TWI792566B - Method of manufacturing a circuit board - Google Patents
Method of manufacturing a circuit board Download PDFInfo
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- TWI792566B TWI792566B TW110134495A TW110134495A TWI792566B TW I792566 B TWI792566 B TW I792566B TW 110134495 A TW110134495 A TW 110134495A TW 110134495 A TW110134495 A TW 110134495A TW I792566 B TWI792566 B TW I792566B
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Abstract
Description
本申請涉及電路板領域,尤其涉及一種電路板的製作方法。 The present application relates to the field of circuit boards, in particular to a method for manufacturing a circuit board.
隨著電子產品的多樣化,對電路板的精度要求日益增加。然,面對線路分佈相對稀疏的電路板,其在電鍍製作線路時容易產生電鍍厚度不均勻的問題。 With the diversification of electronic products, the precision requirements for circuit boards are increasing. However, in the face of circuit boards with relatively sparse distribution of circuits, the problem of uneven plating thickness is likely to occur when making circuits by electroplating.
有鑑於此,本申請提供一種有利於降低電鍍不均勻的電路板的製作方法。 In view of this, the present application provides a method for manufacturing a circuit board that is beneficial to reduce uneven plating.
一種電路板的製作方法,包括以下步驟:提供一金屬基板,包括介電層及設置於所述金屬基板表面的金屬箔;在所述金屬箔背離所述介電層的一側壓合感光膜,並對所述感光膜進行曝光顯影形成感光圖形層,其中,所述圖形層包括多個線槽及位於相鄰二所述線槽之間的至少一輔助槽;電鍍以對應所述線槽形成線路部並對應所述輔助槽形成輔助導電部,其中,所述線路部及所述輔助導電部共同形成導電圖形層; 去除所述感光圖形層,並藉由快速蝕刻以去除所述金屬箔未被所述導電圖形層覆蓋而裸露的部分,從而將所述金屬箔製成與所述導電圖形層對應的導電圖案層,其中,所述線路部與所述導電圖案層中與所述線路部對應的部分構成導電線路,所述輔助導電部與所述導電圖案層中與所述輔助導電部對應的部分構成輔助圖形;及去除所述輔助圖形。 A method for manufacturing a circuit board, comprising the following steps: providing a metal substrate, including a dielectric layer and a metal foil disposed on the surface of the metal substrate; pressing a photosensitive film on the side of the metal foil facing away from the dielectric layer , and the photosensitive film is exposed and developed to form a photosensitive graphic layer, wherein the graphic layer includes a plurality of wire grooves and at least one auxiliary groove between two adjacent wire grooves; electroplating is used to correspond to the wire grooves forming a line part and forming an auxiliary conductive part corresponding to the auxiliary groove, wherein the line part and the auxiliary conductive part together form a conductive pattern layer; removing the photosensitive pattern layer, and removing the exposed part of the metal foil not covered by the conductive pattern layer by rapid etching, so that the metal foil is made into a conductive pattern layer corresponding to the conductive pattern layer , wherein, the line part and the part corresponding to the line part in the conductive pattern layer form a conductive line, and the auxiliary conductive part and the part corresponding to the auxiliary conductive part in the conductive pattern layer form an auxiliary pattern ; and removing the auxiliary graphics.
作為本申請一種方案,所述輔助圖形藉由蝕刻的方式去除。 As a solution of the present application, the auxiliary pattern is removed by etching.
作為本申請一種方案,所述輔助圖形藉由鑽孔的方式去除。 As a solution of the present application, the auxiliary pattern is removed by drilling.
作為本申請一種方案,藉由所述鑽孔的方式去除所述輔助圖形並在所述介電層上形成凹槽或貫穿孔,並藉由防焊材料或者樹脂材料對所述凹槽或者貫穿孔進行填充。 As a solution of the present application, the auxiliary pattern is removed by the drilling method and a groove or a through hole is formed on the dielectric layer, and the groove or the through hole is formed with a solder resist material or a resin material. The hole is filled.
作為本申請一種方案,所述金屬基板還包括至少一線路層,所述線路層內埋於所述介電層中並與所述金屬箔間隔。 As a solution of the present application, the metal substrate further includes at least one circuit layer, and the circuit layer is embedded in the dielectric layer and spaced from the metal foil.
作為本申請一種方案,二所述金屬箔設置於所述介電層的相對二側。 As a solution of the present application, the two metal foils are disposed on two opposite sides of the dielectric layer.
作為本申請一種方案,去除所述輔助圖形之後,還包括:對所述電路板進行增層。 As a solution of the present application, after removing the auxiliary pattern, further includes: building up the circuit board.
本申請的電路板的製作方法,其藉由先在電鍍形成導電圖形層時在所述線路部之間形成所述輔助導電部,而後再快速蝕刻形成導電線路與輔助圖形後將所述輔助圖形去除,從而實現在不影響電路板功能的情況下,有利於在電鍍時提升各處金屬沉積的均勻性使最後形成的各所述導電線路厚度更加均勻,進而提升電路板中線路的品質。 The manufacturing method of the circuit board of the present application, it forms the auxiliary conductive part between the circuit parts when electroplating to form the conductive pattern layer, and then quickly etches the conductive circuit and the auxiliary pattern to form the auxiliary pattern Remove, so as to achieve without affecting the function of the circuit board, it is beneficial to improve the uniformity of metal deposition everywhere during electroplating, so that the thickness of each of the conductive lines formed at last is more uniform, thereby improving the quality of the lines in the circuit board.
10:金屬基板 10: Metal substrate
11:介電層 11: Dielectric layer
13:金屬箔 13: metal foil
15:線路層 15: Line layer
151:第一線路層 151: The first line layer
153:第二線路層 153: Second line layer
30:感光膜 30: photosensitive film
30a:感光圖形層 30a: photosensitive graphics layer
31:線槽 31: trunking
33:輔助槽 33: Auxiliary slot
51:線路部 51: Line Department
53:輔助導電部 53: Auxiliary conductive part
50:導電圖形層 50: Conductive graphic layer
130:導電圖案層 130: conductive pattern layer
60:導電線路 60: Conductive circuit
63:輔助圖形 63: Auxiliary graphics
110:貫穿孔 110: through hole
70:單面金屬板 70:Single-sided metal plate
71:介質層 71: Dielectric layer
73:金屬層 73: metal layer
圖1為本申請一實施方式的金屬基板的剖面示意圖。 FIG. 1 is a schematic cross-sectional view of a metal substrate according to an embodiment of the present application.
圖2為在圖1所示的金屬基板上設置感光膜的剖面示意圖。 FIG. 2 is a schematic cross-sectional view of disposing a photosensitive film on the metal substrate shown in FIG. 1 .
圖3為將圖2所示的感光膜曝光顯影形成感光圖形層的剖面示意圖。 FIG. 3 is a schematic cross-sectional view of exposing and developing the photosensitive film shown in FIG. 2 to form a photosensitive graphic layer.
圖4為在圖3所示的金屬箔上形成導電圖形層的剖面示意圖。 FIG. 4 is a schematic cross-sectional view of forming a conductive pattern layer on the metal foil shown in FIG. 3 .
圖5為將圖4中的感光圖形層去除並形成導電圖案層的剖面示意圖。 FIG. 5 is a schematic cross-sectional view of removing the photosensitive pattern layer in FIG. 4 and forming a conductive pattern layer.
圖6為本申請一實施方式的電路板的剖面示意圖。 FIG. 6 is a schematic cross-sectional view of a circuit board according to an embodiment of the present application.
圖7為本申請另一實施方式的電路板的剖面示意圖。 FIG. 7 is a schematic cross-sectional view of a circuit board according to another embodiment of the present application.
圖8為本申請再一實施方式的電路板的剖面示意圖。 FIG. 8 is a schematic cross-sectional view of a circuit board according to yet another embodiment of the present application.
下面將結合本申請實施例中的圖式,對本申請實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例僅僅係本申請一部分實施例,而不係全部的實施例。 The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them.
除非另有定義,本文所使用的所有的技術及科學術語與屬於本申請的技術領域的技術人員通常理解的含義相同。本文中在本申請的說明書中所使用的術語只係為了描述具體的實施例的目的,不係旨在於限制本申請。 Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the application. The terms used herein in the description of the application are for the purpose of describing specific embodiments only, and are not intended to limit the application.
下面結合圖式,對本申請的一些實施方式作詳細說明。在不衝突的情況下,下述的實施例/實施方式及實施例/實施方式中的特徵可相互組合。 Some implementations of the present application will be described in detail below with reference to the drawings. In the case of no conflict, the following embodiments/implementations and features in the embodiments/implementations can be combined with each other.
請參閱圖1至圖6,本申請一實施方式的電路板的製作方法,其包括以下步驟: Please refer to Fig. 1 to Fig. 6, the manufacturing method of the circuit board of an embodiment of the present application, it comprises the following steps:
步驟S1,請參閱圖1,提供一金屬基板10,所述金屬基板10包括介電層11及設置於所述金屬基板10表面的金屬箔13。
Step S1 , please refer to FIG. 1 , providing a
在一些實施方式中,所述金屬基板10還可進一步包括至少一線路層15,所述線路層15內埋於所述介電層11中並與所述金屬箔13間隔。而本實施方式中,以所述金屬基板10包括二層線路層15為例進行說明。具體的,二所述線路層15分別為第一線路層151及第二線路層153,且所述第一線路層151與所述第二線路層153沿第一方向間隔並內埋於所述介電層11中。所述第一線路層151還可與所述第二線路層153電連接。
In some embodiments, the
在一些實施方式中,所述金屬箔13可形成於所述介電層11的一側或者多側。在本實施方式中,以所述金屬箔13形成於所述介電層11沿所述第一方向間隔的相對二側為例。
In some embodiments, the
在一些實施方式中,所述金屬箔13還可與所述線路層15電連接。在本實施方式中,具體的,臨近所述第一線路層151的所述金屬箔13可與所述第一線路層151電連接,臨近所述第二線路層153的所述金屬箔13可與所述第二線路層153電連接。
In some embodiments, the
步驟S2,請參閱圖2及圖3,在所述金屬箔13背離所述介電層11的一側壓合感光膜30,並對所述感光膜30進行曝光顯影形成感光圖形層30a。其中,每一所述感光圖形層30a包括多個線槽31及位於相鄰二所述線槽31之間的至少一輔助槽33。
Step S2, please refer to FIG. 2 and FIG. 3 , press the
在本實施方式中,二所述感光膜30分別壓合至二所述金屬箔13上並對其曝光顯影對應形成二感光圖形層30a。
In this embodiment, the two
步驟S3,請參閱圖4,電鍍以對應所述線槽31形成線路部51並對應所述輔助槽33形成輔助導電部53,其中,所述線路部51及所述輔助導電部53共同形成導電圖形層50。
Step S3, please refer to FIG. 4 , electroplating to form a
在本實施方式中,二所述導電圖形層50分別形成於二所述金屬箔13的表面。
In this embodiment, the two
由於位於二所述線槽31之間的所述輔助槽33的存在,使得電鍍形成所述線路部51時同時對應所述輔助槽33在相鄰二所述線路部51之間形成輔助導電部53,有利於平衡電鍍時的電流,從而有利於電鍍時各處金屬沉積的均勻性,進而使得的各所述線路部51的厚度更加均勻。
Due to the existence of the
步驟S4,請參閱圖5,去除所述感光圖形層30a,並藉由快速蝕刻以去除所述金屬箔13未被所述導電圖形層50覆蓋而裸露的部分,從而將所述金屬箔13製成與所述導電圖形層50對應的導電圖案層130。其中,所述線路部51與所述導電圖案層130中與所述線路部51對應的部分構成導電線路60,所述輔助導電部53與所述導電圖案層130中與所述輔助導電部53對應的部分構成輔助圖形63。
Step S4, please refer to FIG. 5, remove the
在本實施方式中,二所述導電線路60分別形成於所述介電層11的相對二側,且二所述輔助圖形63分別形成於所述介電層11的相對二側。
In this embodiment, the two
步驟S5,請參閱圖6,去除所述輔助圖形63,從而製得所述電路板。
Step S5, please refer to FIG. 6 , remove the
在一些實施方式中,所述輔助圖形63可藉由局部蝕刻的方式去除。
In some embodiments, the
在一些實施方式中,所述輔助圖形63還可藉由鑽孔的方式去除。其中,鑽孔的深度保證完全去除所述輔助圖形63即可。例如,鑽孔時剛好去除所述輔助圖形63;又如,鑽孔時同時還去除部分所述介電層11從而在所述介電層11上形成凹槽(圖未示),並藉由防焊材料(例如防焊油墨)或者樹脂材料對所述介電層11上的所述凹槽進行填充;再如,如圖7所示,鑽孔時在不破壞所述介電層11內部線路的前提下,去除所述輔助圖形63的同時貫穿所述介電層11從而在所述介電層11上形成貫穿孔110,並藉由防焊材料或者樹脂材料對所述介電層11上的所述貫穿孔110進行填充。
In some embodiments, the
在其他實施方式中,所述輔助圖形63還可藉由其他方式去除,不僅限於上述描述的方式。
In other implementations, the
在一些實施方式中,所述電路板的製作方法在步驟S5之後還可進一步地包括步驟S6,如圖8所示,在所述導電線路60上壓合單面金屬板70並進行棕化,以進行後續增層作業。其中,所述單面金屬板70包括層疊的介質層71與金屬層73,所述介質層71背離所述金屬層73的一側與所述導電線路60結合。
In some embodiments, the manufacturing method of the circuit board may further include step S6 after step S5, as shown in FIG. 8 , pressing a single-
本申請的電路板的製作方法,其藉由先在電鍍形成導電圖形層50時在所述線路部51之間形成所述輔助導電部53,而後再快速蝕刻形成導電線路60與輔助圖形63後將所述輔助圖形63去除,從而實現在不影響電路板功能的情況下,有利於在電鍍時提升各處金屬沉積的均勻性使最後形成的各所述導電線路60厚度更加均勻,進而提升電路板中線路的品質。
The manufacturing method of the circuit board of the present application is to form the auxiliary
11:介電層 11: Dielectric layer
13:金屬箔 13: metal foil
30a:感光圖形層 30a: photosensitive graphics layer
31:線槽 31: trunking
33:輔助槽 33: Auxiliary slot
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CN202111063424.9A CN115802607A (en) | 2021-09-10 | 2021-09-10 | Method for manufacturing circuit board |
CN202111063424.9 | 2021-09-10 |
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TW200952588A (en) * | 2008-06-11 | 2009-12-16 | Advanced Semiconductor Eng | Circuit board with buried conductive trace formed thereon and method for manufacturing the same |
CN103384453A (en) * | 2013-07-11 | 2013-11-06 | 电子科技大学 | Processing method of inner-layer reliable hole and line of printed circuit |
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TW200952588A (en) * | 2008-06-11 | 2009-12-16 | Advanced Semiconductor Eng | Circuit board with buried conductive trace formed thereon and method for manufacturing the same |
CN103384453A (en) * | 2013-07-11 | 2013-11-06 | 电子科技大学 | Processing method of inner-layer reliable hole and line of printed circuit |
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