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TWI848792B - Light source system - Google Patents

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TWI848792B
TWI848792B TW112130168A TW112130168A TWI848792B TW I848792 B TWI848792 B TW I848792B TW 112130168 A TW112130168 A TW 112130168A TW 112130168 A TW112130168 A TW 112130168A TW I848792 B TWI848792 B TW I848792B
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light source
reflector
homogenizer
xenon lamp
driving device
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TW112130168A
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TW202507195A (en
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柯歷亞
廖華賢
林啟清
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光焱科技股份有限公司
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Priority to CN202311114355.9A priority patent/CN119468095A/en
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Abstract

一種光源系統,其包括:一氙氣燈;一橢圓反射鏡;一第一平面反射鏡;一均光器;一第二平面反射鏡;一光學透鏡;一電源供應器;一光圈;一光電感測器;一第一驅動裝置,其係與該氙氣燈或該橢圓反射鏡連接;一第二驅動裝置,其係與該光圈連接;以及一控制裝置,其係與該光電感測器、該電源供應器、該第一驅動裝置以及該第二驅動裝置連接;其中,該控制裝置係根據該光電感測器所感測之模擬光源之性質來控制該電源供應器、該第一驅動裝置以及該第二驅動裝置。本發明之光源系統係適用於提供強度、穩定度、均勻度及光譜與太陽光相近之模擬光源。 A light source system includes: a xenon lamp; an elliptical reflector; a first plane reflector; a homogenizer; a second plane reflector; an optical lens; a power supply; an aperture; a photo sensor; a first drive device connected to the xenon lamp or the elliptical reflector; a second drive device connected to the aperture; and a control device connected to the photo sensor, the power supply, the first drive device and the second drive device; wherein the control device controls the power supply, the first drive device and the second drive device according to the properties of the analog light source sensed by the photo sensor. The light source system of the present invention is suitable for providing a simulated light source with intensity, stability, uniformity and spectrum similar to that of sunlight.

Description

光源系統 Light source system

本發明係關於一種光源系統,尤指一種包含控制裝置的光源系統。 The present invention relates to a light source system, in particular to a light source system including a control device.

全球氣候變遷已成為人類生存的危機,因此世界各國對於綠色能源的發展不遺餘力,太陽能發電更扮演著核心的角色。矽基太陽能電池的技術發展已臻成熟,其光電轉換效率要再進一步提升已面臨瓶頸。所以,目前大多數科學家與研發人員的工作重心都放在發展光電轉換效率更高的新型太陽能電池,例如:鈣鈦礦-晶矽疊層太陽能電池、多結電池均屬之。 Global climate change has become a crisis for human survival, so countries around the world are making every effort to develop green energy, and solar power generation plays a core role. The technology of silicon-based solar cells has matured, and its photoelectric conversion efficiency has reached a bottleneck. Therefore, most scientists and researchers are currently focusing on developing new solar cells with higher photoelectric conversion efficiency, such as calcium-titanium-crystalline silicon stacked solar cells and multi-junction cells.

當太陽能電池的型態從「單結」電池演進成「疊層」、「多結」電池時,因應測試條件的要求,對於可提供完美AM1.5G光譜以及光譜可調的太陽光模擬器的需求與日俱增,並逐漸成為必要條件。 As the type of solar cells evolves from "single junction" cells to "stacked" and "multi-junction" cells, the demand for solar simulators that can provide perfect AM1.5G spectrum and adjustable spectrum is increasing day by day in response to the requirements of test conditions, and gradually becomes a necessary condition.

對於太陽光模擬器的品質規範,IEC 60904為世界公認的國際標準。IEC 60904規範了評價太陽光模擬器品質的三項指標,即「空間輻照均勻度」、「輻照光強穩定度」與「光譜致合度」,這三項指標我們也常簡稱為「光均」、「光穩」、「光譜」。 IEC 60904 is a world-recognized international standard for the quality of solar simulators. IEC 60904 specifies three indicators for evaluating the quality of solar simulators, namely "spatial irradiance uniformity", "irradiance intensity stability" and "spectral consistency". These three indicators are often referred to as "light uniformity", "light stability" and "spectrum".

放眼現今市售各廠牌太陽光模擬器,若是採用單一種氙燈燈泡作為光源的產品,其最佳光均、光穩、光譜性能水準多半落在AAA等級,若要 做到A+等級,尤其是「光譜致合度」這項指標,現有技術之單一種氙燈燈泡目前無一能達成此項標準。 Looking at the solar simulators of various brands currently on the market, if a single xenon lamp is used as the light source, the best light uniformity, light stability, and spectral performance level are mostly at the AAA level. If it is to achieve the A+ level, especially the "spectral consistency" indicator, none of the single xenon lamp bulbs with existing technology can currently meet this standard.

為了讓光譜致合度達到A+(甚至優於A+)的水準,以滿足對於疊層、多結太陽能電池量測的要求,許多廠商轉而發展「多燈」系統,藉由組合兩個以上不同波長範圍的光源,加以截長補短或用波長拼湊的方式,使光譜致合度可以達到或優於A+的水準。 In order to achieve spectral matching of A+ (or even better than A+) and meet the requirements for measuring stacked and multi-junction solar cells, many manufacturers have turned to developing "multi-light" systems. By combining two or more light sources with different wavelength ranges, cutting off the strengths to make up for the weaknesses or using wavelength splicing, the spectral matching can reach or exceed the A+ level.

無論是雙燈(氙燈+鹵燈)太陽光模擬器或是LED太陽光模擬器,都屬於「多燈」的光源系統。多燈系統的光譜雖然可調,但是各燈源的使用壽命(Lifetime)不一致,導致系統無可避免的需要經常校準。 Whether it is a dual-lamp (xenon lamp + halogen lamp) solar simulator or an LED solar simulator, it belongs to a "multi-lamp" light source system. Although the spectrum of the multi-lamp system is adjustable, the service life of each light source is inconsistent, resulting in the system inevitably needing frequent calibration.

以雙燈系統(氙燈+鹵燈)為例:用於太陽能電池的量測,其光源必須滿足IEC 60904的規範,光強必須達到一個太陽光強度(1 sun)以上,即1000W/m2以上,才能滿足STC測試條件。根據實際統計,鹵燈(QTH)的可用時數不到50小時,一旦超過50小時,雖然燈泡還會亮但是已無法讓雙燈系統的輻照光強達到1000W/m2的標準,故需頻繁更換新燈。 Take the dual-lamp system (xenon lamp + halogen lamp) as an example: for the measurement of solar cells, its light source must meet the specifications of IEC 60904, and the light intensity must reach one solar light intensity (1 sun), that is, 1000W/ m2 or more, to meet the STC test conditions. According to actual statistics, the usable hours of halogen lamps (QTH) are less than 50 hours. Once it exceeds 50 hours, although the bulb will still light up, it is no longer possible for the dual-lamp system to reach the 1000W/ m2 standard of irradiation intensity, so new lamps need to be replaced frequently.

再以LED光源系統為例:隨然LED光源的壽命時數號稱「數以萬計」,但是,這是在適當的結點溫度(Tj)前提條件下才能達到,例如:Tj<85℃或Tj<105℃。一旦使用條件造成Tj過高,LED的壽命將會快速衰退,甚至燒毀(burn-out),這也是LED光源系統必須為LED燈板配置冷卻模組的原因。我們測試了許多市售型LED太陽光模擬器,均宣稱其輻照光強規格大於1.2 sun(即大於1200W/m2),但是我們發現:不到1500小時,其最大光強就已經無法超過1000W/m2了。若要符合IEC 光強規範,就需要超載(over-drive)使用LED燈珠,這無疑更惡化了LED光源的使用條件,提升了Tj過高的風險。 Take the LED light source system as an example: Although the life of LED light sources is said to be "tens of thousands of hours", this can only be achieved under the premise of appropriate junction temperature (Tj), such as: Tj < 85℃ or Tj < 105℃. Once the use conditions cause Tj to be too high, the life of the LED will decline rapidly, or even burn out. This is why the LED light source system must be equipped with a cooling module for the LED light panel. We tested many commercially available LED solar simulators, all of which claimed that their irradiance intensity specifications were greater than 1.2 sun (i.e. greater than 1200W/ m2 ), but we found that: less than 1500 hours, their maximum light intensity could not exceed 1000W/ m2 . To comply with IEC light intensity regulations, LED lamp beads need to be overdriven, which undoubtedly worsens the operating conditions of LED light sources and increases the risk of excessive Tj.

再者,LED光源系統是由許多不同波長的LED燈珠組合起來的,簡而言之,RGB LED燈珠的老化速度各自不同,點燈後就必須面臨衰退速度各有不同的動態變化,從許多的使用經驗發現,其長時(long term)光譜穩定度不佳。 Furthermore, the LED light source system is composed of many LED lamp beads of different wavelengths. In short, the aging speed of RGB LED lamp beads is different. After lighting, they must face different dynamic changes in the decay speed. From many usage experiences, it is found that its long-term spectral stability is not good.

最後,透過市場調查,當LED光源/燈板性能衰退時,維修單顆燈珠的難度很高,只能整組更換,而且,LED光源/燈板的成本比重占整個LED模擬器系統的40%~50%,導致使用者需擔負極高的成本壓力。 Finally, through market research, when the performance of LED light sources/lamp panels declines, it is very difficult to repair a single lamp bead, and the entire set can only be replaced. In addition, the cost of LED light sources/lamp panels accounts for 40%~50% of the entire LED simulator system, resulting in users having to bear extremely high cost pressure.

由此可知,雙燈系統太陽光模擬器與LED光源系統太陽光模擬器各自有其無法克服的產品弱點。因此,有開發一種新穎之光源系統以解決上述問題之需求。 From this, we can see that the dual-lamp system solar simulator and the LED light source system solar simulator each have their own insurmountable product weaknesses. Therefore, there is a need to develop a novel light source system to solve the above problems.

本發明所要解決的技術問題在於,針對現有技術的不足提供一種光源系統。 The technical problem to be solved by the present invention is to provide a light source system to address the deficiencies of the existing technology.

本發明創新之處在於,利用光學元件上的鍍膜設計,使得光學元件的反射、透射的光譜會隨著入射光角度的不同而產生顯著變化,進而達到使用單一燈泡光源,調整光學元器件的空間位置與角度,改變太陽光模擬器輸出的光譜。 The innovation of this invention lies in that the coating design on the optical element makes the reflected and transmitted spectrum of the optical element change significantly with the different angles of the incident light, thereby achieving the use of a single bulb light source, adjusting the spatial position and angle of the optical element, and changing the spectrum output by the solar simulator.

雖然反射率光譜會隨著入射角度而變化是已知的現象.而應採用何種鍍膜材質與光學光路設計、光學元器件選擇、光學元器件空間位置與角 度的控制範圍等,有無限多種可能性,非顯而易見的設計與組合可以達到3A太陽光模擬器光源輸出表現的要求(IEC 60904-9:2017;光強度1000W/m2,空間均勻度<2%,光強不穩定<1%;光譜可達到IEC 60904-3的匹配度)。 Although it is known that the reflectivity spectrum changes with the angle of incidence, there are infinite possibilities for what coating material and optical path design to use, the selection of optical components, the control range of the spatial position and angle of optical components, etc. Non-obvious designs and combinations can achieve the requirements of 3A solar simulator light source output performance (IEC 60904-9:2017; light intensity 1000W/ m2 , spatial uniformity <2%, light intensity instability <1%; spectrum can achieve IEC 60904-3 matching).

如圖1所示,利用不同入射角度其穿透光譜產生變化的現象(可用於本案中的均光器與光學透鏡),用於太陽光模擬器的設計,來達到單光源-光譜可調的創新裝置。 As shown in Figure 1, the phenomenon that the transmitted spectrum changes at different incident angles (which can be used in the homogenizer and optical lens in this case) is used in the design of the solar simulator to achieve an innovative device with a single light source and adjustable spectrum.

圖1係為在0度與45度入射角度,經過設計的光學薄膜後的透射光譜。圖中可以顯著地見到,45度入射角的光譜有顯著的「藍移」現象(峰值由550nm藍移到500nm)。 Figure 1 shows the transmission spectra after the designed optical film at incident angles of 0 and 45 degrees. It can be clearly seen in the figure that the spectrum at an incident angle of 45 degrees has a significant "blue shift" phenomenon (the peak is blue-shifted from 550nm to 500nm).

如圖2及圖3所示,利用反射鏡反射鍍膜的設計(膜厚、材質),搭配控制入射光的角度,可以調控反射光的光譜,用於太陽光模擬器的設計,可以達到單光源-光譜可調的創新裝置。 As shown in Figures 2 and 3, by utilizing the design of the reflective coating of the reflector (film thickness, material) and controlling the angle of the incident light, the spectrum of the reflected light can be adjusted. When used in the design of a solar simulator, an innovative device with a single light source and adjustable spectrum can be achieved.

如圖2所示,光學反射鏡(橢圓反射鏡、平面反射鏡)的光學鍍膜厚度可以改變不同波段的光學反射率(即各波段的反射光強度)。 As shown in Figure 2, the optical coating thickness of the optical reflector (elliptical reflector, plane reflector) can change the optical reflectivity of different bands (i.e. the intensity of reflected light in each band).

如圖3所示,改變不同入射光的角度,可以改變不同波段的光學反射率光譜(參考文獻:DOI:10.1109/JPHOT.2013.2278983)。 As shown in Figure 3, changing the angle of the incident light can change the optical reflectance spectrum of different bands (reference: DOI: 10.1109/JPHOT.2013.2278983).

本創新案採用的技術方案,利用篩選過(特定)的光學元件(透鏡、反射鏡),施以特定的光學鍍膜處理(膜厚、材質),透過特定的光學元件組合(短弧氙燈、橢圓反射鏡、第一反射鏡、機械光圈、均光鏡(器)、第二反射鏡、第一光學透鏡),並利用驅動裝置(第1到第n驅動裝置)來控制氙燈光束入射各個光學元件的角度,經過不同角度改變反射(或透射)後的光譜調變,進而調 整、控制整個太陽光模擬器輸出的光束品質(光譜、均勻度、光強度)而達到IEC 60904-9國際規範要求的太陽光模擬器之要求。 The technical solution adopted in this innovation case uses selected (specific) optical components (lenses, reflectors), applies specific optical coating treatment (film thickness, material), and uses a specific combination of optical components (short arc xenon lamp, elliptical reflector, first reflector, mechanical aperture, homogenizer, second reflector, first optical lens) and a drive device (1st to nth drive device) to control the angle of the xenon lamp beam incident on each optical component. After changing the spectrum after reflection (or transmission) at different angles, the spectrum is modulated, and the quality of the beam output by the entire solar simulator (spectrum, uniformity, light intensity) is adjusted and controlled to meet the requirements of the solar simulator required by the IEC 60904-9 international standard.

上述之光學鍍膜材質可以是金屬氧化物,如五氧化二鉭(Ta2O5)和/或三氧化二鋁(Aluminum Oxide(Al2O3))等介電材料,和金屬材料,如下列表1所示。 The optical coating material mentioned above can be metal oxides, such as tantalum pentoxide (Ta 2 O 5 ) and/or aluminum oxide (Aluminum Oxide (Al 2 O 3 )) and other dielectric materials, and metal materials, as shown in Table 1 below.

Figure 112130168-A0305-02-0007-1
Figure 112130168-A0305-02-0007-1

上述之層數可以是單層或是多層不同材料的組合鍍層。 The above-mentioned number of layers can be a single layer or a combination of multiple layers of different materials.

上述之鍍膜方式可以蒸發沈積、離子束濺鍍(IBS)、電漿濺鍍、原子層沉積、次波長結構表面或以上方式的混合鍍膜。 The above coating methods can be evaporation deposition, ion beam sputtering (IBS), plasma sputtering, atomic layer deposition, sub-wavelength structure surface or mixed coating of the above methods.

為了解決上述的技術問題,本發明所採用的其中一技術方案是一種光源系統,其包括:一氙氣燈;一橢圓反射鏡,其係設置於一鄰近該氙氣燈之位置,以反射該氙氣燈所發射之光源; 一均光器,其係設置於經該橢圓反射鏡反射之光源的路徑上;一光學透鏡,其係設置於經該均光器均質之光源的路徑上,以折射該光源,以輸出一模擬光源;一電源供應器,其係與該氙氣燈電性連接;一第一驅動裝置,其係與該氙氣燈或該橢圓反射鏡連接,以驅動該氙氣燈或該橢圓反射鏡,藉此改變該氙氣燈與該橢圓反射鏡之間的相對位置;以及一控制裝置,其係與該電源供應器以及該第一驅動裝置連接;其中,該控制裝置係根據該模擬光源之性質來控制該電源供應器以及該第一驅動裝置。 In order to solve the above technical problems, one of the technical solutions adopted by the present invention is a light source system, which includes: a xenon lamp; an elliptical reflector, which is arranged at a position adjacent to the xenon lamp to reflect the light source emitted by the xenon lamp; a homogenizer, which is arranged on the path of the light source reflected by the elliptical reflector; an optical lens, which is arranged on the path of the light source homogenized by the homogenizer to refract the light source to output a simulated light source; A power supply electrically connected to the xenon lamp; a first driving device connected to the xenon lamp or the elliptical reflector to drive the xenon lamp or the elliptical reflector to change the relative position between the xenon lamp and the elliptical reflector; and a control device connected to the power supply and the first driving device; wherein the control device controls the power supply and the first driving device according to the properties of the analog light source.

上述之光源系統,可進一步包括:一第一平面反射鏡,其係設置於經該橢圓反射鏡反射之光源的路徑上,以將經該橢圓反射鏡反射之光源反射至該均光器,該均光器係設置於經該第一平面反射鏡反射之光源的路徑上;一第二平面反射鏡,其係設置於經該均光器均質之光源的路徑上,以將經該均光器均質之光源反射至該光學透鏡,該光學透鏡係設置於經該第二平面反射鏡反射之光源的路徑上;一光圈,其係設置於該第一平面反射鏡與該均光器之間;一光電感測器,其係設置於經該光學透鏡折射之光源的路徑上;以及一第二驅動裝置,其係與該光圈連接,以控制該光圈的大小;其中,該控制裝置係根據該光電感測器所感測之模擬光源之性質來控制該電源供應器、該第一驅動裝置以及該第二驅動裝置。 The above-mentioned light source system may further include: a first plane reflector, which is arranged on the path of the light source reflected by the elliptical reflector to reflect the light source reflected by the elliptical reflector to the light homogenizer, and the light homogenizer is arranged on the path of the light source reflected by the first plane reflector; a second plane reflector, which is arranged on the path of the light source homogenized by the light homogenizer to reflect the light source homogenized by the light homogenizer to the optical lens, and the optical lens is arranged on the path of the light source reflected by the first plane reflector. The second plane reflector is disposed on the path of the light source reflected by the second plane reflector; an aperture is disposed between the first plane reflector and the light homogenizer; a photoelectric sensor is disposed on the path of the light source refracted by the optical lens; and a second driving device is connected to the aperture to control the size of the aperture; wherein the control device controls the power supply, the first driving device and the second driving device according to the properties of the simulated light source sensed by the photoelectric sensor.

上述之光源系統,其中,該橢圓反射鏡、該第一平面反射鏡、該均光器及第二平面反射鏡中之至少一者的表面可具有一鍍層。 The above-mentioned light source system, wherein the surface of at least one of the elliptical reflector, the first plane reflector, the light homogenizer and the second plane reflector may have a coating.

上述之光源系統,其中,該鍍層可選自由鋁反射膜、銀反射膜、金反射膜、多層介電質膜及特製鍍膜所組成之群組。 In the above-mentioned light source system, the coating layer can be selected from a group consisting of an aluminum reflective film, a silver reflective film, a gold reflective film, a multi-layer dielectric film and a special coating film.

上述之光源系統,其中,該鍍層之厚度可介於1nm至150μm之間。 The above-mentioned light source system, wherein the thickness of the coating can be between 1nm and 150μm.

上述之光源系統,可進一步包括:一第三驅動裝置,其係與該第一平面反射鏡連接,以控制該第一平面反射鏡與入射光源之間的角度。 The above-mentioned light source system may further include: a third driving device, which is connected to the first plane reflector to control the angle between the first plane reflector and the incident light source.

上述之光源系統,可進一步包括:一第四驅動裝置,其係與該均光器連接,以控制該均光器與入射光源之間的角度。 The above-mentioned light source system may further include: a fourth driving device connected to the light homogenizer to control the angle between the light homogenizer and the incident light source.

上述之光源系統,可進一步包括:一第五驅動裝置,其係與該第二平面反射鏡連接,以控制該第一平面反射鏡與入射光源之間的角度。 The above-mentioned light source system may further include: a fifth driving device, which is connected to the second plane reflector to control the angle between the first plane reflector and the incident light source.

上述之光源系統,其中,該橢圓反射鏡之曲率可介於1.4至2.25之間。其中,橢圓反射鏡之曲率的定義係為橢圓反射鏡開口到焦點距離,除橢圓反射鏡開口直徑。 In the above-mentioned light source system, the curvature of the elliptical reflector can be between 1.4 and 2.25. The curvature of the elliptical reflector is defined as the distance from the opening of the elliptical reflector to the focal point, divided by the opening diameter of the elliptical reflector.

上述之光源系統,其中,該第一驅動裝置可驅動該氙氣燈或該橢圓反射鏡沿一z方向上下移動10mm。 The above-mentioned light source system, wherein the first driving device can drive the xenon lamp or the elliptical reflector to move 10 mm up and down along a z direction.

上述之光源系統,其中,藉由該控制裝置之控制,該電源供應器之輸出功率可介於其最大輸出功率之20%至100%之間,以及藉由該控制裝置之控制,該光圈之開口的大小可於其最大值之0%至100%之間。 The above-mentioned light source system, wherein, by the control of the control device, the output power of the power supply can be between 20% and 100% of its maximum output power, and by the control of the control device, the size of the aperture opening can be between 0% and 100% of its maximum value.

據此,本發明之光源系統可持續且穩定地提供強度及光譜與太陽光相近之模擬光源。 Accordingly, the light source system of the present invention can continuously and stably provide a simulated light source with an intensity and spectrum similar to that of sunlight.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 To further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings provided are only for reference and description and are not used to limit the present invention.

100:光源系統 100: Light source system

101:氙氣燈 101: Xenon lamp

102:橢圓反射鏡 102: Elliptical reflector

104:均光器 104: Light homogenizer

106:光學透鏡 106:Optical lens

107:電源供應器 107: Power supply

110:第一驅動裝置 110: First driving device

112:控制裝置 112: Control device

120:模擬光源 120:Simulated light source

200:光源系統 200: Light source system

201:氙氣燈 201: Xenon lamp

202:橢圓反射鏡 202: Elliptical reflector

203:第一平面反射鏡 203: First plane reflector

204:均光器 204: Homogenizer

205:第二平面反射鏡 205: Second plane reflector

206:光學透鏡 206:Optical lens

207:電源供應器 207: Power supply

208:光圈 208: Aperture

209:光電感測器 209: Photoelectric sensor

210:第一驅動裝置 210: First drive device

211:第二驅動裝置 211: Second drive device

212:控制裝置 212: Control device

220:模擬光源 220:Simulated light source

〔圖1〕為不同之入射角度對穿透光譜所產生之變化的示圖;〔圖2〕為不同之光學鍍膜厚度對於不同波段之光學反射率之影響的示圖;〔圖3〕為不同之入射光角度對於不同波段之光學反射率光譜之影響的示圖;〔圖4〕為本發明實施例1的光源系統的示意圖;以及〔圖5〕為本發明實施例2的光源系統的示意圖。 [Figure 1] is a diagram showing the changes in the transmitted light spectrum caused by different incident angles; [Figure 2] is a diagram showing the effects of different optical coating thicknesses on the optical reflectivity of different wavelength bands; [Figure 3] is a diagram showing the effects of different incident light angles on the optical reflectivity spectra of different wavelength bands; [Figure 4] is a schematic diagram of the light source system of embodiment 1 of the present invention; and [Figure 5] is a schematic diagram of the light source system of embodiment 2 of the present invention.

以下是透過特定的具體實施例來說明本發明所揭示之光源系統的實施方式,本發明所屬技術領域中具有通常知識者可由本說明書所揭示的內容瞭解本發明的優點與效果。本發明可透過其他不同的具體實施例加以實施或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構 思下進行各種修改與變更。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所揭示的內容並非用以限制本發明的保護範圍。 The following is a specific embodiment to illustrate the implementation of the light source system disclosed by the present invention. Those with ordinary knowledge in the technical field to which the present invention belongs can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed in various ways based on different viewpoints and applications without deviating from the concept of the present invention. The following implementation will further explain the relevant technical content of the present invention in detail, but the disclosed content is not used to limit the scope of protection of the present invention.

實施例1 Implementation Example 1

如圖4所示,本實施例之光源系統100包括:一氙氣燈101;一橢圓反射鏡102;一均光器104;一光學透鏡106;一電源供應器107;一第一驅動裝置110;以及一控制裝置112。 As shown in FIG. 4 , the light source system 100 of this embodiment includes: a xenon lamp 101; an elliptical reflector 102; a homogenizer 104; an optical lens 106; a power supply 107; a first driving device 110; and a control device 112.

其中,該氙氣燈101係用於發射一光源。 The xenon lamp 101 is used to emit a light source.

其中,該橢圓反射鏡102係設置於一鄰近該氙氣燈101之位置,以反射該氙氣燈101所發射之光源。 The elliptical reflector 102 is disposed at a position adjacent to the xenon lamp 101 to reflect the light source emitted by the xenon lamp 101.

其中,該均光器104係設置於經該橢圓反射鏡102反射之光源的路徑上,以均質化該光源。在本實施例中,該均光器104與入射光之間的夾角為90°,但本發明並不限於此,該夾角較佳可介於85°~95°之間。 The light homogenizer 104 is disposed on the path of the light source reflected by the elliptical reflector 102 to homogenize the light source. In this embodiment, the angle between the light homogenizer 104 and the incident light is 90°, but the present invention is not limited thereto, and the angle is preferably between 85° and 95°.

其中,該光學透鏡106係設置於經該均光器104均質之光源的路徑上,以折射該光源,以輸出一模擬光源120。 The optical lens 106 is disposed on the path of the light source homogenized by the light homogenizer 104 to refract the light source to output a simulated light source 120.

其中,該電源供應器107係與該氙氣燈101電性連接,以供應該氙氣燈101所需之電源。 The power supply 107 is electrically connected to the xenon lamp 101 to supply the power required by the xenon lamp 101.

其中,該第一驅動裝置110與該氙氣燈101連接,以驅動該氙氣燈101,藉此改變該氙氣燈101與該橢圓反射鏡102之間的相對位置。在本實施例中,該第一驅動裝置110驅動該氙氣燈101沿一z方向上下移動10mm,但本發明並不限於此,只要能改變該氙氣燈101與該橢圓反射鏡102之間的相對位置即可。於另一實施方式中,該第一驅動裝置110與該橢圓反射鏡102連接,以驅動 該橢圓反射鏡102沿一z方向上下移動,藉此改變該氙氣燈101與該橢圓反射鏡102之間的相對位置。 The first driving device 110 is connected to the xenon lamp 101 to drive the xenon lamp 101, thereby changing the relative position between the xenon lamp 101 and the elliptical reflector 102. In this embodiment, the first driving device 110 drives the xenon lamp 101 to move 10 mm up and down along a z direction, but the present invention is not limited thereto, as long as the relative position between the xenon lamp 101 and the elliptical reflector 102 can be changed. In another embodiment, the first driving device 110 is connected to the elliptical reflector 102 to drive the elliptical reflector 102 to move up and down along a z direction, thereby changing the relative position between the xenon lamp 101 and the elliptical reflector 102.

其中,該氙氣燈101或該橢圓反射鏡102的移動距離可在+-10mm之間,透過該氙氣燈101與該橢圓反射鏡102間的距離改變,進而改變了光源入射該均光器104的角度,進而改變該光源經均質後的光譜.但本發明並不限於此,亦可調整該橢圓反射鏡102與該均光器104或該氙氣燈101與該均光器104之間空間位置(即調整二者於x、y或z方向上之相對位置)(此亦調整光源入射該均光器104的角度)。 The moving distance of the xenon lamp 101 or the elliptical reflector 102 can be between +-10mm. By changing the distance between the xenon lamp 101 and the elliptical reflector 102, the angle of the light source incident on the homogenizer 104 is changed, thereby changing the spectrum of the light source after homogenization. However, the present invention is not limited to this. The spatial position between the elliptical reflector 102 and the homogenizer 104 or the xenon lamp 101 and the homogenizer 104 can also be adjusted (i.e., the relative position of the two in the x, y or z direction is adjusted) (this also adjusts the angle of the light source incident on the homogenizer 104).

其中,該控制裝置112係與該電源供應器107以及該第一驅動裝置110連接。 The control device 112 is connected to the power supply 107 and the first driving device 110.

其中,該控制裝置112係根據該模擬光源120之性質來控制該電源供應器107以及該第一驅動裝置110。 The control device 112 controls the power supply 107 and the first driving device 110 according to the properties of the simulated light source 120.

具體而言,可感測該模擬光源120之強度,該控制裝置112可根據該模擬光源120之強度調整該電源供應器107之輸出功率,當該模擬光源120之強度隨著該氙氣燈101之使用壽命而衰退時,可即時藉由提升該電源供應器107之輸出功率來使該模擬光源120之強度維持恆定。在本實施例中,藉由該控制裝置之控制,該電源供應器之輸出功率係介於其最大輸出功率之20%至100%之間,但本發明並不限於此。 Specifically, the intensity of the simulated light source 120 can be sensed, and the control device 112 can adjust the output power of the power supply 107 according to the intensity of the simulated light source 120. When the intensity of the simulated light source 120 declines with the service life of the xenon lamp 101, the intensity of the simulated light source 120 can be kept constant by increasing the output power of the power supply 107 in real time. In this embodiment, the output power of the power supply is between 20% and 100% of its maximum output power under the control of the control device, but the present invention is not limited to this.

此外,可感測該模擬光源120之光譜,該控制裝置112可根據該模擬光源120之光譜藉由該第一驅動裝置110調整該氙氣燈101的位置,當該模擬光源120之光譜隨著該氙氣燈101之使用壽命而偏移太陽光之光譜時,可即時藉由調整該氙氣燈101的位置來使該模擬光源120之光譜維持恆定。 In addition, the spectrum of the simulated light source 120 can be sensed, and the control device 112 can adjust the position of the xenon lamp 101 according to the spectrum of the simulated light source 120 through the first driving device 110. When the spectrum of the simulated light source 120 deviates from the spectrum of sunlight as the xenon lamp 101 ages, the position of the xenon lamp 101 can be adjusted in real time to keep the spectrum of the simulated light source 120 constant.

綜合上述,本實施例之光源系統100可即時地對於該模擬光源120之性質做出適當的調整,藉此該光源系統100持續且穩定地提供與太陽光的光譜致合度達到A+的水準的模擬光源120。本實施例之光源系統100具有一定程度的穩定性,當該光源系統100調整至最適狀態後,其最適狀態可合理維持一段時間,不會立即失控。 In summary, the light source system 100 of this embodiment can make appropriate adjustments to the properties of the simulated light source 120 in real time, so that the light source system 100 can continuously and stably provide the simulated light source 120 with a spectrum consistency of A+ with the sunlight. The light source system 100 of this embodiment has a certain degree of stability. When the light source system 100 is adjusted to the optimal state, its optimal state can be reasonably maintained for a period of time without being out of control immediately.

實施例2 Example 2

如圖5所示,本實施例之光源系統200包括:一氙氣燈201;一橢圓反射鏡202;一第一平面反射鏡203;一均光器204;一第二平面反射鏡205;一光學透鏡206;一電源供應器207;一光圈208;一光電感測器209;一第一驅動裝置210;一第二驅動裝置211;以及一控制裝置212。 As shown in FIG. 5 , the light source system 200 of this embodiment includes: a xenon lamp 201; an elliptical reflector 202; a first plane reflector 203; a homogenizer 204; a second plane reflector 205; an optical lens 206; a power supply 207; an aperture 208; a photoelectric sensor 209; a first driving device 210; a second driving device 211; and a control device 212.

其中,該氙氣燈201係用於發射一光源。 The xenon lamp 201 is used to emit a light source.

其中,該橢圓反射鏡202係設置於一鄰近該氙氣燈201之位置,以反射該氙氣燈201所發射之光源。 The elliptical reflector 202 is disposed at a position adjacent to the xenon lamp 201 to reflect the light source emitted by the xenon lamp 201.

相較於實施例1,本實施例之光源系統200進一步包括:一第一平面反射鏡203。其中,該第一平面反射鏡203係設置於經該橢圓反射鏡202反射之光源的路徑上,以反射經該橢圓反射鏡202反射之光源。在本實施例中,該第一平面反射鏡203與入射光之間的夾角為45°,但本發明並不限於此,該夾角較佳可介於40°~50°之間。 Compared to Embodiment 1, the light source system 200 of this embodiment further includes: a first plane reflector 203. The first plane reflector 203 is disposed on the path of the light source reflected by the elliptical reflector 202 to reflect the light source reflected by the elliptical reflector 202. In this embodiment, the angle between the first plane reflector 203 and the incident light is 45°, but the present invention is not limited thereto, and the angle is preferably between 40° and 50°.

其中,該均光器204係設置於經該第一平面反射鏡203反射之光源的路徑上,以均質化該光源。在本實施例中,該均光器204與入射光之間的夾角為90°,但本發明並不限於此,該夾角較佳可介於85°~95°之間。 The light homogenizer 204 is disposed on the path of the light source reflected by the first plane reflector 203 to homogenize the light source. In this embodiment, the angle between the light homogenizer 204 and the incident light is 90°, but the present invention is not limited thereto, and the angle is preferably between 85° and 95°.

相較於實施例1,本實施例之光源系統200進一步包括:一第二平面反射鏡205。其中,該第二平面反射鏡205係設置於經該均光器204均質之光源的路徑上,以反射經該均光器204均質之光源。在本實施例中,該第二平面反射鏡205與入射光之間的夾角為45°,但本發明並不限於此,該夾角較佳可介於40°~50°之間。 Compared with Embodiment 1, the light source system 200 of this embodiment further includes: a second plane reflector 205. The second plane reflector 205 is disposed on the path of the light source homogenized by the light homogenizer 204 to reflect the light source homogenized by the light homogenizer 204. In this embodiment, the angle between the second plane reflector 205 and the incident light is 45°, but the present invention is not limited thereto, and the angle is preferably between 40° and 50°.

其中,該光學透鏡206係設置於經該第二平面反射鏡205反射之光源的路徑上,以折射該光源,以輸出一模擬光源220。 The optical lens 206 is disposed on the path of the light source reflected by the second plane reflector 205 to refract the light source to output a simulated light source 220.

其中,該電源供應器207係與該氙氣燈201電性連接,以供應該氙氣燈201所需之電源。 The power supply 207 is electrically connected to the xenon lamp 201 to supply the power required by the xenon lamp 201.

相較於實施例1,本實施例之光源系統200進一步包括:一光圈208。其中,該光圈208係設置於該第一平面反射鏡203與該均光器204之間,以控制通過之光源的大小。 Compared to Embodiment 1, the light source system 200 of this embodiment further includes: an aperture 208. The aperture 208 is disposed between the first plane reflector 203 and the light homogenizer 204 to control the size of the light source passing through.

相較於實施例1,本實施例之光源系統200進一步包括:一光電感測器209。其中,該光電感測器209係設置於經該光學透鏡206折射之光源的路徑上,以感測該模擬光源220的強度及光譜。 Compared to Embodiment 1, the light source system 200 of this embodiment further includes: a photo sensor 209. The photo sensor 209 is disposed on the path of the light source refracted by the optical lens 206 to sense the intensity and spectrum of the simulated light source 220.

其中,該第一驅動裝置210與該氙氣燈201連接,以驅動該氙氣燈201,藉此改變該氙氣燈201與該橢圓反射鏡202之間的相對位置。在本實施例中,該第一驅動裝置210驅動該氙氣燈201沿一z方向上下移動10mm,但本發明並不限於此。於另一實施方式中,該第一驅動裝置210與該橢圓反射鏡202連接,以驅動該橢圓反射鏡202沿一z方向上下移動,藉此改變該氙氣燈201與該橢圓反射鏡202之間的相對位置。 The first driving device 210 is connected to the xenon lamp 201 to drive the xenon lamp 201, thereby changing the relative position between the xenon lamp 201 and the elliptical reflector 202. In this embodiment, the first driving device 210 drives the xenon lamp 201 to move up and down 10 mm along a z direction, but the present invention is not limited thereto. In another embodiment, the first driving device 210 is connected to the elliptical reflector 202 to drive the elliptical reflector 202 to move up and down along a z direction, thereby changing the relative position between the xenon lamp 201 and the elliptical reflector 202.

其中,該氙氣燈201或該橢圓反射鏡202的移動距離可在+-10mm之間,透過與該第一平面反射鏡203間的距離改變,進而改變了光源入射該第一平面反射鏡203的角度,進而改變該光源經反射後的光譜.但本發明並不限於此,亦可調整該橢圓反射鏡202與該第一平面反射鏡203或該氙氣燈201與該第一平面反射鏡203之間空間位置(即調整二者於x、y或z方向上之相對位置)(此亦調整光源入射該第一平面反射鏡203的角度)。 The moving distance of the xenon lamp 201 or the elliptical reflector 202 can be between +-10mm, and the distance between the xenon lamp 201 and the first plane reflector 203 can be changed, thereby changing the angle of the light source incident on the first plane reflector 203, thereby changing the spectrum of the light source after reflection. However, the present invention is not limited to this, and the spatial position between the elliptical reflector 202 and the first plane reflector 203 or the xenon lamp 201 and the first plane reflector 203 can also be adjusted (i.e., the relative position of the two in the x, y or z direction is adjusted) (this also adjusts the angle of the light source incident on the first plane reflector 203).

相較於實施例1,本實施例之光源系統200進一步包括:一第二驅動裝置211。其中,該第二驅動裝置211係與該光圈208連接,以控制該光圈208的大小。 Compared to Embodiment 1, the light source system 200 of this embodiment further includes: a second driving device 211. The second driving device 211 is connected to the aperture 208 to control the size of the aperture 208.

其中,該控制裝置212係與該光電感測器209、該電源供應器207、該第一驅動裝置210以及該第二驅動裝置211連接。 The control device 212 is connected to the photoelectric sensor 209, the power supply 207, the first driving device 210 and the second driving device 211.

其中,該控制裝置212係根據該光電感測器209所感測之模擬光源220之性質來控制該電源供應器207、該第一驅動裝置210以及該第二驅動裝置211。 The control device 212 controls the power supply 207, the first driving device 210 and the second driving device 211 according to the properties of the analog light source 220 sensed by the photo sensor 209.

具體而言,該光電感測器209可感測該模擬光源220之強度,該控制裝置212可根據該模擬光源220之強度調整該電源供應器207之輸出功率以及藉由該第二驅動裝置211調整該光圈208的大小,當該模擬光源220之強度隨著該氙氣燈201之使用壽命而衰退時,可即時藉由提升該電源供應器207之輸出功率或放大該光圈208來使該模擬光源220之強度維持恆定。在本實施例中,藉由該控制裝置之控制,該電源供應器之輸出功率係介於其最大輸出功率之20%至100%之間,以及藉由該控制裝置之控制,該光圈之開口的大小係於其最大值之0%至100%之間,但本發明並不限於此。 Specifically, the photosensor 209 can sense the intensity of the simulated light source 220, and the control device 212 can adjust the output power of the power supply 207 according to the intensity of the simulated light source 220 and adjust the size of the aperture 208 through the second driving device 211. When the intensity of the simulated light source 220 declines with the service life of the xenon lamp 201, the intensity of the simulated light source 220 can be maintained constant by increasing the output power of the power supply 207 or enlarging the aperture 208. In this embodiment, the output power of the power supply is between 20% and 100% of its maximum output power by the control of the control device, and the size of the aperture opening is between 0% and 100% of its maximum value by the control of the control device, but the present invention is not limited thereto.

此外,該光電感測器209可感測該模擬光源220之光譜,該控制裝置212可根據該模擬光源220之光譜藉由該第一驅動裝置210調整該氙氣燈201的位置,當該模擬光源220之光譜隨著該氙氣燈201之使用壽命而偏移太陽光之光譜時,可即時藉由調整該氙氣燈201的位置來使該模擬光源220之光譜維持恆定。 In addition, the photoelectric sensor 209 can sense the spectrum of the analog light source 220, and the control device 212 can adjust the position of the xenon lamp 201 through the first driving device 210 according to the spectrum of the analog light source 220. When the spectrum of the analog light source 220 deviates from the spectrum of sunlight as the xenon lamp 201 ages, the position of the xenon lamp 201 can be adjusted in real time to keep the spectrum of the analog light source 220 constant.

綜合上述,本實施例之光源系統200可即時地對於該模擬光源220之性質進行監控,並做出適當的調整,藉此該光源系統200持續且穩定地提供與太陽光的光譜致合度達到A+的水準的模擬光源220。本實施例之光源系統200具有一定程度的穩定性,當該光源系統200調整至最適狀態後,即使移開該光電感測器209,其最適狀態仍可合理維持,不會立即失控。 In summary, the light source system 200 of this embodiment can monitor the properties of the simulated light source 220 in real time and make appropriate adjustments, so that the light source system 200 continuously and stably provides the simulated light source 220 with a spectrum matching the sunlight at the A+ level. The light source system 200 of this embodiment has a certain degree of stability. After the light source system 200 is adjusted to the optimal state, even if the photoelectric sensor 209 is removed, its optimal state can still be reasonably maintained and will not be out of control immediately.

於一較佳實施例中,該橢圓反射鏡、該第一平面反射鏡、該均光器及第二平面反射鏡中之至少一者的表面可具有一鍍層,且該鍍層可選自由鋁反射膜、銀反射膜、金反射膜、多層介電質膜及特製鍍膜所組成之群組,且鍍層之厚度可介於1nm至150μm之間,但本發明並不限於此。藉由該鍍層之設置,可進一步調控該模擬光源之光譜。 In a preferred embodiment, at least one of the elliptical reflector, the first plane reflector, the light homogenizer and the second plane reflector may have a coating on its surface, and the coating may be selected from a group consisting of an aluminum reflective film, a silver reflective film, a gold reflective film, a multi-layer dielectric film and a special coating, and the thickness of the coating may be between 1nm and 150μm, but the present invention is not limited thereto. By setting the coating, the spectrum of the analog light source can be further adjusted.

於一較佳實施例中,可進一步包括:一第三驅動裝置,其係與該第一平面反射鏡連接,以控制該第一平面反射鏡與入射光源之間的角度,但本發明並不限於此。藉由控制該第一平面反射鏡與入射光源之間的角度,可進一步調控該模擬光源之光譜。 In a preferred embodiment, it may further include: a third driving device, which is connected to the first plane reflector to control the angle between the first plane reflector and the incident light source, but the present invention is not limited thereto. By controlling the angle between the first plane reflector and the incident light source, the spectrum of the simulated light source can be further adjusted.

於一較佳實施例中,可進一步包括:一第四驅動裝置,其係與該均光器連接,以控制該均光器與入射光源之間的角度,但本發明並不限於 此。藉由控制該均光器與入射光源之間的角度,可進一步調控該模擬光源之光譜。 In a preferred embodiment, it may further include: a fourth driving device, which is connected to the light homogenizer to control the angle between the light homogenizer and the incident light source, but the present invention is not limited thereto. By controlling the angle between the light homogenizer and the incident light source, the spectrum of the simulated light source can be further adjusted.

於一較佳實施例中,可進一步包括:一第五驅動裝置,其係與該第二平面反射鏡連接,以控制該第二平面反射鏡與入射光源之間的角度,但本發明並不限於此。藉由控制該第二平面反射鏡與入射光源之間的角度,可進一步調控該模擬光源之光譜。 In a preferred embodiment, it may further include: a fifth driving device, which is connected to the second plane reflector to control the angle between the second plane reflector and the incident light source, but the present invention is not limited thereto. By controlling the angle between the second plane reflector and the incident light source, the spectrum of the simulated light source can be further adjusted.

於一較佳實施例中,該橢圓反射鏡之曲率可介於1.4至2.25之間,但本發明並不限於此。藉由調整該橢圓反射鏡之曲率,可進一步調控該模擬光源之光譜。其中,橢圓反射鏡之曲率的定義係為橢圓反射鏡開口到焦點距離,除橢圓反射鏡開口直徑。 In a preferred embodiment, the curvature of the elliptical reflector can be between 1.4 and 2.25, but the present invention is not limited thereto. By adjusting the curvature of the elliptical reflector, the spectrum of the simulated light source can be further adjusted. The curvature of the elliptical reflector is defined as the distance from the opening of the elliptical reflector to the focal point, minus the diameter of the opening of the elliptical reflector.

綜合上述,本發明之光源系統可持續且穩定地提供強度及光譜與太陽光相近之模擬光源,且該模擬光源與太陽光的光譜致合度可達到A+的水準。 In summary, the light source system of the present invention can continuously and stably provide a simulated light source with an intensity and spectrum similar to that of sunlight, and the spectral consistency between the simulated light source and sunlight can reach the A+ level.

以上所揭示的內容僅為本發明的較佳可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。 The contents disclosed above are only the best feasible embodiments of the present invention, and do not limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the contents of the description and drawings of the present invention are included in the scope of the patent application of the present invention.

100:光源系統 100: Light source system

101:氙氣燈 101: Xenon lamp

102:橢圓反射鏡 102: Elliptical reflector

104:均光器 104: Light homogenizer

106:光學透鏡 106:Optical lens

107:電源供應器 107: Power supply

110:第一驅動裝置 110: First driving device

112:控制裝置 112: Control device

120:模擬光源 120:Simulated light source

Claims (11)

一種光源系統,其包括:一氙氣燈;一橢圓反射鏡,其係設置於一鄰近該氙氣燈之位置,以反射該氙氣燈所發射之光源;一均光器,其係設置於經該橢圓反射鏡反射之光源的路徑上;一光學透鏡,其係設置於經該均光器均質之光源的路徑上,以折射該光源,以輸出一模擬光源;一電源供應器,其係與該氙氣燈電性連接;一第一驅動裝置,其係與該氙氣燈或該橢圓反射鏡連接,以驅動該氙氣燈或該橢圓反射鏡,藉此改變該氙氣燈與該橢圓反射鏡之間的相對位置;以及一控制裝置,其係與該電源供應器以及該第一驅動裝置連接;其中,該控制裝置係根據該模擬光源之性質來控制該電源供應器以及該第一驅動裝置。 A light source system includes: a xenon lamp; an elliptical reflector, which is arranged at a position adjacent to the xenon lamp to reflect the light source emitted by the xenon lamp; a homogenizer, which is arranged on the path of the light source reflected by the elliptical reflector; an optical lens, which is arranged on the path of the light source homogenized by the homogenizer to refract the light source to output a simulated light source; a power supply, which is connected to the xenon lamp Electrically connected; a first driving device, which is connected to the xenon lamp or the elliptical reflector to drive the xenon lamp or the elliptical reflector to change the relative position between the xenon lamp and the elliptical reflector; and a control device, which is connected to the power supply and the first driving device; wherein the control device controls the power supply and the first driving device according to the properties of the analog light source. 如請求項1所述之光源系統,進一步包括:一第一平面反射鏡,其係設置於經該橢圓反射鏡反射之光源的路徑上,以將經該橢圓反射鏡反射之光源反射至該均光器,該均光器係設置於經該第一平面反射鏡反射之光源的路徑上;一第二平面反射鏡,其係設置於經該均光器均質之光源的路徑上,以將經該均光器均質之光源反射至該光學透鏡,該光學透鏡係設置於經該第二平面反射鏡反射之光源的路徑上; 一光圈,其係設置於該第一平面反射鏡與該均光器之間;一光電感測器,其係設置於經該光學透鏡折射之光源的路徑上;以及一第二驅動裝置,其係與該光圈連接,以控制該光圈的大小;其中,該控制裝置係根據該光電感測器所感測之模擬光源之性質來控制該電源供應器、該第一驅動裝置以及該第二驅動裝置。 The light source system as described in claim 1 further comprises: a first plane reflector, which is arranged on the path of the light source reflected by the elliptical reflector to reflect the light source reflected by the elliptical reflector to the homogenizer, and the homogenizer is arranged on the path of the light source reflected by the first plane reflector; a second plane reflector, which is arranged on the path of the light source homogenized by the homogenizer to reflect the light source homogenized by the homogenizer to the optical lens, and the optical lens is arranged on the path of the light source reflected by the second plane reflector; an aperture, which is arranged between the first plane reflector and the light homogenizer; a photoelectric sensor, which is arranged on the path of the light source refracted by the optical lens; and a second driving device, which is connected to the aperture to control the size of the aperture; wherein the control device controls the power supply, the first driving device and the second driving device according to the properties of the simulated light source sensed by the photoelectric sensor. 如請求項2所述之光源系統,其中,該橢圓反射鏡、該第一平面反射鏡、該均光器及第二平面反射鏡中之至少一者的表面係具有一鍍層。 A light source system as described in claim 2, wherein the surface of at least one of the elliptical reflector, the first plane reflector, the light homogenizer and the second plane reflector has a coating. 如請求項3所述之光源系統,其中,該鍍層係選自由鋁反射膜、銀反射膜、金反射膜、多層介電質膜及特製鍍膜所組成之群組。 A light source system as described in claim 3, wherein the coating is selected from the group consisting of an aluminum reflective film, a silver reflective film, a gold reflective film, a multi-layer dielectric film, and a special coating. 如請求項3所述之光源系統,其中,該鍍層之厚度係介於1nm至150μm之間。 A light source system as described in claim 3, wherein the thickness of the coating is between 1 nm and 150 μm. 如請求項2所述之光源系統,進一步包括:一第三驅動裝置,其係與該第一平面反射鏡連接,以控制該第一平面反射鏡與入射光源之間的角度。 The light source system as described in claim 2 further includes: a third driving device connected to the first plane reflector to control the angle between the first plane reflector and the incident light source. 如請求項2所述之光源系統,進一步包括:一第四驅動裝置,其係與該均光器連接,以控制該均光器與入射光源之間的角度。 The light source system as described in claim 2 further comprises: a fourth driving device connected to the light homogenizer to control the angle between the light homogenizer and the incident light source. 如請求項2所述之光源系統,進一步包括:一第五驅動裝置,其係與該第二平面反射鏡連接,以控制該第一平面反射鏡與入射光源之間的角度。 The light source system as described in claim 2 further comprises: a fifth driving device connected to the second plane reflector to control the angle between the first plane reflector and the incident light source. 如請求項1或2所述之光源系統,其中,該橢圓反射鏡之曲率係介於1.4至2.25之間。 A light source system as described in claim 1 or 2, wherein the curvature of the elliptical reflector is between 1.4 and 2.25. 如請求項1或2所述之光源系統,其中,該第一驅動裝置驅動該氙氣燈或該橢圓反射鏡沿一z方向上下移動10mm。 A light source system as described in claim 1 or 2, wherein the first driving device drives the xenon lamp or the elliptical reflector to move 10 mm up and down along a z direction. 如請求項2所述之光源系統,其中藉由該控制裝置之控制,該電源供應器之輸出功率係介於其最大輸出功率之20%至100%之間,以及藉由該控制裝置之控制,該光圈之開口的大小係介於其最大值之0%至100%之間。 A light source system as described in claim 2, wherein the output power of the power supply is between 20% and 100% of its maximum output power under the control of the control device, and the size of the aperture opening is between 0% and 100% of its maximum value under the control of the control device.
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