、BHY系列)貼合。貼合係以壓延銅箔的光滑面接觸黏接劑層之方式,以160℃、在40kgf/cm2 的加壓下,加壓30秒而黏接。接著以140℃熱處理4小時使其硬化,得到剝離強度評價用樣本。將剝離強度評價用樣本於25℃,以拉伸速度50mm/min進行90°剝離試驗,測定剝離強度。此試驗係表示在常溫下的黏接強度。 [評價標準] ◎:1.0N/mm以上 ○:0.8N/mm以上小於1.0N/mm △:0.5N/mm以上小於0.8N/mm ×:小於0.5N/mmPeel strength (adhesion) The following adhesive composition b was applied to a 12.5 μm thick polyimide film (manufactured by Kaneka Co., Ltd., APICAL (registered trademark)) in such a manner that the thickness after drying was 12.5 μm, and dried at 130°C for 3 minutes. Then, the adhesive composition a was applied to the adhesive composition b surface in such a manner that the thickness after drying was 12.5 μm, and dried at 130°C for 3 minutes. The adhesive film (B-stage product) obtained in this manner was bonded to a 18 μm thick rolled copper foil (manufactured by JX Metal Co., Ltd., BHY series). The bonding is done by bringing the smooth surface of the rolled copper foil into contact with the adhesive layer at 160°C and under a pressure of 40kgf/ cm2 for 30 seconds. It is then hardened by heat treatment at 140°C for 4 hours to obtain a sample for peel strength evaluation. The sample for peel strength evaluation is subjected to a 90° peel test at 25°C and a tensile speed of 50mm/min to measure the peel strength. This test indicates the bonding strength at room temperature. [Evaluation Standard] ◎: 1.0N/mm or more ○: 0.8N/mm or more but less than 1.0N/mm △: 0.5N/mm or more but less than 0.8N/mm ×: less than 0.5N/mm

焊料耐熱性 由與上述剝離強度試驗相同方法製作樣本,將2.0cm×2.0cm的樣本片以23℃進行老化處理2天,於以280℃溶融的焊料浴中漂浮10秒,確認是否有膨脹等外觀變化。 <評價標準> ◎:無膨脹 ○:有一部分膨脹 △:有多數膨脹 ×:有膨脹,且變色Solder heat resistance The samples were prepared in the same way as the peel strength test. The 2.0 cm × 2.0 cm sample pieces were aged at 23°C for 2 days and floated in a solder bath melted at 280°C for 10 seconds to check for changes in appearance such as expansion. <Evaluation criteria> ◎: No expansion ○: Some expansion △: Some expansion ×: Expansion and discoloration

相對電容率(εc)及損耗正切(tanδ) 以乾燥硬化後的厚度成為12.5μm之方式將下述黏接劑組成物b塗佈在厚度100μm的Teflon(註冊商標)片,以130℃乾燥3分鐘。接著以乾燥後的厚度成為12.5μm之方式將黏接劑組成物a塗佈在黏接劑組成物b面,以130℃乾燥3分鐘。接著以140℃熱處理4小時使其硬化後,剝離Teflon(註冊商標)片獲得試驗用的黏接劑層片。將得到的試驗用黏接劑層片裁切成8cm×3mm的短片狀,獲得試驗用樣本。相對電容率(εc)及損耗正切(tanδ),係使用網路分析器(Anritsu公司製),以空腔共振器擾動法在溫度23℃、頻率1GHz的條件下測定。如以下評價得到的相對電容率、損耗正切。 <相對電容率的評價標準> ◎:2.3以下 ○:超過2.3,2.6以下 △:超過2.6,3.0以下 ×:超過3.0 <損耗正切的評價標準> ◎:0.008以下 ○:超過0.008,0.01以下 △:超過0.01,0.02以下 ×:超過0.02Relative capacitance (εc) and loss tangent (tanδ) The following adhesive composition b was applied to a 100μm thick Teflon (registered trademark) sheet in such a way that the thickness after drying and curing became 12.5μm, and dried at 130℃ for 3 minutes. Then, adhesive composition a was applied to the adhesive composition b surface in such a way that the thickness after drying became 12.5μm, and dried at 130℃ for 3 minutes. Then, after heat treatment at 140℃ for 4 hours to harden it, the Teflon (registered trademark) sheet was peeled off to obtain a test adhesive layer sheet. The obtained test adhesive layer sheet was cut into short pieces of 8cm×3mm to obtain a test sample. Relative capacitance (εc) and loss tangent (tanδ) were measured using a network analyzer (manufactured by Anritsu Corporation) using the cavity resonator perturbation method at a temperature of 23°C and a frequency of 1 GHz. The relative capacitance and loss tangent were evaluated as follows. <Evaluation criteria for relative capacitance> ◎: 2.3 or less ○: More than 2.3, less than 2.6 △: More than 2.6, less than 3.0 ×: More than 3.0 <Evaluation criteria for loss tangent> ◎: 0.008 or less ○: More than 0.008, less than 0.01 △: More than 0.01, less than 0.02 ×: More than 0.02

填料(A)的個數 於垂直於疊層體表面方向切割疊層體,以電子顯微鏡拍攝剖面。目視計算在剖面中之於黏接劑層3a之區域與黏接劑層3b之區域含有的填料。另外,長徑為小於15nm之填料(A)由於線膨脹性的影響微弱,並不列入計算。Number of fillers (A) The laminate was cut perpendicular to the surface of the laminate, and the cross section was photographed with an electron microscope. The fillers contained in the adhesive layer 3a and the adhesive layer 3b in the cross section were visually counted. In addition, fillers (A) with a length smaller than 15 nm were not included in the calculation because the linear expansion property had a weak effect.

線膨脹性 使用熱機械分析裝置(日立High-Tech Science公司製、「TMA-7100」),將在上述相對電容率測定時使用的合計膜厚25μm之試驗用樣本裁切成長度1.5cm,導入至裝置中。以負荷5g、升溫速度10℃/分的條件,從20℃升溫至250℃。基於得到的溫度與尺寸變化之數據,求出於30℃之平均線膨脹係數,評價試驗用樣本的低膨脹性。 <線膨脹係數的評價標準> 評價標準係在30℃之值。 ◎:500ppm以下 ○:超過500ppm,550ppm以下 △:超過550ppm,600ppm以下 ×:超過600ppmLinear expansion Using a thermomechanical analyzer (manufactured by Hitachi High-Tech Science, "TMA-7100"), the test sample with a total film thickness of 25μm used in the above relative capacitance measurement was cut into a length of 1.5cm and introduced into the device. The temperature was raised from 20℃ to 250℃ under the conditions of a load of 5g and a heating rate of 10℃/min. Based on the obtained temperature and dimensional change data, the average linear expansion coefficient at 30℃ was calculated to evaluate the low expansion of the test sample. <Evaluation standard of linear expansion coefficient> The evaluation standard is the value at 30℃. ◎: 500ppm or less ○: More than 500ppm, less than 550ppm △: More than 550ppm, less than 600ppm ×: More than 600ppm

樹脂組成物(F-1)的製造例 摻合填料(A-1)30質量份、酸改性聚烯烴(B-1)100質量份、環氧樹脂(C-1)20質量份、甲基環己烷382質量份、甲基乙基酮39質量份、甲苯11質量份,均勻攪拌混合得到樹脂組成物(F-1)。Preparation Example of Resin Composition (F-1) 30 parts by mass of filler (A-1), 100 parts by mass of acid-modified polyolefin (B-1), 20 parts by mass of epoxy resin (C-1), 382 parts by mass of methylcyclohexane, 39 parts by mass of methyl ethyl ketone, and 11 parts by mass of toluene were mixed and stirred uniformly to obtain a resin composition (F-1).

樹脂組成物(F-2)~(F-23)的製造例 以與樹脂組成物(F-1)相同之方式,製造樹脂組成物(F-2)~(F-23)。摻合量表式於表1。Preparation example of resin composition (F-2)~(F-23) Resin composition (F-2)~(F-23) was prepared in the same manner as resin composition (F-1). The blending amount is shown in Table 1.

實施例1 以乾燥後厚度成為12.5μm之方式將樹脂組成物(F-12)塗佈在聚醯亞胺(PI)膜(DU PONT-TORAY公司製 商品名Kapton EN50),以130℃乾燥3分鐘。接著以乾燥後的厚度成為12.5μm之方式塗佈樹脂組成物(F-11),以130℃乾燥3分鐘。接著,以銅箔(JX日鑛日石製 BHY 厚度18μm)的光滑面接觸樹脂組成物(F-11)層之方式貼合,在160℃、40kgf/cm2 的加壓下加壓30秒而黏接。接著以140℃熱處理4小時使其硬化,得到疊層體。黏接劑層3a及黏接劑層3b中含有之填料(A)的個數的比率,為a1/a2=52/48(30/28)。結果表示於表2。Example 1 The resin composition (F-12) was applied to a polyimide (PI) film (Kapton EN50, manufactured by DU PONT-TORAY) to a thickness of 12.5 μm after drying, and dried at 130°C for 3 minutes. Then, the resin composition (F-11) was applied to a thickness of 12.5 μm after drying, and dried at 130°C for 3 minutes. Then, a copper foil (BHY, thickness 18 μm, manufactured by JX Japan Mining and Sunshine Co., Ltd.) was attached so that the smooth surface thereof was in contact with the resin composition (F-11) layer, and the layers were bonded by applying pressure at 160°C and 40 kgf/ cm2 for 30 seconds. Then, the laminate was cured by heat treatment at 140°C for 4 hours. The ratio of the number of fillers (A) contained in the adhesive layer 3a and the adhesive layer 3b was a1/a2=52/48 (30/28). The results are shown in Table 2.

實施例2~13、比較例1~3 與實施例1相同之方式進行實施例2~13、比較例1~3。結果以表2表示。Examples 2 to 13, Comparative Examples 1 to 3 Examples 2 to 13 and Comparative Examples 1 to 3 were carried out in the same manner as Example 1. The results are shown in Table 2.

[表1] [Table 1]

[表2] [Table 2]

表1使用的填料(A)、酸改性聚烯烴(B)、環氧樹脂(C)、寡聚苯醚(D)及聚碳二亞胺(E)如下: <填料(A)> 填料(A-1):磷系阻燃填料(三光(股)製HCA-HQ-HS、球狀、粒徑:1.5μm) 填料(A-2):氫氧化鋁(昭和電工(股)製HYGILITEH42M、粒徑:1.0μm) 填料(A-3):氧化矽(Denka(股)製FB-3SDC、球狀、粒徑:3μm) 填料(A-4):氧化鈦(石原產業(股)製TIPAQUE CR-50、粒徑:0.25μm) 填料(A-5):碳黑(三菱化學(股)製碳黑良流動性#MA100、球狀、粒徑:24nm) <環氧樹脂(C)> 環氧樹脂(C-1):二環戊二烯型環氧樹脂:HP-7200(DIC公司製 環氧當量 259g/eq) 環氧樹脂(C-2):環氧改性聚丁二烯樹脂:JP-100(日本曹達公司製) <寡聚苯醚(D)> 寡聚苯醚(D-1):寡聚苯醚苯乙烯改性品:OPE-2St 1200(三菱瓦斯化學公司製 Mn1000的具有通式(4)之構造的化合物) 寡聚苯醚(D-2):寡聚苯醚:SA90(SABIC公司製 Mn1800的具有通式(3)之構造的化合物) <聚碳二亞胺(E)> 聚碳二亞胺樹脂(E-1):V-09GB(日清紡Chemical公司製 碳二亞胺當量216g/eq)The filler (A), acid-modified polyolefin (B), epoxy resin (C), oligophenylene ether (D) and polycarbodiimide (E) used in Table 1 are as follows: <Filler (A)> Filler (A-1): phosphorus-based flame retardant filler (HCA-HQ-HS manufactured by Sanko Co., Ltd., spherical, particle size: 1.5μm) Filler (A-2): aluminum hydroxide (HYGILITE H42M manufactured by Showa Denko Co., Ltd., particle size: 1.0μm) Filler (A-3): silicon oxide (FB-3SDC manufactured by Denka Co., Ltd., spherical, particle size: 3μm) Filler (A-4): titanium oxide (TIPAQUE manufactured by Ishihara Sangyo Co., Ltd.) CR-50, particle size: 0.25μm) Filler (A-5): Carbon black (Mitsubishi Chemical Co., Ltd. Carbon black good fluidity #MA100, spherical, particle size: 24nm) <Epoxy resin (C)> Epoxy resin (C-1): Dicyclopentadiene type epoxy resin: HP-7200 (DIC Corporation, epoxy equivalent 259g/eq) Epoxy resin (C-2): Epoxy-modified polybutadiene resin: JP-100 (Nippon Soda Co., Ltd.) <Oligophenyl ether (D)> Oligophenyl ether (D-1): Oligophenyl ether styrene modified product: OPE-2St 1200 (Mitsubishi Gas Chemical Co., Ltd. =Compound with a structure of general formula (4) with Mn 1000) Oligophenyl ether (D-2): Oligophenyl ether: SA90 (Compound with a structure of general formula (3) with Mn 1800 manufactured by SABIC) <Polycarbodiimide (E)> Polycarbodiimide resin (E-1): V-09GB (manufactured by Nisshinbo Chemical Co., Ltd., carbodiimide equivalent 216 g/eq)

<酸改性聚烯烴(B)> 製造例1 在1L高壓釜中,加入丙烯-丁烯共聚物(三井化學公司製「TAFMER(註冊商標)XM7080」)100質量份、甲苯150質量份及馬來酸酐19質量份、二-三級丁基過氧化物6質量份,升溫至140℃後,接著攪拌3小時。之後,冷卻得到的反應液後,將其注入裝有大量的甲基乙基酮的容器,使樹脂析出。之後,藉由將含有該樹脂之液體以離心分離,將經接枝聚合馬來酸酐的酸改性丙烯-丁烯共聚物,與(聚)馬來酸酐及低分子量物分離、精製。之後,經由在減壓下70℃乾燥5小時,獲得馬來酸酐改性丙烯-丁烯共聚物(B-1、酸價19mgKOH/g、數目平均分子量25,000、Tm80℃、△H35J/g)。<Acid-modified polyolefin (B)> Production Example 1 In a 1L autoclave, 100 parts by mass of propylene-butene copolymer ("TAFMER (registered trademark) XM7080" manufactured by Mitsui Chemicals Co., Ltd.), 150 parts by mass of toluene, 19 parts by mass of maleic anhydride, and 6 parts by mass of di-tertiary butyl peroxide were added, and the temperature was raised to 140°C, followed by stirring for 3 hours. After that, the obtained reaction liquid was cooled and poured into a container containing a large amount of methyl ethyl ketone to precipitate the resin. Thereafter, by centrifugally separating the liquid containing the resin, the acid-modified propylene-butene copolymer grafted with maleic anhydride was separated from the (poly)maleic anhydride and low molecular weight substances and purified. After that, the mixture was dried at 70°C for 5 hours under reduced pressure to obtain a maleic anhydride-modified propylene-butene copolymer (B-1, acid value 19 mgKOH/g, number average molecular weight 25,000, Tm 80°C, ΔH 35 J/g).

製造例2 將馬來酸酐的加入量變更為6質量份,除此以外,以與製造例1相同之方式,獲得馬來酸酐改性丙烯-丁烯共聚物(B-2、酸價7mgKOH/g、數目平均分子量35,000、Tm82℃、△H25J/g)。 [產業上利用性]Preparation Example 2 Except that the amount of maleic anhydride added was changed to 6 parts by mass, a maleic anhydride-modified propylene-butene copolymer (B-2, acid value 7 mgKOH/g, number average molecular weight 35,000, Tm 82°C, ΔH 25 J/g) was obtained in the same manner as in Preparation Example 1. [Industrial Applicability]

本發明之疊層體,由於黏接性及介電特性良好,且線膨脹性良好,於軟性印刷電路板之用途,特別是需要在高頻區域的低介電特性(低相對電容率、低損耗正切)之FPC用途中為有用。The laminate of the present invention has good adhesion and dielectric properties, and good linear expansion properties, and is useful in the application of flexible printed circuit boards, especially in FPC applications that require low dielectric properties (low relative capacitance, low loss tangent) in the high frequency region.

1:金屬基材 2:樹脂基材 3:黏接劑層 3a:黏接劑層3a 3b:黏接劑層3b 10:疊層體1: Metal substrate 2: Resin substrate 3: Adhesive layer 3a: Adhesive layer 3a 3b: Adhesive layer 3b 10: Laminated body

[圖1]圖1係在垂直於疊層體表面的方向之剖面圖。[Figure 1] Figure 1 is a cross-sectional view in a direction perpendicular to the surface of the laminate.

1:金屬基材 1:Metal substrate

2:樹脂基材 2: Resin substrate

3:黏接劑層 3: Adhesive layer

3a:黏接劑層3a 3a: Adhesive layer 3a

3b:黏接劑層3b 3b: Adhesive layer 3b

10:疊層體 10:Layered body

Claims (5)

一種疊層體,係以金屬基材、黏接劑層、樹脂基材之順序疊層,該黏接劑層含有填料(A)、酸改性聚烯烴(B)及環氧樹脂(C)的硬化物;該填料(A)係選自於由含磷阻燃填料、氫氧化鋁、氧化矽、氧化鈦及碳黑構成之群組中之1種以上;該填料(A)的含量,相對於酸改性聚烯烴(B)100質量份,係0.1質量份以上50質量份以下;在垂直於該疊層體表面的方向之該黏接劑層之剖面中,從中間點到接近該金屬基材表面側的區域所含有的該填料(A)之個數a1,多於從中間點到接近該樹脂基材表面側的區域所含有的該填料(A)之個數b1,該a1與b1的比率為a1/b1=98/2~52/48。 A laminated body is a metal substrate, an adhesive layer, and a resin substrate laminated in sequence, wherein the adhesive layer contains a filler (A), an acid-modified polyolefin (B), and a cured product of an epoxy resin (C); the filler (A) is selected from at least one of the group consisting of a phosphorus-containing flame retardant filler, aluminum hydroxide, silicon oxide, titanium oxide, and carbon black; and the content of the filler (A), relative to 100 parts by weight of the acid-modified polyolefin (B), is 0.1 mass parts or more and 50 mass parts or less; in the cross section of the adhesive layer in the direction perpendicular to the surface of the laminate, the number a1 of the filler (A) contained in the area from the midpoint to the side close to the surface of the metal substrate is greater than the number b1 of the filler (A) contained in the area from the midpoint to the side close to the surface of the resin substrate, and the ratio of a1 to b1 is a1/b1=98/2~52/48. 如請求項1之疊層體,其中,該黏接劑層的硬化物成分更含有數目平均分子量3000以下的寡聚苯醚(D)。 As in claim 1, the laminated body, wherein the curing component of the adhesive layer further contains oligophenylene ether (D) with a numerical average molecular weight of less than 3000. 如請求項1或2之疊層體,其中,該黏接劑層的硬化物成分更含有聚碳二亞胺(E)。 As in claim 1 or 2, the laminated body, wherein the curing component of the adhesive layer further contains polycarbodiimide (E). 如請求項1或2之疊層體,其中,該黏接劑層的於1GHz之相對電容率(εc)為3.0以下,損耗正切(tanδ)為0.02以下。 A laminate as claimed in claim 1 or 2, wherein the relative capacitance (εc) of the adhesive layer at 1 GHz is less than 3.0, and the loss tangent (tanδ) is less than 0.02. 一種印刷電路板,含有請求項1~4中任一項之疊層體作為構成要件。 A printed circuit board comprising a laminated body as one of claims 1 to 4.
TW109142531A 2019-12-04 2020-12-03 Low dielectric stack TWI869502B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019219824 2019-12-04
JP2019-219824 2019-12-04

Publications (2)

Publication Number Publication Date
TW202130504A TW202130504A (en) 2021-08-16
TWI869502B true TWI869502B (en) 2025-01-11

Family

ID=76221687

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109142531A TWI869502B (en) 2019-12-04 2020-12-03 Low dielectric stack

Country Status (5)

Country Link
JP (1) JP7582182B2 (en)
KR (1) KR20220108030A (en)
CN (1) CN114302933B (en)
TW (1) TWI869502B (en)
WO (1) WO2021112134A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI828469B (en) * 2022-12-09 2024-01-01 南亞塑膠工業股份有限公司 Adhesive composition and copper clad laminate manufactured using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084507A (en) * 2007-10-02 2009-04-23 Hitachi Kasei Polymer Co Ltd Multilayer adhesive film, coverlay film using the same, and multilayer adhesive film with copper foil
TW201728445A (en) * 2015-11-02 2017-08-16 Toyo Boseki Low-dielectric flame-resistant adhesive composition
WO2019188087A1 (en) * 2018-03-30 2019-10-03 三井金属鉱業株式会社 Copper-clad laminate
TW201940634A (en) * 2018-03-07 2019-10-16 日商東亞合成股份有限公司 Adhesive composition, and adhesive layer-equipped layered product using same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4065595B2 (en) * 1997-02-20 2008-03-26 三井化学株式会社 Adhesive composition and board manufacturing method using the adhesive composition
JP3820668B2 (en) * 1997-02-25 2006-09-13 日立化成工業株式会社 Metal base substrate and manufacturing method thereof
JP2006045388A (en) * 2004-08-05 2006-02-16 Kaneka Corp Insulating adhesive sheet and its application
JP2008153313A (en) * 2006-12-15 2008-07-03 Matsushita Electric Ind Co Ltd Optical device apparatus, manufacturing method thereof, and camera module
JP4918380B2 (en) * 2007-03-13 2012-04-18 ソマール株式会社 Shielding film and method for producing the same
WO2009055554A2 (en) * 2007-10-26 2009-04-30 E. I. Du Pont De Nemours And Company Multi-layer chip carrier and process for making
JP5327937B2 (en) * 2007-12-25 2013-10-30 旭化成ケミカルズ株式会社 Adhesive for laser welding
TWI506082B (en) * 2009-11-26 2015-11-01 Ajinomoto Kk Epoxy resin composition
JP2014141603A (en) * 2013-01-25 2014-08-07 Toyo Ink Sc Holdings Co Ltd Adhesive agent composition excellent in dielectric property, adhesive agent sheet using the same and printed wiring board
WO2014148155A1 (en) * 2013-03-22 2014-09-25 ナミックス株式会社 Resin composition and adhesive film, coverlay film, and interlayer adhesive using resin composition
JP6718148B2 (en) * 2014-09-24 2020-07-08 東亞合成株式会社 Adhesive composition and laminate with adhesive layer using the same
JP6686587B2 (en) * 2015-03-30 2020-04-22 大日本印刷株式会社 Battery packaging material, manufacturing method thereof, and battery
JP6579309B2 (en) * 2015-05-01 2019-09-25 味の素株式会社 Curable composition
WO2016185956A1 (en) * 2015-05-15 2016-11-24 東洋紡株式会社 Laminate comprising low dielectric constant adhesive layer
JP6142961B1 (en) * 2016-03-08 2017-06-07 東洋インキScホールディングス株式会社 LAMINATE, MANUFACTURING METHOD THEREOF, AND RESIN FILM WITH ADHESIVE LAYER
WO2018116728A1 (en) * 2016-12-22 2018-06-28 株式会社村田製作所 Circuit module
JP2018135467A (en) * 2017-02-22 2018-08-30 藤森工業株式会社 Hot-melt adhesive resin laminate and laminate
JP2019127501A (en) * 2018-01-22 2019-08-01 藤森工業株式会社 Thermosetting adhesive composition, adhesive film, coverlay film, and flexible printed wiring board

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084507A (en) * 2007-10-02 2009-04-23 Hitachi Kasei Polymer Co Ltd Multilayer adhesive film, coverlay film using the same, and multilayer adhesive film with copper foil
TW201728445A (en) * 2015-11-02 2017-08-16 Toyo Boseki Low-dielectric flame-resistant adhesive composition
TW201940634A (en) * 2018-03-07 2019-10-16 日商東亞合成股份有限公司 Adhesive composition, and adhesive layer-equipped layered product using same
WO2019188087A1 (en) * 2018-03-30 2019-10-03 三井金属鉱業株式会社 Copper-clad laminate

Also Published As

Publication number Publication date
CN114302933A (en) 2022-04-08
TW202130504A (en) 2021-08-16
JPWO2021112134A1 (en) 2021-06-10
JP7582182B2 (en) 2024-11-13
WO2021112134A1 (en) 2021-06-10
KR20220108030A (en) 2022-08-02
CN114302933B (en) 2024-05-10

Similar Documents

Publication Publication Date Title
JP6941308B2 (en) Low Dielectric Adhesive Composition
TWI589628B (en) Resin composition
JP2010222408A (en) Resin composition for flexible printed wiring board, resin film, prepreg, metal foil with resin, flexible printed wiring board
KR20220079852A (en) Polyolefin-based adhesive composition
TWI869502B (en) Low dielectric stack
JP7660990B2 (en) Thermosetting maleimide resin composition
JP7120497B1 (en) Adhesive composition, and adhesive sheet, laminate and printed wiring board containing same
KR102804060B1 (en) Adhesive films, laminates and printed wiring boards
CN113354936B (en) Resin composition, cured product of resin composition, resin sheet, printed wiring board, and semiconductor device
KR20200012773A (en) Resin composition
KR20230039605A (en) Adhesive compositions, adhesive sheets, laminates and printed wiring boards
CN114341300A (en) Polyolefin-based adhesive composition
JP7524903B2 (en) Adhesive composition, adhesive sheet, laminate and printed wiring board
JP7537633B2 (en) Adhesive composition, adhesive sheet, electromagnetic wave shielding film, laminate and printed wiring board
JP7444318B1 (en) Adhesive composition, adhesive sheet, laminate, and printed wiring board containing the same
CN118829686A (en) Resin composition, prepreg, film with resin, metal foil with resin, metal foil-clad laminate, and wiring board
TW202411348A (en) Resin composition, copper foil with resin, and printed wiring board
WO2022196586A1 (en) Adhesive composition, and bonding sheet, multilayer body and printed wiring board each containing same
CN117126347A (en) Resin composition and product thereof
WO2025142909A1 (en) Resin composition, resin-attached metal foil, laminate, printed wiring board, and semiconductor package