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TWI647546B - Detection design for preventing board offset - Google Patents

Detection design for preventing board offset Download PDF

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Publication number
TWI647546B
TWI647546B TW107122536A TW107122536A TWI647546B TW I647546 B TWI647546 B TW I647546B TW 107122536 A TW107122536 A TW 107122536A TW 107122536 A TW107122536 A TW 107122536A TW I647546 B TWI647546 B TW I647546B
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exposed
reference line
detectors
component
exposure
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TW107122536A
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Chinese (zh)
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TW202001429A (en
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邱睿彥
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志聖工業股份有限公司
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Publication of TW202001429A publication Critical patent/TW202001429A/en

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Abstract

一種防板偏檢知設計,其具有機台本體、承載平台、第一偵測組件、第二偵測組件及控制裝置。承載平台設置於機台本體中,承載平台的曝光面用以承載待曝光件。第一偵測組件包含有兩個第一偵測器,兩個第一偵測器能偵測待曝光件的第一側邊。第二偵測組件包含有兩個第二偵測器,兩個第二偵測器能偵測待曝光件的第二側邊。控制裝置能依據第一偵測組件及第二偵測組件,偵測待曝光件的第一側邊及第二側邊的結果,而判斷待曝光件是否正確地設置於承載平台,而控制裝置能於待曝光件未正確地設置於承載平台上時,控制警示裝置作動,以提醒使用者。 An anti-plate bias detection design has a machine body, a bearing platform, a first detecting component, a second detecting component and a control device. The carrying platform is disposed in the machine body, and the exposed surface of the carrying platform is used to carry the component to be exposed. The first detecting component includes two first detectors, and the two first detectors can detect the first side of the component to be exposed. The second detecting component includes two second detectors, and the two second detectors can detect the second side of the component to be exposed. The control device can detect the result of the first side and the second side of the object to be exposed according to the first detecting component and the second detecting component, and determine whether the object to be exposed is correctly disposed on the carrying platform, and the control device The warning device can be activated to remind the user when the item to be exposed is not correctly disposed on the carrying platform.

Description

防板偏檢知設計 Anti-plate bias detection design

本發明涉及一種曝光設備內部構件的設計,特別是一種適用於曝光設備中的防板偏檢知設計。 The invention relates to the design of an internal component of an exposure apparatus, in particular to an anti-plate bias detection design suitable for use in an exposure apparatus.

現有的曝光設備,僅在電路板送入曝光設備前,進行位置的校正,在電路板進入曝光設備後,則直接進行曝光作業。因此,現有的曝光設備,容易發生電路板進入曝光設備後,因為電路板相對於曝光底片的位置有所偏差,從而導致曝光後的電路板,整片無法使用而必須報廢的問題。緣此,本發明人乃潛心研究並配合學理的運用,而提出一種設計合理且有效改善上述問題的本發明。 In the existing exposure apparatus, the position is corrected only before the board is fed into the exposure apparatus, and after the board enters the exposure apparatus, the exposure operation is directly performed. Therefore, the existing exposure apparatus is prone to the problem that the board enters the exposure apparatus, because the position of the board relative to the exposure film is deviated, resulting in the board being exposed, the whole piece cannot be used and must be scrapped. Accordingly, the inventors have diligently studied and cooperated with the application of the theory, and proposed a present invention which is rational in design and effective in improving the above problems.

本發明的主要目的在於提供一種防板偏檢知設計,其適用於曝光設備中,所述防板偏檢知設計用以改善現有的曝光設備,容易發生電路板位置偏差,而導致曝光後的電路板必須報廢的問題。 The main object of the present invention is to provide an anti-plate bias detection design, which is suitable for use in an exposure apparatus. The anti-plate bias detection design is used to improve existing exposure equipment, and it is prone to positional deviation of the circuit board, resulting in exposure. The board must be scrapped.

為了實現上述目的,本發明提供一種防板偏檢知設計,其適用於一曝光設備,所述防板偏檢知設計用以對一待曝光件進行曝光,防板偏檢知設計包含:一機台本體、一承載平台、一第一偵測組件、一第二偵測組件及一控制裝置。機台本體設置有一曝光裝置,曝光裝置用以對待曝光件進行曝光。承載平台設置於機台本體,承載平台具有一曝光面,曝光面用以承載待曝光件,曝光面彼此相互垂直的兩側邊分別定義為一第一基準線及一第二基準 線。第一偵測組件包含有兩個一第一偵測器,其用以偵測設置於曝光面上的待曝光件的一第一側邊相對於第一基準線的位置。第二偵測組件包含有兩個一第二偵測器,其用以偵測設置於曝光面上的待曝光件的一第二側邊相對於第二基準線的位置。其中,第一側邊垂直於第二側邊。控制裝置電性連接第一偵測組件及第二偵測組件,控制裝置能依據兩個第一偵測器偵測待曝光件的第一側邊相對於第一基準線的位置的結果,及兩個第二偵測器偵測待曝光件的第二側邊相對於第二基準線的位置的結果,以在待曝光件未正確地設置於曝光面上時,控制一警示裝置作動;控制裝置能依據兩個第一偵測器偵測待曝光件的第一側邊相對於第一基準線的位置的結果,及兩個第二偵測器偵測待曝光件的第二側邊相對於第二基準線的位置的結果,在待曝光件正確地設置於曝光面上時,控制曝光裝置作動,以對待曝光件進行曝光作業。 In order to achieve the above object, the present invention provides an anti-plate bias detection design, which is suitable for an exposure apparatus, and the anti-plate bias detection design is used for exposing an object to be exposed, and the anti-plate bias detection design includes: The machine body, a carrying platform, a first detecting component, a second detecting component and a control device. The machine body is provided with an exposure device for exposing the object to be exposed. The carrying platform is disposed on the machine body, the carrying platform has an exposure surface, and the exposed surface is used for carrying the object to be exposed, and the two sides of the exposure surface perpendicular to each other are respectively defined as a first reference line and a second reference. line. The first detecting component includes two first detecting devices for detecting a position of a first side of the member to be exposed disposed on the exposure surface relative to the first reference line. The second detecting component includes two second detecting devices for detecting a position of a second side of the member to be exposed disposed on the exposure surface relative to the second reference line. Wherein the first side is perpendicular to the second side. The control device is electrically connected to the first detecting component and the second detecting component, and the control device can detect the result of the position of the first side of the object to be exposed relative to the first reference line according to the two first detectors, and The two second detectors detect the position of the second side of the object to be exposed relative to the second reference line to control the actuation of a warning device when the member to be exposed is not properly disposed on the exposure surface; The device can detect the result of the position of the first side of the object to be exposed relative to the first reference line according to the two first detectors, and the second side detector detects the second side of the object to be exposed As a result of the position of the second reference line, when the member to be exposed is correctly placed on the exposure surface, the exposure device is controlled to perform an exposure operation on the object to be exposed.

本發明的防板偏檢知設計,可達到的功效為:可以在待曝光件進行曝光作業前,先利用第一偵測組件及第二偵測組件,對待曝光件進行位置的偵測,藉此判斷待曝光件是否正確地設置於承載平台上,並配合控制裝置及警示裝置,以在判斷待曝光件正確地設置於承載平台上時,才進行曝光作業;若待曝光件未正確地設置於承載平台上時,則不進行曝光作業,並透過警示裝置即時地通知相關人員。如此,將可大幅降低待曝光件在未正確地設置於承載平台的情況下,進行曝光作業,而發生曝光後的待曝光件無法使用的問題。 The anti-plate bias detection design of the invention can achieve the following effects: before the exposure work to be exposed, the first detection component and the second detection component can be used to detect the position of the exposure component, Determining whether the object to be exposed is correctly disposed on the carrying platform, and cooperates with the control device and the warning device to perform an exposure operation when determining that the object to be exposed is correctly disposed on the carrying platform; if the item to be exposed is not correctly set When the platform is on the carrying platform, the exposure operation is not performed, and the relevant personnel are immediately notified through the warning device. In this way, it is possible to greatly reduce the problem that the object to be exposed is not properly placed on the carrier platform, and the exposure operation is performed, and the exposed object to be exposed after exposure is unusable.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

1‧‧‧防板偏檢知設計 1‧‧‧Anti-plate bias detection design

10‧‧‧機台本體 10‧‧‧ machine body

10a‧‧‧曝光空間 10a‧‧‧Exposure space

101‧‧‧活動開口 101‧‧‧Event opening

11‧‧‧承載平台 11‧‧‧Loading platform

111‧‧‧曝光面 111‧‧‧Exposure

12‧‧‧上台框裝置 12‧‧‧Upper frame device

121‧‧‧固定面 121‧‧‧Fixed surface

13‧‧‧曝光裝置 13‧‧‧Exposure device

131‧‧‧下曝光單元 131‧‧‧Under exposure unit

132‧‧‧上曝光單元 132‧‧‧Upper exposure unit

14‧‧‧控制裝置 14‧‧‧Control device

15‧‧‧第一偵測組件 15‧‧‧First detection component

151‧‧‧第一偵測器 151‧‧‧First detector

152‧‧‧第一偵測器 152‧‧‧First detector

16‧‧‧第二偵測組件 16‧‧‧Second detection component

161‧‧‧第二偵測器 161‧‧‧Second detector

162‧‧‧第二偵測器 162‧‧‧Second detector

17‧‧‧第一調整組件 17‧‧‧First adjustment component

171‧‧‧連接臂 171‧‧‧Connecting arm

172‧‧‧驅動器 172‧‧‧ drive

173‧‧‧連接臂 173‧‧‧Connecting arm

174‧‧‧驅動器 174‧‧‧ drive

175‧‧‧滑塊 175‧‧‧ Slider

176‧‧‧滑軌 176‧‧‧rails

177‧‧‧限位構件 177‧‧‧Limited components

18‧‧‧第二調整組件 18‧‧‧Second adjustment component

181‧‧‧連接臂 181‧‧‧Connecting arm

182‧‧‧驅動器 182‧‧‧ drive

183‧‧‧滑塊 183‧‧‧ Slider

184‧‧‧滑軌 184‧‧‧rails

185‧‧‧限位構件 185‧‧‧Limited components

S‧‧‧待曝光件 S‧‧‧To be exposed

S1‧‧‧第一側邊 S1‧‧‧ first side

S2‧‧‧第二側邊 S2‧‧‧ second side

C1‧‧‧第一基準線 C1‧‧‧ first baseline

C2‧‧‧第二基準線 C2‧‧‧ second baseline

C21‧‧‧輔助基準線 C21‧‧‧Auxiliary baseline

D1‧‧‧間隔距離 D1‧‧‧ separation distance

D2‧‧‧間隔距離 D2‧‧‧ separation distance

Q‧‧‧連接板 Q‧‧‧Connecting board

圖1為本發明的防板偏檢知設計的示意圖。 Fig. 1 is a schematic view showing the design of the anti-plate bias detection of the present invention.

圖2為本發明的防板偏檢知設計的承載平台及其中一第一偵測 器的示意圖。 2 is a carrying platform for the anti-plate bias detection design of the present invention and a first detection thereof Schematic diagram of the device.

圖3為本發明的防板偏檢知設計的上台框裝置、其中一第一偵測器及第二偵測組件的示意圖。 FIG. 3 is a schematic diagram of the upper frame device, one of the first detectors and the second detecting component of the anti-plate bias detection design of the present invention.

圖4為本發明的防板偏檢知設計的承載平台、上台框裝置、第一偵測組件及第二偵測組件的示意圖。 4 is a schematic diagram of a load bearing platform, a top frame device, a first detecting component, and a second detecting component of the anti-plate bias detection design of the present invention.

圖5為本發明的防板偏檢知設計的承載平台、第一偵測組件及第二偵測組件的設置位置的示意圖。 FIG. 5 is a schematic diagram showing the installation position of the carrying platform, the first detecting component and the second detecting component of the anti-plate bias detection design of the present invention.

圖6~圖12為待曝光件設置於本發明的防板偏檢知設計的承載平台上的各種狀態示意圖。 6 to FIG. 12 are schematic diagrams showing various states in which the member to be exposed is placed on the carrying platform of the anti-plate bias detection design of the present invention.

圖13為本發明的防板偏檢知設計的其中一第一偵測器及第一調整組件的示意圖。 FIG. 13 is a schematic diagram of one of the first detector and the first adjustment component of the anti-plate bias detection design of the present invention.

圖14為本發明的防板偏檢知設計的其中一第一偵測器及第一調整組件的示意圖。 FIG. 14 is a schematic diagram of one of the first detector and the first adjustment component of the anti-plate bias detection design of the present invention.

圖15為本發明的防板偏檢知設計的兩個第二偵測器及第二調整組件的示意圖。 FIG. 15 is a schematic diagram of two second detectors and a second adjustment component of the anti-plate bias detection design of the present invention.

以下係藉由特定的具體實例說明本發明之防板偏檢知設計的實施方式,熟悉此技術之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。又本發明之圖式僅為簡單說明,並非依實際尺寸描繪,亦即未反應出相關構成之實際尺寸,先予敘明。以下之實施方式係進一步詳細說明本發明之觀點,但並非以任何觀點限制本發明之範疇。於以下說明中,如有指出請參閱特定圖式或是如特定圖式所示,其僅是用以強調於後續說明中,所述及的相關內容大部份出現於該特定圖式中,但不限制該後續說明中僅可參考所述特定圖式。 The embodiments of the anti-plate bias detection design of the present invention are described below by way of specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in the present specification. The present invention may be embodied or applied in various other specific embodiments, and various modifications and changes may be made without departing from the spirit and scope of the invention. Further, the drawings of the present invention are merely illustrative, and are not depicted in actual dimensions, that is, the actual dimensions of the related structures are not reflected, which will be described first. The following embodiments are intended to describe the present invention in further detail, but are not intended to limit the scope of the invention. In the following description, if reference is made to a specific drawing or as shown in the specific drawings, it is only used to emphasize that in the following description, the relevant content of the description is mostly in the specific drawing. However, it is not limited to the specific description in the following description.

請參閱圖1,其為本發明的防板偏檢知設計的示意圖。本發明 的防板偏檢知設計是應用於一曝光設備中,特別是可以應用於用來對電路板進行曝光作業的曝光設備中。防板偏檢知設計1包含有一機台本體10、一承載平台11、一上台框裝置12、一曝光裝置13及一控制裝置14。機台本體10內具有一曝光空間10a。關於機台本體10的外型可以是依據需求變化,機台本體10可以是獨立的設備,或者可以是與其他機台設備相互連接,於此不加以限制。機台本體10包含有一活動開口101,使用者能通過活動開口101對機台本體10內的相關構件,進行維修、更換、清潔等。 Please refer to FIG. 1 , which is a schematic diagram of the anti-plate bias detection design of the present invention. this invention The anti-plate bias detection design is applied to an exposure apparatus, and in particular, it can be applied to an exposure apparatus for performing exposure work on a circuit board. The anti-plate bias detection design 1 includes a machine body 10, a carrier platform 11, an upper frame device 12, an exposure device 13, and a control device 14. The machine body 10 has an exposure space 10a therein. The appearance of the machine body 10 may be changed according to requirements. The machine body 10 may be an independent device, or may be connected to other machine devices, and is not limited thereto. The machine body 10 includes a movable opening 101 through which the user can perform maintenance, replacement, cleaning, and the like on the relevant components in the machine body 10.

請一併參閱圖1及圖2,圖2為承載平台的示意圖。承載平台11設置於機台本體10中,且對應位於曝光空間10a中。承載平台11具有透光的一曝光面111,曝光面111用以承載一待曝光件(例如電路板)。在實際應用中,曝光面111可以是具有多個抽氣孔(圖未標示),多個抽氣孔則是對應連接至至少一抽氣裝置(圖未示),透過抽氣裝置及多個抽氣孔的配合,能據以使設置曝光面111上的待曝光件,固定貼附於曝光面111上。曝光裝置13的一下曝光單元131,設置於機台本體10中,且下曝光單元131所發出的曝光光束,能通過曝光面111照設於待曝光件。 Please refer to FIG. 1 and FIG. 2 together. FIG. 2 is a schematic diagram of the carrying platform. The carrying platform 11 is disposed in the machine body 10 and correspondingly located in the exposure space 10a. The carrying platform 11 has an exposed surface 111 for transmitting light, and the exposed surface 111 is for carrying an object to be exposed (for example, a circuit board). In practical applications, the exposure surface 111 may have a plurality of air venting holes (not shown), and the plurality of air venting holes are correspondingly connected to at least one air extracting device (not shown), through the air extracting device and the plurality of air venting holes. The cooperation can be performed by attaching the member to be exposed on the exposure surface 111 to the exposure surface 111. The lower exposure unit 131 of the exposure device 13 is disposed in the machine body 10, and the exposure light beam emitted by the lower exposure unit 131 can be illuminated by the exposure surface 111 to the object to be exposed.

如圖1、圖3及圖4所示,上台框裝置12設置於機台本體10中,且上台框裝置12位於曝光空間10a中。上台框裝置12具有透光的一固定面121,固定面121用以設置一曝光底片。曝光裝置13的一上曝光單元132,設置於機台本體10中,且上曝光單元132所發出的曝光光束,能通過固定面121照設於曝光底片。在不同的實施例中,防板偏檢知設計1可以是僅包含有下曝光單元131,而不包含有上曝光單元132。 As shown in FIGS. 1, 3, and 4, the upper frame device 12 is disposed in the machine body 10, and the upper frame device 12 is located in the exposure space 10a. The upper frame device 12 has a fixed surface 121 for transmitting light, and the fixing surface 121 is for setting an exposure film. An upper exposure unit 132 of the exposure device 13 is disposed in the machine body 10, and the exposure light beam emitted by the upper exposure unit 132 can be illuminated on the exposure film through the fixing surface 121. In various embodiments, the anti-plate bias detection design 1 may include only the lower exposure unit 131 and not the upper exposure unit 132.

控制裝置14電性連接曝光裝置13,控制裝置14能控制上曝光單元132及下曝光單元131,以利用上曝光單元132及下曝光單元131所發出的曝光光束,配合曝光底片對待曝光件進行曝光作業。在實際應用中,控制裝置14可以是設置於機台本體10中的 電腦、處理器等,或者控制裝置14可以是獨立於機台本體10的電腦,於此不加以限制。 The control device 14 is electrically connected to the exposure device 13, and the control device 14 can control the upper exposure unit 132 and the lower exposure unit 131 to expose the exposure object by using the exposure beam emitted by the upper exposure unit 132 and the lower exposure unit 131. operation. In practical applications, the control device 14 may be disposed in the machine body 10 The computer, the processor, etc., or the control device 14 may be a computer independent of the machine body 10, and is not limited herein.

請一併參閱圖2至圖5,曝光面111的外型為矩形,且曝光面111彼此相互垂直的兩側邊分別定義為一第一基準線C1及一第二基準線C2。防板偏檢知設計1還包含有一第一偵測組件15及一第二偵測組件16。第一偵測組件15包含有兩個第一偵測器151、152,第二偵測組件16包含有兩個第二偵測器161、162。兩個第一偵測器151、152及兩個第二偵測器161、162,分別電性連接控制裝置14,而控制裝置14能控制兩個第一偵測器151、152及兩個第二偵測器161、162,以判斷設置於承載平台11上的待曝光件S(如圖6所示)是否正確地設置。 Referring to FIG. 2 to FIG. 5 , the exposure surface 111 has a rectangular shape, and the two sides of the exposure surface 111 perpendicular to each other are defined as a first reference line C1 and a second reference line C2 . The anti-board detection design 1 further includes a first detecting component 15 and a second detecting component 16. The first detecting component 15 includes two first detectors 151 and 152, and the second detecting component 16 includes two second detectors 161 and 162. The two first detectors 151, 152 and the two second detectors 161, 162 are electrically connected to the control device 14, respectively, and the control device 14 can control the two first detectors 151, 152 and two The detectors 161, 162 are configured to determine whether the member to be exposed S (shown in FIG. 6) disposed on the carrier platform 11 is correctly set.

進一步來說,兩個第一偵測器151、152可以是分別設置於承載平台11及上台框裝置12,且兩個第一偵測器151、152彼此不相互面對地設置,而兩個第一偵測器151、152是大致鄰近於第一基準線C1設置。在實際應用中,關於第一偵測組件15的兩個第一偵測器151、152相對於第一基準線C1的設置位置,可以是依據需求設計,舉例來說,兩個第一偵測器151、152可以是於第二基準線C2的方向的間距不大於0.5厘米,又或者,其中一個第一偵測器151、152可以是對應位於第一基準線C1上,而另一第一偵測器151、152於第二基準線C2的方向,與第一基準線C1的距離是不大於0.5厘米。 Further, the two first detectors 151, 152 may be respectively disposed on the carrying platform 11 and the upper frame device 12, and the two first detectors 151, 152 are not disposed facing each other, and two The first detectors 151, 152 are disposed substantially adjacent to the first reference line C1. In a practical application, the setting positions of the two first detectors 151 and 152 of the first detecting component 15 relative to the first reference line C1 may be designed according to requirements, for example, two first detections. The 151, 152 may be at a distance of no more than 0.5 cm in the direction of the second reference line C2, or alternatively, one of the first detectors 151, 152 may be correspondingly located on the first reference line C1, and the other first The detectors 151, 152 are in the direction of the second reference line C2, and the distance from the first reference line C1 is not more than 0.5 cm.

各個第一偵測器151、152能依據是否偵測到待曝光件S,而對應產生偵測訊號,而控制裝置14則可依據兩個第一偵測器151、152所產生的偵測訊號,以判斷待曝光件S的第一側邊S1(如圖6所示)相對於第一基準線C1的位置。舉例來說,各第一偵測器151、152可以是近接感測器,當第一偵測器151、152未偵測到待曝光件S時,第一偵測器151、152可以是不產生任何訊號,而當第一偵測器151、152偵測到待曝光件S時,則可以是對應產 生一第一訊號。當然,各第一偵測器151、152偵測待曝光件S,而對應產生訊號的方式不以此為限,在不同的實施例中,也可以是,各第一偵測器151、152在未偵測到待曝光件S時,對應產生一種偵測訊號,而偵測到待曝光件S時,則對應產生另一種偵測訊號。 Each of the first detectors 151 and 152 can generate a detection signal according to whether the object S to be exposed is detected, and the control device 14 can detect the detection signals generated by the two first detectors 151 and 152. To determine the position of the first side S1 (shown in FIG. 6) of the member S to be exposed relative to the first reference line C1. For example, each of the first detectors 151, 152 may be a proximity sensor. When the first detectors 151, 152 do not detect the member S to be exposed, the first detectors 151, 152 may be Any signal is generated, and when the first detector 151, 152 detects the item S to be exposed, it may be the corresponding product. Give birth to a first signal. Of course, the first detectors 151 and 152 detect the to-be-exposed component S, and the manner of generating the signal is not limited thereto. In different embodiments, the first detectors 151 and 152 may also be used. When the component S to be exposed is not detected, a detection signal is generated correspondingly, and when the component S to be exposed is detected, another detection signal is generated correspondingly.

在實際應用中,可以是兩個第一偵測器151、152分別獨立地電性連接控制裝置14,而控制裝置14依據兩個第一偵測器151、152所傳遞的兩個第一偵測訊號,據以判斷待曝光件S的第一側邊S1相對於第一基準線C1的一第一偏差量。在不同的實施例,也可以是兩個第一偵測器151、152所分別偵測的結果,透過微處理器整合輸出為單一個結果訊號至控制裝置14,而控制裝置14則能直接依據結果訊號,判斷待曝光件S的第一側邊S1相對於第一基準線C1的位置。 In practical applications, the two first detectors 151 and 152 are electrically connected to the control device 14 independently, and the control device 14 transmits the first detections according to the two first detectors 151 and 152. The test signal is used to determine a first deviation amount of the first side S1 of the member S to be exposed relative to the first reference line C1. In different embodiments, the results of the detection by the two first detectors 151 and 152 may be integrated into a single result signal through the microprocessor to the control device 14, and the control device 14 can directly The result signal determines the position of the first side S1 of the member S to be exposed relative to the first reference line C1.

在實際的應用中,設置於承載平台11的第一偵測器151,還可以是用來偵測曝光面111上,是否設置有待曝光件S,藉此,當控制裝置14依據設置於承載平台11的第一偵測器151所偵測的結果,判斷承載平台11未設置有待曝光件時,控制裝置14則能對應控制警示裝置(圖未示,例如是警示燈、警示喇叭等)作動,以提醒使用者承載平台11上未設置有待曝光件。相對地,設置於上台框裝置12的第一偵測器152,也可以是用來偵測固定面121上,是否設置有曝光底片,藉此,當控制裝置14依據設置於上台框裝置12的第一偵測器152,判斷上台框裝置12未設置有曝光底片時,控制裝置14則能控制警示裝置作動以提醒使用者。 In a practical application, the first detector 151 disposed on the carrying platform 11 can also be used to detect whether the component S to be exposed is disposed on the exposure surface 111, thereby, when the control device 14 is disposed on the carrying platform. When the first detector 151 detects the result of the detection by the first detector 151, the control device 14 can control the warning device (not shown, for example, a warning light, a warning speaker, etc.). To remind the user that the item to be exposed is not provided on the carrying platform 11. In contrast, the first detector 152 disposed on the upper frame device 12 may be configured to detect whether the exposure film is disposed on the fixed surface 121, thereby, when the control device 14 is disposed according to the upper frame device 12 When the first detector 152 determines that the upper frame device 12 is not provided with the exposure film, the control device 14 can control the operation of the warning device to remind the user.

特別說明的是,各個第一偵測器151、152相對於第一基準線C1的設置位置,可以是依據第一偵測器151、152的偵測方式不同,而有所不同。舉例來說,如圖6所示,第一偵測器151可以是對應設置於第一基準線C1上,第一偵測器152則可以是位於第一基準線C1向圖中正Y軸方向偏移的位置。而,各第一偵測器 151(152)可以是在偵測到待曝光件S的第一側邊S1(即,各第一偵測器151(152)的部分被待曝光件S遮蔽)時,向控制裝置14傳遞第一種偵測訊號;各第一偵測器151(152)完全被待曝光件S遮蔽時,則可以是向控制裝置14發出第二種偵測訊號;各第一偵測器151(152)完全未被待曝光件S遮蔽時,則可以是向控制裝置14傳遞第三種偵測訊號。 Specifically, the position of each of the first detectors 151 and 152 relative to the first reference line C1 may be different according to the detection manner of the first detectors 151 and 152. For example, as shown in FIG. 6, the first detector 151 may be correspondingly disposed on the first reference line C1, and the first detector 152 may be located on the first reference line C1 in the positive Y-axis direction of the figure. The location of the move. And each first detector 151 (152) may transmit the first to the control device 14 when the first side S1 of the member S to be exposed S is detected (ie, a portion of each of the first detectors 151 (152) is shielded by the member S to be exposed) A detection signal; when each of the first detectors 151 (152) is completely blocked by the object to be exposed S, the second detection signal may be sent to the control device 14; each of the first detectors 151 (152) When the device S is not completely obscured, the third detection signal may be transmitted to the control device 14.

如圖6所示,當待曝光件S的第一側邊S1大致與第一基準線C1對齊設置時,控制裝置14將可接收到來自第一偵測器151所傳遞的第一種控制訊號(意即,有偵測到第一側邊S1)及來自第一偵測器152所傳遞的第二種偵測訊號(意即,有偵測到第一側邊S1),藉此,控制裝置14能據以判斷待曝光件S的第一側邊S1相對於第一基準線C1位於正確的位置。 As shown in FIG. 6, when the first side S1 of the member to be exposed S is substantially aligned with the first reference line C1, the control device 14 will receive the first type of control signal transmitted from the first detector 151. (meaning that the first side S1 is detected) and the second detection signal transmitted from the first detector 152 (ie, the first side S1 is detected), thereby controlling The device 14 can thereby determine that the first side S1 of the member S to be exposed S is in the correct position with respect to the first reference line C1.

如圖7所示,當控制裝置14接收到兩個第一偵測器151、152所傳遞的兩個第三種偵測訊號(意即,沒有偵測到第一側邊S1或待曝光件S)時,控制裝置14則可據以判斷待曝光件S的第一側邊S1相對於第一基準線C1是向圖中的正Y軸方向偏離設置,如此,可能代表承載平台11上未設置有待曝光件S,或者待曝光件S被設置於承載平台11上完全不正確的位置。 As shown in FIG. 7, when the control device 14 receives the two third detection signals transmitted by the two first detectors 151, 152 (that is, the first side S1 or the to-be-exposure is not detected) In S), the control device 14 can determine that the first side S1 of the member S to be exposed is offset from the first reference line C1 in the positive Y-axis direction of the figure, and thus may represent the carrier platform 11 The member S to be exposed is set, or the member to be exposed S is placed at a position that is completely incorrect on the carrying platform 11.

如圖8所示,當控制裝置14接收到兩個第一偵測器151、152所傳遞的兩個第二種偵測訊號(意即,只偵測到待曝光件S而未偵測到第一側邊S1)時,控制裝置14則可據以判斷待曝光件S的第一側邊S1相對於第一基準線C1是向圖中的負Y軸方向偏離設置。 As shown in FIG. 8, when the control device 14 receives the two second detection signals transmitted by the two first detectors 151, 152 (that is, only the device to be exposed S is detected but not detected) When the first side S1), the control device 14 can determine that the first side S1 of the member S to be exposed is offset from the first reference line C1 in the negative Y-axis direction in the figure.

如圖9所示,當待曝光件S的第一側邊S1與第一基準線C1之間形成有夾角(即待曝光件S相對於承載平台11逆時針旋轉)時,兩個第一偵測器151、152將會傳遞兩個第一種偵測訊號至控制裝置14,如此,控制裝置14將可得知兩個第一偵測器151、152皆偵測到待曝光件S的第一側邊S1,從而可判斷待曝光件S的第一側邊S1相對於第一基準線C1是傾斜地設置,而待曝光件S未 正確地設置於承載平台11。 As shown in FIG. 9, when an angle is formed between the first side S1 of the member S to be exposed and the first reference line C1 (ie, the member S to be exposed is rotated counterclockwise with respect to the carrier platform 11), the two first Detectors The detectors 151, 152 will transmit two first detection signals to the control device 14, so that the control device 14 will know that the two first detectors 151, 152 detect the first to be exposed S One side S1, so that it can be determined that the first side S1 of the member to be exposed S is obliquely disposed with respect to the first reference line C1, and the member to be exposed S is not It is correctly disposed on the carrying platform 11.

需注意的是,上述利用兩個第一偵測器151、152,偵測待曝光件S的第一側邊S1,據以對應傳遞不同種類的偵測訊號至控制裝置14的實施例中,兩個第一偵測器151、152必須是非同時對應位於第一基準線C1上,而兩個第一偵測器151、152可以是其中一個對應位於第一基準線C1上,另一個偏離第一基準線C1設置,或者也可以是兩個第一偵測器151、152分別向第一基準線C1的兩側方向偏離。 It should be noted that the first side detectors 151 and 152 are used to detect the first side S1 of the object to be exposed S, and correspondingly transmit different types of detection signals to the control device 14 in the embodiment. The two first detectors 151, 152 must be non-simultaneously located on the first reference line C1, and the two first detectors 151, 152 may be one corresponding to the first reference line C1, and the other is offset from the first A reference line C1 is disposed, or the two first detectors 151, 152 may be respectively offset toward both sides of the first reference line C1.

如圖2、圖4、圖5及圖13所示,在不同的應用中,第一偵測組件15可以是連接有一第一調整組件17,第一調整組件17能受控制裝置14控制,以對應改變至少一個第一偵測器151、152相對於第一基準線C1的距離,或者第一調整組件17也可以是用來改變兩個第一偵測器151、152於第一基準線C1的方向上的間隔距離D1。 As shown in FIG. 2, FIG. 4, FIG. 5 and FIG. 13, in different applications, the first detecting component 15 may be connected to a first adjusting component 17, and the first adjusting component 17 can be controlled by the control device 14 to Corresponding to changing the distance of the at least one first detector 151, 152 relative to the first reference line C1, or the first adjusting component 17 may also be used to change the two first detectors 151, 152 to the first reference line C1. The distance in the direction of the distance D1.

舉例來說,第一調整組件17可以是包含有兩個連接臂171、173及兩個驅動器172、174。設置於承載平台11的第一偵測器151,可以是與連接臂171相連接,而連接臂171連接驅動器172,驅動器172能受控制裝置14控制,以帶動連接臂171作動,從而使第一偵測器151向第二基準線C2的方向靠近或遠離第一基準線C1。 For example, the first adjustment component 17 can include two connection arms 171, 173 and two drivers 172, 174. The first detector 151 disposed on the carrying platform 11 may be connected to the connecting arm 171, and the connecting arm 171 is connected to the driver 172. The driver 172 can be controlled by the control device 14 to drive the connecting arm 171 to operate, thereby making the first The detector 151 approaches or moves away from the first reference line C1 toward the second reference line C2.

如圖3、圖5及圖14所示,設置於上台框裝置12的第一偵測器152,可以是連接連接臂173,連接臂173與驅動器174連接,而驅動器174能受控制裝置14控制,以透過連接臂173帶動第一偵測器152向承載平台11的方向移動。 As shown in FIG. 3, FIG. 5 and FIG. 14, the first detector 152 disposed on the upper frame device 12 may be a connection connecting arm 173, and the connecting arm 173 is connected to the driver 174, and the driver 174 can be controlled by the control device 14. The first detector 152 is moved in the direction of the carrying platform 11 through the connecting arm 173.

另外,第一調整組件17還可以是包含有一滑塊175、一滑軌176及一限位構件177。設置於上台框裝置12的第一偵測器152還可以是與滑塊175相連接,而滑塊175是可滑動地設置於滑軌176上,滑軌176則是對應固定設置於上台框裝置12,且滑塊175 與滑軌176還可以是連接有限位構件177,使用者可以是透過操作限位構件177,以使滑塊175無法相對於滑軌176移動。滑軌176可以是沿第一基準線C1設置,而使用者可以是透過人力或是電子控制的方式,控制滑塊175沿滑軌176移動,據以使第一偵測器151沿第一基準線C1的方向移動,而當使用者使第一偵測器151移動至所需的位置後,使用者則可以是利用人力或是電子控制的方式,操作限位構件177以使滑塊175與滑軌176相互固定,藉此使滑塊175無法再相對於滑軌176移動。當然,所述滑塊175、滑軌176及限位構件177也可以是應用於設置在承載平台11的第一偵測器151。 In addition, the first adjusting component 17 can also include a slider 175, a sliding rail 176 and a limiting member 177. The first detector 152 disposed on the upper frame device 12 may also be connected to the slider 175, and the slider 175 is slidably disposed on the slide rail 176, and the slide rail 176 is correspondingly fixedly disposed on the upper frame device. 12, and slider 175 The slide rail 176 can also be coupled to the limit member 177, which can be operated by the user to prevent the slider 175 from moving relative to the slide rail 176. The slide rail 176 may be disposed along the first reference line C1, and the user may control the slider 175 to move along the slide rail 176 by manual or electronic control, so that the first detector 151 is along the first reference. The direction of the line C1 is moved, and after the user moves the first detector 151 to the desired position, the user can manually or electronically control the limiting member 177 to cause the slider 175 to The slide rails 176 are fixed to each other, whereby the slider 175 can no longer be moved relative to the slide rails 176. Of course, the slider 175, the slide rail 176, and the limiting member 177 may also be applied to the first detector 151 disposed on the carrying platform 11.

請一併參閱圖3、圖4、圖5及圖15,兩個第二偵測器161、162可以是設置於上台框裝置12,而兩個第二偵測器161、162能用來偵測待曝光件S的第二側邊S2相對於承載平台11的一第二基準線C2的位置。其中,所述第二側邊S2與前述的第一側邊S1相互垂直,所述第二基準線C2與前述的第一基準線C1相互垂直。 Referring to FIG. 3, FIG. 4, FIG. 5 and FIG. 15, the two second detectors 161, 162 may be disposed on the upper frame device 12, and the two second detectors 161, 162 can be used to detect The position of the second side S2 of the exposure member S relative to a second reference line C2 of the carrying platform 11 is measured. The second side S2 and the first side S1 are perpendicular to each other, and the second reference line C2 and the first reference line C1 are perpendicular to each other.

關於兩個第二偵測器161、162的實際作動方式,與前述兩個第一偵測器151、152大致相同,兩者差異僅在於兩個第一偵測器151、152是用來偵測待曝光件S的第一側邊S1相對於第一基準線C1的位置,而兩個第二偵測器161、162則是用來偵測待曝光件S的第二側邊S2相對於第二基準線C2的位置,是以,以下僅說明關於第二偵測器161、162中需特別強調的部分,其餘未詳細說明的部分,請參閱前述對於第一偵測器151、152的說明。 The actual operation manners of the two second detectors 161 and 162 are substantially the same as the two first detectors 151 and 152, and the difference is only that the two first detectors 151 and 152 are used for detecting The position of the first side S1 of the exposure member S relative to the first reference line C1 is measured, and the two second detectors 161 and 162 are used to detect the second side S2 of the member S to be exposed relative to The position of the second reference line C2 is as follows. Only the parts that need to be particularly emphasized in the second detectors 161 and 162 will be described below. For the remaining parts that are not described in detail, refer to the foregoing for the first detectors 151 and 152. Description.

如圖3、圖5及圖15所示,兩個第二偵測器161、162可以是一併設置於上台框裝置12,且兩個第二偵測器161、162是大致鄰近於第二基準線C2設置。在實際應用中,關於第二偵測組件16的兩個第二偵測器161、162相對於第二基準線C2的設置位置,可以是依據需求設計,舉例來說,兩個第二偵測器161、162可以是於第一基準線C1的方向的間距D2不大於0.5厘米,又或者, 其中一個第二偵測器161、162可以是對應位於第二基準線C2上,而另一第二偵測器161、162於第一基準線C1的方向與第二基準線C2的距離是不大於0.5厘米。 As shown in FIG. 3, FIG. 5 and FIG. 15, the two second detectors 161, 162 may be disposed together with the upper frame device 12, and the two second detectors 161, 162 are substantially adjacent to the second. Baseline C2 is set. In a practical application, the positions of the two second detectors 161 and 162 of the second detecting component 16 relative to the second reference line C2 may be designed according to requirements, for example, two second detections. The 161, 162 may be at a distance D2 of not more than 0.5 cm in the direction of the first reference line C1, or One of the second detectors 161, 162 may be correspondingly located on the second reference line C2, and the distance of the other second detectors 161, 162 in the direction of the first reference line C1 from the second reference line C2 is not More than 0.5 cm.

在實際應用中,兩個第二偵測器161、162可以是分別獨立地電性連接控制裝置14,而控制裝置14依據兩個第二偵測器161、162所傳遞的兩個第二偵測訊號,據以判斷待曝光件S的第二側邊S2相對於第二基準線C2的一第二偏差量。 In practical applications, the two second detectors 161, 162 can be electrically connected to the control device 14 independently, and the control device 14 transmits the second second detection according to the two second detectors 161, 162. The test signal is used to determine a second deviation amount of the second side S2 of the member S to be exposed relative to the second reference line C2.

如圖3、圖4、圖5及圖15所示,在不同的應用中,第二偵測組件16可以是連接有一第二調整組件18,第二調整組件18能受控制裝置14控制,以對應改變至少一個第二偵測器161、162相對於第二基準線C2的距離,或者第二調整組件18也可以是用來改變兩個第二偵測器161、162於第二基準線C2的方向上的間隔距離D2。 As shown in FIG. 3, FIG. 4, FIG. 5 and FIG. 15, in different applications, the second detecting component 16 can be connected to a second adjusting component 18, and the second adjusting component 18 can be controlled by the control device 14 to Corresponding to changing the distance of the at least one second detector 161, 162 relative to the second reference line C2, or the second adjusting component 18 may also be used to change the two second detectors 161, 162 to the second reference line C2. The distance in the direction of the distance D2.

舉例來說,如圖2、圖3及圖15所示,第二調整組件18可以是包含有一連接臂181及一驅動器182。設置於上台框裝置12的第二偵測器161、162與連接臂181相連接,而連接臂181連接驅動器182,驅動器182能受控制裝置14控制,以帶動連接臂181作動,從而使第二偵測器161、162沿第一基準線C1的方向靠近或遠離第二基準線C2。 For example, as shown in FIG. 2, FIG. 3 and FIG. 15, the second adjusting component 18 can include a connecting arm 181 and a driver 182. The second detectors 161 and 162 disposed on the upper frame device 12 are connected to the connecting arm 181, and the connecting arm 181 is connected to the driver 182. The driver 182 can be controlled by the control device 14 to drive the connecting arm 181 to operate, thereby making the second The detectors 161, 162 are closer to or away from the second reference line C2 in the direction of the first reference line C1.

於本實施例中,是以兩個第二偵測器161、162設置於一連動板Q,而連接板Q與連接臂181相連接,而驅動器182能通過連接臂181及連接板Q同時調整兩個第二偵測器161、162相對於第二基準線C2的位置,但不以此為限。在不同的實施中,兩個第二偵測器161、162也可以是分別獨立地連接不同的連接臂及驅動器,於此不加以限制。 In this embodiment, the two second detectors 161, 162 are disposed on a linkage plate Q, and the connection plate Q is connected to the connection arm 181, and the driver 182 can be simultaneously adjusted through the connection arm 181 and the connection plate Q. The position of the two second detectors 161, 162 relative to the second reference line C2, but not limited thereto. In different implementations, the two second detectors 161 and 162 may also independently connect different connecting arms and drivers, which are not limited herein.

另外,第二調整組件18還可以是包含有一滑塊183、一滑軌184及一限位構件185。設置於上台框裝置12的第二偵測器161、162可以是與滑塊183相連接,而滑塊183是可滑動地設置於滑軌 184上,滑軌184則是對應固定設置於上台框裝置12,且滑塊183與滑軌184之間設置有限位構件185,使用者可以是透過操作限位構件185,以使滑塊183無法相對於滑軌184移動。滑軌184可以是沿第二基準線C2設置,而使用者可以是透過人力或是電子控制的方式,控制滑塊183沿滑軌184移動,據以使第二偵測器161、162沿第二基準線C2的方向移動,而當使用者使第二偵測器161、162移動至所需的位置後,使用者則可以是利用人力或是電子控制的方式,操作限位構件185以固定滑塊183,而使滑塊183無法再相對於滑軌184移動。 In addition, the second adjusting component 18 can also include a slider 183, a slide rail 184, and a limiting member 185. The second detectors 161, 162 disposed on the upper frame device 12 may be connected to the slider 183, and the slider 183 is slidably disposed on the slide rails. 184, the slide rail 184 is correspondingly fixedly disposed on the upper frame device 12, and a limiting member 185 is disposed between the slider 183 and the slide rail 184, and the user can pass the operation limiting member 185 so that the slider 183 cannot be Moving relative to the slide rail 184. The slide rails 184 may be disposed along the second reference line C2, and the user may control the slider 183 to move along the slide rails 184 by manual or electronic control, so that the second detectors 161, 162 are along the first The direction of the second reference line C2 is moved, and after the user moves the second detectors 161, 162 to the desired position, the user can operate the limiting member 185 to fix by manual or electronic control. The slider 183 prevents the slider 183 from moving relative to the slide rail 184.

各個第二偵測器161、162相對於第二基準線C2的設置位置,可以是依據第二偵測器161、162的偵測方式不同及待曝光件S的尺寸的不同而有所不同。於以下說明中,是以待曝光件S的尺寸明顯較曝光面111的尺寸小為例進行說明,但不以此為限。在待曝光件S的尺寸大致等於曝光面111的大小時,兩個第二偵測器161、162則可以是不透過第二調整組件18進行調整,而兩個第二偵測器161、162可以是用來偵測待曝光件S的第二側邊S2相對於第二基準線C2的位置。換言之,於以下說明中,是以兩個第二偵測器161、162是先經過第二調整組件18調整後,才對待曝光件S的第二側邊S2相對於平行於第二基準線C2的一輔助基準線C21的位置進行偵測。 The position of each of the second detectors 161 and 162 relative to the second reference line C2 may be different according to the detection manner of the second detectors 161 and 162 and the size of the member to be exposed S. In the following description, the size of the member to be exposed S is significantly smaller than the size of the exposed surface 111, but is not limited thereto. When the size of the member to be exposed S is substantially equal to the size of the exposure surface 111, the two second detectors 161, 162 may not be adjusted by the second adjustment component 18, and the two second detectors 161, 162 It may be used to detect the position of the second side S2 of the member S to be exposed relative to the second reference line C2. In other words, in the following description, the second side S2 of the exposure member S is treated relative to the second reference line C2 after the two second detectors 161, 162 are first adjusted by the second adjustment unit 18. The position of an auxiliary reference line C21 is detected.

具體來說,請一併參閱圖6、圖10至圖12,各第二偵測器161(162)可以是在偵測到待曝光件S的第二側邊S2,即,各第二偵測器161(162)的部分被待曝光件S遮蔽時,向控制裝置14傳遞第一種偵測訊號,而各第二偵測器161(162)完全被待曝光件S遮蔽時,則可以是向控制裝置14發出第二種偵測訊號,當第二偵測器161(162)完全未被待曝光件S遮蔽時,則可以是向控制裝置14傳遞第三種偵測訊號。 Specifically, please refer to FIG. 6 and FIG. 10 to FIG. 12, each second detector 161 (162) may be detecting the second side S2 of the member S to be exposed, that is, each second Detector. When the portion of the detector 161 (162) is shielded by the object to be exposed S, the first type of detection signal is transmitted to the control device 14, and when the second detectors 161 (162) are completely obscured by the member to be exposed S, The second detection signal is sent to the control device 14. When the second detector 161 (162) is completely unmasked by the exposure device S, the third detection signal may be transmitted to the control device 14.

如圖6所示,當待曝光件S的第二側邊S2大致與第二基準線 C2平行設置時,控制裝置14將可接收到來自第二偵測器161所傳遞的第一種控制訊號(意即,有偵測到第二側邊S2),及來自第二偵測器162所傳遞的第三種偵測訊號(意即,沒有偵測到第二側邊S2且沒有偵測到待曝光件S),藉此,控制裝置14能據以判斷待曝光件S的第二側邊S2相對於第二基準線C2位於正確的位置。 As shown in FIG. 6, when the second side S2 of the member S to be exposed is substantially parallel to the second reference line When C2 is set in parallel, the control device 14 will receive the first type of control signal transmitted from the second detector 161 (ie, the second side S2 is detected), and the second detector 162. The third detection signal transmitted (that is, the second side S2 is not detected and the item S to be exposed is not detected), whereby the control device 14 can determine the second item to be exposed S The side S2 is at the correct position with respect to the second reference line C2.

如圖10所示,當控制裝置14接收到兩個第二偵測器161、162所傳遞的兩個第三種偵測訊號(意即,沒有偵測到第二側邊S2且沒有偵測到待曝光件S)時,控制裝置14則可據以判斷待曝光件S的第二側邊S2相對於第二基準線C2是向圖中的正X軸方向偏離設置,如此,可能代表承載平台11上未設置有待曝光件S,或者待曝光件S被設置於承載平台11上完全不正確的位置。 As shown in FIG. 10, when the control device 14 receives the two third detection signals transmitted by the two second detectors 161, 162 (that is, the second side S2 is not detected and is not detected. When the device S) is to be exposed, the control device 14 can determine that the second side S2 of the member S to be exposed is offset from the second reference line C2 in the positive X-axis direction of the figure, and thus may represent the bearing. The item S to be exposed is not provided on the stage 11, or the item S to be exposed is placed at a completely incorrect position on the carrying platform 11.

如圖11所示,當控制裝置14接收到兩個第二偵測器161、162所傳遞的兩個第二種偵測訊號(意即,只偵測到待曝光件S而未偵測到第二側邊S2)時,控制裝置14則可據以判斷待曝光件S的第二側邊S2相對於第二基準線C2是向圖中的負Y軸方向偏離設置。 As shown in FIG. 11, when the control device 14 receives the two second detection signals transmitted by the two second detectors 161, 162 (that is, only the component S to be exposed is detected but not detected) When the second side S2), the control device 14 can determine that the second side S2 of the member S to be exposed is offset from the second reference line C2 in the negative Y-axis direction in the figure.

如圖12所示,當待曝光件S的第二側邊S2與第二基準線C2之間形成有夾角(即待曝光件S相對於承載平台11順時針旋轉)時,兩個第二偵測器161、162將會傳遞兩個第二種偵測訊號至控制裝置14,如此,控制裝置14將可得知兩個第二偵測器161、162皆偵測到待曝光件S的第二側邊S2,從而可判斷待曝光件S的第二側邊S2相對於第二基準線C2是傾斜地設置,而待曝光件S未正確地設置於承載平台11。 As shown in FIG. 12, when an angle is formed between the second side S2 of the member S to be exposed and the second reference line C2 (ie, the member S to be exposed is rotated clockwise with respect to the carrier platform 11), the two second Detectors The detectors 161, 162 will transmit two second detection signals to the control device 14, so that the control device 14 will know that the two second detectors 161, 162 detect the first to be exposed S The two sides S2, so that the second side S2 of the member S to be exposed S is obliquely disposed with respect to the second reference line C2, and the member to be exposed S is not correctly disposed on the carrying platform 11.

需注意的是,上述利用兩個第二偵測器161、162,偵測待曝光件S的第二側邊S2,據以對應傳遞不同種類的偵測訊號至控制裝置14的實施例中,兩個第二偵測器161、162必須是非同時對應位於第二基準線C2上,而兩個第二偵測器161、162可以是其中一個對應位於第二基準線C2上,另一個偏離第二基準線C2設置,或者也可以是兩個第二偵測器161、162分別向第二基準線C2 的兩側方向偏離。 It should be noted that, by using the two second detectors 161 and 162, the second side S2 of the to-be-exposed component S is detected, and correspondingly transmitting different types of detection signals to the control device 14, The two second detectors 161, 162 must be non-simultaneously located on the second reference line C2, and the two second detectors 161, 162 may be one corresponding to the second reference line C2, and the other is offset. Two reference lines C2 are set, or two second detectors 161 and 162 may be respectively connected to the second reference line C2. The directions on both sides are deviated.

綜上所述,本發明的防板偏檢知設計1,利用兩個第一偵測器151、152及兩個第二偵測器161、162配合控制裝置14,將可偵測待曝光件S設置於承載平台11上時,是呈現為如圖6的正確放置狀態、如圖7所呈現的向圖中座標系的正Y軸方向偏移的放置狀態、如圖8所呈現的向圖中座標系的負Y軸方向偏移的放置狀態、如圖9所呈現的逆時針偏轉的放置狀態、如圖10所呈現的向圖中座標系的正X軸方向偏移的放置狀態、如圖11所呈現的向圖中座標系的負X軸方向偏移的放置狀態,或是如圖12所呈現的逆時針偏轉的放置狀態,從而控制裝置14能依據上述不同的狀態,在待曝光件S正確地設置於承載平台11上時,對應控制曝光裝置13以對待曝光件S進行曝光作業;相對地,控制裝置14判斷待曝光件S呈現為圖7至圖12中的任一狀態時,控制裝置14則可以是控制警示裝置,以提醒相關使用者待曝光件S未正確地設置於承載平台11,當然,在實際應用中,控制裝置14在判斷待曝光件S未正確地設置於承載平台11時,控制裝置14還可以是控制相關載運裝置(例如具有吸盤的機械手臂等),以調整待曝光件S相對於承載平台11的位置,或者重新置放待曝光件S。 In summary, the anti-plate bias detection design of the present invention uses two first detectors 151, 152 and two second detectors 161, 162 in conjunction with the control device 14, which can detect the to-be-exposed parts. When S is disposed on the carrier platform 11, it is presented in the correct placement state as shown in FIG. 6, and the placement state as shown in FIG. 7 offset from the positive Y-axis direction of the coordinate system in the figure, as shown in FIG. The placement state of the negative coordinate Y-axis direction of the middle coordinate system, the placement state of the counterclockwise deflection as shown in FIG. 9, and the placement state shifted to the positive X-axis direction of the coordinate system in the figure as shown in FIG. 10, such as Figure 11 shows the state of placement in the negative X-axis direction of the coordinate system in the figure, or the state of counter-clockwise deflection as shown in Figure 12, so that the control device 14 can be exposed according to the different states described above. When the member S is correctly disposed on the carrying platform 11, the exposure device 13 is correspondingly controlled to perform an exposure operation on the object to be exposed S; in contrast, the control device 14 determines that the member to be exposed S is presented in any of the states of FIGS. 7 to 12. The control device 14 can be a control alert device to remind the relevant use The device to be exposed S is not correctly disposed on the carrying platform 11. Of course, in the actual application, when the control device 14 determines that the member to be exposed S is not correctly disposed on the carrying platform 11, the control device 14 may also be a control related carrier device ( For example, a robot arm having a suction cup, etc., to adjust the position of the member S to be exposed relative to the carrying platform 11, or to reposition the member to be exposed S.

如上所載,本發明的防板偏檢知設計1可以在對待曝光件S進行曝光作業前,先對待曝光件S進行位置檢測,從而可大幅降低待曝光件S因為放置位置不正確,而導致發生曝光後無法使用的問題。 As described above, the anti-plate bias detection design 1 of the present invention can perform position detection on the exposure member S before performing the exposure operation on the exposure member S, thereby greatly reducing the position to be exposed S due to incorrect placement. A problem that cannot be used after exposure occurs.

以上所述僅為本發明的較佳可行實施例,非因此侷限本發明的專利範圍,故舉凡運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的保護範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Therefore, equivalent technical changes made by using the present specification and the contents of the drawings are included in the protection scope of the present invention. .

Claims (10)

一種防板偏檢知設計,其用以對一待曝光件進行曝光,所述防板偏檢知設計包含:一機台本體,其設置有一曝光裝置,所述曝光裝置用以對所述待曝光件進行曝光;一承載平台,其設置於所述機台本體,所述承載平台具有一曝光面,所述曝光面用以承載所述待曝光件,所述曝光面彼此相互垂直的兩側邊分別定義為一第一基準線及一第二基準線;所述曝光裝置所產生的曝光光束能通過所述曝光面而照射於所述待曝光件;一第一偵測組件,其包含有兩個一第一偵測器,其用以偵測設置於所述曝光面上的所述待曝光件的一第一側邊相對於所述第一基準線的位置;一第二偵測組件,其包含有兩個一第二偵測器,其用以偵測設置於所述曝光面上的所述待曝光件的一第二側邊相對於所述第二基準線的位置;其中,所述第一側邊垂直於所述第二側邊;一控制裝置,其電性連接所述第一偵測組件及所述第二偵測組件,所述控制裝置能依據兩個所述第一偵測器偵測所述待曝光件的所述第一側邊相對於所述第一基準線的位置的結果,及兩個所述第二偵測器偵測所述待曝光件的所述第二側邊相對於所述第二基準線的位置的結果,以在所述待曝光件未正確地設置於所述曝光面上時,控制一警示裝置作動;所述控制裝置能依據兩個所述第一偵測器偵測所述待曝光件的所述第一側邊相對於所述第一基準線的位置的結果,及兩個所述第二偵測器偵測所述待曝光件的所述第二側邊相對於所述第二基準線的位置的結果,在所述 待曝光件正確地設置於所述曝光面上時,控制所述曝光裝置作動,以對所述待曝光件進行曝光作業。 An anti-plate bias detection design for exposing an object to be exposed, the anti-plate bias detection design comprising: a machine body, which is provided with an exposure device, and the exposure device is configured to The exposure member is exposed; a carrying platform is disposed on the machine body, the carrying platform has an exposure surface, the exposure surface is used to carry the object to be exposed, and the two sides of the exposure surface are perpendicular to each other The sides are respectively defined as a first reference line and a second reference line; the exposure beam generated by the exposure device can be irradiated to the object to be exposed through the exposure surface; a first detecting component including Two first detectors for detecting a position of a first side of the object to be exposed disposed on the exposure surface relative to the first reference line; a second detecting component The second detector is configured to detect a position of a second side of the object to be exposed disposed on the exposure surface relative to the second reference line; The first side is perpendicular to the second side; a control device The first detection component and the second detection component are electrically connected to the first detection component, and the control device can detect the first side of the to-be-exposed component relative to the two first detectors. As a result of the position of the first reference line, and the results of the two second detectors detecting the position of the second side of the member to be exposed relative to the second reference line, Controlling an alarm device to act when the object to be exposed is not correctly disposed on the exposure surface; the control device is capable of detecting the first portion of the object to be exposed according to the two first detectors As a result of the position of one side relative to the first reference line, and the two second detectors detect the position of the second side of the member to be exposed relative to the second reference line Result in the stated When the object to be exposed is correctly disposed on the exposure surface, the exposure device is controlled to perform an exposure operation on the object to be exposed. 如請求項1所述的防板偏檢知設計,其中,所述第一偵測組件的兩個所述第一偵測器於所述第二基準線的方向的間距不大於0.5厘米。 The anti-plate bias detection design of claim 1, wherein the distance between the two first detectors of the first detecting component in the direction of the second reference line is not more than 0.5 cm. 如請求項1所述的防板偏檢知設計,其中,所述第二偵測組件的兩個所述第二偵測器於所述第一基準線的方向的間距不大於0.5厘米。 The anti-plate bias detection design of claim 1, wherein the distance between the two second detectors of the second detecting component in the direction of the first reference line is not more than 0.5 cm. 如請求項1所述的防板偏檢知設計,其中,所述第一偵測組件的兩個所述第一偵測器能分別偵測設置於所述曝光面上的所述待曝光件的所述第一側邊,並對應產生兩個第一偵測訊號,而所述控制裝置能依據兩個所述第一偵測訊號,據以判斷所述待曝光件的所述第一側邊相對於所述第一基準線的一第一偏差量。 The anti-plate bias detection design of claim 1, wherein the two first detectors of the first detecting component can respectively detect the to-be-exposed component disposed on the exposure surface The first side of the first detection signal is generated correspondingly, and the control device can determine the first side of the object to be exposed according to the two first detection signals. a first amount of deviation of the edge relative to the first reference line. 如請求項1所述的防板偏檢知設計,其中,所述第二偵測組件的兩個所述第二偵測器能分別偵測設置於所述曝光面上的所述待曝光件的所述第二側邊,並對應產生兩個第二偵測訊號,而所述控制裝置能依據兩個所述第二偵測訊號,據以判斷所述待曝光件的所述第二側邊相對於所述第二基準線的一第二偏差量。 The anti-plate bias detection design of claim 1, wherein the two second detectors of the second detecting component are respectively capable of detecting the to-be-exposed component disposed on the exposure surface The second side of the second detection signal is generated correspondingly, and the control device can determine the second side of the to-be-exposed component according to the two second detection signals. a second amount of deviation of the edge relative to the second reference line. 如請求項1所述的防板偏檢知設計,其中,所述防板偏檢知設計還包含有一上台框裝置,其設置於所述機台本體,且所述上台框裝置對應位於所述承載平台的上方,所述上台框裝置能受所述控制裝置控制,以抵靠於所述承載平台具有所述曝光面的一側;兩個所述第一偵測器分別設置於所述承載平台及所述上台框裝置。 The anti-plate bias detection design according to claim 1, wherein the anti-plate bias detection design further includes an upper frame device disposed on the machine body, and the upper frame device is correspondingly located in the Above the carrying platform, the upper frame device can be controlled by the control device to abut the side of the carrying platform having the exposed surface; two of the first detectors are respectively disposed on the carrying a platform and the upper frame device. 如請求項6所述的防板偏檢知設計,其中,設置於所述承載平台的所述第一偵測器,能用以偵測所述承載平台上是否設置有所述待曝光件;當所述控制裝置依據設置於所述承載平台的所述第一偵測器所偵測的結果,判斷所述承載平台未設置有所述待曝光件時,所述控制裝置將對應控制所述警示裝置作動。 The anti-plate bias detection design according to claim 6, wherein the first detector disposed on the carrying platform can be used to detect whether the to-be-exposed component is disposed on the carrying platform; When the control device determines that the carrying platform is not provided with the to-be-exposed component according to the result detected by the first detector disposed on the carrying platform, the control device controls the corresponding control The warning device is activated. 如請求項1所述的防板偏檢知設計,其中,所述第一偵測組件連接有一第一調整組件,所述第一調整組件能受所述控制裝置控制,以對應改變至少一個所述第一偵測器相對於所述第一基準線的距離。 The anti-plate bias detection design of claim 1, wherein the first detecting component is coupled to a first adjusting component, and the first adjusting component is controllable by the control device to correspondingly change at least one The distance of the first detector relative to the first reference line. 如請求項1所述的防板偏檢知設計,其中,所述第二偵測組件連接有一第二調整組件,所述第二調整組件能受所述控制裝置控制,以對應改變至少一個所述第二偵測器相對於所述第二基準線的距離;通過所述第二調整組件調整後的兩個所述第二偵測組件,能用以偵測所述待曝光件的第二側邊相對於平行於所述第二基準線的一輔助基準線的位置。 The anti-plate bias detection design of claim 1, wherein the second detecting component is coupled to a second adjusting component, and the second adjusting component is controllable by the control device to correspondingly change at least one The distance between the second detector and the second reference line; the two second detecting components that are adjusted by the second adjusting component can be used to detect the second component to be exposed. The position of the side edge relative to an auxiliary reference line parallel to the second reference line. 如請求項1所述的防板偏檢知設計,其中,其中一個所述第一偵測器對應位於所述第一基準線上,另一個所述第一偵測器向所述第二基準線的方向偏離所述第一基準線的距離不大於0.5厘米;其中一個所述第二偵測器對應位於所述第二基準線上,另一個所述第二偵測器向所述第一基準線的方向偏離所述第二基準線的距離不大於0.5厘米。 The anti-plate bias detection design of claim 1, wherein one of the first detectors is corresponding to the first reference line, and the other of the first detectors is to the second reference line. The direction of the deviation from the first reference line is not more than 0.5 cm; one of the second detectors is correspondingly located on the second reference line, and the other of the second detectors is directed to the first reference line The direction of the deviation from the second reference line is no more than 0.5 cm.
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