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TWI793186B - Method for producing laminate and hardened seal - Google Patents

Method for producing laminate and hardened seal Download PDF

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TWI793186B
TWI793186B TW107134885A TW107134885A TWI793186B TW I793186 B TWI793186 B TW I793186B TW 107134885 A TW107134885 A TW 107134885A TW 107134885 A TW107134885 A TW 107134885A TW I793186 B TWI793186 B TW I793186B
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layer
resin layer
energy ray
curable resin
mass
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TW107134885A
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TW202014302A (en
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佐藤明德
高麗洋佑
阿久津高志
垣內康彦
岡本直也
山田忠知
中山武人
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日商琳得科股份有限公司
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Abstract

本發明為有關一種層合體,其為具有:能量線硬化性樹脂層(I),與支撐該能量線硬化性樹脂層(I)的支撐層(II);其中,前述能量線硬化性樹脂層(I),為具有具黏著性的表面,前述支撐層(II)為具有基材(Y)及黏著劑層,該基材(Y)及黏著劑層之至少一者為含有熱膨脹性粒子,前述由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)與前述支撐層(II),經使前述熱膨脹性粒子進行膨脹之處理,而於其界面形成分離。The present invention relates to a laminate comprising: an energy ray curable resin layer (I), and a support layer (II) supporting the energy ray curable resin layer (I); wherein the energy ray curable resin layer (I) has an adhesive surface, the aforementioned support layer (II) has a base material (Y) and an adhesive layer, at least one of the base material (Y) and the adhesive layer contains thermally expandable particles, The cured resin layer (I') formed by curing the energy ray curable resin layer (I) and the support layer (II) are separated at the interface through the treatment of expanding the thermally expandable particles.

Description

層合體及硬化密封體之製造方法Method for producing laminate and hardened seal

本發明為有關層合體及硬化密封體之製造方法。The present invention relates to a method of manufacturing a laminated body and a hardened sealing body.

近年來,伴隨電子機器之小型化、輕量化及高機能化,半導體晶片,多以趨近其尺寸之方式進行實際的封裝。該些封裝,亦稱為CSP(裸晶封裝;Chip Scale Package)。CSP可列舉如,以晶圓尺寸處理至封裝的最後步驟為止而完成的WLP(Wafer Level Package)、以較晶圓尺寸為更大的面板尺寸處理至封裝的最後步驟為止而完成的PLP(Panel Level Package)等。In recent years, along with the miniaturization, light weight and high performance of electronic equipment, semiconductor chips are usually packaged in a way approaching their size. These packages are also called CSP (Chip Scale Package). Examples of CSP include WLP (Wafer Level Package), which is completed from wafer-size processing to the final step of packaging, and PLP (Panel Level Package) etc.

WLP及PLP可區分為扇入(Fan-In)型與扇出(Fan-Out)型。扇出(Fan-Out)型的WLP(以下,亦稱為「FOWLP」)及PLP(以下,亦稱為「FOPLP」)製程中,半導體晶片被密封材以較晶片尺寸為更大的區域方式被覆,而形成半導體晶片的硬化密封體,而導線重佈層(RDL)及外部電極,不僅形成於半導體晶片的線路面,亦形成於密封材的表面區域中。WLP and PLP can be divided into fan-in (Fan-In) type and fan-out (Fan-Out) type. In the fan-out (Fan-Out) type WLP (hereinafter, also referred to as "FOWLP") and PLP (hereinafter, also referred to as "FOPLP") processes, the semiconductor wafer is sealed in a larger area than the wafer size. coating to form a hardened sealing body of the semiconductor wafer, and the wire redistribution layer (RDL) and external electrodes are not only formed on the circuit surface of the semiconductor wafer, but also formed in the surface area of the sealing material.

FOWLP及FOPLP,例如,可經由使複數的半導體晶片載置於暫時固定用薄片之載置步驟,與以熱硬化性密封材被覆之被覆步驟,與使該密封材熱硬化而製得硬化密封體之硬化步驟,與使該硬化密封體與暫時固定用薄片分離之分離步驟,與於露出的半導體晶片側之表面,形成導線重佈層(RDL)之導線重佈層(RDL)形成步驟之方式製得(以下,進行被覆步驟及硬化步驟之加工,亦稱為「密封加工」)。For FOWLP and FOPLP, for example, a hardened sealing body can be produced by placing a plurality of semiconductor wafers on a temporary fixing sheet, covering with a thermosetting sealing material, and thermosetting the sealing material. The hardening step, the separation step of separating the hardened sealing body from the temporary fixing sheet, and the wire redistribution layer (RDL) forming step of forming a wire redistribution layer (RDL) on the surface of the exposed semiconductor wafer side Manufactured (hereinafter, the processing of the coating step and the hardening step is also referred to as "sealing processing").

專利文獻1中,揭示一種於基材的至少一側面上,設置含有熱膨脹性微小球的熱膨脹性黏著層的供切斷電子零件用的暫時固定用加熱剝離型黏著薄片。FOWLP及FOPLP之製造中,推測也可使用專利文獻1記載之加熱剝離型黏著薄片。    [先前技術文獻]    [專利文獻]Patent Document 1 discloses a heat-peelable adhesive sheet for temporary fixing of electronic components, in which a thermally expandable adhesive layer containing thermally expandable microspheres is provided on at least one side of a substrate. In the production of FOWLP and FOPLP, it is presumed that the heat-peelable adhesive sheet described in Patent Document 1 can also be used. [Prior technical literature] [Patent literature]

[專利文獻1] 專利第3594853號公報[Patent Document 1] Patent No. 3594853

[發明所欲解決之問題][Problem to be solved by the invention]

但,於製造專利文獻1記載的以黏著薄片作為暫時固定用薄片所使用的硬化密封體時,硬化密封體受到熱收縮時會有翹曲之傾向。此點,推測因被密封於硬化密封體中的半導體晶片,存在靠近與暫時固定用薄片相鄰接之面側,故於硬化密封體中,產生了熱膨脹係數較小但於半導體晶片中的存在比例相對更高之側的區域,與熱膨脹係數較大、硬化樹脂的存在比例相對更高之側的區域,而由兩區域的熱收縮率之差異而發生應力所造成者。該問題,於FOWLP、FOPLP等的封裝尺寸越大時,有著更顯著之傾向。      發生翹曲之硬化密封體,例如,於隨後步驟之進行硬化密封體研削時,將容易發生破裂、硬化密封體使用裝置進行運送之際,使用手臂收受傳遞硬化密封體時,將容易發生失調等問題。However, when the hardened sealing body described in Patent Document 1 is manufactured using the adhesive sheet as the temporary fixing sheet, the hardened sealing body tends to warp when subjected to heat shrinkage. At this point, it is speculated that because of being sealed in the semiconductor wafer in the hardened sealing body, there is a surface side adjacent to the temporary fixing sheet, so in the hardened sealing body, the thermal expansion coefficient is small but exists in the semiconductor wafer. The area on the side with a relatively higher ratio and the area on the side with a higher thermal expansion coefficient and a relatively higher ratio of hardened resin are caused by the stress generated by the difference in thermal contraction rate between the two areas. This problem tends to become more prominent as the package size of FOWLP, FOPLP, etc. increases. The warped hardened seal, for example, will be prone to breakage when the hardened seal is ground in the subsequent step, and when the hardened seal is transported by the device, it will be prone to misalignment when the hardened seal is received and delivered by the arm. question.

而抑制硬化密封體變形之方法,例如,已有研究使用具備有設有一含有熱膨脹性粒子的熱膨脹性黏著層的暫時固定層與熱硬化性樹脂層之層合體的方法。即,實施於該層合體所具備的熱硬化性樹脂層上載置半導體晶片之載置步驟及被覆步驟,其後,使熱硬化性樹脂層及密封材熱硬化,製得附有硬化樹脂層的硬化密封體後,使熱膨脹性粒子發泡,而使附有硬化樹脂層的硬化密封體與暫時固定層形成分離之方法。依該方法時,因硬化樹脂層具有作為硬化密封體之抗變形層的機能,故可製得可抑制變形發生的硬化密封體。As for the method of suppressing the deformation of the hardened sealing body, for example, a method of using a laminate including a temporary fixing layer provided with a thermally expandable adhesive layer containing thermally expandable particles and a thermosetting resin layer has been studied. That is, a placing step and a coating step of placing a semiconductor chip on the thermosetting resin layer included in the laminate are carried out, and thereafter, the thermosetting resin layer and the sealing material are thermally cured to obtain a laminate with a cured resin layer. After the sealing body is hardened, the heat-expandable particles are foamed to separate the hardened sealing body with the cured resin layer from the temporary fixing layer. According to this method, since the hardened resin layer functions as a deformation-resistant layer of the hardened sealing body, it is possible to obtain a hardened sealing body in which deformation is suppressed.

另一方面,依上述方法時,因使熱膨脹性粒子發泡之處理,與使熱硬化性樹脂層硬化之處理等任一者皆為加熱處理,故於使熱硬化性樹脂層硬化的加熱處理中,於暫時固定層中的熱膨脹性粒子會有產生發泡之情形。依本發明者等的研究結果,得知於熱硬化性樹脂層充份硬化之前,若暫時固定層中的熱膨脹性粒子產生發泡時,於隨後的分離步驟中,暫時固定層的分離性會有惡化之情形。      因此,極期待有一種可以適用於將抗變形層的硬化樹脂層供予硬化密封體,形成附有硬化樹脂層的硬化密封體之後,可使硬化樹脂層與暫時固定層容易分離以製造硬化密封體的層合體。On the other hand, when according to the above method, any one of the treatment of making the thermally expandable particles foam and the treatment of hardening the thermosetting resin layer is heat treatment, so the heat treatment of making the thermosetting resin layer harden In this method, the heat-expandable particles in the temporarily fixed layer may foam. According to the research results of the inventors of the present invention, before the thermosetting resin layer is fully cured, if the thermally expandable particles in the temporarily fixed layer are foamed, the detachability of the temporarily fixed layer will be deteriorated in the subsequent separation step. There are deteriorating conditions. Therefore, it is highly expected to have a method that can be applied to supply the hardened resin layer of the anti-deformation layer to the hardened sealing body, and after forming the hardened sealed body with the hardened resin layer, the hardened resin layer can be easily separated from the temporary fixing layer to produce a hardened seal. body laminates.

本發明為鑑於上述問題,而以提出一種具有支撐層與硬化性樹脂層,其可於將密封對象物固定於前述硬化性樹脂層的表面,進行密封加工的同時,亦可提供作為該密封加工所形成的硬化密封體之抗翹曲層的硬化樹脂層,且可使前述硬化樹脂層與前述支撐層容易分離的層合體,及使用該層合體的硬化密封體之製造方法為目的。        [解決問題之方法]In view of the above-mentioned problems, the present invention proposes a support layer and a hardening resin layer, which can fix the object to be sealed on the surface of the hardening resin layer and perform sealing work, and also provide a sealant for the sealing work. The cured resin layer of the anti-warping layer of the cured sealing body formed, and the laminated body in which the cured resin layer and the aforementioned support layer can be easily separated, and the production method of the cured sealed body using the laminated body are aimed at. [The way to solve the problem]

本發明者們,就解決上述問題經過深入研究結果,發現經由下述的本發明,即可解決上述問題,因而完成本發明。      即,本發明為有關以下的[1]~[11]。      [1] 一種層合體,其特徵為具有      能量線硬化性樹脂層(I),與      支撐該能量線硬化性樹脂層(I)的支撐層(II);      能量線硬化性樹脂層(I),為具有具黏著性的表面,      支撐層(II)為具有基材(Y)及黏著劑層(X),該基材(Y)及黏著劑層(X)之至少一者為含有熱膨脹性粒子,      由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)與支撐層(II),經使前述熱膨脹性粒子膨脹之處理,而於該界面形成分離。      [2] 如上述[1]記載之層合體,其中,      由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)之23℃的儲存彈性率E’,為1.0×107 ~1.0×1013 Pa。      [3] 如上述[1]或[2]記載之層合體,其中,      能量線硬化性樹脂層(I)之厚度為1~500μm。      [4] 如上述[1]~[3]中任一項記載的層合體,其中,      能量線硬化性樹脂層(I)之可見光穿透率為5%以上。      [5] 如上述[1]~[4]中任一項記載的層合體,其中,      基材(Y)為具有含有前述熱膨脹性粒子的膨脹性基材層(Y1)。      [6] 如上述[5]記載之層合體,其中,      黏著劑層(X)為非膨脹性黏著劑層。      [7] 如上述[5]或[6]記載之層合體,其中,      黏著劑層(X)與能量線硬化性樹脂層(I)為直接層合者。      [8] 如上述[5]~[7]中任一項記載之層合體,其中,      基材(Y)為具有非膨脹性基材層(Y2)及膨脹性基材層(Y1),      支撐層(II)為依序具有非膨脹性基材層(Y2)、膨脹性基材層(Y1),及黏著劑層(X)      黏著劑層(X)與能量線硬化性樹脂層(I)為直接層合者。      [9] 如上述[1]~[8]中任一項記載的層合體,其為用於形成包含前述密封對象物的硬化密封體者,      其係於能量線硬化性樹脂層(I)的表面的一部份載置密封對象物,      以能量線照射能量線硬化性樹脂層(I),而形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’),      於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆,      該密封材熱硬化後,經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II)於該界面形成分離。      [10] 如上述[9]記載之層合體,其係用於防止前述硬化密封體之翹曲。      [11] 一種硬化密封體之製造方法,其為使用上述[1]~[10]中任一項記載的層合體製造硬化密封體之方法,其特徵為,具有下述步驟(i)~(iv):      步驟(i):於前述層合體所具有的能量線硬化性樹脂層(I)的表面之一部份,載置密封對象物之步驟      步驟(ii):以能量線照射能量線硬化性樹脂層(I),形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)之步驟      步驟(iii):於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆,使該密封材熱硬化,而形成包含前述密封對象物的硬化密封體之步驟      步驟(iv):經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II),於該界面形成分離,而製得附有硬化樹脂層的硬化密封體之步驟。        [發明之效果]The inventors of the present invention, as a result of intensive research on solving the above-mentioned problems, found that the above-mentioned problems can be solved by the following invention, and thus completed the present invention. That is, the present invention relates to the following [1] to [11]. [1] A laminate characterized by having an energy ray-curable resin layer (I), and a support layer (II) supporting the energy ray-curable resin layer (I); the energy ray-curable resin layer (I), To have an adhesive surface, the support layer (II) has a base material (Y) and an adhesive layer (X), at least one of the base material (Y) and the adhesive layer (X) contains heat-expandable particles , The cured resin layer (I') formed by curing the energy ray curable resin layer (I) and the support layer (II) are separated at the interface through the treatment of expanding the thermally expandable particles. [2] The laminate according to the above [1], wherein the storage elastic modulus E' at 23°C of the cured resin layer (I') formed by curing the energy ray curable resin layer (I) is 1.0×10 7 ~1.0×10 13 Pa. [3] The laminate according to the above [1] or [2], wherein the thickness of the energy ray curable resin layer (I) is 1 to 500 μm. [4] The laminate according to any one of the above [1] to [3], wherein the visible light transmittance of the energy ray curable resin layer (I) is 5% or more. [5] The laminate according to any one of the above [1] to [4], wherein the substrate (Y) has an expandable substrate layer (Y1) containing the thermally expandable particles. [6] The laminate according to the above [5], wherein the adhesive layer (X) is a non-expandable adhesive layer. [7] The laminate according to the above [5] or [6], wherein the adhesive layer (X) and the energy ray curable resin layer (I) are directly laminated. [8] The laminate according to any one of the above [5] to [7], wherein the base material (Y) has a non-expandable base material layer (Y2) and an expandable base material layer (Y1), and supports Layer (II) has a non-expandable base material layer (Y2), an expandable base material layer (Y1), and an adhesive layer (X) in this order. The adhesive layer (X) and the energy ray curable resin layer (I) for direct lamination. [9] The laminate according to any one of the above [1] to [8], which is used to form a cured sealing body containing the object to be sealed, and is composed of the energy ray curable resin layer (I). Place the object to be sealed on a part of the surface, and irradiate the energy ray curable resin layer (I) with energy rays to form a cured resin layer (I') formed by curing the energy ray curable resin layer (I). The object to be sealed, and at least the surface of the cured resin layer (I') on the peripheral part of the object to be sealed are covered with a thermosetting sealing material, and after the sealing material is thermally cured, the aforementioned heat-expandable particles are treated to expand, The cured resin layer (I') and the support layer (II) are separated at the interface. [10] The laminate described in [9] above, which is used to prevent warpage of the hardened sealing body. [11] A method for producing a cured sealing body, which is a method of producing a cured sealing body using the laminate described in any one of the above [1] to [10], characterized by comprising the following steps (i) to ( iv): Step (i): A step of placing an object to be sealed on a part of the surface of the energy ray-curable resin layer (I) of the above-mentioned laminate. Step (ii): Irradiating energy ray with energy ray and curing Resin layer (I), the step of forming a cured resin layer (I') formed by curing the energy ray curable resin layer (I) Step (iii): On the aforementioned sealing object, at least the peripheral portion of the sealing object The surface of the cured resin layer (I') is coated with a thermosetting sealing material, and the sealing material is thermally cured to form a hardened sealing body comprising the aforementioned object to be sealed. Step (iv): by making the aforementioned thermally expandable The particle expansion treatment is a step of making the hardened resin layer (I') and the support layer (II) separate at the interface to obtain a hardened sealing body with a hardened resin layer. [Effect of Invention]

本發明之內容,為提供一種具有支撐層與硬化性樹脂層,其可於將密封對象物固定於前述硬化性樹脂層的表面,進行密封加工的同時,亦可提供作為該密封加工所形成的硬化密封體之抗翹曲層的硬化樹脂層,且可使前述硬化樹脂層與前述支撐層容易分離的層合體,及使用該層合體的硬化密封體之製造方法。The content of the present invention is to provide a support layer and a hardening resin layer, which can fix the object to be sealed on the surface of the hardening resin layer and carry out the sealing process, and also provide the product formed by the sealing process. A cured resin layer of a warpage-resistant layer of a hardened sealing body, a laminate capable of easily separating the hardened resin layer from the support layer, and a method for producing a cured sealed body using the laminated body.

本說明書中,作為對象之層是否為「非膨脹性層」之判斷方式為,進行3分鐘膨脹處理後,依下述算式算出該處理前後的體積變化率未達5%之情形,則將該層判斷為「非膨脹性層」。又,若上述體積變化率為5%以上之情形時,該層則判斷為「膨脹性層」。      ・體積變化率(%)={(處理後之前述層的體積-處理前之前述層的體積)/處理前之前述層的體積}×100      又,「進行膨脹處理」,例如,為含有熱膨脹性粒子的層之情形,於該熱膨脹性粒子的開始膨脹溫度(t),進行3分鐘的加熱處理即可。In this specification, the method of judging whether the target layer is a "non-expandable layer" is that after performing the expansion treatment for 3 minutes, if the volume change rate before and after the treatment is calculated according to the following formula, it is less than 5%. The layer was judged as "non-expandable layer". In addition, when the above-mentioned volume change rate is 5% or more, the layer is judged as an "expandable layer".・Volume change rate (%)={(volume of the above-mentioned layer after treatment-volume of the above-mentioned layer before treatment)/volume of the above-mentioned layer before treatment}×100 Also, "expansion treatment" is, for example, to include thermal expansion In the case of a layer of thermally expandable particles, heat treatment for 3 minutes may be performed at the expansion initiation temperature (t) of the thermally expandable particles.

本說明書中,「有效成份」係指,作為對象的組成物所含有的成份中,去除稀釋溶劑後的成份之意。In this specification, the term "active ingredient" means, among the components contained in the target composition, the diluent solvent is excluded.

本說明書中,質量平均分子量(Mw)為,使用凝膠滲透色層分析(GPC)法測定之標準聚苯乙烯換算之值,具體而言為基於實施例記載之方法測定之值。In the present specification, the mass average molecular weight (Mw) is a value measured using gel permeation chromatography (GPC) in terms of standard polystyrene, specifically, a value measured based on the method described in Examples.

本說明書中,例如,「(甲基)丙烯酸」為表示「丙烯酸」與「甲基丙烯酸」等二者,其他的類似用語亦為相同。In this specification, for example, "(meth)acrylic acid" means both "acrylic acid" and "methacrylic acid", and other similar terms are also the same.

本說明書中,較佳的數值範圍(例如,含量等的範圍)中,以階段性記載的下限值及上限值,為各自獨立且可進行組合者。例如,「較佳為10~90,更佳為30~60」之記載,可分別以「較佳的下限值(10)」與「更佳的上限值(60)」進行組合,而為「10~60」者。In this specification, the lower limit and the upper limit described in stages in a preferable numerical range (for example, the range of content etc.) are each independent and combinable. For example, the description of "preferably 10-90, more preferably 30-60" can be combined with "preferably lower limit (10)" and "better upper limit (60)", and Those who are "10-60".

本說明書中所例示的各成份及材料,於無特別限定下,可單獨使用1種亦可、將2種以上合併使用亦可,為2種以上合併使用之情形,該些之組合及比例可作任意之選擇。The components and materials exemplified in this specification can be used alone or in combination of two or more without special limitations. In the case of using two or more in combination, the combination and ratio of these can be adjusted. Make any choice.

本說明書中,「能量線」係指,電磁波或電荷粒子線中具有能量子者之意,其例如,紫外線、輻射線、電子線等。紫外線,例如,可使用作為紫外線光源的高壓水銀燈、融合燈(Fusion Light)、氙氣燈、螢光燈或LED燈等進行照射。電子線,為照射使用電子線加速器等所發生之電子者。      本說明書中,「能量線硬化性」係指,具有經照射能量線而硬化的性質之意,「非能量線硬化性」係指,具有經照射能量線而硬化的性質之意。In this specification, "energy ray" refers to an electromagnetic wave or a charged particle ray having energy quanta, for example, ultraviolet rays, radiation rays, electron rays, and the like. Ultraviolet rays can be irradiated using, for example, a high-pressure mercury lamp, a fusion lamp (Fusion Light), a xenon lamp, a fluorescent lamp, or an LED lamp as an ultraviolet light source. Electron beams are those that irradiate electrons generated using electron beam accelerators, etc.  In this specification, "energy ray curable" means that it has the property of being cured by irradiation with energy rays, and "non-energy ray curable" means that it has the property of being cured by irradiating energy rays.

[層合體]      本發明之一態樣之層合體,為具有能量線硬化性樹脂層(I),與支撐該能量線硬化性樹脂層(I)的支撐層(II)。      能量線硬化性樹脂層(I)為具有具黏著性表面者。      支撐層(II)為具有基材(Y)及黏著劑層(X),該基材(Y)及黏著劑層(X)的至少一者為含有熱膨脹性粒子。[Laminate] A laminate according to an aspect of the present invention has an energy ray-curable resin layer (I) and a support layer (II) supporting the energy ray-curable resin layer (I). The energy ray curable resin layer (I) has an adhesive surface. The support layer (II) has a base material (Y) and an adhesive layer (X), and at least one of the base material (Y) and the adhesive layer (X) contains thermally expandable particles.

本發明之一態樣之層合體中,使支撐層(II)中的熱膨脹性粒子經進行膨脹處理,可使由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)與支撐層(II),於其界面形成分離。即,本發明之一態樣之層合體,經由加熱膨脹處理,使熱膨脹性粒子膨脹,而於該含有熱膨脹性粒子的層之表面生成凹凸,因而減少支撐層(II)與由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)的接觸面積。其結果可於支撐層(II)與硬化樹脂層(I’)的界面上,僅使用些許力量時即可容易使其整體分離。      又,本發明之一態樣之層合體中,因於能量線硬化性樹脂層(I)硬化之際,無須進行加熱處理,故於使能量線硬化性樹脂層(I)硬化之際,支撐層(II)中的熱膨脹性粒子不會產生膨脹,而可使由支撐層(II)與由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)的具有優良分離性者。In the laminate of one aspect of the present invention, the heat-expandable particles in the support layer (II) are subjected to expansion treatment, and the cured resin layer (I') formed by curing the energy ray-curable resin layer (I) can be combined with the The support layer (II) is separated at its interface. That is, in the laminated body of one aspect of the present invention, the heat-expandable particles are expanded through heat-expansion treatment, and irregularities are generated on the surface of the layer containing the heat-expandable particles, thereby reducing the support layer (II) and the energy ray hardening property. The contact area of the cured resin layer (I') formed by curing the resin layer (I). As a result, the interface between the support layer (II) and the cured resin layer (I') can be easily separated as a whole with only a little force. In addition, in the laminated body of one aspect of the present invention, since heat treatment is not required when the energy ray-curable resin layer (I) is cured, when the energy ray-curable resin layer (I) is cured, the supporting The heat-expandable particles in the layer (II) do not expand, but can make the cured resin layer (I') formed by curing the support layer (II) and the energy ray curable resin layer (I) have excellent separability .

本發明之一態樣之層合體,為適合使用於形成包含前述密封對象物的硬化密封體之方法,該方法為:      於能量線硬化性樹脂層(I)的表面的一部份載置密封對象物、以能量線照射能量線硬化性樹脂層(I),而形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’),於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆,該密封材熱硬化後,經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II)於該界面形成分離。      依上述方法形成的硬化密封體,於半導體晶片存在比例相對高之側之面,為具備硬化樹脂層(I’)者。其結果推測可縮小硬化密封體的2個表面間之收縮應力的差異,而製得可有效地抑制變形的硬化密封體。      即,本發明之一態樣之層合體,適合作為硬化密封體之抗翹曲用的抗翹曲用層合體。      於該情形,本發明之一態樣之層合體,因具有較熱硬化性樹脂層得以更容易調高黏著力的能量線硬化性樹脂層(I),故可使密封對象物更能確實地固定於表面的一部份。又,相對於熱硬化性樹脂層,於高溫下進行加熱時,主要於硬化的初期階段中會產生軟化,而容易造成晶片偏移之可能性而言,能量線硬化型黏著劑組成物,則會因能量線的照射而硬化,而不會軟化,故可迴避伴隨硬化過程中所發生的晶片偏移現象。A laminated body according to an aspect of the present invention is a method suitable for forming a hardened sealing body including the aforementioned object to be sealed. The object is irradiated with the energy ray curable resin layer (I) to form a cured resin layer (I') formed by hardening the energy ray curable resin layer (I), and the aforementioned sealed object and the sealed object The surface of the hardened resin layer (I') at least in the peripheral part of the object is covered with a thermosetting sealing material. After the sealing material is thermosetted, the aforementioned heat-expandable particles are expanded to make the hardened resin layer (I') It is separated from the support layer (II) at this interface. The hardened sealing body formed by the above method has a hardened resin layer (I') on the side where the proportion of semiconductor wafers is relatively high. As a result, it is presumed that the difference in shrinkage stress between the two surfaces of the hardened sealing body can be reduced to obtain a hardened sealing body that can effectively suppress deformation. That is, the laminated body of one aspect of the present invention is suitable as a warpage-resistant laminated body for anti-warping of a hardened sealing body. In this case, the laminated body of one aspect of the present invention has the energy ray-curable resin layer (I) whose adhesive force can be adjusted more easily than the thermosetting resin layer, so that the object to be sealed can be sealed more reliably. part of the surface. In addition, when the thermosetting resin layer is heated at a high temperature, it will soften mainly in the initial stage of curing, and easily cause the possibility of wafer displacement. The energy ray-curable adhesive composition is It will be hardened by the irradiation of energy rays without softening, so it can avoid the wafer shift phenomenon that occurs during the hardening process.

<層合體之構成內容>      隨後,將參考圖式說明本發明之一態樣的層合體之構成。      圖1~3為,表示本發明之第一態樣~第三態樣的層合體之構成的層合體之截面模式圖。又,以下的本發明之第一態樣~第三態樣之層合體中,貼附於支撐體的黏著劑層(X)(或第2黏著劑層(X2))的黏著表面(即,與支撐體為相反側的表面),及與能量線硬化性樹脂層(I)的支撐層(II)側為相反側的表面,亦可再具有層合剝離材之構成。<Configuration of Laminate> Next, the configuration of a laminate according to an aspect of the present invention will be described with reference to the drawings. Figures 1 to 3 are cross-sectional schematic diagrams of laminates showing the constitution of the laminates of the first to third aspects of the present invention. In addition, in the following laminates of the first aspect to the third aspect of the present invention, the adhesive surface (that is, The surface on the opposite side to the support body) and the surface on the opposite side to the support layer (II) side of the energy ray curable resin layer (I) may further have a structure in which a laminate release material is laminated.

[第一態樣的層合體]      本發明之第一態樣的層合體,例如圖1所示之層合體1a、1b。      層合體1a、1b為,具備能量線硬化性樹脂層(I),與具有基材(Y)及黏著劑層(X)的支撐層(II),其具有由基材(Y),與能量線硬化性樹脂層(I)直接層合之構成。      又,本發明之第一態樣之層合體中,黏著劑層(X)的黏著表面為貼附於支撐體(未標示於圖式)。[Laminated body of the first aspect] The laminated body of the first aspect of the present invention is, for example, the laminated body 1a, 1b shown in FIG. 1 . The laminates 1a and 1b are provided with an energy ray curable resin layer (I), and a support layer (II) having a base material (Y) and an adhesive layer (X), and have the base material (Y) and the energy A configuration in which the linear curable resin layer (I) is directly laminated. In addition, in the laminated body of the first aspect of the present invention, the adhesive surface of the adhesive layer (X) is attached to a support (not shown in the drawings).

支撐層(II)為,至少於任一層中含有熱膨脹性粒子者,層合體1a中,基材(Y)為僅由含有熱膨脹性粒子的膨脹性基材層(Y1)的單層所構成之基材。      基材(Y),如圖1(a)所示之層合體1a般,可為僅由膨脹性基材層(Y1)所形成的單層構成之基材,或如圖1(b)所示層合體1b般,為具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)的多層構成之基材。基材(Y)具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)時,基材(Y)可為僅由膨脹性基材層(Y1)及非膨脹性基材層(Y2)所構成者。      又,又以具有膨脹性基材層(Y1)與非膨脹性基材層(Y2)為直接層合之構成者為佳。The support layer (II) is one that contains heat-expandable particles in at least one layer, and in the laminate 1a, the base material (Y) is constituted only by a single layer of the expandable base material layer (Y1) containing heat-expandable particles Substrate. The base material (Y), like the laminate 1a shown in Figure 1(a), can be a base material consisting only of a single layer formed by the expandable base material layer (Y1), or as shown in Figure 1(b) In general, the laminate 1b is a substrate having a multilayer structure having an expandable base material layer (Y1) and a non-expandable base material layer (Y2). When the base material (Y) has an expandable base material layer (Y1) and a non-expandable base material layer (Y2), the base material (Y) can be composed of only the expandable base material layer (Y1) and the non-expandable base material layer (Y2) constituted. In addition, it is preferable to have a structure in which the expandable base material layer (Y1) and the non-expandable base material layer (Y2) are directly laminated.

如圖1(a)所示之層合體1a,於經由加熱膨脹處理,使膨脹性基材層(Y1)所含有的熱膨脹性粒子膨脹,而於基材(Y)表面形成凹凸,而可降低能量線硬化性樹脂層(I)於事前硬化的硬化樹脂層(I’)的接觸面積。      此時,黏著劑層(X)的黏著表面為貼附於未標示於圖式的支撐體。黏著劑層(X)與支撐體為以極為密著之方式貼附,故即使膨脹性基材層(Y1)的黏著劑層(X)側的表面,發生會產生凹凸的力量時,黏著劑層(X)也容易產生抗衡的力量。因此,於基材(Y)的黏著劑層(X)側的表面,將不易形成凹凸。      其結果,於層合體1a中,於支撐層(II)的基材(Y)與硬化樹脂層(I’)之界面P,只要使用些許力量即可使其整體容易分離。      又,層合體1a所具有的黏著劑層(X),為由對支撐體具有高黏著力的黏著劑組成物所形成,故可於界面P上容易形成分離。The laminated body 1a shown in Figure 1(a) undergoes heat expansion treatment to expand the thermally expandable particles contained in the expandable base material layer (Y1) to form unevenness on the surface of the base material (Y), thereby reducing the The contact area of the energy ray curable resin layer (I) and the previously cured cured resin layer (I′). At this time, the adhesive surface of the adhesive layer (X) is attached to the support not shown in the drawing. The adhesive layer (X) and the support are attached in a very close manner, so even if a force that causes unevenness occurs on the surface of the expandable base material layer (Y1) on the adhesive layer (X) side, the adhesive will not Layer (X) is also prone to generate countervailing forces. Therefore, it becomes difficult to form unevenness|corrugation on the surface of the adhesive layer (X) side of a base material (Y). As a result, in the laminated body 1a, at the interface P between the base material (Y) of the support layer (II) and the hardened resin layer (I'), the entirety can be easily separated with a little force. Also, since the adhesive layer (X) of the laminated body 1a is formed of an adhesive composition having high adhesive force to the support, separation can be easily formed on the interface P.

又,就抑制熱膨脹性粒子所產生的應力傳達至黏著劑層(X)側之觀點,如圖1(b)所示之層合體1b般,基材(Y)以具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)者為佳。      膨脹性基材層(Y1)的熱膨脹性粒子之膨脹產生的應力,因受到非膨脹性基材層(Y2)之抑制,故難以傳達到黏著劑層(X)。      因此,於黏著劑層(X)的支撐體側的表面將不易生成凹凸,而黏著劑層(X)與支撐體之密著性,於加熱膨脹處理前後幾乎未有變化,而可保持良好的密著性。如此,於膨脹性基材層(Y1)的能量線硬化性樹脂層(I)側的表面更容易形成凹凸,其結果,使得支撐層(II)的膨脹性基材層(Y1)與硬化樹脂層(I’)之界面P,只要使用些許力量即可使其整體容易分離。      又,如圖1(b)所示之層合體1b般,膨脹性基材層(Y1)與能量線硬化性樹脂層(I)以直接層合,且具有於非膨脹性基材層(Y2)的膨脹性基材層(Y1)之相反側的表面上層合黏著劑層(X)之構成為佳。Also, from the viewpoint of suppressing the stress generated by the heat-expandable particles from being transmitted to the side of the adhesive layer (X), like the laminate 1b shown in FIG. Y1) and non-expandable substrate layer (Y2) are preferred. The stress generated by the expansion of the thermally expandable particles in the expandable base material layer (Y1) is difficult to be transmitted to the adhesive layer (X) because it is suppressed by the non-expandable base material layer (Y2). Therefore, unevenness is not easily formed on the surface of the support body side of the adhesive layer (X), and the adhesion between the adhesive layer (X) and the support body hardly changes before and after thermal expansion treatment, and can maintain good Adhesion. In this way, unevenness is more easily formed on the surface of the expandable base material layer (Y1) on the energy ray-curable resin layer (I) side, and as a result, the expandable base material layer (Y1) of the support layer (II) and the cured resin The interface P of the layer (I') can be easily separated as a whole as long as a little force is used. Also, like the laminated body 1b shown in Figure 1(b), the expandable base material layer (Y1) and the energy ray curable resin layer (I) are directly laminated, and have a non-expandable base material layer (Y2 ) is preferably formed by laminating an adhesive layer (X) on the surface opposite to the expandable substrate layer (Y1).

[第二態樣的層合體]      本發明之第二態樣的層合體,可列舉如,圖2所示之層合體2a、2b。      層合體2a、2b中,支撐層(II)所具有的黏著劑層(X)為,具有第1黏著劑層(X1)及第2黏著劑層(X2),且具有以第1黏著劑層(X1)及第2黏著劑層(X2)挾夾基材(Y),而第1黏著劑層(X1)的黏著表面,與能量線硬化性樹脂層(I)為直接層合之構成。      又,本發明之第二態樣之層合體中,第2黏著劑層(X2)的黏著表面為貼附於支撐體(未標示於圖式)。[Laminated body of the second aspect] The laminated body of the second aspect of the present invention includes, for example, the laminated bodies 2a and 2b shown in FIG. 2 . In the laminated body 2a, 2b, the adhesive layer (X) which the support layer (II) has has the 1st adhesive layer (X1) and the 2nd adhesive layer (X2), and has the 1st adhesive layer (X1) and the second adhesive layer (X2) sandwich the substrate (Y), and the adhesive surface of the first adhesive layer (X1) is directly laminated with the energy ray curable resin layer (I). In addition, in the laminated body of the second aspect of the present invention, the adhesive surface of the second adhesive layer (X2) is attached to a support (not shown in the drawings).

本發明之第二態樣的層合體中,基材(Y)以具有含有熱膨脹性粒子的膨脹性基材層(Y1)者為佳。      基材(Y),如圖2(a)所示之層合體2a般,可為僅由膨脹性基材層(Y1)所形成的單層構成之基材,或如圖2(b)所示層合體2b般,亦可為具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)所形成的多層構成之基材。In the laminate of the second aspect of the present invention, the substrate (Y) preferably has an expandable substrate layer (Y1) containing heat-expandable particles. The base material (Y), like the laminated body 2a shown in Figure 2(a), can be a base material consisting only of a single layer formed by the expandable base material layer (Y1), or as shown in Figure 2(b) As shown in the laminated body 2b, it may be a base material having a multilayer structure formed of an expandable base material layer (Y1) and a non-expandable base material layer (Y2).

又,如上所述般,就為加熱膨脹處理前後可使第2黏著劑層(X2)與支撐體保持良好密著性的層合體之觀點,如圖2(b)所示般,基材(Y)以具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)者為佳。      又,第二態樣之層合體中,於使用具有膨脹性基材層(Y1)及非膨脹性基材層(Y2)的基材(Y)時,如圖2(b)所示般,以具有於膨脹性基材層(Y1)的能量線硬化性樹脂層(I)側的表面上層合第1黏著劑層(X1),於與非膨脹性基材層(Y2)的膨脹性基材層(Y1)為相反側的表面上層合第2黏著劑層(X2)之構成者為佳。Also, as described above, from the viewpoint of a laminate that can maintain good adhesion between the second adhesive layer (X2) and the support before and after thermal expansion treatment, as shown in Figure 2(b), the substrate ( Y) preferably has an expandable base material layer (Y1) and a non-expandable base material layer (Y2). Also, in the laminated body of the second aspect, when using the base material (Y) having the expandable base material layer (Y1) and the non-expandable base material layer (Y2), as shown in FIG. 2( b ), The first adhesive layer (X1) is laminated on the surface of the energy ray curable resin layer (I) side of the expandable base material layer (Y1), and the expandable base layer with the non-expandable base material layer (Y2) The material layer (Y1) is preferably formed by laminating the second adhesive layer (X2) on the opposite surface.

第二態樣之層合體,經由加熱膨脹處理,可使構成基材(Y)的膨脹性基材層(Y1)中的熱膨脹性粒子進行膨脹,而於膨脹性基材層(Y1)的表面形成凹凸。      隨後,因經由於膨脹性基材層(Y1)的表面所生成的凹凸,而押壓至第1黏著劑層(X1)上,而使第1黏著劑層(X1)的黏著表面亦形成凹凸之過程,而可降低第1黏著劑層(X1)與能量線硬化性樹脂層(I)於事前硬化而得的硬化樹脂層(I’)的接觸面積。其結果,可於支撐層(II)的第1黏著劑層(X1)與硬化樹脂層(I’)的界面P,只要使用些許力量即可使其整體容易分離。      又,本發明之第二態樣之層合體,就於界面P上,只要使用些許的力量即可使其整體容易分離之層合體的觀點,支撐層(II)所具有的基材(Y)的膨脹性基材層(Y1),與第1黏著劑層(X1)以具有直接層合之構成者為佳。In the laminated body of the second aspect, the heat-expandable particles in the expandable base material layer (Y1) constituting the base material (Y) can be expanded through heat expansion treatment, and the heat-expandable particles on the surface of the expandable base material layer (Y1) can be expanded. Form bumps. Then, because of the unevenness generated on the surface of the expandable base material layer (Y1), it is pressed onto the first adhesive layer (X1), so that the adhesive surface of the first adhesive layer (X1) also forms unevenness. The process can reduce the contact area between the first adhesive layer (X1) and the hardened resin layer (I') obtained by hardening the energy ray curable resin layer (I) in advance. As a result, the interface P between the first adhesive layer (X1) and the cured resin layer (I') of the support layer (II) can be easily separated as a whole with only a little force. In addition, the laminated body of the second aspect of the present invention is a laminated body that can be easily separated as a whole with only a little force on the interface P. The base material (Y) included in the support layer (II) It is preferable that the expandable base material layer (Y1) and the first adhesive layer (X1) have a structure of direct lamination.

[第三態樣的層合體]      本發明之第三態樣的層合體,可列舉如,圖3所示之層合體3。      圖3所示之層合體3為具有,於基材(Y)的一側之表面側,具有含有熱膨脹性粒子的膨脹性黏著劑層的第1黏著劑層(X1),且於基材(Y)的另一側之表面側,具備有具非膨脹性黏著劑層的第2黏著劑層(X2)之支撐層(II),且第1黏著劑層(X1)與能量線硬化性樹脂層(I)為直接層合之構成。      層合體3中,第2黏著劑層(X2)的黏著表面,為貼附於支撐體(未標示於圖式)。      又,本發明之第三態樣的層合體所具有的基材(Y),以由非膨脹性基材層所構成者為佳。[Laminated body of the third aspect] The laminated body of the third aspect of the present invention includes, for example, the laminated body 3 shown in FIG. 3 . The laminate 3 shown in FIG. 3 has a first adhesive layer (X1) having an expandable adhesive layer containing heat-expandable particles on the surface side of one side of the substrate (Y), and on the substrate (Y). The surface side of the other side of Y) is equipped with a support layer (II) having a second adhesive layer (X2) having a non-expandable adhesive layer, and the first adhesive layer (X1) and the energy ray curable resin Layer (I) is a direct laminated composition. In the laminated body 3, the adhesive surface of the second adhesive layer (X2) is attached to the support (not shown in the drawing). Also, the substrate (Y) included in the laminated body of the third aspect of the present invention is preferably composed of a non-expandable substrate layer.

本發明之第三態樣之層合體,經由加熱膨脹處理,可使膨脹性黏著劑層的第1黏著劑層(X1)中之熱膨脹性粒子進行膨脹,而於第1黏著劑層(X1)的表面生成凹凸,而降低第1黏著劑層(X1)與能量線硬化性樹脂層(I)於事前硬化而得的硬化樹脂層(I’)的接觸面積。      另一方面,第1黏著劑層(X1)的基材(Y)側的表面,因層合基材(Y),故難以生成凹凸。      因此,經由加熱膨脹處理時,可容易於第1黏著劑層(X1)的能量線硬化性樹脂層(I)側的表面形成凹凸,其結果,於支撐層(II)的第1黏著劑層(X1)與硬化樹脂層(I’)的界面P,只要使用些許力量即可使其整體容易分離。In the laminated body of the third aspect of the present invention, the heat-expandable particles in the first adhesive layer (X1) of the expandable adhesive layer can be expanded through thermal expansion treatment, and the heat-expandable particles in the first adhesive layer (X1) can be expanded. Asperities are generated on the surface, and the contact area between the first adhesive layer (X1) and the cured resin layer (I') obtained by curing the energy ray curable resin layer (I) in advance is reduced. On the other hand, since the substrate (Y) is laminated on the surface of the first adhesive layer (X1) on the substrate (Y) side, it is difficult to generate unevenness. Therefore, during thermal expansion treatment, irregularities can be easily formed on the surface of the first adhesive layer (X1) on the energy ray curable resin layer (I) side, and as a result, the first adhesive layer of the support layer (II) The interface P between (X1) and the cured resin layer (I') can be easily separated as a whole with only a little force.

本發明之一態樣之層合體,可僅由支撐層(II)及能量線硬化性樹脂層(I)所構成者亦可,具有支撐層(II)及能量線硬化性樹脂層(I)以外的其他之層者亦可。其他之層的例示,例如,設置於能量線硬化性樹脂層(I)的支撐層(II)為相反側之面之黏著劑層等。      又,本發明之一態樣之層合體,就於加熱膨脹處理時以外的步驟中,可無須進行極力加熱之觀點,以不具有熱硬化性樹脂層者為佳。但,此處的熱硬化性樹脂層,係指具有熱硬化性,且非能量線硬化性之層之意。A laminate according to an aspect of the present invention may be composed only of the support layer (II) and the energy ray-curable resin layer (I), and may have the support layer (II) and the energy ray-curable resin layer (I) Layers other than those can also be used. Examples of other layers include, for example, an adhesive layer provided on the side opposite to the support layer (II) of the energy ray curable resin layer (I). Also, the laminated body of one aspect of the present invention is preferably one that does not have a thermosetting resin layer from the viewpoint of eliminating the need for extreme heating in steps other than the thermal expansion treatment. However, the thermosetting resin layer here means a layer that is thermosetting and not energy ray curable.

<層合體的各種物性>    (剝離力(F0 ))      於能量線硬化性樹脂層(I)的硬化前與加熱膨脹處理前,就可充份固定密封對象物,且不會對密封作業造成不良影響之觀點,支撐層(II)與能量線硬化性樹脂層(I)的密著性以越高者為佳。      基於上述觀點,本發明之一態樣之層合體中,能量線硬化性樹脂層(I)於硬化前且於進行加熱膨脹處理前,於支撐層(II)與能量線硬化性樹脂層(I)的界面P上形成分離之際之剝離力(F0 ),較佳為100mN/25mm以上,更佳為130mN/25mm以上,特佳為160mN/25mm以上,又,較佳為50000mN/25mm以下。      又,剝離力(F0 )為依下述測定方法所測定之值。        <剝離力(F0 )之測定>      將層合體於23℃、50%RH(相對濕度)的環境下,靜置24小時後,將黏著膠布(琳德股份有限公司製、製品名「PL-SHIN」)貼附於能量線硬化性樹脂層(I)的表面。      隨後,將層合體的支撐層(II)側介由黏著劑貼附於玻璃板(股份有限公司U-KOU商會製、浮板玻璃、3mm(JIS R 3202品))。其次,將貼附有層合體的上述玻璃板之端部,固定於萬能拉伸試驗機(東方科技股份有限公司製、製品名「TENSILON UTM-4-100」)的下部夾具。      隨後,以將層合體的支撐層(II)與能量線硬化性樹脂層(I)的界面P上形成剝離之方式,以萬能拉伸試驗機的上部夾具固定黏著膠布及支撐層(II)。隨後,於與上述為相同之環境下,基於JIS Z 0237:2000,使用180˚拉伸剝離法,以拉伸速度300mm/分鐘,於界面P形成剝離之際所測定的剝離力,設為「剝離力(F0 )」。<Physical properties of the laminate> (Peel force (F 0 )) Before the hardening of the energy ray curable resin layer (I) and before the thermal expansion treatment, the object to be sealed can be sufficiently fixed without causing damage to the sealing work. From the viewpoint of adverse effects, the higher the adhesion between the support layer (II) and the energy ray curable resin layer (I), the better. Based on the above point of view, in the laminated body of an aspect of the present invention, the energy ray curable resin layer (I) is bonded between the support layer (II) and the energy ray curable resin layer (I) before being cured and before thermal expansion treatment. The peel force (F 0 ) when separation is formed on the interface P of ) is preferably at least 100mN/25mm, more preferably at least 130mN/25mm, particularly preferably at least 160mN/25mm, and preferably at least 50000mN/25mm . In addition, the peel force (F 0 ) is a value measured by the following measurement method. <Measurement of Peeling Force (F 0 )> After the laminate was left to stand for 24 hours at 23°C and 50%RH (relative humidity), the adhesive tape (manufactured by Linde Co., Ltd., product name "PL- SHIN") is attached to the surface of the energy ray curable resin layer (I). Then, the support layer (II) side of the laminate was attached to a glass plate (manufactured by U-KOU Shokai Co., Ltd., float glass, 3 mm (JIS R 3202 product)) via an adhesive. Next, the end of the glass plate to which the laminate was attached was fixed to a lower jig of a universal tensile testing machine (manufactured by Oriental Technology Co., Ltd., product name "TENSILON UTM-4-100"). Then, the adhesive tape and the support layer (II) were fixed with the upper fixture of the universal tensile testing machine in such a way that the interface P between the support layer (II) and the energy ray curable resin layer (I) of the laminate was peeled off. Then, under the same environment as above, based on JIS Z 0237:2000, the peeling force measured at the time of peeling at the interface P using the 180˚ tensile peeling method at a tensile speed of 300mm/min is set to " Peel Force (F 0 )".

(剝離力(F1 ))      本發明之一態樣之層合體中,由能量線硬化性樹脂層(I)硬化而形成硬化樹脂層(I’)之後,經由加熱膨脹處理,而於支撐層(II)與硬化樹脂層(I’)的界面P形成分離時的剝離力(F1 ),就於界面P上可僅使用些許力量即可容易整體分離之觀點,通常為2000mN/25mm以下,較佳為1000mN/25mm以下,更佳為500mN/25mm以下,更較佳為150mN/25mm以下,特佳為100mN/25mm以下,最佳為50mN/25mm以下,最最佳為0mN/25mm。      剝離力(F1 )為0mN/25mm時,為包含即使進行剝離力之測定,但因剝離力過低而無法測定之情形。      又,剝離力(F1 )為依下述測定方法所測定之值。        <剝離力(F1 )之測定>      將層合體於23℃、50%RH(相對濕度)的環境下,靜置24小時後,將黏著膠布(琳德股份有限公司製、製品名「PL-SHIN」)貼附於層合體的能量線硬化性樹脂層(I)的表面。      隨後,將層合體的支撐層(II)側介由黏著劑貼附於玻璃板(股份有限公司U-KOU商會製、浮板玻璃、3mm(JIS R 3202品))。      其次,將紫外線以照度215mW/cm2 、光量187mJ/cm2 之條件照射3次,使能量線硬化性樹脂層(I)硬化,而形成硬化樹脂層(I’)。隨後,將玻璃板及層合體於最大膨脹溫度下加熱3分鐘,使層合體的膨脹性基材層(Y1)中之熱膨脹性粒子膨脹。其後,與上述之剝離力(F0 )之測定相同般,依相同條件,將於支撐層(II)與硬化樹脂層(I’)的界面P進行剝離之際所測定的剝離力設為「剝離力(F1 )」。      又,剝離力(F1 )之測定中,使用萬能拉伸試驗機的上部夾具,固定層合體的支撐層(II)之際,即可於界面P上使硬化樹脂層(I’)完全分離,但無固定之情形,則結束測定,此時的剝離力(F1 )則為「0mN/25mm」。(Peel force (F 1 )) In the laminated body according to one aspect of the present invention, after the energy ray curable resin layer (I) is cured to form the cured resin layer (I'), heat expansion treatment is performed on the support layer. (II) The peeling force (F 1 ) when separating from the interface P of the cured resin layer (I') is usually 2000mN/25mm or less in view of the fact that the interface P can be easily separated as a whole with only a little force, Preferably it is less than 1000mN/25mm, more preferably less than 500mN/25mm, more preferably less than 150mN/25mm, most preferably less than 100mN/25mm, most preferably less than 50mN/25mm, most preferably less than 0mN/25mm. When the peeling force (F 1 ) is 0 mN/25 mm, it includes the case where the peeling force cannot be measured because the peeling force is too low even if it is measured. In addition, the peel force (F 1 ) is a value measured by the following measurement method. <Measurement of Peeling Force (F 1 )> After the laminate was left to stand at 23°C and 50%RH (relative humidity) for 24 hours, the adhesive tape (manufactured by Linde Co., Ltd., product name "PL- SHIN") is attached to the surface of the energy ray curable resin layer (I) of the laminate. Then, the support layer (II) side of the laminate was attached to a glass plate (manufactured by U-KOU Shokai Co., Ltd., float glass, 3 mm (JIS R 3202 product)) via an adhesive. Next, ultraviolet rays were irradiated three times under conditions of illuminance 215 mW/cm 2 and light intensity 187 mJ/cm 2 to harden the energy ray curable resin layer (I) to form a cured resin layer (I′). Subsequently, the glass plate and the laminate were heated at the maximum expansion temperature for 3 minutes to expand the heat-expandable particles in the expandable substrate layer (Y1) of the laminate. Thereafter, in the same manner as the measurement of the above-mentioned peeling force (F 0 ), under the same conditions, the peeling force measured when the interface P of the support layer (II) and the cured resin layer (I') is peeled off is set to "Peel force (F 1 )". In addition, in the measurement of the peeling force (F 1 ), the hardened resin layer (I') can be completely separated on the interface P when the support layer (II) of the laminate is fixed using the upper grip of the universal tensile testing machine. , but if there is no fixation, the measurement ends, and the peeling force (F 1 ) at this time is "0mN/25mm".

(黏著劑層(X)的黏著力)      本發明之一態樣之層合體中,於室溫(23℃)下,支撐層(II)所具有的黏著劑層(X)(第1黏著劑層(X1)及第2黏著劑層(X2))的黏著力,較佳為0.1~10.0N/25mm,更佳為0.2~8.0N/25mm,特佳為0.4~6.0N/25mm,最佳為0.5~4.0N/25mm。      支撐層(II)具有第1黏著劑層(X1)及第2黏著劑層(X2)時,第1黏著劑層(X1)及第2黏著劑層(X2)的黏著力,分別以上述範圍為佳,但就提高與支撐體的密著性,且可容易於界面P形成整體分離之觀點,貼附於支撐體的第2黏著劑層(X2)的黏著力,以較第1黏著劑層(X1)的黏著力為更高者為較佳。(Adhesive Force of Adhesive Layer (X)) In the laminate of one aspect of the present invention, at room temperature (23°C), the adhesive layer (X) (first adhesive) of the support layer (II) layer (X1) and the second adhesive layer (X2)), preferably 0.1-10.0N/25mm, more preferably 0.2-8.0N/25mm, particularly preferably 0.4-6.0N/25mm, most preferably It is 0.5~4.0N/25mm. When the supporting layer (II) has the first adhesive layer (X1) and the second adhesive layer (X2), the adhesive force of the first adhesive layer (X1) and the second adhesive layer (X2) are respectively in the above range It is better, but from the point of view of improving the adhesion with the support and easily forming a whole separation at the interface P, the adhesive force of the second adhesive layer (X2) attached to the support should be higher than that of the first adhesive The layer (X1) with higher adhesion is preferred.

(能量線硬化性樹脂層(I)的黏著力)      本發明之一態樣之層合體,就與密封對象物具有良好密著性之觀點,能量線硬化性樹脂層(I)於載置密封對象物側的表面(即,與支撐層(II)為相反側之面),為具有黏著性。      具體而言,於室溫(23℃)下,能量線硬化性樹脂層(I)於載置密封對象物側的表面之黏著力,就可充份固定密封對象物之觀點,較佳為0.05N/25mm以上,更佳為0.10N/25mm以上,特佳為0.50N/25mm以上。上述表面之黏著力的上限值並未有特別之限定,通常為50N/25mm以下,亦可為40N/25mm以下、30N/25mm以下。(Adhesion of the energy ray-curable resin layer (I)) In the laminated body of an aspect of the present invention, the energy ray-curable resin layer (I) is mounted and sealed from the viewpoint of good adhesion to the object to be sealed. The surface on the object side (that is, the surface opposite to the support layer (II)) has adhesiveness. Specifically, at room temperature (23° C.), the adhesive force of the energy ray curable resin layer (I) on the surface on which the object to be sealed is placed is preferably 0.05 from the viewpoint that the object to be sealed can be sufficiently fixed. N/25mm or more, more preferably 0.10N/25mm or more, particularly preferably 0.50N/25mm or more. The upper limit of the adhesive force on the above surface is not particularly limited, but it is usually 50N/25mm or less, and may be 40N/25mm or less, 30N/25mm or less.

又,本說明書中,該些之黏著力,為依下述測定方法測定之值。        <黏著力之測定>      於剝離薄膜上所形成的黏著劑層(X)或能量線硬化性樹脂層(I)的表面,層合厚度50μm之PET薄膜(東洋紡股份有限公司製、製品名「COSMO-SHUNE A4100」)。      隨後,將黏著劑層(X)或能量線硬化性樹脂層(I)的表面,貼附於被附著體的不銹鋼鋼板(SUS304 360番研磨),於23℃、50%RH(相對濕度)的環境下,靜置24小時後,於相同環境下,依JIS Z 0237:2000為基準,使用180˚拉伸剝離法,以拉伸速度300mm/分鐘之條件,測定其於23℃下之黏著力。In addition, in this specification, the adhesive force of these is the value measured by the following measuring method. <Measurement of Adhesive Strength> A PET film (manufactured by Toyobo Co., Ltd., product name "COSMO") with a thickness of 50 μm was laminated on the surface of the adhesive layer (X) or the energy ray-curable resin layer (I) formed on the release film. -SHUNE A4100"). Then, attach the surface of the adhesive layer (X) or the energy ray-curable resin layer (I) to a stainless steel plate (SUS304 360-degree grinding) of the adherend, and place it at 23°C, 50%RH (relative humidity) Under the environment, after standing for 24 hours, in the same environment, according to JIS Z 0237: 2000, use the 180˚ tensile peeling method and the tensile speed of 300mm/min to measure its adhesion at 23°C .

(基材(Y)的拉伸強度值)      支撐層(II)所具有的基材(Y),為非黏著性基材。      本發明之一態樣中,有關是否為非黏著性基材之判斷,為對於作為對象的基材之表面,為依JIS Z 0237:1991為基準所測定的拉伸強度值為50mN/5mmφ時,則判斷該基材為「非黏著性基材」。又,上述拉伸強度值為50mN/5mmφ以上時,該基材則判斷為「黏著性基材」。      本發明之一態樣所使用的支撐層(II)所具有的基材(Y)的表面中之拉伸強度值,通常為未達50mN/5mmφ,較佳為未達30mN/5mmφ,更佳為未達10mN/5mmφ,特佳為未達5mN/5mmφ。      基材(Y)的表面中之拉伸強度值,為依下述測定方法所測定之值。        <拉伸強度值之測定>      將作為測定對象的基材切斷為一邊10mm的正方形之後,於23℃、50%RH(相對濕度)的環境下靜置24小時,作為試驗樣品。於23℃、50%RH(相對濕度)環境下,使用黏性試驗機(日本特殊測器股份有限公司製、製品名「NTS-4800」),依JIS Z0237:1991為基準測定試驗樣品的表面之拉伸強度值。具體而言,以直徑5mm的不銹鋼鋼製偵測器,以1秒鐘、接觸荷重0.98N/cm2 接觸試驗樣品表面後,再測定該偵測器以10mm/秒鐘的速度,由試驗樣品表面離開時所必要的力量,該所得之值,作為該試驗樣品的拉伸強度值。(Tensile Strength Value of Substrate (Y)) The substrate (Y) included in the support layer (II) is a non-adhesive substrate. In one aspect of the present invention, the determination of whether it is a non-adhesive base material is when the tensile strength value measured on the basis of JIS Z 0237: 1991 is 50mN/5mmφ for the surface of the target base material , then it is judged that the substrate is "non-adhesive substrate". In addition, when the above-mentioned tensile strength value is 50 mN/5 mmφ or more, the base material is judged as an "adhesive base material". The tensile strength on the surface of the substrate (Y) used in the support layer (II) used in one aspect of the present invention is usually less than 50mN/5mmφ, preferably less than 30mN/5mmφ, more preferably It is less than 10mN/5mmφ, especially preferably less than 5mN/5mmφ. The tensile strength value on the surface of the substrate (Y) is a value measured by the following measurement method. <Measurement of Tensile Strength Value> The base material to be measured was cut into a square of 10 mm on one side, and then left to stand in an environment of 23° C. and 50% RH (relative humidity) for 24 hours to obtain a test sample. Under the environment of 23°C and 50%RH (relative humidity), the surface of the test sample was measured according to JIS Z0237:1991 using a viscosity tester (manufactured by Nippon Special Sekki Co., Ltd., product name "NTS-4800") the tensile strength value. Specifically, after contacting the surface of the test sample with a stainless steel detector with a diameter of 5mm for 1 second and a contact load of 0.98N/cm 2 , then measure the speed of the detector at a speed of 10mm/second from the test sample. The force necessary for the surface to leave, and the resulting value, is taken as the tensile strength value of the test sample.

隨後,將說明構成本發明之一態樣的層合體之各層內容。Subsequently, the content of each layer constituting the laminated body of one aspect of the present invention will be explained.

<支撐層(II)>      本發明之一態樣的層合體所具有的支撐層(II)為,具有基材(Y)及黏著劑層(X),且該基材(Y)及黏著劑層(X)中至少一者為含有熱膨脹性粒子者。如上所述,支撐層(II)為經由加熱膨脹處理,而由支撐對象物的能量線硬化性樹脂層(I)分離之層,即所謂具有作為暫時固定層的機能之層。      含有熱膨脹性粒子的層,為包含於基材(Y)的構成內容之情形,與包含於黏著劑層(X)之構成內容之情形中,本發明之一態樣所使用的支撐層(II)可分為以下的態樣。      ・第一態樣的支撐層(II):具備具有含有熱膨脹性粒子的膨脹性基材層(Y1)的基材(Y)之支撐層(II)。      ・第二態樣的支撐層(II):於基材(Y)的兩面側,具有含有作為熱膨脹性粒子的膨脹性黏著劑層之第1黏著劑層(X1),作為非膨脹性黏著劑層之第2黏著劑層(X2)的支撐層(II)。<Support layer (II)> The support layer (II) included in the laminated body of one aspect of the present invention has a substrate (Y) and an adhesive layer (X), and the substrate (Y) and adhesive At least one of the layers (X) contains heat-expandable particles. As described above, the support layer (II) is a layer separated from the energy ray-curable resin layer (I) of the object to be supported by thermal expansion treatment, and is a layer that functions as a temporary fixing layer. A layer containing heat-expandable particles is included in the composition of the base material (Y) and in the case of the composition of the adhesive layer (X). The support layer (II) used in one aspect of the present invention ) can be divided into the following forms.・Support layer (II) of the first aspect: A support layer (II) having a base material (Y) having an expandable base material layer (Y1) containing heat-expandable particles.・Support layer (II) of the second aspect: On both sides of the substrate (Y), there is a first adhesive layer (X1) containing an expandable adhesive layer as heat-expandable particles as a non-expandable adhesive The support layer (II) of the second adhesive layer (X2) of the layer.

[第一態樣的支撐層(II)]      第一態樣的支撐層(II),如圖1~2所示般,基材(Y)為具有含有熱膨脹性粒子的膨脹性基材層(Y1)者。      第一態樣的支撐層(II)中,界面P,就只要使用些許的力量即可使其整體容易分離之觀點,黏著劑層(X)以非膨脹性黏著劑層為佳。      具體而言,圖1所示之層合體1a、1b所具有的支撐層(II)中,黏著劑層(X)以非膨脹性黏著劑層為佳。      又,圖2所示之層合體2a、2b所具有的支撐層(II)中,第1黏著劑層(X1)及第2黏著劑層(X2)的任一者以皆為非膨脹性黏著劑層為佳。      如第一態樣的支撐層(II)所示般,因基材(Y)具有膨脹性基材層(Y1),故黏著劑層(X)無須具有膨脹性,而無須受到賦予膨脹性的組成、構成及製程等所拘束。如此,於設計黏著劑層(X)之際,例如,可以對於黏著性等的性能、生產性、經濟性等,除膨脹性以外的期待性能作優先之設計,而可提高黏著劑層(X)的設計自由度。[Support layer (II) of the first aspect] The support layer (II) of the first aspect, as shown in Figures 1-2, the substrate (Y) is an expandable substrate layer containing thermally expandable particles ( Y1). In the support layer (II) of the first aspect, the interface P can be easily separated as a whole with only a little force, and the adhesive layer (X) is preferably a non-expandable adhesive layer. Specifically, in the support layer (II) of the laminates 1a and 1b shown in Fig. 1, the adhesive layer (X) is preferably a non-expandable adhesive layer. In addition, in the supporting layer (II) of the laminates 2a and 2b shown in FIG. 2, either the first adhesive layer (X1) or the second adhesive layer (X2) is non-expandable adhesive. Agent layer is better. As shown in the support layer (II) of the first aspect, since the base material (Y) has an expandable base material layer (Y1), the adhesive layer (X) does not need to have expandability, and does not need to be subject to the expansion-imparting condition. Constrained by composition, composition and manufacturing process. In this way, when designing the adhesive layer (X), for example, performance such as adhesiveness, productivity, economical efficiency, etc., can be designed with priority for expected performance other than swelling, and the adhesive layer (X) can be improved. ) degrees of design freedom.

第一態樣的支撐層(II)的加熱膨脹處理前的基材(Y)的厚度,較佳為10~1000μm,更佳為20~700μm,特佳為25~500μm,最佳為30~300μm。The thickness of the substrate (Y) before thermal expansion treatment of the support layer (II) of the first aspect is preferably 10-1000 μm, more preferably 20-700 μm, particularly preferably 25-500 μm, most preferably 30-30 μm. 300 μm.

第一態樣的支撐層(II)的加熱膨脹處理前的黏著劑層(X)的厚度,較佳為1~60μm,更佳為2~50μm,特佳為3~40μm,最佳為5~30μm。The thickness of the adhesive layer (X) before the thermal expansion treatment of the support layer (II) of the first aspect is preferably 1-60 μm, more preferably 2-50 μm, particularly preferably 3-40 μm, most preferably 5 μm. ~30μm.

又,本說明書中,例如,如圖2所示般,支撐層(II)為具有複數的黏著劑層(X)時,上述「黏著劑層(X)的厚度」係指,各個黏著劑層之厚度(圖2中,為第1黏著劑層(X1)及第2黏著劑層(X2)的各別之厚度)之意。      又,本說明書中,構成層合體之各層的厚度,係指依實施例記載之方法所測定之值之意。Also, in this specification, for example, as shown in FIG. 2, when the support layer (II) has a plurality of adhesive layers (X), the above-mentioned "thickness of the adhesive layer (X)" means that each adhesive layer The thickness (in FIG. 2, the respective thicknesses of the first adhesive layer (X1) and the second adhesive layer (X2)) means. In addition, in this specification, the thickness of each layer constituting the laminate means the value measured by the method described in the examples.

第一態樣的支撐層(II)中,於加熱膨脹處理前的膨脹性基材層(Y1),與黏著劑層(X)的厚度比[(Y1)/(X)],較佳為1000以下,更佳為200以下,特佳為60以下,最佳為30以下。      該厚度比為1000以下時,經由加熱膨脹處理後,可形成一種於支撐層(II)與硬化樹脂層(I’)的界面P,只要使用些許力量即可使其整體容易分離之層合體。      又,該厚度比,較佳為0.2以上,更佳為0.5以上,特佳為1.0以上,最佳為5.0以上。In the support layer (II) of the first aspect, the thickness ratio [(Y1)/(X)] of the expandable base material layer (Y1) before the thermal expansion treatment to the adhesive layer (X) is preferably Below 1000, more preferably below 200, particularly preferably below 60, most preferably below 30. When the thickness ratio is less than 1000, after thermal expansion treatment, a laminate can be formed at the interface P between the support layer (II) and the hardened resin layer (I’), which can be easily separated as a whole with a little force. Moreover, the thickness ratio is preferably at least 0.2, more preferably at least 0.5, particularly preferably at least 1.0, most preferably at least 5.0.

又,第一態樣的支撐層(II)中,基材(Y),如圖1(a)所示般,可為僅由膨脹性基材層(Y1)所構成者,如圖1(b)所示般,亦可為能量線硬化性樹脂層(I)側具有膨脹性基材層(Y1)、黏著劑層(X)側具有非膨脹性基材層(Y2)者。Also, in the support layer (II) of the first aspect, the base material (Y), as shown in Figure 1(a), may be composed only of the expandable base material layer (Y1), as shown in Figure 1( As shown in b), one may have an expandable base material layer (Y1) on the side of the energy ray curable resin layer (I) and a non-expandable base material layer (Y2) on the side of the adhesive layer (X).

第一態樣的支撐層(II)中,於加熱膨脹處理前的膨脹性基材層(Y1)與非膨脹性基材層(Y2)的厚度比[(Y1)/(Y2)],較佳為0.02~200,更佳為0.03~150,特佳為0.05~100。In the support layer (II) of the first aspect, the thickness ratio [(Y1)/(Y2)] of the expandable base material layer (Y1) to the non-expandable base material layer (Y2) before the thermal expansion treatment is relatively Preferably, it is 0.02-200, more preferably, it is 0.03-150, and most preferably, it is 0.05-100.

[第二態樣的支撐層(II)]      第二態樣的支撐層(II),如圖3所示般,為於基材(Y)的兩面側,分別具有作為含有熱膨脹性粒子的膨脹性黏著劑層的第1黏著劑層(X1),與作為非膨脹性黏著劑層的第2黏著劑層(X2)者。      又,第二態樣的支撐層(II)中,作為膨脹性黏著劑層的第1黏著劑層(X1),與作為能量線硬化性樹脂層(I)為形成直接接觸。      第二態樣的支撐層(II)中,基材(Y)以非膨脹性基材為佳。非膨脹性基材,以僅由非膨脹性基材層(Y2)所構成者為佳。[Support layer (II) of the second aspect] The support layer (II) of the second aspect, as shown in FIG. The first adhesive layer (X1) which is a non-expandable adhesive layer, and the second adhesive layer (X2) which is a non-expandable adhesive layer. Also, in the support layer (II) of the second aspect, the first adhesive layer (X1) as the expandable adhesive layer is in direct contact with the energy ray curable resin layer (I). In the support layer (II) of the second aspect, the base material (Y) is preferably a non-expandable base material. The non-expandable base material is preferably composed of only the non-expandable base material layer (Y2).

第二態樣的支撐層(II)中,加熱膨脹處理前的作為膨脹性黏著劑層的第1黏著劑層(X1),與作為非膨脹性黏著劑層的第2黏著劑層(X2)的厚度比[(X1)/(X2)],較佳為0.1~80,更佳為0.3~50,特佳為0.5~15。In the support layer (II) of the second aspect, the first adhesive layer (X1) as an expandable adhesive layer before heat expansion treatment, and the second adhesive layer (X2) as a non-expandable adhesive layer The thickness ratio [(X1)/(X2)] is preferably 0.1-80, more preferably 0.3-50, particularly preferably 0.5-15.

又,第二態樣的支撐層(II)之加熱膨脹處理前的作為膨脹性黏著劑層的第1黏著劑層(X1),與基材(Y)的厚度比[(X1)/(Y)],較佳為0.05~20,更佳為0.1~10,特佳為0.2~3。In addition, the thickness ratio of the first adhesive layer (X1) as an expandable adhesive layer before the thermal expansion treatment of the support layer (II) of the second aspect to the substrate (Y) is [(X1)/(Y )], preferably 0.05-20, more preferably 0.1-10, particularly preferably 0.2-3.

以下,將對構成支撐層(II)的任一層所含有的熱膨脹性粒子進行說明,並詳細敘述構成基材(Y)的膨脹性基材層(Y1)、非膨脹性基材層(Y2),及黏著劑層(X)。Hereinafter, the thermally expandable particles contained in any layer constituting the support layer (II) will be described, and the expandable substrate layer (Y1) and the non-expandable substrate layer (Y2) constituting the substrate (Y) will be described in detail. , and the adhesive layer (X).

[熱膨脹性粒子]      本發明之一態樣所使用的熱膨脹性粒子,只要可經由特定的加熱膨脹處理而產生膨脹之粒子即可。      本發明之一態樣所使用的熱膨脹性粒子於23℃下的膨脹前之平均粒徑,較佳為3~100μm,更佳為4~70μm,特佳為6~60μm,最佳為10~50μm。      又,熱膨脹性粒子的膨脹前之平均粒徑係指體積中間粒徑(D50 ),於使用雷射繞射式粒度分佈測定裝置(例如,Malvern公司製、製品名「MASTERSIZER 3000」)測定而得的膨脹前的熱膨脹性粒子之粒子分佈中,由膨脹前的熱膨脹性粒子的粒徑較小之側起進行計算的累積體積頻度達相當於50%之粒徑之意。[Heat-expandable particles] The heat-expandable particles used in one aspect of the present invention may be any particles that can be expanded by a specific thermal expansion treatment. The average particle diameter of the heat-expandable particles used in one aspect of the present invention before expansion at 23°C is preferably 3-100 μm, more preferably 4-70 μm, particularly preferably 6-60 μm, and most preferably 10-100 μm. 50 μm. Also, the average particle diameter before expansion of the heat-expandable particles refers to the volume median particle diameter (D 50 ), measured using a laser diffraction particle size distribution analyzer (for example, manufactured by Malvern, product name "MASTERSIZER 3000") In the obtained particle distribution of the heat-expandable particles before expansion, the cumulative volume frequency calculated from the side where the particle diameter of the heat-expandable particles before expansion is smaller corresponds to 50% of the particle diameter.

本發明之一態樣所使用的熱膨脹性粒子於23℃下的膨脹前之90%粒徑(D90 ),較佳為10~150μm,更佳為20~100μm,特佳為25~90μm,最佳為30~80μm。      又,熱膨脹性粒子的膨脹前之90%粒徑(D90 )係指,使用雷射繞射式粒度分佈測定裝置(例如,Malvern公司製、製品名「MASTERSIZER 3000」)測定的膨脹前的熱膨脹性粒子之粒子分佈中,由膨脹前的熱膨脹性粒子的粒徑較小之側起進行計算的累積體積頻度達相當於90%之粒徑之意。The 90% particle size (D 90 ) of the heat-expandable particles used in one aspect of the present invention before expansion at 23°C is preferably 10-150 μm, more preferably 20-100 μm, particularly preferably 25-90 μm, The optimum is 30-80 μm. Also, the 90% particle size (D 90 ) of thermally expandable particles before expansion refers to the thermal expansion before expansion measured using a laser diffraction particle size distribution analyzer (for example, manufactured by Malvern, product name "MASTERSIZER 3000") In the particle distribution of thermally expandable particles, it means that the cumulative volume frequency calculated from the side where the particle size of thermally expandable particles before expansion is smaller is equivalent to 90% of the particle size.

本發明之一態樣所使用的熱膨脹性粒子,只要為使密封材硬化之際不會產生膨脹,且具有較密封材的硬化溫度為更高膨脹起始溫度(t)的粒子即可,具體而言,以將膨脹起始溫度(t)調整為60~270℃之熱膨脹性粒子為佳。又,膨脹起始溫度(t),可配合所使用的密封材之硬化溫度作適當之選擇。      又,本說明書中,熱膨脹性粒子之膨脹起始溫度(t)係指,依實施例記載之方法所測定之值之意。The thermally expandable particles used in one aspect of the present invention should not expand when the sealing material is hardened, and have a higher expansion initiation temperature (t) than the hardening temperature of the sealing material. Specifically, heat-expandable particles whose expansion initiation temperature (t) is adjusted to 60 to 270° C. are preferable. Also, the expansion initiation temperature (t) can be appropriately selected in accordance with the hardening temperature of the sealing material used. In addition, in this specification, the expansion initiation temperature (t) of heat-expandable particles refers to the value measured according to the method described in the examples.

熱膨脹性粒子,以具有由熱塑性樹脂所構成的外殻,與含於該外殻內,且加熱至特定溫度時即會氣化的內包成份所構成的微膠囊化發泡劑為佳。      構成微膠囊化發泡劑的外殻之熱塑性樹脂,例如,氯化亞乙烯-丙烯腈共聚物、聚乙烯醇、聚乙烯醇縮丁醛、聚甲基丙烯酸甲酯、聚丙烯腈、聚氯化亞乙烯、聚碸等。The heat-expandable particles preferably have a shell made of thermoplastic resin, and a microencapsulated foaming agent that is contained in the shell and contains an inner component that vaporizes when heated to a specific temperature. Thermoplastic resins that form the shell of microencapsulated foaming agents, such as vinylidene chloride-acrylonitrile copolymer, polyvinyl alcohol, polyvinyl butyral, polymethyl methacrylate, polyacrylonitrile, polychlorinated Vinylene, Polyethylene, etc.

含於該外殻內的內包成份,例如,丙烷、丁烷、戊烷、己烷、庚烷、辛烷、壬烷、癸烷、異丁烷、異戊烷、異己烷、異庚烷、異辛烷、異壬烷、異癸烷、環丙烷、環丁烷、環戊烷、環己烷、環庚烷、環辛烷、新戊烷、十二烷、異十二烷、環十三烷、己基環己烷、十三烷、十四烷、十五烷、十六烷、十七烷、十八烷、十九烷、異十三烷、4-甲基十二烷、異十四烷、異十五烷、異十六烷、2,2,4,4,6,8,8-七甲基壬烷、異十七烷、異十八烷、異十九烷、2,6,10,14-四甲基十五烷、環十三烷、庚基環己烷、n-辛基環己烷、環十五烷、壬基環己烷、癸基環己烷、十五烷基環己烷、十六烷基環己烷、十七烷基環己烷、十八烷基環己烷等。      該些內包成份,可單獨使用亦可、將2種以上合併使用亦可。      熱膨脹性粒子的膨脹起始溫度(t),可以適當選擇內包成份之種類予以調整。Included components contained within the shell, for example, propane, butane, pentane, hexane, heptane, octane, nonane, decane, isobutane, isopentane, isohexane, isoheptane , isooctane, isononane, isodecane, cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, neopentane, dodecane, isododecane, cyclo Tridecane, Hexylcyclohexane, Tridecane, Tetradecane, Pentadecane, Hexadecane, Heptadecane, Octadecane, Nonadecane, Isotridecane, 4-Methyldodecane, Isotetradecane, Isopentadecane, Isohexadecane, 2,2,4,4,6,8,8-Heptamethylnonane, Isoheptadecane, Isooctadecane, Isnonadecane, 2,6,10,14-Tetramethylpentadecane, cyclotridecane, heptylcyclohexane, n-octylcyclohexane, cyclopentadecane, nonylcyclohexane, decylcyclohexane , pentadecylcyclohexane, hexadecylcyclohexane, heptadecylcyclohexane, octadecylcyclohexane, etc. These internal components can be used alone or in combination of two or more. The expansion initiation temperature (t) of heat-expandable particles can be adjusted by properly selecting the type of inner package components.

本發明之一態樣所使用的熱膨脹性粒子,於加熱至膨脹起始溫度(t)以上的溫度時的體積最大膨脹率,較佳為1.5~100倍,更佳為2~80倍,特佳為2.5~60倍,最佳為3~40倍。The thermally expandable particles used in one aspect of the present invention have a maximum volume expansion rate of preferably 1.5 to 100 times, more preferably 2 to 80 times, especially when heated to a temperature above the expansion initiation temperature (t). The best is 2.5 to 60 times, and the best is 3 to 40 times.

<膨脹性基材層(Y1)>      本發明之一態樣所使用的支撐層(II)所具有的膨脹性基材層(Y1),為含有熱膨脹性粒子,且經由特定的加熱膨脹處理時,可產生膨脹之層。<Expandable base material layer (Y1)> When the expandable base material layer (Y1) included in the support layer (II) used in one aspect of the present invention contains heat-expandable particles and undergoes specific thermal expansion treatment , can produce a dilated layer.

又,就提高與膨脹性基材層(Y1)與層合的其他之層的層間密著性之觀點,可對膨脹性基材層(Y1)的表面,以氧化法、凹凸化法等進行表面處理、易接著處理,或施以底漆處理。      氧化法,例如,電暈放電處理、電漿放電處理、鉻酸處理(濕式)、熱風處理、臭氧,及紫外線照射處理等,凹凸化法,例如,噴沙法、溶劑處理法等。Also, from the viewpoint of improving the interlayer adhesion between the expandable base material layer (Y1) and other laminated layers, the surface of the expandable base material layer (Y1) can be oxidized, roughened, etc. Surface treatment, easy-to-adhesive treatment, or primer treatment. Oxidation methods, such as corona discharge treatment, plasma discharge treatment, chromic acid treatment (wet), hot air treatment, ozone, and ultraviolet radiation treatment, etc., embossing methods, such as sandblasting, solvent treatment, etc.

本發明之一態樣中,膨脹性基材層(Y1)以滿足下述要件(1)者為佳。      ・要件(1):熱膨脹性粒子的膨脹起始溫度(t)中,膨脹性基材層(Y1)的儲存彈性率E’(t),為1.0×107 Pa以下。      又,本說明書中,特定溫度中之膨脹性基材層(Y1)的儲存彈性率E’,係指由實施例記載之方法所測定之值之意。In one aspect of the present invention, it is preferable that the expandable base material layer (Y1) satisfies the following requirement (1).・Requirement (1): The storage elastic modulus E'(t) of the expandable base material layer (Y1) at the expansion initiation temperature (t) of the thermally expandable particles is 1.0×10 7 Pa or less. In addition, in this specification, the storage elastic modulus E' of the expandable base material layer (Y1) at a specific temperature means the value measured by the method described in an Example.

上述要件(1),亦稱為指示熱膨脹性粒子於膨脹前的膨脹性基材層(Y1)之剛性的指標。      就於支撐層(II)與硬化樹脂層(I’)的界面P,僅使用些許力量即可容易分離之觀點,於加熱至膨脹起始溫度(t)以上的溫度之際,與作為支撐層(II)的能量線硬化性樹脂層(I)層合之側的表面,必須使其容易形成凹凸狀態。      即,滿足上述要件(1)的膨脹性基材層(Y1),於膨脹起始溫度(t)時,可使熱膨脹性粒子膨脹至更大,能量線而可於與硬化性樹脂層(I)層合之側的支撐層(II)的表面,更容易形成凹凸。      其結果,可製得一種於支撐層(II)與硬化樹脂層(I’)的界面P,僅使用些許力量即可容易分離的層合體。The above requirement (1) is also referred to as an index indicating the rigidity of the thermally expandable particle before expansion of the expandable base material layer (Y1). From the point of view that the interface P between the support layer (II) and the cured resin layer (I') can be easily separated with only a little force, when heated to a temperature above the expansion initiation temperature (t), the support layer (II) The surface of the energy ray-curable resin layer (I) on which the layer (I) is laminated must be easily formed into a concave-convex state. That is, the expandable base material layer (Y1) that satisfies the above-mentioned requirement (1) can expand the thermally expandable particles to a greater extent at the expansion initiation temperature (t), and the energy rays can be combined with the curable resin layer (I ) on the surface of the support layer (II) on the laminated side is more likely to form unevenness. As a result, a laminate can be easily separated at the interface P between the support layer (II) and the cured resin layer (I') with only a little force.

要件(1)所規定之膨脹性基材層(Y1)的儲存彈性率E’(t),基於上述觀點,較佳為9.0×106 Pa以下,更佳為8.0×106 Pa以下,特佳為6.0×106 Pa以下,最佳為4.0×106 Pa以下。      又,就可抑制膨脹後的熱膨脹性粒子之流動、提高層合於能量線硬化性樹脂層(I)之側的支撐層(II)的表面上的凹凸形狀之維持性、於界面P上僅使用些許力量即可容易分離之觀點,要件(1)所規定之膨脹性基材層(Y1)的儲存彈性率E’(t),較佳為1.0×103 Pa以上,更佳為1.0×104 Pa以上,特佳為1.0×105 Pa以上。The storage elastic modulus E'(t) of the expandable base material layer (Y1) stipulated in the requirement (1) is preferably 9.0×10 6 Pa or less, more preferably 8.0×10 6 Pa or less, especially from the above viewpoint. Preferably, it is 6.0×10 6 Pa or less, most preferably, it is 4.0×10 6 Pa or less. In addition, the flow of the thermally expandable particles after expansion can be suppressed, and the maintenance of the uneven shape on the surface of the support layer (II) laminated on the side of the energy ray curable resin layer (I) can be improved. From the viewpoint of easy separation with a little force, the storage elastic modulus E'(t) of the expandable base material layer (Y1) specified in the requirement (1) is preferably 1.0×10 3 Pa or more, more preferably 1.0× 10 4 Pa or more, particularly preferably 1.0×10 5 Pa or more.

膨脹性基材層(Y1),以由含有樹脂及熱膨脹性粒子的樹脂組成物(y)所形成者為佳。      又,樹脂組成物(y)中,於無損本發明效果之範圍,必要時,可含有基材用之添加劑。      基材用之添加劑,例如,光安定劑、抗氧化劑、抗靜電劑、滑動劑、抗黏著劑、著色劑等。      又,該些基材用之添加劑,可分別單獨使用亦可、將2種以上合併使用亦可。      含有該些基材用添加劑時,其各別的基材用添加劑之含量,相對於上述樹脂100質量份,較佳為0.0001~20質量份,更佳為0.001~10質量份。The expandable base material layer (Y1) is preferably formed of a resin composition (y) containing a resin and thermally expandable particles. In addition, the resin composition (y) may contain additives for substrates if necessary within the range that does not impair the effect of the present invention.  Additives for substrates, such as light stabilizers, antioxidants, antistatic agents, slip agents, anti-adhesive agents, colorants, etc. In addition, these additives for base materials may be used alone or in combination of two or more. When these base material additives are contained, the content of the respective base material additives is preferably 0.0001 to 20 parts by mass, more preferably 0.001 to 10 parts by mass, based on 100 parts by mass of the aforementioned resin.

熱膨脹性粒子之含量,相對於膨脹性基材層(Y1)的全量(100質量%)或樹脂組成物(y)的有效成份之全量(100質量%),較佳為1~40質量%,更佳為5~35質量%,特佳為10~30質量%,最佳為15~25質量%。The content of the thermally expandable particles is preferably 1 to 40% by mass relative to the total amount (100% by mass) of the expandable base material layer (Y1) or the total amount (100% by mass) of active ingredients of the resin composition (y), More preferably, it is 5-35 mass %, It is especially preferable that it is 10-30 mass %, Most preferably, it is 15-25 mass %.

含有作為膨脹性基材層(Y1)的形成材料之樹脂組成物(y)的樹脂,可為非黏著性樹脂亦可、黏著性樹脂亦可。      即,樹脂組成物(y)中所含有的樹脂為黏著性樹脂時,於由樹脂組成物(y)形成膨脹性基材層(Y1)的過程中,因該黏著性樹脂會與聚合性化合物進行聚合反應,使所得樹脂成為非黏著性樹脂,故只要含有該樹脂的膨脹性基材層(Y1)為非黏著性者即可。The resin containing the resin composition (y) as a material for forming the expandable base layer (Y1) may be a non-adhesive resin or an adhesive resin. That is, when the resin contained in the resin composition (y) is an adhesive resin, in the process of forming the expandable base material layer (Y1) from the resin composition (y), the adhesive resin may interact with the polymerizable compound. Since the polymerization reaction is carried out to make the obtained resin a non-adhesive resin, it is only necessary that the expandable base material layer (Y1) containing this resin is non-adhesive.

樹脂組成物(y)所含有的上述樹脂的質量平均分子量(Mw),較佳為1000~100萬,更佳為1000~70萬,特佳為1000~50萬。The mass average molecular weight (Mw) of the resin contained in the resin composition (y) is preferably from 1,000 to 1,000,000, more preferably from 1,000 to 700,000, and most preferably from 1,000 to 500,000.

又,該樹脂為具有2種以上的結構單位之共聚物時,該共聚物之形態,並未有特別之限定,而可為嵌段共聚物、無規共聚物,及接枝共聚物中之任一者。Also, when the resin is a copolymer having two or more structural units, the form of the copolymer is not particularly limited, and may be one of block copolymers, random copolymers, and graft copolymers. either.

上述樹脂之含量,相對於膨脹性基材層(Y1)的全量(100質量%)或樹脂組成物(y)的有效成份之全量(100質量%),較佳為50~99質量%,更佳為60~95質量%,特佳為65~90質量%,最佳為70~85質量%。The content of the above-mentioned resin is preferably 50 to 99% by mass, more preferably It is preferably 60 to 95% by mass, particularly preferably 65 to 90% by mass, most preferably 70 to 85% by mass.

又,就形成可滿足上述要件(1)的膨脹性基材層(Y1)之觀點,樹脂組成物(y)所含有的上述樹脂,以含有由胺基甲酸丙烯酸酯系樹脂及烯烴系樹脂所選出之1種以上為佳。      又,上述胺基甲酸丙烯酸酯系樹脂,以下述樹脂(U1)為佳。      ・胺基甲酸酯預聚物(UP),與含有(甲基)丙烯酸酯的乙烯基化合物聚合而得之胺基甲酸丙烯酸酯系樹脂(U1)。Also, from the viewpoint of forming the expandable base material layer (Y1) that satisfies the above-mentioned requirement (1), the above-mentioned resin contained in the resin composition (y) may be composed of a urethane-based resin and an olefin-based resin. One or more selected ones are preferred. In addition, the above-mentioned urethane-based resin is preferably the following resin (U1).・Urethane prepolymer (UP), a urethane acrylate resin (U1) obtained by polymerizing a vinyl compound containing (meth)acrylate.

(胺基甲酸丙烯酸酯系樹脂(U1))      作為胺基甲酸丙烯酸酯系樹脂(U1)的主鏈之胺基甲酸酯預聚物(UP),例如,聚醇與多價異氰酸酯之反應物等。      又,胺基甲酸酯預聚物(UP),以再使用鏈延長劑施以鏈延長反應而得者為佳。(Urethane-based resin (U1)) Urethane prepolymer (UP) as the main chain of urethane-based resin (U1), for example, a reaction product of polyalcohol and polyvalent isocyanate wait. In addition, the urethane prepolymer (UP) is preferably obtained by chain extension reaction using a chain extender.

作為胺基甲酸酯預聚物(UP)的原料之聚醇,例如,伸烷基型聚醇、醚型聚醇、酯型聚醇、醯胺酯型聚醇、酯・醚型聚醇、碳酸酯型聚醇等。      該些聚醇,可單獨使用亦可、將2種以上合併使用亦可。      本發明之一態樣所使用的聚醇,以二醇為佳,以酯型二醇、伸烷基型二醇及碳酸酯型二醇為較佳,以酯型二醇、碳酸酯型二醇為更佳。Polyalcohols used as raw materials for urethane prepolymers (UP), such as alkylene-type polyols, ether-type polyols, ester-type polyols, amide ester-type polyols, and ester-ether-type polyols , Carbonate polyalcohol, etc. These polyalcohols may be used alone or in combination of two or more. The polyalcohols used in one aspect of the present invention are preferably diols, preferably ester diols, alkylene diols and carbonate diols, and ester diols and carbonate diols. Alcohol is better.

酯型二醇,例如,由1,3-丙烷二醇、1,4-丁烷二醇、1,5-戊烷二醇、新戊二醇、1,6-己烷二醇等的鏈烷二醇;乙二醇、丙二醇、二乙二醇、二丙二醇等的烷二醇;等的二醇類所選出的1種或2種以上,與由苯二甲酸、異苯二甲酸、對苯二甲酸、萘二羧酸、4,4-二苯基二羧酸、二苯基甲烷-4,4’-二羧酸、琥珀酸、己二酸、壬二酸、癸二酸、氯菌酸、馬來酸、富馬酸、依康酸、環己烷-1,3-二羧酸、環己烷-1,4-二羧酸、六氫苯二甲酸、六氫異苯二甲酸、六氫對苯二甲酸、甲基六氫苯二甲酸等的二羧酸及該些無水物所選出之1種或2種以上所形成的縮聚合物。      具體而言,例如,聚乙烯己二酸酯二醇、聚丁烯己二酸酯二醇、聚伸六甲基己二酸酯二醇、聚伸六甲基間苯二甲酸酯二醇、聚新戊基己二酸酯二醇、聚乙烯伸丙基己二酸酯二醇、聚乙烯伸丁基己二酸酯二醇、聚丁烯伸六甲基己二酸酯二醇、聚二伸乙基己二酸酯二醇、聚(聚伸四甲醚)己二酸酯二醇、聚(3-甲基戊烯己二酸酯)二醇、聚乙烯乙酸酯二醇、聚乙烯癸二酸酯二醇、聚丁烯壬二酸酯二醇、聚丁烯癸二酸酯二醇及聚新戊基對苯二甲酸酯二醇等。Ester diols, for example, chains consisting of 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, neopentyl glycol, 1,6-hexanediol, etc. Alkanediol; Alkanediol such as ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol; etc., one or more selected from diols, combined with phthalic acid, isophthalic acid, terephthalic acid Phthalic acid, naphthalene dicarboxylic acid, 4,4-diphenyldicarboxylic acid, diphenylmethane-4,4'-dicarboxylic acid, succinic acid, adipic acid, azelaic acid, sebacic acid, chlorine Bacteric acid, maleic acid, fumaric acid, itaconic acid, cyclohexane-1,3-dicarboxylic acid, cyclohexane-1,4-dicarboxylic acid, hexahydrophthalic acid, hexahydroisophthalic acid Dicarboxylic acids such as formic acid, hexahydroterephthalic acid, methylhexahydrophthalic acid, and polycondensates of one or more selected from these anhydrous substances. Specifically, for example, polyethylene adipate diol, polybutylene adipate diol, polyhexamethylene adipate diol, polyhexamethylene isophthalate diol , polyneopentyl adipate diol, polyvinyl propylene adipate diol, polyethylene butyl adipate diol, polybutylene hexamethyl adipate diol, Polydiethylene adipate diol, poly(tetramethylene ether) adipate diol, poly(3-methylpentene adipate) diol, polyvinyl acetate diol , polyethylene sebacate diol, polybutylene azelate diol, polybutene sebacate diol and polyneopentyl terephthalate diol, etc.

伸烷基型二醇,例如,1,3-丙烷二醇、1,4-丁烷二醇、1,5-戊烷二醇、新戊二醇、1,6-己烷二醇等的鏈烷二醇;乙二醇、丙二醇、二乙二醇、二丙二醇等的烷二醇;聚乙二醇、聚丙二醇、聚丁烯二醇等的聚烷二醇;聚丁烯二醇等的聚氧烷二醇;等。Alkylene diols such as 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, neopentyl glycol, 1,6-hexanediol, etc. Alkanediols; Alkanediols such as ethylene glycol, propylene glycol, diethylene glycol, and dipropylene glycol; Polyalkylene glycols such as polyethylene glycol, polypropylene glycol, and polybutene glycol; Polybutene glycol, etc. polyoxyalkylene glycol; etc.

碳酸酯型二醇,例如,1,4-伸四甲基碳酸酯二醇、1,5-伸五甲基碳酸酯二醇、1,6-伸六甲基碳酸酯二醇、1,2-伸丙基碳酸酯二醇、1,3-伸丙基碳酸酯二醇、2,2-二甲基伸丙基碳酸酯二醇、1,7-庚基伸甲基碳酸酯二醇、1,8-辛基伸甲基碳酸酯二醇、1,4-環己烷碳酸酯二醇等。Carbonate diols, for example, 1,4-tetramethylcarbonate diol, 1,5-pentamethylcarbonate diol, 1,6-hexylene carbonate diol, 1,2 -Propylene carbonate diol, 1,3-propylene carbonate diol, 2,2-dimethyl propylene carbonate diol, 1,7-heptyl propylene carbonate diol, 1 , 8-octyl methylene carbonate diol, 1,4-cyclohexane carbonate diol, etc.

作為胺基甲酸酯預聚物(UP)的原料之多價異氰酸酯,例如,芳香族聚異氰酸酯、脂肪族聚異氰酸酯、脂環式聚異氰酸酯等。      該些多價異氰酸酯,可單獨使用亦可、將2種以上合併使用亦可。      又,該些多價異氰酸酯,亦可為三羥甲基丙烷加成物型變性體、與水反應後的縮二脲型變性體、含有異三聚氰酸酯環的異三聚氰酸酯型變性體。As polyvalent isocyanate which is a raw material of a urethane prepolymer (UP), aromatic polyisocyanate, aliphatic polyisocyanate, alicyclic polyisocyanate etc. are mentioned, for example. These polyvalent isocyanates may be used alone or in combination of two or more. In addition, these polyvalent isocyanates may also be trimethylolpropane adduct-type modified products, biuret-type modified products reacted with water, and isocyanurates containing isocyanurate rings. type transgender.

該些之中,本發明之一態樣所使用的多價異氰酸酯,又以二異氰酸酯為佳,以由4,4’-二苯基甲烷二異氰酸酯(MDI)、2,4-伸甲苯基二異氰酸酯(2,4-TDI)、2,6-伸甲苯基二異氰酸酯(2,6-TDI)、伸六甲基二異氰酸酯(HMDI),及脂環式二異氰酸酯所選出之1種以上者為較佳。Among these, the polyvalent isocyanate used in one aspect of the present invention is preferably a diisocyanate, such as 4,4'-diphenylmethane diisocyanate (MDI), 2,4-cresyl diisocyanate One or more selected from isocyanate (2,4-TDI), 2,6-cresyl diisocyanate (2,6-TDI), hexamethylene diisocyanate (HMDI), and alicyclic diisocyanate better.

脂環式二異氰酸酯,例如,3-異氰酸酯甲基-3,5,5-三甲基環己基異氰酸酯(異佛爾酮二異氰酸酯、IPDI)、1,3-環戊烷二異氰酸酯、1,3-環己烷二異氰酸酯、1,4-環己烷二異氰酸酯、甲基-2,4-環己烷二異氰酸酯、甲基-2,6-環己烷二異氰酸酯等,又以異佛爾酮二異氰酸酯(IPDI)為佳。Cycloaliphatic diisocyanates such as 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate (isophorone diisocyanate, IPDI), 1,3-cyclopentane diisocyanate, 1,3 -Cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, methyl-2,4-cyclohexane diisocyanate, methyl-2,6-cyclohexane diisocyanate, etc., and isophorone Diisocyanate (IPDI) is preferred.

本發明之一態樣中,作為胺基甲酸丙烯酸酯系樹脂(U1)的主鏈之胺基甲酸酯預聚物(UP),為二醇與二異氰酸酯之反應物,又以兩末端具有乙烯性不飽合基的直鏈胺基甲酸酯預聚物為佳。      於該直鏈胺基甲酸酯預聚物的兩末端導入乙烯性不飽合基之方法,例如,使由二醇與二異氰酸酯化合物進行反應而得的直鏈胺基甲酸酯預聚物的末端之NCO基,與(甲基)丙烯酸羥烷酯進行反應之方法等。In one aspect of the present invention, the urethane prepolymer (UP) as the main chain of the urethane acrylate resin (U1) is a reaction product of a diol and a diisocyanate, and has Ethylenically unsaturated linear urethane prepolymers are preferred. A method of introducing ethylenically unsaturated groups at both ends of the linear urethane prepolymer, for example, a linear urethane prepolymer obtained by reacting a diol with a diisocyanate compound The NCO group at the end of the compound, the method of reacting with hydroxyalkyl (meth)acrylate, etc.

(甲基)丙烯酸羥烷酯,例如,2-羥基(甲基)丙烯酸乙酯、2-羥基(甲基)丙烯酸丙酯、3-羥基(甲基)丙烯酸丙酯、2-羥基(甲基)丙烯酸丁酯、3-羥基(甲基)丙烯酸丁酯、4-羥基(甲基)丙烯酸丁酯等。Hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl(meth)acrylate, 2-hydroxy(meth)propylacrylate, 3-hydroxy(meth)acrylate, 2-hydroxy(methyl)acrylate ) butyl acrylate, 3-hydroxy(meth)acrylate, 4-hydroxy(meth)acrylate, etc.

作為胺基甲酸丙烯酸酯系樹脂(U1)的側鏈之乙烯基化合物,為至少包含(甲基)丙烯酸酯。      (甲基)丙烯酸酯,以由(甲基)丙烯酸烷酯及(甲基)丙烯酸羥烷酯所選出之1種以上為佳,以併用(甲基)丙烯酸烷酯及(甲基)丙烯酸羥烷酯者為較佳。The vinyl compound which is a side chain of the urethane-based resin (U1) contains at least (meth)acrylate. (Meth)acrylates are preferably one or more selected from alkyl (meth)acrylates and hydroxyalkyl (meth)acrylates, and alkyl (meth)acrylates and hydroxy (meth)acrylates are used in combination. Alkyl esters are preferred.

於併用(甲基)丙烯酸烷酯及(甲基)丙烯酸羥烷酯時,相對於(甲基)丙烯酸烷酯100質量份,(甲基)丙烯酸羥烷酯之添加比例,較佳為0.1~100質量份,更佳為0.5~30質量份,特佳為1.0~20質量份,最佳為1.5~10質量份。When an alkyl (meth)acrylate and a hydroxyalkyl (meth)acrylate are used together, the addition ratio of the hydroxyalkyl (meth)acrylate is preferably 0.1 to 100 parts by mass of the alkyl (meth)acrylate. 100 parts by mass, more preferably 0.5-30 parts by mass, particularly preferably 1.0-20 parts by mass, most preferably 1.5-10 parts by mass.

該(甲基)丙烯酸烷酯所具有的烷基之碳數,較佳為1~24,更佳為1~12,特佳為1~8,最佳為1~3。The carbon number of the alkyl group which this alkyl (meth)acrylate has is preferably 1-24, More preferably, it is 1-12, Especially preferably, it is 1-8, Most preferably, it is 1-3.

又,(甲基)丙烯酸羥烷酯,例如,與於上述直鏈胺基甲酸酯預聚物的兩末端導入乙烯性不飽合基時所使用的(甲基)丙烯酸羥烷酯為相同之內容。Also, the hydroxyalkyl (meth)acrylate is, for example, the same as the hydroxyalkyl (meth)acrylate used when introducing an ethylenically unsaturated group to both ends of the linear urethane prepolymer. the content.

(甲基)丙烯酸酯以外的乙烯基化合物,例如,苯乙烯、α-甲基苯乙烯、乙烯基甲苯等的芳香族烴系乙烯基化合物;甲基乙烯醚、乙基乙烯醚等的乙烯醚類;乙酸乙烯、丙酸乙烯、(甲基)丙烯腈、N-乙烯基吡咯啶酮、(甲基)丙烯酸、馬來酸、富馬酸、依康酸、甲基(丙烯酸基醯胺)等的含有極性基之單體;等。      該些可單獨使用亦可、將2種以上合併使用亦可。Vinyl compounds other than (meth)acrylates, such as aromatic hydrocarbon-based vinyl compounds such as styrene, α-methylstyrene, and vinyltoluene; vinyl ethers such as methyl vinyl ether and ethyl vinyl ether Vinyl acetate, vinyl propionate, (meth)acrylonitrile, N-vinylpyrrolidone, (meth)acrylic acid, maleic acid, fumaric acid, itaconic acid, meth(acrylamide) etc. Monomers containing polar groups; etc.  These may be used alone or in combination of two or more.

乙烯基化合物中,(甲基)丙烯酸酯的含量,相對於該乙烯基化合物全量(100質量%),較佳為40~100質量%,更佳為65~100質量%,特佳為80~100質量%,最佳為90~100質量%。The content of (meth)acrylate in the vinyl compound is preferably from 40 to 100% by mass, more preferably from 65 to 100% by mass, particularly preferably from 80 to 100% by mass, based on the total amount (100% by mass) of the vinyl compound. 100% by mass, preferably 90 to 100% by mass.

乙烯基化合物中,(甲基)丙烯酸烷酯及(甲基)丙烯酸羥烷酯的合計含量,相對於該乙烯基化合物的全量(100質量%),較佳為40~100質量%,更佳為65~100質量%,特佳為80~100質量%,最佳為90~100質量%。In the vinyl compound, the total content of the alkyl (meth)acrylate and the hydroxyalkyl (meth)acrylate is preferably from 40 to 100% by mass, more preferably It is 65 to 100% by mass, particularly preferably 80 to 100% by mass, most preferably 90 to 100% by mass.

本發明之一態樣所使用的胺基甲酸丙烯酸酯系樹脂(U1)中,由胺基甲酸酯預聚物(UP)產生的結構單位(u11),與由乙烯基化合物產生的結構單位(u12)的含量比[(u11)/(u12)],依質量比計,較佳為10/90~80/20,更佳為20/80~70/30,特佳為30/70~60/40,最佳為35/65~55/45。In the urethane acrylate resin (U1) used in one aspect of the present invention, the structural unit (u11) derived from the urethane prepolymer (UP) and the structural unit derived from the vinyl compound The content ratio of (u12) [(u11)/(u12)], in terms of mass ratio, is preferably 10/90-80/20, more preferably 20/80-70/30, and most preferably 30/70- 60/40, the best is 35/65~55/45.

(烯烴系樹脂)      樹脂組成物(y)所含有的樹脂中,較佳的烯烴系樹脂,例如,至少具有由烯烴單體所產生的結構單位之聚合物。      上述烯烴單體,以碳數2~8之α-烯烴為佳,具體而言,例如,乙烯基、丙烯基、丁烯基、異丁烯基、1-己烯基等。      該些之中,又以乙烯基及丙烯基為佳。(Olefin-based resin) Among the resins contained in the resin composition (y), a preferable olefin-based resin is, for example, a polymer having at least a structural unit derived from an olefin monomer. The above-mentioned olefin monomers are preferably α-olefins with 2 to 8 carbon atoms, specifically, vinyl, propenyl, butenyl, isobutenyl, 1-hexenyl, etc. Among these, vinyl and acrylic are preferred.

具體而言,烯烴系樹脂,例如,超低密度聚乙烯(VLDPE、密度:880kg/m3 以上、未達910kg/m3 )、低密度聚乙烯(LDPE、密度:910kg/m3 以上、未達915kg/m3 )、中密度聚乙烯(MDPE、密度:915kg/m3 以上、未達942kg/m3 )、高密度聚乙烯(HDPE、密度:942kg/m3 以上)、直鏈狀低密度聚乙烯等的聚乙烯樹脂;聚丙烯樹脂(PP);聚丁烯樹脂(PB);乙烯-丙烯共聚物;烯烴系彈性體(TPO);聚(4-甲基ー1-戊烯)(PMP);乙烯-乙酸乙烯共聚物(EVA);乙烯-乙烯醇共聚物(EVOH);乙烯-丙烯-(5-亞乙基-2-降莰烯)等的烯烴系三元共聚物;等。Specifically, olefin-based resins, such as ultra-low-density polyethylene (VLDPE, density: 880 kg/m 3 or more, less than 910 kg/m 3 ), low-density polyethylene (LDPE, density: 910 kg/m 3 or more, less than up to 915kg/m 3 ), medium density polyethylene (MDPE, density: above 915kg/m 3 , less than 942kg/m 3 ), high density polyethylene (HDPE, density: above 942kg/m 3 ), linear low Polyethylene resin such as density polyethylene; polypropylene resin (PP); polybutene resin (PB); ethylene-propylene copolymer; olefin-based elastomer (TPO); poly(4-methyl-1-pentene) (PMP); Ethylene-vinyl acetate copolymer (EVA); Ethylene-vinyl alcohol copolymer (EVOH); Olefin-based terpolymers such as ethylene-propylene-(5-ethylidene-2-norcamphene); wait.

本發明之一態樣中,烯烴系樹脂亦可為再施以由酸變性、羥基變性,及丙烯酸基變性所選出之1種以上的變性而得之變性烯烴系樹脂。In one aspect of the present invention, the olefin resin may be denatured by one or more denaturations selected from acid denaturation, hydroxyl denaturation, and acrylic denaturation.

例如,對烯烴系樹脂實施酸變性而得之酸變性烯烴系樹脂,例如,由上述無變性之烯烴系樹脂,與不飽合羧酸或其酐,進行接枝聚合而得的變性聚合物等。      上述的不飽合羧酸或其酐,例如,馬來酸、富馬酸、依康酸、檬康酸、戊烯二酸、四氫苯二甲酸、烏頭酸、(甲基)丙烯酸、馬來酸酐、依康酸酐、戊烯二酸酐、檬康酸酐、烏頭酸酐、降莰烯二羧酸酐、四氫苯二甲酸酐等。      又,不飽合羧酸或其酐,可單獨使用亦可、將2種以上合併使用亦可。For example, acid-modified olefin-based resins obtained by acid-modifying olefin-based resins, such as denatured polymers obtained by graft polymerization of the above-mentioned non-denatured olefin-based resins with unsaturated carboxylic acids or their anhydrides, etc. . The above-mentioned unsaturated carboxylic acids or their anhydrides, for example, maleic acid, fumaric acid, itaconic acid, citraconic acid, glutaconic acid, tetrahydrophthalic acid, aconitic acid, (meth)acrylic acid, maleic acid, Toic anhydride, itaconic anhydride, glutaconic anhydride, citraconic anhydride, aconitic anhydride, norcamphene dicarboxylic anhydride, tetrahydrophthalic anhydride, etc. In addition, the unsaturated carboxylic acid or its anhydride may be used alone or in combination of two or more.

對烯烴系樹脂實施丙烯酸基變性而得之丙烯酸基變性烯烴系樹脂,例如,於作為主鏈的上述無變性的烯烴系樹脂上,以作為側鏈之方式,與(甲基)丙烯酸烷酯進行接枝聚合而得之變性聚合物等。      上述(甲基)丙烯酸烷酯所具有的烷基之碳數,較佳為1~20,更佳為1~16,特佳為1~12。      上述(甲基)丙烯酸烷酯,例如,與可選擇作為後述的單體(a1’)的化合物為相同之內容等。An acrylic-modified olefin-based resin obtained by subjecting an olefin-based resin to denaturation with an acrylic group, for example, on the above-mentioned non-denatured olefin-based resin as a main chain, as a side chain, undergoes a reaction with an alkyl (meth)acrylate Denatured polymers obtained by graft polymerization, etc. The number of carbon atoms in the alkyl group of the above-mentioned alkyl (meth)acrylate is preferably 1-20, more preferably 1-16, particularly preferably 1-12. The above-mentioned alkyl (meth)acrylate is, for example, the same as the compound that can be selected as the monomer (a1') described later.

對烯烴系樹脂實施羥基變性而得之羥基變性烯烴系樹脂,例如,使作為主鏈的上述無變性的烯烴系樹脂,與含有羥基之化合物進行接枝聚合而得之變性聚合物等。      上述含有羥基之化合物,例如,2-羥基(甲基)丙烯酸乙酯、2-羥基(甲基)丙烯酸丙酯、3-羥基(甲基)丙烯酸丙酯、2-羥基(甲基)丙烯酸丁酯、3-羥基(甲基)丙烯酸丁酯、4-羥基(甲基)丙烯酸丁酯等的(甲基)丙烯酸羥烷酯類;乙烯醇、烯丙醇等的不飽合醇類等。The hydroxy-denatured olefin-based resin obtained by modifying the hydroxyl group of an olefin-based resin is, for example, a denatured polymer obtained by graft-polymerizing the above-mentioned non-denatured olefin-based resin as a main chain with a compound containing a hydroxyl group. The compounds containing hydroxyl groups mentioned above, for example, 2-hydroxy (meth) acrylate, 2-hydroxy (meth) acrylate, 3-hydroxy (meth) acrylate, 2-hydroxy (meth) acrylate Hydroxyalkyl (meth)acrylates such as esters, 3-hydroxybutyl (meth)acrylate and 4-hydroxybutyl (meth)acrylate; unsaturated alcohols such as vinyl alcohol and allyl alcohol, etc.

(胺基甲酸丙烯酸酯系樹脂及烯烴系樹脂以外的樹脂)      本發明之一態樣中,樹脂組成物(y)中,於無損本發明效果之範圍,可含有胺基甲酸丙烯酸酯系樹脂及烯烴系樹脂以外的樹脂。      該些樹脂,例如,聚二氯乙烯、聚氯化亞乙烯、聚乙烯醇等的乙烯系樹脂;聚乙烯對苯二甲酸酯、聚丁烯對苯二甲酸酯、聚乙烯萘酯等的聚酯系樹脂;聚苯乙烯;丙烯腈-丁二烯-苯乙烯共聚物;三乙酸纖維素;聚碳酸酯;不相當胺基甲酸丙烯酸酯系樹脂的聚胺基甲酸酯;聚碸;聚醚-醚酮;聚醚碸;聚苯硫醚;聚醚醯亞胺、聚醯亞胺等的聚醯亞胺系樹脂;聚醯胺系樹脂;丙烯酸樹脂;氟系樹脂等。(Resins other than urethane-based resins and olefin-based resins) In one aspect of the present invention, the resin composition (y) may contain urethane-based resins and Resins other than olefin resins. These resins, for example, vinyl resins such as polyvinyl dichloride, polyvinylidene chloride, and polyvinyl alcohol; polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthyl ester, etc. Polyester resins; Polystyrene; Acrylonitrile-butadiene-styrene copolymer; Cellulose triacetate; Polycarbonate; Polyurethanes not equivalent to urethane acrylate resins; Polyurethane ; Polyether-ether ketone; polyether ketone; polyphenylene sulfide;

其中,就形成可滿足上述要件(1)的膨脹性基材層(Y1)之觀點,樹脂組成物(y)中的胺基甲酸丙烯酸酯系樹脂及烯烴系樹脂以外的樹脂之含有比例,以較少者為佳。      胺基甲酸丙烯酸酯系樹脂及烯烴系樹脂以外的樹脂之含有比例,相對於樹脂組成物(y)中所含有的樹脂的全量100質量份,較佳為未達30質量份,更佳為未達20質量份,更佳為未達10質量份,特佳為未達5質量份,最佳為未達1質量份。Here, from the viewpoint of forming the expandable base material layer (Y1) satisfying the above-mentioned requirement (1), the content ratio of the resin other than the urethane-based resin and the olefin-based resin in the resin composition (y) is given by Less is better. The content ratio of resins other than urethane-based resins and olefin-based resins is preferably less than 30 parts by mass, more preferably not more than 100 parts by mass of the total amount of resins contained in the resin composition (y). 20 parts by mass, more preferably less than 10 parts by mass, particularly preferably less than 5 parts by mass, most preferably less than 1 part by mass.

(無溶劑型樹脂組成物(y1))      本發明之一態樣所使用的樹脂組成物(y),例如,將質量平均分子量(Mw)為50000以下的具有乙烯性不飽合基的低聚物,與能量線聚合性單體,與上述熱膨脹性粒子摻合而得的未添加溶劑的無溶劑型樹脂組成物(y1)等。      無溶劑型樹脂組成物(y1)中,因未添加溶劑,故能量線聚合性單體為可提高上述低聚物之可塑性者。      對由無溶劑型樹脂組成物(y1)所形成的塗膜,照射能量線時,將容易形成滿足上述要件(1)的膨脹性基材層(Y1)。(Solvent-free resin composition (y1)) The resin composition (y) used in one aspect of the present invention is, for example, an oligomerized A solvent-free resin composition (y1) without adding a solvent obtained by blending an energy ray polymerizable monomer and the above-mentioned heat-expandable particles. In the solvent-free resin composition (y1), since no solvent is added, the energy ray polymerizable monomer is one that can improve the plasticity of the above-mentioned oligomer. When a coating film formed of a solvent-free resin composition (y1) is irradiated with energy rays, an expandable base material layer (Y1) satisfying the above requirement (1) will be easily formed.

又,添加於無溶劑型樹脂組成物(y1)的熱膨脹性粒子之種類、形狀及添加量(含量),係如上所述。In addition, the kind, shape, and addition amount (content) of the thermally expandable particles added to the non-solvent type resin composition (y1) are as above.

無溶劑型樹脂組成物(y1)所含有的上述低聚物之質量平均分子量(Mw)為50000以下,較佳為1000~50000,更佳為2000~40000,特佳為3000~35000,最佳為4000~30000。The mass average molecular weight (Mw) of the oligomer contained in the solvent-free resin composition (y1) is 50,000 or less, preferably 1,000 to 50,000, more preferably 2,000 to 40,000, most preferably 3,000 to 35,000, most preferably 4000~30000.

又,上述低聚物,於上述樹脂組成物(y)所含有的樹脂中,只要為質量平均分子量為50000以下的具有乙烯性不飽合基者即可,又以上述的胺基甲酸酯預聚物(UP)為佳。      又,該低聚物亦可使用具有乙烯性不飽合基的變性烯烴系樹脂。In addition, the above-mentioned oligomer may be any one having an ethylenically unsaturated group having a mass average molecular weight of 50,000 or less in the resin contained in the above-mentioned resin composition (y), and the above-mentioned urethane Prepolymers (UP) are preferred. In addition, as the oligomer, a denatured olefin-based resin having an ethylenically unsaturated group can also be used.

無溶劑型樹脂組成物(y1)中,上述低聚物及能量線聚合性單體的合計含量,相對於無溶劑型樹脂組成物(y1)的全量(100質量%),較佳為50~99質量%,更佳為60~95質量%,特佳為65~90質量%,最佳為70~85質量%。In the solvent-free resin composition (y1), the total content of the aforementioned oligomers and energy ray polymerizable monomers is preferably from 50 to 99% by mass, more preferably 60-95% by mass, particularly preferably 65-90% by mass, most preferably 70-85% by mass.

能量線聚合性單體,例如,(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烷酯、(甲基)丙烯酸二環戊烯氧酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸金剛烷酯、丙烯酸三環癸酯等的脂環式聚合性化合物;丙烯酸苯基羥丙酯、丙烯酸苄酯、酚環氧乙烷變性丙烯酸酯等的芳香族聚合性化合物;(甲基)丙烯酸四氫糠酯、丙烯酸嗎啉酯、N-乙烯基吡咯啶酮、N-乙烯基己內醯胺等的雜環式聚合性化合物等。      該些能量線聚合性單體,可單獨使用亦可、將2種以上合併使用亦可。Energy ray polymerizable monomers such as isobornyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentyl (meth)acrylate, dicyclopentenyloxy (meth)acrylate Cyclohexyl (meth)acrylate, alicyclic polymerizable compounds such as cyclohexyl (meth)acrylate, adamantyl (meth)acrylate, tricyclodecanyl acrylate, etc.; phenyl hydroxypropyl acrylate, benzyl acrylate, phenol oxirane Aromatic polymeric compounds such as denatured acrylates; heterocyclic polymeric compounds such as tetrahydrofurfuryl (meth)acrylate, morpholinyl acrylate, N-vinylpyrrolidone, N-vinylcaprolactam, etc. wait. These energy ray polymerizable monomers may be used alone or in combination of two or more.

上述低聚物與能量線聚合性單體的添加比(上述低聚物/能量線聚合性單體),較佳為20/80~90/10,更佳為30/70~85/15,特佳為35/65~80/20。The addition ratio of the above oligomer to the energy ray polymerizable monomer (the above oligomer/energy ray polymerizable monomer) is preferably 20/80 to 90/10, more preferably 30/70 to 85/15, The best is 35/65~80/20.

本發明之一態樣中,無溶劑型樹脂組成物(y1),以再添加光聚合起始劑為佳。      含有光聚合起始劑時,即使照射較低能量的能量線時,也可充份地進行硬化反應。In one aspect of the present invention, it is preferable to add a photopolymerization initiator to the solvent-free resin composition (y1).  When a photopolymerization initiator is included, the hardening reaction can proceed sufficiently even when irradiated with low-energy energy rays.

光聚合起始劑,例如,1-羥基-環己基-苯基-酮、苯偶因、苯偶因甲醚、苯偶因乙醚、苯偶因丙醚、苄基苯基硫醚、四甲基秋蘭姆單硫醚、偶氮雙異丁腈、二苄酯、二乙醯酯、8-氯蒽醌等。      該些光聚合起始劑,可單獨使用亦可、將2種以上合併使用亦可。Photopolymerization initiators, for example, 1-hydroxy-cyclohexyl-phenyl-ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzylphenyl sulfide, tetramethyl Thiuram monosulfide, azobisisobutyronitrile, dibenzyl ester, diacetyl ester, 8-chloroanthraquinone, etc. These photopolymerization initiators may be used alone or in combination of two or more.

光聚合起始劑之添加量,相對於上述低聚物及能量線聚合性單體的全量(100質量份),較佳為0.01~5質量份,更佳為0.01~4質量份,特佳為0.02~3質量份。The amount of the photopolymerization initiator to be added is preferably 0.01 to 5 parts by mass, more preferably 0.01 to 4 parts by mass, and most preferably It is 0.02 to 3 parts by mass.

<非膨脹性基材層(Y2)>      構成基材(Y)的非膨脹性基材層(Y2)之形成材料,例如,紙材、樹脂、金屬等,其可配合本發明之一態樣的層合體之用途作適當之選擇。<Non-expandable base material layer (Y2)> The forming material of the non-expandable base material layer (Y2) constituting the base material (Y), for example, paper, resin, metal, etc., which can be combined with one aspect of the present invention Make appropriate choices for the use of the laminated body.

紙材,例如,薄葉紙、中質紙、上質紙、含浸紙、銅版紙、繪圖紙、硫酸紙、玻璃紙等。      樹脂,例如,聚乙烯、聚丙烯等的聚烯烴樹脂;聚二氯乙烯、聚氯化亞乙烯、聚乙烯醇、乙烯-乙酸乙烯共聚物、乙烯-乙烯醇共聚物等的乙烯系樹脂;聚乙烯對苯二甲酸酯、聚丁烯對苯二甲酸酯、聚乙烯萘酯等的聚酯系樹脂;聚苯乙烯;丙烯腈-丁二烯-苯乙烯共聚物;三乙酸纖維素;聚碳酸酯;聚胺基甲酸酯、丙烯酸基變性聚胺基甲酸酯等的胺基甲酸酯樹脂;聚甲基戊烯;聚碸;聚醚-醚酮;聚醚碸;聚苯硫醚;聚醚醯亞胺、聚醯亞胺等的聚醯亞胺系樹脂;聚醯胺系樹脂;丙烯酸樹脂;氟系樹脂等。      金屬,例如,鋁、錫、鉻、鈦等。Paper materials, such as thin leaf paper, medium paper, high quality paper, impregnated paper, coated paper, drawing paper, sulfuric acid paper, cellophane, etc. Resins, for example, polyolefin resins such as polyethylene and polypropylene; vinyl resins such as polyvinyl dichloride, polyvinylidene chloride, polyvinyl alcohol, ethylene-vinyl acetate copolymer, ethylene-vinyl alcohol copolymer, etc.; Polyester-based resins such as ethylene terephthalate, polybutylene terephthalate, and polyethylene naphthyl ester; polystyrene; acrylonitrile-butadiene-styrene copolymer; cellulose triacetate; Polycarbonate; Urethane resins such as polyurethane, acrylic denatured polyurethane, etc.; Polymethylpentene; Polyethylene; Polyether-etherketone; Sulfide; polyimide-based resins such as polyetherimide and polyimide; polyamide-based resins; acrylic resins; fluorine-based resins, etc. Metals, such as aluminum, tin, chromium, titanium, etc.

該些形成材料,可由1種所構成亦可、將2種以上合併使用亦可。      由2種以上的形成材料合併使用的非膨脹性基材層(Y2),例如,紙材經由聚乙烯等的熱塑性樹脂層合者、含有樹脂的樹脂薄膜或薄片表面形成金屬膜者等。      又,金屬層之形成方法,例如,將上述金屬使用真空蒸鍍、濺鍍、離子鍍敷等的PVD法進行蒸鍍之方法,或使用一般的黏著劑貼附由上述金屬所形成的金屬箔之方法等。These formation materials may consist of 1 type, and may be used in combination of 2 or more types. Non-expandable substrate layer (Y2) that is made of two or more forming materials, for example, paper laminated with thermoplastic resin such as polyethylene, resin film or sheet surface containing resin with metal film, etc. In addition, the method of forming the metal layer is, for example, a method of vapor-depositing the above-mentioned metals using a PVD method such as vacuum evaporation, sputtering, or ion plating, or attaching a metal foil formed of the above-mentioned metals using a general adhesive. method etc.

其中,本發明之一態樣中,就膨脹性基材層(Y1)所含的膨脹性粒子進行膨脹之際,可抑制膨脹性基材層(Y1)的非膨脹性基材層(Y2)側的表面形成凹凸、可於膨脹性基材層(Y1)的黏著劑層(X1)側的表面形成優良的凹凸等觀點,非膨脹性基材層(Y2),以具備不會受到因膨脹性粒子膨脹而發生變形之程度的剛性者為佳。具體而言,膨脹性粒子開始膨脹時的溫度(t)中,非膨脹性基材層(Y2)的儲存彈性率E’(t),以1.1×107 Pa以上為佳。Among them, in one aspect of the present invention, when the expandable particles contained in the expandable base material layer (Y1) expand, the non-expandable base material layer (Y2) of the expandable base material layer (Y1) can be suppressed From the viewpoint of forming unevenness on the surface of the expandable base material layer (Y1) on the side of the adhesive layer (X1), etc., the non-expandable base material layer (Y2) has a Rigidity to the extent that the flexible particles expand and deform is preferred. Specifically, the storage elastic modulus E'(t) of the non-expandable base material layer (Y2) at the temperature (t) at which the expandable particles start to expand is preferably 1.1×10 7 Pa or more.

又,就提高與非膨脹性基材層(Y2)層合的其他層之間的層間密著性之觀點,非膨脹性基材層(Y2)含有樹脂時,可對非膨脹性基材層(Y2)的表面,依與上述膨脹性基材層(Y1)相同般,使用氧化法、凹凸化法等進行表面處理、易接著處理,或施以底漆處理。Also, from the viewpoint of improving interlayer adhesion between other layers laminated with the non-expandable base material layer (Y2), when the non-expandable base material layer (Y2) contains a resin, the non-expandable base material layer (Y2) can be The surface of (Y2) is subjected to surface treatment, easy-adhesion treatment, or primer treatment by oxidation, embossing, or the like in the same manner as the above-mentioned expandable base material layer (Y1).

又,非膨脹性基材層(Y2)含有樹脂時,可與該樹脂同時,含有樹脂組成物(y),亦可含有上述的基材用之添加劑。Moreover, when the non-expandable base material layer (Y2) contains resin, it may contain resin composition (y) simultaneously with this resin, and may contain the above-mentioned additive for base material.

非膨脹性基材層(Y2),為基於上述方法判斷的非膨脹性之層。      因此,由上述式所算出的非膨脹性基材層(Y2)之體積變化率(%)為未達5%,較佳為未達2%,更佳為未達1%,特佳為未達0.1%,最佳為未達0.01%。The non-expandable base material layer (Y2) is a non-expandable layer judged based on the above method. Therefore, the volume change rate (%) of the non-expandable base material layer (Y2) calculated by the above formula is less than 5%, preferably less than 2%, more preferably less than 1%, and most preferably less than 1%. Up to 0.1%, the best is less than 0.01%.

又,非膨脹性基材層(Y2)中,該體積變化率於上述範圍內時,亦可含有熱膨脹性粒子。例如,可經由選擇非膨脹性基材層(Y2)所含有的樹脂之方式,於即使含有熱膨脹性粒子之情形時,也可將體積變化率調整至上述範圍。      其中,非膨脹性基材層(Y2)以不含有熱膨脹性粒子者為佳。非膨脹性基材層(Y2)含有熱膨脹性粒子時,其含量以越少越好,具體的熱膨脹性粒子的含量為,相對於非膨脹性基材層(Y2)的全量(100質量%),通常為未達3質量%,較佳為未達1質量%,更佳為未達0.1質量%,特佳為未達0.01質量%,最佳為未達0.001質量%。Moreover, in a non-expandable base material layer (Y2), when this volume change rate exists in the said range, you may contain thermally expandable particle|grains. For example, by selecting the resin contained in the non-expandable base material layer (Y2), even when thermally expandable particles are contained, the volume change rate can be adjusted to the above range. Among them, the non-expandable substrate layer (Y2) is preferably one that does not contain heat-expandable particles. When the non-expandable base material layer (Y2) contains heat-expandable particles, the less the content, the better. The specific content of heat-expandable particles is relative to the total amount (100% by mass) of the non-expandable base material layer (Y2). , usually less than 3 mass %, preferably less than 1 mass %, more preferably less than 0.1 mass %, particularly preferably less than 0.01 mass %, most preferably less than 0.001 mass %.

<黏著劑層(X)>      本發明之一態樣所使用的支撐層(II)所具有的黏著劑層(X),可由含有黏著性樹脂的黏著劑組成物(x)所形成。      又,黏著劑組成物(x),必要時,可含有交聯劑、增黏劑、聚合性化合物、聚合起始劑等的黏著劑用的添加劑。      以下,將對黏著劑組成物(x)所含有的各成份進行說明。      又,支撐層(II),於具有第1黏著劑層(X1)及第2黏著劑層(X2)之情形,第1黏著劑層(X1)及第2黏著劑層(X2),亦可由含有以下所示各成份的黏著劑組成物(x)所形成。<Adhesive layer (X)> The adhesive layer (X) included in the support layer (II) used in one aspect of the present invention can be formed of an adhesive composition (x) containing an adhesive resin. In addition, the adhesive composition (x) may contain adhesive additives such as a crosslinking agent, a tackifier, a polymerizable compound, and a polymerization initiator, if necessary. Below, each component contained in the adhesive composition (x) will be explained. Also, when the support layer (II) has the first adhesive layer (X1) and the second adhesive layer (X2), the first adhesive layer (X1) and the second adhesive layer (X2) can also be formed by The adhesive composition (x) containing each component shown below was formed.

(黏著性樹脂)      本發明之一態樣所使用的黏著性樹脂,以該樹脂單獨即具有黏著性,且質量平均分子量(Mw)為1萬以上的聚合物為佳。      本發明之一態樣所使用的黏著性樹脂的質量平均分子量(Mw),就可提升黏著力之觀點,較佳為1萬~200萬,更佳為2萬~150萬,特佳為3萬~100萬。(Adhesive Resin) The adhesive resin used in one aspect of the present invention is preferably a polymer having adhesiveness alone and having a mass average molecular weight (Mw) of 10,000 or more. The mass average molecular weight (Mw) of the adhesive resin used in one aspect of the present invention is preferably 10,000 to 2 million, more preferably 20,000 to 1.5 million, and most preferably 3 from the viewpoint of improving the adhesive force. Ten thousand to one million.

具體的黏著性樹脂,例如,丙烯酸系樹脂、胺基甲酸酯系樹脂、聚異丁烯系樹脂等的橡膠系樹脂、聚酯系樹脂、烯烴系樹脂、聚矽氧系樹脂、聚乙烯醚系樹脂等。      該些黏著性樹脂,可單獨使用亦可、將2種以上合併使用亦可。      又,該些黏著性樹脂,為具有2種以上的結構單位之共聚物時,該共聚物之形態,並未有特別之限定,而可為嵌段共聚物、無規共聚物,及接枝共聚物中之任一者。Specific adhesive resins, for example, rubber-based resins such as acrylic resins, urethane-based resins, and polyisobutylene-based resins, polyester-based resins, olefin-based resins, silicone-based resins, and polyvinyl ether-based resins wait. These adhesive resins may be used alone or in combination of two or more. Also, when these adhesive resins are copolymers having two or more structural units, the form of the copolymer is not particularly limited, and may be block copolymers, random copolymers, or grafted copolymers. any of the copolymers.

本發明之一態樣中,就可產生優良的黏著力之觀點,該黏著性樹脂以含有丙烯酸系樹脂為佳。      又,使用具有第1黏著劑層(X1)及第2黏著劑層(X2)的支撐層(II)時,因與能量線硬化性樹脂層(I)接觸的第1黏著劑層(X1)中含有丙烯酸系樹脂,故可使第1黏著劑層(X1)的表面容易形成凹凸。In one aspect of the present invention, the adhesive resin preferably contains an acrylic resin from the viewpoint of producing excellent adhesive force. Also, when using the support layer (II) having the first adhesive layer (X1) and the second adhesive layer (X2), the first adhesive layer (X1) in contact with the energy ray curable resin layer (I) Since the acrylic resin is contained in the adhesive agent layer (X1), unevenness can be easily formed on the surface of the first adhesive layer (X1).

黏著性樹脂中的丙烯酸系樹脂之含有比例為,相對於黏著劑組成物(x)或黏著劑層(X)所含有的黏著性樹脂之全量(100質量%),較佳為30~100質量%,更佳為50~100質量%,特佳為70~100質量%,最佳為85~100質量%。The content ratio of the acrylic resin in the adhesive resin is preferably 30 to 100% by mass relative to the total amount (100% by mass) of the adhesive resin contained in the adhesive composition (x) or the adhesive layer (X). %, more preferably 50-100% by mass, particularly preferably 70-100% by mass, most preferably 85-100% by mass.

黏著性樹脂的含量,相對於黏著劑組成物(x)的有效成份之全量(100質量%)或黏著劑層(X)的全量(100質量%),較佳為35~100質量%,更佳為50~100質量%,特佳為60~98質量%,最佳為70~95質量%。The content of the adhesive resin is preferably 35 to 100% by mass, more preferably It is preferably 50-100% by mass, particularly preferably 60-98% by mass, most preferably 70-95% by mass.

(交聯劑)      本發明之一態樣中,黏著劑組成物(x)為含有具有官能基的黏著性樹脂之情形,其以再含有交聯劑者為佳。      該交聯劑為,可與具有官能基的黏著性樹脂進行反應,並以該官能基為交聯起點,於黏著性樹脂相互間形成交聯者。(Crosslinking agent) In one aspect of the present invention, when the adhesive composition (x) contains an adhesive resin having a functional group, it preferably further contains a crosslinking agent. The cross-linking agent is capable of reacting with the adhesive resin having a functional group, and using the functional group as the starting point of cross-linking to form cross-linking between the adhesive resins.

交聯劑,例如,異氰酸酯系交聯劑、環氧系交聯劑、吖環丙烷(aziridine)系交聯劑、金屬螯合物系交聯劑等。      該些交聯劑,可單獨使用亦可、將2種以上合併使用亦可。      該些交聯劑中,就可提高凝集力、提升黏著力之觀點,及容易取得等的觀點,以異氰酸酯系交聯劑為佳。The cross-linking agent is, for example, an isocyanate-based cross-linking agent, an epoxy-based cross-linking agent, an aziridine-based cross-linking agent, a metal chelate-based cross-linking agent, and the like. These crosslinking agents may be used alone or in combination of two or more. Among these cross-linking agents, isocyanate-based cross-linking agents are preferred in terms of improving cohesion and adhesion, and being easy to obtain.

交聯劑之含量,可以黏著性樹脂所具有的官能基之數作適當之調整,一般相對於具有官能基的黏著性樹脂100質量份,較佳為0.01~10質量份,更佳為0.03~7質量份,特佳為0.05~5質量份。The content of the crosslinking agent can be appropriately adjusted by the number of functional groups in the adhesive resin. Generally, relative to 100 parts by mass of the adhesive resin with functional groups, it is preferably 0.01-10 parts by mass, more preferably 0.03- 7 parts by mass, preferably 0.05 to 5 parts by mass.

(增黏劑)      本發明之一態樣中,黏著劑組成物(x),就可使黏著力更向上提升之觀點,可再含有增黏劑。      本說明書中,「增黏劑」係指,可輔助性地提高上述黏著性樹脂之黏著力的成份,且質量平均分子量(Mw)為未達1萬之低聚物之意,由此可與上述的黏著性樹脂予以區別。      增黏劑之質量平均分子量(Mw),較佳為400~9000,更佳為500~8000,特佳為800~5000。(Tackifier) In one aspect of the present invention, the adhesive composition (x) may further contain a tackifier from the viewpoint of further enhancing the adhesive force. In this specification, "tackifier" refers to a component that can assist in improving the adhesive force of the above-mentioned adhesive resin, and means an oligomer with a mass average molecular weight (Mw) of less than 10,000, which can be compared with The above-mentioned adhesive resins are distinguished. The mass average molecular weight (Mw) of the tackifier is preferably 400-9000, more preferably 500-8000, and most preferably 800-5000.

增黏劑,例如,松脂系樹脂、萜烯系樹脂、苯乙烯系樹脂、石油腦經熱分解而生成的戊烯、異戊二烯、胡椒鹼、1,3-戊二烯等的C5餾份經共聚而得的C5系石油樹脂、石油腦經熱分解而生成的茚、乙烯基甲苯等的C9餾份經共聚而得的C9系石油樹脂,及該些氫化後之氫化樹脂等。Tackifiers, such as pine resins, terpene resins, styrene resins, pentene, isoprene, piperine, 1,3-pentadiene, etc. C5 series petroleum resins obtained by copolymerization, C9 series petroleum resins obtained by copolymerization of C9 fractions such as indene and vinyltoluene produced by thermal decomposition of naphtha, and hydrogenated resins after hydrogenation.

增黏劑之軟化點,較佳為60~170℃,更佳為65~160℃,特佳為70~150℃。      又,本說明書中,增黏劑之「軟化點」,係指依JIS K 2531為基準所測定之值之意。      增黏劑,可單獨使用亦可,亦可將軟化點、構造等相異的2種以上合併使用亦可。      又,使用2種以上的複數之增黏劑時,該些複數的增黏劑之軟化點的加權平均,以於上述範圍者為佳。The softening point of the tackifier is preferably 60-170°C, more preferably 65-160°C, particularly preferably 70-150°C. In addition, in this specification, the "softening point" of the tackifier refers to the value measured based on JIS K 2531. Tackifiers can be used alone or in combination of two or more different in softening point and structure. In addition, when two or more plural tackifiers are used, the weighted average of the softening points of these plural tackifiers is preferably within the above range.

增黏劑之含量,相對於黏著劑組成物(x)的有效成份之全量(100質量%)或黏著劑層(X)的全量(100質量%),較佳為0.01~65質量%,更佳為0.1~50質量%,特佳為1~40質量%,最佳為2~30質量%。The content of the tackifier is preferably 0.01 to 65% by mass relative to the total amount (100% by mass) of the active ingredients of the adhesive composition (x) or the total amount (100% by mass) of the adhesive layer (X), and more preferably It is preferably 0.1 to 50% by mass, particularly preferably 1 to 40% by mass, most preferably 2 to 30% by mass.

(黏著劑用添加劑)      本發明之一態樣中,黏著劑組成物(x),於無損本發明效果之範圍,除上述的添加劑以外,亦可再含有一般黏著劑所使用的黏著劑用添加劑。      該些黏著劑用添加劑,例如,抗氧化劑、軟化劑(可塑劑)、防鏽劑、顏料、染料、遅延劑、反應促進劑(觸媒)、紫外線吸收劑、抗靜電劑等。      又,該些黏著劑用添加劑,可分別單獨使用亦可、將2種以上合併使用亦可。      含有該些黏著劑用添加劑時,其各個黏著劑用添加劑之含量,相對於黏著性樹脂100質量份,較佳為0.0001~20質量份,更佳為0.001~10質量份。(Additives for Adhesives) In one aspect of the present invention, the adhesive composition (x) may contain, in addition to the above-mentioned additives, additives for adhesives commonly used in adhesives, as long as the effect of the present invention is not impaired. .  These additives for adhesives, for example, antioxidants, softeners (plasticizers), antirust agents, pigments, dyes, retarders, reaction accelerators (catalysts), ultraviolet absorbers, antistatic agents, etc. In addition, these adhesive additives may be used alone or in combination of two or more. When these additives for adhesives are contained, the content of each additive for adhesives is preferably 0.0001 to 20 parts by mass, more preferably 0.001 to 10 parts by mass, based on 100 parts by mass of the adhesive resin.

又,使用具有作為膨脹性黏著劑層的第1黏著劑層(X1)之上述第二態樣的支撐層(II)時,作為膨脹性黏著劑層之第1黏著劑層(X1)的形成材料,為由上述的黏著劑組成物(x),再含有熱膨脹性粒子的膨脹性黏著劑組成物(x11)而形成者。      該熱膨脹性粒子,係如上所述。      熱膨脹性粒子的含量,相對於膨脹性黏著劑組成物(x11)的有效成份之全量(100質量%)或膨脹性黏著劑層之全量(100質量%),較佳為1~70質量%,更佳為2~60質量%,特佳為3~50質量%,最佳為5~40質量%。Also, when using the support layer (II) of the second aspect having the first adhesive layer (X1) as the expandable adhesive layer, the formation of the first adhesive layer (X1) as the expandable adhesive layer The material is formed from the above-mentioned adhesive composition (x) and an expandable adhesive composition (x11) containing heat-expandable particles. The thermally expandable particles are as described above. The content of the thermally expandable particles is preferably 1 to 70% by mass relative to the total amount (100% by mass) of the active ingredient of the expandable adhesive composition (x11) or the total amount (100% by mass) of the expandable adhesive layer, More preferably, it is 2-60 mass %, Most preferably, it is 3-50 mass %, Most preferably, it is 5-40 mass %.

另一方面,黏著劑層(X)為非膨脹性黏著劑層時,作為非膨脹性黏著劑層之形成材料的黏著劑組成物(x),以不含有熱膨脹性粒子者為佳。      含有熱膨脹性粒子的情形,其含量以越少越好,一般相對於黏著劑組成物(x)的有效成份之全量(100質量%)或黏著劑層(X)的全量(100質量%),較佳為未達1質量%,更佳為未達0.1質量%,特佳為未達0.01質量%,最佳為未達0.001質量%。On the other hand, when the adhesive layer (X) is a non-expandable adhesive layer, the adhesive composition (x) as a material for forming the non-expandable adhesive layer preferably does not contain heat-expandable particles. In the case of containing heat-expandable particles, the less the content, the better. Generally, relative to the total amount (100% by mass) of the active ingredients of the adhesive composition (x) or the total amount (100% by mass) of the adhesive layer (X), It is preferably less than 1% by mass, more preferably less than 0.1% by mass, particularly preferably less than 0.01% by mass, most preferably less than 0.001% by mass.

又,如圖2所示之層合體2a、2b所示般,使用作為非膨脹性黏著劑層的具有第1黏著劑層(X1)及第2黏著劑層(X2)的支撐層(II)時,於23℃下、作為非膨脹性黏著劑層之第1黏著劑層(X1)的儲存剪切彈性率G’(23),較佳為1.0×108 Pa以下,更佳為5.0×107 Pa以下,特佳為1.0×107 Pa以下。      作為非膨脹性黏著劑層的第1黏著劑層(X1)的儲存剪切彈性率G’(23)為1.0×108 Pa以下時,例如,為圖2所示之層合體2a、2b等的構成時,其可經由加熱膨脹處理而使膨脹性基材層(Y1)中的熱膨脹性粒子進行膨脹,而使與硬化樹脂層(I’)接觸的第1黏著劑層(X1)的表面更容易形成凹凸。      其結果,可形成一種於支撐層(II)與硬化樹脂層(I’)的界面P,只要使用些許力量即可使其整體容易分離之層合體。      又,於23℃下,作為非膨脹性黏著劑層之第1黏著劑層(X1)的儲存剪切彈性率G’(23),較佳為1.0×104 Pa以上,更佳為5.0×104 Pa以上,特佳為1.0×105 Pa以上。Also, as shown in the laminates 2a and 2b shown in FIG. 2, a support layer (II) having a first adhesive layer (X1) and a second adhesive layer (X2) as a non-expandable adhesive layer is used. At 23°C, the storage shear modulus G'(23) of the first adhesive layer (X1) as a non-expandable adhesive layer is preferably 1.0×10 8 Pa or less, more preferably 5.0× 10 7 Pa or less, particularly preferably 1.0×10 7 Pa or less. When the storage shear elastic modulus G'(23) of the first adhesive layer (X1) which is a non-expandable adhesive layer is 1.0×10 8 Pa or less, for example, the laminated body 2a, 2b etc. shown in FIG. 2 In the case of the structure, it can expand the thermally expandable particles in the expandable base material layer (Y1) through thermal expansion treatment, so that the surface of the first adhesive layer (X1) in contact with the cured resin layer (I') Easier to form bumps. As a result, the interface P between the support layer (II) and the cured resin layer (I') can be formed into a laminate that can be easily separated as a whole with only a little force. Also, at 23°C, the storage shear modulus G'(23) of the first adhesive layer (X1), which is a non-expandable adhesive layer, is preferably at least 1.0×10 4 Pa, more preferably 5.0× 10 4 Pa or more, particularly preferably 1.0×10 5 Pa or more.

本發明之一態樣的層合體所具有的支撐層(II)之波長375nm的光穿透率,較佳為30%以上,更佳為50%以上,特佳為70%以上。光穿透率於上述範圍時,能量線(紫外線)介由支撐層(II)而照射能量線硬化性樹脂層(I)時,能量線可使硬化性樹脂層(I)的硬化度更向上提升。又,波長375nm的光穿透率之上限值並未有特別之限定,例如,可為95%以下。上述穿透率,可使用分光光度計的公知方法而測定。      就達成上述的光穿透率之觀點,支撐層(II)所具有的基材(Y)及黏著劑層(X)含有著色劑時,於不妨礙本發明效果之範圍,以調整其含量為佳為佳。      含有著色劑時,其含量以越少越好,一般相對於黏著劑組成物(x)的有效成份之全量(100質量%)或黏著劑層(X)的全量(100質量%),較佳為未達1質量%,更佳為未達0.1質量%,特佳為未達0.01質量%,最佳為未達0.001質量%,又,基材(Y)中的著色劑之含量,相對於樹脂組成物(y)的有效成份之全量(100質量%)或基材(Y)的全量(100質量%),較佳為未達1質量%,更佳為未達0.1質量%,特佳為未達0.01質量%,最佳為未達0.001質量%。The light transmittance of the supporting layer (II) in the laminate according to one aspect of the present invention at a wavelength of 375 nm is preferably at least 30%, more preferably at least 50%, and most preferably at least 70%. When the light transmittance is in the above range, when the energy ray (ultraviolet rays) irradiates the energy ray curable resin layer (I) through the supporting layer (II), the energy ray can make the hardening degree of the curable resin layer (I) more upward promote. Also, the upper limit of the light transmittance at a wavelength of 375 nm is not particularly limited, for example, it may be 95% or less. The above-mentioned transmittance can be measured by a known method using a spectrophotometer. From the viewpoint of achieving the above-mentioned light transmittance, when the base material (Y) and the adhesive layer (X) of the support layer (II) contain a coloring agent, within the range that does not hinder the effect of the present invention, adjust its content to Good is better. When a coloring agent is contained, the less the content, the better, generally relative to the total amount (100% by mass) of the active ingredients of the adhesive composition (x) or the total amount (100% by mass) of the adhesive layer (X), preferably It is less than 1% by mass, more preferably less than 0.1% by mass, most preferably less than 0.01% by mass, most preferably less than 0.001% by mass, and the content of the coloring agent in the substrate (Y) is less than 0.01% by mass. The total amount (100% by mass) of the active ingredient of the resin composition (y) or the total amount (100% by mass) of the substrate (Y) is preferably less than 1% by mass, more preferably less than 0.1% by mass, most preferably It is less than 0.01% by mass, most preferably less than 0.001% by mass.

<能量線硬化性樹脂層(I)>      能量線硬化性樹脂層(I)只要為經照射能量線而可形成硬化之層時,並未有特別之限定,例如,由含有能量線硬化性成份(a)的能量線硬化性樹脂組成物所形成者。<Energy ray curable resin layer (I)> The energy ray curable resin layer (I) is not particularly limited as long as it can be hardened by irradiation with energy rays. (a) formed of the energy ray curable resin composition.

[能量線硬化性成份(a)]      能量線硬化性成份(a)為,經由能量線之照射而硬化之成份。      能量線硬化性成份(a),例如,具有能量線硬化性雙鍵的質量平均分子量(Mw)為80000~2000000之聚合物(a1)(以下,亦簡稱「聚合物(a1)」)、具有能量線硬化性雙鍵的分子量為100~80000之化合物(a2)(以下,亦簡稱「化合物(a2)」)等。      能量線硬化性成份(a),可單獨使用亦可、將2種以上合併使用亦可。[Energy ray-curing component (a)] The energy ray-curing component (a) is a component that is hardened by irradiation of energy rays. The energy ray curable component (a) is, for example, a polymer (a1) having an energy ray curable double bond and having a mass average molecular weight (Mw) of 80,000 to 2,000,000 (hereinafter also referred to as "polymer (a1)"), A compound (a2) having an energy ray-curable double bond with a molecular weight of 100 to 80,000 (hereinafter also referred to simply as "compound (a2)") and the like. The energy ray-curing component (a) may be used alone or in combination of two or more.

(聚合物(a1))      聚合物(a1)為,具有能量線硬化性雙鍵的質量平均分子量(Mw)為80000~2000000之聚合物。      聚合物(a1),例如,由具有可與其他化合物所具有的基進行反應的官能基X之丙烯酸系聚合物(a11),與具有可與上述官能基X進行反應之基Y及具有能量線硬化性雙鍵的能量線硬化性化合物(a12),進行聚合而形成的丙烯酸系樹脂(a1-1)等。      聚合物(a1),可單獨使用亦可、將2種以上合併使用亦可。(Polymer (a1)) The polymer (a1) is a polymer having an energy-ray-curable double bond and a mass average molecular weight (Mw) of 80,000 to 2,000,000. The polymer (a1), for example, is composed of an acrylic polymer (a11) having a functional group X capable of reacting with a group possessed by other compounds, a group Y having a group Y capable of reacting with the above-mentioned functional group X, and an energy ray An energy ray-curable compound (a12) with a curable double bond, an acrylic resin (a1-1) formed by polymerization, and the like. The polymer (a1) may be used alone or in combination of two or more.

・丙烯酸系聚合物(a11)      丙烯酸系聚合物(a11)所具有的官能基X,例如,羥基、羧基、胺基、取代胺基(胺基中之1個或2個的氫原子,可被氫原子以外的基取代而得之基)及環氧基所成之群所選出之1種以上者。・Acrylic polymer (a11) The functional group X of the acrylic polymer (a11) is, for example, a hydroxyl group, a carboxyl group, an amine group, or a substituted amino group (one or two of the hydrogen atoms in the amine group can be replaced by One or more selected from the group consisting of a group substituted with a group other than a hydrogen atom) and an epoxy group.

丙烯酸系聚合物(a11),例如,由具有上述官能基X之丙烯酸系單體,與不具有上述官能基X之丙烯酸系單體進行共聚而形成者,或該些單體以外,再與丙烯酸系單體以外的單體(非丙烯酸系單體)共聚而形成者。丙烯酸系聚合物(a11),可為無規共聚物亦可、嵌段共聚物亦可。      丙烯酸系聚合物(a11),可單獨使用亦可、將2種以上合併使用亦可。The acrylic polymer (a11), for example, is formed by copolymerizing an acrylic monomer having the above-mentioned functional group X with an acrylic monomer not having the above-mentioned functional group X, or other than these monomers, and acrylic acid Those formed by copolymerization of monomers other than acrylic monomers (non-acrylic monomers). The acrylic polymer (a11) may be a random copolymer or a block copolymer. Acrylic polymers (a11) may be used alone or in combination of two or more.

具有上述官能基X之丙烯酸系單體,例如,含有羥基之單體、含有羧基之單體、胺基含有單體、含有取代胺基單體、含有環氧基之單體等。      含有羥基之單體,例如,(甲基)丙烯酸羥甲基、(甲基)丙烯酸2-羥乙基、(甲基)丙烯酸2-羥丙基、(甲基)丙烯酸3-羥丙基、(甲基)丙烯酸2-羥丁基、(甲基)丙烯酸3-羥丁基、(甲基)丙烯酸4-羥丁基等的(甲基)丙烯酸羥烷基;乙烯醇、烯丙醇等的非(甲基)丙烯酸系不飽合醇(不具有(甲基)丙烯醯基骨架之不飽合醇)等。      含有羧基之單體,例如,(甲基)丙烯酸、巴豆酸等的乙烯性不飽合單羧酸(具有乙烯性不飽合鍵結之單羧酸);富馬酸、依康酸、馬來酸、檬康酸等的乙烯性不飽合二羧酸(具有乙烯性不飽合鍵結之二羧酸);上述乙烯性不飽合二羧酸之酸酐;2-羧基乙甲基丙烯酸酯等的(甲基)丙烯酸羧基烷酯等。      該些之中,又以含有羥基之單體、含有羧基之單體為佳,又以含有羥基之單體為較佳。Acrylic monomers having the above-mentioned functional group X include, for example, monomers containing hydroxyl groups, monomers containing carboxyl groups, monomers containing amine groups, monomers containing substituted amino groups, monomers containing epoxy groups, and the like. Hydroxyl-containing monomers, such as hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, Hydroxyalkyl (meth)acrylates such as 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, etc.; vinyl alcohol, allyl alcohol, etc. non-(meth)acrylic unsaturated alcohols (unsaturated alcohols that do not have a (meth)acryl skeleton), etc. Carboxyl-containing monomers, such as (meth)acrylic acid, crotonic acid and other ethylenically unsaturated monocarboxylic acids (monocarboxylic acids with ethylenically unsaturated bonds); fumaric acid, itaconic acid, maleic acid Ethylenically unsaturated dicarboxylic acids (dicarboxylic acids having ethylenically unsaturated bonds) such as acid and ciconic acid; anhydrides of the above-mentioned ethylenically unsaturated dicarboxylic acids; 2-carboxyethyl methacrylate, etc. Carboxyalkyl (meth)acrylate, etc. Among these, monomers containing hydroxyl groups and monomers containing carboxyl groups are preferred, and monomers containing hydroxyl groups are more preferred.

不具有上述官能基X之丙烯酸系單體,例如,(甲基)丙烯酸甲基、(甲基)丙烯酸乙基、(甲基)丙烯酸n-丙基、(甲基)丙烯酸異丙基、(甲基)丙烯酸n-丁基、(甲基)丙烯酸異丁基、(甲基)丙烯酸sec-丁基、(甲基)丙烯酸tert-丁基、(甲基)丙烯酸戊基、(甲基)丙烯酸己基、(甲基)丙烯酸庚基、(甲基)丙烯酸2-乙基己基、(甲基)丙烯酸異辛基、(甲基)丙烯酸n-辛基、(甲基)丙烯酸n-壬基、(甲基)丙烯酸異壬基、(甲基)丙烯酸癸基、(甲基)丙烯酸十一烷基、(甲基)丙烯酸十二烷基((甲基)丙烯酸月桂基)、(甲基)丙烯酸十三烷基、(甲基)丙烯酸十四烷基((甲基)丙烯酸肉豆蔻基)、(甲基)丙烯酸十五烷基、(甲基)丙烯酸十六烷基((甲基)丙烯酸棕櫚基)、(甲基)丙烯酸十七烷基、(甲基)丙烯酸十八烷基((甲基)丙烯酸硬脂基)等的構成烷酯之烷基為,碳數為1~18的鏈狀構造之(甲基)丙烯酸烷酯等。      又,不具有上述官能基X之丙烯酸系單體,例如,(甲基)丙烯酸甲氧甲基、(甲基)丙烯酸甲氧基乙基、(甲基)丙烯酸乙氧甲基、(甲基)丙烯酸乙氧基乙基等的含有烷氧烷基之(甲基)丙烯酸酯;包含(甲基)丙烯酸苯基等的(甲基)丙烯酸芳酯等的具有芳香族基之(甲基)丙烯酸酯;非交聯性的(甲基)丙烯酸基醯胺及其衍生物;(甲基)丙烯酸N,N-二甲基胺基乙基、(甲基)丙烯酸N,N-二甲基胺基丙基等的非交聯性之具有三級胺基之(甲基)丙烯酸酯等。      上述非丙烯酸系單體,例如,伸乙基、降莰烯等的烯烴;乙酸乙烯;苯乙烯等。Acrylic monomers that do not have the above-mentioned functional group X, for example, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, ( n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, (meth)acrylate Hexyl acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate , isononyl (meth)acrylate, decyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate (lauryl (meth)acrylate), (meth)acrylate ) tridecyl acrylate, tetradecyl (meth)acrylate (myristyl (meth)acrylate), pentadecyl (meth)acrylate, hexadecyl (meth)acrylate ((meth) ) (palmyl acrylate), heptadecyl (meth)acrylate, octadecyl (meth)acrylate (stearyl (meth)acrylate), etc. Alkyl (meth)acrylate with a chain structure of 18, etc. Also, acrylic monomers that do not have the above-mentioned functional group X, for example, methoxymethyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxymethyl (meth)acrylate, (methoxymethyl) (meth)acrylic acid esters containing alkoxyalkyl groups such as ethoxyethyl acrylate; Acrylates; non-crosslinkable (meth)acrylamides and their derivatives; (meth)acrylate N,N-dimethylaminoethyl, (meth)acrylate N,N-dimethyl Non-crosslinked (meth)acrylates with tertiary amino groups such as aminopropyl groups. The above-mentioned non-acrylic monomers, for example, olefins such as ethylidene and norbornene; vinyl acetate; styrene, etc.

丙烯酸系聚合物(a11)中,相對於構成該些的結構單位之全量,由具有上述官能基X之丙烯酸系單體產生的結構單位量之含量,較佳為0.1~50質量%,更佳為1~40質量%,特佳為3~30質量%。上述結構單位的含量於上述範圍時,於所得丙烯酸系樹脂(a1-1)中,能量線硬化性雙鍵的含量可容易地調節至較佳之範圍。In the acrylic polymer (a11), the content of the structural unit amount derived from the acrylic monomer having the above-mentioned functional group X is preferably 0.1 to 50% by mass, more preferably It is 1 to 40% by mass, particularly preferably 3 to 30% by mass. When content of the said structural unit is in the said range, in the obtained acrylic resin (a1-1), content of an energy-beam curable double bond can be easily adjusted to a preferable range.

・能量線硬化性化合物(a12)      能量線硬化性化合物(a12)為,具有可與上述官能基X進行反應之基Y及能量線硬化性雙鍵的化合物。      上述基Y,例如,由異氰酸酯基、環氧基及羧基所成之群所選出之1種以上者等,該些之中,又以異氰酸酯基為佳。能量線硬化性化合物(a12)具有異氰酸酯基時,該異氰酸酯基,容易與作為上述官能基的具有羥基之丙烯酸系聚合物(a11)的羥基進行反應。      能量線硬化性化合物(a12)所具有的能量線硬化性雙鍵之數,於1分子中,較佳為1~5個,更佳為1~3個。      能量線硬化性化合物(a12),可單獨使用亦可、將2種以上合併使用亦可。・Energy ray-curable compound (a12) The energy ray-curable compound (a12) is a compound having a group Y capable of reacting with the above-mentioned functional group X and an energy ray-curable double bond. The above-mentioned group Y is, for example, one or more selected from the group consisting of isocyanate group, epoxy group and carboxyl group, and among them, isocyanate group is preferable. When the energy ray-curable compound (a12) has an isocyanate group, the isocyanate group easily reacts with the hydroxyl group of the acrylic polymer (a11) having a hydroxyl group as the above-mentioned functional group. The number of energy ray-curable double bonds contained in the energy ray-curable compound (a12) is preferably 1 to 5, more preferably 1 to 3 in 1 molecule. The energy ray-curing compound (a12) may be used alone or in combination of two or more.

能量線硬化性化合物(a12),例如,2-甲基丙烯醯氧乙基異氰酸酯、甲基-異丙烯基-α,α-二甲基苄基異氰酸酯、甲基丙烯醯基異氰酸酯、烯丙基異氰酸酯、1,1-(雙丙烯醯氧甲基)乙基異氰酸酯;二異氰酸酯化合物或聚異氰酸酯化合物,與羥基(甲基)丙烯酸乙酯進行反應而得之丙烯醯基單異氰酸酯化合物;二異氰酸酯化合物或聚異氰酸酯化合物,與聚醇化合物,與(甲基)丙烯酸羥乙酯進行反應而得之丙烯醯基單異氰酸酯化合物等。該些之中,又以2-甲基丙烯醯氧乙基異氰酸酯為佳。Energy ray-curing compounds (a12), for example, 2-methacryloxyethyl isocyanate, methyl-isopropenyl-α,α-dimethylbenzyl isocyanate, methacryl isocyanate, allyl Isocyanates, 1,1-(bisacryloxymethyl)ethyl isocyanate; diisocyanate compounds or polyisocyanate compounds, acryl monoisocyanate compounds obtained by reaction with hydroxyethyl (meth)acrylate; diisocyanate compounds Or polyisocyanate compound, polyalcohol compound, and acryl monoisocyanate compound obtained by reacting with hydroxyethyl (meth)acrylate, etc. Among these, 2-methacryloxyethyl isocyanate is preferable.

丙烯酸系樹脂(a1-1)中,相對於由丙烯酸系聚合物(a11)所產生之上述官能基X的含量,由能量線硬化性化合物(a12)所產生之能量線硬化性雙鍵的含量之比例,較佳為20~120莫耳%,更佳為5~100莫耳%,特佳為50~100莫耳%。上述比例於上述範圍時,可更憎大經由硬化而形成的硬化樹脂層(I’)的接著力。又,能量線硬化性化合物(a12)為單官能(1分子中具有1個上述之基)化合物時,上述含量的比例之上限值為100莫耳%,能量線硬化性化合物(a12)為多官能(1分子中具有2個以上的上述之基)化合物時,上述含量的比例之上限值為超過100莫耳%。In the acrylic resin (a1-1), the content of the energy ray-curable double bond generated from the energy ray-curable compound (a12) relative to the content of the above-mentioned functional group X generated from the acrylic polymer (a11) The ratio is preferably 20-120 mol%, more preferably 5-100 mol%, particularly preferably 50-100 mol%. When the above-mentioned ratio is in the above-mentioned range, the adhesive force of the cured resin layer (I') formed through curing can be further increased. In addition, when the energy ray-curable compound (a12) is a monofunctional (having one of the above-mentioned groups in one molecule) compound, the upper limit of the ratio of the above-mentioned content is 100 mol%, and the energy ray-curable compound (a12) is In the case of a polyfunctional (having two or more of the above-mentioned groups in one molecule) compound, the upper limit of the ratio of the above-mentioned content exceeds 100 mol%.

丙烯酸系樹脂(a1-1)之含量,相對於能量線硬化性樹脂組成物有效成份之全量(100質量%)或能量線硬化性樹脂層(I)的全量(100質量%),較佳為1~40質量%,更佳為2~30質量%,特佳為3~20質量%。The content of the acrylic resin (a1-1) is preferably: 1 to 40% by mass, more preferably 2 to 30% by mass, particularly preferably 3 to 20% by mass.

聚合物(a1)之質量平均分子量(Mw),較佳為100000~2000000,更佳為300000~1500000。The mass average molecular weight (Mw) of the polymer (a1) is preferably from 100,000 to 2,000,000, more preferably from 300,000 to 1,500,000.

聚合物(a1)中之至少一部份,可經後述交聯劑(e)進行交聯者亦可、未交聯者亦可。At least a part of the polymer (a1) may be cross-linked by a cross-linking agent (e) described later, or may not be cross-linked.

(化合物(a2))      化合物(a2)為具有能量線硬化性雙鍵,且分子量為100~80000之化合物。      化合物(a2)所具有的能量線硬化性雙鍵,以(甲基)丙烯醯基、乙烯基等為佳。      化合物(a2),例如,具有能量線硬化性雙鍵之低分子量化合物、具有能量線硬化性雙鍵之環氧樹脂、具有能量線硬化性雙鍵之酚樹脂等。      化合物(a2),可單獨使用亦可、將2種以上合併使用亦可。(Compound (a2)) The compound (a2) is a compound having an energy ray hardening double bond and a molecular weight of 100 to 80,000. The energy ray-hardening double bond possessed by the compound (a2) is preferably a (meth)acryl group, a vinyl group, or the like. The compound (a2) includes, for example, a low molecular weight compound having an energy ray-curable double bond, an epoxy resin having an energy ray-curable double bond, a phenol resin having an energy ray-curable double bond, and the like. Compound (a2) may be used alone or in combination of two or more.

上述具有能量線硬化性雙鍵之低分子量化合物,例如,多官能之單體、低聚物等,又以具有(甲基)丙烯醯基之丙烯酸酯系化合物為佳。      丙烯酸酯系化合物,例如,2-羥基-3-(甲基)丙烯醯氧丙基甲基丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、丙氧基化乙氧基化雙酚A二(甲基)丙烯酸酯、2,2-雙[4-((甲基)丙烯醯氧基聚乙氧基)苯基]丙烷、乙氧基化雙酚A二(甲基)丙烯酸酯、2,2-雙[4-((甲基)丙烯醯氧基二乙氧基)苯基]丙烷、9,9-雙[4-(2-(甲基)丙烯醯氧乙氧基)苯基]茀、2,2-雙[4-((甲基)丙烯醯氧基聚丙氧基)苯基]丙烷、三環癸烷二甲醇二(甲基)丙烯酸酯(三環癸烷二羥甲基二(甲基)丙烯酸酯)、1,10-癸烷二醇二(甲基)丙烯酸酯、1,6-己烷二醇二(甲基)丙烯酸酯、1,9-壬烷二醇二(甲基)丙烯酸酯、二丙二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚丁烯二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、2,2-雙[4-((甲基)丙烯醯氧基乙氧基)苯基]丙烷、新戊二醇二(甲基)丙烯酸酯、乙氧基化聚丙二醇二(甲基)丙烯酸酯、2-羥基-1,3-二(甲基)丙烯醯氧基丙烷等的2官能(甲基)丙烯酸酯;叁(2-(甲基)丙烯醯氧基乙基)異三聚氰酸酯、ε-己內酯變性三-(2-(甲基)丙烯醯氧基乙基)異三聚氰酸酯、乙氧基化丙三醇三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、乙氧基化季戊四醇四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇聚(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯等的多官能(甲基)丙烯酸酯;胺基甲酸酯(甲基)丙烯酸酯低聚物等的多官能(甲基)丙烯酸酯低聚物等。The aforementioned low-molecular-weight compounds with energy-ray-curable double bonds, such as polyfunctional monomers and oligomers, are preferably acrylate-based compounds with (meth)acryl groups. Acrylate-based compounds such as 2-hydroxy-3-(meth)acryloxypropyl methacrylate, polyethylene glycol di(meth)acrylate, propoxylated ethoxylated bisphenol A Di(meth)acrylate, 2,2-bis[4-((meth)acryloxypolyethoxy)phenyl]propane, ethoxylated bisphenol A di(meth)acrylate, 2,2-bis[4-((meth)acryloxydiethoxy)phenyl]propane, 9,9-bis[4-(2-(meth)acryloxyethoxy)benzene base] fennel, 2,2-bis[4-((meth)acryloxypolypropoxy)phenyl]propane, tricyclodecane dimethanol di(meth)acrylate (tricyclodecane dihydroxy Methyl di(meth)acrylate), 1,10-decanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate Alcohol di(meth)acrylate, Dipropylene glycol di(meth)acrylate, Tripropylene glycol di(meth)acrylate, Polypropylene glycol di(meth)acrylate, Polybutylene glycol di(meth)acrylate ester, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, 2,2-bis[4-((methyl) Acryloxyethoxy)phenyl]propane, neopentyl glycol di(meth)acrylate, ethoxylated polypropylene glycol di(meth)acrylate, 2-hydroxy-1,3-di(meth)acrylate 2-functional (meth)acrylates such as base) acryloxypropane; tris(2-(meth)acryloxyethyl)isocyanurate, ε-caprolactone denatured tris-(2 -(meth)acryloxyethyl)isocyanurate, ethoxylated glycerol tri(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane tri( Meth)acrylate, Di-Trimethylolpropane Tetra(meth)acrylate, Ethoxylated Pentaerythritol Tetra(meth)acrylate, Pentaerythritol Tetra(meth)acrylate, Dipentaerythritol Poly(meth)acrylate Polyfunctional (meth)acrylates such as acrylates and dipentaerythritol hexa(meth)acrylate; polyfunctional (meth)acrylate oligomers such as urethane (meth)acrylate oligomers wait.

上述具有能量線硬化性雙鍵之環氧樹脂、具有能量線硬化性雙鍵之酚樹脂,例如,可使用「特開2013-194102號公報」之段落0043等所記載之內容。該些樹脂,亦可相當於構成後述熱硬化性成份(f)之樹脂,於本發明中,則將其視為化合物(a2)處理。As the above-mentioned epoxy resin having an energy ray-curable double bond and the phenol resin having an energy ray-curable double bond, for example, those described in paragraph 0043 of "JP-A-2013-194102" and the like can be used. These resins may also correspond to the resins constituting the thermosetting component (f) described later, and are treated as compound (a2) in the present invention.

化合物(a2)之質量平均分子量(Mw),較佳為100~30000,更佳為300~10000。The mass average molecular weight (Mw) of the compound (a2) is preferably from 100 to 30,000, more preferably from 300 to 10,000.

化合物(a2)之含量,相對於能量線硬化性樹脂組成物的有效成份之全量(100質量%)或能量線硬化性樹脂層(I)的全量(100質量%),較佳為1~40質量%,更佳為2~30質量%,特佳為3~20質量%。The content of the compound (a2) is preferably 1 to 40% with respect to the total amount (100% by mass) of the active ingredients of the energy ray-curable resin composition or the total amount (100% by mass) of the energy ray-curable resin layer (I). % by mass, more preferably 2 to 30% by mass, particularly preferably 3 to 20% by mass.

[不具有能量線硬化性雙鍵之聚合物(b)]      能量線硬化性樹脂組成物,於含有化合物(a2)時,以再含有不具有能量線硬化性雙鍵之聚合物(b)(以下,亦簡稱「聚合物(b)」)者為佳。      聚合物(b),可單獨使用亦可、將2種以上合併使用亦可。[Polymer (b) not having an energy ray-curable double bond] When the energy ray-curable resin composition contains the compound (a2), it may further contain a polymer (b) not having an energy ray-curable double bond ( Hereinafter, it is also referred to simply as "polymer (b)"). The polymer (b) may be used alone or in combination of two or more.

聚合物(b),例如,丙烯酸系聚合物、苯氧基樹脂、胺基甲酸酯樹脂、聚酯、橡膠系樹脂、胺基甲酸丙烯酸酯樹脂、聚乙烯醇(PVA)、丁醛樹脂、聚酯胺基甲酸酯樹脂等。該些之中,又以丙烯酸系聚合物(以下,「丙烯酸系聚合物(b-1)」)為佳。Polymer (b), for example, acrylic polymer, phenoxy resin, urethane resin, polyester, rubber-based resin, urethane acrylate resin, polyvinyl alcohol (PVA), butyral resin, Polyester urethane resin, etc. Among these, an acrylic polymer (hereinafter, "acrylic polymer (b-1)") is preferable.

丙烯酸系聚合物(b-1),可為公知之成份,例如,可為1種的丙烯酸系單體之均聚物,或2種以上的丙烯酸系單體的共聚物皆可,亦可為1種或2種以上的丙烯酸系單體,與1種或2種以上的丙烯酸系單體以外的單體(非丙烯酸系單體)所構成的共聚物。The acrylic polymer (b-1) may be a known component. For example, it may be a homopolymer of one type of acrylic monomer, or a copolymer of two or more types of acrylic monomers, or it may be A copolymer composed of one or more acrylic monomers and one or more monomers other than acrylic monomers (non-acrylic monomers).

構成丙烯酸系聚合物(b-1)之丙烯酸系單體,例如,(甲基)丙烯酸烷酯、具有環狀骨架之(甲基)丙烯酸酯、含有環氧基之(甲基)丙烯酸酯、含有羥基之(甲基)丙烯酸酯、含有取代胺基(甲基)丙烯酸酯等。其中,「取代胺基」係如先前所說明之內容。Acrylic monomers constituting the acrylic polymer (b-1), for example, alkyl (meth)acrylates, (meth)acrylates having a ring skeleton, (meth)acrylates containing epoxy groups, Hydroxyl-containing (meth)acrylates, substituted amino-containing (meth)acrylates, etc. Here, the "substituted amino group" is as described above.

(甲基)丙烯酸烷酯,例如,(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸n-丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸n-丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸sec-丁酯、(甲基)丙烯酸tert-丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸n-辛酯、(甲基)丙烯酸n-壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸十一烷酯、(甲基)丙烯酸十二烷基((甲基)丙烯酸月桂基)、(甲基)丙烯酸十三烷酯、(甲基)丙烯酸十四烷基((甲基)丙烯酸肉豆蔻基)、(甲基)丙烯酸十五烷酯、(甲基)丙烯酸十六烷基((甲基)丙烯酸棕櫚基)、(甲基)丙烯酸十七烷酯、(甲基)丙烯酸十八烷基((甲基)丙烯酸硬脂基)等的構成烷酯之烷基為碳數1~18的鏈狀構造之(甲基)丙烯酸烷酯等。Alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, (meth)acrylic acid n-butyl, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, ( Isononyl methacrylate, Decyl (meth)acrylate, Undecyl (meth)acrylate, Lauryl (meth)acrylate (Lauryl (meth)acrylate), (Meth)acrylic acid Tridecyl (meth)acrylate, tetradecyl (meth)acrylate (myristyl (meth)acrylate), pentadecyl (meth)acrylate, hexadecyl (meth)acrylate ((meth)acrylic acid Palmityl), heptadecyl (meth)acrylate, octadecyl (meth)acrylate (stearyl (meth)acrylate), etc. The alkyl group constituting the alkyl ester is a chain with 1 to 18 carbon atoms Structured (meth)acrylic acid alkyl esters, etc.

具有環狀骨架之(甲基)丙烯酸酯,例如,(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊烷基等的(甲基)丙烯酸環烷酯;(甲基)丙烯酸苄酯等的(甲基)丙烯酸芳烷酯;(甲基)丙烯酸二環戊烯酯等的(甲基)丙烯酸環烯酯;(甲基)丙烯酸二環戊烯氧基乙酯等的(甲基)丙烯酸環烯氧烷酯等。(Meth)acrylates having a cyclic skeleton, for example, cycloalkyl (meth)acrylates such as isobornyl (meth)acrylate and dicyclopentyl (meth)acrylate; benzyl (meth)acrylate Aralkyl (meth)acrylates such as esters; cycloenyl (meth)acrylates such as dicyclopentenyl (meth)acrylates; (meth)acrylates such as dicyclopentenyloxyethyl (meth)acrylates base) cycloalkyleneoxyalkyl acrylate, etc.

含有環氧基之(甲基)丙烯酸酯,例如,(甲基)丙烯酸環氧等。      含有羥基之(甲基)丙烯酸酯,例如,(甲基)丙烯酸羥甲酯、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸3-羥丁酯、(甲基)丙烯酸4-羥丁酯等。      含有取代胺基之(甲基)丙烯酸酯,例如,(甲基)丙烯酸N-甲基胺基乙酯等。(Meth)acrylates containing epoxy groups, for example, (meth)acrylic epoxy and the like. Hydroxyl-containing (meth)acrylates, for example, hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxy (meth)acrylate Hydroxypropyl, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, etc.  (meth)acrylates containing substituted amino groups, for example, N-methylaminoethyl (meth)acrylate, etc.

構成丙烯酸系聚合物(b-1)之非丙烯酸系單體,例如,乙烯基、降莰烯等的烯烴;乙酸乙烯;苯乙烯等。Non-acrylic monomers constituting the acrylic polymer (b-1) include, for example, olefins such as vinyl and norbornene; vinyl acetate; styrene and the like.

聚合物(b),可為其至少一部份經交聯劑(e)交聯而得者亦可、未交聯者亦可。      至少一部份經交聯劑(e)交聯而得之聚合物(b),例如,聚合物(b)中的反應性官能基與交聯劑(e)進行反應而得者等。      上述反應性官能基,可配合交聯劑(e)的種類等作適當之選擇即可,並未有特別之限定。例如,交聯劑(e)為聚異氰酸酯化合物時,上述反應性官能基,例如,羥基、羧基、胺基等,該些之中,又以與異氰酸酯基具有高反應性之羥基為佳。又,交聯劑(e)為環氧系化合物時,上述反應性官能基,例如,羧基、胺基、醯胺基等,該些之中,又以與環氧基具有高反應性之羧基為佳。其中,就防止半導體晶圓及半導體晶片線路腐蝕之觀點,上述反應性官能基以羧基以外的基為佳。The polymer (b) may be at least partially crosslinked by the crosslinking agent (e), or may be uncrosslinked. At least a part of the polymer (b) obtained by cross-linking with the cross-linking agent (e), for example, one obtained by reacting the reactive functional groups in the polymer (b) with the cross-linking agent (e). The above-mentioned reactive functional groups can be appropriately selected in accordance with the type of crosslinking agent (e), and are not particularly limited. For example, when the crosslinking agent (e) is a polyisocyanate compound, the reactive functional groups mentioned above are, for example, hydroxyl, carboxyl, amine, etc. Among them, hydroxyl groups with high reactivity with isocyanate groups are preferred. In addition, when the crosslinking agent (e) is an epoxy compound, the above-mentioned reactive functional groups, for example, carboxyl, amine, amido, etc., among them, the carboxyl group having high reactivity with epoxy groups better. Among them, from the viewpoint of preventing corrosion of semiconductor wafers and semiconductor wafer lines, the above-mentioned reactive functional groups are preferably groups other than carboxyl groups.

上述具有反應性官能基之聚合物(b),例如,至少由上述具有反應性官能基之單體經聚合而得者。為丙烯酸系聚合物(b-1)的情形時,可將構成該丙烯酸系聚合物的單體所列舉的上述丙烯酸系單體及非丙烯酸系單體中任一者或二者,作為上述具有反應性官能基使用即可。例如,具有作為反應性官能基之羥基的聚合物(b),例如,含有羥基之(甲基)丙烯酸酯經聚合而得者等,其他例如,由先前所列舉的上述丙烯酸系單體或非丙烯酸系單體中,1個或2個以上的氫原子被上述反應性官能基所取代的單體經聚合而得者等。The above-mentioned polymer (b) having a reactive functional group is, for example, one obtained by polymerizing at least the above-mentioned monomer having a reactive functional group. In the case of an acrylic polymer (b-1), any one or both of the above-mentioned acrylic monomers and non-acrylic monomers listed as monomers constituting the acrylic polymer can be used as the above-mentioned Reactive functional groups can be used. For example, a polymer (b) having a hydroxyl group as a reactive functional group, for example, one obtained by polymerizing a (meth)acrylate containing a hydroxyl group, etc. Among the acrylic monomers, those in which one or more hydrogen atoms are substituted by the above-mentioned reactive functional groups are obtained by polymerization.

聚合物(b)中,相對於構成該聚合物的結構單位之全量,由具有反應性官能基之單體產生的結構單位之含量,較佳為1~25質量%,更佳為2~20質量%。上述結構單位的含量於上述範圍時,於聚合物(b)中,為使交聯程度達較佳之範圍。In the polymer (b), the content of the structural unit derived from the monomer having a reactive functional group is preferably 1 to 25% by mass, more preferably 2 to 20% by mass, relative to the total amount of structural units constituting the polymer. quality%. When the content of the above-mentioned structural unit is in the above-mentioned range, the degree of crosslinking in the polymer (b) is within a preferable range.

聚合物(b)之質量平均分子量(Mw),就使能量線硬化性樹脂組成物的成膜性更良好之觀點,較佳為10000~2000000,更佳為100000~1500000。The mass average molecular weight (Mw) of the polymer (b) is preferably from 10,000 to 2,000,000, more preferably from 100,000 to 1,500,000, from the viewpoint of improving the film-forming properties of the energy ray-curable resin composition.

能量線硬化性樹脂組成物,例如,含有聚合物(a1)及化合物(a2)中任一者或二者之組成物,又,含有化合物(a2)時,以再含有聚合物(b)為佳。The energy ray-curable resin composition is, for example, a composition containing either or both of the polymer (a1) and the compound (a2), and when the compound (a2) is contained, the polymer (b) is further contained. good.

能量線硬化性成份(a)及聚合物(b)的合計含量,相對於能量線硬化性樹脂組成物的有效成份之全量(100質量%)或能量線硬化性樹脂層(I)的全量(100質量%),較佳為5~90質量%,更佳為10~80質量%,特佳為15~70質量%。合計含量於上述範圍時,可使能量線硬化性更為良好。The total content of the energy ray-curable component (a) and the polymer (b) is based on the total amount of active ingredients (100% by mass) of the energy ray-curable resin composition or the total amount of the energy ray-curable resin layer (I) ( 100% by mass), preferably 5 to 90% by mass, more preferably 10 to 80% by mass, particularly preferably 15 to 70% by mass. When the total content is within the above range, the energy ray hardening property can be further improved.

能量線硬化性樹脂組成物或能量線硬化性樹脂層(I)中,含有能量線硬化性成份(a)及聚合物(b)時,聚合物(b)之含量,相對於能量線硬化性成份(a)100質量份,較佳為3~160質量份,更佳為6~130質量份。聚合物(b)的含量於上述範圍時,可使能量線硬化性更為良好。When energy ray curable resin composition or energy ray curable resin layer (I) contains energy ray curable component (a) and polymer (b), the content of polymer (b) is relative to energy ray curable Component (a) is 100 mass parts, Preferably it is 3-160 mass parts, More preferably, it is 6-130 mass parts. When the content of the polymer (b) is in the above range, the energy ray curability can be further improved.

能量線硬化性樹脂組成物中,除能量線硬化性成份(a)及聚合物(b)以外,可配合目的,含有由光聚合起始劑(c)、耦合劑(d)、交聯劑(e)、著色劑(g)、熱硬化性成份(f)、硬化促進劑(g)、填充材(h)及廣用添加劑(z)所成之群所選出之1種以上者。例如,使用含有能量線硬化性成份(a)及熱硬化性成份(f)的能量線硬化性樹脂組成物時,於所形成的能量線硬化性樹脂層(I),可經由加熱而提高對被附著體的接著力,亦可提高由該能量線硬化性樹脂層(I)所形成的硬化樹脂層(I’)的強度。In the energy ray curable resin composition, in addition to the energy ray curable component (a) and the polymer (b), it may contain a photopolymerization initiator (c), a coupling agent (d), and a crosslinking agent according to the purpose. One or more selected from the group consisting of (e), colorant (g), thermosetting component (f), hardening accelerator (g), filler (h) and general-purpose additive (z). For example, when using an energy ray curable resin composition containing an energy ray curable component (a) and a thermosetting component (f), the formed energy ray curable resin layer (I) can be heated to improve The adhesive force of the adherend can also increase the strength of the cured resin layer (I') formed from the energy ray curable resin layer (I).

[光聚合起始劑(c)]      光聚合起始劑(c),例如,可使用苯偶因、苯偶因甲醚、苯偶因乙醚、苯偶因異丙醚、苯偶因異丁醚、苯偶因安息香酸、苯偶因安息香酸甲酯、苯偶因二甲基縮酮等的苯偶因化合物;苯乙酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮等的苯乙酮化合物;氧化雙(2,4,6-三甲基苯甲醯基)苯基次膦(phosphine)、氧化2,4,6-三甲基苯甲醯基二苯基次膦等的氧化醯次膦化合物;苄基苯基硫醚、四甲基秋蘭姆單硫醚等的硫醚化合物;1-羥基環己基苯酮等的α-酮醇化合物;偶氮雙異丁腈等的偶氮化合物;二茂鈦等的二茂鈦化合物;9-氧硫𠮿

Figure 107134885-xxxx-3
等的9-氧硫𠮿
Figure 107134885-xxxx-3
化合物;二苯甲酮、2-(二甲基胺基)-1-(4-嗎啉基苯基)-2-苄基-1-丁酮、乙酮、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-、1-(O-乙醯肟)等的二苯甲酮化合物;過氧化物化合物;二乙醯基等的二酮化合物;苄基;二苄基;2,4-二乙基氧硫𠮿
Figure 107134885-xxxx-3
;1,2-二苯基甲烷;2-羥基-2-甲基-1-[4-(1-甲基乙烯基)苯基]丙酮;2-氯蒽醌等。又,1-氯蒽醌等的醌化合物;胺等的光増感劑等。      光聚合起始劑(c),可單獨使用亦可、將2種以上合併使用亦可。      能量線硬化性樹脂組成物或能量線硬化性樹脂層(I)中,光聚合起始劑(c)之含量,相對於能量線硬化性化合物(a)100質量份,較佳為0.01~20質量份,更佳為0.03~10質量份,特佳為0.05~5質量份。[Photopolymerization initiator (c)] As the photopolymerization initiator (c), for example, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl Benzoine compounds such as ether, benzoine benzoic acid, methyl benzoine benzoate, benzoine dimethyl ketal, etc.; acetophenone, 2-hydroxy-2-methyl-1-phenyl-propane Acetophenone compounds such as -1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, etc.; oxidized bis(2,4,6-trimethylbenzoyl ) phenylphosphine (phosphine), 2,4,6-trimethylbenzoyldiphenylphosphine oxide and other phosphine oxide compounds; benzyl phenyl sulfide, tetramethylthiuram mono Thioether compounds such as sulfide; α-ketol compounds such as 1-hydroxycyclohexyl benzophenone; azo compounds such as azobisisobutyronitrile; titanocene compounds such as titanocene;
Figure 107134885-xxxx-3
9-oxosulfur
Figure 107134885-xxxx-3
Compounds; benzophenone, 2-(dimethylamino)-1-(4-morpholinylphenyl)-2-benzyl-1-butanone, ethyl ketone, 1-[9-ethyl- Benzophenone compounds such as 6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetyloxime); peroxide compounds; diacetyl Diketone compounds such as; benzyl; dibenzyl; 2,4-diethylsulfuryl 𠮿
Figure 107134885-xxxx-3
; 1,2-diphenylmethane; 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl] acetone; 2-chloroanthraquinone, etc. Also, quinone compounds such as 1-chloroanthraquinone; photosensitizers such as amines; and the like. The photopolymerization initiator (c) may be used alone or in combination of two or more. In the energy ray curable resin composition or the energy ray curable resin layer (I), the content of the photopolymerization initiator (c) is preferably 0.01 to 20 parts by mass relative to 100 parts by mass of the energy ray curable compound (a). Parts by mass are more preferably 0.03 to 10 parts by mass, particularly preferably 0.05 to 5 parts by mass.

[耦合劑(d)]      耦合劑(d),於使用具有可與無機化合物或有機化合物反應之官能基者時,可提高能量線硬化性樹脂層(I)的密著性,又,可使由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’),無損其耐熱性、提高耐水性。      耦合劑(d),可單獨使用亦可、將2種以上合併使用亦可。[Coupling agent (d)] When using a coupling agent (d) that has a functional group that can react with an inorganic compound or an organic compound, it can improve the adhesion of the energy ray-curable resin layer (I), and can also make the The cured resin layer (I') formed by curing the energy ray curable resin layer (I) improves water resistance without impairing its heat resistance. The coupling agent (d) may be used alone or in combination of two or more.

耦合劑(d),以具有可與能量線硬化性成份(a)、聚合物(b)等所具有的官能基進行反應之官能基的化合物為佳,又以矽烷耦合劑為較佳。      矽烷耦合劑,例如,3-縮水甘油氧丙基三甲氧基矽烷、3-縮水甘油氧丙甲基二乙氧基矽烷、3-縮水甘油氧丙基三乙氧基矽烷、3-縮水甘油氧甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-(2-胺基乙基胺基)丙基三甲氧基矽烷、3-(2-胺基乙基胺基)丙甲基二乙氧基矽烷、3-(苯基胺基)丙基三甲氧基矽烷、3-苯胺基丙基三甲氧基矽烷、3-醯脲基丙基三乙氧基矽烷、3-氫硫基丙基三甲氧基矽烷、3-氫硫基丙甲基二甲氧基矽烷、雙(3-三乙氧基矽烷基丙基)四硫化物、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、咪唑矽烷等。The coupling agent (d) is preferably a compound having a functional group capable of reacting with a functional group of the energy ray curable component (a), polymer (b), etc., and a silane coupling agent is more preferred. Silane coupling agents, for example, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropylmethyldiethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxy Methyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane 3-(2-aminoethylamino)propyltrimethoxysilane, 3-(2-aminoethylamino)propylmethyldiethoxysilane, 3-(phenylamino ) Propyltrimethoxysilane, 3-anilinopropyltrimethoxysilane, 3-acylureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyl Methyldimethoxysilane, bis(3-triethoxysilylpropyl)tetrasulfide, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyl trimethoxysilane Acetyloxysilane, imidazole silane, etc.

能量線硬化性樹脂組成物或能量線硬化性樹脂層(I)中,耦合劑(d)之含量,相對於能量線硬化性成份(a)及聚合物(b)的合計100質量份,較佳為0.03~20質量份,更佳為0.05~10質量份,特佳為0.1~5質量份。耦合劑(d)的含量為上述下限值以上時,可使提高對填充材之樹脂的分散性,提高能量線硬化性樹脂層(I)的接著性等的效果更為顯著,於上述上限值以下時,可抑制逸出氣體的發生。In the energy ray curable resin composition or the energy ray curable resin layer (I), the content of the coupling agent (d) is less than 100 parts by mass of the total of the energy ray curable component (a) and the polymer (b). Preferably, it is 0.03-20 mass parts, More preferably, it is 0.05-10 mass parts, Most preferably, it is 0.1-5 mass parts. When the content of the coupling agent (d) is more than the above-mentioned lower limit, the effects of improving the dispersibility of the resin in the filler and improving the adhesiveness of the energy ray-curable resin layer (I) are more remarkable. When it is below the limit value, the generation of outgassing can be suppressed.

[交聯劑(e)]      使用交聯劑(e),使能量線硬化性成份(a)、聚合物(b)等進行交聯時,可調節能量線硬化性樹脂層(I)的初期接著力及凝集力。      交聯劑(e),可單獨使用亦可、將2種以上合併使用亦可。[Crosslinking agent (e)] When the energy ray curable component (a), polymer (b), etc. are crosslinked using the crosslinking agent (e), the initial stage of the energy ray curable resin layer (I) can be adjusted. Adherence and cohesion. The crosslinking agent (e) may be used alone or in combination of two or more.

交聯劑(e),例如,有機多價異氰酸酯化合物、有機多價亞胺化合物、金屬螯合物系交聯劑(具有金屬螯合物構造之交聯劑)、吖環丙烷(aziridine)系交聯劑(具有吖環丙烷基之交聯劑)等。Crosslinking agent (e), for example, organic polyvalent isocyanate compound, organic polyvalent imine compound, metal chelate crosslinking agent (crosslinking agent with metal chelate structure), aziridine (aziridine) Cross-linking agent (cross-linking agent having an aziridine group), etc.

有機多價異氰酸酯化合物,例如,芳香族多價異氰酸酯化合物、脂肪族多價異氰酸酯化合物及脂環族多價異氰酸酯化合物(以下,該些化合物亦統稱為「芳香族多價異氰酸酯化合物等」);上述芳香族多價異氰酸酯化合物等的三聚物、異三聚氰酸酯體及加成物;上述芳香族多價異氰酸酯化合物等與聚醇化合物反應而得的末端異氰酸酯胺基甲酸酯預聚物等。      上述「加成物」係指,上述芳香族多價異氰酸酯化合物、脂肪族多價異氰酸酯化合物或脂環族多價異氰酸酯化合物,與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷或蓖麻油等的低分子之含活性氫化合物之反應物之意,其例如,後述三羥甲基丙烷的二甲苯二異氰酸酯加成物等。又,「末端異氰酸酯胺基甲酸酯預聚物」係指,具有胺基甲酸酯鍵結同時,於分子末端部具有異氰酸酯基之預聚物之意。Organic polyvalent isocyanate compounds, such as aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, and alicyclic polyvalent isocyanate compounds (hereinafter, these compounds are also collectively referred to as "aromatic polyvalent isocyanate compounds, etc."); Trimers, isocyanurate bodies, and adducts of aromatic polyvalent isocyanate compounds, etc.; terminal isocyanate urethane prepolymers obtained by reacting the above aromatic polyvalent isocyanate compounds, etc., with polyol compounds wait. The above-mentioned "adduct" refers to the above-mentioned aromatic polyvalent isocyanate compound, aliphatic polyvalent isocyanate compound or alicyclic polyvalent isocyanate compound, and ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane or Reactants of low-molecular-weight active hydrogen-containing compounds such as castor oil, for example, xylene diisocyanate adducts of trimethylolpropane described later. Also, the term "isocyanate-terminated urethane prepolymer" means a prepolymer having a urethane bond and having an isocyanate group at a molecular terminal.

有機多價異氰酸酯化合物,更具體而言,例如,於2,4-伸甲苯基二異氰酸酯;2,6-伸甲苯基二異氰酸酯;1,3-二甲苯二異氰酸酯;1,4-二甲苯二異氰酸酯;二苯基甲烷-4,4’-二異氰酸酯;二苯基甲烷-2,4’-二異氰酸酯;3-甲基二苯基甲烷二異氰酸酯;伸六甲基二異氰酸酯;異佛爾酮二異氰酸酯;二環己基甲烷-4,4’-二異氰酸酯;二環己基甲烷-2,4’-二異氰酸酯;三羥甲基丙烷等的聚醇中之全部或一部份的羥基上,附加伸甲苯基二異氰酸酯、伸六甲基二異氰酸酯及二甲苯二異氰酸酯中之任1種或2種以上而得之化合物;離胺酸二異氰酸酯等。Organic polyvalent isocyanate compounds, more specifically, for example, in 2,4-cresyl diisocyanate; 2,6-cresyl diisocyanate; 1,3-xylene diisocyanate; 1,4-xylene diisocyanate Isocyanate; Diphenylmethane-4,4'-diisocyanate; Diphenylmethane-2,4'-diisocyanate; 3-Methyldiphenylmethane diisocyanate; Hexamethylene diisocyanate; Isophorone Diisocyanate; Dicyclohexylmethane-4,4'-diisocyanate; Dicyclohexylmethane-2,4'-diisocyanate; Trimethylolpropane and other polyalcohols in all or part of the hydroxyl groups, additional Compounds obtained from any one or two or more of cresyl diisocyanate, hexylene diisocyanate and xylene diisocyanate; lysine diisocyanate, etc.

有機多價亞胺化合物,例如,N,N’-二苯基甲烷-4,4’-雙(1-吖環丙烷(aziridine)羧基醯胺)、三羥甲基丙烷-三-β-吖環丙烷基丙酸酯、四羥甲基甲烷-三-β-吖環丙烷基丙酸酯、N,N’-甲苯-2,4-雙(1-吖環丙烷羧基醯胺)三乙烯三聚氰胺等。Organic polyvalent imine compounds such as N,N'-diphenylmethane-4,4'-bis(1-aziridine carboxamide), trimethylolpropane-tri-β-aziridine Cyclopropanyl propionate, Tetramethylolmethane-tris-β-Aziridine propionate, N,N'-Toluene-2,4-Bis(1-Aziridinecarboxyamide)triethylenemelamine wait.

交聯劑(e)使用有機多價異氰酸酯化合物時,能量線硬化性成份(a)及/或聚合物(b),以使用含有羥基之聚合物為佳。交聯劑(e)具有異氰酸酯基,且能量線硬化性成份(a)及/或聚合物(b)具有羥基時,經交聯劑(e)與能量線硬化性成份(a)及/或聚合物(b)的反應,即可於能量線硬化性樹脂層(I)中,簡便地導入交聯構造。When an organic polyvalent isocyanate compound is used as the crosslinking agent (e), it is preferable to use a hydroxyl group-containing polymer for the energy ray curable component (a) and/or the polymer (b). When the crosslinking agent (e) has an isocyanate group and the energy ray-curable component (a) and/or the polymer (b) has a hydroxyl group, the crosslinker (e) and the energy ray-curable component (a) and/or The reaction of the polymer (b) can easily introduce a crosslinked structure into the energy ray curable resin layer (I).

能量線硬化性樹脂組成物或能量線硬化性樹脂層(I)中,交聯劑(e)之含量,相對於能量線硬化性成份(a)及聚合物(b)的合計100質量份,較佳為0.01~20質量份,更佳為0.1~10質量份,特佳為0.5~5質量份。In the energy ray curable resin composition or the energy ray curable resin layer (I), the content of the crosslinking agent (e) is 100 parts by mass of the total of the energy ray curable component (a) and the polymer (b), Preferably it is 0.01-20 mass parts, More preferably, it is 0.1-10 mass parts, Most preferably, it is 0.5-5 mass parts.

[熱硬化性成份(f)]      熱硬化性成份(f),例如,環氧系熱硬化性樹脂、熱硬化性聚醯亞胺、聚胺基甲酸酯、不飽合聚酯、聚矽氧樹脂等,該些之中,又以環氧系熱硬化性樹脂為佳。      熱硬化性成份(f),可單獨使用亦可、將2種以上合併使用亦可。[Thermosetting component (f)] Thermosetting component (f), for example, epoxy-based thermosetting resin, thermosetting polyimide, polyurethane, unsaturated polyester, polysilicon epoxy resin, etc., and among them, epoxy-based thermosetting resin is preferable. The thermosetting component (f) may be used alone or in combination of two or more.

(環氧系熱硬化性樹脂)      環氧系熱硬化性樹脂,為含有環氧樹脂(f1)者,其可再含有熱硬化劑(f2)。(Epoxy-based thermosetting resin) The epoxy-based thermosetting resin contains epoxy resin (f1), which may further contain a thermosetting agent (f2).

環氧樹脂(f1),例如公知之樹脂,例如,多官能系環氧樹脂、雙酚A二環氧醚及其氫化物、鄰甲酚-酚醛清漆環氧樹脂、二環戊二烯型環氧樹脂、聯苯型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、伸苯基骨架型環氧樹脂等的2官能以上之環氧化合物等。      環氧樹脂(f1),可單獨使用亦可、將2種以上合併使用亦可。Epoxy resins (f1), such as known resins, for example, polyfunctional epoxy resins, bisphenol A diepoxy ethers and their hydrides, o-cresol-novolac epoxy resins, dicyclopentadiene-type epoxy resins, Bifunctional epoxy compounds such as epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenylene skeleton type epoxy resin, etc. Epoxy resins (f1) may be used alone or in combination of two or more.

環氧樹脂(f1),可使用乙烯基(ethenyl)(乙烯基)、2-丙烯基(烯丙基)、(甲基)丙烯醯基、(甲基)丙烯酸基醯胺基等的具有不飽合烴基之環氧樹脂。具有不飽合烴基之環氧樹脂,相較於不具有不飽合烴基的環氧樹脂,其與丙烯酸系樹脂具有更高的相溶性。因此,使用具有不飽合烴基之環氧樹脂時,可提高所得封裝之信賴性。Epoxy resin (f1), can use vinyl (ethenyl) (vinyl), 2-propenyl (allyl), (meth)acryl, (meth)acrylamide etc. Saturated hydrocarbon-based epoxy resin. Epoxy resins with unsaturated hydrocarbon groups have higher compatibility with acrylic resins than epoxy resins without unsaturated hydrocarbon groups. Therefore, when an epoxy resin having an unsaturated hydrocarbon group is used, the reliability of the resulting package can be improved.

環氧樹脂(f1)的數平均分子量,就能量線硬化性樹脂層(I)的硬化性,及硬化樹脂層(I’)的強度及耐熱性之觀點,較佳為300~30000,更佳為400~10000,特佳為500~3000。      環氧樹脂(f1)的環氧當量,較佳為100~1000g/eq,更佳為150~800g/eq。The number average molecular weight of the epoxy resin (f1) is preferably from 300 to 30000, more preferably from the viewpoint of the curability of the energy ray curable resin layer (I), and the strength and heat resistance of the cured resin layer (I'). 400-10000, especially 500-3000. The epoxy equivalent of the epoxy resin (f1) is preferably 100-1000 g/eq, more preferably 150-800 g/eq.

熱硬化劑(f2),對環氧樹脂(f1)為具有作為硬化劑之機能。      熱硬化劑(f2),例如,1分子中具有2個以上可與環氧基進行反應之官能基的化合物等。上述官能基,例如,酚性羥基、醇性羥基、胺基、羧基、酸基經酐化之基等,又以酚性羥基、胺基、或酸基經酐化而得之基為佳,以酚性羥基或胺基為較佳。      熱硬化劑(f2),可單獨使用亦可、將2種以上合併使用亦可。The thermosetting agent (f2) functions as a curing agent for the epoxy resin (f1). A thermosetting agent (f2), for example, a compound having two or more functional groups capable of reacting with an epoxy group in one molecule, etc. The above-mentioned functional groups, for example, phenolic hydroxyl group, alcoholic hydroxyl group, amino group, carboxyl group, acid group are anhydrided groups, etc., and phenolic hydroxyl groups, amino groups, or acid groups are preferably anhydrided groups. A phenolic hydroxyl group or an amino group is preferred. The thermosetting agent (f2) can be used alone or in combination of two or more.

熱硬化劑(f2)中,具有酚性羥基之酚系硬化劑,例如,多官能酚樹脂、雙酚、酚醛清漆型酚樹脂、二環戊二烯系酚樹脂、芳烷基酚樹脂等。      熱硬化劑(f2)中,具有胺基之胺系硬化劑,例如,二氰二醯胺等。      熱硬化劑(f2)之含量,相對於環氧樹脂(f1)100質量份,較佳為0.01~20質量份。Among the thermosetting agents (f2), phenolic curing agents having phenolic hydroxyl groups include, for example, polyfunctional phenolic resins, bisphenols, novolak-type phenolic resins, dicyclopentadiene-based phenolic resins, and aralkylphenolic resins. Among the thermal hardeners (f2), amine-based hardeners with amine groups, such as dicyandiamide, etc. The content of the thermosetting agent (f2) is preferably 0.01 to 20 parts by mass relative to 100 parts by mass of the epoxy resin (f1).

熱硬化性成份(f)的含量(例如,環氧樹脂(f1)及熱硬化劑(f2)的總含量),相對於聚合物(b)100質量份,較佳為1~500質量份。The content of the thermosetting component (f) (for example, the total content of the epoxy resin (f1) and the thermosetting agent (f2)) is preferably 1 to 500 parts by mass based on 100 parts by mass of the polymer (b).

[硬化促進劑(g)]      硬化促進劑(g),為可調整能量線硬化性樹脂層(I)的硬化速度之成份。      較佳的硬化促進劑(g),例如,三乙烯二胺、苄基二甲基胺、三乙醇胺、二甲基胺基乙醇、叁(二甲基胺甲基)酚等的三級胺類;2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、2-苯基-4,5-二羥甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑等的咪唑類;三丁基次膦、二苯基次膦、三苯基次膦等的有機次膦類;四苯基鏻四苯基硼酸鹽、三苯基次膦四苯基硼酸鹽等的四苯基硼鹽等。      使用硬化促進劑(g)時,硬化促進劑(g)之含量,相對於熱硬化性成份(f)100質量份,較佳為0.01~10質量份。[Hardening accelerator (g)] The hardening accelerator (g) is a component that can adjust the hardening speed of the energy ray-curable resin layer (I). Preferred hardening accelerators (g), for example, tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris(dimethylaminomethyl)phenol, etc. ; 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dimethylolimidazole, 2-phenyl-4-methyl-5 -Imidazoles such as hydroxymethylimidazole; organic phosphines such as tributylphosphine, diphenylphosphinate, triphenylphosphinate; tetraphenylphosphonium tetraphenyl borate, triphenylphosphine tetraphenyl Tetraphenylboron salts such as phenyl borate and the like. When using a hardening accelerator (g), the content of the hardening accelerator (g) is preferably 0.01 to 10 parts by mass relative to 100 parts by mass of the thermosetting component (f).

[廣用添加劑(z)]      廣用添加劑(z),可使用公知之添加劑,其可配合目的作任意之選擇,而未有特別之限定,如,填充材、著色劑、可塑劑、抗靜電劑、抗氧化劑、吸除劑等。      廣用添加劑(z)中,其各別可單獨使用亦可、將2種以上合併使用亦可。[Wide-use additive (z)] Wide-use additive (z) can use well-known additives, which can be selected arbitrarily according to the purpose, without special limitations, such as fillers, colorants, plasticizers, antistatic Agents, antioxidants, absorbents, etc. Among the widely used additives (z), each of them may be used alone or in combination of two or more.

填充材,可列舉如,無機填充材、有機填充材等,使用該些成份時,可調整硬化樹脂層(I’)的熱膨脹係數。      能量線硬化性樹脂層(I),可含有填充材亦可、不含有填充材亦可,含有填充材時,其含量就更能有效抑制變形發生之觀點,相對於能量線硬化性樹脂組成物的有效成份之全量(100質量%)或能量線硬化性樹脂層(I)的全量(100質量%),較佳為5~87質量%,更佳為7~78質量%。      填充材,例如,由熱傳導性材料所形成者。      無機填充材,例如,二氧化矽、氧化鋁、滑石、碳酸鈣、鈦白、氧化鐵紅、碳化矽、氮化硼等的粉末;該些無機填充材經球形化而得之顆粒;該些無機填充材的表面改質品;該些無機填充材的單結晶纖維;玻璃纖維等。      填充材之平均粒徑,較佳為0.01~20μm,更佳為0.1~15μm,特佳為0.3~10μm。填充材的平均粒徑於上述範圍時,可維持硬化樹脂層(I’)的接著性,且可抑制能量線硬化性樹脂層(I)穿透率之下降。The fillers include, for example, inorganic fillers and organic fillers, and when these components are used, the thermal expansion coefficient of the cured resin layer (I') can be adjusted. The energy ray-curable resin layer (I) may or may not contain a filler. When a filler is included, the content will be more effective in suppressing deformation. Compared with the energy ray-curable resin composition The total amount (100% by mass) of active ingredients or the total amount (100% by mass) of the energy ray-curable resin layer (I) is preferably 5 to 87% by mass, more preferably 7 to 78% by mass. Filling materials, for example, those formed from thermally conductive materials. Inorganic fillers, such as powders of silicon dioxide, alumina, talc, calcium carbonate, titanium dioxide, red iron oxide, silicon carbide, boron nitride, etc.; spheroidized particles of these inorganic fillers; Surface modified products of inorganic fillers; single crystal fibers of these inorganic fillers; glass fibers, etc. The average particle size of the filler is preferably 0.01-20 μm, more preferably 0.1-15 μm, and most preferably 0.3-10 μm. When the average particle size of the filler is within the above range, the adhesiveness of the cured resin layer (I') can be maintained, and the decrease in the transmittance of the energy ray-curable resin layer (I) can be suppressed.

能量線硬化性樹脂組成物,可含有著色劑亦可、不含有著色計亦可,含有著色劑時,其含量以越少越好,具體而言,相對於能量線硬化性樹脂組成物的有效成份之全量(100質量%)或能量線硬化性樹脂層(I)的全量(100質量%),較佳為未達5質量%,更佳為未達0.1質量%,特佳為未達0.01質量%,最佳為未達0.001質量%。The energy ray-curable resin composition may or may not contain a colorant, and when a colorant is contained, the less the content, the better. Specifically, the energy ray-curable resin composition is effective The total amount (100% by mass) of the components or the total amount (100% by mass) of the energy ray-curable resin layer (I) is preferably less than 5% by mass, more preferably less than 0.1% by mass, most preferably less than 0.01% by mass % by mass, preferably less than 0.001% by mass.

<<能量線硬化性樹脂組成物之製造方法>>      能量線硬化性樹脂組成物,可經由摻合構成該組成物的各成份之方式製得。      摻合各成份時的添加順序並未有特別之限定,其可將2種以上的成份同時添加。      使用溶劑時,可先使溶劑與溶劑以外的任一添加成份混合,該添加成份可預先予以稀釋後存放使用,或先將溶劑以外的任一添加成份預先稀釋存放,使用時再將溶劑與該些添加成份混合使用亦可。      摻合時,各成份之混合方法並未有特別之限定,例如,可由使攪拌子或攪拌翼等迴轉混合之方法;使用混練機進行混合之方法;施加超音波使其混合之方法等公知方法中適當地選擇使用即可。      各成份之添加及混合時之溫度及時間,只要不會造成各添加成份之劣化時,並未有特別之限定,只要進行適當調整即可,又,溫度以15~30℃為佳。<<Manufacturing method of energy ray curable resin composition>> The energy ray curable resin composition can be prepared by blending the various components constituting the composition. There is no particular limitation on the order of addition when blending the ingredients, and two or more ingredients can be added at the same time. When using a solvent, the solvent can be mixed with any additional ingredients other than the solvent, and the added ingredients can be diluted in advance and stored for use, or any additional ingredients other than the solvent can be diluted and stored in advance, and then the solvent can be mixed with the solvent when used. Some additional ingredients can also be used in combination. When blending, the mixing method of each component is not particularly limited, for example, the method of mixing by rotating a stirring bar or stirring blade; You can choose to use it appropriately. There are no special restrictions on the temperature and time of adding and mixing each component, as long as it does not cause deterioration of each added component, as long as it is properly adjusted, and the temperature is preferably 15-30°C.

上述溶劑,例如,甲苯、二甲苯等的烴;甲醇、乙醇、2-丙醇、異丁基醇(2-甲基丙烷-1-醇)、1-丁醇等的醇;乙酸乙酯等的酯;丙酮、甲基乙酮等的酮;四氫呋喃等的醚;二甲基甲醯胺、N-甲基吡咯啶酮等的醯胺(具有醯胺鍵結之化合物)等。該些之中,就可使能量線硬化性樹脂組成物中所含的成份得以更均勻地混合之觀點,以使用甲基乙酮、甲苯、乙酸乙酯為佳。溶劑,可單獨使用亦可、將2種以上合併使用亦可。The above-mentioned solvents, for example, hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, 2-propanol, isobutyl alcohol (2-methylpropan-1-ol), 1-butanol; ethyl acetate and the like ketones such as acetone and methyl ethyl ketone; ethers such as tetrahydrofuran; amides (compounds having an amide bond) such as dimethylformamide and N-methylpyrrolidone, etc. Among them, it is preferable to use methyl ethyl ketone, toluene, and ethyl acetate from the viewpoint of mixing the components contained in the energy ray-curable resin composition more uniformly. The solvent may be used alone or in combination of two or more.

能量線硬化性樹脂層(I),可為單層構成亦可、由2層以上的複數層所構成者亦可。      由2層以上所構成的能量線硬化性樹脂層(I),例如具有:可賦予具有高儲存彈性率E’的硬化樹脂層(I’)的能量線硬化性樹脂層(I-i),與具有高黏著力的能量線硬化性樹脂層(I-ii)之樹脂層等。具有該些構成時,將能量線硬化性樹脂層(I-ii)配置於載置密封對象物之側之面上時,除可強固地固定密封對象物的同時,於硬化後,由能量線硬化性樹脂層(I-i)硬化而得的硬化樹脂層(I’),因具有可有效地抑制變形之機能,故得以更為提高兼具暫時固定層之性能,與抗變形層之性能。能量線硬化性樹脂層(I-i)及(I-ii)的較佳組成及物性,可於上述能量線硬化性樹脂層(I)的較佳組成內容及物性中,配合所期待之機能,作適當之選擇使用即可。The energy ray-curable resin layer (I) may be composed of a single layer, or may be composed of a plurality of two or more layers. The energy ray-curable resin layer (I) composed of two or more layers, for example, has an energy ray-curable resin layer (I-i) capable of imparting a cured resin layer (I') having a high storage modulus E', and has Resin layer, etc. of energy ray curable resin layer (I-ii) with high adhesive force. With these configurations, when the energy ray-curable resin layer (I-ii) is placed on the surface on which the object to be sealed is placed, the object to be sealed can be firmly fixed, and after hardening, the energy ray The hardened resin layer (I') obtained by hardening the hardened resin layer (I-i) has the function of effectively suppressing deformation, so it can further improve the performance of the temporary fixing layer and the performance of the deformation-resistant layer. The preferred composition and physical properties of the energy ray-curable resin layers (I-i) and (I-ii) can be made in accordance with the desired functions in the preferred composition and physical properties of the energy ray-curable resin layer (I). Appropriate selection can be used.

能量線硬化性樹脂層(I)的厚度,較佳為1~500μm,更佳為5~300μm,特佳為10~200μm,最佳為15~100μm,最佳為20~50μm。能量線硬化性樹脂層(I)的厚度為上述下限值以上時,可製得更能有效抑制變形之硬化密封體,於上述上限值以下時,除可抑制費用的増加同時,亦可得到優良的硬化性。      其中,「能量線硬化性樹脂層(I)的厚度」係指,能量線硬化性樹脂層(I)全體之厚度之意,例如,由2層以上所構成的能量線硬化性樹脂層(I)的厚度,係指構成能量線硬化性樹脂層(I)的全部層的合計厚度之意。The thickness of the energy ray curable resin layer (I) is preferably 1-500 μm, more preferably 5-300 μm, particularly preferably 10-200 μm, most preferably 15-100 μm, most preferably 20-50 μm. When the thickness of the energy ray-curable resin layer (I) is more than the above-mentioned lower limit, a cured sealing body that can more effectively suppress deformation can be obtained. Excellent hardenability is obtained. Here, the "thickness of the energy ray curable resin layer (I)" means the thickness of the entire energy ray curable resin layer (I), for example, the energy ray curable resin layer (I) composed of two or more layers ) means the total thickness of all the layers constituting the energy ray curable resin layer (I).

23℃中,由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)的儲存彈性率E’,就作為製得具有可抑制變形且具有平坦表面的附有硬化樹脂層的硬化密封體之層合體之觀點,較佳為1.0×107 Pa以上,更佳為1.0×108 Pa以上,特佳為5.0×108 Pa以上,最佳為1.0×109 以上,又,較佳為1.0×1013 Pa以下,更佳為1.0×1012 Pa以下,特佳為5.0×1011 Pa以下,最佳為1.0×1011 Pa以下。The storage elastic modulus E' of the hardened resin layer (I') formed by hardening the energy ray-curable resin layer (I) at 23°C is used as an index to obtain a hardened resin layer with a flat surface that can suppress deformation. From the viewpoint of the laminated body of the hardened sealing body, it is preferably at least 1.0×10 7 Pa, more preferably at least 1.0×10 8 Pa, particularly preferably at least 5.0×10 8 Pa, and most preferably at least 1.0×10 9 . Preferably it is 1.0×10 13 Pa or less, more preferably 1.0×10 12 Pa or less, particularly preferably 5.0×10 11 Pa or less, most preferably 1.0×10 11 Pa or less.

能量線硬化性樹脂層(I)的可見光(波長:380nm~750nm)穿透率,較佳為5%以上,更佳為10%以上,特佳為30%以上,最佳為50%以上。可見光穿透率於上述範圍時,可製得充份的能量線硬化性。可見光穿透率的上限值並未有限制,例如,可為95%以下。上述穿透率,為使用分光光度計依公知方法而可測定。The visible light (wavelength: 380nm-750nm) transmittance of the energy ray curable resin layer (I) is preferably at least 5%, more preferably at least 10%, particularly preferably at least 30%, most preferably at least 50%. When the visible light transmittance is within the above range, sufficient energy ray curability can be obtained. The upper limit of the visible light transmittance is not limited, for example, it may be 95% or less. The above-mentioned transmittance can be measured by a known method using a spectrophotometer.

<層合體之製造方法>      本發明之一態樣之層合體,例如,可將可各別形成黏著劑層(X)、基材(Y)及能量線硬化性樹脂層(I)的各種期待之構成內容以貼合方式製得。各層之形成,例如,可於剝離材上,塗佈可形成各層所使用的樹脂組成物,並經乾燥處理而形成。      但,本發明之一態樣的層合體之製造方法,並不僅限定於上述之方法,例如,可於剝離材上所形成的黏著劑層(X)上,塗佈可形成基材(Y)的樹脂組成物(y),再於其上,再塗佈能量線硬化性樹脂組成物之方法所示般,於特定之層上,依序塗佈樹脂組成物進行層形成,而形成多層化之方法。該情形中,複數之層,例如可使用多層塗佈機(Coater)等同時進行塗佈。<Manufacturing method of laminated body> The laminated body of one aspect of the present invention, for example, can separately form various expectations of the adhesive layer (X), base material (Y) and energy ray curable resin layer (I) The composition content is made by laminating. The formation of each layer can be formed by, for example, coating a resin composition used for forming each layer on a release material, and drying it. However, the method for producing a laminate according to an aspect of the present invention is not limited to the method described above. For example, the formable substrate (Y) can be coated on the adhesive layer (X) formed on the release material. As shown in the method of coating the resin composition (y) of energy ray curable resin composition on it, the resin composition is sequentially coated on a specific layer to form a layer to form a multilayer method. In this case, a plurality of layers can be coated simultaneously using, for example, a multilayer coater (coater).

[硬化密封體之製造方法]      本發明之一態樣的硬化密封體之製造方法,為使用本發明之一態樣的層合體製造硬化密封體之方法,其為具有下述步驟(i)~(iv)。      步驟(i):於前述層合體所具有的能量線硬化性樹脂層(I)的表面之一部份,載置密封對象物之步驟      步驟(ii):以能量線照射能量線硬化性樹脂層(I),形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)之步驟      步驟(iii):於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆,使該密封材熱硬化,而形成包含前述密封對象物的硬化密封體之步驟      步驟(iv):經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II),於該界面形成分離,而製得附有硬化樹脂層的硬化密封體之步驟      又,本發明之一態樣中之硬化密封體,係指以密封材被覆密封對象物後,使該密封材硬化而得之物,其係由密封對象物與密封材之硬化物所構成。[Manufacturing method of hardened sealing body] The manufacturing method of the hardened sealing body of one aspect of the present invention is a method of manufacturing a hardened sealing body using the laminated body of one aspect of the present invention, which has the following steps (i) to (iv). Step (i): A step of placing an object to be sealed on a part of the surface of the energy ray-curable resin layer (I) of the laminate. Step (ii): Irradiating the energy ray-curable resin layer with energy rays (I), the step of forming the cured resin layer (I') formed by hardening the energy ray curable resin layer (I) Step (iii): Hardening the aforementioned sealed object and at least the peripheral portion of the sealed object The surface of the resin layer (I') is covered with a thermosetting sealing material, and the sealing material is thermally cured to form a hardened sealing body containing the aforementioned object to be sealed. Step (iv): After expanding the aforementioned heat-expandable particles The process of separating the hardened resin layer (I') and the support layer (II) at the interface to obtain a hardened sealing body with a hardened resin layer. Also, the hardened sealing body in one aspect of the present invention , refers to the object obtained by covering the object to be sealed with a sealing material and then hardening the sealing material, which is composed of the object to be sealed and the hardened material of the sealing material.

圖4為說明使用圖1(a)所示之層合體1a製造硬化密封體的步驟之截面模式圖。以下,將適度地參考圖4,對上述各步驟進行說明。Fig. 4 is a schematic cross-sectional view illustrating the steps of producing a hardened sealing body using the laminated body 1a shown in Fig. 1(a). Hereinafter, the above steps will be described with appropriate reference to FIG. 4 .

<步驟(i)>      步驟(i)為,於本發明之一態樣的層合體所具有的能量線硬化性樹脂層(I)的表面之一部份,載置密封對象物之步驟。      圖4(a)為說明於本步驟中的層合體1a中,將支撐層(II)的黏著劑層(X)的黏著表面貼附於支撐體50,使能量線硬化性樹脂層(I)的表面之一部份,載置密封對象物60之狀態。      又,圖4(a)中,為說明使用圖1(a)所示之層合體1a之例示,於使用具有其他構成的本發明之一態樣的層合體時,同樣地為依支撐體、層合體,及密封對象物之順序進行層合或載置。<Step (i)> Step (i) is a step of placing an object to be sealed on a part of the surface of the energy ray-curable resin layer (I) of the laminated body of one aspect of the present invention. Fig. 4(a) illustrates that in the laminated body 1a in this step, the adhesive surface of the adhesive layer (X) of the support layer (II) is attached to the support body 50, so that the energy ray curable resin layer (I) A part of the surface of the surface is the state where the object to be sealed 60 is placed. Also, in FIG. 4(a), in order to illustrate an example using the laminated body 1a shown in FIG. The laminated body and the object to be sealed are laminated or placed in sequence.

步驟(i)中之溫度條件,以於熱膨脹性粒子未膨脹之溫度下進行者為佳,例如,以於0~80℃之環境下(其中,膨脹起始溫度(t)為60~80℃之情形,為未達膨脹起始溫度(t)之環境)進行為佳。The temperature conditions in the step (i) are preferably carried out at a temperature at which the heat-expandable particles are not expanded, for example, in an environment of 0-80°C (wherein, the expansion initiation temperature (t) is 60-80°C In the case of this, it is better to carry out in an environment that does not reach the expansion initiation temperature (t).

支撐體,以貼附於層合體的黏著劑層(X)的黏著表面的全面者為佳。      因此,支撐體以板狀為佳。又,貼附於黏著劑層(X)的黏著表面之側的支撐體的表面面積,如圖4所示般,以黏著劑層(X)的黏著表面面積以上為佳。The support is preferably one that is attached to the entire surface of the adhesive layer (X) of the laminate. Therefore, the support body is preferably in the form of a plate. Also, the surface area of the support attached to the adhesive surface of the adhesive layer (X) is preferably greater than or equal to the adhesive surface area of the adhesive layer (X) as shown in FIG. 4 .

構成支撐體之材質,可配合密封對象物之種類、步驟(ii)所使用的密封材之種類等,並考慮機械強度、耐熱性等所要求的特性後,予以適當地選擇。      具體而言,構成支撐體之材質,例如,SUS等的金屬材料;玻璃、矽晶圓等的非金屬無機材料;環氧樹脂、ABS樹脂、丙烯酸樹脂、工程塑膠、高階工程塑膠、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂等的樹脂材料;玻璃環氧樹脂等的複合材料等,該些之中,又以SUS、玻璃,及矽晶圓等為佳。又,就能量線硬化性樹脂層(I),可介由支撐體照射能量線之觀點,該支撐體以玻璃等的透明材料為佳。      又,工程塑膠,可列舉如,尼龍、聚碳酸酯(PC),及聚乙烯對苯二甲酸酯(PET)等。      高階工程塑膠,可列舉如,聚苯硫醚(PPS)、聚醚碸(PES),及聚醚-醚酮(PEEK)等。The material constituting the support body can be appropriately selected according to the type of object to be sealed, the type of sealing material used in step (ii), etc., taking into consideration required characteristics such as mechanical strength and heat resistance. Specifically, the material constituting the support body, for example, metal materials such as SUS; non-metallic inorganic materials such as glass and silicon wafers; epoxy resin, ABS resin, acrylic resin, engineering plastics, high-grade engineering plastics, polyamide Resin materials such as amine resin and polyamideimide resin; composite materials such as glass epoxy resin, etc. Among them, SUS, glass, and silicon wafers are preferred. Moreover, from the viewpoint that the energy ray-curable resin layer (I) can be irradiated with energy rays through a support, the support is preferably made of a transparent material such as glass. In addition, engineering plastics include, for example, nylon, polycarbonate (PC), and polyethylene terephthalate (PET). High-end engineering plastics include, for example, polyphenylene sulfide (PPS), polyether ketone (PES), and polyether-ether ketone (PEEK).

支撐體的厚度,可配合密封對象物之種類、步驟(ii)所使用的密封材之種類等,作適當之選擇,較佳為20μm以上50mm以下,更佳為60μm以上20mm以下。The thickness of the support can be appropriately selected according to the type of object to be sealed, the type of sealing material used in step (ii), etc., preferably 20 μm to 50 mm, more preferably 60 μm to 20 mm.

另一方面,能量線載置於硬化性樹脂層(I)的表面中之一部份的密封對象物,例如,半導體晶片、半導體晶圓、化合物半導體、半導體封裝、電子零件、藍寶石基板、顯示器、平板用基板等。On the other hand, the object to be sealed where energy lines are placed on a part of the surface of the curable resin layer (I), for example, semiconductor wafers, semiconductor wafers, compound semiconductors, semiconductor packages, electronic parts, sapphire substrates, displays , Substrates for flat panels, etc.

密封對象物為半導體晶片時,於使用本發明之一態樣的層合體時,可製造附有硬化樹脂層的半導體晶片。      半導體晶片可使用以往公知者,其線路面上,形成有由電晶體、電阻、冷凝器等的線路元件所構成的集積線路。      隨後,半導體晶片,於與線路面為相反側的內面,以被能量線硬化性樹脂層(I)的表面被覆之方式載置者為佳。該情形中,於載置後,半導體晶片的線路面呈現外露之狀態。      半導體晶片之載置,可使用覆晶接合器、黏晶機(Die Bonder)等的公知裝置進行。      半導體晶片配置之佈局、配置數等,可配合目的之封裝形態、生產數量等作適當之決定即可。When the object to be sealed is a semiconductor wafer, a semiconductor wafer with a cured resin layer can be produced by using the laminated body of one aspect of the present invention. The semiconductor chip can be known in the past, and its circuit surface is formed with an integrated circuit composed of circuit elements such as transistors, resistors, and condensers. Next, it is preferable that the semiconductor wafer is placed on the inner surface opposite to the circuit surface so that the surface of the energy ray-curable resin layer (I) is covered. In this case, after mounting, the circuit surface of the semiconductor wafer is exposed. The mounting of the semiconductor chip can be carried out using known devices such as flip-chip bonders and die bonders. The layout and number of configurations of semiconductor chips can be appropriately determined in accordance with the intended packaging form and production quantity.

其中,如本發明之一態樣之層合體般,以使用於將密封材被覆於較FOWLP、FOPLP等的半導體晶片的晶片尺寸為更大之區域,形成不僅半導體晶片的線路面,於密封材的表面區域中,也可形成導線重佈層(RDL)的封裝者為佳。      因此,半導體晶片為能量線載置於硬化性樹脂層(I)的表面中之一部份者,該複數的半導體晶片,以間隔特定的距離形成行列之狀態,載置於該表面者為佳,複數的半導體晶片,以間隔特定距離,以整列為複數行且為複數列之矩陣狀之狀態載置於該表面者為較佳。      半導體晶片相互間的間隔,可配合作為目的之封裝形態等作適當之決定。Among them, like the laminated body of one aspect of the present invention, the area used for covering the sealing material on a semiconductor wafer with a larger wafer size than FOWLP, FOPLP, etc., is formed not only on the circuit surface of the semiconductor wafer, but also on the sealing material. In the surface area of the package, the package that can also form a wire redistribution layer (RDL) is preferred. Therefore, the semiconductor chip is a part of the surface of the curable resin layer (I) where the energy lines are placed, and the plurality of semiconductor chips are preferably placed on the surface in a state of forming rows and rows at a specific distance. , A plurality of semiconductor wafers are preferably mounted on the surface in a matrix-like state of a plurality of rows and a plurality of columns at a predetermined distance apart. The spacing between semiconductor chips can be appropriately determined in accordance with the intended packaging form.

<步驟(ii)>      步驟(ii)為,以能量線照射能量線硬化性樹脂層(I),形成由能量線硬化性樹脂層(I)硬化而形成的硬化樹脂層(I’)之步驟。      圖4(b)為說明本步驟中,使能量線硬化性樹脂層(I)硬化,而形成硬化樹脂層(I’)之狀態。      能量線之種類及照射條件,只要可使能量線硬化性樹脂層(I)硬化至可充份發揮其機能之程度的種類及條件時,並未有特別之限定,其可由公知方法之中,配合所期待的製程適當地選擇使用。      能量線硬化性樹脂層(I)於硬化時,能量線之照度,以4~280mW/cm2 為佳,於前述硬化時,能量線之光量,以5~1000mJ/cm2 為佳,100~500mJ/cm2 為較佳。      能量線之種類及照射裝置係如上所述。      能量線,只要可使能量線硬化性樹脂層(I)被能量線照射之方向時,無論任何方向進行之照射皆可,例如,支撐體(II)及支撐體50,於使用具有優良光穿透率者時,可介由支撐體(II)及支撐體50(即,圖4(b)中,為由與支撐體50的黏著劑層(X)為相反側之面射入,通過支撐體50、黏著劑層(X)及基材(Y)),將能量線照射至能量線硬化性樹脂層(I)。<Step (ii)> Step (ii) is a step of irradiating the energy ray curable resin layer (I) with energy rays to form a cured resin layer (I') formed by curing the energy ray curable resin layer (I) . FIG. 4( b ) illustrates the state in which the energy ray curable resin layer (I) is cured to form the cured resin layer (I') in this step. The type and irradiation conditions of energy rays are not particularly limited as long as they can harden the energy ray-curable resin layer (I) to the extent that it can fully exert its functions. It is properly selected and used according to the expected process. When the energy ray-curable resin layer (I) is hardened, the illuminance of the energy ray is preferably 4-280mW/cm 2 , and during the above-mentioned hardening, the illuminance of the energy ray is preferably 5-1000mJ/cm 2 , preferably 100-280mW/cm 2 . 500mJ/cm 2 is better. The types of energy rays and irradiation devices are as described above. Energy rays can be irradiated in any direction as long as the energy ray-curable resin layer (I) can be irradiated by the energy rays. When the transmittance is higher, it can be injected through the support body (II) and the support body 50 (that is, in FIG. body 50, the adhesive layer (X) and the base material (Y)), the energy ray is irradiated to the energy ray curable resin layer (I).

<步驟(iii)>      步驟(iii)為,使用熱硬化性的密封材被覆(以下,亦稱為「被覆處理」)上述密封對象物,與該密封對象物的至少周邊部之硬化樹脂層(I’)的表面,使該密封材熱硬化,而形成包含上述密封對象物的硬化密封體之步驟。      被覆處理中,首先,為使用密封材被覆密封對象物,與硬化樹脂層(I’)的表面中之至少密封對象物的周邊部。      密封材為被覆密封對象物露出面的全體之同時,亦填充於複數的半導體晶片相互間之間隙。      例如,圖4(c)為說明使用密封材70被覆密封對象物60及硬化樹脂層(I’)的全部表面之狀態。<Step (iii)> Step (iii) is to cover (hereinafter, also referred to as "coating treatment") the above-mentioned sealed object with a thermosetting sealing material, and the hardened resin layer ( The surface of I') is a step of thermally hardening the sealing material to form a hardened sealing body including the above-mentioned sealing object. In the coating process, first, in order to coat the object to be sealed with a sealing material, at least the peripheral portion of the object to be sealed is between the surface of the hardened resin layer (I'). The sealing material not only covers the entire exposed surface of the object to be sealed, but also fills the gap between multiple semiconductor chips. For example, Fig. 4(c) illustrates the state where the sealing material 70 is used to cover the entire surface of the sealing object 60 and the cured resin layer (I').

密封材為,具有由外部環境保護密封對象物及其附加要件之機能。      本發明之一態樣之製造方法所使用的密封材,為含有熱硬化性樹脂的熱硬化性之密封材。      又,密封材,於室溫下,可為顆粒狀、顆粒狀、薄膜狀等的固狀,亦可為組成物形態之液狀,就作業性之觀點,以薄膜狀的密封材之密封樹脂薄膜為佳。The sealing material has the function of protecting the sealing object and its additional elements from the external environment. The sealing material used in the manufacturing method of one aspect of the present invention is a thermosetting sealing material containing a thermosetting resin. In addition, the sealing material can be solid at room temperature, such as granular, granular, and film-like, or it can be liquid in the form of a composition. From the viewpoint of workability, the sealing resin of the film-like sealing material Film is preferred.

被覆方法,可由以往密封步驟所使用的方法中,配合密封材之種類,作適當的選擇使用,例如,可使用滾軋層合法、真空加壓法、真空層合法、旋轉塗佈法、模具塗佈法、轉注成型法、壓縮成形模具法等。The coating method can be appropriately selected from the methods used in the previous sealing step, depending on the type of sealing material. For example, roll lamination, vacuum pressurization, vacuum lamination, spin coating, and die coating can be used. Cloth method, transfer injection molding method, compression molding mold method, etc.

隨後,於被覆處理後,使密封材熱硬化,而製得密封對象物被密封材所密封之硬化密封體。      又,步驟(iii)的熱硬化處理,為於熱膨脹性粒子不會膨脹的溫度下進行,例如,使用具有含熱膨脹性粒子的層之層合體時,以於未達該熱膨脹性粒子之膨脹起始溫度(t)之溫度條件下進行者為佳。Then, after the coating treatment, the sealing material is thermally cured to obtain a hardened sealing body in which the object to be sealed is sealed by the sealing material. Also, the thermosetting treatment in step (iii) is carried out at a temperature at which the heat-expandable particles do not expand. It is better to carry out under the temperature condition of the initial temperature (t).

本發明之一態樣之製造方法中,如圖4(c)所示般,為於經密封材70密封的密封對象物60側之面設有硬化樹脂層(I’)之狀態下,進行熱硬化處理。      因設有硬化樹脂層(I’),故可縮小所得的2個硬化密封體的表面間之收縮應力差,而可有效地抑制因硬化密封體所生成的變形。In the manufacturing method of one aspect of the present invention, as shown in FIG. Heat hardened. Since the hardened resin layer (I') is provided, the shrinkage stress difference between the surfaces of the obtained two hardened sealing bodies can be reduced, and the deformation caused by the hardened sealing body can be effectively suppressed.

<步驟(iv)>      步驟(iv)為,上述熱膨脹性粒子經進行膨脹處理,使硬化樹脂層(I’)與支撐層(II),於該界面形成分離,而製得附有硬化樹脂層的硬化密封體之步驟。      圖4(d)為說明,熱膨脹性粒子經進行膨脹處理,而於硬化樹脂層(I’)與支撐層(II)的界面P形成分離之狀態。      如圖4(d)所示般,經於界面P形成分離結果,而可製得具有密封對象物60經被密封而形成的硬化密封體80與硬化樹脂層(I’)之附有硬化樹脂層的硬化密封體100。      又,硬化樹脂層(I’)的存在,除具有可有效地抑制因硬化密封體所生成的變形之機能的同時,亦可保護密封對象物,而提高密封對象物之信賴性。<Step (iv)> Step (iv) is that the above-mentioned heat-expandable particles are subjected to expansion treatment, so that the hardened resin layer (I') and the support layer (II) are separated at the interface, and the hardened resin layer is obtained. step of hardening the seal. Figure 4(d) illustrates that the heat-expandable particles are subjected to expansion treatment and form a state of separation at the interface P between the hardened resin layer (I') and the support layer (II). As shown in Fig. 4(d), by forming a separation result at the interface P, it is possible to obtain a cured resin with a hardened sealing body 80 and a hardened resin layer (I') formed by sealing the object 60 to be sealed. layer of hardened sealant 100 . In addition, the existence of the hardened resin layer (I') not only has the function of effectively suppressing the deformation caused by the hardened sealing body, but also protects the object to be sealed, thereby improving the reliability of the object to be sealed.

步驟(iv)中之「進行膨脹處理」,係指將熱膨脹性粒子加熱至膨脹起始溫度(t)以上,使該熱膨脹性粒子進行膨脹處理,經由該處理而於硬化樹脂層(I’)側的支撐層(II)的表面產生凹凸。其結果可使界面P於使用些許力量時即可使其整體容易分離。      使熱膨脹性粒子膨脹之際的「膨脹起始溫度(t)以上之溫度」係指,「膨脹起始溫度(t)+10℃」以上、「膨脹起始溫度(t)+60℃」以下為佳,以「膨脹起始溫度(t)+15℃」以上、「膨脹起始溫度(t)+40℃」以下為較佳。      又,加熱方法並未有特別之限定,例如,可使用加熱板、烘箱、燒結爐、紅外線燈、熱風送風機等之加熱方法,就使支撐層(II)與硬化樹脂層(I’)的界面P容易分離之觀點,加熱時的熱源以可設置於支撐體50側之方法為佳。"Performing expansion treatment" in step (iv) refers to heating the heat-expandable particles to a temperature above the expansion initiation temperature (t), subjecting the heat-expandable particles to expansion treatment, and through this treatment, the hardened resin layer (I') The surface of the supporting layer (II) on the side is uneven. As a result, the interface P can be easily separated as a whole with a little force. "Temperature above the expansion start temperature (t)" when expanding the heat-expandable particles refers to "expansion start temperature (t) + 10°C" or more and "expansion start temperature (t)+60°C" or less Preferably, it is more than "expansion initiation temperature (t) + 15°C" and more preferably "expansion initiation temperature (t) + 40°C". Also, the heating method is not particularly limited. For example, heating methods such as a heating plate, an oven, a sintering furnace, an infrared lamp, and a hot air blower can be used to make the interface between the support layer (II) and the hardened resin layer (I') From the viewpoint of easy separation of P, it is preferable that the heat source during heating be installed on the side of the support body 50 .

依此方法所得的附有硬化樹脂層的硬化密封體,隨後可施以必要的加工處理。其一例例如以下之說明。又,以下之說明中,密封對象物60將以使用半導體晶片60之態樣進行說明。The hardened sealing body with the hardened resin layer obtained in this way can then be subjected to necessary processing. An example thereof is described below. In addition, in the following description, the object to be sealed 60 will be described using a semiconductor wafer 60 .

<第一研削步驟>      圖5(a)中,為依上述製造方法所得之附有硬化樹脂層的硬化密封體100,圖5(b)中,為說明使用研削手段110對與硬化密封體80的硬化樹脂層(I’)為相反側之面100a進行研削,使半導體晶片60的線路面60a露出之第一研削步驟。      研削手段110,並未有特別之限定,例如可使用研磨機等的公知研削裝置。      實施第一研削步驟之際,就作業性之觀點,以將硬化密封體之硬化樹脂層(I’)側之面,固定於其他支撐體上為佳。      又,就作業性之觀點,於第一研削步驟前,可將其切割為包含1個或複數個晶片之特定大小。<First Grinding Step> In Fig. 5(a), the hardened sealing body 100 with a hardened resin layer obtained according to the above-mentioned manufacturing method is shown. In Fig. 5(b), the pair of grinding means 110 and the hardened sealing body 80 The cured resin layer (I') is ground on the opposite side 100a to expose the circuit surface 60a of the semiconductor wafer 60 in the first grinding step. The grinding means 110 is not particularly limited, and for example, a known grinding device such as a grinder can be used. When implementing the first grinding step, it is better to fix the surface of the hardened resin layer (I') side of the hardened sealing body on another support body from the viewpoint of workability. Also, from the viewpoint of workability, before the first grinding step, it can be cut into a specific size including one or multiple wafers.

<導線重佈層(RDL)及形成外部端子電極之步驟>      圖5(c)中,為說明經由第一研削步驟,而使露出於硬化密封體80表面的半導體晶片60之線路面60a形成電路連接的導線重佈層(RDL)200,及形成外部端子電極300之導線重佈層(RDL)及形成外部端子電極之步驟。      導線重佈層(RDL)200之材質,只要為導電性材料時,則未有特別之限制,例如,可為金、銀、銅、鋁等的金屬、含有該些金屬的合金等。導線重佈層(RDL)200,可使用扣除法(subtractive Process)、半加成法(Semi-additive Process)等的公知方法而形成,必要時,可設有1層以上的絕緣層。      外部端子電極300,與導線重佈層(RDL)200的外部電極墊形成電路連接。外部電子電極300,例如,可將焊球(Solder balls)等經焊接接合方式而形成。<Steps of wire redistribution layer (RDL) and forming external terminal electrodes> In FIG. 5(c), to illustrate the formation of a circuit on the circuit surface 60a of the semiconductor chip 60 exposed on the surface of the hardened sealing body 80 through the first grinding step The wire redistribution layer (RDL) 200 connected, and the step of forming the wire redistribution layer (RDL) of the external terminal electrode 300 and forming the external terminal electrode. The material of the wire redistribution layer (RDL) 200 is not particularly limited as long as it is a conductive material. For example, it can be metals such as gold, silver, copper, aluminum, or alloys containing these metals. The wire redistribution layer (RDL) 200 can be formed using a known method such as a subtractive process or a semi-additive process, and if necessary, one or more insulating layers can be provided. The external terminal electrode 300 forms a circuit connection with the external electrode pad of the wire redistribution layer (RDL) 200 . The external electronic electrodes 300 can be formed, for example, by soldering and joining solder balls.

<切割步驟>      圖5(d)中,為說明切割連接外部端子電極300的附有硬化樹脂層的硬化密封體100之步驟。      切割可依1個單位的半導體晶片之方式進行亦可、包含複數個半導體晶片之特定大小進行切割亦可。切割附有硬化樹脂層的硬化密封體100之方法,並未有特別之限定,其可使用切割機(dicing saw)等的切斷手段予以實施。<Cutting Step> In FIG. 5( d ), the step of cutting the hardened sealing body 100 with a hardened resin layer connected to the external terminal electrode 300 is described.  Dicing can be carried out in the form of one unit of semiconductor wafer, or can be cut with a specific size including multiple semiconductor wafers. The method of cutting the cured sealing body 100 with the cured resin layer is not particularly limited, and cutting means such as a dicing saw can be used for cutting.

<第二研削步驟>      圖5(e)中,為說明使用研削手段110對配置於與硬化密封體80的導線重佈層(RDL)200為相反側的硬化樹脂層(I’)進行研削之第二研削步驟。此時,於硬化密封體80的導線重佈層(RDL)200側之面,以使用內面研磨床(BACK GRINDING TABLE)等予以固定為佳。研削手段110,例如與第一研削步驟為相同之手段。      第二研削步驟中,可對硬化樹脂層(I’)的一部份進行研削,或對全部硬化樹脂層(I’)進行研削皆可。      研削硬化樹脂層(I’)之方式,可使所得半導體封裝更小型化。因此,基於該觀點,以對硬化樹脂層(I’)進行全部研削者為佳。      另一方面,不進行第二研削步驟之情形,或僅對硬化樹脂層(I’)的一部份進行之情形,硬化樹脂層(I’)亦具有保護半導體晶片60內面之機能。        [實施例]<Second Grinding Step> In FIG. 5(e), the grinding means 110 is used to illustrate the grinding of the hardened resin layer (I') disposed on the opposite side to the lead wire redistribution layer (RDL) 200 of the hardened sealing body 80. Second grinding step. At this time, it is preferable to fix the surface of the hardened sealing body 80 on the wire redistribution layer (RDL) 200 side using a back grinding table (BACK GRINDING TABLE). The grinding means 110 is, for example, the same means as the first grinding step. In the second grinding step, a part of the hardened resin layer (I') can be ground, or the entire hardened resin layer (I') can be ground. The method of grinding the hardened resin layer (I') can make the obtained semiconductor package more miniaturized. Therefore, from this point of view, it is preferable to grind all the cured resin layer (I'). On the other hand, if the second grinding step is not carried out, or if only a part of the hardened resin layer (I') is carried out, the hardened resin layer (I') also has the function of protecting the inner surface of the semiconductor chip 60. [Example]

本實施形態,將使用以下實施例作具體的說明,但本發明並不受以下實施例所限定。      又,以下之說明中,硬化性樹脂層(I)係指,「能量線硬化性樹脂層(I)」及「熱硬化性樹脂層」等二者之意。      又,各例中之物性值,為依以下方法所測定之值。This embodiment will be specifically described using the following examples, but the present invention is not limited by the following examples. In addition, in the following description, curable resin layer (I) refers to both "energy ray curable resin layer (I)" and "thermosetting resin layer". In addition, the physical property values in each example are the values measured according to the following methods.

<質量平均分子量(Mw)>      使用凝膠滲透色層分析裝置(東曹股份有限公司製、製品名「HLC-8020」),依下述條件進行測定,使用標準聚苯乙烯換算而得的測定值。        (測定條件)      ・管柱:依序連結「TSK guard column HXL-L」、「TSK gel G2500HXL」、「TSK gel G2000HXL」、「TSK gel G1000HXL」(任一者皆為東曹股份有限公司製)者      ・管柱溫度:40℃      ・展開溶劑:四氫呋喃      ・流速:1.0mL/min<Mass average molecular weight (Mw)> Using a gel permeation chromatography analyzer (manufactured by Tosoh Co., Ltd., product name "HLC-8020"), the measurement was carried out under the following conditions, and the measurement was based on standard polystyrene conversion value. (Measurement conditions) ・Tube column: connect "TSK guard column HXL-L", "TSK gel G2500HXL", "TSK gel G2000HXL", "TSK gel G1000HXL" in sequence (all are manufactured by Tosoh Co., Ltd.)・Column temperature: 40℃ ・Evolving solvent: tetrahydrofuran ・Flow rate: 1.0mL/min

<各層厚度之測定>      使用TECLOCK股份有限公司製之定壓厚度測定器(型號:「PG-02J」、標準規格:JIS K6783、Z 1702、Z 1709)進行測定。<Measurement of the thickness of each layer> The measurement was carried out using a constant pressure thickness tester manufactured by TECLOCK Co., Ltd. (model: "PG-02J", standard specifications: JIS K6783, Z 1702, Z 1709).

<熱膨脹性粒子之膨脹起始溫度(t)及最大膨脹溫度之測定法>      各例所使用的熱膨脹性粒子之膨脹起始溫度(t),為依下述方法測定。      製作於直徑6.0mm(內徑5.65mm)、深度4.8mm之鋁杯中,加入作為測定對象的熱膨脹性粒子0.5mg,於其上蓋上鋁蓋(直徑5.6mm、厚度0.1mm)所得之樣品。      使用動態黏彈性測定裝置,由該樣品的鋁蓋上部,以加壓器施以0.01N力量之狀態下,測定樣品之高度。隨後,於加壓器施加0.01N的力量之狀態,由20℃起至300℃為止,以10℃/min之升溫速度進行加熱,測定加壓器的垂直方向中之變位量,將對於正方向的變位起始溫度設為膨脹起始溫度(t)。      又,最大膨脹溫度為,依上述方法測定而得之變位量達最大時之溫度。<Measurement method of the expansion start temperature (t) and maximum expansion temperature of heat-expandable particles> The expansion start temperature (t) of the heat-expandable particles used in each example was measured according to the following method. Made in an aluminum cup with a diameter of 6.0mm (inner diameter 5.65mm) and a depth of 4.8mm, add 0.5mg of heat-expandable particles as the measurement object, and cover the sample with an aluminum cover (diameter 5.6mm, thickness 0.1mm). Using a dynamic viscoelasticity measuring device, measure the height of the sample from the upper part of the aluminum cover of the sample with a force of 0.01N applied by the presser. Then, in the state where a force of 0.01N is applied to the press, heat it from 20°C to 300°C at a heating rate of 10°C/min, and measure the displacement in the vertical direction of the press. The displacement start temperature in the direction is set as the expansion start temperature (t). In addition, the maximum expansion temperature is the temperature at which the displacement measured by the above method reaches the maximum.

<變形之評估>      將各例所製得之硬化性樹脂層(I)形成用薄片的硬化性樹脂層(I),貼附於矽晶圓(尺寸:12英吋、厚度:100μm)。      隨後,準備由環氧樹脂(STRUERS公司製、製品名「EPO-FIX樹脂」)與硬化劑(STRUERS公司製、製品名「EPO-FIX硬化劑」)混合而得之樹脂組成物作為熱硬化性樹脂組成物,將該該樹脂組成物以厚度30μm之方式塗佈於上述矽晶圓的與硬化性樹脂層(I)為相反側之面上。依此方式,則製得依硬化性樹脂層(I)/矽晶圓/熱硬化性樹脂組成物層之順序的硬化前之測定樣品。      隨後,於硬化性樹脂層(I)為能量線硬化性樹脂層(I)時,使用紫外線照射裝置RAD-2000(琳德股份有限公司製),將紫外線依照度215mW/cm2 、光量187mJ/cm2 之條件照射3次,使能量線硬化性樹脂層(I)硬化,形成硬化樹脂層(I’)。又,硬化性樹脂層(I)為熱硬化性樹脂層(I)時,可於180℃下進行60分鐘加熱,而形成硬化樹脂層(I’)。其後,將上述熱硬化性樹脂組成物加熱、硬化,形成熱硬化樹脂層,而製得具有硬化樹脂層(I’)/矽晶圓/熱硬化樹脂層之順序的硬化後之測定樣品。      將硬化後測定樣品載置於水平床台後,依目視觀察,並依以下之基準評估是否發生變形。又,硬化後測定樣品中之「矽晶圓/熱硬化樹脂層」部份,因為相當於半導體晶片經熱硬化性樹脂進行密封加工而形成的硬化密封體之構成,故可使用本評估結果作為硬化樹脂層(I’)的抗變形層性能之評估。      A:變形量為3mm以下。      B:變形量為大於3mm、未達15mm。      C:變形量為15mm以上。      又,未貼附硬化性樹脂層(I)之情況下,依與上述為相同順序所矽晶圓/熱硬化樹脂層時的變形量為15mm。<Evaluation of deformation> The curable resin layer (I) of the sheet for forming the curable resin layer (I) prepared in each example was attached to a silicon wafer (size: 12 inches, thickness: 100 μm). Then, a resin composition obtained by mixing an epoxy resin (manufactured by STRUERS, product name "EPO-FIX resin") and a curing agent (manufactured by STRUERS, product name "EPO-FIX hardener") was prepared as a thermosetting resin composition. A resin composition was applied to a thickness of 30 μm on the surface of the silicon wafer opposite to the curable resin layer (I). In this way, the measurement samples before curing are obtained in the order of curable resin layer (I)/silicon wafer/thermosetting resin composition layer. Next, when the curable resin layer (I) is an energy ray curable resin layer (I), use an ultraviolet irradiation device RAD-2000 (manufactured by Linde Co., Ltd.) to irradiate ultraviolet rays with a light intensity of 215mW/cm 2 and a light intensity of 187mJ/ The condition of cm 2 is irradiated three times to harden the energy ray curable resin layer (I) to form a cured resin layer (I'). Moreover, when curable resin layer (I) is a thermosetting resin layer (I), it can heat at 180 degreeC for 60 minutes, and can form curable resin layer (I'). Thereafter, the thermosetting resin composition was heated and cured to form a thermosetting resin layer, and a cured measurement sample having the order of cured resin layer (I′)/silicon wafer/thermosetting resin layer was prepared. Place the hardened test sample on a horizontal bed, observe visually, and evaluate whether there is deformation according to the following criteria. In addition, the "silicon wafer/thermosetting resin layer" part of the sample measured after curing is equivalent to the composition of a hardened seal formed by sealing a semiconductor chip with a thermosetting resin, so this evaluation result can be used as a Evaluation of the anti-deformation layer performance of the hardened resin layer (I'). A: The amount of deformation is 3 mm or less. B: The amount of deformation is greater than 3 mm and less than 15 mm. C: The amount of deformation is 15 mm or more. Also, in the case where the curable resin layer (I) was not attached, the amount of deformation of the silicon wafer/thermosetting resin layer was 15 mm in the same procedure as above.

<分離性之評估>      於各例所得層合體所具有的硬化性樹脂層(I)的表面貼附矽晶圓之後,以能量線或熱能使硬化性樹脂層(I)硬化而形成硬化樹脂層(I’)。隨後,經由加熱膨脹處理使膨脹性基材層(Y1)膨脹,而使硬化樹脂層(I’)與支撐層(II)分離,隨後基於以下之基準,評估其分離性。又,各例所製得的硬化性樹脂層(I)的硬化條件,及支撐層(II)的加熱膨脹處理條件,為與後述實施例1~5及參考例1記載之條件為相同之條件。      A:可形成分離,且硬化樹脂層(I’)的外觀良好,無糊料殘留。      B:可形成分離,硬化樹脂層(I’)的外觀雖良好,但殘留部份糊料。      C:無法形成分離,或硬化樹脂層(I’)全面殘留糊料,或硬化樹脂層(I’)的外觀不良。<Evaluation of separability> After attaching a silicon wafer to the surface of the curable resin layer (I) of the laminates obtained in each example, the curable resin layer (I) was cured with energy rays or heat energy to form a cured resin layer (I'). Then, the expandable base material layer (Y1) was expanded through heat expansion treatment to separate the cured resin layer (I') from the support layer (II), and then the separation property was evaluated based on the following criteria. In addition, the curing conditions of the curable resin layer (I) obtained in each example, and the thermal expansion treatment conditions of the support layer (II) are the same conditions as those described in Examples 1 to 5 and Reference Example 1 described later. . A: Separation can be formed, and the appearance of the hardened resin layer (I’) is good without paste residue. B: Separation can be formed. Although the appearance of the hardened resin layer (I’) is good, some paste remains. C: Separation cannot be formed, or paste remains on the hardened resin layer (I'), or the appearance of the hardened resin layer (I') is poor.

<膨脹性基材層(Y1)的儲存彈性率E’>      將製得的儲存彈性率E’測定用之厚度200μm的膨脹性基材層(Y1),切取為縱5mm×橫30mm×厚度200μm之大小後,去除剝離材者作為試驗樣品。      使用動態黏彈性測定裝置(TA Instruments公司製、製品名「DMAQ800」),依試驗起始溫度0℃、試驗結束溫度300℃、升溫速度3℃/分鐘、振動數1Hz、振幅20μm之條件,於特定之溫度間,測定該試驗樣品的儲存彈性率E’。<Storage elastic modulus E' of the expansive substrate layer (Y1)> Cut out the prepared expansive substrate layer (Y1) with a thickness of 200 μm for the measurement of the storage elastic modulus E' to a length of 5 mm × width 30 mm × thickness of 200 μm After the size, remove the peeling material as the test sample. Using a dynamic viscoelasticity measuring device (manufactured by TA Instruments, product name "DMAQ800"), under the conditions of test start temperature 0°C, test end temperature 300°C, heating rate 3°C/min, vibration frequency 1 Hz, and amplitude 20 μm, the Measure the storage elastic modulus E' of the test sample at a specific temperature.

<第1黏著劑層(X1)及第2黏著劑層(X2)的儲存剪切彈性率G’>      將第1黏著劑層(X1)及第2黏著劑層(X2),切斷為直徑8mm之圓形者,去除剝離材,將其重疊後形成厚度3mm者,作為試驗樣品。      使用黏彈性測定裝置(Anton Paar公司製、裝置名「MCR300」),依試驗起始溫度0℃、試驗結束溫度300℃、升溫速度3℃/分鐘、振動數1Hz之條件下,使用螺旋剪切法,測定特定之溫度中,試驗樣品之儲存剪切彈性率G’。<Storage shear elastic modulus G' of the first adhesive layer (X1) and the second adhesive layer (X2)> Cut the first adhesive layer (X1) and the second adhesive layer (X2) into diameters For a circular shape of 8mm, remove the peeling material, and stack them to form a thickness of 3mm, which is used as a test sample. Using a viscoelasticity measurement device (manufactured by Anton Paar, device name "MCR300"), the spiral shear was used under the conditions of the test start temperature 0°C, test end temperature 300°C, temperature rise rate 3°C/min, and vibration frequency 1Hz. Method to measure the storage shear elastic modulus G' of the test sample at a specific temperature.

<硬化樹脂層(I’)的儲存彈性率E’>      將硬化後的各例所得的硬化性樹脂層(I)作為試驗片,使用動態黏彈性測定裝置(TA Instruments公司製、製品名「DMAQ800」),依試驗起始溫度0℃、試驗結束溫度300℃、升溫速度3℃/分鐘、振動數11Hz、振幅20μm之條件下,於23℃下,測定所形成的硬化樹脂層(I’)的儲存彈性率E’。又,試驗片中,硬化性樹脂層(I)為能量線硬化性樹脂層(I)時,為使用紫外線照射裝置RAD-2000(琳德股份有限公司製),將紫外線依照度215mW/cm2 、光量187mJ/cm2 之條件照射3次使其硬化者,硬化性樹脂層(I)為熱硬化性樹脂層(I)時,為使用於180℃下進行60分鐘加熱硬化者。<Storage modulus E' of cured resin layer (I')> Using the cured resin layer (I) obtained in each example after curing as a test piece, a dynamic viscoelasticity measuring device (manufactured by TA Instruments, product name "DMAQ800") was used. ”), under the conditions of test start temperature 0°C, test end temperature 300°C, heating rate 3°C/min, vibration frequency 11Hz, amplitude 20μm, at 23°C, measure the formed hardened resin layer (I') The storage elastic rate E'. In addition, in the test piece, when the curable resin layer (I) is the energy ray curable resin layer (I), the ultraviolet irradiation device RAD-2000 (manufactured by Linde Co., Ltd. ) , The light quantity 187mJ/cm 2 is irradiated three times to make it harden, and when the curable resin layer (I) is a thermosetting resin layer (I), it is used to heat harden at 180°C for 60 minutes.

合成例1    (膨脹性基材層(Y1)所使用的「胺基甲酸丙烯酸酯系樹脂」之合成)      於氮氣氛圍下的反應容器內,相對於質量平均分子量1,000的聚碳酸酯二醇(碳酸酯型二醇)100質量份,以聚碳酸酯二醇之羥基與異佛爾酮二異氰酸酯的異氰酸酯基之當量比為1/1之方式添加異佛爾酮二異氰酸酯,再加入甲苯160質量份,於氮氣氛圍下進行攪拌,再於80℃下進行6小時以上之反應,使異氰酸酯基濃度到達理論量為止。      其次,添加稀釋有2-羥基乙甲基丙烯酸酯(2-HEMA)1.44質量份的甲苯30質量份而得的溶液,再於80℃下進行6小時反應至兩末端的異氰酸酯基消失為止,而製得質量平均分子量2.9萬之胺基甲酸酯預聚物。      隨後,於氮氣氛圍下的反應容器內,加入上述所得之胺基甲酸酯預聚物100質量份、甲基丙烯酸甲酯(MMA)117質量份、2-羥基乙甲基丙烯酸酯(2-HEMA)5.1質量份、1-硫代甘油1.1質量份,及甲苯50質量份,於攪拌中,升溫至105℃。隨後,於反應容器內,於維持105℃下,以4小時時間將稀釋有自由基起始劑(日本FINECHEM股份有限公司製、製品名「ABN-E」)2.2質量份的甲苯210質量份而得的溶液滴入其中。      滴入結束後,於105℃下進行6小時之反應,而製得質量平均分子量10.5萬之胺基甲酸丙烯酸酯系樹脂的溶液。Synthesis Example 1 (Synthesis of "Urethane Acrylic Resin" used in the expandable substrate layer (Y1)) In a reaction vessel under a nitrogen atmosphere, polycarbonate diol (carbonic acid ester diol) 100 parts by mass, add isophorone diisocyanate in such a way that the equivalent ratio of the hydroxyl group of polycarbonate diol to the isocyanate group of isophorone diisocyanate is 1/1, and then add 160 parts by mass of toluene , stirred under a nitrogen atmosphere, and then reacted at 80°C for more than 6 hours until the concentration of isocyanate groups reached the theoretical amount. Next, a solution obtained by diluting 1.44 parts by mass of 2-hydroxyethyl methacrylate (2-HEMA) with 30 parts by mass of toluene was added, and the reaction was carried out at 80° C. for 6 hours until the isocyanate groups at both ends disappeared, and A urethane prepolymer with a mass average molecular weight of 29,000 was obtained. Subsequently, 100 parts by mass of the urethane prepolymer obtained above, 117 parts by mass of methyl methacrylate (MMA), 2-hydroxyethyl methacrylate (2- 5.1 parts by mass of HEMA), 1.1 parts by mass of 1-thioglycerol, and 50 parts by mass of toluene were heated up to 105° C. while stirring. Subsequently, 210 parts by mass of toluene diluted with 2.2 parts by mass of a free radical initiator (manufactured by Japan Finechem Co., Ltd., product name "ABN-E") was added to the reactor at 105°C for 4 hours. The resulting solution was dropped into it. After the dropping, the reaction was carried out at 105°C for 6 hours to obtain a solution of urethane acrylate resin with a mass average molecular weight of 105,000.

[支撐層(II)形成用薄片之製作]    製造例1    (支撐層(II-A))      依下述順序(1-1)~(1-4)製作形成支撐層(II-A)的薄片。      形成各層所使用的材料之詳細內容,係如以下所示。[Manufacturing of the sheet for forming the support layer (II)] Production Example 1 (Support layer (II-A)) The sheet forming the support layer (II-A) was produced in the following order (1-1) to (1-4) . The details of the materials used to form each layer are as follows.

<黏著性樹脂>      ・丙烯酸系共聚物(i):具有由2-乙基己基丙烯酸酯(2EHA)/2-羥乙基丙烯酸酯(HEA)=80.0/20.0(質量比)所形成的原料單體所產生的結構單位之Mw為60萬的丙烯酸系共聚物。      ・丙烯酸系共聚物(ii):具有由n-丁基丙烯酸酯(BA)/甲基丙烯酸甲酯(MMA)/2-羥乙基丙烯酸酯(HEA)/丙烯酸=86.0/8.0/5.0/1.0(質量比)所形成的原料單體所產生的結構單位的Mw為60萬的丙烯酸系共聚物。        <添加劑>      ・異氰酸酯交聯劑(i):東曹股份有限公司製、製品名「CORONATE L」、固形成份濃度:75質量%。        <熱膨脹性粒子>      ・熱膨脹性粒子A:KUREHA股份有限公司製、製品名「S2640」、膨脹起始溫度(t)=208℃、平均粒徑(D50 )= 24μm、90%粒徑(D90 )=49μm。        <剝離材>      ・重剝離薄膜:琳德股份有限公司製、製品名「SP-PET382150」、聚乙烯對苯二甲酸酯(PET)薄膜的一側面,設有由聚矽氧系剝離劑所形成的剝離劑層者,厚度:38μm。      ・輕剝離薄膜:琳德股份有限公司製、製品名「SP-PET381031」、PET薄膜的一側面,設有由聚矽氧系剝離劑所形成的剝離劑層者,厚度:38μm。<Adhesive resin> ・Acrylic copolymer (i): has a raw material list consisting of 2-ethylhexyl acrylate (2EHA)/2-hydroxyethyl acrylate (HEA)=80.0/20.0 (mass ratio) An acrylic copolymer with a structural unit Mw of 600,000.・Acrylic copolymer (ii): has the composition of n-butyl acrylate (BA) / methyl methacrylate (MMA) / 2-hydroxyethyl acrylate (HEA) / acrylic acid = 86.0/8.0/5.0/1.0 (Mass ratio) An acrylic copolymer having a Mw of 600,000 structural units derived from raw material monomers to be formed. <Additives> ・Isocyanate crosslinking agent (i): manufactured by Tosoh Co., Ltd., product name "CORONATE L", solid content concentration: 75% by mass. <Heat-expandable particles> ・Heat-expandable particles A: manufactured by KUREHA Co., Ltd., product name "S2640", expansion start temperature (t) = 208°C, average particle size (D 50 ) = 24 μm, 90% particle size (D 90 )=49 μm. <Release material> ・Heavy release film: Linde Co., Ltd., product name "SP-PET382150", one side of a polyethylene terephthalate (PET) film, with a silicone-based release agent The thickness of the formed release agent layer: 38 μm.・Light release film: Linde Co., Ltd., product name "SP-PET381031", PET film with a release agent layer formed of a silicone release agent on one side, thickness: 38 μm.

(1-1)第1黏著劑層(X1)的形成      於作為黏著性樹脂之上述丙烯酸系共聚物(i)的固形成份100質量份中,添加上述異氰酸酯系交聯劑(i)5.0質量份,使用甲苯稀釋、均勻攪拌後,製得固形成份濃度(有效成份濃度)25質量%的黏著劑組成物。      隨後,將該黏著劑組成物塗佈於上述重剝離薄膜的剝離劑層之表面(以下,「剝離處理面」)形成塗膜,將該塗膜於100℃下進行60秒鐘之乾燥,形成厚度5μm的非熱膨脹性黏著劑層之第1黏著劑層(X1)。      又,於23℃中,第1黏著劑層(X1)的儲存剪切彈性率G’(23)為2.5×105 Pa。      又,依上述方法為基準測定之第1黏著劑層(X1),於23℃下之黏著力為0.3N/25mm。(1-1) Formation of the first adhesive layer (X1) To 100 parts by mass of the solid content of the above-mentioned acrylic copolymer (i) as an adhesive resin, 5.0 parts by mass of the above-mentioned isocyanate-based crosslinking agent (i) was added , after dilution with toluene and uniform stirring, an adhesive composition with a solid content concentration (active component concentration) of 25% by mass was prepared. Subsequently, apply the adhesive composition on the surface of the release agent layer of the above-mentioned heavy release film (hereinafter, "release treatment surface") to form a coating film, and dry the coating film at 100°C for 60 seconds to form The first adhesive layer (X1) of the non-thermally expandable adhesive layer with a thickness of 5 μm. Also, at 23°C, the storage shear modulus G'(23) of the first adhesive layer (X1) was 2.5×10 5 Pa. In addition, the adhesive strength at 23° C. of the first adhesive layer (X1) measured based on the above-mentioned method was 0.3 N/25 mm.

(1-2)第2黏著劑層(X2)的形成      於作為黏著性樹脂之上述丙烯酸系共聚物(ii)的固形成份100質量份中,添加上述異氰酸酯系交聯劑(i)0.8質量份,使用甲苯稀釋、均勻攪拌後,製得固形成份濃度(有效成份濃度)25質量%的黏著劑組成物。      隨後,將該黏著劑組成物塗佈於上述輕剝離薄膜之剝離處理面而形成塗膜,將該塗膜於100℃下進行60秒鐘之乾燥,形成厚度10μm的第2黏著劑層(X2)。      又,於23℃中,第2黏著劑層(X2)的儲存剪切彈性率G’(23)為9.0×104 Pa。      又,依上述方法為基準測定之第2黏著劑層(X2),於23℃下之黏著力為1.0N/25mm。(1-2) Formation of the second adhesive layer (X2) To 100 parts by mass of the solid content of the above-mentioned acrylic copolymer (ii) as an adhesive resin, add 0.8 parts by mass of the above-mentioned isocyanate-based crosslinking agent (i) , after dilution with toluene and uniform stirring, an adhesive composition with a solid content concentration (active component concentration) of 25% by mass was prepared. Subsequently, apply the adhesive composition on the release-treated surface of the above-mentioned light release film to form a coating film, and dry the coating film at 100° C. for 60 seconds to form a second adhesive layer (X2) with a thickness of 10 μm. ). Also, at 23°C, the storage shear modulus G'(23) of the second adhesive layer (X2) was 9.0×10 4 Pa. Also, the adhesive force of the second adhesive layer (X2) at 23° C. measured based on the above-mentioned method was 1.0 N/25 mm.

(1-3)基材(Y)的製作      於合成例1所製得的胺基甲酸丙烯酸酯系樹脂的固形成份100質量份中,上述異氰酸酯系交聯劑(i)6.3質量份中,添加作為觸媒之二辛基錫雙(2-乙基己酸酯)1.4質量份,及上述熱膨脹性粒子A,使用甲苯稀釋、均勻攪拌後,製得固形成份濃度(有效成份濃度)30質量%的樹脂組成物。      又,相對於所得樹脂組成物中的有效成份之全量(100質量%),熱膨脹性粒子A的含量為20質量%。      隨後,將該樹脂組成物塗佈於作為非膨脹性基材之厚度50μm的聚乙烯對苯二甲酸酯(PET)薄膜(東洋紡股份有限公司製、製品名「COSMO-SHUNE A4100」、拉伸強度值:0mN/5mmφ)之表面上而形成塗膜,使該塗膜於100℃下進行120秒鐘之乾燥,形成厚度50μm的膨脹性基材層(Y1)。      其中,上述非膨脹性基材之PET薄膜,相當於非膨脹性基材層(Y2)。      依上述方法,製得由厚度50μm的膨脹性基材層(Y1)及厚度50μm的非膨脹性基材層(Y2)所形成的基材(Y)。(1-3) Preparation of base material (Y) In 100 parts by mass of the solid content of the urethane acrylate resin prepared in Synthesis Example 1, and 6.3 parts by mass of the above-mentioned isocyanate crosslinking agent (i), add 1.4 parts by mass of dioctyltin bis(2-ethylhexanoate) as a catalyst, and the above-mentioned thermally expandable particles A were diluted with toluene and stirred uniformly to obtain a solid content concentration (active component concentration) of 30 mass % resin composition. Also, the content of the heat-expandable particles A was 20% by mass relative to the total amount (100% by mass) of the active ingredients in the obtained resin composition. Subsequently, this resin composition was coated on a polyethylene terephthalate (PET) film (manufactured by Toyobo Co., Ltd., product name "COSMO-SHUNE A4100") with a thickness of 50 μm as a non-expandable substrate, stretched Strength value: 0mN/5mmφ) A coating film was formed on the surface, and the coating film was dried at 100°C for 120 seconds to form an expansive substrate layer (Y1) with a thickness of 50 μm. Among them, the PET film of the above-mentioned non-expandable substrate is equivalent to the non-expandable substrate layer (Y2). According to the above method, a substrate (Y) formed by an intumescent substrate layer (Y1) with a thickness of 50 μm and a non-expandable substrate layer (Y2) with a thickness of 50 μm was prepared.

又,測定膨脹性基材層(Y1)的儲存彈性率E’及拉伸強度值之樣品,為於上述輕剝離薄膜的剝離處理面上,塗佈該樹脂組成物形成塗膜,並使該塗膜於大氣溫度100℃下進行120秒鐘之乾燥,同樣地形成厚度200μm之膨脹性基材層(Y1)。      隨後,依上述測定方法為基準,測定膨脹性基材層(Y1)的各溫度中之儲存彈性率及拉伸強度值。該測定結果,係如以下所示。      ・23℃中之儲存彈性率E’(23)=2.0×108 Pa      ・100℃中之儲存彈性率E’(100)=3.0×106 Pa      ・208℃中之儲存彈性率E’(208)=5.0×105 Pa      ・拉伸強度值=0mN/5mmφIn addition, the sample for measuring the storage elastic modulus E' and the tensile strength value of the expandable base material layer (Y1) is to apply the resin composition to form a coating film on the release-treated surface of the above-mentioned light release film, and make the The coating film was dried at an atmospheric temperature of 100° C. for 120 seconds to form an expansive substrate layer (Y1) with a thickness of 200 μm in the same manner. Subsequently, the storage modulus and tensile strength of the expandable substrate layer (Y1) at various temperatures were measured based on the above-mentioned measurement method. The measurement results are shown below.・Storage elastic modulus E'(23)=2.0×10 8 Pa at 23°C ・Storage elastic modulus E'(100)=3.0×10 6 Pa at 100°C ・Storage elastic modulus E'(208 at 208°C )=5.0×10 5 Pa ・Tensile strength value=0mN/5mmφ

(1-4)各層之層合      於將依上述(1-3)所製得之基材(Y)的非膨脹性基材層(Y2),與上述(1-2)所形成之第2黏著劑層(X2)貼合的同時,將膨脹性基材層(Y1)與上述(1-1)所形成之第1黏著劑層(X1)貼合。      隨後,依輕剝離薄膜/第2黏著劑層(X2)/非膨脹性基材層(Y2)/膨脹性基材層(Y1)/第1黏著劑層(X1)/重剝離薄膜之順序層合而製得支撐層(II-A)形成用薄片。(1-4) Lamination of each layer In the non-expandable substrate layer (Y2) of the substrate (Y) prepared according to the above (1-3), and the second layer formed by the above (1-2) At the same time as bonding the adhesive layer (X2), the expandable base material layer (Y1) is bonded to the first adhesive layer (X1) formed in (1-1) above. Then, according to the sequential layer of light peel film/second adhesive layer (X2)/non-intumescent substrate layer (Y2)/expandable substrate layer (Y1)/first adhesive layer (X1)/heavy peel film Together, a sheet for forming a support layer (II-A) was obtained.

製造例2    (支撐層(II-B))      於製造例1中,除將熱膨脹性粒子A變更為下述熱膨脹性粒子B、塗佈樹脂組成物形成塗膜後的乾燥條件變更為於大氣溫度100℃下進行1分鐘處理以外,其他皆依與製造例1為相同之方法,製得支撐層(II-B)形成用薄片。      ・熱膨脹性粒子B:日本FERRITE股份有限公司製、製品名「031-40DU」、膨脹起始溫度(t)=80℃。Production Example 2 (Support layer (II-B)) In Production Example 1, except that the thermally expandable particles A were changed to the following thermally expandable particles B, and the drying conditions after coating the resin composition to form a coating film were changed to atmospheric temperature Except for the treatment at 100° C. for 1 minute, the same method as in Production Example 1 was followed to prepare a support layer (II-B) forming sheet.・Thermally expandable particles B: Made by Japan Ferrite Co., Ltd., product name "031-40DU", expansion initiation temperature (t) = 80°C.

製造例3    (支撐層(II-C))      於製造例1中,除將熱膨脹性粒子A變更為下述熱膨脹性粒子C、塗佈樹脂組成物形成塗膜後的乾燥條件變更為於大氣溫度100℃下進行1分鐘處理以外,其他皆依與製造例1為相同之方法,製得支撐層(II-C)形成用薄片。      ・熱膨脹性粒子C:日本FERRITE股份有限公司製、製品名「053-40DU」、膨脹起始溫度(t)=100℃。Production Example 3 (Support layer (II-C)) In Production Example 1, except that the thermally expandable particles A were changed to the following thermally expandable particles C, and the drying conditions after coating the resin composition to form a coating film were changed to atmospheric temperature Except for the treatment at 100° C. for 1 minute, the other methods were the same as in Production Example 1 to prepare a sheet for forming a support layer (II-C).・Thermally expandable particles C: Made by Japan Ferrite Co., Ltd., product name "053-40DU", expansion initiation temperature (t) = 100°C.

又,於製造例2及3中,於形成支撐層(II)形成用薄片之際,雖塗佈樹脂組成物形成塗膜後之乾燥溫度,較熱膨脹性粒子之膨脹起始溫度(t)為高,但因上述乾燥溫度為大氣溫度,故於所形成的支撐層(II)上,並未發現發泡現象。Also, in Production Examples 2 and 3, when forming the support layer (II) sheet, the drying temperature after coating the resin composition to form a coating film was higher than the expansion initiation temperature (t) of the thermally expandable particles by High, but because the above-mentioned drying temperature is atmospheric temperature, no foaming phenomenon was found on the formed support layer (II).

製造例4    (支撐層(II-D))      於製造例1中,除將熱膨脹性粒子A變更為下述熱膨脹性粒子D、塗佈樹脂組成物形成塗膜後的乾燥條件變更為於大氣溫度100℃下進行1分鐘處理以外,其他皆依與製造例1為相同之方法,製得支撐層(II-D)形成用薄片。      ・熱膨脹性粒子D:日本FERRITE股份有限公司製、製品名「920-40DU」、膨脹起始溫度(t)=120℃。Production Example 4 (Support layer (II-D)) In Production Example 1, except that the thermally expandable particles A were changed to the following thermally expandable particles D, and the drying conditions after coating the resin composition to form a coating film were changed to atmospheric temperature Except for the treatment at 100° C. for 1 minute, the other methods were the same as in Production Example 1 to prepare a sheet for forming a support layer (II-D).・Thermally expandable particles D: Made by Japan Ferrite Co., Ltd., product name "920-40DU", expansion initiation temperature (t) = 120°C.

[硬化性樹脂層(I)形成用薄片之製作]    製造例5    (能量線硬化性樹脂層(I-A))      摻合下述所示種類及添加量(任一者皆為「有效成份比」)的各成份,再使用甲基乙酮稀釋,均勻地攪拌,製得固形成份濃度(有效成份濃度)61質量%的硬化性組成物之溶液。        [(a2)成份]      ・二季戊四醇六丙烯酸酯(日本化藥股份有限公司製、製品名「KAYARAD DPHA」):17.6質量份        [(b)成份]      ・丙烯酸系聚合物:丙烯酸丁酯(BA)(55質量份)、丙烯酸甲酯(MA)(10質量份)、甲基丙烯酸環氧酯(GMA)(20質量份)及丙烯酸-2-羥乙酯(HEA)(15質量份)共聚而形成的丙烯酸系樹脂(玻璃轉移溫度:-28℃、Mw:80萬):17質量份        [(c)成份]      ・苯基1-羥基環己酮(BASF公司製、製品名「IRGACURE-184」):0.5質量份        [(d)成份]      ・含有環氧基之低聚物型矽烷耦合劑(三菱化學股份有限公司製、製品名「MSEP2」):0.6質量份        [(e)成份]      ・TDI系交聯劑(東洋化學股份有限公司、製品名「BHS-8515」):0.5質量份        [(f)成份]      ・液狀雙酚A型環氧樹脂(日本觸媒股份有限公司製、製品名「BPA328」):16質量份      ・二環戊二烯型環氧樹脂(日本觸媒股份有限公司製、製品名「XD-1000L」):18質量份      ・二環戊二烯型環氧樹脂(DIC股份有限公司製、製品名「HP-7200HH」):27質量份      ・二氰二醯胺(股份有限公司ADEKA製、製品名「ADEKA夥伴3636AS」):1.5質量份        [(g)成份]      ・咪唑(四國化成工業股份有限公司製、製品名「2PH-Z」):1.5質量份[Preparation of sheet for forming curable resin layer (I)] Production Example 5 (Energy Ray Curable Resin Layer (I-A)) Blend the types and amounts shown below (either of which is "active ingredient ratio") Each component is diluted with methyl ethyl ketone and stirred uniformly to obtain a solution of a curable composition with a solid content concentration (active component concentration) of 61% by mass. [(a2) component] ・Dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd., product name "KAYARAD DPHA"): 17.6 parts by mass [(b) component] ・Acrylic polymer: butyl acrylate (BA) (55 parts by mass), methyl acrylate (MA) (10 parts by mass), epoxy methacrylate (GMA) (20 parts by mass) and 2-hydroxyethyl acrylate (HEA) (15 parts by mass) copolymerized Formed acrylic resin (glass transition temperature: -28°C, Mw: 800,000): 17 parts by mass [(c) component] ・Phenyl 1-hydroxycyclohexanone (manufactured by BASF Corporation, product name "IRGACURE-184" ): 0.5 parts by mass [(d) component] ・Epoxy-containing oligomer type silane coupling agent (manufactured by Mitsubishi Chemical Corporation, product name "MSEP2"): 0.6 parts by mass [(e) component] ・TDI Cross-linking agent (Toyo Chemical Co., Ltd., product name "BHS-8515"): 0.5 parts by mass [(f) component] ・Liquid bisphenol A epoxy resin (manufactured by Nippon Shokubai Co., Ltd., product name "BPA328"): 16 parts by mass ・Dicyclopentadiene-type epoxy resin (manufactured by Nippon Shokubai Co., Ltd., product name "XD-1000L"): 18 parts by mass ・Dicyclopentadiene-type epoxy resin ( DIC Co., Ltd., product name "HP-7200HH"): 27 parts by mass ・Dicyandiamide (manufactured by ADEKA Co., Ltd., product name "ADEKA Partner 3636AS"): 1.5 parts by mass [(g) component] ・・Imidazole (manufactured by Shikoku Chemical Industry Co., Ltd., product name "2PH-Z"): 1.5 parts by mass

將依上述方法製得之硬化性組成物之溶液,塗佈於上述輕剝離薄膜的剝離處理面上,形成塗膜,使該塗膜於120℃下進行2分鐘乾燥,形成厚度25μm之能量線硬化性樹脂層(I-A),再製作由能量線硬化性樹脂層(I-A)及輕剝離薄膜所形成之能量線硬化性樹脂層(I-A)形成用薄片。Apply the solution of curable composition prepared by the above method on the peeling surface of the above light release film to form a coating film, and dry the coating film at 120°C for 2 minutes to form an energy beam with a thickness of 25 μm For the curable resin layer (I-A), a sheet for forming the energy ray curable resin layer (I-A) formed by the energy ray curable resin layer (I-A) and the light release film was produced.

製造例6    (能量線硬化性樹脂層(I-B))      摻合下述所示種類及添加量(任一者皆為「有效成份比」)的各成份,再使用甲基乙酮稀釋,均勻地攪拌,而製得固形成份濃度(有效成份濃度)61質量%的硬化性組成物之溶液。        [(a2)成份]      ・ε-己內酯變性三-(2-丙烯醯氧基乙基)異三聚氰酸酯(新中村化學工業股份有限公司製、製品名「A-9300-1CL」、3官能紫外線硬化性化合物):10質量份        [(b)成份]      ・丙烯酸系樹脂:丙烯酸甲基(MA)(85質量份)/丙烯酸-2-羥乙酯(HEA)(15質量份)共聚而形成之丙烯酸系樹脂:28質量份        [(c)成份]      ・2-(二甲基胺基)-1-(4-嗎啉基(morpholino)苯基)-2-苄基-1-丁酮(BASF公司製、製品名「Irgacure(註冊商標)369」):0.6質量份        [(d)成份]      ・3-甲基丙烯醯氧基(methacryloxy)丙基三甲氧基矽烷(信越化學工業股份有限公司製、製品名「KBM-503」):0.4質量份        [(h)成份]      ・二氧化矽填料(溶融石英填料、平均粒徑8μm):57質量份        [(z)成份]      ・由酞青系青色色素(Pigment Blue 15:3)32質量份,與異吲哚二酮 (indolinone)系黄色色素(Pigment Yellow 139)18質量份,與蒽醌系紅色色素(Pigment Red 177)50質量份混合,使上述3種色素之合計量/苯乙烯丙烯酸樹脂量=1/3(質量比)之方式進行顏料化而得的顏料:4質量份Manufacturing Example 6 (Energy Ray Curable Resin Layer (I-B)) Blend the ingredients of the types and amounts shown below (either of which are "active ingredient ratios"), then dilute with methyl ethyl ketone, and evenly Stirring was performed to prepare a solution of a curable composition having a solid content concentration (active component concentration) of 61% by mass. [Ingredient (a2)] ・ε-caprolactone-denatured tris-(2-acryloxyethyl)isocyanurate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name "A-9300-1CL") , 3-functional ultraviolet curable compound): 10 parts by mass [(b) component] ・Acrylic resin: methyl acrylate (MA) (85 parts by mass)/2-hydroxyethyl acrylate (HEA) (15 parts by mass) Acrylic resin formed by copolymerization: 28 parts by mass [(c) component] ・2-(dimethylamino)-1-(4-morpholino phenyl)-2-benzyl-1- Butanone (manufactured by BASF Corporation, product name "Irgacure (registered trademark) 369"): 0.6 parts by mass [(d) component] ・3-methacryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd. Co., Ltd., product name "KBM-503"): 0.4 parts by mass [(h) component] ・Silica filler (fused silica filler, average particle size 8 μm): 57 parts by mass [(z) component] ・Consisting of Phthalocyanine cyan pigment (Pigment Blue 15:3) 32 mass parts, and isoindolinone (indolinone) system yellow pigment (Pigment Yellow 139) 18 mass parts, and anthraquinone system red pigment (Pigment Red 177) 50 mass parts The pigment obtained by mixing the total amount of the above three kinds of pigments/the amount of styrene acrylic resin = 1/3 (mass ratio): 4 parts by mass

將依上述方法製得之硬化性組成物之溶液,塗佈於上述輕剝離薄膜的剝離處理面上,形成塗膜,並使該該塗膜於120℃下進行2分鐘之乾燥,形成厚度25μm之能量線硬化性樹脂層(I-B),再製作由能量線硬化性樹脂層(I-B)及輕剝離薄膜所形成之能量線硬化性樹脂層(I-B)形成用薄片。Apply the solution of curable composition prepared by the above method on the peeling surface of the above light release film to form a coating film, and dry the coating film at 120°C for 2 minutes to form a thickness of 25 μm The energy ray curable resin layer (I-B), and then the sheet for forming the energy ray curable resin layer (I-B) formed by the energy ray curable resin layer (I-B) and the light release film.

製造例7    (熱硬化性樹脂層(I-C))      摻合下述所示種類及添加量(任一者皆為「有效成份比」)的各成份,再使用甲基乙酮稀釋、均勻攪拌後,而製得固形成份濃度(有效成份濃度)61質量%的硬化性組成物之溶液。      ・丙烯酸系聚合物:由丙烯酸丁基(BA)(1質量份)、丙烯酸甲基(MA)(74質量份)、甲基丙烯酸環氧(GMA)(15質量份)及丙烯酸-2-羥乙基(HEA)(10質量份)共聚而形成之丙烯酸系樹脂(玻璃轉移溫度:8℃、Mw:44萬):18質量份      ・液狀雙酚A型環氧樹脂(日本觸媒股份有限公司製、製品名「BPA328」):3質量份      ・固形雙酚A型環氧樹脂(三菱化學股份有限公司製、製品名「EPIKOTE 1055」):20質量份      ・二環戊二烯型環氧樹脂(日本化藥股份有限公司製、製品名「XD-1000L」):1.5質量份      ・二氰二醯胺(ADEKA公司製、製品名「ADEKA夥伴3636AS」):0.5質量份      ・咪唑(四國化成工業股份有限公司製、製品名「2PH-Z」):0.5質量份      ・含有環氧基之低聚物型矽烷耦合劑(三菱化學股份有限公司製、製品名「MSEP2」):0.5質量份      ・球狀二氧化矽填料(ADMATECHS股份有限公司製、製品名「SC2050MA」):6質量份      ・球狀二氧化矽填料(龍森股份有限公司、製品名「SV-10」):50質量份Production Example 7 (Thermosetting resin layer (I-C)) After blending the ingredients of the types and amounts shown below (either of which are "active ingredient ratios"), dilute with methyl ethyl ketone and stir evenly , and a solution of a curable composition with a solid content concentration (active component concentration) of 61% by mass was prepared.・Acrylic polymer: butyl acrylate (BA) (1 part by mass), methyl acrylate (MA) (74 parts by mass), epoxy methacrylate (GMA) (15 parts by mass) and 2-hydroxy acrylate Ethyl (HEA) (10 parts by mass) copolymerized acrylic resin (glass transition temperature: 8°C, Mw: 440,000): 18 parts by mass ・Liquid bisphenol A epoxy resin (Nippon Shokubai Co., Ltd. Made by the company, product name "BPA328"): 3 parts by mass ・Solid bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Corporation, product name "EPIKOTE 1055"): 20 parts by mass ・Dicyclopentadiene type epoxy Resin (manufactured by Nippon Kayaku Co., Ltd., product name "XD-1000L"): 1.5 parts by mass ・Dicyandiamide (manufactured by ADEKA Corporation, product name "ADEKA Partner 3636AS"): 0.5 parts by mass ・Imidazole (Shikoku Kasei Kogyo Co., Ltd., product name "2PH-Z"): 0.5 parts by mass ・Epoxy-containing oligomer type silane coupling agent (manufactured by Mitsubishi Chemical Co., Ltd., product name "MSEP2"): 0.5 parts by mass・Spherical silica filler (manufactured by ADMATECHS Co., Ltd., product name "SC2050MA"): 6 parts by mass ・Spherical silica filler (Longsen Co., Ltd., product name "SV-10"): 50 parts by mass

將依上述方法製得之硬化性組成物之溶液,塗佈於上述輕剝離薄膜的剝離處理面上,形成塗膜,並使該塗膜於120℃下進行2分鐘之乾燥,形成厚度25μm之熱硬化性樹脂層(I-C),再製作由熱硬化性樹脂層(I-C)及輕剝離薄膜所形成之熱硬化性樹脂層(I-C)形成用薄片。Apply the solution of the curable composition prepared by the above method on the peeling surface of the above light release film to form a coating film, and dry the coating film at 120°C for 2 minutes to form a 25 μm thick film. Thermosetting resin layer (I-C), and then make a sheet for forming thermosetting resin layer (I-C) formed by thermosetting resin layer (I-C) and light release film.

[層合體之製作]    實施例1~5、參考例1      去除表1所示之支撐層(II)形成用薄片之重剝離薄膜,使露出之第1黏著劑層(X1),與表1所示之硬化性樹脂層(I)形成用薄片的硬化性樹脂層(I)的表面貼合,製得層合體。又,實施例5中,為使用日東電工股份有限公司製之製品名「REVALPHA 3195」(膨脹起始溫度(t)=170℃)作為支撐層(II-E)形成用薄片。      各例所得之層合體的分離性,及變形之評估結果係如表1所示。[Manufacture of laminated body] Examples 1-5, Reference Example 1 Remove the support layer (II) formation sheet shown in Table 1 and peel off the film so that the first adhesive layer (X1) exposed is the same as that shown in Table 1. The surface of the curable resin layer (I) of the curable resin layer (I) forming sheet shown was bonded together to obtain a laminate. In addition, in Example 5, Nitto Denko Co., Ltd. product name "REVALPHA 3195" (expansion initiation temperature (t) = 170° C.) was used as the support layer (II-E) forming sheet.  The evaluation results of separation and deformation of the laminates obtained in each example are shown in Table 1.

[硬化密封體之製作]      隨後,使用各例所得之層合體,依以下之順序製作硬化密封體。[Production of hardened sealing body] Then, using the laminated body obtained in each example, the hardened sealing body was produced in the following order.

(1)半導體晶片之載置      將層合體所具有的支撐層(II)側的輕剝離薄膜去除,使露出之支撐層(II)的第2黏著劑層(X2)的黏著表面貼附於支撐體(玻璃)。      隨後,亦去除硬化性樹脂層(I)側的輕剝離薄膜,於露出的硬化性樹脂層(I)的表面上,以與各半導體晶片的線路面為相反側的內面接觸硬化性樹脂層(I)的表面之方式,相隔必要的間隔載置9個半導體晶片(各個的晶片尺寸為6.4mm×6.4mm、晶片厚度為200μm(♯2000))。(1) Mounting of the semiconductor wafer Remove the light release film on the support layer (II) side of the laminate, and attach the exposed adhesive surface of the second adhesive layer (X2) of the support layer (II) to the support body (glass). Subsequently, the light release film on the side of the curable resin layer (I) is also removed, and on the surface of the exposed curable resin layer (I), the inner surface on the opposite side to the circuit surface of each semiconductor chip is in contact with the curable resin layer. In the form of the surface of (I), nine semiconductor wafers (each wafer size is 6.4 mm x 6.4 mm and wafer thickness is 200 μm (♯2000)) are placed at necessary intervals.

(2)硬化樹脂層(I’)的形成      於實施例1~5中,上述(1)之後、下述(3)之前,使用紫外線(UV)照射作為硬化性樹脂層(I)之能量線硬化性樹脂層(I),而形成載置有半導體晶片的硬化樹脂層(I’)。又,紫外線,為使用紫外線照射裝置RAD-2000(琳德股份有限公司製),由支撐體(玻璃)側,以照度215mW/cm2 、光量187mJ/cm2 之條件照射3次。      又,參考例1為,不實施(2)之步驟,而於後述(3)步驟中,於使密封材硬化之過程中,同時使作為硬化性樹脂層(I)之熱硬化性樹脂層硬化。(2) Formation of the cured resin layer (I') In Examples 1 to 5, after the above (1) and before the following (3), ultraviolet (UV) irradiation is used as the energy ray of the curable resin layer (I) The hardening resin layer (I) is formed to form the hardening resin layer (I') on which the semiconductor wafer is placed. In addition, ultraviolet rays were irradiated three times from the support (glass) side under conditions of illuminance 215 mW/cm 2 and light intensity 187 mJ/cm 2 using an ultraviolet irradiation device RAD-2000 (manufactured by Linde Corporation). Also, in Reference Example 1, the step (2) is not implemented, and in the step (3) described later, in the process of curing the sealing material, the thermosetting resin layer as the curable resin layer (I) is simultaneously cured. .

(3)硬化密封體之形成      使用密封材之熱硬化性的密封樹脂薄膜被覆於9個的上述半導體晶片,與該半導體晶片的至少周邊部之硬化樹脂層(I’)(參考例1中,為熱硬化性樹脂層)的表面上,再使用真空加熱加壓層合器(ROHM and HAAS公司製、製品名「7024HP5」),使密封樹脂薄膜進行熱硬化,而製得硬化密封體。又,密封條件係如下所述。      ・預熱溫度:床台及膜片(diaphragm)皆為100℃      ・真空拉伸:60秒鐘      ・動態加壓模式:30秒鐘      ・靜態加壓模式:10秒鐘      ・密封溫度:180℃×60分鐘(3) Formation of hardened sealing body The thermosetting sealing resin film of the sealing material is used to cover the above-mentioned 9 semiconductor wafers, and the hardened resin layer (I') of at least the peripheral portion of the semiconductor wafer (in reference example 1, On the surface of the thermosetting resin layer), the sealing resin film was thermally cured using a vacuum heat press laminator (manufactured by ROHM and HAAS, product name "7024HP5") to obtain a cured sealing body. In addition, the sealing conditions are as follows.・Preheating temperature: 100°C for bed and diaphragm (diaphragm) ・Vacuum stretching: 60 seconds ・Dynamic pressurization mode: 30 seconds ・Static pressurization mode: 10 seconds ・Sealing temperature: 180°C× 60 minutes

(4)界面P之分離      於上述(3)之後,將各層合體的支撐層(II)所含有的熱膨脹性粒子,於膨脹起始溫度(t)+30℃之溫度進行3分鐘之加熱膨脹處理,使支撐層(II)的第1黏著劑層(X1)與硬化樹脂層(I’)的界面P形成分離。依此方式,即製得附有硬化樹脂層的硬化密封體。(4) Separation of the interface P After the above (3), the heat-expandable particles contained in the support layer (II) of each laminate are subjected to heat-expansion treatment at the temperature of the expansion initiation temperature (t) + 30°C for 3 minutes , to separate the interface P between the first adhesive layer (X1) of the support layer (II) and the cured resin layer (I′). In this manner, a hardened sealing body with a hardened resin layer is produced.

Figure 02_image001
Figure 02_image001

由表1結果得知,使用本發明之一態樣的層合體的實施例1~5中,所形成的硬化密封體並未發生變形,且,支撐層(II)具有優良的分離性。      另一方面,硬化性樹脂層使用熱硬化性樹脂層之參考例1中,硬化樹脂層(I’)並無法與支撐層(II)形成分離。As can be seen from the results in Table 1, in Examples 1 to 5 using the laminate of an aspect of the present invention, the formed cured sealant was not deformed, and the support layer (II) had excellent separability. On the other hand, in Reference Example 1 where a thermosetting resin layer was used as the curable resin layer, the cured resin layer (I') could not be separated from the support layer (II).

1a、1b、2a、2b、3:層合體(I):能量線硬化性樹脂層(I’):硬化樹脂層(II):支撐層(X):黏著劑層(X1):第1黏著劑層(X2):第2黏著劑層(Y):基材(Y1):膨脹性基材層(Y2):非膨脹性基材層50:支撐體60:密封對象物(半導體晶片)70:密封材80:硬化密封體100:附有硬化樹脂層的硬化密封體100a:硬化密封體之面110:研削手段200:導線重佈層(RDL)300:外部端子電極1a, 1b, 2a, 2b, 3: laminate (I): energy ray curable resin layer (I'): curable resin layer (II): support layer (X): adhesive layer (X1): first adhesive Agent layer (X2): Second adhesive layer (Y): Base material (Y1): Expandable base material layer (Y2): Non-expandable base material layer 50: Support body 60: Object to be sealed (semiconductor wafer) 70 : Sealing material 80: Hardened sealing body 100: Hardened sealing body with hardened resin layer 100a: Surface of hardened sealing body 110: Grinding means 200: Conductor wire redistribution layer (RDL) 300: External terminal electrode

[圖1] 說明本發明之第一態樣的層合體之構成的該層合體之截面模式圖。      [圖2] 說明本發明之第二態樣的層合體之構成的該層合體之截面模式圖。      [圖3] 說明本發明之第三態樣的層合體之構成的該層合體之截面模式圖。      [圖4] 說明使用圖1(a)所示之層合體1a製造附有硬化樹脂層的硬化密封體的步驟之截面模式圖。      [圖5] 說明硬化密封體的加工方法之截面模式圖。[FIG. 1] A schematic cross-sectional view of the laminate illustrating the constitution of the laminate according to the first aspect of the present invention. [FIG. 2] A schematic cross-sectional view of the laminate illustrating the constitution of the laminate according to the second aspect of the present invention. [FIG. 3] A schematic cross-sectional view of the laminate illustrating the constitution of the laminate according to the third aspect of the present invention. [FIG. 4] A cross-sectional schematic diagram illustrating the steps of manufacturing a hardened sealing body with a hardened resin layer using the laminated body 1a shown in FIG. 1(a). [Fig. 5] It is a schematic cross-sectional view illustrating the processing method of the hardened sealing body.

1a、1b:層合體 1a, 1b: laminate

P:界面 P: interface

(X):黏著劑層 (X): adhesive layer

(Y):基材 (Y): Substrate

(Y1):膨脹性基材層 (Y1): Expandable substrate layer

(Y2):非膨脹性基材層 (Y2): Non-intumescent substrate layer

(I):能量線硬化性樹脂層 (I): Energy ray curable resin layer

(II):支撐層 (II): support layer

Claims (11)

一種層合體,其特徵為具有能量線硬化性樹脂層(I),與支撐該能量線硬化性樹脂層(I)的支撐層(II);能量線硬化性樹脂層(I),為具有具黏著性的表面,支撐層(II)為具有基材(Y)及黏著劑層(X),該基材(Y)及黏著劑層(X)之至少一者為含有熱膨脹性粒子,於由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)與支撐層(II)間,經使前述熱膨脹性粒子膨脹之處理,而於前述硬化樹脂層(I’)與前述支撐層(II)之界面形成分離。 A laminate characterized by having an energy ray-curable resin layer (I), and a support layer (II) supporting the energy ray-curable resin layer (I); the energy ray-curable resin layer (I) having Adhesive surface, the support layer (II) has a base material (Y) and an adhesive layer (X), at least one of the base material (Y) and the adhesive layer (X) contains thermally expandable particles, and is formed by Between the cured resin layer (I') formed by hardening the energy ray curable resin layer (I) and the support layer (II), the heat-expandable particles are expanded, and between the cured resin layer (I') and the support layer The interface of layer (II) forms a separation. 如請求項1之層合體,其中,由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)之23℃的儲存彈性率E’,為1.0×107~1.0×1013Pa。 The laminate according to claim 1, wherein the storage elastic modulus E' at 23°C of the cured resin layer (I') formed by curing the energy ray curable resin layer (I) is 1.0×10 7 to 1.0×10 13 Pa. 如請求項1或2之層合體,其中,能量線硬化性樹脂層(I)之厚度為1~500μm。 The laminate according to claim 1 or 2, wherein the thickness of the energy ray curable resin layer (I) is 1 to 500 μm. 如請求項1或2之層合體,其中,能量線硬化性樹脂層(I)之可見光穿透率為5%以上。 The laminate according to claim 1 or 2, wherein the visible light transmittance of the energy ray curable resin layer (I) is 5% or more. 如請求項1或2之層合體,其中,基材(Y)為具有含有 前述熱膨脹性粒子的膨脹性基材層(YI)。 The laminate according to claim 1 or 2, wherein the substrate (Y) has The expandable base material layer (YI) of the said thermally expandable particle. 如請求項5之層合體,其中,黏著劑層(X)為非膨脹性黏著劑層。 The laminate according to claim 5, wherein the adhesive layer (X) is a non-expandable adhesive layer. 如請求項5之層合體,其中,黏著劑層(X)與能量線硬化性樹脂層(I)為直接層合者。 The laminate according to claim 5, wherein the adhesive layer (X) and the energy ray curable resin layer (I) are directly laminated. 如請求項5之層合體,其中,基材(Y)為具有非膨脹性基材層(Y2)及膨脹性基材層(Y1),支撐層(II)為依序具有非膨脹性基材層(Y2)、膨脹性基材層(Y1),及黏著劑層(X),黏著劑層(X)與能量線硬化性樹脂層(I)為直接層合者。 The laminate according to claim 5, wherein the base material (Y) has a non-expandable base material layer (Y2) and an expandable base material layer (Y1), and the support layer (II) has a non-expandable base material layer in sequence The layer (Y2), the expandable substrate layer (Y1), and the adhesive layer (X), the adhesive layer (X) and the energy ray curable resin layer (I) are directly laminated. 如請求項1或2之層合體,其為用於形成包含密封對象物的硬化密封體者,其係於能量線硬化性樹脂層(I)的表面之一部份載置密封對象物,以能量線照射能量線硬化性樹脂層(I),而形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’),於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆, 該密封材熱硬化後,經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II)於前述硬化樹脂層(I’)與前述支撐層(II)之界面形成分離。 The laminated body according to claim 1 or 2, which is used to form a hardened sealing body containing a sealed object, wherein the sealed object is placed on a part of the surface of the energy ray curable resin layer (I), so that The energy ray irradiates the energy ray curable resin layer (I) to form a cured resin layer (I') formed by hardening the energy ray curable resin layer (I), on the aforementioned sealing object, and at least the periphery of the sealing object Part of the surface of the cured resin layer (I') is covered with a thermosetting sealing material, After the sealing material is thermally cured, the heat-expandable particles are expanded, so that the hardened resin layer (I') and the support layer (II) are formed at the interface between the hardened resin layer (I') and the support layer (II) separate. 如請求項9之層合體,其係用於防止前述硬化密封體之翹曲。 The laminated body according to claim 9, which is used to prevent warpage of the aforementioned hardened sealing body. 一種硬化密封體之製造方法,其為使用請求項1~10中任一項之層合體製造硬化密封體之方法,其特徵為,具有下述步驟(i)~(iv):步驟(i):於前述層合體所具有的能量線硬化性樹脂層(I)的表面之一部份,載置密封對象物之步驟步驟(ii):以能量線照射能量線硬化性樹脂層(I),形成由能量線硬化性樹脂層(I)硬化形成的硬化樹脂層(I’)之步驟步驟(iii):於前述密封對象物,與該密封對象物的至少周邊部份的硬化樹脂層(I’)之表面,以熱硬化性密封材被覆,使該密封材熱硬化,而形成包含前述密封對象物的硬化密封體之步驟步驟(iv):經使前述熱膨脹性粒子膨脹之處理,使硬化樹脂層(I’)與支撐層(II),於前述硬化樹脂層(I’)與前述支撐層(II)之界面形成分離,而製得附有硬化樹脂層的硬化密封體之步驟。 A method of manufacturing a hardened sealing body, which is a method of manufacturing a hardened sealing body using the laminate in any one of Claims 1 to 10, characterized in that it has the following steps (i) to (iv): Step (i) : Step (ii) of placing an object to be sealed on a part of the surface of the energy ray-curable resin layer (I) of the aforementioned laminate: irradiating the energy ray-curable resin layer (I) with energy rays, The step of forming the cured resin layer (I') formed by hardening the energy ray curable resin layer (I) Step (iii): On the aforementioned sealing object, the hardened resin layer (I') on at least the peripheral portion of the sealing object The surface of ') is covered with a thermosetting sealing material, and the sealing material is thermally cured to form a hardened sealing body containing the aforementioned object to be sealed Step (iv): After the treatment of expanding the aforementioned thermally expandable particles, harden The resin layer (I') and the supporting layer (II) are separated at the interface between the hardened resin layer (I') and the aforementioned supporting layer (II) to obtain a hardened sealing body with a hardened resin layer.
TW107134885A 2018-10-03 2018-10-03 Method for producing laminate and hardened seal TWI793186B (en)

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JP2009035635A (en) * 2007-08-01 2009-02-19 Nitto Denko Corp Stain resistant heat peelable adhesive sheet
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