TWI656102B - Breaking method of brittle substrate - Google Patents
Breaking method of brittle substrate Download PDFInfo
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- TWI656102B TWI656102B TW104128694A TW104128694A TWI656102B TW I656102 B TWI656102 B TW I656102B TW 104128694 A TW104128694 A TW 104128694A TW 104128694 A TW104128694 A TW 104128694A TW I656102 B TWI656102 B TW I656102B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/037—Controlling or regulating
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Abstract
本發明係揭示一種脆性基板之分斷方法,其即使預先規定了脆性基板之分斷位置,亦可防止脆性基板在應分斷之時點之前被意外分斷。本發明係一邊對刻劃輪51施加荷重F一邊使其轉動,藉此在玻璃基板4上形成溝渠線TL者。刻劃輪51朝與荷重F之面內成分Fi之方向相同之行進方向DP行進。形成溝渠線TL之工序係為獲得無裂痕狀態而進行者。使玻璃基板4在厚度方向DT上之裂痕沿溝渠線TL朝行進方向伸展,藉此形成裂痕線CL。藉由裂痕線CL,玻璃基板4在溝渠線TL正下方處在與溝渠線TL交叉方向上之連續之相連被斷開。沿裂痕線CL分斷玻璃基板4。 The invention discloses a method for breaking a fragile substrate. Even if the breaking position of the fragile substrate is specified in advance, the fragile substrate can be prevented from being accidentally broken before the time when the fragile substrate should be broken. In the present invention, the scoring wheel 51 is rotated while applying a load F to thereby form a trench line TL on the glass substrate 4. The scoring wheel 51 travels in the same direction DP as the direction of the in-plane component Fi of the load F. The process of forming the trench line TL is performed to obtain a crack-free state. A crack in the thickness direction DT of the glass substrate 4 is extended along the trench line TL in the traveling direction, thereby forming a crack line CL. By the crack line CL, the continuous connection of the glass substrate 4 directly below the trench line TL in the direction crossing the trench line TL is disconnected. The glass substrate 4 is cut along the crack line CL.
Description
本發明係關於一種脆性基板之分斷方法,特別係關於一種使用刻劃輪之分斷方法。 The present invention relates to a method for cutting a fragile substrate, and more particularly to a method for cutting using a scribing wheel.
在平面顯示面板或太陽能電池板等電氣機器之製造中,經常需要將玻璃基板等脆性基板分斷。其首先是在基板上形成刻劃線,其次沿此刻劃線分斷基板。刻劃線可藉由用刀尖機械性地加工基板而形成。藉由將刀尖在基板上滑動或轉動在基板上藉由塑性變形形成溝渠,與此同時,在該溝渠之正下方形成垂直裂痕。其後進行被稱為分斷工序之應力施加。藉由分斷工序使裂痕徹底地沿厚度方向行進,藉此分斷基板。 In the manufacture of electrical devices such as flat display panels and solar panels, it is often necessary to break fragile substrates such as glass substrates. First, a scribe line is formed on the substrate, and then the substrate is broken along the scribe line. The scribe line can be formed by mechanically processing the substrate with a knife edge. A trench is formed by plastic deformation on the substrate by sliding or rotating the blade tip on the substrate, and at the same time, a vertical crack is formed directly below the trench. Thereafter, a stress application called a breaking step is performed. The crack is completely advanced in the thickness direction by the cutting process, thereby cutting the substrate.
在多數情況下,分斷基板之工序係在基板上形成刻劃線之工序之後緊接著進行。然而,亦有提議在形成刻劃線之工序與分斷工序之間進行加工基板之工序。所謂加工基板之工序係例如在基板上設置某些部件之工序者。 In most cases, the step of cutting the substrate is performed immediately after the step of forming a scribe line on the substrate. However, there is also a proposal for processing the substrate between the step of forming the scribe line and the breaking step. The process of processing a substrate is, for example, a process in which some components are provided on a substrate.
例如根據國際公開第2002/104078號技術,在有機EL顯示器之製造方法中,在安裝封蓋之前針對成為各個有機EL顯示器之各個區域,在玻璃基板上形成刻劃線。因此,能夠避免設置封蓋之後在玻璃基板上形成刻劃線時封蓋與玻璃切刀接觸之問題。 For example, according to the technique of International Publication No. 2002/104078, in the method of manufacturing an organic EL display, a scribe line is formed on a glass substrate for each area that becomes each organic EL display before the cover is installed. Therefore, it is possible to avoid the problem that the cover contacts the glass cutter when the scribe line is formed on the glass substrate after the cover is provided.
又,例如根據國際公開第2003/006391號技術,在液晶顯示面板之製造方法中,2個玻璃基板在形成刻劃線之後彼此貼合。藉此,能 夠在1次分斷工序中同時分斷2塊脆性基板。 In addition, for example, according to the technology of International Publication No. 2003/006391, in a method of manufacturing a liquid crystal display panel, two glass substrates are bonded to each other after forming a scribe line. With this, can Enough to cut two brittle substrates at the same time in one cutting process.
【先前技術文獻】 [Previous Technical Literature]
【專利文獻】 [Patent Literature]
【專利文獻1】國際公開第2002/104078號 [Patent Document 1] International Publication No. 2002/104078
【專利文獻2】國際公開第2003/006391號 [Patent Document 2] International Publication No. 2003/006391
根據上述先前技術,對脆性基板之加工係在形成刻劃線後進行,其後藉由施加應力而進行分斷工序。如此意味著對脆性基板進行加工時已存在垂直裂痕。可能出現在加工中意外產生該垂直裂痕沿厚度方向之進一步伸展,導致加工中本應為一體之脆性基板被分離之情形。此外,在刻劃線之形成工序與基板之分斷工序之間不進行基板之加工工序之情形中亦然,通常需要在刻劃線之形成工序之後且在基板之分斷工序之前搬送或保管基板,此時亦可能出現基板被意外分斷之情形。 According to the above-mentioned prior art, the processing of the fragile substrate is performed after the scribe line is formed, and thereafter the breaking process is performed by applying a stress. This means that there are already vertical cracks when processing fragile substrates. It may happen that during the processing, the vertical crack is further extended in the thickness direction, which causes the brittle substrate that should be integrated during processing to be separated. In addition, in the case where the substrate processing step is not performed between the step of forming the scribe line and the step of cutting the substrate, it is usually necessary to transport or store it after the step of forming the scribe line and before the step of cutting the substrate. The substrate may be accidentally cut off at this time.
本發明係為解決如以上之問題而完成者,其目的在於提供一種脆性基板之分斷方法,其能夠防止即使在預先規定脆性基板之分斷位置下,脆性基板仍在較應分斷之時點之前被意外分斷。 The present invention has been made to solve the problems as described above, and an object thereof is to provide a method for breaking a fragile substrate, which can prevent the fragile substrate from being broken at a time when the fragile substrate is broken even in a predetermined breaking position of the fragile substrate. It was accidentally broken before.
本發明之脆性基板之分斷方法使用刻劃輪,該刻劃輪具有繞旋轉軸而設之外周部,於該外周部設置有刀尖,且具有以下工序。 The method for cutting a fragile substrate of the present invention uses a scoring wheel having an outer peripheral portion around a rotation axis, a blade point is provided on the outer peripheral portion, and the following steps are performed.
準備脆性基板,該脆性基板具有第1面及與第1面相反之第2面,且具有垂直於第1面之厚度方向。 A brittle substrate having a first surface and a second surface opposite to the first surface and having a thickness direction perpendicular to the first surface is prepared.
其次,藉由對刻劃輪施加荷重,一邊將刻劃輪之外周部按壓在脆性基板之第1面上,一邊使刻劃輪在脆性基板之第1面上轉動,藉此在脆性基板之第1面上發生塑性變形從而形成具有溝形狀之溝渠線。 荷重具有平行於脆性基板之第1面之面內成分。在形成溝渠線之工序中,刻劃輪在第1面上朝與面內成分方向相同之行進方向行進。形成溝渠線之工序係為獲得下述狀態而進行:脆性基板在溝渠線正下方處在與溝渠線交叉之方向上連續地相連之狀態即無裂痕狀態。 Next, by applying a load to the scribe wheel, while pressing the outer periphery of the scribe wheel on the first surface of the fragile substrate, the scribe wheel is rotated on the first surface of the fragile substrate, thereby allowing the The first surface is plastically deformed to form a trench line having a trench shape. The load has an in-plane component parallel to the first surface of the fragile substrate. In the step of forming the trench line, the scoring wheel travels on the first surface in the same direction as the in-plane component direction. The process of forming the trench line is performed to obtain a state in which the brittle substrate is continuously connected in a direction crossing the trench line directly below the trench line, that is, a state without cracks.
其次,使脆性基板在厚度方向上之裂痕沿溝渠線朝行進方向伸展,藉此形成裂痕線。藉由裂痕線,脆性基板在溝渠線之正下方處在與溝渠線交叉之方向上之連續之相連被斷開。 Next, a crack in the thickness direction of the brittle substrate is extended along the trench line in the direction of travel, thereby forming a crack line. By the crack line, the continuous connection of the fragile substrate directly below the trench line in a direction crossing the trench line is disconnected.
其次,沿裂痕線分斷脆性基板。 Second, the brittle substrate is cut along the crack line.
根據本發明,形成在正下方不具有裂痕之溝渠線作為規定脆性基板分斷位置之線。作為分斷之直接開端所使用之裂痕線係在形成溝渠線之後藉由沿該溝渠線伸展裂痕而形成。藉此,形成溝渠線之後且形成裂痕線之前的脆性基板,即使由溝渠線規定其分斷位置,因裂痕線尚未形成,故仍處於不容易發生分斷之狀態。藉由利用該狀態,能夠防止即使在預先規定脆性基板之分斷位置下,脆性基板仍在較應分斷之時點之前被意外分斷。 According to the present invention, a ditch line having no cracks formed immediately below is used as a line defining a breaking position of the fragile substrate. The crack line used as the direct beginning of the break is formed by extending the crack along the trench line after forming the trench line. With this, the brittle substrate after the trench line is formed and before the crack line is formed, even if the breaking position is specified by the trench line, the crack line is not easily broken because the crack line has not been formed yet. By using this state, it is possible to prevent the fragile substrate from being accidentally broken before the point at which the fragile substrate should be broken, even at a predetermined breaking position of the fragile substrate.
4‧‧‧玻璃基板/脆性基板 4‧‧‧ glass substrate / brittle substrate
50‧‧‧切割器具 50‧‧‧ cutting appliances
51‧‧‧刻劃輪 51‧‧‧ Scribing Wheel
52‧‧‧銷 52‧‧‧pin
53‧‧‧固定架 53‧‧‧ fixed frame
AL‧‧‧輔助線 AL‧‧‧Auxiliary line
AX‧‧‧旋轉軸 AX‧‧‧Rotary axis
CL‧‧‧裂痕線 CL‧‧‧ Rift Line
DC‧‧‧方向 DC‧‧‧ direction
DP‧‧‧行進方向 DP‧‧‧ Direction of travel
DT‧‧‧厚度方向 DT‧‧‧thickness direction
ED1‧‧‧邊 ED1‧‧‧side
ED2‧‧‧邊 ED2‧‧‧side
F‧‧‧荷重 F‧‧‧Load
Fi‧‧‧面內成分 Fi‧‧‧ in-plane ingredients
Fp‧‧‧垂直成分 Fp‧‧‧ vertical composition
MS‧‧‧表面形狀 MS‧‧‧ Surface shape
N1‧‧‧起點 N1‧‧‧ starting point
N2‧‧‧中途點 N2‧‧‧ Halfway
N3‧‧‧終點 N3‧‧‧ Finish
PF‧‧‧外周部 PF‧‧‧ Peripheral Department
RT‧‧‧箭頭 RT‧‧‧ Arrow
SF1‧‧‧上表面/第1面 SF1‧‧‧upper / first
SF2‧‧‧下表面/第2面 SF2‧‧‧bottom surface / 2nd surface
TL‧‧‧溝渠線 TL‧‧‧Ditch Line
圖1係概略顯示圖1之脆性基板之分斷方法所使用之切割器具之構成的側視圖。 FIG. 1 is a side view schematically showing the configuration of a cutting tool used in the method for cutting a brittle substrate in FIG. 1.
圖2(A)及圖2(B)係概略顯示刻劃輪及銷之構成的前視圖(A)、及圖2(A)的局部擴大圖(B)。 2 (A) and 2 (B) are a front view (A) schematically showing the configuration of a scoring wheel and a pin, and a partially enlarged view (B) of FIG. 2 (A).
圖3係概略顯示本發明之實施形態1中脆性基板之分斷方法之構成的流程圖。 FIG. 3 is a flowchart schematically showing a configuration of a method for cutting a fragile substrate in Embodiment 1 of the present invention.
圖4(A)及圖4(B)係概略顯示本發明之實施形態1中脆性基板之分斷方法之第1及第2工序的俯視圖。 4 (A) and 4 (B) are plan views schematically showing the first and second steps of the method for breaking a fragile substrate in Embodiment 1 of the present invention.
圖5(A)及圖5(B)係概略顯示圖4(A)中所形成之溝渠線之構成的端 面圖(A)、及圖4(B)中所形成之裂痕線之構成的端面圖(B)。 FIG. 5 (A) and FIG. 5 (B) are ends showing the structure of the trench line formed in FIG. 4 (A). The top view (A) and the end view (B) of the structure of the crack line formed in FIG. 4 (B).
圖6(A)及圖6(B)係概略顯示本發明之實施形態1之變化例中脆性基板之分斷方法的俯視圖。 6 (A) and 6 (B) are plan views schematically showing a method for breaking a brittle substrate in a modified example of the first embodiment of the present invention.
圖7係概略顯示本發明之實施形態2中脆性基板之分斷方法的俯視圖。 FIG. 7 is a plan view schematically showing a method for cutting a brittle substrate in Embodiment 2 of the present invention.
圖8係概略顯示本發明之實施形態3中脆性基板之分斷方法的俯視圖。 FIG. 8 is a plan view schematically showing a method for cutting a brittle substrate in Embodiment 3 of the present invention.
圖9係概略顯示本發明之實施形態4中脆性基板之分斷方法的俯視圖。 FIG. 9 is a plan view schematically showing a method for breaking a brittle substrate in Embodiment 4 of the present invention.
以下基於圖式說明本發明之實施形態。並且,在以下圖式中,對相同或相當之部分賦予相同之參照符號,不再重複其說明。 Hereinafter, embodiments of the present invention will be described based on the drawings. In the following drawings, the same or corresponding parts are given the same reference signs, and descriptions thereof will not be repeated.
參照圖1、圖2(A)及圖2(B),首先,說明本實施形態之玻璃基板4(脆性基板)之分斷方法所使用之切割器具50如下。 Referring to FIG. 1, FIG. 2 (A), and FIG. 2 (B), first, the cutting tool 50 used in the method for cutting the glass substrate 4 (brittle substrate) according to this embodiment will be described below.
切割器具50藉由安裝於刻劃頭(未圖示)而對於玻璃基板4相對地移動,藉此對玻璃基板4進行刻劃。切割器具50具有刻劃輪51、銷52及固定架53。刻劃輪51具有大略圓盤狀之形狀,其直徑典型地在數個mm左右。刻劃輪51經由銷52固持於固定架53,可繞旋轉軸AX旋轉。 The cutting tool 50 is mounted on a scoring head (not shown) to move the glass substrate 4 relatively, thereby scoring the glass substrate 4. The cutting tool 50 includes a scoring wheel 51, a pin 52, and a fixing frame 53. The scoring wheel 51 has a substantially disk-like shape, and its diameter is typically around several mm. The scoring wheel 51 is fixed to the fixed frame 53 via a pin 52 and is rotatable about a rotation axis AX.
刻劃輪51具有設置有刀尖之外周部PF。外周部PF繞旋轉軸AX以圓環狀延伸。如圖2(A)所示,外周部PF在目視水準下呈稜線狀陡立,藉此構成包含稜線與傾斜面之刀尖。另一方面,在顯微鏡水準下,因刻劃輪51侵入玻璃基板4內而實際地起作用之部分(較圖2(B)之兩點鏈線更下方)中,外周部PF之稜線具有細微的表面形狀MS。在前視圖(圖2(B))中,表面形狀MS宜具有曲線形狀且該曲線形狀具有有限之曲率半徑。刻劃輪51係使用超硬合金、燒結金剛石、多晶金剛石或單晶 金剛石等硬質材料而形成。從減小上述稜線及傾斜面之表面粗糙度之觀點來看,刻劃輪51整體可由單晶金剛石製作。 The scoring wheel 51 has an outer peripheral portion PF provided with a cutting edge. The outer peripheral portion PF extends in a ring shape around the rotation axis AX. As shown in FIG. 2 (A), the outer peripheral portion PF is ridge-like and steep at a visual level, thereby constituting a cutting edge including a ridge and an inclined surface. On the other hand, at the microscope level, in the part that actually works because the scoring wheel 51 penetrates into the glass substrate 4 (below the two-point chain line in FIG. 2 (B)), the ridge line of the outer peripheral portion PF has a fine Surface shape MS. In the front view (FIG. 2 (B)), the surface shape MS preferably has a curved shape and the curved shape has a limited radius of curvature. Scribing wheel 51 is made of superhard alloy, sintered diamond, polycrystalline diamond or single crystal It is made of hard materials such as diamond. From the viewpoint of reducing the surface roughness of the ridgeline and the inclined surface, the entire scribe wheel 51 can be made of single crystal diamond.
其次,一邊參照圖3所示之流程,一邊說明使用切割器具50之基板4之分斷方法如下。 Next, referring to the flow shown in FIG. 3, a method for cutting the substrate 4 using the cutting tool 50 will be described below.
參照圖1及圖4(A),準備具有上表面SF1(第1面)與下表面SF2(與第1面相反之第2面)之玻璃基板4(圖3:步驟S10)。玻璃基板4具有垂直於上表面SF1之厚度方向DT。在圖4中,玻璃基板4具有彼此對向之邊ED1及ED2。 1 and 4 (A), a glass substrate 4 having an upper surface SF1 (first surface) and a lower surface SF2 (second surface opposite to the first surface) is prepared (FIG. 3: Step S10). The glass substrate 4 has a thickness direction DT perpendicular to the upper surface SF1. In FIG. 4, the glass substrate 4 has edges ED1 and ED2 facing each other.
其次,使刻劃輪51在玻璃基板4之上表面SF1上轉動(圖1:箭頭RT),藉此刻劃輪51在上表面SF1上朝行進方向DP行進。利用上述轉動之行進係藉由對刻劃輪51施加荷重F,而一邊將刻劃輪51之外周部PF按壓在玻璃基板4之上表面SF1上一邊進行。藉此在玻璃基板4之上表面SF1上產生塑性變形從而形成具有溝形狀之溝渠線TL(圖3:步驟S20)。 Next, the scoring wheel 51 is rotated on the upper surface SF1 of the glass substrate 4 (FIG. 1: arrow RT), whereby the scoring wheel 51 travels on the upper surface SF1 in the traveling direction DP. The traveling by the rotation is performed by applying a load F to the scoring wheel 51 while pressing the outer peripheral portion PF of the scoring wheel 51 on the upper surface SF1 of the glass substrate 4. Thereby, plastic deformation occurs on the upper surface SF1 of the glass substrate 4 to form a trench line TL having a trench shape (FIG. 3: Step S20).
荷重F具有平行於玻璃基板4之厚度方向DT之垂直成分Fp與平行於上表面SF1之面內成分Fi。行進方向DP與面內成分Fi之方向相同。 The load F has a vertical component Fp parallel to the thickness direction DT of the glass substrate 4 and an in-plane component Fi parallel to the upper surface SF1. The direction of travel DP is the same as the direction of the in-plane component Fi.
參照圖5(A),上述之形成溝渠線TL之工序係為獲得下述狀態而進行:玻璃基板4在溝渠線TL正下方處在與溝渠線TL交叉之方向DC上連續地相連之狀態即無裂痕狀態。在無裂痕狀態中,雖然已藉由塑性變形形成溝渠線TL,但是尚未形成沿該溝渠線之裂痕。因此,即使對玻璃基板4施加扭矩,仍不會容易地發生沿溝渠線之分斷。為得到無裂痕狀態,只要不過度增大垂直成分Fp(圖1)即可。 Referring to FIG. 5 (A), the above-mentioned step of forming the trench line TL is performed in order to obtain a state in which the glass substrate 4 is continuously connected in a direction DC that intersects the trench line TL directly below the trench line TL. No cracks. In the crack-free state, although the trench line TL has been formed by plastic deformation, a crack along the trench line has not been formed. Therefore, even if a torque is applied to the glass substrate 4, the break along the trench line does not easily occur. In order to obtain a crack-free state, it is sufficient that the vertical component Fp is not excessively increased (FIG. 1).
圖4(A)中,溝渠線TL係自起點N1,經由中途點N2直至終點N3而形成。溝渠線TL宜遠離上表面SF1之邊緣而形成。藉此,刻劃輪51無需接觸上表面SF1之邊緣。 In FIG. 4 (A), the ditch line TL is formed from the starting point N1, passing through the halfway point N2 to the ending point N3. The trench line TL should be formed away from the edge of the upper surface SF1. Thereby, the scoring wheel 51 does not need to contact the edge of the upper surface SF1.
進一步參照圖4(B),其次形成輔助線AL。以此為開端,沿溝渠 線TL形成裂痕線CL(圖3:步驟S30)。 Referring further to FIG. 4 (B), an auxiliary line AL is formed next. Use this as a starting point, along the ditch The line TL forms a crack line CL (FIG. 3: Step S30).
參照圖5(B),藉由裂痕線CL,玻璃基板4在溝渠線TL正下方處在與溝渠線TL之延長方向(圖4(A)及(B)之橫向方向)交叉之方向DC上之連續之相連被斷開。換言之,此處所謂「連續之相連」係未被裂痕遮斷之連接。並且,在如上述之連續之相連被斷開之狀態下,介以裂痕線CL之裂痕,玻璃基板4之各個部分之間亦可彼此接觸。藉由使玻璃基板4在厚度方向DT上之裂痕(參照圖5(B))沿溝渠線TL朝行進方向DP伸展而進行裂痕線CL之形成。 Referring to FIG. 5 (B), by the crack line CL, the glass substrate 4 is directly below the trench line TL in a direction DC crossing the extending direction of the trench line TL (the lateral direction of FIGS. 4 (A) and (B)). The continuous connection is disconnected. In other words, the so-called "continuous connection" here is a connection that is not interrupted by cracks. In addition, in a state where the continuous connection is disconnected as described above, each part of the glass substrate 4 can also contact each other through the crack of the crack line CL. The crack line CL is formed by extending a crack (see FIG. 5 (B)) in the thickness direction DT of the glass substrate 4 along the trench line TL in the traveling direction DP.
輔助線AL係以與玻璃基板4之上表面SF1上之溝渠線TL相接的方式形成,在本實施形態中,以與溝渠線TL交叉之方式形成。輔助線AL係一般之刻劃線,因此,伴有在玻璃基板4之厚度方向DT上滲透之裂痕。亦可將形成溝渠線TL所用之切割器具50用於輔助線AL之形成,但此時需要較形成溝渠線TL時之荷重F更大之荷重。並且,為更加確實地形成輔助線AL,亦可使用其他器具。例如,亦可使用沿外周部PF設置有凹凸形狀之刻劃輪。利用如上器具,可容易地形成伴有更深裂痕之輔助線AL。並且,如圖4(B)所示,在輔助線AL開始於遠離玻璃基板4之邊緣之位置之情形(所謂內切)時,亦能夠更加確實地產生裂痕。 The auxiliary line AL is formed so as to be in contact with the trench line TL on the upper surface SF1 of the glass substrate 4. In this embodiment, it is formed so as to cross the trench line TL. Since the auxiliary line AL is a general scribe line, it is accompanied by a crack that penetrates in the thickness direction DT of the glass substrate 4. The cutting tool 50 used to form the trench line TL may also be used to assist the formation of the line AL, but at this time, a larger load than the load F when the trench line TL is formed is required. In addition, in order to form the auxiliary line AL more reliably, other devices may be used. For example, a scribing wheel provided with an uneven shape along the outer peripheral portion PF may be used. With the above apparatus, the auxiliary line AL with deeper cracks can be easily formed. Furthermore, as shown in FIG. 4 (B), when the auxiliary line AL starts at a position far away from the edge of the glass substrate 4 (so-called incision), a crack can be more reliably generated.
又,裂痕線CL之形成相信係因溝渠線TL附近之內部應力之應變釋放而開始。具體而言,認為該內部應力係在形成輔助線AL時由加諸玻璃基板4的應力所釋放。認為作為裂痕線CL之形成開始的開端之處理只要是某種成為內部應力被釋放的開端之處理即可,不限於上述輔助線AL之形成處理。 The formation of the crack line CL is believed to have begun by strain release of internal stress near the trench line TL. Specifically, it is considered that the internal stress is released by the stress applied to the glass substrate 4 when the auxiliary line AL is formed. It is considered that the process that is the beginning of the formation of the crack line CL may be any process that is the beginning of the release of internal stress, and is not limited to the formation process of the auxiliary line AL described above.
根據本發明者之研究,與自中途點N2朝終點N3之方向相比,自中途點N2朝起點N1之方向更難形成裂痕線CL。亦即存在所謂方向依存性,即,在形成溝渠線TL時,裂痕線CL容易朝與刻劃輪51之行進 方向DP相同之方向伸展。其原因被認為起因於上述之內部應力之分佈。 According to the study by the present inventors, it is more difficult to form the crack line CL from the halfway point N2 toward the starting point N1 than from the halfway point N2 toward the end point N3. That is, there is a so-called direction dependency, that is, when the ditch line TL is formed, the crack line CL tends to travel toward the scribing wheel 51 Stretch in the same direction as DP. The reason is considered to be due to the above-mentioned internal stress distribution.
其次,在步驟S40(圖3)中,藉由所謂分斷工序沿裂痕線CL分斷玻璃基板4。分斷工序可藉由例如施加外力使玻璃基板撓曲而進行。並且,裂痕線CL在其形成時沿厚度方向DT徹底行進時,裂痕線CL之形成與玻璃基板4之分斷可同時發生。在上述情形時分斷工序可省略。 Next, in step S40 (FIG. 3), the glass substrate 4 is cut along the crack line CL in a so-called cutting step. The breaking step can be performed, for example, by applying an external force to bend the glass substrate. In addition, when the crack line CL travels completely in the thickness direction DT during its formation, the formation of the crack line CL and the breaking of the glass substrate 4 may occur simultaneously. In the above case, the breaking process can be omitted.
根據本實施形態,形成在正下方不具有裂痕之溝渠線TL(圖5(A))作為規定玻璃基板4之分斷位置之線。作為分斷之直接開端所使用之裂痕線CL(圖5(B))係在形成溝渠線TL之後藉由沿該溝渠線伸展裂痕而形成。藉此,形成溝渠線TL之後且形成裂痕線CL之前之玻璃基板4(圖4(A)),即使由溝渠線TL規定欲使玻璃基板4分斷之位置,仍處於尚未形成沿該溝渠線TL之裂痕之無裂痕狀態。只要不對玻璃基板4施加過大之應力,則可容易地維持無裂痕狀態。因此,在該無裂痕狀態期間,可穩定地進行玻璃基板4之保管、搬送,及在玻璃基板4上之成膜及蝕刻等加工而不會伴隨裂痕之意外產生。 According to the present embodiment, a trench line TL (FIG. 5 (A)) without a crack immediately below is formed as a line defining the breaking position of the glass substrate 4. The crack line CL (FIG. 5 (B)) used as the direct beginning of the breaking is formed by extending the crack along the trench line after forming the trench line TL. With this, the glass substrate 4 (FIG. 4 (A)) after the trench line TL is formed and before the crack line CL is formed, even though the position where the glass substrate 4 is to be broken is specified by the trench line TL, it is still not formed along the trench line Crack-free state of TL cracks. As long as no excessive stress is applied to the glass substrate 4, the crack-free state can be easily maintained. Therefore, during this crack-free state, the glass substrate 4 can be stably stored, transported, and film-formed and etched on the glass substrate 4 without being accidentally generated.
根據如以上之本實施形態,藉由利用無裂痕狀態,即使預先了規定玻璃基板4之分斷位置,亦能防止玻璃基板4在所期望之時點之前被意外分斷。 According to this embodiment as described above, by using the crack-free state, even if the breaking position of the glass substrate 4 is specified in advance, the glass substrate 4 can be prevented from being accidentally broken before a desired point in time.
又,本實施形態之裂痕線CL之形成工序與所謂分斷工序之裂痕之產生本質上不同。分斷工序係使已形成之裂痕在厚度方向上進一步伸展,藉此將基板徹底地分離者。另一方面,裂痕線CL之形成工序伴有質的變化,即,從藉由溝渠線TL之形成而得到之無裂痕狀態朝具有沿溝渠線TL之裂痕之狀態變化。此變化被認為係藉由無裂痕狀態所具有之內部應力的釋放而發生。 The step of forming the crack line CL in this embodiment is substantially different from the generation of cracks in the so-called breaking step. The breaking step is to further extend the formed cracks in the thickness direction, thereby completely separating the substrate. On the other hand, the formation process of the crack line CL is accompanied by a qualitative change, that is, from a crack-free state obtained by the formation of the trench line TL to a state having a crack along the trench line TL. This change is thought to occur through the release of internal stresses in a crack-free state.
其次,說明本實施形態之變化例。參照圖6(A),僅形成輔助線 AL時,有無法形成沿溝渠線TL之裂痕線CL之情形。參照圖6(B),即便在該情形時,亦能夠沿輔助線AL分離玻璃基板4,藉此使裂痕線CL開始形成。 Next, a modified example of this embodiment will be described. 6 (A), only auxiliary lines are formed In AL, a crack line CL along the trench line TL may not be formed. Referring to FIG. 6 (B), even in this case, the glass substrate 4 can be separated along the auxiliary line AL, whereby the crack line CL can be formed.
並且,本變化例之輔助線AL亦可藉由與上述裂痕線CL相同之方法形成。亦即,也可在形成溝渠線之後,藉由沿此溝渠線形成裂痕而形成。 In addition, the auxiliary line AL of this modification can also be formed by the same method as the crack line CL described above. That is, after the trench line is formed, it may be formed by forming a crack along the trench line.
在本實施形態之玻璃基板4之分斷方法中亦然,首先利用與上述實施形態1相同之方法,在玻璃基板4之上表面SF1上形成溝渠線TL(圖4(A))。 The same is true of the method for breaking the glass substrate 4 in this embodiment. First, a trench line TL is formed on the upper surface SF1 of the glass substrate 4 by the same method as in the first embodiment (FIG. 4 (A)).
參照圖7,其次在玻璃基板4之下表面SF2上形成輔助線AL。在平面佈置中輔助線AL係與溝渠線TL交叉。又,在本實施形態中,輔助線AL及溝渠線TL形成於玻璃基板4之不同面上,故彼此不直接接觸。 Referring to FIG. 7, an auxiliary line AL is formed next on the lower surface SF2 of the glass substrate 4. The auxiliary line AL crosses the ditch line TL in a planar arrangement. In this embodiment, since the auxiliary lines AL and the trench lines TL are formed on different surfaces of the glass substrate 4, they are not in direct contact with each other.
其次,與實施形態1之圖6(B)大略相同,沿輔助線AL分離玻璃基板4。藉此開始形成裂痕線CL。其後,與實施形態1相同,沿裂痕線CL分斷玻璃基板4。 Next, similarly to FIG. 6 (B) of the first embodiment, the glass substrate 4 is separated along the auxiliary line AL. This starts the formation of the crack line CL. Thereafter, as in the first embodiment, the glass substrate 4 is divided along the crack line CL.
在本實施形態之玻璃基板4之分斷方法中,首先利用與上述實施形態1相同之方法,在玻璃基板4之上表面SF1上形成溝渠線TL(圖4(A))。 In the cutting method of the glass substrate 4 in this embodiment, first, a trench line TL is formed on the upper surface SF1 of the glass substrate 4 by the same method as in the first embodiment (FIG. 4 (A)).
參照圖8,其次,在玻璃基板4之上表面SF1上,以與溝渠線TL局部重合之方式形成輔助線AL。圖中,輔助線AL係在溝渠線TL之中以與起點N1與中途點N2之間之部分重合且遠離終點N3之方式形成。輔助線AL之長度係例如0.5mm左右。以輔助線AL之形成為開端,形成裂痕線CL。 Referring to FIG. 8, the auxiliary line AL is formed on the upper surface SF1 of the glass substrate 4 so as to partially overlap the trench line TL. In the figure, the auxiliary line AL is formed in the ditch line TL so as to coincide with a portion between the start point N1 and the halfway point N2 and be far from the end point N3. The length of the auxiliary line AL is, for example, about 0.5 mm. Starting from the formation of the auxiliary line AL, a crack line CL is formed.
並且,上述以外之構成與前述實施形態1之構成大略相同,故賦予相同或對應之要素以相同符號,不再重複其說明。 In addition, the configuration other than the above is almost the same as the configuration of the first embodiment, and therefore the same or corresponding elements are given the same reference numerals, and descriptions thereof will not be repeated.
在本實施形態之玻璃基板4之分斷方法中,首先亦利用與上述實施形態1相同之方法,在玻璃基板4之上表面SF1上形成溝渠線TL(圖4(A))。 In the cutting method of the glass substrate 4 in this embodiment, first, a trench line TL is formed on the upper surface SF1 of the glass substrate 4 by the same method as in the first embodiment (FIG. 4 (A)).
參照圖9,其次,以雷射光照射溝渠線TL之一部分。圖中,以雷射光照射溝渠線TL之中在起點N1與中途點N2之間且遠離終點N3之部分。藉此,在溝渠線TL之中起點N1與中途點N2之間之部分形成裂痕線CL,以此為開端,自中途點N2朝終點N3形成裂痕線CL。 Referring to FIG. 9, a part of the trench line TL is irradiated with laser light. In the figure, a portion of the trench line TL between the start point N1 and the halfway point N2 and far from the end point N3 is irradiated with laser light. Thereby, a crack line CL is formed in the portion between the starting point N1 and the halfway point N2 in the trench line TL. From this, a crack line CL is formed from the halfway point N2 toward the end point N3.
又,上述以外之構成係與前述實施形態1之構成大略相同,故賦予相同或對應之要素以相同符號,不再重複其說明。 In addition, the configuration other than the above is almost the same as the configuration of the first embodiment, and therefore the same or corresponding elements are given the same reference numerals, and descriptions thereof will not be repeated.
上述各實施形態之脆性基板之分斷方法特別適用於玻璃基板,但脆性基板亦可由玻璃以外之材料製作。例如,亦可使用陶瓷、矽、化合物半導體、藍寶石,或石英作為玻璃以外之材料。 The method for cutting a brittle substrate in each of the above embodiments is particularly suitable for a glass substrate, but the brittle substrate may be made of a material other than glass. For example, ceramics, silicon, compound semiconductors, sapphire, or quartz can also be used as materials other than glass.
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TW201417156A (en) * | 2012-10-26 | 2014-05-01 | Mitsuboshi Diamond Ind Co Ltd | Breaking method and breaking apparatus of brittle material substrate |
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JP6288293B2 (en) | 2018-03-07 |
WO2016067728A1 (en) | 2016-05-06 |
KR20170067805A (en) | 2017-06-16 |
KR101866824B1 (en) | 2018-07-17 |
TW201615579A (en) | 2016-05-01 |
CN107108322A (en) | 2017-08-29 |
JPWO2016067728A1 (en) | 2017-07-06 |
CN107108322B (en) | 2020-01-14 |
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