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TWI624905B - Multi-die press - Google Patents

Multi-die press Download PDF

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Publication number
TWI624905B
TWI624905B TW106102295A TW106102295A TWI624905B TW I624905 B TWI624905 B TW I624905B TW 106102295 A TW106102295 A TW 106102295A TW 106102295 A TW106102295 A TW 106102295A TW I624905 B TWI624905 B TW I624905B
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Taiwan
Prior art keywords
unit
suction
suction head
substrate
rotating table
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TW106102295A
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Chinese (zh)
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TW201828407A (en
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Yan-Pei Dai
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Priority to TW106102295A priority Critical patent/TWI624905B/en
Priority to CN201710675708.0A priority patent/CN108340038A/en
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Publication of TWI624905B publication Critical patent/TWI624905B/en
Publication of TW201828407A publication Critical patent/TW201828407A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K3/00Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K3/00Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
    • B23K3/08Auxiliary devices therefor
    • B23K3/087Soldering or brazing jigs, fixtures or clamping means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/857Interconnections, e.g. lead-frames, bond wires or solder balls

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)

Abstract

一種多晶粒壓合機,包括:基板、水平移動載台及龍門支架,該水平移動載台安裝於該基座上,能於水平方向精密移動,該水平移動載台上另安裝著能獨立旋轉的三個晶粒旋轉台及一基板旋轉台;該龍門支架樹立於該基座,且不干涉該水平移動載台的移動,該龍門支架安裝著一升降機構,該升降機構能控制位於其底部之吸取頭的升降,該吸取頭由下而上至少包括一吸取單元及一旋轉單元;藉由該水平移動載台精準地在不同時間移動該晶粒旋轉台或該基板旋轉台於該吸取頭下方,由該升降機構適時控制該吸取頭下降,讓該吸取頭一次吸取該晶粒旋轉台上的複數顆微型晶粒,或是將該複數微型晶粒加壓安裝於該基板旋轉台上的接收基板。A multi-die press machine comprises: a substrate, a horizontal moving stage and a gantry bracket, wherein the horizontal moving stage is mounted on the base, and can be precisely moved in a horizontal direction, and the horizontal moving stage is additionally mounted independently a rotating three-grain rotating table and a substrate rotating table; the gantry bracket is erected on the base and does not interfere with the movement of the horizontal moving stage, the gantry bracket is mounted with a lifting mechanism, and the lifting mechanism can be controlled Lifting and lowering of the suction head at the bottom, the suction head includes at least one suction unit and a rotating unit from bottom to top; and the horizontal rotating stage accurately moves the die rotating table or the substrate rotating table at different times for the suction Under the head, the lifting mechanism timely controls the suction head to descend, allowing the suction head to suck a plurality of micro-grains on the crystal rotating table at a time, or pressurizing the plurality of micro-grains on the substrate rotating table. Receiving substrate.

Description

多晶粒壓合機Multi-die pressing machine

本發明為一種多晶粒壓合機的技術領域,尤其指一種在微米間距的條件下,一次進行吸取大量微型晶粒及進行加壓焊接作業的設計。The invention relates to the technical field of a multi-grain pressing machine, in particular to a design for extracting a large number of micro-grains and performing a pressure welding operation at a time under the condition of a micron pitch.

LED元件為目前運用最為廣泛的發光元件,若將RGB三種不同波長的LED擺放在一起,透過光強度控制各LED發光強度,就能發出各種顏色的光。目前戶外或是室內大型LED看板,它就是以RGB三色組成一顆發光源(尺寸約2~4mm),複數發光源以間距(約5~15mm)的陣列方式分佈擺放,就可製作出大型遠距離觀看的銀幕。當單元面積內分佈數目愈多的發光源,解析度也愈高。LED elements are currently the most widely used light-emitting elements. If three different wavelengths of RGB LEDs are placed together and the light intensity of each LED is controlled by the light intensity, various colors of light can be emitted. At present, large-scale LED signboards for outdoor or indoor use are composed of three colors of RGB to form a light source (about 2 ~ 4mm in size), and a plurality of light sources are arranged in an array with a pitch (about 5 ~ 15mm) to produce Large screen for long distance viewing. As more light sources are distributed within the cell area, the higher the resolution.

同理若將微尺寸(約0.01~0.1mm)的RGB 微型LED晶粒組裝在一起,形成約0.05~0.25mm的發光源,複數發光源以間距(約0.05~0.5mm)的陣列方式分佈擺放,就可形成高解析度的LED銀幕。例如50吋電視4k掃描線的解析度間距為1000mm/4000=0.25mm,因此間距0.1mm的解析度會比4k*2k電視解析度更高。可適用於製作穿戴裝置顯示器、VR顯示器…等各種特殊顯示器應用上。Similarly, if micro-sized (about 0.01 ~ 0.1mm) RGB micro LED dies are assembled together to form a light source of about 0.05 ~ 0.25mm, a plurality of light sources are distributed in an array manner with a pitch (about 0.05 ~ 0.5mm). It can form a high-resolution LED screen. For example, the resolution pitch of 4k scan lines for a 50-inch TV is 1000mm / 4000 = 0.25mm, so the resolution of a pitch of 0.1mm will be higher than that of a 4k * 2k TV. It can be applied to various special display applications such as wearable device displays, VR displays, etc.

但是如何將0.01mm~0.1mm小尺寸的LED微型晶粒,以RGB三色擺放到銀幕基板上並將每顆LED微型晶粒的正負極焊接起來,是目前LED業界共用遭遇到的技術瓶頸。例如4K電視,一個50吋銀幕上面採用0.05mm尺寸的發光源,就需要超過上億顆RGB的LED微型晶粒,若採用一顆顆焊接的加工方式,效率差且沒有商業利益存在的。因此目前廠商皆不斷開發各式設備,以期該設備能一次進行100~10000顆微型晶粒的吸取及焊接作業。However, how to place small LED microchips with a size of 0.01mm ~ 0.1mm on the screen substrate in RGB three colors and weld the positive and negative electrodes of each LED microchip is a technical bottleneck encountered by the LED industry at present. . For example, in a 4K TV, a light source with a size of 0.05mm on a 50-inch screen requires more than 100 million RGB LED micro-dies. If one welding process is used, the efficiency is poor and there are no commercial benefits. Therefore, manufacturers are constantly developing various types of equipment in the hope that the equipment can perform the extraction and welding of 100 to 10,000 micro-grains at a time.

本發明之主要目的係提供一種多晶粒壓合機,主要是提供一種一次能吸取100~10000顆LED微型晶粒,並移載至具有正負極接線及線路的接收基板上,該接收基板可為顯示器基板或照明基板等,然後將微型晶粒準確地定位壓下並以高溫將晶粒焊接於接收基板上。The main purpose of the present invention is to provide a multi-die pressing machine, which is mainly to provide a LED chip that can absorb 100 ~ 10000 LED micro-dies at a time and transfer it to a receiving substrate with positive and negative wiring and lines. For a display substrate or a lighting substrate, etc., the micro crystal grains are accurately positioned and pressed, and the crystal grains are soldered to the receiving substrate at a high temperature.

為達上述之目的,本發明包括:基板、水平移動載台及龍門支架,該水平移動載台安裝於該基座上,能於水平方向精密移動,該水平移動載台上另安裝著能獨立旋轉的三個晶粒旋轉台及一基板旋轉台;該龍門支架樹立於該基座,且不干涉該水平移動載台的移動,該龍門支架安裝著一升降機構,該升降機構能控制一吸取頭的升降,該吸取頭由下而上至少包括一吸取單元及一旋轉單元;藉由該水平移動載台精準地在不同時間移動該晶粒旋轉台或該基板旋轉台於該吸取頭下方,由該升降機構適時控制該吸取頭下降,讓該吸取頭一次吸取該晶粒旋轉台上的複數顆微型晶粒,或是將該複數微型晶粒加壓安裝於該基板旋轉台上的接收基板。To achieve the above object, the present invention includes: a base plate, a horizontal moving stage and a gantry bracket. The horizontal moving stage is mounted on the base and can be precisely moved in the horizontal direction. Rotating three die rotation stage and a substrate rotation stage; the gantry bracket stands on the base and does not interfere with the movement of the horizontal moving stage. The gantry bracket is equipped with a lifting mechanism which can control a suction The lifting of the head, the suction head from bottom to top includes at least a suction unit and a rotation unit; the horizontal movement stage accurately moves the die rotation stage or the substrate rotation stage under the suction head at different times, The lifting mechanism timely controls the suction head to descend, so that the suction head can suck a plurality of micro crystal grains on the crystal grain rotating table at one time, or press the plurality of micro crystal grains to a receiving substrate mounted on the substrate rotary table. .

由於本發明將微型晶粒以微米間距安裝於該接收基板上,為克服習用封裝設備排列元件的定位精度於10μm的限制,本發明水平位置的精度由該水平移動載台負責,目前該水平移動載台的精度可達奈米級,該升降機構僅負責該吸取頭的上升,因此即可滿足以微米間距將微型晶粒安裝於該接收基板的作業。Since the present invention mounts micro-dies on the receiving substrate at a micrometer pitch, in order to overcome the limitation of the positioning accuracy of the array elements of conventional packaging equipment to 10 μm, the accuracy of the horizontal position of the present invention is the responsibility of the horizontal moving stage. The accuracy of the stage can reach nanometer level, and the lifting mechanism is only responsible for the ascent of the suction head, so it can meet the operation of mounting micro-dies on the receiving substrate at a micron pitch.

再者,本發明之吸取頭進一步包括由下而上依序結合的吸取單元、加熱單元、隔熱單元及旋轉單元,利用該吸取單元能一次吸取數目眾多的微型晶粒,而在另一個下降時機,該加熱單元則能適時加熱,進而使熱能經該吸取單元傳導至該微型晶粒處,以完成熔焊於接收基板的目的,為一種創新實用的特殊吸取頭設計。Furthermore, the suction head of the present invention further includes a suction unit, a heating unit, a heat insulation unit, and a rotation unit which are sequentially combined from bottom to top, and the suction unit can suck a large number of micro crystal grains at a time, and drop in another one. At the right time, the heating unit can heat in a timely manner, so that the heat energy is transmitted to the micro crystal grains through the suction unit to complete the purpose of welding to the receiving substrate, which is an innovative and practical special suction head design.

以下配合圖式及元件符號對本發明之實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The following describes the embodiments of the present invention in more detail with reference to the drawings and component symbols, so that those skilled in the art can implement them after studying this specification.

本發明實施例為描述多晶粒壓合機,在各種實施例中,是以簡單示意的參考圖式進行描述,圖式中構件皆以簡單方塊呈現其所在位置及其空間型態,並未將各構件之詳細機構、機器及結構具體繪出,此類構件是運用目前實際機台即可具體實現之,但不因此限縮其範圍。本所所使用之術語「微型」晶粒,是根據本發明實施例之某些元件或結構之描述性大小,參考尺寸範圍於5μm至200μm。接收基板是用以供該微型晶粒採陣列式排列安裝其上,該接收基板是指用於顯示器銀幕之基板。The embodiments of the present invention describe a multi-die pressing machine. In various embodiments, they are described with reference to schematic diagrams. The components in the diagrams are shown in simple blocks in their positions and their spatial patterns. The detailed mechanism, machine and structure of each component are specifically drawn. Such components can be realized concretely using the current actual machine, but the scope is not limited. The term "micro" grains used in this study is a descriptive size of certain elements or structures according to embodiments of the present invention, and the reference size ranges from 5 μm to 200 μm. The receiving substrate is used for mounting the micro-dies in an array arrangement. The receiving substrate refers to a substrate for a display screen.

如圖1及圖2所示,分別為本發明側面結構示意圖以及基座俯視狀態的示意圖。本發明多晶粒壓合機,包括:基座1、水平移動載台2及龍門支架3。該水平移動載台2安裝於該基座1上,其上承載著能獨立旋轉的三個晶粒旋轉台21、22、22及一基板旋轉台24。該龍門支架3橫跨架設於基座1上方,安裝著一升降機構31,該升降機構31能控制一吸取頭4的升降。藉此利用該水平移動載台2精準地移動調整各旋轉台的位置,配合該吸取頭4適時升降,讓微型晶粒得依序被吸取上升、等待、下降、加壓加熱而焊接固定。由於本發明之架構能精準地控制各構件的位置,一次完成100~1000顆晶粒的焊接作業,在微米間距的條件下,滿足於該接收基板上完成千萬顆或億顆微型晶粒的焊接固定作業。As shown in FIG. 1 and FIG. 2, it is a schematic diagram of a side structure and a plan view of a base of the present invention, respectively. The multi-die pressing machine of the present invention comprises: a base 1, a horizontal moving carrier 2 and a gantry bracket 3. The horizontal moving stage 2 is mounted on the base 1, and carries three die rotating stages 21, 22, 22 and a substrate rotating stage 24 that can rotate independently. The gantry bracket 3 is erected above the base 1, and a lifting mechanism 31 is installed. The lifting mechanism 31 can control the lifting of a suction head 4. In this way, the horizontal moving stage 2 is used to accurately move and adjust the position of each rotary table, and the suction head 4 is raised and lowered in time, so that the micro crystal grains can be sequentially picked up, waited, lowered, and heated by pressure to be fixed. Because the structure of the present invention can accurately control the position of each component, the welding operation of 100 to 1000 grains can be completed at one time. Under the condition of micron pitch, it is satisfied to complete the tens or millions of micro grains on the receiving substrate. Welding and fixing operations.

接著就各構件的運作方式及結構作一說明:Then explain the operation mode and structure of each component:

該基座1為一花岡岩平台,確保機台精密不受微震影響。The base 1 is a Huagangyan platform to ensure that the machine is not affected by microseisms.

水平移動載台2安裝於該基座1上,能於水平(X-Y軸)方向作精準地移動。該水平移動載台2上另安裝著能獨立旋轉的三個晶粒旋轉台21、22、23及一基板旋轉台24。該晶粒旋轉台21、22、23能精準地控制其旋轉角度,分別用以承載著三個晶粒載盤(圖中並未畫出),三個晶粒載盤分別放置著紅光微型晶粒、綠光微型晶粒、以及藍光微型晶粒。本發明是利用該晶粒旋轉台21、22、23可精準旋轉的特性,進一步校正其所在方位。該基板旋轉台24亦能精準地控制其旋轉角度,用以承載該接收基板(圖中並未畫出),該接收基板是供放置不同顏色的微型晶粒。在本實施例中,移動載台、旋轉台的皆為高精密度機台,為業界常用機台,故不再詳加描述。另外該水平移動載台2另安裝著一第一對位鏡頭組25,該第一對位鏡頭組25是朝上方向置拍攝,用以拍攝該吸取頭4的影像,透過內部軟體的運作分析,進而驅動該吸取頭4旋轉,以校正其位置。The horizontal moving stage 2 is mounted on the base 1 and can accurately move in the horizontal (X-Y axis) direction. The horizontal moving stage 2 is also mounted with three die rotating tables 21, 22, 23 and a substrate rotating table 24 which can rotate independently. The die rotation stage 21, 22, 23 can precisely control its rotation angle, and is used to carry three die carriers (not shown), and the three die carriers are respectively placed with red light micro Die, green micro-die, and blue micro-die. The present invention utilizes the characteristic that the crystal grain rotary table 21, 22, 23 can rotate accurately to further correct its orientation. The substrate rotating table 24 can also precisely control its rotation angle to carry the receiving substrate (not shown in the figure). The receiving substrate is used for placing miniature crystal grains of different colors. In this embodiment, both the mobile stage and the rotary stage are high-precision machines, which are commonly used in the industry, so they will not be described in detail. In addition, the horizontal moving stage 2 is also installed with a first alignment lens group 25. The first alignment lens group 25 is photographed in an upward direction, for capturing an image of the suction head 4, and analyzing the operation through internal software. Then, the suction head 4 is driven to rotate to correct its position.

該龍門支架3為ㄇ字型,採橫跨架設於該基座1上方,且不干涉到該水平移動載台2的移動。該龍門支架3中央位置安裝著該升降機構31,該升降機構31用以能控制位於其底部之吸取頭4的升降。該吸取頭4具有兩種功能:一、為一次精準地吸取100~1000顆微型晶粒,二、再次下降過程中,得進行加壓、加熱焊接作業。另外該龍門支架3另安裝著一第二對位鏡頭組33,該第二對位鏡頭組33是朝下方拍攝,當該晶粒旋轉台21、22、23或該基板旋轉台24被該水平移動載台2移動至下方位置時,由該第二對位鏡頭組33拍攝其影像,透過內部軟體的運作及分析,進而驅動該晶粒旋轉台21、22、23或該基板旋轉台24旋轉,以校正其位置,接著進行原點對位並予以電腦紀錄原點位置。The gantry bracket 3 is a U-shaped, and is erected over the base 1 without interfering with the movement of the horizontal moving platform 2. A lifting mechanism 31 is installed at the center of the gantry bracket 3, and the lifting mechanism 31 is used to control the lifting of the suction head 4 located at the bottom thereof. The suction head 4 has two functions: one is to accurately suck 100 to 1000 micro-grains at one time, and the second is to perform pressure and heating welding operations during the lowering process. In addition, the gantry bracket 3 is additionally equipped with a second alignment lens group 33. The second alignment lens group 33 is photographed downward. When the die rotation table 21, 22, 23 or the substrate rotation table 24 is horizontally When the moving stage 2 moves to the lower position, the image is captured by the second alignment lens group 33, and the operation and analysis of the internal software drive the die rotation stage 21, 22, 23 or the substrate rotation stage 24 to rotate. To correct its position, then align the origin and record the origin position by computer.

如圖3所示,為本發明第一實施例之吸取頭的側面結構示意圖。該吸取頭4包括由上而下依序結合的一旋轉單元41、一隔熱單元42、一加熱單元43、以及一吸取單元44。該旋轉單元41為一高精密度的旋轉軸,進而控制該吸取單元44的方位。該隔熱單元42包括由上而下連的一冷卻盤421及一隔熱層422,該隔熱層422由熱傳導係數差的材料所構成,避免熱能向上傳遞。該冷卻盤421另外連接一冷卻管路(圖中未畫出),使該冷卻盤421具有降溫的效果,避免影響該旋轉單元41的運轉。該加熱單元43用以快速提升該吸取單元44的溫度,以利微型晶粒焊接作業的進行。該加熱單元43的加熱方式包括接觸式加熱及非接觸式加熱。接觸式加熱係於該加熱單元43內部填設一電熱裝置(圖中未畫出),內部其餘部份皆為傳熱性佳的金屬所構成,藉此快速升溫。而非接觸式加熱則進一步包括一雷射發射單元45(如圖4所示),該加熱單元43對應該雷射發射單元45位置處具有一盲孔431,該盲孔431的孔底是位於該加熱單元43的中心位置,透過該雷射發射單元45發射特定波長的光源於盲孔431內,使得該加熱單元43得快速升溫,此種方式的升溫效率較快。由於該吸取單元44與該加熱單元43是結合在一起,當該加熱單元43溫度快速升高時,該吸取單元4亦會同步升高。As shown in FIG. 3, it is a schematic side structural diagram of a suction head according to the first embodiment of the present invention. The suction head 4 includes a rotation unit 41, a heat insulation unit 42, a heating unit 43, and a suction unit 44 which are sequentially combined from top to bottom. The rotation unit 41 is a high-precision rotation axis, and further controls the orientation of the suction unit 44. The heat insulation unit 42 includes a cooling plate 421 and a heat insulation layer 422 connected from top to bottom. The heat insulation layer 422 is made of a material having a poor thermal conductivity coefficient to prevent heat energy from being transmitted upward. The cooling plate 421 is further connected with a cooling pipe (not shown in the figure), so that the cooling plate 421 has a cooling effect and avoids affecting the operation of the rotating unit 41. The heating unit 43 is used to quickly raise the temperature of the suction unit 44 to facilitate the micro-grain welding operation. The heating methods of the heating unit 43 include contact heating and non-contact heating. The contact heating system is equipped with an electric heating device (not shown in the figure) inside the heating unit 43, and the rest of the interior is made of a metal with good heat transfer properties, thereby rapidly heating up. The non-contact heating further includes a laser emission unit 45 (as shown in FIG. 4). The heating unit 43 has a blind hole 431 at a position corresponding to the laser emission unit 45. The bottom of the blind hole 431 is located at The central position of the heating unit 43 emits a light source with a specific wavelength into the blind hole 431 through the laser emitting unit 45, so that the heating unit 43 can quickly heat up, and the heating efficiency is faster in this way. Since the suction unit 44 and the heating unit 43 are combined together, when the temperature of the heating unit 43 increases rapidly, the suction unit 4 also rises simultaneously.

如圖3、4所示,該吸取單元44由下而上包括相連的一多孔吸盤441及一金屬壓頭442。如圖5、6所示,該多孔吸盤441內部具有複數個縱向氣道4411且底面具有複數個接觸墊4412,每個該緃向氣道4411出口處對應著一個接觸墊4412,該多孔吸盤441與該金屬壓頭442相接處,於該縱向氣道4411頂端具有許多橫向氣道4413,藉此連通各縱向氣道4411。該金屬壓頭442內部具有管路4421能連接於外部的抽真空裝置(圖中未畫出),該複數縱向氣道4411是與該管路4421相連接,藉此適時產生真空以吸取晶粒。該接觸墊4412可由純金所構成,間距尺寸是與微型晶粒相同。As shown in FIGS. 3 and 4, the suction unit 44 includes a porous suction cup 441 and a metal indenter 442 connected from bottom to top. As shown in FIGS. 5 and 6, the porous suction cup 441 has a plurality of longitudinal air channels 4411 inside and a plurality of contact pads 4412 on the bottom surface, and each of the forward air channels 4411 corresponds to a contact pad 4412. The porous suction cup 441 and the Where the metal indenter 442 meets, there are a plurality of lateral air channels 4413 at the top of the longitudinal air channel 4411, thereby communicating the longitudinal air channels 4411. The metal indenter 442 has a pipe 4421 inside which can be connected to an external vacuum pumping device (not shown in the figure). The plurality of longitudinal air passages 4411 are connected to the pipe 4421 to generate a vacuum in time to suck the crystal grains. The contact pad 4412 may be made of pure gold, and the pitch size is the same as that of the micro-die.

接著就本發明的運作方式作一簡單的描述:Then a brief description of the operation mode of the present invention:

本實施例是用以製成一LED的顯示器銀幕,是將微尺寸(約0.01~0.1mm)的R、G、B 微型LED晶粒組裝在一起,形成約0.05~0.25mm的發光源,複數發光源以間距(約0.05~0.5mm)的陣列方式分佈擺放,藉此形成高解析度的LED銀幕。This embodiment is used to make an LED display screen. The micro-sized (about 0.01 ~ 0.1mm) R, G, B micro LED die are assembled together to form a light source of about 0.05 ~ 0.25mm. The light emitting sources are arranged in an array manner with a pitch (about 0.05 to 0.5 mm), thereby forming a high-resolution LED screen.

承載著紅光微型晶粒、綠光微型晶粒、以及藍光微型晶粒的三個晶粒載盤分別放置於相對應之該晶粒旋轉台21、22、23上,欲安裝的接收基板則放置於該基板旋轉台24上。 Three die carriers carrying red light micro-dies, green light micro-dies, and blue light micro-dies are placed on the corresponding die turntables 21, 22, and 23 respectively. The receiving substrates to be mounted are Placed on the substrate rotating table 24.

首先進行校正作業,該水平移動載台2分別依序移動該晶粒旋轉台21、22、23及該基板旋轉台24於該第二對位鏡頭組33正下方,確認所承載之晶粒載盤及接收基板的位置是否正確,如果不對,並啟動旋轉台旋轉一角度,以校正至正確方位。同理將該第一對位鏡頭組25由該水平移動載台2移動至該吸取頭4正下方,確認該吸取單元44之位置是否正確,如果不對則由該旋轉單元41旋轉一角度,校正至該吸取單元44於正確方位。 First, the calibration operation is performed. The horizontal moving stage 2 sequentially moves the die rotation stage 21, 22, 23 and the substrate rotation stage 24 directly below the second alignment lens group 33 to confirm the carried die load. Whether the position of the disc and the receiving substrate are correct. If they are not correct, start the rotary table to rotate an angle to correct the correct orientation. Similarly, move the first alignment lens group 25 from the horizontal moving stage 2 directly below the suction head 4 to confirm whether the position of the suction unit 44 is correct. If it is not correct, the rotation unit 41 rotates an angle to correct The suction unit 44 is in the correct orientation.

接著進行晶粒的移載作業:首先將承載紅光微型晶粒之該晶粒旋轉台21移動至該吸取單元44正下方,該升降機構31控制該吸取頭4下降,利用該吸取單元44一次吸取100~1000顆紅光微型晶粒,吸取後上升待機。 Next, the crystal grain transfer operation is performed: first, the crystal grain rotating table 21 carrying the red light micro crystal grains is moved directly below the suction unit 44; the lifting mechanism 31 controls the suction head 4 to descend, and the suction unit 44 is used once Absorb 100 ~ 1000 red light micro-crystal grains and rise to standby after aspiration.

接著利用該水平移動載台2將該基板旋轉台24移動至該吸取頭4正下方。 Then, the substrate rotating table 24 is moved directly below the suction head 4 by the horizontal moving stage 2.

該升降機構31再次作動而使該吸取頭4下降,使該紅光微型晶粒得安裝於具有正負極接線及線路的該接收基板上,該接收基板於相對位置亦設有鍚膏或焊接劑等,之後該加熱單元43升溫,該吸取單元44同步升溫,使得該紅光晶粒熔焊到該接收基板上,之後解除該吸取單元44之真空吸力狀態後,該吸取頭4再度上升。 The lifting mechanism 31 is actuated again to lower the suction head 4 so that the red light micro-crystal grains can be mounted on the receiving substrate with positive and negative wiring and lines, and the receiving substrate is also provided with a paste or solder at a relative position. After that, the heating unit 43 heats up, and the suction unit 44 heats up synchronously, so that the red crystal grains are welded to the receiving substrate. After the vacuum suction state of the suction unit 44 is released, the suction head 4 rises again.

同理,接著將承載綠光微型晶粒之該晶粒旋轉台22由該水平移動載台4移動至該吸取單元4正下方,依序吸取微型晶粒上升,等待後再下降熔焊接到該接收基板上,即完成綠光微型晶粒的焊接作業。同理該藍光微型晶粒亦以相同方式完成焊接作業。當然也可將所有特定顏色之微型晶粒焊接於該接收基板後,再進行其他顏色微型晶粒的焊接作業。藉由本發明能一次大量地進行微型晶粒的焊接,在多次作業後,即達到商業化將數目眾多的發光二極體加工形成於一顯示器銀幕,最終達到高解析度發光二極體螢幕的生產目的。In the same way, the grain rotating table 22 carrying the green light micro-crystals is then moved from the horizontal moving stage 4 directly below the suction unit 4, and the micro-crystals are sequentially picked up, waited, and then fused and welded to the On the receiving substrate, the welding operation of green light micro-crystal grains is completed. In the same way, the blue light micro-crystal grains also complete the welding operation in the same way. Of course, it is also possible to weld micro-crystal grains of a specific color to the receiving substrate, and then perform welding operations of micro-crystal grains of other colors. With the present invention, a large number of micro-grains can be welded at one time. After multiple operations, a large number of light-emitting diodes are commercially processed and formed on a display screen, and finally a high-resolution light-emitting diode screen is reached. Production purpose.

如圖7所示,為本發明第三實施例之吸取頭的側面結構示意圖,在本實施中該吸取頭4包括由上而下依序結合的一旋轉單元41、一隔熱單元42、以及一吸取單元44,在本實施例中並無該加熱單元的結構,因此在本實施例中該吸取頭4主要負責將晶粒放置而安裝於接收基板後,後續再進行晶粒與接收基板加熱焊接固化作業,因此該隔熱單元42也可省略。As shown in FIG. 7, it is a schematic side structural view of a suction head according to a third embodiment of the present invention. In this embodiment, the suction head 4 includes a rotation unit 41, a heat insulation unit 42, and a combination of the top and bottom in order. A suction unit 44 does not have the structure of the heating unit in this embodiment. Therefore, in this embodiment, the suction head 4 is mainly responsible for placing the dies on the receiving substrate, and subsequently heating the dies and the receiving substrate. Since the welding and curing operation is performed, the heat insulation unit 42 may be omitted.

以上所述者僅為用以解釋本發明之較佳實施例,並非企圖據以對本發明做任何形式上之限制,是以,凡有在相同之發明精神下所作有關本發明之任何修飾或變更,皆仍應包括在本發明意圖保護之範疇。The above are only used to explain the preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Therefore, any modification or change related to the present invention made under the same spirit of the invention Should still be included in the scope of the present invention.

1‧‧‧基座1‧‧‧ base

2‧‧‧水平移動載台2‧‧‧Horizontal mobile carrier

21、22、22‧‧‧晶粒旋轉台21, 22, 22‧‧‧ Grain Rotary Table

24‧‧‧基板旋轉台24‧‧‧ substrate rotation stage

25‧‧‧第一對位鏡頭組25‧‧‧First registration lens group

3‧‧‧龍門支架3‧‧‧ Gantry bracket

31‧‧‧升降機構31‧‧‧Lifting mechanism

33‧‧‧第二對位鏡頭組33‧‧‧Second registration lens group

4‧‧‧吸取頭4‧‧‧ Suction head

41‧‧‧旋轉單元41‧‧‧rotating unit

42‧‧‧隔熱單元42‧‧‧Insulation unit

421‧‧‧冷卻盤421‧‧‧cooling plate

422‧‧‧隔熱層422‧‧‧ Insulation

43‧‧‧加熱單元43‧‧‧Heating unit

431‧‧‧盲孔431‧‧‧blind hole

44‧‧‧吸取單元44‧‧‧ Suction unit

441‧‧‧多孔吸盤441‧‧‧Porous suction cup

4411‧‧‧緃向氣道4411 ‧ ‧ 緃 towards the airway

4412‧‧‧接觸墊4412‧‧‧ contact pad

4413‧‧‧橫向氣道4413‧‧‧ Lateral airway

4412‧‧‧接觸墊4412‧‧‧ contact pad

442‧‧‧金屬壓頭442‧‧‧ metal indenter

45‧‧‧雷射發射單元45‧‧‧Laser Launch Unit

圖1為本發明之側面結構示意圖; 圖2為本發明之基座與水平移動載台之俯視結構示意圖,而龍門支架位置則以假想線表示; 圖3為本發明第一實施例之吸取頭的側面結構示意圖; 圖4為本發明第二實施例之吸取頭的側面結構示意圖; 圖5為本發明吸取單元之仰視圖; 圖6為本發明多孔吸盤之局部剖面示意圖; 圖7為本發明第三實施例之吸取頭的側面結構示意圖。FIG. 1 is a schematic side structural view of the present invention; FIG. 2 is a top structural schematic view of a base and a horizontal moving stage of the present invention, and the position of the gantry bracket is indicated by an imaginary line; FIG. 3 is a suction head of the first embodiment of the present invention Fig. 4 is a side structural schematic view of a suction head according to a second embodiment of the present invention; Fig. 5 is a bottom view of a suction unit of the present invention; Fig. 6 is a schematic partial sectional view of a porous suction cup of the present invention; Schematic side view of the suction head of the third embodiment.

Claims (8)

一種多晶粒壓合機,包括:一基座;一水平移動載台,安裝於該基座上,能於水平方向精密移動,該水平移動載台上另安裝著能獨立旋轉的三個晶粒旋轉台及一基板旋轉台;以及一龍門支架,樹立固定於該基座,且不干涉到該水平移動載台的移動,該龍門支架上安裝著一升降機構,該升降機構能控制一吸取頭的升降,該吸取頭由下而上至少包括一吸取單元及一旋轉單元;其中該水平移動載台上另安裝著一第一對位鏡頭組,該第一對位鏡頭組是朝上方向拍攝,用以校正該吸取頭的位置;該龍門支架處另安裝著一第二對位鏡頭組,該第二對位鏡頭組是朝下方拍攝,用以校正下方該晶粒旋轉台及該基板旋轉台的位置;藉由該水平移動載台精準地在不同時間移動該晶粒旋轉台或該基板旋轉台於該吸取頭下方,由該升降機構適時控制該吸取頭下降,讓該吸取頭一次吸取該晶粒旋轉台的複數微型晶粒,或是將該複數微型晶粒加壓安裝於該基板旋轉台上的接收基板。A multi-die pressing machine includes: a base; a horizontal moving carrier mounted on the base, which can be precisely moved in a horizontal direction; and the horizontal moving carrier is further installed with three crystals capable of independent rotation. A particle rotating table and a substrate rotating table; and a gantry bracket, which is fixed on the base and does not interfere with the movement of the horizontal moving carrier. A lifting mechanism is installed on the gantry bracket, which can control a suction Lifting of the head, the suction head includes at least a suction unit and a rotation unit from bottom to top; wherein the horizontal movement stage is further installed with a first alignment lens group, the first alignment lens group is directed upward Photographing to correct the position of the pick-up head; a second alignment lens group is installed at the gantry bracket, and the second alignment lens group is photographed downwards to correct the crystal grain rotary table and the substrate below The position of the rotating table; the horizontally moving stage accurately moves the crystal grain rotating table or the substrate rotating table below the suction head, and the lifting mechanism controls the suction head to descend in time to allow the suction A plurality of micro chip suction of the die table rotation, or pressing the plurality of micro chip mounted on the substrate rotating stage receiving the substrate. 如申請專利範圍第1項所述之多晶粒壓合機,其中該吸取單元由下而上包括相連的一多孔吸盤及一金屬壓頭,該多孔吸盤內部具有複數個縱向氣道且底面具有複數接觸墊,每個該緃向氣道出口位於對應一個該接觸墊,該複數縱向氣道是與位於該金屬壓頭內的管路相連通,該管路連接於外部的抽真空裝置,用以適時產生真空。The multi-grain pressing machine according to item 1 of the patent application scope, wherein the suction unit includes a porous suction cup and a metal indenter connected from bottom to top, the porous suction cup has a plurality of longitudinal air channels inside and the bottom surface has A plurality of contact pads, each of which is located at a corresponding one of the contact pads, and the plurality of longitudinal air passages are in communication with a pipeline located in the metal head, which is connected to an external vacuum device for timely Create a vacuum. 如申請專利範圍第2項所述之多晶粒壓合機,其中該接觸墊為純金材質。The multi-die pressing machine described in item 2 of the scope of patent application, wherein the contact pad is made of pure gold. 如申請專利範圍第1項所所述之多晶粒壓合機,其中該吸取頭進一步包括一隔熱單元,因此該吸取頭的結構由下而上依序由該吸取單元、該隔熱單元及該旋轉單元所構成,該隔熱單元由下而上包括相連的一隔熱層及一冷卻盤,該冷卻盤另外連接一冷卻管路。The multi-die pressing machine as described in item 1 of the patent application scope, wherein the suction head further includes a heat insulation unit, so the structure of the suction head is sequentially from the suction unit to the heat insulation unit And the rotating unit, the heat insulation unit includes a heat insulation layer and a cooling plate connected from bottom to top, and the cooling plate is additionally connected with a cooling pipe. 如申請專利範圍第1項所所述之多晶粒壓合機,其中該吸取頭進一步包括一隔熱單元及一加熱單元,因此該吸取頭的結構由下而上依序由該吸取單元、該加熱單元、該隔熱單元以及該旋轉單元所構成。The multi-die pressing machine as described in item 1 of the scope of patent application, wherein the suction head further includes a heat insulation unit and a heating unit, so the structure of the suction head is sequentially from the suction unit to the bottom, The heating unit, the heat insulation unit, and the rotation unit are configured. 如申請專利範圍第5項所述之多晶粒壓合機,其中該加熱單元內部安裝著一電熱裝置。The multi-die pressing machine according to item 5 of the scope of patent application, wherein an electric heating device is installed inside the heating unit. 如申請專利範圍第5項所述之多晶粒壓合機,其中該吸取頭進一步包括一雷射發射單元,該加熱單元為金屬材質,在該雷射發射單元發射特定波長的光源於該加熱單元,可使得該加熱單元快速升溫。The multi-die pressing machine according to item 5 of the patent application scope, wherein the suction head further comprises a laser emitting unit, the heating unit is made of metal, and the laser emitting unit emits a light source with a specific wavelength to the heating Unit, which can make the heating unit heat up quickly. 如申請專利範圍第5項所述之多晶粒壓合機,其中該加熱單元對應該雷射發射單元位置處具有一盲孔,該盲孔的孔底是位於該加熱單元的中心位置,該雷射發射單元得發射特定波長的光源於該盲孔內。The multi-die pressing machine according to item 5 of the scope of patent application, wherein the heating unit has a blind hole at a position corresponding to the laser emitting unit, and the bottom of the blind hole is located at the center of the heating unit. The laser emitting unit must emit a light source with a specific wavelength in the blind hole.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110662362B (en) * 2019-11-13 2020-11-17 温州大学 Multi-station reinforcing sheet laminating device for flexible circuit board production
CN115443060A (en) * 2022-09-30 2022-12-06 苏州科韵激光科技有限公司 Component taking equipment and method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM427666U (en) * 2011-10-27 2012-04-21 Gillion Technology Corp Die pickup device
CN102934220A (en) * 2010-06-07 2013-02-13 威科仪器有限公司 Multi-wafer rotating disc reactor with inertial planetary drive
TW201312675A (en) * 2011-09-15 2013-03-16 Hitachi High Tech Instr Co Ltd Die Bonder and Bonding Method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9226407B2 (en) * 2002-07-01 2015-12-29 Semigear Inc Reflow treating unit and substrate treating apparatus
DE102010015520A1 (en) * 2010-04-16 2011-10-20 Pac Tech-Packaging Technologies Gmbh Method and apparatus for forming solder deposits
TWI564106B (en) * 2011-03-28 2017-01-01 山田尖端科技股份有限公司 Bonding apparatus and bonding method
TWM422749U (en) * 2011-10-24 2012-02-11 Gallant Micro Machining Co Ltd Chip laminating device
TWM471120U (en) * 2013-09-06 2014-01-21 Synpower Co Ltd Automatic pasting machine
US9427818B2 (en) * 2014-01-20 2016-08-30 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor processing boat design with pressure sensor
JP6400938B2 (en) * 2014-04-30 2018-10-03 ファスフォードテクノロジ株式会社 Die bonder and bonding method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102934220A (en) * 2010-06-07 2013-02-13 威科仪器有限公司 Multi-wafer rotating disc reactor with inertial planetary drive
TW201312675A (en) * 2011-09-15 2013-03-16 Hitachi High Tech Instr Co Ltd Die Bonder and Bonding Method
TWM427666U (en) * 2011-10-27 2012-04-21 Gillion Technology Corp Die pickup device

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