TWI741141B - Adhesive composition for polarizing film, polarizing film, optical film and image display device - Google Patents
Adhesive composition for polarizing film, polarizing film, optical film and image display device Download PDFInfo
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- TWI741141B TWI741141B TW107104303A TW107104303A TWI741141B TW I741141 B TWI741141 B TW I741141B TW 107104303 A TW107104303 A TW 107104303A TW 107104303 A TW107104303 A TW 107104303A TW I741141 B TWI741141 B TW I741141B
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- Taiwan
- Prior art keywords
- meth
- polarizing film
- acrylate
- adhesive composition
- film
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- 239000000853 adhesive Substances 0.000 title claims abstract description 192
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 192
- 239000000203 mixture Substances 0.000 title claims abstract description 192
- 239000010408 film Substances 0.000 title claims description 268
- 239000012788 optical film Substances 0.000 title claims description 26
- 239000003112 inhibitor Substances 0.000 claims abstract description 48
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 11
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 153
- 239000012790 adhesive layer Substances 0.000 claims description 88
- 230000001681 protective effect Effects 0.000 claims description 88
- 239000010410 layer Substances 0.000 claims description 39
- 230000001568 sexual effect Effects 0.000 claims description 3
- -1 polysiloxane Polymers 0.000 abstract description 112
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 129
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 56
- 150000003254 radicals Chemical class 0.000 description 48
- 229920002451 polyvinyl alcohol Polymers 0.000 description 34
- 239000004372 Polyvinyl alcohol Substances 0.000 description 33
- 238000001723 curing Methods 0.000 description 33
- 239000011342 resin composition Substances 0.000 description 29
- 239000000047 product Substances 0.000 description 28
- 230000000694 effects Effects 0.000 description 27
- 125000004122 cyclic group Chemical group 0.000 description 25
- 229920000642 polymer Polymers 0.000 description 25
- 230000003287 optical effect Effects 0.000 description 24
- 229920000647 polyepoxide Polymers 0.000 description 24
- 239000003822 epoxy resin Substances 0.000 description 23
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 22
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 22
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 22
- 238000000576 coating method Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 21
- 125000000524 functional group Chemical group 0.000 description 20
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 19
- 239000003999 initiator Substances 0.000 description 19
- 239000004973 liquid crystal related substance Substances 0.000 description 18
- 150000002902 organometallic compounds Chemical class 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 239000000126 substance Substances 0.000 description 18
- 238000010030 laminating Methods 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000010521 absorption reaction Methods 0.000 description 15
- 125000003700 epoxy group Chemical group 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- 239000007870 radical polymerization initiator Substances 0.000 description 14
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 13
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 12
- 239000006087 Silane Coupling Agent Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 239000003505 polymerization initiator Substances 0.000 description 11
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 150000001336 alkenes Chemical class 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 150000001450 anions Chemical class 0.000 description 9
- 125000002091 cationic group Chemical group 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 8
- 150000003926 acrylamides Chemical class 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 8
- 238000006356 dehydrogenation reaction Methods 0.000 description 8
- 238000004043 dyeing Methods 0.000 description 8
- 229910052740 iodine Inorganic materials 0.000 description 8
- 239000011630 iodine Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 125000003566 oxetanyl group Chemical group 0.000 description 8
- 229920000570 polyether Polymers 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- 229920000858 Cyclodextrin Polymers 0.000 description 7
- 239000004721 Polyphenylene oxide Substances 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 230000010287 polarization Effects 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 238000003419 tautomerization reaction Methods 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical group OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 210000002858 crystal cell Anatomy 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 5
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920000098 polyolefin Polymers 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 229960000834 vinyl ether Drugs 0.000 description 5
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 4
- JUXZNIDKDPLYBY-UHFFFAOYSA-N 3-ethyl-3-(phenoxymethyl)oxetane Chemical compound C=1C=CC=CC=1OCC1(CC)COC1 JUXZNIDKDPLYBY-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 150000004292 cyclic ethers Chemical group 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000004843 novolac epoxy resin Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- 229920002284 Cellulose triacetate Polymers 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- RODZIAKMFCIGPL-UHFFFAOYSA-N P.I.I Chemical compound P.I.I RODZIAKMFCIGPL-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 150000004982 aromatic amines Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229920005601 base polymer Polymers 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000000269 nucleophilic effect Effects 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical group O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical class C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 2
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 2
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 2
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- DORYUYZNWCZQOL-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-phenylphenyl)butan-1-one Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 DORYUYZNWCZQOL-UHFFFAOYSA-N 0.000 description 2
- MZNSQRLUUXWLSB-UHFFFAOYSA-N 2-ethenyl-1h-pyrrole Chemical compound C=CC1=CC=CN1 MZNSQRLUUXWLSB-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 2
- BIDWUUDRRVHZLQ-UHFFFAOYSA-N 3-ethyl-3-(2-ethylhexoxymethyl)oxetane Chemical compound CCCCC(CC)COCC1(CC)COC1 BIDWUUDRRVHZLQ-UHFFFAOYSA-N 0.000 description 2
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- AAWINMXGBBFQRZ-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid;(3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)C(O)=O.OCC(C)(C)COC(=O)C=C AAWINMXGBBFQRZ-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 2
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 2
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229920001450 Alpha-Cyclodextrin Polymers 0.000 description 2
- 229910017008 AsF 6 Inorganic materials 0.000 description 2
- XDUZWPPSSHEDFK-VVXQKDJTSA-N C(C(C)(C)C)C([C@H](O)[C@H](O)CO)O Chemical compound C(C(C)(C)C)C([C@H](O)[C@H](O)CO)O XDUZWPPSSHEDFK-VVXQKDJTSA-N 0.000 description 2
- 229910020366 ClO 4 Inorganic materials 0.000 description 2
- ICMAFTSLXCXHRK-UHFFFAOYSA-N Ethyl pentanoate Chemical group CCCCC(=O)OCC ICMAFTSLXCXHRK-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000001116 FEMA 4028 Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 206010040880 Skin irritation Diseases 0.000 description 2
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- HLXRWTJXGMHOFN-XJSNKYLASA-N Verbenalin Chemical compound O([C@@H]1OC=C([C@H]2C(=O)C[C@H](C)[C@H]21)C(=O)OC)[C@@H]1O[C@H](CO)[C@@H](O)[C@H](O)[C@H]1O HLXRWTJXGMHOFN-XJSNKYLASA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- HFHDHCJBZVLPGP-RWMJIURBSA-N alpha-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO HFHDHCJBZVLPGP-RWMJIURBSA-N 0.000 description 2
- 229940043377 alpha-cyclodextrin Drugs 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- WHGYBXFWUBPSRW-FOUAGVGXSA-N beta-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO WHGYBXFWUBPSRW-FOUAGVGXSA-N 0.000 description 2
- 235000011175 beta-cyclodextrine Nutrition 0.000 description 2
- 229960004853 betadex Drugs 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 150000002497 iodine compounds Chemical class 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 2
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 238000007344 nucleophilic reaction Methods 0.000 description 2
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 230000036556 skin irritation Effects 0.000 description 2
- 231100000475 skin irritation Toxicity 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 235000021286 stilbenes Nutrition 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 2
- JZRWCGZRTZMZEH-UHFFFAOYSA-N thiamine Chemical compound CC1=C(CCO)SC=[N+]1CC1=CN=C(C)N=C1N JZRWCGZRTZMZEH-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- LAOHSTYFUKBMQN-UHFFFAOYSA-N (4-phenylphenyl) prop-2-enoate Chemical compound C1=CC(OC(=O)C=C)=CC=C1C1=CC=CC=C1 LAOHSTYFUKBMQN-UHFFFAOYSA-N 0.000 description 1
- HIYIGPVBMDKPCR-UHFFFAOYSA-N 1,1-bis(ethenoxymethyl)cyclohexane Chemical compound C=COCC1(COC=C)CCCCC1 HIYIGPVBMDKPCR-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- HGCMSCWGVAYWHR-UHFFFAOYSA-N 1,3,5-trimethyl-2-[[phenyl-[(2,4,6-trimethylphenyl)methyl]phosphoryl]methyl]benzene Chemical compound CC1=CC(C)=CC(C)=C1CP(=O)(C=1C=CC=CC=1)CC1=C(C)C=C(C)C=C1C HGCMSCWGVAYWHR-UHFFFAOYSA-N 0.000 description 1
- QOSTVEDABRQTSU-UHFFFAOYSA-N 1,4-bis(methylamino)anthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(NC)=CC=C2NC QOSTVEDABRQTSU-UHFFFAOYSA-N 0.000 description 1
- YGOKTRWIJMNYPH-UHFFFAOYSA-N 1,5-bis(methylamino)anthracene-9,10-dione Chemical compound O=C1C2=C(NC)C=CC=C2C(=O)C2=C1C=CC=C2NC YGOKTRWIJMNYPH-UHFFFAOYSA-N 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- UYBGGSUXZMAIBV-UHFFFAOYSA-N 1-(9,10-dioxoanthracen-2-yl)ethyl 1h-imidazole-2-carboxylate Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C(C)OC(=O)C1=NC=CN1 UYBGGSUXZMAIBV-UHFFFAOYSA-N 0.000 description 1
- HWCLMKDWXUGDKL-UHFFFAOYSA-N 1-ethenoxy-2-ethoxyethane Chemical compound CCOCCOC=C HWCLMKDWXUGDKL-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- UBPXWZDJZFZKGH-UHFFFAOYSA-N 1-ethenyl-3-methylpyrrolidin-2-one Chemical compound CC1CCN(C=C)C1=O UBPXWZDJZFZKGH-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- PBGPBHYPCGDFEZ-UHFFFAOYSA-N 1-ethenylpiperidin-2-one Chemical compound C=CN1CCCCC1=O PBGPBHYPCGDFEZ-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- RESPXSHDJQUNTN-UHFFFAOYSA-N 1-piperidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCCC1 RESPXSHDJQUNTN-UHFFFAOYSA-N 0.000 description 1
- WLPAQAXAZQUXBG-UHFFFAOYSA-N 1-pyrrolidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCC1 WLPAQAXAZQUXBG-UHFFFAOYSA-N 0.000 description 1
- RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 1
- ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 1H-imidazole silane Chemical compound [SiH4].N1C=NC=C1 ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LZHUBCULTHIFNO-UHFFFAOYSA-N 2,4-dihydroxy-1,5-bis[4-(2-hydroxyethoxy)phenyl]-2,4-dimethylpentan-3-one Chemical compound C=1C=C(OCCO)C=CC=1CC(C)(O)C(=O)C(O)(C)CC1=CC=C(OCCO)C=C1 LZHUBCULTHIFNO-UHFFFAOYSA-N 0.000 description 1
- CEGGECULKVTYMM-UHFFFAOYSA-N 2,6-dimethylheptane-3,5-dione Chemical compound CC(C)C(=O)CC(=O)C(C)C CEGGECULKVTYMM-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- LESMLVDJJCWZAJ-UHFFFAOYSA-N 2-(diphenylphosphorylmethyl)-1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 LESMLVDJJCWZAJ-UHFFFAOYSA-N 0.000 description 1
- WZWXRQASCOKEEG-UHFFFAOYSA-N 2-(prop-2-enoylamino)ethyl 2-cyanoacetate Chemical compound C=CC(=O)NCCOC(=O)CC#N WZWXRQASCOKEEG-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- FESDHLLVLYZNFY-UHFFFAOYSA-N 2-benzylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1CC1=CC=CC=C1 FESDHLLVLYZNFY-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZDHWTWWXCXEGIC-UHFFFAOYSA-N 2-ethenylpyrimidine Chemical compound C=CC1=NC=CC=N1 ZDHWTWWXCXEGIC-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- WVQHODUGKTXKQF-UHFFFAOYSA-N 2-ethyl-2-methylhexane-1,1-diol Chemical compound CCCCC(C)(CC)C(O)O WVQHODUGKTXKQF-UHFFFAOYSA-N 0.000 description 1
- CBECDWUDYQOTSW-UHFFFAOYSA-N 2-ethylbut-3-enal Chemical compound CCC(C=C)C=O CBECDWUDYQOTSW-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- YRNDGUSDBCARGC-UHFFFAOYSA-N 2-methoxyacetophenone Chemical compound COCC(=O)C1=CC=CC=C1 YRNDGUSDBCARGC-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- YRRAEYCMWVQGAG-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-phenylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)C1=CC=CC=C1 YRRAEYCMWVQGAG-UHFFFAOYSA-N 0.000 description 1
- RASDUGQQSMMINZ-UHFFFAOYSA-N 2-methyl-1-piperidin-1-ylprop-2-en-1-one Chemical compound CC(=C)C(=O)N1CCCCC1 RASDUGQQSMMINZ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- KWVIBDAKHDJCNY-UHFFFAOYSA-N 20alpha-atisine Natural products C12CCC3(C(C4=C)O)CCC4CC3C11CCCC2(C)CN2CCOC21 KWVIBDAKHDJCNY-UHFFFAOYSA-N 0.000 description 1
- OZFSDOFRXYCNKS-UHFFFAOYSA-N 3-[diethoxy(1-phenylpropan-2-yloxy)silyl]-n-ethenylpropan-1-amine Chemical compound C=CNCCC[Si](OCC)(OCC)OC(C)CC1=CC=CC=C1 OZFSDOFRXYCNKS-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- OXKAXHPVFLEQHV-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropan-1-amine Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCN OXKAXHPVFLEQHV-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- VNGLVZLEUDIDQH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-methyloxirane Chemical compound CC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 VNGLVZLEUDIDQH-UHFFFAOYSA-N 0.000 description 1
- WPSWDCBWMRJJED-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;oxirane Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WPSWDCBWMRJJED-UHFFFAOYSA-N 0.000 description 1
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
- SKLLASZUGHQRDL-UHFFFAOYSA-N 4-hydroxy-2-methylidene-5-phenoxypentanoic acid Chemical compound OC(=O)C(=C)CC(O)COC1=CC=CC=C1 SKLLASZUGHQRDL-UHFFFAOYSA-N 0.000 description 1
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- OSSMYOQKNHMTIP-UHFFFAOYSA-N 5-[dimethoxy(methyl)silyl]pentane-1,3-diamine Chemical compound CO[Si](C)(OC)CCC(N)CCN OSSMYOQKNHMTIP-UHFFFAOYSA-N 0.000 description 1
- KHZGUWAFFHXZLC-UHFFFAOYSA-N 5-methylhexane-2,4-dione Chemical compound CC(C)C(=O)CC(C)=O KHZGUWAFFHXZLC-UHFFFAOYSA-N 0.000 description 1
- IGMOYJSFRIASIE-UHFFFAOYSA-N 6-Methylheptan-2,4-dione Chemical compound CC(C)CC(=O)CC(C)=O IGMOYJSFRIASIE-UHFFFAOYSA-N 0.000 description 1
- JSZCJJRQCFZXCI-UHFFFAOYSA-N 6-prop-2-enoyloxyhexanoic acid Chemical compound OC(=O)CCCCCOC(=O)C=C JSZCJJRQCFZXCI-UHFFFAOYSA-N 0.000 description 1
- IXKVYKPPJAWZLH-UHFFFAOYSA-N 7-thiabicyclo[4.1.0]hepta-2,4-diene Chemical compound C1=CC=CC2SC21 IXKVYKPPJAWZLH-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- OKJADYKTJJGKDX-UHFFFAOYSA-N Butyl pentanoate Chemical group CCCCOC(=O)CCCC OKJADYKTJJGKDX-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- XNHJPNPNLMENTO-OKILXGFUSA-N C(C(C)(C)C)[C@@]([C@](CO)(O)CC(C)(C)C)(O)CO Chemical compound C(C(C)(C)C)[C@@]([C@](CO)(O)CC(C)(C)C)(O)CO XNHJPNPNLMENTO-OKILXGFUSA-N 0.000 description 1
- SRPBBQKGRCJHNL-UHFFFAOYSA-N CC(C(CNC(C=C)=O)NC(C)=O)=O Chemical compound CC(C(CNC(C=C)=O)NC(C)=O)=O SRPBBQKGRCJHNL-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- 229920001651 Cyanoacrylate Polymers 0.000 description 1
- 229920001353 Dextrin Polymers 0.000 description 1
- 239000004375 Dextrin Substances 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- OFQRUTMGVBMTFQ-UHFFFAOYSA-N Ethyl 4-methylpentanoate Chemical group CCOC(=O)CCC(C)C OFQRUTMGVBMTFQ-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 101000720524 Gordonia sp. (strain TY-5) Acetone monooxygenase (methyl acetate-forming) Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920005692 JONCRYL® Polymers 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FUHBSOUWXAIQLE-UHFFFAOYSA-N N-(diethoxymethylsilylmethyl)cyclohexanamine Chemical compound CCOC(OCC)[SiH2]CNC1CCCCC1 FUHBSOUWXAIQLE-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- FMZQRLVDRCWTRA-UHFFFAOYSA-N N-[3-formamido-4-(2-phenylethenyl)phenyl]formamide Chemical compound C(=O)NC1=C(C=CC(=C1)NC=O)C=CC1=CC=CC=C1 FMZQRLVDRCWTRA-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HLXRWTJXGMHOFN-UHFFFAOYSA-N Verbenalin Natural products C12C(C)CC(=O)C2C(C(=O)OC)=COC1OC1OC(CO)C(O)C(O)C1O HLXRWTJXGMHOFN-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000008619 Xingren Substances 0.000 description 1
- MOOIXEMFUKBQLJ-UHFFFAOYSA-N [1-(ethenoxymethyl)cyclohexyl]methanol Chemical compound C=COCC1(CO)CCCCC1 MOOIXEMFUKBQLJ-UHFFFAOYSA-N 0.000 description 1
- UIDZKLBCABAXMS-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCC(CO)CC1 UIDZKLBCABAXMS-UHFFFAOYSA-N 0.000 description 1
- CGZIAILFYADRSQ-UHFFFAOYSA-N [4-[(prop-2-enoylamino)methyl]phenyl]methyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC1=CC=C(CNC(=O)C=C)C=C1 CGZIAILFYADRSQ-UHFFFAOYSA-N 0.000 description 1
- WYBZFSGKJOYRQH-UHFFFAOYSA-N [nitro(phenyl)methyl] carbamate Chemical group NC(=O)OC([N+]([O-])=O)C1=CC=CC=C1 WYBZFSGKJOYRQH-UHFFFAOYSA-N 0.000 description 1
- KSZVHVUMUSIKTC-UHFFFAOYSA-N acetic acid;propan-2-one Chemical compound CC(C)=O.CC(O)=O KSZVHVUMUSIKTC-UHFFFAOYSA-N 0.000 description 1
- VKVOKQTWSYMEAI-UHFFFAOYSA-N acetyl 2-methylpropanoate Chemical group CC(C)C(=O)OC(C)=O VKVOKQTWSYMEAI-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000006307 alkoxy benzyl group Chemical group 0.000 description 1
- 125000000278 alkyl amino alkyl group Chemical group 0.000 description 1
- YYCNOHYMCOXPPJ-UHFFFAOYSA-N alumane;nickel Chemical class [AlH3].[Ni] YYCNOHYMCOXPPJ-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- JERAEGPJHSIFOW-UHFFFAOYSA-N benzyl(nitro)carbamic acid Chemical group OC(=O)N([N+]([O-])=O)CC1=CC=CC=C1 JERAEGPJHSIFOW-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 125000005619 boric acid group Chemical group 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 229920003174 cellulose-based polymer Polymers 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 229920005565 cyclic polymer Polymers 0.000 description 1
- 229940097362 cyclodextrins Drugs 0.000 description 1
- VEIOBOXBGYWJIT-UHFFFAOYSA-N cyclohexane;methanol Chemical compound OC.OC.C1CCCCC1 VEIOBOXBGYWJIT-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 235000019425 dextrin Nutrition 0.000 description 1
- 229920005994 diacetyl cellulose Polymers 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical class OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 238000001227 electron beam curing Methods 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- XCLDSQRVMMXWMS-UHFFFAOYSA-N ethyl 4-methyl-3-oxopentanoate Chemical group CCOC(=O)CC(=O)C(C)C XCLDSQRVMMXWMS-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- UKFXDFUAPNAMPJ-UHFFFAOYSA-N ethylmalonic acid Chemical group CCC(C(O)=O)C(O)=O UKFXDFUAPNAMPJ-UHFFFAOYSA-N 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- GDSRMADSINPKSL-HSEONFRVSA-N gamma-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO GDSRMADSINPKSL-HSEONFRVSA-N 0.000 description 1
- 229940080345 gamma-cyclodextrin Drugs 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000012835 hanging drop method Methods 0.000 description 1
- DGCTVLNZTFDPDJ-UHFFFAOYSA-N heptane-3,5-dione Chemical compound CCC(=O)CC(=O)CC DGCTVLNZTFDPDJ-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229940077844 iodine / potassium iodide Drugs 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007794 irritation Effects 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 150000004658 ketimines Chemical class 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-L methylmalonate(2-) Chemical group [O-]C(=O)C(C)C([O-])=O ZIYVHBGGAOATLY-UHFFFAOYSA-L 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 150000002780 morpholines Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 description 1
- HZGIOLNCNORPKR-UHFFFAOYSA-N n,n'-bis(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCC[Si](OC)(OC)OC HZGIOLNCNORPKR-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- WUFHQGLVNNOXMP-UHFFFAOYSA-N n-(triethoxysilylmethyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CNC1CCCCC1 WUFHQGLVNNOXMP-UHFFFAOYSA-N 0.000 description 1
- VNBLTKHUCJLFSB-UHFFFAOYSA-N n-(trimethoxysilylmethyl)aniline Chemical compound CO[Si](OC)(OC)CNC1=CC=CC=C1 VNBLTKHUCJLFSB-UHFFFAOYSA-N 0.000 description 1
- KNGXNIKIUROCEZ-UHFFFAOYSA-N n-[4-(4-formamido-3-methylphenyl)-2-methylphenyl]formamide Chemical group C1=C(NC=O)C(C)=CC(C=2C=C(C)C(NC=O)=CC=2)=C1 KNGXNIKIUROCEZ-UHFFFAOYSA-N 0.000 description 1
- XWVCGVPSPHTRHE-BQYQJAHWSA-N n-[4-[(e)-2-phenylethenyl]phenyl]acetamide Chemical compound C1=CC(NC(=O)C)=CC=C1\C=C\C1=CC=CC=C1 XWVCGVPSPHTRHE-BQYQJAHWSA-N 0.000 description 1
- QRIJEPHXWKXBDD-UHFFFAOYSA-N n-anthracen-1-ylacetamide Chemical compound C1=CC=C2C=C3C(NC(=O)C)=CC=CC3=CC2=C1 QRIJEPHXWKXBDD-UHFFFAOYSA-N 0.000 description 1
- PKGAPYCRMCGSNJ-UHFFFAOYSA-N n-anthracen-1-ylformamide Chemical compound C1=CC=C2C=C3C(NC=O)=CC=CC3=CC2=C1 PKGAPYCRMCGSNJ-UHFFFAOYSA-N 0.000 description 1
- CLYWMXVFAMGARU-UHFFFAOYSA-N n-benzyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCC1=CC=CC=C1 CLYWMXVFAMGARU-UHFFFAOYSA-N 0.000 description 1
- DYLMGWPMAXPGEB-UHFFFAOYSA-N n-ethoxy-2-methylprop-2-enamide Chemical compound CCONC(=O)C(C)=C DYLMGWPMAXPGEB-UHFFFAOYSA-N 0.000 description 1
- FRDNYWXDODPUJV-UHFFFAOYSA-N n-ethyl-2-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CCNCC(C)C[Si](OC)(OC)OC FRDNYWXDODPUJV-UHFFFAOYSA-N 0.000 description 1
- SXEQNYJKZGIDTG-UHFFFAOYSA-N n-methoxy-2-methylprop-2-enamide Chemical compound CONC(=O)C(C)=C SXEQNYJKZGIDTG-UHFFFAOYSA-N 0.000 description 1
- OKQIEBVRUGLWOR-UHFFFAOYSA-N n-naphthalen-1-ylacetamide Chemical compound C1=CC=C2C(NC(=O)C)=CC=CC2=C1 OKQIEBVRUGLWOR-UHFFFAOYSA-N 0.000 description 1
- CGRYTQQVSFZYCI-UHFFFAOYSA-N n-naphthalen-1-ylformamide Chemical compound C1=CC=C2C(NC=O)=CC=CC2=C1 CGRYTQQVSFZYCI-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JTHNLKXLWOXOQK-UHFFFAOYSA-N n-propyl vinyl ketone Natural products CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 1
- OPECTNGATDYLSS-UHFFFAOYSA-N naphthalene-2-sulfonyl chloride Chemical compound C1=CC=CC2=CC(S(=O)(=O)Cl)=CC=C21 OPECTNGATDYLSS-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- GUEMHMJRIFUWFS-UHFFFAOYSA-N oxetane;phenol Chemical compound C1COC1.OC1=CC=CC=C1.OC1=CC=CC=C1 GUEMHMJRIFUWFS-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 238000009840 oxygen flask method Methods 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 150000004291 polyenes Chemical class 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 125000003263 primary aromatic amine group Chemical group 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- GVIIRWAJDFKJMJ-UHFFFAOYSA-N propan-2-yl 3-oxobutanoate Chemical compound CC(C)OC(=O)CC(C)=O GVIIRWAJDFKJMJ-UHFFFAOYSA-N 0.000 description 1
- OCAIYHCKLADPEG-UHFFFAOYSA-N propan-2-yl pentanoate Chemical group CCCCC(=O)OC(C)C OCAIYHCKLADPEG-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical group CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 125000003155 secondary aromatic amine group Chemical group 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 230000037380 skin damage Effects 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002335 surface treatment layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000006337 tetrafluoro ethyl group Chemical group 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 235000019157 thiamine Nutrition 0.000 description 1
- 239000011721 thiamine Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 238000009816 wet lamination Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J135/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J135/02—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/868—Arrangements for polarized light emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/318—Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of liquid crystal displays
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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Abstract
本發明是使用一種偏光薄膜用接著劑組成物,其含有活性能量線硬化性成分、及具有反應性基之氣泡抑制劑。宜使用聚矽氧系氣泡抑制劑作為氣泡抑制劑,並且氣泡抑制劑以具有(甲基)丙烯醯基作為反應性基者為佳。氣泡抑制劑可為具有胺甲酸酯鍵者,亦可為具有三聚異氰酸酯環結構者。The present invention uses an adhesive composition for a polarizing film, which contains an active energy ray curable component and a bubble inhibitor having a reactive group. It is preferable to use a polysiloxane-based bubble suppressor as the bubble suppressor, and the bubble suppressor preferably has a (meth)acrylic acid group as a reactive group. The bubble inhibitor may be one having a urethane bond, or one having a trimeric isocyanate ring structure.
Description
本發明是關於偏光薄膜用接著劑組成物、偏光薄膜、光學薄膜及影像顯示裝置。該偏光薄膜可單獨或是以將其積層為光學薄膜的形式來形成液晶顯示裝置(LCD)、有機EL顯示裝置、CRT、PDP等影像顯示裝置。The present invention relates to an adhesive composition for a polarizing film, a polarizing film, an optical film, and an image display device. The polarizing film can be used alone or laminated as an optical film to form an image display device such as a liquid crystal display device (LCD), an organic EL display device, a CRT, or a PDP.
發明背景 液晶顯示裝置於時鐘、行動電話、PDA、筆記型電腦、電腦用顯示器、DVD播放器、TV等用途上的市場正急速地擴張。液晶顯示裝置是經由液晶之切換(Switching)使偏光狀態可視化,基於其顯示原理會使用偏光件。特別是在TV等用途上,益趨追求高亮度、高對比、廣視角,且在偏光薄膜方面亦益趨追求高穿透率、高偏光度、高色再現性等。Background of the Invention The market for liquid crystal display devices for applications such as clocks, mobile phones, PDAs, notebook computers, computer monitors, DVD players, and TVs is rapidly expanding. The liquid crystal display device visualizes the polarization state through the switching of the liquid crystal, and uses a polarizer based on its display principle. Especially in TV and other applications, the pursuit of high brightness, high contrast, wide viewing angle, and the pursuit of high transmittance, high degree of polarization, high color reproducibility, etc. are also increasingly pursued in terms of polarizing films.
作為偏光件,由具有高穿透率、高偏光度來說,碘系偏光件最普遍廣為使用,其具有例如使聚乙烯醇(以下亦僅稱「PVA」)吸附碘並延伸而成之結構。一般而言偏光薄膜是使用藉由所謂水系接著劑在偏光件兩面貼合透明保護薄膜而成之物,且該水系接著劑是將聚乙烯醇系材料溶於水而成者(下述專利文獻1)。透明保護薄膜是使用透濕度高的三乙醯纖維素等。當使用前述水系接著劑時(即所謂濕式積層),在將偏光件與透明保護薄膜貼合後需要進行乾燥步驟。As a polarizer, iodine-based polarizers are the most commonly used in terms of high transmittance and high degree of polarization. For example, polyvinyl alcohol (hereinafter also referred to as "PVA") is formed by adsorbing iodine and extending it. structure. Generally speaking, a polarizing film is made by laminating a transparent protective film on both sides of a polarizer by a so-called water-based adhesive, and the water-based adhesive is made by dissolving a polyvinyl alcohol-based material in water (Patent Document below) 1). The transparent protective film is made of triacetyl cellulose with high moisture permeability. When the aforementioned water-based adhesive is used (so-called wet lamination), a drying step is required after bonding the polarizer and the transparent protective film.
另一方面,已提出一種活性能量線硬化性接著劑,以取代前述水系接著劑。使用活性能量線硬化性接著劑製造偏光薄膜時,因不需乾燥步驟,故能提升偏光薄膜之生產性。例如,本發明人等已提出使用N-取代醯胺系單體作為硬化性成分的自由基聚合型之活性能量線硬化性接著劑(下述專利文獻2)。On the other hand, an active energy ray curable adhesive has been proposed to replace the aforementioned water-based adhesive. When the active energy ray curable adhesive is used to manufacture the polarizing film, since the drying step is not required, the productivity of the polarizing film can be improved. For example, the inventors of the present invention have proposed a radical polymerization type active energy ray curable adhesive that uses an N-substituted amide-based monomer as a curable component (Patent Document 2 below).
先前技術文獻 專利文獻 專利文獻1:日本專利特開2001-296427號公報 專利文獻2:日本專利特開2012-052000號公報Prior Art Documents Patent Documents Patent Document 1: Japanese Patent Laid-Open No. 2001-296427 Patent Document 2: Japanese Patent Laid-Open No. 2012-052000
發明概要 發明欲解決之課題 然而,基於提升顯示器之品質的觀點,市場上對偏光薄膜逐漸有連至今並未視為問題之微小氣泡都要減低的要求。產生微小氣泡的原因有很多,例如在偏光件及透明保護薄膜等之薄膜貼合步驟中,即使在為接著而塗佈之接著劑組成物中未含氣泡的情況下,也會因為貼合薄膜彼此時夾入空氣,而有在偏光件與透明保護薄膜之間產生被稱為所謂「積層氣泡(laminated bubbles)」之微小氣泡的情況。因此,過去市場上一直在尋求可抑制積層氣泡產生、並可形成能夠提升顯示器品質之接著劑層的偏光薄膜用接著劑組成物。Summary of the Invention Problems to be Solved by the Invention However, based on the viewpoint of improving the quality of displays, the market gradually requires polarizing films to reduce even the tiny bubbles that have not been regarded as a problem until now. There are many reasons for the generation of tiny bubbles. For example, in the film bonding step of polarizers and transparent protective films, even if there are no bubbles in the adhesive composition applied for bonding, it will be due to the bonding of the film. When air is sandwiched between each other, there are cases where tiny bubbles called "laminated bubbles" are generated between the polarizer and the transparent protective film. Therefore, in the past, the market has been seeking an adhesive composition for a polarizing film that can suppress the generation of laminated bubbles and can form an adhesive layer that can improve the quality of the display.
本發明乃有鑑於上述實情研發而成者,其目的在於提供一種作為接著劑層之原料的偏光薄膜用接著劑組成物,其至少可提升偏光件與透明保護薄膜之密著性,並可減少存在於兩者間之積層氣泡。The present invention was developed in view of the above facts, and its purpose is to provide an adhesive composition for polarizing films as the raw material of the adhesive layer, which can at least improve the adhesion between the polarizer and the transparent protective film and reduce Laminated bubbles that exist between the two.
用以解決課題之手段 本發明人等為解決上述課題而精心探究的結果,發現可藉由在偏光薄膜用接著劑組成物中摻混具有反應性基之氣泡抑制劑來達成上述目的,終至解決本發明之課題。Means to Solve the Problem The inventors of the present invention have carefully studied to solve the above-mentioned problem and found that the above-mentioned object can be achieved by mixing a bubble inhibitor having a reactive group in the adhesive composition for polarizing film. Solve the problem of the present invention.
即,本發明是有關於一種偏光薄膜用接著劑組成物,其特徵在於含有活性能量線硬化性成分、及具有反應性基之氣泡抑制劑。That is, the present invention relates to an adhesive composition for a polarizing film, which is characterized by containing an active energy ray curable component and a bubble inhibitor having a reactive group.
上述偏光薄膜用接著劑組成物中,前述氣泡抑制劑為具有反應性基之聚矽氧系氣泡抑制劑較佳。In the above-mentioned adhesive composition for polarizing films, the aforementioned bubble inhibitor is preferably a silicone-based bubble inhibitor having a reactive group.
上述偏光薄膜用接著劑組成物中,前述氣泡抑制劑以具有(甲基)丙烯醯基作為反應性基者為佳。In the above-mentioned adhesive composition for a polarizing film, it is preferable that the aforementioned bubble inhibitor has a (meth)acryloyl group as a reactive group.
上述偏光薄膜用接著劑組成物中,前述氣泡抑制劑為具有胺甲酸酯鍵者較佳。In the above-mentioned adhesive composition for polarizing films, the above-mentioned bubble inhibitor is preferably one having a urethane bond.
上述偏光薄膜用接著劑組成物中,前述氣泡抑制劑為具有三聚異氰酸酯環結構者較佳。In the above-mentioned adhesive composition for polarizing films, the above-mentioned bubble inhibitor is preferably one having a trimeric isocyanate ring structure.
上述偏光薄膜用接著劑組成物中,令組成物之總量為100重量%時,前述氣泡抑制劑之含量為0.01~0.6重量%較佳。In the above-mentioned adhesive composition for polarizing films, when the total amount of the composition is 100% by weight, the content of the aforementioned bubble inhibitor is preferably 0.01 to 0.6% by weight.
上述偏光薄膜用接著劑組成物中,其硬化前之表面張力為30mN/m以下較佳。In the aforementioned adhesive composition for polarizing films, the surface tension before curing is preferably 30 mN/m or less.
上述偏光薄膜用接著劑組成物中,其至少含有自由基聚合性化合物作為前述活性能量線硬化性成分為佳。In the above-mentioned adhesive composition for polarizing films, it is preferable that it contains at least a radical polymerizable compound as the active energy ray curable component.
又本發明是有關於一種偏光薄膜,其特徵在於在偏光件之至少一面隔著接著劑層積層有透明保護薄膜,且該接著劑層是使如前述任一項所記載之偏光薄膜用接著劑組成物硬化而得。The present invention also relates to a polarizing film, characterized in that a transparent protective film is laminated on at least one surface of the polarizing member via an adhesive layer, and the adhesive layer is made of the adhesive for polarizing film as described in any one of the foregoing The composition is hardened.
上述偏光薄膜中,前述接著劑層之厚度為0.2~3μm較佳。In the above-mentioned polarizing film, the thickness of the aforementioned adhesive layer is preferably 0.2 to 3 μm.
上述偏光薄膜中,其於令前述接著劑層之厚度為d(μm)、且令前述接著劑層所包含之前述氣泡抑制劑的含量為y(重量%)時,滿足下式(1)為佳。 0.1-0.02d≦y≦0.6-0.08d (1)In the above-mentioned polarizing film, when the thickness of the adhesive layer is d (μm) and the content of the bubble inhibitor contained in the adhesive layer is y (wt%), the following formula (1) is satisfied: good. 0.1-0.02d≦y≦0.6-0.08d (1)
並且本發明是有關於一種光學薄膜,其特徵在於積層有至少一層如前述任一項所記載之偏光薄膜;亦或有關於一種影像顯示裝置,其特徵在於使用有如前述任一項所記載之偏光薄膜或前述光學薄膜。And the present invention relates to an optical film characterized in that at least one layer of the polarizing film described in any of the foregoing is laminated; or it relates to an image display device characterized in that the polarizing film described in any of the foregoing is used Film or the aforementioned optical film.
發明效果 一般而言,偏光薄膜是隔著由偏光薄膜用接著劑組成物所形成之接著劑層來積層偏光件與透明保護薄膜而製造,但如前述,在貼合偏光件與透明保護膜時會有因夾入空氣而產生積層氣泡的傾向,而市場上要求將其減低。本發明由於在作為接著劑層之原料的偏光薄膜用接著劑組成物中摻混了具有反應性基之氣泡抑制劑,故可將硬化前之組成物的表面自由能降低。藉此,偏光薄膜用接著劑組成物對偏光件及透明保護薄膜之濡濕性會提升,且偏光薄膜用接著劑組成物對存在於偏光件及透明保護薄膜表面的極微細凹凸亦可有效率地濡濕擴散。結果可在貼合偏光件及透明保護薄膜時減低積層氣泡的產生。Effects of the Invention Generally speaking, a polarizing film is manufactured by laminating a polarizer and a transparent protective film through an adhesive layer formed of an adhesive composition for a polarizing film. However, as mentioned above, when bonding the polarizer and the transparent protective film, There is a tendency to generate layered bubbles due to air being trapped, and the market requires them to be reduced. In the present invention, since the adhesive composition for polarizing film used as the raw material of the adhesive layer is blended with a bubble inhibitor having a reactive group, the surface free energy of the composition before curing can be reduced. Thereby, the wettability of the polarizer and the transparent protective film of the polarizing film adhesive composition is improved, and the polarizing film adhesive composition can also effectively deal with the extremely fine unevenness that exists on the surface of the polarizer and the transparent protective film. Wet and spread. As a result, the generation of laminated bubbles can be reduced when the polarizer and the transparent protective film are laminated.
此外,於薄膜基材塗敷接著劑組成物時,為了改善其塗敷性,已知有在接著劑組成物中例如摻混被視為表面自由能低之氟系化合物等矽烷耦合劑的技術。然而,一般而言當在接著劑組成物中摻混這種矽烷耦合劑時,接著劑組成物對被附對象之薄膜基材的密著性會有降低的傾向。關於其原因,吾人推測是由於即使在使接著劑組成物硬化而形成接著劑層的情況下,氣泡抑制劑仍會作為未硬化物殘存於薄膜基材表面,因而導致可有助於接著劑層與薄膜基材之接著力顯現的相互作用未充分產生。In addition, in order to improve the coating properties when coating the adhesive composition on the film substrate, it is known that the adhesive composition is blended with a silane coupling agent such as a fluorine compound which is considered to have low surface free energy. . However, in general, when such a silane coupling agent is blended into an adhesive composition, the adhesive composition tends to decrease its adhesion to the film substrate to be attached. Regarding the reason, we speculate that even when the adhesive composition is cured to form an adhesive layer, the bubble inhibitor still remains on the surface of the film substrate as an uncured substance, which can contribute to the adhesive layer. The interaction with the adhesive force of the film substrate is not sufficiently generated.
然而本發明在接著劑組成物中摻混具有反應性基之氣泡抑制劑來有效降低硬化前之組成物的表面自由能,並在硬化後透過氣泡抑制劑所具有之反應性基使氣泡抑制劑組入接著劑層,藉此可以減低積層氣泡及提升接著劑層對屬被附對象之偏光件及透明保護薄膜的密著性。就結果而言,當使用本發明之偏光薄膜用接著劑組成物時,可以防止伴隨偏光件及透明保護膜之間的積層氣泡減低導致之外觀不良的產生,並且藉由提升偏光件及透明保護薄膜與接著劑層之間的密著性,可以提高偏光件與透明保護薄膜之接著強度。However, in the present invention, a bubble inhibitor with a reactive group is blended into the adhesive composition to effectively reduce the surface free energy of the composition before curing, and after curing, the bubble inhibitor can pass through the reactive group of the bubble inhibitor. Incorporating the adhesive layer can reduce the build-up of bubbles and improve the adhesion of the adhesive layer to the polarizer and the transparent protective film of the attached object. As a result, when the adhesive composition for polarizing films of the present invention is used, it is possible to prevent appearance defects caused by the reduction of the laminated bubbles between the polarizer and the transparent protective film, and by improving the polarizer and the transparent protective film The adhesion between the film and the adhesive layer can improve the adhesion strength between the polarizer and the transparent protective film.
用以實施發明之形態 本發明之偏光薄膜用接著劑組成物含有活性能量線硬化性成分、及具有反應性基的氣泡抑制劑。Modes for Carrying Out the Invention The adhesive composition for polarizing films of the present invention contains an active energy ray curable component and a bubble inhibitor having a reactive group.
<活性能量線硬化性成分> 可於本發明中使用的活性能量線硬化性成分可大致區分為電子射線硬化性、紫外線硬化性及可見光線硬化性。並且,硬化形態可區分為自由基聚合硬化型接著劑組成物與陽離子聚合性接著劑組成物。本發明中,將波長範圍10nm~小於380nm之活性能量線記為紫外線、將波長範圍380nm~800nm之活性能量線記為可見光線。特別是可於本發明中使用的活性能量線硬化性成分(A)是以利用380nm~450nm的可見光線之可見光線硬化性尤佳。<Active energy ray curable component> The active energy ray curable component that can be used in the present invention can be roughly classified into electron beam curable properties, ultraviolet curable properties, and visible light curable properties. In addition, the curing form can be divided into a radical polymerization curing type adhesive composition and a cation polymerizable adhesive composition. In the present invention, the active energy line with a wavelength range of 10 nm to less than 380 nm is recorded as ultraviolet light, and the active energy line with a wavelength range of 380 nm to 800 nm is recorded as visible light. In particular, the active energy ray curable component (A) that can be used in the present invention is particularly good in visible light curability using visible rays of 380 nm to 450 nm.
<1:自由基聚合硬化性化合物> 自由基聚合性化合物可舉如具有(甲基)丙烯醯基、乙烯基等含碳-碳雙鍵之自由基聚合性官能基的化合物。該等硬化性成分可使用單官能自由基聚合性化合物或雙官能以上之多官能自由基聚合性化合物中任一者。此外,該等自由基聚合性化合物可單獨使用1種或可將2種以上組合使用。該等自由基聚合性化合物以例如具有(甲基)丙烯醯基之化合物為合宜。另,本發明中,所謂(甲基)丙烯醯基意指丙烯醯基及/或甲基丙烯醯基,以下「(甲基)」同義。具有(甲基)丙烯醯基之化合物,可舉出具有(甲基)丙烯醯胺基之(甲基)丙烯醯胺衍生物、或具有(甲基)丙烯醯氧基之(甲基)丙烯酸酯。具有(甲基)丙烯醯基之化合物雖例示於下,但可進行種種選擇而使用,並無特別限定。本發明之活性能量線硬化型接著劑組成物中,自由基聚合性化合物之含量宜在10重量%以上。<1: Radical polymerizable curable compound> The radical polymerizable compound includes, for example, a compound having a carbon-carbon double bond-containing radical polymerizable functional group such as a (meth)acryloyl group and a vinyl group. As these curable components, either a monofunctional radical polymerizable compound or a bifunctional or higher polyfunctional radical polymerizable compound can be used. Moreover, these radically polymerizable compounds may be used individually by 1 type or in combination of 2 or more types. As these radically polymerizable compounds, for example, compounds having a (meth)acryloyl group are suitable. In addition, in the present invention, the term “(meth)acryloyl group” means an acryloyl group and/or methacryloyl group, and “(meth)” is synonymous below. Compounds having a (meth)acryloyl group include (meth)acrylamide derivatives having a (meth)acrylamido group, or (meth)acrylic acid having a (meth)acryloyloxy group ester. Although the compound which has a (meth)acryloyl group is illustrated below, it can select various and use, and is not specifically limited. In the active energy ray curable adhesive composition of the present invention, the content of the radical polymerizable compound is preferably 10% by weight or more.
《單官能自由基聚合性化合物》 單官能自由基聚合性化合物,可舉例如下述通式(1)所示化合物: [化學式1](惟,R1 為氫原子或甲基,R2 及R3 分別獨立為氫原子、烷基、羥烷基、烷氧基烷基或環狀醚基,且R2 及R3 亦可形成環狀雜環)。烷基、羥烷基及/或烷氧基烷基之烷基部分之碳數並無特別限定,可舉例如1~4個者。又,亦可形成R2 及R3 之環狀雜環,可舉例如N-丙烯醯基啉。"Monofunctional radical polymerizable compound" The monofunctional radical polymerizable compound includes, for example, a compound represented by the following general formula (1): [Chemical formula 1] (However, R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently a hydrogen atom, an alkyl group, a hydroxyalkyl group, an alkoxyalkyl group or a cyclic ether group, and R 2 and R 3 can also form Cyclic heterocycle). The carbon number of the alkyl part of an alkyl group, a hydroxyalkyl group, and/or an alkoxyalkyl group is not specifically limited, For example, 1 to 4 can be mentioned. In addition, a cyclic heterocyclic ring of R 2 and R 3 may also be formed, for example, N-acryloyl group Morpholine.
作為通式(1)所示化合物之具體例,可舉例如N-甲基(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N,N-二乙基(甲基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-己基(甲基)丙烯醯胺等含N-烷基的(甲基)丙烯醯胺衍生物;N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺、N-羥甲基-N-丙烷(甲基)丙烯醯胺等含N-羥烷基(甲基)丙烯醯胺衍生物;N-甲氧基甲基丙烯醯胺、N-乙氧基甲基丙烯醯胺等含N-烷氧基(甲基)丙烯醯胺衍生物等。並且,作為含環狀醚基(甲基)丙烯醯胺衍生物可舉出(甲基)丙烯醯胺基之氮原子形成了雜環的含雜環(甲基)丙烯醯胺衍生物,可舉例如N-丙烯醯基啉、N-丙烯醯基哌啶、N-甲基丙烯醯基哌啶、N-丙烯醯基吡咯啶等。該等之中,由反應性優異之觀點、可獲得高彈性模數之硬化物之觀點、及對偏光件之接著性優異之觀點來看,可適當地使用N-羥乙基丙烯醯胺、或N-丙烯醯基啉。As specific examples of the compound represented by the general formula (1), for example, N-methyl(meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl (Meth)acrylamide, N-isopropyl(meth)acrylamide, N-butyl(meth)acrylamide, N-hexyl(meth)acrylamide, etc. containing N-alkyl groups (Meth)acrylamide derivatives; N-hydroxymethyl (meth)acrylamide, N-hydroxyethyl (meth)acrylamide, N-hydroxymethyl-N-propane (meth)propylene N-hydroxyalkyl (meth)acrylamide derivatives such as amide; N-methoxymethacrylamide, N-ethoxymethacrylamide, etc. containing N-alkoxy (methyl) ) Acrylamide derivatives, etc. In addition, examples of the cyclic ether group-containing (meth)acrylamide derivative include heterocyclic (meth)acrylamide derivatives in which the nitrogen atom of the (meth)acrylamide group forms a heterocyclic ring. For example, N-acryloyl Pyroline, N-acryloylpiperidine, N-methacryloylpiperidine, N-acryloylpyrrolidine, etc. Among them, from the viewpoint of excellent reactivity, the viewpoint of obtaining a cured product with a high elastic modulus, and the viewpoint of excellent adhesion to the polarizer, N-hydroxyethyl acrylamide, Or N-acryloyl Morpholine.
由提升透過接著劑層接著偏光件與透明保護薄膜時的接著性及耐水性,更進一步由聚合速度快而造成的生產性提升之觀點來看,接著劑組成物中,通式(1)所記載之化合物含量宜為1~50重量%,更宜為3~20重量%。尤其一旦通式(1)所記載之化合物的含量過多,硬化物之吸水率會變高,而有耐水性惡化的情況。From the viewpoint of improving the adhesiveness and water resistance when the polarizing member and the transparent protective film are connected through the adhesive layer, and the productivity improvement caused by the faster polymerization speed, in the adhesive composition, the general formula (1) The stated compound content is preferably 1-50% by weight, more preferably 3-20% by weight. In particular, when the content of the compound described in the general formula (1) is too large, the water absorption rate of the cured product becomes higher, and the water resistance may deteriorate.
並且,本發明中所使用之接著劑組成物,除通式(1)所示化合物之外,亦可含有其他單官能自由基聚合性化合物作為硬化性成分。作為單官能自由基聚合性化合物可舉例如具有(甲基)丙烯醯氧基之各種(甲基)丙烯酸衍生物。具體而言,可舉例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、2-甲基-2-硝基丙基(甲基)丙烯酸酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸三級戊酯、3-戊基(甲基)丙烯酸酯、2,2-二甲基丁基(甲基)丙烯酸酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸十六烷酯、(甲基)丙烯酸正辛酯、2-乙基己基(甲基)丙烯酸酯、4-甲基-2-丙基戊基(甲基)丙烯酸酯、(甲基)丙烯酸正十八烷酯等(甲基)丙烯酸(碳數1-20)烷基酯類。In addition, the adhesive composition used in the present invention may contain other monofunctional radical polymerizable compounds as curable components in addition to the compound represented by the general formula (1). As a monofunctional radically polymerizable compound, various (meth)acrylic acid derivatives which have a (meth)acryloyloxy group are mentioned, for example. Specifically, for example, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, 2-methyl-2-nitro Propyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, secondary butyl (meth)acrylate, tertiary butyl (meth)acrylate, (meth) ) N-pentyl acrylate, tertiary pentyl (meth)acrylate, 3-pentyl (meth)acrylate, 2,2-dimethylbutyl (meth)acrylate, n-hexyl (meth)acrylate , Cetyl (meth)acrylate, n-octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 4-methyl-2-propylpentyl (meth)acrylate, (Meth) acrylic acid (carbon number 1-20) alkyl esters such as n-octadecyl (meth)acrylate.
又,前述(甲基)丙烯酸衍生物,可舉例如(甲基)丙烯酸環己酯、(甲基)丙烯酸環戊酯等(甲基)丙烯酸環烷酯;(甲基)丙烯酸苄酯等(甲基)丙烯酸芳烷酯;(甲基)丙烯酸2-異莰酯、(甲基)丙烯酸2-降莰基甲酯、5-降莰烯-2-基-甲基(甲基)丙烯酸酯、3-甲基-2-降莰基甲基(甲基)丙烯酸酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸二環戊酯等多環式(甲基)丙烯酸酯;(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸2-乙氧基乙酯、(甲基)丙烯酸2-甲氧基甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙基卡必醇(甲基)丙烯酸酯、(甲基)丙烯酸苯氧乙酯、烷基苯氧基聚乙二醇(甲基)丙烯酸酯等含烷氧基或苯氧基之(甲基)丙烯酸酯等等。將本發明之樹脂組成物用作偏光薄膜的接著劑時,由對保護薄膜之密著性的觀點來看,宜含有(甲基)丙烯酸苯氧乙酯、烷基苯氧基聚乙二醇(甲基)丙烯酸酯、2-羥-3-苯氧丙基丙烯酸酯等含烷氧基或苯氧基之(甲基)丙烯酸酯。相對於樹脂組成物,其含量宜為1重量%~30重量%。In addition, the aforementioned (meth)acrylic acid derivatives include, for example, cyclohexyl (meth)acrylate, cyclopentyl (meth)acrylate, and other cycloalkyl (meth)acrylates; benzyl (meth)acrylate, etc. ( Aralkyl meth)acrylate; 2-isobornyl (meth)acrylate, 2-norbornylmethyl (meth)acrylate, 5-norbornen-2-yl-methyl(meth)acrylate , 3-Methyl-2-norbornylmethyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenoxyethyl (meth)acrylate, (meth)acrylic acid Polycyclic (meth)acrylates such as dicyclopentyl ester; 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 2-methoxy(meth)acrylate Ethyl methoxy ethyl, 3-methoxy butyl (meth) acrylate, ethyl carbitol (meth) acrylate, phenoxy ethyl (meth) acrylate, alkylphenoxy polyethylene Alcohol (meth)acrylate and other alkoxy or phenoxy-containing (meth)acrylates, etc. When the resin composition of the present invention is used as an adhesive for polarizing films, it is preferable to contain phenoxyethyl (meth)acrylate and alkylphenoxy polyethylene glycol from the viewpoint of adhesion to the protective film (Meth)acrylates, 2-hydroxy-3-phenoxypropyl acrylates and other (meth)acrylates containing alkoxy or phenoxy groups. The content is preferably 1% by weight to 30% by weight relative to the resin composition.
又,作為前述(甲基)丙烯酸衍生物,可舉如(甲基)丙烯酸-2-羥乙酯、(甲基)丙烯酸-2-羥丙酯、(甲基)丙烯酸-3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸4-羥丁酯、(甲基)丙烯酸6-羥己酯、(甲基)丙烯酸8-羥辛酯、(甲基)丙烯酸10-羥癸酯、(甲基)丙烯酸12-羥基月桂酯等(甲基)丙烯酸羥烷酯;或[4(羥甲基)環己基]甲基丙烯酸酯、環己烷二甲醇一(甲基)丙烯酸酯、2-羥-3-苯氧丙基(甲基)丙烯酸酯等含羥基(甲基)丙烯酸酯;(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸4-羥丁酯環氧丙醚等含環氧基(甲基)丙烯酸酯;(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,2-三氟乙基乙酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸六氟丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、3-氯-2-羥丙基(甲基)丙烯酸酯等含鹵素(甲基)丙烯酸酯;(甲基)丙烯酸二甲基胺基乙酯等(甲基)丙烯酸烷基胺基烷基酯;(甲基)丙烯酸3-氧雜環丁烷基甲酯、(甲基)丙烯酸3-甲基-氧雜環丁烷基甲酯、(甲基)丙烯酸3-乙基-氧雜環丁烷基甲酯、(甲基)丙烯酸3-丁基-氧雜環丁烷基甲酯、(甲基)丙烯酸3-己基-氧雜環丁烷基甲酯等含氧雜環丁烷基(甲基)丙烯酸酯;(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸丁內酯等具有雜環的(甲基)丙烯酸酯;或羥基三甲基乙酸新戊二醇(甲基)丙烯酸酯加成物、(甲基)丙烯酸對苯基苯酚酯等等。其中,2-羥-3-苯氧丙基丙烯酸酯因與各種保護薄膜之接著性優異,故較佳。In addition, examples of the aforementioned (meth)acrylic acid derivatives include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 3-hydroxypropyl (meth)acrylate , 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, (meth)acrylic acid 10-hydroxydecyl ester, 12-hydroxylauryl (meth)acrylate and other (meth) hydroxyalkyl acrylates; or [4 (hydroxymethyl) cyclohexyl] methacrylate, cyclohexane dimethanol one (meth) Hydroxy (meth)acrylates such as acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, etc.; glycidyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate Epoxy-containing (meth)acrylate such as glycidyl ether; 2,2,2-trifluoroethyl (meth)acrylate, 2,2,2-trifluoroethyl ethyl (meth)acrylate , Tetrafluoropropyl (meth)acrylate, hexafluoropropyl (meth)acrylate, octafluoropentyl (meth)acrylate, heptafluorodecyl (meth)acrylate, 3-chloro-2-hydroxypropyl (Meth)acrylic acid esters and other halogen-containing (meth)acrylates; (meth)acrylic acid dimethylamino ethyl esters and other (meth)acrylic acid alkylamino alkyl esters; (meth)acrylic acid 3- Oxetanyl methyl ester, 3-methyl-oxetanyl methyl (meth)acrylate, 3-ethyl-oxetanyl methyl (meth)acrylate, (methyl) ) Oxetanyl (meth)acrylates such as 3-butyl-oxetanyl methyl acrylate and 3-hexyl-oxetanyl methyl (meth)acrylate; (Meth)acrylates with heterocycles such as tetrahydrofurfuryl acrylate and butyrolactone (meth)acrylate; or neopentyl glycol (meth)acrylate adducts of hydroxytrimethylacetate, (meth)acrylate Base) p-phenylphenol acrylate and the like. Among them, 2-hydroxy-3-phenoxypropyl acrylate is preferred because of its excellent adhesion to various protective films.
又,單官能自由基聚合性化合物可列舉為:(甲基)丙烯酸、丙烯酸羧乙酯、丙烯酸羧戊酯、伊康酸、馬來酸、延胡索酸、巴豆酸、異巴豆酸等含有羧基之單體。In addition, the monofunctional radical polymerizable compound can be exemplified by (meth)acrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, isocrotonic acid and other carboxyl-containing monomers. body.
又,作為單官能自由基聚合性化合物,可舉例如N-乙烯基吡咯啶酮、N-乙烯基-ε-己內醯胺、甲基乙烯基吡咯啶酮等內醯胺系乙烯基單體;乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌、乙烯基吡、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基啉等具有含氮雜環之乙烯系單體等等。In addition, examples of monofunctional radical polymerizable compounds include internal vinyl monomers such as N-vinylpyrrolidone, N-vinyl-ε-caprolactone, and methyl vinylpyrrolidone. ; Vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiper Vinylpyridine , Vinyl pyrrole, vinyl imidazole, vinyl azole, vinyl Vinyl monomers with nitrogen-containing heterocycles such as morpholines, etc.
只要使樹脂組成物含有上述化合物中具有高極性之含羥基(甲基)丙烯酸酯、含羧基(甲基)丙烯酸酯或含磷酸基(甲基)丙烯酸酯等,對各種基材之密著力便會提升。相對於樹脂組成物,含烴基(甲基)丙烯酸酯之含量宜為1重量%~30重量%。當含量過多時,硬化物之吸水率會變高,而有耐水性惡化的情況。相對於樹脂組成物,含羧基(甲基)丙烯酸酯的含量宜為1重量%~20重量%。當含量過多時,偏光薄膜之光學耐久性會降低,故不佳。含磷酸基(甲基)丙烯酸酯可舉例如2-(甲基)丙烯醯氧基乙基酸式磷酸鹽,且相對於樹脂組成物,其含量宜為0.1重量%~10重量%。當含量過多時,偏光薄膜之光學耐久性會降低,故不佳。As long as the resin composition contains hydroxyl-containing (meth)acrylates, carboxyl-containing (meth)acrylates or phosphoric acid-containing (meth)acrylates, which have high polarity among the above-mentioned compounds, the adhesion to various substrates can be achieved. Will improve. The content of the hydrocarbon group-containing (meth)acrylate is preferably 1% by weight to 30% by weight relative to the resin composition. When the content is too much, the water absorption rate of the hardened material will become higher, and the water resistance may deteriorate. The content of the carboxyl group-containing (meth)acrylate is preferably 1% by weight to 20% by weight relative to the resin composition. When the content is too much, the optical durability of the polarizing film will decrease, so it is not good. Examples of the phosphoric acid group-containing (meth)acrylate include 2-(meth)acryloyloxyethyl acid phosphate, and the content thereof is preferably 0.1% by weight to 10% by weight relative to the resin composition. When the content is too much, the optical durability of the polarizing film will decrease, so it is not good.
又,單官能自由基聚合性化合物,可使用具有活性亞甲基之自由基聚合性化合物。具有活性亞甲基之自由基聚合性化合物是在末端或分子中具有(甲基)丙烯醯基等活性雙鍵基且具有活性亞甲基之化合物。活性亞甲基可列舉乙醯乙醯基、烷氧丙二醯基或氰乙醯基等。且,前述活性亞甲基以乙醯乙醯基為佳。具有活性亞甲基之自由基聚合性化合物之具體例可舉如2-乙醯乙醯氧基乙基(甲基)丙烯酸酯、2-乙醯乙醯氧基丙基(甲基)丙烯酸酯、2-乙醯乙醯氧基-1-甲基乙基(甲基)丙烯酸酯等乙醯乙醯氧基烷基(甲基)丙烯酸酯;2-乙氧丙二醯基氧基乙基(甲基)丙烯酸酯、2-氰乙醯氧基乙基(甲基)丙烯酸酯、N-(2-氰乙醯氧基乙基)丙烯醯胺、N-(2-丙醯乙醯氧基丁基)丙烯醯胺、N-(4-乙醯乙醯氧基甲苄基)丙烯醯胺、N-(2-乙醯乙醯基胺乙基)丙烯醯胺等。具有活性亞甲基之自由基聚合性化合物以乙醯乙醯氧基烷基(甲基)丙烯酸酯為佳。In addition, as the monofunctional radical polymerizable compound, a radical polymerizable compound having an active methylene group can be used. The radically polymerizable compound having an active methylene group is a compound that has an active double bond group such as a (meth)acryloyl group at the terminal or in the molecule, and has an active methylene group. Examples of the active methylene group include acetylacetoxy, alkoxypropanedioxin or cyanoacetoxy. In addition, the aforementioned active methylene group is preferably acetylacetonyl. Specific examples of radically polymerizable compounds having active methylene groups include 2-acetylacetoxyethyl (meth)acrylate, 2-acetylacetoxypropyl (meth)acrylate , 2-Acetylacetoxy-1-methylethyl (meth)acrylate and other Acetylacetoxyalkyl (meth)acrylates; 2-Ethoxypropanedioxyloxyethyl (Meth)acrylate, 2-cyanoacetoxyethyl (meth)acrylate, N-(2-cyanoacetoxyethyl)acrylamide, N-(2-propaneacetoxy) Butyl)acrylamide, N-(4-acetylacetoxymethylbenzyl)acrylamide, N-(2-acetylacetaminoethyl)acrylamide, and the like. The radically polymerizable compound having a reactive methylene group is preferably acetoxyalkyl (meth)acrylate.
《多官能自由基聚合性化合物》 又,作為雙官能以上的多官能自由基聚合性化合物,可舉例如多官能(甲基)丙烯醯胺衍生物之N,N’-亞甲基雙(甲基)丙烯醯胺、三丙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二丙烯酸酯、2-乙基-2-丁基丙二醇二(甲基)丙烯酸酯、雙酚A二(甲基)丙烯酸酯、雙酚A環氧乙烷加成物二(甲基)丙烯酸酯、雙酚A環氧丙烷加成物二(甲基)丙烯酸酯、雙酚A二環氧丙基醚二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、環狀三羥甲丙烷縮甲醛(甲基)丙烯酸酯、二㗁烷二醇二(甲基)丙烯酸酯、三羥甲丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、EO改質二甘油四(甲基)丙烯酸酯等(甲基)丙烯酸與多元醇的酯化物、9,9-雙[4-(2-(甲基)丙烯醯氧基乙氧基)苯基]茀、羥基三甲基乙酸新戊二醇丙烯酸酯加成物等。作為具體例,是以ARONIX M-220(東亞合成公司製)、LIGHT-ACRYLATE 1,9ND-A(共榮社化學公司製)、LIGHT-ACRYLATE DGE-4A(共榮社化學公司製)、LIGHT-ACRYLATE DCP-A(共榮社化學公司製)、SR-531(Sartomer公司製)、CD-536(Sartomer公司製)等為佳。此外因應需要,可舉如各種環氧(甲基)丙烯酸酯、胺甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、及各種(甲基)丙烯酸酯系單體等。另,多官能(甲基)丙烯醯胺衍生物之聚合速度快且生產性優異,加上將樹脂組成物作成硬化物時之交聯性優異,故宜含於接著劑組成物中。"Polyfunctional Radical Polymerizable Compounds" In addition, examples of polyfunctional radical polymerizable compounds having more than two functions include N,N'-methylenebis(formaldehyde) which is a polyfunctional (meth)acrylamide derivative. Base) acrylamide, tripropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol Di(meth)acrylate, 1,10-decanediol diacrylate, 2-ethyl-2-butylpropanediol di(meth)acrylate, bisphenol A di(meth)acrylate, bisphenol A ethylene oxide adduct di(meth)acrylate, bisphenol A propylene oxide adduct di(meth)acrylate, bisphenol A diglycidyl ether di(meth)acrylate, Neopentyl glycol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, cyclic trimethylolpropane formal (meth)acrylate, diethylene glycol bis(methyl) )Acrylate, trimethylolpropane tri(meth)acrylate, neopentylerythritol tri(meth)acrylate, neopentylerythritol tetra(meth)acrylate, dineopentylerythritol penta(meth)acrylate Acrylic acid ester, dineopentaerythritol hexa(meth)acrylate, EO modified diglycerol tetra(meth)acrylate, etc. (meth)acrylic acid and polyol esterification products, 9,9-bis[4-( 2-(Meth)acryloyloxyethoxy)phenyl]茀, hydroxytrimethylacetate neopentyl glycol acrylate adduct, etc. As specific examples, ARONIX M-220 (manufactured by Toagosei Co., Ltd.), LIGHT-ACRYLATE 1,9ND-A (manufactured by Kyoeisha Chemical Co., Ltd.), LIGHT-ACRYLATE DGE-4A (manufactured by Kyoeisha Chemical Co., Ltd.), LIGHT -ACRYLATE DCP-A (manufactured by Kyoeisha Chemical Co., Ltd.), SR-531 (manufactured by Sartomer Co., Ltd.), CD-536 (manufactured by Sartomer Co., Ltd.), etc. are preferable. In addition, as required, various epoxy (meth)acrylates, urethane (meth)acrylates, polyester (meth)acrylates, and various (meth)acrylate monomers can be mentioned. In addition, the polyfunctional (meth)acrylamide derivative has a fast polymerization rate and is excellent in productivity. In addition, it has excellent crosslinkability when the resin composition is made into a cured product, so it is preferably contained in the adhesive composition.
從兼具與偏光件和各種透明保護薄膜之接著性、以及在嚴酷的環境下之光學耐久性的觀點而言,自由基聚合性化合物係以併用單官能自由基聚合性化合物及多官能自由基聚合性化合物為佳。此外,由於單官能自由基聚合性化合物之液體黏度相對較低,使之含於樹脂組成物中,便能降低樹脂組成物的液體黏度。又,單官能自由基聚合性化合物具有能展現各種機能之官能基的情況較多,使之含於樹脂組成物中,便能使樹脂組成物及/或樹脂組成物之硬化物展現各種機能。多官能自由基聚合性化合物因能使樹脂組成物之硬化物產生3維交聯,故宜使之含於樹脂組成物中。單官能自由基聚合性化合物與多官能自由基聚合性化合物之比,宜相對於單官能自由基聚合性化合物100重量份,以10重量份至1000重量份之範圍混合多官能自由基聚合性化合物。From the standpoint of having both adhesion to polarizers and various transparent protective films, and optical durability in harsh environments, the radical polymerizable compound is a combination of a monofunctional radical polymerizable compound and a polyfunctional radical Polymerizable compounds are preferred. In addition, since the liquid viscosity of the monofunctional radical polymerizable compound is relatively low, if it is contained in the resin composition, the liquid viscosity of the resin composition can be reduced. In addition, the monofunctional radical polymerizable compound often has a functional group capable of exhibiting various functions, and if it is contained in the resin composition, the resin composition and/or the cured product of the resin composition can exhibit various functions. Since the polyfunctional radical polymerizable compound can cause three-dimensional crosslinking of the cured product of the resin composition, it is preferably contained in the resin composition. The ratio of the monofunctional radical polymerizable compound to the polyfunctional radical polymerizable compound is preferably to mix the polyfunctional radical polymerizable compound in the range of 10 parts by weight to 1000 parts by weight relative to 100 parts by weight of the monofunctional radical polymerizable compound .
<2︰陽離子聚合性接著劑組成物> 作為在陽離子聚合性接著劑組成物中所使用的陽離子聚合性化合物,可分類為在分子內具有1個陽離子聚合性官能基的單官能陽離子聚合性化合物,及在分子內具有2個以上陽離子聚合性官能基的多官能陽離子聚合性化合物。由於單官能陽離子聚合性化合物之液體黏度相對較低,使之含於樹脂組成物中,便能降低樹脂組成物的液體黏度。又,單官能陽離子聚合性化合物具有能展現各種機能之官能基的情況較多,使之含有於樹脂組成物中,便能使樹脂組成物及/或樹脂組成物之硬化物展現各種機能。多官能陽離子聚合性化合物因能使樹脂組成物之硬化物產生3維交聯,故宜使之含於樹脂組成物中。單官能陽離子聚合性化合物與多官能陽離子聚合性化合物之比,宜相對於單官能陽離子聚合性化合物100重量份,以10重量份至1000重量份之範圍混合多官能陽離子聚合性化合物。作為陽離子聚合性官能基,可舉例如環氧基或氧雜環丁烷基、乙烯基醚基。作為具環氧基之化合物,可舉出脂肪族環氧化合物、脂環式環氧化合物、芳香族環氧化合物,而本發明之陽離子聚合性接著劑組成物以含有脂環式環氧化合物尤佳,因其硬化性和接著性優異。作為脂環式環氧化合物,可舉如3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯、3,4-環氧環己基甲基3,4-環氧環己烷羧酸酯的己內酯改質物、三甲基己內酯改質物、戊內酯改質物等,具體而言,可舉出CELLOXIDE 2021、CELLOXIDE 2021A、CELLOXIDE 2021P、CELLOXIDE 2081、CELLOXIDE 2083、CELLOXIDE 2085(以上,DAICEL化學工業公司製)、Cyracure UVR-6105、Cyracure UVR-6107、Cyracure 30、R-6110(以上,日本陶氏化學(DOW CHEMICAL)公司製)、jer-828(以上,Japan Epoxy Resins公司製)等。具氧雜環丁烷基之化合物有改善本發明之陽離子聚合性接著劑組成物之硬化性、降低該組成物之液體黏度等效果,故宜含有該化合物。作為具有氧雜環丁烷基之化合物,可舉如3-乙基-3-羥甲基氧雜環丁烷、1,4-雙[(3-乙基-3-氧雜環丁烷基)甲氧基甲基]苯、3-乙基-3-(苯氧甲基)氧雜環丁烷、二[(3-乙基-3-氧雜環丁烷基)甲基]醚、3-乙基-3-(2-乙基己氧基甲基)氧雜環丁烷、苯酚酚醛氧雜環丁烷等、及市售之ARON OXETANE OXT-101、ARON OXETANE OXT-121、ARON OXETANE OXT-211、ARON OXETANE OXT-221、ARON OXETANE OXT-212(以上,東亞合成公司製)等。具乙烯基醚基之化合物有改善本發明之陽離子聚合性接著劑組成物之硬化性、降低該組成物之液體黏度等效果,故宜含有該化合物。作為具乙烯基醚基之化合物,可舉如2-羥乙基乙烯基醚、二乙二醇單乙烯基醚、4-羥丁基乙烯基醚、二乙二醇單乙烯基醚、三乙二醇二乙烯基醚、環己烷二甲醇二乙烯基醚、環己烷二甲醇單乙烯基醚、三環癸烷乙烯基醚、環己基乙烯基醚、甲氧基乙基乙烯基醚、乙氧基乙基乙烯基醚、新戊四醇型四乙烯基醚等。<2: Cationic polymerizable adhesive composition> As the cationically polymerizable compound used in the cationically polymerizable adhesive composition, it can be classified as a monofunctional cationically polymerizable compound having one cationically polymerizable functional group in the molecule , And a polyfunctional cationically polymerizable compound having two or more cationically polymerizable functional groups in the molecule. Since the liquid viscosity of the monofunctional cationic polymerizable compound is relatively low, the liquid viscosity of the resin composition can be reduced if it is contained in the resin composition. In addition, monofunctional cationically polymerizable compounds often have functional groups capable of exhibiting various functions. By including them in the resin composition, the resin composition and/or the cured product of the resin composition can exhibit various functions. Since the polyfunctional cationically polymerizable compound can cause three-dimensional crosslinking of the cured product of the resin composition, it is preferably contained in the resin composition. The ratio of the monofunctional cationically polymerizable compound to the polyfunctional cationically polymerizable compound is preferably to mix the polyfunctional cationically polymerizable compound in the range of 10 parts by weight to 1000 parts by weight with respect to 100 parts by weight of the monofunctional cationically polymerizable compound. Examples of the cationically polymerizable functional group include an epoxy group, an oxetanyl group, and a vinyl ether group. Examples of compounds having epoxy groups include aliphatic epoxy compounds, alicyclic epoxy compounds, and aromatic epoxy compounds. The cationic polymerizable adhesive composition of the present invention contains especially alicyclic epoxy compounds. Good, because of its excellent curability and adhesion. As the alicyclic epoxy compound, for example, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate, 3,4-epoxycyclohexylmethyl 3,4-cyclic Caprolactone-modified products, trimethylcaprolactone-modified products, and valerolactone-modified products of oxycyclohexane carboxylates, etc., specifically, CELLOXIDE 2021, CELLOXIDE 2021A, CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085 (above, manufactured by DAICEL Chemical Industry Co., Ltd.), Cyracure UVR-6105, Cyracure UVR-6107, Cyracure 30, R-6110 (above, manufactured by Dow Chemical Co., Ltd.), jer-828 (above , Japan Epoxy Resins Corporation) and so on. The compound having an oxetanyl group has the effects of improving the curability of the cationic polymerizable adhesive composition of the present invention and reducing the liquid viscosity of the composition, so it is preferable to contain the compound. Examples of compounds having an oxetanyl group include 3-ethyl-3-hydroxymethyloxetane, 1,4-bis[(3-ethyl-3-oxetanyl )Methoxymethyl]benzene, 3-ethyl-3-(phenoxymethyl)oxetane, bis[(3-ethyl-3-oxetanyl)methyl]ether, 3-Ethyl-3-(2-ethylhexyloxymethyl)oxetane, phenol phenol oxetane, etc., and commercially available ARON OXETANE OXT-101, ARON OXETANE OXT-121, ARON OXETANE OXT-211, ARON OXETANE OXT-221, ARON OXETANE OXT-212 (above, manufactured by Toagosei Co., Ltd.), etc. The compound having a vinyl ether group has the effects of improving the curability of the cationic polymerizable adhesive composition of the present invention and reducing the liquid viscosity of the composition, so it is preferable to contain the compound. Examples of compounds with vinyl ether groups include 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol monovinyl ether, triethyl Glycol divinyl ether, cyclohexane dimethanol divinyl ether, cyclohexane dimethanol monovinyl ether, tricyclodecane vinyl ether, cyclohexyl vinyl ether, methoxyethyl vinyl ether, Ethoxy ethyl vinyl ether, neopentyl erythritol type tetravinyl ether, etc.
<具有反應性基之氣泡抑制劑> 氣泡抑制劑係可藉由摻混於接著劑組成物中而製成降低接著劑組成物表面張力的化合物,且藉此具有可減低與貼合的被著體間之氣泡的效果。氣泡抑制劑可使用添加於接著劑組成物中時具備減低接著劑組成物表面張力之效果者,例如聚二甲基矽氧烷等具有聚矽氧烷骨架之聚矽氧系氣泡抑制劑、使(甲基)丙烯酸酯等聚合而成之具有(甲基)丙烯醯基骨架的(甲基)丙烯酸系氣泡抑制劑、使乙烯基醚或環狀醚等聚合而成之聚醚系氣泡抑制劑、由具有全氟烷基之氟系化合物構成之氟性氣泡抑制劑等。<Bubble inhibitor with reactive group> The bubbling inhibitor can be blended into the adhesive composition to produce a compound that reduces the surface tension of the adhesive composition, and thereby has the ability to reduce and adhere to the coating. The effect of bubbles between the bodies. The bubble inhibitor can use those that have the effect of reducing the surface tension of the adhesive composition when added to the adhesive composition, for example, polysiloxane-based bubble inhibitors with a polysiloxane skeleton such as polydimethylsiloxane, etc. (Meth)acrylic acid-based air bubble inhibitors formed by polymerization of (meth)acrylic acid esters, etc., and polyether-based air bubble inhibitors formed by polymerization of vinyl ether or cyclic ether, etc. , Fluorine bubble suppressant composed of fluorine-based compound with perfluoroalkyl group, etc.
氣泡抑制劑所具有之反應性基可舉如聚合性官能基,具體而言例如:(甲基)丙烯醯基、乙烯基、烯丙基等具有乙烯性雙鍵的自由基聚合性官能基、環氧丙基等之環氧基、氧雜環丁烷基、乙烯基醚基、環狀醚基、環狀硫醚基、內酯基等之陽離子聚合性官能基等等。由在接著劑組成物中之反應性的觀點來看,以具有雙鍵作為反應性基之氣泡抑制劑為佳,更佳為具有(甲基)丙烯酼基之氣泡抑制劑。Examples of the reactive group possessed by the bubble suppressor include polymerizable functional groups, and specific examples include radical polymerizable functional groups having ethylenic double bonds such as (meth)acrylic acid groups, vinyl groups, and allyl groups, Cationic polymerizable functional groups such as epoxy group, oxetanyl group, vinyl ether group, cyclic ether group, cyclic sulfide group, lactone group, etc., such as glycidyl group. From the viewpoint of reactivity in the adhesive composition, a bubble suppressor having a double bond as a reactive group is preferred, and a bubble suppressor having a (meth)propylene ethylene group is more preferred.
當考慮到抑制積層氣泡效果及提升接著性效果時,在前述氣泡抑制劑中,則以聚矽氧系氣泡抑制劑為佳。並且,當在氣泡抑制劑中考慮到接著劑層之接著性時,以在主鏈骨架或側鏈包含胺甲酸酯鍵或三聚異氰酸酯環結構者為佳。也可以適當地使用市售品作為聚矽氧系氣泡抑制劑,可舉例如丙烯酼基改質聚二甲基矽氧烷之「BYK-UV3505」(畢克化學日本公司製)。When considering the effect of suppressing the build-up of bubbles and the effect of improving adhesion, among the aforementioned bubble inhibitors, polysiloxane-based bubble inhibitors are preferred. In addition, when considering the adhesiveness of the adhesive layer in the bubble inhibitor, it is preferable to include a urethane bond or a trimeric isocyanate ring structure in the main chain skeleton or side chain. A commercially available product can also be suitably used as a polysiloxane-based bubble inhibitor, and for example, "BYK-UV3505" (manufactured by BYK Chem. Japan) made of propylene-based modified polydimethylsiloxane can be mentioned.
為了兼顧所得之接著劑層之接著力、及減低積層氣泡的效果,故令接著劑組成物之總量為100重量%時,氣泡抑制劑之含量宜為0.01~0.6重量%。In order to take into account both the adhesive force of the resulting adhesive layer and the effect of reducing the build-up bubbles, when the total amount of the adhesive composition is 100% by weight, the content of the bubble inhibitor is preferably 0.01 to 0.6% by weight.
<自由基聚合性接著劑組成物的態樣> 在活性能量線使用電子射線等的情形時,該接著劑組成物毋須含有光聚合起始劑,但在活性能量線使用紫外線或可見光線的情形時,接著劑組成物則宜含有光聚合起始劑。<The aspect of the radical polymerizable adhesive composition> When the active energy rays use electron beams, etc., the adhesive composition does not need to contain a photopolymerization initiator, but when the active energy rays use ultraviolet rays or visible rays In this case, the adhesive composition preferably contains a photopolymerization initiator.
《光聚合起始劑》 在使用自由基聚合性化合物時,光聚合起始劑可依照活性能量線來作適當選擇。藉由紫外線或可見光線使其硬化時,可使用以紫外線或可見光線裂解的光聚合起始劑。作為前述光聚合起始劑,可舉例如二苯基乙二酮(benzil)、二苯基酮、苯甲醯基苯甲酸、3,3’-二甲基-4-甲氧基二苯基酮等二苯基酮系化合物;4-(2-羥基乙氧基)苯基(2-羥-2-丙基)酮、α-羥-α,α’-二甲基苯乙酮、2-甲基-2-羥基苯丙酮、α-羥基環己基苯基酮等芳香族酮化合物;甲氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯乙酮、2-甲基-1-[4-(甲硫基)-苯基]-2-啉丙烷-1等的苯乙酮系化合物;苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻異丙基醚、苯偶姻丁基醚、大茴香偶姻甲基醚等的苯偶姻醚系化合物;苄基二甲縮酮等芳香族縮酮系化合物;2-萘磺醯氯等芳香族磺醯氯系化合物;1-苯酮-1,1-丙二酮-2-(鄰乙氧基羰基)肟等的光活性肟系化合物;9-氧硫 、2-氯9-氧硫 、2-甲基9-氧硫 、2,4-二甲基9-氧硫 、異丙基9-氧硫 、2,4-二氯9-氧硫 、2,4-二乙基9-氧硫 、2,4-二異丙基9-氧硫 、十二基9-氧硫 等的9-氧硫 系化合物;樟腦醌;鹵化酮;醯基氧化膦;醯基膦酸酯等。"Photopolymerization initiator" When a radical polymerizable compound is used, the photopolymerization initiator can be appropriately selected in accordance with active energy rays. When curing by ultraviolet or visible light, a photopolymerization initiator that is cleaved by ultraviolet or visible light can be used. Examples of the aforementioned photopolymerization initiator include benzil, diphenyl ketone, benzyl benzoic acid, and 3,3'-dimethyl-4-methoxydiphenyl Ketones and other diphenyl ketone compounds; 4-(2-hydroxyethoxy) phenyl(2-hydroxy-2-propyl) ketone, α-hydroxy-α,α'-dimethylacetophenone, 2 -Methyl-2-hydroxypropiophenone, α-hydroxycyclohexyl phenyl ketone and other aromatic ketone compounds; methoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, 2-diethoxyacetophenone, 2-methyl-1-[4-(methylthio)-phenyl]-2- Acetophenone compounds such as oxypropane-1; benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin butyl ether, anisin methyl ether, etc. Benzoin ether compounds; aromatic ketal compounds such as benzyl dimethyl ketal; aromatic sulfonyl chloride compounds such as 2-naphthalenesulfonyl chloride; 1-phenone-1, 1-propanedione-2 -(O-ethoxycarbonyl) oxime and other photoactive oxime compounds; 9-oxysulfur , 2-Chloro 9-oxysulfur , 2-Methyl 9-oxysulfur , 2,4-Dimethyl 9-oxysulfur , Isopropyl 9-oxysulfur , 2,4-Dichloro 9-oxysulfur , 2,4-Diethyl 9-oxysulfur , 2,4-Diisopropyl 9-oxysulfur , Dodecyl 9-oxysulfur 9-oxysulfur Series compounds; camphorquinone; halogenated ketones; acyl phosphine oxide; acyl phosphonate and the like.
相對於接著劑組成物之總量,前述光聚合起始劑之摻混量為20重量%以下。光聚合起始劑之摻混量宜為0.01~20重量%,且宜為0.05~10重量%,更宜為0.1~5重量%。The blending amount of the aforementioned photopolymerization initiator is 20% by weight or less with respect to the total amount of the adhesive composition. The blending amount of the photopolymerization initiator is preferably 0.01 to 20% by weight, preferably 0.05 to 10% by weight, and more preferably 0.1 to 5% by weight.
又,在將本發明所使用之接著劑組成物作成含有自由基聚合性化合物作為硬化性成分之可見光線硬化性來使用時,尤宜使用對380nm以上之光有高感度之光聚合起始劑。對380nm以上之光線有高感度的光聚合起始劑將於後詳述。In addition, when the adhesive composition used in the present invention is used as a visible light curable containing a radical polymerizable compound as a curable component, it is particularly suitable to use a photopolymerization initiator with high sensitivity to light above 380nm . The photopolymerization initiator with high sensitivity to light above 380nm will be described in detail later.
作為前述光聚合起始劑,宜單獨使用下述通式(2)所示化合物、或併用通式(2)所示化合物與後述之對380nm以上光線有高感度的光聚合起始劑: [化學式2](式中,R4 及R5 表示-H、-CH2 CH3 、-iPr或Cl,R4 及R5 可相同或相異)。在使用通式(2)所示化合物時,其接著性優於單獨使用對380nm以上的光有高感度之光聚合起始劑的情形。通式(2)所示化合物當中,以R4 及R5 為-CH2 CH3 時的二乙基9-氧硫 尤佳。接著劑組成物中,相對於接著劑組成物之總量,通式(4)所示化合物之組成比率以0.1~5重量%為佳,以0.5~4重量%較佳,以0.9~3重量%更佳。As the aforementioned photopolymerization initiator, it is preferable to use the compound represented by the following general formula (2) alone or in combination with the compound represented by the general formula (2) and the photopolymerization initiator with high sensitivity to light of 380 nm or more described later: [ Chemical formula 2] (In the formula, R 4 and R 5 represent -H, -CH 2 CH 3 , -iPr or Cl, and R 4 and R 5 may be the same or different). When the compound represented by the general formula (2) is used, its adhesiveness is better than when a photopolymerization initiator with high sensitivity to light of 380 nm or more is used alone. Among the compounds represented by the general formula (2), when R 4 and R 5 are -CH 2 CH 3 , the diethyl 9-oxysulfide Especially good. In the adhesive composition, relative to the total amount of the adhesive composition, the composition ratio of the compound represented by the general formula (4) is preferably 0.1 to 5 wt%, preferably 0.5 to 4 wt%, and 0.9 to 3 wt% % Is better.
又,宜因應需要而添加聚合起始助劑。聚合起始助劑可舉如三乙胺、二乙胺、N-甲基二乙醇胺、乙醇胺、4-二甲胺苯甲酸、4-二甲胺苯甲酸甲酯、4-二甲胺苯甲酸乙酯、4-二甲胺苯甲酸異戊酯等,尤宜為4-二甲胺苯甲酸乙酯。使用聚合起始助劑時,其添加量相對於接著劑組成物之總量,一般為0~5重量%,並以0~4重量%為佳,0~3重量%為最佳。In addition, it is suitable to add a polymerization initiation assistant as necessary. The polymerization initiation aid may include, for example, triethylamine, diethylamine, N-methyldiethanolamine, ethanolamine, 4-dimethylamine benzoic acid, methyl 4-dimethylamine benzoate, 4-dimethylamine benzoic acid Ethyl, isoamyl 4-dimethylaminobenzoate, etc., and ethyl 4-dimethylaminobenzoate is particularly preferred. When the polymerization initiation aid is used, its addition amount is generally 0-5 wt% relative to the total amount of the adhesive composition, preferably 0-4 wt%, and most preferably 0-3 wt%.
又,可因應需要而併用周知之光聚合起始劑。具有UV吸收能的透明保護薄膜不會穿透380nm以下的光線,因此光聚合起始劑宜使用對380nm以上之光線有高感度的光聚合起始劑。具體而言,可舉如2-甲基-1-(4-甲硫基苯基)-2-啉丙-1-酮、2-苄基-2-二甲胺基-1-(4-啉苯基)-丁-1-酮、2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-啉基)苯基]-1-丁酮、2,4,6-三甲基苯甲醯基-二苯基-膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物、雙(η5-2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦等。In addition, well-known photopolymerization initiators can be used in combination as needed. The transparent protective film with UV absorption energy will not penetrate the light below 380nm, so the photopolymerization initiator should be a photopolymerization initiator with high sensitivity to light above 380nm. Specifically, for example, 2-methyl-1-(4-methylthiophenyl)-2- Phenylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4- Phenylphenyl)-butan-1-one, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4- (Hydroxy)phenyl)-1-butanone, 2,4,6-trimethylbenzyl-diphenyl-phosphine oxide, bis(2,4,6-trimethylbenzyl) -Phenylphosphine oxide, bis(η5-2,4-cyclopentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium Wait.
尤其,光聚合起始劑除了通式(2)的光聚合起始劑以外,宜進一步使用下述通式(3)所示化合物: [化學式3](式中,R6 、R7 及R8 表示-H、-CH3 、-CH2 CH3 、-iPr或Cl,且R6 、R7 及R8 可相同或相異)。通式(3)所示化合物可適當使用亦屬市售品的2-甲基-1-(4-甲硫基苯基)-2-啉丙-1-酮(商品名:IRGACURE907,製造者:BASF)。除此之外,2-苄基-2-二甲胺基-1-(4-啉苯基)-丁-1-酮(商品名:IRGACURE369,製造者:BASF)、2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-啉基)苯基]-1-丁酮(商品名:IRGACURE379,製造者:BASF)由於感度高,因此較為理想。In particular, in addition to the photopolymerization initiator of the general formula (2), the photopolymerization initiator preferably further uses a compound represented by the following general formula (3): [Chemical formula 3] (In the formula, R 6 , R 7 and R 8 represent -H, -CH 3 , -CH 2 CH 3 , -iPr or Cl, and R 6 , R 7 and R 8 may be the same or different). The compound represented by the general formula (3) can suitably use 2-methyl-1-(4-methylthiophenyl)-2- which is also a commercially available product. Phytopropan-1-one (trade name: IRGACURE907, manufacturer: BASF). In addition, 2-benzyl-2-dimethylamino-1-(4- Phenylphenyl)-butan-1-one (trade name: IRGACURE369, manufacturer: BASF), 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4 -(4- Linyl)phenyl]-1-butanone (trade name: IRGACURE379, manufacturer: BASF) is preferable because of its high sensitivity.
<具有活性亞甲基之自由基聚合性化合物、以及具有奪氫作用之自由基聚合起始劑> 上述接著劑組成物中,當使用具有活性亞甲基之自由基聚合性化合物作為自由基聚合性化合物時,宜與具有奪氫作用之自由基聚合起始劑組合使用。藉由前述結構,則特別是即便是在高濕度環境或剛從水中取出(非乾燥狀態),偏光薄膜所具有的接著劑層之接著性仍會顯著提升。該理由並未究明,但可推測為以下原因。即,具有活性亞甲基之自由基聚合性化合物會一邊與構成接著劑層之其他自由基聚合性化合物一起聚合,一邊被組入接著劑層中之基底聚合物的主鏈及/或支鏈,形成接著劑層。於前述聚合過程中,一旦存在具奪氫作用之自由基聚合起始劑,就會一邊形成構成接著劑層之基底聚合物、一邊從具有活性亞甲基之自由基聚合性化合物奪氫,而在亞甲基產生自由基。然後,產生自由基之亞甲基會與PVA等偏光件之羥基反應,而在接著劑層與偏光件之間形成共價鍵。就其結果可推知特別是即便在非乾燥狀態下,偏光薄膜所具有之接著劑層之接著性仍會明顯提升。<The radical polymerizable compound with active methylene group and the radical polymerization initiator with hydrogen abstraction> In the above-mentioned adhesive composition, when a radical polymerizable compound with active methylene group is used as the radical polymerization In the case of sexual compounds, it is suitable to be used in combination with a radical polymerization initiator with hydrogen abstraction. With the aforementioned structure, especially even in a high humidity environment or just taken out of water (non-dried state), the adhesiveness of the adhesive layer of the polarizing film will still be significantly improved. This reason has not been clarified, but it can be presumed to be the following reason. That is, the radical polymerizable compound with active methylene groups polymerizes with other radical polymerizable compounds constituting the adhesive layer while being incorporated into the main chain and/or branch chain of the base polymer in the adhesive layer , Form an adhesive layer. In the aforementioned polymerization process, once a radical polymerization initiator with hydrogen abstraction is present, it will form the base polymer constituting the adhesive layer while abstracting hydrogen from the radical polymerizable compound with active methylene groups. Free radicals are generated in the methylene group. Then, the methylene group that generates free radicals reacts with the hydroxyl group of the polarizing member such as PVA to form a covalent bond between the adhesive layer and the polarizing member. As a result, it can be inferred that even in a non-dried state, the adhesiveness of the adhesive layer of the polarizing film will still be significantly improved.
於本發明中,具有奪氫作用之自由基聚合起始劑可舉例如9-氧硫 系自由基聚合起始劑、二苯基酮系自由基聚合起始劑等。前述自由基聚合起始劑以9-氧硫 系自由基聚合起始劑為佳。作為9-氧硫 系自由基聚合起始劑,可舉例如上述通式(2)所示化合物。通式(2)所示化合物之具體例可舉出9-氧硫 、二甲基9-氧硫 、二乙基9-氧硫 、異丙基9-氧硫 、氯9-氧硫 等。通式(2)所示化合物當中,尤佳的是R4 及R5 為-CH2 CH3 時的二乙基9-氧硫 。In the present invention, the radical polymerization initiator with hydrogen abstraction can include, for example, 9-oxysulfur It is a radical polymerization initiator, a benzophenone-based radical polymerization initiator, etc. The aforementioned radical polymerization initiator is 9-oxysulfur It is preferably a radical polymerization initiator. As 9-oxysulfur The radical polymerization initiator includes, for example, the compound represented by the above-mentioned general formula (2). Specific examples of compounds represented by the general formula (2) include 9-oxysulfur , Dimethyl 9-oxysulfur , Diethyl 9-oxysulfur , Isopropyl 9-oxysulfur , Chlorine 9-oxysulfur Wait. Among the compounds represented by the general formula (2), particularly preferred is diethyl 9-oxysulfur when R 4 and R 5 are -CH 2 CH 3 .
在上述接著劑組成物中含有具活性亞甲基之自由基聚合性化合物、與具有奪氫作用之自由基聚合起始劑的情況下,令硬化性成分的總量為100重量%時,宜含有1~50重量%之前述具有活性亞甲基的自由基聚合性化合物,及宜相對於硬化性樹脂組成物之總量,含有0.1~10重量%之自由基聚合起始劑。In the case where the above-mentioned adhesive composition contains a radical polymerizable compound having a reactive methylene group and a radical polymerization initiator having a hydrogen abstraction effect, when the total amount of the curable component is 100% by weight, it is preferable It contains 1-50% by weight of the aforementioned radical polymerizable compound having active methylene groups, and preferably contains 0.1-10% by weight of a radical polymerization initiator relative to the total amount of the curable resin composition.
如上述,於本發明中,在具有奪氫作用之自由基聚合起始劑存在下,於具有活性亞甲基之自由基聚合性化合物之亞甲基產生自由基,而前述亞甲基與PVA等偏光件之羥基會進行反應形成共價鍵。因此,為了在具有活性亞甲基之自由基聚合性化合物之亞甲基產生自由基,並充分形成前述共價鍵,則在令硬化性成分之總量為100重量%時,具有活性亞甲基之自由基聚合性化合物以含有1~50重量%為佳,進而以含有3~30重量%較佳。為使耐水性充份提升並增進在非乾燥狀態下之接著性,具有活性亞甲基之自由基聚合性化合物宜設為1重量%以上。另一方面,一旦超過50重量%,就會出現接著劑層硬化不良的情況。此外,相對於接著劑組成物之總量,具有奪氫作用之自由基聚合起始劑是以含有0.1~10重量%為佳,更以含有0.3~9重量%較佳。為使奪氫反應充分地進行,宜使用0.1重量%以上的自由基聚合起始劑。另一方面,一旦超過10重量%,就會有未完全溶解於組成物中的情況。As mentioned above, in the present invention, in the presence of a radical polymerization initiator having a hydrogen abstraction effect, free radicals are generated from the methylene group of the radical polymerizable compound having a reactive methylene group, and the aforementioned methylene group and PVA The hydroxyl groups of the polarizer will react to form a covalent bond. Therefore, in order to generate free radicals at the methylene group of the radical polymerizable compound having active methylene groups and fully form the aforementioned covalent bonds, when the total amount of the curable component is 100% by weight, active methylene groups The radical polymerizable compound of the base preferably contains 1-50% by weight, and more preferably contains 3-30% by weight. In order to sufficiently improve the water resistance and improve the adhesiveness in a non-dry state, the radical polymerizable compound with active methylene group is preferably set to 1% by weight or more. On the other hand, if it exceeds 50% by weight, poor curing of the adhesive layer may occur. In addition, with respect to the total amount of the adhesive composition, the radical polymerization initiator with hydrogen abstraction is preferably contained in 0.1-10% by weight, more preferably 0.3-9% by weight. In order to allow the hydrogen abstraction reaction to proceed sufficiently, it is preferable to use 0.1% by weight or more of a radical polymerization initiator. On the other hand, if it exceeds 10% by weight, it may not completely dissolve in the composition.
<光陽離子聚合起始劑> 陽離子聚合性接著劑組成物含有選自於以上所說明之具環氧基的化合物、具氧雜環丁烷基的化合物、具乙烯基醚基的化合物中之至少1種化合物作為硬化性成分,且其等均可經由陽離子聚合而硬化,所以摻混光陽離子聚合起始劑。該光陽離子聚合起始劑藉由可見光線、紫外線、X射線、電子射線等活性能量線之照射,會產生陽離子種或路易士酸,引發環氧基與氧雜環丁烷基的聚合反應。光陽離子聚合起始劑可使用光酸產生劑及光鹼產生劑,且適合使用後述之光酸產生劑。又,本發明所使用之接著劑組成物要採用可見光線硬化性者時,宜使用特別對380nm以上的光具有高感度的光陽離子聚合起始劑,但光陽離子聚合起始劑一般而言是在300nm附近或比其更短的波長區域顯示極大吸收的化合物,所以可藉由摻混對較比其更長之波長區域、具體而言為比380nm更長的波長的光顯示極大吸收之光敏化劑,來感應在其附近波長的光,促進源自光陽離子聚合起始劑之陽離子種或酸的產生。作為光敏化劑,可舉例如蒽化合物、芘化合物、羰基化合物、有機硫化合物、過硫化物、氧化還原系化合物、偶氮及重氮化合物、鹵素化合物及光還原性色素等,其等亦可將2種類以上混合使用。尤其蒽化合物因光敏化效果優異而甚為理想,具體而言,可舉如ANTHRACURE UVS-1331、ANTHRACURE UVS-1221(川崎化成公司製)。光敏化劑的含量以0.1重量%~5重量%為佳,0.5重量%~3重量%較佳。<Photocationic polymerization initiator> The cationic polymerizable adhesive composition contains at least one selected from the group consisting of epoxy-containing compounds, oxetanyl-containing compounds, and vinyl ether group-containing compounds described above One compound is used as a curable component, and all of them can be cured by cationic polymerization, so a photocationic polymerization initiator is blended. The photocationic polymerization initiator is irradiated with active energy rays such as visible rays, ultraviolet rays, X-rays, electron rays, etc., to generate cationic species or Lewis acid, and initiate the polymerization reaction of epoxy groups and oxetanyl groups. As a photocationic polymerization initiator, a photoacid generator and a photobase generator can be used, and the photoacid generator mentioned later can be used suitably. In addition, when the adhesive composition used in the present invention is to be curable by visible light, it is preferable to use a photocationic polymerization initiator that is particularly sensitive to light above 380 nm. However, the photocationic polymerization initiator is generally Compounds that exhibit maximum absorption in the vicinity of 300 nm or shorter wavelength regions, so it can be blended with a photosensitive compound that exhibits maximum absorption for longer wavelength regions, specifically, light with wavelengths longer than 380 nm A chemical agent to sense light of a wavelength near it and promote the production of cationic species or acids derived from the photocationic polymerization initiator. Examples of photosensitizers include anthracene compounds, pyrene compounds, carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreducible dyes. They may also be used Mix two or more types to use. In particular, the anthracene compound is very desirable because of its excellent photosensitizing effect. Specifically, there are ANTHRACURE UVS-1331 and ANTHRACURE UVS-1221 (manufactured by Kawasaki Chemical Co., Ltd.). The content of the photosensitizer is preferably 0.1% to 5% by weight, preferably 0.5% to 3% by weight.
<其他成分> 本發明所使用之接著劑組成物宜含有下述成分。<Other components> The adhesive composition used in the present invention preferably contains the following components.
<丙烯酸系寡聚物> 本發明所使用之接著劑組成物中,除了前述自由基聚合性化合物之硬化性成分以外,還可含有(甲基)丙烯酸單體聚合而成之丙烯酸系寡聚物。藉由接著劑組成物中含有成分,可在對該組成物照射活性能量線使其硬化時降低硬化收縮,而可降低與接著劑、偏光件及透明保護薄膜等被著體之界面應力。其結果,可抑制接著劑層與被著體的接著性低減。為能充分抑制硬化物層(接著劑層)的硬化收縮,相對於接著劑組成物之總量,丙烯酸系寡聚物的含量以20重量%以下為佳,15重量%以下較佳。接著劑組成物中之丙烯酸系寡聚物的含量一旦過多,則在對該組成物照射活性能量線時的反應速度會急遽降低,而有造成硬化不良的情況。另一方面,相對於接著劑組成物之總量,丙烯酸系寡聚物以含有3重量%以上為佳,含有5重量%以上較佳。<Acrylic oligomer> The adhesive composition used in the present invention may contain, in addition to the curable component of the radical polymerizable compound, an acrylic oligomer formed by polymerization of (meth)acrylic monomers . By containing components in the adhesive composition, the curing shrinkage can be reduced when the composition is irradiated with active energy rays to harden the composition, and the interface stress with the adherend, such as the adhesive, the polarizer, and the transparent protective film, can be reduced. As a result, the adhesion between the adhesive layer and the adherend can be suppressed from decreasing. In order to sufficiently suppress the curing shrinkage of the cured product layer (adhesive layer), the content of the acrylic oligomer is preferably 20% by weight or less, and preferably 15% by weight or less, relative to the total amount of the adhesive composition. If the content of the acrylic oligomer in the adhesive composition is too large, the reaction rate when the composition is irradiated with active energy rays is drastically reduced, which may cause poor curing. On the other hand, with respect to the total amount of the adhesive composition, the acrylic oligomer is preferably contained at 3% by weight or more, and more preferably at 5% by weight.
考慮塗敷時的作業性和均勻性時,接著劑組成物係以低黏度為佳,所以(甲基)丙烯酸單體聚合而成之丙烯酸系寡聚物亦以低黏度為佳。作為低黏度並可防止接著劑層硬化收縮的丙烯酸系寡聚物,以重量平均分子量(Mw)在15000以下者為佳,而10000以下者更佳,5000以下者最佳。另一方面,為能充分抑制硬化物層(接著劑層)之硬化收縮,丙烯酸系寡聚物之重量平均分子量(Mw)以在500以上為佳,1000以上更佳,1500以上尤佳。作為構成丙烯酸系寡聚物之(甲基)丙烯酸單體,具體而言可舉例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、2-甲基-2-硝基丙基(甲基)丙烯酸酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸三級戊酯、(甲基)丙烯酸3-戊酯、2,2-二甲基丁基(甲基)丙烯酸酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸2-乙基己酯、4-甲基-2-丙基戊基(甲基)丙烯酸酯、N-十八基(甲基)丙烯酸酯等(甲基)丙烯酸(碳數1-20)烷基酯類;以及例如環烷基(甲基)丙烯酸酯(例如,(甲基)丙烯酸環己酯、(甲基)丙烯酸環戊酯等)、(甲基)丙烯酸芳烷酯(例如,(甲基)丙烯酸苄酯等)、多環式(甲基)丙烯酸酯(例如(甲基)丙烯酸2-異莰酯、(甲基)丙烯酸2-降莰基甲酯、5-降莰烯-2-基-甲基(甲基)丙烯酸酯、3-甲基-2-降莰基甲基(甲基)丙烯酸酯等)、含羥基(甲基)丙烯酸酯類(例如(甲基)丙烯酸羥乙酯、(甲基)丙烯酸2-羥丙酯、2,3-二羥丙基甲基-丁基(甲基)甲基丙烯酸酯等)、含烷氧基或苯氧基的(甲基)丙烯酸酯類((甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸2-乙氧基乙酯、(甲基)丙烯酸2-甲氧基甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙基卡必醇(甲基)丙烯酸酯、(甲基)丙烯酸苯氧乙酯等)、含環氧基(甲基)丙烯酸酯類(例如,(甲基)丙烯酸環氧丙酯等)、含鹵素(甲基)丙烯酸酯類(例如(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,2-三氟乙基乙酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸六氟丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯等)、(甲基)丙烯酸烷基胺基烷酯(例如二甲基胺基乙基(甲基)丙烯酸酯等)等。該等(甲基)丙烯酸酯可單獨使用或將2種以上併用。作為丙烯酸系寡聚物之具體例,可舉出東亞合成公司製「ARUFON」、綜研化學公司製「ACTFLOW」、BASF JAPAN公司製「JONCRYL」等。When considering workability and uniformity during coating, the adhesive composition is preferably low viscosity, so the acrylic oligomer polymerized by the (meth)acrylic monomer is also preferably low viscosity. As an acrylic oligomer with low viscosity and capable of preventing the hardening and shrinkage of the adhesive layer, the weight average molecular weight (Mw) is preferably below 15,000, more preferably below 10,000, and most preferably below 5000. On the other hand, in order to sufficiently suppress the curing shrinkage of the cured layer (adhesive layer), the weight average molecular weight (Mw) of the acrylic oligomer is preferably 500 or more, more preferably 1000 or more, and particularly preferably 1500 or more. Specific examples of the (meth)acrylic monomer constituting the acrylic oligomer include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, (meth) ) Isopropyl acrylate, 2-methyl-2-nitropropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, 2-butyl (meth)acrylate Ester, tertiary butyl (meth)acrylate, n-pentyl (meth)acrylate, tertiary pentyl (meth)acrylate, 3-pentyl (meth)acrylate, 2,2-dimethylbutyl (Meth)acrylate, n-hexyl (meth)acrylate, cetyl (meth)acrylate, n-octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 4-methyl- (Meth)acrylic acid (carbon number 1-20) alkyl esters such as 2-propylpentyl (meth)acrylate and N-octadecyl (meth)acrylate; and, for example, cycloalkyl (methyl) ) Acrylate (for example, cyclohexyl (meth)acrylate, cyclopentyl (meth)acrylate, etc.), aralkyl (meth)acrylate (for example, benzyl (meth)acrylate, etc.), polycyclic (Meth) acrylate (e.g. 2-isobornyl (meth)acrylate, 2-norbornyl methyl (meth)acrylate, 5-norbornen-2-yl-methyl (meth)acrylate) , 3-Methyl-2-norbornylmethyl (meth)acrylate, etc.), hydroxyl-containing (meth)acrylates (such as hydroxyethyl (meth)acrylate, 2-hydroxy (meth)acrylate) Propyl ester, 2,3-dihydroxypropylmethyl-butyl (meth)methacrylate, etc.), (meth)acrylates containing alkoxy or phenoxy groups ((meth)acrylic acid 2 -Methoxyethyl, 2-ethoxyethyl (meth)acrylate, 2-methoxymethoxyethyl (meth)acrylate, 3-methoxybutyl (meth)acrylate, ethyl Carbitol (meth)acrylate, phenoxyethyl (meth)acrylate, etc.), epoxy-containing (meth)acrylates (for example, glycidyl (meth)acrylate, etc.), containing Halogen (meth)acrylates (e.g. 2,2,2-trifluoroethyl (meth)acrylate, 2,2,2-trifluoroethyl ethyl (meth)acrylate, tetrafluoroethyl (meth)acrylate Fluoropropyl ester, hexafluoropropyl (meth)acrylate, octafluoropentyl (meth)acrylate, heptafluorodecyl (meth)acrylate, etc.), alkylaminoalkyl (meth)acrylate (e.g. Dimethylaminoethyl (meth)acrylate etc.) and the like. These (meth)acrylates can be used individually or in combination of 2 or more types. Specific examples of acrylic oligomers include "ARUFON" manufactured by Toagosei Co., Ltd., "ACTFLOW" manufactured by Soken Chemical Co., Ltd., and "JONCRYL" manufactured by BASF JAPAN.
<光酸產生劑> 上述接著劑組成物中可含有光酸產生劑。上述接著劑組成物中含有光酸產生劑時,相較於不含光酸產生劑之情況,可躍進地提升接著劑層之耐水性及耐久性。光酸產生劑可以下述通式(4)來表示。<Photo-acid generator> The above-mentioned adhesive composition may contain a photo-acid generator. When the photoacid generator is contained in the above-mentioned adhesive composition, the water resistance and durability of the adhesive layer can be improved drastically compared to the case where the photoacid generator is not contained. The photoacid generator can be represented by the following general formula (4).
通式(4) [化學式4](惟L+ 表示任意的鎓陽離子;且,X- 表示選自於由PF66 - 、SbF6 - 、AsF6 - 、SbCl6 - 、BiCl5 - 、SnCl6 - 、ClO4 - 、二硫胺甲酸鹽陰離子、SCN- 所構成群組中之相對陰離子)。General formula (4) [Chemical formula 4] (L + but an arbitrary cation; and, X - represents a group selected consisting of PF6 6 -, SbF 6 -, AsF 6 -, SbCl 6 -, BiCl 5 -, SnCl 6 -, ClO 4 -, two thiamin Formate anion, SCN - the relative anion in the group).
其次,說明通式(4)中之相對陰離子X- 。 Next, the relative anion X- in the general formula (4) will be explained.
通式(4)中的相對陰離子X- 原理上並無特別限制,而以非親核性陰離子為佳。當相對陰離子X- 為非親核性陰離子時,因不易與共存於分子內的陽離子或所併用之各種材料產生親核反應,故可提升通式(4)所示光酸產生劑本身或使用有其之組成物的歷時穩定性。在此所謂的非親核性陰離子是指引發親核反應的能力較低之陰離子。作為此種陰離子,可舉出PF66 - 、SbF6 - 、AsF6 - 、SbCl6 - 、BiCl5 - 、SnCl6 - 、ClO4 - 、二硫胺甲酸鹽陰離子、SCN- 等。 The relative anion X- in the general formula (4) is not particularly limited in principle, and non-nucleophilic anions are preferred. When the relative anion X -is a non-nucleophilic anion, it is not easy to produce a nucleophilic reaction with cations coexisting in the molecule or various materials used in combination, so the photoacid generator represented by the general formula (4) itself or the use of The diachronic stability of its composition. The so-called non-nucleophilic anion here refers to an anion with a low ability to initiate a nucleophilic reaction. Examples of such anions include PF6 6 -, SbF 6 -, AsF 6 -, SbCl 6 -, BiCl 5 -, SnCl 6 -, ClO 4 -, two thiocarbamoyl anions, SCN - and the like.
作為本發明之光酸產生劑之理想具體例,具體而言可舉例如「Cyracure-UVI-6992」、「Cyracure-UVI-6974」(以上為日本陶氏化學(Dow Chemical)股份有限公司製)、「ADEKA OPTOMER SP150」、「ADEKA OPTOMER SP152」、「ADEKA OPTOMER SP170」、「ADEKA OPTOMER SP172」(以上為艾迪科(ADEKA)股份有限公司製)、「IRGACURE250」(汽巴精化(Ciba Specialty Chemicals)公司製)、「CI-5102」、「CI-2855」(以上為日本曹達公司製)、「SANEIDO SI-60L」、「SANEIDO SI-80L」、「SANEIDO SI-100L」、「SANEIDO SI-110L」、「SANEIDO SI-180L」(以上為三新化學公司製)、「CPI-100P」、「CPI-100A」(以上為三亞普羅(SAN-APRO)股份有限公司製)、「WPI-069」、「WPI-113」、「WPI-116」、「WPI-041」、「WPI-044」、「WPI-054」、「WPI-055」、「WPAG-281」、「WPAG-567」、「WPAG-596」(以上為和光純藥公司製)。As preferred specific examples of the photoacid generator of the present invention, specific examples include "Cyracure-UVI-6992" and "Cyracure-UVI-6974" (the above are made by Dow Chemical Co., Ltd.) , "ADEKA OPTOMER SP150", "ADEKA OPTOMER SP152", "ADEKA OPTOMER SP170", "ADEKA OPTOMER SP172" (above manufactured by ADEKA Co., Ltd.), "IRGACURE250" (Ciba Specialty Chemicals) company), "CI-5102", "CI-2855" (the above are manufactured by Soda Corporation in Japan), "SANEIDO SI-60L", "SANEIDO SI-80L", "SANEIDO SI-100L", "SANEIDO SI -110L", "SANEIDO SI-180L" (above manufactured by Sanxin Chemical Co., Ltd.), "CPI-100P", "CPI-100A" (above manufactured by Sanya Pro (SAN-APRO) Co., Ltd.), "WPI- 069", "WPI-113", "WPI-116", "WPI-041", "WPI-044", "WPI-054", "WPI-055", "WPAG-281", "WPAG-567" , "WPAG-596" (The above is made by Wako Pure Chemical Industries, Ltd.).
相對於接著劑組成物之總量,光酸產生劑之含量為10重量%以下,並以0.01~10重量%為佳,0.05~5重量%較佳,0.1~3重量%尤佳。Relative to the total amount of the adhesive composition, the content of the photoacid generator is 10% by weight or less, preferably 0.01-10% by weight, preferably 0.05-5% by weight, and particularly preferably 0.1-3% by weight.
<光鹼產生劑> 光鹼產生劑是一可藉由紫外線或可見光線等光照射而使分子結構產生變化或分子開裂,作為自由基聚合性化合物或環氧樹脂的聚合反應之觸媒來發揮功能,生成1種以上鹼性物質之化合物。鹼性物質例如為2級胺、3級胺。作為光鹼產生劑可舉例如,上述α-胺苯乙酮化合物、上述肟酯化合物、或具有醯氧基亞胺基、N-甲醯基化芳香族胺基、N-醯基化芳香族胺基、硝基苄基胺甲酸酯基、烷氧基苄基胺甲酸酯基等取代基的化合物。其中又以肟酯化合物為佳。<Photobase generator> A photobase generator can change or crack the molecular structure by light irradiation such as ultraviolet rays or visible rays, and act as a catalyst for the polymerization reaction of radical polymerizable compounds or epoxy resins. Function to generate more than one kind of alkaline compounds. The basic substance is, for example, a secondary amine and a tertiary amine. As the photobase generator, for example, the above-mentioned α-aminoacetophenone compound, the above-mentioned oxime ester compound, or having an oxyimino group, an N-methylated aromatic amine group, and an N-acylated aromatic Compounds with substituents such as amino groups, nitrobenzyl carbamate groups, and alkoxybenzyl carbamate groups. Among them, oxime ester compounds are preferred.
具有醯氧基亞胺基之化合物可舉出譬如O,O’-琥珀酸二苯乙酮肟、O,O’-琥珀酸二萘乙酮肟、二苯甲酮肟丙烯酸酯-苯乙烯共聚物。Compounds having an oxyimino group include, for example, O,O'-benzophenone oxime succinate, O,O'-benzophenone oxime succinate, benzophenone oxime acrylate-styrene copolymer Things.
具有N-甲醯基化芳香族胺基、N-醯基化芳香族胺基之化合物可舉例如,二-N-(對甲醯胺基)二苯基甲烷、二-N-(對乙醯胺基)二苯基甲烷、二-N-(對苯甲醯胺基)二苯基甲烷、4-甲醯胺基二苯乙 烯、4-乙醯胺基二苯乙烯、2,4-二甲醯胺基二苯乙烯、1-甲醯胺基萘、1-乙醯胺基萘、1,5-二甲醯胺基萘、1-甲醯胺基蒽、1,4-二甲醯胺基蒽、1-乙醯胺基蒽、1,4-二甲醯胺基蒽醌、1,5-二甲醯胺基蒽醌、3,3’-二甲基-4,4’-二甲醯胺基聯苯、4,4’-二甲醯胺基二苯基酮等。The compounds having N-formylated aromatic amine groups and N-formylated aromatic amine groups include, for example, two-N-(p-formylamino) diphenylmethane, two-N-(p-ethyl Amino) diphenylmethane, bis-N-(p-benzamide) diphenylmethane, 4-formamido stilbene, 4-acetamido stilbene, 2,4- Dimethamidostilbene, 1-methamidonaphthalene, 1-acetamido naphthalene, 1,5-dimethylamido naphthalene, 1-methamido anthracene, 1,4-dimethyl Aminoanthracene, 1-acetylaminoanthracene, 1,4-dimethylaminoanthraquinone, 1,5-dimethylaminoanthraquinone, 3,3'-dimethyl-4,4' -Dimethamidobiphenyl, 4,4'-dimethylamido diphenyl ketone, etc.
作為具有硝基苄基胺甲酸酯基、烷氧基苄基胺甲酸酯基之化合物可舉例如,雙{{(2-硝基苄基)氧基}羰基}二胺基二苯甲烷、2,4-二{{(2-硝基苄基)氧基}二苯乙烯、雙{{(2-硝基苄基氧基)羰基}己烷-1,6-二胺、間茬胺{{(2-硝基-4-氯苄基)氧基}醯胺}。Examples of compounds having a nitrobenzylcarbamate group and an alkoxybenzylcarbamate group include bis{{(2-nitrobenzyl)oxy}carbonyl}diaminodiphenylmethane , 2,4-bis{{(2-nitrobenzyl)oxy}stilbene, bis{{(2-nitrobenzyloxy)carbonyl}hexane-1,6-diamine, stubble Amine {{(2-nitro-4-chlorobenzyl)oxy}amide}.
光鹼產生劑宜為肟酯化合物及α-胺苯乙酮化合物之至少任1種,更宜為肟酯化合物。作為α-胺苯乙酮化合物,尤以具有2個以上氮原子者為佳。The photobase generator is preferably at least one of an oxime ester compound and an α-amine acetophenone compound, and more preferably an oxime ester compound. As the α-amine acetophenone compound, those having two or more nitrogen atoms are particularly preferred.
作為其他的光鹼產生劑,亦可使用WPBG-018(商品名:9-anthrylmethyl N,N’-diethylcarbamate),WPBG-027(商品名:(E)-1-[3-(2-hydroxyphenyl)-2-propenoyl]piperidine),WPBG-082(商品名:guanidinium2-(3-benzoylphenyl)propionate),WPBG-140(商品名:1-(anthraquinon-2-yl)ethyl imidazolecarboxylate)等之光鹼產生劑。As other photobase generators, WPBG-018 (trade name: 9-anthrylmethyl N,N'-diethylcarbamate), WPBG-027 (trade name: (E)-1-[3-(2-hydroxyphenyl)) can also be used -2-propenoyl]piperidine), WPBG-082 (trade name: guanidinium2-(3-benzoylphenyl)propionate), WPBG-140 (trade name: 1-(anthraquinon-2-yl)ethyl imidazolecarboxylate), etc. .
<含有烷氧基、環氧基中任一者之化合物> 以上述接著劑組成物來說,於接著劑組成物中可併用光酸產生劑、與含有烷氧基及環氧基中任一者之化合物。<A compound containing either an alkoxy group or an epoxy group> In the adhesive composition described above, a photoacid generator, and any one of an alkoxy group and an epoxy group may be used together in the adhesive composition The compound of the person.
(具環氧基之化合物及高分子) 使用分子內具有1個以上環氧基之化合物或者分子內具有2個以上環氧基之高分子(環氧樹脂)時,亦可併用分子內具有二個以上與環氧基有反應性之官能基的化合物。此處所謂與環氧基有反應性之官能基,可舉如羧基、酚性羥基、巰基、1級或2級芳香族胺基等。考慮到3維硬化性,該等官能基以在一分子中具有2個以上尤佳。(Epoxy group-containing compounds and polymers) When using a compound having one or more epoxy groups in the molecule or a polymer (epoxy resin) having two or more epoxy groups in the molecule, it can also be used in combination with two or more epoxy groups in the molecule. Compounds with more than one functional group reactive with epoxy groups. The functional group reactive with the epoxy group here includes, for example, a carboxyl group, a phenolic hydroxyl group, a mercapto group, a primary or secondary aromatic amine group, and the like. Considering the three-dimensional hardenability, it is preferable to have two or more functional groups in one molecule.
作為在分子內具有1個以上環氧基之高分子,可舉例如環氧樹脂,以及由雙酚A與表氯醇所衍生之雙酚A型環氧樹脂、由雙酚F與表氯醇所衍生之雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚酚醛型環氧樹脂、甲酚酚醛型環氧樹脂、雙酚A酚醛型環氧樹脂、雙酚F酚醛型環氧樹脂、脂環式環氧樹脂、二苯基醚型環氧樹脂、氫醌型環氧樹脂、萘型環氧樹脂、聯苯型環氧樹脂、茀型環氧樹脂、3官能型環氧樹脂、4官能型環氧樹脂等多官能型環氧樹脂、縮水甘油酯型環氧樹脂、縮水甘油胺型環氧樹脂、海因(hydantoin)型環氧樹脂、三聚異氰酸酯型環氧樹脂、脂肪族鏈狀環氧樹脂等,該等環氧樹脂亦可被鹵素化,亦可被氫化。市售的環氧樹脂製品,可舉例如Japan Epoxy Resins股份公司製的JERCoat 828、1001、801N、806、807、152、604、630、871、YX8000、YX8034、YX4000、DIC股份公司製的Epiclon830、EXA835LV、HP4032D、HP820、股份公司艾迪科(ADEKA)製的EP4100系列、EP4000系列、EPU系列、DAICEL化學股份公司製的CELLOXIDE系列(2021、2021P、2083、2085、3000等)、EPOLEAD系列、EHPE系列、新日鐵化學公司製的YD系列、YDF系列、YDCN系列、YDB系列、苯氧樹脂(為由雙酚類及表氯醇所合成之聚羥基聚醚並在兩末端具有環氧基;YP系列等)、NAGASE CHEMTEX公司製的DENACOL系列、共榮社化學公司製的Epolite系列等,惟不限於此。該等環氧基樹脂亦可併用2種以上。Examples of polymers having one or more epoxy groups in the molecule include epoxy resins, bisphenol A type epoxy resins derived from bisphenol A and epichlorohydrin, and bisphenol F and epichlorohydrin. Derived bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, bisphenol A novolac epoxy resin, bisphenol F novolac epoxy Resins, alicyclic epoxy resins, diphenyl ether type epoxy resins, hydroquinone type epoxy resins, naphthalene type epoxy resins, biphenyl type epoxy resins, sulphur type epoxy resins, trifunctional epoxy resins , Multifunctional epoxy resins such as tetrafunctional epoxy resins, glycidyl ester epoxy resins, glycidylamine epoxy resins, hydantoin epoxy resins, trimeric isocyanate epoxy resins, fats Group chain epoxy resins, etc., these epoxy resins may be halogenated or hydrogenated. Commercially available epoxy resin products include, for example, JERCoat 828, 1001, 801N, 806, 807, 152, 604, 630, 871, YX8000, YX8034, YX4000, Epiclon 830 manufactured by DIC Co., Ltd. manufactured by Japan Epoxy Resins Co., Ltd. EXA835LV, HP4032D, HP820, EP4100 series, EP4000 series, EPU series manufactured by ADEKA Co., Ltd., CELLOXIDE series manufactured by DAICEL Chemical Co., Ltd. (2021, 2021P, 2083, 2085, 3000, etc.), EPOLEAD series, EHPE Series, YD series, YDF series, YDCN series, YDB series, phenoxy resin (polyhydroxy polyether synthesized from bisphenols and epichlorohydrin with epoxy groups at both ends) manufactured by Nippon Steel Chemical Company; YP series, etc.), DENACOL series manufactured by NAGASE CHEMTEX, Epolite series manufactured by Kyoeisha Chemical Company, etc., but not limited to these. These epoxy-based resins can also be used in combination of two or more kinds.
(具有烷氧基之化合物及高分子) 作為分子內具有烷氧基之化合物,只要是分子內具有1個以上烷氧基者就無特別限制,可使用周知之物。此種化合物,可舉如三聚氰胺化合物、胺基樹脂、矽烷耦合劑等作為代表。(Compound and polymer having an alkoxy group) As the compound having an alkoxy group in the molecule, there are no particular restrictions as long as it has one or more alkoxy groups in the molecule, and well-known ones can be used. Examples of such compounds include melamine compounds, amino resins, and silane coupling agents.
相對於接著劑組成物之總量,含烷氧基與環氧基中任一者之化合物的摻混量通常為30重量%以下,組成物中化合物的含量若過多,接著性就會降低,對落下試驗之耐衝擊性會有惡化的狀況。組成物中化合物的含量以20重量%以下較佳。另一方面,從耐水性之觀點來看,組成物中,化合物宜含有2重量%以上,含有5重量%以上較佳。The blending amount of the compound containing either an alkoxy group and an epoxy group relative to the total amount of the adhesive composition is usually 30% by weight or less. If the content of the compound in the composition is too large, the adhesiveness will decrease. The impact resistance of the drop test may deteriorate. The content of the compound in the composition is preferably 20% by weight or less. On the other hand, from the viewpoint of water resistance, the composition preferably contains the compound at 2% by weight or more, and more preferably 5% by weight or more.
<矽烷耦合劑> 本發明所使用之接著劑組成物為活性能量線硬化性硬化性的情形下,矽烷耦合劑宜使用活性能量線硬化性化合物,但即便不是活性能量線硬化性,亦能夠賦予同樣的耐水性。<Silane Coupling Agent> When the adhesive composition used in the present invention is curable with active energy ray, it is preferable to use an active energy ray curable compound for the silane coupling agent. The same water resistance.
矽烷耦合劑的具體例方面,作為活性能量線硬化性的化合物可舉如乙烯基三氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4環氧環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等。Specific examples of silane coupling agents include vinyl trichlorosilane, vinyl trimethoxy silane, vinyl triethoxy silane, 2-(3,4 epoxycyclohexyl) as active energy ray-curable compounds. ) Ethyl trimethoxy silane, 3-glycidoxy propyl trimethoxy silane, 3-glycidoxy propyl methyl diethoxy silane, 3-glycidoxy propyl triethyl Oxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methyl Acrylicoxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, etc.
適宜的是3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷。Suitable are 3-methacryloxypropyltrimethoxysilane and 3-acryloxypropyltrimethoxysilane.
不屬於活性能量線硬化性之矽烷耦合劑的具體例方面,則以具有胺基之矽烷耦合劑(D1)為佳。具有胺基之矽烷耦合劑(D1)的具體例,可舉如γ-胺丙基三甲氧基矽烷、γ-胺丙基三乙氧基矽烷、γ-胺丙基三異丙氧基矽烷、γ-胺丙基甲基二甲氧基矽烷、γ-胺丙基甲基二乙氧基矽烷、γ-(2-胺乙基)胺丙基三甲氧基矽烷、γ-(2-胺乙基)胺丙基甲基二甲氧基矽烷、γ-(2-胺乙基)胺丙基三乙氧基矽烷、γ-(2-胺乙基)胺丙基甲基二乙氧基矽烷、γ-(2-胺乙基)胺丙基三異丙氧基矽烷、γ-(2-(2-胺乙基)胺乙基)胺丙基三甲氧基矽烷、γ-(6-胺己基)胺丙基三甲氧基矽烷、3-(N-乙胺基)-2-甲基丙基三甲氧基矽烷、γ-脲丙基三甲氧基矽烷、γ-脲丙基三乙氧基矽烷、N-苯基-γ-胺丙基三甲氧基矽烷、N-苄基-γ-胺丙基三甲氧基矽烷、N-乙烯基苄基-γ-胺丙基三乙氧基矽烷、N-環己基胺甲基三乙氧基矽烷、N-環己基胺甲基二乙氧基甲基矽烷、N-苯基胺甲基三甲氧基矽烷、(2-胺乙基)胺甲基三甲氧基矽烷、N,N’-雙[3-(三甲氧基矽基)丙基]伸乙二胺等含胺基的矽烷類;N-(1,3-二甲基亞丁基)-3-(三乙氧基矽基)-1-丙胺等酮亞胺(ketimine)型矽烷類。In terms of specific examples of the silane coupling agent that is not curable by active energy rays, the silane coupling agent (D1) having an amine group is preferred. Specific examples of the silane coupling agent (D1) having an amino group include γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-Aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-(2-aminoethyl)aminopropyltrimethoxysilane, γ-(2-amine ethyl) Yl)aminopropylmethyldimethoxysilane, γ-(2-aminoethyl)aminopropyltriethoxysilane, γ-(2-aminoethyl)aminopropylmethyldiethoxysilane , Γ-(2-aminoethyl)aminopropyl triisopropoxysilane, γ-(2-(2-aminoethyl)aminoethyl)aminopropyl trimethoxysilane, γ-(6-amine Hexyl)aminopropyltrimethoxysilane, 3-(N-ethylamino)-2-methylpropyltrimethoxysilane, γ-ureapropyltrimethoxysilane, γ-ureapropyltriethoxy Silane, N-phenyl-γ-aminopropyl trimethoxysilane, N-benzyl-γ-aminopropyl trimethoxysilane, N-vinylbenzyl-γ-aminopropyl triethoxysilane, N-cyclohexylaminomethyl triethoxysilane, N-cyclohexylaminomethyl diethoxymethylsilane, N-phenylaminomethyl trimethoxysilane, (2-aminoethyl)aminomethyl Amino-containing silanes such as trimethoxysilane, N,N'-bis[3-(trimethoxysilyl)propyl]ethylenediamine; N-(1,3-dimethylbutylene)- 3-(Triethoxysilyl)-1-propylamine and other ketimine type silanes.
具有胺基之矽烷耦合劑(D1)可僅使用1種,亦可將多種組合使用。其等之中,為了確保良好的接著性,係以γ-胺丙基三甲氧基矽烷、γ-(2-胺乙基)胺丙基三甲氧基矽烷、γ-(2-胺乙基)胺丙基甲基二甲氧基矽烷、γ-(2-胺乙基)胺丙基三乙氧基矽烷、γ-(2-胺乙基)胺丙基甲基二乙氧基矽烷、N-(1,3-二甲基亞丁基)-3-(三乙氧基矽基)-1-丙胺為佳。The silane coupling agent (D1) having an amine group may be used only by one type, or may be used in combination of multiple types. Among them, in order to ensure good adhesiveness, γ-aminopropyltrimethoxysilane, γ-(2-aminoethyl)aminopropyltrimethoxysilane, γ-(2-aminoethyl) Aminopropylmethyldimethoxysilane, γ-(2-aminoethyl)aminopropyltriethoxysilane, γ-(2-aminoethyl)aminopropylmethyldiethoxysilane, N -(1,3-Dimethylbutylene)-3-(triethoxysilyl)-1-propylamine is preferred.
相對於接著劑組成物之總量,矽烷耦合劑之摻混量以0.01~20重量%之範圍為佳,0.05~15重量%較佳,0.1~10重量%更佳。因若摻混量超過20重量%時,接著劑組成物之儲存穩定性會惡化,而小於0.1重量%時則會無法充分發揮接著耐水性之效果。Relative to the total amount of the adhesive composition, the blending amount of the silane coupling agent is preferably in the range of 0.01-20% by weight, preferably 0.05-15% by weight, and more preferably 0.1-10% by weight. If the blending amount exceeds 20% by weight, the storage stability of the adhesive composition will deteriorate, and if it is less than 0.1% by weight, the adhesive water resistance effect cannot be fully exhibited.
上述以外之非屬活性能量線硬化性的矽烷耦合劑之具體例,可舉如3-脲丙基三乙氧基矽烷、3-氯丙基三甲氧基矽烷、3-巰丙基甲基二甲氧基矽烷、3-巰丙基三甲氧基矽烷、雙(三乙氧基矽基丙基)四硫醚、3-異氰酸酯丙基三乙氧基矽烷、咪唑矽烷等。Specific examples of non-active energy ray-curable silane coupling agents other than those mentioned above include 3-ureapropyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropylmethyl bis Methoxysilane, 3-mercaptopropyltrimethoxysilane, bis(triethoxysilylpropyl) tetrasulfide, 3-isocyanatepropyltriethoxysilane, imidazole silane, etc.
<具乙烯基醚基之化合物> 本發明所使用之接著劑組成物含有具乙烯基醚基之化合物時,偏光件與接著劑層之接著耐水性會提升,故甚為理想。可獲得該效果之理由雖尚不明朗,但可推測出理由之一是由於化合物所具有之乙烯基醚基與偏光件相互作用,而提高了偏光件與接著劑層之接著力。為能使偏光件與接著劑層之接著耐水性進一步提高,化合物宜為具乙烯基醚基之自由基聚合性化合物。此外,相對於接著劑組成物之總量,化合物之含量以含有0.1~19重量%為佳。<Compound with vinyl ether group> When the adhesive composition used in the present invention contains a compound having a vinyl ether group, the adhesion water resistance between the polarizing member and the adhesive layer will be improved, which is ideal. Although the reason for obtaining this effect is not clear, it can be presumed that one of the reasons is that the vinyl ether group of the compound interacts with the polarizing member to increase the adhesion between the polarizing member and the adhesive layer. In order to further improve the water resistance of the polarizer and the adhesive layer, the compound is preferably a radical polymerizable compound having a vinyl ether group. In addition, relative to the total amount of the adhesive composition, the content of the compound is preferably 0.1 to 19% by weight.
<可產生酮-烯醇互變異構性之化合物> 本發明所使用之接著劑組成物中,可含有可產生酮-烯醇互變異構性之化合物。例如,在含有交聯劑之接著劑組成物中或在可摻混交聯劑使用之接著劑組成物中,可適宜採用包含上述可產生酮-烯醇互變異構性之化合物的態樣。藉此,可抑制在摻混有機金屬化合物後之接著劑組成物的黏度過度上升或膠化、以及微凝膠物的生成,而能實現延長該組成物之使用期限的效果。<The compound capable of producing keto-enol tautomerism> The adhesive composition used in the present invention may contain a compound capable of producing keto-enol tautomerism. For example, in an adhesive composition containing a cross-linking agent or in an adhesive composition that can be blended with a cross-linking agent, a form containing the above-mentioned compound capable of producing keto-enol tautomerism can be suitably adopted. Thereby, the viscosity of the adhesive composition after blending with the organometallic compound can be prevented from excessively increasing or gelling, and the formation of microgels can be suppressed, and the effect of extending the life of the composition can be achieved.
上述可產生酮-烯醇互變異構性之化合物可使用各種β-二羰基化合物。具體例可舉如乙醯丙酮、2,4-己二酮、3,5-庚二酮、2-甲基己-3,5-二酮、6-甲基庚-2,4-二酮、2,6-二甲基庚-3,5-二酮等的β-二酮類;乙醯乙酸甲酯、乙醯乙酸乙酯、乙醯乙酸異丙酯、乙醯乙酸三級丁酯等乙醯乙酸酯類;丙醯基乙酸乙酯、丙醯基乙酸乙酯、丙醯基乙酸異丙酯、丙醯基乙酸三級丁酯等丙醯基乙酸酯類;異丁醯基乙酸乙酯、異丁醯基乙酸乙酯、異丁醯基乙酸異丙酯、異丁醯基乙酸三級丁酯等異丁醯基乙酸酯類;丙二酸甲酯、丙二酸乙酯等丙二酸酯類等。其中適宜的化合物可舉如乙醯丙酮及乙醯乙酸酯類。所述可產生酮-烯醇互變異構性之化合物可單獨使用,亦可將2種以上組合使用。Various β-dicarbonyl compounds can be used as the above-mentioned compound capable of producing keto-enol tautomerism. Specific examples include acetone, 2,4-hexanedione, 3,5-heptanedione, 2-methylhexan-3,5-dione, 6-methylheptane-2,4-dione , 2,6-Dimethylheptane-3,5-dione and other β-diketones; methyl acetylacetate, ethyl acetylacetate, isopropyl acetylacetate, tertiary butyl acetylacetate Acetyl acetates; ethyl propylacetate, ethyl propylacetate, isopropyl propylacetate, tertiary butyl propylacetate and other propylacetates; ethyl isobutylacetate , Ethyl isobutyryl acetate, isobutyl isopropyl acetate, tertiary butyl isobutyryl acetate and other isobutyryl acetate; methyl malonate, ethyl malonate and other malonic acid esters. Among them, suitable compounds may be exemplified by acetone and acetone acetate. The compound capable of producing keto-enol tautomerism may be used alone or in combination of two or more kinds.
可產生酮-烯醇互變異構性之化合物的使用量,係例如相對於1重量份之有機金屬化合物為0.05重量份~10重量份,較佳為0.2重量份~3重量份(例如0.3重量份~2重量份)。上述化合物之使用量相對於1重量份之有機金屬化合物若低於0.05重量份,就會有難以發揮充分使用效果的情形。另一方面,該化合物之使用量相對於1重量份之有機金屬化合物若超過10重量份,就會對有機金屬化合物有過剩的相互作用,而難以展現所欲獲得之耐水性之情況。The use amount of the compound that can produce keto-enol tautomerism is, for example, 0.05 parts by weight to 10 parts by weight, preferably 0.2 parts by weight to 3 parts by weight (for example, 0.3 parts by weight) relative to 1 part by weight of the organometallic compound. Parts~2 parts by weight). If the usage amount of the above-mentioned compound is less than 0.05 part by weight relative to 1 part by weight of the organometallic compound, it may be difficult to fully exert the effect of use. On the other hand, if the amount of the compound used exceeds 10 parts by weight relative to 1 part by weight of the organometallic compound, there will be excessive interactions with the organometallic compound, making it difficult to exhibit the desired water resistance.
<聚輪烷(polyrotaxane)> 本發明之接著劑組成物中可含有聚輪烷。上述聚輪烷具有環狀分子、貫穿該環狀分子的開口部之直鏈狀分子及封端基,且該封端基係以該環狀分子不會從該直鏈狀分子脫離之方式配置於該直鏈狀分子兩端。環狀分子宜具有活性能量線硬化性之官能基。<Polyrotaxane> The adhesive composition of the present invention may contain polyrotaxane. The polyrotaxane has a cyclic molecule, a linear molecule penetrating the opening of the cyclic molecule, and an end capping group, and the end capping group is arranged in such a way that the cyclic molecule will not be separated from the linear molecule At both ends of the linear molecule. The cyclic molecule preferably has a functional group that is hardened by active energy rays.
就環狀分子而言,只要其開口部上有直鏈狀分子被以串刺狀包接、可在直鏈狀分子上移動且具有活性能量線聚合性基之分子,則無特別限定。又,本說明書中,「環狀分子」之「環狀」意指實質上為「環狀」。亦即,只要可在直鏈分子上移動,則環狀分子亦可為非完全閉環。The cyclic molecule is not particularly limited as long as the opening of the linear molecule is surrounded by a thorn, can move on the linear molecule, and has an active energy ray polymerizable group. In addition, in this specification, the "cyclic" of the "cyclic molecule" means that it is substantially "cyclic." That is, as long as it can move on a linear molecule, the cyclic molecule may be incompletely closed.
環狀分子之具體例可列舉環狀聚醚、環狀聚酯、環狀聚醚胺、環狀聚胺等環狀聚合物;及α-環糊精、β-環糊精、γ-環糊精等環糊精。其中,就較容易取得且能夠選擇多種封端基之觀點看來,其宜為α-環糊精、β-環糊精、γ-環糊精等環糊精。環狀分子亦可於聚輪烷中或接著劑中混雜有2種以上。Specific examples of cyclic molecules include cyclic polymers such as cyclic polyethers, cyclic polyesters, cyclic polyetheramines, and cyclic polyamines; and α-cyclodextrin, β-cyclodextrin, and γ-ring Cyclodextrins such as dextrin. Among them, from the viewpoint that it is relatively easy to obtain and can choose a variety of end-capping groups, it is preferably cyclodextrin such as α-cyclodextrin, β-cyclodextrin, and γ-cyclodextrin. Two or more types of cyclic molecules may be mixed in the polyrotaxane or the adhesive.
本發明所使用之聚輪烷中,上述環狀分子具有活性能量線聚合性基。藉此,即便於聚輪烷與活性能量線硬化性成分反應而硬化後,仍可獲得交聯點可動之接著劑。環狀分子所具有之活性能量線聚合性基只要為可與上述活性能量線硬化性化合物聚合之基即可,例如可列舉(甲基)丙烯醯基及(甲基)丙烯醯氧基等自由基聚合性基。In the polyrotaxane used in the present invention, the cyclic molecule has an active energy ray polymerizable group. Thereby, even after the polyrotaxane reacts with the active energy ray curable component and is cured, an adhesive with a movable crosslinking point can be obtained. The active energy ray polymerizable group possessed by the cyclic molecule may be a group that can be polymerized with the above-mentioned active energy ray curable compound, and examples thereof include (meth)acryloyl groups and (meth)acryloyloxy groups. Base polymerizable group.
使用環糊精作為環狀分子時,活性能量線聚合性基宜可經由任意適當之連接子導入環糊精之羥基。聚輪烷於1分子中所具有之活性能量線聚合性基之數量宜為2個~1280個,較佳為50個~1000個,更佳為90個~900個。When cyclodextrin is used as the cyclic molecule, the active energy ray polymerizable group can preferably be introduced into the hydroxyl group of the cyclodextrin via any appropriate linker. The number of active energy ray polymerizable groups that the polyrotaxane has in one molecule is preferably 2 to 1280, preferably 50 to 1000, and more preferably 90 to 900.
環狀分子中宜導入有疏水性改質基。藉由導入疏水性改質基,可提高與活性能量線硬化性成分之相溶性。又,由於可賦予疏水性,故在用作偏光薄膜時,可防止水浸入接著劑層與偏光件之界面而可更進一步提高耐水性。作為疏水性改質基,可列舉聚酯鏈、聚醯胺鏈、烷基鏈、氧伸烷基鏈、醚鏈等。具體例可列舉WO2009/145073之[0027]~[0042]中記載之基。It is preferable to introduce a hydrophobic modifying group into the cyclic molecule. By introducing a hydrophobic modifying group, the compatibility with active energy ray curable components can be improved. In addition, since it can be imparted with hydrophobicity, when used as a polarizing film, water can be prevented from entering the interface between the adhesive layer and the polarizer, and the water resistance can be further improved. Examples of the hydrophobic modifying group include polyester chains, polyamide chains, alkyl chains, oxyalkylene chains, ether chains, and the like. Specific examples include the bases described in [0027] to [0042] of WO2009/145073.
使用含有聚輪烷之樹脂組成物作為接著劑的偏光薄膜,其耐水性優異。偏光薄膜之耐水性提升的理由雖不明確,但可推測如下。亦即,吾等認為是因聚輪烷之環狀分子的可動性致使交聯點可移動(所謂滑輪效應),從而對硬化後之接著劑賦予柔軟性,增加對偏光件之表面凹凸的密著性,結果便防止了水侵入偏光件與接著劑層之界面。此外,還推測藉由聚輪烷具有疏水性改質基而可對接著劑賦予疏水性這一點,亦有助於防止水侵入偏光件與接著劑層之界面。A polarizing film using a resin composition containing polyrotaxane as an adhesive has excellent water resistance. Although the reason for the improved water resistance of the polarizing film is not clear, it can be presumed as follows. That is, we believe that the mobility of the cyclic molecules of polyrotaxane causes the cross-linking point to move (the so-called pulley effect), thereby imparting flexibility to the cured adhesive and increasing the density of the unevenness on the surface of the polarizer. As a result, it prevents water from invading the interface between the polarizer and the adhesive layer. In addition, it is also speculated that the hydrophobicity of the adhesive can be imparted to the adhesive by the polyrotaxane having a hydrophobic modifying group, which also helps prevent water from entering the interface between the polarizer and the adhesive layer.
相對於樹脂組成物,聚輪烷之含量宜為2重量%~50重量%。The content of polyrotaxane is preferably 2% by weight to 50% by weight relative to the resin composition.
前述接著劑組成物可含有下述通式(5)所示化合物: [化學式5](惟,X為含有選自於由乙烯基、(甲基)丙烯醯基、苯乙烯基、(甲基)丙烯醯胺基、乙烯基醚基、環氧基、氧雜環丁烷基、及巰基所構成群組中之至少1種反應性基之官能基,且R9 及R10 分別獨立表示氫原子,或是亦可具有取代基的脂肪族烴基、芳基或雜環基)。通式(5)記載之化合物容易與聚乙烯醇系偏光件所具有之羥基形成酯鍵。又,前述通式(5)所記載之化合物更具有含反應性基之X,透過X所含之反應性基而可與接著劑組成物中含有之其他硬化性成分反應。即,硬化性樹脂層所具有的硼酸基及/或硼酸酯基可透過共價鍵與偏光件所具有之羥基強固接著。藉此,即便偏光件與硬化性樹脂層之界面有水分存在,因其等不僅透過氫鍵及/或離子鍵,還透過共價鍵強固地相互作用,故偏光件與硬化性樹脂層之間的接著耐水性會飛躍性地提升。從提升偏光件與硬化物層之接著性及耐水性的觀點,尤其是從在透過接著劑層來接著偏光件與透明保護薄膜的情況下提升接著性及耐水性的觀點來看,接著劑組成物中,通式(5)記載之化合物含量以0.001~50重量%為佳,0.1~30重量%較佳,1~10重量%尤佳。The aforementioned adhesive composition may contain a compound represented by the following general formula (5): [Chemical formula 5] (However, X is selected from the group consisting of vinyl, (meth)acryloyl, styryl, (meth)acrylamido, vinyl ether, epoxy, oxetanyl, And a functional group of at least one reactive group in the group consisting of a mercapto group, and R 9 and R 10 each independently represent a hydrogen atom, or an aliphatic hydrocarbon group, an aryl group, or a heterocyclic group that may have a substituent). The compound described in the general formula (5) easily forms an ester bond with the hydroxyl group of the polyvinyl alcohol-based polarizer. In addition, the compound described in the aforementioned general formula (5) further has X containing a reactive group, and can react with other curable components contained in the adhesive composition through the reactive group contained in X. That is, the boric acid group and/or borate group of the curable resin layer can be strongly bonded to the hydroxyl group of the polarizing member through a covalent bond. Thereby, even if moisture exists at the interface between the polarizing member and the curable resin layer, it interacts strongly not only through hydrogen bonds and/or ionic bonds, but also through covalent bonds. Therefore, the polarizer and the curable resin layer interact strongly with each other. The subsequent water resistance will be greatly improved. From the viewpoint of improving the adhesion and water resistance between the polarizer and the cured layer, especially from the viewpoint of improving the adhesion and water resistance when the polarizer and the transparent protective film are bonded through the adhesive layer, the adhesive composition Among them, the content of the compound described in the general formula (5) is preferably 0.001-50% by weight, preferably 0.1-30% by weight, and particularly preferably 1-10% by weight.
<有機金屬化合物> 當本發明之接著劑組成物同時含有選自於由金屬烷氧化物及金屬螯合物所構成群組中之至少1種有機金屬化合物和具有聚合性官能基及羧基之聚合性化合物時,可使偏光件與接著劑層之接著耐水性提升,故較佳。有機金屬化合物會因夾雜水分而成為活性金屬種,結果有機金屬化合物會與偏光件及構成接著劑層之活性能量線硬化性成分兩方強固地相互作用。藉此,即便偏光件與接著劑層之界面有水分存在,因其等透過有機金屬化合物強固地相互作用,故偏光件與接著劑層之間的接著耐水性會飛躍性地提升。有機金屬化合物對接著劑層之接著性、耐水性提升方面助益甚大,但含有該化合物的組成物會因液體穩定性變得不穩定,導致有使用期限變短、生產性惡化的傾向。推測其原因之一是有機金屬化合物的反應性高,其與組成物中微量含有的水分接觸將引發水解反應與自縮合反應,結果會自體凝聚而使組成物液白濁化(產生凝聚物、相分離、沈澱)。然而於組成物中同時含有有機金屬化合物和具有聚合性官能基及羧基之聚合性化合物時,可抑制有機金屬化合物的水解反應與自縮合反應,而能使組成物中之有機金屬化合物的液體穩定性飛躍性地提升。有機金屬化合物之比率宜為組成物總量之0.05~15重量%,且較佳為0.1~10重量%。這是因為在摻混量超過15重量%時,會有組成物之儲存穩定性惡化、用以接著於偏光件或保護薄膜之成分比率相對不足而致使接著性降低之虞。而在低於0.05重量%時,接著耐水性之效果會無法充分發揮之故。硬化型接著劑組成物中,令有機金屬化合物之總量為α(mol)時,具有聚合性官能基及羧基之聚合性化合物的含量以0.25α(mol)以上為佳,0.35α(mol)以上較佳,0.5α(mol)以上尤佳。若具有聚合性官能基及羧基之聚合性化合物的含量低於0.25α(mol),會有有機金屬化合物穩定化不足、致使水解反應與自縮合反應進行而使用期限縮短的狀況。此外,相對於有機金屬化合物之總量α(mol),聚合性化合物之含量的上限並無特別限制,可舉例如4α(mol)左右。<Organic metal compound> When the adhesive composition of the present invention contains at least one organometallic compound selected from the group consisting of metal alkoxides and metal chelate, and a polymer having a polymerizable functional group and a carboxyl group In the case of a sexual compound, the water resistance of the polarizer and the adhesive layer can be improved, so it is preferred. The organometallic compound becomes an active metal species due to the inclusion of moisture. As a result, the organometallic compound strongly interacts with both the polarizer and the active energy ray curable component constituting the adhesive layer. Thereby, even if moisture exists at the interface between the polarizing member and the adhesive layer, since it interacts strongly through the organometallic compound, the adhesive water resistance between the polarizing member and the adhesive layer is greatly improved. The organometallic compound greatly contributes to the adhesion and water resistance of the adhesive layer. However, the composition containing the compound becomes unstable due to liquid stability, which tends to shorten the service life and deteriorate the productivity. It is speculated that one of the reasons for this is the high reactivity of the organometallic compound, and its contact with a trace amount of moisture contained in the composition will initiate a hydrolysis reaction and a self-condensation reaction. Phase separation, precipitation). However, when the composition contains both an organometallic compound and a polymerizable compound having a polymerizable functional group and a carboxyl group, the hydrolysis reaction and self-condensation reaction of the organometallic compound can be suppressed, and the liquid of the organometallic compound in the composition can be stabilized. Sex has improved dramatically. The ratio of the organometallic compound is preferably 0.05 to 15% by weight of the total composition, and preferably 0.1 to 10% by weight. This is because when the blending amount exceeds 15% by weight, the storage stability of the composition deteriorates, and the ratio of the components for adhesion to the polarizer or the protective film is relatively insufficient, which may reduce the adhesiveness. When it is less than 0.05% by weight, the effect of subsequent water resistance may not be fully exerted. In the curable adhesive composition, when the total amount of organometallic compounds is α (mol), the content of polymerizable compounds having polymerizable functional groups and carboxyl groups is preferably 0.25α (mol) or more, 0.35α (mol) The above is preferable, and 0.5α (mol) or more is particularly preferable. If the content of the polymerizable compound having a polymerizable functional group and a carboxyl group is less than 0.25α (mol), the stabilization of the organometallic compound may be insufficient, resulting in the progress of the hydrolysis reaction and the self-condensation reaction and the shortening of the service life. In addition, the upper limit of the content of the polymerizable compound relative to the total amount α (mol) of the organometallic compound is not particularly limited, and may be, for example, about 4α (mol).
<聚氯化烯烴> 本發明之接著劑組成物中亦可摻混聚氯化烯烴。此時,所得之接著劑層其源自聚乙烯醇系偏光件之碘化合物所造成之被染色性會明顯降低,而可作為抑制來自偏光件之碘化合物之游離及擴散的保護層而發揮功用。就結果而言,將本發明之接著劑組成物使用於偏光薄膜用途時,偏光薄膜之光學耐久性會明顯提升。並且,本發明之接著劑組成物必須在光學上為透明,故聚烯烴系樹脂宜選擇可溶於活性能量線硬化性成分,且不會產生層分離或沉澱之聚氯化烯烴。未施行氯化之聚烯烴,因對藉由照射活性能量線而硬化之硬化性成分的溶解性明顯較低,故不佳。<Polychlorinated olefin> Polychlorinated olefin may also be blended in the adhesive composition of the present invention. At this time, the dyeability of the resulting adhesive layer derived from the iodine compound of the polyvinyl alcohol polarizer will be significantly reduced, and it can function as a protective layer that inhibits the release and diffusion of the iodine compound from the polarizer. . As a result, when the adhesive composition of the present invention is used for polarizing film applications, the optical durability of the polarizing film will be significantly improved. In addition, the adhesive composition of the present invention must be optically transparent. Therefore, the polyolefin resin should preferably be a polychlorinated olefin that is soluble in active energy ray curable components and does not cause layer separation or precipitation. Polyolefins that are not chlorinated are not good because they have significantly lower solubility for curable components that are hardened by irradiation with active energy rays.
本發明可使用之聚氯化烯烴可舉例如氯化聚乙烯、氯化聚丙烯、丙烯酸改質或胺甲酸酯改質聚氯化烯烴等。Examples of polychlorinated olefins that can be used in the present invention include chlorinated polyethylene, chlorinated polypropylene, acrylic-modified or urethane-modified polychlorinated olefins.
聚氯化烯烴中的氯含有率宜為25~50重量%,更宜為30~45重量%。一旦低於25重量%,則其對活性能量線硬化性成分之溶解性會降低而有變得難以形成在光學上為透明之組成物的情況。一旦超過50重量%,在作成偏光薄膜時的嚴苛加濕環境下,其光學特性之變化變大,而有變得無法獲得本發明之效果的情形。聚氯化烯烴中之氯含量可依據JIS-K7229來測定。更具體地說,可用譬如「氧燒瓶燃燒法」進行測定,即在氧氣環境下使含氯樹脂燃燒,並以水吸收所產生之氣體氯後,藉由滴定而定量。The chlorine content in the polychlorinated olefin is preferably 25-50% by weight, more preferably 30-45% by weight. If it is less than 25% by weight, the solubility of the active energy ray curable component may decrease, and it may become difficult to form an optically transparent composition. If it exceeds 50% by weight, under the severe humidification environment when the polarizing film is made, the change in its optical characteristics becomes large, and the effects of the present invention may become impossible to obtain. The chlorine content in polychlorinated olefins can be measured in accordance with JIS-K7229. More specifically, it can be measured by, for example, the "oxygen flask combustion method", that is, the chlorine-containing resin is burned in an oxygen environment, and the generated gas chlorine is absorbed by water, and then the amount is determined by titration.
又,氯化聚烯烴之重量平均分子量以3,000~100,000為佳,以5,000~80,000更佳,而以使用10,000~20,000之範圍者最佳。一旦聚氯化烯烴之分子量過低,作成硬化物時會有耐水性未充分提升的情況。而一旦分子量過高,對活性能量線硬化性成分的溶解性會明顯下降,而有變得難以形成在光學上為透明之組成物的情形。In addition, the weight average molecular weight of the chlorinated polyolefin is preferably 3,000 to 100,000, more preferably 5,000 to 80,000, and it is best to use the range of 10,000 to 20,000. Once the molecular weight of the polychlorinated olefin is too low, the water resistance may not be sufficiently improved when the cured product is made. If the molecular weight is too high, the solubility of the active energy ray curable component will be significantly reduced, and it may become difficult to form an optically transparent composition.
就聚氯化烯烴而言,可取得之市售品可舉例如SUPERCHLON系列(日本製紙化學公司製)、HARDLEN系列(東洋紡公司製)、ELASLEN系列(昭和電工公司製)等。As for polychlorinated olefins, commercially available products that can be obtained include, for example, SUPERCHLON series (manufactured by Nippon Paper & Chemical Corporation), HARDLEN series (manufactured by Toyobo Co., Ltd.), ELASLEN series (manufactured by Showa Denko Corporation), and the like.
可取得之市售品中,更宜使用SUPERCHLON系列(日本製紙化學公司製)之「SUPERCHLON 814HS」、「SUPERCHLON 390S」、「SUPERCHLON 803MW」、「SUPERCHLON 803L」、「SUPERCHLON B」;HARDLEN系列(東洋紡公司製)之「HARDLEN 16-LP」、「HARDLEN 15-LP」;及ELASLEN系列(昭和電工公司製)之「ELASLEN 404B」、「ELASLEN 402B」、「ELASLEN 401A」,尤其是「SUPERCHLON 814HS」對活性能量線硬化性成分之溶解性、及在作成偏光薄膜時之嚴苛加濕條件下光學特性之穩定性的平衡優異,而可更加適合使用。Among the commercially available products, it is more appropriate to use SUPERCHLON series (manufactured by Nippon Paper & Chemical Corporation) "SUPERCHLON 814HS", "SUPERCHLON 390S", "SUPERCHLON 803MW", "SUPERCHLON 803L", "SUPERCHLON B"; HARDLEN series (Toyobo "HARDLEN 16-LP" and "HARDLEN 15-LP" manufactured by the company); and "ELASLEN 404B", "ELASLEN 402B", "ELASLEN 401A", especially "SUPERCHLON 814HS" of the ELASLEN series (manufactured by Showa Denko) It is excellent in the balance between the solubility of active energy ray curable components and the stability of optical properties under severe humidification conditions when making polarizing films, making it more suitable for use.
<上述以外的添加劑> 又,本發明所使用之接著劑組成物可在不損及本發明之目的及效果的範圍內,摻混各種添加劑作為其他任意成分。作為此種添加劑,可舉如環氧樹脂、聚醯胺、聚醯胺醯亞胺、聚胺甲酸酯、聚丁二烯、聚氯丁二烯、聚醚、聚酯、苯乙烯-丁二烯嵌段共聚物、石油樹脂、二甲苯樹脂、酮樹脂、纖維素樹脂、氟系寡聚物、聚矽氧系寡聚物、聚硫醚系寡聚物等聚合物或寡聚物;啡噻、2,6-二三級丁基-4-甲苯酚等聚合抑制劑;聚合起始助劑;界面活性劑;可塑劑;紫外線吸收劑;無機填充劑;顏料;染料等。<Additives other than the above> In addition, the adhesive composition used in the present invention may be blended with various additives as other optional components within a range that does not impair the purpose and effects of the present invention. As such additives, for example, epoxy resin, polyamide, polyamide imide, polyurethane, polybutadiene, polychloroprene, polyether, polyester, styrene-butadiene Polymers or oligomers such as diene block copolymers, petroleum resins, xylene resins, ketone resins, cellulose resins, fluorine-based oligomers, polysiloxane-based oligomers, and polysulfide-based oligomers; Phenothi , 2,6-Di-tertiary butyl-4-cresol and other polymerization inhibitors; polymerization initiators; surfactants; plasticizers; ultraviolet absorbers; inorganic fillers; pigments; dyes, etc.
相對於接著劑組成物之總量,上述添加劑通常為0~10重量%,並宜為0~5重量%,最佳為0~3重量%。Relative to the total amount of the adhesive composition, the above-mentioned additives are usually 0-10% by weight, preferably 0-5% by weight, and most preferably 0-3% by weight.
<偏光薄膜用接著劑組成物> 為了有效抑制積層氣泡之產生,本發明之偏光薄膜用接著劑組成物在硬化前的表面張力宜為30mN/m以下。接著劑組成物在硬化前的表面張力的測定方法方法將於後詳述。<Adhesive composition for polarizing film> In order to effectively suppress the generation of laminated bubbles, the surface tension of the adhesive composition for polarizing film of the present invention before curing is preferably 30 mN/m or less. The method of measuring the surface tension of the adhesive composition before curing will be described in detail later.
本發明之偏光薄膜用接著劑組成物在將該組成物硬化而得之硬化物浸漬於23℃的純水中24小時後,其總體吸水率宜為10重量%以下。總體吸水率是以下式表示。 式︰{(M2-M1)/M1}×100(%) 惟,M1︰硬化物浸漬前之重量;M2︰硬化物浸漬後之重量。 藉由將總體吸水率設為10重量%以下,則可抑制將偏光薄膜置於嚴苛的高溫高濕環境下時水往偏光件移動,而能抑制偏光件的穿透率上升和偏光度的降低。從可使偏光薄膜之接著劑層在高溫下之嚴苛環境下之光學耐久性變得更良好的觀點來看,前述總體吸水率宜為5重量%以下,更以3重量%以下為佳,1重量%以下最佳。另一方面,在貼合偏光件與透明保護薄膜之際,偏光件已保有一定量之水分,故該硬化型接著劑與偏光件所含水分接觸時會有產生塌凹、氣泡等外觀不良之情形。為抑制外觀不良,該硬化型接著劑宜可吸收一定量的水分。更具體而言,總體吸水率宜為0.01重量%以上,更宜為0.05重量%以上。The adhesive composition for polarizing films of the present invention preferably has an overall water absorption rate of 10% by weight or less after immersing the cured product obtained by curing the composition in pure water at 23° C. for 24 hours. The overall water absorption is expressed by the following formula. Formula: {(M2-M1)/M1}×100(%) However, M1: the weight of the cured product before immersion; M2: the weight of the cured product after immersion. By setting the overall water absorption rate to 10% by weight or less, it is possible to prevent water from moving to the polarizer when the polarizing film is placed in a severe high-temperature and high-humidity environment, and to suppress the increase in the transmittance of the polarizer and the degree of polarization. reduce. From the viewpoint of improving the optical durability of the adhesive layer of the polarizing film under severe environments at high temperatures, the aforementioned overall water absorption is preferably 5% by weight or less, more preferably 3% by weight or less, 1% by weight or less is best. On the other hand, when bonding the polarizer and the transparent protective film, the polarizer already retains a certain amount of moisture, so when the hardening type adhesive comes into contact with the moisture contained in the polarizer, it may cause dents, bubbles, and other appearance defects. situation. In order to suppress poor appearance, the hardened adhesive should absorb a certain amount of water. More specifically, the overall water absorption is preferably 0.01% by weight or more, and more preferably 0.05% by weight or more.
本發明中所使用之接著劑組成物的黏度宜為3~100mPa・s,較佳為5~50mPa・s,最佳為10~30mPa・s。當接著劑組成物之黏度高時,塗佈後的表面平滑性貧乏而會產生外觀不良,故不佳。本發明中所使用之接著劑組成物,可加熱或冷卻該組成物並調整為較佳範圍之黏度後再行塗佈。The viscosity of the adhesive composition used in the present invention is preferably 3-100 mPa·s, preferably 5-50 mPa·s, and most preferably 10-30 mPa·s. When the viscosity of the adhesive composition is high, the surface smoothness after coating is poor and poor appearance may occur, which is not good. The adhesive composition used in the present invention can be applied after heating or cooling the composition and adjusting the viscosity to a preferable range.
本發明之接著劑組成物是以辛醇/水分配係數(以下稱logPow值)較高者為佳。logPow值是表示物質親油性的指標,意指辛醇/水之分配係數的對數值。logPow高代表為親油性,即意味著吸水率低。logPow值雖可測定(JIS-Z-7260記載之燒瓶浸透法),惟亦可藉由根據偏光薄膜用硬化型接著劑之構成成分(硬化性成分等)的各化合物之結構進行計算來求出。本說明書中是使用Cambridgesoft公司製ChemDraw Ultra所計算出的logPow値。 以上述計算值為基礎,本發明中偏光薄膜用硬化型接著劑的logPow值可以利用下述式進行計算。 硬化型接著劑之logPow=Σ(logPowi×Wi) logPowi:硬化型接著劑之各成分的logPow值 Wi︰(i成分之莫耳數)/(硬化型接著劑之各成分的總莫耳數) 進行上述計算時,於硬化型接著劑之各成分中,聚合起始劑或光酸產生劑等之不會形成硬化物(接著劑層)之骨架的成分會被排除上述計算之成分外。本發明之偏光薄膜用硬化型接著劑之logPow值宜為1以上,較佳為1.5以上,最佳為2以上。藉此便可提高接著耐水性及加濕耐久性。另一方面,本發明之偏光薄膜用硬化型接著劑的logPow值通常為8以下左右,且宜為5以下,更宜為4以下。若該logPow值過高,則會如前述變得容易產生塌凹或氣泡等外觀不良,故不佳。The adhesive composition of the present invention preferably has a higher octanol/water partition coefficient (hereinafter referred to as logPow value). The logPow value is an index indicating the lipophilicity of a substance, which means the logarithmic value of the octanol/water partition coefficient. High logPow means lipophilicity, which means low water absorption. Although the logPow value can be measured (the flask permeation method described in JIS-Z-7260), it can also be calculated by calculating the structure of each compound based on the constituent components (curable components, etc.) of the curable adhesive for polarizing films . In this manual, the logPow value calculated by ChemDraw Ultra manufactured by Cambridgesoft is used. Based on the above calculated value, the logPow value of the curable adhesive for polarizing films of the present invention can be calculated by the following formula. The logPow of the hardening adhesive=Σ(logPowi×Wi) logPowi: the logPow value of each component of the hardening adhesive Wi: (the number of moles of the i component)/(the total number of moles of each component of the hardening adhesive) When the above calculation is performed, among the components of the hardening adhesive, the components that do not form the skeleton of the hardened product (adhesive layer), such as the polymerization initiator or the photoacid generator, will be excluded from the above calculated components. The logPow value of the curable adhesive for polarizing films of the present invention is preferably 1 or more, preferably 1.5 or more, and most preferably 2 or more. This can improve adhesion resistance and humidification durability. On the other hand, the logPow value of the curable adhesive for polarizing films of the present invention is usually about 8 or less, and preferably 5 or less, and more preferably 4 or less. If the logPow value is too high, as described above, it is easy to cause poor appearance such as sinking or bubbles, which is undesirable.
而且,本發明之接著劑組成物以實質上不含水或揮發性溶劑為佳。因實質上不含揮發性溶劑,就不需加熱處理,則不僅生產性優異,還能抑制偏光件因熱造成光學特性降低,故較佳。所謂「實質上不含」是指譬如令接著劑組成物之總量為100重量%以下時含有低於5重量%,尤其是指含有低於2重量%者。Furthermore, the adhesive composition of the present invention is preferably substantially free of water or volatile solvents. Since it does not substantially contain a volatile solvent and does not require heat treatment, it not only has excellent productivity, but also suppresses the deterioration of the optical properties of the polarizer due to heat, which is preferable. The so-called "substantially free" means that, for example, when the total amount of the adhesive composition is 100% by weight or less, the content is less than 5% by weight, and in particular, the content is less than 2% by weight.
此外,接著劑組成物宜選擇可使經前述而形成之硬化物層、尤其是接著劑層的Tg成為60℃以上,更宜為70℃以上,更宜為75℃以上,更宜為100℃以上,更宜為120℃以上。另一方面,接著劑層的Tg若變得過高會使偏光薄膜之撓性降低,故接著劑層的Tg宜為300℃以下,更宜為240℃以下,更宜為180℃以下。Tg<玻璃轉移溫度>是使用TA INSTRUMENTS製之動態黏彈性測定裝置RSAIII並依下列測定條件進行測定。 樣本尺寸︰寬10mm、長30mm, 鉗夾距離20mm, 以測定模式︰拉伸,頻率︰1Hz,升溫速度︰5℃/分鐘,進行動態黏彈性測定,並採用作為tanδ之峰頂的溫度Tg。In addition, the adhesive composition should be selected so that the Tg of the cured product layer formed by the foregoing, especially the adhesive layer, becomes 60°C or higher, more preferably 70°C or higher, more preferably 75°C or higher, and more preferably 100°C Above, it is more preferably above 120°C. On the other hand, if the Tg of the adhesive layer becomes too high, the flexibility of the polarizing film will decrease. Therefore, the Tg of the adhesive layer is preferably 300°C or less, more preferably 240°C or less, and more preferably 180°C or less. Tg<Glass transition temperature> is measured using the dynamic viscoelasticity measuring device RSAIII manufactured by TA INSTRUMENTS under the following measuring conditions. Sample size: width 10mm, length 30mm, clamping distance 20mm, measuring mode: stretching, frequency: 1Hz, heating rate: 5°C/min, for dynamic viscoelasticity measurement, and use the temperature Tg as the peak top of tanδ.
此外,接著劑組成物經前述而形成之硬化物層、尤其是接著劑層的儲存彈性模數在25℃下宜為1.0×107 Pa以上,而1.0×108 Pa以上較佳。黏著劑層之儲存彈性模數宜為1.0×103 Pa~1.0×106 Pa。接著劑層的儲存彈性模數會影響對偏光薄膜實施熱循環(從-40℃~80℃等)時的偏光件裂痕,當儲存彈性模數低時,就容易產生偏光件裂痕之不良狀況。具有高儲存彈性模數之溫度區域以80℃以下較佳,90℃以下最佳。儲存彈性模數是與進行Tg<玻璃轉移溫度>同時,使用TA INSTRUMENTS製之動態黏彈性測定裝置RSAIII,依相同測定條件進行測定。進行動態黏彈性之測定,並採用儲存彈性模數(E’)之值。In addition, the storage elastic modulus of the cured product layer formed by the aforementioned adhesive composition, especially the adhesive layer, is preferably 1.0×10 7 Pa or more at 25° C., and preferably 1.0×10 8 Pa or more. The storage elastic modulus of the adhesive layer should be 1.0×10 3 Pa~1.0×10 6 Pa. The storage elastic modulus of the adhesive layer will affect the cracks of the polarizer when the polarizing film is thermally cycled (from -40°C to 80°C, etc.). When the storage elastic modulus is low, the polarizer cracks are likely to occur. The temperature zone with high storage elastic modulus is preferably below 80°C, and the best below 90°C. The storage elastic modulus is measured at the same time as Tg<Glass Transition Temperature>, using the dynamic viscoelasticity measuring device RSAIII manufactured by TA INSTRUMENTS under the same measuring conditions. The dynamic viscoelasticity is measured and the storage elastic modulus (E') value is used.
又,本發明之接著劑組成物因具有硬化性成分,故使該接著劑組成物硬化時,通常會發生硬化收縮。硬化收縮率是表示由樹脂組成物形成接著劑層時硬化收縮比率的指標。接著劑層之硬化收縮率若變大,則在使接著劑組成物硬化並形成接著劑層時,會發生界面變形而出現接著不良的情形,故宜將其抑制。由上述觀點來看,使具有本發明之效果的樹脂組成物硬化所得之硬化物,其上述硬化收縮率宜為10%以下。且前述硬化收縮率宜低,前述硬化收縮率是以8%以下為佳,更以5%以下為佳。前述硬化收縮率是以日本專利特開第2013-104869號所記載之方法來測定,具體而言是以實施例所記載之利用Sentech公司製硬化收縮感測器之方法來測定。In addition, since the adhesive composition of the present invention has a curable component, curing shrinkage usually occurs when the adhesive composition is cured. The curing shrinkage rate is an index indicating the curing shrinkage rate when the adhesive layer is formed from the resin composition. If the curing shrinkage rate of the adhesive layer is increased, when the adhesive composition is cured and the adhesive layer is formed, interface deformation may occur and poor bonding may occur, so it is preferable to suppress this. From the above viewpoint, the cured product obtained by curing the resin composition having the effects of the present invention preferably has the curing shrinkage rate of 10% or less. In addition, the aforementioned curing shrinkage rate is preferably low, and the aforementioned curing shrinkage rate is preferably 8% or less, and more preferably 5% or less. The above-mentioned curing shrinkage rate is measured by the method described in Japanese Patent Laid-Open No. 2013-104869, and specifically measured by the method described in the examples using a curing shrinkage sensor manufactured by Sentech.
又,從安全性之觀點來看,本發明所使用之接著劑組成物是以使用皮膚刺激較低之材料作為前述硬化性成分為佳。皮膚刺激性可用P.I.I指標來判斷。P.I.I是廣泛使用之表示皮膚損害程度的指標,以崔氏試驗(Draize法)測定。測定值是以0~8的範圍表示,值越小則判定為刺激性越低,然而測定值之誤差大,故作為參考值就好。P.I.I宜為4以下,較佳為3以下,最佳為2以下。In addition, from the viewpoint of safety, the adhesive composition used in the present invention preferably uses a material with less skin irritation as the hardening component. Skin irritation can be judged by P.I.I index. P.I.I is a widely used index that indicates the degree of skin damage, and is measured by the Cui's test (Draize method). The measured value is expressed in the range of 0-8. The smaller the value, the lower the irritation. However, the error of the measured value is large, so it is good as a reference value. P.I.I is preferably 4 or less, preferably 3 or less, and most preferably 2 or less.
<光學薄膜> 本發明之接著劑組成物可適合用於光學薄膜用途,尤其適合用於至少具備聚乙烯醇系偏光件的偏光薄膜用途。以下,作為光學薄膜之一例是舉偏光薄膜為例予以說明。<Optical Film> The adhesive composition of the present invention can be suitably used for optical film applications, and is particularly suitable for polarizing film applications including at least a polyvinyl alcohol-based polarizer. Hereinafter, as an example of an optical film, a polarizing film will be described as an example.
<偏光薄膜> 本發明之偏光薄膜,是在偏光件之至少一面隔著接著劑層積層有透明保護薄膜,且該接著劑層是使偏光薄膜用接著劑組成物硬化而得。例如,可為在聚乙烯醇系偏光件之單面,隔著偏光薄膜用接著劑組成物之硬化物層而積層有透明保護薄膜者,亦可為在聚乙烯醇系偏光件之兩面積層有透明保護薄膜者。<Polarizing film> The polarizing film of the present invention is obtained by laminating a transparent protective film on at least one surface of a polarizer with an adhesive interposed therebetween, and the adhesive layer is obtained by curing the polarizing film adhesive composition. For example, a transparent protective film may be laminated on one side of the polyvinyl alcohol-based polarizer via the cured layer of the polarizing film adhesive composition, or it may be laminated on both areas of the polyvinyl alcohol-based polarizer. Transparent protective film.
此外,本發明之偏光薄膜亦可為具備黏著劑層者。黏著劑層可積層於任意位置,可譬如於聚乙烯醇系偏光件上積層前述硬化物層後,再於其上形成黏著劑層,亦可於聚乙烯醇系偏光件之其中一面積層前述硬化物層,並於另一面積層黏著劑層。或者亦可將黏著劑層積層於由偏光件/前述硬化物層/保護薄膜所構成之偏光薄膜之前述保護薄膜側。如上述,可將黏著劑層積層於偏光薄膜之任意位置上。In addition, the polarizing film of the present invention may also have an adhesive layer. The adhesive layer can be laminated at any position, for example, after the above-mentioned hardened layer is laminated on the polyvinyl alcohol-based polarizer, then an adhesive layer is formed on it, or it can be hardened on one of the area layers of the polyvinyl alcohol-based polarizer. The object layer, and an adhesive layer on another area. Alternatively, the adhesive may be laminated on the protective film side of the polarizing film composed of the polarizer/the hardened material layer/protective film. As mentioned above, the adhesive can be layered on any position of the polarizing film.
積層聚乙烯醇系偏光件、本發明組成物之硬化物層、透明保護薄膜及黏著劑層而得之偏光薄膜厚度宜為150μm以下,更宜為100μm以下。偏光薄膜厚度過厚時,在高溫高濕下的尺寸變化變大,而產生顯示不均之不良狀況,故不佳。The thickness of the polarizing film obtained by laminating the polyvinyl alcohol-based polarizer, the cured layer of the composition of the present invention, the transparent protective film and the adhesive layer is preferably 150 μm or less, more preferably 100 μm or less. When the thickness of the polarizing film is too thick, the dimensional change under high temperature and high humidity becomes large, and the display unevenness occurs, which is not good.
上述接著劑組成物所形成之硬化物層、尤其是接著劑層的厚度宜為0.2~3μm。硬化物層的厚度過薄時,由於硬化物層之凝聚力不足而導致剝離力會降低,故不佳。硬化物層的厚度過厚時,對偏光薄膜之截面施加應力時變得容易發生剝離,而會發生因衝撃所造成的剝落不良,故不佳。接著劑層的厚度以0.3~2μm較佳,0.4~1.5μm最佳。The thickness of the cured product layer formed by the above-mentioned adhesive composition, especially the adhesive layer, is preferably 0.2 to 3 μm. When the thickness of the hardened layer is too thin, the peeling force will decrease due to insufficient cohesion of the hardened layer, which is not preferable. When the thickness of the hardened layer is too thick, peeling easily occurs when stress is applied to the cross section of the polarizing film, and peeling failure due to impact may occur, which is not preferable. The thickness of the adhesive layer is preferably 0.3 to 2 μm, and 0.4 to 1.5 μm is the best.
又,令接著劑層厚度為d(μm),並令接著劑層所包含之氣泡抑制劑的含量為y(重量%)時,當滿足下式(1)時,由於可以兼顧積層氣泡之抑制效果及接著性提升效果,故較佳。 0.1-0.02d≦y≦0.6-0.08d (1) 當y<0.1-0.02d時,接著劑層之接著性提升效果良好,但積層氣泡卻有增加的傾向;而當y>0.6-0.08d時,接著劑層之積層氣泡的抑制效果良好,但接著性提升效果卻有劣化的傾向。此外,上述式(1)中,接著劑層之厚度d(μm)以0.2≦d≦3為佳,較佳為0.3≦d≦2,更佳為0.4≦d≦1.5。In addition, when the thickness of the adhesive layer is d (μm) and the content of the bubble inhibitor contained in the adhesive layer is y (wt%), when the following formula (1) is satisfied, the suppression of laminated bubbles can be considered The effect and the adhesion improvement effect are better. 0.1-0.02d≦y≦0.6-0.08d (1) When y<0.1-0.02d, the adhesion improvement effect of the adhesive layer is good, but the laminated bubbles tend to increase; and when y>0.6-0.08d At this time, the effect of suppressing the build-up bubbles of the adhesive layer is good, but the adhesion improvement effect tends to deteriorate. In addition, in the above formula (1), the thickness d (μm) of the adhesive layer is preferably 0.2≦d≦3, preferably 0.3≦d≦2, and more preferably 0.4≦d≦1.5.
偏光件並無特別限制,可使用各種偏光件。作為偏光件,可舉例如使聚乙烯醇系薄膜、部份縮甲醛化聚乙烯醇系薄膜、乙烯-醋酸乙烯共聚物系部份皂化薄膜等親水性高分子薄膜吸附碘或二色性染料等之二色性材料並進行單軸延伸而成者,及聚乙烯醇之脫水處理物或聚氯乙烯之脫鹽酸處理物等多烯系配向薄膜等。其等之中,又以由聚乙烯醇系薄膜與碘等二色性物質所構成之偏光件為佳。其等偏光件之厚度宜為2~30μm,更宜為4~20μm,最宜為5~15μm。偏光件之厚度薄時,光學耐久性會降低而不佳。偏光件之厚度厚時,在高溫高濕下的尺寸變化變大,而產生顯示不均之不良狀況,故不佳。The polarizer is not particularly limited, and various polarizers can be used. As the polarizer, for example, hydrophilic polymer films such as polyvinyl alcohol-based films, partially formalized polyvinyl alcohol-based films, ethylene-vinyl acetate copolymer-based partially saponified films, etc., adsorb iodine or dichroic dyes, etc. The dichroic material is uniaxially stretched, and polyene-based alignment films such as dehydrated polyvinyl alcohol or dehydrated polyvinyl chloride. Among them, a polarizer composed of a polyvinyl alcohol-based film and dichroic substances such as iodine is preferred. The thickness of the polarizer is preferably 2-30μm, more preferably 4-20μm, most preferably 5-15μm. When the thickness of the polarizer is thin, the optical durability will decrease and it is not good. When the thickness of the polarizer is thick, the dimensional change under high temperature and high humidity becomes large, and the display unevenness is caused, which is not good.
將聚乙烯醇系薄膜以碘染色再單軸延伸而成之偏光件舉例來說可以下述方式製作:將聚乙烯醇浸漬到碘之水溶液藉此染色,再延伸到原長之3~7倍。亦可因應需求將其浸漬於硼酸、碘化鉀等的水溶液中。此外亦可因應需求在染色前將聚乙烯醇系薄膜浸漬於水中進行水洗。藉由水洗聚乙烯醇系薄膜,可洗淨聚乙烯醇系薄膜表面的污垢及抗結塊劑,除此以外藉由使聚乙烯醇系薄膜膨潤亦有防止染色參差等不均的效果。延伸可在使用碘染色之後進行,亦可以邊染色邊進行延伸,又,亦可進行延伸之後,使用碘進行染色。且亦可在硼酸、碘化鉀等的水溶液中或在水浴中進行延伸。A polarizer made of polyvinyl alcohol-based film dyed with iodine and then uniaxially stretched, for example, can be made in the following way: polyvinyl alcohol is dipped in an aqueous solution of iodine to dye, and then stretched to 3 to 7 times the original length . It can also be immersed in an aqueous solution of boric acid, potassium iodide, etc. according to needs. In addition, the polyvinyl alcohol-based film can be immersed in water for washing before dyeing. By washing the polyvinyl alcohol-based film with water, the dirt on the surface of the polyvinyl alcohol-based film and the anti-caking agent can be cleaned. In addition, the swelling of the polyvinyl alcohol-based film also has the effect of preventing uneven dyeing and other unevenness. Stretching may be performed after dyeing with iodine, or it may be stretched while dyeing, or it may be dyed with iodine after stretching. It can also be extended in an aqueous solution of boric acid, potassium iodide, etc., or in a water bath.
又,關於本發明所使用之接著劑組成物,若使用厚度10μm以下之薄型偏光件作為偏光件時,可顯著發揮其效果(可滿足在高溫高濕下之嚴苛環境中之光學耐久性)。上述厚度10μm以下之偏光件相較於厚度超過10μm之偏光件,相對來說水分之影響較大,而在高溫高濕下之環境中的光學耐久性不夠充分,容易引起穿透率上升或偏光度降低。亦即,以本發明之總體吸水率在10重量%以下的接著劑層積層上述10μm以下之偏光件時,在嚴酷之高溫高濕下的環境中水往偏光件的移動會受到抑制,從而能夠顯著抑制如偏光薄膜的穿透率上升及偏光度降低等光學耐久性的劣化。偏光件之厚度從薄型化之觀點來看,是以1~7μm為佳。此種薄型偏光件的厚度不均情況較少,視辨性優異,且尺寸變化小,而且作成偏光薄膜的厚度亦可謀求薄型化,由此觀點來看甚為理想。In addition, regarding the adhesive composition used in the present invention, if a thin polarizer with a thickness of 10 μm or less is used as a polarizer, its effect can be remarkably exerted (it can satisfy the optical durability in the severe environment of high temperature and high humidity) . The above-mentioned polarizers with a thickness of less than 10μm are relatively more affected by moisture than those with a thickness of more than 10μm, and the optical durability in the environment of high temperature and high humidity is not sufficient, and it is easy to cause increase in transmittance or polarization. The degree is reduced. That is, when the above-mentioned polarizing member of 10 μm or less is laminated with the adhesive having an overall water absorption rate of 10% by weight or less of the present invention, the movement of water to the polarizing member is suppressed in an environment of severe high temperature and high humidity, thereby enabling Significantly suppress the deterioration of optical durability such as the increase in the transmittance of the polarizing film and the decrease in the degree of polarization. From the viewpoint of thinning, the thickness of the polarizer is preferably 1~7μm. Such a thin polarizer has less unevenness in thickness, is excellent in visibility, and has a small dimensional change. In addition, the thickness of the polarizing film can be reduced in thickness, which is very desirable from the viewpoint.
薄型偏光件代表性地可列舉記載於日本專利特開昭51-069644號公報、或日本專利特開2000-338329號公報、WO2010/100917號手冊、PCT/JP2010/001460號的說明書、或日本專利特願2010-269002號說明書或日本專利特願2010-263692號說明書的薄型偏光膜。該等薄型偏光膜可藉由包含有將聚乙烯醇系樹脂(以下,也稱PVA系樹脂)層與延伸用樹脂基材在積層體的狀態下延伸的步驟與染色的步驟之製法製得。只要為該製法,則即使PVA系樹脂層很薄,仍可藉由被延伸用樹脂基材支持而在無延伸造成斷裂等不良狀況下進行延伸。Representative examples of thin polarizers include those described in Japanese Patent Laid-Open No. 51-069644, or Japanese Patent Laid-Open No. 2000-338329, Handbook WO2010/100917, Specification of PCT/JP2010/001460, or Japanese Patent The thin polarizing film of Japanese Patent Application No. 2010-269002 or Japanese Patent Application No. 2010-263692. These thin polarizing films can be produced by a manufacturing method including a step of extending a polyvinyl alcohol-based resin (hereinafter, also referred to as a PVA-based resin) layer and a resin substrate for stretching in the state of a laminate and a step of dyeing. As long as this method is used, even if the PVA-based resin layer is thin, it can be stretched without being broken due to stretching by being supported by the stretching resin base material.
前述薄型偏光膜以包含有在積層體之狀態下延伸的步驟與染色的步驟之製法中,從可高倍率地延伸來提高偏光性能之觀點來看,較理想的是利用如WO2010/100917號手冊、PCT/JP2010/001460之說明書、或是日本專利特願2010-269002號說明書或日本專利特願2010-263692號說明書中所記載之包含有在硼酸水溶液中延伸之步驟的製法所製得者,特別理想的是利用如日本專利特願2010-269002號說明書或日本專利特願2010-263692號說明書中所記載之包含有在硼酸水溶液中延伸前作為補助而進行空中延伸之步驟的製法所製得者。In the manufacturing method of the aforementioned thin polarizing film that includes the step of stretching in the state of the laminate and the step of dyeing, from the viewpoint that it can be stretched at a high magnification to improve the polarization performance, it is preferable to use the manual such as WO2010/100917 , PCT/JP2010/001460 specification, or Japanese Patent Application No. 2010-269002 specification or Japanese Patent Application No. 2010-263692 specification described in Japanese Patent Application No. 2010-263692. It is particularly desirable to use the method described in Japanese Patent Application No. 2010-269002 or Japanese Patent Application No. 2010-263692, which includes a step of performing aerial extension as a supplement before extension in an aqueous solution of boric acid. By.
透明保護薄膜宜為透明性、機械強度、熱穩定性、水分阻斷性及各向同性等優異者。可舉如:聚對苯二甲酸乙二酯及聚萘二甲酸乙二酯等聚酯系聚合物;二乙醯纖維素及三乙醯纖維素等纖維素系聚合物;聚甲基丙烯酸甲酯等丙烯酸系聚合物;聚苯乙烯及丙烯腈-苯乙烯共聚物(AS樹脂)等苯乙烯系聚合物;以及聚碳酸酯系聚合物等。又,亦可列舉下述聚合物作為形成上述透明保護薄膜之聚合物之例:聚乙烯、聚丙烯、具有環系乃至降莰烯結構之聚烯烴、如乙烯-丙烯共聚物之聚烯烴系聚合物、氯乙烯系聚合物、尼龍及芳香族聚醯胺等醯胺系聚合物、亞胺系聚合物、碸系聚合物、聚醚碸系聚合物、聚醚醚酮系聚合物、聚伸苯硫系聚合物、乙烯醇系聚合物、氯化亞乙烯系聚合物、乙烯醇縮丁醛系聚合物、芳酯系聚合物、聚甲醛系聚合物、環氧系聚合物或上述聚合物之摻合物等。透明保護薄膜中亦可含有1種以上任意的適當添加劑。添加劑可舉如紫外線吸收劑、抗氧化劑、滑劑、可塑劑、脫模劑、抗著色劑、阻燃劑、成核劑、抗靜電劑、顏料、著色劑等。透明保護薄膜中,上述熱可塑性樹脂含量宜為50~100重量%,較佳為50~99重量%,更佳為60~98重量%,特佳為70~97重量%。透明保護薄膜中上述熱可塑性樹脂含量在50重量%以下時,會有無法充分發揮熱可塑性樹脂原有的高透明性等之虞。The transparent protective film is preferably one that is excellent in transparency, mechanical strength, thermal stability, moisture barrier properties, and isotropy. Examples include: polyester-based polymers such as polyethylene terephthalate and polyethylene naphthalate; cellulose-based polymers such as diacetyl cellulose and triacetyl cellulose; polymethyl methacrylate Acrylic polymers such as esters; styrene polymers such as polystyrene and acrylonitrile-styrene copolymer (AS resin); and polycarbonate polymers. In addition, the following polymers can also be cited as examples of polymers forming the above-mentioned transparent protective film: polyethylene, polypropylene, polyolefins having cyclic or even norbornene structures, such as polyolefin polymerization of ethylene-propylene copolymers Amine-based polymers such as vinyl chloride polymers, nylon and aromatic polyamides, imine-based polymers, turbid polymers, polyether-based polymers, polyetheretherketone-based polymers, and Benzene sulfide polymer, vinyl alcohol polymer, chlorinated vinylene polymer, vinyl butyral polymer, aryl ester polymer, polyoxymethylene polymer, epoxy polymer or the above-mentioned polymers The blends and so on. The transparent protective film may contain one or more arbitrary appropriate additives. Examples of additives include ultraviolet absorbers, antioxidants, slip agents, plasticizers, mold release agents, anti-colorants, flame retardants, nucleating agents, antistatic agents, pigments, colorants, and the like. In the transparent protective film, the above-mentioned thermoplastic resin content is preferably 50-100% by weight, preferably 50-99% by weight, more preferably 60-98% by weight, particularly preferably 70-97% by weight. When the content of the thermoplastic resin in the transparent protective film is 50% by weight or less, the inherent high transparency of the thermoplastic resin may not be sufficiently exhibited.
作為透明保護薄膜,Tg(玻璃轉移溫度)宜為115℃以上,較宜為120℃以上,更宜為125℃以上,尤宜為130℃以上。藉由Tg在115℃以上而可成為偏光薄膜之耐久性優異者。上述透明保護薄膜的Tg上限值並無特別限定,然從成形性等的觀點來看,宜為170℃以下。As a transparent protective film, the Tg (glass transition temperature) is preferably 115°C or higher, more preferably 120°C or higher, more preferably 125°C or higher, and particularly preferably 130°C or higher. With a Tg of 115°C or higher, it can become a polarizing film with excellent durability. The upper limit of Tg of the above-mentioned transparent protective film is not particularly limited, but it is preferably 170°C or lower from the viewpoint of moldability and the like.
偏光件、透明保護薄膜亦可在積層上述接著劑組成物之前實施表面改質處理。尤其偏光件以在塗佈接著劑組成物或貼合之前,對偏光件表面實施表面改質處理為佳。表面改質處理可列舉電暈處理、電漿處理及ITRO處理(火焰矽烷處理)等處理,尤以電暈處理為佳。藉由實施電暈處理,可在偏光件表面生成羰基或胺基等極性官能基,而提升與硬化性樹脂層之密著性。並且,因灰化效果而可除去表面異物,減輕表面凹凸,故能作成外觀特性優異之偏光薄膜。The polarizer and the transparent protective film may be subjected to surface modification treatment before laminating the above-mentioned adhesive composition. In particular, the polarizer is preferably subjected to surface modification treatment on the surface of the polarizer before applying the adhesive composition or bonding. Surface modification treatment can include corona treatment, plasma treatment and ITRO treatment (flame silane treatment), etc., and corona treatment is particularly preferred. By performing corona treatment, polar functional groups such as carbonyl groups or amine groups can be generated on the surface of the polarizer, thereby improving the adhesion with the curable resin layer. In addition, surface foreign matter can be removed due to the ashing effect, and surface irregularities can be reduced, so a polarizing film with excellent appearance characteristics can be made.
對偏光件施行表面改質處理時,宜施行使偏光件表面之表面粗度(Ra)成為0.6nm以上。前述表面粗度(Ra)以0.8nm以上為佳,1nm以上更佳。藉此令前述表面粗度(Ra)在0.6nm以上,則在偏光薄膜之製造步驟中,即便使偏光件表面接觸導輥時,仍可良好地輸送偏光件。另,若前述表面粗度(Ra)變得過大時耐溫水性會變差,故前述表面粗度(Ra)宜為10nm以下,更宜為5nm以下。When performing surface modification treatment on the polarizer, it is advisable to apply the surface roughness (Ra) of the polarizer surface to 0.6nm or more. The aforementioned surface roughness (Ra) is preferably 0.8 nm or more, more preferably 1 nm or more. As a result, the aforementioned surface roughness (Ra) is 0.6 nm or more, so in the manufacturing step of the polarizing film, even when the surface of the polarizing member is brought into contact with the guide roller, the polarizing member can still be transported well. In addition, if the surface roughness (Ra) becomes too large, the temperature and water resistance will deteriorate. Therefore, the surface roughness (Ra) is preferably 10 nm or less, and more preferably 5 nm or less.
前述表面粗度(Ra)之測定是以算出平均粗度(表面凹凸的平均值)來表示表面粗度之參數。表面粗度(Ra)之測定是利用Veeco公司製之原子力顯微鏡(AFM)Nanoscope IV以Tapping模式測定而得之值。懸臂支架是使用譬如Metrology Probe探針:Tap300(RTESP型)。測量範圍為1μm正方。The measurement of the aforementioned surface roughness (Ra) is to calculate the average roughness (average value of the surface irregularities) to express the parameter of the surface roughness. The surface roughness (Ra) is measured using an atomic force microscope (AFM) Nanoscope IV manufactured by Veeco in the Tapping mode. The cantilever holder is to use, for example, the Metrology Probe probe: Tap300 (RTESP type). The measuring range is 1μm square.
本發明之偏光薄膜可依包含下述步驟之製造方法來製造︰ 塗敷步驟,在偏光件及透明保護薄膜中之至少一面塗敷接著劑組成物; 貼合步驟,貼合偏光件及透明保護薄膜;及 接著步驟,從偏光件面側或透明保護薄膜面側照射活性能量線使接著劑組成物硬化而得接著劑層,並透過該接著劑層使偏光件及透明保護薄膜接著。The polarizing film of the present invention can be manufactured according to the manufacturing method including the following steps: coating step, coating the adhesive composition on at least one side of the polarizing member and the transparent protective film; bonding step, laminating the polarizing member and the transparent protective film Film; and the next step, irradiating active energy rays from the side of the polarizer surface or the surface of the transparent protective film to harden the adhesive composition to obtain an adhesive layer, and the polarizer and the transparent protective film are bonded through the adhesive layer.
塗敷偏光薄膜用接著劑組成物的方法可視組成物之黏度或所欲獲得之厚度而適當選擇,可舉例如逆向塗佈機、凹版塗佈機(直接、逆向或間接)、棒式逆向塗佈機、輥塗佈機、模塗機、棒塗機、桿塗機等。本發明中使用之接著劑組成物的黏度宜為3~100mPa・s,更宜為5~50mPa・s,最宜為10~30mPa・s。硬化性樹脂組成物的黏度高時,塗佈後的表面平滑性貧乏而會產生外觀不良,故不佳。本發明中使用之硬化性樹脂組成物,可加熱或冷卻該組成物並調整為較佳範圍的黏度後再行塗佈。The method of coating the adhesive composition for polarizing films can be appropriately selected depending on the viscosity of the composition or the desired thickness. Examples include reverse coaters, gravure coaters (direct, reverse, or indirect), and bar reverse coaters. Cloth machine, roll coater, die coater, bar coater, rod coater, etc. The viscosity of the adhesive composition used in the present invention is preferably 3-100 mPa·s, more preferably 5-50 mPa·s, and most preferably 10-30 mPa·s. When the viscosity of the curable resin composition is high, the surface smoothness after application is poor, and poor appearance may occur, which is undesirable. The curable resin composition used in the present invention can be applied after heating or cooling the composition and adjusting the viscosity to a preferable range.
通常,在積層2片薄膜時,一般是在一側的薄膜貼合面上塗佈接著劑組成物並積層,但藉由在兩側的薄膜貼合面上塗敷接著劑層之後再行積層,可製得外觀品級優異之積層薄膜。塗敷方法是以後計量塗敷方式為宜。本發明中「後計量塗敷方式」是指對液膜施加外力去除過剩液體,而獲得預定塗敷膜厚的方式。本發明之偏光薄膜之製造方法中,在對由接著劑組成物構成之液膜施加所述外力時,會撥除存在於貼合面之污物或塵埃之類的異物等。作為後計量塗敷方式之具體例,可列舉凹版輥筒塗敷方式、順輥(forward roll)塗敷方式、氣刀塗敷方式、桿式/棒式塗敷方式等,惟從異物去除精度或塗佈膜厚均勻性等觀點來看,本發明中,前述塗敷方式是以使用了凹版輥筒的凹版輥筒塗敷方式為佳。Generally, when two films are laminated, the adhesive composition is generally applied to the film bonding surface on one side and laminated. However, by coating the adhesive layer on the film bonding surfaces on both sides and then laminating, A laminated film with excellent appearance grade can be produced. The coating method is the later metering coating method. In the present invention, the "post-metering coating method" refers to a method in which an external force is applied to a liquid film to remove excess liquid and obtain a predetermined coating film thickness. In the manufacturing method of the polarizing film of the present invention, when the external force is applied to the liquid film composed of the adhesive composition, foreign matter such as dirt or dust present on the bonding surface is removed. As specific examples of post-metering coating methods, gravure roll coating methods, forward roll coating methods, air knife coating methods, rod/rod coating methods, etc. can be cited, but the accuracy of foreign matter removal From the viewpoint of uniformity of coating film thickness, etc., in the present invention, the aforementioned coating method is preferably a gravure roll coating method using a gravure roll.
可透過如上述塗敷後之接著劑組成物來貼合偏光件與透明保護薄膜。偏光件與透明保護薄膜之貼合可使用輥壓積層器來進行。於偏光件兩面積層保護薄膜之方法可選自以下方法:貼合偏光件與1片保護薄膜後再貼合另1片保護薄膜之方法;以及,同時貼合偏光件與2片保護薄膜之方法。於貼合時產生的夾入氣泡藉由採用前者之方法可顯著減低而較為理想,亦即採用貼合偏光件與1片保護薄膜後再貼合另1片保護薄膜之方法。The polarizer and the transparent protective film can be bonded through the adhesive composition after coating as described above. The bonding of the polarizer and the transparent protective film can be performed using a roll laminate. The method of layering the protective film on the two areas of the polarizer can be selected from the following methods: the method of laminating the polarizer and one protective film and then laminating the other protective film; and the method of laminating the polarizer and two protective films at the same time . The trapped air bubbles generated during bonding can be significantly reduced by the former method, which is ideal, that is, the method of bonding a polarizer and a protective film and then bonding another protective film.
硬化步驟中使用的活性能量線可大致區別為電子射線硬化性、紫外線硬化性及可見光線硬化性。本發明中,將波長範圍10nm~小於380nm之活性能量線記為紫外線、將波長範圍380nm~800nm之活性能量線記為可見光線。在製造本發明之偏光薄膜時,尤宜利用380nm~450nm之可見光線。The active energy rays used in the curing step can be roughly divided into electron beam curing properties, ultraviolet curing properties, and visible light curing properties. In the present invention, the active energy line with a wavelength range of 10 nm to less than 380 nm is recorded as ultraviolet light, and the active energy line with a wavelength range of 380 nm to 800 nm is recorded as visible light. When manufacturing the polarizing film of the present invention, it is particularly suitable to use visible light of 380nm~450nm.
本發明之偏光薄膜是在偏光件及/或透明保護薄膜直接塗敷偏光薄膜用接著劑組成物,並於貼合偏光件與透明保護薄膜後,照射活性能量線(電子射線、紫外線、可見光線等),使接著劑組成物硬化而形成接著劑層。活性能量線(電子射線、紫外線、可見光線等)之照射方向可從任意適當方向照射。較佳為從透明保護薄膜側照射。若從偏光件側進行照射,則有偏光件因活性能量線(電子射線、紫外線、可見光線等)而劣化之虞。The polarizing film of the present invention is to directly coat the polarizer and/or transparent protective film with the adhesive composition for the polarizing film, and after bonding the polarizer and the transparent protective film, irradiate active energy rays (electron rays, ultraviolet rays, visible rays) Etc.) to harden the adhesive composition to form an adhesive layer. The irradiation direction of active energy rays (electron rays, ultraviolet rays, visible rays, etc.) can be irradiated from any appropriate direction. It is preferable to irradiate from the side of the transparent protective film. If irradiated from the side of the polarizer, the polarizer may deteriorate due to active energy rays (electron beams, ultraviolet rays, visible rays, etc.).
關於電子射線硬化性,電子射線之照射條件只要是可將上述偏光薄膜用接著劑組成物硬化的條件,則可採用任意適當條件。例如,電子射線照射時,加速電壓宜為5kV~300kV,更宜為10kV~250kV。加速電壓低於5kV時,電子射線會無法到達偏光薄膜用接著劑組成物而有硬化不足之虞;而加速電壓超過300kV時,通過試料之滲透力會過強,而有對透明保護薄膜或偏光件造成傷害之虞。照射線量為5~100kGy,較佳為10~75kGy。照射線量低於5kGy時,偏光薄膜用接著劑組成物會硬化不足;超過100kGy時,會對透明保護薄膜或偏光件造成傷害,使得機械強度降低或產生黃變,而無法獲得預定之光學特性。Regarding the electron beam curability, as long as the electron beam irradiation conditions are conditions capable of curing the above-mentioned polarizing film adhesive composition, any appropriate conditions can be adopted. For example, during electron beam irradiation, the accelerating voltage should be 5kV~300kV, more preferably 10kV~250kV. When the accelerating voltage is lower than 5kV, the electron beam will not reach the adhesive composition for polarizing film and there is a risk of insufficient curing; and when the accelerating voltage exceeds 300kV, the penetration force through the sample will be too strong, and there will be resistance to the transparent protective film or polarized light. Pieces are in danger of causing harm. The amount of irradiation is 5-100 kGy, preferably 10-75 kGy. When the irradiation dose is less than 5kGy, the adhesive composition for polarizing film will not harden enough; when it exceeds 100kGy, it will damage the transparent protective film or the polarizer, reduce the mechanical strength or produce yellowing, and fail to obtain the predetermined optical properties.
電子射線照射通常於惰性氣體中進行照射,然而,若有必要,亦可於大氣中或導入了少量氧的條件下進行。雖因透明保護薄膜的材料而定,惟藉由適當導入氧可在電子射線會一開始接觸的透明保護薄膜面上特意產生氧阻障,防止透明保護薄膜受損,並能有效率地只對接著劑照射電子射線。Electron beam irradiation is usually carried out in an inert gas, however, if necessary, it can also be carried out in the atmosphere or with a small amount of oxygen introduced. Although it depends on the material of the transparent protective film, by properly introducing oxygen, an oxygen barrier can be deliberately created on the surface of the transparent protective film that the electron beam will initially contact, preventing damage to the transparent protective film, and effectively The adhesive is irradiated with electron rays.
本發明之偏光薄膜之製造方法中,活性能量線以使用包含有波長範圍380nm~450nm之可見光線的射線為佳,特別是以使用波長範圍380nm~450nm之可見光線的照射量最多之活性能量線為佳。紫外線硬化性、可見光線硬化性當中,若使用賦予了紫外線吸收能之透明保護薄膜(紫外線不穿透型透明保護薄膜)時,因會吸收波長約比380nm短之光,故波長比380nm短之光無法到達接著劑組成物,對其聚合反應沒有幫助。此外,被透明保護薄膜吸收之波長比380nm短之光會轉換成熱能,使透明保護薄膜本身發熱,而造成偏光薄膜產生卷曲、皺紋等不良之原因。因此,本發明中採用紫外線硬化性、可見光線硬化性時,以使用不發出波長比380nm短之光的裝置作為活性能量線產生裝置為佳,更具體來說,以波長範圍380~440nm之積算照度與波長範圍250~370nm之積算照度的比為100:0至100:50為佳,較佳為100:0至100:40。作為本發明之活性能量線,宜為封入鎵之金屬鹵素燈、發出波長範圍380~440nm之LED光源。或者,可使用低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、白熱燈泡、氙燈、鹵素燈、碳弧燈、金屬鹵素燈、螢光燈、鎢絲燈、鎵燈、準分子雷射或太陽光等包含紫外線與可見光線之光源,亦可用帶通濾波器遮蔽波長比380nm短之紫外線來使用。為了提高偏光件與透明保護薄膜之間之接著劑層的接著性能,同時防止偏光薄膜卷曲,宜使用封入鎵之金屬鹵素燈並透過可遮蔽波長比380nm短之光的帶通濾波器而得到的活性能量線、或使用LED光源而得到之波長405nm的活性能量線。In the manufacturing method of the polarizing film of the present invention, the active energy ray is preferably the ray containing the visible light in the wavelength range of 380nm~450nm, especially the active energy ray that uses the most irradiated amount of visible light in the wavelength range of 380nm to 450nm Better. Among UV curability and visible light curability, if a transparent protective film (transparent UV non-transparent protective film) with UV absorption energy is used, it will absorb light with a wavelength shorter than 380nm, so the wavelength is shorter than 380nm. Light cannot reach the adhesive composition and does not help its polymerization reaction. In addition, the light with a wavelength shorter than 380nm absorbed by the transparent protective film will be converted into heat energy, which causes the transparent protective film itself to generate heat, which causes the polarizing film to produce curls, wrinkles and other undesirable causes. Therefore, when ultraviolet curability and visible light curability are used in the present invention, it is better to use a device that does not emit light with a wavelength shorter than 380nm as the active energy ray generating device. More specifically, it is calculated based on the product of the wavelength range of 380~440nm. The ratio of the illuminance to the cumulative illuminance of the wavelength range of 250 to 370 nm is preferably 100:0 to 100:50, preferably 100:0 to 100:40. As the active energy line of the present invention, a metal halide lamp enclosed with gallium and an LED light source with a wavelength range of 380 to 440 nm are suitable. Alternatively, low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, incandescent bulbs, xenon lamps, halogen lamps, carbon arc lamps, metal halide lamps, fluorescent lamps, tungsten lamps, gallium lamps, excimer lasers or Sunlight and other light sources including ultraviolet and visible light can also be used with a band-pass filter to shield ultraviolet light with a wavelength shorter than 380nm. In order to improve the bonding performance of the adhesive layer between the polarizer and the transparent protective film, while preventing the polarizing film from curling, it is advisable to use a metal halide lamp enclosed in gallium and pass through a bandpass filter that can block light with a wavelength shorter than 380nm. Active energy ray, or active energy ray with a wavelength of 405nm obtained by using an LED light source.
本發明之偏光薄膜用接著劑組成物尤其可適用於形成可接著偏光件與波長365nm之光線穿透率低於5%之透明保護薄膜的接著劑層。此時,本發明之偏光薄膜用接著劑組成物藉由含有上述通式(2)之光聚合起始劑,隔著具有UV吸收能之透明保護薄膜而照射紫外線時,可硬化形成接著劑層。因此,即便對在偏光件兩面積層了具有UV吸收能之透明保護薄膜的偏光薄膜,亦可使接著劑層硬化。而理所當然,對積層了不具有UV吸收能之透明保護薄膜而成的偏光薄膜,亦可使接著劑層硬化。此外,所謂具有UV吸收能之透明保護薄膜,意指對於380nm之光的穿透率低於10%的透明保護薄膜。The adhesive composition for polarizing films of the present invention is particularly suitable for forming an adhesive layer that can bond a polarizer and a transparent protective film with a light transmittance of less than 5% at a wavelength of 365 nm. At this time, the adhesive composition for polarizing film of the present invention contains the photopolymerization initiator of the above general formula (2), and when irradiated with ultraviolet light through a transparent protective film having UV absorption energy, it can be cured to form an adhesive layer . Therefore, even for a polarizing film in which a transparent protective film with UV absorbing energy is layered on both areas of the polarizer, the adhesive layer can be hardened. Of course, it is also possible to harden the adhesive layer for a polarizing film formed by laminating a transparent protective film that does not have UV absorbing energy. In addition, the so-called transparent protective film with UV absorption energy means a transparent protective film with a transmittance of less than 10% for 380nm light.
作為對透明保護薄膜賦予UV吸收能之方法,可舉如使紫外線吸收劑含於透明保護薄膜中之方法、與在透明保護薄膜表面積層含有紫外線吸收劑之表面處理層之方法。As a method of imparting UV absorbing energy to the transparent protective film, for example, a method of containing an ultraviolet absorber in the transparent protective film, and a method of containing a surface treatment layer of the ultraviolet absorber on the surface of the transparent protective film.
作為紫外線吸收劑之具體例,可舉例如周知之氧二苯基酮系化合物、苯并三唑系化合物、柳酸酯系化合物、二苯基酮系化合物、氰基丙烯酸酯系化合物、鎳錯合鹽系化合物、三吖系化合物等。Specific examples of ultraviolet absorbers include, for example, well-known oxybenzophenone-based compounds, benzotriazole-based compounds, salicylate-based compounds, benzophenone-based compounds, cyanoacrylate-based compounds, and nickel aluminum compounds. Synthetic salt compounds, three acridine Department of compounds and so on.
關於紫外線硬化性或可見光線硬化性,較佳為在照射紫外線或可見光線之前將偏光薄膜用接著劑組成物加溫(照射前加溫),此時以加溫至40℃以上為佳,加溫至50℃以上較佳。此外,在照射紫外線或可見光線之後將偏光薄膜用接著劑組成物加溫(照射後加溫)亦適宜,此時以加溫至40℃以上為佳,加溫至50℃以上較佳。Regarding ultraviolet curability or visible light curability, it is preferable to heat the polarizing film adhesive composition before irradiating ultraviolet or visible light (heating before irradiation). In this case, it is better to heat to 40°C or higher. The temperature is preferably above 50°C. In addition, it is also suitable to heat the adhesive composition for polarizing film after irradiating ultraviolet rays or visible rays (heating after irradiation). In this case, it is better to heat to 40°C or higher, and to heat to 50°C or higher.
本發明之偏光薄膜在連續生產線上製造時,生產線速度會依接著劑組成物之硬化時間而定,惟以5~100m/min為佳,並以10~50m/min較佳,20~30m/min更佳。生產線速度過低時,會缺乏生產性,或對透明保護薄膜造成過大傷害,而無法製作出可承受耐久性試驗等的偏光薄膜。生產線速度過大時,接著劑組成物的硬化會不足,而有無法獲得所欲獲得之接著性的情況。When the polarizing film of the present invention is manufactured on a continuous production line, the production line speed will depend on the curing time of the adhesive composition, but it is preferably 5-100m/min, and preferably 10-50m/min, 20-30m/min. min is better. When the production line speed is too low, it will lack productivity or cause excessive damage to the transparent protective film, making it impossible to produce a polarizing film that can withstand durability tests, etc. When the line speed is too high, the curing of the adhesive composition may be insufficient, and the desired adhesiveness may not be obtained in some cases.
本發明之偏光薄膜在實際使用時,可作為與其他光學層積層而成之光學薄膜來使用。該光學層方面並無特別限定,可使用1層或2層以上之例如反射板及半穿透板、相位差板(包含1/2及1/4等波長板)、視角補償薄膜等可用於形成液晶顯示裝置等的光學層。尤佳為於本發明之偏光薄膜上再積層反射板或半穿透反射板而成的反射型偏光薄膜或半穿透型偏光薄膜、於偏光薄膜上再積層相位差板而成的橢圓偏光薄膜或圓偏光薄膜、於偏光薄膜上再積層視角補償薄膜而成的廣視角偏光薄膜、或於偏光薄膜上再積層增亮薄膜而成的偏光薄膜。In actual use, the polarizing film of the present invention can be used as an optical film laminated with other optical layers. The optical layer is not particularly limited, and one or more layers such as reflectors and semi-transmissive plates, retardation plates (including 1/2 and 1/4 wavelength plates), viewing angle compensation films, etc. can be used. An optical layer of a liquid crystal display device or the like is formed. Particularly preferred is a reflective polarizing film or semi-transmissive polarizing film formed by laminating a reflective plate or a semi-transmissive reflector on the polarizing film of the present invention, and an elliptical polarizing film formed by laminating a phase difference plate on the polarizing film Or a circular polarizing film, a wide viewing angle polarizing film formed by laminating a viewing angle compensation film on a polarizing film, or a polarizing film formed by laminating a brightness enhancement film on a polarizing film.
於偏光薄膜積層了上述光學層而成之光學薄膜,亦可在液晶顯示裝置等之製造過程中以依序個別積層之方式形成,但預先積層成光學薄膜者在品質穩定性與組裝作業等方面較具優勢,有改善液晶顯示裝置等之製造步驟的優點。可使用黏著層等適當的接著手段進行積層。上述偏光薄膜及其他光學薄膜在接著時,其等之光學軸可因應所欲獲得之相位差特性等作成適當的配置角度。The optical film formed by laminating the above-mentioned optical layer on the polarizing film can also be formed in a sequential manner in the manufacturing process of liquid crystal display devices, etc., but the optical film is pre-laminated into an optical film in terms of quality stability and assembly operations. It is more advantageous and has the advantage of improving the manufacturing steps of liquid crystal display devices and the like. It can be laminated with an appropriate bonding method such as an adhesive layer. When the above-mentioned polarizing film and other optical films are bonded, the optical axis of the polarizing film and other optical films can be arranged at an appropriate angle according to the desired retardation characteristics.
在前述偏光薄膜、或積層有至少1層偏光薄膜之光學薄膜上,亦可設置用於與液晶單元等其他構件接著之黏著層。形成黏著層之黏著劑並無特別限制,可適當選擇並使用例如丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺甲酸酯、聚醯胺、聚醚、氟系或橡膠系等聚合物作為基底聚合物者。尤佳的是可使用如同丙烯酸系黏著劑般具優異光學透明性、可展現適度濡濕性、凝聚性與接著性等之黏著特性並且具有優異耐候性及耐熱性等之物。On the aforementioned polarizing film or an optical film laminated with at least one layer of polarizing film, an adhesive layer for bonding with other components such as liquid crystal cells can also be provided. The adhesive forming the adhesive layer is not particularly limited. For example, acrylic polymer, silicone polymer, polyester, polyurethane, polyamide, polyether, fluorine-based or rubber-based can be appropriately selected and used. Such polymers as the base polymer. It is particularly preferable to use materials that have excellent optical transparency like acrylic adhesives, can exhibit adhesive properties such as moderate wettability, cohesiveness, and adhesion, and have excellent weather resistance and heat resistance.
黏著層可以不同組成或種類等之層的重疊層形式設置於偏光薄膜、光學薄膜之單面或兩面。又,在設置於兩面之情形下,於偏光薄膜或光學薄膜之表背亦可作成組成或種類或厚度等相異的黏著層。黏著層之厚度可因應使用目的與接著力等來作適宜決定,一般為1~100μm,宜為5~30μm,尤宜為10~20μm。The adhesive layer can be arranged on one side or both sides of the polarizing film and the optical film in the form of an overlapping layer of layers of different compositions or types. Moreover, when it is installed on both sides, the front and back of the polarizing film or the optical film can also be made into adhesive layers with different compositions, types, or thicknesses. The thickness of the adhesive layer can be appropriately determined according to the purpose of use and adhesion, etc., generally 1-100μm, preferably 5-30μm, especially 10-20μm.
對於黏著層之露出面,在供實際使用為止之間,為了防止其受污染,可用分離件暫時貼附並覆蓋。藉此,可防止在一般操作狀態下接觸到黏著層。作為分離件,除了上述厚度條件外,可使用依循習知之適宜物品,例如可使用將塑膠薄膜、橡膠薄片、紙、布、不織布、網、發泡薄片或金屬箔、及該等之積層體等適宜的薄片物因應需要以聚矽氧系或長鏈烷系、氟系或硫化鉬等適宜的剝離劑進行塗佈處理而成者等。The exposed surface of the adhesive layer can be temporarily attached and covered with a separator to prevent it from being contaminated before it is actually used. This prevents contact with the adhesive layer under normal operating conditions. As the separator, in addition to the above-mentioned thickness conditions, suitable articles according to conventional knowledge can be used, for example, plastic films, rubber sheets, paper, cloth, non-woven fabrics, nets, foam sheets or metal foils, and laminates of these can be used. Suitable sheet materials are coated with suitable release agents such as polysiloxane-based, long-chain alkane-based, fluorine-based, or molybdenum sulfide, etc., as required.
本發明之偏光薄膜或光學薄膜,可適宜使用在液晶顯示裝置等各種裝置的形成等等。液晶顯示裝置的形成可依循習知來進行。即,液晶顯示裝置一般是藉由將液晶單元與偏光薄膜或光學薄膜及因應需求的照明系統等構成零件適當組裝並安裝驅動電路等而形成,在本發明中,除使用本發明之偏光薄膜或光學薄膜此點以外無特別限定,可依習知為準。關於液晶單元,可使用譬如TN型或STN型、π型等任意型式。The polarizing film or optical film of the present invention can be suitably used in the formation of various devices such as liquid crystal display devices. The formation of the liquid crystal display device can be performed according to conventional knowledge. That is, the liquid crystal display device is generally formed by appropriately assembling the liquid crystal cell, the polarizing film or the optical film, and the component parts such as the lighting system according to the demand, and installing the driving circuit. In the present invention, in addition to the use of the polarizing film or The optical film is not particularly limited except for this point, and it can be based on conventional knowledge. Regarding the liquid crystal cell, any type such as TN type, STN type, and π type can be used.
可形成液晶單元之單側或兩側配置有偏光薄膜或光學薄膜而成的液晶顯示裝置、或是使用了背光或反射板作為照明系統等適當的液晶顯示裝置。此時,本發明之偏光薄膜或光學薄膜可配置於液晶單元之單側或兩側。於兩側配置偏光薄膜或光學薄膜時,其等可為相同者,亦可為相異者。此外,於形成液晶顯示裝置時,可在適當位置上配置1層或2層以上之諸如擴散板、防眩層、抗反射膜、保護板、稜鏡陣列、透鏡陣列片、光擴散板、背光等適當零件。 實施例It is possible to form a liquid crystal display device in which a polarizing film or an optical film is arranged on one side or both sides of a liquid crystal cell, or an appropriate liquid crystal display device using a backlight or a reflective plate as an illumination system. At this time, the polarizing film or optical film of the present invention can be arranged on one side or both sides of the liquid crystal cell. When polarizing films or optical films are arranged on both sides, they may be the same or different. In addition, when forming a liquid crystal display device, one layer or two or more layers such as diffuser, anti-glare layer, anti-reflection film, protective plate, ridge array, lens array sheet, light diffuser, and backlight can be arranged in an appropriate position. Wait for appropriate parts. Example
以下記載本發明之實施例,惟本發明之實施形態不受限於此。Examples of the present invention are described below, but the embodiments of the present invention are not limited thereto.
(硬化性樹脂組成物之調製) 使用54.5重量%之1,9-壬二醇二丙烯酸酯、10重量%之羥乙基丙烯醯胺、30重量%之丙烯醯基啉作為活性能量線硬化性成分,並使用0.5重量%之BYK公司製「BYK-UV3570」作為具有反應性基之氣泡抑制劑,使用3重量%之IRGACURE 907、2重量%之KAYACURE DETX-S2作為聚合起始劑,攪拌3小時後獲得接著劑組成物A。(Preparation of curable resin composition) 54.5 wt% of 1,9-nonanediol diacrylate, 10 wt% of hydroxyethyl acrylamide, and 30 wt% of acrylamide are used As a curable component of active energy rays, 0.5% by weight of BYK "BYK-UV3570" is used as a bubble inhibitor with a reactive group, and 3% by weight of IRGACURE 907 and 2% by weight of KAYACURE DETX-S2 are used as The polymerization initiator was stirred for 3 hours to obtain an adhesive composition A.
<製作偏光件> 將平均聚合度2400、皂化度99.9莫耳%之厚度45μm的聚乙烯醇薄膜浸漬在30℃溫水中60秒使其膨潤。接著,浸漬於碘/碘化鉀(重量比=0.5/8)濃度0.3%之水溶液中,一邊使其延伸到3.5倍一邊將薄膜染色。其後,在65℃之硼酸酯水溶液中進行延伸,以使總延伸倍率成為6倍。延伸後,以40℃烘箱進行3分鐘的乾燥,而獲得聚乙烯醇系偏光件X(厚度18μm)。<Preparation of Polarizer> A 45 μm polyvinyl alcohol film with an average degree of polymerization of 2400 and a degree of saponification of 99.9 mol% was immersed in 30°C warm water for 60 seconds to swell it. Next, it was immersed in a 0.3% aqueous solution of iodine/potassium iodide (weight ratio=0.5/8), and the film was dyed while extending it to 3.5 times. Thereafter, stretching was performed in a borate aqueous solution at 65°C so that the total stretching ratio became 6 times. After stretching, drying was performed in an oven at 40°C for 3 minutes to obtain a polyvinyl alcohol-based polarizer X (thickness 18 μm).
<薄型偏光件的製作> 為了製作薄型偏光件,首先,對24μm厚PVA層成膜於非晶性PET基材上而成的積層體進行延伸溫度130℃的空中輔助延伸,藉此生成延伸積層體,接著藉由將延伸積層體染色而生成著色積層體,再藉由延伸溫度65度的硼酸水中延伸將著色積層體與非晶性PET基材一體地進行延伸,以使總延伸倍率成為5.94倍後,而生成包含10μm厚PVA層的光學薄膜積層體。而可生成包含用以構成薄型偏光件Y之厚度5μm之PVA層的光學薄膜積層體(總厚度40μm),該光學薄膜積層體之成膜於非晶性PET基材之PVA層的PVA分子經所述的2段延伸而高度配向,且藉染色而吸附的碘以多碘離子錯合物之形式於一方向高度配向。<Production of thin polarizer> In order to produce a thin polarizer, first, a laminate formed by forming a 24μm thick PVA layer on an amorphous PET substrate is subjected to air-assisted stretching at a stretching temperature of 130°C to produce a stretched laminate Then, the colored laminate is formed by dyeing the stretched laminate, and the colored laminate is stretched integrally with the amorphous PET substrate by stretching in boric acid water at a stretching temperature of 65 degrees, so that the total stretch magnification becomes 5.94 After magnification, an optical thin film laminate including a 10 μm thick PVA layer was produced. An optical thin film laminate (total thickness 40 μm) including a PVA layer with a thickness of 5 μm for forming the thin polarizer Y can be produced. The PVA molecule of the optical thin film laminate is formed on the PVA layer of the amorphous PET substrate. The two-stage extension is highly aligned, and the iodine adsorbed by dyeing is highly aligned in one direction in the form of polyiodide ion complexes.
<透明保護薄膜> (i)Acryl;以雙軸捏合機在220℃下混合日本專利特開2010-284840號公報之製造例1中記載的醯亞胺化MS樹脂100重量份及三吖系紫外線吸收劑(艾迪科(ADEKA)公司製、商品名:T-712)0.62重量份,製作出樹脂顆粒。將所製得之樹脂顆粒在100.5kPa、100℃下乾燥12小時,再以單軸擠製機在塑模溫度270℃下從T型模擠出,成形為薄膜狀(厚度160μm)。並且於150℃的氣體環境下將該薄膜往其輸送方向延伸(厚度80μm),接著塗佈含水性胺甲酸酯樹脂之易接著劑之後,於150℃的氣體環境下往與薄膜輸送方向正交之方向延伸,而製得厚度40μm(透濕度58g/m2 /24h)之透明丙烯酸薄膜(Acryl)。 (ii)COP;使用厚度52μm之環狀聚烯烴薄膜(日本ZEON公司製)。 (iii)TAC;使用厚度60μm之三乙醯纖維素薄膜(富士軟片公司製)。<Transparent protective film> (i) Acryl; 100 parts by weight of the imidized MS resin described in Production Example 1 of Japanese Patent Laid-Open No. 2010-284840 was mixed with a biaxial kneader at 220°C and three acridines 0.62 parts by weight of an ultraviolet absorber (manufactured by ADEKA, trade name: T-712) to prepare resin pellets. The prepared resin pellets were dried at 100.5 kPa and 100°C for 12 hours, and then extruded from a T-die with a uniaxial extruder at a molding temperature of 270°C to be formed into a film (thickness 160 μm). And the film is stretched in the conveying direction (thickness 80μm) in a gas atmosphere at 150°C, and then coated with an easy-adhesive agent of water-containing urethane resin, and then in a gas environment at 150°C in the same direction as the film conveying direction. Extending in the opposite direction, a transparent acrylic film (Acryl) with a thickness of 40 μm (water permeability of 58 g/m 2 /24h) was prepared. (ii) COP: A cyclic polyolefin film with a thickness of 52 μm (manufactured by ZEON, Japan) is used. (iii) TAC: A 60 μm thick triacetyl cellulose film (manufactured by Fuji Film Co., Ltd.) was used.
<剝離力> 將偏光薄膜切出與偏光件之延伸方向平行為200mm、直行方向為15mm的大小,並將偏光薄膜貼合於玻璃板。其次將透明保護薄膜(第1保護薄膜或第2保護薄膜)與偏光件之間用裁切刀劃出切痕,使用Tensilon試驗機,將保護薄膜與偏光件以剝離速度300mm/min朝90度方向剝離,測定其剝離強度(N/15mm)。<Peeling force> The polarizing film is cut out to a size of 200 mm parallel to the extending direction of the polarizer and 15 mm in the straight direction, and the polarizing film is bonded to the glass plate. Next, make a cut mark between the transparent protective film (the first protective film or the second protective film) and the polarizer with a cutter, and use the Tensilon testing machine to move the protective film and the polarizer at a peeling speed of 300mm/min to 90 degrees Peel off in the direction and measure the peel strength (N/15mm).
<積層前氣泡> 採取剛塗敷接著劑後的樣品,分別對兩面利用光學顯微鏡觀察並計算氣泡數。氣泡數係於5cm×5cm之範圍進行計算,並確認塗敷面之氣泡數合計。<Bubble before lamination> Take the sample immediately after applying the adhesive, observe both sides with an optical microscope, and count the number of bubbles. Calculate the number of bubbles in the range of 5cm×5cm, and confirm the total number of bubbles on the coated surface.
<積層氣泡> 分別對偏光薄膜之兩面利用光學顯微鏡觀察並計算氣泡數。氣泡數係於5cm×5cm之範圍進行計算,並確認兩面之氣泡數合計。<Layered bubbles> Observe the two sides of the polarizing film with an optical microscope and count the number of bubbles. Calculate the number of bubbles in the range of 5cm×5cm, and confirm the total number of bubbles on both sides.
<表面張力> 使用Drop Master(協和界面科學(股))以懸滴法進行測定。<Surface tension> It was measured by the hanging drop method using Drop Master (Kyowa Interface Science Co., Ltd.).
實施例1 使用MCD塗佈機(富士機械公司製)(網孔形狀:蜂巢狀、凹版輥筒線數:1000條/inch、轉速180%/對線速),分別於第1保護薄膜(Acryl)及第2保護薄膜(COP)上塗敷接著劑組成物A,以使厚度為0.5μm,並使用輥壓機貼合於上述偏光件X的兩面。其後,從經貼合之透明保護薄膜側(兩側)用活性能量線照射裝置將上述可見光線照射於兩面並使硬化型接著劑硬化,然後在以70℃經3分鐘熱風乾燥,而獲得於偏光件兩側具有透明保護薄膜的偏光薄膜。貼合之生產線速度是在25m/min下進行。Example 1 Using an MCD coater (manufactured by Fuji Machinery Co., Ltd.) (mesh shape: honeycomb, gravure roll line number: 1000 lines/inch, rotation speed 180%/pair line speed), the first protective film (Acryl ) And the second protective film (COP) were coated with the adhesive composition A so as to have a thickness of 0.5 μm, and were bonded to both sides of the polarizer X using a roll press. After that, the above-mentioned visible light is irradiated on both sides with an active energy ray irradiation device from the side (both sides) of the laminated transparent protective film to harden the hardening type adhesive, and then it is dried in hot air at 70°C for 3 minutes to obtain Polarizing films with transparent protective films on both sides of the polarizer. The speed of the lamination production line is 25m/min.
實施例2 使用接著劑組成物B,其除了針對實施例1所使用之接著劑組成物A將具有反應性基之氣泡抑制劑變更為0.5重量%之BYK公司製「BYK-UV3505」以外,其餘為相同組成。Example 2 Adhesive composition B was used, except for the adhesive composition A used in Example 1 that the bubble inhibitor with a reactive group was changed to 0.5% by weight of BYK company "BYK-UV3505", the rest For the same composition.
比較例1 除了變更為接著劑組成物C以外,依與實施例1同樣地進行評估,而前述接著劑組成物C係除了由接著劑組成物A之組成除去BYK公司製「BYK-UV3570」以外,其餘為相同組成者。 比較例2 使用接著劑組成物D,其除了針對實施例1所使用之接著劑組成物A將具有反應性基之氣泡抑制劑變更為0.5重量%之不具有反應性基之聚醚改質聚矽氧系氣泡抑制劑之「401LS Additive」以外,其餘為相同組成。Comparative Example 1 The evaluation was carried out in the same manner as in Example 1 except that the adhesive composition C was changed. The aforementioned adhesive composition C was composed of the adhesive composition A except for the BYK company "BYK-UV3570" , And the rest are of the same composition. Comparative Example 2 Adhesive composition D was used, except that for the adhesive composition A used in Example 1, the bubble inhibitor with a reactive group was changed to 0.5% by weight of a polyether modified polymer without a reactive group. Except for the "401LS Additive" of the silica-based bubble inhibitor, the rest have the same composition.
實施例3 除了使用TAC作為第1保護薄膜以外,依與實施例1同樣地進行評估。Example 3 Evaluation was performed in the same manner as in Example 1, except that TAC was used as the first protective film.
比較例3 除了使用接著劑組成物C取代接著劑組成物A以外,依與實施例3同樣地進行評估。Comparative Example 3 The evaluation was performed in the same manner as in Example 3 except that the adhesive composition C was used instead of the adhesive composition A.
實施例4、比較例4 除使用表1記載之各接著劑組成物取代接著劑組成物A,並使用薄型偏光件Y取代偏光件X,且使用以下述方法製造之偏光薄膜以外,依與實施例1同樣地進行評估。Example 4, Comparative Example 4 Except that each adhesive composition described in Table 1 was used instead of the adhesive composition A, a thin polarizer Y was used instead of the polarizer X, and the polarizing film manufactured by the following method was used, the implementation was followed Example 1 was evaluated in the same way.
於包含薄型偏光件Y之光學薄膜積層體的薄型偏光件Y表面塗佈表1所記載之各接著劑組成物,並貼合第1保護薄膜後以50℃進行5分鐘的乾燥。其次,將非晶性PET基材剝離後,於其剝離面塗佈表1所記載之各接著劑組成物,並在貼合第2保護薄膜後以紫外線使其硬化,而製作出使用了薄型偏光件Y之偏光薄膜。Each of the adhesive compositions described in Table 1 was coated on the surface of the thin polarizer Y including the optical film laminate of the thin polarizer Y, and the first protective film was laminated, followed by drying at 50°C for 5 minutes. Next, after peeling off the amorphous PET substrate, each adhesive composition described in Table 1 was applied to the peeling surface, and the second protective film was laminated and then cured by ultraviolet rays to produce a thin type. Polarizing film of polarizer Y.
實施例5、比較例5 除了使用表1所記載之各接著劑組成物取代接著劑組成物A以外,依與實施例1同樣地進行了評估。Example 5 and Comparative Example 5 The evaluation was performed in the same manner as in Example 1, except that each adhesive composition described in Table 1 was used instead of the adhesive composition A.
[表1] [Table 1]
表1中,活性能量線硬化性成分為: 1,9-壬二醇二丙烯酸酯,共榮社化學公司製「LIGHT ACRYLATE 1.9ND-A」、 羥乙基丙烯醯胺,興人公司製「HEAA」、 丙烯醯基林,興人公司製「ACMO」、 羥基三甲基乙酸新戊二醇丙烯酸酯加成物,共榮社化學公司製「LIGHT ACRYLATE HPP-A」、 2-羥-3-苯氧丙基丙烯酸酯,東亞合成公司製「M5700」、 雙酚A型環氧樹脂,商品名「jER-828」,Japan Epoxy Resins公司製、 3-乙基-3-苯氧甲基氧雜環丁烷,商品名「ARON OXETANE OXT-211」,東亞合成公司製; 具有反應性基之氣泡抑制劑為: 具有丙烯醯官能基之改質聚二甲基矽氧烷之聚矽氧系氣泡抑制劑(含有胺甲酸酯鍵及三聚異氰酸酯環結構),BYK公司製「BYK-UV3505」、 具有丙烯醯官能基之聚酯改質聚二甲基矽氧烷之聚矽氧系氣泡抑制劑(含有胺甲酸酯鍵及三聚異氰酸酯環結構),BYK公司製「BYK-UV3570」; 不具有反應性基之氣泡抑制劑為: 聚醚改質聚矽氧系氣泡抑制劑,Dow Cornin Toray公司製「401LS Additive」; 聚合起始劑為: IRGACURE 907,BASF公司製、 KAYACURE DETX-S,日本化藥公司製、 以六氟磷酸三芳基鋶鹽作為主成分的有效成分50%之碳酸伸丙酯溶液,商品名「UVI-6992」,陶氏化學公司製。In Table 1, the active energy ray curable components are: 1,9-nonanediol diacrylate, "LIGHT ACRYLATE 1.9ND-A" manufactured by Kyoeisha Chemical Co., Ltd., and hydroxyethyl acrylamide, manufactured by Hingren Co., Ltd. HEAA", acrylic Lin, "ACMO" made by Xingren Company, hydroxytrimethylacetate neopentyl glycol acrylate adduct, "LIGHT ACRYLATE HPP-A" made by Kyoeisha Chemical Company, 2-hydroxy-3-phenoxypropyl acrylic acid Ester, "M5700" manufactured by Toagosei Co., Ltd., bisphenol A epoxy resin, trade name "jER-828", manufactured by Japan Epoxy Resins, 3-ethyl-3-phenoxymethyloxetane, product The name "ARON OXETANE OXT-211", manufactured by Toagosei Co., Ltd.; The bubble inhibitor with a reactive group is: Polysiloxane-based bubble inhibitor of modified polydimethylsiloxane with acrylic functional group (containing amine Formate bond and triisocyanate ring structure), BYK "BYK-UV3505" made by BYK, a polysiloxane-based air bubble inhibitor (containing urethane Acid ester bond and triisocyanate ring structure), BYK company "BYK-UV3570"; bubble inhibitor without reactive group: polyether modified polysiloxane bubble inhibitor, Dow Cornin Toray company "401LS"Additive"; the polymerization initiator is: IRGACURE 907, manufactured by BASF Corporation, KAYACURE DETX-S, manufactured by Nippon Kayaku Co., a 50% propylene carbonate solution of active ingredient with triarylsulfonium hexafluorophosphate as the main component, Trade name "UVI-6992", manufactured by The Dow Chemical Company.
實施例6~18 針對實施例2所使用之組成物B,將接著劑層所含有之氣泡抑制劑的含量y(重量%)變更為表2所記載者,並將接著劑層之厚度d(μm)變更為表2所記載者,除此之外,依與實施例2同樣地進行評估。Examples 6 to 18 For the composition B used in Example 2, the content y (weight %) of the bubble inhibitor contained in the adhesive layer was changed to that described in Table 2, and the thickness d ( μm) was changed to those described in Table 2, except that it was evaluated in the same manner as in Example 2.
[表2] [Table 2]
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