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TWI633558B - Operating method of resistive memory storage apparatus - Google Patents

Operating method of resistive memory storage apparatus Download PDF

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Publication number
TWI633558B
TWI633558B TW106131660A TW106131660A TWI633558B TW I633558 B TWI633558 B TW I633558B TW 106131660 A TW106131660 A TW 106131660A TW 106131660 A TW106131660 A TW 106131660A TW I633558 B TWI633558 B TW I633558B
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resistive memory
memory device
heating step
operating
resistive
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TW106131660A
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TW201916011A (en
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林立偉
蔡宗寰
紀舜 林
小峰 林
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華邦電子股份有限公司
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Abstract

一種電阻式記憶體元件的操作方法,包括:對電阻式記憶體元件執行加熱步驟;在加熱步驟之後,對電阻式記憶體元件執行設定及重置循環操作,以增加電阻式記憶體元件的讀取邊界;以及判斷電阻式記憶體元件是否通過讀取邊界驗證。A method of operating a resistive memory device, comprising: performing a heating step on a resistive memory device; and performing a setting and resetting cycle operation on the resistive memory device after the heating step to increase reading of the resistive memory component Take the boundary; and determine whether the resistive memory component is verified by reading the boundary.

Description

電阻式記憶體元件的操作方法Method of operating a resistive memory element

本發明是有關於一種記憶體元件的操作方法,且特別是有關於一種電阻式記憶體元件的操作方法。The present invention relates to a method of operating a memory device, and more particularly to a method of operating a resistive memory device.

近年來電阻式記憶體(諸如電阻式隨機存取記憶體(Resistive Random Access Memory,RRAM))的發展極為快速,是目前最受矚目之未來記憶體的結構。由於電阻式記憶體具備低功耗、高速運作、高密度以及相容於互補式金屬氧化物半導體製程技術之潛在優勢,因此非常適合作為下一世代之非揮發性記憶體元件。In recent years, resistive memory (such as Resistive Random Access Memory (RRAM)) has developed extremely rapidly and is currently the most attractive structure of future memory. Resistive memory is a low-power, high-speed operation, high-density, and compatible with complementary metal oxide semiconductor process technology, making it ideal for the next generation of non-volatile memory components.

現行的電阻式記憶體通常包括相對配置的上電極與下電極以及位於上電極與下電極之間的介電層。在現行的電阻式記憶體可反覆地在高低電阻狀態間切換以記憶資料前,首先需進行通道形成(forming)的程序。形成的程序包括對電阻式記憶體施加一偏壓,例如正偏壓,使電流從上電極流至下電極,使得介電層中產生氧空缺(oxygen vacancy)和氧離子(oxygen ion)而形成電流路徑,使電阻式記憶體自高阻態(high resistance state,HRS)變為低阻態(low resistance state,LRS),以形成導電燈絲(filament)。通常,在所形成的燈絲中,鄰近上電極處的部分的直徑會小於鄰近下電極處的部分的直徑。之後,可對電阻式記憶體進行重置(reset)或設定(set),使電阻式記憶體分別切換為高阻態與低阻態,以完成資料的記憶。此外,當對現行的電阻式記憶體進行重置時,包括對電阻式記憶體施加與設定時極性相反的反向偏壓,使電流從下電極流至上電極。此時,鄰近上電極處的氧空缺與部份氧離子結合而中斷電流路徑,使得燈絲在鄰近上電極處斷開。當對現行的電阻式記憶體進行設定時,包括可對電阻式記憶體施加與燈絲成形的程序時極性相同的偏壓,使電流從上電極流至下電極。此時,鄰近上電極處的氧離子脫離,重新形成氧空缺,使得燈絲在鄰近上電極處重新形成。Current resistive memories typically include opposing upper and lower electrodes and a dielectric layer between the upper and lower electrodes. Before the current resistive memory can be repeatedly switched between high and low resistance states to memorize data, the process of channel formation is first required. The process of forming includes applying a bias voltage to the resistive memory, such as a positive bias, to cause current to flow from the upper electrode to the lower electrode, such that oxygen vacancy and oxygen ion are formed in the dielectric layer. The current path changes the resistive memory from a high resistance state (HRS) to a low resistance state (LRS) to form a conductive filament. Generally, in the formed filament, the diameter of the portion adjacent to the upper electrode may be smaller than the diameter of the portion adjacent to the lower electrode. After that, the resistive memory can be reset or set, so that the resistive memory is switched to the high-resistance state and the low-resistance state, respectively, to complete the memory of the data. In addition, when the current resistive memory is reset, a reverse bias having a polarity opposite to that set at the resistive memory is applied to cause current to flow from the lower electrode to the upper electrode. At this time, the oxygen vacancy adjacent to the upper electrode combines with a portion of the oxygen ions to interrupt the current path, causing the filament to be disconnected adjacent to the upper electrode. When the current resistive memory is set, a bias having the same polarity as that of the filament forming process can be applied to the resistive memory to cause current to flow from the upper electrode to the lower electrode. At this time, oxygen ions adjacent to the upper electrode are detached, and oxygen vacancies are newly formed, so that the filament is reformed adjacent to the upper electrode.

然而,在現有技術中,若電阻式記憶體經過加熱步驟通常會降低其讀取邊界,從而造成無法正確判斷電阻式記憶體的邏輯狀態。因此,如何增加電阻式記憶體的讀取邊界為目前的重要課題之一。However, in the prior art, if the resistive memory is subjected to a heating step, the read boundary is usually lowered, and the logic state of the resistive memory cannot be correctly judged. Therefore, how to increase the read boundary of resistive memory is one of the important topics at present.

本發明提供一種電阻式記憶體元件的操作方法,可增加電阻式記憶體元件的讀取邊界。The present invention provides a method of operating a resistive memory device that increases the read boundary of a resistive memory device.

本發明的電阻式記憶體元件的操作方法包括:對電阻式記憶體元件執行加熱步驟;對電阻式記憶體元件執行設定及重置循環操作,以增加電阻式記憶體元件的讀取邊界;以及判斷電阻式記憶體元件是否通過讀取邊界驗證。設定及重置循環操作在加熱步驟之後執行。The method of operating a resistive memory device of the present invention includes: performing a heating step on the resistive memory device; performing a set and reset cycle operation on the resistive memory device to increase a read boundary of the resistive memory device; Determine if the resistive memory component is verified by reading the boundary. The set and reset cycle operations are performed after the heating step.

在一實施例中,在對電阻式記憶體元件執行設定及重置循環操作的步驟之後,所述電阻式記憶體元件的操作方法更包括:若電阻式記憶體元件通過讀取邊界驗證,結束設定及重置循環操作;以及若電阻式記憶體元件不通過讀取邊界驗證,重複對電阻式記憶體元件執行設定及重置循環操作的步驟直到電阻式記憶體元件通過讀取邊界驗證,或者直到一預設次數。In one embodiment, after the step of performing a set and reset cycle operation on the resistive memory element, the method of operating the resistive memory element further comprises: if the resistive memory element is verified by reading the boundary, ending Setting and resetting the loop operation; and repeating the steps of performing the set and reset loop operations on the resistive memory element until the resistive memory element does not pass the read boundary verification, or until the resistive memory element is verified by the read boundary, or Until a preset number of times.

在一實施例中,上述的電阻式記憶體元件的操作方法更包括對電阻式記憶體元件執行形成程序以及初始重置程序。形成程序包括加熱步驟。設定及重置循環操作在形成程序以及初始重置程序結束之後執行。In an embodiment, the method of operating the resistive memory device further includes performing a forming process and an initial resetting process on the resistive memory device. The forming process includes a heating step. The set and reset loop operations are executed after the formation procedure and the initial reset procedure are completed.

在一實施例中,上述的電阻式記憶體元件的操作方法更包括安裝電阻式記憶體元件於電路板上。安裝步驟包括加熱步驟。設定及重置循環操作用以程式化及抹除電阻式記憶體元件。In one embodiment, the method of operating the resistive memory device further includes mounting a resistive memory device on the circuit board. The installation step includes a heating step. Set and reset loop operations to program and erase resistive memory components.

本發明的電阻式記憶體元件的操作方法包括:對電阻式記憶體元件執行刷新操作;依據電阻式記憶體元件是否經過加熱步驟,來決定是否對電阻式記憶體元件執行程式化及抹除循環操作,以增加電阻式記憶體元件的讀取邊界;以及判斷電阻式記憶體元件是否通過讀取邊界驗證。程式化及抹除循環操作在刷新操作之後執行。The method for operating a resistive memory device of the present invention comprises: performing a refresh operation on the resistive memory device; and determining whether to perform a stylization and erasing cycle on the resistive memory device according to whether the resistive memory device is subjected to a heating step. Operation to increase the read boundary of the resistive memory element; and to determine if the resistive memory element is verified by read boundary. Stylized and erase loop operations are performed after the refresh operation.

在一實施例中,上述的電阻式記憶體元件的操作方法更包括:判斷電阻式記憶體元件是否經過加熱步驟;若電阻式記憶體元件經過加熱步驟,在刷新操作之後,對電阻式記憶體元件執行程式化及抹除循環操作;以及若電阻式記憶體元件沒有經過加熱步驟,結束電阻式記憶體元件的操作方法。In one embodiment, the method for operating the resistive memory device further includes: determining whether the resistive memory device has undergone a heating step; and if the resistive memory device is subjected to the heating step, after the refreshing operation, the resistive memory The component performs stylization and erase cycle operations; and if the resistive memory component is not subjected to a heating step, the method of operating the resistive memory component is terminated.

在一實施例中,上述的電阻式記憶體元件包括第一晶胞陣列以及第二晶胞陣列。所述電阻式記憶體元件的操作方法更包括對第一晶胞陣列施加弱設定電壓,以使第一晶胞陣列的多個記憶體晶胞從第一電阻狀態轉變為第二電阻狀態。弱設定電壓的電壓值小於正常設定電壓的電壓值。判斷電阻式記憶體元件是否經過加熱步驟的步驟包括:判斷第一晶胞陣列中的記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量是否大於臨界值;若記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量大於臨界值,判斷電阻式記憶體元件經過加熱步驟;以及若記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量小於或等於臨界值,判斷電阻式記憶體元件沒有經過加熱步驟。In one embodiment, the resistive memory device described above includes a first array of unit cells and a second array of unit cells. The method of operating the resistive memory device further includes applying a weak set voltage to the first unit cell array to cause the plurality of memory cells of the first unit cell array to transition from the first resistive state to the second resistive state. The voltage value of the weak set voltage is lower than the voltage value of the normal set voltage. The step of determining whether the resistive memory element has undergone the heating step comprises: determining whether the number of the memory cells in the first unit cell array transitioning from the second resistive state to the first resistive state is greater than a critical value; if the memory unit cell is from The second resistance state is changed to a state in which the first resistance state is greater than a threshold value, determining that the resistive memory device is subjected to the heating step; and if the number of the memory cell transitioning from the second resistance state to the first resistance state is less than or equal to a threshold value It is judged that the resistive memory element has not undergone a heating step.

在一實施例中,在對電阻式記憶體元件執行程式化及抹除循環操作的步驟之後,所述電阻式記憶體元件的操作方法更包括:若電阻式記憶體元件通過讀取邊界驗證,結束程式化及抹除循環操作;以及若電阻式記憶體元件不通過讀取邊界驗證,重複對電阻式記憶體元件執行程式化及抹除循環操作的步驟直到電阻式記憶體元件通過讀取邊界驗證,或者直到一預設次數。In an embodiment, after the step of performing the staging and erasing loop operations on the resistive memory device, the operating method of the resistive memory device further comprises: if the resistive memory component is verified by reading the boundary, End stylization and erase loop operations; and if the resistive memory component does not pass the read boundary verification, repeat the steps of stylizing and erasing the loop operation of the resistive memory component until the resistive memory component passes the read boundary Verify, or until a preset number of times.

在一實施例中,上述的電阻式記憶體元件的操作方法更包括對電阻式記憶體元件執行上電操作。判斷電阻式記憶體元件是否經過加熱步驟的步驟在上電操作結束之後執行。In an embodiment, the method of operating the resistive memory device further includes performing a power-on operation on the resistive memory device. The step of judging whether or not the resistive memory element has undergone the heating step is performed after the end of the power-on operation.

在一實施例中,刷新操作在上電操作結束之後執行。In an embodiment, the refresh operation is performed after the power up operation ends.

基於上述,在本發明的操作方法中,在電阻式記憶體元件經過加熱步驟之後,包括設定及重置循環操作或者程式化及抹除循環操作步驟,以增加電阻式記憶體元件的讀取邊界。Based on the above, in the operating method of the present invention, after the resistive memory element is subjected to the heating step, the setting and resetting cycle operations or the stylization and erasing cycle operation steps are performed to increase the read boundary of the resistive memory device. .

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

以下提出多個實施例來說明本發明,然而本發明不僅限於所例示的多個實施例。又實施例之間也允許有適當的結合。在本申請說明書全文(包括申請專利範圍)中所使用的「耦接」一詞可指任何直接或間接的連接手段。舉例而言,若文中描述第一裝置耦接於第二裝置,則應該被解釋成該第一裝置可以直接連接於該第二裝置,或者該第一裝置可以透過其他裝置或某種連接手段而間接地連接至該第二裝置。此外,「訊號」一詞可指至少一電流、電壓、電荷、溫度、資料、電磁波或任何其他一或多個訊號。The invention is illustrated by the following examples, but the invention is not limited to the illustrated embodiments. Further combinations are also allowed between the embodiments. The term "coupled" as used throughout the specification (including the scope of the claims) may be used in any direct or indirect connection. For example, if the first device is described as being coupled to the second device, it should be construed that the first device can be directly connected to the second device, or the first device can be connected through other devices or some kind of connection means. Connected to the second device indirectly. In addition, the term "signal" may mean at least one current, voltage, charge, temperature, data, electromagnetic wave or any other one or more signals.

圖1繪示本發明一實施例之記憶體儲存裝置的概要示意圖。圖2繪示本發明一實施例之記憶體晶胞中的燈絲經形成程序、重置操作及設定操作的概要示意圖。請參考圖1及圖2,本實施例之記憶體儲存裝置100包括記憶體控制電路110以及電阻式記憶體元件120。電阻式記憶體元件120耦接至記憶體控制電路110。電阻式記憶體元件120包括多個以陣列方式排列的記憶體晶胞122。在本實施例中,記憶體晶胞122包括上電極210、下電極220以及介電層230。上電極210及下電極220為良好的金屬導體,兩者的材料可以相同或不相同。介電層230設置在上電極210以及下電極220之間。介電層230包括介電材料,例如包括過渡金屬氧化物。記憶體晶胞122至少具有兩種阻值狀態,藉由在上電極210及下電極220分別施加不同的電壓來改變記憶體晶胞122的阻值狀態,記憶體晶胞122可提供儲存資料的功能。FIG. 1 is a schematic diagram of a memory storage device according to an embodiment of the invention. 2 is a schematic diagram showing a filament formation process, a reset operation, and a setting operation in a memory cell according to an embodiment of the invention. Referring to FIG. 1 and FIG. 2 , the memory storage device 100 of the embodiment includes a memory control circuit 110 and a resistive memory component 120 . The resistive memory component 120 is coupled to the memory control circuit 110. The resistive memory element 120 includes a plurality of memory cells 122 arranged in an array. In the present embodiment, the memory cell 122 includes an upper electrode 210, a lower electrode 220, and a dielectric layer 230. The upper electrode 210 and the lower electrode 220 are good metal conductors, and the materials of the two may be the same or different. The dielectric layer 230 is disposed between the upper electrode 210 and the lower electrode 220. Dielectric layer 230 includes a dielectric material, including, for example, a transition metal oxide. The memory cell 122 has at least two resistance states. By applying different voltages to the upper electrode 210 and the lower electrode 220 respectively, the resistance state of the memory cell 122 is changed, and the memory cell 122 can provide data storage. Features.

在本實施例中,記憶體晶胞122例如具有一電晶體一電阻(1T1R)的結構,或者二電晶體二電阻(2T2R)的結構,其實施方式可以由所屬技術領域的通常知識獲致足夠的教示、建議與實施說明。本發明對記憶體晶胞122的結構並不加以限制。In the present embodiment, the memory cell 122 has, for example, a transistor-resistor (1T1R) structure or a two-diode two-resistor (2T2R) structure, and its implementation can be sufficiently obtained by the general knowledge in the art. Instructions, suggestions and implementation instructions. The present invention does not limit the structure of the memory cell 122.

在本實施例中,記憶體控制電路110用以對記憶體晶胞122進行形成程序。在此過程中,記憶體晶胞122兩端的電極持續被施加偏壓V1(即形成電壓),以對介電層230產生一個外加電場。在本實施例中,在上電極210施加其值為V1伏特的正電壓,在下電極220施加0伏特的電壓。此外加電場會將氧原子222分離成氧離子212及氧空缺232。氧空缺232在介電層230中形成燈絲,作為電流傳遞路徑。當外加電場超過臨界值時,介電層230會產生介電崩潰現象,從而由高阻態轉變為低阻態。此種崩潰並非永久,其阻值仍可改變。In this embodiment, the memory control circuit 110 is configured to form a memory cell 122. During this process, the electrodes at both ends of the memory cell 122 are continuously applied with a bias voltage V1 (i.e., a voltage is formed) to generate an applied electric field to the dielectric layer 230. In the present embodiment, a positive voltage having a value of V1 volt is applied to the upper electrode 210, and a voltage of 0 volt is applied to the lower electrode 220. In addition, the addition of an electric field separates the oxygen atoms 222 into oxygen ions 212 and oxygen vacancies 232. The oxygen vacancy 232 forms a filament in the dielectric layer 230 as a current transfer path. When the applied electric field exceeds the critical value, the dielectric layer 230 will undergo a dielectric collapse phenomenon, thereby transitioning from a high resistance state to a low resistance state. This type of collapse is not permanent and its resistance can still change.

經形成程序的記憶體晶胞122具有低阻態。在重置操作時,記憶體晶胞122的上電極210被施加0伏特的電壓,下電極220被施加其值為V2伏特的正電壓。此電壓差值是重置電壓,例如-V2伏特。經重置操作的記憶體晶胞122其狀態由低阻態轉變為高阻態。接著,在設定操作時,記憶體晶胞122的上電極210被施加其值為V3伏特的正電壓,下電極220被施加0伏特的電壓。此電壓差值是設定電壓,例如+V3伏特。經設定操作的記憶體晶胞122其狀態由高阻態轉變為低阻態。在本實施例中,重置電壓及設定電壓的大小及極性僅用以例示說明,不用以限定本發明。在本實施例中,圖2所繪示的形成程序、重置操作及設定操作僅用以例示說明,不用以限定本發明。The memory cell 122 that forms the program has a low resistance state. At the time of the reset operation, the upper electrode 210 of the memory cell 122 is applied with a voltage of 0 volts, and the lower electrode 220 is applied with a positive voltage of a value of V2 volts. This voltage difference is a reset voltage, such as -V2 volts. The reset cell memory cell 122 changes its state from a low resistance state to a high resistance state. Next, at the time of the setting operation, the upper electrode 210 of the memory cell 122 is applied with a positive voltage of V3 volts, and the lower electrode 220 is applied with a voltage of 0 volts. This voltage difference is a set voltage, such as +V3 volts. The memory cell 122 of the set operation changes its state from a high resistance state to a low resistance state. In the present embodiment, the magnitude and polarity of the reset voltage and the set voltage are for illustrative purposes only, and are not intended to limit the present invention. In the present embodiment, the forming procedure, the resetting operation, and the setting operation illustrated in FIG. 2 are for illustrative purposes only, and are not intended to limit the present invention.

圖3繪示本發明一實施例之電阻式記憶體元件的操作方法。請參考圖1至圖3,在步驟S100中,本實施例的記憶體控制電路110對電阻式記憶體元件120執行形成程序以及初始重置程序。之後,在步驟S110中,記憶體控制電路110對電阻式記憶體元件120執行設定及重置循環操作,以增加電阻式記憶體元件120的讀取邊界。也就是,相較於未執行步驟S110的電阻式記憶體元件120的讀取邊界,執行步驟S110後的電阻式記憶體元件120的讀取邊界較大。在步驟S120中,記憶體控制電路110判斷電阻式記憶體元件120是否通過讀取邊界驗證。讀取邊界驗證包括設定第一電流閾值與小於第一電流閾值的第二電流閾值,以及比較流經電阻式記憶體元件120的電流與第一電流閾值及第二電流閾值。當電阻式記憶體元件120的電流大於第一電流閾值或小於第二電流閾值時,判斷電阻式記憶體元件120通過讀取邊界驗證。當電阻式記憶體元件120的電流介於第一電流閾值與第二電流閾值之間時,判斷電阻式記憶體元件120未通過讀取邊界驗證。FIG. 3 illustrates a method of operating a resistive memory device in accordance with an embodiment of the present invention. Referring to FIG. 1 to FIG. 3, in step S100, the memory control circuit 110 of the present embodiment performs a forming process and an initial resetting process on the resistive memory device 120. Thereafter, in step S110, the memory control circuit 110 performs a set and reset cycle operation on the resistive memory device 120 to increase the read boundary of the resistive memory device 120. That is, the read boundary of the resistive memory element 120 after the step S110 is performed is larger than the read boundary of the resistive memory element 120 in which the step S110 is not performed. In step S120, the memory control circuit 110 determines whether the resistive memory element 120 has passed the read boundary verification. The reading boundary verification includes setting a first current threshold and a second current threshold that is less than the first current threshold, and comparing the current flowing through the resistive memory element 120 with the first current threshold and the second current threshold. When the current of the resistive memory element 120 is greater than the first current threshold or less than the second current threshold, it is determined that the resistive memory element 120 is verified by reading the boundary. When the current of the resistive memory element 120 is between the first current threshold and the second current threshold, it is determined that the resistive memory element 120 has not passed the read boundary verification.

若電阻式記憶體元件120未通過讀取邊界驗證,記憶體控制電路110再次執行步驟S110,以重複對電阻式記憶體元件120執行設定及重置循環操作的步驟,直到電阻式記憶體元件120通過讀取邊界驗證。在一實施例中,記憶體控制電路110也可設定一預設次數,以重複對電阻式記憶體元件120執行步驟S110直到達到此預設次數為止。另一方面,若電阻式記憶體元件120通過讀取邊界驗證,記憶體控制電路110結束步驟S110的設定及重置循環操作。If the resistive memory element 120 does not pass the read boundary verification, the memory control circuit 110 performs step S110 again to repeat the steps of performing the set and reset cycle operations on the resistive memory element 120 until the resistive memory element 120 Verify by reading the boundary. In an embodiment, the memory control circuit 110 can also be set a preset number of times to repeatedly perform the step S110 on the resistive memory element 120 until the preset number of times is reached. On the other hand, if the resistive memory element 120 is verified by the read boundary, the memory control circuit 110 ends the setting of the step S110 and the reset loop operation.

在本實施例中,設定及重置循環操作包括至少一次設定操作以及至少一次重置操作,其實施方式可以由所屬技術領域的通常知識獲致足夠的教示、建議與實施說明。In the present embodiment, the set and reset cycle operations include at least one set operation and at least one reset operation, and embodiments thereof may be sufficiently taught, suggested, and implemented by the general knowledge in the art.

圖4繪示本發明另一實施例之電阻式記憶體元件的操作方法。請參考圖1、圖2及圖4,在步驟S200中,本實施例的記憶體控制電路110對電阻式記憶體元件120執行加熱步驟。在步驟S210中,記憶體控制電路110對電阻式記憶體元件120執行設定及重置循環操作,以增加電阻式記憶體元件120的讀取邊界。也就是,相較於未執行步驟S210的電阻式記憶體元件120的讀取邊界,執行步驟S210後的電阻式記憶體元件120的讀取邊界較大。在本實施例中,設定及重置循環操作包括至少一次重置操作以及至少一次設定操作,其實施方式可以由所屬技術領域的通常知識或者圖2所揭示的內容獲致足夠的教示、建議與實施說明。在本實施例中,步驟S210的設定及重置循環操作在步驟S200的加熱步驟後執行。4 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. Referring to FIG. 1, FIG. 2 and FIG. 4, in step S200, the memory control circuit 110 of the present embodiment performs a heating step on the resistive memory device 120. In step S210, the memory control circuit 110 performs a set and reset cycle operation on the resistive memory element 120 to increase the read boundary of the resistive memory element 120. That is, the read boundary of the resistive memory element 120 after the step S210 is performed is larger than the read boundary of the resistive memory element 120 in which the step S210 is not performed. In this embodiment, the setting and resetting cycle operation includes at least one reset operation and at least one setting operation, and the implementation manner thereof can obtain sufficient teaching, suggestion and implementation by the general knowledge in the technical field or the content disclosed in FIG. Description. In the present embodiment, the setting and reset cycle operation of step S210 is performed after the heating step of step S200.

在步驟S220中,記憶體控制電路110判斷電阻式記憶體元件120是否通過讀取邊界驗證。若電阻式記憶體元件120不通過讀取邊界驗證,記憶體控制電路110再次執行步驟S210,以重複對電阻式記憶體元件120執行設定及重置循環操作,直到電阻式記憶體元件120通過讀取邊界驗證。在一實施例中,記憶體控制電路110也可設定一預設次數,以重複對電阻式記憶體元件120執行步驟S210直到達到此預設次數為止。另一方面,若電阻式記憶體元件120通過讀取邊界驗證,記憶體控制電路110結束步驟S210的設定及重置循環操作操作。In step S220, the memory control circuit 110 determines whether the resistive memory element 120 has passed the read boundary verification. If the resistive memory element 120 does not pass the read boundary verification, the memory control circuit 110 performs step S210 again to repeatedly perform the setting and reset cycle operations on the resistive memory element 120 until the resistive memory element 120 passes the read. Take the boundary verification. In an embodiment, the memory control circuit 110 can also be set to a preset number of times to repeatedly perform the step S210 on the resistive memory element 120 until the preset number of times is reached. On the other hand, if the resistive memory element 120 is verified by the read boundary, the memory control circuit 110 ends the setting of the step S210 and the reset cycle operation operation.

在一實施例中,步驟S200的加熱步驟可能在記憶體控制電路110對電阻式記憶體元件120執行形成程序時產生。或者,在一實施例中,步驟S200的加熱步驟可能在將電阻式記憶體元件120安裝於電路板上時所產生。在此實施例中,安裝步驟包括加熱步驟,並且設定及重置循環操作用以程式化及抹除電阻式記憶體元件120。In an embodiment, the heating step of step S200 may be generated when the memory control circuit 110 performs a forming process on the resistive memory element 120. Alternatively, in an embodiment, the heating step of step S200 may occur when the resistive memory element 120 is mounted on a circuit board. In this embodiment, the mounting step includes a heating step, and the set and reset cycle operations are used to program and erase the resistive memory element 120.

圖5繪示本發明另一實施例之電阻式記憶體元件的操作方法。請參考圖1、圖2及圖5,在步驟S300中,本實施例的記憶體控制電路110對電阻式記憶體元件120執行刷新操作。在步驟S310中,記憶體控制電路110依據電阻式記憶體元件120是否經過一加熱步驟,來決定是否對電阻式記憶體元件120執行程式化及抹除循環操作,以增加電阻式記憶體元件120的讀取邊界。也就是,相較於未執行程式化及抹除循環操作的電阻式記憶體元件120的讀取邊界,執行程式化及抹除循環操作後的電阻式記憶體元件120的讀取邊界較大。在本實施例中,程式化及抹除循環操作以及刷新操作的實施方式可以由所屬技術領域的通常知識獲致足夠的教示、建議與實施說明。FIG. 5 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. Referring to FIG. 1, FIG. 2 and FIG. 5, in step S300, the memory control circuit 110 of the present embodiment performs a refresh operation on the resistive memory device 120. In step S310, the memory control circuit 110 determines whether to perform a stylization and erase cycle operation on the resistive memory device 120 according to whether the resistive memory device 120 has undergone a heating step to increase the resistive memory device 120. Read boundary. That is, the read boundary of the resistive memory element 120 after the execution of the stylization and erase cycle operations is large compared to the read boundary of the resistive memory element 120 in which the stylization and erase cycle operations are not performed. In the present embodiment, the implementation of the stylization and erase cycle operations and the refresh operation can be sufficiently taught, suggested, and implemented by the general knowledge in the art.

在一實施例中,圖2的電阻式記憶體元件120例如包括溫度感測器,用以偵測溫度,且當記憶體控制電路110判斷所測得的溫度大於一預定值,則判斷電阻式記憶體元件120經過加熱步驟。In one embodiment, the resistive memory component 120 of FIG. 2 includes, for example, a temperature sensor for detecting temperature, and when the memory control circuit 110 determines that the measured temperature is greater than a predetermined value, determining the resistive The memory element 120 is subjected to a heating step.

在一實施例中,圖2的電阻式記憶體元件120例如包括不同的晶胞陣列,分別用以偵測溫度以及儲存資料。舉例而言,電阻式記憶體元件120例如包括用以偵測溫度的第一晶胞陣列,以及用以儲存資料的第二晶胞陣列。在一實施例中,第一晶胞陣列的晶胞數量小於第二晶胞陣列的晶胞。In one embodiment, the resistive memory component 120 of FIG. 2 includes, for example, different arrays of cell cells for detecting temperature and storing data, respectively. For example, the resistive memory component 120 includes, for example, a first array of cell cells for detecting temperature, and a second array of cell cells for storing data. In an embodiment, the number of unit cells of the first unit cell array is smaller than the unit cell of the second unit cell array.

圖6繪示本發明另一實施例之電阻式記憶體元件的操作方法。在本實施例中,電阻式記憶體元件120還包括用以偵測溫度的第一晶胞陣列以及用以儲存資料的第二晶胞陣列。請參考圖1、圖2及圖6,在步驟S400中,本實施例的記憶體控制電路110對第一晶胞陣列施加弱設定(weak set)電壓,使第一晶胞陣列的多個記憶體晶胞從第一電阻狀態(例如高阻態)轉變為第二電阻狀態(例如低阻態)。接著,對電阻式記憶體元件120執行上電操作(power up operation)。在本實施例中,弱設定電壓的電壓值小於正常設定電壓的電壓值,例如小於圖2的電壓值V3。根據弱設定電壓所寫入的資料容易受到高溫的影響而發生位元反轉,例如從第二電阻狀態(例如低阻態)轉變為第一電阻狀態(例如高阻態)。接著,在步驟S410中,記憶體控制電路110判斷電阻式記憶體元件120是否經過一加熱步驟。若電阻式記憶體元件120沒有經過加熱步驟,記憶體控制電路110結束電阻式記憶體元件120的操作方法。FIG. 6 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. In this embodiment, the resistive memory device 120 further includes a first cell array for detecting temperature and a second cell array for storing data. Referring to FIG. 1 , FIG. 2 and FIG. 6 , in step S400 , the memory control circuit 110 of the embodiment applies a weak set voltage to the first unit cell array to make a plurality of memories of the first unit cell array. The bulk cell transitions from a first resistive state (eg, a high resistance state) to a second resistive state (eg, a low resistance state). Next, a power up operation is performed on the resistive memory element 120. In the present embodiment, the voltage value of the weak set voltage is less than the voltage value of the normal set voltage, for example, less than the voltage value V3 of FIG. The data written according to the weak set voltage is susceptible to high temperature effects and bit reversal occurs, for example, from a second resistive state (eg, a low resistance state) to a first resistive state (eg, a high resistance state). Next, in step S410, the memory control circuit 110 determines whether the resistive memory element 120 has undergone a heating step. If the resistive memory element 120 has not undergone a heating step, the memory control circuit 110 ends the method of operating the resistive memory element 120.

若判斷電阻式記憶體元件120經過加熱步驟,記憶體控制電路110對電阻式記憶體元件120執行刷新操作(步驟S420)。接著,在步驟S430中,記憶體控制電路110對電阻式記憶體元件120執行程式化及抹除循環操作,以增加電阻式記憶體元件120的讀取邊界。If it is determined that the resistive memory element 120 has undergone the heating step, the memory control circuit 110 performs a refresh operation on the resistive memory element 120 (step S420). Next, in step S430, the memory control circuit 110 performs a program and erase cycle operation on the resistive memory device 120 to increase the read boundary of the resistive memory device 120.

在步驟S440中,本實施例的記憶體控制電路110判斷電阻式記憶體元件120是否通過讀取邊界驗證。若電阻式記憶體元件120不通過讀取邊界驗證,記憶體控制電路110再次執行步驟S430,以重複對電阻式記憶體元件120執行程式化及抹除循環操作,直到電阻式記憶體元件120通過讀取邊界驗證。在一實施例中,記憶體控制電路110也可設定一預設次數,以重複對電阻式記憶體元件120執行步驟S430直到達到此預設次數為止。另一方面,若電阻式記憶體元件120通過讀取邊界驗證,記憶體控制電路110執行步驟S450。In step S440, the memory control circuit 110 of the present embodiment determines whether the resistive memory element 120 has passed the read boundary verification. If the resistive memory element 120 does not pass the read boundary verification, the memory control circuit 110 performs step S430 again to repeatedly perform the stylization and erase cycle operations on the resistive memory element 120 until the resistive memory element 120 passes. Read boundary verification. In an embodiment, the memory control circuit 110 can also be set a predetermined number of times to repeatedly perform the step S430 on the resistive memory device 120 until the preset number of times is reached. On the other hand, if the resistive memory element 120 is verified by the read boundary, the memory control circuit 110 performs step S450.

在步驟S450中,本實施例的記憶體控制電路110再次對第一晶胞陣列施加弱設定電壓,以使第一晶胞陣列的多個記憶體晶胞從第一電阻狀態(例如高阻態)轉變為第二電阻狀態(例如低阻態),從而使得第一晶胞陣列再次具備溫度偵測功能。接著,記憶體控制電路110結束電阻式記憶體元件120的操作方法。In step S450, the memory control circuit 110 of the present embodiment applies a weak set voltage to the first cell array again, so that the plurality of memory cells of the first cell array are from the first resistance state (for example, a high resistance state). Transitioning to a second resistance state (eg, a low resistance state) causes the first cell array to again have a temperature sensing function. Next, the memory control circuit 110 ends the method of operating the resistive memory element 120.

圖7繪示本發明一實施例之判斷電阻式記憶體元件是否經過加熱步驟的方法流程圖。請參考圖6及圖7,在本實施例中,步驟S410例如包括步驟S412、S414及S416。在步驟S412中,記憶體控制電路110判斷第一晶胞陣列中的記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量是否大於一臨界值。若記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量大於臨界值,在步驟S414中,記憶體控制電路110判斷電阻式記憶體元件120經過加熱步驟。若記憶體晶胞從第二電阻狀態轉變為第一電阻狀態的數量小於或等於臨界值,在步驟S416中,記憶體控制電路110判斷電阻式記憶體元件120沒有經過加熱步驟。FIG. 7 is a flow chart showing a method of determining whether a resistive memory device has undergone a heating step according to an embodiment of the invention. Referring to FIG. 6 and FIG. 7, in the embodiment, step S410 includes steps S412, S414, and S416, for example. In step S412, the memory control circuit 110 determines whether the number of memory cells in the first unit cell array transitions from the second resistance state to the first resistance state is greater than a threshold value. If the number of changes of the memory cell from the second resistance state to the first resistance state is greater than the threshold value, in step S414, the memory control circuit 110 determines that the resistive memory device 120 has undergone the heating step. If the number of changes of the memory cell from the second resistance state to the first resistance state is less than or equal to the threshold value, in step S416, the memory control circuit 110 determines that the resistive memory device 120 has not undergone the heating step.

綜上所述,在本發明的示範實施例中,在電阻式記憶體元件經過加熱步驟之後,其操作方法包括設定及重置循環操作或者程式化及抹除循環操作步驟,以增加電阻式記憶體元件的讀取邊界。在一示範實施例中,電阻式記憶體元件具備溫度偵測功能,記憶體控制電路可據此決定是否對電阻式記憶體元件執行程式化及抹除循環操作,以增加電阻式記憶體元件的讀取邊界。 In summary, in the exemplary embodiment of the present invention, after the resistive memory element is subjected to the heating step, the operation method includes setting and resetting the cyclic operation or the stylization and erasing cycle operation steps to increase the resistive memory. The read boundary of the body element. In an exemplary embodiment, the resistive memory component has a temperature detecting function, and the memory control circuit can determine whether to perform stylization and erase cycle operations on the resistive memory component to increase the resistance memory component. Read the boundary.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

100‧‧‧記憶體儲存裝置 100‧‧‧ memory storage device

110‧‧‧記憶體控制電路 110‧‧‧Memory Control Circuit

120‧‧‧電阻式記憶體元件 120‧‧‧Resistive memory components

122‧‧‧記憶體晶胞 122‧‧‧ memory cell

210‧‧‧上電極 210‧‧‧Upper electrode

212‧‧‧氧離子 212‧‧‧Oxygen ions

220‧‧‧下電極 220‧‧‧ lower electrode

222‧‧‧氧原子 222‧‧‧Oxygen atom

230‧‧‧介電層 230‧‧‧ dielectric layer

232‧‧‧氧空缺 232‧‧‧Oxygen vacancies

V1‧‧‧形成電壓 V1‧‧‧ forming voltage

V2‧‧‧重置電壓 V2‧‧‧Reset voltage

V3‧‧‧設定電壓 V3‧‧‧Set voltage

HRS‧‧‧高阻態 HRS‧‧‧high resistance state

LRS‧‧‧低阻態 LRS‧‧‧Low resistance state

S100、S110、S120、S200、S210、S220、S300、S310、S400、S410、S412、S414、S416、S420、S430、S440、S450‧‧‧方法步驟 S100, S110, S120, S200, S210, S220, S300, S310, S400, S410, S412, S414, S416, S420, S430, S440, S450‧‧‧ method steps

圖1繪示本發明一實施例之記憶體儲存裝置的概要示意圖。 圖2繪示本發明一實施例之記憶體晶胞中的燈絲經形成程序、重置操作及設定操作的概要示意圖。 圖3繪示本發明一實施例之電阻式記憶體元件的操作方法。 圖4繪示本發明另一實施例之電阻式記憶體元件的操作方法。 圖5繪示本發明另一實施例之電阻式記憶體元件的操作方法。 圖6繪示本發明另一實施例之電阻式記憶體元件的操作方法。 圖7繪示本發明一實施例之判斷電阻式記憶體元件是否經過加熱步驟的方法流程圖。FIG. 1 is a schematic diagram of a memory storage device according to an embodiment of the invention. 2 is a schematic diagram showing a filament formation process, a reset operation, and a setting operation in a memory cell according to an embodiment of the invention. FIG. 3 illustrates a method of operating a resistive memory device in accordance with an embodiment of the present invention. 4 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. FIG. 5 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. FIG. 6 illustrates a method of operating a resistive memory device in accordance with another embodiment of the present invention. FIG. 7 is a flow chart showing a method of determining whether a resistive memory device has undergone a heating step according to an embodiment of the invention.

Claims (9)

一種電阻式記憶體元件的操作方法,包括:對該電阻式記憶體元件執行一加熱步驟,其中,經過該加熱步驟後,該電阻式記憶體元件的一讀取邊界降低;對該電阻式記憶體元件執行一設定及重置循環操作,以增加該電阻式記憶體元件的降低後的該讀取邊界;以及判斷該電阻式記憶體元件是否通過一讀取邊界驗證,其中該設定及重置循環操作在該加熱步驟之後執行。 A method of operating a resistive memory device, comprising: performing a heating step on the resistive memory device, wherein after the heating step, a read boundary of the resistive memory device is reduced; The body element performs a set and reset cycle operation to increase the reduced read boundary of the resistive memory element; and determine whether the resistive memory element is verified by a read boundary, wherein the setting and resetting The cycle operation is performed after this heating step. 如申請專利範圍第1項所述的電阻式記憶體元件的操作方法,在對該電阻式記憶體元件執行該設定及重置循環操作的步驟之後,所述電阻式記憶體元件的操作方法更包括:若該電阻式記憶體元件通過該讀取邊界驗證,結束該設定及重置循環操作;以及若該電阻式記憶體元件不通過該讀取邊界驗證,重複對該電阻式記憶體元件執行該設定及重置循環操作的步驟直到該電阻式記憶體元件通過該讀取邊界驗證,或者直到一預設次數。 The method of operating a resistive memory device according to claim 1, wherein the method of operating the resistive memory device is performed after the step of performing the setting and resetting cycle operation on the resistive memory device. The method includes: if the resistive memory component is verified by the read boundary, ending the setting and resetting cycle operation; and if the resistive memory component does not pass the read boundary verification, repeating execution of the resistive memory component The step of setting and resetting the loop operation until the resistive memory element is verified by the read boundary, or up to a predetermined number of times. 如申請專利範圍第1項所述的電阻式記憶體元件的操作方法,更包括:安裝該電阻式記憶體元件於一電路板上,其中該安裝步驟包括該加熱步驟,其中該設定及重置循環操作用以程式化及抹除該電阻式記憶體元件。 The method for operating a resistive memory device according to claim 1, further comprising: mounting the resistive memory component on a circuit board, wherein the mounting step comprises the heating step, wherein the setting and resetting The loop operation is used to program and erase the resistive memory component. 一種電阻式記憶體元件的操作方法,包括:對該電阻式記憶體元件執行一刷新操作;依據該電阻式記憶體元件是否經過一加熱步驟,來決定是否對該電阻式記憶體元件執行一程式化及抹除循環操作,以增加該電阻式記憶體元件的一讀取邊界,其中,經過該加熱步驟後,該電阻式記憶體元件的該讀取邊界降低;以及判斷該電阻式記憶體元件是否通過一讀取邊界驗證,其中該程式化及抹除循環操作在該刷新操作之後執行。 A method for operating a resistive memory device, comprising: performing a refresh operation on the resistive memory device; determining whether to execute a program on the resistive memory device according to whether the resistive memory device has undergone a heating step And erasing a loop operation to increase a read boundary of the resistive memory element, wherein the read boundary of the resistive memory element is lowered after the heating step; and determining the resistive memory element Whether to perform a read boundary verification, wherein the stylization and erase loop operations are performed after the refresh operation. 如申請專利範圍第4項所述的電阻式記憶體元件的操作方法,更包括:判斷該電阻式記憶體元件是否經過該加熱步驟;若該電阻式記憶體元件經過該加熱步驟,在該刷新操作之後,對該電阻式記憶體元件執行該程式化及抹除循環操作;以及若該電阻式記憶體元件沒有經過該加熱步驟,結束該電阻式記憶體元件的操作方法。 The method for operating a resistive memory device according to claim 4, further comprising: determining whether the resistive memory device has undergone the heating step; if the resistive memory device passes the heating step, the refreshing After the operation, the staging and erasing cycle operations are performed on the resistive memory device; and if the resistive memory device does not undergo the heating step, the method of operating the resistive memory device is terminated. 如申請專利範圍第5項所述的電阻式記憶體元件的操作方法,其中該電阻式記憶體元件包括一第一晶胞陣列以及一第二晶胞陣列,所述電阻式記憶體元件的操作方法更包括:對該第一晶胞陣列施加一弱設定電壓,以使該第一晶胞陣列的多個記憶體晶胞從一第一電阻狀態轉變為一第二電阻狀態,其中該弱設定電壓的電壓值小於一正常設定電壓的電壓值, 其中判斷該電阻式記憶體元件是否經過該加熱步驟的步驟包括:判斷該第一晶胞陣列中的該些記憶體晶胞從該第二電阻狀態轉變為該第一電阻狀態的數量是否大於一臨界值;若該些記憶體晶胞從該第二電阻狀態轉變為該第一電阻狀態的數量大於該臨界值,判斷該電阻式記憶體元件經過該加熱步驟;以及若該些記憶體晶胞從該第二電阻狀態轉變為該第一電阻狀態的數量小於或等於該臨界值,判斷該電阻式記憶體元件沒有經過該加熱步驟。 The method of operating a resistive memory device according to claim 5, wherein the resistive memory device comprises a first cell array and a second cell array, and the resistive memory device operates The method further includes: applying a weak set voltage to the first unit cell array to cause the plurality of memory cells of the first unit cell array to transition from a first resistance state to a second resistance state, wherein the weak setting The voltage value of the voltage is less than the voltage value of a normal set voltage. The step of determining whether the resistive memory element has undergone the heating step comprises: determining whether the number of the memory cells in the first unit cell array changes from the second resistance state to the first resistance state is greater than one a threshold value; if the number of the memory cells from the second resistance state to the first resistance state is greater than the threshold value, determining that the resistive memory device passes the heating step; and if the memory cells are The number of transitions from the second resistance state to the first resistance state is less than or equal to the threshold value, and it is determined that the resistive memory element has not undergone the heating step. 如申請專利範圍第5項所述的電阻式記憶體元件的操作方法,在對該電阻式記憶體元件執行該程式化及抹除循環操作的步驟之後,所述電阻式記憶體元件的操作方法更包括:若該電阻式記憶體元件通過該讀取邊界驗證,結束該程式化及抹除循環操作;以及若該電阻式記憶體元件不通過該讀取邊界驗證,重複對該電阻式記憶體元件執行該程式化及抹除循環操作的步驟直到該電阻式記憶體元件通過該讀取邊界驗證,或者直到一預設次數。 The method of operating a resistive memory device according to claim 5, after the step of performing the stylization and erase cycle operations on the resistive memory device, the method of operating the resistive memory device The method further includes: if the resistive memory component is verified by the read boundary, ending the stylization and erase cycle operation; and repeating the resistive memory if the resistive memory component does not pass the read boundary verification The component performs the step of stylizing and erasing the loop operation until the resistive memory component is verified by the read boundary, or up to a predetermined number of times. 如申請專利範圍第5項所述的電阻式記憶體元件的操作方法,更包括: 對該電阻式記憶體元件執行一上電操作,其中判斷該電阻式記憶體元件是否經過該加熱步驟的步驟在該上電操作結束之後執行。 The method for operating a resistive memory device according to claim 5, further comprising: A power-on operation is performed on the resistive memory element, wherein the step of determining whether the resistive memory element has passed the heating step is performed after the power-on operation ends. 如申請專利範圍第8項所述的電阻式記憶體元件的操作方法,其中該刷新操作在該上電操作結束之後執行。 The method of operating a resistive memory device according to claim 8 wherein the refresh operation is performed after the end of the power-on operation.
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