TWI670507B - Production method of radiation image detecting device - Google Patents
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- TWI670507B TWI670507B TW103127007A TW103127007A TWI670507B TW I670507 B TWI670507 B TW I670507B TW 103127007 A TW103127007 A TW 103127007A TW 103127007 A TW103127007 A TW 103127007A TW I670507 B TWI670507 B TW I670507B
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Abstract
本發明提供一種放射線圖像檢測裝置的製造方法,當利用黏著層將螢光體基板貼合於光電轉換面板時抑制氣泡的產生。當利用黏著層29將螢光體基板27與光電轉換面板21加以接合時,使貼合輥123,在以20N/cm以上且35N/cm以下的線壓力按壓至支撐體的與螢光體層側的面為相反側的面的狀態下,以20mm/s以上且50mm/s以下的速度進行移動,所述螢光體基板27包括形成於支撐體25上而將放射線轉換成可見光的螢光體層20,所述光電轉換面板21接收可見光而對放射線圖像進行檢測。 The present invention provides a method of manufacturing a radiation image detecting apparatus which suppresses generation of bubbles when a phosphor substrate is bonded to a photoelectric conversion panel by an adhesive layer. When the phosphor substrate 27 and the photoelectric conversion panel 21 are joined by the adhesive layer 29, the bonding roller 123 is pressed against the phosphor layer side of the support at a line pressure of 20 N/cm or more and 35 N/cm or less. The surface of the opposite surface is moved at a speed of 20 mm/s or more and 50 mm/s or less, and the phosphor substrate 27 includes a phosphor layer formed on the support 25 to convert radiation into visible light. 20. The photoelectric conversion panel 21 receives visible light and detects a radiographic image.
Description
本發明是有關於一種放射線圖像檢測裝置的製造方法,藉由閃爍器(scintillator)將放射線轉換成可見光而對放射線圖像進行檢測。 The present invention relates to a method of manufacturing a radiation image detecting apparatus for detecting a radiation image by converting radiation into visible light by a scintillator.
在醫療領域等,各種放射線圖像檢測裝置被投入實際應用,所述放射線圖像檢測裝置藉由對被攝體照射X射線等放射線,並對穿透被攝體的放射線進行檢測,來檢測被攝體的放射線圖像。作為此種放射線圖像檢測裝置,如下的數位放射線攝影(Digital Radiography,DR)方式得到普及,即,根據放射線的入射而生成電荷,將所生成的電荷轉換成電壓而生成表示放射線圖像的數位格式的圖像資料。 In the medical field, etc., various types of radiation image detecting apparatuses are used to detect radiation of X-rays and the like, and to detect radiation that penetrates the subject. Radiographic image of the subject. As such a radiographic image detecting apparatus, a digital radiography (DR) method in which electric charges are generated in accordance with incidence of radiation, and the generated electric charge is converted into a voltage to generate a digital image indicating a radiographic image is used. Format image data.
作為所述DR方式的放射線圖像檢測裝置,有直接轉換方式者及間接轉換方式者,所述直接轉換方式者是藉由硒等的半導體層而將放射線直接轉換成電荷,所述間接轉換方式者是藉由閃爍器(scintillator)而將放射線轉換成光,並藉由包含光電二極體(photodiode)等的光電轉換面板而轉換成電荷。 The radiation image detecting device of the DR system includes a direct conversion method in which a radiation is directly converted into a charge by a semiconductor layer such as selenium, and an indirect conversion method, and the indirect conversion method. Radiation is converted into light by a scintillator, and converted into electric charge by a photoelectric conversion panel including a photodiode or the like.
間接轉換方式的放射線圖像檢測裝置中所使用的閃爍器是由可將放射線轉換成可見光的螢光體(例如,鋱活化硫氧化釓GOS(Gd2O2S:Tb)等的粒子或碘化銫CsI:Tl等的柱狀晶體)所形成。所述閃爍器亦可在光電轉換面板的攝影面上直接塗佈(或蒸鍍)螢光體而形成,但主流方法是在支撐體上預先塗佈螢光體層而製作螢光體基板,將所述螢光體基板隔著黏著層貼合於光電轉換面板的攝影面。作為支撐體,是使用聚對苯二甲酸乙二醇酯(polyethylene terephthalate,PET)等樹脂基板或非晶碳(amorphous carbon)基板等。 The scintillator used in the radiation image detecting device of the indirect conversion method is a phosphor that can convert radiation into visible light (for example, particles or iodine such as strontium sulphur oxide sulphur oxide GOS (Gd 2 O 2 S: Tb). It is formed by a columnar crystal of CsI: Tl or the like. The scintillator may be formed by directly coating (or vapor-depositing) a phosphor on the imaging surface of the photoelectric conversion panel, but the mainstream method is to apply a phosphor layer on the support to prepare a phosphor substrate. The phosphor substrate is bonded to the imaging surface of the photoelectric conversion panel via an adhesive layer. As the support, a resin substrate such as polyethylene terephthalate (PET) or an amorphous carbon substrate or the like is used.
作為將螢光體基板貼合於光電轉換面板的方法,例如已知有如下方法:將螢光體基板隔著黏著層積層於光電轉換面板上,並在螢光體基板上利用貼合輥進行按壓(專利文獻1~專利文獻3)。 As a method of bonding a phosphor substrate to a photoelectric conversion panel, for example, a method is known in which a phosphor substrate is laminated on a photoelectric conversion panel via an adhesive layer, and a bonding roller is used on the phosphor substrate. Pressing (Patent Document 1 to Patent Document 3).
[現有技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本專利特開2005-062016號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-062016
[專利文獻2]日本專利特開2001-145109號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2001-145109
[專利文獻3]日本專利特開2003-066147號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2003-066147
然而,如專利文獻1~專利文獻3所記載,存在如下情況:當將螢光體基板貼合於光電轉換面板時,直徑為毫米級的氣 泡混入至螢光體與光電轉換面板之間的黏著層。由於光電轉換面板的畫素尺寸為150μm×150μm左右,因此毫米級的氣泡會導致圖像缺陷產生。 However, as described in Patent Document 1 to Patent Document 3, when the phosphor substrate is bonded to the photoelectric conversion panel, the gas having a diameter of millimeters is used. The bubble is mixed into the adhesive layer between the phosphor and the photoelectric conversion panel. Since the pixel size of the photoelectric conversion panel is about 150 μm × 150 μm, bubbles of a millimeter order may cause image defects.
又,存在如下情況:在黏著層上產生直徑為數十微米級程度的小徑的氣泡。此種小徑的氣泡充分小於光電轉換面板的畫素尺寸,因此當氣泡為孤立狀時,不會產生圖像缺陷。但是,容易密集地產生多個小徑的氣泡。小徑的氣泡存在藉由密集而在整體上達到毫米級直徑的情況,此時,與大徑的氣泡同樣,會導致圖像缺陷產生。又,在密集產生有小徑的氣泡的部位,亦存在黏著層的黏著力下降的問題。 Further, there is a case where bubbles having a small diameter of a few tens of micrometers are generated on the adhesive layer. The bubble of such a small diameter is sufficiently smaller than the pixel size of the photoelectric conversion panel, so that when the bubble is isolated, no image defect occurs. However, it is easy to densely generate a plurality of small-diameter bubbles. The small-diameter bubbles have a millimeter-scale diameter as a whole by being dense, and at this time, as with the large-diameter bubbles, image defects are caused. Further, in a portion where bubbles having a small diameter are densely generated, there is also a problem that the adhesive force of the adhesive layer is lowered.
本發明的放射線圖像檢測裝置的製造方法的目的在於,當隔著黏著層將在支撐體上形成有螢光體的螢光體基板貼合於光電轉換面板時,抑制由大徑的氣泡所引起的圖像缺陷或密集的小徑的氣泡的產生。 An object of the method for producing a radiation image detecting apparatus according to the present invention is to suppress a bubble having a large diameter when a phosphor substrate having a phosphor formed on a support is bonded to a photoelectric conversion panel via an adhesive layer. Causes image defects or the generation of dense small-diameter bubbles.
本發明的放射線圖像檢測裝置的製造方法製造放射線圖像檢測裝置,所述放射線圖像檢測裝置包括:螢光體基板,包括支撐體及形成於所述支撐體上而將放射線轉換成可見光的螢光體層;光電轉換面板,接收可見光而對放射線圖像進行檢測;以及黏著層,設置於螢光體基板的螢光體層側的面上,用以與光電轉換面板接合,且所述放射線圖像檢測裝置的製造方法是使貼合輥在以20N/cm以上且35N/cm以下的線壓力(linear pressure) 按壓至支撐體的與螢光體層側的面為相反側的面的狀態下,以20mm/s以上且50mm/s以下的速度進行移動,藉此使螢光體基板隔著黏著層接合於光電轉換面板。 A method of manufacturing a radiation image detecting apparatus according to the present invention includes a radiation image detecting apparatus including: a phosphor substrate including a support body and a support body formed on the support body to convert radiation into visible light a phosphor layer; a photoelectric conversion panel that detects visible light to detect a radiation image; and an adhesive layer disposed on a surface of the phosphor substrate on a side of the phosphor layer for bonding with the photoelectric conversion panel, and the radiation pattern The image detecting device is manufactured by setting the bonding roller to a linear pressure of 20 N/cm or more and 35 N/cm or less. In a state where the surface of the support opposite to the surface on the phosphor layer side is pressed, the substrate is moved at a speed of 20 mm/s or more and 50 mm/s or less to bond the phosphor substrate to the photovoltaic layer via the adhesive layer. Conversion panel.
較佳為,線壓力為25N/cm以上且30N/cm以下。 Preferably, the line pressure is 25 N/cm or more and 30 N/cm or less.
較佳為,貼合輥的速度為20mm/s以上且40mm/s以下。 Preferably, the speed of the bonding roller is 20 mm/s or more and 40 mm/s or less.
螢光體層例如為分散於黏合劑(binder)中的GOS,且是塗佈於支撐體上而形成。 The phosphor layer is, for example, a GOS dispersed in a binder, and is formed by being applied to a support.
較佳為,貼合輥例如隔著絲網(silk screen)對螢光體基板進行按壓。 Preferably, the bonding roller presses the phosphor substrate, for example, via a silk screen.
較佳為,在將光電轉換面板支撐於垂直上側,將螢光體基板支撐於垂直下側的狀態下,貼合輥自垂直下側將螢光體基板上推至垂直上方,並推抵至光電轉換面板。 Preferably, in a state in which the photoelectric conversion panel is supported on the vertical upper side and the phosphor substrate is supported on the vertically lower side, the bonding roller pushes the phosphor substrate from the vertical lower side vertically upward, and pushes it up to Photoelectric conversion panel.
貼合輥例如是利用橡膠包覆金屬製的軸部而形成。較佳為所述橡膠的橡膠硬度為50以上且80以下。 The bonding roller is formed, for example, by coating a metal shaft portion with rubber. It is preferable that the rubber has a rubber hardness of 50 or more and 80 or less.
較佳為黏著層的厚度為10μm以上且30μm以下。又,較佳為,黏著層對不鏽鋼材料的黏著力為8.0N/25mm以上,且對聚對苯二甲酸乙二醇酯的黏著力為7.2N/25mm以上。 The thickness of the adhesive layer is preferably 10 μm or more and 30 μm or less. Further, it is preferable that the adhesive layer has an adhesive force to the stainless steel material of 8.0 N/25 mm or more and an adhesive force to polyethylene terephthalate of 7.2 N/25 mm or more.
較佳為,在光電轉換面板與螢光體基板的貼合後,在50℃下進行4個小時的加熱處理。 Preferably, after the photoelectric conversion panel and the phosphor substrate are bonded together, heat treatment is performed at 50 ° C for 4 hours.
根據本發明的放射線圖像檢測裝置的製造方法,當藉由黏著層將在支撐體上形成有螢光體的螢光體基板貼合於光電轉換 面板時,可抑制所述大徑的氣泡或密集的小徑的氣泡的產生。 According to the method of manufacturing a radiation image detecting apparatus of the present invention, a phosphor substrate on which a phosphor is formed on a support is bonded to a photoelectric conversion by an adhesive layer In the case of a panel, generation of the large-diameter bubbles or dense small-diameter bubbles can be suppressed.
10‧‧‧X射線圖像檢測裝置 10‧‧‧X-ray image detecting device
11‧‧‧FPD(平板檢測器) 11‧‧‧FPD (flat detector)
12‧‧‧電路支撐基板 12‧‧‧Circuit support substrate
12a‧‧‧下表面 12a‧‧‧ lower surface
13‧‧‧控制單元 13‧‧‧Control unit
14‧‧‧框體 14‧‧‧ frame
14a‧‧‧照射面 14a‧‧‧ illuminated surface
14b‧‧‧側部 14b‧‧‧ side
15‧‧‧導引線 15‧‧‧Guide line
20‧‧‧螢光體層/螢光體(閃爍器) 20‧‧‧Fluorescent layer/fluorescent body (scintillator)
20a‧‧‧端部 20a‧‧‧End
21‧‧‧光電轉換面板 21‧‧‧ photoelectric conversion panel
21a‧‧‧表面 21a‧‧‧Surface
21b‧‧‧外部端子 21b‧‧‧External terminals
22‧‧‧黏著層 22‧‧‧Adhesive layer
25‧‧‧支撐體(螢光體支撐基板) 25‧‧‧Support (phosphor support substrate)
26‧‧‧光反射膜 26‧‧‧Light reflective film
27‧‧‧螢光體基板 27‧‧‧Fuel substrate
28‧‧‧對準標記 28‧‧‧ alignment mark
29‧‧‧黏著層 29‧‧‧Adhesive layer
30‧‧‧電路基板 30‧‧‧ circuit board
30a‧‧‧訊號處理部 30a‧‧‧Signal Processing Department
30b‧‧‧圖像記憶體 30b‧‧‧ image memory
31‧‧‧撓性印刷基板 31‧‧‧Flexible printed circuit board
31a‧‧‧閘極驅動器 31a‧‧‧gate driver
31b‧‧‧電荷放大器 31b‧‧‧Charger amplifier
100‧‧‧貼合裝置 100‧‧‧Fitting device
101‧‧‧光電轉換面板保持部 101‧‧‧ photoelectric conversion panel holding unit
101a‧‧‧吸附面 101a‧‧‧Adsorption surface
101b‧‧‧吸氣口 101b‧‧‧ suction port
102‧‧‧螢光體基板保持部 102‧‧‧Fluorescent substrate holder
102a‧‧‧吸附面 102a‧‧‧Adsorption surface
102b‧‧‧吸氣口 102b‧‧‧ suction port
103‧‧‧第1吸氣部 103‧‧‧1st inhalation department
104‧‧‧第2吸氣部 104‧‧‧2nd inhalation department
105‧‧‧控制裝置 105‧‧‧Control device
106‧‧‧鉸鏈 106‧‧‧Hinges
111‧‧‧基部 111‧‧‧ base
111a‧‧‧凹部 111a‧‧‧ recess
112‧‧‧吸附板 112‧‧‧Adsorption plate
112a‧‧‧貫通孔 112a‧‧‧through hole
115‧‧‧第1吸氣壓力控制部 115‧‧‧1st inspiratory pressure control department
116‧‧‧第2吸氣壓力控制部 116‧‧‧2nd Inspiratory Pressure Control Department
121‧‧‧框體 121‧‧‧ frame
122‧‧‧絲網 122‧‧‧Screen
123‧‧‧貼合輥 123‧‧‧Finishing roller
123a‧‧‧軸部 123a‧‧‧Axis
123b‧‧‧橡膠 123b‧‧‧Rubber
124‧‧‧支撐板 124‧‧‧Support plate
126‧‧‧相機 126‧‧‧ camera
131‧‧‧氣缸 131‧‧‧ cylinder
132‧‧‧導軌 132‧‧‧rails
133‧‧‧移動台 133‧‧‧Mobile Station
134‧‧‧正時皮帶 134‧‧‧ Timing belt
136‧‧‧正時帶輪 136‧‧‧ timing belt pulley
141‧‧‧氣缸 141‧‧‧ cylinder
142‧‧‧支撐板控制部 142‧‧‧Support Plate Control Department
143‧‧‧監視器 143‧‧‧ monitor
150‧‧‧貼合線壓力控制部 150‧‧‧Fixed line pressure control department
151‧‧‧貼合速度控制部 151‧‧‧Fixed Speed Control Department
161‧‧‧貼合線 161‧‧‧ affixing line
162‧‧‧彎曲部 162‧‧‧Bend
S10~S16‧‧‧步驟 S10~S16‧‧‧Steps
XR‧‧‧X射線 XR‧‧‧X-ray
X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction
圖1是X射線圖像檢測裝置的局部斷裂立體圖。 Fig. 1 is a partially broken perspective view of an X-ray image detecting apparatus.
圖2是X射線圖像檢測裝置的剖面圖。 2 is a cross-sectional view of an X-ray image detecting apparatus.
圖3是表示貼合裝置的構成的說明圖。 3 is an explanatory view showing a configuration of a bonding apparatus.
圖4是表示光電轉換面板吸附部的構成的剖面圖。 4 is a cross-sectional view showing a configuration of an adsorption portion of a photoelectric conversion panel.
圖5是表示螢光體基板吸附部的構成的說明圖。 FIG. 5 is an explanatory view showing a configuration of a phosphor substrate adsorption portion.
圖6是貼合步驟的流程圖。 Figure 6 is a flow chart of the bonding step.
圖7是表示螢光體基板被貼合於光電轉換面板的狀況的剖面圖。 FIG. 7 is a cross-sectional view showing a state in which a phosphor substrate is bonded to a photoelectric conversion panel.
圖8是表示貼合的線壓力及速度與所混入的氣泡的關係的圖表。 Fig. 8 is a graph showing the relationship between the line pressure and the speed of bonding and the bubbles to be mixed.
如圖1所示,作為放射線圖像檢測裝置的一例的X射線圖像檢測裝置10包括平板檢測器(Flat Panel Detector,FPD)11、電路支撐基板12、控制單元13、以及收納該些的框體14。框體14是由X射線XR的穿透性高、重量輕且耐久性高的碳纖維強化樹脂(carbon fiber)形成為一體的單殼式構造(monocoque structure)。X射線圖像檢測裝置10為可移動型的電子暗盒(cartridge)。 As shown in FIG. 1, an X-ray image detecting apparatus 10 as an example of a radiation image detecting apparatus includes a flat panel detector (FPD) 11, a circuit supporting substrate 12, a control unit 13, and a frame for housing the same. Body 14. The frame 14 is a monocoque structure in which a carbon fiber reinforced resin having a high X-ray XR permeability, light weight, and high durability is integrally formed. The X-ray image detecting device 10 is a movable type electronic cartridge.
在框體14的1個側面,設置有開口部(未圖示)、以及 塞住所述開口部的蓋構件(未圖示)。在製造X射線圖像檢測裝置10時,自開口部將FPD11或控制單元13插入至框體14內。 An opening (not shown) is provided on one side surface of the casing 14 and A cover member (not shown) that plugs the opening. When the X-ray image detecting apparatus 10 is manufactured, the FPD 11 or the control unit 13 is inserted into the casing 14 from the opening.
在框體14上設置有攝影時被照射X射線XR的照射面14a,所述X射線XR是自X射線源放射而穿透檢測體(患者)的射線。在所述照射面14a上,形成有表示被攝體的可攝影區域及其中心位置的導引線15。導引線15的外框對應於可攝影區域,導引線15呈十字狀交叉的交點對應於可攝影區域的中心位置。 The housing 14 is provided with an irradiation surface 14a that is irradiated with an X-ray XR that is a radiation that is emitted from the X-ray source and penetrates the sample (patient). On the irradiation surface 14a, a guide wire 15 indicating a photographable region of the subject and its center position is formed. The outer frame of the guide lead 15 corresponds to the photographic area, and the intersection of the guide lines 15 in a cross shape corresponds to the center position of the photographic area.
在框體14內,自照射面14a側依次配置有FPD11及電路支撐基板12。電路支撐基板12支撐著電路基板30(參照圖2),並固定於框體14。控制單元13配置在框體14內的沿短邊方向的一端側。 In the casing 14, the FPD 11 and the circuit supporting substrate 12 are disposed in this order from the side of the irradiation surface 14a. The circuit supporting substrate 12 supports the circuit board 30 (see FIG. 2) and is fixed to the housing 14. The control unit 13 is disposed on one end side in the short side direction in the casing 14.
控制單元13收納有微電腦(micro computer)及電池(battery)(均未圖示)。所述微電腦藉由有線或無線來與連接於X射線源80的控制台(未圖示)進行通訊,對FPD11的動作進行控制。 The control unit 13 houses a micro computer and a battery (none of which are shown). The microcomputer communicates with a console (not shown) connected to the X-ray source 80 by wire or wirelessly to control the operation of the FPD 11.
如圖2所示,FPD11包括:螢光體(閃爍器)20,將X射線XR轉換成可見光;以及光電轉換面板21,將所述可見光轉換成電荷。X射線圖像檢測裝置10為照射側採集(Irradiation Side Sampling,ISS)型,光電轉換面板21配置在較螢光體層20更靠X射線XR的入射側。螢光體層20將穿透光電轉換面板21的X射線XR轉換成可見光而放出。光電轉換面板21對自螢光體層20放出的可見光進行光電轉換而轉換成電荷。 As shown in FIG. 2, the FPD 11 includes a phosphor (scintillator) 20 that converts X-rays XR into visible light, and a photoelectric conversion panel 21 that converts the visible light into electric charges. The X-ray image detecting device 10 is of an Irradiation Side Sampling (ISS) type, and the photoelectric conversion panel 21 is disposed on the incident side of the X-ray XR of the phosphor layer 20. The phosphor layer 20 converts the X-ray XR penetrating the photoelectric conversion panel 21 into visible light and emits it. The photoelectric conversion panel 21 photoelectrically converts visible light emitted from the phosphor layer 20 into electric charges.
光電轉換面板21隔著包含環氧樹脂等的黏著層22而貼附於框體14的照射面14a側的內表面。在光電轉換面板21的表面21a上,呈二維矩陣狀形成有進行光電轉換的光電二極體(photodiode,PD)(未圖示)。表面21a內,排列有PD的區域為攝影面。 The photoelectric conversion panel 21 is attached to the inner surface of the frame 14 on the irradiation surface 14a side via an adhesive layer 22 containing an epoxy resin or the like. On the surface 21a of the photoelectric conversion panel 21, a photodiode (PD) (not shown) for photoelectric conversion is formed in a two-dimensional matrix. In the surface 21a, the area in which the PDs are arranged is a photographing surface.
螢光體層20是藉由支撐體25而支撐,在螢光體層20與支撐體25之間形成有光反射膜26。螢光體層20例如包括包含樹脂等的黏合劑(結合劑)、以及分散於所述黏合劑中的多個螢光體粒子,且塗佈於支撐體25上而形成。黏合劑例如是將聚乙烯醇縮丁醛樹脂、胺基甲酸酯樹脂及塑化劑的混合物溶解於甲苯、2-丁醇及二甲苯的混合溶劑中而成。又,螢光體粒子例如是平均粒徑為約5μm的GOS(Gd2O2S:Tb)的粒狀晶體,吸收X射線XR而產生可見光。支撐體25是由PET等透明的絕緣性材料所形成。光反射膜26是由鋁等的金屬薄膜所形成。螢光體基板27包括支撐體25、光反射膜26及螢光體層20。 The phosphor layer 20 is supported by the support 25, and a light reflection film 26 is formed between the phosphor layer 20 and the support 25. The phosphor layer 20 includes, for example, a binder (bonding agent) containing a resin or the like, and a plurality of phosphor particles dispersed in the binder, and is formed by being applied onto the support 25 . The binder is prepared, for example, by dissolving a mixture of a polyvinyl butyral resin, a urethane resin, and a plasticizer in a mixed solvent of toluene, 2-butanol, and xylene. Further, the phosphor particles are, for example, a granular crystal of GOS (Gd 2 O 2 S: Tb) having an average particle diameter of about 5 μm, and absorb X-rays XR to generate visible light. The support 25 is formed of a transparent insulating material such as PET. The light reflecting film 26 is formed of a metal thin film such as aluminum. The phosphor substrate 27 includes a support 25, a light reflecting film 26, and a phosphor layer 20.
螢光體層20隔著包含丙烯酸系接合劑等的黏著層29將與形成有光反射膜26的面相反之側貼合於光電轉換面板21的表面21a。在光電轉換面板21的表面21a上,在與螢光體層20的端部20a相對應的位置形成有對準標記28。對準標記28由鋁等的金屬薄膜所形成。螢光體層20的端部20a及對準標記28在使螢光體基板27貼合於光電轉換面板21時,用於螢光體基板27與光電轉換面板21的位置對準。 The phosphor layer 20 is bonded to the surface 21 a of the photoelectric conversion panel 21 on the side opposite to the surface on which the light reflecting film 26 is formed via an adhesive layer 29 containing an acrylic adhesive or the like. On the surface 21a of the photoelectric conversion panel 21, an alignment mark 28 is formed at a position corresponding to the end portion 20a of the phosphor layer 20. The alignment mark 28 is formed of a metal thin film of aluminum or the like. The end portion 20a of the phosphor layer 20 and the alignment mark 28 are used to align the position of the phosphor substrate 27 and the photoelectric conversion panel 21 when the phosphor substrate 27 is bonded to the photoelectric conversion panel 21.
電路支撐基板12配置於螢光體支撐基板25的與X射線XR的入射側相反之側。電路支撐基板12藉由螺絲等而固著於框體14的側部14b。在電路支撐基板12的與螢光體支撐基板25為相反側的下表面12a,隔著黏著層等而固定有電路基板30。 The circuit supporting substrate 12 is disposed on the side of the phosphor supporting substrate 25 opposite to the incident side of the X-ray XR. The circuit supporting substrate 12 is fixed to the side portion 14b of the casing 14 by screws or the like. The circuit board 30 is fixed to the lower surface 12a of the circuit support substrate 12 on the side opposite to the phosphor support substrate 25 via an adhesive layer or the like.
電路基板30與光電轉換面板21經由撓性印刷基板31而電性連接。撓性印刷基板31藉由所謂捲帶式自動接合(Tape Automated Bonding,TAB)的接合法,而與設置於光電轉換面板21的端部的外部端子21b連接。 The circuit board 30 and the photoelectric conversion panel 21 are electrically connected via the flexible printed circuit board 31. The flexible printed circuit board 31 is connected to the external terminal 21b provided at the end of the photoelectric conversion panel 21 by a bonding method called Tape Automated Bonding (TAB).
在撓性印刷基板31上搭載有閘極驅動器(gate driver)31a及電荷放大器(charge amplifier)31b,所述閘極驅動器31a用以對光電轉換面板21進行驅動,所述電荷放大器31b將自光電轉換面板21輸出的電荷轉換成電壓訊號。在電路基板30上搭載有訊號處理部30a及圖像記憶體30b,所述訊號處理部30a根據藉由電荷放大器31b而轉換的電壓訊號生成圖像資料,所述圖像記憶體30b對圖像資料進行記憶。在訊號處理部30a中,包括相關雙採樣電路(correlated double sampling circuit)、電壓放大器、多工器(multiplexer)、類比/數位(analog to digital,A/D)轉換器等。閘極驅動器31a、電荷放大器31b、訊號處理部30a、圖像記憶體30b分別構成為積體電路。 A gate driver 31a and a charge amplifier 31b for driving the photoelectric conversion panel 21 for driving the photoelectric conversion panel 31 from the photovoltaic are mounted on the flexible printed circuit board 31. The charge output from the conversion panel 21 is converted into a voltage signal. A signal processing unit 30a and an image memory 30b are mounted on the circuit board 30, and the signal processing unit 30a generates image data based on a voltage signal converted by the charge amplifier 31b, the image memory 30b pair image Data for memory. The signal processing unit 30a includes a correlated double sampling circuit, a voltage amplifier, a multiplexer, an analog to digital (A/D) converter, and the like. Each of the gate driver 31a, the charge amplifier 31b, the signal processing unit 30a, and the image memory 30b is configured as an integrated circuit.
為了保護電路基板30、訊號處理部30a及圖像記憶體30b避開X射線XR,電路支撐基板12較佳為包含鉛等X射線屏蔽材料。 In order to protect the circuit board 30, the signal processing unit 30a, and the image memory 30b from the X-ray XR, the circuit support substrate 12 preferably includes an X-ray shielding material such as lead.
其次,說明X射線圖像檢測裝置10的一個製造步驟,即,藉由黏著層29而將光電轉換面板21與螢光體基板27加以貼合的貼合步驟。如圖3所示,用以藉由黏著層29而將光電轉換面板21與螢光體基板27加以貼合的貼合裝置100包括:光電轉換面板保持部101,用以對光電轉換面板21進行吸附保持;螢光體基板保持部102,用以對螢光體基板27進行吸附保持;第1吸氣部103,用以對光電轉換面板保持部101的內部空間的空氣進行吸氣;第2吸氣部104,用以對螢光體基板保持部102的內部空間的空氣進行吸氣;以及控制裝置105,用以對第1吸氣部103、第2吸氣部104、螢光體基板保持部102中所含的各部進行控制。 Next, a manufacturing step of the X-ray image detecting apparatus 10, that is, a bonding step of bonding the photoelectric conversion panel 21 and the phosphor substrate 27 by the adhesive layer 29 will be described. As shown in FIG. 3, the bonding apparatus 100 for bonding the photoelectric conversion panel 21 and the phosphor substrate 27 by the adhesive layer 29 includes a photoelectric conversion panel holding portion 101 for performing the photoelectric conversion panel 21. The phosphor substrate holding portion 102 is configured to adsorb and hold the phosphor substrate 27; the first air suction portion 103 is configured to inhale the air in the internal space of the photoelectric conversion panel holding portion 101; The air suction unit 104 is configured to inhale air in the internal space of the phosphor substrate holding unit 102, and the control device 105 is configured to apply the first air suction unit 103, the second air suction unit 104, and the phosphor substrate. Each unit included in the holding unit 102 is controlled.
光電轉換面板保持部101藉由鉸鏈106而安裝於螢光體基板保持部102。因此,光電轉換面板保持部101可相對於螢光體基板保持部102而轉動自如,且在以兩點鏈線表示的打開位置與以實線表示的關閉位置之間進行打開及關閉。光電轉換面板21在光電轉換面板保持部101處於打開位置的狀態下載置於吸附面101a上,藉由吸附而受到保持。其後,當光電轉換面板保持部101轉動至關閉位置時,吸附保持於吸附面101a上的光電轉換面板21與吸附保持於螢光體基板保持部102上的螢光體基板27相向。再者,光電轉換面板保持部101在轉動至關閉位置的狀態下,亦不使光電轉換面板21與螢光體基板27接觸,而在空開規定的間隙的狀態下相對於螢光體基板27平行地保持光電轉換面板21。 The photoelectric conversion panel holding portion 101 is attached to the phosphor substrate holding portion 102 by a hinge 106. Therefore, the photoelectric conversion panel holding portion 101 is rotatable with respect to the phosphor substrate holding portion 102, and is opened and closed between an open position indicated by a two-dot chain line and a closed position indicated by a solid line. The photoelectric conversion panel 21 is placed on the adsorption surface 101a in a state where the photoelectric conversion panel holding portion 101 is in the open position, and is held by adsorption. Thereafter, when the photoelectric conversion panel holding portion 101 is rotated to the closed position, the photoelectric conversion panel 21 adsorbed and held on the adsorption surface 101a faces the phosphor substrate 27 adsorbed and held by the phosphor substrate holding portion 102. In the state where the photoelectric conversion panel holding portion 101 is rotated to the closed position, the photoelectric conversion panel 21 is not brought into contact with the phosphor substrate 27, and the predetermined distance is released with respect to the phosphor substrate 27. The photoelectric conversion panel 21 is held in parallel.
第1吸氣部103是真空泵、用以將真空泵連接於光電轉 換面板保持部101的吸氣口101b的配管或閥(valve)等。第1吸氣部103藉由自吸氣口101b對光電轉換面板保持部101的內部空間(參照圖4的凹部111a)的空氣進行吸氣,而對載置於吸附面101a上的光電轉換面板21進行吸附。 The first suction unit 103 is a vacuum pump for connecting the vacuum pump to the photoelectric conversion A pipe, a valve, or the like of the intake port 101b of the panel holding portion 101 is replaced. The first intake unit 103 inhales the air in the internal space (see the recess 111a of FIG. 4) of the photoelectric conversion panel holding unit 101 from the air intake port 101b, and the photoelectric conversion panel placed on the adsorption surface 101a. 21 adsorption.
如圖4所示,光電轉換面板保持部101包括基部111及吸附板112。基部111與鉸鏈106形成為一體,且在對光電轉換面板21進行吸附保持之側的表面上,形成有凹部111a。吸附板112覆蓋所述凹部111a而與基部111形成為一體。因此,吸附板112的露出的表面成為光電轉換面板保持部101的吸附面101a。 As shown in FIG. 4, the photoelectric conversion panel holding portion 101 includes a base portion 111 and an adsorption plate 112. The base portion 111 is formed integrally with the hinge 106, and a concave portion 111a is formed on the surface on the side where the photoelectric conversion panel 21 is suction-held. The adsorption plate 112 covers the concave portion 111a and is formed integrally with the base portion 111. Therefore, the exposed surface of the adsorption plate 112 becomes the adsorption surface 101a of the photoelectric conversion panel holding portion 101.
在吸附板112上,設置有連結凹部111a與外部的多個吸附孔112a,當第1吸氣部103自吸氣口101b對凹部111a的空氣進行吸氣時,自吸附面101a側通過貫通孔112a而對空氣進行吸氣。當第1吸氣部103在吸附面101a上載置有光電轉換面板21的狀態下對空氣進行吸氣時,將光電轉換面板21吸附於吸附面101a。 The adsorption plate 112 is provided with a plurality of adsorption holes 112a that connect the concave portion 111a and the outside, and when the first air suction portion 103 inhales the air of the concave portion 111a from the air inlet 101b, the through hole is passed through the adsorption surface 101a side. 112a inhales air. When the first intake unit 103 inhales air in a state where the photoelectric conversion panel 21 is placed on the adsorption surface 101a, the photoelectric conversion panel 21 is adsorbed to the adsorption surface 101a.
至少在作為吸附面101a的吸附板112的露出的表面上,塗佈有抗靜電劑。因此,光電轉換面板21不會因靜電力(electrostatic force)等而保持於吸附板112上,只要第1吸氣部103停止空氣的吸氣,即可自吸附面101a自然地剝離光電轉換面板21。再者,吸附板112是在表面及背面上塗佈抗靜電劑之後形成吸附孔112a,因此吸附板112在凹部111a側的表面上亦塗佈有抗靜電劑。 An antistatic agent is applied on at least the exposed surface of the adsorption plate 112 as the adsorption surface 101a. Therefore, the photoelectric conversion panel 21 is not held by the adsorption plate 112 by an electrostatic force or the like, and the photoelectric conversion panel 21 can be naturally peeled off from the adsorption surface 101a as long as the first intake portion 103 stops the intake of air. . Further, since the adsorption plate 112 is formed by applying an antistatic agent to the front surface and the back surface, the adsorption hole 112a is formed. Therefore, the adsorption plate 112 is also coated with an antistatic agent on the surface on the side of the concave portion 111a.
第1吸氣部103對空氣的吸氣壓力是藉由控制部105的第1吸氣壓力控制部115來控制。即,第1吸氣壓力控制部115控制光電轉換面板21對吸附面101a的吸附壓力。具體而言,第1吸氣壓力控制部115以10kPa使光電轉換面板21吸附保持於吸附面101a。這是用以不損傷光電轉換面板21且確實地預先吸附保持光電轉換面板21的吸附壓力。 The intake pressure of the air by the first intake unit 103 is controlled by the first intake pressure control unit 115 of the control unit 105. In other words, the first intake pressure control unit 115 controls the adsorption pressure of the photoelectric conversion panel 21 on the adsorption surface 101a. Specifically, the first intake pressure control unit 115 adsorbs and holds the photoelectric conversion panel 21 on the adsorption surface 101a at 10 kPa. This is an adsorption pressure for not holding the photoelectric conversion panel 21 and surely adsorbing and holding the photoelectric conversion panel 21 in advance.
如圖5所示,螢光體基板保持部102包括:箱體狀的框體121,與鉸鏈106形成為一體,且頂面(載置螢光體基板27的Z側的面)開口;以及絲網122,覆蓋所述框體121的開口的頂面。 As shown in FIG. 5, the phosphor substrate holding portion 102 includes a box-shaped housing 121 which is integrally formed with the hinge 106 and has a top surface (a surface on which the Z side of the phosphor substrate 27 is placed) is opened; The screen 122 covers the top surface of the opening of the frame 121.
絲網122是設置有多個可通氣的孔的網眼狀片材,在絲網122上載置螢光體基板27。絲網122具有如下程度的硬度:可使螢光體基板27保持著大致平面形狀而對螢光體基板27進行載置。又,絲網122在如下程度下由柔軟的材料形成:當自框體121的內部使貼合輥123推抵至絲網122時,可連同所載置的螢光體基板27一併突出至關閉位置的光電轉換面板保持部101側,從而將螢光體基板27推抵至光電轉換面板21。 The screen 122 is a mesh-like sheet provided with a plurality of ventilable holes, and the phosphor substrate 27 is placed on the screen 122. The screen 122 has a hardness such that the phosphor substrate 27 can be placed in a substantially planar shape and placed on the phosphor substrate 27. Further, the screen 122 is formed of a soft material such that when the bonding roller 123 is pushed against the screen 122 from the inside of the housing 121, it can be protruded together with the mounted phosphor substrate 27 to The side of the photoelectric conversion panel holding portion 101 at the position of the closing position pushes the phosphor substrate 27 against the photoelectric conversion panel 21.
由絲網122及框體121圍成的螢光體基板保持部102的內部空間,經設置於框體121上的吸氣口102b連接於第2吸氣部104。第2吸氣部104是真空泵、用以將真空泵連接於吸氣口102b的配管或閥等。第2吸氣部104藉由自吸氣口102b對螢光體基板保持部102的內部空間的空氣進行吸氣,而自絲網122的多個孔對外部的空氣進行吸氣,從而使螢光體基板保持部102吸附保持 載置於絲網122上的螢光體基板27。因此,絲網122的露出至外部的表面是螢光體基板保持部102對螢光體基板27進行吸附保持的吸附面102a。 The internal space of the phosphor substrate holding portion 102 surrounded by the screen 122 and the frame 121 is connected to the second intake unit 104 via the intake port 102b provided in the housing 121. The second intake unit 104 is a vacuum pump or a pipe or a valve for connecting the vacuum pump to the intake port 102b. The second intake unit 104 inhales the air in the internal space of the phosphor substrate holding unit 102 from the air intake port 102b, and inhales the outside air from the plurality of holes of the screen 122, thereby causing the fire. The light substrate holding portion 102 is adsorbed and held The phosphor substrate 27 placed on the screen 122. Therefore, the surface exposed to the outside of the screen 122 is the adsorption surface 102a in which the phosphor substrate holding unit 102 adsorbs and holds the phosphor substrate 27.
再者,第2吸氣部104對空氣的吸氣壓力是藉由控制部105的第2吸氣壓力控制部116來控制。即,第2吸氣壓力控制部116控制螢光體基板27對絲網122(吸附面102a)的吸附壓力。具體而言,第2吸氣壓力控制部116以3kPa~4kPa使螢光體基板27吸附保持於吸附面102a。這是用以不損傷螢光體基板27且以在絲網122上不移動的方式確實地預先保持螢光體基板27的吸附壓力。 Further, the intake pressure of the second intake unit 104 to the air is controlled by the second intake pressure control unit 116 of the control unit 105. In other words, the second intake pressure control unit 116 controls the adsorption pressure of the phosphor substrate 27 on the screen 122 (the adsorption surface 102a). Specifically, the second intake pressure control unit 116 adsorbs and holds the phosphor substrate 27 on the adsorption surface 102a at 3 kPa to 4 kPa. This is a suction pressure for reliably holding the phosphor substrate 27 in advance without damaging the phosphor substrate 27 so as not to move on the screen 122.
在由框體121及絲網122所形成的螢光體基板保持部102的內部空間內,設置有貼合輥123、多個支撐板124及相機126等。 In the internal space of the phosphor substrate holding portion 102 formed by the frame 121 and the mesh 122, a bonding roller 123, a plurality of support plates 124, a camera 126, and the like are provided.
貼合輥123是在金屬(例如鐵)的軸部123a上包覆橡膠硬度為70的橡膠123b而形成。貼合輥123在Y方向上至少長於螢光體基板27。又,貼合輥123支撐於氣缸(air cylinder)131上,藉由使氣缸131的活塞上下移動,而在垂直方向(Z方向)上移動自如。藉由利用氣缸131上推貼合輥123,而自垂直下方(Z方向的負側)對螢光體基板27連同絲網122一併進行按壓,藉由黏著層29而使螢光體基板27貼合於光電轉換面板21。 The bonding roller 123 is formed by coating a rubber portion 123b having a rubber hardness of 70 on a shaft portion 123a of a metal (for example, iron). The bonding roller 123 is at least longer than the phosphor substrate 27 in the Y direction. Further, the bonding roller 123 is supported by an air cylinder 131, and is movable in the vertical direction (Z direction) by moving the piston of the air cylinder 131 up and down. By pressing the bonding roller 123 by the air cylinder 131, the phosphor substrate 27 and the screen 122 are collectively pressed from vertically below (the negative side in the Z direction), and the phosphor substrate 27 is adhered by the adhesive layer 29. It is bonded to the photoelectric conversion panel 21.
支撐貼合輥123的氣缸131是藉由控制裝置105的貼合線壓力控制部150來控制。即,貼合線壓力控制部150經由氣缸131,對將貼合輥123推抵至絲網122及載置於絲網122上的螢光體基板27的按壓力進行控制。貼合輥123沿長邊方向(Y方向)呈直線狀抵接至絲網122,因此貼合線壓力控制部150所控制的按壓力為線壓力(貼合線壓力)。具體而言,貼合線壓力控制部150以20N/cm以上且35N/cm以下的線壓力,利用貼合輥123按壓至絲網122。藉由調節至處於所述範圍內的線壓力,而使氣泡難以混入至螢光體基板27與光電轉換面板21之間。 The cylinder 131 that supports the bonding roller 123 is controlled by the bonding line pressure control unit 150 of the control device 105. In other words, the bonding line pressure control unit 150 controls the pressing force of the bonding roller 123 against the screen 122 and the phosphor substrate 27 placed on the screen 122 via the air cylinder 131. Since the bonding roller 123 linearly abuts on the screen 122 in the longitudinal direction (Y direction), the pressing force controlled by the bonding line pressure control unit 150 is the line pressure (bonding line pressure). Specifically, the bonding line pressure control unit 150 presses the screen 122 to the screen 122 by the bonding roller 123 at a line pressure of 20 N/cm or more and 35 N/cm or less. By adjusting the line pressure within the above range, it is difficult to mix bubbles between the phosphor substrate 27 and the photoelectric conversion panel 21.
再者,在本實施形態中,貼合線壓力控制部150將貼合輥123的線壓力控制在20N/cm以上且35N/cm以下的範圍內,但若處於23N/cm以上且32N/cm以下的範圍內,可抑制氣泡混入。特別是若處於25N/cm以上且30N/cm以下的範圍內,則可進一步抑制氣泡的混入頻率。 In the present embodiment, the bonding line pressure control unit 150 controls the line pressure of the bonding roller 123 within a range of 20 N/cm or more and 35 N/cm or less, but is 23 N/cm or more and 32 N/cm. In the following range, air bubbles can be suppressed from entering. In particular, when it is in the range of 25 N/cm or more and 30 N/cm or less, the frequency of mixing bubbles can be further suppressed.
支撐貼合輥123的氣缸131設置於移動台133上。移動台133沿導軌132移動自如,導軌132沿與貼合輥123的長邊方向垂直的X方向呈直線狀設置。又,移動台133固定於正時皮帶(timing belt)134的規定部位,正時皮帶134搭掛於設置於導軌132的兩端附近的兩個正時帶輪(timing pulley)136上。因此,藉由使正時帶輪136旋轉而使正時皮帶134移動,可使移動台133沿導軌132自如地移動。即,藉由控制正時帶輪136,可控制貼合輥123朝向X方向的移動速度。 The cylinder 131 supporting the bonding roller 123 is disposed on the moving stage 133. The moving table 133 is movable along the guide rail 132, and the guide rail 132 is linearly arranged in the X direction perpendicular to the longitudinal direction of the bonding roller 123. Further, the mobile station 133 is fixed to a predetermined portion of the timing belt 134, and the timing belt 134 is hung on two timing pulleys 136 provided near both ends of the guide rail 132. Therefore, by moving the timing belt 136 to move the timing belt 134, the moving table 133 can be freely moved along the guide rail 132. That is, by controlling the timing pulley 136, the moving speed of the bonding roller 123 in the X direction can be controlled.
貼合輥123朝向X方向的移動速度實質上等效於螢光體基板27與光電轉換面板21的貼合速度。因此,貼合速度控制部 151藉由控制正時帶輪136的旋轉速度,來控制螢光體基板27與光電轉換面板21的貼合速度。具體而言,貼合速度控制部151以20mm/s以上且50mm/s以下的速度使螢光體基板27與光電轉換面板21貼合。藉由調節至處於所述範圍內的貼合速度,氣泡難以混入至螢光體基板27與光電轉換面板21之間。 The moving speed of the bonding roller 123 in the X direction is substantially equivalent to the bonding speed of the phosphor substrate 27 and the photoelectric conversion panel 21. Therefore, the fitting speed control unit 151 controls the bonding speed of the phosphor substrate 27 and the photoelectric conversion panel 21 by controlling the rotational speed of the timing pulley 136. Specifically, the bonding speed control unit 151 bonds the phosphor substrate 27 to the photoelectric conversion panel 21 at a speed of 20 mm/s or more and 50 mm/s or less. By adjusting to the bonding speed within the above range, it is difficult for air bubbles to be mixed between the phosphor substrate 27 and the photoelectric conversion panel 21.
再者,在本實施形態中,貼合速度控制部151將螢光體基板27與光電轉換面板21的貼合速度控制在20mm/s以上且50mm/s以下的範圍內,但若處於20mm/s以上且45mm/s以下的範圍內,可抑制氣泡混入。特別是若處於20mm/s以上且40mm/s以下的範圍內,則可進一步抑制氣泡的混入頻率。 In the present embodiment, the bonding speed control unit 151 controls the bonding speed of the phosphor substrate 27 and the photoelectric conversion panel 21 to be in the range of 20 mm/s or more and 50 mm/s or less, but if it is at 20 mm/ In the range of s or more and 45 mm/s or less, the incorporation of air bubbles can be suppressed. In particular, when it is in the range of 20 mm/s or more and 40 mm/s or less, the frequency of mixing bubbles can be further suppressed.
支撐板124是自絲網122的垂直下側支撐螢光體基板27,以平行地保持螢光體基板27。支撐體124在螢光體基板保持部102的內部設置有多個,藉由各個氣缸141來支撐,且藉由各氣缸141的活塞而沿垂直方向(Z方向)上下移動自如。控制裝置105的支撐板控制部142藉由控制各氣缸141,來使支撐板適當移動至垂直下方(Z方向的負側)的退避位置,以不妨礙貼合輥123朝向X方向的移動。 The support plate 124 supports the phosphor substrate 27 from the vertical lower side of the screen 122 to hold the phosphor substrate 27 in parallel. A plurality of support bodies 124 are provided inside the phosphor substrate holding portion 102, and are supported by the respective cylinders 141, and are vertically movable in the vertical direction (Z direction) by the pistons of the respective cylinders 141. The support plate control unit 142 of the control device 105 controls the respective cylinders 141 to appropriately move the support plate to a retracted position vertically below (negative side in the Z direction) so as not to hinder the movement of the bonding roller 123 in the X direction.
相機126在使光電轉換面板保持部101轉動至關閉位置時,隔著絲網122及支撐體25,對光電轉換面板21的對準標記28及螢光體層20的端部20a進行攝影。又,相機126分別設置於設置有對準標記28的部位,因此在螢光體基板保持部102的內部設置有多個。各相機126所拍攝的圖像被顯示於控制裝置105的 監視器(monitor)143上,操縱貼合裝置100的操作員根據顯示於監視器143上的圖像,使螢光體基板27在絲網122上滑動或旋轉,藉此使螢光體基板27的位置對準於光電轉換面板21。使螢光體基板27的位置對準於光電轉換面板21所要求的精度例如在±0.25mm以內。 When the photoelectric conversion panel holding portion 101 is rotated to the closed position, the camera 126 images the alignment mark 28 of the photoelectric conversion panel 21 and the end portion 20a of the phosphor layer 20 via the screen 122 and the support 25 . Further, since the cameras 126 are respectively provided at the portions where the alignment marks 28 are provided, a plurality of the cameras 126 are provided inside the phosphor substrate holding portion 102. An image taken by each camera 126 is displayed on the control device 105. On the monitor 143, the operator who manipulates the bonding apparatus 100 slides or rotates the phosphor substrate 27 on the screen 122 based on the image displayed on the monitor 143, thereby causing the phosphor substrate 27 to be made. The position is aligned with the photoelectric conversion panel 21. The accuracy required to align the position of the phosphor substrate 27 to the photoelectric conversion panel 21 is, for example, within ±0.25 mm.
其次,對使用貼合裝置100將螢光體基板27貼合於光電轉換面板21的流程進行說明。如圖6所示,首先,將光電轉換面板21載置於處於打開位置的光電轉換面板保持部101的規定位置,對第1吸氣部103進行控制,使光電轉換面板21吸附保持於吸附面101a(S10)。另一方面,在螢光體基板保持部102的絲網122上的規定位置,載置塗佈有黏著層29的螢光體基板27,對第2吸氣部104進行控制,而使螢光體基板27吸附保持於絲網122上(S11)。在所述狀態下,使光電轉換面板保持部101轉動而移動至關閉位置(S12),與螢光體基板27的垂直上方(Z方向的正側)相對向而平行地配置光電轉換面板21。並且,藉由監視器143對照出有螢光體層20的端部20a與光電轉換面板21的對準標記28的圖像進行確認,以螢光體層20的端部20a與對準標記28的相互位置關係為以預先設定的精度相一致的方式,而使螢光體基板27的吸附保持力下降等,使螢光體基板27在絲網122上滑動或旋轉,將螢光體基板27的位置對準於光電轉換面板21(S13)。 Next, a flow in which the phosphor substrate 27 is bonded to the photoelectric conversion panel 21 by using the bonding apparatus 100 will be described. As shown in FIG. 6, first, the photoelectric conversion panel 21 is placed at a predetermined position of the photoelectric conversion panel holding portion 101 at the open position, and the first intake unit 103 is controlled to adsorb and hold the photoelectric conversion panel 21 to the adsorption surface. 101a (S10). On the other hand, the phosphor substrate 27 coated with the adhesive layer 29 is placed at a predetermined position on the screen 122 of the phosphor substrate holding portion 102, and the second intake portion 104 is controlled to be fluorescent. The body substrate 27 is adsorbed and held on the screen 122 (S11). In the above state, the photoelectric conversion panel holding portion 101 is rotated and moved to the closed position (S12), and the photoelectric conversion panel 21 is disposed in parallel with the vertical direction (the positive side in the Z direction) of the phosphor substrate 27 in parallel. Further, the monitor 143 confirms the image of the alignment mark 28 of the phosphor layer 20 and the alignment mark 28 of the photoelectric conversion panel 21, so that the end portion 20a of the phosphor layer 20 and the alignment mark 28 are mutually The positional relationship is such that the adsorption holding force of the phosphor substrate 27 is lowered by a predetermined accuracy, and the phosphor substrate 27 is slid or rotated on the screen 122 to position the phosphor substrate 27. It is aligned with the photoelectric conversion panel 21 (S13).
位置對準結束後,藉由貼合線壓力控制部150對氣缸131進行控制,利用螢光體基板27的端部將貼合輥123上推至垂 直上方(Z方向的正側),並隔著絲網122將螢光體基板27按壓至光電轉換面板21(S14)。此時,藉由貼合線壓力控制部150,將線壓力調節至20N/cm以上且35N/cm以下的範圍內,所述線壓力是貼合輥123將螢光體基板27按壓至光電轉換面板21的線壓力。並且,在保持著所述線壓力的狀態下,藉由貼合速度控制部151而以20mm/s以上且50mm/s以下的速度,使貼合輥123移動至螢光體層20的端部20a為止(S15)。藉此,以20N/cm以上且35N/cm以下的線壓力,並且以20mm/s以上且50mm/s以下的貼合速度,將螢光體基板27貼合於光電轉換面板21。 After the alignment is completed, the cylinder line 131 is controlled by the bonding line pressure control unit 150, and the bonding roller 123 is pushed up to the end by the end portion of the phosphor substrate 27. Straight upward (positive side in the Z direction), the phosphor substrate 27 is pressed against the photoelectric conversion panel 21 via the screen 122 (S14). At this time, the line pressure is adjusted to a range of 20 N/cm or more and 35 N/cm or less by the bonding line pressure control unit 150, which is a bonding roller 123 that presses the phosphor substrate 27 to photoelectric conversion. The line pressure of the panel 21. In the state where the line pressure is maintained, the bonding speed control unit 151 moves the bonding roller 123 to the end portion 20a of the phosphor layer 20 at a speed of 20 mm/s or more and 50 mm/s or less. So far (S15). By this, the phosphor substrate 27 is bonded to the photoelectric conversion panel 21 at a bonding speed of 20 N/cm or more and 35 N/cm or less and at a bonding speed of 20 mm/s or more and 50 mm/s or less.
其後,光電轉換面板21與螢光體基板27的貼合體在50℃的空氣中實施4個小時的加熱處理(S16)。經實施加熱處理的光電轉換面板21與螢光體基板27的貼合體在進行由貼合引起的氣泡混入的檢查等之後,將光電轉換面板21經由撓性印刷基板31等與各部連接而組裝至框體14,藉此X射線圖像檢測裝置10完成。 Thereafter, the bonded body of the photoelectric conversion panel 21 and the phosphor substrate 27 is subjected to heat treatment for 4 hours in air at 50 ° C (S16). After the bonding of the photoelectric conversion panel 21 and the phosphor substrate 27 subjected to the heat treatment to the air bubbles by the bonding, the photoelectric conversion panel 21 is connected to the respective portions via the flexible printed circuit board 31 or the like and assembled. The frame 14 is completed by the X-ray image detecting device 10.
如上所述,本發明是使用貼合裝置100,以20N/cm以上且35N/cm以下的線壓力,並且以20mm/s以上且50mm/s以下的貼合速度,將螢光體基板27貼合於光電轉換面板21。因此,可防止大徑的氣泡混入至光電轉換面板21與螢光體基板27之間,並且可防止密集的小徑的氣泡混入至光電轉換面板21與螢光體基板27之間。 As described above, according to the present invention, the bonding apparatus 100 is used, and the phosphor substrate 27 is attached at a bonding speed of 20 N/cm or more and 35 N/cm or less at a bonding speed of 20 mm/s or more and 50 mm/s or less. The photoelectric conversion panel 21 is incorporated. Therefore, it is possible to prevent bubbles of a large diameter from being mixed between the photoelectric conversion panel 21 and the phosphor substrate 27, and it is possible to prevent dense small-diameter bubbles from being mixed between the photoelectric conversion panel 21 and the phosphor substrate 27.
如圖7所示,當將使用貼合輥123將螢光體基板27按 壓至光電轉換面板21的部位設為貼合線161,將位於其前方(貼合輥123的移動目的地的X方向)的螢光體基板27及絲網122稍微彎曲的部分設為彎曲部162時,在所述貼合線壓力及貼合速度的範圍內使螢光體基板27貼合於光電轉換面板21時,在彎曲部162難以產生撓曲、變形、扭曲等。其結果為,所有大的氣泡均難以混入至光電轉換面板21與螢光體基板27之間。 As shown in FIG. 7, when the bonding substrate 123 is to be used, the phosphor substrate 27 is pressed. A portion that is pressed to the photoelectric conversion panel 21 is a bonding line 161, and a portion where the phosphor substrate 27 and the screen 122 which are located in front of the X direction of the movement of the bonding roller 123 are slightly curved is a curved portion. At 162, when the phosphor substrate 27 is bonded to the photoelectric conversion panel 21 within the range of the bonding line pressure and the bonding speed, it is less likely to cause deflection, deformation, distortion, and the like in the curved portion 162. As a result, it is difficult for all the large bubbles to be mixed between the photoelectric conversion panel 21 and the phosphor substrate 27.
再者,所述貼合線壓力及貼合速度是藉由實驗來確定。如由圖8所知,根據貼合線壓力與貼合速度的平衡程度,容易產生大徑的氣泡或小徑的氣泡的密集體(小徑氣泡群組),但若藉由所述貼合線壓力與貼合速度的平衡程度,大徑的氣泡與小徑氣泡群組均不會混入。 Furthermore, the bonding line pressure and the bonding speed are determined experimentally. As is understood from Fig. 8, depending on the degree of balance between the bonding line pressure and the bonding speed, a large-diameter bubble or a small-diameter bubble group (small-diameter bubble group) is likely to be generated, but by the bonding The balance between the line pressure and the bonding speed is such that the large diameter bubble and the small diameter bubble group do not mix.
再者,即使在光電轉換面板21與螢光體基板27進行貼合時氣泡混入的情況下,藉由實施加熱處理,亦可縮小所混入的氣泡的大小。藉此,X射線圖像檢測裝置10的製造良率提高。 In addition, even when bubbles are mixed when the photoelectric conversion panel 21 and the phosphor substrate 27 are bonded together, the size of the bubbles to be mixed can be reduced by performing heat treatment. Thereby, the manufacturing yield of the X-ray image detecting apparatus 10 is improved.
再者,黏著層29的厚度在可維持光電轉換面板21與螢光體基板27的接合的範圍內,儘可能地越薄越好。其目的在於提高X射線圖像的檢測感度。例如,為了一面維持光電轉換面板21與螢光體基板27的接合,一面提高X射線圖像的檢測感度,黏著層29的厚度較佳為10μm以上且30μm以下的範圍內。 Further, the thickness of the adhesive layer 29 is as thin as possible while maintaining the bonding of the photoelectric conversion panel 21 and the phosphor substrate 27. The purpose is to improve the detection sensitivity of the X-ray image. For example, in order to improve the detection sensitivity of the X-ray image while maintaining the bonding between the photoelectric conversion panel 21 and the phosphor substrate 27, the thickness of the adhesive layer 29 is preferably in the range of 10 μm or more and 30 μm or less.
又,較佳為,黏著層29對不鏽鋼材料的黏著力為8.0N/25mm以上,且對聚對苯二甲酸乙二醇酯的黏著力為7.2N/25mm以上。這是用以在所述範圍的厚度下使光電轉換面板21與螢 光體基板27良好地接合的黏著力。黏著力是利用依據國際標準化組織(International Standardization Organization,ISO)29862的測定方法(例如,日本工業標準(Japanese Industrial Standards,JIS)Z0237中所規定的方法)來測定。 Further, it is preferable that the adhesive layer 29 has an adhesive force to the stainless steel material of 8.0 N/25 mm or more and an adhesive force to polyethylene terephthalate of 7.2 N/25 mm or more. This is to make the photoelectric conversion panel 21 and the firefly at the thickness of the range The adhesion of the light-substrate substrate 27 to good bonding. The adhesion is measured by a measurement method according to the International Standardization Organization (ISO) 29862 (for example, a method specified in Japanese Industrial Standards (JIS) Z0237).
再者,將形成貼合輥123的外周的橡膠123b的橡膠硬度設為70,但橡膠123b的橡膠硬度較佳為50以上且80以下。其原因在於,若使用超過所述範圍的硬橡膠,則即使貼合線壓力在所述範圍內,螢光體基板27亦會在貼合線161處壓壞,在彎曲部162產生撓曲、變形、扭曲等,從而氣泡容易混入。反之,若使用低於所述範圍的軟橡膠,則橡膠123b自身會壓壞,難以實現經設定的貼合線壓力,從而氣泡容易混入。橡膠硬度可使用依據ISO7619的硬度計(durometer)(關於測定方法,例如使用JIS K 7215中所規定的方法)進行測量。 In addition, the rubber hardness of the rubber 123b which forms the outer periphery of the bonding roll 123 is 70, but the rubber hardness of the rubber 123b is preferably 50 or more and 80 or less. The reason for this is that if a hard rubber exceeding the above range is used, even if the bonding line pressure is within the above range, the phosphor substrate 27 is crushed at the bonding line 161, and the bending portion 162 is deflected. Deformation, distortion, etc., so that bubbles are easily mixed in. On the other hand, if a soft rubber lower than the above range is used, the rubber 123b itself is crushed, and it is difficult to achieve the set bonding line pressure, so that the bubbles are easily mixed. The rubber hardness can be measured using a durometer according to ISO 7619 (for the measurement method, for example, using the method specified in JIS K 7215).
再者,使用GOS粒子作為螢光體粒子,但作為螢光體粒子,可使用以A2O2S:X(其中,A為Y、La、Gd、Lu之中任一者,X為Eu、Tb、Pr之中任一者)表示的粒子。又,作為螢光體粒子24b,亦可使用在A2O2S:X中含有鈰(Ce)或釤(Sm)作為共激活劑的粒子。 Further, GOS particles are used as the phosphor particles, but as the phosphor particles, A 2 O 2 S:X can be used (wherein A is Y, La, Gd, Lu, and X is Eu) Particles represented by any of Tb and Pr). Further, as the phosphor particles 24b, particles containing cerium (Ce) or cerium (Sm) as a co-activator in A 2 O 2 S:X may be used.
再者,使用X射線作為放射線,但亦可使用γ射線或α射線等X射線以外的放射線作為放射線。此外,在所述實施形態中,是舉出作為可移動型的放射線圖像檢測裝置的電子暗盒為例對本發明進行說明,但本發明亦可應用於站姿型或臥姿型的放射 線圖像檢測裝置、或乳房攝影(mammography)裝置等。 Further, X-rays are used as the radiation, but radiation other than X-rays such as γ-rays or α-rays may be used as the radiation. Further, in the above-described embodiment, the present invention is described by taking an electronic cassette as a movable type radiographic image detecting apparatus as an example. However, the present invention can also be applied to a standing type or a lying type type of radiation. A line image detecting device, or a mammography device or the like.
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