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TWI839152B - Wafer clamping jig - Google Patents

Wafer clamping jig Download PDF

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Publication number
TWI839152B
TWI839152B TW112108918A TW112108918A TWI839152B TW I839152 B TWI839152 B TW I839152B TW 112108918 A TW112108918 A TW 112108918A TW 112108918 A TW112108918 A TW 112108918A TW I839152 B TWI839152 B TW I839152B
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Taiwan
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wafer
base
hole
clamping
size
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TW112108918A
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Chinese (zh)
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TW202437449A (en
Inventor
洪榮南
林萬迪
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環球晶圓股份有限公司
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Priority to TW112108918A priority Critical patent/TWI839152B/en
Priority to CN202410044068.3A priority patent/CN118617617A/en
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Publication of TWI839152B publication Critical patent/TWI839152B/en
Publication of TW202437449A publication Critical patent/TW202437449A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Jigs For Machine Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A wafer clamping jig includes a base, a clamping member and a carrying platform. The base includes a passing hole. A vent hole is located at the base. The clamping member is movably disposed on the base. The carrying platform is movably disposed in or under the base and corresponding to the passing hole. An ingot fixing jig is further provided.

Description

晶圓夾持治具 Wafer clamping fixture

本發明是有關於一種夾持治具及固定治具,且特別是有關於一種晶圓夾持治具以及一種晶棒固定治具。 The present invention relates to a clamping jig and a fixing jig, and in particular to a wafer clamping jig and a crystal rod fixing jig.

在晶圓的切割製程中,若習知的晶圓夾持治具未能良好支撐晶圓,用來使切割線降溫的水流直接衝擊到晶圓,可能會使晶圓容易受水流衝擊而導致破片。此外,在切割過程中,晶圓與治具會浸泡於用以降溫的冷卻液體(水)中,位於晶圓與治具之間的冷卻液體(水)在切割過程中可能會吸熱而變成水蒸氣/氣泡,切割製程中產生的氣泡因無法逸散,對晶圓產生壓力,也會造成晶圓破片。 During the wafer cutting process, if the conventional wafer clamping fixture fails to properly support the wafer, the water flow used to cool the cutting line will directly impact the wafer, which may cause the wafer to be easily impacted by the water flow and cause it to break. In addition, during the cutting process, the wafer and fixture will be immersed in the cooling liquid (water) used for cooling. The cooling liquid (water) between the wafer and the fixture may absorb heat and turn into water vapor/bubbles during the cutting process. The bubbles generated during the cutting process cannot dissipate, which will cause pressure on the wafer and cause wafer breakage.

此外,習知的晶棒固定治具以黏貼方式固定晶棒,上膠以及脫膠過程十分耗時,影響晶棒加工效率。 In addition, the conventional crystal rod fixing jig fixes the crystal rod by gluing, and the gluing and degumming process is very time-consuming, which affects the processing efficiency of the crystal rod.

本發明提供一種晶圓夾持治具,其降低切割晶圓時發生破片的機率。 The present invention provides a wafer clamping fixture that reduces the probability of wafer breakage when cutting the wafer.

本發明提供一種晶棒固定治具,其可有效率地固定晶棒以進行後續加工。 The present invention provides a crystal rod fixing fixture, which can efficiently fix the crystal rod for subsequent processing.

本發明的一種晶圓夾持治具,包括一基座、一卡合件以及一承接座。基座包括一通過孔,通過孔的尺寸大於第二晶圓的第二尺寸,且一排氣孔位於基座。卡合件可運動地設置於基座的上方。承接座可運動地設置於基座內或是下方且對應於通過孔。 The wafer clamping fixture of the present invention includes a base, a clamping piece and a receiving seat. The base includes a through hole, the size of the through hole is larger than the second size of the second wafer, and an exhaust hole is located on the base. The clamping piece can be movably arranged above the base. The receiving seat can be movably arranged inside or below the base and corresponds to the through hole.

在本發明的一實施例中,一第一晶圓適於被夾持於基座與卡合件之間,以被切割為一第二晶圓,上述的通過孔的尺寸介於第一晶圓的第一尺寸與第二晶圓的第二尺寸之間。第二晶圓適於通過通過孔且被承接座承接,基座包括環繞通過孔的一托緣,第一晶圓適於被夾持於托緣與卡合件之間。 In one embodiment of the present invention, a first wafer is suitable for being clamped between the base and the clamping member to be cut into a second wafer, and the size of the through hole is between the first size of the first wafer and the second size of the second wafer. The second wafer is suitable for passing through the through hole and being received by the receiving seat, the base includes a supporting edge surrounding the through hole, and the first wafer is suitable for being clamped between the supporting edge and the clamping member.

在本發明的一實施例中,上述的排氣孔位於基座與第一晶圓之間,排氣孔凹陷於托緣。 In one embodiment of the present invention, the exhaust hole is located between the base and the first wafer, and the exhaust hole is recessed in the support edge.

在本發明的一實施例中,上述的承接座設置於該基座內或是下方時,承接座對基座所在平面的投影重疊於局部的通過孔。且承接座適於從基座的下方移開,以使承接座對基座所在平面的投影不重疊於通過孔。 In one embodiment of the present invention, when the above-mentioned receiving seat is arranged inside or below the base, the projection of the receiving seat on the plane where the base is located overlaps with the local through hole. And the receiving seat is suitable for being moved away from the bottom of the base so that the projection of the receiving seat on the plane where the base is located does not overlap with the through hole.

在本發明的一實施例中,一第一晶圓適於被夾持於基座與卡合件之間,以被切割為一第二晶圓,上述的通過孔的尺寸大於第一晶圓的第一尺寸,排氣孔形成於通過孔的壁面與第一晶圓之間。 In one embodiment of the present invention, a first wafer is suitable for being clamped between a base and a clamping member to be cut into a second wafer, the size of the through hole is larger than the first size of the first wafer, and the exhaust hole is formed between the wall of the through hole and the first wafer.

在本發明的一實施例中,上述的晶圓夾持治具更包括一 尺寸調整件,可運動地設置於基座。尺寸調整件對基座所在平面的投影局部重疊於通過孔,卡合件可運動地設置於尺寸調整件,第一晶圓適於被夾持於尺寸調整件與卡合件之間。 In one embodiment of the present invention, the wafer clamping fixture further includes a size adjustment member that is movably disposed on the base. The projection of the size adjustment member on the plane where the base is located partially overlaps the through hole, the clamping member is movably disposed on the size adjustment member, and the first wafer is suitable for being clamped between the size adjustment member and the clamping member.

在本發明的一實施例中,上述的承接座可轉動地設置於基座,且承接座具有沿著徑向延伸的一穿槽。 In one embodiment of the present invention, the above-mentioned receiving seat is rotatably arranged on the base, and the receiving seat has a through groove extending along the radial direction.

本發明的一種晶棒固定治具,包括一側板、一第一夾持件以及一第二夾持件。第一夾持件固定於側板。第二夾持件固定於側板。 The present invention discloses a crystal rod fixing fixture, comprising a side plate, a first clamping member and a second clamping member. The first clamping member is fixed to the side plate. The second clamping member is fixed to the side plate.

在本發明的一實施例中,一晶棒的一端面抵靠於側板,且晶棒的一周側被夾置於第一夾持件與第二夾持件之間,上述的第一夾持件具有一V型承載面,V型承載面的開口朝向第二夾持件。 In one embodiment of the present invention, one end face of a crystal rod is against the side plate, and one side of the crystal rod is clamped between a first clamp and a second clamp. The first clamp has a V-shaped bearing surface, and the opening of the V-shaped bearing surface faces the second clamp.

本發明的一種晶棒固定治具,包括一第一基座以及一第一真空吸盤。第一真空吸盤設置於第一基座。 The present invention discloses a crystal rod fixing fixture, comprising a first base and a first vacuum suction cup. The first vacuum suction cup is disposed on the first base.

在本發明的一實施例中,上述的晶棒固定治具更包括一第二基座以及一第二真空吸盤。第二基座可移動地設置於第一基座的一側。第二真空吸盤設置於第二基座,且朝向第一真空吸盤,第一真空吸盤適於吸附一晶棒的一第一端面,第二真空吸盤適於吸附晶棒的一第二端面。 In one embodiment of the present invention, the above-mentioned crystal rod fixing fixture further includes a second base and a second vacuum suction cup. The second base is movably arranged on one side of the first base. The second vacuum suction cup is arranged on the second base and faces the first vacuum suction cup. The first vacuum suction cup is suitable for sucking a first end face of a crystal rod, and the second vacuum suction cup is suitable for sucking a second end face of the crystal rod.

基於上述,本發明的晶圓夾持治具的卡合件可運動地設置於基座的上方,以將第一晶圓良好地夾持於基座與卡合件之間,而降低第一晶圓或第二晶圓受水流衝擊而導致破片的機率。 被基座與卡合件夾持的第一晶圓被切割為第二晶圓後,可穿過基座的通過孔,以被基座的下方的承接座良好地承接。此外,晶圓夾持治具的排氣孔可使加工過程中產生的氣泡逸散,避免氣泡對第一晶圓或第二晶圓產生壓力造成第一晶圓或第二晶圓破片。另外,習知的晶棒固定治具以黏貼方式固定晶棒,上膠脫膠過程十分耗時。本發明的晶棒固定治具以夾持或真空吸附的方式將晶棒固定,以提升效率。 Based on the above, the clamping part of the wafer clamping fixture of the present invention can be movably arranged above the base to well clamp the first wafer between the base and the clamping part, thereby reducing the probability of the first wafer or the second wafer being impacted by the water flow and causing fragments. After the first wafer clamped by the base and the clamping part is cut into the second wafer, it can pass through the through hole of the base to be well received by the receiving seat below the base. In addition, the exhaust hole of the wafer clamping fixture can allow the bubbles generated during the processing to escape, thereby preventing the bubbles from generating pressure on the first wafer or the second wafer and causing the first wafer or the second wafer to be broken. In addition, the known crystal rod fixing fixture fixes the crystal rod by gluing, and the gluing and debonding process is very time-consuming. The crystal rod fixing fixture of the present invention fixes the crystal rod by clamping or vacuum adsorption to improve efficiency.

D1:第一尺寸 D1: First size

D2:第二尺寸 D2: Second size

D3、D3a:通過孔尺寸 D3, D3a: Through hole size

10:第一晶圓 10: First wafer

12:第二晶圓 12: Second wafer

14:晶棒 14: Crystal rod

16:第一端面 16: First end face

18:第二端面 18: Second end face

100、100a:晶圓夾持治具 100, 100a: Wafer clamping fixture

110、110a:基座 110, 110a: base

112、112a:通過孔 112, 112a: through hole

114、114a:排氣孔 114, 114a: Exhaust hole

116:托緣 116: Entrustment

118:進線槽 118: Cable entry slot

120、120a:卡合件 120, 120a: snap-fit parts

130、130a:承接座 130, 130a: receiving seat

132:穿槽 132: Groove

140:尺寸調整件 140: Size adjustment piece

150:切割機台連接部 150: Cutting machine connection part

200、200a、200b、200c、200d:晶棒固定治具 200, 200a, 200b, 200c, 200d: Crystal rod fixing fixture

210、210a、210b:側板 210, 210a, 210b: Side panels

220、220a、220b:第一夾持件 220, 220a, 220b: first clamping member

222:V型承載面 222: V-shaped bearing surface

230、230a、230b:第二夾持件 230, 230a, 230b: second clamping member

240:第一基座 240: First base

250:第一真空吸盤 250: First vacuum suction cup

260:第二基座 260: Second base

270:第二真空吸盤 270: Second vacuum suction cup

圖1是依照本發明的一實施例的一種晶圓夾持治具的立體示意圖。 Figure 1 is a three-dimensional schematic diagram of a wafer clamping fixture according to an embodiment of the present invention.

圖2是圖1的晶圓夾持治具夾持第一晶圓且承接座從基座下方移開的俯視示意圖。 FIG2 is a schematic top view of the wafer clamping fixture of FIG1 clamping the first wafer and the receiving seat being moved away from under the base.

圖3是圖2的第一晶圓切割為第二晶圓且將承接座置於基座下方的俯視圖示意圖。 FIG3 is a schematic top view of the first wafer in FIG2 being cut into a second wafer and the receiving seat being placed under the base.

圖4是依照本發明的另一實施例的一種晶圓夾持治具的立體示意圖。 Figure 4 is a three-dimensional schematic diagram of a wafer clamping fixture according to another embodiment of the present invention.

圖5是圖4的晶圓夾持治具夾持第一晶圓的立體示意圖。 FIG5 is a three-dimensional schematic diagram of the wafer clamping fixture of FIG4 clamping the first wafer.

圖6是圖5的俯視圖示意圖。 Figure 6 is a schematic diagram of a top view of Figure 5.

圖7是本發明的一實施例的一種晶棒固定治具的立體示意圖。 Figure 7 is a three-dimensional schematic diagram of a crystal rod fixing fixture of an embodiment of the present invention.

圖8是本發明的另一實施例的一種晶棒固定治具的立體示意圖。 Figure 8 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention.

圖9是本發明的另一實施例的一種晶棒固定治具的立體示意圖。 Figure 9 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention.

圖10是本發明的另一實施例的一種晶棒固定治具的立體示意圖。 Figure 10 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention.

圖11是本發明的另一實施例的一種晶棒固定治具的立體示意圖。 Figure 11 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention.

圖1是依照本發明的一實施例的一種晶圓夾持治具的立體示意圖。圖2是圖1的晶圓夾持治具夾持第一晶圓且承接座從基座的下方移開的俯視示意圖。圖3是圖2的第一晶圓切割為第二晶圓且將承接座置於基座下方的俯視圖示意圖。要說明的是,在圖2與圖3中,第一晶圓與第二晶圓以虛線表示。 FIG. 1 is a three-dimensional schematic diagram of a wafer clamping fixture according to an embodiment of the present invention. FIG. 2 is a top view schematic diagram of the wafer clamping fixture of FIG. 1 clamping a first wafer and the receiving seat being moved away from the bottom of the base. FIG. 3 is a top view schematic diagram of the first wafer of FIG. 2 being cut into a second wafer and the receiving seat being placed under the base. It should be noted that in FIG. 2 and FIG. 3, the first wafer and the second wafer are represented by dotted lines.

請參閱圖1至圖3,本實施例的晶圓夾持治具100適於良好地夾持一第一晶圓10(圖2),以使被夾持的第一晶圓10可被切割線(未繪示)切割為一第二晶圓12(圖3)。第一晶圓10的一第一尺寸D1大於第二晶圓12的一第二尺寸D2。舉例來說,第一晶圓10的第一尺寸D1例如是6吋,第二晶圓12的第二尺寸D2例如是4吋,但第一晶圓10的第一尺寸D1與第二晶圓12的第二尺寸D2不以此為限制。 Please refer to Figures 1 to 3. The wafer clamping fixture 100 of this embodiment is suitable for clamping a first wafer 10 (Figure 2) well, so that the clamped first wafer 10 can be cut into a second wafer 12 (Figure 3) by a cutting line (not shown). A first size D1 of the first wafer 10 is larger than a second size D2 of the second wafer 12. For example, the first size D1 of the first wafer 10 is, for example, 6 inches, and the second size D2 of the second wafer 12 is, for example, 4 inches, but the first size D1 of the first wafer 10 and the second size D2 of the second wafer 12 are not limited to this.

如圖1所示,晶圓夾持治具100包括一基座110、卡合件120以及一承接座130。基座110包括一通過孔112及環繞通過孔112的一托緣116。第一晶圓10適於被托緣116承托。 As shown in FIG. 1 , the wafer clamping fixture 100 includes a base 110, a clamping member 120, and a receiving seat 130. The base 110 includes a through hole 112 and a supporting edge 116 surrounding the through hole 112. The first wafer 10 is suitable for being supported by the supporting edge 116.

如圖3所示,在本實施例中,通過孔112的尺寸D3介於第一晶圓10的第一尺寸D1與第二晶圓12的第二尺寸D2之間。通過孔112的尺寸D3小於第一晶圓10的第一尺寸D1,以形成托緣116。此外,由於通過孔112的尺寸D3大於第二晶圓12的第二尺寸D2,被切割出的第二晶圓12可穿過通過孔112。 As shown in FIG. 3 , in the present embodiment, the size D3 of the through hole 112 is between the first size D1 of the first wafer 10 and the second size D2 of the second wafer 12. The size D3 of the through hole 112 is smaller than the first size D1 of the first wafer 10 to form a support edge 116. In addition, since the size D3 of the through hole 112 is larger than the second size D2 of the second wafer 12, the cut second wafer 12 can pass through the through hole 112.

值得一提的是,由於晶圓夾持治具100連同第一晶圓10在切割過程中會浸泡於用以降溫的冷卻液體(水)中,位於第一晶圓10上方的冷卻液體(水)會沿著第一晶圓10的上表面往外側流去。但位於第一晶圓10與基座110之間的冷卻液體(水)在切割過程中可能會吸熱而變成水蒸氣。 It is worth mentioning that since the wafer clamping fixture 100 and the first wafer 10 are immersed in the cooling liquid (water) for cooling during the cutting process, the cooling liquid (water) above the first wafer 10 will flow outward along the upper surface of the first wafer 10. However, the cooling liquid (water) between the first wafer 10 and the base 110 may absorb heat and turn into water vapor during the cutting process.

為了避免水蒸氣蓄積在第一晶圓10與基座110之間,而將第一晶圓10或第二晶圓12頂破。在本實施例中,排氣孔114位於基座110與第一晶圓10之間,以使蓄積在第一晶圓10與基座110之間的水蒸氣可通過排氣孔114洩出。在本實施例中,排氣孔114凹陷於托緣116,但不以此為限制。 In order to prevent water vapor from accumulating between the first wafer 10 and the base 110, the first wafer 10 or the second wafer 12 is broken. In this embodiment, the exhaust hole 114 is located between the base 110 and the first wafer 10, so that the water vapor accumulated between the first wafer 10 and the base 110 can be discharged through the exhaust hole 114. In this embodiment, the exhaust hole 114 is recessed in the support edge 116, but it is not limited to this.

此外,如圖1所示,卡合件120可運動地設置於基座110的上方。在本實施例中,卡合件120的數量例如是4個,等距地設置於基座110上,但卡合件120的數量與配置位置不以此為限制。 In addition, as shown in FIG. 1 , the engaging member 120 can be movably disposed above the base 110. In this embodiment, the number of the engaging members 120 is, for example, 4, which are equidistantly disposed on the base 110, but the number and configuration position of the engaging members 120 are not limited thereto.

卡合件120可相對於基座110徑向運動,卡合件120可沿著徑向往外以讓位給第一晶圓10。第一晶圓10安裝於基座110上方後,卡合件120沿著徑向往內以復位,而使第一晶圓10被夾持於基座110的托緣116與卡合件120之間。在本實施例中,由於第一晶圓110良好地夾持於基座110與卡合件120之間,而降低第一晶圓10或第二晶圓12受水流衝擊而導致破片的機率。 The clamping member 120 can move radially relative to the base 110, and the clamping member 120 can move radially outward to make way for the first wafer 10. After the first wafer 10 is mounted on the base 110, the clamping member 120 moves radially inward to reset, so that the first wafer 10 is clamped between the supporting edge 116 of the base 110 and the clamping member 120. In this embodiment, since the first wafer 110 is well clamped between the base 110 and the clamping member 120, the probability of the first wafer 10 or the second wafer 12 being broken by water flow is reduced.

另外,承接座130可運動地設置於基座110內且對應於通過孔112。如圖2所示,當第一晶圓10要被切割時,為了避免切割線(未繪示)切割到承接座130,承接座130適於從基座110的下方移開,以使承接座130對基座110所在平面的投影不重疊於通過孔112。 In addition, the receiving seat 130 can be movably disposed in the base 110 and corresponds to the through hole 112. As shown in FIG2, when the first wafer 10 is to be cut, in order to prevent the cutting line (not shown) from cutting the receiving seat 130, the receiving seat 130 is suitable for moving away from the bottom of the base 110 so that the projection of the receiving seat 130 on the plane where the base 110 is located does not overlap with the through hole 112.

接著,切割線從排氣孔114旁的進線槽118(圖2)開始以順時針方向切割第一晶圓10,以切割出第二晶圓12(圖3)。當切割線移動到第一晶圓10與第二晶圓12的10點鐘方向,而不會切割到承接座130時,將承接座130重新移入於基座110(圖3),使承接座130對基座110所在平面的投影重疊於局部的通過孔112。承接座130移入於基座110後,切割線繼續以順時針方向切割出第二晶圓12,直至回到入刀點後完成切割。 Next, the cutting line starts from the line entry slot 118 (Figure 2) next to the exhaust hole 114 and cuts the first wafer 10 in a clockwise direction to cut out the second wafer 12 (Figure 3). When the cutting line moves to the 10 o'clock position between the first wafer 10 and the second wafer 12 and does not cut the receiving seat 130, the receiving seat 130 is moved back into the base 110 (Figure 3) so that the projection of the receiving seat 130 on the plane where the base 110 is located overlaps the local through hole 112. After the receiving seat 130 is moved into the base 110, the cutting line continues to cut out the second wafer 12 in a clockwise direction until it returns to the entry point to complete the cutting.

如圖3所示,當承接座130位於基座110內時,承接座130對基座110所在平面的投影重疊於局部的通過孔112。當第一晶圓10被切割為第二晶圓12,且承接座130位於基座110內時,第二晶圓12可穿過通過孔112且被承接座130承接,以避免第二 晶圓12在此階段因未能被良好承接而破裂。 As shown in FIG3 , when the receiving seat 130 is located in the base 110, the projection of the receiving seat 130 on the plane where the base 110 is located overlaps the local through hole 112. When the first wafer 10 is cut into the second wafer 12 and the receiving seat 130 is located in the base 110, the second wafer 12 can pass through the through hole 112 and be received by the receiving seat 130 to prevent the second wafer 12 from being broken due to failure to be well received at this stage.

圖4是依照本發明的另一實施例的一種晶圓夾持治具的立體示意圖。圖5是圖4的晶圓夾持治具夾持第一晶圓的立體示意圖。圖6是圖5的俯視圖示意圖。要說明的是,在圖4中,為了清楚區分基座110a與承接座130a,將承接座130a以打點表示。 FIG. 4 is a three-dimensional schematic diagram of a wafer clamping fixture according to another embodiment of the present invention. FIG. 5 is a three-dimensional schematic diagram of the wafer clamping fixture of FIG. 4 clamping a first wafer. FIG. 6 is a schematic diagram of a top view of FIG. 5. It should be noted that in FIG. 4, in order to clearly distinguish the base 110a from the receiving seat 130a, the receiving seat 130a is indicated by dots.

請參閱圖4至圖6,圖4的晶圓夾持治具100a與圖1的晶圓夾持治具100的主要差異在於,在圖1的晶圓夾持治具100中,第一晶圓10是夾持於基座110的托緣116與卡合件120之間。因此,圖3的通過孔112的尺寸D3會小於第一晶圓10的第一尺寸D1。 Please refer to Figures 4 to 6. The main difference between the wafer clamping fixture 100a of Figure 4 and the wafer clamping fixture 100 of Figure 1 is that in the wafer clamping fixture 100 of Figure 1, the first wafer 10 is clamped between the supporting edge 116 of the base 110 and the clamping member 120. Therefore, the size D3 of the through hole 112 of Figure 3 is smaller than the first size D1 of the first wafer 10.

在本實施例中,如圖5所示,晶圓夾持治具100a更包括尺寸調整件140,可運動地設置於基座110a,且卡合件120a可運動地設置於尺寸調整件140。第一晶圓10適於被夾持於尺寸調整件140與卡合件120a之間。 In this embodiment, as shown in FIG. 5 , the wafer clamping fixture 100a further includes a size adjustment member 140 movably disposed on the base 110a, and a clamping member 120a movably disposed on the size adjustment member 140. The first wafer 10 is suitable for being clamped between the size adjustment member 140 and the clamping member 120a.

具體地說,使用者可依照不同尺寸的第一晶圓10,將尺寸調整件140沿著徑向移動,以將尺寸調整件140相對於基座110a的位置。舉例來說,若第一晶圓10的尺寸較大,尺寸調整件140可相對於基座110a沿著徑向往外運動,以使尺寸調整件140能夠承載第一晶圓10的邊緣部位。之後調整卡合件120a相對於尺寸調整件140的位置,以使第一晶圓10被夾持於尺寸調整件140與卡合件120a之間。 Specifically, the user can move the size adjustment member 140 radially according to the first wafer 10 of different sizes to adjust the position of the size adjustment member 140 relative to the base 110a. For example, if the size of the first wafer 10 is larger, the size adjustment member 140 can move radially outward relative to the base 110a so that the size adjustment member 140 can support the edge of the first wafer 10. Then adjust the position of the clamping member 120a relative to the size adjustment member 140 so that the first wafer 10 is clamped between the size adjustment member 140 and the clamping member 120a.

相反地,若第一晶圓10的尺寸較小,尺寸調整件140可 相對於基座110a沿著徑向往內運動,以使尺寸調整件140能夠承載第一晶圓10的邊緣部位。之後調整卡合件120a相對於尺寸調整件140的位置,以使第一晶圓10被夾持於尺寸調整件140與卡合件120a之間。 On the contrary, if the size of the first wafer 10 is smaller, the size adjustment member 140 can move radially inward relative to the base 110a so that the size adjustment member 140 can support the edge of the first wafer 10. Then, the position of the clamping member 120a relative to the size adjustment member 140 is adjusted so that the first wafer 10 is clamped between the size adjustment member 140 and the clamping member 120a.

同樣地,在本實施例中,由於第一晶圓110被良好地夾持於基座110與卡合件120之間,更具體地說,第一晶圓110被良好地夾持尺寸調整件140與卡合件120a之間,而降低第一晶圓10或第二晶圓12受水流衝擊而導致破片的機率。 Similarly, in this embodiment, since the first wafer 110 is well clamped between the base 110 and the clamping member 120, more specifically, the first wafer 110 is well clamped between the size adjustment member 140 and the clamping member 120a, the probability of the first wafer 10 or the second wafer 12 being broken by the impact of water flow is reduced.

如圖6所示,在本實施例中,由於第一晶圓10未直接接觸基座110a,也就是說,基座110a不需要用來承載第一晶圓10。晶圓夾持治具100a的基座110a的通過孔112a的尺寸D3a大於第一晶圓10的第一尺寸D1,而使得排氣孔114a(圖5)形成於基座110a在通過孔112a旁的壁面與第一晶圓10之間。晶圓夾持治具100a的排氣孔114a可使加工過程中產生的氣泡逸散,避免氣泡對晶圓產生壓力造成晶圓破片。 As shown in FIG. 6 , in this embodiment, since the first wafer 10 does not directly contact the base 110a, that is, the base 110a does not need to be used to carry the first wafer 10. The size D3a of the through hole 112a of the base 110a of the wafer clamping fixture 100a is larger than the first size D1 of the first wafer 10, so that the exhaust hole 114a ( FIG. 5 ) is formed between the wall of the base 110a next to the through hole 112a and the first wafer 10. The exhaust hole 114a of the wafer clamping fixture 100a can allow the bubbles generated during the processing to escape, thereby preventing the bubbles from exerting pressure on the wafer and causing wafer breakage.

此外,如圖6所示,由於第一晶圓110被夾持尺寸調整件140與卡合件120a之間,尺寸調整件140對基座110a所在平面的投影局部重疊於通過孔112a,以承載第一晶圓110。 In addition, as shown in FIG. 6 , since the first wafer 110 is clamped between the size adjusting member 140 and the engaging member 120a, the projection of the size adjusting member 140 on the plane where the base 110a is located partially overlaps the through hole 112a to support the first wafer 110.

請回到圖4,承接座130a可運動地設置於基座110a下方且對應於通過孔112a。在本實施例中,承接座130a中央有一凸起小圓,適於承接被切割後穿過通過孔112的第二晶圓12。 Please go back to Figure 4. The receiving seat 130a is movably disposed below the base 110a and corresponds to the through hole 112a. In this embodiment, there is a raised small circle in the center of the receiving seat 130a, which is suitable for receiving the second wafer 12 that passes through the through hole 112 after being cut.

在本實施例中,晶圓夾持治具100a的承接座130a可轉 動地設置於基座110a,且承接座130a具有沿著徑向延伸的一穿槽132。穿槽132內設置一切割機台連接部150,切割機台連接部150連接於切割線(未繪示)與切割機台(未繪示)。因此,當切割機台聯通切割線轉動切割第一晶圓10時,切割機台連接部150同步地帶動承接座130a轉動。本實施例的晶圓夾持治具100a的承接座130a可與切割機台同步轉動,而不需在切割製程中停止切割,以放入承接座,因此具有較佳的切割效率。 In this embodiment, the receiving seat 130a of the wafer clamping fixture 100a is rotatably arranged on the base 110a, and the receiving seat 130a has a through groove 132 extending along the radial direction. A cutting machine connection part 150 is arranged in the through groove 132, and the cutting machine connection part 150 is connected to the cutting line (not shown) and the cutting machine (not shown). Therefore, when the cutting machine is connected to the cutting line and rotates to cut the first wafer 10, the cutting machine connection part 150 synchronously drives the receiving seat 130a to rotate. The receiving seat 130a of the wafer clamping fixture 100a of this embodiment can rotate synchronously with the cutting machine without stopping the cutting in the cutting process to put in the receiving seat, so it has better cutting efficiency.

圖7是依照本發明的一實施例的一種晶棒固定治具的立體示意圖。請參閱圖7,本實施例的晶棒固定治具200適於固定長度大於20公厘的晶棒(未繪示),但不以此為限制。晶棒固定治具200包括一側板210、一第一夾持件220和一第二夾持件230。 FIG7 is a three-dimensional schematic diagram of a crystal rod fixing fixture according to an embodiment of the present invention. Referring to FIG7, the crystal rod fixing fixture 200 of this embodiment is suitable for fixing a crystal rod (not shown) with a length greater than 20 mm, but is not limited thereto. The crystal rod fixing fixture 200 includes a side plate 210, a first clamping member 220, and a second clamping member 230.

第一夾持件220和第二夾持件230固定於側板210。在本實施例中,晶棒固定治具200的第一夾持件220具有一V型承載面222。V型承載面222的開口朝向第二夾持件230。 The first clamping member 220 and the second clamping member 230 are fixed to the side plate 210. In this embodiment, the first clamping member 220 of the crystal rod fixing fixture 200 has a V-shaped bearing surface 222. The opening of the V-shaped bearing surface 222 faces the second clamping member 230.

在本實施例中,晶棒的一端面(圓表面)適於抵靠於側板210,且晶棒14的一周側(圓周面)適於被夾置於第一夾持件220的V型承載面222與第二夾持件230之間,而達到三點固定,以穩固地固定。相較於習知的晶棒固定治具以黏貼方式固定晶棒,上膠脫膠過程十分耗時。本實施例的晶棒固定治具200以夾持的方式將晶棒固定,可有效提升固定晶棒的效率。 In this embodiment, one end face (circular surface) of the crystal rod is suitable for abutting against the side plate 210, and one side (circumferential surface) of the crystal rod 14 is suitable for being clamped between the V-shaped bearing surface 222 of the first clamping member 220 and the second clamping member 230, so as to achieve three-point fixation for stable fixation. Compared with the known crystal rod fixing fixture that fixes the crystal rod by gluing, the gluing and debonding process is very time-consuming. The crystal rod fixing fixture 200 of this embodiment fixes the crystal rod by clamping, which can effectively improve the efficiency of fixing the crystal rod.

圖8是依照本發明的另一實施例的一種晶棒固定治具的立體示意圖。請參閱圖8,本實施例的晶棒固定治具200a適於固 定直徑小於150公厘的晶棒14,但不以此為限制。晶棒固定治具200a的第一夾持件220a和第二夾持件230a固定於側板210a。第一夾持件220a和第二夾持件230a夾持晶棒14的兩端面。同樣地,本實施例的晶棒固定治具200a以夾持的方式將晶棒固定,可有效提升固定晶棒的效率。 FIG8 is a three-dimensional schematic diagram of a crystal rod fixing fixture according to another embodiment of the present invention. Referring to FIG8, the crystal rod fixing fixture 200a of this embodiment is suitable for fixing a crystal rod 14 with a diameter less than 150 mm, but is not limited thereto. The first clamping member 220a and the second clamping member 230a of the crystal rod fixing fixture 200a are fixed to the side plate 210a. The first clamping member 220a and the second clamping member 230a clamp the two end surfaces of the crystal rod 14. Similarly, the crystal rod fixing fixture 200a of this embodiment fixes the crystal rod by clamping, which can effectively improve the efficiency of fixing the crystal rod.

圖9是依照本發明的另一實施例的一種晶棒固定治具的立體示意圖。請參閱圖9,本實施例的晶棒固定治具200b適於固定直徑大於150公厘的晶棒14,但不以此為限制。由於晶棒14的直徑尺寸較大,適用於多點夾持。晶棒固定治具200b的第一夾持件220b和第二夾持件230b固定於側板210b,且具有多組側板210b、第一夾持件220b和第二夾持件230b,以夾持晶棒14的不同位置。 FIG9 is a three-dimensional schematic diagram of a crystal rod fixing fixture according to another embodiment of the present invention. Referring to FIG9, the crystal rod fixing fixture 200b of this embodiment is suitable for fixing a crystal rod 14 with a diameter greater than 150 mm, but is not limited thereto. Since the diameter of the crystal rod 14 is relatively large, it is suitable for multi-point clamping. The first clamping member 220b and the second clamping member 230b of the crystal rod fixing fixture 200b are fixed to the side plate 210b, and have multiple sets of side plates 210b, first clamping members 220b and second clamping members 230b to clamp different positions of the crystal rod 14.

圖10是本發明的另一實施例的一種晶棒固定治具的立體示意圖。請參閱圖10,本實施例的晶棒固定治具200c適於固定長度小於50公厘的晶棒,但不以此為限制。晶棒固定治具200c包括第一基座240以及第一真空吸盤250。第一真空吸盤250設置於第一基座240,且適於吸附晶棒14的一第一端面16。 FIG10 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention. Referring to FIG10 , the crystal rod fixing fixture 200c of this embodiment is suitable for fixing a crystal rod with a length less than 50 mm, but is not limited thereto. The crystal rod fixing fixture 200c includes a first base 240 and a first vacuum suction cup 250. The first vacuum suction cup 250 is disposed on the first base 240 and is suitable for adsorbing a first end face 16 of the crystal rod 14.

相較於習知的晶棒固定治具以黏貼方式固定晶棒,上膠脫膠過程十分耗時。本實施例的晶棒固定治具200c以真空吸附的方式將晶棒固定,可有效提升固定晶棒的效率。 Compared with the conventional crystal rod fixing fixture that fixes the crystal rod by gluing, the gluing and debonding process is very time-consuming. The crystal rod fixing fixture 200c of this embodiment fixes the crystal rod by vacuum adsorption, which can effectively improve the efficiency of fixing the crystal rod.

圖11是本發明的另一實施例的一種晶棒固定治具的立體示意圖。請參閱圖11,本實施例的晶棒固定治具200d適於固定厚 度大於50公厘的晶棒,但不以此為限制。圖11的晶棒固定治具200d與圖10的晶棒固定治具200c的差異是,晶棒固定治具200d還包括第二基座260以及第二真空吸盤270。 FIG11 is a three-dimensional schematic diagram of a crystal rod fixing fixture of another embodiment of the present invention. Referring to FIG11 , the crystal rod fixing fixture 200d of this embodiment is suitable for fixing a crystal rod with a thickness greater than 50 mm, but is not limited thereto. The difference between the crystal rod fixing fixture 200d of FIG11 and the crystal rod fixing fixture 200c of FIG10 is that the crystal rod fixing fixture 200d further includes a second base 260 and a second vacuum chuck 270.

第二真空吸盤270設置於第二基座260,且朝向第一真空吸盤250。第二真空吸盤270適於吸附晶棒14的一第二端面18。本實施例的晶棒固定治具200d以真空吸附的方式固定晶棒的兩端面,可有效提升固定晶棒14的效率且可相當穩固地固定晶棒14。 The second vacuum suction cup 270 is disposed on the second base 260 and faces the first vacuum suction cup 250. The second vacuum suction cup 270 is suitable for adsorbing a second end face 18 of the crystal rod 14. The crystal rod fixing fixture 200d of this embodiment fixes the two end faces of the crystal rod by vacuum adsorption, which can effectively improve the efficiency of fixing the crystal rod 14 and can fix the crystal rod 14 quite stably.

值得一提的是,在本實施例的晶棒固定治具200、200a、200b、200c、200d中,於放電加工切割製程時,適於以銅膠帶等導體(未繪示)連接晶棒14與晶棒固定治具200、200a、200b、200c、200d。以增加晶棒14與晶棒固定治具200、200a、200b、200c、200d間的導電性,使晶棒14電通率增加,進而提升放電加工效率。須注意的是,為保持最佳導電率以及避免膠帶影響切割路徑,膠帶須與切割路徑距離20公厘。 It is worth mentioning that in the crystal rod fixing fixture 200, 200a, 200b, 200c, 200d of the present embodiment, during the EDM cutting process, it is suitable to connect the crystal rod 14 and the crystal rod fixing fixture 200, 200a, 200b, 200c, 200d with a conductor such as copper tape (not shown). In order to increase the conductivity between the crystal rod 14 and the crystal rod fixing fixture 200, 200a, 200b, 200c, 200d, the conductivity of the crystal rod 14 is increased, thereby improving the EDM processing efficiency. It should be noted that in order to maintain the best conductivity and prevent the tape from affecting the cutting path, the tape must be 20 mm away from the cutting path.

綜上所述,本發明的晶圓夾持治具的卡合件可運動地設置於基座的上方,以將第一晶圓良好地夾持於基座與卡合件之間,而降低第一晶圓或第二晶圓受水流衝擊而導致破片的機率。被基座與卡合件夾持的第一晶圓被切割為第二晶圓後,可穿過基座的通過孔,以被基座的下方的承接座良好地承接。此外,晶圓夾持治具的排氣孔可使加工過程中產生的氣泡逸散,避免氣泡對第一晶圓或第二晶圓產生壓力造成第一晶圓或第二晶圓破片。 In summary, the clamping member of the wafer clamping fixture of the present invention can be movably arranged above the base to well clamp the first wafer between the base and the clamping member, thereby reducing the probability of the first wafer or the second wafer being impacted by the water flow and causing fragmentation. After the first wafer clamped by the base and the clamping member is cut into the second wafer, it can pass through the through hole of the base to be well received by the receiving seat below the base. In addition, the exhaust hole of the wafer clamping fixture can allow the bubbles generated during the processing to escape, thereby preventing the bubbles from generating pressure on the first wafer or the second wafer and causing the first wafer or the second wafer to be broken.

另外,習知的晶棒固定治具以黏貼方式固定晶棒,上膠 脫膠過程十分耗時。本發明的晶棒固定治具以夾持或真空吸附的方式將晶棒固定,以提升效率。 In addition, the conventional crystal rod fixing jig fixes the crystal rod by gluing, and the gluing and degumming process is very time-consuming. The crystal rod fixing jig of the present invention fixes the crystal rod by clamping or vacuum adsorption to improve efficiency.

100:晶圓夾持治具 100: Wafer clamping fixture

110:基座 110: Base

112:通過孔 112:Through the hole

114:排氣孔 114: Exhaust hole

116:托緣 116: Entrustment

120:卡合件 120: snap-fit parts

130:承接座 130: Receiver

Claims (7)

一種晶圓夾持治具,包括:一基座,包括一通過孔,該通過孔的尺寸大於該第二晶圓的該第二尺寸,且一排氣孔位於該基座;一卡合件,可運動地設置於該基座的上方;以及一承接座,可運動地設置於該基座內或是下方且對應於該通過孔。 A wafer clamping fixture includes: a base, including a through hole, the size of the through hole is larger than the second size of the second wafer, and an exhaust hole is located on the base; a clamping member is movably arranged above the base; and a receiving seat is movably arranged inside or below the base and corresponds to the through hole. 如請求項1所述的晶圓夾持治具,其中一第一晶圓適於被夾持於該基座與該卡合件之間,以被切割為一第二晶圓,該通過孔的尺寸介於該第一晶圓的該第一尺寸與該第二晶圓的該第二尺寸之間,該第二晶圓適於通過該通過孔且被該承接座承接,該基座包括環繞該通過孔的一托緣,該第一晶圓適於被夾持於該托緣與該卡合件之間。 The wafer clamping fixture as described in claim 1, wherein a first wafer is suitable for being clamped between the base and the clamping member to be cut into a second wafer, the size of the through hole is between the first size of the first wafer and the second size of the second wafer, the second wafer is suitable for passing through the through hole and being received by the receiving seat, the base includes a supporting edge surrounding the through hole, and the first wafer is suitable for being clamped between the supporting edge and the clamping member. 如請求項2所述的晶圓夾持治具,其中該排氣孔位於該基座與該第一晶圓之間,該排氣孔凹陷於該托緣。 The wafer clamping fixture as described in claim 2, wherein the exhaust hole is located between the base and the first wafer, and the exhaust hole is recessed in the support edge. 如請求項1所述的晶圓夾持治具,其中當該承接座設置於該基座內或是下方時,該承接座對該基座所在平面的投影重疊於局部的該通過孔,且該承接座適於從該基座的下方移開,以使該承接座對該基座所在平面的投影不重疊於該通過孔。 The wafer clamping fixture as described in claim 1, wherein when the receiving seat is arranged inside or below the base, the projection of the receiving seat on the plane where the base is located overlaps with the local through hole, and the receiving seat is suitable for being moved away from below the base so that the projection of the receiving seat on the plane where the base is located does not overlap with the through hole. 如請求項1所述的晶圓夾持治具,其中一第一晶圓適於被夾持於該基座與該卡合件之間,以被切割為一第二晶圓,該 通過孔的尺寸大於該第一晶圓的一第一尺寸,該排氣孔形成於該通過孔的壁面與該第一晶圓之間。 A wafer clamping fixture as described in claim 1, wherein a first wafer is suitable for being clamped between the base and the engaging member to be cut into a second wafer, the size of the through hole is larger than a first size of the first wafer, and the exhaust hole is formed between the wall of the through hole and the first wafer. 如請求項1所述的晶圓夾持治具,更包括一尺寸調整件,可運動地設置於該基座,該尺寸調整件對該基座所在平面的投影局部重疊於該通過孔,該卡合件可運動地設置於該尺寸調整件,一第一晶圓適於被夾持於該尺寸調整件與該卡合件之間。 The wafer clamping fixture as described in claim 1 further includes a size adjustment member movably disposed on the base, the projection of the size adjustment member on the plane where the base is located partially overlaps the through hole, the clamping member is movably disposed on the size adjustment member, and a first wafer is suitable for being clamped between the size adjustment member and the clamping member. 如請求項6所述的晶圓夾持治具,其中該承接座可轉動地設置於該基座,且該承接座具有沿著徑向延伸的一穿槽。 The wafer clamping fixture as described in claim 6, wherein the receiving seat is rotatably disposed on the base, and the receiving seat has a through groove extending along the radial direction.
TW112108918A 2023-03-10 2023-03-10 Wafer clamping jig TWI839152B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6065461A (en) * 1997-03-17 2000-05-23 Super Silicon Crystal Research Institute Corp. Ingot slicing method and apparatus therefor
TW201347015A (en) * 2011-12-29 2013-11-16 Memc Electronic Materials Methods for mounting an ingot on a wire saw
US20140295126A1 (en) * 2013-03-29 2014-10-02 Sumco Techxiv Corporation Method for slicing semiconductor single crystal ingot
US20200303199A1 (en) * 2019-03-21 2020-09-24 Samuel Messinger Longitudinal silicon ingot slicing apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6065461A (en) * 1997-03-17 2000-05-23 Super Silicon Crystal Research Institute Corp. Ingot slicing method and apparatus therefor
TW201347015A (en) * 2011-12-29 2013-11-16 Memc Electronic Materials Methods for mounting an ingot on a wire saw
US20140295126A1 (en) * 2013-03-29 2014-10-02 Sumco Techxiv Corporation Method for slicing semiconductor single crystal ingot
US20200303199A1 (en) * 2019-03-21 2020-09-24 Samuel Messinger Longitudinal silicon ingot slicing apparatus

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