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TWI692042B - Semiconductor package structure and manufacturing method thereof - Google Patents

Semiconductor package structure and manufacturing method thereof Download PDF

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Publication number
TWI692042B
TWI692042B TW107143416A TW107143416A TWI692042B TW I692042 B TWI692042 B TW I692042B TW 107143416 A TW107143416 A TW 107143416A TW 107143416 A TW107143416 A TW 107143416A TW I692042 B TWI692042 B TW I692042B
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pin group
chip
adhesive layer
thermosetting adhesive
stage thermosetting
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TW107143416A
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TW202022956A (en
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石智仁
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南茂科技股份有限公司
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Priority to CN201910222534.1A priority patent/CN111276407B/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49517Additional leads
    • H01L23/4952Additional leads the additional leads being a bump or a wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49503Lead-frames or other flat leads characterised by the die pad
    • H01L23/4951Chip-on-leads or leads-on-chip techniques, i.e. inner lead fingers being used as die pad
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49503Lead-frames or other flat leads characterised by the die pad
    • H01L23/49513Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/832Applying energy for connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

A manufacturing method of a semiconductor package structure including the following steps is provided. Providing a lead frame which includes a first lead group and a second lead group. Disposing a carrier at one side of the first lead group, wherein the first lead group comprises a plurality of first leads and the carrier covers a gap between any two adjacent first leads. Forming a two-stage thermosetting adhesive layer at the other side of the first lead group, and the two-stage thermosetting adhesive layer is further filled into the gap between any two adjacent first leads. Adhering a first chip to the two-stage thermosetting adhesive layer, and the first chip and the carrier are located at two opposite sides of the first lead group. Using wire bonding manner to make the first chip be electrically connected to the first lead group and the second lead group. Forming an encapsulant to cover the lead frame, the two-stage thermosetting adhesive layer and the first chip.

Description

半導體封裝結構及其製作方法Semiconductor packaging structure and manufacturing method thereof

本發明是有關於一種封裝結構,且特別是有關於一種半導體封裝結構及其製作方法。The invention relates to a packaging structure, and in particular to a semiconductor packaging structure and a manufacturing method thereof.

導線架常用於半導體封裝,用以承載晶片,並作為晶片電性連接外部裝置的媒介。進一步來說,晶片可由導線架的第一引腳群所承載,並電性連接至第一引腳群與相對於第一引腳群的第二引腳群,惟受限於導線架的尺寸,若將大尺寸晶片設置於導線架的第一引腳群上,則第一引腳群上用以與大尺寸晶片電性連接的部位可能被大尺寸晶片覆蓋,導致大尺寸晶片無法與第一引腳群電性連接。再加上,目前導線架均是採用適當尺寸之膠膜預先黏貼於引腳群上,再使晶片直接貼合於膠膜上,然而,膠膜之成本相當昂貴,因此,如何克服上述大尺寸晶片封裝的技術問題及降低黏晶成本,便成為當前亟待解決的問題之一。Lead frames are often used in semiconductor packages to carry chips and as a medium for the chips to be electrically connected to external devices. Further, the chip can be carried by the first pin group of the lead frame and electrically connected to the first pin group and the second pin group relative to the first pin group, but is limited by the size of the lead frame If the large-size chip is placed on the first pin group of the lead frame, the portion of the first pin group that is electrically connected to the large-size chip may be covered by the large-size chip, resulting in the large-size chip One pin group is electrically connected. In addition, at present, the lead frame is pre-adhered to the pin group with an appropriate size of adhesive film, and then the wafer is directly attached to the adhesive film. However, the cost of the adhesive film is quite expensive, so how to overcome the above large size The technical problems of chip packaging and reducing the cost of die bonding have become one of the problems that need to be solved urgently.

本發明提供一種半導體封裝結構的製作方法,有利於大尺寸晶片封裝。The invention provides a method for manufacturing a semiconductor packaging structure, which is beneficial to large-sized chip packaging.

本發明提供一種半導體封裝結構,有助於簡化黏晶製程、降低生產成本且具有良好的可靠度。The invention provides a semiconductor packaging structure, which helps to simplify the crystal bonding process, reduce the production cost and has good reliability.

本發明的半導體封裝結構的製作方法包括以下步驟。提供導線架,包括第一引腳群與第二引腳群。設置載體於第一引腳群的一側,其中第一引腳群包括多個第一引腳,且載體覆蓋任二相鄰的第一引腳之間的間隙。形成兩階段熱固性膠層於第一引腳群的另一側,兩階段熱固性膠層進一步填入任二相鄰的第一引腳之間的間隙。使第一晶片貼合於兩階段熱固性膠層,且第一晶片與載體分別位於第一引腳群的相對兩側。採用打線接合的方式使第一晶片電性連接第一引腳群與第二引腳群。形成封裝膠體,以包覆導線架、兩階段熱固性膠層及第一晶片。The manufacturing method of the semiconductor package structure of the present invention includes the following steps. A lead frame is provided, including a first pin group and a second pin group. The carrier is disposed on one side of the first pin group, wherein the first pin group includes a plurality of first pins, and the carrier covers a gap between any two adjacent first pins. A two-stage thermosetting adhesive layer is formed on the other side of the first pin group. The two-stage thermosetting adhesive layer further fills the gap between any two adjacent first pins. The first chip is attached to the two-stage thermosetting adhesive layer, and the first chip and the carrier are respectively located on opposite sides of the first pin group. The first chip is electrically connected to the second pin group by wire bonding. An encapsulating gel is formed to cover the lead frame, the two-stage thermosetting adhesive layer and the first chip.

在本發明的一實施例中,上述的半導體封裝結構的製作方法更包括以下步驟。在使第一晶片貼合於兩階段熱固性膠層之後,進行一道烘烤程序,使第一晶片透過兩階段熱固性膠層固定於第一引腳群之後,再移除載體。In an embodiment of the invention, the above-mentioned method for manufacturing a semiconductor package structure further includes the following steps. After attaching the first chip to the two-stage thermosetting adhesive layer, a baking process is performed to fix the first chip to the first pin group through the two-stage thermosetting adhesive layer, and then the carrier is removed.

在本發明的一實施例中,上述的在使第一晶片貼合於兩階段熱固性膠層的過程中,第一晶片的主動表面朝向兩階段熱固性膠層,並使第一晶片的主動表面的至少部分落在第一引腳群與第二引腳群之間。In an embodiment of the invention, in the process of attaching the first wafer to the two-stage thermosetting adhesive layer, the active surface of the first wafer faces the two-stage thermosetting adhesive layer, and the active surface of the first wafer At least partially between the first pin group and the second pin group.

在本發明的一實施例中,上述的形成兩階段熱固性膠層於第一引腳群的方法是採用網版印刷製程。In one embodiment of the present invention, the above-mentioned method of forming the two-stage thermosetting adhesive layer on the first pin group uses a screen printing process.

在本發明的一實施例中,上述的導線架還包括匯流條,位於第一引腳群與第二引腳群之間,在使第一晶片貼合於兩階段熱固性膠層的過程中,第一晶片的端部自第一引腳群朝向第二引腳群延伸並止於匯流條與第二引腳群之間,並採用打線接合的方式使第一晶片電性連接匯流條。In an embodiment of the present invention, the lead frame further includes a bus bar located between the first pin group and the second pin group. During the process of attaching the first chip to the two-stage thermosetting adhesive layer, The end of the first chip extends from the first pin group toward the second pin group and stops between the bus bar and the second pin group, and the first chip is electrically connected to the bus bar by wire bonding.

在本發明的一實施例中,上述的半導體封裝結構的製作方法更包括以下步驟。在使第一晶片貼合於兩階段熱固性膠層之後,使第二晶片貼合於第一晶片,且第一晶片位於兩階段熱固性膠層與第二晶片之間。採用打線接合的方式使第一晶片電性連接第一引腳群、第二晶片電性連接第二引腳群及第一晶片電性連接第二晶片,第一晶片透過第二晶片電性連接第二引腳群。In an embodiment of the invention, the above-mentioned method for manufacturing a semiconductor package structure further includes the following steps. After attaching the first wafer to the two-stage thermosetting adhesive layer, the second wafer is attached to the first wafer, and the first wafer is located between the two-stage thermosetting adhesive layer and the second wafer. The first chip is electrically connected to the first pin group, the second chip is electrically connected to the second pin group and the first chip is electrically connected to the second chip by wire bonding, and the first chip is electrically connected through the second chip The second pin group.

本發明的半導體封裝結構包括導線架、兩階段熱固性膠層、第一晶片以及封裝膠體。導線架包括第一引腳群與第二引腳群,其中第一引腳群包括多個第一引腳。兩階段熱固性膠層設置於第一引腳群的一側,且進一步填充於任二相鄰的第一引腳之間的間隙內。第一晶片貼合於兩階段熱固性膠層,以透過兩階段熱固性膠層連接第一引腳群,且第一晶片電性連接第一引腳群與第二引腳。封裝膠體包覆導線架、兩階段熱固性膠層及第一晶片。The semiconductor packaging structure of the present invention includes a lead frame, a two-stage thermosetting adhesive layer, a first chip, and an encapsulating gel. The lead frame includes a first pin group and a second pin group, where the first pin group includes a plurality of first pins. The two-stage thermosetting adhesive layer is disposed on one side of the first pin group, and is further filled in the gap between any two adjacent first pins. The first chip is attached to the two-stage thermosetting adhesive layer to connect the first pin group through the two-stage thermosetting adhesive layer, and the first chip is electrically connected to the first pin group and the second pin. The packaging gel coats the lead frame, the two-stage thermosetting adhesive layer and the first chip.

在本發明的一實施例中,上述的半導體封裝結構更包括載體,設置於第一引腳群的另一側,且被封裝膠體包覆。第一晶片載體分別位於第一引腳群的相對兩側,其中載體覆蓋任二相鄰的第一引腳之間的間隙,且填充於任二相鄰的第一引腳之間的間隙內的兩階段熱固性膠層接觸載體。In an embodiment of the invention, the above-mentioned semiconductor packaging structure further includes a carrier, which is disposed on the other side of the first pin group and is covered by the packaging gel. The first wafer carriers are respectively located on opposite sides of the first pin group, wherein the carrier covers the gap between any two adjacent first pins and fills the gap between any two adjacent first pins The two-stage thermosetting adhesive layer contacts the carrier.

在本發明的一實施例中,上述的導線架還包括匯流條,位於第一引腳群與第二引腳群之間。第一晶片的端部自第一引腳群朝向第二引腳群延伸並止於匯流條與第二引腳群之間,且第一晶片電性連接匯流條。In an embodiment of the present invention, the lead frame further includes a bus bar, which is located between the first pin group and the second pin group. The end of the first chip extends from the first pin group toward the second pin group and stops between the bus bar and the second pin group, and the first chip is electrically connected to the bus bar.

在本發明的一實施例中,上述的半導體封裝結構更包括第二晶片,貼合於第一晶片,且被封裝膠體包覆。第一晶片位於兩階段熱固性膠層與第二晶片之間,其中第一晶片電性連接第一引腳群,第二晶片電性連接第二引腳群,且第一晶片電性連接第二晶片,以使第一晶片透過第二晶片電性連接第二引腳群。In an embodiment of the present invention, the above-mentioned semiconductor package structure further includes a second chip, is attached to the first chip, and is covered with a packaging gel. The first chip is located between the two-stage thermosetting adhesive layer and the second chip, wherein the first chip is electrically connected to the first pin group, the second chip is electrically connected to the second pin group, and the first chip is electrically connected to the second Chip, so that the first chip is electrically connected to the second pin group through the second chip.

基於上述,第一引腳群具有相對的第一側與第二側,且第一側設有電性接點,透過將晶片設置於第一引腳群的第二側,本發明的半導體封裝結構的製作方法能避免發生內引腳的第一側上的電性接點被晶片覆蓋的情事,故有利於大晶片尺寸封裝。另一方面,晶片透過兩階段熱固性膠層固定於第一引腳群的第二側而不會輕易地自導線架脫落,故本發明的半導體封裝結構具有良好的可靠度。Based on the above, the first pin group has opposite first and second sides, and the first side is provided with electrical contacts. By placing the chip on the second side of the first pin group, the semiconductor package of the present invention The manufacturing method of the structure can avoid the situation that the electrical contact on the first side of the inner pin is covered by the wafer, so it is advantageous for large chip size packaging. On the other hand, the chip is fixed to the second side of the first pin group through a two-stage thermosetting adhesive layer and does not easily fall off from the lead frame, so the semiconductor package structure of the present invention has good reliability.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below in conjunction with the accompanying drawings for detailed description as follows.

圖1A至圖1D是本發明一實施例的半導體封裝結構的製作過程的示意圖。圖2A是對應於圖1A的俯視示意圖。圖2B是圖1B沿剖線I-I的剖面示意圖。圖2C是圖1C沿剖線J-J的剖面示意圖。請參考圖1A與圖2A,在本實施例中,首先,提供導線架110,其中導線架110包括相對的第一引腳群111與第二引腳群112,第一引腳群111是由多根第一引腳111c採適當間距並列而成,且第二引腳群112是由多根第二引腳112c採適當間距並列而成。舉例來說,任二根相鄰的第一引腳111c之間維持間隙111d,而任二根相鄰的第二引腳112c之間的間隙的大小可與間隙111d的大小相同,但本發明不限於此。1A to 1D are schematic diagrams of the manufacturing process of a semiconductor package structure according to an embodiment of the invention. FIG. 2A is a schematic top view corresponding to FIG. 1A. FIG. 2B is a schematic cross-sectional view of FIG. 1B along section line I-I. 2C is a schematic cross-sectional view of FIG. 1C along section line J-J. Please refer to FIGS. 1A and 2A. In this embodiment, first, a lead frame 110 is provided. The lead frame 110 includes a first pin group 111 and a second pin group 112 opposite to each other. The first pin group 111 is formed by A plurality of first pins 111c are formed in parallel at an appropriate pitch, and the second pin group 112 is formed by a plurality of second pins 112c in parallel at an appropriate pitch. For example, the gap 111d is maintained between any two adjacent first pins 111c, and the gap between any two adjacent second pins 112c may have the same size as the gap 111d, but the present invention Not limited to this.

第一引腳群111具有相對的第一側111a與第二側111b,而第二引腳群112具有相對的第一側112a與第二側112b。第一引腳群111的第一側111a與第二引腳群112的第一側112a面向同側,而第一引腳群111的第二側111b與第二引腳群112的第二側112b面向同側。進一步來說,第一引腳群111與第二引腳群112彼此面對的-二端部互為分離而形成通道101,且第一引腳群111的長度大於第二引腳群112的長度。另一方面,導線架110還包括匯流條113,位於第一引腳群111與第二引腳群112之間的通道101內。如圖1A所示,第一引腳群111與匯流條113之間維持間隙,而匯流條113與第二引腳群112之間維持間隙。The first pin group 111 has opposite first sides 111a and second sides 111b, and the second pin group 112 has opposite first sides 112a and second sides 112b. The first side 111a of the first pin group 111 and the first side 112a of the second pin group 112 face the same side, and the second side 111b of the first pin group 111 and the second side of the second pin group 112 112b faces the same side. Further, the first pin group 111 and the second pin group 112 face each other-the two ends are separated from each other to form a channel 101, and the length of the first pin group 111 is greater than that of the second pin group 112 length. On the other hand, the lead frame 110 further includes a bus bar 113 located in the channel 101 between the first pin group 111 and the second pin group 112. As shown in FIG. 1A, a gap is maintained between the first pin group 111 and the bus bar 113, and a gap is maintained between the bus bar 113 and the second pin group 112.

接著,設置載體120於第一引腳群111的第一側111a,其中載體120局部覆蓋於第一引腳群111的第一側111a,且不覆蓋第一引腳群111的第一側111a最接近第二引腳群112的區塊以形成打線區。舉例來說,載體120可為膠帶或隔板與膠帶(或膠體)的組合,用以貼附於第一引腳群111的第一側111a,故載體120不會任意相對於第一引腳群111移動。另一方面,載體120用以覆蓋任二根相鄰的第一引腳111c之間的間隙111d,而每一個間隙111d被載體120覆蓋的程度以及載體120所覆蓋的間隙111d的數量視實際製程需求而定。Next, the carrier 120 is disposed on the first side 111a of the first pin group 111, wherein the carrier 120 partially covers the first side 111a of the first pin group 111 and does not cover the first side 111a of the first pin group 111 The block closest to the second pin group 112 forms a bonding area. For example, the carrier 120 may be a combination of an adhesive tape or a spacer and an adhesive tape (or colloid) to be attached to the first side 111a of the first pin group 111, so the carrier 120 does not arbitrarily relative to the first pin Group 111 moves. On the other hand, the carrier 120 is used to cover the gap 111d between any two adjacent first pins 111c, and the degree to which each gap 111d is covered by the carrier 120 and the number of gaps 111d covered by the carrier 120 depend on the actual process Depends.

請參考圖1B與圖2B,接著,形成兩階段熱固性膠層130於第一引腳群111的第二側111b,其中兩階段熱固性膠層130又稱半硬化階段環氧樹脂(b-stage epoxy resin),且可透過網版印刷製程形成於第一引腳群111的第二側111b。在本實施例中,兩階段熱固性膠層130在第一引腳群111的第二側111b的分布範圍大致上與載體120在第一引腳群111的第一側111a的分布範圍相同或相近,其中兩階段熱固性膠層130進一步填入任二相鄰的第一引腳111c之間的間隙111d,且兩階段熱固性膠層130受載體120的限制而不會隨意地流動。Please refer to FIG. 1B and FIG. 2B, and then, a two-stage thermosetting adhesive layer 130 is formed on the second side 111b of the first pin group 111, wherein the two-stage thermosetting adhesive layer 130 is also called a semi-hardening stage epoxy resin (b-stage epoxy resin), and can be formed on the second side 111b of the first pin group 111 through a screen printing process. In this embodiment, the distribution range of the two-stage thermosetting adhesive layer 130 on the second side 111b of the first pin group 111 is substantially the same as or similar to the distribution range of the carrier 120 on the first side 111a of the first pin group 111 Among them, the two-stage thermosetting adhesive layer 130 is further filled into the gap 111d between any two adjacent first pins 111c, and the two-stage thermosetting adhesive layer 130 is restricted by the carrier 120 and does not flow randomly.

另一方面,填充於任二相鄰的第一引腳111c之間的間隙111d內的兩階段熱固性膠層130接觸載體120,並且接觸載體120暴露於任二相鄰的第一引腳111c之間的間隙111d內的表面,藉由黏附面積的提升,兩階段熱固性膠層130不易自第一引腳群111之間隙脫落,故有助於提高製程良率。在其他實施例中,填充於任二相鄰的第一引腳之間的間隙內的兩階段熱固性膠層可不接觸載體,也就是與載體暴露於任二相鄰的第一引腳之間的間隙內的表面保持距離。On the other hand, the two-stage thermosetting adhesive layer 130 filled in the gap 111d between any two adjacent first pins 111c contacts the carrier 120, and the contact carrier 120 is exposed to any two adjacent first pins 111c The surface within the gap 111d is improved by the adhesion area, and the two-stage thermosetting adhesive layer 130 is not easy to fall off from the gap of the first pin group 111, so it helps to improve the process yield. In other embodiments, the two-stage thermosetting adhesive layer filled in the gap between any two adjacent first pins may not contact the carrier, that is, the carrier is exposed between any two adjacent first pins Keep the distance within the gap.

請參考圖1C與圖2C,接著,使第一晶片140貼合於兩階段熱固性膠層130,且第一晶片140與載體120分別位於第一引腳群111的相對兩側。進一步來說,第一晶片140的主動表面141朝向自第一引腳群111的第二側111b與兩階段熱固性膠層130,並以主動表面141貼附於兩階段熱固性膠層130,後續經由一道烘烤程序使兩階段熱固性膠層130固化,以使第一晶片140透過兩階段熱固性膠層130固定於第一引腳群111的第二側111b。Please refer to FIGS. 1C and 2C. Then, the first chip 140 is bonded to the two-stage thermosetting adhesive layer 130, and the first chip 140 and the carrier 120 are respectively located on opposite sides of the first pin group 111. Further, the active surface 141 of the first chip 140 faces the second side 111b of the first pin group 111 and the two-stage thermosetting adhesive layer 130, and is attached to the two-stage thermosetting adhesive layer 130 with the active surface 141, and then passes through A baking process cures the two-stage thermosetting adhesive layer 130, so that the first chip 140 is fixed to the second side 111b of the first pin group 111 through the two-stage thermosetting adhesive layer 130.

另一方面,第一晶片140的主動表面141具有區段141a,其中區段141a未與兩階段熱固性膠層130相接觸,且落在第一引腳群111與第二引腳群112之間(即落在通道101內)。進一步而言,第一晶片140的主動表面141設有銲墊,且位在區段141a內。如圖1C所示,第一晶片140中對應於區段141a的端部142自第一引腳群111朝向第二引腳群112延伸並止於匯流條113與第二引腳群112之間(即朝向第二引腳群112延伸並止於通道101內),且主動表面141上的銲墊例如是落在匯流條113與第二引腳群112之間。On the other hand, the active surface 141 of the first wafer 140 has a section 141a, wherein the section 141a is not in contact with the two-stage thermosetting adhesive layer 130 and falls between the first pin group 111 and the second pin group 112 (I.e. falls within the channel 101). Further, the active surface 141 of the first wafer 140 is provided with bonding pads and is located in the section 141a. As shown in FIG. 1C, the end 142 of the first wafer 140 corresponding to the section 141 a extends from the first pin group 111 toward the second pin group 112 and stops between the bus bar 113 and the second pin group 112 (That is, it extends toward the second pin group 112 and stops in the channel 101), and the bonding pad on the active surface 141 falls between the bus bar 113 and the second pin group 112, for example.

請參考圖1C,接著,採用打線接合的方式使第一晶片140電性連接第一引腳群111與第二引腳群112。舉例來說,導線150自主動表面141上的銲墊穿過匯流條113與第二引腳群112之間的間隙,並跨越匯流條113朝向第一引腳群111的第一側111a延伸,以電性接合於第一引腳群111上的打線區。導線151自主動表面141上的銲墊穿過匯流條113與第二引腳群112之間的間隙,並朝向匯流條113延伸,以電性接合於匯流條113上。導線151在匯流條113上的電性接合點與導線150在第一引腳群111上的電性接合點面向同側。另一方面,導線152自主動表面141上的銲墊穿過匯流條113與第二引腳群112之間的間隙,並朝向第二引腳群112的第一側112a延伸,以電性接合第二引腳群112上的打線區。特別說明的是,上述導線的穿引方式可視實際製程需求而調整。Please refer to FIG. 1C. Next, the first chip 140 is electrically connected to the first pin group 111 and the second pin group 112 by wire bonding. For example, the wire 150 passes through the gap between the bus bar 113 and the second pin group 112 from the bonding pad on the active surface 141, and extends across the bus bar 113 toward the first side 111a of the first pin group 111, The wire bonding area on the first pin group 111 is electrically connected. The wire 151 passes through the gap between the bus bar 113 and the second pin group 112 from the bonding pad on the active surface 141 and extends toward the bus bar 113 to be electrically connected to the bus bar 113. The electrical junction of the wire 151 on the bus bar 113 and the electrical junction of the wire 150 on the first pin group 111 face the same side. On the other hand, the wire 152 passes through the gap between the bus bar 113 and the second pin group 112 from the bonding pad on the active surface 141 and extends toward the first side 112a of the second pin group 112 for electrical bonding The bonding area on the second pin group 112. In particular, the above-mentioned lead-through method can be adjusted according to actual process requirements.

請參考圖1D,最後,形成封裝膠體160,以包覆導線架110、載體120、兩階段熱固性膠層130、第一晶片140以及導線150~152。至此,本實施例的半導體封裝結構100的製作大致完成,且經上述製作流程所得的半導體封裝結構100具有良好的可靠度。Please refer to FIG. 1D. Finally, an encapsulant 160 is formed to cover the lead frame 110, the carrier 120, the two-stage thermosetting adhesive layer 130, the first chip 140, and the wires 150-152. So far, the fabrication of the semiconductor package structure 100 of this embodiment is substantially completed, and the semiconductor package structure 100 obtained through the above-mentioned fabrication process has good reliability.

圖3是本發明另一實施例的半導體封裝結構的示意圖。請參考圖3,本實施例的半導體封裝結構100A與上述實施例的半導體封裝結構100略有不同,進一步而言,本實施例的半導體封裝結構100A更包括固定於第一晶片140的背表面143的第二晶片170,且第二晶片170被封裝膠體160包覆。3 is a schematic diagram of a semiconductor package structure according to another embodiment of the invention. Referring to FIG. 3, the semiconductor package structure 100A of this embodiment is slightly different from the semiconductor package structure 100 of the above embodiment. Further, the semiconductor package structure 100A of this embodiment further includes a back surface 143 fixed to the first chip 140 The second wafer 170, and the second wafer 170 is covered by the encapsulant 160.

就本實施例的半導體封裝結構100A的製程而言,在使第一晶片140貼合於兩階段熱固性膠層130之後,使第二晶片170以主動表面171貼合於第一晶片140的背表面143,且第一晶片140位於兩階段熱固性膠層130與第二晶片170之間。進一步來說,第二晶片170的主動表面171具有區段171a,其中區段171a未與第一晶片140的背表面143相貼合,且延伸超出第一晶片140的端部142。並且,主動表面171的區段171a落在匯流條113與第二引腳群112之間。In terms of the manufacturing process of the semiconductor package structure 100A of this embodiment, after the first wafer 140 is bonded to the two-stage thermosetting adhesive layer 130, the second wafer 170 is bonded to the back surface of the first wafer 140 with the active surface 171 143, and the first wafer 140 is located between the two-stage thermosetting adhesive layer 130 and the second wafer 170. Further, the active surface 171 of the second wafer 170 has a section 171 a, wherein the section 171 a does not fit the back surface 143 of the first wafer 140 and extends beyond the end 142 of the first wafer 140. Also, the section 171 a of the active surface 171 falls between the bus bar 113 and the second pin group 112.

另一方面,第一晶片140未直接電性連接第二引腳群112,而是透過第二晶片170間接電性連接第二引腳群112。並且,第二晶片170透過第一晶片140間接電性連接匯流條113與第一引腳群111。舉例來說,第二晶片170的主動表面171設有銲墊,且位在區段171a內。如圖3所示,導線153自第二晶片170的主動表面171上的銲墊朝向延伸第一晶片140的主動表面141延伸,以電性接合於主動表面141上的銲墊。導線154自第二晶片170的主動表面171上的銲墊穿過匯流條113與第二引腳群112之間的間隙,並朝向第二引腳群112的第一側112a延伸,以電性接合第二引腳群112上的打線區。特別說明的是,上述導線的穿引方式可視實際製程需求而調整。On the other hand, the first chip 140 is not directly electrically connected to the second pin group 112, but is indirectly electrically connected to the second pin group 112 through the second chip 170. In addition, the second chip 170 indirectly and electrically connects the bus bar 113 and the first pin group 111 through the first chip 140. For example, the active surface 171 of the second wafer 170 is provided with bonding pads and is located in the section 171a. As shown in FIG. 3, the wire 153 extends from the pad on the active surface 171 of the second wafer 170 toward the active surface 141 extending the first wafer 140, and is electrically connected to the pad on the active surface 141. The wire 154 passes through the gap between the bus bar 113 and the second pin group 112 from the bonding pad on the active surface 171 of the second chip 170, and extends toward the first side 112a of the second pin group 112 to electrically The bonding area on the second pin group 112 is engaged. In particular, the above-mentioned lead-through method can be adjusted according to actual process requirements.

圖4是本發明又一實施例的半導體封裝結構的示意圖。請參考圖4,本實施例的半導體封裝結構100B與上述實施例的半導體封裝結構100略有不同,進一步而言,本實施例的半導體封裝結構100B未設有載體120(見圖1D)。4 is a schematic diagram of a semiconductor package structure according to yet another embodiment of the present invention. Referring to FIG. 4, the semiconductor package structure 100B of this embodiment is slightly different from the semiconductor package structure 100 of the above embodiment. Further, the semiconductor package structure 100B of this embodiment is not provided with a carrier 120 (see FIG. 1D ).

就本實施例的半導體封裝結構100B的製程而言,載體120(見圖1D)在封裝膠體160形成前被移除。更進一步而言,在經由一道烘烤程序使兩階段熱固性膠層130固化,以使第一晶片140透過兩階段熱固性膠層130固定於第一引腳群111的第二側111b之後,載體120(見圖1D)即被移除。In terms of the manufacturing process of the semiconductor package structure 100B of this embodiment, the carrier 120 (see FIG. 1D) is removed before the encapsulant 160 is formed. Furthermore, after curing the two-stage thermosetting adhesive layer 130 through a baking process, so that the first chip 140 is fixed to the second side 111b of the first pin group 111 through the two-stage thermosetting adhesive layer 130, the carrier 120 (See Figure 1D) is removed.

圖5是本發明再一實施例的半導體封裝結構的示意圖。請參考圖5,本實施例的半導體封裝結構100C與上述實施例的半導體封裝結構100A略有不同,進一步而言,本實施例的半導體封裝結構100C未設有載體120(見圖3)。5 is a schematic diagram of a semiconductor package structure according to yet another embodiment of the present invention. Referring to FIG. 5, the semiconductor package structure 100C of this embodiment is slightly different from the semiconductor package structure 100A of the above embodiment. Further, the semiconductor package structure 100C of this embodiment is not provided with a carrier 120 (see FIG. 3 ).

就本實施例的半導體封裝結構100C的製程而言,載體120(見圖3)在封裝膠體160形成前被移除。更進一步而言,在經由一道烘烤程序使兩階段熱固性膠層130固化,以使第一晶片140透過兩階段熱固性膠層130固定於第一引腳群111的第二側111b之後,載體120(見圖3)即被移除。In terms of the manufacturing process of the semiconductor packaging structure 100C of this embodiment, the carrier 120 (see FIG. 3) is removed before the encapsulant 160 is formed. Furthermore, after curing the two-stage thermosetting adhesive layer 130 through a baking process, so that the first chip 140 is fixed to the second side 111b of the first pin group 111 through the two-stage thermosetting adhesive layer 130, the carrier 120 (See Figure 3) is removed.

綜上所述,第一引腳群有相對的第一側與第二側,且第一側設有打線區,透過將晶片設置於第一引腳群的第二側,本發明的半導體封裝結構的製作方法能避免發生第一引腳群的第一側上的打線區被晶片覆蓋的情事,故有利於大晶片尺寸封裝。在形成兩階段熱固性膠層於第一引腳群的第二側時,第一引腳群的第一側設有載體,藉以防止兩階段熱固性膠層隨意地流動或自第一引腳群脫落,故有助於提高製程良率。另一方面,晶片透過兩階段熱固性膠層固定於第一引腳群的第二側而不會輕易地自導線架脫落,故本發明的半導體封裝結構具有良好的可靠度。In summary, the first pin group has opposite first and second sides, and the first side is provided with a bonding area. By placing the chip on the second side of the first pin group, the semiconductor package of the present invention The manufacturing method of the structure can avoid the situation that the wire bonding area on the first side of the first pin group is covered by the wafer, so it is beneficial to the packaging of a large chip size. When forming the two-stage thermosetting adhesive layer on the second side of the first pin group, the first side of the first pin group is provided with a carrier to prevent the two-stage thermosetting adhesive layer from flowing randomly or falling off from the first pin group , So it helps to improve the yield of the process. On the other hand, the chip is fixed to the second side of the first pin group through a two-stage thermosetting adhesive layer and does not easily fall off from the lead frame, so the semiconductor package structure of the present invention has good reliability.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

100、100A~100C:半導體封裝結構100, 100A~100C: semiconductor packaging structure

101:通道101: channel

110:導線架110: lead frame

111:第一引腳群111: first pin group

111a、112a:第一側111a, 112a: first side

111b、112b:第二側111b, 112b: second side

111c:第一引腳111c: the first pin

111d:間隙111d: clearance

112:第二引腳群112: second pin group

112c:第二引腳112c: second pin

113:匯流條113: bus bar

120:載體120: carrier

130:兩階段熱固性膠層130: Two-stage thermosetting adhesive layer

140:第一晶片140: the first chip

141、171:主動表面141, 171: Active surface

141a、171a:區段141a, 171a: section

142:端部142: end

143:背表面143: back surface

150~154:導線150~154: wire

160:封裝膠體160: encapsulating colloid

170:第二晶片170: second chip

圖1A至圖1D是本發明一實施例的半導體封裝結構的製作過程的示意圖。 圖2A是對應於圖1A的俯視示意圖。 圖2B是圖1B沿剖線I-I的剖面示意圖。 圖2C是圖1C沿剖線J-J的剖面示意圖。 圖3是本發明另一實施例的半導體封裝結構的示意圖。 圖4是本發明又一實施例的半導體封裝結構的示意圖。 圖5是本發明再一實施例的半導體封裝結構的示意圖。1A to 1D are schematic diagrams of the manufacturing process of a semiconductor package structure according to an embodiment of the invention. FIG. 2A is a schematic top view corresponding to FIG. 1A. FIG. 2B is a schematic cross-sectional view of FIG. 1B along section line I-I. 2C is a schematic cross-sectional view of FIG. 1C along section line J-J. 3 is a schematic diagram of a semiconductor package structure according to another embodiment of the invention. 4 is a schematic diagram of a semiconductor package structure according to yet another embodiment of the present invention. 5 is a schematic diagram of a semiconductor package structure according to yet another embodiment of the present invention.

100:半導體封裝結構 100: Semiconductor packaging structure

101:通道 101: channel

110:導線架 110: lead frame

111:第一引腳群 111: first pin group

111a、112a:第一側 111a, 112a: first side

111b、112b:第二側 111b, 112b: second side

112:第二引腳群 112: second pin group

113:匯流條 113: bus bar

120:載體 120: carrier

130:兩階段熱固性膠層 130: Two-stage thermosetting adhesive layer

140:第一晶片 140: the first chip

141:主動表面 141: Active surface

141a:區段 141a: Section

142:端部 142: end

150~152:導線 150~152: wire

160:封裝膠體 160: encapsulating colloid

Claims (8)

一種半導體封裝結構的製作方法,包括:提供導線架,包括第一引腳群與第二引腳群;設置載體於所述第一引腳群的一側,其中所述第一引腳群包括多個第一引腳,且所述載體覆蓋所述多個第一引腳中任二相鄰者之間的間隙;形成兩階段熱固性膠層於所述第一引腳群的另一側,所述兩階段熱固性膠層進一步填入所述多個第一引腳中任二相鄰者之間的間隙;使第一晶片貼合於所述兩階段熱固性膠層,且所述第一晶片與所述載體分別位於所述第一引腳群的相對兩側;採用打線接合的方式使所述第一晶片電性連接所述第一引腳群與所述第二引腳群;以及形成封裝膠體,以包覆所述導線架、所述兩階段熱固性膠層及所述第一晶片,其中所述導線架還包括匯流條,位於所述第一引腳群與所述第二引腳群之間,在使所述第一晶片貼合於所述兩階段熱固性膠層的過程中,所述第一晶片的端部自所述第一引腳群朝向所述第二引腳群延伸並止於所述匯流條與所述第二引腳群之間,並採用打線接合的方式使所述第一晶片電性連接所述匯流條。 A method for manufacturing a semiconductor packaging structure includes: providing a lead frame including a first pin group and a second pin group; setting a carrier on one side of the first pin group, wherein the first pin group includes A plurality of first pins, and the carrier covers a gap between any two adjacent ones of the plurality of first pins; forming a two-stage thermosetting adhesive layer on the other side of the first pin group, The two-stage thermosetting adhesive layer is further filled into the gap between any two adjacent ones of the plurality of first pins; the first chip is attached to the two-stage thermosetting adhesive layer, and the first chip And the carrier are located on opposite sides of the first pin group; wire bonding is used to electrically connect the first chip to the first pin group and the second pin group; and forming Encapsulating colloid to cover the lead frame, the two-stage thermosetting adhesive layer and the first chip, wherein the lead frame further includes a bus bar located between the first pin group and the second pin Between the groups, in the process of attaching the first wafer to the two-stage thermosetting adhesive layer, the end of the first wafer extends from the first pin group toward the second pin group It also stops between the bus bar and the second pin group, and the first chip is electrically connected to the bus bar by wire bonding. 如申請專利範圍第1項所述的半導體封裝結構的製作方法,更包括: 在使所述第一晶片貼合於所述兩階段熱固性膠層之後,進行一道烘烤程序,使所述第一晶片透過所述兩階段熱固性膠層固定於所述第一引腳群之後,再移除所述載體。 The manufacturing method of the semiconductor package structure as described in item 1 of the patent application scope further includes: After attaching the first chip to the two-stage thermosetting adhesive layer, a baking process is performed to fix the first chip to the first pin group through the two-stage thermosetting adhesive layer, Then remove the carrier. 如申請專利範圍第2項所述的半導體封裝結構的製作方法,其中在使所述第一晶片貼合於所述兩階段熱固性膠層的過程中,所述第一晶片的主動表面朝向所述兩階段熱固性膠層,並使所述第一晶片的主動表面的至少部分落在所述第一引腳群與所述第二引腳群之間。 The method for manufacturing a semiconductor package structure as described in item 2 of the patent application range, wherein in the process of attaching the first wafer to the two-stage thermosetting adhesive layer, the active surface of the first wafer faces the The two-stage thermosetting adhesive layer makes at least part of the active surface of the first wafer fall between the first pin group and the second pin group. 如申請專利範圍第1項所述的半導體封裝結構的製作方法,其中形成所述兩階段熱固性膠層於所述第一引腳群的方法是採用網版印刷製程。 The method for manufacturing a semiconductor package structure as described in item 1 of the patent application scope, wherein the method of forming the two-stage thermosetting adhesive layer on the first pin group is by a screen printing process. 如申請專利範圍第1項所述的半導體封裝結構的製作方法,更包括:在使所述第一晶片貼合於所述兩階段熱固性膠層之後,使第二晶片貼合於所述第一晶片,且所述第一晶片位於所述兩階段熱固性膠層與所述第二晶片之間;以及採用打線接合的方式使所述第一晶片電性連接第一引腳群、所述第二晶片電性連接第二引腳群及所述第一晶片電性連接所述第二晶片,所述第一晶片透過所述第二晶片電性連接所述第二引腳群。 The method for manufacturing a semiconductor package structure as described in item 1 of the patent application scope further includes: after bonding the first wafer to the two-stage thermosetting adhesive layer, bonding the second wafer to the first A wafer, and the first wafer is located between the two-stage thermosetting adhesive layer and the second wafer; and the first wafer is electrically connected to the first pin group and the second by wire bonding The chip is electrically connected to the second pin group and the first chip is electrically connected to the second chip, and the first chip is electrically connected to the second pin group through the second chip. 一種半導體封裝結構,包括:導線架,包括第一引腳群與第二引腳群,其中所述第一引腳 群包括多個第一引腳;兩階段熱固性膠層,設置於所述第一引腳群的一側,且進一步填充於所述多個第一引腳中任二相鄰者之間的間隙內;第一晶片,貼合於所述兩階段熱固性膠層,以透過所述兩階段熱固性膠層連接所述第一引腳群,且所述第一晶片電性連接所述第一引腳群與所述第二引腳;以及封裝膠體,包覆所述導線架、所述兩階段熱固性膠層及所述第一晶片,其中所述導線架還包括匯流條,位於所述第一引腳群與所述第二引腳群之間,所述第一晶片的端部自所述第一引腳群朝向所述第二引腳群延伸並止於所述匯流條與所述第二引腳群之間,且所述第一晶片電性連接所述匯流條。 A semiconductor packaging structure includes: a lead frame, including a first pin group and a second pin group, wherein the first pin The group includes a plurality of first pins; a two-stage thermosetting adhesive layer is provided on one side of the first pin group and further fills the gap between any two adjacent ones of the plurality of first pins Inside; the first chip is attached to the two-stage thermosetting adhesive layer to connect the first pin group through the two-stage thermosetting adhesive layer, and the first chip is electrically connected to the first pin Group and the second pin; and an encapsulating colloid covering the lead frame, the two-stage thermosetting adhesive layer and the first chip, wherein the lead frame further includes a bus bar, which is located at the first lead Between the foot group and the second pin group, the end of the first chip extends from the first pin group toward the second pin group and stops at the bus bar and the second Between the pin groups, and the first chip is electrically connected to the bus bar. 如申請專利範圍第6項所述的半導體封裝結構,更包括:載體,設置於所述第一引腳群的另一側,且被所述封裝膠體包覆,所述第一晶片與所述載體分別位於所述第一引腳群的相對兩側,其中所述載體覆蓋所述多個第一引腳中任二相鄰者之間的間隙,且填充於所述多個第一引腳中任二相鄰者之間的間隙內的所述兩階段熱固性膠層接觸所述載體。 The semiconductor packaging structure as described in item 6 of the patent application scope further includes: a carrier, which is disposed on the other side of the first pin group and is covered by the packaging colloid, the first chip and the Carriers are respectively located on opposite sides of the first pin group, wherein the carrier covers the gap between any two adjacent ones of the plurality of first pins and is filled in the plurality of first pins The two-stage thermosetting adhesive layer in the gap between any two neighbors contacts the carrier. 如申請專利範圍第6項所述的半導體封裝結構,更包括:第二晶片,貼合於所述第一晶片,且被所述封裝膠體包覆,所述第一晶片位於所述兩階段熱固性膠層與所述第二晶片之間, 其中所述第一晶片電性連接所述第一引腳群,所述第二晶片電性連接所述第二引腳群,且所述第一晶片電性連接所述第二晶片,以使所述第一晶片透過所述第二晶片電性連接所述第二引腳群。 The semiconductor packaging structure as described in item 6 of the patent application scope further includes: a second chip attached to the first chip and covered by the packaging gel, the first chip is located in the two-stage thermosetting Between the glue layer and the second wafer, Wherein the first chip is electrically connected to the first pin group, the second chip is electrically connected to the second pin group, and the first chip is electrically connected to the second chip, so that The first chip is electrically connected to the second pin group through the second chip.
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