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TWI650371B - Curable epoxy composition, film, laminated film, prepreg, laminate, cured product and composite - Google Patents

Curable epoxy composition, film, laminated film, prepreg, laminate, cured product and composite Download PDF

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TWI650371B
TWI650371B TW103137353A TW103137353A TWI650371B TW I650371 B TWI650371 B TW I650371B TW 103137353 A TW103137353 A TW 103137353A TW 103137353 A TW103137353 A TW 103137353A TW I650371 B TWI650371 B TW I650371B
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film
epoxy compound
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TW201615737A (en
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藤村誠
坂野豪
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日本瑞翁股份有限公司
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Abstract

提供一種硬化性環氧組成物、以及使用其而得到的薄膜、積層薄膜、預浸材、積層體、硬化物及複合體,其中此硬化性環氧組成物,係含有下列而成:多元環氧化合物(A),其係具有聯苯構造及/或縮合多環構造;含磷環氧化合物(B),其係具有以下式(1)或(2)表示之構造;及含三嗪構造的酚樹脂(C)。 Provided are a curable epoxy composition, a film obtained by using the same, a laminated film, a prepreg, a laminate, a cured product, and a composite, wherein the curable epoxy composition comprises the following: a multi-ring An oxygen compound (A) having a biphenyl structure and/or a condensed polycyclic structure; a phosphorus-containing epoxy compound (B) having a structure represented by the following formula (1) or (2); and a triazine-containing structure Phenolic resin (C).

(式(1)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~4的整數,式(2)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~5的整數)。 (In the formula (1), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and represent 0 to 0. An integer of 4, in the formula (2), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and Indicates an integer from 0 to 5.)

Description

硬化性環氧組成物、薄膜、積層薄膜、預浸材、積層體、硬化物及複合體 Curable epoxy composition, film, laminated film, prepreg, laminate, cured product and composite

本發明係有關於一種硬化性環氧組成物、薄膜、積層薄膜、預浸材、積層體、硬化物及複合體。 The present invention relates to a curable epoxy composition, a film, a laminated film, a prepreg, a laminate, a cured product, and a composite.

隨著追求電子機器的小型化、多功能化、通信高速化等,在電子機器所使用的電路基板係被要求進一步高密度化,為了因應此種高密度化的要求,係謀求電路基板的多層化。此種多層電路基板,係例如在由電絕緣層及在其表面所形成的導體層所構成之內層基板上,層積電絕緣層且使導體層形成在此電絕緣層上,而且藉由重複進行此等電絕緣層的層積及導體層的形成來形成。 In order to reduce the size, the versatility of the electronic device, and the high-speed communication, the circuit board used in the electronic device is required to be further increased in density. In order to meet the demand for such high density, it is necessary to obtain a multilayer of the circuit board. Chemical. Such a multilayer circuit substrate is formed, for example, on an inner layer substrate composed of an electrically insulating layer and a conductor layer formed on a surface thereof, and an electrically insulating layer is laminated and a conductor layer is formed on the electrically insulating layer, and This is formed by repeating the lamination of these electrically insulating layers and the formation of a conductor layer.

作為用以構成此種多層電路基板的電絕緣層之材料,通常係使用陶瓷、熱硬化性樹脂等。尤其是作為熱硬化性樹脂之環氧樹脂,因為在經濟性與性能的平衡是優異的,所以被廣泛地使用。 As a material for constituting the electrically insulating layer of such a multilayer circuit substrate, ceramics, thermosetting resins, and the like are usually used. In particular, an epoxy resin which is a thermosetting resin is widely used because it is excellent in balance between economy and performance.

作為用以構成此種電絕緣層之環氧樹脂材料,例如,專利文獻1係揭示一種含有(A)環氧樹脂、(B)活性酯化合物、及(C)含三嗪的甲酚酚醛清漆樹脂之環氧樹脂組成物。在專利文獻1,係記載使用此種環氧樹脂組成物時,能夠形成一 種僅管粗度小、但是對鍍覆導體顯示高密著力且經低線膨脹率化.低介電損耗角正切(low dielectric loss tangent)化之絕緣層。 As an epoxy resin material for constituting such an electrically insulating layer, for example, Patent Document 1 discloses an cresol novolak containing (A) an epoxy resin, (B) an active ester compound, and (C) a triazine-containing cresol. Resin epoxy resin composition. Patent Document 1 describes that when such an epoxy resin composition is used, it is possible to form one The tube has a small thickness, but shows a high density on the plated conductor and a low linear expansion rate. Low dielectric loss tangent insulation layer.

在此,在前述的多層電路基板,在多層電路基板中所形成之各導體層,其構成係如以下:透過設置在電絕緣層之通路孔(via hole)而互相層間連接。而且,在形成被使用在此種層間連接之通路孔時,係藉由對電絕緣層照射雷射而設置通路孔用孔穴之後,進行金屬鍍覆處理,為了將在那以前因雷射照射所產生之殘留在下層導體層上和電絕緣層之樹脂殘渣(smear)除去,係進行去殘渣處理。去殘渣處理係例如藉由將形成有通路孔用孔穴之多層基板,浸漬在過錳酸鉀和重鉻酸鉀之化學氧化劑的溶液而將此孔穴內的殘渣溶解除去等來進行。此種去殘渣處理不充分而無法充分地確保去殘渣性時,即便對通路孔進行金屬鍍覆處理,亦由於殘渣的原因而有無法充分地確保上層導體層與下層導體層的導通性之可能性。 Here, in the multilayer circuit board described above, each of the conductor layers formed on the multilayer circuit board has a structure in which the layers are connected to each other through a via hole provided in the electrically insulating layer. Further, when a via hole to be used in such interlayer connection is formed, a hole for a via hole is formed by irradiating a laser to the electrically insulating layer, and then a metal plating process is performed, in order to be irradiated by the laser before. The resulting resin residue (smear) remaining on the lower conductor layer and the electrically insulating layer is subjected to residue removal treatment. The residue removal treatment is performed, for example, by immersing a multilayer substrate having pores for via holes in a solution of a chemical oxidizing agent of potassium permanganate and potassium dichromate to dissolve and remove the residue in the pores. When the residue removal treatment is insufficient and the residue resistance cannot be sufficiently ensured, even if the via hole is subjected to metal plating treatment, the conductivity of the upper conductor layer and the lower conductor layer may not be sufficiently ensured due to the residue. Sex.

又,在多層電路基板,導體層必須與電絕緣層密著,其密著性弱時,在多層電路基板的製造步驟中和封裝中,而且在作為電子材料用基板之使用中等產生剝離,致使可靠性有無法充分地確保之可能性。 Further, in the multilayer circuit board, the conductor layer must be adhered to the electrically insulating layer, and when the adhesion is weak, peeling occurs in the manufacturing process of the multilayer circuit substrate and in the package, and in the use as the substrate for the electronic material. Reliability has the potential to be insufficiently ensured.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

[專利文獻1]日本特開2011-132507號公報 [Patent Document 1] Japanese Laid-Open Patent Publication No. 2011-132507

在此種實際情況,本發明者等進行研討時,瞭解 了使用在上述的專利文獻1所記載的環氧樹脂組成物而形成多層印刷配線板的電絕緣層時,雖然耐熱性和電特性係大致良好,但是去殘渣性差且與導體層的密著性仍然不充分。 In this practical situation, the inventors of the present invention, etc. When the electrical insulating layer of the multilayer printed wiring board is formed using the epoxy resin composition described in Patent Document 1, the heat resistance and electrical properties are substantially good, but the residue is poor and the adhesion to the conductor layer is poor. Still not enough.

本發明之目的,係提供一種硬化性環氧組成物、以及使用其而得到的薄膜、積層薄膜、預浸材、積層體、硬化物及複合體,其中此硬化性環氧組成物係能夠形成耐熱性、電性及去殘渣性優異且具有良好的平衡、而且與導體層之密著性亦優異之電絕緣層。 An object of the present invention is to provide a curable epoxy composition, and a film, a laminate film, a prepreg, a laminate, a cured product, and a composite obtained by using the same, wherein the curable epoxy composition can be formed An electrically insulating layer which is excellent in heat resistance, electrical properties, and degreasability, has a good balance, and is excellent in adhesion to a conductor layer.

為了達成上述目的,本發明者等專心研究的結果,發現使用含有具有聯苯構造及/或縮合多環構造之多元環氧化合物、特定含磷環氧化合物、及含三嗪構造的酚樹脂而成之硬化性環氧組成物時,能夠得到具有所需要的特性之電絕緣層,而完成了本發明。 In order to achieve the above object, the inventors of the present invention have found that a polyvalent epoxy compound having a biphenyl structure and/or a condensed polycyclic structure, a specific phosphorus-containing epoxy compound, and a phenol resin having a triazine structure are used. When the curable epoxy composition is formed, an electrically insulating layer having desired characteristics can be obtained, and the present invention has been completed.

亦即,依照本發明,係提供下列: That is, in accordance with the present invention, the following are provided:

[1]一種硬化性環氧組成物,係含有下列而成:多元環氧化合物(A),其係具有聯苯構造及/或縮合多環構造;含磷環氧化合物(B),其係具有以下式(1)或(2)表示之構造;及含三嗪構造的酚樹脂(C), [1] A curable epoxy composition comprising the following: a polyvalent epoxy compound (A) having a biphenyl structure and/or a condensed polycyclic structure; and a phosphorus-containing epoxy compound (B). a structure represented by the following formula (1) or (2); and a phenol resin (C) having a triazine structure,

(式(1)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~4的整數,式(2)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~5的整數)。 (In the formula (1), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and represent 0 to 0. An integer of 4, in the formula (2), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and Indicates an integer from 0 to 5.)

[2]如[1]所述之硬化性環氧組成物,其中前述含磷環氧化合物(B)係具有以下式(3)表示的磷雜菲(phosphaphenanthrene)構造之環氧化合物, [2] The curable epoxy composition according to [1], wherein the phosphorus-containing epoxy compound (B) has an epoxy compound of a phosphaphenanthrene structure represented by the following formula (3),

[3]如[1]或[2]所述之硬化性環氧組成物,其中前述多元環氧化合物(A)與前述含磷環氧化合物(B)之含有比例,係以「多元環氧化合物(A):含磷環氧化合物(B)」的重量比計,為20:80~95:5。 [3] The curable epoxy composition according to [1] or [2], wherein the ratio of the polyvalent epoxy compound (A) to the phosphorus-containing epoxy compound (B) is "multiple epoxy" The weight ratio of the compound (A): phosphorus-containing epoxy compound (B)" is from 20:80 to 95:5.

[4]如[1]至[3]項中任一項所述之硬化性環氧組成物,其中前述含三嗪構造的酚樹脂(C)的含有比例,係相對於在硬化性環氧組成物中所含有的環氧化合物之合計100重量份,為1~60重量份。 [4] The curable epoxy composition according to any one of [1] to [3] wherein the content of the triazine-containing phenol resin (C) is relative to the curable epoxy The total amount of the epoxy compound contained in the composition is from 1 to 60 parts by weight based on 100 parts by weight.

[5]如[1]至[4]項中任一項所述之硬化性環氧組成物,其中進一步含有活性酯化合物(D)。 [5] The curable epoxy composition according to any one of [1] to [4], further comprising an active ester compound (D).

[6]一種薄膜,係由如前述[1]至[5]項中任一項所述之硬化性環氧組成物所構成。 [6] A film comprising the curable epoxy composition according to any one of the above [1] to [5].

[7]一種積層薄膜,係具有由如前述[1]至[5]項中任一項所述之硬化性環氧組成物所構成之接著層;及由被鍍覆層用樹脂組成物所構成被鍍覆層。 [7] A laminate film comprising the adhesive layer comprising the curable epoxy composition according to any one of the above [1] to [5]; and a resin composition for a layer to be plated Form a layer to be plated.

[8]一種預浸材,係由如前述[6]所述之薄膜、或如前述[7]所述之積層薄膜、及纖維基材所構成。 [8] A prepreg comprising the film according to the above [6], or the laminated film according to the above [7], and a fibrous substrate.

[9]一種積層體,係在基材層積如在前述[6]所述之薄膜、如在前述[7]所述之積層薄膜或如在前述[8]所述之預浸材而成。 [9] A laminated body obtained by laminating a film according to the above [6], a laminated film according to the above [7], or a prepreg as described in the above [8]. .

[10]一種硬化物,係將如前述[1]、[2]、[3]、[4]或[5]所述之硬化性環氧組成物、如前述[6]所述之薄膜、如前述[7]所述之積層薄膜、如前述[8]所述之預浸材、或如前述[1]所述之積層體硬化而成。 [10] A hardened epoxy composition according to the above [1], [2], [3], [4] or [5], the film according to the above [6], The laminated film according to the above [7], the prepreg according to the above [8], or the laminate according to the above [1] is cured.

[11]一種複合體,係在如前述[10]所述之硬化物的表面形成導體層而成。 [11] A composite obtained by forming a conductor layer on the surface of the cured product according to the above [10].

[12]一種電子材料用基板,係含有如前述[10]所述之硬化物或如前述[11]所述之複合體作為構成材料。 [12] A substrate for an electronic material, comprising the cured product according to the above [10] or the composite according to the above [11] as a constituent material.

依照本發明,能夠提供一種硬化性環氧組成物、以及使用其而得到的薄膜、積層薄膜、預浸材、積層體、硬化物及複合體,其中此硬化性環氧組成物係能夠形成耐熱性、電特性及去殘渣性優異且具有良好的平衡,而且與導體層之密著性亦優異之電絕緣層。 According to the present invention, it is possible to provide a curable epoxy composition, a film obtained by using the same, a laminate film, a prepreg, a laminate, a cured product, and a composite, wherein the curable epoxy composition is capable of forming heat resistance An electrically insulating layer which is excellent in properties, electrical properties, and degreasability, has a good balance, and is excellent in adhesion to a conductor layer.

用以實施發明之形態 Form for implementing the invention

本發明的硬化性環氧組成物,係含有下列而成之組成物:具有聯苯構造及/或縮合多環構造之多元環氧化合物(A);含磷環氧化合物(B);及含三嗪構造的酚樹脂(C)。 The curable epoxy composition of the present invention contains the following composition: a polyvalent epoxy compound (A) having a biphenyl structure and/or a condensed polycyclic structure; a phosphorus-containing epoxy compound (B); A phenolic resin (C) of a triazine structure.

[具有聯苯構造及/或縮合多環構造之多元環氧化合物(A)] [Multi-element epoxy compound (A) having a biphenyl structure and/or a condensed polycyclic structure]

在本發明所使用之具有聯苯構造及/或縮合多環構造之多元環氧化合物(A)[以下,有簡稱為多元環氧化合物(A)之情形],係在1分子中具有至少2個環氧基(環氧乙烷環)且具有聯苯構造及縮合多環構造的至少一方,而且不具有後述的式(1)或(2)所示的構造之化合物。 The polyvalent epoxy compound (A) having a biphenyl structure and/or a condensed polycyclic structure used in the present invention [hereinafter, abbreviated as a polyvalent epoxy compound (A)] has at least 2 in one molecule. The epoxy group (oxirane ring) has at least one of a biphenyl structure and a condensed polycyclic structure, and does not have a compound having a structure represented by the formula (1) or (2) described later.

前述所謂聯苯構造,係指苯環以2個單鍵連接而成之構造。在所得到的硬化樹脂,聯苯構造係通常構成此樹脂的主鏈,但是亦可存在於側鏈。 The above-mentioned biphenyl structure refers to a structure in which a benzene ring is connected by two single bonds. In the obtained hardened resin, the biphenyl structure usually constitutes the main chain of the resin, but may be present in the side chain.

又,前述所謂縮合多環構造,係指2個以上的單環縮合(縮環)而成之構造。構成縮合多環構造之環係可為脂環亦可為芳香環,又,亦可為含有雜原子者。縮合環數係沒有特別限定,從提高所得到的電絕緣層的耐熱性、機械強度等之觀點而言,以2環以上為佳,實用上,作為其上限,係10環左右。作為此種縮合多環構造,例如可舉出二環戊二烯構造、萘構造、茀構造、蒽構造、菲構造、三鄰亞苯構造、芘構造、卵苯(ovalene)構造等。縮合多環構造係與上述的聯苯構造同樣地,在所得到 的硬化樹脂,通常係構成此樹脂的主鏈,但是亦可存在於側鏈。 Moreover, the above-mentioned condensed polycyclic structure means a structure in which two or more single-ring condensations (condensed rings) are formed. The ring system constituting the condensed polycyclic structure may be an alicyclic ring or an aromatic ring, or may be a hetero atom. The number of the condensed rings is not particularly limited, and from the viewpoint of improving the heat resistance and mechanical strength of the obtained electrically insulating layer, it is preferably two or more rings, and practically, the upper limit is about 10 rings. Examples of such a condensed polycyclic structure include a dicyclopentadiene structure, a naphthalene structure, a fluorene structure, a fluorene structure, a phenanthrene structure, a tri-p-phenylene structure, a fluorene structure, and an ovalene structure. The condensed polycyclic structure is obtained in the same manner as the biphenyl structure described above. The hardened resin usually constitutes the main chain of the resin, but may also be present in the side chain.

本發明所使用的多元環氧化合物(A),係具有聯苯構造、縮合多環構造、或聯苯構造與縮合多環構造之二者,從提高所得到的電絕緣層的耐熱性和機械強度之觀點而言,作為多元環氧化合物(A),係以具有聯苯構造者為佳,以具有聯苯芳烷基構造者為較佳。 The polyvalent epoxy compound (A) used in the present invention has both a biphenyl structure, a condensed polycyclic structure, or a biphenyl structure and a condensed polycyclic structure, and improves the heat resistance and mechanical properties of the obtained electrically insulating layer. From the viewpoint of strength, the polyvalent epoxy compound (A) is preferably a biphenyl structure, and a biphenyl aralkyl structure is preferred.

又,作為多元環氧化合物(A),係將具有聯苯構造者(包含具有聯苯構造及縮合多環構造之二者)及具有縮合多環構造者併用時,從使電絕緣層的耐熱性和電特性提升之觀點而言,該等的調配比例,係以重量比(具有聯苯構造之多元環氧化合物/具有縮合多環構造之多元環氧化合物)計,通常以3/7~7/3為佳。 Further, the polyvalent epoxy compound (A) is a heat-resistant insulating layer when a biphenyl structure (including both a biphenyl structure and a condensed polycyclic structure) and a condensed polycyclic structure are used in combination. From the viewpoint of improvement in properties and electrical characteristics, the ratio of these ratios is based on the weight ratio (multicomponent epoxy compound having a biphenyl structure/polyvalent epoxy compound having a condensed polycyclic structure), usually 3/7~ 7/3 is better.

在本發明所使用之多元環氧化合物(A),係只要在1分子中具有至少2個環氧基(環氧乙烷環)且具有聯苯構造及/或縮合多環構造之化合物,其構造就不被限定,從電絕緣層具有優異的耐熱性、機械強度等之觀點而言,以具有聯苯構造及/或縮合多環構造之酚醛清漆型環氧化合物為佳。作為酚醛清漆型環氧化合物,可舉出苯酚酚醛清漆型環氧化合物、甲酚酚醛清漆型環氧化合物等。 The polyvalent epoxy compound (A) used in the present invention is a compound having at least two epoxy groups (oxirane rings) in one molecule and having a biphenyl structure and/or a condensed polycyclic structure. The structure is not limited, and a novolac type epoxy compound having a biphenyl structure and/or a condensed polycyclic structure is preferred from the viewpoint of having excellent heat resistance and mechanical strength of the electrically insulating layer. Examples of the novolac type epoxy compound include a phenol novolak type epoxy compound and a cresol novolac type epoxy compound.

作為多元環氧化合物(A),因為能夠得到良好的硬化反應性,其環氧當量係通常為100~1500當量,較佳是以150~500當量者為適合。又,在本說明書所謂「環氧當量」,係指含有1克當量的環氧基之環氧化合物的克數(g/eq),能夠依照JIS K 7236的方法而測定。 As the polyvalent epoxy compound (A), since it can obtain good hardening reactivity, the epoxy equivalent is usually from 100 to 1,500 equivalents, preferably from 150 to 500 equivalents. In the present specification, the term "epoxy equivalent" means the number of grams (g/eq) of an epoxy compound containing 1 gram equivalent of an epoxy group, and can be measured in accordance with the method of JIS K 7236.

在本發明所使用之多元環氧化合物(A),係能夠依照習知的方法而適當地製造,但是亦能夠以市售品的方式取得。 The polyvalent epoxy compound (A) used in the present invention can be suitably produced according to a conventional method, but can also be obtained as a commercially available product.

作為具有聯苯構造之多元環氧化合物(A)的市售品之例子,係具有聯苯芳烷基構造之酚醛清漆型環氧化合物,例如商品名「NC3000-FH、NC3000-H、NC3000、NC3000-L、NC3100」(以上,日本化藥公司製);具有四甲基聯苯構造之環氧化合物,例如商品名「YX-4000」(以上,三菱化學公司製)等。 An example of a commercially available product of a polyvalent epoxy compound (A) having a biphenyl structure is a novolak type epoxy compound having a biphenyl aralkyl structure, for example, trade names "NC3000-FH, NC3000-H, NC3000, NC3000-L, NC3100" (manufactured by Nippon Kayaku Co., Ltd.); an epoxy compound having a tetramethylbiphenyl structure, for example, a trade name "YX-4000" (above, manufactured by Mitsubishi Chemical Corporation).

又,作為具有縮合多環構造之多元環氧化合物(A)的市售品之例子,係具有二環戊二烯構造之酚醛清漆型環氧化合物,例如商品名「Epiclon HP7200L、Epiclon HP7200、Epiclon HP7200H、Epiclon HP7200HH、Epiclon HP7200HHH」(以上,DIC公司製、「Epiclon」係註冊商標)、商品名「Tactix556、Tactix756」(以上,Huntsman Advanced Materials公司製、「Tactix」係註冊商標)、商品名「XD-1000-1L、XD-1000-2L」(以上,日本化藥公司製);具有茀構造之環氧化合物,例如商品名「ONCOAT EX-1010、ONCOAT EX-1011、ONCOAT EX-1012、ONCOAT EX-1020、ONCOAT EX-1030、ONCOAT EX-1040、ONCOAT EX-1050、ONCOAT EX-1051」(以上,長瀬產業公司製、「ONCOAT」係註冊商標)、商品名「OGSOL PG-100、OGSOL EG-200、OGSOL EG-250)」(以上,大阪Gas Chemicals公司製、「OGSOL」係註冊商標)等。 Further, as an example of a commercially available product of the polyvalent epoxy compound (A) having a condensed polycyclic structure, a novolac type epoxy compound having a dicyclopentadiene structure, for example, the trade name "Epiclon HP7200L, Epiclon HP7200, Epiclon" HP7200H, Epiclon HP7200HH, Epiclon HP7200HHH" (above, DIC company, "Epiclon" registered trademark), trade name "Tactix556, Tactix756" (above, "Tactix" registered trademark of Huntsman Advanced Materials Co., Ltd.), product name" XD-1000-1L, XD-1000-2L" (manufactured by Nippon Kayaku Co., Ltd.); an epoxy compound having a ruthenium structure, for example, "ONCOAT EX-1010, ONCOAT EX-1011, ONCOAT EX-1012, ONCOAT" EX-1020, ONCOAT EX-1030, ONCOAT EX-1040, ONCOAT EX-1050, ONCOAT EX-1051" (above, "ONCOAT" registered trademark), trade name "OGSOL PG-100, OGSOL EG" -200, OGSOL EG-250)" (above, Osaka Gas Chemicals Co., Ltd., "OGSOL" is a registered trademark).

以上的多元環氧化合物(A),係能夠各自單獨、或混合2種以上而使用。 The above polyvalent epoxy compound (A) can be used singly or in combination of two or more kinds.

(含磷環氧化合物(B)) (phosphorus containing epoxy compound (B))

在本發明所使用之含磷環氧化合物(B),係具有以下述式(1)或(2)表示的構造之含磷環氧化合物即可,而沒有特別限定。 The phosphorus-containing epoxy compound (B) used in the present invention may be a phosphorus-containing epoxy compound having a structure represented by the following formula (1) or (2), and is not particularly limited.

(式(1)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~4的整數。 (In the formula (1), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and represent 0 to 0. An integer of 4.

式(2)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~5的整數)。 In the formula (2), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and represent 0 to 5 Integer).

在本發明,藉由將作為環氧化合物之上述的具有聯苯構造及/或縮合多環構造之多元環氧化合物(A)、及具有以前述式(1)或(2)的構造之含磷環氧化合物(B)併用,而且使用含三嗪構造的酚樹脂(C)作為硬化劑,能夠使所得到的電絕緣層成為耐熱性、電特性、及去殘渣性優異且具有良好的平衡,而且與導體層的密著性(特別是在高溫高濕試驗後之與導體層的密著性)亦優異者。 In the present invention, the above-mentioned polyvalent epoxy compound (A) having a biphenyl structure and/or a condensed polycyclic structure as an epoxy compound, and a structure having the structure of the above formula (1) or (2) When the phosphorus epoxy compound (B) is used in combination and the phenol resin (C) having a triazine structure is used as the curing agent, the obtained electrically insulating layer can be excellent in heat resistance, electrical properties, and residue resistance, and has a good balance. Moreover, the adhesion to the conductor layer (especially the adhesion to the conductor layer after the high-temperature and high-humidity test) is also excellent.

作為具有以前述式(1)或(2)表示的構造之含磷環氧化合物(B),係具有以下式(3)表示的磷雜菲構造之環氧化合物為特佳。 The phosphorus-containing epoxy compound (B) having the structure represented by the above formula (1) or (2) is particularly preferably an epoxy compound having a phosphaphenanthrene structure represented by the following formula (3).

作為上述具有磷雜菲構造之環氧化合物,係沒有特別限定,例如可舉出具有磷雜菲構造之聯苯型環氧化合物、具有磷雜菲構造之雙酚型環氧化合物、具有磷雜菲構造之酚系酚醛清漆型環氧化合物等。 The epoxy compound having a phosphaphenanthene structure is not particularly limited, and examples thereof include a biphenyl type epoxy compound having a phosphaphenanthene structure, a bisphenol type epoxy compound having a phosphaphenanthrene structure, and a phosphorus compound. A phenolic novolac type epoxy compound such as a phenanthrene structure.

作為具有磷雜菲構造之聯苯型環氧化合物,可舉出藉由使用9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物或其衍生物且使用習知的方法將聯苯型環氧樹脂改性,而能夠得到之各種具有磷雜菲構造的聯苯型環氧化合物等。作為此種化合物的例子,係沒有特別限定,可舉出使用9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物,將具有四甲基聯苯構造的環氧化合物之三菱化學公司製的YX-4000改性而得到的環氧化合物等。 The biphenyl type epoxy compound having a phosphaphenanthene structure can be exemplified by using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide or a derivative thereof. The method is to modify a biphenyl type epoxy resin, and various biphenyl type epoxy compounds having a phosphaphenanthrene structure can be obtained. The example of such a compound is not particularly limited, and an epoxy having a tetramethylbiphenyl structure can be used by using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide. An epoxy compound obtained by modifying YX-4000 manufactured by Mitsubishi Chemical Corporation.

又,作為具有磷雜菲構造之雙酚型環氧化合物,可舉出藉由使用9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物或其衍生物且使用習知的方法,將雙酚A型環氧樹脂、雙酚F型環氧樹脂等的雙酚型環氧樹脂改性而得到之各種具有磷雜菲構造的雙酚型環氧化合物等。作為此種化合物的例子,係沒有特別限定,可舉出新日鐵住金化學公司製的FX305EK70。 Further, examples of the bisphenol type epoxy compound having a phosphaphenanthrene structure can be exemplified by using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide or a derivative thereof. A bisphenol type epoxy compound having a phosphaphenanthrene structure obtained by modifying a bisphenol type epoxy resin such as a bisphenol A type epoxy resin or a bisphenol F type epoxy resin. The FX305EK70 manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd. is exemplified as an example of such a compound.

而且,作為具有磷雜菲構造之酚系酚醛清漆型環氧化合物,可舉出藉由使用9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物或其衍生物且使用習知的方法,將酚系酚醛清漆型環氧 樹脂改性而得到之各種具有磷雜菲構造之酚系酚醛清漆型環氧化合物等。作為此種化合物的例子,係沒有特別限定,可舉出例如新日鐵住金化學公司製的FX289BEK75。 Further, as the phenolic novolac type epoxy compound having a phosphaphenanthrene structure, by using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide or a derivative thereof And a phenolic novolak type epoxy using a conventional method Various phenolic novolak type epoxy compounds having a phenanthroline structure obtained by resin modification. The example of such a compound is not particularly limited, and for example, FX289BEK75 manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd. is mentioned.

作為在本發明所使用之含磷環氧化合物(B),係在其分子內具有1個以上的環氧基者即可,但是從能夠提升交聯密度,藉此所得到的電絕緣層的機械強度、耐熱性、線膨脹率不容易低落,進而能夠提升電特性方面而言,係以在分子內具有至少2個環氧基之多元環氧化合物為佳。 The phosphorus-containing epoxy compound (B) used in the present invention may have one or more epoxy groups in its molecule, but an electrically insulating layer obtained by increasing the crosslinking density. The mechanical strength, heat resistance, and linear expansion ratio are not easily lowered, and in terms of electrical characteristics, a polyvalent epoxy compound having at least two epoxy groups in the molecule is preferred.

在本發明的硬化性環氧組成物之含磷環氧化合物(B)的含量,係沒有特別限定,但是從與上述的多元環氧化合物(A)之關係而言,以「多元環氧化合物(A):含磷環氧化合物(B)」的重量比計,係以設為20:80~95:5的範圍為佳。藉由將在本發明的硬化性環氧組成物中之含磷環氧化合物(B)的含量,設為與上述的多元環氧化合物(A)的關係為上述範圍,能夠使所得到的電絕緣層的耐熱性、電特性、去殘渣性及對導體層之密著性進一步提高。又,從能夠使所得到的電絕緣層的電特性成為更優異者之觀點而言,以「多元環氧化合物(A):含磷環氧化合物(B)」的重量比計,係以設為60:40~95:5的範圍為較佳,以設為60:40~80:20的範圍為特佳。或是從能夠使所得到的電絕緣層成為去殘渣性更優異者之觀點而言,係以設為20:80~55:45的範圍為較佳,以設為25:75~55:45的範圍為特佳。 The content of the phosphorus-containing epoxy compound (B) in the curable epoxy composition of the present invention is not particularly limited, but from the relationship with the above-mentioned polyvalent epoxy compound (A), "polyvalent epoxy compound" The weight ratio of (A): phosphorus-containing epoxy compound (B)" is preferably in the range of 20:80 to 95:5. By setting the content of the phosphorus-containing epoxy compound (B) in the curable epoxy composition of the present invention to the above range of the polyvalent epoxy compound (A), the obtained electricity can be obtained. The heat resistance, electrical properties, slag resistance, and adhesion to the conductor layer of the insulating layer are further improved. In addition, from the viewpoint of making the electrical characteristics of the obtained electrically insulating layer more excellent, the weight ratio of the "polyvalent epoxy compound (A): phosphorus-containing epoxy compound (B)" is used. The range of 60:40 to 95:5 is preferable, and the range of 60:40 to 80:20 is particularly preferable. Or from the viewpoint that the obtained electrically insulating layer can be more excellent in degreasability, it is preferably in the range of 20:80 to 55:45, and is preferably set to 25:75 to 55:45. The range is particularly good.

(其他環氧化合物) (other epoxy compounds)

又,在本發明的硬化性環氧組成物,係除了上述的多元環 氧化合物(A)及含磷環氧化合物(B)以外,亦可依照需要而適當地含有那些環氧化合物以外的其他環氧化合物。作為此種其他環氧化合物,例如能夠適合舉出三元以上的多元酚型環氧化合物,藉由進一步使用此種三元以上的多元酚型環氧化合物,能夠使所得到的電絕緣層的耐熱性、電特性進一步提升。 Further, in the curable epoxy composition of the present invention, in addition to the above polycyclic ring In addition to the oxygen compound (A) and the phosphorus-containing epoxy compound (B), other epoxy compounds other than the epoxy compound may be appropriately contained as needed. As such another epoxy compound, for example, a trihydric or higher polyphenol type epoxy compound can be suitably used, and by using such a trihydric or higher polyphenol type epoxy compound, the obtained electrically insulating layer can be obtained. Heat resistance and electrical properties are further improved.

作為三元以上的多元酚型環氧化合物,係三元以上的多元酚的環氧化合物即可,而沒有特別限定,以三元以上的多元羥苯基烷型環氧化合物為佳。在此,所謂三元以上的多元羥苯基烷型環氧化合物,係指具有將被3個以上的羥苯基取代的脂肪族烴之羥基進行環氧丙基化而成的構造之化合物。 The trivalent or higher polyhydric phenol type epoxy compound may be an epoxy compound of a trihydric or higher polyhydric phenol, and is not particularly limited, and a trihydric or higher polyhydric hydroxyphenyl alkene epoxy compound is preferred. Here, the trivalent or higher polyhydroxyphenylene oxide type epoxy compound is a compound having a structure in which a hydroxyl group of an aliphatic hydrocarbon substituted with three or more hydroxyphenyl groups is subjected to epoxidation.

此種三元以上的多元羥苯基烷型環氧化合物之中,以三~四元的多元羥苯基烷型環氧化合物為較佳,尤其是三羥苯基甲烷型環氧化合物、四羥苯基乙烷型環氧化合物係特別適合使用。 Among such trivalent or higher polyhydroxyphenylene oxide type epoxy compounds, a three- to four-membered polyhydroxyphenylene type epoxy compound is preferred, especially a trishydroxyphenylmethane type epoxy compound, and four Hydroxyphenylethane type epoxy compounds are particularly suitable for use.

作為三羥苯基甲烷型環氧化合物的具體例,係沒有特別限定,可舉出商品名「EPPN-503、EPPN-502H、EPPN-501H」(以上,日本化藥公司製)、商品名「TACTIX-742」(以上,Dow Chemical公司製)、「jER 1032H60」(以上,三菱化學公司製)等。又,作為四羥苯基乙烷型環氧化合物的具體例,係沒有特別限定,可舉出商品名「jER 1031S」(以上,三菱化學公司製)等。 Specific examples of the trishydroxyphenylmethane-based epoxy compound are not particularly limited, and examples thereof include "EPPN-503, EPPN-502H, and EPPN-501H" (above, manufactured by Nippon Kayaku Co., Ltd.) and trade name " TACTIX-742 (above, manufactured by Dow Chemical Co., Ltd.), "jER 1032H60" (above, manufactured by Mitsubishi Chemical Corporation), and the like. In addition, the specific example of the tetrahydroxyphenylethane type epoxy compound is not particularly limited, and the product name "jER 1031S" (above, manufactured by Mitsubishi Chemical Corporation) and the like can be mentioned.

在本發明的硬化性環氧組成物,含有三元以上的多元酚型環氧化合物作為其他環氧化合物時,三元以上的多元酚型環氧化合物之含有比例係只要不阻礙本發明效果之顯 現,就沒有特別限定,在本發明的硬化性環氧組成物中所含有的環氧化合物之合計100重量%中,以1~45重量%為佳,較佳為3~40重量%。特別是使用三元以上的多元酚型環氧化合物作為其他環氧化合物且藉由使其含有比例為上述範圍,能夠進一步提高所得到的電絕緣層的耐熱性、電特性及對導體層之密著性的提升效果。 When the curable epoxy composition of the present invention contains a trihydric or higher polyphenol-type epoxy compound as the other epoxy compound, the content ratio of the trihydric or higher polyphenol-type epoxy compound is not inhibited by the effect of the present invention. Display The total amount of the epoxy compound contained in the curable epoxy composition of the present invention is preferably from 1 to 45% by weight, preferably from 3 to 40% by weight, based on 100% by weight of the total of the epoxy compound. In particular, when a trihydric or higher polyphenol type epoxy compound is used as the other epoxy compound and the content ratio thereof is in the above range, the heat resistance, electrical properties, and adhesion to the conductor layer of the obtained electrically insulating layer can be further improved. The effect of sexual improvement.

又,作為其他環氧化合物,係除了三元以上的多元酚型環氧化合物以外,或者亦可使用脂環式環氧化合物、甲酚酚醛清漆型環氧化合物、苯酚酚醛清漆型環氧化合物、雙酚A酚醛清漆型環氧化合物、參酚型環氧化合物、肆(羥苯基)乙烷型環氧化合物、脂肪族鏈狀環氧化合物等,這些係能夠以適當的市售品之方式取得。 Further, as the other epoxy compound, in addition to the ternary or higher polyphenol type epoxy compound, an alicyclic epoxy compound, a cresol novolak type epoxy compound, a phenol novolak type epoxy compound, or an epoxide novolak type epoxy compound may be used. A bisphenol A novolak type epoxy compound, a phenol type epoxy compound, a fluorenyl (hydroxyphenyl) ethane type epoxy compound, an aliphatic chain epoxy compound, etc., which can be suitably marketed Acquired.

(含三嗪構造的酚樹脂(C)) (phenolic resin containing triazine structure (C))

在本發明所使用之含三嗪構造的酚樹脂(C),係指具有苯酚、甲酚及萘酚等的芳香族羥基化合物、三聚氰胺、苯并胍胺等具有三嗪環之化合物、及甲醛之縮合聚合物。含三嗪構造的酚樹脂(C)係典型地具有以下述式(4)表示之構造。 The phenol resin (C) having a triazine structure used in the present invention means an aromatic hydroxy compound such as phenol, cresol or naphthol, a compound having a triazine ring such as melamine or benzoguanamine, and formaldehyde. The condensation polymer. The phenol resin (C) having a triazine structure typically has a structure represented by the following formula (4).

(式(4)中,R3、R4係氫原子或甲基,p係1~30的整數。又,R3、R4係各自可相同亦可以互相不同,而且,p為2以上時, 複數個R4係各自可相同亦可以互相不同。又,針對在式(4)中之至少一方的胺基,在胺基中所含有的氫原子亦可被其他的基(例如,烷基等)取代) (In the formula (4), R 3 and R 4 are a hydrogen atom or a methyl group, and p is an integer of 1 to 30. Further, each of R 3 and R 4 may be the same or different from each other, and when p is 2 or more Further, the plurality of R 4 groups may be the same or different from each other. Further, for the amine group of at least one of the formula (4), the hydrogen atom contained in the amine group may be other groups (for example, an alkyl group). Etc) replace)

含三嗪構造的酚樹脂(C)係藉由存在酚性的活性羥基,而具有作為在本發明所使用的環氧化合物的硬化劑之作用,特別是藉由含有含三嗪構造的酚樹脂(C),所得到的電絕緣層,係成為對此層所被層積的導體層、特別是由銅所構成之導體層顯示具有優異的密著性者。 The phenol resin (C) having a triazine structure functions as a hardener for the epoxy compound used in the present invention by the presence of a phenolic active hydroxyl group, particularly by containing a phenol resin having a triazine-containing structure. (C) The obtained electrically insulating layer exhibits excellent adhesion to the conductor layer laminated on the layer, particularly the conductor layer composed of copper.

含三嗪構造的酚樹脂(C)係能夠依照習知的方法來製造,亦能夠以市售品的方式取得。作為此種市售品的例子,可舉出商品名「LA7052、LA7054、LA3018、LA1356」(以上,DIC公司製)等。以上之含三嗪構造的酚樹脂(C),係能夠各自單獨、或混合2種以上而使用。 The phenol resin (C) having a triazine structure can be produced by a conventional method, and can also be obtained as a commercially available product. As an example of such a commercial item, the brand name "LA7052, LA7054, LA3018, LA1356" (above, DIC company) etc. are mentioned. The phenol resin (C) having a triazine structure as described above can be used alone or in combination of two or more.

在本發明的硬化性環氧組成物中之含三嗪構造的酚樹脂(C)的調配量,係相對於所使用的環氧化合物之合計(亦即,多元環氧化合物(A)、含磷環氧化合物(B)、以及依需求而使用的其他環氧化合物之合計)100重量份,以1~60重量份為佳,較佳為2~50重量份,更佳為3~40重量份的範圍。 The compounding amount of the triazine-containing phenol resin (C) in the curable epoxy composition of the present invention is based on the total of the epoxy compounds used (that is, the polyvalent epoxy compound (A), 100 parts by weight of the phosphorus epoxy compound (B) and other epoxy compounds used as required, preferably 1 to 60 parts by weight, preferably 2 to 50 parts by weight, more preferably 3 to 40 parts by weight. The scope of the share.

又,本發明的硬化樹脂組成物中,所使用的環氧化合物與含三嗪構造的酚樹脂(C)之當量比[相對於所使用的環氧化合物的環氧基之合計數,含三嗪構造的酚樹脂(C)的活性羥基量之合計數之比例(活性羥基量/環氧基量)],係以0.01~1.1為佳,較佳為0.05~0.6,更佳為0.1~0.4的範圍。藉由將含三嗪構造的酚樹脂(C)的調配量設為上述範圍,能夠進一步提升 所得到的電絕緣層的電特性、及耐熱性。又,所使用的環氧化合物與含三嗪構造的酚樹脂(C)之當量比,係能夠從所使用的環氧化合物的總環氧當量、與含三嗪構造的酚樹脂(C)的總活性羥基當量來求取。 Further, in the cured resin composition of the present invention, the equivalent ratio of the epoxy compound to the phenol resin (C) having a triazine structure [the total number of epoxy groups of the epoxy compound to be used is three The ratio of the total amount of active hydroxyl groups of the phenol resin (C) of the azine structure (the amount of active hydroxyl groups / the amount of epoxy groups) is preferably 0.01 to 1.1, preferably 0.05 to 0.6, more preferably 0.1 to 0.4. The scope. By setting the amount of the phenol resin (C) having a triazine structure to the above range, it is possible to further enhance Electrical properties and heat resistance of the obtained electrically insulating layer. Further, the equivalent ratio of the epoxy compound to be used to the phenol resin (C) having a triazine structure can be from the total epoxy equivalent of the epoxy compound to be used, and the phenol resin (C) having a triazine structure. The total active hydroxyl equivalent is obtained.

[活性酯化合物(D)] [Active ester compound (D)]

又,本發明的硬化性環氧組成物係除了上述各成分以外,以含有活性酯化合物(D)為佳。作為活性酯化合物(D),係具有活性酯基者即可,在本發明係以在分子內具有至少2個活性酯基之化合物為佳。 Further, the curable epoxy composition of the present invention preferably contains the active ester compound (D) in addition to the above respective components. The active ester compound (D) may have an active ester group, and in the present invention, a compound having at least two active ester groups in the molecule is preferred.

活性酯化合物(D)係藉由加熱使得酯部位與環氧基反應,而與上述之含三嗪構造的酚樹脂(C)同樣地具有作為在本發明所使用的環氧化合物的硬化劑之作用。 The active ester compound (D) is reacted with an epoxy group by heating to have a hardener as an epoxy compound used in the present invention in the same manner as the above-described triazine-containing phenol resin (C). effect.

作為活性酯化合物(D),從提高所得到的電絕緣層的耐熱性等的觀點而言,以從羧酸化合物及/或硫羧酸化合物、與羥基化合物及/或硫醇化合物反應而成者所得到的活性酯化合物為佳,以使選自由羧酸化合物、酚化合物、萘酚化合物及硫醇化合物所組成群組之1種或2種以上反應而成者所得到的活性酯化合物為較佳,以從使羧酸化合物與具有酚性羥基之芳香族化合物反應而成者所得到者且在分子內具有至少2個活性酯基之芳香族化合物為特佳。活性酯化合物(D)係可為直鏈狀或多分枝狀,若例示的活性酯化合物(D)係源自在分子內具有至少2個羧酸之化合物,此種在分子內具有至少2個羧酸之化合物含有脂肪族鏈時,能夠提高與環氧化合物的相溶性;又,具有芳香族環時,能夠提高耐熱性。 The active ester compound (D) is formed by reacting a carboxylic acid compound and/or a sulfuric acid compound with a hydroxy compound and/or a thiol compound from the viewpoint of improving the heat resistance of the obtained electrically insulating layer. An active ester compound obtained by reacting one or more selected from the group consisting of a carboxylic acid compound, a phenol compound, a naphthol compound, and a thiol compound is preferred. Preferably, an aromatic compound obtained by reacting a carboxylic acid compound with an aromatic compound having a phenolic hydroxyl group and having at least two active ester groups in the molecule is particularly preferred. The active ester compound (D) may be linear or multi-branched, and the exemplified active ester compound (D) is derived from a compound having at least two carboxylic acids in the molecule, and this has at least 2 in the molecule. When the compound of a carboxylic acid contains an aliphatic chain, compatibility with an epoxy compound can be improved, and when it has an aromatic ring, heat resistance can be improved.

作為用以形成活性酯化合物(D)之羧酸化合物的具體例,可舉出苯甲酸、乙酸、琥珀酸、順丁烯二酸、伊康酸、酞酸、異酞酸、對酞酸、焦蜜石酸等。這些之中,從提高所得到的電絕緣層的耐熱性之觀點而言,係以琥珀酸、順丁烯二酸、伊康酸、酞酸、異酞酸、對酞酸為佳,以酞酸、異酞酸、對酞酸為較佳,以異酞酸、對酞酸為更佳。 Specific examples of the carboxylic acid compound for forming the active ester compound (D) include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, citric acid, isodecanoic acid, and p-citric acid. Pyrophyllite and so on. Among these, from the viewpoint of improving the heat resistance of the obtained electrically insulating layer, succinic acid, maleic acid, itaconic acid, citric acid, isophthalic acid, and citric acid are preferred. Acid, isophthalic acid, and citric acid are preferred, and isophthalic acid and citric acid are more preferred.

作為用以形成活性酯化合物(D)之硫羧酸化合物的具體例,可舉出硫乙酸、硫苯甲酸等。 Specific examples of the sulfur carboxylic acid compound for forming the active ester compound (D) include sulfuric acid, thiobenzoic acid, and the like.

作為用以形成活性酯化合物(D)之羥基化合物的具體例,可舉出氫醌、間苯二酚、雙酚A、雙酚F、雙酚S、還原酚酞(phenolphthalin)、甲基化雙酚A、甲基化雙酚F、甲基化雙酚S、苯酚、鄰甲酚、間甲酚、對甲酚、兒茶酚、α-萘酚、β-萘酚、1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯基酮、三羥基二苯基酮、四羥基二苯基酮、根皮三酚、苯三酚、二環戊二烯基二苯酚、苯酚酚醛清漆等。尤其是從提升活性酯化合物(D)的溶解性,同時提高所得到的電絕緣層的耐熱性之觀點而言,以1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯基酮、三羥基二苯基酮、四羥基二苯基酮、二環戊二烯基二苯酚、苯酚酚醛清漆為佳,以二羥基二苯基酮、三羥基二苯基酮、四羥基二苯基酮、二環戊二烯基二苯酚、苯酚酚醛清漆為較佳,二環戊二烯基二苯酚、苯酚酚醛清漆為更佳。 Specific examples of the hydroxy compound for forming the active ester compound (D) include hydroquinone, resorcin, bisphenol A, bisphenol F, bisphenol S, phenolphthalin, and methylated double Phenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-di Hydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxydiphenyl ketone, trihydroxydiphenyl ketone, tetrahydroxydiphenyl ketone, cadaverin, benzenetriol, two Cyclopentadienyl diphenol, phenol novolak, and the like. In particular, from the viewpoint of improving the solubility of the active ester compound (D) while improving the heat resistance of the obtained electrically insulating layer, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6 - Dihydroxynaphthalene, dihydroxydiphenyl ketone, trihydroxydiphenyl ketone, tetrahydroxydiphenyl ketone, dicyclopentadienyl diphenol, phenol novolac, preferably dihydroxydiphenyl ketone, three Hydroxydiphenyl ketone, tetrahydroxydiphenyl ketone, dicyclopentadienyl diphenol, and phenol novolak are preferred, and dicyclopentadienyl diphenol and phenol novolak are more preferred.

作為用以形成活性酯化合物(D)之硫醇化合物的具體例,可舉出苯二硫醇、三嗪二硫醇等。 Specific examples of the thiol compound for forming the active ester compound (D) include benzenedithiol and triazinedithiol.

活性酯化合物(D)的製造方法係沒有特別限定,能夠使用習知的方法來製造。例如,能夠藉由前述的羧酸化合物及/或硫羧酸化合物、與羥基化合物及/或硫醇化合物之縮合反應而得到。 The method for producing the active ester compound (D) is not particularly limited, and it can be produced by a known method. For example, it can be obtained by a condensation reaction of the above carboxylic acid compound and/or a sulfuric acid compound with a hydroxy compound and/or a thiol compound.

在本發明,作為活性酯化合物(D),係例如能夠使用在特開2002-12650號公報所揭示之具有活性酯基之芳香族化合物及在特開2004-277460號公報所揭示之多官能性聚酯、市售品等。作為市售品,例如可舉出商品名「EXB9451、EXB9460、EXB9460S、Epiclon HPC-8000-65T」(以上,DIC公司製、「Epiclon」係註冊商標)、商品名「DC808」(JAPAN EPOXY RESINS公司製)、商品名「YLH1026」(JAPAN EPOXY RESINS公司製)等。 In the present invention, as the active ester compound (D), for example, an aromatic compound having an active ester group disclosed in JP-A-2002-12650 and a polyfunctionality disclosed in JP-A-2004-277460 can be used. Polyester, commercial products, etc. As a commercial item, the brand name "EXB9451, EXB9460, EXB9460S, Epiclon HPC-8000-65T" (above, DIC company, "Epiclon" registered trademark), and product name "DC808" (JAPAN EPOXY RESINS company) )), the product name "YLH1026" (made by JAPAN EPOXY RESINS), etc.

在本發明的硬化性環氧組成物中之活性酯化合物(D)的調配量,係相對於所使用的環氧化合物之合計(亦即,多元環氧化合物(A)、及含磷環氧化合物(B)、以及按照必要而使用的其他環氧化合物之合計)100重量份,以10~150重量份為佳,較佳為15~130重量份,更佳為20~120重量份的範圍。 The compounding amount of the active ester compound (D) in the curable epoxy composition of the present invention is based on the total of the epoxy compound used (that is, the polyvalent epoxy compound (A), and the phosphorus-containing epoxy compound. 100 parts by weight of the compound (B) and, if necessary, other epoxy compounds, preferably 10 to 150 parts by weight, preferably 15 to 130 parts by weight, more preferably 20 to 120 parts by weight. .

又,本發明的硬化樹脂組成物中,所使用的環氧化合物與活性酯化合物(D)之當量比[相對於所使用的環氧化合物的環氧基之合計數,活性酯(D)的反應性基之合計數之比例(活性酯基量/環氧基量)],係以0.5~1.1為佳,較佳為0.6~0.9,更佳為0.65~0.85的範圍。 Further, in the cured resin composition of the present invention, the equivalent ratio of the epoxy compound to the active ester compound (D) is [the total number of epoxy groups relative to the epoxy compound used, and the active ester (D) The ratio of the total number of reactive groups (the amount of active ester groups / the amount of epoxy groups) is preferably from 0.5 to 1.1, more preferably from 0.6 to 0.9, still more preferably from 0.65 to 0.85.

又,本發明的硬化性環氧組成物中,所使用的環氧化合物、與含三嗪構造的酚樹脂(C)及活性酯化合物(D)之當 量比{相對於含三嗪構造的酚樹脂(C)的活性羥基及活性酯化合物(D)的活性酯基之合計數,所使用的環氧化合物的環氧基之合計數之比例[環氧基量/(活性羥基量+活性酯基量)]}、通常為小於1.1,以0.6~0.99為佳,較佳為0.65~0.95的範圍。藉由將上述當量比設為上述範圍,在所得到的電絕緣層能夠良好地發揮電特性及去殘渣性。又,所使用的環氧化合物、與含三嗪構造的酚樹脂(C)及活性酯化合物(D)之當量比,係能夠從所使用的環氧化合物的總環氧當量、含三嗪構造的酚樹脂(C)的總活性羥基當量及活性酯化合物(D)的總活性酯當量求取。 Further, in the curable epoxy composition of the present invention, the epoxy compound to be used, the phenol resin (C) having a triazine structure, and the active ester compound (D) are used. The ratio of the ratio of {the active hydroxyl group of the phenol resin (C) containing the triazine structure and the active ester group of the active ester compound (D), the ratio of the total number of epoxy groups of the epoxy compound used [ring The amount of oxygen / (amount of active hydroxyl group + amount of active ester group)]} is usually less than 1.1, preferably 0.6 to 0.99, more preferably 0.65 to 0.95. By setting the above equivalent ratio to the above range, electrical properties and degreasability can be satisfactorily exhibited in the obtained electrically insulating layer. Further, the equivalent ratio of the epoxy compound to be used and the phenol resin (C) and the active ester compound (D) having a triazine structure can be derived from the total epoxy equivalent of the epoxy compound to be used and the triazine-containing structure. The total active hydroxyl equivalent of the phenol resin (C) and the total active ester equivalent of the active ester compound (D) were determined.

(其他成分) (other ingredients)

本發明的硬化性環氧組成物係在不阻礙本發明效果的顯現之範圍,除了上述各成分以外,亦能夠適當地進一步含有如以下記載之其他成分。 The curable epoxy composition of the present invention may further contain other components as described below in addition to the above-described respective components, insofar as the effects of the present invention are not impaired.

藉由在本發明的硬化性環氧組成物添加填充劑,能夠使所得到的電絕緣層成為低線膨脹性者。作為此填充劑,係習知的無機填充劑及有機填充劑的任一者均能夠使用,以無機填充劑為佳。作為無機填充劑的具體例,係能夠舉出碳酸鈣、碳酸鎂、碳酸鋇、氧化鋅。氧化鈦、氧化鎂、矽酸鎂、矽酸鈣、矽酸鋯、水合氧化鋁、氫氧化鎂、氫氧化鋁、硫酸鋇、氧化矽、滑石、黏土等。又,所使用的填充劑係可以是預先使用矽烷偶合劑等進行表面處理者。作為本發明的硬化性環氧組成物中的填充劑之含量,係沒有特別限定,以固體成分換算計,通常為30~90重量%。 By adding a filler to the curable epoxy composition of the present invention, the obtained electrically insulating layer can be made into a low linear expansion property. Any of the conventional inorganic fillers and organic fillers can be used as the filler, and an inorganic filler is preferred. Specific examples of the inorganic filler include calcium carbonate, magnesium carbonate, barium carbonate, and zinc oxide. Titanium oxide, magnesium oxide, magnesium niobate, calcium niobate, zirconium silicate, hydrated alumina, magnesium hydroxide, aluminum hydroxide, barium sulfate, cerium oxide, talc, clay, and the like. Further, the filler to be used may be a surface treated in advance using a decane coupling agent or the like. The content of the filler in the curable epoxy composition of the present invention is not particularly limited, but is usually 30 to 90% by weight in terms of solid content.

又,在本發明的硬化性環氧組成物,係能夠添加 具有極性基之脂環式烯烴聚合物。作為前述極性基,係可舉出具有能夠與環氧基反應而形成共價鍵的構造之基、及含有雜原子且對環氧基不具有反應性之基,以含有雜原子且對環氧基不具有反應性之基為佳。此種脂環式烯烴聚合物係對環氧基不具有反應性者,因此,實質上係不含有對環氧基具有反應性之官能基者。在此,所謂「實質上係不含有對環氧基具有反應性之官能基」,係意味著脂環式烯烴聚合物係不含有會阻礙本發明效果的顯現的程度之對環氧基具有反應性之官能基。作為對環氧基具有反應性之官能基,係可舉出具有能夠與環氧基反應而形成共價鍵的構造之基,例如,可舉出1級胺基、2級胺基、氫硫基、羧基、羧酸酐基、羥基、及環氧基等與環氧基反應而形成共價鍵之含雜原子的官能基。 Further, the curable epoxy composition of the present invention can be added An alicyclic olefin polymer having a polar group. Examples of the polar group include a group having a structure capable of reacting with an epoxy group to form a covalent bond, and a group having a hetero atom and having no reactivity with an epoxy group, and containing a hetero atom and an epoxy group. It is preferred that the group has no reactivity. Since such an alicyclic olefin polymer is not reactive with an epoxy group, it does not substantially contain a functional group reactive with an epoxy group. Here, the term "substantially does not contain a functional group reactive with an epoxy group" means that the alicyclic olefin polymer does not contain an epoxy group which does not inhibit the effect of the present invention. Functionality of sex. The functional group reactive with an epoxy group is a group having a structure capable of reacting with an epoxy group to form a covalent bond, and examples thereof include a primary amine group, a secondary amine group, and a hydrogen sulfur. A hetero atom-containing functional group which forms a covalent bond by reacting with an epoxy group, such as a carboxyl group, a carboxyl group, a carboxylic anhydride group, a hydroxyl group, and an epoxy group.

上述脂環式烯烴聚合物,係例如能夠將不含有雜原子而含有芳香環之脂環式烯烴單體(a)、不含有芳香環而含有雜原子之脂環式烯烴單體(b)、同時含有芳香環及雜原子之脂環式烯烴單體(c)、及同時不含有芳香環及雜原子之能夠與前述脂環式烯烴單體(a)~(c)共聚合之單體(d)適當地組合且依照習知的方法進行聚合,而能夠容易地得到。亦可對所得到的聚合物進一步進行氫化。 The alicyclic olefin polymer is, for example, an alicyclic olefin monomer (a) which does not contain a hetero atom and contains an aromatic ring, and an alicyclic olefin monomer (b) which does not contain an aromatic ring and contains a hetero atom. An alicyclic olefin monomer (c) containing an aromatic ring and a hetero atom, and a monomer which can be copolymerized with the alicyclic olefin monomer (a) to (c) simultaneously without an aromatic ring and a hetero atom ( d) The polymerization is carried out in an appropriate manner and in accordance with a conventional method, and can be easily obtained. The obtained polymer can also be further hydrogenated.

作為在本發明的硬化性環氧組成物之具有極性基之脂環式烯烴聚合物的調配量,係沒有特別限定,相對於所使用的環氧化合物之合計100重量份,通常為50重量份以下,較佳為35重量份以下。 The amount of the alicyclic olefin polymer having a polar group in the curable epoxy composition of the present invention is not particularly limited, and is usually 50 parts by weight based on 100 parts by weight of the total of the epoxy compound to be used. Hereinafter, it is preferably 35 parts by weight or less.

在本發明的硬化性環氧組成物,亦可依照需要而 含有硬化促進劑。作為硬化促進劑,係沒有特別限定,例如,可舉出脂肪族多元胺、芳香族多元胺、第2級胺、第3級胺、酸酐、咪唑衍生物、有機酸醯肼、氰胍(dicyanodiamide)及其衍生物、尿素衍生物等。尤其是以咪唑衍生物為特佳。 The curable epoxy composition of the present invention may also be as needed Contains a hardening accelerator. The curing accelerator is not particularly limited, and examples thereof include an aliphatic polyamine, an aromatic polyamine, a second amine, a third amine, an acid anhydride, an imidazole derivative, an organic acid hydrazine, and a dicyanodiamide. ) and its derivatives, urea derivatives and the like. In particular, imidazole derivatives are particularly preferred.

作為咪唑衍生物,係具有咪唑骨架之化合物即可,而沒有特別限定,例如,可舉出2-乙基咪唑、2-乙基-4-甲基咪唑、雙-2-乙基-4-甲基咪唑、1-甲基-2-乙基咪唑、2-異丙基咪唑、2,4-二甲基咪唑、2-十七基咪唑等的烷基取代咪唑化合物;2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-乙基咪唑、1-苄基-2-苯基咪唑、苯并咪唑、2-乙基-4-甲基-1-(2’-氰乙基)咪唑等被含有芳基、芳烷基等的環構造之烴基取代之咪唑化合物等。該等係能夠單獨1種、或組合2種類以上而使用。 The imidazole derivative is not particularly limited as long as it is a compound having an imidazole skeleton, and examples thereof include 2-ethylimidazole, 2-ethyl-4-methylimidazole, and bis-2-ethyl-4-. An alkyl-substituted imidazole compound such as methylimidazole, 1-methyl-2-ethylimidazole, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-heptadecylimidazole or the like; 2-phenylimidazole , 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-ethylimidazole, 1-benzyl-2-phenylimidazole, benzimidazole, 2 An imidazole compound or the like which is substituted with a hydrocarbon group having a ring structure such as an aryl group or an aralkyl group, such as ethyl-4-methyl-1-(2'-cyanoethyl)imidazole. These can be used alone or in combination of two or more.

作為在本發明的硬化性環氧組成物之硬化促進劑的調配量,係相對於所使用的環氧化合物之合計100重量份,通常為0.1~10重量份,較佳為0.5~8重量份。 The amount of the curing accelerator of the curable epoxy composition of the present invention is usually 0.1 to 10 parts by weight, preferably 0.5 to 8 parts by weight, based on 100 parts by weight based on the total of the epoxy compound to be used. .

而且,為了提升所得到的電絕緣層的阻燃性之目的,亦可在本發明的硬化性環氧組成物,例如適當地添加鹵素系阻燃劑、磷酸酯系阻燃劑等通常被添加在電絕緣膜形成用的樹脂組成物之阻燃劑。 Further, in order to enhance the flame retardancy of the obtained electrically insulating layer, a curable epoxy composition of the present invention, for example, a halogen-based flame retardant or a phosphate-based flame retardant may be added as appropriate. A flame retardant for a resin composition for forming an electrically insulating film.

又,在本發明的硬化性環氧組成物,亦可進一步依照需要而適當地添加阻燃助劑、耐熱安定劑、耐候安定劑、防老劑、紫外線吸收劑(雷射加工性提升劑)、調平劑、抗靜電劑、增滑劑、抗黏結劑、防霧劑、滑劑、染料、天然油、合成 油、蠟、乳劑、磁性體、介電特性調整劑、韌性劑等習知的成分。 Further, in the curable epoxy composition of the present invention, a flame retardant auxiliary, a heat stabilizer, a weathering stabilizer, an antioxidant, an ultraviolet absorber (laser processing enhancer), and the like may be further appropriately added as needed. Leveling agent, antistatic agent, slip agent, anti-adhesive agent, anti-fogging agent, slip agent, dye, natural oil, synthesis A conventional component such as an oil, a wax, an emulsion, a magnetic material, a dielectric property modifier, and a toughening agent.

作為本發明的硬化性環氧組成物的製造方法,係沒有特別限定,可將上述各成分直接混合,亦可在使其溶解或分散在有機溶劑之狀態下進行混合,亦可在使上述各成分的一部分溶解或分散在有機溶劑之狀態下調製組成物且在此組成物混合殘留的成分。 The method for producing the curable epoxy composition of the present invention is not particularly limited, and the above components may be directly mixed, or may be mixed in a state of being dissolved or dispersed in an organic solvent, or each of the above may be used. A part of the component is dissolved or dispersed in an organic solvent to prepare a composition, and the composition is mixed with the remaining component.

(薄膜) (film)

本發明的薄膜,係將上述的本發明的硬化性環氧組成物成形為薄片狀或薄膜狀而成之成形體。 The film of the present invention is a molded article obtained by molding the above-described curable epoxy composition of the present invention into a sheet shape or a film form.

將本發明的硬化性環氧組成物成形為薄片狀或薄膜狀而成為成形體時,係以藉由將本發明的硬化性環氧組成物,依照需要添加有機溶劑而塗布、噴撒或流延在支撐體,其次進行乾燥來得到為佳。 When the curable epoxy composition of the present invention is formed into a sheet form or a film form to form a molded body, the curable epoxy composition of the present invention is applied, sprayed or flowed by adding an organic solvent as needed. It is preferable to extend on the support and then dry it.

作為此時所使用的支撐體,可舉出樹脂薄膜、金屬箔等。作為樹脂薄膜,可舉出聚對酞酸乙二酯薄膜、聚丙烯薄膜、聚乙烯薄膜、聚碳酸酯薄膜、聚萘二甲酸乙二酯薄膜、聚芳香酯(polyarylate)薄膜、耐綸薄膜等。這些之薄膜之中,以聚對酞酸乙二酯薄膜或聚萘二甲酸乙二酯薄膜為佳,因為具有優異的耐熱性、耐藥品性及剝離性等。作為金屬箔,可舉出銅箔、鋁箔、鎳箔、鉻箔、金箔、銀箔等。 Examples of the support used in this case include a resin film, a metal foil, and the like. Examples of the resin film include a polyethylene terephthalate film, a polypropylene film, a polyethylene film, a polycarbonate film, a polyethylene naphthalate film, a polyarylate film, a nylon film, and the like. . Among these films, a polyethylene terephthalate film or a polyethylene naphthalate film is preferred because of excellent heat resistance, chemical resistance, and peelability. Examples of the metal foil include copper foil, aluminum foil, nickel foil, chrome foil, gold foil, and silver foil.

薄片狀或薄膜狀的成形體之厚度,沒有特別限定,從作業性等的觀點而言,通常為1~150μm,以2~100μm為佳,較佳是5~80μm。 The thickness of the sheet-like or film-shaped molded body is not particularly limited, but is usually 1 to 150 μm , preferably 2 to 100 μm , and more preferably 5 to 80 μm from the viewpoint of workability and the like.

作為塗布本發明的硬化性環氧組成物之方法,可舉出浸漬塗布、輥塗布、簾流塗布、模塗布、狹縫塗布、凹版塗布等。 Examples of the method of applying the curable epoxy composition of the present invention include dip coating, roll coating, curtain coating, die coating, slit coating, gravure coating, and the like.

又,在本發明,作為薄片狀或薄膜狀成形體,係以本發明的硬化性環氧組成物為未硬化或半硬化的狀態為佳。在此,所謂未硬化,係指將成形體浸漬在能夠將調製此組成物時所使用的環氧化合物溶解之溶劑時,實質上此環氧化合物的全部係溶解之狀態。又,所謂半硬化,係指已硬化至進一步加熱時能夠硬化程度之途中為止之狀態,較佳是在能夠將調製此組成物時所使用的環氧化合物溶解之溶劑,此環氧化合物的一部分(具體而言,係7重量%以上的量,且一部分殘留之量)係溶解的狀態,或是成形體在溶劑中浸漬24小時之後的體積,係成為浸漬前的體積之200%以上(膨潤率)之狀態。 Further, in the present invention, it is preferable that the curable epoxy composition of the present invention is in a state of being unhardened or semi-cured as a sheet-like or film-like molded body. Here, the term "unhardened" refers to a state in which substantially all of the epoxy compound is dissolved when the molded article is immersed in a solvent capable of dissolving the epoxy compound used in preparing the composition. Further, the term "semi-hardening" refers to a state in which it is hardened to the extent that it can be cured at the time of further heating, and is preferably a solvent capable of dissolving an epoxy compound used for preparing the composition, and a part of the epoxy compound. (specifically, the amount is 7% by weight or more, and a part of the residual amount) is in a dissolved state, or the volume after the immersion of the molded body in the solvent for 24 hours is 200% or more of the volume before immersion (swelling) The state of the rate).

又,亦可將本發明的硬化性環氧組成物塗布在支撐體上之後,依照需要進行乾燥。乾燥溫度,係以設為本發明的硬化性環氧組成物不硬化程度的溫度為佳,通常為20~300℃,較佳為30~200℃。乾燥溫度太高時,硬化反應過度進行,致使所得到的成形體有未成為未硬化或半硬化的狀態之可能性。又,乾燥時間係通常為30秒鐘~1小時,較佳為1分鐘~30分鐘。 Further, after the curable epoxy composition of the present invention is applied onto a support, it may be dried as needed. The drying temperature is preferably a temperature at which the curable epoxy composition of the present invention does not harden, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. When the drying temperature is too high, the hardening reaction proceeds excessively, so that the obtained molded body may not be in an unhardened or semi-hardened state. Further, the drying time is usually from 30 seconds to 1 hour, preferably from 1 minute to 30 minutes.

然後,如此進行而得到之本發明的薄膜,係在使其附著於支撐體上之狀態下、或是從支撐體剝下而使用。 Then, the film of the present invention obtained in this manner is used in a state where it is adhered to the support or peeled off from the support.

(積層薄膜) (layered film)

本發明的積層薄膜,係具有由上述的硬化性環氧組成物所 構成之接著層;及由被鍍覆層用樹脂組成物所構成之被鍍覆層。 The laminated film of the present invention has the above-mentioned curable epoxy composition An underlayer formed; and a plated layer composed of a resin composition for a layer to be plated.

被鍍覆層係沒有特別限定,從使積層薄膜的電特性及耐熱性提升之觀點而言,以構成此層之樹脂的50重量%以上是由脂環式烯烴聚合物所構成者為佳。作為用以形成此種被鍍覆層之被鍍覆層用樹脂組成物,通常係以含有具有極性基之脂環式烯烴聚合物、及硬化劑而成者為佳。 The layer to be plated is not particularly limited, and from the viewpoint of improving the electrical properties and heat resistance of the laminated film, it is preferred that 50% by weight or more of the resin constituting the layer be composed of an alicyclic olefin polymer. The resin composition for a layer to be plated for forming such a layer to be plated is usually an alicyclic olefin polymer having a polar group and a curing agent.

作為具有極性基之脂環式烯烴聚合物,係沒有特別限定,作為脂環式構造,可舉出具有環烷構造、環烯構造等者。因具有優異的機械強度、耐熱性等,以具有環烷構造者為佳。又,作為在脂環式烯烴聚合物所含有的極性基,可舉出酚性羥基、酚性羥基、羧基、烷氧基、環氧基、環氧丙基、羥羰基、羰基、胺基、羧酸酐基、磺酸基、磷酸基等。尤其是以羧基、羧酸酐基、及酚性羥基為佳,以羧酸酐基為較佳。 The alicyclic olefin polymer having a polar group is not particularly limited, and examples of the alicyclic structure include a naphthene structure and a cycloolefin structure. It is preferred to have a naphthene structure because of its excellent mechanical strength, heat resistance and the like. Further, examples of the polar group contained in the alicyclic olefin polymer include a phenolic hydroxyl group, a phenolic hydroxyl group, a carboxyl group, an alkoxy group, an epoxy group, a glycidyl group, a hydroxycarbonyl group, a carbonyl group, and an amine group. A carboxylic anhydride group, a sulfonic acid group, a phosphoric acid group or the like. In particular, a carboxyl group, a carboxylic anhydride group, and a phenolic hydroxyl group are preferred, and a carboxylic anhydride group is preferred.

作為在被鍍覆層用樹脂組成物所含有的硬化劑,係藉由加熱而能夠使具有極性基之脂環式烯烴聚合物形成交聯構造者即可,而沒有特別限定,可使用添加於一般的電絕緣膜形成用的樹脂組成物的硬化劑。作為硬化劑,係以使用具有2個以上能夠與所使用之具有極性基的脂環式烯烴聚合物之極性基反應而形成鍵結之化合物為佳。 The curing agent contained in the resin composition for a layer to be plated may be a crosslinked structure in which an alicyclic olefin polymer having a polar group is formed by heating, and is not particularly limited, and may be added thereto. A hardener for a resin composition for forming a general electrical insulating film. As the curing agent, it is preferred to use a compound having two or more polar groups capable of reacting with a polar group-containing olefin polymer having a polar group to form a bond.

例如,使用具有羧基、羧酸酐基等、酚性羥基之脂環式烯烴聚合物作為具有極性基之脂環式烯烴聚合物時,作為能夠適合使用之硬化劑,可舉出多元環氧化合物、多元異氰酸酯化合物、多元胺化合物、多元醯肼化合物、吖環丙烷 (aziridine)化合物、鹼性金屬氧化物、有機金屬鹵化物等。這些係可單獨使用1種亦可併用2種以上。又,亦可藉由將這些化合物與過氧化物併用而使用作為硬化劑。 For example, when an alicyclic olefin polymer having a phenolic hydroxyl group such as a carboxyl group or a carboxylic acid anhydride group is used as the alicyclic olefin polymer having a polar group, a polyvalent epoxy compound may be mentioned as a curing agent which can be suitably used. Polyisocyanate compound, polyamine compound, polyvalent ruthenium compound, anthracycline (aziridine) compound, basic metal oxide, organometallic halide, and the like. These may be used alone or in combination of two or more. Further, it can also be used as a curing agent by using these compounds in combination with a peroxide.

因為與具有極性基之脂環式烯烴聚合物所具有的極性基之反應性和緩,使得被鍍覆層用樹脂組成物的操作變為容易,作為硬化劑,尤其是以多元環氧化合物為佳,以環氧丙基醚型環氧化合物和脂環式的多元環氧化合物為特別適合使用。 Since the reactivity with the polar group possessed by the alicyclic olefin polymer having a polar group is gentle, the operation of the resin composition for the plated layer becomes easy, and as the hardener, especially a polyvalent epoxy compound is preferable. It is particularly suitable to use a epoxidized propyl ether type epoxy compound and an alicyclic type polyvalent epoxy compound.

相對於具有極性基之脂環式烯烴聚合物100重量份,在被鍍覆層用樹脂組成物中之硬化劑的調配量,係以1~100重量份為佳,較佳是5~80重量份,更佳為10~50重量份的範圍。藉由將硬化劑的調配量設為上述範圍,能夠使將本發明的積層薄膜硬化而得到的硬化物之機械強度及電特性成為良好者。 The amount of the curing agent in the resin composition for a layer to be plated is preferably from 1 to 100 parts by weight, preferably from 5 to 80 parts by weight based on 100 parts by weight of the alicyclic olefin polymer having a polar group. More preferably, it is in the range of 10 to 50 parts by weight. By setting the amount of the curing agent to the above range, the mechanical strength and electrical properties of the cured product obtained by curing the laminated film of the present invention can be improved.

又,在本發明所使用之被鍍覆層用樹脂組成物,係除了上述成分以外,亦可含有受阻酚化合物和受阻胺化合物。 Further, the resin composition for a layer to be plated used in the present invention may contain a hindered phenol compound and a hindered amine compound in addition to the above components.

所謂受阻酚化合物,係指具有羥基且在此羥基的β位置的碳原子不具有氫原子之在分子內具有至少1個受阻構造之酚化合物。作為受阻酚化合物的具體例,可舉出1,1,3-參-(2-甲基-4-羥基-5-第三-丁基苯基)丁烷、4,4’-亞丁基雙-(3-甲基-6-第三-丁基苯酚)、2,2-硫雙(4-甲基-6-第三丁基苯酚)、丙酸正十八基-3-(4’-羥基-3’,5’-二-第三丁基-苯基)酯、肆-[亞甲基-3-(3’,5’-二-第三丁基-4’-羥苯基)丙酸酯]甲烷等。 The hindered phenol compound refers to a phenol compound having a hydroxyl group and having at least one hindered structure in the molecule in which the carbon atom at the β position of the hydroxyl group does not have a hydrogen atom. Specific examples of the hindered phenol compound include 1,1,3-gin-(2-methyl-4-hydroxy-5-tri-butylphenyl)butane and 4,4'-butylene double. -(3-methyl-6-tri-butylphenol), 2,2-thiobis(4-methyl-6-tert-butylphenol), propionate n-octadecyl-3-(4' -hydroxy-3',5'-di-tert-butyl-phenyl) ester, fluorene-[methylene-3-(3',5'-di-t-butyl-4'-hydroxyphenyl) Propionate] methane and the like.

在被鍍覆層用樹脂組成物中之受阻酚化合物的調 配量,係沒有特別限定,相對於具有極性基之脂環式烯烴聚合物100重量份,以0.04~10重量份為佳,較佳為0.3~5重量份,更佳為0.5~3重量份的範圍。藉由將受阻酚化合物的調配量設為上述範圍,能夠使將本發明的積層薄膜硬化而得到之硬化物的機械強度成為良好。 Adjustment of hindered phenol compounds in the resin composition for the plated layer The amount of the alicyclic olefin polymer having a polar group is preferably from 0.04 to 10 parts by weight, preferably from 0.3 to 5 parts by weight, more preferably from 0.5 to 3 parts by weight, per 100 parts by weight of the alicyclic olefin polymer having a polar group. The scope. By setting the amount of the hindered phenol compound to the above range, the mechanical strength of the cured product obtained by curing the laminated film of the present invention can be improved.

又,受阻胺化合物,係指在分子中具有至少一個在第4位置具有2級胺或3級胺的2,2,6,6-四烷基哌啶基之化合物。作為烷基的碳數,係通常為1~50。作為受阻胺化合物,係以在分子中具有至少一個在第4位置具有2級胺或3級胺的2,2,6,6-四甲基哌啶基之化合物為佳。又,在本發明,係以併用受阻酚化合物、及受阻胺化合物為佳,藉由併用受阻酚化合物及受阻胺化合物,在對將本發明的積層薄膜硬化而得到之硬化物,使用過錳酸鹽的水溶液等進行表面粗化處理時,即便表面粗化處理條件產生變化時,亦能夠將表面粗化處理後的硬化物保持為表面粗度低者。 Further, the hindered amine compound means a compound having at least one 2,2,6,6-tetraalkylpiperidinyl group having a secondary amine or a tertiary amine at the fourth position in the molecule. The carbon number of the alkyl group is usually from 1 to 50. As the hindered amine compound, a compound having at least one 2,2,6,6-tetramethylpiperidinyl group having a secondary amine or a tertiary amine at the fourth position in the molecule is preferred. Further, in the present invention, it is preferred to use a hindered phenol compound and a hindered amine compound in combination, and a permanganic acid is used for the cured product obtained by curing the laminated film of the present invention by using a hindered phenol compound and a hindered amine compound in combination. When the surface roughening treatment of the salt aqueous solution or the like is performed, even if the surface roughening treatment conditions are changed, the cured product after the surface roughening treatment can be kept to have a low surface roughness.

作為受阻胺化合物的具體例,可舉出癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、癸二酸雙(1,2,2,6,6-五甲基-4-哌啶基)酯、1[2-{3-(3,5-二-第三丁基-4-羥苯基)丙醯氧基}乙基]-4-{3-(3,5-二-第三丁基-4-羥苯基)丙醯氧基)-2,2,6,6-四甲基哌啶、8-苄基-7,7,9,9-四甲基-3-辛基-1,2,3-三氮雜螺[4,5]十一烷-2,4-二酮等。 Specific examples of the hindered amine compound include bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate and bismuth azelaic acid (1, 2, 2, 6, 6). -pentamethyl-4-piperidinyl), 1[2-{3-(3,5-di-t-butyl-4-hydroxyphenyl)propenyloxy}ethyl]-4-{ 3-(3,5-di-t-butyl-4-hydroxyphenyl)propanoxy)-2,2,6,6-tetramethylpiperidine, 8-benzyl-7,7,9 , 9-tetramethyl-3-octyl-1,2,3-triazaspiro[4,5]undecane-2,4-dione, and the like.

受阻胺化合物的調配量係沒有特別限定,相對於具有極性基之脂環式烯烴聚合物100重量份,通常為0.02~10重量份,以0.2~5重量份為佳,較佳為0.25~3重量份。藉由將 受阻胺化合物的調配量設為上述範圍,能夠使將本發明的積層薄膜硬化而得到之硬化物的機械強度成為良好。 The amount of the hindered amine compound to be added is not particularly limited, and is usually 0.02 to 10 parts by weight, preferably 0.2 to 5 parts by weight, more preferably 0.25 to 3 parts by weight per 100 parts by weight of the alicyclic olefin polymer having a polar group. Parts by weight. By When the amount of the hindered amine compound is in the above range, the mechanical strength of the cured product obtained by curing the laminated film of the present invention can be improved.

又,在本發明所使用之被鍍覆層用樹脂組成物,係除了上述成分以外,亦可含有硬化促進劑。作為硬化促進劑,係使用添加於一般的電絕緣膜形成用樹脂組成物之硬化促進劑即可,例如,能夠使用與上述的本發明的硬化性環氧組成物同樣的硬化促進劑。在被鍍覆層用樹脂組成物中之硬化促進劑的調配量,係按照使用目的而適當地選擇即可,相對於具有極性基之脂環式烯烴聚合物100重量份,以0.001~30重量份為佳,較佳為0.01~10重量份,更佳為0.03~5重量份。 Further, the resin composition for a layer to be plated used in the present invention may contain a curing accelerator in addition to the above components. As the curing accelerator, a curing accelerator added to a general resin composition for forming an electric insulating film may be used. For example, a curing accelerator similar to the above-described curable epoxy composition of the present invention can be used. The amount of the curing accelerator in the resin composition for a layer to be plated may be appropriately selected according to the purpose of use, and may be 0.001 to 30 by weight based on 100 parts by weight of the alicyclic olefin polymer having a polar group. The portion is preferably from 0.01 to 10 parts by weight, more preferably from 0.03 to 5 parts by weight.

而且,在本發明所使用之被鍍覆層用樹脂組成物,係除了上述成分以外,亦可含有填充劑。作為填充劑,係能夠使用與在上述的硬化性環氧組成物所使用的填充劑同樣者。在被鍍覆層用樹脂組成物中之填充劑的調配量,係以固體成分換算計,通常為1~50重量%,以2~45重量%為佳,較佳為3~35重量%。 Further, the resin composition for a layer to be plated used in the present invention may contain a filler in addition to the above components. As the filler, the same as the filler used in the above-described curable epoxy composition can be used. The blending amount of the filler in the resin composition for a layer to be plated is usually 1 to 50% by weight, preferably 2 to 45% by weight, and preferably 3 to 35% by weight, in terms of solid content.

又,在本發明所使用之被鍍覆層用樹脂組成物,係除了上述成分以外,係與上述的本發明的硬化性環氧組成物同樣地,亦可適當地添加硬化促進劑、阻燃劑、阻燃助劑、耐熱安定劑、耐候安定劑、防老化劑、紫外線吸收劑(雷射加工性提升劑)、調平劑、抗靜電劑、增滑劑、抗黏結劑、防霧劑、滑劑、染料、天然油、合成油、蠟、乳劑、磁性體、介電特性調整劑、韌性劑等的習知的成分。這些任意成分的調配比例,係在不損害本發明的目的之範圍適當地選擇即可。 Further, in the resin composition for a plated layer to be used in the present invention, in addition to the above-mentioned components, a curing accelerator and a flame retardant may be appropriately added in the same manner as the above-described curable epoxy composition of the present invention. Agent, flame retardant auxiliary, heat stabilizer, weathering stabilizer, anti-aging agent, ultraviolet absorber (laser processing enhancer), leveling agent, antistatic agent, slip agent, anti-adhesive agent, anti-fogging agent Conventional ingredients such as slip agents, dyes, natural oils, synthetic oils, waxes, emulsions, magnetic materials, dielectric property modifiers, and tougheners. The blending ratio of these optional components may be appropriately selected within the range not impairing the object of the present invention.

作為在本發明所使用之被鍍覆層用樹脂組成物的製造方法,係沒有特別限定,可將上述各成分直接混合,亦可在使上述各成分的一部分溶解或分散在有機溶劑之狀態下調製組成物且在此組成物混合殘留的成分。 The method for producing the resin composition for a plated layer to be used in the present invention is not particularly limited, and the above components may be directly mixed, or a part of each component may be dissolved or dispersed in an organic solvent. The composition is prepared and the remaining components are mixed in the composition.

本發明的積層薄膜係能夠使用此種被鍍覆層用樹脂組成物、及上述本發明的硬化性環氧組成物而製造。具體而言,本發明的積層薄膜係例如能夠藉由以下的2種方法來製造:(1)藉由將上述的被鍍覆層用樹脂組成物塗布、噴撒或流延在支撐體上且依照需要使其乾燥,其次,進一步將上述的硬化樹脂組成物塗布或流延在其上且依照需要使其乾燥來製造之方法;(2)藉由將上述的被鍍覆層用樹脂組成物塗布、噴撒或流延在支撐體上且依照需要使其乾燥而得到之成形成為薄片狀或薄膜狀而成之被鍍覆層用成形體,與將上述的硬化性環氧組成物塗布、噴撒或流延在支撐體上且依照需要使其乾燥而成形成為薄片狀或薄膜狀而成之接著層用成形體進行層積且使這些成形體一體化來製造之方法。這些製造方法之中,因為是較容易的製程且具有優異的產能,以上述(1)的製造方法為佳。 The laminated film of the present invention can be produced by using the resin composition for a layer to be plated and the curable epoxy composition of the present invention. Specifically, the laminated film of the present invention can be produced, for example, by the following two methods: (1) applying, spraying, or casting the above-mentioned resin composition for a plated layer onto a support and a method of drying the above-mentioned hardened resin composition by applying or casting the above-mentioned hardened resin composition and drying it as needed, and (2) using the resin composition for the above-mentioned plated layer a molded article for a plated layer formed by coating, spraying, or casting on a support and drying it as needed to form a sheet or a film, and applying the above-mentioned curable epoxy composition. A method of laminating or casting the formed body into a laminate or a film formed by laminating or casting it into a sheet shape or a film shape, and integrating these molded bodies. Among these manufacturing methods, the production method of the above (1) is preferable because it is an easy process and has excellent productivity.

在上述(1)的製造方法,在將被鍍覆層用樹脂組成物塗布、噴撒或流延在支撐體時,及將硬化性環氧組成物塗布、噴撒或流延在被塗布、噴撒或流延後之被鍍覆層用樹脂組成物時;或是在上述(2)的製造方法,在將被鍍覆層用樹脂組成物及硬化性環氧組成物成形成為薄片狀或薄膜狀而成為被鍍覆層用成形體及接著層用成形體時,係以依照需要添加有機溶劑而將被鍍覆層用樹脂組成物或硬化性環氧組成物塗布、噴撒 或流延在支撐體為佳。 In the production method of the above (1), when the resin composition for a plating layer is applied, sprayed, or cast on a support, and the curable epoxy composition is applied, sprayed, or cast, In the case of the resin composition for a layer to be plated after being sprayed or cast, or in the production method of the above (2), the resin composition for a layer to be plated and the curable epoxy composition are formed into a sheet shape or When the film is formed into a molded article for a plated layer and a molded article for a backing layer, the resin composition for a plated layer or the curable epoxy composition is applied and sprayed by adding an organic solvent as needed. Or casting on the support is better.

作為在此時所使用的支撐體,係可舉出樹脂薄膜、金屬箔等。作為樹脂薄膜,可舉出聚對酞酸乙二酯薄膜、聚丙烯薄膜、聚乙烯薄膜、聚碳酸酯薄膜、聚萘二甲酸乙二酯薄膜、聚芳香酯薄膜、耐綸薄膜等。該等薄膜之中,從耐熱性、耐藥品性、剝離性等的觀點而言,係以聚對酞酸乙二酯薄膜或聚萘二甲酸乙二酯薄膜為佳。作為金屬箔,可舉出銅箔、鋁箔、鎳箔、鉻箔、金箔、銀箔等。又,支撐體的表面平均粗糙度Ra係通常為300nm以下,以150nm以下為佳,較佳為100nm以下。 Examples of the support used at this time include a resin film, a metal foil, and the like. Examples of the resin film include a polyethylene terephthalate film, a polypropylene film, a polyethylene film, a polycarbonate film, a polyethylene naphthalate film, a polyarylate film, and a nylon film. Among these films, a polyethylene terephthalate film or a polyethylene naphthalate film is preferred from the viewpoints of heat resistance, chemical resistance, and peelability. Examples of the metal foil include copper foil, aluminum foil, nickel foil, chrome foil, gold foil, and silver foil. Further, the surface average roughness Ra of the support is usually 300 nm or less, preferably 150 nm or less, preferably 100 nm or less.

在上述(1)的製造方法之被鍍覆層用樹脂組成物及硬化性環氧組成物的厚度,或是在上述(2)的製造方法之被鍍覆層用成形體及接著層用成形體的厚度,係沒有特別限定,在作為積層薄膜時之被鍍覆層的厚度,係以1~10μm為佳,較佳為1.5~8μm,更佳為2~5μm、又,接著層的厚度係以10~100μm為佳,較佳為10~80μm,更佳是設為如15~60μm的厚度。被鍍覆層的厚度太薄時,在將積層薄膜硬化而得到之硬化物上,藉由無電解鍍覆而形成導體層時,導體層的形成性有低落之可能性;另一方面,被鍍覆層的厚度太厚時,將積層薄膜硬化而得到之硬化物,其線膨脹有變大之可能性。又,接著層的厚度太薄時,積層薄膜的配線埋入性有低落之可能性。 The thickness of the resin composition for a plated layer and the curable epoxy composition in the production method of the above (1), or the molded article for the plated layer and the adhesive layer for the production method of the above (2). The thickness of the body is not particularly limited, and the thickness of the plated layer when the film is laminated is preferably 1 to 10 μm , preferably 1.5 to 8 μm , more preferably 2 to 5 μm . Further, the thickness of the subsequent layer is preferably 10 to 100 μm , more preferably 10 to 80 μm , and even more preferably 15 to 60 μm . When the thickness of the layer to be plated is too thin, when the conductor layer is formed by electroless plating on the cured product obtained by curing the laminated film, the formation of the conductor layer may be lowered; on the other hand, When the thickness of the plating layer is too thick, the cured product obtained by hardening the laminated film may have a large linear expansion. Further, when the thickness of the subsequent layer is too thin, the wiring embedding property of the laminated film may be lowered.

作為塗布被鍍覆層用樹脂組成物及硬化性環氧組成物之方法,可舉出浸漬塗布、輥塗布、簾流塗布、模塗布、狹縫塗布、凹版塗布等。 Examples of the method of applying the resin composition for a layer to be plated and the curable epoxy composition include dip coating, roll coating, curtain coating, die coating, slit coating, gravure coating, and the like.

又,在上述(1)的製造方法,將被鍍覆層用樹脂組成物塗布、噴撒或流延在支撐體上之後,或是將硬化性環氧組成物塗布、噴撒或流延在被鍍覆層用樹脂組成物上之後,或是上述(2)的製造方法,將被鍍覆層用樹脂組成物及硬化性環氧組成物塗布在支撐體上之後,亦可依照需要而進行乾燥。乾燥溫度係以設為被鍍覆層用樹脂組成物及硬化性環氧組成物不產生硬化的程度之溫度為佳,通常為20~300℃,較佳為30~200℃。又,乾燥時間係通常為30秒鐘~1小時,較佳為1分鐘~30分鐘。 Further, in the production method of the above (1), after the resin composition for a plating layer is applied, sprayed or cast on the support, the curable epoxy composition is coated, sprayed or cast. After the resin composition for the plating layer is applied, or the resin composition for the plating layer and the curable epoxy composition are applied onto the support, the method of the above (2) may be carried out as needed. dry. The drying temperature is preferably a temperature at which the resin composition for the plating layer and the curable epoxy composition are not cured, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. Further, the drying time is usually from 30 seconds to 1 hour, preferably from 1 minute to 30 minutes.

在本發明的積層薄膜,構成積層薄膜之被鍍覆層及接著層,係以未硬化或半硬化的狀態為佳。藉由將這些層設為未硬化或半硬化的狀態,能夠使本發明的積層薄膜成為接著性高者。又,本發明的積層薄膜係能夠使被鍍覆層發揮更優異之鍍層的剝離強度。 In the laminated film of the present invention, the plated layer and the subsequent layer constituting the laminated film are preferably in an unhardened or semi-hardened state. By laminating these layers in an uncured or semi-hardened state, the laminated film of the present invention can be made to have high adhesion. Further, the laminated film of the present invention can impart a more excellent peel strength of the plating layer to the layer to be plated.

(預浸材) (prepreg)

本發明的預浸材,係在上述本發明的薄膜或本發明的積層薄膜含有纖維基材而成者。 The prepreg according to the present invention is one in which the film of the present invention or the laminated film of the present invention contains a fiber base material.

作為纖維基材,係可舉出聚醯胺纖維、聚芳醯胺纖維、聚酯纖維等的有機纖維、玻璃纖維、碳纖維等的無機纖維。又,作為纖維基材的形態,係可舉出平紋組織或斜紋組織等織物的形態或不織布的形態等。纖維基材的厚度,係以5~100μm為佳,以10~50μm的範圍為佳。太薄時操作變為困難,太厚時樹脂層係相對的變薄,致使配線埋入性有變為不充分之情形。 Examples of the fiber base material include organic fibers such as polyamide fibers, polyarylene fibers, and polyester fibers, and inorganic fibers such as glass fibers and carbon fibers. In addition, examples of the form of the fiber base material include a form of a woven fabric such as a plain weave or a twill weave, and a form of a non-woven fabric. The thickness of the fibrous substrate is preferably from 5 to 100 μm, preferably from 10 to 50 μm . When it is too thin, the operation becomes difficult, and when it is too thick, the resin layer is relatively thin, and the wiring embedding property is insufficient.

本發明的預浸材,係在上述本發明的薄膜含有纖維基材而成之情況,本發明的預浸材係能夠藉由使纖維基材含浸本發明的硬化性環氧組成物來製造。在此時,作為使纖維基材含浸本發明的硬化性環氧組成物之方法,係沒有特別限定,可舉出在本發明的硬化性環氧組成物添加有機溶劑用以調整黏度等,且使添加有機溶劑而成之硬化性環氧組成物浸漬纖維基材之方法;及在纖維基材塗布或噴撒添加有機溶劑而成的硬化性環氧組成物之方法等。在塗布或噴撒之方法,係能夠將纖維基材放置在支撐體上,且將添加有機溶劑而成之硬化性環氧組成物塗布或噴撒在此纖維基材。又,在本發明,作為薄片狀或薄膜狀複合成形體,係與上述的薄片狀或薄膜狀成形體同樣地,以在未硬化或半硬化的狀態下含有本發明的硬化性環氧組成物為佳。 In the prepreg of the present invention, when the film of the present invention contains a fibrous base material, the prepreg of the present invention can be produced by impregnating the fibrous base material with the curable epoxy composition of the present invention. In this case, the method of impregnating the fiber substrate with the curable epoxy composition of the present invention is not particularly limited, and an organic solvent is added to the curable epoxy composition of the present invention to adjust the viscosity and the like. A method of impregnating a fibrous base material with a curable epoxy composition obtained by adding an organic solvent; and a method of applying or spraying a curable epoxy composition obtained by adding an organic solvent to a fibrous base material. In the method of coating or spraying, a fibrous substrate can be placed on a support, and a curable epoxy composition obtained by adding an organic solvent is coated or sprayed on the fibrous substrate. Further, in the present invention, the sheet-like or film-like composite molded article contains the curable epoxy composition of the present invention in an unhardened or semi-cured state in the same manner as the above-mentioned sheet-like or film-form molded article. It is better.

又,使纖維基材含浸本發明的硬化性環氧組成物之後,亦可依照需要而進行乾燥。乾燥溫度係以設為本發明的硬化性環氧組成物不產生硬化的程度之溫度為佳,通常為20~300℃,較佳為30~200℃。乾燥溫度太高,硬化反應過度進行,所得到的複合成形體係有未成為未硬化或半硬化的狀態之可能性。又,乾燥時間係通常為30秒鐘~1小時,較佳為1分鐘~30分鐘。 Further, after the fibrous base material is impregnated with the curable epoxy composition of the present invention, it may be dried as needed. The drying temperature is preferably a temperature at which the curable epoxy composition of the present invention does not harden, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. The drying temperature is too high, the hardening reaction proceeds excessively, and the resulting composite molding system has a possibility that it is not in an unhardened or semi-hardened state. Further, the drying time is usually from 30 seconds to 1 hour, preferably from 1 minute to 30 minutes.

或者,本發明的預浸材係在上述本發明的積層薄膜含有纖維基材而成之情況,本發明的預浸材係以在一面具有接著層,在另外一面具有被鍍覆層且在內部具有纖維基材者為佳,其製造方法係不被限定,例如,能夠使用以下的方法來製 造:(1)將附有支撐體的硬化性環氧組成物薄膜、及附有支撐體的被鍍覆層用樹脂組成物薄膜,以在其間夾住纖維基材之方式將各薄膜的樹脂層側合在一起,且依照需要在加壓、真空、加熱等的條件下進行層積而製造之方法;(2)藉由使纖維基材含浸硬化性環氧組成物或被鍍覆層用樹脂組成物的任一者,且依照需要而進行乾燥來製造預浸材,而且在此預浸材塗布噴撒或流延另一方的樹脂組成物、或是藉由層積另一方之附有支撐體的樹脂組成物薄膜來製造之方法;(3)藉由在支撐體上塗布噴撒或流延等來層積硬化性環氧組成物或被鍍覆層用樹脂組成物的任一者,且在其上重疊纖維基材,而且從其上塗布、噴撒或流延另一方的樹脂組成物來進行層積且依照需要而使其乾燥來製造。又,任一種方法,均是以藉由在組成物依照需要添加有機溶劑而調整組成物的黏度,來控制含浸在纖維基材和塗布、噴撒或流延在支撐體之作業性為佳。 Alternatively, in the prepreg of the present invention, when the laminated film of the present invention contains a fibrous base material, the prepreg of the present invention has an adhesive layer on one surface and a coated layer on the other surface. A fiber substrate is preferred, and a method for producing the film is not limited. For example, the following method can be used. (1) A film of a resin composition having a support and a film of a resin composition for a layer to be coated with a support, and a resin of each film so as to sandwich the fiber substrate therebetween a method in which the layers are joined together and laminated as required under conditions of pressurization, vacuum, heating, etc.; (2) by impregnating the fibrous substrate with a hardenable epoxy composition or a coated layer Any one of the resin compositions, and dried as needed to produce a prepreg, and the prepreg is coated or cast on the other resin composition, or is laminated by the other side. a method of producing a resin composition film of a support; (3) laminating a curable epoxy composition or a resin composition for a layer to be plated by applying a spray or a casting onto the support. The fiber base material is superposed thereon, and the other resin composition is applied, sprayed, or cast thereon, laminated, and dried as necessary to produce. Further, in any of the methods, it is preferable to adjust the viscosity of the composition by adding an organic solvent to the composition as needed, thereby controlling the workability of impregnation on the fibrous substrate and coating, spraying or casting on the support.

又,作為此時所使用的支撐體,可舉出聚對酞酸乙二酯薄膜、聚丙烯薄膜、聚乙烯薄膜、聚碳酸酯薄膜、聚萘二甲酸乙二酯薄膜、聚芳香酯薄膜、耐綸薄膜等的樹脂薄膜;銅箔、鋁箔、鎳箔、鉻箔、金箔、銀箔等的金屬箔;該等係不僅是預浸材的一面,亦可附加在雙面。 Further, examples of the support used in this case include a polyethylene terephthalate film, a polypropylene film, a polyethylene film, a polycarbonate film, a polyethylene naphthalate film, and a polyarylate film. A resin film such as a nylon film; a metal foil such as a copper foil, an aluminum foil, a nickel foil, a chrome foil, a gold foil, or a silver foil; these are not only one side of the prepreg, but may be attached to both sides.

本發明的預浸材的厚度,係沒有特別限定,被鍍覆層的厚度係以1~10μm為佳,較佳為1.5~8μm,更佳為2~5μm、又,接著層的厚度係以10~100μm為佳,較佳為10~80μm,更佳是設為如15~60μm的厚度為佳。 The thickness of the prepreg of the present invention is not particularly limited, and the thickness of the plated layer is preferably 1 to 10 μm , preferably 1.5 to 8 μm , more preferably 2 to 5 μm , and The thickness of the layer is preferably 10 to 100 μm , preferably 10 to 80 μm , more preferably 15 to 60 μm .

在製造本發明的預浸材時,作為塗布被鍍覆層用 樹脂組成物及硬化性環氧組成物之方法,可舉出浸漬塗布、輥塗布、簾流塗布、模塗布、狹縫塗布、凹版塗布等。 When manufacturing the prepreg of the present invention, it is used as a coating layer for coating Examples of the resin composition and the curable epoxy composition include dip coating, roll coating, curtain coating, die coating, slit coating, gravure coating, and the like.

又,在本發明的預浸材,係與上述本發明的薄膜及積層薄膜同樣地,構成預浸材之樹脂組成物係以在未硬化或半硬化的狀態為佳。 Further, in the prepreg of the present invention, similarly to the film and the laminated film of the present invention, the resin composition constituting the prepreg is preferably in an unhardened or semi-cured state.

而且,如此進行而得到之本發明的預浸材,係能夠藉由將其加熱且使其硬化而成為硬化物。 Further, the prepreg of the present invention obtained in this manner can be cured by heating and hardening it.

硬化溫度係通常為30~400℃,以70~300℃為佳,較佳為100~200℃。又,硬化時間係0.1~5小時,較佳為0.5~3小時。加熱方法係沒有特別限制,例如使用電烘箱等而進行即可。 The curing temperature is usually 30 to 400 ° C, preferably 70 to 300 ° C, preferably 100 to 200 ° C. Further, the hardening time is 0.1 to 5 hours, preferably 0.5 to 3 hours. The heating method is not particularly limited, and it may be carried out, for example, using an electric oven or the like.

(積層體) (layered body)

本發明的積層體,係在基材層積上述本發明的薄膜、積層薄膜或預浸材而成者。作為本發明的積層體,係層積至少上述本發明的薄膜、積層薄膜或預浸材而成者即可,以層積在表面具有導體層之基板、及由上述本發明的薄膜、積層薄膜或預浸材所構成之電絕緣層而成者為佳。 The laminate of the present invention is obtained by laminating the above-mentioned film, laminate film or prepreg of the present invention on a substrate. The laminated body of the present invention may be obtained by laminating at least the above-mentioned film, laminated film or prepreg of the present invention, a substrate having a conductor layer laminated on the surface thereof, and a film or laminated film of the present invention. Or an electrically insulating layer composed of a prepreg is preferred.

在表面具有導體層之基板,係在電絕緣性基板的表面具有導體層者。電絕緣性基板係將含有習知的電絕緣材料(例如脂環式烯烴聚合物、環氧化合物、順丁烯二醯亞胺樹脂、(甲基)丙烯酸樹脂、酞酸二烯丙酯樹脂、三嗪樹脂、聚苯醚(polyphenylene ether)、玻璃等)之樹脂組成物硬化而形成者。導體層係沒有特別限定,通常係含有由導電性金屬等導電體所形成的配線之層,亦可進一步含有各種電路。配線、電路等的 構成、厚度等係沒有特別限定。作為在表面具有導體層之基板的具體例,係能夠舉出印刷電路基板、矽晶圓基板等。在表面具有導體層之基板的厚度,通常為10μm~10mm,以20μm~5mm為佳,較佳為30μm~2mm。 A substrate having a conductor layer on its surface is a conductor layer on the surface of the electrically insulating substrate. The electrically insulating substrate will contain a conventional electrically insulating material (for example, an alicyclic olefin polymer, an epoxy compound, a maleimide resin, a (meth)acrylic resin, a diallyl phthalate resin, A resin composition of a triazine resin, a polyphenylene ether, or a glass is hardened and formed. The conductor layer is not particularly limited, and is usually a layer containing wiring formed of a conductor such as a conductive metal, and may further contain various circuits. The configuration, thickness, and the like of the wiring, the circuit, and the like are not particularly limited. Specific examples of the substrate having the conductor layer on the surface include a printed circuit board, a germanium wafer substrate, and the like. The thickness of the substrate having the conductor layer on the surface is usually 10 μm to 10 mm, preferably 20 μm to 5 mm, preferably 30 μm to 2 mm.

本發明所使用之在表面具有導體層之基板,為了提升與電絕緣層的密著性,係以在導體層表面施行前處理為佳。作為前處理的方法,係沒有特別限定而能夠使用習知的技術。例如,導體層係由銅所構成者時,可舉出以下等的方法:使強鹼氧化性溶液接觸導體層表面而在導體表面形成氧化銅的層而粗化之氧化處理方法;以前面的方法將導體層表面進行氧化之後,使用氫化硼鈉、福馬林等進行還原之方法;使鍍層在導體層析出而粗化之方法;使有機酸接觸導體層且將銅的晶界溶解而粗化之方法;及使用硫醇化合物、矽烷化合物等在導體層形成底漆層之方法。這些方法之中,從維持微細的配線圖案形狀的容易性之觀點而言,以使有機酸接觸導體層且將銅的晶界溶解而粗化之方法、及使用硫醇化合物、矽烷化合物等在導體層形成底漆層之方法為佳。 The substrate having the conductor layer on the surface used in the present invention is preferably pretreated on the surface of the conductor layer in order to improve the adhesion to the electrically insulating layer. The method of the pretreatment is not particularly limited, and a conventional technique can be used. For example, when the conductor layer is made of copper, the following method may be used: an oxidation treatment method in which a strong alkali oxidizing solution is brought into contact with the surface of the conductor layer to form a layer of copper oxide on the surface of the conductor; Method for oxidizing the surface of the conductor layer, followed by reduction using sodium borohydride, formalin or the like; a method of roughening the plating layer on the conductor; and bringing the organic acid into contact with the conductor layer and dissolving the grain boundary of the copper And a method of forming a primer layer on a conductor layer using a thiol compound, a decane compound or the like. Among these methods, from the viewpoint of easiness in maintaining the shape of the fine wiring pattern, a method in which an organic acid is brought into contact with a conductor layer, a grain boundary of copper is dissolved and coarsened, and a thiol compound or a decane compound is used. Preferably, the conductor layer forms a primer layer.

本發明的積層體,係通常能夠藉由在表面具有導體層之基板上,將上述本發明的薄膜(亦即,將本發明的硬化性環氧組成物成形成為薄片狀或薄膜狀而成之成形體)、積層薄膜(亦即,由接著層及被鍍覆層所構成之薄片狀或薄膜狀的成形體,其中此接著層係由本發明的硬化性環氧組成物所構成)、或預浸材(在本發明的薄膜含有纖維基材而成之複合成形體,或是在本發明的積層薄膜含有纖維基材而成之複合成形體) 加熱壓黏來製造。 In the laminate of the present invention, the film of the present invention (i.e., the curable epoxy composition of the present invention is formed into a sheet or a film) by a substrate having a conductor layer on its surface. a molded article), a laminated film (that is, a sheet-like or film-like formed body composed of an adhesive layer and a plated layer, wherein the adhesive layer is composed of the curable epoxy composition of the present invention), or a dip material (a composite molded body comprising a fibrous base material in the film of the present invention, or a composite molded body comprising a fibrous base material in the laminated film of the present invention) Heated and pressed to make.

作為加熱壓黏的方法,可舉出以下的方法:將附有支撐體的成形體或複合成形體,以接觸上述的基板的導體層之方式重疊且使用加壓貼合機、壓機(press)、真空貼合機、真空壓機、輥貼合機等的加壓機而進行加熱壓黏(層積)。藉由加熱加壓,能夠使基板表面的導體層與成形體或複合成形體之界面,以實質上不存在空隙之方式結合。前述成形體或複合成形體,係通常在未硬化或半硬化的狀態下被層積在基板的導體層。 The method of heating and pressure-bonding is a method in which a molded body or a composite molded body with a support is placed so as to be in contact with the conductor layer of the above-mentioned substrate, and a press bonding machine or a press (press) is used. A press machine such as a vacuum laminator, a vacuum press, or a roll laminator performs heating and pressure bonding (layering). By heating and pressurizing, the interface between the conductor layer on the surface of the substrate and the molded body or the composite molded body can be bonded without substantially voids. The molded body or the composite molded body is usually laminated on the conductor layer of the substrate in an unhardened or semi-hardened state.

加熱壓黏操作的溫度,係通常為30~250℃,較佳為70~200℃,所施加的壓力係通常為10kPa~20MPa,較佳為100kPa~10MPa,時間係通常為30秒~5小時,較佳為1分鐘~3小時。又,加熱壓黏係為了使配線圖案的埋入性提升且抑制氣泡的產生,以在減壓下進行為佳。進行加熱壓黏之減壓下的壓力,係通常為100kPa~1Pa,較佳為40kPa~10Pa。 The temperature of the heat-pressing operation is usually 30 to 250 ° C, preferably 70 to 200 ° C, and the applied pressure is usually 10 kPa to 20 MPa, preferably 100 kPa to 10 MPa, and the time is usually 30 seconds to 5 hours. Preferably, it is from 1 minute to 3 hours. Further, in order to improve the embedding property of the wiring pattern and suppress the generation of bubbles, the heating and pressure bonding is preferably performed under reduced pressure. The pressure under reduced pressure for heating and pressure bonding is usually 100 kPa to 1 Pa, preferably 40 kPa to 10 Pa.

(硬化物) (hardened)

本發明的硬化物係將本發明的硬化性環氧組成物硬化而成者,包含將由此組成物所構成之本發明的薄膜、積層薄膜、預浸材、及積層體硬化而成之任一者。硬化係能夠藉由使用後述的硬化條件將本發明的硬化性環氧組成物、薄膜等適當地加熱來進行。 The cured product of the present invention is obtained by curing the curable epoxy composition of the present invention, and comprises curing the film, laminated film, prepreg, and laminate of the present invention comprising the composition. By. The curing can be carried out by appropriately heating the curable epoxy composition, film, or the like of the present invention by using the curing conditions described later.

例如,針對本發明的積層體,藉由將構成其之本發明的薄膜、積層薄膜或預浸材進行硬化處理而能夠成為硬化物。硬化係通常藉由將在導體層上形成有本發明的薄膜、積層 薄膜或預浸材之基板全體加熱來進行。硬化係能夠與上述的加熱壓黏操作同時進行。又,亦可以首先在不產生硬化的條件下、亦即以比較低溫且短時間進行加熱壓黏操作之後,進行硬化。雖然本發明的薄膜等,係使用本發明的硬化性環氧組成物而成,但是藉由具有作為硬化劑的作用之含三嗪構造的酚樹脂(C)和活性酯化合物(D)使環氧化合物硬化時,因為加熱時的熔融黏度低且能夠發揮優異的樹脂流動性,所以由得到的硬化樹脂所構成之電絕緣屬係顯示良好的配線埋入性。 For example, the laminate of the present invention can be cured by curing the film, laminate film or prepreg of the present invention. The hardening system usually consists of forming a thin film, a laminate of the present invention on a conductor layer. The entire substrate of the film or the prepreg is heated. The hardening can be performed simultaneously with the above-described heating and pressure bonding operation. Further, it is also possible to first perform hardening under the condition that no hardening occurs, that is, at a relatively low temperature and for a short time. Although the film of the present invention or the like is formed using the curable epoxy composition of the present invention, the ring is provided by a phenol resin (C) having a triazine structure and a living ester compound (D) having a function as a curing agent. When the oxygen compound is cured, since the melt viscosity at the time of heating is low and excellent resin fluidity can be exhibited, the electrical insulation system composed of the obtained cured resin exhibits good wiring embedding property.

又,為了使電絕緣層的平坦性提升之目的和為了增加電絕緣層的厚度之目的,亦可將2片以上的本發明的薄膜、積層薄膜或預浸材進行接觸且貼合在基板的導體層上而層積。 Further, in order to improve the flatness of the electrically insulating layer and to increase the thickness of the electrically insulating layer, two or more films, laminated films or prepregs of the present invention may be contacted and bonded to the substrate. The conductor layers are stacked on top of each other.

硬化溫度係通常為30~400℃,以70~300℃為佳,較佳為100~200℃。又,硬化時間係通常為0.1~5小時,較佳為0.5~3小時。加熱方法係沒有特別限制,例如使用電烘箱等而進行即可。 The curing temperature is usually 30 to 400 ° C, preferably 70 to 300 ° C, preferably 100 to 200 ° C. Further, the hardening time is usually 0.1 to 5 hours, preferably 0.5 to 3 hours. The heating method is not particularly limited, and it may be carried out, for example, using an electric oven or the like.

(複合體) (Complex)

本發明的複合體,係在上述之本發明的硬化物的表面形成導體層而成者。 The composite of the present invention is obtained by forming a conductor layer on the surface of the cured product of the present invention described above.

例如,本發明的積層體係形成多層基板時,本發明的複合體係在此積層體的電絕緣層上進一步形成另外的導體層而成者。作為此種導體層,能夠使用金屬鍍覆或金屬箔。作為金屬鍍覆材料,可舉出金、銀、銅、銠、鈀、鎳或錫等,作為金屬箔,可舉出前述之薄膜、積層薄膜或被使用作為預浸 材的支撐體者。又,在本發明,作為導體層,就能夠微細配線而言,係以使用金屬鍍覆之方法為佳。以下,例示使用金屬鍍覆作為導體層之多層電路基板作為本發明的複合體之一個例子,來說明本發明的複合體之製造方法。 For example, when the laminated system of the present invention forms a multilayer substrate, the composite system of the present invention is formed by further forming another conductor layer on the electrically insulating layer of the laminated body. As such a conductor layer, metal plating or a metal foil can be used. Examples of the metal plating material include gold, silver, copper, rhodium, palladium, nickel, and tin. Examples of the metal foil include the above-mentioned film, laminated film, or used as a prepreg. The support of the material. Further, in the present invention, as the conductor layer, a method of using metal plating is preferable for the fine wiring. Hereinafter, a method of manufacturing the composite of the present invention will be described by exemplifying a multilayer circuit board using metal plating as a conductor layer as an example of the composite of the present invention.

首先,在積層體形成貫穿電絕緣層之通路孔(via hole)和穿通孔(through hole)。作為多層電路基板時,通路孔的形成是為了將構成多層電路基板之各導體層連結。通路孔和穿通孔係能夠藉由如微影術法的化學處理、或鑽孔、雷射、電漿蝕刻等的物理處理等來形成。這些方法之中,因為能夠不使電絕緣層的特性低落而形成較微細的通路孔,以藉由雷射之方法(二氧化碳氣體雷射、準分子雷射、UV-YAG雷射等)為佳。 First, a via hole and a through hole penetrating the electrically insulating layer are formed in the laminated body. In the case of a multilayer circuit substrate, the via holes are formed to connect the respective conductor layers constituting the multilayer circuit substrate. The via hole and the via hole can be formed by chemical treatment such as lithography, or physical treatment such as drilling, laser, plasma etching, or the like. Among these methods, it is possible to form a fine via hole without degrading the characteristics of the electrical insulating layer, and it is preferable to use a laser method (carbon dioxide gas laser, excimer laser, UV-YAG laser, etc.). .

其次,進行粗化積層體的電絕緣層(亦即,本發明的硬化物)的表面之表面粗化處理。表面粗化處理係為了提高與在電絕緣層上所形成的導體層之接著性而進行。 Next, the surface roughening treatment of the surface of the electrically insulating layer (that is, the cured product of the present invention) of the roughened laminate is performed. The surface roughening treatment is performed in order to improve the adhesion to the conductor layer formed on the electrically insulating layer.

電絕緣層的表面平均粗糙度Ra係以0.05μm以上且小於0.5μm為佳,較佳為0.06μm以上且0.3μm以下,而且表面十點平均粗糙度Rzjis,係以0.3μm以上且小於5μm為佳,較佳為0.5μm以上且3μm以下。又,在本說明書,Ra係在JIS B0601-2001所揭示之算術平均粗糙度,表面十點平均粗糙度Rzjis係在JIS B0601-2001附件1所揭示之十點平均粗糙度。 The surface roughness Ra of the electrically insulating layer is preferably 0.05 μm or more and less than 0.5 μm , preferably 0.06 μm or more and 0.3 μm or less, and the surface ten-point average roughness Rzjis is 0.3 μm. The above is preferably less than 5 μm , preferably 0.5 μm or more and 3 μm or less. Further, in the present specification, Ra is an arithmetic mean roughness disclosed in JIS B0601-2001, and a surface ten-point average roughness Rzjis is a ten-point average roughness disclosed in JIS B0601-2001 Annex 1.

作為表面粗化處理方法,係沒有特別限定,可舉出使電絕緣層表面與氧化性化合物接觸之方法等。作為氧化性化合物,可舉出無機氧化性化合物、有機氧化性化合物等具有氧化能力之習知的化合物。根據控制電絕緣層的表面平均粗糙 度容易程度,以使用無機氧化性化合物、有機氧化性化合物等為特佳。作為無機氧化性化合物,可舉出過錳酸鹽、鉻酸酐、重鉻酸鹽、鉻酸鹽、過硫酸鹽、活性二氧化錳、四氧化鋨、過氧化氫、過碘酸鹽等。作為有機氧化性化合物,可舉出過氧化二異丙苯、過氧化辛醯、間氯過苯甲酸、過乙酸、臭氧等。 The surface roughening treatment method is not particularly limited, and examples thereof include a method of bringing the surface of the electrically insulating layer into contact with an oxidizing compound. The oxidizing compound may, for example, be a conventional compound having an oxidizing ability such as an inorganic oxidizing compound or an organic oxidizing compound. According to the surface roughness of the control electrical insulation layer The degree of ease is particularly preferably an inorganic oxidizing compound, an organic oxidizing compound or the like. Examples of the inorganic oxidizing compound include permanganate, chromic anhydride, dichromate, chromate, persulfate, activated manganese dioxide, osmium tetroxide, hydrogen peroxide, and periodate. Examples of the organic oxidizing compound include dicumyl peroxide, octyl peroxide, m-chloroperbenzoic acid, peracetic acid, ozone, and the like.

使用無機氧化性化合物、有機氧化性化合物等而將電絶緣層表面進行表面粗化處理之方法係沒有特別限制。例如可舉出使氧化性化合物溶液與電絶緣層表面接觸之方法,其中此氧化性化合物溶液係將上述氧化性化合物溶解在能夠溶解的溶劑而成來調製。作為使氧化性化合物溶液與電絶緣層表面接觸之方法,係沒有特別限定,例如,可以是以下等的任何的方法:將電絶緣層浸漬於氧化性化合物溶液之浸漬法;利用氧化性化合物溶液的表面張力而將氧化性化合物溶液載置於電絶緣層之液體盛裝法;及將氧化性化合物溶液對電絶緣層進行噴霧之噴霧法。藉由進行表面粗化處理,能夠使電絶緣層與導體層等其他層之間的密著性提升。 The method of roughening the surface of the electrically insulating layer using an inorganic oxidizing compound, an organic oxidizing compound or the like is not particularly limited. For example, a method of bringing an oxidizing compound solution into contact with the surface of an electrically insulating layer prepared by dissolving the oxidizing compound in a solvent capable of dissolving is mentioned. The method of bringing the oxidizing compound solution into contact with the surface of the electrically insulating layer is not particularly limited, and may be, for example, any of the following methods: impregnation of the electrically insulating layer in an oxidizing compound solution; use of an oxidizing compound solution a liquid holding method in which an oxidizing compound solution is placed on an electrically insulating layer; and a spray method in which an oxidizing compound solution is sprayed on an electrically insulating layer. By performing the surface roughening treatment, the adhesion between the electrically insulating layer and other layers such as the conductor layer can be improved.

使這些氧化性化合物溶液接觸電絶緣層表面之溫度、時間等,係考慮氧化性化合物的濃度、種類、接觸方法等而任意地設定即可,溫度係通常為10~100℃,較佳為20~90℃,時間係通常為0.5~60分鐘,較佳為1~40分鐘。 The temperature, time, and the like of contacting the oxidizing compound solution with the surface of the electrically insulating layer may be arbitrarily set in consideration of the concentration, type, contact method, and the like of the oxidizing compound, and the temperature is usually 10 to 100 ° C, preferably 20 ~90 ° C, the time is usually 0.5 to 60 minutes, preferably 1 to 40 minutes.

又,表面粗化處理後,為了除去氧化性化合物,係使用水將表面粗化處理後的電絶緣層表面進行洗淨。又,附著有僅以水無法洗淨的物質時,係進一步使用能夠將此物質溶解的洗淨液進行洗淨,或是藉由使其與其他的化合物接觸等方 法而成為可溶於水的物質之後,使用水洗淨。例如,使過錳酸鉀水溶液、過錳酸鈉水溶液等的鹼性水溶液與電絶緣層接觸時,以將所產生的二氧化錳之皮膜除去為目的,可藉由硫酸羥胺與硫酸的混合液等的酸性水溶液進行中和還原處理之後,使用水洗淨。 Further, after the surface roughening treatment, in order to remove the oxidizing compound, the surface of the electrically insulating layer after the surface roughening treatment is washed with water. Further, when a substance which cannot be washed by water is adhered, the washing liquid which can dissolve the substance is further washed or brought into contact with other compounds. After the method becomes a water-soluble substance, it is washed with water. For example, when an alkaline aqueous solution such as a potassium permanganate aqueous solution or a sodium permanganate aqueous solution is brought into contact with an electrically insulating layer, a mixture of hydroxylamine sulfate and sulfuric acid may be used for the purpose of removing the manganese dioxide film produced. After the neutral aqueous solution is subjected to neutralization and reduction treatment, it is washed with water.

其次,針對積層體的電絶緣層進行表面粗化處理後,在電絶緣層的表面及通路孔和穿通孔的內壁面形成導體層。 Next, after the surface roughening treatment is performed on the electrically insulating layer of the laminated body, a conductor layer is formed on the surface of the electrically insulating layer and the inner wall surface of the via hole and the through hole.

導體層的形成方法,從能夠形成具有優異的密著性的導體層之觀點而言,係以使用無電解鍍覆法來進行佳。 The method of forming the conductor layer is preferably carried out by using an electroless plating method from the viewpoint of being able to form a conductor layer having excellent adhesion.

例如在使用無電解鍍覆法形成導體層時,首先,在將金屬薄膜形成在電絕緣層的表面之前,通常係使銀、鈀、鋅、鈷等的觸媒核附著在電絕緣層上。使觸媒核附著在電絕緣層之方法係沒有特別限制,例如,可舉出浸漬在將銀、鈀、鋅、鈷等的金屬化合物、這些金屬的鹽類、錯合物等,以0.001~10重量%的濃度溶解在水或醇類或氯仿等的有機溶劑而成之液體(亦可依照需要而含有酸、鹼、錯合劑、還原劑等)之後,將金屬還原之方法等。 For example, when a conductor layer is formed by electroless plating, first, a catalyst core such as silver, palladium, zinc, or cobalt is usually adhered to the electrically insulating layer before the metal thin film is formed on the surface of the electrically insulating layer. The method of attaching the catalyst core to the electrically insulating layer is not particularly limited, and examples thereof include metal compounds such as silver, palladium, zinc, and cobalt, salts of these metals, and complex compounds, which are 0.001. A method in which a concentration of 10% by weight is dissolved in an organic solvent such as water or an alcohol or chloroform (including an acid, a base, a complexing agent, a reducing agent, etc. as needed), and then the metal is reduced.

作為在無電解鍍覆法所使用的無電解鍍覆液,係使用習知的自觸媒型無電解鍍覆液即可,在鍍覆液中所含有的金屬種類、還原劑種類、錯合劑種類、氫離子濃度、溶存氧濃度等係沒有特別限定。例如能夠使用以下的無電解鍍覆液:以次磷酸銨、次磷酸、氫化硼銨、肼、福馬林等作為還原劑之無電解銅鍍覆液;以次磷酸鈉作為還原劑之無電解鎳-磷鍍覆 液;以二甲胺硼烷作為還原劑之無電解鎳-硼鍍覆液;無電解鈀鍍覆液;以次磷酸鈉作為還原劑之無電解鈀-磷鍍覆液;無電解金鍍覆液;無電解銀鍍覆液;以次磷酸鈉作為還原劑之無電解鎳-鈷-磷鍍覆液等。 As the electroless plating solution used in the electroless plating method, a conventional self-catalytic type electroless plating solution may be used, and the type of metal contained in the plating solution, the type of reducing agent, and the binder may be used. The type, the hydrogen ion concentration, the dissolved oxygen concentration, and the like are not particularly limited. For example, the following electroless plating solution can be used: an electroless copper plating solution using ammonium hypophosphite, hypophosphorous acid, ammonium borohydride, hydrazine, and fumarine as a reducing agent; and electroless nickel using sodium hypophosphite as a reducing agent. - Phosphorus plating Electrolyte; electroless nickel-boron plating solution using dimethylamine borane as reducing agent; electroless palladium plating solution; electroless palladium-phosphorus plating solution using sodium hypophosphite as reducing agent; electroless gold plating Liquid; electroless silver plating solution; electroless nickel-cobalt-phosphorus plating solution using sodium hypophosphite as a reducing agent.

形成金屬薄膜之後,可以使基板表面與防鏽劑接觸而施行防鏽處理。又,形成金屬薄膜之後,亦能夠將金屬薄膜加熱以提升密著性等。加熱溫度係通常為50~350℃,較佳為80~250℃。又,在此時,加熱亦可在加壓條件下實施。作為此時的加壓方法,例如可舉出使用熱壓機機、加壓加熱輥機等的物理加壓手段之方法。施加的壓力係通常為0.1~20MPa,較佳為0.5~10MPa。若為此範圍,能夠確保金屬薄膜與電絕緣層之高密著性。 After the metal thin film is formed, the surface of the substrate can be brought into contact with the rust preventive agent to perform an rustproof treatment. Further, after the metal thin film is formed, the metal thin film can also be heated to improve adhesion and the like. The heating temperature is usually 50 to 350 ° C, preferably 80 to 250 ° C. Further, at this time, heating may be carried out under pressurized conditions. As the pressurization method at this time, for example, a method using a physical pressurizing means such as a hot press machine or a pressurizing heat roll machine can be mentioned. The applied pressure is usually 0.1 to 20 MPa, preferably 0.5 to 10 MPa. If it is this range, the high adhesion of a metal thin film and an electrically insulating layer can be ensured.

在如此進行而形成的金屬薄膜上形成鍍覆用光阻圖案,而且進一步在其上藉由電解電鍍等的濕式鍍覆使鍍層成長(增厚鍍覆),其次將光阻除去而且藉由蝕刻將金屬薄膜蝕刻成為圖案狀而形成導體層。因而,使用此方法所形成的導體層,係通常由圖案狀的金屬薄膜、及其上成長而成之鍍層所構成。 A resist pattern for plating is formed on the metal thin film formed in this manner, and further, the plating layer is grown (thickened and plated) by wet plating such as electrolytic plating, and then the photoresist is removed and The etching etches the metal thin film into a pattern to form a conductor layer. Therefore, the conductor layer formed by this method is usually composed of a patterned metal thin film and a plating layer grown thereon.

或是使用金屬箔來代替金屬鍍覆作為構成多層電路基板之導體層時,能夠使用以下的方法來製造。 When a metal foil is used instead of metal plating as a conductor layer which comprises a multilayer circuit board, it can manufacture by the following method.

亦即,首先與上述同樣地進行而準備由薄膜或預浸材所構成之電絕緣層、及由金屬箔所構成之導體層所構成之積層體。作為此種積層體,較佳是積層成形時,係將硬化性環氧組成物設為能夠保持各要求特性之硬化度,而且在進行隨後 的加工時、成為多層電路基板時等不產生問題者為佳,特別是以藉由在真空下進行積層成形來形成為佳。又,由此種薄膜或預浸材所構成之電絕緣層、及由金屬箔所構成之導體層所構成之積層體,係例如藉由習知的減去法(subtractive process)而亦能夠使用在印刷配線板。 In other words, first, in the same manner as described above, a laminated body composed of an electrically insulating layer made of a film or a prepreg and a conductor layer made of a metal foil is prepared. As such a laminate, it is preferable to form the curable epoxy composition to have a curing degree capable of maintaining each desired characteristic, and to carry out subsequent formation. In the case of processing, it is preferable that the multilayer circuit board is not problematic, and it is particularly preferable to form it by laminating under vacuum. Further, the laminated body composed of the electrically insulating layer composed of the film or the prepreg and the conductor layer composed of the metal foil can be used, for example, by a conventional subtractive process. In the printed wiring board.

然後,在所準備的積層體,與上述同樣地進行而形成貫穿電絕緣層之通路孔和穿通孔,其次,為了除去通路孔內所形成的樹脂殘渣,對形成有穿通孔之積層體進行去殘渣處理。去殘渣處理的方法係沒有特別限定,例如,可舉出使其接觸過錳酸鹽等的氧化性化合物的溶液(去殘渣液)之方法。具體而言,係能夠藉由將形成有通路孔之積層體,在經調整成為過錳酸鈉濃度70g/升、氫氧化鈉濃度40g/升之60~90℃的水溶液搖動浸漬1~50分鐘,來進行去殘渣處理。 Then, the prepared laminated body is formed in the same manner as described above to form a via hole and a through hole penetrating through the electrically insulating layer, and secondly, in order to remove the resin residue formed in the via hole, the laminated body in which the through hole is formed is removed. Residue treatment. The method of the residue treatment is not particularly limited, and examples thereof include a method of contacting a solution (de-slag liquid) of an oxidizing compound such as permanganate. Specifically, it can be immersed in an aqueous solution adjusted to a sodium permanganate concentration of 70 g/liter and a sodium hydroxide concentration of 40 g/liter at 60 to 90 ° C for 1 to 50 minutes by forming a laminate having via holes. , to carry out the residue treatment.

其次,對積層體進行去殘渣處理之後,在通路孔內壁面形成導體層。導體層的形成方法係沒有特別限定,無電解鍍覆法或電解電鍍法的任一者均能夠使用,從能夠形成具有優異的密著性的導體層之觀點而言,係與形成金屬鍍覆作為上述的導體層之方法同樣地,能夠藉由無電解鍍覆法來進行。 Next, after the residue is subjected to the residue treatment, a conductor layer is formed on the inner wall surface of the via hole. The method for forming the conductor layer is not particularly limited, and any of the electroless plating method and the electrolytic plating method can be used, and from the viewpoint of being able to form a conductor layer having excellent adhesion, metal plating is formed. Similarly to the above-described method of the conductor layer, it can be carried out by an electroless plating method.

其次,在通路孔內壁面形成導體層之後,在金屬箔上形成鍍覆用光阻圖案,進一步藉由電解電鍍等的濕式鍍覆使鍍層在其上成長(增厚鍍覆),其次,將光阻除去,而且藉由蝕刻將金屬箔蝕刻成為圖案狀而形成導體層。因而,使用此方法所形成的導體層,通常係由圖案狀的金屬箔、及在其上成長而成之鍍覆所構成。 Next, after forming a conductor layer on the inner wall surface of the via hole, a resist pattern for plating is formed on the metal foil, and the plating layer is further grown (thickened and plated) by wet plating such as electrolytic plating, and secondly, The photoresist is removed, and the metal foil is etched into a pattern by etching to form a conductor layer. Therefore, the conductor layer formed by this method is usually composed of a patterned metal foil and a plating formed thereon.

將如以上進行而得到的多層電路基板,作為用以製造上述的積層體之基板,而且將其與上述的成形體或複合成形體加熱壓黏且硬化而形成電絕緣層,進一步在其上面依照上述的方法而進行導體層的形成且藉由重複這些步驟,能夠進一步進行多層化,藉此能夠成為所需要的多層電路基板。 The multilayer circuit board obtained as described above is used as a substrate for manufacturing the above-described laminate, and is heat-pressed and cured with the above-mentioned molded body or composite molded body to form an electrically insulating layer, and further thereon. By forming the conductor layer by the above method and repeating these steps, it is possible to further increase the number of layers, thereby making it possible to form a multilayer circuit board.

如此進行而得到之本發明的複合體(及作為本發明的複合體的一個例子之多層電路基板),係具有由本發明的硬化性環氧組成物所構成之電絕緣層(本發明的硬化物)而成,因為此電絕緣層係具有優異的耐熱性、電性及去殘渣性且具有良好的平衡,而且與導體層的密著性(特別是在高溫高濕試驗後之與導體層的密著性)亦優異,本發明的複合體(及作為本發明的複合體的一個例子之多層電路基板)係能夠適合使用於各種用途。特別是由本發明的硬化性環氧組成物所構成之電絕緣層,因為去殘渣性良好,所以在通路孔內壁面形成導體層時,能夠有效地防止因殘渣而產生的導通不良,藉此,依照本發明,能夠提供在各導電層之間具有優異的導通性之高可靠性的多層電路基板。 The composite of the present invention (and the multilayer circuit substrate as an example of the composite of the present invention) obtained in this manner has an electrically insulating layer composed of the curable epoxy composition of the present invention (cured product of the present invention) Because the electrical insulation layer has excellent heat resistance, electrical properties and residue resistance and has a good balance, and adhesion to the conductor layer (especially after the high temperature and high humidity test with the conductor layer) The adhesive body of the present invention (and the multilayer circuit board which is an example of the composite of the present invention) can be suitably used for various purposes. In particular, since the electrically insulating layer composed of the curable epoxy composition of the present invention has good degreasability, when a conductor layer is formed on the inner wall surface of the via hole, conduction failure due to the residue can be effectively prevented. According to the present invention, it is possible to provide a multilayer circuit board having high reliability with excellent electrical conductivity between the respective conductive layers.

(電子材料用基板) (substrate for electronic materials)

本發明的電子材料用基板,係由上述本發明的硬化物或複合體所構成者。此種由本發明的硬化物或複合體所構成之本發明的電子材科用基板,係能夠適合使用在行動電話機、PHS、筆記型個人電腦、個人數位助理(PDA:Personal Digital Assistant)、攜帶式電視電話機、個人電腦、超級電腦、伺服器、路由器(router)、液晶投影機、工程工作站(EWS)、呼叫器 (pager)、文字處理機、電視、取景器(View Finder)型或監視器直視型的錄影機(video tape recorder)、終端設備、電子記事簿、電子桌上型計算機、汽車導航裝置、POS終端設備、具備有觸控面板之裝置等的各種電子機器。 The substrate for an electronic material of the present invention is composed of the above-described cured product or composite of the present invention. The electronic material substrate of the present invention comprising the cured product or the composite of the present invention can be suitably used in a mobile phone, a PHS, a notebook personal computer, a personal digital assistant (PDA: Personal Digital Assistant), and a portable device. Videophone, personal computer, supercomputer, server, router, LCD projector, engineering workstation (EWS), pager (pager), word processor, TV, View Finder or video tape recorder, terminal device, electronic organizer, electronic desktop computer, car navigation device, POS terminal Equipment, various electronic devices equipped with devices such as touch panels.

實施例 Example

以下,舉出實施例及比較例而更具體地說明本發明。又,各例中的「份」及「%」係只要未特別預先告知,就是重量基準。針對各種物性,係依照以下的方法而進行評價。 Hereinafter, the present invention will be more specifically described by way of examples and comparative examples. In addition, the "parts" and "%" in each case are weight basis unless they are specifically notified in advance. Various physical properties were evaluated in accordance with the following methods.

(1)脂環式烯烴聚合物的數平均分子量(Mn)、重量平均分子量(Mw) (1) Number average molecular weight (Mn), weight average molecular weight (Mw) of an alicyclic olefin polymer

將四氫呋喃作為展開溶劑,藉由凝膠滲透層析法(GPC)進行測定且以聚苯乙烯換算值的方式求取。 Tetrahydrofuran was used as a developing solvent and measured by gel permeation chromatography (GPC) and determined in terms of polystyrene.

(2)脂環式烯烴聚合物的氫化率 (2) Hydrogenation rate of alicyclic olefin polymer

藉由400MHz的1H-NMR光譜測定,來求取已氫化的不飽和鍵之莫耳數,對氫化前之在聚合物中的不飽和鍵之莫耳數之比率且將其設作氫化率。 The molar number of the hydrogenated unsaturated bond was determined by 1 H-NMR spectroscopy at 400 MHz, and the ratio of the molar number of the unsaturated bond in the polymer before hydrogenation was set as the hydrogenation rate. .

(3)玻璃轉移溫度(耐熱性) (3) Glass transition temperature (heat resistance)

從薄膜狀硬化物,切取寬度6mm、長度15.4mm、厚度40μm的小片,藉由熱機械分析裝置(TMA/SDTA840:METTLER-TOLEDO公司製),在支點間距離10mm、升溫速度10℃/分鐘的條件下進行測定而得到應力-溫度曲線,而且在此應力-溫度曲線之反曲點描繪切線且從此切線的交點求取薄膜狀硬化物的玻璃轉移溫度(Tg),並且依照以下的評價基準來進行評價耐熱性。玻璃轉移溫度為越高,耐熱性越優異。 From the film-like cured product, a small piece having a width of 6 mm, a length of 15.4 mm, and a thickness of 40 μm was cut out, and a thermomechanical analysis device (TMA/SDTA840: manufactured by METTLER-TOLEDO Co., Ltd.) had a distance between the fulcrums of 10 mm and a temperature increase rate of 10 ° C/ The stress-temperature curve was obtained under the conditions of a minute, and the tangential line was drawn at the inflection point of the stress-temperature curve, and the glass transition temperature (Tg) of the film-like cured product was obtained from the intersection of the tangent, and evaluated according to the following Benchmarks were used to evaluate heat resistance. The higher the glass transition temperature, the more excellent the heat resistance.

(評價基準) (evaluation benchmark)

A:玻璃轉移溫度為150℃以上 A: Glass transition temperature is above 150 °C

B:玻璃轉移溫度為145℃以上且小於150℃ B: glass transition temperature is 145 ° C or more and less than 150 ° C

C:玻璃轉移溫度為小於145℃ C: glass transition temperature is less than 145 ° C

(4)介電損耗角正切(電性) (4) Dielectric loss tangent (electricity)

從薄膜狀硬化物,切取寬度2.0mm、長度80mm、厚度40μm的小片,使用諧振腔微擾法(resonant cavity perturbation method)介電率測定裝置而進行測定在10GHz之介電損耗角正切,且依照以下評價基準而進行評價電特性。 A small piece having a width of 2.0 mm, a length of 80 mm, and a thickness of 40 μm was cut out from the film-like cured product, and a dielectric loss tangent at 10 GHz was measured using a resonant cavity perturbation method dielectric constant measuring device. The electrical characteristics were evaluated in accordance with the following evaluation criteria.

(評價基準) (evaluation benchmark)

A:介電損耗角正切為小於0.0065 A: dielectric loss tangent is less than 0.0065

B:介電損耗角正切為以上0.0065且小於0.070 B: dielectric loss tangent is above 0.0065 and less than 0.070

C:介電損耗角正切為0.0070以上 C: dielectric loss tangent is 0.0070 or more

(5)去殘渣性 (5) Degreasability

在使玻璃纖維含浸含有玻璃填料及不含鹵素的環氧化合物之清漆而得到的芯材之表面,張貼厚度為18μm的銅而成之厚度0.8mm、縱150mm×橫150mm的雙面覆銅基板之銅表面,使用蝕刻劑(商品名「CZ-8100」、MEC公司製)蝕刻約0.5μm之後,在其雙面層積附有支撐體的薄膜成形體,只有將支撐體剝下且在空氣環境下於180℃加熱30分鐘使薄膜成形體硬化,來形成由薄膜狀硬化物所構成之樹脂層。在所得到的積層體硬化物,使用CO2雷射裝置(LC-2G212/2C、日立製作所公司製)且在輸出功率0.65W、射擊次數3、加工直徑(上面)55μm、加工直徑(下面)50μm的條件下,製造在此樹脂層形成有貫穿 至銅表面為止的通路孔用孔穴之去殘渣性評價用基板。將此基板搖動浸漬在以膨潤液(「Swelling Dip Securiganth P」、Atotech公司製、「SECURIGANTH」係註冊商標)500mL/L、氫氧化鈉3g/L的方式調製之60℃的水溶液15分鐘之後,進行水洗。其次,搖動浸漬在以過錳酸鹽的水溶液(「Concentrate Compact CP」、Atotech公司製)640mL/L、氫氧化鈉濃度40g/L的方式調製之80℃的水溶液5分鐘之後,進行水洗。接著,將積層體硬化物浸漬在以硫酸羥胺水溶液(「REDUCTION SECURIGANTH P 500」、Atotech公司製、「SECURIGANTH」係註冊商標)100mL/L、硫酸35mL/L的方式調製之40℃的水溶液5分鐘且中和還原處理之後,進行水洗。使用電子顯微鏡(倍率:5000倍)觀察如此進行而得到的基板之通路孔用孔穴部分的下面及剖面,依照以下的評價基準進行評價去殘渣性。 A surface of a core material obtained by impregnating a glass fiber with a varnish containing a glass filler and a halogen-free epoxy compound, and a double-sided coating having a thickness of 0.8 mm and a length of 150 mm and a width of 150 mm is formed by coating a copper having a thickness of 18 μm . The copper surface of the copper substrate is etched by an etchant (trade name "CZ-8100", manufactured by MEC Corporation) to a thickness of about 0.5 μm, and then a film formed body having a support is laminated on both sides thereof, and only the support is peeled off. Further, the film formed body was cured by heating at 180 ° C for 30 minutes in an air atmosphere to form a resin layer composed of a film-like cured product. In the obtained laminate cured product, a CO 2 laser device (LC-2G212/2C, manufactured by Hitachi, Ltd.) was used, and the output was 0.65 W, the number of shots was 3, and the processing diameter (top surface) was 55 μm . In the following, under the condition of 50 μm , a substrate for the evaluation of the residue of the via hole for forming the via hole penetrating the copper surface was formed. The substrate was immersed in an aqueous solution of 60 ° C prepared by swelling ("Swelling Dip Securiganth P", Atotech Co., Ltd., "SECURIGANTH") 500 mL/L, and sodium hydroxide 3 g/L for 15 minutes. Washed with water. Then, the aqueous solution of 80 ° C prepared by immersing in an aqueous solution of permanganate ("Concentrate Compact CP", Atotech Co., Ltd.) of 640 mL / L and sodium hydroxide concentration of 40 g / L was shaken for 5 minutes, and then washed with water. Then, the laminate cured product was immersed in an aqueous solution of 40 ° C prepared by using a hydroxylamine sulfate aqueous solution ("REDUCTION SECURIGANTH P 500", Atotech Co., Ltd., "SECURIGANTH" registered trademark) 100 mL/L, and sulfuric acid 35 mL/L for 5 minutes. After the neutralization reduction treatment, water washing was performed. The lower surface and the cross section of the hole portion for the via hole of the substrate thus obtained were observed by an electron microscope (magnification: 5000 times), and the residue was evaluated according to the following evaluation criteria.

(評價基準) (evaluation benchmark)

A:通路底、通路周圍的任一者均無樹脂殘留 A: There is no resin residue in either the bottom of the passage or the passage.

B:在通路底無樹脂殘留且在通路周圍有若干樹脂殘留 B: There is no resin residue at the bottom of the passage and there are some resin residues around the passage.

C:通路底、通路周圍的任一者均有樹脂殘留 C: Resin residue in either the bottom of the path or around the path

(6)初期密著性 (6) Initial adhesion

將厚度35μm的電解銅箔之表面使用蝕刻劑(商品名「CZ-8100」、MEC公司製)蝕刻約0.5μm。在所得到的電解銅箔之蝕刻處理面,以薄膜成形體的樹脂層側之面接觸的方式層積,而且藉由真空貼合機,在真空度1kPa以下、90℃、30秒鐘、壓力0.7MPa的條件下進行加熱壓黏。其次,從薄膜成形體之與前述樹脂層相反側的面將支撐體剝下,且將前述使用蝕 刻劑蝕刻約2μm而成之玻璃環氧覆銅積層板(FR-4)的蝕刻處理面重疊在顯現的樹脂層之表面,而且使用真空貼合機在與前述相同條件下進行加熱壓黏。藉由將如此進行而得到的複合成形體,使用烘箱於180℃加熱90分鐘來得到積層體硬化物。依據JIS C6481測定從所得到的積層體硬化物將銅箔剝離之強度且依照以下的評價基準進行評價。 The surface of the electrolytic copper foil having a thickness of 35 μm was etched by about 0.5 μm using an etchant (trade name "CZ-8100", manufactured by MEC Corporation). The etched surface of the obtained electrolytic copper foil is laminated so that the surface of the film formed body is in contact with the surface of the resin layer, and the degree of vacuum is 1 kPa or less, 90 ° C, 30 seconds, and pressure by a vacuum laminator. Heating and pressing under conditions of 0.7 MPa. Next, the support is peeled off from the surface of the film formed body opposite to the resin layer, and the glass epoxy copper-clad laminate (FR-4) obtained by etching the etching agent by about 2 μm is etched. The surface was superposed on the surface of the developed resin layer, and heat-pressed under the same conditions as described above using a vacuum laminator. The composite molded body obtained in this manner was heated at 180 ° C for 90 minutes in an oven to obtain a laminate cured product. The strength of the copper foil peeled from the obtained laminate cured product was measured in accordance with JIS C6481 and evaluated in accordance with the following evaluation criteria.

(評價基準) (evaluation benchmark)

A:剝離強度為0.55kN/m以上 A: Peel strength is 0.55kN/m or more

B:剝離強度為0.50kN/m以上且小於0.55kN/m B: Peel strength is 0.50 kN/m or more and less than 0.55 kN/m

C:剝離強度為小於0.50kN/m C: Peel strength is less than 0.50kN/m

(7)高溫高濕試驗後的密著性 (7) Adhesion after high temperature and high humidity test

將與上述(6)同樣地進行而得到的積層體硬化物表面之銅箔,殘留寬度10mm而將其他部分的銅箔剝離後之試料,在溫度130℃、濕度98%RH的恆溫恆溫槽中放置100小時之後,依據JIS C6481測定從所得到的積層體硬化物將銅箔剝離之強度且依照以下的評價基準進行評價。 The copper foil on the surface of the cured product of the laminate obtained in the same manner as in the above (6) was subjected to a sample having a width of 10 mm and the other portion of the copper foil was peeled off, and the sample was subjected to a constant temperature bath at a temperature of 130 ° C and a humidity of 98% RH. After allowing to stand for 100 hours, the strength of the copper foil peeled from the obtained laminate cured product was measured in accordance with JIS C6481 and evaluated according to the following evaluation criteria.

(評價基準) (evaluation benchmark)

A:剝離強度為0.30kN/m以上 A: Peel strength is 0.30 kN/m or more

B:剝離強度為0.25kN/m以上且小於0.30kN/m B: Peel strength is 0.25 kN/m or more and less than 0.30 kN/m

C:剝離強度為小於0.25kN/m C: Peel strength is less than 0.25kN/m

實施例1 Example 1

(硬化性環氧組成物的調製) (Modulation of hardenable epoxy composition)

將作為具有聯苯構造的多元環氧化合物(A)之聯苯二亞甲基骨架酚醛清漆型環氧樹脂(商品名「NC-3000L」、日本化藥公 司製、環氧當量269)30份、作為含磷環氧化合物(B)之具有磷雜菲構造的酚系酚醛清漆型環氧化合物(商品名「FX-289BEK75」、新日鐵住金化學公司製、固體成分75%的甲基乙基酮溶液、磷含量2%、環氧當量305)93.2份(以環氧化合物換算計為70份)、作為含三嗪構造的酚樹脂(C)的三嗪構造含有甲酚酚醛清漆樹脂(商品名「PHENOLITE LA-3018-50P」、不揮發分50%的丙二醇一甲基醚溶液、DIC公司製、活性羥基當量154)30份(以含三嗪構造的甲酚酚醛清漆樹脂換算計為15份)、作為活性酯化合物(D)的活性酯化合物(商品名「Epiclon HPC-8000-65T」、不揮發分65%的甲苯溶液、DIC公司製、活性酯基當量223)89.2份(以活性酯化合物換算計為58份)、作為填充劑的氧化矽(商品名「SC2500-SXJ」、ADMATECHS公司製)320份、作為抗老化劑的受阻酚系抗氧化劑(商品名「IRGANOX(註冊商標)3114」、BASF公司製)1份、及茴香醚110份進行混合且使用行星式攪拌機攪拌3分鐘。而且在此,將作為硬化促進劑之將1-苄基-2-苯基咪唑30%溶解在茴香醚而成之溶液8.3份(V以1-苄基-2-苯基咪唑換算計為2.5份)進行混合且使用行星式攪拌機攪拌5分鐘而得到硬化性環氧組成物的清漆。又,清漆中,填充劑的含量係以固體成分換算計為64%。 A biphenyl dimethylene skeleton novolac type epoxy resin (trade name "NC-3000L", a chemical compound of Japan, which is a polyvalent epoxy compound (A) having a biphenyl structure. A phenolic novolak type epoxy compound having a phosphaphenanthrene structure (product name "FX-289BEK75", Nippon Steel & Sumitomo Chemical Co., Ltd.) a methyl ethyl ketone solution having a solid content of 75%, a phosphorus content of 2%, an epoxy equivalent of 305), 93.2 parts (70 parts in terms of an epoxy compound), and a phenol resin (C) having a triazine structure. The triazine structure contains cresol novolak resin (trade name "PHENOLITE LA-3018-50P", non-volatile 50% propylene glycol monomethyl ether solution, DIC company, active hydroxyl equivalent 154) 30 parts (with triazine) In the conversion of cresol novolak resin, 15 parts), as an active ester compound of active ester compound (D) (trade name "Epiclon HPC-8000-65T", 65% non-volatile toluene solution, DIC company, Active ester group equivalent: 223) 89.2 parts (58 parts in terms of active ester compound), 320 parts of cerium oxide (trade name "SC2500-SXJ", manufactured by ADMATECHS Co., Ltd.) as a filler, and a hindered phenol system as an anti-aging agent Antioxidant (product name "IRGANOX (registered trademark) 3114", made by BASF) 1 part, and anisole 1 Ten parts were mixed and stirred using a planetary mixer for 3 minutes. Further, here, 8.3 parts of a solution obtained by dissolving 1-benzyl-2-phenylimidazole 30% in anisole as a hardening accelerator (V is 2.5 in terms of 1-benzyl-2-phenylimidazole) The mixture was mixed and stirred using a planetary mixer for 5 minutes to obtain a varnish of a curable epoxy composition. Further, in the varnish, the content of the filler was 64% in terms of solid content.

(薄膜成形體的製造) (Manufacture of film molded body)

其次,將上述所得到之硬化性環氧組成物的清漆,使用模塗布機塗布在縱300mm×橫300mm的大小且厚度為38μm、表面平均黏度Ra為0.08μm之聚對酞酸乙二酯薄膜(支撐體: Lumirror(註冊商標)T60 TORAY公司製)上,其次,在氮環境下於80℃乾燥10分鐘而得到在支撐體上厚度43μm的硬化性環氧組成物之薄膜成形體。使用所得到的薄膜成形體,依照上述方法進行評價去殘渣性、初期密著性及高溫高濕試驗後之密著性。將結果顯示在表1。 Next, the varnish of the curable epoxy composition obtained above was applied to a polyethylene terephthalate having a size of 300 mm × 300 mm in width and a thickness of 38 μm and a surface average viscosity Ra of 0.08 μm using a die coater. The ester film (support: manufactured by Lumirror (registered trademark) T60 TORAY Co., Ltd.) was further dried at 80 ° C for 10 minutes in a nitrogen atmosphere to obtain a film molded body of a curable epoxy composition having a thickness of 43 μm on a support. Using the obtained film molded body, the residue resistance, the initial adhesion, and the adhesion after the high-temperature and high-humidity test were evaluated in accordance with the above method. The results are shown in Table 1.

(薄膜狀硬化物的製造) (Manufacture of film-like cured product)

其次,在厚度10μm的銅箔,使用上下具備有耐熱性橡膠製加壓板之真空貼合機,將從所得到的硬化性環氧組成物的薄膜成形體切取得到的小片,在附有支撐體的狀態下且使硬化性環氧組成物為內側,在減壓至200Pa且溫度110℃、壓力0.1MPa進行加熱壓黏層積60秒鐘,隨後,將支撐體剝下且於180℃在空氣中加熱硬化120分鐘。硬化後,切取附有銅箔的硬化樹脂且使用1mol/L的過硫酸銨水溶液溶解銅箔而得到薄膜狀的硬化物。使用所得到的薄膜狀硬化物且依照上述方法而進行測定玻璃轉移溫度及介電損耗角正切。將結果顯示在表1。 Next, in a copper foil having a thickness of 10 μm , a small piece obtained by cutting a film formed body of the obtained curable epoxy composition using a vacuum laminator having a heat-resistant rubber pressure plate on the upper and lower sides is used. The curable epoxy composition was placed inside while the support was attached, and the laminate was heated and pressure-bonded for 60 seconds under reduced pressure to 200 Pa at a temperature of 110 ° C and a pressure of 0.1 MPa, and then the support was peeled off and then Heat hardened in air at 180 ° C for 120 minutes. After the hardening, the copper foil-cured resin was cut out, and the copper foil was dissolved in a 1 mol/L ammonium persulfate aqueous solution to obtain a film-like cured product. Using the obtained film-like cured product, the glass transition temperature and the dielectric loss tangent were measured in accordance with the above method. The results are shown in Table 1.

實施例2~4、比較例1~4 Examples 2 to 4 and Comparative Examples 1 to 4

除了依照在表1的實施例2~4及比較例1~4之硬化性環氧組成物的組成而變更調配以外,係與實施例1同樣地進行而得到硬化性環氧組成物的清漆、薄膜成形體及薄膜狀硬化物,而且同樣地測定且進行評價。將結果顯示在表1。 A varnish of a curable epoxy composition was obtained in the same manner as in Example 1 except that the composition of the curable epoxy composition of Examples 2 to 4 and Comparative Examples 1 to 4 of Table 1 was changed. The film molded body and the film-like cured product were measured and evaluated in the same manner. The results are shown in Table 1.

又,在表1,「肆羥苯基乙烷型環氧化合物」係四羥苯基乙烷型環氧化合物(商品名「jER 1031S」、三菱化學公司製、環氧當量200、軟化點、90℃),「雙酚A型環氧化合物」係雙酚A型環氧化合物(商品名「jER 828EL」、三菱化學公司製、環 氧當量186、液狀)。 In addition, in Table 1, "anthracene hydroxyphenylethane type epoxy compound" is a tetrahydroxyphenylethane type epoxy compound (trade name "jER 1031S", manufactured by Mitsubishi Chemical Corporation, epoxy equivalent 200, softening point, 90 ° C), "bisphenol A type epoxy compound" is a bisphenol A type epoxy compound (trade name "jER 828EL", manufactured by Mitsubishi Chemical Corporation, and Oxygen equivalent 186, liquid).

如表1所顯示,使用本發明的硬化性環氧組成物時,能夠得到具有優異的耐熱性、電特性、去殘渣性、以及初期及高溫高濕試驗後的密著性之薄膜狀硬化物(實施例1~4)。因而,得知使用本發明的硬化性環氧組成物時,能夠形成具有此種優異的特性之電絕緣層。 As shown in Table 1, when the curable epoxy composition of the present invention is used, a film-like cured product having excellent heat resistance, electrical properties, residue resistance, and adhesion after initial and high-temperature and high-humidity tests can be obtained. (Examples 1 to 4). Therefore, when the curable epoxy composition of the present invention is used, it is known that an electrically insulating layer having such excellent characteristics can be formed.

另一方面,不含有含磷環氧化合物(B)時,所得到的薄膜狀硬化物係成為耐熱性及去殘渣性差之結果(比較例1)、又,不含有具有聯苯構造及/或縮合多環構造之多元環氧化合物(A)時,所得到的薄膜狀硬化物係成為高溫高濕試驗後的密著性差之結果(比較例2)。 On the other hand, when the phosphorus-containing epoxy compound (B) is not contained, the obtained film-like cured product is inferior in heat resistance and residue resistance (Comparative Example 1), and does not contain a biphenyl structure and/or When the polyvalent epoxy compound (A) having a polycyclic structure was condensed, the obtained film-like cured product was a result of poor adhesion after the high-temperature and high-humidity test (Comparative Example 2).

而且,不含有含三嗪構造的酚樹脂(C)時,所得到的薄膜狀硬化物係成為初期及高溫高濕試驗後的密著性差之結果(比較例3);使用雙酚A型環氧化合物來代替含磷環氧化合物(B)時,所得到的薄膜狀硬化物係成為耐熱性、去殘渣性及高溫高 濕試驗後的密著性差之結果(比較例4)。 Further, when the phenol resin (C) having a triazine-containing structure is not contained, the obtained film-like cured product is a result of poor adhesion after initial stage and high-temperature and high-humidity test (Comparative Example 3); use of bisphenol A type ring When the oxygen compound is used in place of the phosphorus-containing epoxy compound (B), the obtained film-like cured product is heat-resistant, degreased, and high in temperature. The result of poor adhesion after the wet test (Comparative Example 4).

合成例1 Synthesis Example 1

作為聚合第1階段,係在經氮取代之耐壓玻璃反應器添加5-亞乙基-雙環[2.2.1]庚-2-烯35莫耳份、1-己烯0.9莫耳份、茴香醚340莫耳份及0.005莫耳份C1063,在攪拌下於80℃進行聚合反應30分鐘而得到降莰烯系開環聚合物的溶液。 As the first stage of polymerization, 5-ethylene-bicyclo[2.2.1]hept-2-ene 35 moles, 1-hexene 0.9 moles, and fennel were added to a nitrogen-substituted pressure-resistant glass reactor. Ether 340 mol parts and 0.005 mol parts of C1063 were subjected to polymerization at 80 ° C for 30 minutes while stirring to obtain a solution of a norbornene-based ring-opening polymer.

其次,作為聚合第2階段,係在聚合第1階段得到的溶液中追加四環[6.5.0.12,5.08,13]十三基-3,8,10,12-四烯45莫耳份、雙環[2.2.1]庚-2-烯-5,6-二羧酸酐20莫耳份、茴香醚250莫耳份及作為釕系聚合觸媒之4-乙醯氧基亞苄基(二氯)(4,5-二溴-1,3-甲基-4-咪唑啉-2-亞基)(三環己基膦)釕(C1063、和光純藥公司製)0.01莫耳份,在攪拌下於80℃進行聚合反應1.5小時而得到降莰烯系開環聚合物的溶液。針對此溶液測定氣相層析法時,能夠確認實質上不殘留單體殘留且聚合轉化率係99%以上。 Next, as a second stage of polymerization, the polymerization system is added in the first stage tetracyclic resultant solution [6.5.0.1 2,5 .0 8,13] tridecyl -3,8,10,12- tetraene 45 Mo Ear, bicyclo[2.2.1]hept-2-ene-5,6-dicarboxylic anhydride 20 mol parts, anisole 250 mol parts and 4-ethyloxybenzylidene group as lanthanide polymerization catalyst (dichloro)(4,5-dibromo-1,3-methyl-4-imidazolin-2-ylidene) (tricyclohexylphosphine) oxime (C1063, manufactured by Wako Pure Chemical Industries, Ltd.) 0.01 mol, The polymerization reaction was carried out at 80 ° C for 1.5 hours with stirring to obtain a solution of a norbornene-based ring-opening polymer. When the gas chromatography was measured for this solution, it was confirmed that substantially no monomer remained and the polymerization conversion ratio was 99% or more.

其次,在經氮取代之附有攪拌機的高壓釜,添加所得到的開環聚合物的溶液且追加0.03莫耳份C1063,於150℃且氫壓7MPa使其攪拌5小時攪拌而進行氫化反應,來得到降莰烯系開環聚合物的氫化物之脂環式烯烴聚合物(1)的溶液。脂環式烯烴聚合物(1)的重量平均分子量係60,000,數量平均分子量係30,000,分子量分布係2。又,氫化率係95%,具有羧酸酐基的重複單元之含有率係20莫耳%。脂環式烯烴聚合物(1)的溶液之固體成分濃度係22%。 Next, a solution of the obtained ring-opening polymer was added to an autoclave with a stirrer substituted with nitrogen, and 0.03 mol of C1063 was added thereto, and the mixture was stirred at 150 ° C under a hydrogen pressure of 7 MPa for 5 hours to carry out a hydrogenation reaction. A solution of a hydride-containing alicyclic olefin polymer (1) of a decene-based ring-opening polymer is obtained. The alicyclic olefin polymer (1) has a weight average molecular weight of 60,000, a number average molecular weight of 30,000, and a molecular weight distribution system of 2. Further, the hydrogenation ratio was 95%, and the content of the repeating unit having a carboxylic anhydride group was 20 mol%. The solid content concentration of the solution of the alicyclic olefin polymer (1) was 22%.

實施例5 Example 5

(被鍍覆層用樹脂組成物) (resin composition for plating layer)

藉由將在合成例1所得到的脂環式烯烴聚合物(1)的溶液454份[以脂環式烯烴聚合物(1)換算計為100份]、作為硬化劑之具有二環戊二烯骨架之多元環氧化合物(商品名「Epiclon HP7200L」、DIC公司製、「Epiclon」係註冊商標)36份、作為無機填充劑之氧化矽(商品名「ADMERFINE SO-C1」、ADMATECHS公司製、平均粒子徑0.25μm、「ADMERFINE」係註冊商標)24.5份、作為抗老化劑之參(3,5-二-第三丁基-4-羥苄基)-異三聚氰酸酯(商品名「IRGANOX(註冊商標)3114」、BASF公司製)1份、作為紫外線吸收劑之2-[2-羥基-3,5-雙(α,α-二甲苄基)苯基]-2H-苯并三唑0.5份、及作為硬化促進劑之1-苄基-2-苯基咪唑0.5份,與茴香醚混合且以調配劑濃度為16%之方式混合,來得到被鍍覆層用樹脂組成物的清漆。 454 parts of a solution of the alicyclic olefin polymer (1) obtained in Synthesis Example 1 (100 parts in terms of alicyclic olefin polymer (1)), and a dicyclopentane as a curing agent 36 parts of a olefinic polyene compound (trade name "Epiclon HP7200L", DIC company, "Epiclon" registered trademark), and cerium oxide as an inorganic filler (trade name "ADMERFINE SO-C1", ADMATECHS, 24.5 parts of an average particle diameter of 0.25 μm and "ADMERFINE" registered trademark, and ginseng (3,5-di-t-butyl-4-hydroxybenzyl)-isocyanurate as an anti-aging agent (trade name) "IRGANOX (registered trademark) 3114", manufactured by BASF Corporation), 2-[2-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]-2H-benzene as a UV absorber 0.5 part of triazole and 0.5 part of 1-benzyl-2-phenylimidazole as a hardening accelerator, mixed with anisole and mixed at a concentration of 16% of the compounding agent to obtain a resin for plating layer Varnish of the object.

(積層薄膜的製造) (Manufacturing of laminated film)

將上述所得到之被鍍覆層用樹脂組成物的清漆,使用繞線棒而塗布在厚度38μm的聚對酞酸乙二酯薄膜(支撐體)上,其次,在氮環境下於80℃使其乾燥10分鐘,而得到形成有由未硬化的被鍍覆層用樹脂組成物所構成之厚度3μm的被鍍覆層之附有支撐體的薄膜。 The varnish of the resin composition for a plated layer obtained above was applied onto a polyethylene terephthalate film (support) having a thickness of 38 μm using a wire bar, and secondly, at 80 ° C in a nitrogen atmosphere. This was dried for 10 minutes to obtain a support-attached film formed with a plated layer having a thickness of 3 μm composed of a resin composition for an unhardened layer to be plated.

其次,將在實施例1所得到的硬化性環氧組成物的清漆使用刮刀片(TESTER產業公司製)及自動薄膜塗膜器(TESTER產業公司製)塗布在附有支撐體的薄膜之由被鍍覆層用樹脂組成物所構成之被鍍覆層的形成面,其次,在氮環境下於80℃使其乾燥10分鐘而得到總厚度為43μm之形成有被鍍 覆層及接著層之附有支撐體的積層薄膜。此附有支撐體的積層薄膜係依照以下的順序而形成有支撐體、由被鍍覆層用樹脂組成物所構成之被鍍覆層、由硬化性環氧組成物所構成之接著層。 Next, the varnish of the curable epoxy composition obtained in Example 1 was coated on a film with a support using a doctor blade (manufactured by TESTER Industries, Inc.) and an automatic film coater (manufactured by TESTER Industries, Inc.). The surface on which the plated layer formed of the resin composition for the plating layer was formed, and then dried at 80 ° C for 10 minutes in a nitrogen atmosphere to obtain a total thickness of 43 μm. A laminated film with a support attached to the cladding and the subsequent layer. The laminated film with a support is formed with a support, a plated layer composed of a resin composition for a plated layer, and an adhesive layer composed of a curable epoxy composition in the following order.

(積層體硬化物的製造) (Manufacture of laminate hardened material)

其次,除了上述以外,另外在使玻璃纖維含浸含有玻璃填料及不含鹵素的環氧化合物之清漆而得到的芯材之表面,張貼厚度為18μm的銅而成之厚度0.8mm、150mm見方(縱150mm、橫150mm)的雙面覆銅基板表面,藉由使此表面與有機酸接觸且被微蝕刻處理形成配線寬度及配線之間距離為50μm、厚度為18μm的導體層而得到內層基板。 In addition, in addition to the above, the surface of the core material obtained by impregnating the glass fiber with a varnish containing a glass filler and a halogen-free epoxy compound is formed by coating a copper having a thickness of 18 μm and having a thickness of 0.8 mm and 150 mm square. The surface of the double-sided copper-clad substrate of 150 mm and 150 mm in width was brought into contact with an organic acid, and a conductor layer having a wiring width and a wiring distance of 50 μm and a thickness of 18 μm was formed by micro-etching treatment to obtain an inner layer substrate.

在此內層基板之雙面,將在上述所得到之附有支撐體的積層薄膜切斷成為150mm見方而成者,以接著層用樹脂組成物側的面成為內側的方式貼合後,進行一次加壓。一次加壓係使用在上下具備耐熱橡膠製加壓板之真空貼合機,在200Pa的減壓下且於温度110℃,以壓力0.1MPa加熱壓黏90秒鐘。而且,使用在上下具備金屬製加壓之油壓加壓装置,以壓黏温度110℃、1MPa進行加熱壓黏90秒鐘。其次,藉由將支撐體剝下,而得到由硬化性環氧組成物及被鍍覆層用樹脂組成物所構成之樹脂層及內層基板之積層體。進而將積層體在空氣環境下、180℃放置60分鐘使樹脂層硬化,而在內層基板上形成有電絶緣層。 On both sides of the inner layer substrate, the laminated film with the support obtained as described above is cut into a 150 mm square, and the surface of the resin layer on the back layer is bonded to the inside. Pressurize once. The primary pressurization was carried out by using a vacuum laminator equipped with a heat-resistant rubber pressure plate on the upper and lower sides, and heat-pressed at a pressure of 110 ° C for 90 seconds under a reduced pressure of 200 Pa at a pressure of 0.1 MPa. Further, a hydraulic pressurizing device having a metal pressurization on the upper and lower sides was used, and heat-pressing was carried out for 90 seconds at a pressure-bonding temperature of 110 ° C and 1 MPa. Then, the support body is peeled off to obtain a laminate of a resin layer composed of a curable epoxy composition and a resin composition for a layer to be plated, and an inner layer substrate. Further, the laminate was allowed to stand in an air atmosphere at 180 ° C for 60 minutes to harden the resin layer, and an electrically insulating layer was formed on the inner substrate.

(膨潤處理步驟) (swelling treatment step)

將所得到的積層體硬化物,搖動浸漬在以成為膨潤液 (「Swelling Dip Securiganth P」、Atotech公司製、「SECURIGANTH」係註冊商標)500mL/L、氫氧化鈉3g/L的方式調製而成之60℃的水溶液15分鐘之後,進行水洗。 The obtained laminate cured product is immersed in a shake to become a swelling liquid ("Swelling Dip Securiganth P", Atotech Co., Ltd., "SECURIGANTH" registered trademark) 500 ° C aqueous solution prepared by dissolving 500 mL / L and sodium hydroxide 3 g / L for 15 minutes, and then washing with water.

(氧化處理步驟) (oxidation treatment step)

其次,搖動浸漬在以成為過錳酸鹽的水溶液(「Concentrate Compact CP」、Atotech公司製)640mL/L、氫氧化鈉濃度40g/L的方式調製而成之80℃的水溶液15分鐘之後,進行水洗。 Then, the aqueous solution of 80 ° C prepared by immersing in an aqueous solution of permanganate ("Concentrate Compact CP", manufactured by Atotech Co., Ltd.) at 640 mL/L and a sodium hydroxide concentration of 40 g/L was shaken for 15 minutes. Washed.

(中和還原處理步驟) (neutralization and reduction processing steps)

接著,將積層體硬化物浸漬在以成為硫酸羥胺水溶液(「REDUCTION SECURIGANTH P 500」、Atotech公司製、「SECURIGANTH」係註冊商標)100mL/L、硫酸35mL/L的方式調製而成之40℃的水溶液5分鐘,進行中和還原處理之後,進行水洗。 Then, the laminate cured product was immersed in a 40 ° C solution prepared by using a hydroxylamine sulfate aqueous solution ("REDUCTION SECURIGANTH P 500", Atotech Co., Ltd., "SECURIGANTH" registered trademark) 100 mL/L, and sulfuric acid 35 mL/L. After the aqueous solution was subjected to a neutralization reduction treatment for 5 minutes, it was washed with water.

(清潔調理劑步驟) (cleaning conditioner step)

其次,將積層體硬化物浸漬在以使清潔調理劑水溶液(「ALCUP MCC-6-A」、上村工業公司製、「ALCUP」係註冊商標)成為濃度50ml/L的方式調整而成之50℃的水溶液5分鐘,來進行清潔調理劑處理。其次,將積層體硬化物浸漬在40℃的水洗水1分鐘之後,進行水洗。 Then, the laminate cured product was immersed in a 50 ° C adjusted to a concentration of 50 ml/L in an aqueous solution of a clean conditioner ("ALCUP MCC-6-A", manufactured by Uemura Industrial Co., Ltd., "ALCUP"). The aqueous solution was taken for 5 minutes for cleaning conditioner treatment. Next, the laminate hardened product was immersed in water washing water at 40 ° C for 1 minute, and then washed with water.

(軟蝕刻處理步驟) (soft etching process step)

其次,將積層體硬化物浸漬在以成為硫酸濃度100g/L、過硫酸鈉100g/L的方式調製的水溶液2分鐘來進行軟蝕刻處理之後,進行水洗。 Next, the layered body cured product was immersed in an aqueous solution prepared to have a sulfuric acid concentration of 100 g/L and sodium persulfate of 100 g/L for 2 minutes, and then subjected to a soft etching treatment, followed by washing with water.

(酸洗處理步驟) (pickling treatment step)

其次,將積層體硬化物浸漬在以成為硫酸濃度100g/L的方式調製的水溶液1分鐘來進行酸洗處理之後,進行水洗。 Next, the layered body cured product was immersed in an aqueous solution prepared to have a sulfuric acid concentration of 100 g/L for 1 minute, and subjected to pickling treatment, followed by washing with water.

(觸媒賦予步驟) (catalyst giving step)

其次,將積層體硬化物浸漬在以成為ALCUP Activator MAT-1-A(商品名、上村工業公司製、「ALCUP」係註冊商標)為200mL/L、ALCUP Activator MAT-1-B(商品名、上村工業公司製、「ALCUP」係註冊商標)為30mL/L、氫氧化鈉為0.35g/L的方式調製之60℃的含Pd鹽的鍍覆觸媒水溶液5分鐘之後,進行水洗。 Next, the laminate cured product is immersed in the ALCUP Activator MAT-1-A (trade name, manufactured by Uemura Industrial Co., Ltd., "ALCUP" registered trademark) at 200 mL/L, ALCUP Activator MAT-1-B (trade name, The PLC salt-containing plating catalyst aqueous solution prepared by the method of the "ALCUP", which is manufactured by Uemura Industrial Co., Ltd., and the "ALCUP" registered trademark) was 30 mL/L and sodium hydroxide was 0.35 g/L, and was washed with water for 5 minutes.

(活性化步驟) (activation step)

接著,將積層體硬化物於35℃浸漬在以成為ALCUP Reducer MAB-4-A(商品名、上村工業公司製、「ALCUP」係註冊商標)為20mL/L、ALCUP Reducer MAB-4-B(商品名、上村工業公司製、「ALCUP」係註冊商標)為200mL/L的方式調整之水溶液3分鐘來將鍍覆觸媒還原處理之後,進行水洗。 Then, the laminate cured product was immersed at 35 ° C to obtain ALCUP Reducer MAB-4-A (trade name, manufactured by Uemura Industrial Co., Ltd., "ALCUP" registered trademark) of 20 mL / L, ALCUP Reducer MAB-4-B ( The product name, the "ALCUP" registered trademark of the company, and the "ALCUP" registered trademark) was adjusted to 200 mL/L for 3 minutes to reduce the plating catalyst, and then washed with water.

(促進劑(Accelerator)處理步驟) (Accelerator processing step)

其次,將積層體硬化物於25℃浸漬在以成為ALCUP Accelerator MEL-3-A(商品名、上村工業公司製、「ALCUP」係註冊商標)為50mL/L的方式調製之水溶液1分鐘。 Then, the laminate cured product was immersed in an aqueous solution prepared by using ALCUP Accelerator MEL-3-A (trade name, manufactured by Uemura Industrial Co., Ltd., "ALCUP" registered trademark) at 50 mL/L for 1 minute at 25 °C.

(無電解鍍覆步驟) (electroless plating step)

對以成為Thru-Cup PEA-6-A(商品名、上村工業公司製、「Thru-Cup」係註冊商標)100mL/L、Thru-Cup PEA-6-B-2X(商品名、上村工業公司製)50mL/L、Thru-Cup PEA-6-C(商品名、上村工業公司製)14mL/L、Thru-Cup PEA-6-D(商品名、上村工 業公司製)15mL/L、Thru-Cup PEA-6-E(商品名、上村工業公司製)50mL/L、37%福馬林水溶液5mL/L的方式調製而成之無電解銅鍍覆液,邊吹入空氣,邊將如此進行而得到的積層體硬化物於溫度36℃浸漬20分鐘進行無電解銅鍍覆處理,而在積層體硬化物表面(由被鍍覆層用樹脂組成物所構成之被鍍覆層的表面)形成無電解鍍覆膜。 In order to become Thru-Cup PEA-6-A (trade name, manufactured by Uemura Industrial Co., Ltd., "Thru-Cup" registered trademark) 100 mL/L, Thru-Cup PEA-6-B-2X (trade name, Uemura Industrial Co., Ltd.) 50 mL/L, Thru-Cup PEA-6-C (trade name, manufactured by Uemura Industrial Co., Ltd.) 14 mL/L, Thru-Cup PEA-6-D (trade name, Uemura) An electroless copper plating solution prepared by a method of 15 mL/L, Thru-Cup PEA-6-E (trade name, manufactured by Uemura Industrial Co., Ltd.), 50 mL/L, and 37% of a formalin aqueous solution of 5 mL/L. While the air is blown, the cured product obtained by the above-described process is immersed at a temperature of 36 ° C for 20 minutes to carry out electroless copper plating treatment, and is formed on the surface of the cured body of the laminate (from the resin composition for the layer to be plated) The surface of the layer to be plated forms an electroless plating film.

其次,將形成有無電解鍍覆膜之積層體硬化物,在空氣環境下於150℃進行退火處理30分鐘。 Next, a cured product of the laminate having an electroless plating film was formed, and annealed at 150 ° C for 30 minutes in an air atmosphere.

對經退火處理之積層體硬化物,施行電解銅鍍覆來形成厚度30μm的電解銅鍍覆膜。其次,藉由將此積層體硬化物於180℃加熱處理60分鐘,而得到在積層體硬化物上形成有由前述金屬薄膜層及電解銅鍍覆膜所構成的導體層之雙面2層的多層印刷配線板。 The annealed laminate hardened material was subjected to electrolytic copper plating to form an electrolytic copper plating film having a thickness of 30 μm . Then, the laminate cured product is heat-treated at 180 ° C for 60 minutes to obtain a double-sided layer of a conductor layer formed of the metal thin film layer and the electrolytic copper plating film formed on the cured product of the laminate. Multilayer printed wiring board.

Claims (11)

一種積層薄膜,具有接著層;及由被鍍覆層用樹脂組成物所構成的被鍍覆層,其中接著層係由含有下列而成之硬化性環氧組成物所形成:多元環氧化合物(A),其係具有聯苯構造及/或縮合多環構造;含磷環氧化合物(B),其係具有以下式(1)或(2)表示之構造;及含三嗪構造的酚樹脂(C), (式(1)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~4的整數,式(2)中,R1及R2係各自獨立且表示碳數1~6的烴基,複數個R1及R2係各自可相同亦可不同,m及n係各自獨立且表示0~5的整數)。 A laminated film having an adhesive layer; and a plated layer composed of a resin composition for a plated layer, wherein the adhesive layer is formed of a curable epoxy composition containing the following: a polyvalent epoxy compound ( A) having a biphenyl structure and/or a condensed polycyclic structure; a phosphorus-containing epoxy compound (B) having a structure represented by the following formula (1) or (2); and a phenol resin having a triazine structure (C), (In the formula (1), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and represent 0 to 0. An integer of 4, in the formula (2), R 1 and R 2 each independently represent a hydrocarbon group having 1 to 6 carbon atoms, and a plurality of R 1 and R 2 groups may be the same or different, and m and n are each independently and Indicates an integer from 0 to 5.) 如申請專利範圍第1項所述之積層薄膜,其中前述含磷環氧化合物(B)係具有以下式(3)表示的磷雜菲(phosphaphenanthrene)構造之環氧化合物, The laminated film according to the first aspect of the invention, wherein the phosphorus-containing epoxy compound (B) has an epoxy compound of a phosphaphenanthrene structure represented by the following formula (3), 如申請專利範圍第1項所述之積層薄膜,其中前述多元環氧化合物(A)與前述含磷環氧化合物(B)之含有比例,係以「多元環氧化合物(A):含磷環氧化合物(B)」的重量比計,為20:80~95:5。 The laminated film according to claim 1, wherein the ratio of the polyvalent epoxy compound (A) to the phosphorus-containing epoxy compound (B) is "polyvalent epoxy compound (A): phosphorus-containing ring The weight ratio of the oxygen compound (B) is 20:80 to 95:5. 如申請專利範圍第1項所述之積層薄膜,其中前述含三嗪構造的酚樹脂(C)的含有比例,係相對於在硬化性環氧組成物中所含有的環氧化合物之合計100重量份,為1~60重量份。 The laminated film according to the first aspect of the invention, wherein the content of the benzene resin (C) containing the triazine structure is 100% by weight based on the total of the epoxy compound contained in the curable epoxy composition. It is 1 to 60 parts by weight. 如申請專利範圍第1項所述之積層薄膜,其中前述硬化性環氧組成物進一步含有活性酯化合物(D)。 The laminated film according to claim 1, wherein the curable epoxy composition further contains an active ester compound (D). 一種預浸材,係由如申請專利範圍第1、2、3、4或5項所述之積層薄膜、及纖維基材所構成。 A prepreg comprising a laminate film as described in claim 1, 2, 3, 4 or 5, and a fibrous substrate. 一種積層體,係在基材層積如申請專利範圍第1、2、3、4或5項所述之積層薄膜而成。 A laminated body obtained by laminating a substrate as described in the first, second, third, fourth or fifth aspect of the patent application. 一種硬化物,係將如申請專利範圍第1、2、3、4或5項所述之積層薄膜、如申請專利範圍第6項所述之預浸材、或如申請專利範圍第7項所述之積層體硬化而成。 A hardened material, which is a laminated film as described in claim 1, 2, 3, 4 or 5, or a prepreg as described in claim 6 or as claimed in claim 7 The layered body is hardened. 一種複合體,係在如申請專利範圍第8項所述之硬化物的表面形成導體層而成。 A composite body formed by forming a conductor layer on a surface of a cured product as described in claim 8 of the patent application. 一種電子材料用基板,係含有如申請專利範圍第8項所述之硬化物作為構成材料。 A substrate for an electronic material comprising the cured product according to item 8 of the patent application as a constituent material. 一種電子材料用基板,係含有如申請專利範圍第9項所述之複合體作為構成材料。 A substrate for an electronic material comprising the composite according to claim 9 of the patent application as a constituent material.
TW103137353A 2014-10-29 2014-10-29 Curable epoxy composition, film, laminated film, prepreg, laminate, cured product and composite TWI650371B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102159616A (en) * 2008-09-24 2011-08-17 积水化学工业株式会社 Resin composition, cured body and multilayer body
CN103724596A (en) * 2012-10-11 2014-04-16 新日铁住金化学株式会社 Epoxy resin composition and condensate
WO2014061450A1 (en) * 2012-10-17 2014-04-24 Dic株式会社 Active ester resin, epoxy resin composition, cured product thereof, prepreg, circuit board, and build-up film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102159616A (en) * 2008-09-24 2011-08-17 积水化学工业株式会社 Resin composition, cured body and multilayer body
CN103724596A (en) * 2012-10-11 2014-04-16 新日铁住金化学株式会社 Epoxy resin composition and condensate
WO2014061450A1 (en) * 2012-10-17 2014-04-24 Dic株式会社 Active ester resin, epoxy resin composition, cured product thereof, prepreg, circuit board, and build-up film

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