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TWI627715B - Substrate structure - Google Patents

Substrate structure Download PDF

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Publication number
TWI627715B
TWI627715B TW106100827A TW106100827A TWI627715B TW I627715 B TWI627715 B TW I627715B TW 106100827 A TW106100827 A TW 106100827A TW 106100827 A TW106100827 A TW 106100827A TW I627715 B TWI627715 B TW I627715B
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dielectric constant
circuit
insulating layer
insulating layers
substrate structure
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TW106100827A
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Chinese (zh)
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TW201826460A (en
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方柏翔
林河全
賴佳助
陳冠達
施智元
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矽品精密工業股份有限公司
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Priority to TW106100827A priority Critical patent/TWI627715B/en
Priority to CN201710043172.0A priority patent/CN108305862A/en
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Publication of TWI627715B publication Critical patent/TWI627715B/en
Publication of TW201826460A publication Critical patent/TW201826460A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492Bases or plates or solder therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492Bases or plates or solder therefor
    • H01L23/4924Bases or plates or solder therefor characterised by the materials

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

一種基板結構,係包括具複數絕緣層之基板本體以及結合至該基板本體且具有被動線路之線路組合,其中,至少一該絕緣層之成形材料係為高介電係數材料,使該線路組合之電容線路形成於該高介電係數材料的絕緣層上,以維持訊號品質,同時縮小該線路組合之整體線路面積。 A substrate structure includes a substrate body having a plurality of insulating layers and a circuit combination coupled to the substrate body and having a passive circuit, wherein at least one of the forming materials of the insulating layer is a high-dielectric constant material, so that the circuit is assembled. The capacitor circuit is formed on the insulating layer of the high-dielectric-constant material to maintain the signal quality and reduce the overall circuit area of the circuit combination.

Description

基板結構 Substrate structure

本發明係有關一種半導體封裝用之基板,尤指一種具有被動線路之基板結構。 The present invention relates to a substrate for a semiconductor package, and more particularly to a substrate structure having a passive circuit.

傳統用於封裝基板的材料係採用低介電係數(即Dk值約於2.5至4之間)及低介電損耗(low Df)的材料,俾透過此低介電係數之材質降低線路間的串擾(cross talk)與寄生電容,以提升訊號品質並抑制線路間的干擾。 The traditional materials used for packaging substrates are materials with low dielectric constant (that is, Dk value is between 2.5 and 4) and low dielectric loss (low Df). Cross talk and parasitic capacitance to improve signal quality and suppress interference between lines.

再者,隨著封裝技術的開發,在系統級封裝體內放置被動射頻元件(如濾波器、分功器、平衡對不平衡轉換器、阻抗匹配電路等)已是常見的整合方式,且這些被動射頻元件可為離散元件,或可積體化整合於封裝基板中。 Furthermore, with the development of packaging technology, it is common to place passive RF components (such as filters, power dividers, balanced-to-unbalanced converters, impedance matching circuits, etc.) in system-level packages. The RF component can be a discrete component, or it can be integrated into a package substrate.

習知積體化被動射頻元件之技術中,積體化被動射頻元件通常由等效的電感、電容、傳輸線組成。如第1A圖所示,一封裝基板之基板結構1係包含有一基板本體10以及一線路組合11。該基板本體10包含一核心層10b與分別設於該核心層10b上、下側之介電層10a,10c。該線路組合11係結合至該核心層10b與介電層10a,10c,其中,該線路組合11係包含有相互電性連接之被動線路11a(如 第1B圖所示,其包含電容線路C與電感線路L)、複數線路層11b以及複數導電盲孔11c,且該些導電盲孔11c係設於該核心層10b與該些介電層10a,10c中。 In the technology of integrated passive radio frequency components, integrated passive radio frequency components are usually composed of equivalent inductors, capacitors, and transmission lines. As shown in FIG. 1A, the substrate structure 1 of a package substrate includes a substrate body 10 and a circuit assembly 11. The substrate body 10 includes a core layer 10b and dielectric layers 10a, 10c disposed on the upper and lower sides of the core layer 10b, respectively. The circuit combination 11 is coupled to the core layer 10b and the dielectric layers 10a and 10c. The circuit combination 11 includes passive circuits 11a (such as As shown in FIG. 1B, it includes a capacitor circuit C and an inductor circuit L), a plurality of circuit layers 11b, and a plurality of conductive blind holes 11c, and the conductive blind holes 11c are provided in the core layer 10b and the dielectric layers 10a. 10c.

前述基板結構1中,主要使用低介電係數(low Dk)之材料作為基板本體10,即該核心層10b與介電層10a,10c之介電係數約於2.5至4之間。 In the aforementioned substrate structure 1, a material with a low dielectric constant (low Dk) is mainly used as the substrate body 10, that is, the dielectric coefficient of the core layer 10b and the dielectric layers 10a, 10c is about 2.5 to 4.

然而,若產品需較大的電容值,在不增加該線路組合11之層數的狀況下,則只能增加該電容線路C之面積。 However, if the product requires a larger capacitance value, the area of the capacitor line C can only be increased without increasing the number of layers of the circuit combination 11.

惟,增加該電容線路C之面積將使該被動線路11a佔用該介電層10a之面積變大,如此,造成該介電層10a之佈線空間變小,即該線路層11b佔用該介電層10a之面積變小,甚而導致電性功能下降。 However, increasing the area of the capacitor line C will make the area of the dielectric layer 10a occupied by the passive line 11a larger, so that the wiring space of the dielectric layer 10a becomes smaller, that is, the line layer 11b takes up the dielectric layer. The area of 10a becomes smaller, and even the electrical function is reduced.

因此,如何克服習知技術中之問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the problems in the conventional technology has become an urgent issue.

鑑於上述習知技術之缺失,本發明提供一種基板結構,係包括:基板本體,係包含複數相互堆疊之絕緣層,其中,至少一該絕緣層之材料係為高介電係數材料,至少一該絕緣層之材料係為低介電係數材料;以及線路組合,係包含被動線路並結合至該基板本體。 In view of the lack of the above-mentioned conventional technologies, the present invention provides a substrate structure including a substrate body including a plurality of insulating layers stacked on each other, wherein at least one of the materials of the insulating layer is a high dielectric constant material, and at least one The material of the insulating layer is a low-dielectric-constant material; and the circuit combination includes a passive circuit and is coupled to the substrate body.

前述之基板結構中,該高介電係數材料之介電係數大於或等於6,且該低介電係數材料之介電係數小於6。 In the aforementioned substrate structure, the dielectric constant of the high dielectric constant material is greater than or equal to 6, and the dielectric constant of the low dielectric constant material is less than 6.

前述之基板結構中,該被動線路係包含一電容線路,係結合至該具高介電係數材料之絕緣層上。 In the aforementioned substrate structure, the passive circuit includes a capacitor circuit, which is coupled to the insulating layer of the material with high dielectric constant.

前述之基板結構中,該被動線路係包含一電感線路,係結合至該具低介電係數材料之絕緣層上。 In the aforementioned substrate structure, the passive circuit includes an inductive circuit, which is coupled to the insulating layer of the material with a low dielectric constant.

前述之基板結構中,該被動線路係包含一電阻線路,係結合至該具低介電係數材料或具高介電係數材料之絕緣層上。 In the aforementioned substrate structure, the passive circuit includes a resistance circuit, which is coupled to the insulating layer of the material having a low dielectric constant or the material having a high dielectric constant.

前述之基板結構中,該線路組合復包含線路層,係結合至該具低介電係數材料之絕緣層上。 In the aforementioned substrate structure, the circuit assembly further includes a circuit layer, which is bonded to the insulating layer of the material having a low dielectric constant.

前述之基板結構中,該複數相互堆疊之絕緣層之中間位置係為一核心層。 In the aforementioned substrate structure, the middle position of the plurality of stacked insulating layers is a core layer.

前述之基板結構中,該複數相互堆疊之絕緣層依介電係數呈非對稱式層疊佈設。 In the aforementioned substrate structure, the plurality of insulating layers stacked on each other are laid out in an asymmetrical manner according to a dielectric constant.

前述之基板結構中,該複數相互堆疊之絕緣層依介電係數呈對稱式層疊佈設。 In the aforementioned substrate structure, the plurality of insulating layers stacked on each other are laid out symmetrically in accordance with a dielectric constant.

前述之基板結構中,該被動線路係包含電感線路、電阻線路或電容線路之至少其中一者。 In the aforementioned substrate structure, the passive line includes at least one of an inductive line, a resistive line, or a capacitive line.

前述之基板結構中,該具高介電係數材料的絕緣層的厚度係小於其它絕緣層的厚度。 In the aforementioned substrate structure, the thickness of the insulating layer of the high dielectric constant material is smaller than the thickness of other insulating layers.

由上可知,本發明之基板結構,主要藉由將該基板本體中之至少一絕緣層改為具有高介電係數材料,使該電感線路或線路層位於具低介電係數材料的絕緣層上,而需要大量電容耦合的被動線路則形成於具高介電係數材料的絕緣層上,因而不僅能維持原本的訊號品質,且同時能有效縮小該線路組合之整體線路面積。 It can be known from the above that the substrate structure of the present invention mainly comprises changing at least one insulating layer in the substrate body to a material having a high dielectric constant, so that the inductance circuit or the circuit layer is located on the insulating layer having a low dielectric constant material. However, passive lines that require a large amount of capacitive coupling are formed on the insulating layer of a material with a high dielectric constant, so that not only the original signal quality can be maintained, but also the overall line area of the line combination can be effectively reduced.

1,2,3,3’,3”,4,4’,4”,5,5’,5”,6,6’‧‧‧基板結構 1,2,3,3 ’, 3”, 4,4 ’, 4”, 5,5 ’, 5”, 6,6’‧‧‧ substrate structure

10,20,30,30’,30”,40,40’,40”,50,50’,50”,60,60’‧‧‧基板本體 10,20,30,30 ’, 30”, 40,40 ’, 40”, 50,50 ’, 50”, 60,60’‧‧‧‧Substrate body

10a,10c‧‧‧介電層 10a, 10c‧‧‧Dielectric layer

10b‧‧‧核心層 10b‧‧‧Core layer

11,21‧‧‧線路組合 11,21‧‧‧ route combination

11a,21a‧‧‧被動線路 11a, 21a‧‧‧ Passive line

11b,21b‧‧‧線路層 11b, 21b‧‧‧ Line layer

11c,21c‧‧‧導電盲孔 11c, 21c ‧ ‧ conductive blind hole

20a,20b‧‧‧絕緣層 20a, 20b‧‧‧ Insulation

30a,30a’,30a”,30b,30b’,30c‧‧‧絕緣層 30a, 30a ’, 30a”, 30b, 30b ’, 30c‧‧‧‧Insulation

40a,40a’,40b,40b’,40b”,40c‧‧‧絕緣層 40a, 40a ’, 40b, 40b’, 40b ”, 40c‧‧‧Insulation

50a,50a’,50b,50b’,50b”,50c,50c’‧‧‧絕緣層 50a, 50a ’, 50b, 50b’, 50b ”, 50c, 50c’‧‧‧Insulation

60a,60a’,60b,60c‧‧‧絕緣層 60a, 60a ’, 60b, 60c‧‧‧Insulation

C‧‧‧電容線路 C‧‧‧capacitor line

h,t,r‧‧‧厚度 h, t, r‧‧‧thickness

L‧‧‧電感線路 L‧‧‧ Inductive line

第1A圖係為習知封裝基板之局部剖面示意圖;第1B圖係為第1A圖之封裝基板之被動線路之上視立體示意圖。 FIG. 1A is a schematic partial cross-sectional view of a conventional package substrate; FIG. 1B is a schematic top perspective view of a passive circuit of the package substrate of FIG. 1A.

第2圖係為本發明之基板結構之第一實施例的局部剖面示意圖;第3A至3C圖係為本發明之基板結構之第二實施例的局部剖面示意圖;第4A至4C圖係為本發明之基板結構之第三實施例的局部剖面示意圖;第5A至5C圖係為本發明之基板結構之第四實施例的局部剖面示意圖;以及第6A至6B圖係為本發明之基板結構之第五實施例的局部剖面示意圖。 Figure 2 is a schematic partial cross-sectional view of the first embodiment of the substrate structure of the present invention; Figures 3A to 3C are schematic partial cross-sectional views of the second embodiment of the substrate structure of the present invention; Figures 4A to 4C are Partial cross-sectional schematic diagram of the third embodiment of the substrate structure of the invention; Figures 5A to 5C are schematic partial cross-sectional diagrams of the fourth embodiment of the substrate structure of the invention; and Figures 6A to 6B are schematic diagrams of the substrate structure of the invention A schematic partial sectional view of the fifth embodiment.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following describes the implementation of the present invention through specific embodiments. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“中 間”、“下”、“上”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings in this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The limited conditions are not technically significant. Any modification of the structure, change of the proportional relationship, or adjustment of the size shall still fall within the scope of this invention without affecting the effects and goals that the invention can produce. The technical content disclosed by the invention can be covered. At the same time, the references in this manual The terms "between", "down", "up" and "one" are only for the convenience of description, and are not used to limit the scope of the present invention. The relative relationship is changed or adjusted without substantial changes. Under the technical content, it should be regarded as the scope in which the present invention can be implemented.

第2圖係為本發明之基板結構2之第一實施例的局部剖面示意圖。 FIG. 2 is a schematic partial cross-sectional view of the first embodiment of the substrate structure 2 of the present invention.

該基板結構2係包括:一基板本體20以及一線路組合21。 The substrate structure 2 includes a substrate body 20 and a circuit assembly 21.

所述之基板本體20係包含複數(於本實施例中係為兩層)絕緣層20a,20b,且其中一該絕緣層20a係包含有一介電係數大於或等於6的高介電係數材料,而另一該絕緣層20b係包含有一介電係數小於6的低介電係數材料。 The substrate body 20 includes a plurality of (two layers in this embodiment) insulating layers 20a, 20b, and one of the insulating layers 20a includes a high-dielectric constant material having a dielectric constant greater than or equal to 6, The other insulating layer 20b includes a low-dielectric-constant material having a dielectric constant less than 6.

於本實施例中,高介電係數材料之絕緣層係以點狀分佈之態樣呈現於圖式中,而低介電係數材料之絕緣層係以空白分佈之態樣呈現於圖式中,先予述明。 In this embodiment, the insulating layer of the high-dielectric constant material is shown in the drawing in the form of a dot distribution, and the insulating layer of the low-dielectric constant material is shown in the drawing in the form of the blank distribution. Be stated beforehand.

於本實施例中,該些絕緣層20a,20b係為介電層,其材質如預浸材(prepreg)或其它已知材質,且該些絕緣層20a,20b之厚度t大致相等。 In this embodiment, the insulating layers 20a and 20b are dielectric layers, and the material thereof is prepreg or other known materials, and the thicknesses t of the insulating layers 20a and 20b are substantially equal.

所述之線路組合21係結合該基板本體20之該些絕緣層20a,20b上,例如,部分該線路組合21設於該些絕緣層20a,20b之間。 The circuit combination 21 is coupled to the insulating layers 20a, 20b of the substrate body 20. For example, a part of the circuit combination 21 is disposed between the insulating layers 20a, 20b.

於本實施例中,該線路組合21係具有相互電性連接之至少一被動線路21a、複數線路層21b以及複數導電盲孔21c,其中,該被動線路21a係包含電感線路L、電阻線路 (圖略)或電容線路C,且該些導電盲孔21c係設於該些絕緣層20a,20b中。例如,該電感線路L係具有螺旋線圈狀(如第1B圖所示),其線圈數可依需求設計。 In this embodiment, the line combination 21 has at least one passive line 21a, a plurality of line layers 21b, and a plurality of conductive blind holes 21c electrically connected to each other. The passive line 21a includes an inductance line L and a resistance line. (The figure is omitted) or the capacitor line C, and the conductive blind holes 21c are disposed in the insulating layers 20a and 20b. For example, the inductance line L has a spiral coil shape (as shown in FIG. 1B), and the number of coils can be designed according to requirements.

再者,關於電容線路C之電容耦合的數值(C)係與材料的介電係數(Dk=ε r)、被動線路21a之耦合極片的面積(A)及介電材料的厚度d有關,其關係式如下:C=ε r A/d Furthermore, the value (C) of the capacitive coupling of the capacitive line C is related to the dielectric constant (Dk = εr) of the material, the area (A) of the coupling pole piece of the passive line 21a, and the thickness d of the dielectric material, The relationship is as follows: C = ε r A / d

由上式可知,為維持一個電容線路的電容耦合量的條件下,只要增加介電材料的介電係數(Dk)或降低材料厚度d就能縮小面積A。 It can be known from the above formula that in order to maintain the capacitive coupling amount of a capacitor line, as long as the dielectric constant (Dk) of the dielectric material is increased or the material thickness d is decreased, the area A can be reduced.

因此,本實施例之基板結構2藉由該基板本體20之其中一該絕緣層20a係包含有一介電係數大於或等於6的高介電係數材料,而其它絕緣層20b係採用低介電係數材料,使該電感線路L或一般連接晶片的電氣線路維持形成在具低介電係數(low Dk)的絕緣層20b上,而須大量電容耦合的電容線路C則形成在具高介電係數(high Dk)的絕緣層20a上,不僅可維持原本的訊號品質,且可有效縮小該電容線路C之整體線路面積,亦不會影響同一絕緣層20a中之線路層21b之佈線空間,甚至可增加同一絕緣層20a中之線路層21b之佈線空間。 Therefore, in the substrate structure 2 of this embodiment, one of the insulating layers 20a of the substrate body 20 includes a high-dielectric constant material having a dielectric constant greater than or equal to 6, and the other insulating layers 20b adopt a low dielectric constant. Materials to keep the inductive line L or the electrical circuit generally connected to the chip to be formed on the insulating layer 20b with a low dielectric constant (low Dk), and the capacitive line C that requires a large amount of capacitive coupling is formed on a high dielectric constant ( high Dk) on the insulating layer 20a can not only maintain the original signal quality, but also effectively reduce the overall circuit area of the capacitor circuit C, and it will not affect the wiring space of the circuit layer 21b in the same insulating layer 20a, or even increase the The wiring space of the wiring layer 21b in the same insulating layer 20a.

具體地,若將Dk從原本的3.6增加至7.8,則該線路組合21之整體線路面積可縮小成原本總面積之80%,其中,該原本總面積係為該基板本體之絕緣層均為具低介電係數(low Dk)材料時該線路組合之整體線路面積。 Specifically, if Dk is increased from the original 3.6 to 7.8, the overall circuit area of the circuit combination 21 can be reduced to 80% of the original total area, where the original total area is the insulation layer of the substrate body. The overall circuit area of the circuit combination for low dielectric constant (low Dk) materials.

另該電阻線路可選擇設於具高介電係數或具低介電係數之絕緣層上。 In addition, the resistance line can be selected on an insulating layer having a high dielectric constant or a low dielectric constant.

第3A至3C圖係為本發明之基板結構3a,3b,3c之第二實施例的局部剖面示意圖。本實施例與第一實施例之差異在於絕緣層之層數,其它構造大致相同,故以下詳細說明相異處,而不再贅述相同處,特此述明。 3A to 3C are schematic partial cross-sectional views of the second embodiment of the substrate structures 3a, 3b, and 3c of the present invention. The difference between this embodiment and the first embodiment lies in the number of layers of the insulating layer, and the other structures are substantially the same. Therefore, the following detailed descriptions are different, and the same points are not repeated, and are hereby described.

如第3A圖所示,該基板本體30係包含三層之絕緣層30a,30b,30c,且中間絕緣層30b係為核心層,而位於該核心層上、下側之絕緣層30a,30c係為介電層。 As shown in FIG. 3A, the substrate body 30 includes three layers of insulating layers 30a, 30b, and 30c, and the intermediate insulating layer 30b is a core layer, and the insulating layers 30a and 30c located above and below the core layer are Is a dielectric layer.

於本實施例中,上側該絕緣層30a係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層30b,30c係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the insulating layer 30a on the upper side includes a high-dielectric-constant material having a dielectric constant greater than or equal to 6, and the other insulating layers 30b, 30c include a low-dielectric-constant material having a dielectric constant less than 6. .

再者,該核心層(即中間絕緣層30b)之厚度h係大於該些介電層(即其它絕緣層30a,30c)之厚度t。 Furthermore, the thickness h of the core layer (ie, the intermediate insulating layer 30b) is greater than the thickness t of the dielectric layers (ie, the other insulating layers 30a, 30c).

如第3B圖所示,該基板本體30’係包含三層之絕緣層30a,30b’,30c,且該些絕緣層30a,30b’,30c係為介電層。 As shown in FIG. 3B, the substrate body 30 'is composed of three insulating layers 30a, 30b', 30c, and the insulating layers 30a, 30b ', 30c are dielectric layers.

於本實施例中,該些絕緣層30a,30b’,30c之厚度t大致相等,且上側該絕緣層30a係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層30b’,30c係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the thicknesses t of the insulating layers 30a, 30b ', 30c are substantially equal, and the insulating layer 30a on the upper side includes a high-dielectric constant material with a dielectric constant greater than or equal to 6, and the other insulating layers 30b ', 30c series contains a low dielectric constant material with a dielectric constant less than 6.

如第3C圖所示,該基板本體30”係包含五層之絕緣層30a,30a’,30a”,30b’,30c,且該些絕緣層30a,30a’,30a”,30b’,30c係為介電層。 As shown in FIG. 3C, the substrate body 30 "is composed of five layers of insulating layers 30a, 30a ', 30a", 30b', 30c, and the insulating layers 30a, 30a ', 30a ", 30b', 30c are Is a dielectric layer.

於本實施例中,該些絕緣層30a,30a’,30a”,30b’,30c 之厚度t大致相等,且上側第二層之該絕緣層30a係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層30a’,30a”,30b’,30c係包含有一介電係數小於6的低介電係數材料,且該絕緣層30a夾設於兩該絕緣層30a’,30a”中。 In this embodiment, the insulating layers 30a, 30a ', 30a ", 30b', 30c The thickness t is approximately the same, and the insulating layer 30a of the upper second layer contains a high dielectric constant material having a dielectric constant greater than or equal to 6, while the other insulating layers 30a ', 30a ", 30b', 30c contain There is a low-dielectric-constant material having a dielectric constant less than 6, and the insulating layer 30a is sandwiched between the two insulating layers 30a ', 30a ".

如第3A至3C圖所示,該些絕緣層30a,30a’,30a”,30b,30b’,30c依介電係數呈非平衡式層疊佈設,亦即中間絕緣層30b,30b’之上、下兩側的絕緣層30a,30a’,30a”,30c之介電係數之高低等級並不相等,即並非對稱分佈,且於前述該些絕緣層上係佈設有線路組合21。 As shown in Figures 3A to 3C, the insulating layers 30a, 30a ', 30a ", 30b, 30b', and 30c are laid out in an unbalanced manner according to the dielectric coefficient, that is, above the intermediate insulating layers 30b, 30b ' The levels of the dielectric coefficients of the insulating layers 30a, 30a ', 30a ", 30c on the lower sides are not equal, that is, they are not symmetrically distributed, and a circuit combination 21 is arranged on the insulating layers.

第4A至4C圖係為本發明之基板結構4a,4b,4c之第三實施例的局部剖面示意圖。本實施例與第二實施例之差異在於該些絕緣層之層疊佈設方式,其它構造大致相同,故以下詳細說明相異處,而不再贅述相同處,特此述明。 4A to 4C are schematic partial cross-sectional views of the third embodiment of the substrate structures 4a, 4b, and 4c of the present invention. The difference between this embodiment and the second embodiment lies in the lamination layout of the insulating layers, and other structures are substantially the same. Therefore, the following detailed description of the differences will not be repeated, and it is hereby described.

如第4A圖所示,該基板本體40係包含三層之絕緣層40a,40b,40c,且中間絕緣層40b係為核心層,而位於該核心層上、下側之絕緣層40a,40c係為介電層。 As shown in FIG. 4A, the substrate body 40 includes three layers of insulating layers 40a, 40b, and 40c, and the intermediate insulating layer 40b is a core layer, and the insulating layers 40a and 40c located above and below the core layer are Is a dielectric layer.

於本實施例中,上、下側該絕緣層40a,40c係包含有一介電係數大於或等於6的高介電係數材料,而中間該絕緣層40b係包含有一介電係數小於6的低介電係數材料,使該些絕緣層40a,40b,40c依介電常數呈平衡式層疊佈設,亦即中間絕緣層40b之上、下兩側的絕緣層40a,40c之介電係數之高低等級呈對稱分佈。 In this embodiment, the upper and lower sides of the insulating layer 40a, 40c include a high-dielectric constant material having a dielectric constant greater than or equal to 6, and the middle of the insulating layer 40b includes a low dielectric constant of a dielectric constant less than 6. The electric coefficient material makes these insulating layers 40a, 40b, and 40c be stacked in a balanced manner according to the dielectric constant, that is, the high and low levels of the dielectric coefficients of the insulating layers 40a and 40c on the upper and lower sides of the intermediate insulating layer 40b are shown. Symmetrical distribution.

應可理解地,雖然上、下兩側的絕緣層40a,40c均包含有一介電係數大於或等於6的高介電係數材料,但兩者的介電係數可為相同或不相同。 It should be understood that although the insulating layers 40a and 40c on the upper and lower sides each include a high dielectric constant material having a dielectric constant greater than or equal to 6, the dielectric constants of the two may be the same or different.

如第4B圖所示,該基板本體40’係包含三層之絕緣層40a,40b’,40c,且該些絕緣層40a,40b’,40c係為介電層。 As shown in FIG. 4B, the substrate body 40 'is composed of three insulating layers 40a, 40b', and 40c, and the insulating layers 40a, 40b ', and 40c are dielectric layers.

於本實施例中,上、下側該絕緣層40a,40c係包含有一介電係數大於或等於6的高介電係數材料,而中間該絕緣層40b’係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the insulating layers 40a and 40c on the upper and lower sides include a high-dielectric constant material having a dielectric constant greater than or equal to 6, and the insulating layer 40b 'on the middle side includes a low dielectric constant less than 6. Dielectric constant material.

如第4C圖所示,該基板本體40”係包含五層之絕緣層40a’,40b’,40b”,40c,且該些絕緣層40a’,40b’,40b”,40c係為介電層。 As shown in FIG. 4C, the substrate body 40 "includes five layers of insulating layers 40a ', 40b', 40b", and 40c, and the insulating layers 40a ', 40b', 40b ", and 40c are dielectric layers. .

於本實施例中,中間該絕緣層40b”係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層40a’,40b’,40c係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the insulating layer 40b "in the middle includes a high-dielectric-constant material with a dielectric constant greater than or equal to 6, and the other insulating layers 40a ', 40b', and 40c include a dielectric with a dielectric constant less than 6. Low dielectric constant material.

應可理解地,雖然上、下兩側的絕緣層40a’,40b’,40c均包含有一介電係數小於6的低介電係數材料,但各層的介電係數可為相同或不相同。 It should be understood that although the insulating layers 40a ', 40b', and 40c on the upper and lower sides each include a low-dielectric constant material having a dielectric constant less than 6, the dielectric constants of the layers may be the same or different.

因此,如第4A至4C圖所示,該些絕緣層40a,40a’,40b,40b’,40b”,40c依介電係數呈平衡式層疊佈設,亦即中間絕緣層40b,40b’,40b”之上、下兩側的絕緣層40a,40a’,40b’,40c之介電係數之高低等級呈對稱分佈,且於前述該些絕緣層上係佈設有線路組合21。 Therefore, as shown in FIGS. 4A to 4C, the insulating layers 40a, 40a ', 40b, 40b', 40b ", 40c are laid out in a balanced manner according to the dielectric constant, that is, the intermediate insulating layers 40b, 40b ', 40b. The dielectric layers of the upper and lower insulating layers 40a, 40a ', 40b', and 40c are symmetrically distributed, and a circuit set 21 is arranged on the insulating layers.

第5A至5C圖係為本發明之基板結構5a,5b,5c之第四 實施例的局部剖面示意圖。本實施例與第三實施例之差異在於平衡式層疊佈設之變化,其它構造大致相同,故以下詳細說明相異處,而不再贅述相同處,特此述明。 Figures 5A to 5C are the fourth of the substrate structures 5a, 5b, and 5c of the present invention. A schematic partial cross-sectional view of the embodiment. The difference between this embodiment and the third embodiment lies in the change of the balanced lamination layout, and other structures are substantially the same, so the following detailed description of the differences will not be repeated, and it is hereby described.

如第5A圖所示,該基板本體50係包含三層之絕緣層50a,50b,50c,且中間絕緣層50b係為核心層,而位於該核心層上、下側之絕緣層50a,50c係為介電層。 As shown in FIG. 5A, the substrate body 50 includes three layers of insulating layers 50a, 50b, and 50c, and the intermediate insulating layer 50b is a core layer, and the insulating layers 50a and 50c located above and below the core layer are Is a dielectric layer.

於本實施例中,中間該絕緣層50b係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層50a,50c係包含有一介電係數小於6的低介電係數材料,使該些絕緣層50a,50b,50c依介電常數呈平衡式層疊佈設。 In this embodiment, the insulating layer 50b in the middle contains a high-dielectric-constant material having a dielectric constant greater than or equal to 6, and the other insulating layers 50a, 50c include a low-dielectric-constant material having a dielectric constant smaller than 6. The insulating layers 50a, 50b, and 50c are laid out in a balanced manner according to the dielectric constant.

應可理解地,雖然上、下兩側的絕緣層50a,50c均包含有一介電係數小於6的低介電係數材料,但兩者的介電係數可為相同或不相同。 It should be understood that although the insulating layers 50a and 50c on the upper and lower sides each include a low-dielectric-constant material with a dielectric constant less than 6, the dielectric constants of the two may be the same or different.

如第5B圖所示,該基板本體50’係包含三層之絕緣層50a,50b’,50c,且該些絕緣層50a,50b’,50c係為介電層。 As shown in FIG. 5B, the substrate body 50 'is composed of three insulating layers 50a, 50b', 50c, and the insulating layers 50a, 50b ', 50c are dielectric layers.

於本實施例中,中間該絕緣層50b’係包含有一介電係數大於或等於6的高介電係數材料,而上、下側該絕緣層50a,50c係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the insulating layer 50b ′ in the middle contains a high-dielectric-constant material with a dielectric constant greater than or equal to 6, and the insulating layers 50a and 50c on the upper and lower sides contain a low-dielectric constant less than 6. Dielectric constant material.

如第5C圖所示,該基板本體50”係包含七層之絕緣層50a,50a’,50b”,50c,50c’,且該些絕緣層50a,50a’,50b”,50c,50c’係為介電層。 As shown in FIG. 5C, the substrate body 50 "includes seven layers of insulating layers 50a, 50a ', 50b", 50c, 50c', and the insulating layers 50a, 50a ', 50b ", 50c, 50c' are Is a dielectric layer.

於本實施例中,上側第二層該絕緣層50a’與下側第二層該絕緣層50c’係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層50a,50b”,50c係包含有 一介電係數小於6的低介電係數材料。 In this embodiment, the upper second insulating layer 50a 'and the lower second insulating layer 50c' include a high dielectric constant material having a dielectric constant greater than or equal to 6, and other insulating layers 50a, "50b", 50c include A low dielectric constant material with a dielectric constant less than 6.

應可理解地,上、下兩側的絕緣層50a,50a’,50c,50c’之介電係數之高低等級呈對稱分佈,但兩側之各層的介電係數可為相同或不相同。 It should be understood that the levels of the dielectric coefficients of the insulating layers 50a, 50a ', 50c, 50c' on the upper and lower sides are symmetrically distributed, but the dielectric coefficients of the layers on both sides may be the same or different.

因此,如第5A至5C圖所示,該些絕緣層50a,50a’,50b,50b’,50b”,50c,50c’依介電係數呈平衡式層疊佈設,亦即中間絕緣層50b,50b’,50b”之上、下兩側的絕緣層50a,50a’,50c,50c’之介電係數之高低等級呈對稱分佈,且於前述該些絕緣層上係佈設有線路組合21。 Therefore, as shown in Figures 5A to 5C, the insulating layers 50a, 50a ', 50b, 50b', 50b ", 50c, 50c 'are laid out in a balanced manner according to the dielectric constant, that is, the intermediate insulating layers 50b, 50b The insulation layers 50a, 50a ', 50c, and 50c' on the upper and lower sides of the ', 50b' are symmetrically distributed in the high and low levels, and a circuit combination 21 is arranged on the insulation layers.

第6A至6B圖係為本發明之基板結構6a,6b之第五實施例的示意圖。本實施例與第一實施例之差異在於絕緣層之層數,其它構造大致相同,故以下詳細說明相異處,而不再贅述相同處,特此述明。 6A to 6B are schematic views of a fifth embodiment of the substrate structures 6a and 6b of the present invention. The difference between this embodiment and the first embodiment lies in the number of layers of the insulating layer, and the other structures are substantially the same. Therefore, the following detailed descriptions are different, and the same points are not repeated, and are hereby described.

如第6A圖所示,該基板本體60係包含三層之絕緣層60a,60b,60c,且中間絕緣層60b係為核心層,而位於該核心層上、下側之絕緣層60a,60c係為介電層。 As shown in FIG. 6A, the substrate body 60 is composed of three insulating layers 60a, 60b, and 60c, and the intermediate insulating layer 60b is a core layer, and the insulating layers 60a, 60c are located above and below the core layer. Is a dielectric layer.

於本實施例中,上側該絕緣層60a係包含有一介電係數大於或等於6的高介電係數材料,而其它該絕緣層60b,60c係包含有一介電係數小於6的低介電係數材料。 In this embodiment, the insulating layer 60a on the upper side includes a high-dielectric-constant material having a dielectric constant greater than or equal to 6, and the other insulating layers 60b, 60c include a low-dielectric-constant material having a dielectric constant less than 6. .

再者,該核心層(即中間絕緣層60b)之厚度h係大於該些介電層(即其它絕緣層60a,60c)之厚度t。或者,如第6B圖所示之基板本體60’,含有該高介電係數材料的該絕緣層60a’的厚度r係小於其它該絕緣層60b,60c的厚度t,h(即r<t<h)。 Furthermore, the thickness h of the core layer (ie, the intermediate insulating layer 60b) is greater than the thickness t of the dielectric layers (ie, the other insulating layers 60a, 60c). Alternatively, as shown in FIG. 6B, the thickness r of the insulating layer 60a 'containing the high dielectric constant material is smaller than the thicknesses t, h of the other insulating layers 60b, 60c (i.e., r <t < h).

由上述公式可知,為維持一電路的電容耦合量的條件下,只要增加介電材料的Dk或降低介電材料厚度就能實現縮小電路面積的功效。因此,第6B圖所示之基板結構6’藉由該基板本體60’之其中一該絕緣層60a’係包含有一介電係數大於或等於6的高介電係數材料,且該絕緣層60a’的厚度r係小於其它該絕緣層60b,60c的厚度t,h,使該電容線路C形成在該絕緣層60a’上,不僅可維持原本的訊號品質,且可有效縮小該電容線路C之整體線路面積,亦不會影響同一絕緣層60a’中之線路層21b之佈線空間,甚至可增加同一絕緣層60a’中之線路層21b之佈線空間。 It can be known from the above formula that, in order to maintain the capacitive coupling amount of a circuit, as long as the Dk of the dielectric material is increased or the thickness of the dielectric material is decreased, the effect of reducing the circuit area can be achieved. Therefore, in the substrate structure 6 'shown in FIG. 6B, one of the insulating layers 60a' of the substrate body 60 'includes a high dielectric constant material having a dielectric constant greater than or equal to 6, and the insulating layer 60a' The thickness r is smaller than the thicknesses t and h of the other insulating layers 60b and 60c, so that the capacitor circuit C is formed on the insulating layer 60a ', which can not only maintain the original signal quality, but also effectively reduce the entirety of the capacitor circuit C. The circuit area will not affect the wiring space of the wiring layer 21b in the same insulating layer 60a ', and may even increase the wiring space of the wiring layer 21b in the same insulating layer 60a'.

具體地,若將Dk從原本的3.6增加至7.8,且降低該絕緣層的厚度,則該線路組合21之整體線路面積可縮小成原本總面積之70%,其中,該原本總面積係為該基板本體之絕緣層均為low Dk時該線路組合之整體線路面積。 Specifically, if Dk is increased from the original 3.6 to 7.8, and the thickness of the insulation layer is reduced, the overall circuit area of the circuit combination 21 can be reduced to 70% of the original total area, where the original total area is the The overall circuit area of the circuit combination when the insulation layers of the substrate body are all low Dk.

綜上所述,本發明之基板結構係藉由將該基板本體中之部分絕緣層改為高介電係數材料,其餘絕緣層維持低介電係數材料,並令電感線路或線路層位於該低介電係數材料的絕緣層上,而需要大量電容耦合的被動線路則形成於該高介電係數材料的絕緣層上,因而不僅能維持原本的訊號品質,且同時能有效縮小該線路組合之整體線路面積,進而降低成本。 In summary, the substrate structure of the present invention is to change a part of the insulating layer in the substrate body to a high-dielectric-constant material, and the remaining insulating layer to maintain a low-dielectric-constant material, and the inductance circuit or the circuit layer should be located at the low-level On the insulating layer of the dielectric constant material, passive circuits that require a large amount of capacitive coupling are formed on the insulating layer of the high dielectric constant material, so not only can it maintain the original signal quality, but it can also effectively reduce the overall size of the circuit combination. Circuit area, thereby reducing costs.

再者,將該高介電係數材料之絕緣層減少厚度可進一步縮小該線路組合之整體線路面積。 Furthermore, reducing the thickness of the insulating layer of the high-dielectric constant material can further reduce the overall circuit area of the circuit combination.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to exemplify the principle of the present invention and its effects, but not to limit the present invention. Anyone skilled in the art can modify the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of patent application described later.

Claims (10)

一種基板結構,係包括:基板本體,係包含複數相互堆疊之絕緣層,其中,至少一該絕緣層之材料係為高介電係數材料,至少一該絕緣層之材料係為低介電係數材料,其中,具高介電係數材料之絕緣層的厚度係小於其它絕緣層的厚度;以及線路組合,係包含被動線路並結合至該基板本體。A substrate structure includes a substrate body including a plurality of insulating layers stacked on each other, wherein at least one material of the insulating layer is a high dielectric constant material, and at least one of the insulating layer is a low dielectric constant material. Among them, the thickness of the insulating layer of the material with high dielectric constant is smaller than the thickness of other insulating layers; and the circuit combination includes passive lines and is coupled to the substrate body. 如申請專利範圍第1項所述之基板結構,其中,該高介電係數材料之介電係數大於或等於6,且該低介電係數材料之介電係數小於6。The substrate structure according to item 1 of the scope of patent application, wherein the dielectric constant of the high dielectric constant material is greater than or equal to 6, and the dielectric constant of the low dielectric constant material is less than 6. 如申請專利範圍第1項所述之基板結構,其中,該被動線路係包含一電容線路,係結合至具高介電係數材料之絕緣層上。The substrate structure according to item 1 of the scope of the patent application, wherein the passive circuit comprises a capacitor circuit which is coupled to the insulating layer of a material with a high dielectric constant. 如申請專利範圍第1項所述之基板結構,其中,該被動線路係包含一電感線路,係結合至具低介電係數材料之絕緣層上。The substrate structure according to item 1 of the scope of the patent application, wherein the passive circuit comprises an inductive circuit, which is coupled to the insulating layer of a material with a low dielectric constant. 如申請專利範圍第1項所述之基板結構,其中,該被動線路係包含一電阻線路,係結合至具低介電係數材料或具高介電係數材料之絕緣層上。The substrate structure according to item 1 of the scope of the patent application, wherein the passive circuit comprises a resistance circuit which is bonded to the insulating layer of a material with a low dielectric constant or a material with a high dielectric constant. 如申請專利範圍第1項所述之基板結構,其中,該線路組合復包含線路層,係結合至具低介電係數材料之絕緣層上。The substrate structure according to item 1 of the scope of the patent application, wherein the circuit combination includes a circuit layer, which is bonded to the insulating layer of a material with a low dielectric constant. 如申請專利範圍第1項所述之基板結構,其中,該複數相互堆疊之絕緣層之中間位置係為一核心層。The substrate structure according to item 1 of the scope of patent application, wherein the middle position of the plurality of insulating layers stacked on each other is a core layer. 如申請專利範圍第1項所述之基板結構,其中,該複數相互堆疊之絕緣層依介電係數呈非對稱式層疊佈設。The substrate structure according to item 1 of the scope of the patent application, wherein the plurality of insulating layers stacked on each other are laid out in an asymmetrical manner according to a dielectric coefficient. 如申請專利範圍第1項所述之基板結構,其中,該複數相互堆疊之絕緣層依介電係數呈對稱式層疊佈設。The substrate structure according to item 1 of the scope of the patent application, wherein the plurality of insulating layers stacked on each other are symmetrically stacked according to the dielectric constant. 如申請專利範圍第1項所述之基板結構,其中,該被動線路係包含電感線路、電阻線路或電容線路之至少其中一者。The substrate structure according to item 1 of the scope of patent application, wherein the passive circuit includes at least one of an inductive circuit, a resistive circuit or a capacitive circuit.
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TW200727445A (en) * 2006-01-13 2007-07-16 Ind Tech Res Inst Multi-functional substrate structure
CN101836518A (en) * 2007-09-28 2010-09-15 双信电机株式会社 Ceramic multilayer substrate
TW201344865A (en) * 2012-04-26 2013-11-01 Subtron Technology Co Ltd Package carrier
TW201631731A (en) * 2015-02-17 2016-09-01 矽品精密工業股份有限公司 Substrate structure

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Publication number Priority date Publication date Assignee Title
TW200727445A (en) * 2006-01-13 2007-07-16 Ind Tech Res Inst Multi-functional substrate structure
CN101836518A (en) * 2007-09-28 2010-09-15 双信电机株式会社 Ceramic multilayer substrate
TW201344865A (en) * 2012-04-26 2013-11-01 Subtron Technology Co Ltd Package carrier
TW201631731A (en) * 2015-02-17 2016-09-01 矽品精密工業股份有限公司 Substrate structure

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