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TWI863064B - Mounting device, inspection device, component assembly method, and semiconductor device manufacturing method - Google Patents

Mounting device, inspection device, component assembly method, and semiconductor device manufacturing method Download PDF

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TWI863064B
TWI863064B TW111147925A TW111147925A TWI863064B TW I863064 B TWI863064 B TW I863064B TW 111147925 A TW111147925 A TW 111147925A TW 111147925 A TW111147925 A TW 111147925A TW I863064 B TWI863064 B TW I863064B
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bonding material
light source
bright spot
camera
substrate
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TW202403922A (en
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小橋英晴
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日商捷進科技有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67138Apparatus for wiring semiconductor or solid state device
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
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  • Die Bonding (AREA)

Abstract

[課題]在於提供一種「用以使接合材料之檢查的精度提升」的技術。 [解決手段]安裝裝置,係具備有:攝像裝置,朝向具有鏡面反射面的接合材料;照明裝置,具有被設置於前述接合材料之上方的光源;及控制裝置,被構成為改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料。 [Topic] To provide a technology for "improving the accuracy of inspection of bonding materials". [Solution] A mounting device is provided with: a camera facing a bonding material having a mirror-reflecting surface; a lighting device having a light source disposed above the bonding material; and a control device configured to change the irradiation position of the light source, and inspect the bonding material based on a plurality of images obtained by the camera taking the bonding material.

Description

安裝裝置、檢查裝置、元件組裝方法及半導體裝置之製造方法Mounting device, inspection device, component assembly method, and semiconductor device manufacturing method

本揭示,係關於安裝裝置,例如可應用於將糊料作為接合材料的晶粒接合器。The present disclosure relates to a mounting device, such as a die bonder that can be used with a paste as a bonding material.

晶粒接合器等的安裝裝置,係使用接合材料,例如將元件附接(安裝)於基板或元件上的裝置。接合材料,係例如樹脂糊料或銲錫等。樹脂糊料,係液體狀之接著劑,例如銀環氧樹脂或銀丙烯酸等的銀糊料。以下,將樹脂糊料僅稱為糊料。元件,係例如半導體晶片(以下,稱為晶粒。)或MEMS(Micro Electro Mechanical System)等。基板,係例如由配線基板或金屬薄板所形成的引線框架、玻璃基板等。Mounting devices such as die bonders are devices that use bonding materials, such as to attach (mount) components to a substrate or component. Bonding materials are, for example, resin paste or solder. Resin paste is a liquid adhesive, such as silver paste such as silver epoxy or silver acrylic. Hereinafter, resin paste will be simply referred to as paste. Components are, for example, semiconductor chips (hereinafter referred to as die) or MEMS (Micro Electro Mechanical System). Substrates are, for example, lead frames formed by wiring boards or metal sheets, glass substrates, etc.

例如,基於使用攝像機及照明裝置而取得的圖像,確認塗佈糊料之基板的位置並進行定位,或確認經塗佈於基板的糊料是否以預定形狀且僅以預定量被塗佈於預定位置。 [先前技術文獻] [專利文獻] For example, based on images obtained using a camera and a lighting device, the position of a substrate on which the paste is applied is confirmed and positioned, or whether the paste applied to the substrate is applied in a predetermined shape and only in a predetermined amount at a predetermined position is confirmed. [Prior art document] [Patent document]

[專利文獻1]日本特開2021-44466號公報[Patent Document 1] Japanese Patent Application Publication No. 2021-44466

[本發明所欲解決之課題][Problems to be solved by the present invention]

本揭示,係在於提供一種「用以使接合材料之檢查的精度提升」的技術。其他課題及新穎之特徵,係可由本說明書的記述及附加圖面明確得知。 [用以解決課題之手段] This disclosure is to provide a technology for "improving the accuracy of inspection of bonding materials". Other topics and novel features can be clearly understood from the description and attached drawings of this manual. [Means for solving the problem]

若簡單地說明本揭示中代表性者的概要,則如下述般。 亦即,安裝裝置,係具備有:攝像裝置,朝向具有鏡面反射面的接合材料;照明裝置,具有被設置於前述接合材料之上方的光源;及控制裝置,被構成為改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料。 [發明之效果] If the representative outline of the present disclosure is briefly described, it is as follows. That is, the mounting device is provided with: a camera device facing a bonding material having a mirror-like reflective surface; a lighting device having a light source disposed above the bonding material; and a control device configured to change the irradiation position of the light source, and inspect the bonding material based on a plurality of images obtained by photographing the bonding material by the camera device. [Effect of the invention]

根據本揭示,可使接合材料之檢查的精度提升According to the present disclosure, the accuracy of inspection of bonding materials can be improved.

以下,使用圖面,說明關於實施形態。但是,在以下之說明中,有時對同一構成要素賦予相同符號並省略重複的說明。另外,為了使說明更為明確,與實際之形態相比,圖面,係有時示意地表示各部的寬度、厚度、形狀等,但其只不過為一例,並非限定本揭示之解釋。The following drawings are used to explain the implementation forms. However, in the following description, the same components are sometimes given the same symbols and repeated descriptions are omitted. In addition, in order to make the description clearer, the drawings sometimes schematically show the width, thickness, shape, etc. of each part compared to the actual form, but this is only an example and does not limit the interpretation of this disclosure.

使用圖1及圖2,說明關於作為安裝裝置之一態樣的實施形態中之晶粒接合器的構成。1 and 2, the structure of a die bonder in an embodiment as one aspect of a mounting device will be described.

接合裝置10,係大致具有:晶粒供給部1,供給安裝於基板S的晶粒D;拾取部2;中間平台部3;預成形部9;接合部4;搬送部5;基板供給部6;基板搬出部7;及控制部(控制裝置)8,監視並控制各部的動作。Y軸方向為晶粒接合器10的前後方向,X軸方向為左右方向。晶粒供給部1被配置於晶粒接合器10的前側,接合部4被配置於後側。在此,在基板S,係形成有成為最終一封裝的複數個製品區域(以下,稱為附接區域P)。例如,在基板S為引線框架的情況下,附接區域P,係具有載置晶粒D的突片。The bonding device 10 generally comprises: a die supply section 1 for supplying a die D mounted on a substrate S; a pick-up section 2; an intermediate platform section 3; a pre-forming section 9; a bonding section 4; a conveying section 5; a substrate supply section 6; a substrate unloading section 7; and a control section (control device) 8 for monitoring and controlling the operation of each section. The Y-axis direction is the front-rear direction of the die bonder 10, and the X-axis direction is the left-right direction. The die supply section 1 is arranged at the front side of the die bonder 10, and the bonding section 4 is arranged at the rear side. Here, a plurality of product areas (hereinafter referred to as attachment areas P) that become the final package are formed on the substrate S. For example, when the substrate S is a lead frame, the attachment area P has a protrusion for mounting the die D.

晶粒供給部1,係具有保持晶圓11的晶圓保持台12與以從晶圓11剝離晶粒D之虛線所示的剝離單元13。晶圓保持台12,係藉由未圖示的驅動手段,沿XY方向移動,將拾取之晶粒D移動至剝離單元13的位置。剝離單元13,係藉由未圖示的驅動手段,沿上下方向移動。晶圓11,係被接著於切割帶16上,並被分割成複數個晶粒D。貼附有晶圓11之切割帶16,係被保持於未圖示的晶圓環。The die supply unit 1 has a wafer holding table 12 for holding a wafer 11 and a stripping unit 13 indicated by a dotted line for stripping a die D from the wafer 11. The wafer holding table 12 is moved in the XY direction by a driving means not shown in the figure, and the picked-up die D is moved to the position of the stripping unit 13. The stripping unit 13 is moved in the up-down direction by a driving means not shown in the figure. The wafer 11 is attached to a dicing tape 16 and is divided into a plurality of die D. The dicing tape 16 attached to the wafer 11 is held by a wafer ring not shown in the figure.

拾取部2,係具有:拾取頭21;Y驅動部23;未圖示的各驅動部,使筒夾22升降、旋轉及X軸方向移動;及晶圓辨識攝影機24。拾取頭21,係具有「將被剝離之晶粒D吸附保持於前端」的筒夾22,從晶粒供給部1拾取晶粒D並載置於中間平台31。Y驅動部23,係使拾取頭21沿Y軸方向移動。晶圓辨識攝影機24,係掌握從晶圓11拾取之晶粒D的拾取位置。The pickup unit 2 has a pickup head 21, a Y drive unit 23, various drives not shown in the figure, which make the collet 22 rise and fall, rotate and move in the X-axis direction, and a wafer recognition camera 24. The pickup head 21 has a collet 22 that "adsorbs and holds the peeled grain D at the front end", picks up the grain D from the grain supply unit 1 and places it on the intermediate platform 31. The Y drive unit 23 moves the pickup head 21 along the Y-axis direction. The wafer recognition camera 24 grasps the pickup position of the grain D picked up from the wafer 11.

中間平台部3,係具有:中間平台31,暫時地載置晶粒D;及平台辨識攝影機32,用以識別中間平台31上的晶粒D。The intermediate platform portion 3 comprises: an intermediate platform 31 for temporarily placing the die D; and a platform identification camera 32 for identifying the die D on the intermediate platform 31 .

預成形部9,係具有注射器91、驅動部93、作為攝像裝置的預成形攝像機94及預成形平台96。注射器91,係將糊料塗佈於藉由搬送部5被搬送至預成形平台96的基板S。驅動部93,係使注射器91沿X軸方向、Y軸方向及上下方向移動。預成形攝像機94,係掌握注射器91的塗佈位置等。在將糊料塗佈於基板S時,使預成形平台96上升,從下方支撐基板S。預成形平台96,係具有用以真空吸附基板S的吸附孔(未圖示),可固定基板S。The preforming section 9 includes a syringe 91, a driving section 93, a preforming camera 94 as an imaging device, and a preforming platform 96. The syringe 91 applies the paste to the substrate S that is transported to the preforming platform 96 by the transport section 5. The driving section 93 moves the syringe 91 along the X-axis direction, the Y-axis direction, and the up-down direction. The preforming camera 94 grasps the application position of the syringe 91, etc. When the paste is applied to the substrate S, the preforming platform 96 is raised to support the substrate S from below. The preforming platform 96 has an adsorption hole (not shown) for vacuum adsorption of the substrate S, which can fix the substrate S.

接合部4,係具有:接合頭41;Y驅動部43;基板辨識攝像機44;及接合平台46。接合頭41,係與拾取頭21相同地,具有「將晶粒D吸附保持於前端」的筒夾42。Y驅動部43,係使接合頭41沿Y軸方向移動。基板辨識攝像機44,係拍攝基板S之附接區域P的位置辨識標記(未圖示),辨識接合位置。在晶粒D被載置於基板S時,使接合平台46上升,從下方支撐基板S。接合平台46,係具有用以真空吸附基板S的吸附孔(未圖示),可固定基板S。藉由像這樣的構成,接合頭41,係基於平台辨識攝影機32的影像資料,修正拾取位置・姿勢,從中間平台31拾取晶粒D。而且,接合頭41,係基於基板辨識攝像機44的影像資料,將晶粒D接合(載置並接著)於被搬送而來的基板S之塗佈有糊料的附接區域P上。The bonding section 4 includes: a bonding head 41; a Y drive section 43; a substrate recognition camera 44; and a bonding platform 46. The bonding head 41, like the pickup head 21, includes a clamp 42 for "adsorbing and holding the die D at the front end". The Y drive section 43 moves the bonding head 41 along the Y-axis direction. The substrate recognition camera 44 photographs the position recognition mark (not shown) of the attachment area P of the substrate S to identify the bonding position. When the die D is placed on the substrate S, the bonding platform 46 is raised to support the substrate S from below. The bonding platform 46 has a suction hole (not shown) for vacuum adsorption of the substrate S, which can fix the substrate S. With such a configuration, the bonding head 41 corrects the pickup position and posture based on the image data of the stage recognition camera 32 and picks up the die D from the intermediate stage 31. Furthermore, the bonding head 41 bonds (places and connects) the die D to the attachment area P on the substrate S that is conveyed and coated with the paste based on the image data of the substrate recognition camera 44.

搬送部5,係具有抓取並搬送基板S的基板搬送爪51與作為基板S移動之搬送路徑的搬送道52。基板S,係藉由「以沿著搬送道52而設置之未圖示的滾珠螺桿,驅動被設置於搬送道52的基板搬送爪51之未圖示的螺帽」的方式進行移動。藉由像這樣的構成,基板S,係從基板供給部6沿著搬送道52經由塗佈位置移動至接合位置,在接合後,移動至基板搬出部7,將基板S收授至基板搬出部7。The conveying section 5 has a substrate conveying claw 51 for grabbing and conveying the substrate S and a conveying path 52 as a conveying path for the substrate S to move. The substrate S is moved by "a ball screw (not shown) provided along the conveying path 52 drives a nut (not shown) of the substrate conveying claw 51 provided on the conveying path 52". With such a structure, the substrate S is moved from the substrate supply section 6 along the conveying path 52 through the coating position to the bonding position, and after bonding, is moved to the substrate carrying section 7, and the substrate S is received and delivered to the substrate carrying section 7.

使用圖3,說明關於晶粒接合器10的控制系統。The control system of the die bonder 10 will be described using FIG. 3 .

控制系統80,係具備有:控制部8;驅動部86;信號部87;及光學系統88。控制部8,係大致具有:控制・演算裝置81,主要由CPU(Central Processing Unit)所構成;記憶裝置82;輸入輸出裝置83;匯流排線84;及電源部85。記憶裝置82,係具有:主記憶裝置82a,由記憶有處理程式等的RAM(Random Access Memory)等所構成;及補助記憶裝置82b,由記憶有控制所需的控制資料或圖像資料等的HDD(Hard Disk Drive)所構成。輸入輸出裝置83,係具有:顯示器83a,顯示裝置狀態或資訊等;觸控面板83b,輸入操作員的指示;滑鼠83c,操作顯示器;及圖像擷取裝置83d,擷取來自光學系統88的圖像資料。又,輸入輸出裝置83,係具有:驅動部86;馬達控制裝置83e,控制驅動部86;及I/O信號控制裝置83f,從信號部87擷取或控制信號。The control system 80 includes: a control unit 8; a drive unit 86; a signal unit 87; and an optical system 88. The control unit 8 generally includes: a control and calculation device 81, which is mainly composed of a CPU (Central Processing Unit); a memory device 82; an input and output device 83; a bus 84; and a power supply unit 85. The memory device 82 includes: a main memory device 82a, which is composed of a RAM (Random Access Memory) storing a processing program, etc.; and an auxiliary memory device 82b, which is composed of a HDD (Hard Disk Drive) storing control data or image data required for control. The input-output device 83 includes: a display 83a for displaying device status or information, etc.; a touch panel 83b for inputting operator instructions; a mouse 83c for operating the display; and an image capture device 83d for capturing image data from an optical system 88. In addition, the input-output device 83 includes: a driver 86; a motor control device 83e for controlling the driver 86; and an I/O signal control device 83f for capturing or controlling signals from a signal unit 87.

在驅動部86,係包含晶粒供給部1的XY平台(未圖示)、圖1所示之拾取頭21的ZY驅動軸即Y驅動部23、注射器91的ZY驅動軸即驅動部93及接合頭41之ZY驅動軸即Y驅動部43等。在信號部87,係包含控制各種感測器信號或照明裝置等的亮度之開關或量(Volume)等。在光學系統88,係包含圖1或圖2所示的晶圓辨識攝影機24、預成形攝像機94、平台辨識攝影機32、基板辨識攝像機44。控制・演算裝置81,係經由匯流排線84,擷取所需的資料而進行演算,將資訊發送至接合頭41等的控制或顯示器83a等。The drive unit 86 includes the XY stage (not shown) of the die supply unit 1, the ZY drive axis of the pickup head 21 shown in FIG. 1, namely the Y drive unit 23, the ZY drive axis of the injector 91, namely the drive unit 93, and the ZY drive axis of the bonding head 41, namely the Y drive unit 43. The signal unit 87 includes switches or volumes for controlling the brightness of various sensor signals or lighting devices. The optical system 88 includes the wafer recognition camera 24, the preform camera 94, the stage recognition camera 32, and the substrate recognition camera 44 shown in FIG. 1 or FIG. 2. The control and calculation device 81 acquires necessary data via the bus 84 and performs calculations, and transmits the information to the control or display 83a of the bonding head 41 and the like.

控制部8,係經由圖像擷取裝置83d,將由光學系統88拍攝到的圖像資料保存於記憶裝置82。藉由基於經保存之圖像資料而程式化的軟體,使用控制・演算裝置81,進行晶粒D及基板S的定位、膏狀接著劑之塗佈圖案的檢查以及晶粒D及基板S的表面檢查。基於控制・演算裝置81算出的晶粒D及基板S的位置,藉由軟體,經由馬達控制裝置83e使驅動部86動作。藉由該製程,進行晶圓11上之晶粒D的定位,並以晶粒供給部1及接合部4的驅動部使其動作,將晶粒D接合於基板S上。光學系統88中使用的辨識攝影機,係將光強度或顏色數值化。The control unit 8 stores the image data captured by the optical system 88 in the memory device 82 via the image capture device 83d. The control and calculation device 81 is used to perform positioning of the die D and the substrate S, inspection of the coating pattern of the paste adhesive, and surface inspection of the die D and the substrate S using software programmed based on the stored image data. Based on the positions of the die D and the substrate S calculated by the control and calculation device 81, the software is used to operate the drive unit 86 via the motor control device 83e. Through this process, the die D on the wafer 11 is positioned, and the die supply unit 1 and the drive unit of the bonding unit 4 are operated to bond the die D to the substrate S. The recognition camera used in the optical system 88 digitizes light intensity or color.

使用圖4,說明關於使用了晶粒接合器10的半導體裝置之製造工程的一工程即接合工程(半導體裝置之製造方法)。在以下之說明中,構成晶粒接合器10之各部的動作,係藉由控制部8予以控制。4 , a bonding process (a method for manufacturing a semiconductor device) which is one of the processes for manufacturing a semiconductor device using the die bonder 10 will be described. In the following description, the operation of each unit constituting the die bonder 10 is controlled by the control unit 8 .

(晶圓搬入工程(工程S1)) 晶圓環(未圖示)被搬入至晶粒接合器10。所搬入的晶圓環被供給至晶粒供給部1。在此,切割帶16被保持於晶圓環,該切割帶16,係貼附有從晶圓11分割的晶粒D。 (Wafer loading process (process S1)) The wafer ring (not shown) is loaded into the die bonder 10. The loaded wafer ring is supplied to the die supply unit 1. Here, the dicing tape 16 is held on the wafer ring, and the dicing tape 16 is attached with the die D separated from the wafer 11.

(基板搬入工程(工程S2)) 儲存有基板S的倉匣(未圖示)被搬入至晶粒接合器10。所搬入之倉匣,係被供給至基板供給部6。以基板供給部6,基板S被固定於基板搬送爪51。 (Substrate loading process (process S2)) The cassette (not shown) storing the substrate S is loaded into the die bonder 10. The loaded cassette is supplied to the substrate supply unit 6. The substrate S is fixed to the substrate transfer claw 51 by the substrate supply unit 6.

(拾取工程(工程S3)) 在工程S1後,以可從切割帶16拾取所期望之晶粒D的方式,移動晶圓保持台12。藉由晶圓辨識攝影機24拍攝晶粒D,基於藉由拍攝所取得的圖像資料,進行晶粒D之定位及表面檢查。 (Pick-up process (process S3)) After process S1, the wafer holding table 12 is moved in a manner that the desired die D can be picked up from the dicing tape 16. The die D is photographed by the wafer recognition camera 24, and the positioning and surface inspection of the die D are performed based on the image data obtained by the photographing.

經定位之晶粒D,係藉由剝離單元13及拾取頭21,從切割帶16被剝離。從切割帶16被剝離之晶粒D,係被吸附、保持於筒夾22並被搬送於中間平台31而載置,該筒夾22,係被設置於拾取頭21。The positioned die D is peeled off from the dicing tape 16 by the peeling unit 13 and the pickup head 21. The die D peeled off from the dicing tape 16 is sucked and held by the collet 22 disposed on the pickup head 21 and is transported to the intermediate platform 31 for placement.

藉由平台辨識攝影機32拍攝中間平台31之上的晶粒D,基於藉由拍攝所取得的圖像資料,進行晶粒D之定位及表面檢查。藉由對圖像資料進行圖像處理的方式,算出中間平台31上的晶粒D相對於晶粒接合器10之晶粒位置基準點的偏移量(X、Y、θ方向),進行定位。另外,晶粒位置基準點,係預先將中間平台31之預定位置保持為裝置的初始設定。藉由對圖像資料進行圖像處理的方式,進行晶粒D之表面檢查。The die D on the intermediate platform 31 is photographed by the platform recognition camera 32, and the positioning and surface inspection of the die D are performed based on the image data obtained by the photographing. The offset (X, Y, θ directions) of the die D on the intermediate platform 31 relative to the die position reference point of the die bonder 10 is calculated by image processing, and the positioning is performed. In addition, the die position reference point is the predetermined position of the intermediate platform 31 that is maintained as the initial setting of the device. The surface inspection of the die D is performed by image processing of the image data.

將晶粒D搬送至中間平台31之拾取頭21,係返回到晶粒供給部1。依照上述順序,下一個晶粒D從切割帶16被剝離,以後依照相同的順序,晶粒D逐一地從切割帶16被剝離。The pick-up head 21 that transports the die D to the intermediate platform 31 returns to the die supply unit 1. According to the above sequence, the next die D is peeled off from the dicing tape 16, and thereafter, the die D is peeled off from the dicing tape 16 one by one according to the same sequence.

(預成形工程(工程S4)) 在S2工程後,藉由搬送部5,基板S被搬送至預成形平台96。藉由預成形攝像機94,拍攝塗佈前之基板S的表面,基於藉由拍攝所取得的圖像資料,確認應塗佈糊料的面。若應塗佈糊料的面沒有問題,則確認藉由預成形平台96所支撐的基板S之塗佈糊料的位置而予以定位。定位,係與接合部4相同地,以圖形匹配等來進行。 (Preforming process (process S4)) After process S2, the substrate S is conveyed to the preforming platform 96 by the conveying unit 5. The surface of the substrate S before coating is photographed by the preforming camera 94, and the surface to be coated with the paste is confirmed based on the image data obtained by the photographing. If there is no problem with the surface to be coated with the paste, the position of the substrate S supported by the preforming platform 96 to coat the paste is confirmed and positioned. Positioning is performed by pattern matching, etc., in the same way as the joint unit 4.

糊料從注射器91之前端的噴嘴被射出,依照噴嘴的軌跡予以塗佈。藉由驅動部93,噴嘴依所欲塗佈的形狀被驅動於XYZ軸,藉由噴嘴之軌跡來描繪×記號形狀或十字形狀等自由的軌跡而予以塗佈(描繪)。另外,在注射器91之前端,係除了噴嘴以外,亦可設置模板頭。The paste is ejected from the nozzle at the front end of the syringe 91 and applied according to the trajectory of the nozzle. The nozzle is driven on the XYZ axis according to the shape to be applied by the drive unit 93, and the nozzle trajectory is used to draw a free trajectory such as an x mark shape or a cross shape to apply (draw). In addition, at the front end of the syringe 91, in addition to the nozzle, a template head can also be set.

藉由預成形攝像機94拍攝所塗佈的糊料。基於藉由拍攝所取得的圖像,確認糊料是否被正確地塗佈,進行所塗佈的糊料之檢查(外觀檢查)。亦即,在外觀檢查中,係確認所塗佈的糊料是否以預定形狀且僅以預定量被塗佈於預定位置。檢查內容,係例如糊料的有無、塗佈面積、塗佈形狀(不足、溢出)等。檢查,係除了以二值化處理,在將糊料之區域分離後計數像素數的方法以外,以基於差分的比較、比較基於圖形匹配之分數(score)的方法、基於輪廓擷取的形狀判定等來進行。The applied paste is photographed by the pre-forming camera 94. Based on the image obtained by the photographing, it is confirmed whether the paste is applied correctly, and the applied paste is inspected (appearance inspection). That is, in the appearance inspection, it is confirmed whether the applied paste is applied in a predetermined shape and only in a predetermined amount at a predetermined position. The inspection content includes, for example, the presence or absence of paste, the coating area, the coating shape (insufficient, overflow), etc. The inspection is performed by a method of counting the number of pixels after separating the paste area by binarization, a method of comparing the difference, a method of comparing the scores based on pattern matching, and a shape determination based on contour extraction.

(接合工程(工程S5)) 若塗佈沒有問題,則藉由搬送部5,基板S被搬送至接合平台46。藉由基板辨識攝像機44拍攝被載置於接合平台46上的基板S,並藉由拍攝取得圖像資料。藉由對圖像資料進行圖像處理的方式,算出基板S相對於晶粒接合器10之基板位置基準點的偏移量(X、Y、θ方向)。另外,基板位置基準點,係預先將接合部4之預定位置保持為裝置的初始設定。 (Joining process (process S5)) If there is no problem with coating, the substrate S is transported to the joining platform 46 by the transport unit 5. The substrate S placed on the joining platform 46 is photographed by the substrate recognition camera 44, and image data is obtained by photographing. By performing image processing on the image data, the offset (X, Y, θ direction) of the substrate S relative to the substrate position reference point of the die bonder 10 is calculated. In addition, the substrate position reference point is the initial setting of the device by pre-setting the predetermined position of the joining unit 4.

從工程S3中所算出的中間平台31上之晶粒D的偏移量來修正接合頭41的吸附位置,藉由筒夾42吸附晶粒D。藉由從中間平台31吸附了晶粒D的接合頭41,晶粒D被接合於接合平台46所支撐的基板S之預定部位。藉由基板辨識攝像機44拍攝被接合於基板S的晶粒D,基於藉由拍攝所取得的圖像資料,進行晶粒D是否被接合於所期望之位置等的檢查。The absorption position of the bonding head 41 is corrected based on the offset of the die D on the intermediate platform 31 calculated in step S3, and the die D is absorbed by the collet 42. The die D is bonded to a predetermined position of the substrate S supported by the bonding platform 46 by the bonding head 41 that absorbs the die D from the intermediate platform 31. The die D bonded to the substrate S is photographed by the substrate recognition camera 44, and based on the image data obtained by the photographing, it is checked whether the die D is bonded to the desired position.

將晶粒D接合於基板S之接合頭41,係返回到中間平台31。依照上述順序,下一個晶粒D從中間平台31被拾取並接合於基板S。重覆進行上述步驟,晶粒D被接合於基板S之所有的附接區域P。The bonding head 41 that has bonded the die D to the substrate S returns to the intermediate platform 31. According to the above sequence, the next die D is picked up from the intermediate platform 31 and bonded to the substrate S. The above steps are repeated until the die D is bonded to all the attachment areas P of the substrate S.

(基板搬出工程(工程S6)) 接合有晶粒D的基板S被搬送至基板搬出部7。以基板搬出部7,接合有晶粒D的基板S從基板搬送爪51被取下並儲存於倉匣。從晶粒接合器10搬出儲存有基板S的倉匣。 (Substrate unloading process (process S6)) The substrate S with the die D bonded thereto is transported to the substrate unloading unit 7. The substrate S with the die D bonded thereto is removed from the substrate transport claw 51 by the substrate unloading unit 7 and stored in the cassette. The cassette storing the substrate S is unloaded from the die bonder 10.

如上述般,晶粒D,係被安裝於基板S上,並從晶粒接合器10被搬出。安裝有晶粒D的基板S被搬送至引線接合工程,晶粒D之電極,係經由Au引線等與基板S的電極電性連接。基板S被搬送至壓模工程,晶粒D與Au引線被壓模樹脂(未圖示)密封,藉此,封裝便完成。As described above, the die D is mounted on the substrate S and removed from the die bonder 10. The substrate S with the die D mounted thereon is transported to the wire bonding process, where the electrode of the die D is electrically connected to the electrode of the substrate S via the Au wire or the like. The substrate S is transported to the molding process, where the die D and the Au wire are sealed with a molding resin (not shown), thereby completing the packaging.

使用圖5,說明關於在藉由預成形攝像機94拍攝糊料PA時所使用的照明裝置。The lighting device used when photographing the paste PA by the preform camera 94 will be described using FIG. 5 .

預成形攝像機94,係被設置於經塗佈在基板S之糊料PA的上方。照明裝置95,係被設置於預成形攝像機94的下方且糊料PA的上方。預成形攝像機94、照明裝置95及控制部8,係構成接合材料量的檢查裝置。The preform camera 94 is disposed above the paste PA applied on the substrate S. The lighting device 95 is disposed below the preform camera 94 and above the paste PA. The preform camera 94, the lighting device 95 and the control unit 8 constitute a device for inspecting the amount of bonding material.

預成形攝像機94,係較佳為由使用了可高速傳送之CMOS(Complementary Metal Oxide Semiconductor)圖像感測器的攝像機(CMOS攝影機)所構成。預成形攝像機94,係更佳為由高感度的背面照射型CMOS攝像機所構成。另外,本實施形態中之預成形攝像機94,係不限定於CMOS攝影機,例如亦可為使用了CCD(Charge Coupled Devices)圖像感測器的攝像機。The pre-forming camera 94 is preferably a camera (CMOS camera) using a CMOS (Complementary Metal Oxide Semiconductor) image sensor capable of high-speed transmission. The pre-forming camera 94 is more preferably a high-sensitivity back-illuminated CMOS camera. In addition, the pre-forming camera 94 in this embodiment is not limited to a CMOS camera, and may be a camera using a CCD (Charge Coupled Devices) image sensor, for example.

照明裝置95,係被構成為將複數個光源95a~ 95l配置成圓頂(半球狀的球殼)狀。藉此,進行光源的多點化。各光源95a~95l,係可個別地進行亮燈及熄燈。The lighting device 95 is configured by arranging a plurality of light sources 95a to 95l in a dome (hemispherical shell) shape. In this way, the light source is multi-pointed. Each light source 95a to 95l can be turned on and off individually.

來自光源95e~95h之照射光向糊料PA的入射角(相對於預成形攝像機94之光學軸的角度),係比來自光源95a~95d之照射光向糊料PA的入射角小。來自光源95i~ 95l之照射光的入射角,係比來自光源95e~95h之照射光向糊料PA的入射角小。例如光源95a~95d,係被配置於同一水平面內。光源95e~95h,係被配置於比光源95a~95d更上方的同一水平面內。光源95i~95l,係被配置於比光源95e~ 95h更上方的同一水平面內。The incident angle of the irradiation light from the light sources 95e~95h to the paste PA (the angle relative to the optical axis of the preform camera 94) is smaller than the incident angle of the irradiation light from the light sources 95a~95d to the paste PA. The incident angle of the irradiation light from the light sources 95i~95l is smaller than the incident angle of the irradiation light from the light sources 95e~95h to the paste PA. For example, the light sources 95a~95d are arranged in the same horizontal plane. The light sources 95e~95h are arranged in the same horizontal plane above the light sources 95a~95d. The light sources 95i~95l are arranged in the same horizontal plane above the light sources 95e~95h.

光源95a~95l之各者,係點光源。光源95a~ 95l之各者,係例如由直徑1mm左右以下,較佳為數百μm左右之光纖所輸出的LED(Light Emitting Diode)光源。又,照明裝置95,係例如亦可為「在圓頂內面設置複數個由LED(Light Emitting Diode)所構成的光源而構成」的圓頂照明。在該情況下,藉由個別地關閉/開啟LED的方式,改變照明光之發光位置。另外,光源之多點化,係亦可藉由移動一個或複數個光源的方式來進行。例如,在移動複數個光源的情況下,照明裝置95,係被構成為具備有光源95a、95e、95i,光源95a、95e、95i分別在同一平面內移動。Each of the light sources 95a to 95l is a point light source. Each of the light sources 95a to 95l is, for example, an LED (Light Emitting Diode) light source output by an optical fiber having a diameter of about 1 mm or less, preferably about several hundred μm. In addition, the lighting device 95 may be, for example, a dome lighting device that "arranges a plurality of light sources composed of LEDs (Light Emitting Diodes) inside a dome". In this case, the light emitting position of the lighting light is changed by turning off/on the LEDs individually. In addition, the multi-point light source may also be achieved by moving one or more light sources. For example, in the case of moving a plurality of light sources, the lighting device 95 is configured to include light sources 95a, 95e, and 95i, and the light sources 95a, 95e, and 95i move within the same plane.

控制部8,係取得來自照明裝置95的各光源之照射光直接反射的位置(直射光的反射位置),並從取得的直射光之反射位置測定液體面即糊料PA的形狀。在直射光之反射位置,係形成有亮點。光源的個數越多,越能以高解析度進行測定。The control unit 8 obtains the position where the irradiated light from each light source of the lighting device 95 is directly reflected (the reflection position of the direct light), and measures the shape of the liquid surface, i.e., the paste PA, from the obtained reflection position of the direct light. Bright spots are formed at the reflection positions of the direct light. The more light sources there are, the higher the resolution can be measured.

使用圖6(a)、圖6(b)、圖6(c)、圖7(a)、圖7(b)、圖8及圖9,說明關於糊料PA之形狀測定的方法。A method for measuring the shape of paste PA will be described using FIGS. 6( a ), 6( b ), 6( c ), 7( a ), 7( b ), 8 , and 9 .

(拍攝) 在圖6(a),係表示僅光源95a呈亮燈時的圖像,圖6(b),係表示僅光源95b呈亮燈時的圖像,在圖6(c),係表示僅光源95c呈亮燈時的圖像。 (Photographed) Figure 6(a) shows an image when only light source 95a is on, Figure 6(b) shows an image when only light source 95b is on, and Figure 6(c) shows an image when only light source 95c is on.

如圖6(a)~圖6(c)所示般,控制部8,係使光源95a、95b、95c逐個亮燈,藉由預成形攝像機94,針對每個光源拍攝在糊料PA之表面直接反射而形成的亮點BS1、BS2、BS3。針對光源95d~95l亦逐個亮燈,拍攝糊料PA。在此,在圖面中,糊料PA,係表示為黑色,亮點BS1、BS2、BS3,係表示為白色。As shown in Fig. 6 (a) to Fig. 6 (c), the control unit 8 turns on the light sources 95a, 95b, and 95c one by one, and uses the pre-forming camera 94 to photograph the bright spots BS1, BS2, and BS3 formed by direct reflection on the surface of the paste PA for each light source. The light sources 95d to 951 are also turned on one by one to photograph the paste PA. In the figure, the paste PA is shown in black, and the bright spots BS1, BS2, and BS3 are shown in white.

(亮點中心之算出) 如圖6(a)~圖6(c)所示般,由於亮點BS1、BS2、BS3,係並非點而是橢圓形狀等之具有廣度的形狀,因此,控制部8,係在各圖像中,算出亮點的中心(亮點中心)。將算出的亮點中心作為亮點位置。關於亮點中心之決定方法,係除了簡單的區域中心(上下或左右之極限點的中心)以外,亦可為配合形狀之變形狀況的重心、最大光度點、最大內切圓的中心點等。 (Calculation of bright spot center) As shown in Fig. 6(a) to Fig. 6(c), since bright spots BS1, BS2, and BS3 are not points but shapes with width such as ellipses, the control unit 8 calculates the center of the bright spot (bright spot center) in each image. The calculated bright spot center is used as the bright spot position. Regarding the method of determining the bright spot center, in addition to the simple regional center (the center of the upper and lower or left and right extreme points), it can also be the center of gravity of the deformation state of the shape, the maximum luminosity point, the center point of the maximum inscribed circle, etc.

另外,以使亮點儘可能接近點的方式,光源之發光面面積,係期望儘可能小。換言之,從形成有亮點之直射光的反射位置觀看,光源之視角,係期望儘可能小。又,光源,係期望儘可能明亮。亮點中心之算出,係並非在每次拍攝時進行,亦可在所有的拍攝後統一進行。In addition, the area of the light emitting surface of the light source is preferably as small as possible so that the bright spot is as close to a point as possible. In other words, the viewing angle of the light source is preferably as small as possible when viewed from the reflection position of the direct light that forms the bright spot. In addition, the light source is preferably as bright as possible. The calculation of the bright spot center is not performed every time shooting, but can be performed uniformly after all shooting.

(糊料之形狀算出) 控制部8,係從算出的二維圖像內之亮點中心(亮點位置)算出三維空間上的反射點,得到糊料的形狀。為了不使說明變得複雜,以下,說明關於光源位於X軸上的例子。 (Calculation of paste shape) The control unit 8 calculates the reflection point in three-dimensional space from the bright spot center (bright spot position) in the calculated two-dimensional image to obtain the shape of the paste. In order not to complicate the explanation, the following is an example of the light source being located on the X-axis.

使用圖7(a)及圖7(b),說明關於形成有亮點的反射面之角度的算出方法。A method for calculating the angle of the reflecting surface on which the bright spot is formed will be described using FIG. 7( a ) and FIG. 7( b ).

預成形攝像機94,係位於充分遠離糊料PA的位置,使得從糊料PA觀看,可視為預成形攝像機94始終位於相同方向。換言之,預成形攝像機94與糊料PA之間的距離(拍攝距離),係相對於糊料PA的大小而言足夠大。例如攝影距離,係100mm左右,糊料寬度,係0.3~ 10mm左右。在圖7(a)中,係為了方便起見,雖設為預成形攝像機94位於糊料PA的正上方,但預成形攝像機94之方向亦可不一定為糊料PA的正上方。只要在拍攝對象的糊料整個區域可近似為位於固定方向即可。The preforming camera 94 is located far enough away from the paste PA so that the preforming camera 94 is always in the same direction when viewed from the paste PA. In other words, the distance between the preforming camera 94 and the paste PA (shooting distance) is large enough relative to the size of the paste PA. For example, the shooting distance is about 100 mm, and the paste width is about 0.3 to 10 mm. In FIG. 7 (a), for the sake of convenience, although the preforming camera 94 is located directly above the paste PA, the direction of the preforming camera 94 does not necessarily have to be directly above the paste PA. As long as the entire area of the paste to be photographed can be approximately located in a fixed direction, it will be sufficient.

將圖5所示的光源95a~95l之一作為光源LS而進行說明。光源LS,係具有點光源,由於距糊料PA的距離足夠長,故被視為平行光源。來自光源LS之照射光,係朝向基板S的表面中之預成形攝像機94的視野之中心O。光源LS距視野中心O的位置及預成形攝像機94之位置為已知。由於光源LS為平行光,故照射光的行進方向為已知。又,糊料PA中之反射光的行進方向,係垂直方向且為已知。亦即,「以中心O為起點、以光源LS之位置為終點」的向量與「以中心O為起點、以預成形攝像機94之位置為終點」的向量為已知。因此,由於光源LS之照射光與反射光所成的角度(θ),係兩個向量所成的角度,故可予以算出。One of the light sources 95a~95l shown in Figure 5 is described as the light source LS. The light source LS is a point light source, and because it is sufficiently far away from the paste PA, it is regarded as a parallel light source. The irradiation light from the light source LS is directed toward the center O of the field of view of the preformed camera 94 on the surface of the substrate S. The position of the light source LS from the field of view center O and the position of the preformed camera 94 are known. Since the light source LS is a parallel light, the direction of travel of the irradiation light is known. In addition, the direction of travel of the reflected light in the paste PA is a vertical direction and is known. That is, the vector "starting from the center O and ending at the position of the light source LS" and the vector "starting from the center O and ending at the position of the preformed camera 94" are known. Therefore, since the angle (θ) formed by the irradiation light and the reflected light of the light source LS is the angle formed by the two vectors, it can be calculated.

當將藉由光源LS形成亮點BS之反射面的角度(反射面之法線方向)設為φ時,則可藉由反射定律,從θ予以算出。亦即,φ=θ/2。所算出的φ,係與垂直方向所成的角度,並且為反射面之切線TD的方向(接觸面方向)與X方向(水平面)所成的角度(切線TD的斜率)。When the angle of the reflection surface (normal direction of the reflection surface) that forms the bright spot BS by the light source LS is set to φ, it can be calculated from θ by the law of reflection. That is, φ=θ/2. The calculated φ is the angle formed with the vertical direction, and is the angle formed by the direction of the tangent TD of the reflection surface (contact surface direction) and the X direction (horizontal plane) (the slope of the tangent TD).

如圖7(b)所示般,當將預成形攝像機94之視野CV的中心O距藉由光源LS所形成之亮點BS的亮點位置設為X BS時,則可從藉由預成形攝像機94所拍攝到的圖像算出X BSAs shown in FIG. 7( b ), when the distance from the center O of the field of view CV of the pre-forming camera 94 to the bright spot BS formed by the light source LS is set as X BS , X BS can be calculated from the image captured by the pre-forming camera 94 .

其次,使用圖8及圖9,說明關於亮點的Z方向之位置(Z位置、高度)的算出方法。Next, a method for calculating the position of a bright spot in the Z direction (Z position, height) will be described using FIG. 8 and FIG. 9 .

如圖8所示般,說明關於形成四個亮點BSa、BSb、BSc、BSd的情形。將預成形攝像機94之視野CV的中心O距四個亮點BSa、BSb、BSc、BSd的亮點位置設為Xa、Xb、Xc、Xd。As shown in Fig. 8, the formation of four bright spots BSa, BSb, BSc, and BSd is described. The bright spot positions of the four bright spots BSa, BSb, BSc, and BSd from the center O of the field of view CV of the pre-forming camera 94 are denoted by Xa, Xb, Xc, and Xd.

如圖9所示般,將形成亮點BSa的位置及形成亮點BSa之反射面的切線TDa配置於X軸上。相同地,將形成亮點BSb的位置及形成亮點BSb之反射面的切線TDb配置於X軸上,將形成亮點BSc的位置及形成亮點BSc之反射面的切線TDc配置於X軸上,將形成亮點BSd的位置及形成亮點BSd之反射面的切線TDd配置於X軸上。在此,將切線TDa、TDb、TDc、TDd的斜率分別設為φa、φb、φc、φd時,則φa<φb<φc<φd。通常,糊料,係隨著遠離中心或中心線,表面相對於基板的傾斜變大。As shown in FIG. 9 , the position where bright spot BSa is formed and the tangent line TDa of the reflection surface forming bright spot BSa are arranged on the X-axis. Similarly, the position where bright spot BSb is formed and the tangent line TDb of the reflection surface forming bright spot BSb are arranged on the X-axis, the position where bright spot BSc is formed and the tangent line TDc of the reflection surface forming bright spot BSc are arranged on the X-axis, and the position where bright spot BSd is formed and the tangent line TDd of the reflection surface forming bright spot BSd are arranged on the X-axis. Here, when the slopes of the tangent lines TDa, TDb, TDc, and TDd are set to φa, φb, φc, and φd, respectively, φa<φb<φc<φd. In general, the inclination of the surface of the paste relative to the substrate increases as it is farther away from the center or the center line.

以鄰接的亮點BSa、BSb之兩條切線TDa、TDb的交點IPa位於兩個亮點BSa、BSb之中間點CPa的方式,配置亮點BSa、BSb及切線TDa、TDb的Z位置。在此,中間點CPa,係位於距視野中心O|Xa+(Xb-Xa)/2|的距離。The Z positions of the bright points BSa, BSb and the tangent lines TDa, TDb are arranged in such a way that the intersection IPa of the two tangent lines TDa, TDb of the adjacent bright points BSa, BSb is located at the middle point CPa of the two bright points BSa, BSb. Here, the middle point CPa is located at a distance of O|Xa+(Xb-Xa)/2| from the center of the field of view.

以兩條切線TDb、TDc的交點IPb位於兩個亮點BSb、BSc之中間點CPb的方式,配置亮點BSb、BSc及切線TDb、TDc的Z位置。在此,中間點CPb,係位於距視野中心O|Xb+(Xc-Xb)/2|的距離。The Z positions of the bright points BSb, BSc and the tangent lines TDb, TDc are arranged so that the intersection point IPb of the two tangent lines TDb, TDc is located at the middle point CPb of the two bright points BSb, BSc. Here, the middle point CPb is located at a distance of O|Xb+(Xc-Xb)/2| from the center of the field of view.

以兩條切線TDc、TDd的交點IPc位於兩個亮點BSc、BSd之中間點CPc的方式,配置亮點BSc、BSd及切線TDc、TDd的Z位置。在此,中間點CPc,係位於距視野中心O|Xc+(Xd-Xc)/2|的距離。The Z positions of the bright points BSc, BSd and the tangent lines TDc, TDd are arranged so that the intersection point IPc of the two tangent lines TDc, TDd is located at the middle point CPc of the two bright points BSc, BSd. Here, the middle point CPc is located at a distance of O|Xc+(Xd-Xc)/2| from the center of the field of view.

藉此,由於可決定交點IPa~IPc及亮點BSa~ BSd的Z位置,因此,可從連結各個交點IPa~IPc及亮點BSa~BSd之多角形近似地算出糊料的形狀(體積)。另外,上述之內插方法為一例,例如亦可使用樣條內插或拉格朗日內插等的其他方法。In this way, since the Z positions of the intersection points IPa~IPc and the bright points BSa~BSd can be determined, the shape (volume) of the paste can be approximately calculated from the polygon connecting the intersection points IPa~IPc and the bright points BSa~BSd. In addition, the above interpolation method is an example, and other methods such as spline interpolation or Lagrange interpolation can also be used.

最外側之亮點的Z位值,係可成為各亮點整體的偏移值。作為晶粒接合器,係由於只要可進行相對量的監視即可,因此,例如如圖8所示般,亦可將最外側之亮點BSd的Z位值設為0,或亦可將Z位值設為0以外的預定值。亦即,最外側之亮點的Z位值,係暫時決定即可。又,亦可將糊料之邊界點的反射面暫時決定為固定角度(垂直或接近垂直的值等)。The Z position value of the bright spot on the outermost side can be the offset value of all bright spots. As a die bonder, since it is sufficient to monitor the relative amount, the Z position value of the bright spot BSd on the outermost side can be set to 0, or the Z position value can be set to a predetermined value other than 0, as shown in FIG8 . That is, the Z position value of the bright spot on the outermost side can be temporarily determined. In addition, the reflection surface of the boundary point of the paste can be temporarily determined to be a fixed angle (vertical or nearly vertical value, etc.).

亦可使光源LS沿接近包含基板表面之水平面的方向移動,檢索亮點與糊料輪廓面接觸(可拍攝亮點之最大的φ)的位置。藉此,由於可將最外側之亮點的高度近似為0,因此,可進行糊料的絕對量測定。The light source LS can also be moved in a direction close to the horizontal plane including the substrate surface to search for the position where the bright spot contacts the paste contour surface (the bright spot with the largest φ can be photographed). In this way, the height of the outermost bright spot can be approximated to 0, so the absolute amount of the paste can be measured.

為了更明確本實施形態,說明關於若干個比較例。In order to further clarify the present embodiment, several comparative examples are described.

(第一比較例) 使用圖10(a)、圖10(b)及圖10(c),說明關於第一比較例。 (First Comparative Example) The first comparative example is described using Figures 10(a), 10(b), and 10(c).

在圖5所示的照明裝置中,考慮使光源95a~ 95l全部亮燈而形成複數個亮點。將此稱為第一比較例。在第一比較例中,係如圖10(a)所示般,可預先大概預測各光源之反射位置即亮點的情形為佳。在此,亮點BS1,係藉由光源95a所形成的亮點,亮點BS2,係藉由光源95b所形成的亮點,亮點BS3,係藉由光源95c所形成的亮點,亮點BS4,係藉由光源95d所形成的亮點。In the lighting device shown in FIG5 , it is considered that all light sources 95a to 951 are turned on to form a plurality of bright spots. This is referred to as the first comparative example. In the first comparative example, as shown in FIG10( a ), it is preferred that the reflection position of each light source, i.e., the bright spot, can be roughly predicted in advance. Here, bright spot BS1 is a bright spot formed by light source 95a, bright spot BS2 is a bright spot formed by light source 95b, bright spot BS3 is a bright spot formed by light source 95c, and bright spot BS4 is a bright spot formed by light source 95d.

但是,如圖10(b)所示般,在欲進行測定的被攝體之形狀不穩定的情況下,係表示為白色之亮點的位置無規則性(與光源的相關性),難以判定哪個亮點相當於哪個光源而無法進行測定。However, as shown in FIG. 10( b ), when the shape of the subject to be measured is unstable, the positions of the bright spots represented by white are irregular (related to the light source), making it difficult to determine which bright spot corresponds to which light source, and measurement cannot be performed.

又,如圖10(c)所示般,在糊料之形狀複雜的情況下,對於一個光源而產生的亮點並不限於一個,光源之多點化,係更難以判別光源與亮點的組合。Furthermore, as shown in FIG. 10( c ), when the shape of the paste is complex, the bright spot generated by one light source is not limited to one, and the multi-point light source makes it more difficult to distinguish the combination of the light source and the bright spot.

在實施形態中,係個別地進行各光源之亮燈並每次進行拍攝,藉此,可保持光源與亮點的相關性。In the implementation form, each light source is turned on individually and photographed each time, thereby maintaining the correlation between the light source and the bright spot.

(第二比較例) 為了解決第一比較例的上述問題,考慮藉由「改變每個光源的波長,設置可進行顏色識別之攝像機」的方式,確保光源與亮點的相關性。將此稱為第二比較例。由於第二比較例,係對於以顏色進行區別時之顏色的數量存在限制,因此,導致多點化光源的點數有上限。又,在第二比較例中,係受到被攝體之分光反射特性(反射光譜)的影響,從而存在有根據帶色之液體的顏色而無法使用的情形。 (Second Comparative Example) In order to solve the above problem of the first comparative example, it is considered to ensure the correlation between the light source and the bright spot by "changing the wavelength of each light source and setting a camera that can perform color recognition". This is called the second comparative example. Since the second comparative example is limited to the number of colors when distinguishing by color, there is an upper limit to the number of points of the multi-point light source. In addition, in the second comparative example, it is affected by the spectral reflection characteristics (reflection spectrum) of the subject, so there is a situation where it cannot be used depending on the color of the colored liquid.

在實施形態中,係個別地進行各光源之亮燈並每次進行拍攝,藉此,可保持光源與亮點的相關性。藉此,由於不需要改變每個光源的波長,因此,不存在上述第二比較例的問題。In the embodiment, each light source is individually turned on and photographed each time, thereby maintaining the correlation between the light source and the bright spot. Thus, since there is no need to change the wavelength of each light source, the problem of the second comparative example does not exist.

(第三比較例) 使用圖11及圖12,說明關於第三比較例。 (Third Comparative Example) The third comparative example will be described using Figures 11 and 12.

考慮如以下方法:使用被設置於糊料之上方的攝像機(上方攝像機),拍攝糊料並測定其面積,藉此,檢查糊料的塗佈量。將此稱為第三比較例。但是,在來自上方攝像機之拍攝中,係僅單純地得知塗佈面積。例如,糊料,係根據溫度而黏度有所不同,其結果,表面張力不同。因此,如圖11的側視圖所示般,即便糊料PA與基板S所成的角度(接觸角)不同,如圖11的圖像所示般,塗佈面積亦可成為相同。換言之,即便為相同的塗佈面積,塗佈量(體積或質量)亦因表面張力等所致之凸起狀態的差異而有所不同且不固定。Consider the following method: Use a camera (an upper camera) placed above the paste to photograph the paste and measure its area, thereby checking the amount of paste applied. This is called the third comparative example. However, in the photographing from the upper camera, only the coating area is simply known. For example, the viscosity of the paste varies depending on the temperature, and as a result, the surface tension is different. Therefore, as shown in the side view of Figure 11, even if the angle (contact angle) between the paste PA and the substrate S is different, as shown in the image of Figure 11, the coating area can be the same. In other words, even if the coating area is the same, the coating amount (volume or mass) varies and is not constant due to differences in the protrusion state caused by surface tension, etc.

例如,在微小晶粒(例如1mm平方左右),係雖進行微小量(比微小晶粒小之平面積的微細面積)之糊料的塗佈,但糊料之塗佈量,係容易受到塗佈時之些微的注射器之高度的變化等的影響。又,在微細面積之塗佈中,當藉由第三比較例測定塗佈量時,則有時會導致測定量因糊料PA之表面張力等的影響而與實際顯著不同。當塗佈量因該原因出現差異時,則如圖12所示般,會影響晶粒被接合於基板時之糊料PA的溢出量(HD)或爬升量(HA)。由於在微小晶粒中,係即便塗佈量稍有差異,變化率亦變大,故會大幅影響接合製程。For example, in the case of micro-crystals (e.g., about 1 mm square), although a micro-amount (a micro-area smaller than the plane area of the micro-crystal) of paste is applied, the amount of paste applied is easily affected by a slight change in the height of the syringe during application, etc. Also, in the case of application of micro-areas, when the amount of application is measured by the third comparative example, the measured amount may be significantly different from the actual amount due to the influence of the surface tension of the paste PA, etc. When the amount of application differs for this reason, as shown in FIG. 12 , the overflow amount (HD) or the climbing amount (HA) of the paste PA when the crystal is bonded to the substrate may be affected. In tiny grains, even a slight difference in the coating amount will increase the variation rate, which will greatly affect the bonding process.

微小晶粒之小型化,係更加進化,除了簡單的晶粒以外,具有MEMS構造者等複雜化。糊料亦需要微小量的塗佈技術,其塗佈量控制亦更被要求準確度。因此,在進行塗佈量控制方面,亦被要求能以進行塗佈工程的晶粒接合器自身來測定或檢查塗佈量。The miniaturization of micro-crystals is further developed. In addition to simple crystals, they are becoming more complex with MEMS structures. Pastes also require a small amount of coating technology, and the coating amount control is also required to be more accurate. Therefore, in terms of coating amount control, it is also required to be able to measure or check the coating amount with the die bonder itself that performs the coating process.

由於在實施形態中,係可更準確地算出糊料的塗佈量,因此,可進行對於微小晶粒之塗佈量的測定或檢查,並可進行更準確的塗佈量控制。Since the coating amount of the paste can be calculated more accurately in the embodiment, the coating amount of fine grains can be measured or inspected, and more accurate coating amount control can be performed.

(其他比較例) 亦考慮如以下方法:「使被配置於垂直(正上方)之攝像機的焦點位置變化,將聚焦位置相加而類推形狀」的方法(第四比較例)或「使用立體攝像機(複數個攝像機),立體地進行辨識」的方法(第五比較例) 、「在平行光光源設置狹縫,使用可條紋狀地形成陰影之斑馬光源來投影條紋」的方法(第六比較例)。 (Other Comparative Examples) The following methods are also considered: "Changing the focus position of the camera placed vertically (directly above) and adding the focus positions to infer the shape" (the fourth comparative example), "using a stereo camera (plural cameras) to perform three-dimensional recognition" (the fifth comparative example), and "setting slits in the parallel light source and using a zebra light source that can form stripes to project stripes" (the sixth comparative example).

由於第四~第六比較例之方法,係利用發現表面之位置的影像,因此,以對象表面進行擴散反射作為前提。如糊料等的液體面般,在鏡面反射為主導之對象物的情況下,係反射之光源側的位置關係或影像的影響強,難以類推反射面的位置。Since the methods of the fourth to sixth comparative examples utilize images to find the position of the surface, they are based on the premise that the object surface is diffusely reflected. In the case of an object dominated by mirror reflection, such as a liquid surface such as a paste, the positional relationship or image of the reflected light source is strongly affected, and it is difficult to infer the position of the reflecting surface.

在具有透明性之液體中,係來自液面內部的光幾乎成為主導。由於液體表面之鏡面反射光失焦,因此,只能聚焦於表面上之些微的擴散光。但是,其光量,係以指數方式,來自內部的反射光較大且埋沒於其光之中,在第四比較例或第五比較例之方法中,係作為結果,無法聚焦於表面。在糊料,係除了透明、半透明以外,存在有於內部包含微細的粒子狀之銀等的金屬者,亦存在有難以檢測表面者。In a transparent liquid, the light from the inside of the liquid surface almost dominates. Since the mirror-reflected light on the liquid surface is out of focus, only the slightly diffused light on the surface can be focused. However, the amount of light is exponentially greater than the reflected light from the inside and is buried in the light, and as a result, it is impossible to focus on the surface in the fourth or fifth comparative examples. In addition to transparent and semi-transparent pastes, there are some that contain fine particles of metal such as silver inside, and some that are difficult to detect on the surface.

在第六比較例之方法中,由於擴散反射體,係不取決於反射定律,因此,取決於由平行光光源所形成的斑馬光源之光照亮的位置,拍攝圖像成為條紋。糊料等形成之半球部分,係取決於光源光的到達位置而形成條紋之圖樣。對此,由於在鏡面反射的情況下,係依照反射定律,因此,在平行光到達了表面的情況下,其反射光未必被聚集於攝像機。因此,在第六比較例之方法中,在鏡面反射的情況下,在表面,係僅看到背景之景色彎曲。In the method of the sixth comparative example, since the diffuse reflector is not determined by the law of reflection, the image is captured as stripes depending on the position illuminated by the zebra light source formed by the parallel light source. The hemispherical part formed by the paste, etc., forms a stripe pattern depending on the arrival position of the light from the light source. In contrast, in the case of mirror reflection, the law of reflection is followed, so when the parallel light reaches the surface, its reflected light may not be gathered on the camera. Therefore, in the method of the sixth comparative example, in the case of mirror reflection, only the background scenery is seen to bend on the surface.

實施形態,係可檢測作為鏡面反射的液體之糊料的表面或「除了透明、半透明以外,於內部包含微細的粒子狀之銀等的金屬」之糊料的表面。又,實施形態之方法,係不僅可應用於糊料,亦可應用於檢測銲錫等的鏡面反射之金屬的表面。亦即,可對具有鏡面反射面之立體形狀的液體或金屬的體積進行測定或檢查。The embodiment can detect the surface of a paste that is a mirror-reflecting liquid or the surface of a paste that is "transparent or semi-transparent and contains fine particles of metal such as silver inside." In addition, the method of the embodiment can be applied not only to the paste but also to the detection of the surface of a mirror-reflecting metal such as solder. That is, the volume of a three-dimensional liquid or metal with a mirror-reflecting surface can be measured or inspected.

在實施形態中,係由於可監視糊料的塗佈量,因此,具有下述的一個或複數個效果。In the embodiment, since the amount of the paste applied can be monitored, one or more of the following effects are achieved.

(1)可針對生產工程中之每次塗佈或每隔固定間隔檢查・測定塗佈量。(1) The coating amount can be checked and measured each time the coating is applied or at regular intervals during the production process.

(2)在生產工程中,基於藉由上述(1)測定到的塗佈量,產生塗佈量異常之警報或錯誤,抑或反饋塗佈量的增減,藉此,可實現塗佈量的穩定化。(2) In the production process, based on the coating amount measured by (1) above, an alarm or error of abnormal coating amount is generated, or feedback of increase or decrease in coating amount is provided, thereby stabilizing the coating amount.

(3)藉由上述(2),可使接合後之糊料的溢出量或爬升量穩定化。(3) By means of the above-mentioned (2), the amount of overflow or rise of the paste after joining can be stabilized.

(4)可使晶粒接合器組裝之產品的良率提升。(4) The yield rate of die bonder assembled products can be improved.

以上,雖基於實施形態,具體地說明了本發明者所完成的揭示,但本揭示並不限定於上述實施形態,無需贅言地可進行各種變更。Although the disclosure completed by the inventors has been specifically described above based on the embodiments, the disclosure is not limited to the above embodiments and various modifications are possible, needless to say.

例如,在實施形態中,係雖說明了關於剛塗佈糊料後之形狀的測定(塗佈量檢查),但可應用於接合後之糊料的浸濕性檢查(糊料的溢出量或爬升量)或銲錫之形狀的測定、銲錫的銲腳檢查(銲錫的溢出量或爬升量)。For example, in the embodiment, although the measurement of the shape just after applying the paste (the amount of coating) is described, it can be applied to the wettability inspection of the paste after bonding (the amount of paste overflow or climbing) or the measurement of the solder shape and the solder lead inspection (the amount of solder overflow or climbing).

又,在實施形態中,係雖說明了點光源作為照明裝置的例子,但亦可使用環型照明作為照明裝置。藉此,可在糊料之表面取得如相等的傾斜角度下之等高線般的圖像,並可實現檢查速度之提升。Furthermore, although the embodiment describes an example of a point light source as an illumination device, a ring-shaped illumination device may also be used as the illumination device. This allows an image such as contour lines at equal tilt angles to be obtained on the surface of the paste, and the inspection speed can be increased.

又,在實施形態中,係雖說明了關於在俯視下圓形狀的糊料,但亦可應用於藉由一邊移動噴嘴一邊進行之塗佈(筆燈、描繪)所形成的糊料之檢查。Furthermore, in the embodiment, although the circular paste in a plan view is described, it can also be applied to the inspection of a paste formed by coating (pen light, drawing) while moving the nozzle.

又,在實施形態中,係雖說明了以預成形攝像機進行檢查的例子,但亦可以基板辨識攝像機或接合攝像機進行檢查。Furthermore, in the embodiment, although an example of inspection using a pre-forming camera is described, inspection may also be performed using a substrate recognition camera or a bonding camera.

又,在實施形態中,係雖說明了點光源作為照明裝置的例子,但亦可追加點光源或平行光源之同軸照明來進行檢查。藉此,可取得φ=0的圖像,並可進行外廓檢查。In the embodiment, although a point light source is described as an example of an illumination device, it is also possible to add a point light source or a coaxial illumination of a parallel light source for inspection. In this way, an image of φ=0 can be obtained, and an outer contour inspection can be performed.

又,在實施形態中,係雖說明了「在晶粒供給部1與接合部4之間設置中間平台部3,以拾取頭21將從晶粒供給部1拾取的晶粒D載置於中間平台31,以接合頭41從中間平台31再次拾取晶粒D,並接合於搬送來的基板S」的例子,但亦可以接合頭41將從晶粒供給部1拾取的晶粒D接合於基板S。Furthermore, in the implementation form, although the example of "providing an intermediate platform portion 3 between the grain supply portion 1 and the bonding portion 4, placing the grain D picked up from the grain supply portion 1 on the intermediate platform 31 by the pickup head 21, and picking up the grain D from the intermediate platform 31 again by the bonding head 41 and bonding it to the conveyed substrate S" is described, the grain D picked up from the grain supply portion 1 can also be bonded to the substrate S by the bonding head 41.

又,在實施形態中,係雖以晶粒接合器為例而進行了說明,但亦可應用於倒裝晶片接合器或晶片安裝機。Furthermore, in the embodiment, although the die bonder is described as an example, the present invention can also be applied to a flip chip bonder or a chip mounter.

8:控制部(控制裝置) 10:晶粒接合器(安裝裝置) 94:預成形攝像機(攝像裝置) 95:照明裝置 95a~95l:光源 PA:糊料(接合材料) 8: Control unit (control device) 10: Die bonder (installation device) 94: Preform camera (camera) 95: Lighting device 95a~95l: Light source PA: Paste (bonding material)

[圖1]圖1,係表示實施形態中的晶粒接合器之概略的上視圖。 [圖2]圖2,係說明在圖1中從箭頭A方向觀看時之概略構成的圖。 [圖3]圖3,係表示圖1所示之晶粒接合器的控制系統之概略構成的方塊圖。 [圖4]圖4,係表示使用了圖1所示之晶粒接合器的半導體裝置之製造方法的流程圖。 [圖5]圖5,係表示實施形態中之預成形攝像機、照明裝置及經塗佈於基板之糊料的圖。 [圖6]圖6(a)至圖6(c),係表示圖5所示的照明裝置之僅一個光源呈亮燈時的糊料之圖像的圖。 [圖7]圖7(a),係表示預成形攝像機、光源及糊料之位置關係的圖。圖7(b),係表示預成形攝像機的視野內之亮點位置的圖。 [圖8]圖8,係表示預成形攝像機的視野內之亮點位置的圖。 [圖9]圖9,係用以說明「基於平面上之亮點的座標與其切線方向,算出亮點的Z位置」之方法的圖。 [圖10]圖10(a),係表示具有光源與亮點的相關性時之圖像的圖。圖10(b),係表示光源與亮點的相關性較少時之圖像的圖。圖10(c),係表示糊料之形狀複雜時之圖像的圖。 [圖11]圖11,係表示所塗佈的糊料之側面及其上面圖像的圖。 [圖12]圖12,係表示糊料之溢出與爬升的圖。 [FIG. 1] FIG. 1 is a top view schematically showing a die bonder in an embodiment. [FIG. 2] FIG. 2 is a diagram illustrating a schematic configuration when viewed from the direction of arrow A in FIG. 1. [FIG. 3] FIG. 3 is a block diagram schematically showing a control system of the die bonder shown in FIG. 1. [FIG. 4] FIG. 4 is a flow chart showing a method for manufacturing a semiconductor device using the die bonder shown in FIG. 1. [FIG. 5] FIG. 5 is a diagram showing a preformed camera, an illumination device, and a paste applied to a substrate in an embodiment. [FIG. 6] FIG. 6(a) to FIG. 6(c) are diagrams showing images of a paste when only one light source of the illumination device shown in FIG. 5 is on. [FIG. 7] FIG. 7(a) is a diagram showing the positional relationship among the preformed camera, the light source, and the paste. Fig. 7(b) is a diagram showing the position of the bright spot in the field of view of the pre-forming camera. [Fig. 8] Fig. 8 is a diagram showing the position of the bright spot in the field of view of the pre-forming camera. [Fig. 9] Fig. 9 is a diagram for explaining the method of "calculating the Z position of the bright spot based on the coordinates of the bright spot on the plane and its tangent direction". [Fig. 10] Fig. 10(a) is a diagram showing an image when there is a correlation between the light source and the bright spot. Fig. 10(b) is a diagram showing an image when the correlation between the light source and the bright spot is less. Fig. 10(c) is a diagram showing an image when the shape of the paste is complex. [Fig. 11] Fig. 11 is a diagram showing the side and top images of the applied paste. [Fig. 12] Fig. 12 is a diagram showing the overflow and climbing of the paste.

S1:晶圓搬入 S1: Wafer loading

S2:基板搬入 S2: Substrate loading

S3:拾取 S3: Pickup

S4:預成形 S4: Pre-forming

S5:接合 S5: Joining

S6:基板搬出 S6: Substrate removal

Claims (11)

一種安裝裝置,其特徵係,具備有:攝像裝置,朝向具有鏡面反射面的接合材料;照明裝置,具有被設置於前述接合材料之上方的光源;及控制裝置,被構成為改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料,經改變之前述光源的照射位置,係被配置成圓頂狀。 A mounting device is characterized by comprising: a camera facing a bonding material having a mirror-like reflective surface; an illumination device having a light source disposed above the bonding material; and a control device configured to change the irradiation position of the light source, and inspect the bonding material based on a plurality of images obtained by photographing the bonding material with the camera, wherein the irradiation position of the light source is changed to be configured in a dome shape. 如請求項1之安裝裝置,其中,前述控制裝置,係被構成為:基於「拍攝到來自前述光源的照射光在前述接合材料的表面之反射點即亮點」的前述複數個圖像,算出圖像內的複數個亮點位置,基於前述圖像內之複數個亮點位置,算出空間上的複數個亮點位置,基於前述空間上之亮點位置,算出前述接合材料的形狀。 As in claim 1, the control device is configured to calculate the positions of the multiple bright spots in the image based on the multiple images of "reflection points of the irradiated light from the light source on the surface of the bonding material, i.e., bright spots", calculate the positions of the multiple bright spots in space based on the multiple bright spot positions in the image, and calculate the shape of the bonding material based on the bright spot positions in space. 如請求項2之安裝裝置,其中,前述控制裝置,係被構成為基於前述圖像內之亮點位置、前述光源之位置及前述攝像裝置之位置,算出前述空間上的亮點位置。 As in the installation device of claim 2, wherein the control device is configured to calculate the bright spot position in the space based on the bright spot position in the image, the position of the light source, and the position of the camera. 如請求項3之安裝裝置,其中,前述控制裝置,係被構成為: 基於前述圖像內之亮點位置、前述光源之位置及前述攝像裝置之位置,算出前述圖像內之亮點位置處的前述接合材料之表面的法線方向,基於前述法線方向,算出前述圖像內之亮點位置處的前述接合材料之表面的切線方向,基於前述圖像內之亮點位置與前述切線方向,算出前述空間上的亮點位置,基於前述切線方向及前述空間上之亮點位置,算出前述接合材料的形狀。 The mounting device of claim 3, wherein the control device is configured to: calculate the normal direction of the surface of the bonding material at the bright spot position in the image based on the bright spot position in the image, the position of the light source and the position of the camera, calculate the tangent direction of the surface of the bonding material at the bright spot position in the image based on the normal direction, calculate the bright spot position in the space based on the bright spot position in the image and the tangent direction, and calculate the shape of the bonding material based on the tangent direction and the bright spot position in the space. 如請求項4之安裝裝置,其中,前述控制裝置,係被構成為藉由移動前述光源的方式,改變前述照射位置。 As in claim 4, the control device is configured to change the irradiation position by moving the light source. 如請求項5之安裝裝置,其中,前述控制裝置,係被構成為檢索前述亮點與前述接合材料之輪廓面接觸的位置。 As in claim 5, the control device is configured to retrieve the position where the bright spot contacts the contour surface of the bonding material. 如請求項4之安裝裝置,其中,前述控制裝置,係被構成為將形成於前述接合材料的最外側之亮點的高度或前述接合材料的邊界點之亮點位置處的前述接合材料之表面的切線方向暫時決定為預定值。 As in claim 4, the control device is configured to temporarily determine the height of the bright spot formed on the outermost side of the bonding material or the tangent direction of the surface of the bonding material at the bright spot position of the boundary point of the bonding material to a predetermined value. 如請求項1之安裝裝置,其中,前述照明裝置,係具有:複數個光源,可個別地進行亮燈及熄燈,前述控制裝置,係被構成為藉由對前述複數個光源進行亮燈及熄燈的方式,改變前述照射位置。 As in claim 1, the lighting device comprises: a plurality of light sources that can be turned on and off individually, and the control device is configured to change the irradiation position by turning on and off the plurality of light sources. 一種檢查裝置,其特徵係,具備有:攝像裝置,朝向具有鏡面反射面的接合材料;照明裝置,具有被設置於前述接合材料之上方的光源;及控制裝置,被構成為改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料,經改變之前述光源的照射位置,係被配置成圓頂狀。 An inspection device is characterized by comprising: a camera facing a bonding material having a mirror-like reflective surface; an illumination device having a light source disposed above the bonding material; and a control device configured to change the irradiation position of the light source, and inspect the bonding material based on a plurality of images obtained by the camera photographing the bonding material, wherein the irradiation position of the light source is changed to be configured in a dome shape. 一種元件組裝方法,其特徵係,具有:「將基板搬入至安裝裝置」的工程,該安裝裝置,係具備有:攝像裝置,朝向具有鏡面反射面的接合材料;及照明裝置,具有被設置於前述接合材料之上方的光源;「將前述接合材料塗佈於前述基板」的工程;「改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料」的工程;及「將元件經由前述接合材料附接於前述基板」的工程,經改變之前述光源的照射位置,係被配置成圓頂狀。 A component assembly method, characterized by having a process of "carrying a substrate into a mounting device", the mounting device having: a camera facing a bonding material having a mirror reflective surface; and a lighting device having a light source disposed above the bonding material; a process of "applying the bonding material to the substrate"; a process of "changing the irradiation position of the light source, and inspecting the bonding material based on a plurality of images obtained by photographing the bonding material with the camera"; and a process of "attaching the component to the substrate via the bonding material", wherein the irradiation position of the light source is changed to be configured in a dome shape. 一種半導體裝置之製造方法,其特徵係,具有:「將基板搬入至安裝裝置」的工程,該安裝裝置,係具備有:攝像裝置,朝向銲錫或糊料即接合材料;及照明裝置,具有被設置於前述接合材料之上方的光源; 「將前述接合材料塗佈於前述基板」的工程;「改變前述光源的照射位置,基於前述攝像裝置拍攝前述接合材料而得到的複數個圖像,檢查前述接合材料」的工程;及「將晶粒經由前述接合材料接合於前述基板」的工程。 A method for manufacturing a semiconductor device is characterized by having a process of "carrying a substrate into a mounting device", the mounting device having: a camera facing the solder or paste, i.e., a bonding material; and a lighting device having a light source disposed above the bonding material; a process of "applying the bonding material to the substrate"; a process of "changing the irradiation position of the light source, and inspecting the bonding material based on a plurality of images obtained by photographing the bonding material with the camera"; and a process of "bonding a die to the substrate via the bonding material".
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