TWI688633B - Work fixing sheet having resin layer - Google Patents
Work fixing sheet having resin layer Download PDFInfo
- Publication number
- TWI688633B TWI688633B TW104130756A TW104130756A TWI688633B TW I688633 B TWI688633 B TW I688633B TW 104130756 A TW104130756 A TW 104130756A TW 104130756 A TW104130756 A TW 104130756A TW I688633 B TWI688633 B TW I688633B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin layer
- meth
- curable resin
- acrylate
- mass
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本發明係關於一種於基材膜上具備黏著劑層並於前述黏著劑層上具備硬化性樹脂層而成之具有樹脂層的工件固定片。 The present invention relates to a work fixing sheet having a resin layer formed by providing an adhesive layer on a base film and a curable resin layer on the adhesive layer.
本申請案係基於2014年9月22日在日本申請之日本專利特願2014-192505號主張優先權,且將其內容引用於本文。 This application claims priority based on Japanese Patent Application No. 2014-192505 filed in Japan on September 22, 2014, and the contents thereof are incorporated herein.
於基材膜上具備黏著劑層並於前述黏著劑層上具備硬化性樹脂層而成之具有樹脂層的工件固定片,係適用於例如將半導體晶圓切割並經過拾取半導體晶片之步驟,將所拾取之半導體晶片接著於基板、引線框架或其他半導體晶片等之黏晶(die bonding)為止的步驟中。例如,於半導體裝置之製造時,前述具有樹脂層的工件固定片之硬化性樹脂層係發揮晶粒接著用接著膜之功能,在將前述具有樹脂層的工件固定片利用前述硬化性樹脂貼附於半導體晶圓之狀態進行切割時,具有樹脂層的工件固定片係使用作為切晶黏晶片。 A workpiece fixing sheet with a resin layer, which is provided with an adhesive layer on the base film and a hardening resin layer on the adhesive layer, is suitable for, for example, cutting a semiconductor wafer and going through the steps of picking up the semiconductor wafer. The picked semiconductor wafer is then subjected to the step of die bonding of the substrate, lead frame, or other semiconductor wafer. For example, in the manufacture of a semiconductor device, the curable resin layer of the workpiece fixing sheet with a resin layer functions as a bonding film for die bonding, and the workpiece fixing sheet with a resin layer is attached with the curable resin When dicing in the state of a semiconductor wafer, the workpiece fixing sheet having a resin layer is used as a die-bonding wafer.
另外,具有樹脂層的工件固定片除前述用途以外,亦可兼用作例如半導體晶圓或半導體晶片(倒裝晶片)之保護膜與切晶片、或兼用作將倒裝晶片接著於晶片搭載部時之接著膜與背面研磨片。 In addition to the aforementioned application, the workpiece fixing sheet having a resin layer can also be used as, for example, a protective film and a diced wafer of a semiconductor wafer or a semiconductor wafer (flip chip), or when a flip chip is attached to a wafer mounting portion Then the film and back grinding sheet.
於任一用途中,具有樹脂層的工件固定片均為利用硬化性樹脂層貼附於半導體晶片之狀態,進一步將黏著劑層與基材膜一起自硬化性樹脂層剝離。此時係預先視需要於黏著劑層進行聚合反應,藉此使黏著劑層之黏著性下降。 In any application, the workpiece fixing sheet having a resin layer is attached to a semiconductor wafer with a curable resin layer, and the adhesive layer and the base film are further peeled off from the curable resin layer. At this time, if necessary, a polymerization reaction is performed on the adhesive layer in advance, thereby reducing the adhesiveness of the adhesive layer.
另一方面,具有樹脂層的工件固定片之硬化性樹脂層藉由含有填充材料而提高強度。對此,有填充材料難以均勻地分散於硬化性樹脂層之情況。又,有填充材料自使含有填充材料之硬化性樹脂層硬化後的硬化膜脫落的可能性。因此,期望一種具備實質不含有填充材料之硬化性樹脂層之具有樹脂層的工件固定片。另外,已知有不同於具有樹脂層的工件固定片,係不經由硬化性樹脂層而將黏著劑層直接貼附於半導體晶圓之黏著片。作為此種黏著片,例如揭示有具備使用基底聚合物之黏著劑層者,前述基底聚合物具有源自具有碳數10~17之烷基之甲基丙烯酸酯單體與除此以外之特定之2種單體的結構單元(參照專利文獻1)。 On the other hand, the curable resin layer of the work fixing sheet having a resin layer contains fillers to increase the strength. In this regard, the filler may be difficult to uniformly disperse in the curable resin layer. In addition, there is a possibility that the filler may come off the cured film after curing the curable resin layer containing the filler. Therefore, a workpiece fixing sheet having a resin layer having a curable resin layer that does not substantially contain a filler material is desired. In addition, there is known an adhesive sheet that directly adheres an adhesive layer to a semiconductor wafer without passing through a curable resin layer and a work fixing sheet having a resin layer. As such an adhesive sheet, for example, there is disclosed an adhesive layer using a base polymer having a methacrylate monomer derived from an alkyl group having 10 to 17 carbon atoms and other specific Structural units of two kinds of monomers (refer to Patent Document 1).
[專利文獻1]日本專利特開2012-136678號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2012-136678
但,專利文獻1中係未記載或暗示關於在黏著片之黏著劑層上設置硬化性樹脂層及硬化性樹脂層之構成成分。又,於使用具備實質不含有填充材料之硬化性樹脂層之具有樹脂層的工件固定片時,通常有如下問題點:不施加較大外力而可容易地拾取半導體晶片之所謂易拾取性會下降。 However, Patent Document 1 does not describe or suggest the constituents of providing a curable resin layer and a curable resin layer on the adhesive layer of the adhesive sheet. In addition, when a workpiece fixing sheet having a resin layer having a hardenable resin layer that does not substantially contain a filler material is used, there is usually a problem that the so-called easy pick-up property that can easily pick up a semiconductor wafer without applying a large external force is reduced .
本發明係鑒於前述情況而完成,課題在於提供一種具有樹脂層的工件固定片,係於基材膜上具備黏著劑層,並於前述黏著劑層上具備實質不含有填充材料之硬化性樹脂層而成,且具有對半導體晶片之易拾取性。 The present invention has been completed in view of the foregoing circumstances, and the object is to provide a workpiece fixing sheet having a resin layer provided with an adhesive layer on a base film and a curable resin layer containing substantially no filler material on the adhesive layer It is easy to pick up the semiconductor wafer.
為了解決前述課題,本發明提供一種具有樹脂層的工件固定片,係於基材膜上具備黏著劑層並於前述黏著劑層上具備硬化性樹脂層而成,前述黏著劑層含有包含烷基碳數為10~18之(甲基)丙烯酸烷酯之單體聚合而成的(甲基)丙烯酸烷酯聚合物,前述硬化性樹脂層含有聚合物成分(a)及硬化性成分(b),且前述硬化性樹脂層之前述 聚合物成分(a)及硬化性成分(b)之總含量相對於前述硬化性樹脂層之總量為95質量%以上。 In order to solve the aforementioned problems, the present invention provides a work fixing sheet having a resin layer, which is formed by providing an adhesive layer on a base film and a curable resin layer on the adhesive layer, the adhesive layer containing an alkyl group An alkyl (meth)acrylate polymer obtained by polymerizing monomers of alkyl (meth)acrylate having a carbon number of 10 to 18, and the curable resin layer contains a polymer component (a) and a curable component (b) , And the foregoing of the curable resin layer The total content of the polymer component (a) and the curable component (b) is 95% by mass or more relative to the total amount of the curable resin layer.
本發明之具有樹脂層的工件固定片較佳為,前述硬化性樹脂層含有丙烯酸系樹脂作為前述聚合物成分(a),且前述丙烯酸系樹脂之含量相對於前述硬化性樹脂層之固體成分之總量為50質量%以上。 In the work fixing sheet having a resin layer of the present invention, it is preferable that the curable resin layer contains an acrylic resin as the polymer component (a), and the content of the acrylic resin relative to the solid content of the curable resin layer The total amount is more than 50% by mass.
本發明之具有樹脂層的工件固定片較佳為,前述硬化性樹脂層之前述硬化性成分(b)之含量相對於前述聚合物成分(a)之含量100質量分為1質量分~100質量分。 In the work fixing sheet having a resin layer of the present invention, it is preferable that the content of the curable component (b) of the curable resin layer is 100 parts by mass to 1 part by mass to 100 parts by mass with respect to the content of the polymer component (a) Minute.
根據本發明而提供如下之具有樹脂層的工件固定片:於基材膜上具備黏著劑層,並於前述黏著劑層上具備實質不含有填充材料之硬化性樹脂層,即完全不含有填充材料或以可忽視使用填充劑所產生效果之程度含有填充材料的硬化性樹脂層而成,且具有對半導體晶片之易拾取性。 According to the present invention, there is provided a workpiece fixing sheet having a resin layer provided with an adhesive layer on a base film and a curable resin layer containing substantially no filler material on the adhesive layer, that is, containing no filler material at all Or it may be made of a curable resin layer containing a filler to such an extent that the effect produced by using the filler can be ignored, and has easy pick-up of the semiconductor wafer.
1‧‧‧工件固定片 1‧‧‧Workpiece fixing piece
10‧‧‧具有樹脂層的工件固定片 10‧‧‧Work piece with resin layer
11‧‧‧基材膜 11‧‧‧ Base film
11a‧‧‧基材膜之表面 11a‧‧‧Surface of substrate film
12‧‧‧黏著劑層 12‧‧‧Adhesive layer
12a‧‧‧黏著劑層之表面 12a‧‧‧Surface of adhesive layer
13‧‧‧硬化性樹脂層 13‧‧‧curable resin layer
13a‧‧‧硬化性樹脂層之表面 13a‧‧‧The surface of the hardening resin layer
14‧‧‧剝離膜 14‧‧‧ peeling film
圖1係示意性表示本發明之具有樹脂層的工件固定片之剖面圖。 FIG. 1 is a cross-sectional view schematically showing a work fixing sheet having a resin layer of the present invention.
本發明之具有樹脂層的工件固定片係於基材膜上具備 黏著劑層並於前述黏著劑層上具備硬化性樹脂層而成,前述黏著劑層含有包含烷基碳數為10~18之(甲基)丙烯酸烷酯之單體聚合而成的(甲基)丙烯酸烷酯聚合物,前述硬化性樹脂層含有聚合物成分(a)及硬化性成分(b),且前述硬化性樹脂層之前述聚合物成分(a)及硬化性成分(b)之總含量相對於前述硬化性樹脂層之總量為95質量%以上。 The workpiece fixing sheet having a resin layer of the present invention is provided on a base film The adhesive layer is formed by having a hardening resin layer on the adhesive layer. The adhesive layer contains a (meth)acrylic acid monomer containing alkyl (meth)acrylate having an alkyl carbon number of 10 to 18. ) An alkyl acrylate polymer, the curable resin layer containing the polymer component (a) and the curable component (b), and the total of the polymer component (a) and the curable component (b) of the curable resin layer The content is 95% by mass or more with respect to the total amount of the curable resin layer.
本說明書中,將基材膜及黏著劑層之積層結構稱為工件固定片。 In this specification, the laminated structure of the base film and the adhesive layer is referred to as a workpiece fixing sheet.
本說明書中,所謂「聚合」包括單一種單體(monomer)(亦稱為單體)之均聚、及複數種單體之共聚之兩者。因此,本說明書中,所謂「聚合物」包括單一種單體均聚而成之均聚物、及複數種單體共聚而成之共聚物之兩者。 In this specification, "polymerization" includes both homopolymerization of a single monomer (also called monomer) and copolymerization of plural monomers. Therefore, in this specification, the "polymer" includes both a homopolymer homopolymerized by a single monomer and a copolymer copolymerized by a plurality of monomers.
前述具有樹脂層的工件固定片適用於例如將半導體晶圓切割,經過拾取半導體晶片之步驟,將所拾取之半導體晶片接著於基板、引線框架、或其他半導體晶片等之黏晶為止的步驟中。此時,前述硬化性樹脂層(樹脂層)發揮晶粒接著用接著膜之功能,在將前述具有樹脂層的工件固定片利用前述硬化性樹脂層貼附於半導體晶圓之狀態進行切割時,將前述具有樹脂層的工件固定片使用作為切晶黏晶片。 The aforementioned workpiece fixing sheet having a resin layer is suitable for, for example, cutting a semiconductor wafer, passing through a step of picking up a semiconductor wafer, and then bonding the picked up semiconductor wafer to a substrate, a lead frame, or other semiconductor wafers, etc. At this time, the curable resin layer (resin layer) functions as a bonding film for bonding crystal grains, and when the workpiece fixing sheet having the resin layer is diced with the curable resin layer attached to a semiconductor wafer, The aforementioned work fixing sheet having a resin layer is used as a die-bonding wafer.
前述具有樹脂層的工件固定片具有即便以較小外力亦 可容易地拾取工件(半導體晶片)之充分易拾取性。因此,可抑制拾取厚度較薄之半導體晶片時之破裂等破損。於黏著劑層含有可進行聚合反應之化合物時,藉由該聚合反應後之黏著劑層之黏著性下降,而會進一步提高此種易拾取性。 The aforementioned workpiece fixing piece having a resin layer has a low external force It is easy to pick up the workpiece (semiconductor wafer) with sufficient ease of picking up. Therefore, it is possible to suppress breakage and the like when picking up a thin semiconductor wafer. When the adhesive layer contains a compound capable of undergoing a polymerization reaction, the adhesiveness of the adhesive layer after the polymerization reaction decreases, which further improves such easy pick-up.
具有樹脂層的工件固定片通常於硬化性樹脂層實質不含有填充材料時,前述易拾取性會下降。對此,本發明之具有樹脂層的工件固定片藉由使黏著劑層含有包含烷基碳數為10~18之(甲基)丙烯酸烷酯之單體聚合而成的(甲基)丙烯酸烷酯聚合物,而即便硬化性樹脂層實質不含有填充材料,亦具有良好之易拾取性。若用於黏著劑層之(甲基)丙烯酸烷酯之烷基碳數為9以下,則於硬化性樹脂層實質不含有填充材料時,具有樹脂層的工件固定片不具有半導體晶片之易拾取性。另一方面,用於黏著劑層之(甲基)丙烯酸烷酯之烷基碳數為19以上者係因溶解性低等而難以處理。 In a work fixing sheet having a resin layer, when the curable resin layer does not substantially contain a filler, the aforementioned easy pick-up property will be reduced. In this regard, the workpiece fixing sheet having a resin layer of the present invention is obtained by polymerizing a monomer containing an alkyl (meth)acrylate having an alkyl carbon number of 10 to 18 by an adhesive layer containing an alkyl (meth)acrylate The ester polymer, even if the curable resin layer does not substantially contain a filler, also has good easy pick-up. If the alkyl carbon number of the alkyl (meth)acrylate used in the adhesive layer is 9 or less, when the curable resin layer does not substantially contain a filler, the workpiece fixing sheet with the resin layer does not have easy pick-up of the semiconductor wafer Sex. On the other hand, alkyl (meth)acrylate used in the adhesive layer having an alkyl carbon number of 19 or more is difficult to handle due to its low solubility.
通常,於使用在基材膜上具備黏著劑層而成之工件固定片並直接在該黏著劑層上固定半導體晶片時,係在切割後將半導體晶片自黏著劑層剝離(拾取)。於黏著劑層含有藉由能量線之照射會聚合之成分時,可於對黏著劑層照射能量線,使黏著劑層之黏著性下降之後進行拾取。 Generally, when a workpiece fixing sheet provided with an adhesive layer on a base film is used and a semiconductor wafer is directly fixed on the adhesive layer, the semiconductor wafer is peeled (picked up) from the adhesive layer after dicing. When the adhesive layer contains a component that is polymerized by irradiation with energy rays, the adhesive layer can be irradiated with energy rays to reduce the adhesiveness of the adhesive layer and then be picked up.
另一方面,於使用具有樹脂層的工件固定片,在該硬化性樹脂層上固定半導體晶片時,在切割後將半導體晶片 保持與硬化性樹脂層一體化之狀態自黏著劑層剝離,或視情況在照射能量線之後自黏著劑層剝離(拾取)。 On the other hand, when a work fixing sheet having a resin layer is used and a semiconductor wafer is fixed on the curable resin layer, the semiconductor wafer is cut after dicing Peel off from the adhesive layer while remaining integrated with the curable resin layer, or peel (pick up) from the adhesive layer after irradiation with energy rays as appropriate.
又,通常,相較於不具備硬化性樹脂層之工件固定片,具有樹脂層的工件固定片進行前述剝離較不容易,有剝離性(易拾取性)較差之傾向。 In addition, in general, the work fixing sheet having a resin layer is less likely to be peeled off than the work fixing sheet having no curable resin layer, and tends to be inferior in peelability (easy pickup property).
對此,本發明之具有樹脂層的工件固定片藉由採用前述構成,而剝離性(易拾取性)優異。 In contrast, the work fixing sheet having a resin layer of the present invention is excellent in peelability (easy pick-up) by adopting the aforementioned configuration.
另外,本發明之具有樹脂層的工件固定片亦適用作保護倒裝晶片背面之保護膜形成用片。此時,硬化性樹脂層(樹脂層)發揮倒裝晶片之保護膜形成用膜之功能,在將具有樹脂層的工件固定片利用硬化性樹脂層貼附於半導體晶圓之狀態進行切割時,係兼用作半導體晶圓或半導體晶片(倒裝晶片)之保護片與切晶片。 In addition, the workpiece fixing sheet having a resin layer of the present invention is also suitable as a sheet for forming a protective film for protecting the back surface of a flip chip. At this time, the curable resin layer (resin layer) functions as a film for forming a protective film of a flip chip, and when the work fixing sheet having a resin layer is diced with the curable resin layer attached to a semiconductor wafer, It is also used as a protective wafer and diced wafer of semiconductor wafers or semiconductor chips (flip chip).
又,本發明之具有樹脂層的工件固定片亦可用於如下情形:將硬化性樹脂層貼附於倒裝晶片用半導體晶圓之電極形成面,且對半導體晶圓中與電極形成面為相反側之面進行研削之後,在電極形成面保留硬化性樹脂層而剝離工件固定片。此時,硬化性樹脂層(樹脂層)在此之後發揮將倒裝晶片接著於晶片搭載部時之接著膜之功能,而具有樹脂層的工件固定片係兼用作接著膜與背面研磨片。 In addition, the workpiece fixing sheet having a resin layer of the present invention can also be used in a case where the curable resin layer is attached to the electrode forming surface of a semiconductor wafer for flip-chip wafer, and is opposite to the electrode forming surface in the semiconductor wafer After grinding the side surface, the hardening resin layer remains on the electrode forming surface and the work fixing sheet is peeled off. In this case, the curable resin layer (resin layer) thereafter functions as an adhesive film when adhering the flip chip to the wafer mounting portion, and the work fixing sheet having the resin layer serves as both the adhesive film and the back polishing sheet.
圖1係示意性表示本發明之具有樹脂層的工件固定片 之剖面圖。 FIG. 1 schematically shows a workpiece fixing sheet having a resin layer of the present invention Of the cross-sectional view.
圖1所示之具有樹脂層的工件固定片10係於基材膜11上具備黏著劑層12並於黏著劑層12上具備硬化性樹脂層13而成,構成為於工件固定片1之黏著劑層12上具備硬化性樹脂層13。又,具有樹脂層的工件固定片10進一步於硬化性樹脂層13上具備剝離膜14。
The
工件固定片10中,黏著劑層12積層於基材膜11之表面11a上,硬化性樹脂層13積層於黏著劑層12之表面12a之一部分。又,於黏著劑層12之表面12a中未積層有硬化性樹脂層13之露出面、及硬化性樹脂層13之表面13a(上表面及側面)上積層有剝離膜14。
In the
但,本發明之具有樹脂層的工件固定片並不限定於圖1所示者。 However, the work fixing sheet having a resin layer of the present invention is not limited to those shown in FIG. 1.
基材膜之材質較佳為各種樹脂,具體而言可例示:聚乙烯(低密度聚乙烯(Low-Density Polyethylene,LDPE)、直鏈低密度聚乙烯(Linear Low-Density Polyethylene,LLDPE)、高密度聚乙烯(High-Density Polyethylene,HDPE)等)、聚丙烯、聚丁烯、聚丁二烯、聚甲基戊烯、聚氯乙烯、氯乙烯聚合物、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚胺基甲酸酯、聚丙烯酸胺基甲酸酯、聚醯亞胺、乙烯/乙酸乙烯酯聚合物、離子聚合物樹脂、乙烯/(甲基)丙烯酸聚合物、乙烯/(甲基)丙烯酸酯聚合物、 聚苯乙烯、聚碳酸酯、氟樹脂、該等之任一樹脂之氫化物、改質物、交聯物或聚合物等。 The material of the substrate film is preferably various resins, and specific examples include polyethylene (Low-Density Polyethylene (LDPE), linear low-density polyethylene (LLDPE), high-density High-density polyethylene (HDPE), etc.), polypropylene, polybutene, polybutadiene, polymethylpentene, polyvinyl chloride, vinyl chloride polymer, polyethylene terephthalate, Polybutylene terephthalate, polyurethane, polyacrylate urethane, polyimide, ethylene/vinyl acetate polymer, ionic polymer resin, ethylene/(meth)acrylic acid polymerization , Ethylene/(meth)acrylate polymer, Polystyrene, polycarbonate, fluororesin, hydride, modified, cross-linked or polymer of any of these resins.
再者,本說明書中,所謂「(甲基)丙烯酸」為包括「丙烯酸」及「甲基丙烯酸」兩者之概念。 In addition, in this specification, the term "(meth)acrylic acid" includes both "acrylic acid" and "methacrylic acid".
基材膜可由1層(單層)形成,亦可包含2層以上之複數層,於包含複數層時,各層之材質可全部相同,亦可全部不同,亦可僅一部分相同。 The base film may be formed by one layer (single layer), or may include more than two plural layers. When plural layers are included, the materials of each layer may be all the same, all may be different, or only a part may be the same.
基材膜之厚度可根據目的而適當選擇,較佳為50μm~300μm,更佳為60μm~100μm。 The thickness of the base film can be appropriately selected according to the purpose, preferably 50 μm to 300 μm, more preferably 60 μm to 100 μm.
前述「基材膜之厚度」係於任意之5處利用接觸式厚度計測定出厚度並以平均表示之值。 The aforementioned "thickness of the base film" is a value measured at an arbitrary 5 places using a contact thickness gauge and expressed as an average.
基材膜亦可對表面實施利用噴砂處理、溶劑處理等之凹凸化處理、或電暈放電處理、電子束照射處理、電漿處理、臭氧/紫外線照射處理、火焰處理、鉻酸處理、熱風處理等氧化處理等,以使其與設於其上之黏著劑層之接著性提高。又,基材膜亦可為表面經實施底塗處理者。 The base film can also be surface roughened by sandblasting, solvent treatment, corona discharge treatment, electron beam irradiation treatment, plasma treatment, ozone/ultraviolet irradiation treatment, flame treatment, chromic acid treatment, hot air treatment Waiting for oxidation treatment, etc., to improve the adhesion with the adhesive layer provided on it. In addition, the base film may be one whose surface is subjected to primer coating treatment.
該等中,就抑制因切割時刀片之摩擦而發生基材膜之斷片而言,基材膜尤佳為表面經電子束照射處理者。 Among these, in terms of suppressing the breakage of the base film due to the friction of the blade during cutting, the base film is particularly preferably a surface treated with electron beam irradiation.
前述黏著劑層含有前述(甲基)丙烯酸烷酯聚合物。 The adhesive layer contains the alkyl (meth)acrylate polymer.
黏著劑層可使用含有前述(甲基)丙烯酸烷酯聚合物等目標成分之黏著劑組成物而形成。又,黏著劑組成物中之非揮發性成分彼此之含量比率於黏著劑層中亦成為相同比率。 The adhesive layer can be formed using an adhesive composition containing the above-mentioned target component such as alkyl (meth)acrylate polymer. In addition, the content ratio of the non-volatile components in the adhesive composition also becomes the same ratio in the adhesive layer.
黏著劑層之厚度可根據目的而適當選擇,較佳為1μm~100μm,更佳為1μm~60μm,尤佳為1μm~30μm。 The thickness of the adhesive layer can be appropriately selected according to the purpose, preferably 1 μm to 100 μm, more preferably 1 μm to 60 μm, and particularly preferably 1 μm to 30 μm.
前述「黏著劑層之厚度」係於任意之5處利用接觸式厚度計測定出厚度並以平均表示之值。再者,當難以直接對黏著劑層應用接觸式厚度計時,亦可藉由如下方式算出:於重疊有基材膜、後述剝離材等其他膜之狀態下與前述同樣地測定整體厚度,取與所重疊之其他膜之厚度(利用與前述同樣之方法測定出)之差量。 The aforementioned "thickness of the adhesive layer" is a value measured at an arbitrary 5 places using a contact thickness meter and expressed as an average. In addition, when it is difficult to directly apply contact thickness timing to the adhesive layer, it can also be calculated by measuring the overall thickness in the same manner as described above with other films such as a base material film, a peeling material described later, and the The difference in the thickness of the superimposed other films (measured by the same method as described above).
前述(甲基)丙烯酸烷酯聚合物係包含構成烷酯之烷基碳數為10~18之(甲基)丙烯酸烷酯的單體聚合而成。再者,本說明書中,於無特別說明之情況,僅記載為「(甲基)丙烯酸烷酯」係指前述「烷基碳數為10~18之(甲基)丙烯酸烷酯」。 The aforementioned alkyl (meth)acrylate polymer is formed by polymerizing a monomer comprising an alkyl (meth)acrylate having 10 to 18 alkyl carbon atoms constituting the alkyl ester. In addition, in this specification, unless otherwise specified, only "alkyl (meth)acrylate" means the said "alkyl (meth)acrylate with an alkyl carbon number of 10-18).
前述(甲基)丙烯酸烷酯之碳數為10~18之烷基可為直鏈狀、支鏈狀及環狀之任一種,於環狀時,可為單環狀及多環狀之任一種,但較佳為直鏈狀或支鏈狀。 The alkyl group having a carbon number of 10 to 18 may be linear, branched, or cyclic. When cyclic, it may be monocyclic or polycyclic. One kind, but preferably linear or branched.
烷基碳數為10~18之(甲基)丙烯酸烷酯之較佳者可例示:(甲基)丙烯酸癸酯、(甲基)丙烯酸十一烷酯、(甲基)丙烯酸十二烷酯((甲基)丙烯酸月桂酯)、(甲基)丙烯酸十三烷酯、(甲基)丙烯酸十四烷酯((甲基)丙烯酸肉豆蔻酯)、(甲基)丙烯酸十五烷酯、(甲基)丙烯酸十六烷酯((甲基)丙烯酸棕櫚酯)、(甲基)丙烯酸十七烷酯、(甲基)丙烯酸十八烷酯((甲基)丙烯酸硬脂酯)、(甲基)丙烯酸異十八烷酯((甲基)丙烯酸異硬脂酯)等烷基為鏈狀之(甲基)丙烯酸烷酯;(甲基)丙烯酸異莰酯、及(甲基)丙烯酸二環戊酯等(甲基)丙烯酸環烷酯等。又,作為烷基碳數為10~18之(甲基)丙烯酸烷酯,前述中就獲得對工件之易拾取性提高之效果而言,尤佳為(甲基)丙烯酸十二烷酯((甲基)丙烯酸月桂酯)、或(甲基)丙烯酸異十八烷酯((甲基)丙烯酸異硬脂酯)。 Preferred examples of alkyl (meth)acrylates having an alkyl carbon number of 10 to 18 are: decyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate (Lauryl (meth)acrylate), tridecyl (meth)acrylate, myristyl (meth)acrylate (myristyl (meth)acrylate), pentadecyl (meth)acrylate, Cetyl (meth)acrylate (palmityl (meth)acrylate), heptadecyl (meth)acrylate, octadecyl (meth)acrylate (stearyl (meth)acrylate), ( Isooctadecyl methacrylate (isostearyl (meth) acrylate) and other alkyl groups are chain alkyl (meth) acrylates; isomethan (meth) acrylate, and (meth) acrylic acid Cycloalkyl (meth)acrylates such as dicyclopentyl ester. In addition, as the alkyl (meth)acrylate having an alkyl carbon number of 10 to 18, in terms of the effect of improving the ease of picking up the workpiece, the dodecyl (meth)acrylate (( (Lauryl meth)acrylate, or isooctadecyl (meth)acrylate (isostearyl (meth)acrylate).
前述(甲基)丙烯酸烷酯聚合物亦可使用藉由能量線之照射會聚合之能量線聚合性者,作為此種聚合物中之較佳者,可例示具有羥基且進一步經由胺基甲酸酯鍵而於側鏈具有聚合性基者。此種(甲基)丙烯酸烷酯聚合物,係例如藉由其所具有之羥基與後述異氰酸酯系交聯劑中之異氰酸酯基反應而交聯。又,相較於例如另外使用低分子量之能量線聚合性化合物並藉由能量線之照射而進行聚合反應之情況,此種丙烯酸酯聚合物藉由在側鏈具有聚合性基 而使聚合反應後之黏著劑層之黏著性下降,藉此提高自被黏著體之剝離性,並獲得對工件之易拾取性提高之效果。又,由於無須另外使用低分子量之能量線聚合性化合物,故如後述般在黏著劑層上形成硬化性樹脂層時,可抑制此種低分子量之能量線聚合性化合物自黏著劑層向硬化性樹脂層移行,而抑制硬化性樹脂層之特性變化。 The aforementioned alkyl (meth)acrylate polymer may also be one that is polymerizable by energy rays polymerized by irradiation of energy rays, and as a preferred one of such polymers, it may be exemplified by having a hydroxyl group and further passing through amino acid The ester bond has a polymerizable group in the side chain. Such an alkyl (meth)acrylate polymer is crosslinked by, for example, reacting a hydroxyl group possessed with an isocyanate group in an isocyanate-based crosslinking agent described later. Moreover, compared with, for example, a case where a low molecular weight energy ray polymerizable compound is additionally used and the polymerization reaction is performed by irradiation of the energy ray, this acrylate polymer has a polymerizable group in the side chain The adhesiveness of the adhesive layer after the polymerization reaction is reduced, thereby improving the peelability from the adherend and obtaining the effect of improving the ease of picking up the workpiece. In addition, since it is not necessary to separately use a low molecular weight energy ray polymerizable compound, when a curable resin layer is formed on the adhesive layer as described later, such a low molecular weight energy ray polymerizable compound can be suppressed from the adhesive layer to the curability The resin layer migrates to suppress the characteristic change of the curable resin layer.
前述較佳之(甲基)丙烯酸烷酯聚合物通常藉由如下方式獲得:使用調配前述(甲基)丙烯酸烷酯及含羥基之單體而成之組成物,使其聚合而獲得聚合物,使該聚合物所具有之羥基與具有異氰酸酯基及聚合性基之化合物之異氰酸酯基反應。在此,為了使羥基與異氰酸酯基反應(形成胺基甲酸酯鍵),必須進一步使用有機錫化合物等觸媒。該觸媒於反應結束後仍然殘留於反應系統中,但難以自所獲得之(甲基)丙烯酸烷酯聚合物完全去除,或者即便可去除亦要追加去除步驟,因此操作變得繁雜且生產性亦會下降。因此,通常採用在反應結束後不自反應系統去除觸媒之方法,因此所獲得之(甲基)丙烯酸烷酯聚合物中殘存有觸媒。 The above-mentioned preferred alkyl (meth)acrylate polymer is usually obtained by polymerizing the composition obtained by blending the foregoing alkyl (meth)acrylate and hydroxyl group-containing monomer to obtain a polymer, The hydroxyl group of the polymer reacts with the isocyanate group of the compound having the isocyanate group and the polymerizable group. Here, in order to react the hydroxyl group with the isocyanate group (form a urethane bond), a catalyst such as an organotin compound must be further used. The catalyst remains in the reaction system after the reaction is completed, but it is difficult to completely remove the alkyl (meth)acrylate polymer obtained, or even if it can be removed, a removal step is added, so the operation becomes complicated and productive Will also decline. Therefore, a method in which the catalyst is not removed from the reaction system after the completion of the reaction is generally adopted, and therefore the catalyst remains in the obtained (meth)acrylic acid alkyl polymer.
(甲基)丙烯酸烷酯聚合物中殘存之前述觸媒,係於保存使用此種聚合物之前述黏著劑組成物時會進行非目標之交聯反應。又,當相對於(甲基)丙烯酸烷酯聚合物中之羥基1莫耳,前述異氰酸酯系交聯劑中之異氰酸酯基之 莫耳數較大時,該傾向特別強。 The aforementioned catalyst remaining in the alkyl (meth)acrylate polymer undergoes an unintended cross-linking reaction when the aforementioned adhesive composition using such a polymer is stored. In addition, when the mole of hydroxyl group in the alkyl (meth)acrylate polymer is 1 mole, the isocyanate group in the isocyanate-based crosslinking agent has This tendency is particularly strong when the Mohr number is large.
對此,本發明中,即便於前述異氰酸酯基之莫耳數較大時,亦藉由使用後述反應延遲劑,而抑制如上所述非目標之交聯反應進行。又,就該抑制效果更高而言,前述(甲基)丙烯酸烷酯聚合物之前述觸媒之殘存量(含量)較佳為2質量%以下,更佳為1質量%以下,又更佳為0.5質量%以下。 In contrast, in the present invention, even when the mole number of the aforementioned isocyanate group is large, by using a reaction retarder described later, the progress of the above-mentioned non-target crosslinking reaction is suppressed. In addition, in terms of higher suppression effect, the residual amount (content) of the catalyst of the alkyl (meth)acrylate polymer is preferably 2% by mass or less, more preferably 1% by mass or less, and still more preferably 0.5 mass% or less.
作為前述(甲基)丙烯酸烷酯聚合物中之更佳之聚合物,可例示以前述(甲基)丙烯酸烷酯及含羥基之(甲基)丙烯酸酯作為必需單體,並使該等單體之共聚物與具有異氰酸酯基及聚合性基之化合物反應的反應物,前述反應物係前述共聚物所具有之羥基與前述具有異氰酸酯基及聚合性基之化合物之異氰酸酯基化合而成。 As a more preferable polymer among the aforementioned (meth)acrylic acid ester polymers, the aforementioned (meth)acrylic acid alkyl esters and hydroxyl-containing (meth)acrylates as essential monomers can be exemplified The copolymer reacts with a compound having an isocyanate group and a polymerizable group. The reactant is formed by combining a hydroxyl group of the copolymer with an isocyanate group of the compound having an isocyanate group and a polymerizable group.
作為前述含羥基之(甲基)丙烯酸酯,可例示(甲基)丙烯酸羥基甲酯、(甲基)丙烯酸2-羥基乙酯、及(甲基)丙烯酸2-羥基丙酯等。 Examples of the hydroxyl-containing (meth)acrylates include hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, and 2-hydroxypropyl (meth)acrylate.
作為前述具有異氰酸酯基及聚合性基之化合物,可例示異氰酸2-甲基丙烯醯氧基乙酯等含異氰酸酯基之(甲基)丙烯酸烷酯等。 Examples of the compound having an isocyanate group and a polymerizable group include isocyanate group-containing alkyl (meth)acrylates such as 2-methacryloxyethyl isocyanate.
前述較佳之(甲基)丙烯酸烷酯聚合物可為除前述必 需單體及化合物以外進一步使任意化合物反應而成者,亦可為使作為前述任意化合物之單體聚合而成者。 The aforementioned preferred alkyl (meth)acrylate polymer may be It is necessary to react any compound other than the monomer and the compound, or it may be a polymer obtained by polymerizing the monomer as the aforementioned arbitrary compound.
作為前述任意單體,可例示不相當於前述(甲基)丙烯酸烷酯之不含羥基之(甲基)丙烯酸酯、(甲基)丙烯酸、伊康酸、及非(甲基)丙烯酸系單體等。 As any of the aforementioned monomers, there may be exemplified non-hydroxyl-containing (meth)acrylates, (meth)acrylic acid, itaconic acid, and non-(meth)acrylic monomers that do not correspond to the aforementioned alkyl (meth)acrylate Body etc.
作為前述不含羥基之(甲基)丙烯酸酯,可例示:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯等構成烷酯之烷基為直鏈狀或支鏈狀且碳數為1~9之(甲基)丙烯酸烷酯;(甲基)丙烯酸苄酯等(甲基)丙烯酸芳烷酯;(甲基)丙烯酸二環戊烯酯等(甲基)丙烯酸環烯酯;(甲基)丙烯酸二環戊烯基氧基乙酯等(甲基)丙烯酸環烯基氧基烷酯;醯亞胺(甲基)丙烯酸酯;(甲基)丙烯酸縮水甘油酯等含縮水甘油基之(甲基)丙烯酸酯等。 Examples of the aforementioned (meth)acrylates that do not contain hydroxyl groups include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, and (meth) Group) amyl acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, 2-ethylhexyl (meth)acrylate Ester, n-nonyl (meth)acrylate, isononyl (meth)acrylate, etc. The alkyl group constituting the alkyl ester is linear or branched and the carbon number is 1-9 alkyl alkyl (meth)acrylate; (Meth)acrylic acid aryl alkyl esters such as benzyl (meth)acrylate; (meth)acrylic acid cycloalkenyl esters such as (meth)acrylic acid dicyclopentenyl ester; (meth)acrylic acid dicyclopentenyloxyethyl (Meth)acrylic acid cycloalkenyloxyalkyl ester; amide imine (meth)acrylate; glycidyl (meth)acrylate and other glycidyl group-containing (meth)acrylate and the like.
作為前述非(甲基)丙烯酸系單體,可例示:乙酸乙烯酯、丙烯腈、苯乙烯、及N-羥甲基丙烯醯胺等。 Examples of the non-(meth)acrylic monomers include vinyl acetate, acrylonitrile, styrene, and N-methylolacrylamide.
前述(甲基)丙烯酸烷酯、含羥基之(甲基)丙烯酸酯、具有異氰酸酯基及聚合性基之化合物、以及前述任意 化合物等用於前述(甲基)丙烯酸烷酯聚合物之調製的成分(前述聚合物之構成成分)均可僅為1種,亦可為2種以上。 The aforementioned alkyl (meth)acrylate, hydroxyl-containing (meth)acrylate, compounds having isocyanate groups and polymerizable groups, and any of the foregoing The components used for the preparation of the aforementioned alkyl (meth)acrylate polymer (components of the aforementioned polymer) such as compounds may be only one kind, or may be two or more kinds.
前述(甲基)丙烯酸烷酯聚合物(並不限定於如上所述之具有羥基且進一步經由胺基甲酸酯鍵而於側鏈具有聚合性基的較佳形態之(甲基)丙烯酸烷酯聚合物)中,相對於用於聚合之所有單體之質量合計,前述烷基碳數為10~18之(甲基)丙烯酸烷酯之比率較佳為60質量%以上,更佳為70質量%以上,尤佳為75質量%以上。再者,前述(甲基)丙烯酸烷酯聚合物中的烷基碳數為10~18之(甲基)丙烯酸烷酯之比率相對於用於聚合之所有單體之質量合計為100質量%以下。 The aforementioned alkyl (meth)acrylate polymer (not limited to the above-mentioned alkyl methacrylate having a hydroxyl group and a preferred form having a polymerizable group in the side chain via an urethane bond Polymer), the ratio of the alkyl (meth)acrylate having an alkyl carbon number of 10 to 18 relative to the total mass of all monomers used for polymerization is preferably 60% by mass or more, more preferably 70% by mass More than 75%, particularly preferably more than 75% by mass In addition, the ratio of the alkyl (meth)acrylate having an alkyl carbon number of 10 to 18 in the alkyl (meth)acrylate polymer relative to the total mass of all monomers used for polymerization is 100% by mass or less .
黏著劑層所含有之前述(甲基)丙烯酸烷酯聚合物可僅為1種,亦可為2種以上。 The aforementioned alkyl (meth)acrylate polymer contained in the adhesive layer may be only one kind or two or more kinds.
又,作為包含烷基碳數為10~18之(甲基)丙烯酸烷酯之單體中其他含有之單體並無特別限定,例如可例示不相當於前述(甲基)丙烯酸烷酯之含羥基之(甲基)丙烯酸酯、不含羥基之(甲基)丙烯酸酯、(甲基)丙烯酸、伊康酸、及非(甲基)丙烯酸系單體等,含羥基之(甲基)丙烯酸酯、不含羥基之(甲基)丙烯酸酯及非(甲基)丙烯酸系單體之具體例與前述相同。 In addition, there are no particular limitations on other monomers contained in the monomers containing alkyl (meth)acrylates having an alkyl group of 10 to 18 carbon atoms. For example, the monomers not equivalent to the aforementioned alkyl (meth)acrylates can be exemplified. Hydroxyl (meth)acrylate, non-hydroxyl (meth)acrylate, (meth)acrylic acid, itaconic acid, non-(meth)acrylic monomers, etc., hydroxyl-containing (meth)acrylic acid Specific examples of esters, (meth)acrylates that do not contain hydroxyl groups, and non-(meth)acrylic monomers are the same as described above.
黏著劑層中,前述(甲基)丙烯酸烷酯聚合物之含量較佳為75質量%以上,更佳為80質量%以上。又,為了形成此種黏著劑層,前述黏著劑組成物之前述(甲基)丙烯酸烷酯聚合物之含量相對於黏著劑組成物中溶劑以外之所有成分之總量,較佳為75質量%以上,更佳為80質量%以上。又,前述黏著劑組成物之(甲基)丙烯酸烷酯聚合物之含量可為100質量%。 In the adhesive layer, the content of the alkyl (meth)acrylate polymer is preferably 75% by mass or more, and more preferably 80% by mass or more. In order to form such an adhesive layer, the content of the alkyl (meth)acrylate polymer in the adhesive composition is preferably 75% by mass relative to the total amount of all components except the solvent in the adhesive composition. Above, more preferably 80% by mass or more. Moreover, the content of the alkyl (meth)acrylate polymer of the adhesive composition may be 100% by mass.
作為前述黏著劑組成物之較佳者,可例示除前述(甲基)丙烯酸烷酯聚合物以外進一步含有異氰酸酯系交聯劑及反應延遲劑者。此種黏著劑組成物於其保存中可抑制非目標之交聯反應進行,因此保存中之黏度等特性之變化得以抑制,而保存性高。 As a preferable one of the above-mentioned adhesive composition, there can be exemplified those which further contain an isocyanate-based crosslinking agent and a reaction retardant in addition to the above-mentioned alkyl (meth)acrylate polymer. This kind of adhesive composition can prevent the non-target cross-linking reaction from progressing during storage, so that changes in characteristics such as viscosity during storage can be suppressed, and the storage property is high.
前述異氰酸酯系交聯劑只要為具有異氰酸酯基(-N=C=O)之交聯劑則並無特別限定,較佳者可例示:2,4-甲苯二異氰酸酯;2,6-甲苯二異氰酸酯;1,3-二甲苯二異氰酸酯;1,4-二甲苯二異氰酸酯;二苯甲烷-4,4'-二異氰酸酯;二苯甲烷-2,4'-二異氰酸酯;3-甲基二苯甲烷二異氰酸酯;六亞甲基二異氰酸酯;異佛爾酮二異氰酸酯;二環己基甲烷-4,4'-二異氰酸酯;二環己基甲烷-2,4'-二異氰酸酯;於三羥甲基丙烷等多元醇之全部羥基或一部分羥基 加成甲苯二異氰酸酯及六亞甲基二異氰酸酯之任一者或兩者而成的化合物;離胺酸二異氰酸酯等。 The isocyanate-based cross-linking agent is not particularly limited as long as it has an isocyanate group (-N=C=O), and preferred examples include: 2,4-toluene diisocyanate; 2,6-toluene diisocyanate ; 1,3-xylene diisocyanate; 1,4-xylene diisocyanate; diphenylmethane-4,4'-diisocyanate; diphenylmethane-2,4'-diisocyanate; 3-methyldiphenylmethane Diisocyanate; hexamethylene diisocyanate; isophorone diisocyanate; dicyclohexylmethane-4,4'-diisocyanate; dicyclohexylmethane-2,4'-diisocyanate; trimethylolpropane, etc. All or part of the hydroxyl groups of the polyol Addition of either or both of toluene diisocyanate and hexamethylene diisocyanate; amine acid diisocyanate, etc.
前述黏著劑組成物所含有之異氰酸酯系交聯劑可僅為1種,亦可為2種以上。 The isocyanate-based crosslinking agent contained in the aforementioned adhesive composition may be only one kind, or two or more kinds.
前述黏著劑組成物中之異氰酸酯系交聯劑所具有之異氰酸酯基之莫耳數,較佳為相對於前述黏著劑組成物中之前述(甲基)丙烯酸烷酯聚合物所具有之羥基之莫耳數為0.2倍以上。藉由如此構成,黏著劑層於藉由UV(ultraviolet,紫外線)照射等之硬化後,對工件(硬化性樹脂層等)之黏著性變小,藉此使工件固定片之易拾取性提高。 The number of moles of isocyanate groups possessed by the isocyanate-based crosslinking agent in the adhesive composition is preferably relative to the number of hydroxyl groups possessed by the alkyl (meth)acrylate polymer in the adhesive composition Ear count is more than 0.2 times. With such a configuration, after the adhesive layer is hardened by UV (ultraviolet, ultraviolet) irradiation or the like, the adhesion to the workpiece (curable resin layer, etc.) becomes smaller, thereby improving the ease of picking-up of the workpiece fixing sheet.
另一方面,本發明中,前述黏著劑組成物中之異氰酸酯系交聯劑所具有之異氰酸酯基之莫耳數,較佳為相對於前述黏著劑組成物中之前述(甲基)丙烯酸烷酯聚合物所具有之羥基之莫耳數為3倍以下。藉由如此構成,抑制異氰酸酯系交聯劑彼此產生副產物之效果變得更高。 On the other hand, in the present invention, the number of moles of isocyanate groups in the isocyanate-based crosslinking agent in the adhesive composition is preferably relative to the alkyl (meth)acrylate in the adhesive composition The number of moles of hydroxyl groups possessed by the polymer is 3 times or less. With such a configuration, the effect of suppressing the generation of by-products between the isocyanate-based crosslinking agents becomes higher.
即,前述黏著劑組成物中之異氰酸酯系交聯劑所具有之異氰酸酯基之莫耳數,較佳為相對於黏著劑組成物中之(甲基)丙烯酸烷酯聚合物所具有之羥基之莫耳數為0.2倍~3倍之範圍。 That is, the number of moles of isocyanate groups possessed by the isocyanate-based crosslinking agent in the adhesive composition is preferably relative to the number of hydroxyl groups possessed by the alkyl (meth)acrylate polymer in the adhesive composition The ears range from 0.2 times to 3 times.
前述黏著劑組成物之異氰酸酯系交聯劑之含量只要以 異氰酸酯基之莫耳數成為上述範圍之方式進行適當調節即可,於滿足此種條件之基礎上,相對於前述(甲基)丙烯酸烷酯聚合物之含量100質量分,較佳為3質量分~20質量分,更佳為5質量分~15質量分。 The content of the isocyanate-based crosslinking agent in the adhesive composition as long as The molar number of the isocyanate group may be appropriately adjusted in such a manner as described above. On the basis of satisfying such conditions, the content of the alkyl (meth)acrylate polymer is 100 parts by mass, preferably 3 parts by mass. ~20 mass points, more preferably 5 to 15 mass points.
前述反應延遲劑係於保存中之前述黏著劑組成物中抑制非目標之交聯反應進行。 The aforementioned reaction delay agent inhibits the progress of unintended crosslinking reaction in the aforementioned adhesive composition during storage.
前述(甲基)丙烯酸烷酯聚合物通常如上所述般含有用於其調製之觸媒。作為反應延遲劑,可例示阻礙該觸媒於黏著劑組成物中之作用者,較佳可例示藉由對於前述觸媒之螯合而形成螯合錯合物者。例如,於前述觸媒為有機錫化合物時,作為反應延遲劑可例示會與錫形成螯合錯合物者。 The aforementioned alkyl (meth)acrylate polymer usually contains a catalyst for its preparation as described above. As the reaction delay agent, those that hinder the action of the catalyst in the adhesive composition can be exemplified, and preferably, those that form a chelate complex by chelating the aforementioned catalyst can be exemplified. For example, when the catalyst is an organotin compound, as a reaction retarder, a chelate complex with tin can be exemplified.
作為較佳之反應延遲劑,更具體而言可例示分子中具有2個以上羰基(-C(=O)-)者,若為分子中具有2個羰基者,則可例示二羧酸、酮酸及二酮等。 As a preferred reaction delay agent, more specifically, there may be exemplified those having two or more carbonyl groups (-C(=O)-) in the molecule, and if there are two carbonyl groups in the molecule, then dicarboxylic acid or keto acid may be exemplified. And dione.
其中,作為更佳之前述反應延遲劑,可例示具有羰基甲基羰基(-C(=O)-CH2-C(=O)-)者,更具體而言可例示丙二酸、乙醯乙酸等β-酮酸;乙醯乙酸甲酯、乙醯乙酸乙酯、乙醯乙酸正丙酯、乙醯乙酸異丙酯、乙醯乙酸正丁酯、乙醯乙酸異丁酯、乙醯乙酸第三丁酯、丙醯乙酸甲酯、丙醯乙酸乙酯、丙醯乙酸正丙酯、丙醯乙酸異丙酯、 丙醯乙酸正丁酯、丙醯乙酸第三丁酯、丁醯乙酸甲酯、丁醯乙酸乙酯、丁醯乙酸正丙酯、丁醯乙酸異丙酯、丁醯乙酸正丁酯、丁醯乙酸第三丁酯、異丁醯乙酸甲酯、異丁醯乙酸乙酯、異丁醯乙酸正丙酯、異丁醯乙酸異丙酯、異丁醯乙酸正丁酯、異丁醯乙酸第三丁酯、3-側氧基庚酸甲酯、3-側氧基庚酸乙酯、3-側氧基庚酸正丙酯、3-側氧基庚酸異丙酯、3-側氧基庚酸正丁酯、3-側氧基庚酸第三丁酯、5-甲基-3-側氧基己酸甲酯、5-甲基-3-側氧基己酸乙酯、5-甲基-3-側氧基己酸正丙酯、5-甲基-3-側氧基己酸異丙酯、5-甲基-3-側氧基己酸正丁酯、5-甲基-3-側氧基己酸第三丁酯、4,4-二甲基-3-側氧基戊酸甲酯、4,4-二甲基-3-側氧基戊酸乙酯、4,4-二甲基-3-側氧基戊酸正丙酯、4,4-二甲基-3-側氧基戊酸異丙酯、4,4-二甲基-3-側氧基戊酸正丁酯、4,4-二甲基-3-側氧基戊酸第三丁酯、苯甲醯乙酸甲酯、丙二酸二甲酯、丙二酸二乙酯、丙二酸甲基乙酯、丙二酸二正丙酯、丙二酸二異丙酯、丙二酸二正丁酯、丙二酸二第三丁酯、丙二酸甲基第三丁酯等β-酮酸酯;乙醯丙酮、二苯甲醯甲烷等β-二酮(1,3-二酮)等。 Among them, as the better reaction delay agent, those having a carbonylmethylcarbonyl group (-C(=O)-CH 2 -C(=O)-) can be exemplified, and more specifically, malonic acid and acetic acid can be exemplified. Etc. β-ketoacid; methyl acetoacetate, ethyl acetate, n-propyl acetoacetate, isopropyl acetoacetate, n-butyl acetoacetate, isobutyl acetoacetate, acetoacetate Tributyl ester, methyl propyl acetate, ethyl propyl acetate, n-propyl propyl acetate, isopropyl propyl acetate, n-butyl propyl acetate, third butyl propyl acetate, methyl butyl acetate , Ethyl butyl acetate, n-propyl butyl acetate, isopropyl butyl acetate, n-butyl butyl acetate, third butyl butyl acetate, methyl isobutyl acetate, ethyl isobutyl acetate, N-propyl isobutyl acetate, isopropyl isobutyl acetate, n-butyl isobutyl acetate, tertiary butyl isobutyl acetate, methyl 3-oxo-heptanoate, 3-oxo-heptanoic acid Ethyl ester, n-propyl 3-oxo-heptanoate, isopropyl 3-oxo-heptanoate, n-butyl 3-oxo-heptanoate, third butyl 3-oxo-heptanoate, 5- Methyl-3-oxo hexanoate, 5-methyl-3-oxo hexanoate, 5-methyl-3-oxo hexanoate, 5-methyl-3 -Isopropyl oxohexanoate, n-butyl 5-methyl-3-oxohexanoate, tert-butyl 5-methyl-3-oxohexanoate, 4,4-dimethyl Methyl-3-oxopentanoate, 4,4-dimethyl-3-oxopentanoate, 4,4-dimethyl-3-oxopentanoate, 4, 4-Dimethyl-3-pentoxypentanoic acid isopropyl ester, 4,4-dimethyl-3-pentoxypentanoic acid n-butyl ester, 4,4-dimethyl-3-pentoxypentanoic acid Third butyl acid, methyl benzoyl acetate, dimethyl malonate, diethyl malonate, methyl ethyl malonate, di-n-propyl malonate, diisopropyl malonate , Β-ketoesters such as di-n-butyl malonate, di-tert-butyl malonate, methyl-tert-butyl malonate, etc.; β-diketones such as acetone, dibenzoylmethane (1 , 3-dione), etc.
前述黏著劑組成物所含有之反應延遲劑可僅為1種,亦可為2種以上。 The reaction retarder contained in the adhesive composition may be only one kind, or two or more kinds.
前述黏著劑組成物較佳為相對於所有成分之合計量而含有0.01質量%~2質量%之反應延遲劑。藉由使反應延 遲劑之前述含量為前述下限值以上,黏著劑組成物於其保存中抑制非目標之交聯反應進行的效果變得更高。又,藉由使反應延遲劑之前述含量為前述上限值以下,於藉由前述黏著劑組成物之塗佈及乾燥而設置黏著劑層時,可藉由乾燥使反應延遲劑揮發,而防止黏著劑層中殘存過量之反應延遲劑。 The aforementioned adhesive composition is preferably a reaction retarder containing 0.01% by mass to 2% by mass relative to the total amount of all components. By delaying the reaction The aforementioned content of the latex is equal to or higher than the aforementioned lower limit, and the effect of suppressing the progress of unintended crosslinking reaction during the storage of the adhesive composition becomes higher. Also, by setting the content of the reaction retarder to be below the upper limit, when the adhesive layer is provided by coating and drying the adhesive composition, the reaction retardant can be volatilized by drying to prevent Excess reaction delay agent remains in the adhesive layer.
前述黏著劑組成物中之反應延遲劑之含量只要以於黏著劑組成物之所有成分之合計量中之質量比率成為上述範圍的方式進行適當調節即可,於滿足此種條件之基礎上,相對於前述(甲基)丙烯酸烷酯聚合物之含量100質量分,較佳為0.01質量分~10質量分,更佳為0.05質量分~5質量分。 The content of the reaction retarder in the aforementioned adhesive composition may be appropriately adjusted so that the mass ratio in the total amount of all components of the adhesive composition becomes the above range. On the basis of satisfying such conditions, the relative The content of the aforementioned alkyl (meth)acrylate polymer is 100 parts by mass, preferably 0.01 to 10 parts by mass, and more preferably 0.05 to 5 parts by mass.
前述黏著劑組成物更佳為除了前述(甲基)丙烯酸烷酯聚合物、異氰酸酯系交聯劑及反應延遲劑以外,進一步含有光聚合起始劑。 The adhesive composition preferably further includes a photopolymerization initiator in addition to the alkyl (meth)acrylate polymer, isocyanate-based crosslinking agent, and reaction retarder.
前述光聚合起始劑可為公知者,具體而言可例示:4-(2-羥基乙氧基)苯基(2-羥基-2-丙基)酮、α-羥基-α,α'-二甲基苯乙酮、2-甲基-2-羥基苯丙酮、1-羥基環己基苯基酮等α-酮醇系化合物;甲氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯乙酮、2-甲基-1-[4-(甲硫基)-苯基]-2-嗎啉基丙烷-1等苯乙酮系化合物;安息香乙醚、 安息香異丙醚、茴香偶姻甲醚等安息香醚系化合物;二苯基乙二酮二甲基縮酮等縮酮系化合物;2-萘磺醯氯等芳香族磺醯氯系化合物;1-苯酮-1,1-丙二酮-2-(鄰乙氧羰基)肟等光活性肟系化合物;二苯甲酮、苯甲醯安息香酸、3,3'-二甲基-4-甲氧基二苯甲酮等二苯甲酮系化合物;噻吨酮(thioxanthone)、2-氯噻吨酮、2-甲基噻吨酮、2,4-二甲基噻吨酮、異丙基噻吨酮、2,4-二氯噻吨酮、2,4-二乙基噻吨酮、2,4-二異丙基噻吨酮等噻吨酮系化合物;樟腦醌;鹵代酮;醯基氧化膦;醯基膦酸酯等。 The aforementioned photopolymerization initiator may be a well-known one, and specific examples include 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl) ketone, α-hydroxy-α,α'- Α-ketoalcohol compounds such as dimethylacetophenone, 2-methyl-2-hydroxyphenylacetone, 1-hydroxycyclohexylphenylketone; methoxyacetophenone, 2,2-dimethoxy- 2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-methyl-1-[4-(methylthio)-phenyl]-2-morpholinopropane-1 and other benzenes Acetone compounds; benzoin ether, Benzoin ether compounds such as benzoin isopropyl ether and anisin methyl ether; ketal compounds such as diphenylethanedione dimethyl ketal; 2-aromatic sulfonyl chloride compounds such as naphthalene sulfonyl chloride; 1- Photoactive oxime compounds such as benzophenone-1,1-propanedione-2-(o-ethoxycarbonyl)oxime; benzophenone, benzoylbenzoic acid, 3,3'-dimethyl-4-methyl Benzophenone compounds such as oxybenzophenone; thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-dimethylthioxanthone, isopropyl Thioxanthone, 2,4-dichlorothioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone and other thioxanthone compounds; camphorquinone; halogenated ketone; Acyl phosphine oxide; acetyl phosphonate and so on.
前述黏著劑組成物之光聚合起始劑之含量相對於前述(甲基)丙烯酸烷酯聚合物之含量100質量分,較佳為0.05質量分~20質量分。 The content of the photopolymerization initiator of the adhesive composition relative to the content of the alkyl (meth)acrylate polymer is 100 parts by mass, preferably 0.05 to 20 parts by mass.
前述黏著劑組成物更佳為除了前述(甲基)丙烯酸烷酯聚合物以外係進一步含有溶劑。 It is more preferable that the adhesive composition further contains a solvent in addition to the alkyl (meth)acrylate polymer.
前述溶劑並無特別限定,較佳可例示:甲苯、二甲苯等烴;甲醇、乙醇、2-丙醇、異丁醇(2-甲基丙烷-1-醇)、1-丁醇等醇;乙酸乙酯等酯;丙酮、甲基乙基酮等酮;四氫呋喃等醚;二甲基甲醯胺及N-甲基吡咯啶酮等醯胺(具有醯胺鍵之化合物)等。 The aforementioned solvent is not particularly limited, and preferably, examples include hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, 2-propanol, isobutanol (2-methylpropane-1-ol), and 1-butanol; Esters such as ethyl acetate; ketones such as acetone and methyl ethyl ketone; ethers such as tetrahydrofuran; amides (compounds with amide bonds) such as dimethylformamide and N-methylpyrrolidone.
前述黏著劑組成物所含有之溶劑可僅為1種,亦可為2種以上。 The solvent contained in the adhesive composition may be only one kind, or two or more kinds.
前述黏著劑組成物含有溶劑時溶劑含量相對於黏著劑組成物之總質量較佳為40質量%~90質量%,更佳為50質量%~80質量%。 When the aforementioned adhesive composition contains a solvent, the solvent content is preferably 40% by mass to 90% by mass, and more preferably 50% by mass to 80% by mass relative to the total mass of the adhesive composition.
前述黏著劑組成物除了前述(甲基)丙烯酸烷酯聚合物以外,亦可於無損本發明效果之範圍內含有不相當於前述異氰酸酯系交聯劑、反應延遲劑、光聚合起始劑及溶劑之其他成分。 In addition to the alkyl (meth)acrylate polymer, the adhesive composition may contain the isocyanate-based crosslinking agent, the reaction retarder, the photopolymerization initiator, and the solvent within a range that does not impair the effects of the present invention Other ingredients.
前述其他成分可為公知者並可根據目的而任意選擇,並無特別限定,較佳可例示染料、顏料、防劣化劑、抗靜電劑、阻燃劑、聚矽氧化合物、及鏈轉移劑等各種添加劑。 The aforementioned other components may be known and can be arbitrarily selected according to the purpose, and are not particularly limited, and preferably include dyes, pigments, anti-deterioration agents, antistatic agents, flame retardants, polysiloxane compounds, chain transfer agents, etc. Various additives.
前述黏著劑組成物係藉由調配前述(甲基)丙烯酸烷酯聚合物與前述聚合物以外之成分而獲得。 The adhesive composition is obtained by blending the alkyl (meth)acrylate polymer and components other than the polymer.
前述各成分調配時之添加順序並無特別限定,亦可同時添加2種以上之成分。 The order of addition of each of the aforementioned components is not particularly limited, and two or more components may be added simultaneously.
調配時混合各成分之方法並無特別限定,例如自使攪拌元件或攪拌翼等旋轉而混合之方法;使用混合機混合之方法;施加超音波而混合之方法等公知方法中適當選擇即可。 The method of mixing the components at the time of preparation is not particularly limited. For example, a method of mixing by rotating a stirring element or a stirring wing, etc.; a method of mixing using a mixer; a method of mixing by applying ultrasonic waves may be appropriately selected from known methods.
各成分之添加及混合時之溫度以及時間,只要不會使各調配成分劣化則並無特別限定,適當調節即可,但溫度 較佳為15℃~30℃。 The temperature and time at the time of addition and mixing of each component are not particularly limited as long as they do not deteriorate each formulated component, and may be adjusted appropriately, but the temperature It is preferably 15°C to 30°C.
前述硬化性樹脂層含有聚合物成分(a)及硬化性成分(b),且前述硬化性樹脂層之前述聚合物成分(a)及硬化性成分(b)之總含量相對於前述硬化性樹脂層之總量為95質量%以上,較佳為97質量%以上,更佳為98質量%以上,且可為100質量%。此種硬化性樹脂層實質不含有填充材料(後述填充材料(c))。又,本發明中即便具備此種硬化性樹脂層,前述具有樹脂層的工件固定片亦如上述般具有易拾取性。又,藉由使硬化性樹脂層實質不含有填充材料,而本發明之具有樹脂層的工件固定片不具有如下問題點:成為含有填充材料時特有之填充材料於硬化性樹脂層中不均勻地分散之狀態、填充材料會自使硬化性樹脂層硬化後之硬化膜脫落等。 The curable resin layer contains a polymer component (a) and a curable component (b), and the total content of the polymer component (a) and curable component (b) of the curable resin layer relative to the curable resin The total amount of layers is 95% by mass or more, preferably 97% by mass or more, more preferably 98% by mass or more, and may be 100% by mass. Such a curable resin layer contains substantially no filler (filler (c) described later). In addition, even if such a curable resin layer is provided in the present invention, the work fixing sheet having the resin layer has easy pick-up properties as described above. In addition, by making the curable resin layer substantially not contain a filler, the workpiece fixing sheet having a resin layer of the present invention does not have the following problem: the filler unique to the case where the filler is contained contains unevenly in the curable resin layer In the dispersed state, the filling material will come off from the cured film after curing the curable resin layer.
再者,本說明書中,「硬化性樹脂層實質不含有填充材料」係指硬化性樹脂層完全不含有填充材料,或者硬化性樹脂層僅以可忽視使用填充劑所產生效果之程度而含有少量填充材料。具體而言係指如下情況:硬化性樹脂層中所含之填充材料相對於形成硬化性樹脂層之硬化性樹脂組成物之固體成分之總量未達5質量%,較佳為未達3質量%,更佳為未達1質量%。 In addition, in this specification, "curable resin layer does not substantially contain a filler" means that the curable resin layer does not contain a filler at all, or the curable resin layer contains only a small amount to the extent that the effect of using a filler can be ignored Filler. Specifically, it refers to the case where the total amount of the filler contained in the curable resin layer with respect to the solid content of the curable resin composition forming the curable resin layer is less than 5% by mass, preferably less than 3% by mass %, more preferably less than 1% by mass.
硬化性樹脂層可使用含有前述聚合物成分(a)及硬化 性成分(b)等目標成分之硬化性樹脂組成物而形成。又,硬化性樹脂組成物中之非揮發性成分彼此之含量比率於硬化性樹脂層中亦成為相同。 For the curable resin layer, the above-mentioned polymer component (a) and curing The curable resin composition of the target component such as the sexual component (b) is formed. In addition, the content ratio of the nonvolatile components in the curable resin composition to the curable resin layer also becomes the same.
本發明中,前述聚合物成分(a)係可視為聚合性化合物進行聚合反應而形成之成分。又,前述硬化性成分(b)係可進行硬化(聚合)反應之成分。再者,本發明中,聚合反應亦包括聚縮合反應。 In the present invention, the polymer component (a) can be regarded as a component formed by a polymerization reaction of a polymerizable compound. In addition, the curable component (b) is a component that can undergo a curing (polymerization) reaction. Furthermore, in the present invention, the polymerization reaction also includes polycondensation reaction.
聚合物成分(a)及硬化性成分(b)係為使硬化性樹脂層發揮其效果所需之硬化性樹脂層之主要構成成分。再者,雖亦有相當於聚合物成分(a)及硬化性成分(b)兩者之成分,但此種成分於本發明中係使用作為聚合物成分(a)而非硬化性成分(b)。 The polymer component (a) and the curable component (b) are the main constituent components of the curable resin layer required for the curable resin layer to exert its effect. In addition, although there are components corresponding to both the polymer component (a) and the curable component (b), this component is used as the polymer component (a) instead of the curable component (b) in the present invention. ).
硬化性樹脂層之厚度可根據目的而適當選擇,較佳為1μm~100μm,更佳為5μm~75μm,尤佳為5μm~50μm。又,硬化性樹脂層之平均厚度可利用與前述黏著劑層之平均厚度相同之測定方法求出。 The thickness of the curable resin layer can be appropriately selected according to the purpose, preferably 1 μm to 100 μm, more preferably 5 μm to 75 μm, and particularly preferably 5 μm to 50 μm. The average thickness of the curable resin layer can be obtained by the same measurement method as the average thickness of the adhesive layer.
前述「硬化性樹脂層之厚度」係於任意之5處利用接觸式厚度計測定出厚度並以平均表示之值。再者,當難以直接對硬化性樹脂層應用接觸式厚度計時,亦可藉由如下方式算出:於重疊有基材膜、黏著劑層、後述剝離材等其他層之狀態下,與前述同樣地測定整體之厚度,取與所重疊之其他層之厚度(利用與前述同樣之方法測定或利用前 述黏著劑層之測定方法測定)之差量。 The aforementioned "thickness of the curable resin layer" is a value measured at an arbitrary 5 points using a contact thickness meter and expressed as an average. In addition, when it is difficult to directly apply the contact thickness measurement to the curable resin layer, it can also be calculated as follows: in the state where the base material film, the adhesive layer, and other layers such as the release material described later are superimposed, the same as above Measure the thickness of the whole, take the thickness of the other layers that are overlapped (use the same method as above to measure or before using Measure the difference of the adhesive layer measurement method).
硬化性樹脂層較佳為具有感壓接著性,且較佳為具有加熱硬化性,更佳為兼具感壓接著性及加熱硬化性。兼具感壓接著性及加熱硬化性之硬化性樹脂層,係於未硬化狀態下能藉由輕輕按壓而貼附於各種被黏著體。又,硬化性樹脂層亦可為能藉由加熱使其軟化而貼附於各種被黏著體者。硬化性樹脂層經過熱硬化而最終成為耐衝擊性高之硬化物,該硬化物之剪切強度亦優異,於嚴格之高溫、高濕度條件下亦可保持充分之接著特性。 The curable resin layer preferably has pressure-sensitive adhesiveness, and preferably has heat-curing properties, and more preferably has both pressure-sensitive adhesiveness and heat-curing properties. The curable resin layer, which has both pressure-sensitive adhesive properties and heat-curing properties, can be attached to various adherends by light pressing in an uncured state. In addition, the curable resin layer can be softened by heating and attached to various adherends. The thermosetting resin layer undergoes thermal curing and finally becomes a hardened product with high impact resistance. The hardened product also has excellent shear strength, and can maintain sufficient adhesive properties under strict high temperature and high humidity conditions.
聚合物成分(a)係用於對硬化性樹脂層賦予成膜性、可撓性等之聚合物化合物。聚合物成分(a)有亦相當於硬化性成分(b)之情況。例如,苯氧基樹脂或於側鏈具有環氧基之丙烯酸系樹脂等,係相當於聚合物成分(a)且亦相當於硬化性成分(b)。將此種成分作為聚合物成分(a)使用。 The polymer component (a) is a polymer compound used to impart film-forming properties, flexibility, etc. to the curable resin layer. The polymer component (a) may also correspond to the curable component (b). For example, a phenoxy resin or an acrylic resin having an epoxy group in the side chain corresponds to the polymer component (a) and also corresponds to the curable component (b). Such a component is used as the polymer component (a).
聚合物成分(a)可單獨使用1種,亦可併用2種以上。 The polymer component (a) may be used alone or in combination of two or more.
聚合物成分(a)可使用丙烯酸系樹脂、聚酯樹脂、胺基甲酸酯樹脂、丙烯酸胺基甲酸酯樹脂、聚矽氧樹脂、橡膠系聚合物、或苯氧基樹脂等,較佳為丙烯酸系樹脂。 As the polymer component (a), acrylic resins, polyester resins, urethane resins, acrylic urethane resins, polysiloxane resins, rubber-based polymers, phenoxy resins, etc. are preferred It is acrylic resin.
前述丙烯酸系樹脂可使用公知丙烯酸聚合物。 As the acrylic resin, a known acrylic polymer can be used.
丙烯酸系樹脂之重量平均分子量(Mw)較佳為1萬~200萬,更佳為10萬~150萬。若丙烯酸系樹脂之重量平均分子量過小,則有硬化性樹脂層與前述黏著劑層之接著力變高,產生半導體晶片之拾取不良的情況。又,若丙烯酸系樹脂之重量平均分子量過大,則有硬化性樹脂層無法追隨被黏著體之凹凸面之情況,且成為空隙等之產生因素。 The weight average molecular weight (Mw) of the acrylic resin is preferably 10,000 to 2 million, and more preferably 100,000 to 1.5 million. If the weight-average molecular weight of the acrylic resin is too small, the adhesive force between the curable resin layer and the adhesive layer may become high, which may cause poor pickup of the semiconductor wafer. In addition, if the weight average molecular weight of the acrylic resin is too large, the curable resin layer may not be able to follow the uneven surface of the adherend, and it may become a factor for voids and the like.
再者,本說明書中,於無特別事先說明之情況下,重量平均分子量係利用凝膠滲透層析(gel permeation chromatography,GPC)法測定之聚苯乙烯換算值。 In addition, in this specification, the weight average molecular weight is the polystyrene conversion value measured by the gel permeation chromatography (GPC) method unless there is particular notice.
丙烯酸系樹脂之玻璃轉移溫度(Tg)較佳為-60℃~70℃,更佳為-30℃~50℃。若丙烯酸系樹脂之Tg過低,則有硬化性樹脂層與前述黏著劑層之剝離力變大,引起半導體晶片之拾取不良的情況。又,若丙烯酸系樹脂之Tg過高,則有用於固定半導體晶圓之接著力變得不充分之虞。 The glass transition temperature (Tg) of the acrylic resin is preferably -60°C to 70°C, more preferably -30°C to 50°C. If the Tg of the acrylic resin is too low, the peeling force of the curable resin layer and the adhesive layer may increase, which may cause poor pickup of the semiconductor wafer. In addition, if the Tg of the acrylic resin is too high, there is a possibility that the adhesive force for fixing the semiconductor wafer becomes insufficient.
構成丙烯酸系樹脂之單體可例示:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸十一烷酯、(甲基)丙烯酸十二烷酯((甲基)丙烯酸月桂酯)、(甲基)丙烯酸十三烷酯、(甲基)丙 烯酸十四烷酯((甲基)丙烯酸肉豆蔻酯)、(甲基)丙烯酸十五烷酯、(甲基)丙烯酸十六烷酯((甲基)丙烯酸棕櫚酯)、(甲基)丙烯酸十七烷酯、(甲基)丙烯酸十八烷酯((甲基)丙烯酸硬脂酯)等烷基為鏈狀且碳數為1~18之(甲基)丙烯酸烷酯;(甲基)丙烯酸環烷酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯基氧基乙酯、醯亞胺(甲基)丙烯酸酯等具有環狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸羥基甲酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯等含羥基之(甲基)丙烯酸酯;(甲基)丙烯酸縮水甘油酯等含縮水甘油基之(甲基)丙烯酸酯等(甲基)丙烯酸酯。 Examples of monomers constituting the acrylic resin include: methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethyl (meth)acrylate Hexyl ester, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, (meth) Group) undecyl acrylate, dodecyl (meth) acrylate (lauryl (meth) acrylate), tridecyl (meth) acrylate, (meth) propyl Myristyl enoate (myristyl (meth)acrylate), pentadecyl (meth)acrylate, cetyl (meth)acrylate (palmityl (meth)acrylate), (meth) Heptadecyl acrylate, octadecyl (meth) acrylate (stearyl (meth) acrylate) and other alkyl groups are chain-shaped and have 1 to 18 carbon atoms; ) Cycloalkyl acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentyl (meth) acrylate, dicyclopentenyl (meth) acrylate, di(meth) acrylate (Meth)acrylates with a cyclic skeleton such as cyclopentenyloxyethyl, amide imide (meth)acrylate; hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate , (Meth)acrylic acid 2-hydroxypropyl and other hydroxyl-containing (meth)acrylate; (meth)acrylic acid and other glycidyl-containing (meth)acrylate and other (meth)acrylate.
又,丙烯酸系樹脂亦可為聚合丙烯酸、甲基丙烯酸、伊康酸、乙酸乙烯酯、丙烯腈、苯乙烯、或N-羥甲基丙烯醯胺等單體者。 In addition, the acrylic resin may be monomers such as polymerized acrylic acid, methacrylic acid, itaconic acid, vinyl acetate, acrylonitrile, styrene, or N-methylolacrylamide.
構成丙烯酸系樹脂之單體可僅為1種,亦可為2種以上。 The monomer constituting the acrylic resin may be only one kind, or two or more kinds.
本說明書中,對於單體聚合而成之物質使用之用語「聚合物」或「樹脂」等係包含自前述單體導出之構成單元(亦稱為重複單元)之「聚合物」或「樹脂」等。又,本說明書中,關於前述「聚合物」或「樹脂」等,於以質量或莫耳數等之比說明該等之製造所使用單體之使用量時,該比可理解為自前述單體導出之構成單元相對於前述單體聚合 而成之「聚合物」或「樹脂」等之整體量的比。即,例如於說明為分別使用20質量%及80質量%之單體X及Y並使該等聚合而獲得聚合物Z時,可理解為該聚合物Z中,自單體X導出之構成單元與自單體Y導出之構成單元相對於聚合物Z之總質量的比率分別為20質量%及80質量%。 In this specification, the terms "polymer" or "resin" used for substances polymerized by monomers are "polymers" or "resins" that include structural units (also called repeating units) derived from the aforementioned monomers Wait. In addition, in this specification, when the above-mentioned "polymer" or "resin", etc., are used to describe the amount of monomers used in the manufacture in terms of mass, molar number, etc., the ratio can be understood as The constituent units derived from the body are polymerized relative to the aforementioned monomers The ratio of the total amount of the resulting "polymer" or "resin". That is, for example, when it is described that 20% by mass and 80% by mass of monomers X and Y are used and these are polymerized to obtain a polymer Z, it can be understood that the constituent unit derived from the monomer X in the polymer Z The ratio of the structural unit derived from the monomer Y to the total mass of the polymer Z is 20% by mass and 80% by mass, respectively.
丙烯酸系樹脂亦可具有乙烯基、(甲基)丙烯醯基、胺基、羥基、羧基、異氰酸酯基等能與其他化合物鍵結之官能基。與其他化合物之鍵結可經由後述交聯劑(f)而進行,或者亦可不經由交聯劑(f)而將前述官能基與其他化合物直接鍵結。藉由使丙烯酸系樹脂利用該等官能基進行鍵結,有提高使用具有樹脂層的工件固定片之半導體裝置之封裝可靠性之傾向。 The acrylic resin may also have functional groups capable of bonding with other compounds, such as vinyl groups, (meth)acryloyl groups, amine groups, hydroxyl groups, carboxyl groups, and isocyanate groups. The bonding with other compounds may be performed via a crosslinking agent (f) described below, or the aforementioned functional groups may be directly bonded to other compounds without passing through the crosslinking agent (f). By bonding the acrylic resin with these functional groups, there is a tendency to improve the packaging reliability of the semiconductor device using the workpiece fixing sheet having a resin layer.
於硬化性樹脂組成物含有丙烯酸系樹脂作為聚合物成分(a)時,硬化性樹脂組成物之丙烯酸系樹脂之含量較佳為相對於硬化性樹脂組成物之固體成分之總量為50質量%以上。藉由設為此種範圍,於將硬化性樹脂層用於在半導體晶片之樹脂密封中的總括硬化製程時,硬化性樹脂層係成為較佳之性狀。其原因在於,此種製程中係於進行半導體晶片之樹脂密封之前,要對晶片進行打線,但即便於硬化前之硬化性樹脂層暴露於高溫時,亦可在保持某程度硬度之狀態下進行打線。即,若硬化性樹脂組成物中之丙烯酸系樹脂之含量相對較多,則即便於熱硬化前亦可使硬化 性樹脂層之儲存模數較高。因此,即便於硬化性樹脂層未硬化或半硬化之狀態下,亦會抑制打線時之晶片振動、移位,固可穩定地進行打線。 When the curable resin composition contains an acrylic resin as the polymer component (a), the content of the acrylic resin in the curable resin composition is preferably 50% by mass relative to the total solid content of the curable resin composition the above. By setting to such a range, when the curable resin layer is used in the blanket curing process in the resin sealing of the semiconductor wafer, the curable resin layer becomes a preferable characteristic. The reason is that in this process, the wafer is wire-bonded before the resin sealing of the semiconductor wafer, but even when the curable resin layer before curing is exposed to high temperature, it can be carried out while maintaining a certain degree of hardness Hit the line. That is, if the content of the acrylic resin in the curable resin composition is relatively large, it can be cured even before thermal curing The storage modulus of the resin layer is higher. Therefore, even in a state where the curable resin layer is not cured or semi-cured, wafer vibration and displacement during wire bonding are suppressed, and wire bonding can be performed stably.
又,於硬化性樹脂組成物含有丙烯酸系樹脂作為聚合物成分(a)時,硬化性樹脂組成物之丙烯酸系樹脂之含量更佳為相對於前述硬化性樹脂組成物之固體成分之總量為50質量%~90質量%。於丙烯酸系樹脂之含量如上述般相對較多時,有黏著劑層與硬化性樹脂層之密接性變高,接著力變高之傾向,但藉由使用本發明之黏著劑層而可降低黏著劑層與硬化性樹脂層之間之接著力,而半導體晶片之易拾取性提高。 In addition, when the curable resin composition contains an acrylic resin as the polymer component (a), the content of the acrylic resin in the curable resin composition is more preferably the total amount relative to the solid content of the curable resin composition as 50% by mass to 90% by mass. When the content of the acrylic resin is relatively large as described above, the adhesiveness between the adhesive layer and the curable resin layer becomes higher, and the adhesive force tends to be higher, but by using the adhesive layer of the present invention, the adhesion can be reduced The adhesive force between the agent layer and the curable resin layer improves the ease of pickup of the semiconductor wafer.
如上所述,於硬化性樹脂層含有丙烯酸系樹脂作為聚合物成分(a)時,硬化性樹脂層中之丙烯酸系樹脂之含量較佳為50質量%以上,更佳為50質量%~90質量%。 As described above, when the curable resin layer contains an acrylic resin as the polymer component (a), the content of the acrylic resin in the curable resin layer is preferably 50% by mass or more, more preferably 50% by mass to 90% by mass %.
本發明中,為了提高前述工件固定片(黏著劑層)自硬化性樹脂層之剝離性並提高易拾取性,或者藉由硬化性樹脂層對被黏著體之凹凸面之追隨而抑制空隙等之產生,聚合物成分(a)可單獨使用丙烯酸系樹脂以外之熱塑性樹脂(以下簡稱為「熱塑性樹脂」),亦可與丙烯酸系樹脂併用。 In the present invention, in order to improve the peelability of the work fixing sheet (adhesive layer) from the hardenable resin layer and improve the ease of pick-up, or to suppress voids by the hardenable resin layer following the uneven surface of the adherend As a result, for the polymer component (a), thermoplastic resins other than acrylic resins (hereinafter simply referred to as "thermoplastic resins") may be used alone or in combination with acrylic resins.
前述熱塑性樹脂之重量平均分子量較佳為1000~10萬,更佳為3000~8萬。 The weight average molecular weight of the aforementioned thermoplastic resin is preferably 1,000 to 100,000, more preferably 3,000 to 80,000.
前述熱塑性樹脂之玻璃轉移溫度(Tg)較佳為-30℃~ 150℃,更佳為-20℃~120℃。 The glass transition temperature (Tg) of the aforementioned thermoplastic resin is preferably -30°C~ 150 ℃, more preferably -20 ℃ ~ 120 ℃.
作為前述熱塑性樹脂,可例示聚酯樹脂、胺基甲酸酯樹脂、苯氧基樹脂、聚丁烯、聚丁二烯、或聚苯乙烯等。 Examples of the aforementioned thermoplastic resins include polyester resins, urethane resins, phenoxy resins, polybutene, polybutadiene, and polystyrene.
前述熱塑性樹脂可單獨使用前述中之1種,亦可併用2種以上。 The thermoplastic resin may be used alone or in combination of two or more.
藉由前述熱塑性樹脂之使用而獲得如上述效果,另一方面,有硬化前之硬化性樹脂層暴露於高溫時硬度下降,在未硬化或半硬化之狀態下之硬化性樹脂層之打線適應性下降的擔憂。因此,硬化性樹脂組成物之熱塑性樹脂之含量較佳為於考慮此種影響之基礎上進行設定。 The aforementioned effects are obtained by using the aforementioned thermoplastic resins. On the other hand, the hardness of the curable resin layer before curing decreases when exposed to high temperature, and the flexibility of the curable resin layer in the uncured or semi-cured state Falling fears. Therefore, the content of the thermoplastic resin of the curable resin composition is preferably set in consideration of such influence.
本發明中,較佳為將前述熱塑性樹脂與丙烯酸系樹脂併用。 In the present invention, it is preferable to use the aforementioned thermoplastic resin in combination with acrylic resin.
硬化性成分(b)可例示環氧系熱硬化性樹脂、熱硬化性聚醯亞胺樹脂、胺基甲酸酯樹脂、不飽和聚酯樹脂、聚矽氧樹脂等,該等中較佳為環氧系熱硬化性樹脂。硬化性成分(b)有亦相當於聚合物成分(a)之情況,但將此種成分作為聚合物成分(a)使用。 The curable component (b) can be exemplified by epoxy-based thermosetting resins, thermosetting polyimide resins, urethane resins, unsaturated polyester resins, polysiloxane resins, etc., among these, preferably Epoxy thermosetting resin. The curable component (b) may also correspond to the polymer component (a), but such a component is used as the polymer component (a).
環氧系熱硬化性樹脂包含環氧樹脂及熱硬化劑。 The epoxy-based thermosetting resin includes an epoxy resin and a thermosetting agent.
環氧系熱硬化性樹脂可單獨使用1種,亦可併用2種 以上。 Epoxy thermosetting resins can be used alone or in combination. the above.
前述環氧樹脂可列舉公知者,具體而言可例示:多官能系環氧樹脂、聯苯基化合物、雙酚A二縮水甘油醚及其氫化物、鄰甲酚酚醛清漆環氧樹脂、二環戊二烯型環氧樹脂、聯苯型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、及伸苯基骨架型環氧樹脂等2官能以上之環氧化合物。 The aforementioned epoxy resins may be publicly known ones, and specific examples thereof include polyfunctional epoxy resins, biphenyl compounds, bisphenol A diglycidyl ether and its hydrogenated products, o-cresol novolac epoxy resins, and bicyclic Two or more functional epoxy compounds such as pentadiene type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and phenylene skeleton type epoxy resin.
又,前述環氧樹脂亦可使用具有不飽和烴基之環氧樹脂。作為具有不飽和烴基之環氧樹脂,可例示多官能系環氧樹脂之環氧樹脂一部分被轉換成包含不飽和烴基之基而成的化合物。此種化合物例如可藉由使丙烯酸對環氧基進行加成反應而製造。又,作為具有不飽和烴基之環氧樹脂,可例示於構成環氧樹脂之芳香環等直接鍵結包含不飽和烴基之基而成的化合物等。不飽和烴基係具有聚合性之不飽和基,具體而言可例示乙烯基(ethenyl)(乙烯基(vinyl))、2-丙烯基(烯丙基)、丙烯醯基、甲基丙烯醯基、丙烯醯胺基、及甲基丙烯醯胺基等,較佳為丙烯醯基。 In addition, as the epoxy resin, an epoxy resin having an unsaturated hydrocarbon group may be used. As the epoxy resin having an unsaturated hydrocarbon group, a compound in which a part of the epoxy resin of a multifunctional epoxy resin is converted into a group containing an unsaturated hydrocarbon group can be exemplified. Such a compound can be produced by adding acrylic acid to an epoxy group, for example. The epoxy resin having an unsaturated hydrocarbon group may be exemplified by a compound obtained by directly bonding a group containing an unsaturated hydrocarbon group to an aromatic ring constituting the epoxy resin. The unsaturated hydrocarbon group is a polymerizable unsaturated group, and specific examples include vinyl (ethenyl) (vinyl), 2-propenyl (allyl), propenyl acetyl, methacryl acetyl, The acrylamide group, the methacrylamide group and the like are preferably acrylamide groups.
相較於不具有不飽和烴基之環氧樹脂,具有不飽和烴基之環氧樹脂與丙烯酸系樹脂之相溶性高。因此,藉由使用包含具有不飽和烴基之環氧樹脂之硬化性樹脂組成物,會提高半導體裝置之封裝可靠性。 Compared with epoxy resins without unsaturated hydrocarbon groups, epoxy resins with unsaturated hydrocarbon groups have high compatibility with acrylic resins. Therefore, by using a curable resin composition containing an epoxy resin having an unsaturated hydrocarbon group, the packaging reliability of the semiconductor device is improved.
就易拾取性提高而言,前述環氧樹脂較佳為軟化點或玻璃轉移溫度高者。 In terms of improvement in easy pick-up, the epoxy resin is preferably one having a high softening point or a high glass transition temperature.
前述環氧樹脂之數量平均分子量並無特別限定,就硬化性樹脂層之硬化性或硬化後之強度及耐熱性之觀點而言,較佳為300~30000,更佳為400~10000,尤佳為500~3000。 The number average molecular weight of the aforementioned epoxy resin is not particularly limited. From the viewpoint of the curability of the curable resin layer or the strength and heat resistance after curing, it is preferably 300 to 30,000, more preferably 400 to 10,000, and particularly preferably It is 500~3000.
前述環氧樹脂之環氧當量較佳為100g/eq~1000g/eq,更佳為300g/eq~800g/eq。 The epoxy equivalent of the aforementioned epoxy resin is preferably 100 g/eq to 1000 g/eq, more preferably 300 g/eq to 800 g/eq.
前述環氧樹脂可單獨使用1種,亦可併用2種以上。 One type of the epoxy resin may be used alone, or two or more types may be used in combination.
前述熱硬化劑作為對於環氧樹脂之硬化劑而發揮功能。 The aforementioned thermosetting agent functions as a curing agent for epoxy resin.
熱硬化劑可例示1分子中具有2個以上可與環氧基反應之官能基之化合物。前述官能基可例示酚性羥基、醇性羥基、胺基、羧基、及使酸基酐化而成之基,較佳為酚性羥基、胺基、使酸基酐化而成之基,更佳為酚性羥基、胺基,尤佳為酚性羥基。 The thermal hardener can be exemplified by a compound having two or more functional groups reactive with epoxy groups in one molecule. Examples of the aforementioned functional groups include phenolic hydroxyl groups, alcoholic hydroxyl groups, amine groups, carboxyl groups, and acidified anhydride groups, preferably phenolic hydroxyl groups, amine groups, and acidified anhydride groups. The phenolic hydroxyl group and amine group are preferable, and the phenolic hydroxyl group is particularly preferable.
前述熱硬化劑中,酚系硬化劑(具有酚性羥基之硬化劑)可例示多官能酚樹脂、聯苯酚、酚醛清漆型酚樹脂、二環戊二烯系酚樹脂、及芳烷基酚樹脂等。 Among the aforementioned thermosetting agents, phenolic hardeners (hardeners with phenolic hydroxyl groups) can be exemplified by multifunctional phenol resins, biphenols, novolac type phenol resins, dicyclopentadiene phenol resins, and aralkyl phenol resins Wait.
前述熱硬化劑中,胺系硬化劑(具有胺基之硬化劑) 可例示DICY(二氰二胺)等。 Among the aforementioned thermal hardeners, amine-based hardeners (hardeners with amine groups) Examples include DICY (dicyandiamide).
前述熱硬化劑亦可具有不飽和烴基。 The aforementioned thermosetting agent may have an unsaturated hydrocarbon group.
作為具有不飽和烴基之熱硬化劑,可例示利用包含不飽和烴基之基取代酚樹脂之羥基一部分而成的化合物、於酚樹脂之芳香環直接鍵結包含不飽和烴基之基而成的化合物等。熱硬化劑中之不飽和烴基係與前述具有不飽和烴基之環氧樹脂中之不飽和烴基相同。 As the thermosetting agent having an unsaturated hydrocarbon group, a compound in which a part of the hydroxyl group of the phenol resin is substituted with a group containing an unsaturated hydrocarbon group, a compound in which a group containing an unsaturated hydrocarbon group is directly bonded to the aromatic ring of the phenol resin, etc. . The unsaturated hydrocarbon group in the thermal hardener is the same as the unsaturated hydrocarbon group in the aforementioned epoxy resin having an unsaturated hydrocarbon group.
就易拾取性提高而言,前述熱硬化劑較佳為軟化點或玻璃轉移溫度高者。 In terms of improvement in easy pick-up, the thermal hardener is preferably one having a high softening point or a high glass transition temperature.
前述熱硬化劑之數量平均分子量較佳為300~30000,更佳為400~10000,尤佳為500~3000。 The number average molecular weight of the aforementioned thermosetting agent is preferably 300 to 30,000, more preferably 400 to 10,000, and particularly preferably 500 to 3,000.
前述熱硬化劑可單獨使用1種,亦可併用2種以上。 The aforementioned thermosetting agent may be used alone or in combination of two or more.
硬化性樹脂組成物之熱硬化劑之含量相對於前述環氧樹脂之含量100質量分,較佳為0.1質量分~500質量分,更佳為1質量分~200質量分。若熱硬化劑之含量過少,則有硬化不足而無法獲得接著性之情況,若熱硬化劑之含量過量,則有硬化性樹脂層之吸濕率變高,而使封裝可靠性下降之情況。 The content of the thermosetting agent of the curable resin composition relative to the content of the epoxy resin is 100 parts by mass, preferably 0.1 to 500 parts by mass, and more preferably 1 to 200 parts by mass. If the content of the thermosetting agent is too small, there may be insufficient curing to obtain adhesiveness. If the content of the thermosetting agent is excessive, the moisture absorption rate of the curable resin layer becomes high, which may reduce the reliability of the package.
硬化性樹脂組成物(硬化性樹脂層)之硬化性成分(b)之含量相對於聚合物成分(a)之含量100質量分,較佳為1質量分~100質量分,更佳為1.5質量分~75質量分,尤佳為2質量分~60質量分。藉由使硬化性成分(b)之含量為如上述之範圍,有維持硬化前之硬化性樹脂層之硬度之傾向,而未硬化或半硬化之狀態下之硬化性樹脂層之打線適應性提高。另一方面,於硬化性成分(b)之含量相對於聚合物成分(a)之含量為相對少量時,有如下情況:即便將硬化性成分(b)之各成分設為軟化點或玻璃轉移溫度高者而欲抑制前述黏著劑層與硬化性樹脂層之接著力變高以提高易拾取性,亦無法充分提高。但,藉由使用本發明之黏著劑層,可降低黏著劑層與硬化性樹脂層之間之接著力,而半導體晶片之易拾取性提高。 The content of the curable component (b) of the curable resin composition (curable resin layer) relative to the content of the polymer component (a) is 100 parts by mass, preferably 1 to 100 parts by mass, and more preferably 1.5 parts by mass Points ~ 75 mass points, especially good for 2 ~ 60 mass points. By setting the content of the curable component (b) to the above-mentioned range, there is a tendency to maintain the hardness of the curable resin layer before curing, while the flexibility of the curable resin layer in the uncured or semi-cured state is improved. . On the other hand, when the content of the curable component (b) is relatively small with respect to the content of the polymer component (a), there may be cases where each component of the curable component (b) is set to the softening point or glass transition If the temperature is high, it is necessary to suppress the adhesive force between the adhesive layer and the curable resin layer from increasing to improve the pick-up property, but it cannot be sufficiently improved. However, by using the adhesive layer of the present invention, the adhesive force between the adhesive layer and the curable resin layer can be reduced, and the ease of pick-up of the semiconductor wafer is improved.
硬化性樹脂層亦可使用除了聚合物成分(a)及硬化性成分(b)以外進一步視需要含有不相當於該等成分之其他成分的硬化性樹脂組成物而形成,以改良其各種物性。 The curable resin layer may be formed using a curable resin composition that contains other components not corresponding to these components in addition to the polymer component (a) and the curable component (b), as necessary, to improve various physical properties.
作為硬化性樹脂組成物所含有之其他成分,可例示填充材料(c)、硬化促進劑(d)、偶合劑(e)、交聯劑(f)、通用添加劑(g)等。 Examples of other components contained in the curable resin composition include filler (c), curing accelerator (d), coupling agent (e), crosslinking agent (f), and general-purpose additive (g).
硬化性樹脂組成物通常藉由含有填充材料(c)而使其熱膨脹係數之調整變得容易。因此,藉由使用此種硬化性 樹脂組成物,而使硬化後之硬化性樹脂層之熱膨脹係數對於半導體晶片、金屬或有機基板最適化,而可使封裝可靠性提高。 The curable resin composition usually contains a filler (c) to facilitate the adjustment of its thermal expansion coefficient. Therefore, by using this hardenability The resin composition optimizes the thermal expansion coefficient of the curable resin layer after curing for semiconductor wafers, metals, or organic substrates, and improves package reliability.
又,通常藉由使用含有填充材料(c)之硬化性樹脂組成物,亦可降低硬化後之硬化性樹脂層之吸濕率。 In addition, by generally using the curable resin composition containing the filler (c), the moisture absorption rate of the curable resin layer after curing can also be reduced.
填充材料(c)係不相當於聚合物成分(a)及硬化性成分(b)之任一者之成分。 The filler (c) is a component that does not correspond to any of the polymer component (a) and the curable component (b).
但,本發明中,如之前說明般使硬化性樹脂層不含有填充材料(c),或者將填充材料(c)之含量設為多於0質量%且未達5質量%,因此硬化性樹脂組成物之填充材料(c)之含量相對於硬化性樹脂組成物之固體成分之總量未達5質量%,較佳為未達3質量%,更佳為未達1質量%。 However, in the present invention, as described above, the curable resin layer does not contain the filler (c), or the content of the filler (c) is set to more than 0% by mass and less than 5% by mass, so the curable resin The content of the filler (c) of the composition relative to the total solid content of the curable resin composition is less than 5 mass%, preferably less than 3 mass%, and more preferably less than 1 mass%.
填充材料(c)較佳為無機填充材料(c),較佳之無機填充材料可例示:二氧化矽、氧化鋁、滑石、碳酸鈣、鈦白、鐵丹、碳化矽、氮化硼等之粉末;使前述二氧化矽等球形化而成之珠;前述二氧化矽等之單晶纖維;玻璃纖維等。 The filler material (c) is preferably an inorganic filler material (c), and preferred inorganic filler materials can be exemplified by powders of silicon dioxide, alumina, talc, calcium carbonate, titanium white, iron dan, silicon carbide, boron nitride, etc. ; Beads made of the aforementioned silica, etc.; single crystal fibers of the aforementioned silica; glass fiber, etc.;
該等中,無機填充材料較佳為二氧化矽填料或氧化鋁填料。 Among these, the inorganic filler is preferably silica filler or alumina filler.
無機填充材料(c)可單獨使用1種,亦可併用2種以上。 The inorganic filler (c) may be used alone or in combination of two or more.
硬化促進劑(d)係用於對硬化性樹脂組成物之硬化速度進行調整,且不相當於聚合物成分(a)及硬化性成分(b)之任一者的成分。 The curing accelerator (d) is a component for adjusting the curing rate of the curable resin composition and does not correspond to any of the polymer component (a) and the curable component (b).
較佳之硬化促進劑(d)可例示:三乙二胺、苄基二甲基胺、三乙醇胺、二甲基胺基乙醇、三(二甲基胺基甲基)苯酚等三級胺;2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑等咪唑類(1個以上之氫原子被氫原子以外之基取代而成之咪唑);三丁基膦、二苯基膦、三苯基膦等有機膦類(1個以上之氫原子被有機基取代而成之膦);四苯基硼酸四苯基鏻、四苯基硼酸三苯基膦等四苯基硼鹽等。 Preferred hardening accelerators (d) can be exemplified by tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris(dimethylaminomethyl)phenol; 2 -Methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxyl Imidazoles such as methylimidazole (imidazoles in which more than one hydrogen atom is replaced by a group other than hydrogen atoms); organic phosphines such as tributylphosphine, diphenylphosphine, and triphenylphosphine (more than one hydrogen Phosphine with atoms replaced by organic groups); tetraphenyl boron salts such as tetraphenyl boron tetraphenyl phosphonium, tetraphenyl boric acid triphenyl phosphine, etc.
硬化促進劑(d)可單獨使用1種,亦可併用2種以上。 One type of hardening accelerator (d) may be used alone, or two or more types may be used in combination.
於使用硬化促進劑(d)時,硬化性樹脂組成物中之硬化促進劑(d)之含量相對於硬化性成分(b)之含量100質量分,較佳為0.01質量分~10質量分,更佳為0.1質量分~1質量分。藉由使硬化促進劑(d)之含量為此種範圍,硬化性樹脂層於高溫、高濕度條件下亦具有優異接著特性,且暴露在嚴格回焊條件下時亦可達成高封裝可靠性。若硬化促進劑(d)之含量過少,則無法充分獲得使用硬化促進劑(d)所產生之效果,若硬化促進劑(d)之含量過量,則高極性之硬化促進劑(d)於高溫、高濕度條件下在硬化性樹脂層中會向與被黏著體之接著界面側移動而偏 析,而使封裝之可靠性下降。 When the curing accelerator (d) is used, the content of the curing accelerator (d) in the curable resin composition is 100 parts by mass relative to the content of the curable component (b), preferably 0.01 to 10 parts by mass, More preferably, it is 0.1 to 1 mass point. By setting the content of the curing accelerator (d) to such a range, the curable resin layer also has excellent adhesion characteristics under high temperature and high humidity conditions, and high packaging reliability can also be achieved when exposed to strict reflow conditions. If the content of the hardening accelerator (d) is too small, the effects of using the hardening accelerator (d) cannot be sufficiently obtained. If the content of the hardening accelerator (d) is excessive, the high-polarity hardening accelerator (d) is at a high temperature 1. Under the condition of high humidity, in the curable resin layer, it will move to the interface side of the adherend and be biased. Analysis, which reduces the reliability of the package.
藉由使用具有會與無機化合物反應之官能基及會與有機官能基反應之官能基者作為偶合劑(e),可使硬化性樹脂層對被黏著體之接著性及密接性提高。又,藉由使用偶合劑(e),而使硬化性樹脂層硬化而獲得之硬化物可在無損其耐熱性下提高耐水性。 By using a functional group that can react with an inorganic compound and a functional group that can react with an organic functional group as the coupling agent (e), the adhesiveness and adhesiveness of the curable resin layer to the adherend can be improved. In addition, by using the coupling agent (e), the cured product obtained by curing the curable resin layer can improve water resistance without impairing its heat resistance.
偶合劑(e)係不相當於聚合物成分(a)及硬化性成分(b)之任一者之成分。 The coupling agent (e) is a component that does not correspond to any of the polymer component (a) and the curable component (b).
偶合劑(e)較佳為具有會與聚合物成分(a)、硬化性成分(b)等所具有之官能基反應之官能基的化合物,更佳為矽烷偶合劑。 The coupling agent (e) is preferably a compound having a functional group that reacts with a functional group possessed by the polymer component (a), curable component (b), etc., and more preferably is a silane coupling agent.
較佳之前述矽烷偶合劑可例示:γ-縮水甘油氧基丙基三甲氧基矽烷、γ-縮水甘油氧基丙基甲基二乙氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、γ-(甲基丙烯醯氧基丙基)三甲氧基矽烷、γ-胺基丙基三甲氧基矽烷、N-6-(胺基乙基)-γ-胺基丙基三甲氧基矽烷、N-6-(胺基乙基)-γ-胺基丙基甲基二乙氧基矽烷、N-苯基-γ-胺基丙基三甲氧基矽烷、γ-脲基丙基三乙氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、雙(3-三乙氧基矽基丙基)四硫烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、及咪唑矽 烷等。 Preferred examples of the aforementioned silane coupling agent are: γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, β-(3,4-epoxycyclohexyl) Ethyltrimethoxysilane, γ-(methacryloxypropyl)trimethoxysilane, γ-aminopropyltrimethoxysilane, N-6-(aminoethyl)-γ-amino Propyltrimethoxysilane, N-6-(aminoethyl)-γ-aminopropylmethyldiethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ- Ureidopropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, bis(3-triethoxysilylpropyl)tetrasulfane, Methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, and imidazolium Alkane etc.
偶合劑(e)可單獨使用前述中之1種,亦可併用2種以上。 The coupling agent (e) may be used alone or in combination of two or more.
於使用偶合劑(e)時,硬化性樹脂組成物之偶合劑(e)之含量相對於聚合物成分(a)及硬化性成分(b)之總含量100質量分,較佳為0.03質量分~20質量分,更佳為0.05質量分~10質量分,尤佳為0.1質量分~5質量分。若偶合劑(e)之含量過少,則有無法獲得使用偶合劑(e)所產生之前述效果之情況,另一方面,若偶合劑(e)之含量過多,則有產生釋氣之可能性。 When the coupling agent (e) is used, the content of the coupling agent (e) of the curable resin composition relative to the total content of the polymer component (a) and the curable component (b) is 100 parts by mass, preferably 0.03 parts by mass ~20 mass points, more preferably 0.05 to 10 mass points, particularly preferably 0.1 to 5 mass points. If the content of the coupling agent (e) is too small, the aforementioned effect produced by using the coupling agent (e) may not be obtained. On the other hand, if the content of the coupling agent (e) is too large, there is a possibility of outgassing .
於使用具有異氰酸酯基等可與其他化合物所具有之官能基鍵結之官能基的前述丙烯酸系樹脂作為聚合物成分(a)時,為了使該官能基與其他化合物鍵結而進行交聯,可使用交聯劑(f)。藉由如上述使用交聯劑(f)之交聯,可調節硬化性樹脂層之初始接著力及凝聚力。 When using the aforementioned acrylic resin having a functional group such as an isocyanate group which can be bonded to a functional group possessed by another compound as the polymer component (a), in order to crosslink the functional group with another compound, it may be Use crosslinker (f). By crosslinking using the crosslinking agent (f) as described above, the initial adhesive force and cohesive force of the curable resin layer can be adjusted.
交聯劑(f)可例示有機多元異氰酸酯化合物、有機多元亞胺化合物等。 Examples of the crosslinking agent (f) include organic polyisocyanate compounds and organic polyimide compounds.
交聯劑(f)係不相當於聚合物成分(a)及硬化性成分(b)之任一者之成分。 The crosslinking agent (f) is a component that does not correspond to any of the polymer component (a) and the curable component (b).
前述有機多元異氰酸酯化合物可例示:芳香族多元異 氰酸酯化合物、脂肪族多元異氰酸酯化合物、脂環族多元異氰酸酯化合物以及該等化合物之三聚物、異氰尿酸酯體及加成物(與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷或蓖麻油等含活性氫之低分子化合物的反應物,例如三羥甲基丙烷加成二甲苯二異氰酸酯等)、或使有機多元異氰酸酯化合物與多元醇化合物反應而獲得之末端異氰酸酯基之胺基甲酸酯預聚物等。 The aforementioned organic polyisocyanate compound can be exemplified by: aromatic polyisocyanate Cyanate compounds, aliphatic polyisocyanate compounds, cycloaliphatic polyisocyanate compounds and trimers, isocyanurate bodies and adducts of these compounds (with ethylene glycol, propylene glycol, neopentyl glycol, trivalent Reactants of low molecular compounds containing active hydrogen such as methylolpropane or castor oil, such as trimethylolpropane addition xylene diisocyanate, etc.), or terminal isocyanates obtained by reacting organic polyisocyanate compounds with polyol compounds Based on carbamate prepolymer and so on.
前述有機多元異氰酸酯化合物更具體而言可例示:2,4-甲苯二異氰酸酯;2,6-甲苯二異氰酸酯;1,3-二甲苯二異氰酸酯;1,4-二甲苯二異氰酸酯;二苯甲烷-4,4'-二異氰酸酯;二苯甲烷-2,4'-二異氰酸酯;3-甲基二苯甲烷二異氰酸酯;六亞甲基二異氰酸酯;異佛爾酮二異氰酸酯;二環己基甲烷-4,4'-二異氰酸酯;二環己基甲烷-2,4'-二異氰酸酯;於三羥甲基丙烷等多元醇之所有或一部分羥基加成甲苯二異氰酸酯及六亞甲基二異氰酸酯之任一者或兩者而成的化合物;離胺酸二異氰酸酯等。 The aforementioned organic polyisocyanate compound can be more specifically exemplified: 2,4-toluene diisocyanate; 2,6-toluene diisocyanate; 1,3-xylene diisocyanate; 1,4-xylene diisocyanate; diphenylmethane- 4,4'-diisocyanate; diphenylmethane-2,4'-diisocyanate; 3-methyldiphenylmethane diisocyanate; hexamethylene diisocyanate; isophorone diisocyanate; dicyclohexylmethane-4 ,4'-diisocyanate; dicyclohexylmethane-2,4'-diisocyanate; addition of toluene diisocyanate and hexamethylene diisocyanate to all or part of the hydroxyl groups of polyhydric alcohols such as trimethylolpropane Or a compound of both; diisocyanate of amine acid, etc.
前述有機多元亞胺化合物可例示:N,N'-二苯甲烷-4,4'-雙(1-氮丙啶羧基醯胺)、三羥甲基丙烷-三-β-氮丙啶基丙酸酯、四羥甲基甲烷-三-β-氮丙啶基丙酸酯、N,N'-甲苯-2,4-雙(1-氮丙啶羧基醯胺)三伸乙基三聚氰胺等。 The aforementioned organic polyimine compounds can be exemplified by: N,N'-diphenylmethane-4,4'-bis(1-aziridine carboxyamide), trimethylolpropane-tri-β-aziridinyl propane Ester, tetramethylolmethane-tri-β-aziridinyl propionate, N,N'-toluene-2,4-bis(1-aziridine carboxyamide) triethylidene melamine, etc.
於使用異氰酸酯系交聯劑作為交聯劑(f)時,聚合物 成分(a)之前述丙烯酸系樹脂較佳為使用含羥基之聚合物。於交聯劑(f)具有異氰酸酯基且丙烯酸系樹脂具有羥基時,藉由交聯劑(f)與丙烯酸系樹脂之反應,可於硬化性樹脂層簡便地導入交聯結構。 When an isocyanate-based crosslinking agent is used as the crosslinking agent (f), the polymer The aforementioned acrylic resin of component (a) is preferably a polymer containing a hydroxyl group. When the crosslinking agent (f) has an isocyanate group and the acrylic resin has a hydroxyl group, the crosslinking structure can be easily introduced into the curable resin layer by the reaction of the crosslinking agent (f) and the acrylic resin.
於使用交聯劑(f)時,硬化性樹脂組成物中之交聯劑(f)之含量相對於聚合物成分(a)之含量100質量分,較佳為0.01質量分~20質量分,更佳為0.1質量分~10質量分,尤佳為0.5質量分~5質量分。 When the crosslinking agent (f) is used, the content of the crosslinking agent (f) in the curable resin composition is 100 parts by mass relative to the content of the polymer component (a), preferably 0.01 to 20 parts by mass, More preferably, it is 0.1 to 10 mass points, and particularly preferably 0.5 to 5 mass points.
通用添加劑(g)可例示公知之塑化劑、抗靜電劑、抗氧化劑、顏料、染料、吸氣劑等。 The general additive (g) can be exemplified by well-known plasticizers, antistatic agents, antioxidants, pigments, dyes, getters, and the like.
通用添加劑(g)係不相當於聚合物成分(a)及硬化性成分(b)之任一者之成分。 The general additive (g) is a component that does not correspond to any of the polymer component (a) and the curable component (b).
硬化性樹脂組成物為了利用稀釋使其處理性良好,較佳為進一步含有溶劑。 In order to improve the handleability of the curable resin composition by dilution, it is preferable to further contain a solvent.
硬化性樹脂組成物所含有之溶劑可與前述黏著劑組成物中之溶劑相同。 The solvent contained in the curable resin composition may be the same as the solvent in the aforementioned adhesive composition.
硬化性樹脂組成物所含有之溶劑可僅為1種,亦可為2種以上。 The solvent contained in the curable resin composition may be only one kind, or two or more kinds.
就將硬化性樹脂組成物中所使用之各成分均勻混合而言,硬化性樹脂組成物所含有之溶劑較佳為甲基乙基酮等。 In order to uniformly mix the components used in the curable resin composition, the solvent contained in the curable resin composition is preferably methyl ethyl ketone or the like.
溶劑係不相當於聚合物成分(a)及硬化性成分(b)之任一者之成分。 The solvent system does not correspond to any of the polymer component (a) and the curable component (b).
硬化性樹脂層之前述聚合物成分(a)及硬化性成分(b)之總含量如上述般相對於硬化性樹脂層之總量為95質量%以上,更佳為97質量%以上,又更佳為98質量%以上。又,為了形成此種硬化性樹脂層,硬化性樹脂組成物之前述聚合物成分(a)及硬化性成分(b)之總含量相對於硬化性樹脂組成物中之溶劑以外之所有成分之總量為95質量%以上,更佳為97質量%以上,又更佳為98質量%以上。 The total content of the polymer component (a) and the curable component (b) of the curable resin layer is 95% by mass or more, more preferably 97% by mass or more relative to the total amount of the curable resin layer, as described above It is preferably over 98% by mass. In order to form such a curable resin layer, the total content of the aforementioned polymer component (a) and curable component (b) of the curable resin composition relative to the total content of all components other than the solvent in the curable resin composition The amount is 95% by mass or more, more preferably 97% by mass or more, and still more preferably 98% by mass or more.
又,前述硬化性樹脂層中之聚合物成分(a)及硬化性成分(b)之總含量可相對於硬化性樹脂層之總量為100質量%。 In addition, the total content of the polymer component (a) and the curable component (b) in the curable resin layer may be 100% by mass relative to the total amount of the curable resin layer.
硬化性樹脂組成物係藉由調配用於構成其之前述各成分而獲得,例如除調配成分不同以外,利用與前述黏著劑組成物時同樣之方法而獲得。 The curable resin composition is obtained by blending the aforementioned components for constituting the same. For example, except that the blending ingredients are different, the same method as in the case of the aforementioned adhesive composition is obtained.
於使用溶劑時,可藉由將溶劑與溶劑以外之任意調配成分混合並預先將該調配成分稀釋而使用,亦可不預先稀釋溶劑以外之任意調配成分而藉由將溶劑與該等調配成分混合而使用。 When a solvent is used, it can be used by mixing the solvent with any formulation components other than the solvent and diluting the formulation component in advance, or by mixing the solvent with these formulation components without diluting any formulation components other than the solvent in advance use.
再者,關於本發明之具有樹脂層的工件固定片中所說明之半導體晶片之易拾取性,例如可將具有樹脂層的工件固定片表面之半導體晶片使用市售之黏晶機,將針之頂起速度及頂起高度設定為特定條件,根據於該條件下是否能拾取半導體晶片而進行評價。此時,對例如共100個晶片連續執行拾取,於所有晶片之拾取成功時、或者在1個以上晶片之拾取成功後第2個以後之晶片之任一個的拾取失敗之程度時,可判斷為易拾取性相對良好。 Furthermore, regarding the ease of picking up the semiconductor wafer described in the workpiece fixing sheet with a resin layer of the present invention, for example, a semiconductor wafer on the surface of the workpiece fixing sheet with a resin layer can be used with a commercially available die bonding machine The jacking speed and jacking height are set to specific conditions, and evaluation is made based on whether the semiconductor wafer can be picked up under these conditions. At this time, for example, when 100 wafers are continuously picked up, when the picking of all wafers is successful, or the picking degree of any one of the second and subsequent wafers after the picking of more than one wafer is successful, it can be determined as Easy to pick up is relatively good.
本發明之具有樹脂層的工件固定片例如可藉由如下方式製造:於基材膜上使用前述黏著劑組成物形成黏著劑層,且於前述黏著劑層上使用前述硬化性樹脂組成物形成硬化性樹脂層。 The workpiece fixing sheet having a resin layer of the present invention can be manufactured, for example, by forming an adhesive layer on the base film using the adhesive composition, and using the curable resin composition on the adhesive layer to form and harden Sexual resin layer.
黏著劑層可藉由在基材膜之表面(圖1中為基材膜11之表面11a)塗佈黏著劑組成物並使其乾燥而形成。此時,亦可視需要藉由對所塗佈黏著劑組成物加熱而進行交聯。加熱條件例如可設為於100℃~130℃進行1分鐘~5分鐘,但並不限定於此。又,將藉由在剝離材之剝離層表面塗佈黏著劑組成物並乾燥而形成之黏著劑層貼合於基材膜之表面,去除前述剝離材,藉此亦可形成黏著劑層。
The adhesive layer can be formed by applying and drying an adhesive composition on the surface of the base film (the
於基材膜之表面或剝離材之剝離層表面塗佈黏著劑組成物係利用公知方法進行即可,可例示使用氣刀塗佈機、刮刀塗佈機、棒式塗佈機、凹版塗佈機、輥式塗佈機、輥刀塗佈機、簾幕塗佈機、模塗機、刀式塗佈機、絲網塗佈機、線棒塗佈機、接觸式塗佈機等各種塗佈機之方法。 The application of the adhesive composition on the surface of the base film or the surface of the release layer of the release material may be performed by a known method, and examples include air knife coater, blade coater, bar coater, and gravure coating. Machine, roll coater, roll knife coater, curtain coater, die coater, knife coater, screen coater, wire bar coater, contact coater, etc. The method of cloth machine.
硬化性樹脂層係可使用硬化性樹脂組成物,並利用與如上述之於基材膜上形成黏著劑層時同樣之方法而形成,但通常難以於黏著劑層上直接塗佈硬化性樹脂組成物。因此,較佳為預先另外形成硬化性樹脂層再將其貼合於黏著劑層之表面之方法,例如將藉由在剝離材之剝離層表面塗佈硬化性樹脂組成物並乾燥而形成之硬化性樹脂層貼合於黏著劑層之表面,且去除前述剝離材等。 The curable resin layer can be formed using a curable resin composition and in the same manner as when forming the adhesive layer on the base film as described above, but it is usually difficult to apply the curable resin composition directly on the adhesive layer Thing. Therefore, it is preferable to separately form a hardenable resin layer in advance and attach it to the surface of the adhesive layer, for example, a hardener formed by coating a hardenable resin composition on the surface of the release layer of the release material and drying The resin layer is attached to the surface of the adhesive layer, and the peeling material and the like are removed.
又,本發明之具有樹脂層的工件固定片除前述方法以外,例如亦可藉由如下方式製造:使用前述黏著劑組成物形成黏著劑層,且使用前述硬化性樹脂組成物形成硬化性樹脂層之後,重疊前述黏著劑層及硬化性樹脂層而製成積層體,且於該積層體之前述黏著劑層之表面貼合基材膜。 Furthermore, in addition to the aforementioned method, the work fixing sheet having a resin layer of the present invention can be manufactured, for example, by forming the adhesive layer using the adhesive composition and forming the curable resin layer using the curable resin composition Thereafter, the adhesive layer and the curable resin layer are superimposed to form a laminate, and the base film is bonded to the surface of the adhesive layer of the laminate.
此時之黏著劑層及硬化性樹脂層之形成條件與前述方法相同。 The conditions for forming the adhesive layer and the curable resin layer at this time are the same as the aforementioned method.
以下利用具體實施例更詳細地說明本發明。但,本發 明並不受以下所示實施例限定。 The present invention will be described in more detail below using specific examples. However, this post The description is not limited by the examples shown below.
製造圖1所示構成之具有樹脂層的工件固定片。更具體而言係如下所述。 A work piece having a resin layer having the structure shown in FIG. 1 is manufactured. More specifically, it is as follows.
於具備冷卻管、氮導入管、溫度計及攪拌裝置之反應容器加入丙烯酸月桂酯(以下簡稱為「LA」)(80質量分)、丙烯酸-2-羥基乙酯(以下簡稱為「HEA」)(20質量分)、過氧化苯甲醯(0.2質量分)、乙酸乙酯(70質量分)、甲苯(30質量分),於氮氣流中在60℃進行8小時聚合反應,藉此獲得丙烯酸系聚合物(A)。將各成分之調配比示於下述表1。 Add lauryl acrylate (hereinafter referred to as "LA") (80 parts by mass) and 2-hydroxyethyl acrylate (hereinafter referred to as "HEA") to a reaction vessel equipped with a cooling tube, nitrogen introduction tube, thermometer, and stirring device 20 parts by mass), benzoyl peroxide (0.2 parts by mass), ethyl acetate (70 parts by mass), toluene (30 parts by mass), and a polymerization reaction was carried out in a nitrogen stream at 60°C for 8 hours, thereby obtaining an acrylic system Polymer (A). The compounding ratio of each component is shown in Table 1 below.
於該丙烯酸系聚合物(A)加入異氰酸2-甲基丙烯醯氧基乙酯(以下簡稱為「MOI」)(22質量分,相對於HEA為約80莫耳%)、月桂酸二丁基錫(以下簡稱為「DBTL」)(0.13質量分),於空氣氣流中在23℃進行12小時加成反應,藉此以47質量%溶液之狀態獲得目標之丙烯酸烷酯聚合物(A-1)。將各成分之調配比示於下述表1。 To this acrylic polymer (A) was added 2-methacryloxyethyl isocyanate (hereinafter referred to as "MOI") (22 parts by mass, about 80 mol% relative to HEA), lauric acid di Butyl tin (hereinafter abbreviated as "DBTL") (0.13 parts by mass) was added in an air stream at 23°C for 12 hours to obtain the target alkyl acrylate polymer (A-1) in the state of a 47% by mass solution ). The compounding ratio of each component is shown in Table 1 below.
對於前述獲得之丙烯酸烷酯聚合物(A-1)(100質量 分)加入光聚合起始劑(Z-1)(Ciba Specialty Chemicals公司製造之「Irgacure 651」,二苯基乙二酮二甲基縮酮)(3質量分)、作為反應延遲劑之乙醯丙酮(1質量分),且利用甲基乙基酮稀釋之後,進行充分攪拌,進一步於其中加入作為異氰酸酯系交聯劑(B-1)之三羥甲基丙烷之甲苯二異氰酸酯三聚物加成物(Nippon Polyurethane公司製造之「Coronate L」)(7.5質量分,相對於丙烯酸酯聚合物(A-1)中之殘存羥基1莫耳,所具有之異氰酸酯基成為1莫耳之量),於23℃進行攪拌,藉此獲得固體成分濃度為25質量%之黏著劑組成物。再者,該「黏著劑組成物之製造」中之調配分數均為固體成分換算值。將各成分之調配比示於下述表1。 For the alkyl acrylate polymer (A-1) obtained above (100 mass Points) Add a photopolymerization initiator (Z-1) ("Irgacure 651" manufactured by Ciba Specialty Chemicals, diphenylethanedione dimethyl ketal) (3 parts by mass), and acetone as a reaction delay agent Acetone (1 part by mass), diluted with methyl ethyl ketone, fully stirred, and further added thereto is toluene diisocyanate trimer of trimethylolpropane as the isocyanate-based crosslinking agent (B-1). The finished product ("Coronate L" manufactured by Nippon Polyurethane) (7.5 parts by mass, with respect to 1 mole of residual hydroxyl groups in the acrylate polymer (A-1), the amount of isocyanate groups it has becomes 1 mole), The mixture was stirred at 23°C to obtain an adhesive composition having a solid content concentration of 25% by mass. In addition, the compounding score in this "manufacture of adhesive composition" is the conversion value of solid content. The compounding ratio of each component is shown in Table 1 below.
於聚對苯二甲酸乙二酯(PET)剝離襯墊之經實施聚矽氧處理之剝離面上塗佈前述獲得之黏著劑組成物,於120℃進行2分鐘加熱乾燥,而形成厚度10μm之黏著劑層。然後於該黏著劑層之表面貼合作為基材膜之厚度100μm之乙烯/甲基丙烯酸聚合物膜,且於23℃保存168小時,藉此獲得工件固定片。 Apply the adhesive composition obtained above to the release surface of polyethylene terephthalate (PET) release liner subjected to polysiloxane treatment, heat-dry at 120°C for 2 minutes to form a thickness of 10 μm Adhesive layer. Then, an ethylene/methacrylic acid polymer film with a thickness of 100 μm as a base film was laminated on the surface of the adhesive layer, and stored at 23° C. for 168 hours, thereby obtaining a workpiece fixing sheet.
將丙烯酸系樹脂(Nagase Chemtex公司製造之「SG-P3」)(87.8質量分)、環氧樹脂(日本化藥公司 製造之「NC-3000」)(12質量分)、酚樹脂(明和化成公司製造之「MEH-7851-H」)(10質量分)、作為硬化促進劑之三苯基膦(0.2質量分)、及矽烷偶合劑(Shin-Etsu Silicone公司製造之「KBM403」,3-縮水甘油氧基丙基三甲氧基矽烷)(1質量分)溶解於甲基乙基酮中,而獲得作為硬化性樹脂組成物之固體成分濃度為20質量%之甲基乙基酮溶液。 Acrylic resin ("SG-P3" manufactured by Nagase Chemtex) (87.8 parts by mass), epoxy resin (Nippon Kayaku Co., Ltd.) Manufactured "NC-3000") (12 parts by mass), phenol resin ("MEH-7851-H" manufactured by Meiwa Chemical Co., Ltd.) (10 parts by mass), and triphenylphosphine (0.2 parts by mass) as a hardening accelerator , And a silane coupling agent ("KBM403" manufactured by Shin-Etsu Silicone, 3-glycidoxypropyltrimethoxysilane) (1 part by mass) dissolved in methyl ethyl ketone to obtain a hardening resin A methyl ethyl ketone solution having a solid content concentration of 20% by mass in the composition.
於剝離襯墊(Lintec公司製造之「SP-PET381031」)上塗佈前述獲得之硬化性樹脂組成物,於100℃乾燥1分鐘,而形成厚度20μm之硬化性樹脂層。又,於硬化性樹脂層貼合與前述同種之剝離襯墊。又,進一步以將貼合之剝離襯墊與硬化性樹脂層切斷之方式半切為直徑150mm之圓形後,去除圓形外側之不要部分。然後,自前述獲得之工件固定片去除剝離襯墊。又,自前述硬化性樹脂層去除一併半切之剝離襯墊,且於硬化性樹脂層之表面貼合工件固定片之黏著劑層,藉此獲得具有樹脂層的工件固定片。 The curable resin composition obtained above was coated on a release liner ("SP-PET381031" manufactured by Lintec), and dried at 100°C for 1 minute to form a 20 μm-thick curable resin layer. In addition, a release liner of the same kind as described above is bonded to the curable resin layer. Furthermore, after cutting the bonded release liner and the curable resin layer in half to form a circle with a diameter of 150 mm, unnecessary portions outside the circle are removed. Then, the release liner is removed from the work fixing sheet obtained previously. In addition, the half-cut release liner is removed from the curable resin layer, and the adhesive layer of the work fixing sheet is bonded to the surface of the hardening resin layer, thereby obtaining a work fixing sheet having a resin layer.
針對前述獲得之具有樹脂層的工件固定片,利用下述方法評價易拾取性。 For the work fixing sheet having a resin layer obtained as described above, the ease of pick-up was evaluated by the following method.
使用貼膜機(Lintec公司製造之「Adwill RAD2500」)在60℃於矽晶圓(直徑150mm,厚度100μm)之2000號研磨面貼附前述獲得之具有樹脂層的工件固定片。然後將其固定於晶圓切割用環狀框架後,使用切割裝置(DISCO公司製造之「DFD651」)將矽晶圓切割成10mm×10mm之尺寸,而獲得晶片。於該切割時,自表面切入基材膜20μm。接著使用紫外線照射裝置(Lintec公司製造之「Adwill RAD2000」),於220mW/cm2、190mJ/cm2之條件下自基材膜側對具有樹脂層的工件固定片照射紫外線。然後,使用黏晶機(Canon Machinery公司製造之「BESTEM-D02」),評價於將針之頂起速度設為1mm/s、頂起高度設為0.2mm時是否能拾取晶片。針係在8mm之四個方角配置4個銷。評價係藉由對100個晶片連續執行拾取而進行,將所有晶片拾取成功之情況評價為「A」,將在1個以上晶片拾取成功後第2個以後之晶片之任一個拾取失敗之情況評價為「A1」,將最初之晶片便失敗之情況評價為「B」。將結果示於下述表1。 Using a laminating machine ("Adwill RAD2500" manufactured by Lintec), the work piece with a resin layer obtained above was attached to the polished surface of silicon wafer (diameter 150mm, thickness 100μm) at 60°C. After fixing it to the ring frame for wafer dicing, the silicon wafer was cut into a size of 10 mm×10 mm using a dicing device (“DFD651” manufactured by DISCO) to obtain a wafer. At the time of this cutting, the base film was cut into 20 μm from the surface. Then ultraviolet irradiation device (manufactured by Lintec Corporation's "Adwill RAD2000") at 220mW / cm 2, at 190mJ / cm 2 of the conditions from the side of the substrate film irradiated with ultraviolet rays for fixing the workpiece sheet with a resin layer. Then, using a die-bonding machine ("BESTEM-D02" manufactured by Canon Machinery Co., Ltd.), it was evaluated whether the wafer could be picked up when the pin-up speed was set to 1 mm/s and the lift height was set to 0.2 mm. The needle system is equipped with four pins at four square corners of 8mm. The evaluation is carried out by continuously picking up 100 wafers, and all wafers are successfully picked up as "A", and after one or more wafers are successfully picked up, any one of the second and subsequent wafers fails to be evaluated. It is "A1", and the case where the initial chip fails is evaluated as "B". The results are shown in Table 1 below.
將丙烯酸烷酯聚合物製造時之調配成分、硬化性樹脂組成物製造時之調配成分設為如下述表1所示,除此以外與實施例1同樣地製造並評價具有樹脂層的工件固定片。將結果示於下述表1。 The formulation component at the time of manufacture of the alkyl acrylate polymer and the formulation component at the time of manufacture of the curable resin composition were as shown in Table 1 below, except that the workpiece fixing sheet having a resin layer was manufactured and evaluated in the same manner as in Example 1. . The results are shown in Table 1 below.
再者,將此處獲得之丙烯酸烷酯聚合物分別設為丙烯酸烷酯聚合物(A-2)(實施例2)、丙烯酸烷酯聚合物(R-1)(比較例1)、丙烯酸烷酯聚合物(R-2)(比較例2、參考例1)。 In addition, the alkyl acrylate polymer obtained here is made into alkyl acrylate polymer (A-2) (Example 2), alkyl acrylate polymer (R-1) (Comparative Example 1), alkyl acrylate Ester polymer (R-2) (Comparative Example 2, Reference Example 1).
又,所有實施例、比較例及參考例中,均調整甲基乙基酮之量而將黏著劑組成物之固體成分濃度調整為25質量%。 In all the examples, comparative examples, and reference examples, the amount of methyl ethyl ketone was adjusted to adjust the solid content concentration of the adhesive composition to 25% by mass.
再者,下述表1中,「2EHA」表示丙烯酸2-乙基己酯,「ISTA」表示丙烯酸異硬脂酯,「MA」表示丙烯酸甲酯。 In addition, in Table 1 below, "2EHA" represents 2-ethylhexyl acrylate, "ISTA" represents isostearyl acrylate, and "MA" represents methyl acrylate.
又,「填充材料」為Admatechs公司製造之「SC2050MA」。 The "filling material" is "SC2050MA" manufactured by Admatechs.
又,調配成分一欄之「-」表示未調配該成分。 In addition, "-" in the field of compounding ingredients means that the ingredients are not blended.
如表1所示,實施例1~2之具有樹脂層的工件固定片 於丙烯酸烷酯聚合物(前述聚合物(A-1)、(A-2))之製造時,使用LA(烷基碳數為12)或ISTA(烷基碳數為18)作為丙烯酸烷酯,且將硬化性樹脂層之聚合物成分(a)及硬化性成分(b)之總含量設為98.9質量%,而具有易拾取性。 As shown in Table 1, the workpiece fixing pieces with resin layers of Examples 1 to 2 For the production of alkyl acrylate polymers (the aforementioned polymers (A-1) and (A-2)), use LA (alkyl carbon number 12) or ISTA (alkyl carbon number 18) as alkyl acrylate And, the total content of the polymer component (a) and the curable component (b) of the curable resin layer is set to 98.9% by mass, and it is easy to pick up.
對此,比較例1~2之具有樹脂層的工件固定片於丙烯酸烷酯聚合物(前述聚合物(R-1)、(R-2))之製造時,使用MA(烷基碳數為1)或2EHA(烷基碳數為8)作為丙烯酸烷酯,而不具有易拾取性。 In this regard, in the manufacture of the workpiece fixing sheet having a resin layer of Comparative Examples 1 to 2 in an alkyl acrylate polymer (the aforementioned polymers (R-1), (R-2)), MA (the alkyl carbon number is 1) or 2EHA (the alkyl carbon number is 8) as an alkyl acrylate, which does not have easy pick-up.
參考例1之具有樹脂層的工件固定片雖於丙烯酸烷酯聚合物之製造時使用MA作為丙烯酸烷酯,但硬化性樹脂層中含有填充劑,而具有易拾取性。 Although the work fixing sheet with a resin layer of Reference Example 1 uses MA as the alkyl acrylate in the production of the alkyl acrylate polymer, the curable resin layer contains a filler and is easy to pick up.
再者,如表1所示,前述各例中係無在1個以上晶片拾取成功後第2個以後之晶片之任一個的拾取失敗之情況,即易拾取性為「A1」之評價之例。 In addition, as shown in Table 1, in the foregoing examples, there is no case where any one of the second and subsequent wafers fails to be picked up after one or more wafers are successfully picked up, that is, an evaluation example where the ease of picking is "A1" .
本發明可用於半導體晶片等之製造。 The invention can be used in the manufacture of semiconductor wafers and the like.
1‧‧‧工件固定片 1‧‧‧Workpiece fixing piece
10‧‧‧具有樹脂層的工件固定片 10‧‧‧Work piece with resin layer
11‧‧‧基材膜 11‧‧‧ Base film
11a‧‧‧基材膜之表面 11a‧‧‧Surface of substrate film
12‧‧‧黏著劑層 12‧‧‧Adhesive layer
12a‧‧‧黏著劑層之表面 12a‧‧‧Surface of adhesive layer
13‧‧‧硬化性樹脂層 13‧‧‧curable resin layer
13a‧‧‧硬化性樹脂層之表面 13a‧‧‧The surface of the hardening resin layer
14‧‧‧剝離膜 14‧‧‧ peeling film
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-192505 | 2014-09-22 | ||
JP2014192505 | 2014-09-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201623505A TW201623505A (en) | 2016-07-01 |
TWI688633B true TWI688633B (en) | 2020-03-21 |
Family
ID=55581092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104130756A TWI688633B (en) | 2014-09-22 | 2015-09-17 | Work fixing sheet having resin layer |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6817813B2 (en) |
KR (1) | KR102421250B1 (en) |
CN (1) | CN106661395B (en) |
SG (1) | SG11201610483UA (en) |
TW (1) | TWI688633B (en) |
WO (1) | WO2016047565A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7240378B2 (en) * | 2018-03-30 | 2023-03-15 | リンテック株式会社 | Laminate for preventing warp of cured sealant, and method for manufacturing cured sealant |
CN109456708B (en) * | 2018-11-06 | 2021-03-02 | 合肥鑫晟光电科技有限公司 | Adhesive film, packaging method of display panel and display device |
JP7349261B2 (en) * | 2019-05-28 | 2023-09-22 | 日東電工株式会社 | Dicing tape and dicing die bond film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI403568B (en) * | 2010-02-01 | 2013-08-01 | Nitto Denko Corp | Thin film for fabrication of semiconductor and method of fabricating semiconductor apparatus |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4300393B2 (en) * | 2002-07-04 | 2009-07-22 | 日立化成工業株式会社 | Adhesive sheet, semiconductor device and manufacturing method thereof |
JP4275522B2 (en) * | 2003-12-26 | 2009-06-10 | 日東電工株式会社 | Dicing die bond film |
JP2006245352A (en) * | 2005-03-04 | 2006-09-14 | Nitta Ind Corp | Wafer dicing tape, and semiconductor-chip picking-up method |
JP4794971B2 (en) * | 2005-03-23 | 2011-10-19 | 古河電気工業株式会社 | Dicing die bond sheet |
JP4822885B2 (en) * | 2006-03-14 | 2011-11-24 | 日東電工株式会社 | Adhesive sheet for semiconductor |
JP2007258437A (en) * | 2006-03-23 | 2007-10-04 | Nippon Steel Chem Co Ltd | Die bond dicing laminate film |
JP2007254590A (en) * | 2006-03-23 | 2007-10-04 | Nippon Steel Chem Co Ltd | Die bond dicing film |
JP4717051B2 (en) * | 2007-11-08 | 2011-07-06 | 日東電工株式会社 | Dicing die bond film |
JP4994429B2 (en) * | 2008-08-04 | 2012-08-08 | 日東電工株式会社 | Dicing die bond film |
EP2151857A2 (en) * | 2008-08-04 | 2010-02-10 | Nitto Denko Corporation | Dicing die-bonding film |
JP4845065B2 (en) * | 2009-08-05 | 2011-12-28 | 古河電気工業株式会社 | Adhesive film and tape for semiconductor wafer processing |
JP5143196B2 (en) * | 2009-09-28 | 2013-02-13 | 日東電工株式会社 | Film for semiconductor devices |
JP2011174042A (en) * | 2010-02-01 | 2011-09-08 | Nitto Denko Corp | Film for producing semiconductor device and method for producing semiconductor device |
WO2012017568A1 (en) * | 2010-08-05 | 2012-02-09 | 古河電気工業株式会社 | Adhesive film and tape for semiconductor wafer processing |
JP5781302B2 (en) | 2010-12-28 | 2015-09-16 | 日東電工株式会社 | Radiation curable pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet |
JP5184685B1 (en) * | 2011-09-26 | 2013-04-17 | 古河電気工業株式会社 | Semiconductor wafer processing tape |
JP5294358B2 (en) * | 2012-01-06 | 2013-09-18 | 古河電気工業株式会社 | Wafer processing tape and semiconductor device manufacturing method using the same |
JP6333596B2 (en) * | 2014-03-26 | 2018-05-30 | リンテック株式会社 | Manufacturing method of workpiece fixing sheet with resin layer |
-
2015
- 2015-09-17 TW TW104130756A patent/TWI688633B/en active
- 2015-09-17 SG SG11201610483UA patent/SG11201610483UA/en unknown
- 2015-09-17 WO PCT/JP2015/076548 patent/WO2016047565A1/en active Application Filing
- 2015-09-17 KR KR1020177000230A patent/KR102421250B1/en active Active
- 2015-09-17 CN CN201580037767.4A patent/CN106661395B/en active Active
- 2015-09-17 JP JP2016550156A patent/JP6817813B2/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI403568B (en) * | 2010-02-01 | 2013-08-01 | Nitto Denko Corp | Thin film for fabrication of semiconductor and method of fabricating semiconductor apparatus |
Also Published As
Publication number | Publication date |
---|---|
CN106661395B (en) | 2021-05-28 |
WO2016047565A1 (en) | 2016-03-31 |
KR20170058910A (en) | 2017-05-29 |
KR102421250B1 (en) | 2022-07-14 |
JP6817813B2 (en) | 2021-01-20 |
CN106661395A (en) | 2017-05-10 |
SG11201610483UA (en) | 2017-03-30 |
JPWO2016047565A1 (en) | 2017-06-29 |
TW201623505A (en) | 2016-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104937712B (en) | Diaphragm formation is with film and diaphragm formation composite sheet | |
TWI592455B (en) | An adhesive composition, an adhesive sheet, and the manufacturing method of a semiconductor device | |
TWI705116B (en) | Composite sheet for forming protective film and method for producing the same | |
TWI669363B (en) | Reagent composition, adhesive sheet, and method of manufacturing semiconductor device | |
TWI600740B (en) | Sheet having a curable resin film-forming layer, and method of manufacturing the semiconductor device using the same | |
TWI740500B (en) | Film adhesive composite sheet, and method of producing semiconductor device | |
TWI591140B (en) | An adhesive composition, a sheet, and a method of manufacturing a semiconductor device | |
JP6333596B2 (en) | Manufacturing method of workpiece fixing sheet with resin layer | |
JP2012167174A (en) | Adhesive composition, adhesive sheet, and method of manufacturing semiconductor device | |
JP5237647B2 (en) | Adhesive composition, adhesive sheet and method for producing semiconductor device | |
TWI688633B (en) | Work fixing sheet having resin layer | |
US7851335B2 (en) | Adhesive composition, adhesive sheet and production method of semiconductor device | |
JP5005325B2 (en) | Adhesive composition, adhesive sheet and method for producing semiconductor device | |
JP2013062446A (en) | Dicing-die bonding sheet | |
JP5414256B2 (en) | Adhesive composition, adhesive sheet, and method for manufacturing semiconductor device | |
JP6279319B2 (en) | Composite sheet for resin film formation | |
JP6205646B2 (en) | Composite sheet for die bonding | |
TWI825080B (en) | Method for manufacturing semiconductor chip | |
JP6547220B2 (en) | Adhesive for die bonding | |
JP2016143676A (en) | Die bonding sheet | |
JP2016113562A (en) | Adhesive for die adhesion | |
JP6029536B2 (en) | Adhesive composition, adhesive sheet, and method for manufacturing semiconductor device | |
JP2013062445A (en) | Dicing-die bonding sheet |