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TWI799876B - 臭氧水製造裝置、水處理裝置及臭氧水製造方法 - Google Patents

臭氧水製造裝置、水處理裝置及臭氧水製造方法 Download PDF

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Publication number
TWI799876B
TWI799876B TW110119604A TW110119604A TWI799876B TW I799876 B TWI799876 B TW I799876B TW 110119604 A TW110119604 A TW 110119604A TW 110119604 A TW110119604 A TW 110119604A TW I799876 B TWI799876 B TW I799876B
Authority
TW
Taiwan
Prior art keywords
ozone water
water production
processing device
production method
ozone
Prior art date
Application number
TW110119604A
Other languages
English (en)
Other versions
TW202146107A (zh
Inventor
和田昇
谷村泰宏
山内登起子
Original Assignee
日商三菱電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱電機股份有限公司 filed Critical 日商三菱電機股份有限公司
Publication of TW202146107A publication Critical patent/TW202146107A/zh
Application granted granted Critical
Publication of TWI799876B publication Critical patent/TWI799876B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F3/02—Aerobic processes
    • C02F3/12—Activated sludge processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/10—Biological treatment of water, waste water, or sewage

Landscapes

  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Inorganic Chemistry (AREA)
  • Microbiology (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Activated Sludge Processes (AREA)
TW110119604A 2020-06-08 2021-05-31 臭氧水製造裝置、水處理裝置及臭氧水製造方法 TWI799876B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2020/022549 2020-06-08
PCT/JP2020/022549 WO2021250745A1 (ja) 2020-06-08 2020-06-08 オゾン水製造装置、水処理装置およびオゾン水製造方法

Publications (2)

Publication Number Publication Date
TW202146107A TW202146107A (zh) 2021-12-16
TWI799876B true TWI799876B (zh) 2023-04-21

Family

ID=78845437

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110119604A TWI799876B (zh) 2020-06-08 2021-05-31 臭氧水製造裝置、水處理裝置及臭氧水製造方法

Country Status (4)

Country Link
JP (1) JP7262673B2 (zh)
CN (1) CN115702116B (zh)
TW (1) TWI799876B (zh)
WO (1) WO2021250745A1 (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201318963A (zh) * 2011-07-08 2013-05-16 Kurita Water Ind Ltd 臭氧水供給裝置及臭氧水供給方法
JP2013188655A (ja) * 2012-03-13 2013-09-26 Hitachi-Ge Nuclear Energy Ltd オゾンを用いた有機物分解システム
TW201619045A (zh) * 2014-09-18 2016-06-01 荏原製作所股份有限公司 氣體溶解水製造裝置及製造方法
CN106794428A (zh) * 2014-08-29 2017-05-31 三菱电机株式会社 过滤膜的清洗方法及清洗装置、以及水处理系统
CN108697989A (zh) * 2016-03-04 2018-10-23 三菱电机株式会社 膜过滤装置、过滤膜清洗方法以及过滤膜的制造方法
JP6617860B1 (ja) * 2019-05-27 2019-12-11 三菱電機株式会社 膜分離活性汚泥システムおよび膜洗浄装置
TW202012318A (zh) * 2018-05-02 2020-04-01 國立大學法人東北大學 臭氧水之製造法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000037695A (ja) * 1998-07-24 2000-02-08 Kurita Water Ind Ltd オゾン水供給装置
JP4276759B2 (ja) 1999-12-20 2009-06-10 住友精密工業株式会社 オゾン発生設備の運転方法
JP4587111B2 (ja) * 2000-04-06 2010-11-24 栗田工業株式会社 オゾン溶解水供給装置
JP4513122B2 (ja) * 2004-03-31 2010-07-28 栗田工業株式会社 オゾン水供給方法及びオゾン水供給装置
WO2009069772A1 (ja) 2007-11-30 2009-06-04 Mitsubishi Electric Corporation オゾン濃縮装置
JP5893939B2 (ja) * 2012-02-02 2016-03-23 松村 明子 オゾン水生成装置及びオゾン水生成方法
JP2014079722A (ja) * 2012-10-18 2014-05-08 Japan Organo Co Ltd オゾン水製造方法
JP6734621B2 (ja) * 2014-02-20 2020-08-05 オルガノ株式会社 オゾン水供給方法及びオゾン水供給装置
JP6271109B1 (ja) * 2017-06-07 2018-01-31 三菱電機株式会社 水処理膜の洗浄装置及び洗浄方法、並びに水処理システム
JP6444574B1 (ja) 2018-06-08 2018-12-26 三菱電機株式会社 水処理システムおよび水処理方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201318963A (zh) * 2011-07-08 2013-05-16 Kurita Water Ind Ltd 臭氧水供給裝置及臭氧水供給方法
JP2013188655A (ja) * 2012-03-13 2013-09-26 Hitachi-Ge Nuclear Energy Ltd オゾンを用いた有機物分解システム
CN106794428A (zh) * 2014-08-29 2017-05-31 三菱电机株式会社 过滤膜的清洗方法及清洗装置、以及水处理系统
TW201619045A (zh) * 2014-09-18 2016-06-01 荏原製作所股份有限公司 氣體溶解水製造裝置及製造方法
CN108697989A (zh) * 2016-03-04 2018-10-23 三菱电机株式会社 膜过滤装置、过滤膜清洗方法以及过滤膜的制造方法
TW202012318A (zh) * 2018-05-02 2020-04-01 國立大學法人東北大學 臭氧水之製造法
JP6617860B1 (ja) * 2019-05-27 2019-12-11 三菱電機株式会社 膜分離活性汚泥システムおよび膜洗浄装置

Also Published As

Publication number Publication date
JPWO2021250745A1 (zh) 2021-12-16
JP7262673B2 (ja) 2023-04-21
WO2021250745A1 (ja) 2021-12-16
CN115702116B (zh) 2024-09-13
CN115702116A (zh) 2023-02-14
TW202146107A (zh) 2021-12-16

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