TWI858283B - Adhesive composition - Google Patents
Adhesive composition Download PDFInfo
- Publication number
- TWI858283B TWI858283B TW110131397A TW110131397A TWI858283B TW I858283 B TWI858283 B TW I858283B TW 110131397 A TW110131397 A TW 110131397A TW 110131397 A TW110131397 A TW 110131397A TW I858283 B TWI858283 B TW I858283B
- Authority
- TW
- Taiwan
- Prior art keywords
- adhesive composition
- adhesive layer
- adhesive
- inorganic filler
- resin
- Prior art date
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- 230000001070 adhesive effect Effects 0.000 title claims abstract description 130
- 239000000853 adhesive Substances 0.000 title claims abstract description 129
- 239000000203 mixture Substances 0.000 title claims abstract description 98
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 135
- 239000012790 adhesive layer Substances 0.000 claims abstract description 108
- 229920001971 elastomer Polymers 0.000 claims abstract description 67
- 239000000806 elastomer Substances 0.000 claims abstract description 67
- 229920005989 resin Polymers 0.000 claims abstract description 61
- 239000011347 resin Substances 0.000 claims abstract description 61
- 239000011256 inorganic filler Substances 0.000 claims abstract description 56
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 56
- 239000011342 resin composition Substances 0.000 claims abstract description 30
- 239000003822 epoxy resin Substances 0.000 claims description 60
- 229920000647 polyepoxide Polymers 0.000 claims description 60
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 16
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 10
- 229920002530 polyetherether ketone Polymers 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 6
- 150000003440 styrenes Chemical class 0.000 claims description 6
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 5
- 229910052582 BN Inorganic materials 0.000 claims description 4
- 239000010445 mica Substances 0.000 claims description 4
- 229910052618 mica group Inorganic materials 0.000 claims description 4
- 239000000454 talc Substances 0.000 claims description 3
- 229910052623 talc Inorganic materials 0.000 claims description 3
- 238000007731 hot pressing Methods 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 110
- -1 diene compounds Chemical class 0.000 description 32
- 238000001723 curing Methods 0.000 description 30
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 25
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 22
- 239000002585 base Substances 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 19
- 239000011889 copper foil Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- 125000003277 amino group Chemical group 0.000 description 14
- 238000012360 testing method Methods 0.000 description 13
- 239000002966 varnish Substances 0.000 description 13
- 239000002313 adhesive film Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 230000005540 biological transmission Effects 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000003063 flame retardant Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 229920006132 styrene block copolymer Polymers 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 7
- 239000004843 novolac epoxy resin Substances 0.000 description 7
- 239000004848 polyfunctional curative Substances 0.000 description 7
- 229920003048 styrene butadiene rubber Polymers 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229920003319 Araldite® Polymers 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000007822 coupling agent Substances 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229920000877 Melamine resin Polymers 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 239000005977 Ethylene Substances 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000011417 postcuring Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical group 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- QEGNUYASOUJEHD-UHFFFAOYSA-N 1,1-dimethylcyclohexane Chemical compound CC1(C)CCCCC1 QEGNUYASOUJEHD-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N 1-nonene Chemical compound CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- 239000004254 Ammonium phosphate Substances 0.000 description 2
- 239000004114 Ammonium polyphosphate Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229920000388 Polyphosphate Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001408 amides Chemical group 0.000 description 2
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 2
- 235000019289 ammonium phosphates Nutrition 0.000 description 2
- 235000019826 ammonium polyphosphate Nutrition 0.000 description 2
- 229920001276 ammonium polyphosphate Polymers 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 150000007973 cyanuric acids Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- KTLIMPGQZDZPSB-UHFFFAOYSA-M diethylphosphinate Chemical compound CCP([O-])(=O)CC KTLIMPGQZDZPSB-UHFFFAOYSA-M 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229920006270 hydrocarbon resin Polymers 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000012796 inorganic flame retardant Substances 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- ZQKXQUJXLSSJCH-UHFFFAOYSA-N melamine cyanurate Chemical compound NC1=NC(N)=NC(N)=N1.O=C1NC(=O)NC(=O)N1 ZQKXQUJXLSSJCH-UHFFFAOYSA-N 0.000 description 2
- 150000007974 melamines Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 239000001205 polyphosphate Substances 0.000 description 2
- 235000011176 polyphosphates Nutrition 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- IVORCBKUUYGUOL-UHFFFAOYSA-N 1-ethynyl-2,4-dimethoxybenzene Chemical compound COC1=CC=C(C#C)C(OC)=C1 IVORCBKUUYGUOL-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 description 1
- ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 1H-imidazole silane Chemical compound [SiH4].N1C=NC=C1 ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 0.000 description 1
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- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000003209 petroleum derivative Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- XFZRQAZGUOTJCS-UHFFFAOYSA-N phosphoric acid;1,3,5-triazine-2,4,6-triamine Chemical compound OP(O)(O)=O.NC1=NC(N)=NC(N)=N1 XFZRQAZGUOTJCS-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000001739 pinus spp. Substances 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- VXVIJUYUEQESQD-UHFFFAOYSA-N triethoxy-(triethoxysilyltetrasulfanyl)silane Chemical compound CCO[Si](OCC)(OCC)SSSS[Si](OCC)(OCC)OCC VXVIJUYUEQESQD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- GTOWTBKGCUDSNY-UHFFFAOYSA-K tris[[ethyl(methyl)phosphoryl]oxy]alumane Chemical compound [Al+3].CCP(C)([O-])=O.CCP(C)([O-])=O.CCP(C)([O-])=O GTOWTBKGCUDSNY-UHFFFAOYSA-K 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229940036248 turpentine Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
- PJEUXMXPJGWZOZ-UHFFFAOYSA-L zinc;diphenylphosphinate Chemical compound [Zn+2].C=1C=CC=CC=1P(=O)([O-])C1=CC=CC=C1.C=1C=CC=CC=1P(=O)([O-])C1=CC=CC=C1 PJEUXMXPJGWZOZ-UHFFFAOYSA-L 0.000 description 1
- GYKKGOMJFMCRIN-UHFFFAOYSA-L zinc;ethyl(methyl)phosphinate Chemical compound [Zn+2].CCP(C)([O-])=O.CCP(C)([O-])=O GYKKGOMJFMCRIN-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J109/00—Adhesives based on homopolymers or copolymers of conjugated diene hydrocarbons
- C09J109/06—Copolymers with styrene
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J125/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
- C09J125/02—Homopolymers or copolymers of hydrocarbons
- C09J125/04—Homopolymers or copolymers of styrene
- C09J125/08—Copolymers of styrene
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
Abstract
本發明提供一種黏接劑組成物,藉由控制機械特性,能防止熱壓接時之樹脂流動,能形成顯示良好的電特性且密合性良好的黏接劑層。係至少含有含苯乙烯系彈性體之樹脂組成物及無機填料之黏接劑組成物,前述無機填料之含量相對於前述樹脂組成物100質量份為1~180質量份,前述無機填料具有板狀或鱗片狀之形狀,且使前述黏接劑組成物硬化而成之黏接劑層之在頻率28GHz之相對介電常數為3.5以下,前述黏接劑層之在頻率28GHz之介電正切為0.005以下。The present invention provides an adhesive composition which can prevent resin flow during hot pressing by controlling mechanical properties, and can form an adhesive layer showing good electrical properties and good adhesion. The adhesive composition contains at least a resin composition containing a styrene-based elastomer and an inorganic filler, wherein the content of the inorganic filler is 1 to 180 parts by mass relative to 100 parts by mass of the resin composition, and the inorganic filler has a plate-like or scale-like shape, and the relative dielectric constant of the adhesive layer formed by curing the adhesive composition at a frequency of 28 GHz is less than 3.5, and the dielectric tangent of the adhesive layer at a frequency of 28 GHz is less than 0.005.
Description
本發明係關於黏接劑組成物。詳言之,係關於在電子零件等的黏接用途能使用的黏接劑組成物。The present invention relates to an adhesive composition. More specifically, it relates to an adhesive composition that can be used for bonding electronic parts and the like.
伴隨電子設備的小型化、輕量化等,電子零件等的黏接用途變得多様化,附黏接劑層之疊層體之需求增大。 又,係屬於電子零件之一種的可撓性印刷配線板(以下亦稱為FPC),需以高速處理大量數據,因應高頻率之作法已有進展。 由於5G之實用化,預測通訊速度提升、高頻率化,尋求優良的低傳送損失之實現、大容量通訊之穩定。伴隨於此,現在,已正在進行FPC中的低介電素材之開發、構成黏接劑層之黏接劑之開發。 As electronic equipment becomes smaller and lighter, the bonding uses of electronic parts and the like become more diverse, and the demand for laminates with adhesive layers increases. In addition, flexible printed wiring boards (hereinafter also referred to as FPCs), which are a type of electronic parts, need to process large amounts of data at high speed, and methods to cope with high frequencies have been developed. With the practical application of 5G, it is predicted that communication speeds will increase and frequencies will increase, and the realization of excellent low transmission loss and stability of large-capacity communications will be sought. In response to this, the development of low-dielectric materials in FPCs and the development of adhesives that constitute adhesive layers are currently underway.
為了同時具有良好的電特性又回應有高黏接性,有人提出一種疊層體,係使用含有含羧基之苯乙烯系彈性體(A)及環氧樹脂(B)之黏接劑組成物,由係該黏接劑組成物構成之黏接劑層及基材薄膜構成(例如參照專利文獻1)。 [先前技術文獻] [專利文獻] In order to have both good electrical properties and high adhesion, a laminate has been proposed, which uses an adhesive composition containing a carboxyl-containing styrene-based elastomer (A) and an epoxy resin (B), and is composed of an adhesive layer and a substrate film composed of the adhesive composition (for example, refer to patent document 1). [Prior art document] [Patent document]
[專利文獻1]國際公開第2016/017473號[Patent Document 1] International Publication No. 2016/017473
(發明欲解決之課題)(The problem to be solved)
印刷配線板之製造步驟有熱壓接的步驟,但若黏接劑之機械特性差,會有無法以預設之厚度、大小黏接的情形。 例如,會發生因為黏接劑柔軟而在熱壓接時出現樹脂流動,或因為熱膨脹率(CTE)大而在熱壓接時變形等問題。 為了防止樹脂流動而添加無機填料時,會發生黏接劑層之電特性惡化、或黏接劑層之密合力降低等問題。 因此,希望能提供一種附黏接劑層之疊層體,係藉由控制機械特性而能夠防止熱壓接時之樹脂流動,呈現良好的電特性且黏接劑層與基材薄膜間之密合性良好。 The manufacturing process of printed wiring boards includes a hot press step, but if the mechanical properties of the adhesive are poor, it may not be possible to bond with the preset thickness and size. For example, the adhesive may flow during hot press because the adhesive is soft, or deform during hot press because the thermal expansion coefficient (CTE) is large. When inorganic fillers are added to prevent the resin from flowing, the electrical properties of the adhesive layer may deteriorate, or the adhesion of the adhesive layer may decrease. Therefore, it is hoped to provide a laminate with an adhesive layer that can prevent the resin from flowing during hot pressing by controlling the mechanical properties, exhibit good electrical properties, and have good adhesion between the adhesive layer and the substrate film.
本發明之目的在於提供一種黏接劑組成物,其藉由控制機械特性,能夠防止熱壓接時之樹脂流動,能形成呈現良好的電特性且密合性良好的黏接劑層。 (解決課題之方式) The purpose of the present invention is to provide an adhesive composition that can prevent the resin from flowing during hot pressing by controlling the mechanical properties, and can form an adhesive layer that exhibits good electrical properties and good adhesion. (Method for solving the problem)
本案發明人等為了解決上述課題,努力研究,結果發現藉由於苯乙烯系彈性體添加特定的無機填料,能夠解決上述課題,乃完成本發明。The inventors of this case have made great efforts to study and find that the above-mentioned problems can be solved by adding specific inorganic fillers to styrene-based elastomers, thus completing the present invention.
本發明包括下列態樣。 (1)一種黏接劑組成物,至少含有含苯乙烯系彈性體之樹脂組成物及無機填料,該無機填料之含量相對於前述樹脂組成物100質量份為1~180質量份,該無機填料具有板狀或鱗片狀之形狀且使該黏接劑組成物硬化而成之黏接劑層之於頻率28GHz之相對介電常數為3.5以下,該黏接劑層之於頻率28GHz之介電正切為0.005以下。 (2)如(1)之黏接劑組成物,其中,該無機填料之縱橫比為5~500以下。 (3)如(1)或(2)之黏接劑組成物,其中,該無機填料之平均粒徑為3.0μm以下。 (4)如(1)~(3)中任一項之黏接劑組成物,其中,該無機填料含有矽系無機填料、及氮化硼中之至少任意者。 (5)如(1)~(4)中任一項之黏接劑組成物,其中,該矽系無機填料含有雲母、及滑石中之至少任意者。 (6)如(1)~(5)中任一項之黏接劑組成物,其中,該苯乙烯系彈性體為含羧基之苯乙烯系彈性體。 (7)如(1)~(5)中任一項之黏接劑組成物,其中,該苯乙烯系彈性體係含胺基之苯乙烯系彈性體。 (8)如(1)~(7)中任一項之黏接劑組成物,其中,該樹脂組成物含有環氧樹脂。 (9)如(8)之黏接劑組成物,其中,該環氧樹脂之含量相對於該樹脂組成物100質量份為1~25質量份。 (10)如(1)~(9)中任一項之黏接劑組成物,其中,該黏接劑組成物之硬化前黏接劑層之於150℃之貯藏彈性模數為1.0E+5Pa以上。 (11)如(1)~(10)中任一項之黏接劑組成物,其中,使該黏接劑組成物硬化而成之黏接劑層之熱膨脹率(CTE)為500ppm/K以下。 (12)一種疊層體,具有:基材薄膜,及由如(1)~(10)中任一項之黏接劑組成物構成之黏接劑層。 (13)如(12)之疊層體,其中,該基材薄膜含有聚醚醚酮(PEEK)樹脂。 (14)一種附黏接劑層之表覆層薄膜,含有如(12)或(13)之疊層體。 (15)一種覆銅疊層板,含有如(12)或(13)之疊層體。 (16)一種印刷配線板,含有如(12)或(13)之疊層體。 (17)一種遮蔽薄膜,含有如(12)或(13)之疊層體。 (18)一種附遮蔽薄膜之印刷配線板,含有如(12)或(13)之疊層體。 (發明之效果) The present invention includes the following aspects. (1) An adhesive composition comprising at least a resin composition containing a styrene-based elastomer and an inorganic filler, wherein the content of the inorganic filler is 1 to 180 parts by mass relative to 100 parts by mass of the resin composition, the inorganic filler has a plate-like or scaly shape, and the relative dielectric constant of the adhesive layer formed by curing the adhesive composition at a frequency of 28 GHz is less than 3.5, and the dielectric tangent of the adhesive layer at a frequency of 28 GHz is less than 0.005. (2) An adhesive composition as described in (1), wherein the aspect ratio of the inorganic filler is less than 5 to 500. (3) The adhesive composition of (1) or (2), wherein the average particle size of the inorganic filler is 3.0 μm or less. (4) The adhesive composition of any one of (1) to (3), wherein the inorganic filler contains at least any one of a silicon-based inorganic filler and boron nitride. (5) The adhesive composition of any one of (1) to (4), wherein the silicon-based inorganic filler contains at least any one of mica and talc. (6) The adhesive composition of any one of (1) to (5), wherein the styrene-based elastomer is a styrene-based elastomer containing a carboxyl group. (7) The adhesive composition of any one of (1) to (5), wherein the styrene-based elastomer is an amine-based elastomer. (8) An adhesive composition as described in any one of (1) to (7), wherein the resin composition contains an epoxy resin. (9) An adhesive composition as described in (8), wherein the content of the epoxy resin is 1 to 25 parts by weight relative to 100 parts by weight of the resin composition. (10) An adhesive composition as described in any one of (1) to (9), wherein the storage elastic modulus of the adhesive layer of the adhesive composition before curing at 150°C is greater than 1.0E+5Pa. (11) An adhesive composition as described in any one of (1) to (10), wherein the coefficient of thermal expansion (CTE) of the adhesive layer formed by curing the adhesive composition is 500 ppm/K or less. (12) A laminate comprising: a substrate film, and an adhesive layer formed by the adhesive composition as described in any one of (1) to (10). (13) A laminate as described in (12), wherein the substrate film contains polyetheretherketone (PEEK) resin. (14) A coating film with an adhesive layer, comprising the laminate as described in (12) or (13). (15) A copper-clad laminate comprising a laminate as described in (12) or (13). (16) A printed wiring board comprising a laminate as described in (12) or (13). (17) A shielding film comprising a laminate as described in (12) or (13). (18) A printed wiring board with a shielding film comprising a laminate as described in (12) or (13). (Effect of the invention)
依照本發明,能提供一種黏接劑組成物,係藉由控制機械特性,而能夠防止熱壓接時之樹脂流動,能形成呈現良好的電特性且密合性良好的黏接劑層。According to the present invention, an adhesive composition can be provided, which can prevent the resin from flowing during heat pressing by controlling the mechanical properties, and can form an adhesive layer having good electrical properties and good adhesion.
以下針對本發明之黏接劑組成物、含有由該黏接劑組成物構成之黏接劑層之疊層體、及含有該疊層體之電子零件相關的構成構件詳細說明,但以下記載之構成要件之說明係作為本發明之一實施態樣之一例,並非限於該等內容。The following is a detailed description of the adhesive composition of the present invention, a laminate containing an adhesive layer composed of the adhesive composition, and components related to electronic components containing the laminate, but the description of the constituent elements recorded below is an example of an implementation of the present invention and is not limited to such contents.
(黏接劑組成物) 本發明之黏接劑組成物至少含有:含有苯乙烯系彈性體之樹脂組成物、及無機填料。 本發明之黏接劑組成物含有之無機填料具有板狀或鱗片狀之形狀。 本發明之黏接劑組成物含有之無機填料之含量,相對於樹脂組成物100質量份為1~180質量份。 使本發明之黏接劑組成物硬化而成之黏接劑層之於頻率28GHz之相對介電常數為3.5以下,該黏接劑層之於頻率28GHz之介電正切為0.005以下。 黏接劑組成物中除了樹脂組成物及無機填料以外,視需要亦可含有其他成分。 (Adhesive composition) The adhesive composition of the present invention contains at least: a resin composition containing a styrene elastomer, and an inorganic filler. The inorganic filler contained in the adhesive composition of the present invention has a plate-like or scaly shape. The content of the inorganic filler contained in the adhesive composition of the present invention is 1 to 180 parts by mass relative to 100 parts by mass of the resin composition. The relative dielectric constant of the adhesive layer formed by curing the adhesive composition of the present invention at a frequency of 28 GHz is 3.5 or less, and the dielectric tangent of the adhesive layer at a frequency of 28 GHz is 0.005 or less. In addition to the resin composition and the inorganic filler, the adhesive composition may contain other components as needed.
<樹脂組成物> 本發明之樹脂組成物至少含有苯乙烯系彈性體。該苯乙烯系彈性體之中,含有含羧基之苯乙烯系彈性體、含胺基之苯乙烯系彈性體較佳。 樹脂組成物可含有環氧樹脂。 樹脂組成物視需要亦可含有苯乙烯系彈性體及環氧樹脂以外之其他樹脂成分。 <Resin composition> The resin composition of the present invention contains at least a styrene-based elastomer. Among the styrene-based elastomer, it is preferred to contain a carboxyl-containing styrene-based elastomer and an amine-containing styrene-based elastomer. The resin composition may contain an epoxy resin. The resin composition may also contain other resin components other than the styrene-based elastomer and the epoxy resin as needed.
<<苯乙烯系彈性體>> 苯乙烯系彈性體不含高極性之鍵結基,故電特性優良,且係可藉由因苯乙烯之結構間之交互作用而具有凝聚力之方面及分子量之調整容易之方面而調整可撓性及密合力之樹脂。又,可藉由改性而提升無機填料之分散性、密合力。 苯乙烯系彈性體,係指以共軛二烯化合物與芳香族乙烯基化合物之嵌段及無規結構為主體之共聚物、及其氫化物。 芳香族乙烯基化合物,例如苯乙烯、第三丁基苯乙烯、α-甲基苯乙烯、二乙烯基苯、1,1-二苯基乙烯、N,N-二乙基對胺基乙基苯乙烯、乙烯基甲苯等。又,共軛二烯化合物,例如:丁二烯、異戊二烯、1,3-戊二烯、2,3-二甲基-1,3-丁二烯等。 苯乙烯系彈性體之具體例可列舉苯乙烯-丁二烯嵌段共聚物、苯乙烯-乙烯丙烯嵌段共聚物、苯乙烯-丁二烯-苯乙烯嵌段共聚物、苯乙烯-異戊二烯-苯乙烯嵌段共聚物、苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物等。 <<Styrene-based elastomer>> Styrene-based elastomers do not contain highly polar bonding groups, so they have excellent electrical properties. They are resins that can adjust flexibility and adhesion due to the cohesive force due to the interaction between styrene structures and the ease of adjusting molecular weight. In addition, the dispersibility and adhesion of inorganic fillers can be improved by modification. Styrene-based elastomers refer to copolymers with block and random structures of conjugated diene compounds and aromatic vinyl compounds as the main components, and their hydrogenates. Aromatic vinyl compounds, such as styrene, tert-butyl styrene, α-methyl styrene, divinylbenzene, 1,1-diphenylethylene, N,N-diethyl-p-aminoethyl styrene, vinyl toluene, etc. In addition, covalent diene compounds, such as butadiene, isoprene, 1,3-pentadiene, 2,3-dimethyl-1,3-butadiene, etc. Specific examples of styrene-based elastomers include styrene-butadiene block copolymers, styrene-ethylene propylene block copolymers, styrene-butadiene-styrene block copolymers, styrene-isoprene-styrene block copolymers, styrene-ethylene butylene-styrene block copolymers, and styrene-ethylene propylene-styrene block copolymers.
該等苯乙烯系彈性體可僅使用1種,亦可併用2種以上。上述共聚物之中,考量黏接性及電特性之觀點,苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物為較佳。又,苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物中之苯乙烯/乙烯丁烯之質量比、及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物中之苯乙烯/乙烯丙烯之質量比,為10/90~50/50較佳,20/80~40/60更佳。該質量比若為此範圍內,能成為具有優良的黏接特性的黏接劑組成物。Only one of the styrene-based elastomers may be used, or two or more of them may be used in combination. Among the above copolymers, styrene-ethylene butylene-styrene block copolymers and styrene-ethylene propylene-styrene block copolymers are preferred from the viewpoints of adhesion and electrical properties. In addition, the mass ratio of styrene/ethylene butylene in the styrene-ethylene butylene-styrene block copolymer and the mass ratio of styrene/ethylene propylene in the styrene-ethylene propylene-styrene block copolymer are preferably 10/90 to 50/50, and more preferably 20/80 to 40/60. If the mass ratio is within this range, an adhesive composition having excellent adhesive properties can be obtained.
苯乙烯系彈性體之含量,相對於樹脂組成物之固體成分100質量份為10.0質量份~99.0質量份較佳。The content of the styrene elastomer is preferably 10.0 parts by mass to 99.0 parts by mass based on 100 parts by mass of the solid content of the resin composition.
<<<含羧基之苯乙烯系彈性體>>> 含羧基之苯乙烯系彈性體,密合性高而能對於硬化物賦予柔軟性,作為提供良好的電特性的成分為有效。 黏接劑組成物中藉由含有含羧基之苯乙烯系彈性體,則電特性良好,即使是低極性之基材薄膜、金屬箔等被黏體,柔軟的黏接劑組成物也能充分隨附被黏體之表面,藉此,高極性之羧基能展現密合性,故黏接劑層之密合性提高。又,含羧基之苯乙烯系彈性體有反應性,故藉由環氧硬化,黏接劑層之耐熱性、耐藥品性亦提升。 又,藉由含有羧基,分散液中之無機填料之分散性提高。 含羧基之苯乙烯系彈性體,係指將以共軛二烯化合物與芳香族乙烯基化合物之嵌段及無規結構為主體之共聚物、及其氫化物利用不飽和羧酸予以改性而得者。 芳香族乙烯基化合物及共軛二烯化合物之種類、苯乙烯系彈性體之具體例,如同上述<<苯乙烯系彈性體>>之欄所述。 <<<Carboxyl-containing styrene elastomer>>> Carboxyl-containing styrene elastomer has high adhesion and can give flexibility to the cured product, and is effective as a component that provides good electrical properties. By containing carboxyl-containing styrene elastomer in the adhesive composition, the electrical properties are good, and even for low-polarity substrate films, metal foils and other adherends, the soft adhesive composition can fully adhere to the surface of the adherend, thereby allowing the highly polar carboxyl groups to exhibit adhesion, thereby improving the adhesion of the adhesive layer. In addition, carboxyl-containing styrene elastomers are reactive, so by epoxy curing, the heat resistance and chemical resistance of the adhesive layer are also improved. In addition, by containing carboxyl groups, the dispersibility of inorganic fillers in the dispersion is improved. Carboxyl-containing styrene elastomers are copolymers mainly composed of blocks and random structures of covalent diene compounds and aromatic vinyl compounds, and their hydrides modified with unsaturated carboxylic acids. The types of aromatic vinyl compounds and covalent diene compounds, and specific examples of styrene elastomers are as described in the above column <<Styrene elastomers>>.
含羧基之苯乙烯系彈性體之改性,例如可藉由於苯乙烯系彈性體聚合時使不飽和羧酸共聚合以進行。又,也可藉由將苯乙烯系彈性體與不飽和羧酸於有機過氧化物存在下進行加熱、混練以進行。 不飽和羧酸可列舉丙烯酸、甲基丙烯酸、馬來酸、衣康酸、富馬酸、馬來酸酐、衣康酸酐等。 利用不飽和羧酸所為之改性量為0.1~10質量%較佳。 含羧基之苯乙烯系彈性體之酸價宜為0.1~30mgKOH/g較佳,0.5~25mgKOH/g更佳,0.5~5mgKOH/g又更佳。此酸價若為0.1mgKOH/g以上,則無機填料之分散性變得良好。酸價若為0.5mgKOH/g以上,則黏接劑組成物之硬化充分,可獲得良好的黏接性、及耐熱性。另一方面,前述酸價若為30mgKOH/g以下,則黏接劑組成物之凝聚力受抑制,故黏著性優異,電特性亦優良。酸價若為5mgKOH/g以下,則和PEEK基材之密合力提高。 The modification of the carboxyl-containing styrene elastomer can be carried out, for example, by copolymerizing an unsaturated carboxylic acid during the polymerization of the styrene elastomer. Alternatively, the modification can be carried out by heating and kneading the styrene elastomer and the unsaturated carboxylic acid in the presence of an organic peroxide. Examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, maleic anhydride, itaconic anhydride, and the like. The modification amount using the unsaturated carboxylic acid is preferably 0.1 to 10% by mass. The acid value of the carboxyl-containing styrene elastomer is preferably 0.1 to 30 mgKOH/g, more preferably 0.5 to 25 mgKOH/g, and even more preferably 0.5 to 5 mgKOH/g. If the acid value is 0.1 mgKOH/g or more, the dispersibility of the inorganic filler becomes good. If the acid value is above 0.5 mgKOH/g, the adhesive composition is sufficiently cured, and good adhesion and heat resistance can be obtained. On the other hand, if the acid value is below 30 mgKOH/g, the cohesion of the adhesive composition is suppressed, so the adhesion is excellent and the electrical properties are also excellent. If the acid value is below 5 mgKOH/g, the adhesion with the PEEK substrate is improved.
又,含羧基之苯乙烯系彈性體之重量平均分子量為1~50萬較佳,3~30萬更佳,5~20萬更理想。重量平均分子量若為上述下限以上,則能展現優良的黏接性,溶於溶劑並塗佈時之塗佈性亦變得良好。重量平均分子量若為上述上限以下,則和環氧樹脂之互容性變得良好。 重量平均分子量若為上述範圍內,則能控制機械特性為適度的範圍,能兼顧樹脂流動之防止及無機填料在分散液中之分散性。 重量平均分子量係將利用凝膠滲透層析(以下亦稱為「GPC」)測得之分子量進行了聚苯乙烯換算之值。 In addition, the weight average molecular weight of the carboxyl-containing styrene elastomer is preferably 10,000 to 500,000, more preferably 300,000 to 300,000, and more preferably 500,000 to 200,000. If the weight average molecular weight is above the lower limit, it can exhibit excellent adhesion, and the coating property when dissolved in a solvent and coated becomes good. If the weight average molecular weight is below the upper limit, the compatibility with the epoxy resin becomes good. If the weight average molecular weight is within the above range, the mechanical properties can be controlled to an appropriate range, and the prevention of resin flow and the dispersibility of the inorganic filler in the dispersion can be taken into account. The weight average molecular weight is a value obtained by converting the molecular weight measured by gel permeation chromatography (hereinafter also referred to as "GPC") into polystyrene.
含羧基之苯乙烯系彈性體之含量,相對於樹脂組成物之固體成分100質量份為10.0~99.0質量份較佳。含量若為上述範圍內,能成為具有優良的黏接特性之黏接劑組成物。 相對於樹脂組成物之固體成分100質量份,為20~49質量份又更佳。含量若為上述範圍內,能控制機械特性在適度的範圍,能兼顧樹脂流動之防止及無機填料在分散液中之分散性。 The content of the carboxyl-containing styrene elastomer is preferably 10.0 to 99.0 parts by mass relative to 100 parts by mass of the solid component of the resin composition. If the content is within the above range, it can become an adhesive composition with excellent bonding properties. It is even better to be 20 to 49 parts by mass relative to 100 parts by mass of the solid component of the resin composition. If the content is within the above range, the mechanical properties can be controlled within an appropriate range, and both the prevention of resin flow and the dispersibility of the inorganic filler in the dispersion can be taken into account.
<<<含胺基之苯乙烯系彈性體>>> 黏接劑組成物中藉由含有含胺基之苯乙烯系彈性體,反應性提高,黏接劑層之密合性提高。又,含胺基之苯乙烯系彈性體具有反應性,故藉由環氧硬化,黏接劑層之耐熱性、耐藥品性亦會提升。 因含有胺基,和金屬之密合性提高。 又,因含有胺基,和環氧樹脂之反應性高,能於樹脂流出前便硬化,能有效地防止樹脂流動。 含胺基之苯乙烯系彈性體,係指將以共軛二烯化合物與芳香族乙烯基化合物之嵌段及無規結構為主體之共聚物、及其氫化物予以胺改性而得者。 芳香族乙烯基化合物及共軛二烯化合物之種類、苯乙烯系彈性體之具體例,如同上述<<苯乙烯系彈性體>>之欄所述。 <<<Amino-containing styrene elastomer>>> By containing an amine-containing styrene elastomer in the adhesive composition, the reactivity is improved and the adhesion of the adhesive layer is improved. In addition, since the amine-containing styrene elastomer is reactive, the heat resistance and chemical resistance of the adhesive layer are also improved by epoxy curing. Because it contains an amine group, the adhesion to metal is improved. In addition, because it contains an amine group, the reactivity with epoxy resin is high, and it can be cured before the resin flows out, which can effectively prevent the resin from flowing. Amine-containing styrene elastomer refers to a copolymer mainly composed of a block and random structure of a conjugated diene compound and an aromatic vinyl compound, and its hydrogenated product is modified with amine. The types of aromatic vinyl compounds and covalent diene compounds, and specific examples of styrene-based elastomers are as described in the above column "Styrene-based elastomers".
將苯乙烯系彈性體予以胺改性之方法不特別限定,可採用公知之方法,例如:使用具有胺基之聚合起始劑將(氫化)嵌段共聚物予以聚合以進行胺改性之方法;藉由使用具有胺基之不飽和單體作為共聚合之原料以將(氫化)共聚物進行胺改性之方法;使含羧基之苯乙烯系彈性體和具有2個以上胺基之胺改性劑反應並形成醯胺結構、或醯亞胺結構以進行胺改性之方法等。The method for amine-modifying the styrene-based elastomer is not particularly limited, and a known method may be used, for example: a method of amine-modifying a (hydrogenated) block copolymer by polymerizing it using a polymerization initiator having an amine group; a method of amine-modifying a (hydrogenated) copolymer by using an unsaturated monomer having an amine group as a copolymerization raw material; a method of amine-modifying a carboxyl-containing styrene-based elastomer and an amine modifier having two or more amine groups to react and form an amide structure or an imide structure, etc.
又,含胺基之苯乙烯系彈性體之重量平均分子量為1~50萬較佳,3~30萬更佳,5~20萬更理想。重量平均分子量若為上述下限以上,則能展現優良的黏接性,溶於溶劑並塗佈時之塗佈性也會變好。重量平均分子量若為上述上限以下,則和環氧樹脂之互容性變得良好。 重量平均分子量若為上述範圍內,則能控制機械特性為適度的範圍,可兼顧樹脂流動之防止及無機填料在分散液中之分散性。 In addition, the weight average molecular weight of the amino-containing styrene elastomer is preferably 10,000 to 500,000, more preferably 300,000 to 300,000, and more preferably 500,000 to 200,000. If the weight average molecular weight is above the lower limit, it can exhibit excellent adhesion, and the coating property will also be improved when dissolved in a solvent and coated. If the weight average molecular weight is below the upper limit, the compatibility with the epoxy resin becomes good. If the weight average molecular weight is within the above range, the mechanical properties can be controlled to an appropriate range, and both the prevention of resin flow and the dispersibility of the inorganic filler in the dispersion can be taken into account.
含胺基之苯乙烯系彈性體之含量,相對於樹脂組成物之固體成分100質量份為10.0~99.0質量份較佳。相對於樹脂組成物之固體成分100質量份為20~49質量份又更佳。含量若為10.0~99.0質量份,則能成為具有優良的黏接特性之黏接劑組成物。含量若為20~49質量份,則能控制機械特性為適度的範圍,可兼顧樹脂流動之防止及無機填料在分散液中之分散性。The content of the amino-containing styrene elastomer is preferably 10.0-99.0 parts by weight relative to 100 parts by weight of the solid content of the resin composition. It is even more preferably 20-49 parts by weight relative to 100 parts by weight of the solid content of the resin composition. If the content is 10.0-99.0 parts by weight, it can become an adhesive composition with excellent bonding properties. If the content is 20-49 parts by weight, the mechanical properties can be controlled within an appropriate range, and both the prevention of resin flow and the dispersibility of the inorganic filler in the dispersion can be taken into account.
藉由將無改性苯乙烯系彈性體與改性苯乙烯系彈性體混合,能夠維持黏接性並且調整硬度、控制MFR。By mixing unmodified styrene elastomer with modified styrene elastomer, it is possible to adjust hardness and control MFR while maintaining adhesion.
<<環氧樹脂>> 環氧樹脂,係和上述含羧基之苯乙烯系彈性體中之羧基、上述含胺基之苯乙烯系彈性體中之胺基反應,並展現對於被黏體之高程度之黏接性、黏接劑硬化物之耐熱性之成分。 <<Epoxy resin>> Epoxy resin is a component that reacts with the carboxyl group in the above-mentioned carboxyl group-containing styrene elastomer and the amine group in the above-mentioned amine group-containing styrene elastomer, and exhibits a high degree of adhesion to the adherend and heat resistance of the cured adhesive.
環氧樹脂,例如:雙酚A型環氧樹脂、雙酚F型環氧樹脂、或將此等予以氫化而得者;鄰苯二甲酸二環氧丙酯、間苯二甲酸二環氧丙酯、對苯二甲酸二環氧丙酯、對羥基苯甲酸環氧丙酯、四氫鄰苯二甲酸二環氧丙酯、琥珀酸二環氧丙酯、己二酸二環氧丙酯、癸二酸二環氧丙酯、偏苯三甲酸三環氧丙酯等環氧丙酯系環氧樹脂;乙二醇二環氧丙醚、丙二醇二環氧丙醚、1,4-丁二醇二環氧丙醚、1,6-己烷二醇二環氧丙醚、三羥甲基丙烷三環氧丙醚、新戊四醇四環氧丙醚、四苯基環氧丙醚乙烷、三苯基環氧丙醚乙烷、山梨醇之聚環氧丙醚、聚甘油之聚環氧丙醚等環氧丙醚系環氧樹脂;三環氧丙基異氰尿酸酯、四環氧丙基二胺基二苯基甲烷等環氧丙胺系環氧樹脂;環氧化聚丁二烯、環氧化大豆油等線狀脂肪族環氧樹脂等,但不限於此等。又,可使用含有二甲苯結構之酚醛清漆環氧樹脂、萘酚酚醛清漆型環氧樹脂、苯酚酚醛清漆環氧樹脂、鄰甲酚酚醛清漆環氧樹脂、雙酚A酚醛清漆環氧樹脂等酚醛清漆型環氧樹脂。Epoxy resins, for example, bisphenol A epoxy resins, bisphenol F epoxy resins, or hydrogenated versions thereof; epoxy resins based on propylene glycol, ethylene glycol, propylene glycol, 1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1,4-dihydro-1 - Butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, trihydroxymethylpropane triglycidyl ether, pentaerythritol tetraglycidyl ether, tetraphenylglycidyl ether ethane, triphenylglycidyl ether ethane, polyglycidyl ether of sorbitol, polyglycidyl ether of polyglycerol and other glycidyl ether-based epoxy resins; triglycidyl isocyanurate, tetraglycidyl diaminodiphenylmethane and other glycidyl amine-based epoxy resins; epoxidized polybutadiene, epoxidized soybean oil and other linear aliphatic epoxy resins, etc., but not limited to these. In addition, novolac epoxy resins such as novolac epoxy resins containing a xylene structure, naphthol novolac epoxy resins, phenol novolac epoxy resins, o-cresol novolac epoxy resins, and bisphenol A novolac epoxy resins can be used.
又,環氧樹脂,例如可使用溴化雙酚A型環氧樹脂、含磷之環氧樹脂、含氟之環氧樹脂、含二環戊二烯骨架之環氧樹脂、含萘骨架之環氧樹脂、蒽型環氧樹脂、第三丁基兒茶酚型環氧樹脂、三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、聯苯型環氧樹脂、雙酚S型環氧樹脂等。該等環氧樹脂可僅使用1種,也可併用2種以上。 上述環氧樹脂之中,考量能獲得電特性優異之黏接劑組成物且和苯乙烯系彈性體之互容性良好之觀點,宜為不具羥基之環氧樹脂較佳。尤其,酚醛清漆環氧樹脂、如下列結構之環氧樹脂,因係適度地具有柔軟骨架之環氧樹脂,硬化物不易發生脆性破壞,黏接劑組成物之硬化物對於長期使用之性能之安定性好,官能基數亦高,故耐熱性亦提升,較為理想。為苯乙烯-丁二烯嵌段共聚物之環氧化合物更佳。苯乙烯-丁二烯嵌段共聚物之環氧化合物,由於環氧結構之反應中,除芳香環以外有如烯烴骨架、乙烯基的不飽和鍵參與,能夠促進反應速度及提高交聯密度,結果,即使是少摻合量仍能夠提升耐熱性、耐藥品性。又,苯乙烯-丁二烯嵌段共聚物之環氧化合物,藉由分子量大並含有環氧基,會如同分散劑般作用,能夠使無機填料之分散性更好。苯乙烯-丁二烯嵌段共聚物之環氧化合物亦可使用市售之環氧化合物,例如:CELLOXIDE 2021P、CELLOXIDE 2081、CELLOXIDE 2000(大賽璐公司製)、EPOLEAD GT401、EPOLEAD PB3600、EPOLEAD PB4700(大賽璐公司製)、EPOFRIEND AT501、EPOFRIEND CT310(大賽璐公司製)。 In addition, epoxy resins such as brominated bisphenol A type epoxy resins, phosphorus-containing epoxy resins, fluorine-containing epoxy resins, dicyclopentadiene skeleton-containing epoxy resins, naphthalene skeleton-containing epoxy resins, anthracene-type epoxy resins, tert-butylcatechol-type epoxy resins, triphenylmethane-type epoxy resins, tetraphenylethane-type epoxy resins, biphenyl-type epoxy resins, bisphenol S-type epoxy resins, etc. can be used. Only one of these epoxy resins can be used, or two or more can be used in combination. Among the above epoxy resins, epoxy resins without hydroxyl groups are preferred from the viewpoint of obtaining adhesive compositions with excellent electrical properties and good compatibility with styrene-based elastomers. In particular, novolac epoxy resins and epoxy resins with the following structures are epoxy resins with moderately soft skeletons, and the cured products are not prone to brittle failure. The cured products of adhesive compositions have good stability in performance for long-term use, and the functional groups are also high, so the heat resistance is also improved, which is more ideal. Epoxy compounds of styrene-butadiene block copolymers are more preferred. The epoxy compounds of styrene-butadiene block copolymers can promote the reaction speed and increase the crosslinking density because they have unsaturated bonds such as olefin skeletons and vinyl groups in addition to aromatic rings in the reaction of the epoxy structure. As a result, even a small amount of blending can still improve heat resistance and chemical resistance. In addition, the epoxy compounds of styrene-butadiene block copolymers, due to their large molecular weight and epoxy groups, can act like dispersants and make the inorganic filler more dispersible. The epoxy compound of the styrene-butadiene block copolymer can also use commercially available epoxy compounds, such as: CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2000 (manufactured by Da Cellulose Corporation), EPOLEAD GT401, EPOLEAD PB3600, EPOLEAD PB4700 (manufactured by Da Cellulose Corporation), EPOFRIEND AT501, EPOFRIEND CT310 (manufactured by Da Cellulose Corporation).
[化1] R為含有亞甲基-芳基-亞甲基之結構、或含有碳數6以上之脂肪族烴結構之結構,芳基可列舉苯、二甲苯、萘、聯苯等,脂肪族烴可列舉己烷、二甲基環己烷、二環戊二烯等。 酚醛清漆型之環氧樹脂之具體例,例如:三菱化學(股)公司製之「YX7700」(含二甲苯結構之酚醛清漆型環氧樹脂)、日本化藥(股)公司製之「NC7000L」(萘酚酚醛清漆型環氧樹脂)、日鐵化學&材料(股)公司公司製之「ESN485」(萘酚酚醛清漆型環氧樹脂)、DIC(股)公司製之「N-690」(甲酚酚醛清漆型環氧樹脂)、DIC(股)公司製之「N-695」(甲酚酚醛清漆型環氧樹脂)等。 [Chemistry 1] R is a structure containing a methylene-aryl-methylene group or a structure containing an aliphatic hydrocarbon structure having 6 or more carbon atoms. Examples of the aryl group include benzene, xylene, naphthalene, biphenyl, etc., and examples of the aliphatic hydrocarbon include hexane, dimethylcyclohexane, dicyclopentadiene, etc. Specific examples of novolac-type epoxy resins include: "YX7700" manufactured by Mitsubishi Chemical Corporation (a novolac-type epoxy resin containing a xylene structure), "NC7000L" manufactured by Nippon Kayaku Co., Ltd. (a naphthol novolac-type epoxy resin), "ESN485" manufactured by Nippon Steel Chemical & Materials Co., Ltd. (a naphthol novolac-type epoxy resin), "N-690" manufactured by DIC Corporation (a cresol novolac-type epoxy resin), and "N-695" manufactured by DIC Corporation (a cresol novolac-type epoxy resin).
又,具有胺基之環氧樹脂,因胺基之觸媒作用能使硬化時間縮短、或降低硬化溫度,故作業性能提升。又,因含有胺基,和金屬層之密合性提高。 尤其,環氧樹脂若為環氧丙胺型環氧樹脂,則更理想。環氧丙胺型環氧樹脂為多官能,故能以少量而硬化,分子骨架因含有胺,故和含胺基之苯乙烯系彈性體之互容性良好,且有反應促進效果。又,因含有胺基,故和金屬層之密合性能提升。 環氧丙胺型之環氧樹脂之具體例,例如:就四環氧丙基二胺基二苯基甲烷而言可列舉三菱化學(股)公司製之「jER604」、住友化學(股)公司製之「SUMIEPOXY ELM434」、Huntsman Advanced Materials(股)公司製之「ARALDITE MY720」、「ARALDITE MY721」、「ARALDITE MY9512」、「ARALDITE MY9612」、「ARALDITE MY9634」、「ARALDITE MY9663」、三菱瓦斯化學(股)公司製「TETRAD-X」、「TETRAD-C」等。 In addition, epoxy resins with amino groups can shorten the curing time or lower the curing temperature due to the catalytic effect of the amino groups, so the workability is improved. In addition, because it contains amino groups, the adhesion with the metal layer is improved. In particular, if the epoxy resin is a glycidylamine type epoxy resin, it is more ideal. Glycidylamine type epoxy resin is multifunctional, so it can be cured with a small amount. Because the molecular skeleton contains amines, it has good compatibility with styrene elastomers containing amino groups and has a reaction-promoting effect. In addition, because it contains amino groups, the adhesion with the metal layer is improved. Specific examples of epoxy resins of the epoxy propylamine type include, for example, tetraethylene glycol diamino diphenylmethane, "jER604" manufactured by Mitsubishi Chemical Co., Ltd., "SUMIEPOXY ELM434" manufactured by Sumitomo Chemical Co., Ltd., "ARALDITE MY720", "ARALDITE MY721", "ARALDITE MY9512", "ARALDITE MY9612", "ARALDITE MY9634", "ARALDITE MY9663" manufactured by Huntsman Advanced Materials Co., Ltd., "TETRAD-X", "TETRAD-C" manufactured by Mitsubishi Gas Chemical Co., Ltd., etc.
本發明使用之環氧樹脂宜為一分子中具有2個以上之環氧基者較佳。原因在於,能於和含羧基之苯乙烯系彈性體之反應形成交聯結構,展現高耐熱性。又,使用環氧基為2個以上之環氧樹脂時,和含羧基之苯乙烯系彈性體之交聯度足夠,可獲得充分的耐熱性。The epoxy resin used in the present invention preferably has two or more epoxy groups in one molecule. The reason is that it can form a cross-linked structure when reacting with a carboxyl-containing styrene elastomer, thereby exhibiting high heat resistance. In addition, when an epoxy resin having two or more epoxy groups is used, the degree of cross-linking with a carboxyl-containing styrene elastomer is sufficient, and sufficient heat resistance can be obtained.
上述環氧樹脂之含量相對於樹脂組成物100質量份為1~25質量份較佳。上述環氧樹脂之含量若為上述下限值以上,則黏接劑組成物會充分硬化,能夠擔保良好的耐熱性、耐藥品性。另一方面,環氧樹脂之含量若多,則密合性降低,故若為上述上限值以下,能夠擔保良好的密合性。The content of the epoxy resin is preferably 1 to 25 parts by weight relative to 100 parts by weight of the resin composition. If the content of the epoxy resin is above the lower limit, the adhesive composition will be sufficiently hardened, and good heat resistance and chemical resistance can be ensured. On the other hand, if the content of the epoxy resin is too high, the adhesion will decrease, so if it is below the upper limit, good adhesion can be ensured.
上述環氧樹脂之軟化點或熔點為90℃以下較佳。環氧樹脂之軟化點或熔點若為90℃以下,則黏接劑組成物之玻璃轉移點下降,硬化前之黏接劑組成物在高溫域之彈性模數下降,硬化後之黏接劑組成物在常溫域(室溫)之彈性模數能提高。又,環氧樹脂若在反應溫度溶解,因反應快,故較理想。The softening point or melting point of the epoxy resin is preferably below 90°C. If the softening point or melting point of the epoxy resin is below 90°C, the glass transition point of the adhesive composition decreases, the elastic modulus of the adhesive composition before curing in the high temperature range decreases, and the elastic modulus of the adhesive composition after curing in the normal temperature range (room temperature) can be improved. In addition, it is more ideal if the epoxy resin is dissolved at the reaction temperature because the reaction is fast.
<<其他樹脂成分>> 樹脂組成物中,除了上述苯乙烯系彈性體、及適當含有之環氧樹脂,尚可在對於黏接劑組成物之功能不造成影響的程度內含有苯乙烯系彈性體以外之其他熱塑性樹脂。 <<Other resin components>> In addition to the above-mentioned styrene elastomer and the epoxy resin contained appropriately, the resin composition may contain other thermoplastic resins other than styrene elastomers to the extent that the functions of the adhesive composition are not affected.
上述其他熱塑性樹脂,例如:苯氧基樹脂、聚醯胺樹脂、聚酯樹脂、聚碳酸酯樹脂、聚苯醚樹脂、聚胺甲酸酯樹脂、聚縮醛樹脂、聚乙烯系樹脂、聚丙烯系樹脂及聚乙烯基系樹脂等。該等熱塑性樹脂可以單獨使用,也可將2種以上併用。The above-mentioned other thermoplastic resins include, for example, phenoxy resins, polyamide resins, polyester resins, polycarbonate resins, polyphenylene ether resins, polyurethane resins, polyacetal resins, polyethylene resins, polypropylene resins, and polyvinyl resins. These thermoplastic resins may be used alone or in combination of two or more.
<無機填料> 無機填料具有板狀或鱗片狀之形狀。 本發明之黏接劑組成物含有之無機填料之含量,相對於樹脂組成物100質量份為1~180質量份。 無機填料之含量相對於樹脂組成物100質量份若為30~175質量份則更理想。 無機填料之含量若為上述範圍內,則能控制機械特性為適度的範圍,能兼顧樹脂流動之防止及良好的密合性。 <Inorganic filler> The inorganic filler has a plate-like or scaly shape. The content of the inorganic filler contained in the adhesive composition of the present invention is 1 to 180 parts by mass relative to 100 parts by mass of the resin composition. It is more ideal if the content of the inorganic filler is 30 to 175 parts by mass relative to 100 parts by mass of the resin composition. If the content of the inorganic filler is within the above range, the mechanical properties can be controlled to a suitable range, and both the prevention of resin flow and good adhesion can be taken into account.
本發明之無機填料若具有板狀或鱗片狀之形狀則就種類而言無特殊限制,可因應目的而適當選擇,例如:考量耐熱性、介電特性之觀點,為矽系無機填料及氮化硼較佳。又,矽系無機填料之中,考量縱橫比之觀點,為天然雲母、合成雲母、天然滑石更佳,其中,考量吸水率之觀點,合成雲母又更佳。 它們可單獨使用,也可將2種以上組合使用。 本發明中,係使黏接劑組成物中含有特定之形狀之特定量之無機填料,由該黏接劑組成物形成黏接劑層。獲得之黏接劑層能防止熱壓接時之樹脂流動,成為呈現良好的電特性且密合性良好的黏接劑層。 If the inorganic filler of the present invention has a plate-like or scaly shape, there is no special restriction on the type, and it can be appropriately selected according to the purpose. For example, from the perspective of heat resistance and dielectric properties, silicon-based inorganic fillers and boron nitride are preferred. Moreover, among silicon-based inorganic fillers, natural mica, synthetic mica, and natural talc are preferred from the perspective of aspect ratio, and synthetic mica is preferred from the perspective of water absorption. They can be used alone or in combination of two or more. In the present invention, an inorganic filler of a specific shape and a specific amount is contained in the adhesive composition, and an adhesive layer is formed by the adhesive composition. The obtained adhesive layer can prevent the resin from flowing during hot pressing, and becomes an adhesive layer with good electrical properties and good adhesion.
本發明之無機填料之平均粒徑為3.0μm以下較佳。無機填料之平均粒徑可以利用例如雷射散射法來算出。又,針對無機填料之縱橫比,考量熱膨脹率(CTE)、薄膜強度之觀點,為5以上500以下較佳。The average particle size of the inorganic filler of the present invention is preferably 3.0 μm or less. The average particle size of the inorganic filler can be calculated by, for example, laser scattering method. In addition, the aspect ratio of the inorganic filler is preferably 5 or more and 500 or less in view of the coefficient of thermal expansion (CTE) and film strength.
[縱橫比之測定] 針對無機填料之縱橫比,例如可使用掃描型電子顯微鏡(SEM)或穿透型電子顯微鏡(TEM)觀察,從測定值之平均求得。例如,針對薄膜(層)中存在之無機填料之縱橫比,可將薄膜以環氧樹脂包埋後,使用離子研磨裝置進行薄膜剖面之離子研磨,製得剖面觀察用試樣,並使用掃描型電子顯微鏡(SEM)或穿透型電子顯微鏡(TEM)來觀察獲得之試樣之剖面,從無機填料之面方向之長度與厚度之測定值之平均求出。 [Determination of aspect ratio] For the aspect ratio of inorganic fillers, for example, a scanning electron microscope (SEM) or a transmission electron microscope (TEM) can be used to observe and obtain the aspect ratio from the average of the measured values. For example, for the aspect ratio of inorganic fillers present in a thin film (layer), the thin film can be embedded with epoxy resin, and then the thin film cross section can be ion-polished using an ion polishing device to obtain a sample for cross-section observation. The cross section of the obtained sample can be observed using a scanning electron microscope (SEM) or a transmission electron microscope (TEM), and the aspect ratio can be obtained from the average of the measured values of the length and thickness in the plane direction of the inorganic filler.
薄膜中之無機填料之含量為1~50體積%較佳。薄膜中之無機填料之含量為2~30體積%則更理想。 無機填料之含量若為上述下限以上,能夠防止黏接劑層之樹脂流動。無機填料之含量若為50體積%以下,則無機填料之分散性、耐熱性會更好。無機填料之含量若為30體積%以下,能確保良好的密合性。 The content of inorganic filler in the film is preferably 1~50 volume %. The content of inorganic filler in the film is more ideally 2~30 volume %. If the content of inorganic filler is above the above lower limit, the resin of the adhesive layer can be prevented from flowing. If the content of inorganic filler is below 50 volume %, the dispersibility and heat resistance of inorganic filler will be better. If the content of inorganic filler is below 30 volume %, good adhesion can be ensured.
<其他成分> 黏接劑組成物中,除了上述苯乙烯系彈性體、及無機填料以外,在對於黏接劑組成物之功能不造成影響之程度內可以含有例如:賦黏劑、阻燃劑、硬化劑、硬化促進劑、偶聯劑、抗熱老化劑、塗平劑、消泡劑、顏料、及溶劑等作為其他成分。 <Other ingredients> In addition to the above-mentioned styrene elastomer and inorganic filler, the adhesive composition may contain, for example, adhesives, flame retardants, hardeners, hardening accelerators, coupling agents, heat aging inhibitors, leveling agents, defoaming agents, pigments, and solvents as other ingredients to the extent that they do not affect the functions of the adhesive composition.
上述賦黏劑,例如:香豆酮-茚樹脂、萜烯樹脂、萜烯-酚醛樹脂、松香樹脂、對第三丁基苯酚-乙炔樹脂、苯酚-甲醛樹脂、二甲苯-甲醛樹脂、石油系烴樹脂、氫化烴樹脂、松節油系樹脂等。該等賦黏劑可單獨使用,也可將2種以上併用。The above-mentioned adhesives include, for example, coumarone-indene resins, terpene resins, terpene-phenolic resins, rosin resins, p-tert-butylphenol-acetylene resins, phenol-formaldehyde resins, xylene-formaldehyde resins, petroleum hydrocarbon resins, hydrogenated hydrocarbon resins, turpentine resins, etc. These adhesives may be used alone or in combination of two or more.
上述阻燃劑可含有有機系阻燃劑及無機系阻燃劑中之任意者。有機系阻燃劑,例如:磷酸三聚氰胺、聚磷酸三聚氰胺、磷酸胍、聚磷酸胍、磷酸銨、聚磷酸銨、磷酸醯胺銨、聚磷酸醯胺銨、磷酸胺甲酸酯、聚磷酸胺甲酸酯、參(二乙基次膦酸)鋁、參(甲基乙基次膦酸)鋁、參(二苯基次膦酸)鋁、雙(二乙基次膦酸)鋅、雙(甲基乙基次膦酸)鋅、雙(二苯基次膦酸)鋅、雙(二乙基次膦酸)氧鈦、肆(二乙基次膦酸)鈦、雙(甲基乙基次膦酸)氧鈦、肆(甲基乙基次膦酸)鈦、雙(二苯基次膦酸)氧鈦、肆(二苯基次膦酸)鈦等磷系阻燃劑;三聚氰胺、蜜白胺、三聚氰胺氰尿酸鹽等三𠯤系化合物、氰尿酸化合物、異氰尿酸化合物、三唑系化合物、四唑化合物、重氮化合物、尿素等氮系阻燃劑;聚矽氧化合物、矽烷化合物等矽系阻燃劑等。又,無機系阻燃劑可列舉氫氧化鋁、氫氧化鎂、氫氧化鋯、氫氧化鋇、氫氧化鈣等金屬氫氧化物;氧化錫、氧化鋁、氧化鎂、氧化鋯、氧化鋅、氧化鉬、氧化鎳等金屬氧化物;碳酸鋅、碳酸鎂、碳酸鋇、硼酸鋅、水合玻璃等。該等阻燃劑可將2種以上併用。The flame retardant may contain any of an organic flame retardant and an inorganic flame retardant. Organic flame retardants include, for example, melamine phosphate, melamine polyphosphate, guanidine phosphate, guanidine polyphosphate, ammonium phosphate, ammonium polyphosphate, ammonium phosphate amide, ammonium polyphosphate amide, phosphocarbamate, polyphosphocarbamate, aluminum tris(diethylphosphinate), aluminum tris(methylethylphosphinate), aluminum tris(diphenylphosphinate), zinc bis(diethylphosphinate), zinc bis(methylethylphosphinate), zinc bis(diphenylphosphinate), titanium bis(diethylphosphinate), tetrakis(tetrakis(diethylphosphinate), and tetrakis(tetrakis(diphenylphosphinate). Phosphorus-based flame retardants such as titanium (diethylphosphinate), titanium bis(methylethylphosphinate), titanium tetrakis(methylethylphosphinate), titanium bis(diphenylphosphinate), titanium tetrakis(diphenylphosphinate); nitrogen-based flame retardants such as melamine, melam, melamine cyanurate, cyanuric acid compounds, isocyanuric acid compounds, triazole compounds, tetrazole compounds, diazo compounds, urea, etc.; silicon-based flame retardants such as polysiloxane compounds and silane compounds, etc. Inorganic flame retardants include metal hydroxides such as aluminum hydroxide, magnesium hydroxide, zirconium hydroxide, barium hydroxide, and calcium hydroxide; metal oxides such as tin oxide, aluminum oxide, magnesium oxide, zirconium oxide, zinc oxide, molybdenum oxide, and nickel oxide; zinc carbonate, magnesium carbonate, barium carbonate, zinc borate, and hydrated glass. Two or more of these flame retardants may be used in combination.
上述硬化劑可列舉胺系硬化劑、酸酐系硬化劑等,但不限定於此等。胺系硬化劑,例如:甲基化三聚氰胺樹脂、丁基化三聚氰胺樹脂、苯胍胺樹脂等三聚氰胺樹脂、二氰二胺、4,4’-二苯基二胺基碸等。又,酸酐可列舉芳香族系酸酐、及脂肪族系酸酐。該等硬化劑可單獨使用,亦可併用2種以上。 硬化劑之含量相對於黏接劑組成物100質量份為0.5~100質量份較佳,5~70質量份更佳。 The above-mentioned hardeners include, but are not limited to, amine hardeners, acid anhydride hardeners, etc. Amine hardeners include, for example, methylated melamine resins, butylated melamine resins, benzoguanamine resins, melamine resins, dicyandiamide, 4,4'-diphenyldiamine, etc. Acid anhydrides include aromatic acid anhydrides and aliphatic acid anhydrides. These hardeners can be used alone or in combination of two or more. The content of the hardener is preferably 0.5 to 100 parts by mass, and more preferably 5 to 70 parts by mass, relative to 100 parts by mass of the adhesive composition.
上述硬化促進劑,係為了促進含羧基之苯乙烯系彈性體與環氧樹脂之反應而使用,可使用三級胺系硬化促進劑、三級胺鹽系硬化促進劑及咪唑系硬化促進劑等。 藉由添加上述硬化促進劑,能使反應快速進行,能在樹脂流出前便硬化,可有效防止樹脂流動。 The above-mentioned curing accelerator is used to promote the reaction between carboxyl-containing styrene elastomer and epoxy resin. Tertiary amine curing accelerator, tertiary amine salt curing accelerator and imidazole curing accelerator can be used. By adding the above-mentioned curing accelerator, the reaction can be carried out quickly, and the resin can be cured before it flows out, which can effectively prevent the resin from flowing.
三級胺系硬化促進劑可列舉苄基二甲胺、2-(二甲胺基甲基)苯酚、2,4,6-參(二甲胺基甲基)苯酚、四甲基胍、三乙醇胺、N,N’-二甲基哌𠯤、三乙二胺、1,8-二氮雜雙環[5.4.0]十一烯等。Examples of tertiary amine hardening accelerators include benzyldimethylamine, 2-(dimethylaminomethyl)phenol, 2,4,6-tris(dimethylaminomethyl)phenol, tetramethylguanidine, triethanolamine, N,N'-dimethylpiperidinium, triethylenediamine, and 1,8-diazabicyclo[5.4.0]undecene.
三級胺鹽系硬化促進劑可列舉1,8-二氮雜雙環[5.4.0]十一烯之甲酸鹽、辛酸鹽、對甲苯磺酸鹽、鄰苯二甲酸鹽、苯酚鹽或苯酚酚醛清漆樹脂鹽、1,5-二氮雜雙環[4.3.0]壬烯之甲酸鹽、辛酸鹽、對甲苯磺酸鹽、鄰苯二甲酸鹽、苯酚鹽或苯酚酚醛清漆樹脂鹽等。Examples of the tertiary amine salt-based hardening accelerator include 1,8-diazobicyclo[5.4.0]undecene formate, octanoate, p-toluenesulfonate, phthalate, phenol salt or phenol novolac resin salt, 1,5-diazobicyclo[4.3.0]nonene formate, octanoate, p-toluenesulfonate, phthalate, phenol salt or phenol novolac resin salt, etc.
咪唑系硬化促進劑可列舉2-甲基咪唑、2-十一基咪唑、2-十七基咪唑、1,2-二甲基咪唑、2-甲基-4-乙基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-十一基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-乙基-4’-甲基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]乙基-s-三𠯤異氰尿酸加成物、2-苯基咪唑異氰尿酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑等。該等硬化促進劑可單獨使用,亦可將2種以上併用。Imidazole hardening accelerators include 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-methyl-4-ethylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 2,4-diamino-6-[2'-methylimidazolyl-(1')]ethyl-s-triazine, 2,4-diamino-6-[2'-undecyl- 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]ethyl-s-triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, etc. These curing accelerators may be used alone or in combination of two or more.
黏接劑組成物含有硬化促進劑時,硬化促進劑之含量相對於黏接劑組成物100質量份為0.05~10質量份較佳,0.1~5質量份更佳。硬化促進劑之含量若為上述範圍內,則苯乙烯系彈性體與環氧樹脂之反應、環氧樹脂彼此之反應容易進行,容易確保黏接性及耐熱性。When the adhesive composition contains a hardening accelerator, the content of the hardening accelerator is preferably 0.05 to 10 parts by mass, and more preferably 0.1 to 5 parts by mass, relative to 100 parts by mass of the adhesive composition. If the content of the hardening accelerator is within the above range, the reaction between the styrene elastomer and the epoxy resin and the reaction between the epoxy resins are easy to proceed, and it is easy to ensure adhesion and heat resistance.
又,上述偶聯劑可列舉乙烯基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、3-脲丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、雙(三乙氧基矽丙基)四硫化物、3-異氰酸基丙基三乙氧基矽烷、咪唑矽烷等矽烷系偶聯劑;鈦酸鹽系偶聯劑;鋁酸鹽系偶聯劑;鋯系偶聯劑等。它們可以單獨使用,亦可將2種以上組合使用。In addition, the coupling agent may include silane-based coupling agents such as vinyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, p-phenylenetrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-acryloxypropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-ureidopropyltriethoxysilane, 3-butylpropylmethyldimethoxysilane, bis(triethoxysilyl)tetrasulfide, 3-isocyanatopropyltriethoxysilane, and imidazole silane; titanium-based coupling agents; aluminum-based coupling agents; zirconium-based coupling agents, and the like. They can be used individually or in combination of 2 or more.
上述熱老化防止劑可列舉2,6-二-第三丁基-4-甲基酚、正十八烷基-3-(3’,5’-二-第三丁基-4’-羥基苯基)丙酸酯、肆[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、新戊四醇肆[3-(3,5-二-第三丁基-4-羥基酚)]、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]等酚系氧化防止劑;二月桂基-3,3’-硫二丙酸酯、二肉豆蔻基-3,3’-二硫丙酸酯等硫系氧化防止劑;亞磷酸參壬基苯酯、亞磷酸參(2,4-二-第三丁基苯基)酯等磷系氧化防止劑等。此等可單獨使用,亦可將2種以上組合使用。Examples of the heat aging inhibitor include phenolic oxidation inhibitors such as 2,6-di-tert-butyl-4-methylphenol, n-octadecyl-3-(3',5'-di-tert-butyl-4'-hydroxyphenyl) propionate, tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate]methane, pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenol)], and triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl) propionate]; sulfur-based oxidation inhibitors such as dilauryl-3,3'-dithiodipropionate and dimyristyl-3,3'-dithiopropionate; phosphorus-based oxidation inhibitors such as tris-nonylphenyl phosphite and tris-(2,4-di-tert-butylphenyl) phosphite; and the like. These can be used individually or in combination of two or more.
<由黏接劑組成物構成之黏接劑層之特性> 由本發明之黏接劑組成物構成之黏接劑層,係藉由將黏接劑組成物成膜並硬化以形成。 硬化方法無特殊限定,可因應目的而適當選擇,例如:熱硬化等。 黏接劑層之厚度無特殊限制,可因應目的而適當選擇,例如考量薄膜化之觀點,3~100μm較佳,為了能確保密合力,5~70μm更佳,為了更精確地控制樹脂流動,10~50μm更理想。 <Characteristics of the adhesive layer composed of the adhesive composition> The adhesive layer composed of the adhesive composition of the present invention is formed by filming the adhesive composition and curing it. The curing method is not particularly limited and can be appropriately selected according to the purpose, such as thermal curing. The thickness of the adhesive layer is not particularly limited and can be appropriately selected according to the purpose. For example, from the perspective of thin filmization, 3~100μm is preferred, 5~70μm is more preferred to ensure the sealing force, and 10~50μm is more ideal to more accurately control the resin flow.
使本發明之黏接劑組成物硬化而成之黏接劑層之在頻率28GHz之相對介電常數(εr)為3.5以下,該黏接劑層之在頻率28GHz之介電正切(tanδ)為0.005以下。進而,相對介電常數為3.2以下且介電正切為0.002以下更理想。 若相對介電常數為3.5以下且介電正切為0.005以下,則即便是電特性之要求嚴格的FPC相關製品亦能適用。若相對介電常數為3.2以下且介電正切為0.002以下,則即使在高頻傳送時也能更減少衰減。 The relative dielectric constant (εr) of the adhesive layer formed by curing the adhesive composition of the present invention at a frequency of 28 GHz is 3.5 or less, and the dielectric tangent (tanδ) of the adhesive layer at a frequency of 28 GHz is 0.005 or less. Furthermore, it is more ideal that the relative dielectric constant is 3.2 or less and the dielectric tangent is 0.002 or less. If the relative dielectric constant is 3.5 or less and the dielectric tangent is 0.005 or less, it can be applied even to FPC-related products with strict requirements on electrical properties. If the relative dielectric constant is 3.2 or less and the dielectric tangent is 0.002 or less, attenuation can be further reduced even during high-frequency transmission.
[相對介電常數及介電正切] 黏接劑層之相對介電常數及介電正切,可使用網路分析儀MS46122B(Anritsu公司製)及開放型共振器Fabry-PerotDPS-03(KEYCOM公司製),以開放型共振器法,按溫度23℃、頻率28GHz之條件測定。 [Relative dielectric constant and dielectric tangent] The relative dielectric constant and dielectric tangent of the adhesive layer can be measured using a network analyzer MS46122B (manufactured by Anritsu) and an open-type resonator Fabry-Perot DPS-03 (manufactured by KEYCOM) using the open-type resonator method at a temperature of 23°C and a frequency of 28 GHz.
針對本發明之黏接劑組成物硬化後之黏接劑層之在25℃之貯藏彈性模數,考量疊層體時之密合力之觀點,為1.0E+8Pa以上較佳。又,該黏接劑組成物之硬化後黏接劑層之在25℃之貯藏彈性模數為1.0E+9Pa以下較佳。貯藏彈性模數若為上述範圍內,則能維持疊層體時之密合力。 針對本發明之黏接劑組成物之硬化前黏接劑層之在150℃之貯藏彈性模數,考量密合力之觀點,為1.0E+5Pa以上1.0E+8Pa以下較佳。又,考量對於被黏體表面之隨附性之觀點,1.0E+5Pa以上1.0E+7Pa以下更佳,考量樹脂流動之觀點,1.0E+6Pa以上1.0E+7Pa以下又更佳。 貯藏彈性模數若為上述範圍內,則能於熱壓接時控制機械特性,能兼顧樹脂流動與密合力,故為理想。 For the storage elastic modulus of the adhesive layer at 25°C after the adhesive composition of the present invention is cured, it is preferably 1.0E+8Pa or more from the perspective of the close adhesion when the laminate is stacked. In addition, the storage elastic modulus of the adhesive layer at 25°C after the adhesive composition is cured is preferably 1.0E+9Pa or less. If the storage elastic modulus is within the above range, the close adhesion when the laminate is stacked can be maintained. For the storage elastic modulus of the adhesive layer at 150°C before the adhesive composition of the present invention is cured, it is preferably 1.0E+5Pa or more and 1.0E+8Pa or less from the perspective of the close adhesion. In addition, considering the adhesion to the adherend surface, 1.0E+5Pa to 1.0E+7Pa is better, and considering the resin flow, 1.0E+6Pa to 1.0E+7Pa is even better. If the storage elastic modulus is within the above range, the mechanical properties can be controlled during heat pressing, and both resin flow and adhesion can be taken into account, so it is ideal.
[貯藏彈性模數(Pa)] 黏接劑層之貯藏彈性模數,例如可藉由針對由黏接劑層構成之試樣,製作厚度100μm之黏接劑薄膜,並使用黏彈性測定裝置(TA Instruments公司製RSA-G2,於測定頻率1Hz、升溫速度5℃/min之條件下,依JIS K7244進行測定以求出。 [Storage elastic modulus (Pa)] The storage elastic modulus of the adhesive layer can be obtained by, for example, preparing an adhesive film with a thickness of 100 μm for a sample composed of an adhesive layer, and measuring it using a viscoelasticity measuring device (RSA-G2 manufactured by TA Instruments, at a measuring frequency of 1 Hz and a heating rate of 5°C/min in accordance with JIS K7244.
使本發明之黏接劑組成物硬化而成之黏接劑層之熱膨脹率(CTE),宜為500ppm/K以下較佳。熱膨脹率若為上述值以下,則熱壓接時之變形少,故較理想。 熱膨脹率之測定,例如依使用熱機械分析裝置[Hitachi HitechScience公司製製品名:SII//SS7100]之拉伸模式,以負荷:50mN、升溫速度:5℃/min.之比例,從25℃以升溫速度:5℃/min之比例升溫到250℃,測定尺寸之溫度變化,並從25℃至125℃之範圍之斜率,求出線膨脹係數以進行。 The thermal expansion coefficient (CTE) of the adhesive layer formed by curing the adhesive composition of the present invention is preferably 500ppm/K or less. If the thermal expansion coefficient is below the above value, the deformation during heat pressing is small, which is more ideal. The thermal expansion coefficient is measured, for example, by using a thermomechanical analyzer [manufactured by Hitachi HitechScience: SII//SS7100] in a tensile mode, with a load of 50mN and a heating rate of 5℃/min., from 25℃ to 250℃, and measuring the temperature change of the size, and calculating the linear expansion coefficient from the slope of the range of 25℃ to 125℃.
<黏接劑層之製造方法> 可藉由將上述黏接劑組成物予以成膜以製造黏接劑層。上述黏接劑組成物可藉由將至少含有苯乙烯系彈性體之樹脂組成物、無機填料、及視需要之其他樹脂成分、其他成分予以混合以製造。混合方法不特別限定,只要黏接劑組成物成為均勻即可。黏接劑組成物宜以溶液或分散液之狀態使用,故通常也使用溶劑。 溶劑,例如:甲醇、乙醇、異丙醇、正丙醇、異丁醇、正丁醇、苯甲醇、乙二醇單甲醚、丙二醇單甲醚、二乙二醇單甲醚、二丙酮醇等醇類;丙酮、甲乙酮、甲基異丁基酮、甲基戊酮、環己酮、異佛爾酮等酮類;甲苯、二甲苯、乙基苯、均三甲苯等芳香族烴類;乙酸甲酯、乙酸乙酯、乙二醇單甲醚乙酸酯、3-甲氧基丁基乙酸酯等酯類;己烷、庚烷、環己烷、甲基環己烷等脂肪族烴類等。該等溶劑可單獨使用,亦可將2種以上組合使用。 黏接劑組成物若為含有溶劑之溶液或分散液(樹脂清漆),則對於基材薄膜之塗佈及黏接劑層之形成能夠順利進行,容易獲得期待厚度的黏接劑層。 黏接劑組成物含有溶劑時,考量包括黏接劑層之形成之作業性等觀點,固體成分濃度較佳為3~80質量%,更佳為10~50質量%之範圍。固體成分濃度若為80質量%以下,溶液之黏度適當,容易均勻地塗佈。 針對黏接劑層之製造方法之更具體的實施態樣,可藉由將含有上述黏接劑組成物及溶劑之樹脂清漆塗佈在基材薄膜之表面,形成樹脂清漆層後,將溶劑從該樹脂清漆層除去,以形成B階段狀之黏接劑層。在此,黏接劑層為B階段狀,係指黏接劑組成物為未硬化狀態或一部分開始硬化之半硬化狀態,利用加熱等則黏接劑組成物之硬化會進一步進行之狀態。 在此,樹脂清漆塗佈在基材薄膜上之方法無特殊限制、可因應目的適當選擇,例如:噴塗法、旋塗法、浸塗法、輥塗法、刀塗法、刮刀輥法、刮刀葉片法、簾塗法、狹縫塗佈法、網版印刷法、噴墨法、點膠法等。 可對於上述B階段狀之黏接劑層進一步施以加熱等並形成已硬化之黏接劑層。 <Method for producing adhesive layer> The adhesive layer can be produced by forming the above-mentioned adhesive composition into a film. The above-mentioned adhesive composition can be produced by mixing a resin composition containing at least a styrene-based elastomer, an inorganic filler, and other resin components and other components as required. The mixing method is not particularly limited as long as the adhesive composition becomes uniform. The adhesive composition is preferably used in the form of a solution or a dispersion, so a solvent is usually used. Solvents, such as: alcohols such as methanol, ethanol, isopropanol, n-propanol, isobutanol, n-butanol, benzyl alcohol, ethylene glycol monomethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, diacetone alcohol, etc.; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl amyl ketone, cyclohexanone, isophorone, etc.; aromatic hydrocarbons such as toluene, xylene, ethylbenzene, mesitylene, etc.; esters such as methyl acetate, ethyl acetate, ethylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, etc.; aliphatic hydrocarbons such as hexane, heptane, cyclohexane, methylcyclohexane, etc. These solvents may be used alone or in combination of two or more. If the adhesive composition is a solution or dispersion (resin varnish) containing a solvent, the coating of the substrate film and the formation of the adhesive layer can be carried out smoothly, and the adhesive layer of the expected thickness can be easily obtained. When the adhesive composition contains a solvent, the solid content concentration is preferably 3 to 80% by mass, and more preferably 10 to 50% by mass, taking into account the workability of the formation of the adhesive layer. If the solid content concentration is less than 80% by mass, the viscosity of the solution is appropriate and it is easy to apply evenly. A more specific implementation of the method for manufacturing the adhesive layer is to apply a resin varnish containing the above-mentioned adhesive composition and a solvent on the surface of the base film, and after forming the resin varnish layer, remove the solvent from the resin varnish layer to form a B-stage adhesive layer. Here, the adhesive layer is in the B-stage state, which means that the adhesive composition is in an uncured state or a semi-cured state where a part of the adhesive composition begins to cure, and the curing of the adhesive composition will further proceed by heating, etc. Here, the method of applying the resin varnish on the substrate film is not particularly limited and can be appropriately selected according to the purpose, such as spray coating, spin coating, dip coating, roller coating, knife coating, scraper roller method, scraper blade method, curtain coating, slit coating, screen printing, inkjet method, glue dispensing method, etc. The above-mentioned B-stage adhesive layer can be further heated to form a hardened adhesive layer.
(疊層體) 本發明之疊層體,具備:基材薄膜,及在該基材薄膜中之至少一表面之上述黏接劑層。 (Laminate) The laminate of the present invention comprises: a substrate film, and the above-mentioned adhesive layer on at least one surface of the substrate film.
<基材薄膜> 本發明使用之基材薄膜可從疊層體之用途選擇。例如:疊層體作為表覆層薄膜、覆銅疊層板(CCL)使用時,可列舉聚醯亞胺薄膜、聚醚醚酮薄膜、聚苯硫醚薄膜、芳香族聚醯胺薄膜、聚萘二甲酸乙二醇酯薄膜、及液晶聚合物薄膜等。該等之中,考量黏接性及電特性之觀點,聚醯亞胺薄膜、聚醚醚酮(PEEK)薄膜、聚萘二甲酸乙二醇酯薄膜、及液晶聚合物薄膜較佳。 <Base film> The base film used in the present invention can be selected from the purpose of the laminate. For example, when the laminate is used as a surface coating film or a copper-clad laminate (CCL), polyimide film, polyetheretherketone film, polyphenylene sulfide film, aromatic polyamide film, polyethylene naphthalate film, and liquid crystal polymer film can be listed. Among them, polyimide film, polyetheretherketone (PEEK) film, polyethylene naphthalate film, and liquid crystal polymer film are preferred from the perspective of adhesion and electrical properties.
又,本發明之疊層體作為黏合片使用時,基材薄膜需為脫模性薄膜,例如:聚對苯二甲酸乙二醇酯薄膜、聚乙烯薄膜、聚丙烯薄膜、聚矽氧脫模處理紙、聚烯烴樹脂塗佈紙、TPX(聚甲基戊烯)薄膜、及氟系樹脂薄膜等。Furthermore, when the laminate of the present invention is used as an adhesive sheet, the base film needs to be a release film, such as polyethylene terephthalate film, polyethylene film, polypropylene film, silicone release treated paper, polyolefin resin coated paper, TPX (polymethylpentene) film, and fluorine resin film.
本發明之疊層體作為遮蔽薄膜使用時,基材薄膜需為有電磁波遮蔽能力之薄膜,例如:保護絕緣層與金屬箔之疊層體等。When the laminate of the present invention is used as a shielding film, the base film must be a film with electromagnetic wave shielding capability, such as a laminate of a protective insulating layer and a metal foil.
(表覆層薄膜) 本發明之疊層體之一理想實施態樣可列舉表覆層薄膜。 製造FPC時,為了保護配線部分,通常,係使用具有稱為「表覆層薄膜」之黏接劑層之疊層體。此表覆層薄膜,具備:絕緣樹脂層及形成於其表面之黏接劑層。 例如:表覆層薄膜,係在上述基材薄膜之至少其中一表面形成了上述黏接劑層,且基材薄膜與黏接劑層之剝離一般而言係困難的疊層體。 表覆層薄膜中含有的基材薄膜之厚度為5~100μm較佳,5~50μm更佳,5~30μm更理想。基材薄膜之厚度若為上述上限以下,則能將表覆層薄膜予以薄膜化。基材薄膜之厚度若為上述下限以上,則能輕易設計印刷配線板,操作性亦佳。 製造表覆層薄膜之方法,例如:將含有上述黏接劑組成物及溶劑之樹脂清漆塗佈在上述基材薄膜之表面而形成樹脂清漆層後,將溶劑從該樹脂清漆層除去,以製造已形成B階段狀之黏接劑層之表覆層薄膜。 去除溶劑時之乾燥溫度,宜為40~250℃較佳,70~170℃更佳。 乾燥,可藉由將已塗佈黏接劑組成物之疊層體通過已實施熱風乾燥、遠紅外線加熱、及高頻感應加熱等之爐之中以進行。 又,視需要,為了保存等,也可在黏接劑層之表面疊層脫模性薄膜。脫模性薄膜可使用聚對苯二甲酸乙二醇酯薄膜、聚乙烯薄膜、聚丙烯薄膜、聚矽氧脫模處理紙、聚烯烴樹脂塗佈紙、TPX薄膜、氟系樹脂薄膜等公知品。本發明之表覆層薄膜,係使用低介電的本發明之黏接劑組成物,所以電子設備之高速傳送可進行,進而和電子設備之黏接安定性亦為優良。 (Surface coating film) One of the ideal implementation forms of the laminate of the present invention is a surface coating film. When manufacturing FPC, in order to protect the wiring part, a laminate having an adhesive layer called a "surface coating film" is usually used. This surface coating film has: an insulating resin layer and an adhesive layer formed on its surface. For example: the surface coating film is a laminate in which the above-mentioned adhesive layer is formed on at least one surface of the above-mentioned base film, and the base film and the adhesive layer are generally difficult to peel off. The thickness of the base film contained in the surface coating film is preferably 5~100μm, more preferably 5~50μm, and more preferably 5~30μm. If the thickness of the base film is below the upper limit, the surface coating film can be thinned. If the thickness of the base film is above the lower limit, the printed wiring board can be easily designed and the operability is also good. The method of manufacturing the surface coating film, for example: after applying the resin varnish containing the above-mentioned adhesive composition and the solvent on the surface of the above-mentioned base film to form a resin varnish layer, the solvent is removed from the resin varnish layer to manufacture a surface coating film having formed a B-stage adhesive layer. The drying temperature when removing the solvent is preferably 40~250℃, and more preferably 70~170℃. Drying can be performed by passing the laminated body coated with the adhesive composition through a furnace that has been subjected to hot air drying, far infrared heating, and high-frequency induction heating. In addition, if necessary, a release film can be laminated on the surface of the adhesive layer for preservation. The release film can use known products such as polyethylene terephthalate film, polyethylene film, polypropylene film, silicone release paper, polyolefin resin coated paper, TPX film, fluorine resin film, etc. The surface coating film of the present invention uses the low-dielectric adhesive composition of the present invention, so high-speed transmission of electronic equipment can be carried out, and the bonding stability with the electronic equipment is also excellent.
(黏合片) 本發明之疊層體之一理想實施態樣可列舉黏合片。 黏合片係脫模性薄膜(基材薄膜)之表面形成了上述黏接劑層者。又,黏合片亦可為在2片脫模性薄膜之間具備黏接劑層之態樣。使用黏合片時,係將脫模性薄膜剝離後使用。脫模性薄膜亦能使用和上述(表覆層薄膜)之欄位記載者為同樣者。 黏合片中含有的基材薄膜之厚度為5~100μm較佳,25~75μm更佳,38~50μm更理想。基材薄膜之厚度若為上述範圍內,則黏合片容易製造,操作性亦佳。 製造黏合片之方法,例如有在脫模性薄膜之表面塗佈含有上述黏接劑組成物及溶劑之樹脂清漆,再和上述表覆層薄膜的情形同樣地實施並乾燥之方法。 本發明之黏合片係使用低介電的本發明之黏接劑組成物,故電子設備之高速傳送係為可能,進而和電子設備之黏接安定性亦優良。 (Adhesive sheet) One of the ideal embodiments of the laminate of the present invention is an adhesive sheet. The adhesive sheet is a sheet having the above-mentioned adhesive layer formed on the surface of a release film (base film). In addition, the adhesive sheet may be a sheet having an adhesive layer between two release films. When using the adhesive sheet, the release film is peeled off before use. The release film may be the same as that described in the above-mentioned (surface coating film) field. The thickness of the base film contained in the adhesive sheet is preferably 5 to 100 μm, more preferably 25 to 75 μm, and more preferably 38 to 50 μm. If the thickness of the base film is within the above-mentioned range, the adhesive sheet is easy to manufacture and has good operability. The method of manufacturing the adhesive sheet includes, for example, coating a resin varnish containing the above-mentioned adhesive composition and a solvent on the surface of a release film, and then performing the same process as the above-mentioned surface coating film and drying. The adhesive sheet of the present invention uses the low-dielectric adhesive composition of the present invention, so high-speed transmission of electronic equipment is possible, and the bonding stability with the electronic equipment is also excellent.
(覆銅疊層板(CCL)) 本發明之疊層體之一理想實施態樣可列舉使銅箔貼合在本發明之疊層體中之黏接劑層而成之覆銅疊層板。 覆銅疊層板,係使用上述疊層體而貼合了銅箔,例如:按基材薄膜、黏接劑層及銅箔之順序構成。又,在基材薄膜之兩面可形成黏接劑層及銅箔。 本發明使用之黏接劑組成物,和含銅之物品間之黏接性亦優良。 本發明之覆銅疊層板係使用低介電的本發明之黏接劑組成物,故電子設備之高速傳送係為可能,且黏接安定性優異。 (Copper-clad laminate (CCL)) One ideal embodiment of the laminate of the present invention is to laminate copper foil to an adhesive layer in the laminate of the present invention to form a copper-clad laminate. The copper-clad laminate is formed by laminating copper foil using the laminate, for example, in the order of a substrate film, an adhesive layer, and a copper foil. In addition, an adhesive layer and a copper foil may be formed on both sides of the substrate film. The adhesive composition used in the present invention also has excellent adhesion to copper-containing articles. The copper-clad laminate of the present invention uses the low-dielectric adhesive composition of the present invention, so high-speed transmission of electronic equipment is possible and the bonding stability is excellent.
製造覆銅疊層板之方法,例如有使上述疊層體之黏接劑層與銅箔予以面接觸,於80℃~150℃進行熱層合,再利用後硬化將黏接劑層予以硬化之方法。後硬化之條件例如可為於不活潑氣體之氣體環境下於100℃~200℃進行30分鐘~4小時。又,上述銅箔不特別限定,可使用電解銅箔、壓延銅箔等。The method of manufacturing the copper-clad laminate includes, for example, bringing the adhesive layer of the laminate into surface contact with the copper foil, performing heat lamination at 80°C to 150°C, and then curing the adhesive layer by post-curing. The post-curing conditions may be, for example, 100°C to 200°C for 30 minutes to 4 hours in an inert gas environment. The copper foil is not particularly limited, and electrolytic copper foil, rolled copper foil, etc. may be used.
(印刷配線板) 本發明之疊層體之一理想實施態樣可列舉將銅配線貼合在本發明之疊層體中之黏接劑層而成之印刷配線板。 印刷配線板可藉由在上述覆銅疊層板形成電子電路以獲得。 印刷配線板,係使用上述疊層體而貼合了基材薄膜及銅配線,按基材薄膜、黏接層及銅配線之順序構成。又,也可在基材薄膜之兩面形成黏接層及銅配線。 例如:可藉由利用熱壓製等,在具有配線部分之面介隔黏接劑層貼附表覆層薄膜以製造印刷配線板。 本發明之印刷配線板係使用低介電的本發明之黏接劑組成物,故電子設備之高速傳送係為可能,進而和電子設備之黏接安定性亦優良。 製造本發明之印刷配線板之方法,例如有使上述疊層體之黏接劑層與銅配線予以接觸,於80℃~150℃進行熱層合,再利用後硬化將黏接劑層予以硬化之方法。後硬化之條件例如可為於100℃~200℃進行30分鐘~4小時。上述銅配線之形狀不特別限定,可因應需求選擇適當形狀等。 (Printed wiring board) One ideal embodiment of the laminate of the present invention is a printed wiring board formed by bonding copper wiring to an adhesive layer in the laminate of the present invention. The printed wiring board can be obtained by forming an electronic circuit on the above-mentioned copper-clad laminate. The printed wiring board is formed in the order of a base film, an adhesive layer and copper wiring by using the above-mentioned laminate. In addition, an adhesive layer and copper wiring can be formed on both sides of the base film. For example, a printed wiring board can be manufactured by bonding a surface coating film to a surface having a wiring portion via an adhesive layer by using hot pressing, etc. The printed wiring board of the present invention uses the low-dielectric adhesive composition of the present invention, so high-speed transmission of electronic equipment is possible, and the bonding stability with the electronic equipment is also excellent. The method of manufacturing the printed wiring board of the present invention includes, for example, making the adhesive layer of the above-mentioned laminated body contact with the copper wiring, performing heat lamination at 80°C~150°C, and then curing the adhesive layer by post-curing. The post-curing conditions can be, for example, 30 minutes to 4 hours at 100°C~200°C. The shape of the above-mentioned copper wiring is not particularly limited, and an appropriate shape can be selected according to needs.
(遮蔽薄膜) 本發明之疊層體之一理想實施態樣可列舉遮蔽薄膜。 遮蔽薄膜係為了截斷會影響電腦、行動電話、分析設備等各種電子設備並成為誤作動原因之電磁波雜訊,而用以遮蔽各種電子設備之薄膜。也稱為電磁波遮蔽薄膜。 電磁波遮蔽薄膜係例如按絕緣樹脂層、金屬層、及本發明之黏接劑層之順序疊層而成。 本發明之遮蔽薄膜係使用低介電的本發明之黏接劑組成物,故電子設備之高速傳送係為可能,進而和電子設備之黏接安定性亦優良。 (Shielding film) One of the ideal implementation forms of the laminate of the present invention is a shielding film. The shielding film is a film used to shield various electronic devices in order to cut off electromagnetic wave noise that may affect various electronic devices such as computers, mobile phones, and analytical equipment and become the cause of malfunction. It is also called an electromagnetic wave shielding film. The electromagnetic wave shielding film is formed by stacking, for example, an insulating resin layer, a metal layer, and an adhesive layer of the present invention in this order. The shielding film of the present invention uses the low-dielectric adhesive composition of the present invention, so high-speed transmission of electronic devices is possible, and the bonding stability with the electronic devices is also excellent.
(附遮蔽薄膜之印刷配線板) 本發明之疊層體之一理想實施態樣可列舉附遮蔽薄膜之印刷配線板。 附遮蔽薄膜之印刷配線板,係於基板之至少單面設有印刷電路之印刷配線板上貼附了上述電磁波遮蔽薄膜者。 附遮蔽薄膜之印刷配線板,例如具有:印刷配線板;和印刷配線板之設有印刷電路側之面相鄰之絕緣薄膜;及上述電磁波遮蔽薄膜。 本發明之附遮蔽薄膜之印刷配線板,係使用低介電的本發明之黏接劑組成物,故電子設備之高速傳送係為可能,進而和電子設備之黏接安定性亦優良。 [實施例] (Printed wiring board with shielding film) One of the ideal embodiments of the laminate of the present invention is a printed wiring board with shielding film. The printed wiring board with shielding film is a printed wiring board having a printed circuit on at least one side of a substrate, to which the above-mentioned electromagnetic wave shielding film is attached. The printed wiring board with shielding film, for example, comprises: a printed wiring board; an insulating film adjacent to the side of the printed wiring board having the printed circuit; and the above-mentioned electromagnetic wave shielding film. The printed wiring board with shielding film of the present invention uses the low-dielectric adhesive composition of the present invention, so that high-speed transmission of electronic equipment is possible, and further the bonding stability with the electronic equipment is also excellent. [Example]
以下舉實施例對於本發明進一步詳述,但本發明之範圍不限於該等實施例。又,下列中,若無特別指明,份及%係質量基準。The following examples are given to further describe the present invention, but the scope of the present invention is not limited to these examples. In addition, in the following, unless otherwise specified, parts and % are based on mass.
(含羧基之苯乙烯系彈性體) 使用旭化成(股)公司製之商品名「TUFTEC M1913」(馬來酸改性苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物)。此共聚物之酸價為10mgKOH/g,苯乙烯/乙烯丁烯比為30/70,重量平均分子量為67,000。 (含羧基之苯乙烯系彈性體) 使用旭化成(股)公司製之商品名「TUFTEC M1911」(馬來酸改性苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物)。此共聚物之酸價為2mgKOH/g,苯乙烯/乙烯丁烯比為30/70,重量平均分子量為69,000。 (不含羧基之苯乙烯系彈性體) 使用旭化成(股)公司製之商品名「TUFTEC P1500」(氫化苯乙烯系彈性體)。此共聚物之酸價為0mgKOH/g,苯乙烯/乙烯丁烯比為30/70,重量平均分子量為67,000。 (含胺基之苯乙烯系彈性體) 使用旭化成(股)公司製之商品名「TUFTEC MP10」(胺改性氫化苯乙烯-丁二烯共聚物(胺改性苯乙烯-乙烯丁烯-苯乙烯共聚物))。此共聚物之苯乙烯比為30,重量平均分子量為78,000。 (環氧樹脂) 使用DIC(股)公司製之商品名「HP-7200」(環氧樹脂、軟化點56-66℃)。 (環氧樹脂) 使用大賽璐(股)公司製之商品名「EPOFRIEND CT310」(苯乙烯-丁二烯嵌段共聚物之環氧化物)。此共聚物之苯乙烯/乙烯丁烯比為40/60,重量平均分子量為93,000,環氧當量為2125g/eq.。 (溶劑) 使用由甲苯及甲乙酮構成之混合溶劑(質量比=90:10)。 (基材薄膜) 使用信越聚合物公司製之「Shin-Etsu Sepla Film PEEK」(聚醚醚酮、厚度50μm)作為基材薄膜。 (電解銅箔) 使用三井金屬礦業製之「TQ-M7-VSP」(電解銅箔、厚度12μm、光澤面Rz1.27μm、光澤面Ra0.197μm、光澤面Rsm12.95μm)作為電解銅箔。光澤面之表面粗糙度,係使用雷射顯微鏡測定粗糙度曲線,並從粗糙度曲線依據JISB0601:2013(ISO4287:1997Amd.1:2009)求出之值。 (脫模薄膜) 使用PANAC公司製NP75SA(聚矽氧脫模PET薄膜、75μm)作為脫模薄膜。 (填料) 使用下列記載之填料作為填料。 MK-100DS MICROMICA(雲母)(Katakura&Co-opAgri(股)公司製)縱橫比27.5 UHP-S2 六方晶氮化硼(昭和電工(股)公司製)縱橫比6 MX-300 壓克力粒子(總研化學(股)公司製) SQ-C8 二氧化矽(Admatechs(股)公司製) MC6000 三聚氰胺異氰尿酸酯(日產化學(股)公司製) (Carboxyl-containing styrene elastomer) Used the product name "TUFTEC M1913" (maleic acid-modified styrene-ethylene butylene-styrene block copolymer) manufactured by Asahi Kasei Corporation. The acid value of this copolymer is 10 mgKOH/g, the styrene/ethylene butylene ratio is 30/70, and the weight average molecular weight is 67,000. (Carboxyl-containing styrene elastomer) Used the product name "TUFTEC M1911" (maleic acid-modified styrene-ethylene butylene-styrene block copolymer) manufactured by Asahi Kasei Corporation. The acid value of this copolymer is 2 mgKOH/g, the styrene/ethylene butylene ratio is 30/70, and the weight average molecular weight is 69,000. (Carboxyl-free styrene elastomer) Used the product name "TUFTEC P1500" (hydrogenated styrene elastomer) manufactured by Asahi Kasei Corporation. The acid value of this copolymer is 0 mgKOH/g, the styrene/ethylene butylene ratio is 30/70, and the weight average molecular weight is 67,000. (Amino-containing styrene elastomer) The product name "TUFTEC MP10" (amine-modified hydrogenated styrene-butadiene copolymer (amine-modified styrene-ethylene butylene-styrene copolymer) manufactured by Asahi Kasei Corporation was used. The styrene ratio of this copolymer is 30, and the weight average molecular weight is 78,000. (Epoxy resin) The product name "HP-7200" (epoxy resin, softening point 56-66°C) manufactured by DIC Corporation was used. (Epoxy resin) The product name "EPOFRIEND CT310" (epoxide of styrene-butadiene block copolymer) manufactured by Daicell Corporation was used. The copolymer has a styrene/ethylene butene ratio of 40/60, a weight average molecular weight of 93,000, and an epoxy equivalent of 2125 g/eq. (Solvent) A mixed solvent consisting of toluene and methyl ethyl ketone (mass ratio = 90:10) was used. (Base film) "Shin-Etsu Sepla Film PEEK" (polyetheretherketone, thickness 50μm) manufactured by Shin-Etsu Polymer Co., Ltd. was used as the base film. (Electrolytic copper foil) "TQ-M7-VSP" (electrolytic copper foil, thickness 12μm, glossy surface Rz 1.27μm, glossy surface Ra 0.197μm, glossy surface Rsm 12.95μm) manufactured by Mitsui Mining and Co., Ltd. was used as the electrolytic copper foil. The surface roughness of the glossy surface is the value obtained from the roughness curve measured using a laser microscope in accordance with JIS B0601: 2013 (ISO 4287: 1997 Amd. 1: 2009). (Release film) NP75SA (polysilicone release PET film, 75 μm) manufactured by PANAC was used as the release film. (Filler) The fillers listed below were used as the fillers. MK-100DS MICROMICA (mica) (made by Katakura & Co-op Agri) aspect ratio 27.5 UHP-S2 hexagonal boron nitride (made by Showa Denko) aspect ratio 6 MX-300 acrylic particles (made by Soken Chemical) SQ-C8 silica (made by Admatechs) MC6000 melamine isocyanurate (made by Nissan Chemical)
(實施例1) 按表1之比例含有表1所示之構成樹脂組成物之各成分,並製作樹脂組成物。 然後,按表2所示之比例含有表2所示之構成黏接劑層之各成分,將此等成分溶於溶劑,製作固體成分濃度為20質量%之樹脂清漆。 使用之填料之形狀及平均粒徑示於表2。 對於基材薄膜之表面進行電暈處理。 將該樹脂清漆塗佈在基材薄膜之表面,於110℃之烘箱使其乾燥4分鐘,使甲苯揮發,以形成黏接劑層,獲得附黏接劑之基材薄膜。以黏接劑疊層體之黏接劑層接觸電解銅箔之光澤面之方式進行重疊,於120℃實施熱層合,獲得硬化前黏接劑疊層體。將硬化前黏接劑疊層體以180℃、3MPa的條件壓製3分鐘,之後於180℃進行30分鐘後硬化,以將黏接劑層硬化,獲得硬化後黏接劑疊層體。 測定實施例1之硬化後黏接劑疊層體之電解銅箔與基材薄膜間之密合力(N/cm)。 (Example 1) The components constituting the resin composition shown in Table 1 are contained in the proportions shown in Table 1, and a resin composition is prepared. Then, the components constituting the adhesive layer shown in Table 2 are contained in the proportions shown in Table 2, and these components are dissolved in a solvent to prepare a resin varnish having a solid component concentration of 20 mass%. The shape and average particle size of the filler used are shown in Table 2. The surface of the substrate film is subjected to a corona treatment. The resin varnish is applied to the surface of the substrate film and dried in an oven at 110°C for 4 minutes to volatilize toluene to form an adhesive layer, thereby obtaining a substrate film with an adhesive. The adhesive layer of the adhesive laminate is laminated in such a way that it contacts the glossy surface of the electrolytic copper foil, and heat lamination is performed at 120°C to obtain a pre-cured adhesive laminate. The pre-cured adhesive laminate is pressed at 180°C and 3MPa for 3 minutes, and then post-cured at 180°C for 30 minutes to cure the adhesive layer and obtain a post-cured adhesive laminate. The adhesion (N/cm) between the electrolytic copper foil and the substrate film of the post-cured adhesive laminate of Example 1 is measured.
[密合力(N/cm)] 針對密合力,係將硬化後黏接劑疊層體裁切成寬25mm之試驗體,按照JIS Z0237:2009(黏貼帶・黏著片試驗方法),以剝離速度0.3m/分、剝離角180°,測定從固定在支持體之附黏接劑之基材薄膜剝離電解銅箔時之剝離強度,以測出密合力。 [Adhesion (N/cm)] For adhesion, the cured adhesive layer was cut into a test piece with a width of 25 mm. According to JIS Z0237:2009 (Testing methods for adhesive tapes and adhesive sheets), the peeling speed was 0.3 m/min and the peeling angle was 180°. The peeling strength was measured when the electrolytic copper foil was peeled off from the base film with adhesive fixed on the support to measure the adhesion.
再者,也測定硬化後之在25℃及硬化前之在150℃之貯藏彈性模數(Pa)。Furthermore, the storage elastic modulus (Pa) at 25°C after curing and at 150°C before curing was also measured.
[貯藏彈性模數(Pa)] 黏接劑層之貯藏彈性模數,係針對由黏接劑層構成之試樣,製作厚度100μm之黏接劑薄膜,使用黏彈性測定裝置(TA Instruments公司製RSA-G2,按測定頻率1Hz、升溫速度5℃/min之條件依照JIS K7244進行測定。測定試樣,係將樹脂清漆輥塗於脫模薄膜上,然後將此附塗膜之薄膜於烘箱內靜置,於110℃使其乾燥4分鐘,形成B階段狀之黏接劑層(厚度50μm)。然後將此黏接劑層以黏接面彼此接觸的方式於120℃進行熱層合,形成硬化前黏接劑薄膜(厚度100μm),製成硬化前黏接劑薄膜(100mm×100mm)。從黏接劑薄膜將脫模薄膜剝離,並測定硬化前黏接劑層之貯藏彈性模數(Pa)。 又,將硬化前黏接劑薄膜(厚度100μm)於烘箱內靜置,於150℃進行60分鐘加熱硬化處理,製作硬化後黏接劑薄膜(100mm×100mm)。從黏接劑薄膜將脫模薄膜剝離,測定硬化後黏接劑層之貯藏彈性模數(Pa)。 [Storage elastic modulus (Pa)] The storage elastic modulus of the adhesive layer is measured by making a 100μm thick adhesive film for a sample composed of an adhesive layer using a viscoelasticity measuring device (RSA-G2 manufactured by TA Instruments, with a measurement frequency of 1Hz and a heating rate of 5℃/min in accordance with JIS K7244 was used for the measurement. The test sample was coated with a resin varnish roll on a release film, and then the coated film was placed in an oven and dried at 110°C for 4 minutes to form a B-stage adhesive layer (50μm thick). The adhesive layer was then thermally laminated at 120°C with the bonding surfaces in contact with each other to form a pre-curing adhesive film (100μm thick) to produce a pre-curing adhesive film (100mm×100mm). The release film was peeled off from the adhesive film, and the storage elastic modulus (Pa) of the pre-curing adhesive layer was measured. In addition, the uncured adhesive film (thickness 100μm) was placed in an oven and heat-cured at 150℃ for 60 minutes to produce a cured adhesive film (100mm×100mm). The release film was peeled off from the adhesive film, and the storage elastic modulus (Pa) of the cured adhesive layer was measured.
針對實施例1之硬化後黏接劑疊層體中之黏接劑層,亦測定在頻率28GHz之相對介電常數、及介電正切。The relative dielectric constant and dielectric tangent of the adhesive layer in the cured adhesive stack of Example 1 were also measured at a frequency of 28 GHz.
[相對介電常數及介電正切] 黏接劑層之相對介電常數及介電正切,可使用網路分析儀MS46122B(Anritsu公司製)及開放型共振器Fabry-PerotDPS-03(KEYCOM公司製),以開放型共振器法,按溫度23℃、頻率28GHz之條件測定。測定試樣,係將樹脂清漆輥塗在脫模薄膜上,然後將此附塗膜之薄膜於烘箱內靜置,於110℃使其乾燥4分鐘,形成B階段狀之黏接劑層(厚度50μm)。然後將此黏接劑層以黏接面彼此接觸的方式於120℃進行熱層合,形成硬化前黏接劑薄膜(厚度100μm)。將此硬化前黏接劑薄膜(厚度100μm)於烘箱內靜置,於150℃進行60分鐘加熱硬化處理,而製得硬化後黏接劑薄膜(100mm×100mm)。從硬化後黏接劑薄膜將脫模薄膜剝離,並測定黏接劑層之相對介電常數及介電正切。 [Relative dielectric constant and dielectric tangent] The relative dielectric constant and dielectric tangent of the adhesive layer can be measured by the open resonator method at a temperature of 23°C and a frequency of 28 GHz using a network analyzer MS46122B (manufactured by Anritsu) and an open resonator Fabry-Perot DPS-03 (manufactured by KEYCOM). The test sample is a resin varnish roll applied to a release film, and then the film with the film is placed in an oven and dried at 110°C for 4 minutes to form a B-stage adhesive layer (thickness 50μm). This adhesive layer is then thermally laminated at 120°C with the bonding surfaces in contact with each other to form a pre-cured adhesive film (thickness 100μm). The uncured adhesive film (thickness 100μm) was placed in an oven and heated and cured at 150℃ for 60 minutes to obtain a cured adhesive film (100mm×100mm). The release film was peeled off from the cured adhesive film, and the relative dielectric constant and dielectric tangent of the adhesive layer were measured.
針對實施例1之硬化後黏接劑疊層體中之黏接劑層,亦測定在30~50℃之熱膨脹率(CTE)。The thermal expansion coefficient (CTE) of the adhesive layer in the adhesive stack after curing in Example 1 was also measured at 30-50°C.
[熱膨脹率(CTE)] 熱膨脹率之測定,例如依使用熱機械分析裝置[HitachiHitechScience公司製製品名:SII//SS7100]之拉伸模式,以負荷:50mN、升溫速度:5℃/min.之比例,從25℃以升溫速度:5℃/min之比例升溫到250℃,測定尺寸之溫度變化,並從30℃至50℃之範圍之斜率,求出線膨脹係數以進行。 [Thermal expansion coefficient (CTE)] The thermal expansion coefficient is measured, for example, by using a thermomechanical analyzer [manufactured by Hitachi Hitech Science: SII//SS7100] in a tensile mode, with a load of 50 mN and a heating rate of 5°C/min., from 25°C to 250°C, and measuring the temperature change of the dimensions, and calculating the linear expansion coefficient from the slope in the range of 30°C to 50°C.
針對實施例1之硬化後黏接劑疊層體,實施焊料耐熱試驗。A solder heat resistance test was performed on the cured adhesive stack of Example 1.
[焊料耐熱試驗] 焊料耐熱試驗,係使基材薄膜面朝上,將硬化後黏接劑疊層體在288℃之焊料浴漂浮10秒×3次,確認黏接劑層是否有膨起、剝離等外觀異常。 依下列評價基準,評價疊層體之耐熱性。 ◎無異常(亦無溶解)。 ○最終無異常,但試驗中觀察到黏接劑層軟化。 △未剝離,但黏接劑層軟化而出現「斑點」。 ×剝離。 [Solder heat resistance test] The solder heat resistance test is to float the cured adhesive layer in a 288°C solder bath for 10 seconds x 3 times with the substrate film facing up to check whether the adhesive layer has any appearance abnormalities such as swelling or peeling. The heat resistance of the laminate is evaluated according to the following evaluation criteria. ◎ No abnormality (no dissolution). ○ No abnormality in the end, but softening of the adhesive layer was observed during the test. △ No peeling, but the adhesive layer softened and "spots" appeared. × Peeling.
對於實施例1之疊層體,實施疊層體製作時之黏接劑層之樹脂流動試驗。For the laminate of Example 1, a resin flow test of the adhesive layer during the manufacture of the laminate was performed.
[樹脂流動試驗] 樹脂流動試驗,係將附黏接劑之基材薄膜裁切成30mm×90mm的大小,使用皮帶沖孔機開出3處直徑5mm的孔穴。以附黏接劑之基材薄膜的黏接劑層和電解銅箔之光澤面接觸的方式進行重疊,於150℃進行熱層合,以180℃、3MPa的條件壓製3分鐘,以顯微鏡[KEYENCE公司製、製品名:DIGITAL MICROSCOPE VHX-500、透鏡倍率:300倍](4點×3處)測定12點銅箔溢出之樹脂之長度,記載平均值。 [Resin flow test] The resin flow test is to cut the base film with adhesive into a size of 30mm×90mm, and use a belt punch to punch 3 holes with a diameter of 5mm. The adhesive layer of the base film with adhesive and the glossy surface of the electrolytic copper foil are overlapped in contact, and heat-laminated at 150℃. Pressed at 180℃ and 3MPa for 3 minutes, the length of the resin overflowing from the copper foil at 12 points is measured with a microscope [made by KEYENCE, product name: DIGITAL MICROSCOPE VHX-500, lens magnification: 300 times] (4 points×3 points), and the average value is recorded.
各測定結果示於表3。The test results are shown in Table 3.
(實施例2~實施例11) 實施例1中之構成黏接劑層之成分之種類及摻合量按表1及表2所示變更,除此以外和實施例1同樣進行,製作實施例2~實施例11之疊層體。 對於製作之疊層體實施和實施例1同樣的評價。 結果示於表3。 (Example 2 to Example 11) The types and blending amounts of the components constituting the adhesive layer in Example 1 were changed as shown in Tables 1 and 2, and the laminates of Example 2 to Example 11 were prepared in the same manner as in Example 1. The prepared laminates were evaluated in the same manner as in Example 1. The results are shown in Table 3.
(比較例1~比較例8) 實施例1中之構成黏接劑層之成分之種類及摻合量按表1及表2所示變更,除此以外和實施例1同樣進行,製作比較例1~比較例8之疊層體。對於製作之疊層體實施和實施例1同樣的評價。 結果示於表3。 (Comparative Example 1 to Comparative Example 8) The types and blending amounts of the components constituting the adhesive layer in Example 1 were changed as shown in Tables 1 and 2. The same procedures as in Example 1 were followed to prepare the laminates of Comparative Example 1 to Comparative Example 8. The prepared laminates were evaluated in the same manner as in Example 1. The results are shown in Table 3.
[表1]
[表2]
[表3]
具有由本發明之黏接劑組成物構成之黏接劑層之疊層體,適合用於製造智慧手機、行動電話、光模組、數位照相機、遊戲機、筆記電腦、醫療器具等電子設備用之FPC相關製品。The laminate having the adhesive layer composed of the adhesive composition of the present invention is suitable for manufacturing FPC-related products for electronic equipment such as smart phones, mobile phones, optical modules, digital cameras, game consoles, notebook computers, medical devices, etc.
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