TWI707766B - Imprinting system, glue supplying device and imprinting method - Google Patents
Imprinting system, glue supplying device and imprinting method Download PDFInfo
- Publication number
- TWI707766B TWI707766B TW107124438A TW107124438A TWI707766B TW I707766 B TWI707766 B TW I707766B TW 107124438 A TW107124438 A TW 107124438A TW 107124438 A TW107124438 A TW 107124438A TW I707766 B TWI707766 B TW I707766B
- Authority
- TW
- Taiwan
- Prior art keywords
- glue
- imprinting
- item
- patent application
- mold
- Prior art date
Links
Images
Landscapes
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
本發明是有關於一種壓印系統、供膠裝置及壓印方法,且特別是有關於一種用於晶圓壓印製程的壓印系統、供膠裝置及壓印方法。 The invention relates to an imprinting system, a glue supply device and an imprinting method, and more particularly to an imprinting system, a glue supplying device and an imprinting method used in a wafer imprinting process.
奈米壓印是利用模具的壓印微結構(如複數凹孔)對晶圓上的膠層進行壓印,以在晶圓上形成所需的微結構,例如光學裝置之鏡片的光學微結構。然而,在模具的所述凹孔的深度較大的情況下,於壓印過程中,所述凹孔內的空氣無法隨著膠的進入而完全排出,從而產生氣泡而影響產品良率。並且,若為了解決所述氣泡問題而改變(增加)模具於壓印過程中施加於膠層的壓力,則會因所述改變而影響壓印品質。 Nanoimprinting uses the imprinted microstructures of the mold (such as multiple concave holes) to imprint the adhesive layer on the wafer to form the required microstructure on the wafer, such as the optical microstructure of the lens of an optical device . However, when the depth of the recessed hole of the mold is large, during the imprinting process, the air in the recessed hole cannot be completely discharged as the glue enters, thereby generating bubbles and affecting the product yield. Moreover, if the pressure applied by the mold to the adhesive layer during the imprinting process is changed (increased) in order to solve the bubble problem, the imprint quality will be affected due to the change.
本發明提供一種壓印系統、供膠裝置及壓印方法,可避免膠層於壓印後產生氣泡。 The invention provides an embossing system, a glue supply device and an embossing method, which can prevent the glue layer from generating bubbles after embossing.
本發明的壓印系統包括一壓印模具及一供膠裝置。壓印模具具有一壓印表面。供膠裝置包括一供膠主體及一出膠部。供膠主體適於驅動出膠部往壓印表面移動,並藉由出膠部提供一第一膠層至壓印表面。壓印模具適於將第一膠層壓印至一晶圓。 The imprinting system of the present invention includes an imprinting mold and a glue supply device. The imprinting mold has an imprinting surface. The glue supply device includes a glue supply main body and a glue outlet part. The glue supply body is adapted to drive the glue out part to move to the imprinting surface, and the glue out part provides a first glue layer to the imprinting surface. The imprinting mold is suitable for printing the first adhesive layer onto a wafer.
本發明的供膠裝置,包括一供膠主體、一延伸臂及一出膠部。延伸臂從供膠主體延伸出。出膠部配置於延伸臂的末端。供膠主體適於驅動延伸臂伸入一壓印模具內以使出膠部對位於壓印模具的一壓印表面,並藉由出膠部提供一第一膠層至壓印表面。壓印模具適於將第一膠層壓印至一晶圓。 The glue supply device of the present invention includes a glue supply main body, an extension arm and a glue outlet part. The extension arm extends from the glue supply main body. The glue outlet part is arranged at the end of the extension arm. The glue supply main body is adapted to drive the extension arm to extend into an imprinting mold so that the glue outlet is located on an imprinting surface of the imprinting mold, and the glue outlet provides a first adhesive layer to the imprinting surface. The imprinting mold is suitable for printing the first adhesive layer onto a wafer.
在本發明的一實施例中,上述的供膠主體的底部具有多個滾輪,供膠主體適於藉由這些滾輪而移動。 In an embodiment of the present invention, the bottom of the above-mentioned glue supply body has a plurality of rollers, and the glue supply body is adapted to move by the rollers.
在本發明的一實施例中,上述的供膠裝置包括一延伸臂,延伸臂從供膠主體延伸出,出膠部配置於延伸臂的末端,延伸臂適於伸入壓印模具內以使出膠部對位於壓印表面。 In an embodiment of the present invention, the above-mentioned glue supply device includes an extension arm that extends from the glue supply body, and the glue outlet portion is disposed at the end of the extension arm, and the extension arm is adapted to extend into the imprinting mold to make The glue outlet is located on the imprinting surface.
在本發明的一實施例中,上述的供膠主體適於驅動延伸臂升降。 In an embodiment of the present invention, the above-mentioned glue supply body is suitable for driving the extension arm up and down.
在本發明的一實施例中,上述的供膠主體透過延伸臂而供膠至出膠部。 In an embodiment of the present invention, the aforementioned glue supply body supplies glue to the glue outlet part through the extension arm.
在本發明的一實施例中,上述的壓印模具包括一上模具及一承載台,承載台位於上模具的下方且適於承載晶圓。 In an embodiment of the present invention, the above-mentioned imprinting mold includes an upper mold and a carrying table, and the carrying table is located below the upper mold and is suitable for carrying wafers.
在本發明的一實施例中,上述的供膠主體適於驅動出膠部移至上模具與承載台之間。 In an embodiment of the present invention, the above-mentioned glue supply main body is suitable for driving the glue outlet part to move between the upper mold and the carrying platform.
在本發明的一實施例中,上述的出膠部具有一出膠表面,出膠表面的中央具有一出膠孔。 In an embodiment of the present invention, the glue outlet part has a glue outlet surface, and the center of the glue outlet surface has a glue outlet hole.
在本發明的一實施例中,上述的出膠孔適於藉由供膠主體的驅動而對位於壓印表面的中央。 In an embodiment of the present invention, the above-mentioned glue outlet hole is adapted to be positioned at the center of the imprinting surface by the driving of the glue supply body.
在本發明的一實施例中,上述的出膠部適於藉由供膠主體的驅動而與壓印表面具有一間距。 In an embodiment of the present invention, the above-mentioned glue outlet portion is adapted to have a distance from the imprinting surface by the driving of the glue supply body.
在本發明的一實施例中,上述的壓印表面具有複數壓印凹孔,出膠部適於使部分第一膠層進入至少部分這些壓印凹孔。 In an embodiment of the present invention, the above-mentioned embossing surface has a plurality of embossing recesses, and the glue outlet portion is adapted to allow part of the first adhesive layer to enter at least part of these embossing recesses.
在本發明的一實施例中,上述的出膠部適於施加一出膠壓力於壓印表面,以至少部分地排出這些壓印凹孔內的氣泡。 In an embodiment of the present invention, the above-mentioned glue discharging part is suitable for applying a glue discharging pressure to the imprinting surface to at least partially expel the bubbles in the imprinting recesses.
在本發明的一實施例中,上述的晶圓上具有一第二膠層,壓印模具適於將第一膠層壓印至第二膠層。 In an embodiment of the present invention, the above-mentioned wafer has a second adhesive layer, and the imprinting mold is suitable for printing the first adhesive layer onto the second adhesive layer.
本發明的壓印方法包括以下步驟。提供一壓印模具,具有一壓印表面。提供一供膠裝置,包括一供膠主體及一出膠部。藉由供膠主體驅動出膠部往壓印表面移動,並藉由出膠部提供一第一膠層至壓印表面。壓印模具將第一膠層壓印至一晶圓。 The imprinting method of the present invention includes the following steps. Provide an imprint mold with an imprint surface. Provide a glue supply device, including a glue supply main body and a glue outlet. The glue supply body drives the glue out part to move to the imprinting surface, and the glue out part provides a first glue layer to the imprinting surface. The imprinting mold prints the first adhesive layer onto a wafer.
在本發明的一實施例中,上述的供膠主體的底部具有多個滾輪,所述方法包括以下步驟。供膠主體藉由這些滾輪而移動。 In an embodiment of the present invention, the bottom of the above-mentioned glue supply body has a plurality of rollers, and the method includes the following steps. The main body of the glue is moved by these rollers.
在本發明的一實施例中,上述的供膠裝置包括一延伸臂,延伸臂從供膠主體延伸出,出膠部配置於延伸臂的末端,所述方法包括以下步驟。延伸臂伸入壓印模具內以使出膠部對位於壓印表面。 In an embodiment of the present invention, the aforementioned glue supply device includes an extension arm, the extension arm extends from the glue supply body, and the glue outlet portion is disposed at the end of the extension arm. The method includes the following steps. The extension arm extends into the imprinting mold so that the glue out part is positioned on the imprinting surface.
在本發明的一實施例中,上述的壓印方法包括以下步驟。供膠主體驅動延伸臂升降。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. The main body of the glue supply drives the extension arm up and down.
在本發明的一實施例中,上述的壓印方法包括以下步驟。供膠主體透過延伸臂而供膠至出膠部。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. The glue supply body supplies glue to the glue outlet part through the extension arm.
在本發明的一實施例中,上述的壓印模具包括一上模具及一承載台,承載台位於上模具的下方,所述方法包括以下步驟。藉由承載台承載晶圓。 In an embodiment of the present invention, the above-mentioned imprinting mold includes an upper mold and a bearing table, the bearing table is located below the upper mold, and the method includes the following steps. The wafer is carried by the stage.
在本發明的一實施例中,上述的壓印方法包括以下步驟。供膠主體驅動出膠部移至上模具與承載台之間。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. The glue supply main body drives the glue out part to move between the upper mold and the bearing platform.
在本發明的一實施例中,上述的出膠部具有一出膠表面,出膠表面的中央具有一出膠孔,所述方法包括以下步驟。出膠孔藉由供膠主體的驅動而對位於壓印表面的中央。 In an embodiment of the present invention, the aforementioned glue outlet portion has a glue outlet surface, and the center of the glue outlet surface has a glue outlet hole. The method includes the following steps. The glue outlet hole is aligned at the center of the imprinting surface by the drive of the glue supply main body.
在本發明的一實施例中,上述的壓印方法包括以下步驟。出膠部藉由供膠主體的驅動而與壓印表面具有一間距。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. The glue outlet part is driven by the glue supply body to have a distance from the imprinting surface.
在本發明的一實施例中,上述的壓印表面具有複數壓印凹孔,所述方法包括以下步驟。出膠部使部分第一膠層進入至少部分這些壓印凹孔。 In an embodiment of the present invention, the above-mentioned imprinting surface has a plurality of imprinting concave holes, and the method includes the following steps. The glue outlet part allows part of the first glue layer to enter at least part of these embossed recesses.
在本發明的一實施例中,上述的壓印方法包括以下步驟。出膠部施加一出膠壓力於壓印表面,以至少部分地排出這些壓印凹孔內的氣泡。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. The glue discharging part applies a glue discharging pressure on the imprinting surface to at least partially expel the air bubbles in the imprinting concave holes.
在本發明的一實施例中,上述的壓印方法包括以下步驟。提供一第二膠層於晶圓上。壓印模具將第一膠層壓印至第二 膠層。 In an embodiment of the present invention, the above-mentioned imprinting method includes the following steps. Provide a second adhesive layer on the wafer. The imprinting mold prints the first adhesive layer to the second Glue layer.
基於上述,本發明在利用壓印模具對晶圓進行壓印之前,利用供膠裝置提供第一膠層於壓印模具的壓印表面,供膠裝置在其供膠過程中可藉由足夠的供膠壓力使壓印表面上的第一膠層的氣泡排出,然後壓印模具再將其壓印表面上的已排出氣泡的第一膠層壓印至晶圓。據此,以施加預壓而排出氣泡的方式避免膠層於壓印後留有氣泡,從而提升壓印產品的良率。 Based on the above, the present invention uses the glue supply device to provide the first glue layer on the imprinting surface of the imprint mold before using the imprint mold to imprint the wafer, so that the glue supply device can use enough glue during the glue supply process. The pressure of the glue supply causes the bubbles of the first glue layer on the imprinting surface to be discharged, and then the imprinting mold then prints the first glue on the imprinting surface with the discharged bubbles onto the wafer. Accordingly, the pre-pressure is applied to discharge the bubbles to prevent the adhesive layer from leaving bubbles after the embossing, thereby improving the yield of the embossed product.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.
50:第一膠層 50: The first adhesive layer
60:第二膠層 60: second adhesive layer
100:壓印系統 100: Imprinting system
110:壓印模具 110: Imprint mold
110a:壓印表面 110a: Imprinting surface
110b:壓印凹孔 110b: Embossed concave hole
112:上模具 112: Upper mold
114:承載台 114: bearing platform
120:供膠裝置 120: Glue supply device
122:供膠主體 122: Main body for glue
122a:滾輪 122a: scroll wheel
122b:吐膠器 122b: Glue dispenser
122c:膠桶 122c: plastic bucket
122d:膠管 122d: hose
124:出膠部 124: Glue department
124a:出膠表面 124a: Glue surface
126:延伸臂 126: Extension arm
H:出膠孔 H: Glue hole
W:晶圓 W: Wafer
圖1是本發明一實施例的壓印系統的示意圖。 Fig. 1 is a schematic diagram of an imprinting system according to an embodiment of the present invention.
圖2是圖1的供膠裝置的立體圖。 Fig. 2 is a perspective view of the glue supply device of Fig. 1.
圖3繪示圖2的供膠裝置的出膠部移至壓印模具內。 Fig. 3 shows the glue outlet part of the glue supply device of Fig. 2 moved into the imprinting mold.
圖4繪示圖3的出膠部上升並出膠。 FIG. 4 illustrates that the glue outlet part of FIG. 3 rises and glue is discharged.
圖5繪示圖4的出膠部提供膠層至模具的壓印表面的局部放大圖。 FIG. 5 is a partial enlarged view showing the glue layer provided by the glue outlet part of FIG. 4 to the imprinting surface of the mold.
圖6繪示圖4的出膠部移離壓印模具。 Fig. 6 shows the glue ejection part of Fig. 4 moved away from the imprinting mold.
圖1是本發明一實施例的壓印系統的示意圖。圖2是圖1
的供膠裝置的立體圖。圖3繪示圖2的供膠裝置的出膠部移至壓印模具內。請參考圖1至圖3,本實施例的壓印系統100包括一壓印模具110及一供膠裝置120。壓印模具110包括一上模具112及一承載台114,承載台114位於上模具112的下方且適於承載晶圓W。在壓印模具110對晶圓W進行壓印之前,供膠裝置120用以提供膠層至壓印模具110的壓印表面,詳述如下。
Fig. 1 is a schematic diagram of an imprinting system according to an embodiment of the present invention. Figure 2 is Figure 1
A perspective view of the glue supply device. Fig. 3 shows the glue outlet part of the glue supply device of Fig. 2 moved into the imprinting mold. Please refer to FIGS. 1 to 3. The
圖4繪示圖3的出膠部上升並出膠。圖5繪示圖4的出膠部提供膠層至模具的壓印表面的局部放大圖。壓印模具110的上模具112如圖5所示具有一壓印表面110a,壓印表面110a具有複數壓印凹孔110b。為使圖式較為清楚,圖5將壓印凹孔110b繪示為較大,實際上壓印凹孔110b可為奈米級的微結構,本發明不對此加以限制。供膠裝置120如圖2所示包括一供膠主體122及一出膠部124。供膠主體122適於驅動出膠部124如圖3所示移至上模具112與承載台114之間並如圖4所示上升而往上模具112的壓印表面110a(標示於圖5)移動。供膠主體122如圖5所示藉由出膠部124提供一第一膠層50至壓印表面110a,使部分第一膠層50進入至少部分這些壓印凹孔110b。
FIG. 4 illustrates that the glue outlet part of FIG. 3 rises and glue is discharged. FIG. 5 is a partial enlarged view showing the glue layer provided by the glue outlet part of FIG. 4 to the imprinting surface of the mold. The
供膠裝置120在上述供膠過程中可藉由足夠的供膠壓力使壓印表面110a的這些壓印凹孔110b內的第一膠層50的氣泡排出。圖6繪示圖4的出膠部移離壓印模具。在供膠裝置120提供第一膠層50至壓印模具110的壓印表面110a之後,供膠主體122驅動出膠部124移離壓印模具110而成為圖6所示狀態,接著壓
印模具110可將其壓印表面110a上的已排出氣泡的第一膠層50壓印至晶圓W上的第二膠層60。據此,以施加預壓而排出氣泡的方式避免膠層於壓印後留有氣泡,從而提升壓印產品的良率。
The
進一步而言,由於膠層氣泡難以排出的問題大多發生於壓印表面的中央,因此供膠主體122所提供的第一膠層50可集中於壓印表面110a的中央。具體而言,本實施例的出膠部124如圖3至圖5所示具有一出膠表面124a,出膠表面124a的中央具有一出膠孔H。出膠孔H適於藉由供膠主體122(繪適於圖2)的驅動而對位於壓印表面110a(標示於圖5)的中央,使出膠部124透過出膠孔H而在壓印表面110a的中央處提供第一膠層50。在此壓印方式之下,壓印表面110a的周圍區域例如是藉由往周圍擴散的第二膠層60直接進行壓印,而非如中央處般將第一膠層50壓印至第二膠層60。
Furthermore, since the problem that the adhesive layer bubbles are difficult to discharge mostly occurs in the center of the imprinting surface, the first
在本實施例中,出膠部124適於藉由供膠主體122的驅動而如圖5所示與壓印模具110的壓印表面110a具有一適當間距,並提供適當的膠量,以產生足夠的壓力使氣泡排出。所述間距例如是0.1毫米,而所述膠量例如是2毫升,本發明不對此加以限制。
In this embodiment, the
請參考圖2,本實施例的供膠主體122的底部可具有多個滾輪122a,且適於藉由這些滾輪122a而移至壓印模具110(繪示於圖3及圖4)處或移離壓印模具110。此外,供膠裝置120更包括一延伸臂126,延伸臂126從供膠主體122延伸出,出膠部124配置
於延伸臂126的末端,延伸臂126適於伸入壓印模具110內以使出膠部124對位於壓印模具110的壓印表面110a。並且,供膠主體122可藉由伺服馬達或其他適當的驅動裝置來驅動延伸臂126升降於圖3及圖4所示狀態之間。
Please refer to FIG. 2, the bottom of the
進一步而言,供膠主體122在其滾輪122a處可具有煞車裝置,並將其設定為僅在延伸臂126及出膠部124處於圖3所示的較低的位置時才允許滾輪122a作動,以避免延伸臂126及出膠部124處於圖4所示的較高的位置時誤作動而撞擊壓印模具110。此外,本實施例的供膠主體122例如是藉其吐膠器122b的驅動而使膠桶122c內的膠透過膠管122d及延伸臂126而供膠至出膠部124。並且,供膠主體122可設有人機介面供使用者操作,以依需求控制延伸臂126的升降及出膠部124的吐膠量。
Furthermore, the
綜上所述,本發明在利用壓印模具對晶圓進行壓印之前,利用供膠裝置提供第一膠層於壓印模具的壓印表面,供膠裝置在其供膠過程中可藉由足夠的供膠壓力使壓印表面上的第一膠層的氣泡排出,然後壓印模具再將其壓印表面上的已排出氣泡的第一膠層壓印至晶圓。據此,以施加預壓而排出氣泡的方式避免膠層於壓印後留有氣泡,從而提升壓印產品的良率。 In summary, in the present invention, before using the imprinting mold to imprint the wafer, the glue supply device is used to provide the first glue layer on the imprinting surface of the imprinting mold. The glue supply device can use Sufficient glue supply pressure allows the bubbles of the first glue layer on the imprinting surface to be discharged, and then the imprinting mold then prints the first glue on the imprinting surface with the discharged bubbles onto the wafer. Accordingly, the pre-pressure is applied to discharge the bubbles to prevent the adhesive layer from leaving bubbles after the embossing, thereby improving the yield of the embossed product.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.
50‧‧‧第一膠層 50‧‧‧First adhesive layer
110‧‧‧壓印模具 110‧‧‧Imprint mold
112‧‧‧上模具 112‧‧‧Upper mold
114‧‧‧承載台 114‧‧‧Carrier
124‧‧‧出膠部 124‧‧‧Gluing department
124a‧‧‧出膠表面 124a‧‧‧Gluing surface
H‧‧‧出膠孔 H‧‧‧Glue hole
W‧‧‧晶圓 W‧‧‧wafer
Claims (28)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107124438A TWI707766B (en) | 2018-07-16 | 2018-07-16 | Imprinting system, glue supplying device and imprinting method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107124438A TWI707766B (en) | 2018-07-16 | 2018-07-16 | Imprinting system, glue supplying device and imprinting method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202005782A TW202005782A (en) | 2020-02-01 |
TWI707766B true TWI707766B (en) | 2020-10-21 |
Family
ID=70412820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107124438A TWI707766B (en) | 2018-07-16 | 2018-07-16 | Imprinting system, glue supplying device and imprinting method |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI707766B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201036799A (en) * | 2009-04-10 | 2010-10-16 | Hon Hai Prec Ind Co Ltd | Imprint mold |
TW201209883A (en) * | 2010-05-21 | 2012-03-01 | Tokyo Electron Ltd | Imprinting system, imprinting method, and computer storage medium |
TW201532784A (en) * | 2013-11-29 | 2015-09-01 | Ev Group E Thallner Gmbh | Method and device for embossing structures |
TW201820412A (en) * | 2016-11-22 | 2018-06-01 | 日商佳能股份有限公司 | Imprint device, imprint method and article production method |
-
2018
- 2018-07-16 TW TW107124438A patent/TWI707766B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201036799A (en) * | 2009-04-10 | 2010-10-16 | Hon Hai Prec Ind Co Ltd | Imprint mold |
TW201209883A (en) * | 2010-05-21 | 2012-03-01 | Tokyo Electron Ltd | Imprinting system, imprinting method, and computer storage medium |
TW201532784A (en) * | 2013-11-29 | 2015-09-01 | Ev Group E Thallner Gmbh | Method and device for embossing structures |
TW201820412A (en) * | 2016-11-22 | 2018-06-01 | 日商佳能股份有限公司 | Imprint device, imprint method and article production method |
Also Published As
Publication number | Publication date |
---|---|
TW202005782A (en) | 2020-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5411557B2 (en) | Microstructure transfer device | |
CN102200687B (en) | Embosser and the method manufacturing article | |
US9759999B2 (en) | Imprinting apparatus and imprinting method thereof | |
JP2007313439A (en) | Resin coating apparatus and resin coating method | |
CN102371748B (en) | Roll mold, method for fabricating the same and method for fabricating thin film pattern using the same | |
CN107305261A (en) | Imprint apparatus and imprint method | |
WO2014196505A1 (en) | Layered-body production method | |
BR112016010171B1 (en) | Method of manufacturing a continuous press belt | |
TWI707766B (en) | Imprinting system, glue supplying device and imprinting method | |
JP5397054B2 (en) | Nanoimprint method and nanoimprint apparatus | |
JP5644906B2 (en) | Nanoimprint method | |
CN103257524A (en) | Imprint apparatus and imprint method | |
KR101602366B1 (en) | Manufacturing method for transparent electrode film using blading process | |
CN110764363B (en) | Imprinting system, glue supply device and imprinting method | |
TW201738097A (en) | Imprinting apparatus and imprinting method | |
JP2013208868A (en) | Method and device of mold release | |
JP2014069339A (en) | Stamper, stamper production apparatus and production method of the same, and fine structure transfer method | |
JP6277052B2 (en) | Method and apparatus for manufacturing decorative board for gaming machine | |
CN104511994A (en) | Film Thickness Uniformity Control Method for Embossing System | |
CN108957949A (en) | A kind of nano-imprinting method | |
CN102455460A (en) | Light guide plate manufacturing method | |
JP2017144676A (en) | Transfer printing method | |
KR100660779B1 (en) | Device for making etched and unetched regions on substrate | |
KR101584199B1 (en) | Manufacturing method for transparent electrode film using plasma eting | |
CN213861283U (en) | transfer equipment |