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TWI613942B - Electrical connection structure - Google Patents

Electrical connection structure Download PDF

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Publication number
TWI613942B
TWI613942B TW105121256A TW105121256A TWI613942B TW I613942 B TWI613942 B TW I613942B TW 105121256 A TW105121256 A TW 105121256A TW 105121256 A TW105121256 A TW 105121256A TW I613942 B TWI613942 B TW I613942B
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layer
organic
electrical connection
connection structure
circuit
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TW105121256A
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Chinese (zh)
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TW201803418A (en
Inventor
林冠嶧
唐文忠
陳柏煒
許毓麟
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元太科技工業股份有限公司
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Priority to TW105121256A priority Critical patent/TWI613942B/en
Priority to CN201710324175.1A priority patent/CN107579090B/en
Priority to US15/641,206 priority patent/US10103201B2/en
Publication of TW201803418A publication Critical patent/TW201803418A/en
Application granted granted Critical
Publication of TWI613942B publication Critical patent/TWI613942B/en
Priority to US16/111,155 priority patent/US10522597B2/en
Priority to US16/122,871 priority patent/US10607932B2/en

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Abstract

一種電連接結構,位於可撓顯示器的邊緣。電連接結構包含可撓基板、第一線路層、有機緩衝層、有機閘極隔離層與有機保護層。第一線路層位於可撓基板上且往可撓基板的邊緣延伸。有機緩衝層位於可撓基板與第一線路層上,使得第一線路層位於有機緩衝層與可撓基板之間。有機閘極隔離層位於有機緩衝層上。有機保護層位於有機閘極隔離層上。有機保護層、有機閘極隔離層與有機緩衝層共同具有兩穿孔,使第一線路層部分位於穿孔中。 An electrical connection structure located at the edge of a flexible display. The electrical connection structure comprises a flexible substrate, a first wiring layer, an organic buffer layer, an organic gate isolation layer and an organic protective layer. The first circuit layer is on the flexible substrate and extends toward the edge of the flexible substrate. The organic buffer layer is located on the flexible substrate and the first circuit layer such that the first circuit layer is located between the organic buffer layer and the flexible substrate. The organic gate isolation layer is on the organic buffer layer. The organic protective layer is on the organic gate isolation layer. The organic protective layer, the organic gate isolation layer and the organic buffer layer together have two perforations such that the first wiring layer portion is located in the perforations.

Description

電連接結構 Electrical connection structure

本案是有關於一種電連接結構。 This case is about an electrical connection structure.

一般而言,顯示裝置的邊緣設有軟性電路板(Flexible printed circuit board;FPC),使得顯示裝置可透過軟性電路板接收外部電子裝置的訊號與電力。由於傳統的顯示裝置不具撓性,因此電性連接顯示裝置的軟性電路板不易受到拉扯,不需考量軟性電路板的抗拉力能力。然而,在有機薄膜電晶體陣列(Organic TFT Array)的顯示裝置中,因其具有撓性,就需考量軟性電路板的抗拉力能力。 Generally, the edge of the display device is provided with a flexible printed circuit board (FPC), so that the display device can receive signals and power of the external electronic device through the flexible circuit board. Since the conventional display device is not flexible, the flexible circuit board electrically connected to the display device is not easily pulled, and it is not necessary to consider the tensile strength of the flexible circuit board. However, in a display device of an organic thin film OLED array, since it has flexibility, it is necessary to consider the tensile strength of a flexible circuit board.

一般而言,有機薄膜電晶體陣列顯示裝置在可撓基板邊緣依序堆疊有有機緩衝層、有機閘極隔離層與有機保護層,並於有機緩衝層與有機閘極隔離層之間形成用來連接積體電路(Integrated Circuit;IC)與軟性電路板的線路,且線路的兩端分別從有機閘極隔離層與有機保護層的兩穿孔裸露,以供積體電路與軟性電路板接合於顯示裝置的可撓基板。 Generally, the organic thin film transistor array display device sequentially stacks an organic buffer layer, an organic gate isolation layer and an organic protective layer on the edge of the flexible substrate, and is formed between the organic buffer layer and the organic gate isolation layer. Connecting the integrated circuit (IC) and the circuit of the flexible circuit board, and both ends of the line are exposed from the two through holes of the organic gate isolation layer and the organic protection layer, respectively, for the integrated circuit and the flexible circuit board to be bonded to the display A flexible substrate for the device.

然而,這樣的電連接結構因其線路與有機緩衝層接觸,而有機緩衝層為有機材料,因此線路的附著力不佳。如 此一來,在線路連接軟性電路板後,線路易受軟性電路板的拉力而損壞,例如軟性電路板難以承受大於0.5N/mm的拉力。 However, such an electrical connection structure is in contact with the organic buffer layer because of its wiring, and the organic buffer layer is an organic material, so the adhesion of the wiring is poor. Such as As a result, after the circuit is connected to the flexible circuit board, the line is easily damaged by the tension of the flexible circuit board, for example, the flexible circuit board is difficult to withstand a pulling force greater than 0.5 N/mm.

本發明之一技術態樣為一種電連接結構,位於可撓顯示器的邊緣。 One aspect of the present invention is an electrical connection structure located at the edge of a flexible display.

根據本發明一實施方式,一種電連接結構包含可撓基板、第一線路層、有機緩衝層、有機閘極隔離層與有機保護層。第一線路層位於可撓基板上且往可撓基板的邊緣延伸。有機緩衝層位於可撓基板與第一線路層上,使得第一線路層位於有機緩衝層與可撓基板之間。有機閘極隔離層位於有機緩衝層上。有機保護層位於有機閘極隔離層上。有機保護層、有機閘極隔離層與有機緩衝層共同具有兩穿孔,使第一線路層部分位於穿孔中。 According to an embodiment of the invention, an electrical connection structure includes a flexible substrate, a first wiring layer, an organic buffer layer, an organic gate isolation layer, and an organic protective layer. The first circuit layer is on the flexible substrate and extends toward the edge of the flexible substrate. The organic buffer layer is located on the flexible substrate and the first circuit layer such that the first circuit layer is located between the organic buffer layer and the flexible substrate. The organic gate isolation layer is on the organic buffer layer. The organic protective layer is on the organic gate isolation layer. The organic protective layer, the organic gate isolation layer and the organic buffer layer together have two perforations such that the first wiring layer portion is located in the perforations.

在本發明一實施方式中,上述電連接結構更包含第二線路層。第二線路層位於穿孔中的第一線路層上,且延伸至有機緩衝層圍繞穿孔的壁面上與有機緩衝層與有機閘極隔離層之間。 In an embodiment of the invention, the electrical connection structure further includes a second circuit layer. The second circuit layer is located on the first circuit layer in the via and extends to the organic buffer layer between the wall surface of the via and the organic buffer layer and the organic gate isolation layer.

在本發明一實施方式中,上述第二線路層從穿孔其中之一中的第一線路層上延伸至另一穿孔中的第一線路層上。 In an embodiment of the invention, the second circuit layer extends from the first circuit layer in one of the perforations to the first circuit layer in the other of the perforations.

在本發明一實施方式中,上述電連接結構更包含第一導電層。第一導電層位於穿孔中的第二線路層上,使第二線路層位於第一導電層與第一線路層之間。 In an embodiment of the invention, the electrical connection structure further includes a first conductive layer. The first conductive layer is located on the second circuit layer in the through hole such that the second circuit layer is located between the first conductive layer and the first circuit layer.

在本發明一實施方式中,上述第一導電層延伸至有機閘極隔離層圍繞穿孔的壁面上與有機閘極隔離層與有機保護層之間。 In an embodiment of the invention, the first conductive layer extends between the organic gate isolation layer and the organic gate isolation layer and the organic gate layer.

在本發明一實施方式中,上述第一導電層從穿孔其中之一中的第二線路層上延伸至另一穿孔中的第二線路層上。 In an embodiment of the invention, the first conductive layer extends from the second wiring layer in one of the through holes to the second wiring layer in the other of the through holes.

在本發明一實施方式中,上述電連接結構更包含第二導電層。第二導電層位於穿孔中的第一導電層上,使第一導電層位於第二導電層與第二線路層之間。 In an embodiment of the invention, the electrical connection structure further includes a second conductive layer. The second conductive layer is located on the first conductive layer in the through hole such that the first conductive layer is located between the second conductive layer and the second circuit layer.

在本發明一實施方式中,上述第二導電層延伸至有機保護層圍繞穿孔的壁面上與有機保護層背對有機閘極隔離層的表面上。 In an embodiment of the invention, the second conductive layer extends to the surface of the organic protective layer surrounding the organic gate layer on the wall surface of the through hole and the organic protective layer.

在本發明一實施方式中,上述可撓基板具有阻障層。至少部分阻障層由第一線路層覆蓋。 In an embodiment of the invention, the flexible substrate has a barrier layer. At least a portion of the barrier layer is covered by the first circuit layer.

在本發明一實施方式中,上述有機閘極隔離層位於有機保護層與有機緩衝層之間。 In an embodiment of the invention, the organic gate isolation layer is between the organic protective layer and the organic buffer layer.

在本發明一實施方式中,上述第一線路層的厚度介於1500埃至2500埃。 In an embodiment of the invention, the first circuit layer has a thickness of between 1,500 angstroms and 2,500 angstroms.

在本發明一實施方式中,上述第一線路層的材料包含鋁、鉬、铬、鈦、銅、鎳或其合金。 In an embodiment of the invention, the material of the first circuit layer comprises aluminum, molybdenum, chromium, titanium, copper, nickel or an alloy thereof.

在本發明一實施方式中,上述電連接結構更包含積體電路。積體電路電性連接位在穿孔其中之一中的第一線路層。 In an embodiment of the invention, the electrical connection structure further includes an integrated circuit. The integrated circuit is electrically connected to the first circuit layer located in one of the perforations.

在本發明一實施方式中,上述電連接結構更包含 軟性電路板。軟性電路板電性連接位在另一穿孔中的第一線路層。 In an embodiment of the invention, the electrical connection structure further includes Flexible circuit board. The flexible circuit board electrically connects the first circuit layer in another via.

在本發明上述實施方式中,由於電連接結構的第一線路層是位於可撓基板上,非在有機材料上,因此第一線路層的附著力得以提升。此外,有機緩衝層、有機閘極隔離層與有機保護層依序堆疊於第一線路層上,且共同具有兩穿孔,第一線路層位於穿孔中。如此一來,當積體電路與軟性電路板的接點分別設置於穿孔中時,軟性電路板便可透過第一線路層電性連接積體電路。由於第一線路層與可撓基板間的附著力佳,因此軟性電路板的抗拉力能力得以提升。當可撓顯示器因彎折而拉扯軟性電路板時,可避免第一線路層與穿孔中的其他金屬層受軟性電路板的拉力而損壞。 In the above embodiment of the present invention, since the first wiring layer of the electrical connection structure is on the flexible substrate, not on the organic material, the adhesion of the first wiring layer is improved. In addition, the organic buffer layer, the organic gate isolation layer and the organic protective layer are sequentially stacked on the first circuit layer, and have two perforations in common, and the first circuit layer is located in the through hole. In this way, when the contacts of the integrated circuit and the flexible circuit board are respectively disposed in the through holes, the flexible circuit board can be electrically connected to the integrated circuit through the first circuit layer. Since the adhesion between the first circuit layer and the flexible substrate is good, the tensile strength of the flexible circuit board is improved. When the flexible display pulls the flexible circuit board by bending, the first circuit layer and other metal layers in the through hole can be prevented from being damaged by the pulling force of the flexible circuit board.

100、100A、100B、100C、100D、100E‧‧‧電連接結構 100, 100A, 100B, 100C, 100D, 100E‧‧‧ electrical connection structure

110‧‧‧可撓基板 110‧‧‧Flexible substrate

112‧‧‧表面 112‧‧‧ surface

114‧‧‧阻障層 114‧‧‧Barrier layer

120‧‧‧第一線路層 120‧‧‧First line layer

130‧‧‧有機緩衝層 130‧‧‧Organic buffer layer

132‧‧‧壁面 132‧‧‧ wall

134‧‧‧壁面 134‧‧‧ wall

136‧‧‧表面 136‧‧‧ surface

140‧‧‧有機閘極隔離層 140‧‧‧Organic gate isolation

142‧‧‧壁面 142‧‧‧ wall

144‧‧‧壁面 144‧‧‧ wall

146‧‧‧表面 146‧‧‧ surface

150‧‧‧有機保護層 150‧‧‧Organic protective layer

152‧‧‧壁面 152‧‧‧ wall

154‧‧‧壁面 154‧‧‧ wall

156‧‧‧表面 156‧‧‧ surface

162‧‧‧穿孔 162‧‧‧Perforation

164‧‧‧穿孔 164‧‧‧Perforation

170、170a‧‧‧第二線路層 170, 170a‧‧‧second circuit layer

180、180a‧‧‧第一導電層 180, 180a‧‧‧ first conductive layer

190‧‧‧第二導電層 190‧‧‧Second conductive layer

200‧‧‧可撓顯示器 200‧‧‧flexible display

202‧‧‧顯示區 202‧‧‧ display area

210‧‧‧積體電路 210‧‧‧ integrated circuit

220‧‧‧軟性電路板 220‧‧‧Soft circuit board

2-2‧‧‧線段 2-2‧‧‧ segments

L1、L2‧‧‧折線 L1, L2‧‧‧ fold line

第1圖繪示根據本發明一實施方式之位於可撓顯示器邊緣的電連接結構的俯視圖。 1 is a top plan view of an electrical connection structure at an edge of a flexible display in accordance with an embodiment of the present invention.

第2圖繪示第1圖之電連接結構沿線段2-2的剖面圖。 2 is a cross-sectional view of the electrical connection structure of FIG. 1 taken along line 2-2.

第3圖繪示根據本發明一實施方式之電連接結構的剖面圖。 3 is a cross-sectional view showing an electrical connection structure according to an embodiment of the present invention.

第4圖繪示根據本發明一實施方式之電連接結構的剖面圖。 4 is a cross-sectional view showing an electrical connection structure according to an embodiment of the present invention.

第5圖繪示根據本發明一實施方式之電連接結構的剖面圖。 Figure 5 is a cross-sectional view showing an electrical connection structure in accordance with an embodiment of the present invention.

第6圖繪示軟性電路板連接第5圖之電連接結構與連接習知電連接結構的拉力-時間關係圖。 Figure 6 is a diagram showing the tension-time relationship of the electrical connection structure of the flexible circuit board connected to Figure 5 and the connection of the conventional electrical connection structure.

第7圖繪示根據本發明一實施方式之電連接結構的剖面圖。 Figure 7 is a cross-sectional view showing an electrical connection structure in accordance with an embodiment of the present invention.

第8圖繪示根據本發明一實施方式之電連接結構的剖面圖。 Figure 8 is a cross-sectional view showing an electrical connection structure in accordance with an embodiment of the present invention.

以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 The embodiments of the present invention are disclosed in the following drawings, and the details of However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings.

第1圖繪示根據本發明一實施方式之位於可撓顯示器200邊緣的電連接結構100的俯視圖。第2圖繪示第1圖之電連接結構100沿線段2-2的剖面圖。為求簡潔,第2~5圖均省略第1圖的積體電路210與軟性電路板220,合先敘明。同時參閱第1圖與第2圖,可撓顯示器200具有顯示區202。電連接結構100位於可撓顯示器200的邊緣,例如電連接結構100位於顯示區202的外側。電連接結構100包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140(Organic Gate Insulator;OGI)與有機保護層150(Organic Passivation;OPV)。 1 is a top plan view of an electrical connection structure 100 at the edge of a flexible display 200 in accordance with an embodiment of the present invention. 2 is a cross-sectional view of the electrical connection structure 100 of FIG. 1 taken along line 2-2. For the sake of brevity, the integrated circuits 210 and the flexible circuit board 220 of Fig. 1 are omitted in the second to fifth embodiments. Referring also to FIGS. 1 and 2, the flexible display 200 has a display area 202. The electrical connection structure 100 is located at the edge of the flexible display 200, for example, the electrical connection structure 100 is located outside of the display area 202. The electrical connection structure 100 includes a flexible substrate 110, a first wiring layer 120, an organic buffer layer 130, an organic gate isolation layer 140 (OGI), and an organic protective layer 150 (Organic Passivation; OPV).

第一線路層120位於可撓基板110的表面112上,且第一線路層120往可撓基板110的邊緣延伸。有機緩衝層130位於可撓基板110與第一線路層120上,使得第一線路層120位於有機緩衝層130與可撓基板110之間。有機閘極隔離層140位於有機緩衝層130上。有機保護層150位於有機閘極隔離層140上。也就是說,有機閘極隔離層140位於有機保護層150與有機緩衝層130之間。 The first circuit layer 120 is located on the surface 112 of the flexible substrate 110, and the first circuit layer 120 extends toward the edge of the flexible substrate 110. The organic buffer layer 130 is located on the flexible substrate 110 and the first wiring layer 120 such that the first wiring layer 120 is located between the organic buffer layer 130 and the flexible substrate 110. The organic gate isolation layer 140 is on the organic buffer layer 130. The organic protective layer 150 is on the organic gate isolation layer 140. That is, the organic gate isolation layer 140 is located between the organic protective layer 150 and the organic buffer layer 130.

此外,有機保護層150、有機閘極隔離層140與有機緩衝層130共同具有兩穿孔162、164,使得第一線路層120部分位於穿孔162、164中。在本實施方式中,第一線路層120從穿孔162、164裸露,且在穿孔162中的第一線路層120可用來電性連接積體電路210,在穿孔164中的第一線路層120可用來電性連接軟性電路板220。 In addition, the organic protective layer 150, the organic gate isolation layer 140 and the organic buffer layer 130 have two vias 162, 164 together such that the first wiring layer 120 is partially located in the vias 162, 164. In the present embodiment, the first circuit layer 120 is exposed from the vias 162, 164, and the first circuit layer 120 in the vias 162 can be electrically connected to the integrated circuit 210, and the first circuit layer 120 in the vias 164 can be used to make an incoming call. The flexible circuit board 220 is connected.

由於電連接結構100的第一線路層120是位於可撓基板110上,非在有機材料上,因此第一線路層120的附著力得以提升。此外,有機緩衝層130、有機閘極隔離層140與有機保護層150依序堆疊於第一線路層120上,且第一線路層120位於穿孔162、164中。如此一來,當積體電路210與軟性電路板220的接點分別設置於穿孔162、164中時,軟性電路板220便可透過第一線路層120電性連接積體電路210,使訊號在軟性電路板220與積體電路210之間傳遞。 Since the first wiring layer 120 of the electrical connection structure 100 is located on the flexible substrate 110, not on the organic material, the adhesion of the first wiring layer 120 is improved. In addition, the organic buffer layer 130, the organic gate isolation layer 140 and the organic protection layer 150 are sequentially stacked on the first circuit layer 120, and the first circuit layer 120 is located in the vias 162, 164. In this way, when the contacts of the integrated circuit 210 and the flexible circuit board 220 are respectively disposed in the through holes 162 and 164, the flexible circuit board 220 can be electrically connected to the integrated circuit 210 through the first circuit layer 120, so that the signal is in the The flexible circuit board 220 is transferred between the integrated circuit 210 and the integrated circuit 210.

另外,由於第一線路層120與可撓基板110間的附著力佳,因此軟性電路板220的抗拉力能力得以提升。當可撓顯示器200因彎折而拉扯軟性電路板220時,可避免第一線路 層120與穿孔162、164中的其他導電金屬層(將於後述)受軟性電路板220的拉力而損壞,例如可避免第一線路層120脫離可撓基板110。 In addition, since the adhesion between the first circuit layer 120 and the flexible substrate 110 is good, the tensile strength of the flexible circuit board 220 is improved. When the flexible display 200 pulls the flexible circuit board 220 due to bending, the first line can be avoided The layer 120 and other conductive metal layers in the vias 162, 164 (which will be described later) are damaged by the pulling force of the flexible circuit board 220, for example, the first wiring layer 120 can be prevented from being detached from the flexible substrate 110.

在本實施方式中,可撓基板110的材料可以包含矽,第一線路層120的材料可以包含鋁、鉬、铬、鈦、銅、鎳或其合金,以讓第一線路層120與可撓基板110間具有良好的附著力。此外,第一線路層120的厚度可介於1500埃至2500埃,以讓第一線路層120具有良好的強度,使其在彎折時或受軟性電路板220拉力時不易斷裂。 In this embodiment, the material of the flexible substrate 110 may include germanium, and the material of the first circuit layer 120 may include aluminum, molybdenum, chromium, titanium, copper, nickel or an alloy thereof to make the first circuit layer 120 and the flexible The substrate 110 has good adhesion between the substrates. In addition, the thickness of the first wiring layer 120 may be between 1500 angstroms and 2,500 angstroms to allow the first wiring layer 120 to have good strength so that it is not easily broken when bent or when the flexible circuit board 220 is pulled.

此外,可撓基板110具有覆蓋表面112的阻障層114(例如矽的氮化物,SiNx),且至少部分阻障層114(例如位在可撓基板110邊緣的阻障層114)由第一線路層120覆蓋。阻障層114可用來防止水與氣體侵入,以延長可撓顯示器200的使用壽命。 In addition, the flexible substrate 110 has a barrier layer 114 covering the surface 112 (eg, germanium nitride, SiNx), and at least a portion of the barrier layer 114 (eg, the barrier layer 114 located at the edge of the flexible substrate 110) is first The circuit layer 120 is covered. The barrier layer 114 can be used to prevent intrusion of water and gas to extend the useful life of the flexible display 200.

應瞭解到,已敘述過的元件連接關係與材料將不再重複贅述,合先敘明。在以下敘述中,將說明其他型式的電連接結構。 It should be understood that the component connection relationships and materials that have been described will not be repeated, and will be described first. In the following description, other types of electrical connection structures will be described.

第3圖繪示根據本發明一實施方式之電連接結構100A的剖面圖。同時參閱第1圖與第3圖,電連接結構100A包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140與有機保護層150。與第2圖實施方式不同的地方在於:電連接結構100A更包含第二線路層170。第二線路層170位於穿孔162、164中的第一線路層120上。第二線路層170延伸至有機緩衝層130圍繞穿孔162的壁面132上與有機緩衝 層130圍繞穿孔164的壁面134上。此外,第二線路層170延伸至有機緩衝層130與有機閘極隔離層140之間。在本實施方式中,第二線路層170從穿孔162的第一線路層120上延伸至另一穿孔164中的第一線路層120上,使得第二線路層170覆蓋穿孔162、164之間的有機緩衝層130表面136。 3 is a cross-sectional view of an electrical connection structure 100A in accordance with an embodiment of the present invention. Referring to FIGS. 1 and 3 , the electrical connection structure 100A includes a flexible substrate 110 , a first wiring layer 120 , an organic buffer layer 130 , an organic gate isolation layer 140 , and an organic protective layer 150 . The difference from the embodiment of FIG. 2 is that the electrical connection structure 100A further includes the second wiring layer 170. The second circuit layer 170 is located on the first circuit layer 120 of the vias 162, 164. The second wiring layer 170 extends to the organic buffer layer 130 around the wall surface 132 of the via 162 and organic buffer Layer 130 surrounds wall 134 of perforation 164. Further, the second wiring layer 170 extends between the organic buffer layer 130 and the organic gate isolation layer 140. In the present embodiment, the second wiring layer 170 extends from the first wiring layer 120 of the via 162 to the first wiring layer 120 of the other via 164 such that the second wiring layer 170 covers the between the vias 162, 164. Organic buffer layer 130 surface 136.

當積體電路210與軟性電路板220的接點分別設置於穿孔162、164中時,軟性電路板220便可透過第一線路層120及第二線路層170電性連接積體電路210,使訊號在軟性電路板220與積體電路210之間傳遞。這樣的設計,當第一線路層120與第二線路層170其中任一者損壞時,積體電路210與軟性電路板220仍可導通。也就是說,第一線路層120與第二線路層170皆可作為電連接結構100A電性連接積體電路210與軟性電路板220的線路。 When the contacts of the integrated circuit 210 and the flexible circuit board 220 are respectively disposed in the through holes 162 and 164, the flexible circuit board 220 can be electrically connected to the integrated circuit 210 through the first circuit layer 120 and the second circuit layer 170. The signal is transmitted between the flexible circuit board 220 and the integrated circuit 210. With such a design, when either of the first circuit layer 120 and the second circuit layer 170 is damaged, the integrated circuit 210 and the flexible circuit board 220 can still be turned on. That is, both the first circuit layer 120 and the second circuit layer 170 can electrically connect the integrated circuit 210 and the flexible circuit board 220 as the electrical connection structure 100A.

在本實施方式中,由於第二線路層170並非在可撓基板110上的第一層,因此第二線路層170的厚度可小於第一線路層120的厚度,以節省材料成本,但並不用以限制本發明。 In the present embodiment, since the second circuit layer 170 is not the first layer on the flexible substrate 110, the thickness of the second circuit layer 170 may be smaller than the thickness of the first circuit layer 120 to save material cost, but it is not used. To limit the invention.

第4圖繪示根據本發明一實施方式之電連接結構100B的剖面圖。同時參閱第1圖與第4圖,電連接結構100B包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140、有機保護層150與第二線路層170。與第3圖實施方式不同的地方在於:電連接結構100B更包含第一導電層180。第一導電層180位於穿孔162、164中的第二線路層170上,使第二線路層170位於第一導電層180與第一線路層120 之間。此外,第一導電層180延伸至有機閘極隔離層140圍繞穿孔162的壁面142上與有機閘極隔離層140圍繞穿孔164的壁面144上。在本實施方式中,第一導電層180還延伸至有機閘極隔離層140與有機保護層150之間,也就是延伸至有機閘極隔離層140的表面146上。 4 is a cross-sectional view of an electrical connection structure 100B in accordance with an embodiment of the present invention. Referring to FIGS. 1 and 4 , the electrical connection structure 100B includes a flexible substrate 110 , a first wiring layer 120 , an organic buffer layer 130 , an organic gate isolation layer 140 , an organic protective layer 150 , and a second wiring layer 170 . The difference from the embodiment of FIG. 3 is that the electrical connection structure 100B further includes the first conductive layer 180. The first conductive layer 180 is located on the second circuit layer 170 of the vias 162, 164 such that the second circuit layer 170 is located at the first conductive layer 180 and the first circuit layer 120. between. In addition, the first conductive layer 180 extends over the wall surface 142 of the via 162 around the via 142 of the organic gate isolation layer 140 and the organic gate isolation layer 140. In the present embodiment, the first conductive layer 180 also extends between the organic gate isolation layer 140 and the organic protective layer 150, that is, to the surface 146 of the organic gate isolation layer 140.

當積體電路210與軟性電路板220的接點分別設置於穿孔162、164中時,第一導電層180可作為接合焊墊(Bonding Pad),使積體電路210與軟性電路板220可分別透過穿孔162、164中的第一導電層180電性連接第一線路層120與第二線路層170。 When the contacts of the integrated circuit 210 and the flexible circuit board 220 are respectively disposed in the through holes 162 and 164, the first conductive layer 180 can serve as a bonding pad, so that the integrated circuit 210 and the flexible circuit board 220 can be respectively separated. The first circuit layer 120 and the second circuit layer 170 are electrically connected through the first conductive layer 180 of the vias 162, 164.

第5圖繪示根據本發明一實施方式之電連接結構100C的剖面圖。同時參閱第1圖與第5圖,電連接結構100C包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140、有機保護層150、第二線路層170與第一導電層180。與第4圖實施方式不同的地方在於:電連接結構100C更包含第二導電層190。第二導電層190位於穿孔162、164中的第一導電層180上,使第一導電層180位於第二導電層190與第二線路層170之間。此外,第二導電層190延伸至有機保護層150圍繞穿孔162的壁面152上與有機保護層150圍繞穿孔164的壁面154上。在本實施方式中,第二導電層190還延伸至有機保護層150背對有機閘極隔離層140的表面156上。 FIG. 5 is a cross-sectional view showing an electrical connection structure 100C according to an embodiment of the present invention. Referring to FIGS. 1 and 5 , the electrical connection structure 100C includes a flexible substrate 110 , a first wiring layer 120 , an organic buffer layer 130 , an organic gate isolation layer 140 , an organic protective layer 150 , and a second wiring layer 170 . A conductive layer 180. The difference from the embodiment of FIG. 4 is that the electrical connection structure 100C further includes the second conductive layer 190. The second conductive layer 190 is located on the first conductive layer 180 in the vias 162, 164 such that the first conductive layer 180 is located between the second conductive layer 190 and the second wiring layer 170. In addition, the second conductive layer 190 extends over the wall surface 152 of the organic protective layer 150 around the perforations 162 and the wall 154 surrounding the perforations 164 with the organic protective layer 150. In the present embodiment, the second conductive layer 190 also extends to the surface 156 of the organic protective layer 150 facing away from the organic gate isolation layer 140.

當積體電路210與軟性電路板220的接點分別設置於穿孔162、164中時,第二導電層190可作為接合焊墊(Bonding Pad),使積體電路210與軟性電路板220可分別透過 穿孔162、164中的第一導電層180與第二導電層190電性連接第一線路層120與第二線路層170。 When the contacts of the integrated circuit 210 and the flexible circuit board 220 are respectively disposed in the through holes 162 and 164, the second conductive layer 190 can serve as a bonding pad, so that the integrated circuit 210 and the flexible circuit board 220 can be respectively separated. Through The first conductive layer 180 and the second conductive layer 190 of the vias 162 and 164 are electrically connected to the first circuit layer 120 and the second circuit layer 170.

第6圖繪示軟性電路板連接第5圖之電連接結構100C與連接習知電連接結構的拉力-時間關係圖。同時參閱第5圖與第6圖,當軟性電路板的接點設置於第5圖穿孔164中的第二導電層190上時,軟性電路板在電連接結構100C中所能承受3N/mm左右(例如3.05N/mm,即折線L1的最大值)的拉力,明顯大於軟性電路板在習知電連接結構中所能承受的拉力(例如0.56N/mm,即折線L2的最大值),但以上的數據並不用以限制本發明。 FIG. 6 is a diagram showing the tension-time relationship between the flexible circuit board connecting the electrical connection structure 100C of FIG. 5 and the conventional electrical connection structure. Referring to FIG. 5 and FIG. 6 simultaneously, when the contact of the flexible circuit board is disposed on the second conductive layer 190 in the through hole 164 of FIG. 5, the flexible circuit board can withstand about 3 N/mm in the electrical connection structure 100C. The tensile force (for example, 3.05 N/mm, that is, the maximum value of the fold line L1) is significantly larger than the tensile force that the flexible circuit board can withstand in the conventional electrical connection structure (for example, 0.56 N/mm, that is, the maximum value of the fold line L2), but The above data is not intended to limit the invention.

第7圖繪示根據本發明一實施方式之電連接結構100D的剖面圖。電連接結構100D包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140、有機保護層150、第二線路層170a、第一導電層180與第二導電層190。與第5圖實施方式不同的地方在於:第二線路層170a並未從穿孔162的第一線路層120上延伸至另一穿孔164中的第一線路層120上,而是分開成兩部分,使得至少部分有機閘極隔離層140可位於此兩部分的第二線路層170a之間。 FIG. 7 is a cross-sectional view showing an electrical connection structure 100D according to an embodiment of the present invention. The electrical connection structure 100D includes a flexible substrate 110, a first wiring layer 120, an organic buffer layer 130, an organic gate isolation layer 140, an organic protection layer 150, a second wiring layer 170a, a first conductive layer 180, and a second conductive layer 190. . The difference from the embodiment of FIG. 5 is that the second circuit layer 170a does not extend from the first circuit layer 120 of the through hole 162 to the first circuit layer 120 in the other through hole 164, but is divided into two parts. At least a portion of the organic gate isolation layer 140 can be positioned between the two portions of the second wiring layer 170a.

第8圖繪示根據本發明一實施方式之電連接結構100E的剖面圖。電連接結構100E包含可撓基板110、第一線路層120、有機緩衝層130、有機閘極隔離層140、有機保護層150、第二線路層170、第一導電層180a與第二導電層190。與第5圖實施方式不同的地方在於:第一導電層180a從穿孔162中的第二線路層170上延伸至另一穿孔164中的第二線路 層170上。 FIG. 8 is a cross-sectional view showing an electrical connection structure 100E according to an embodiment of the present invention. The electrical connection structure 100E includes a flexible substrate 110, a first wiring layer 120, an organic buffer layer 130, an organic gate isolation layer 140, an organic protection layer 150, a second wiring layer 170, a first conductive layer 180a and a second conductive layer 190. . The difference from the embodiment of FIG. 5 is that the first conductive layer 180a extends from the second wiring layer 170 in the through hole 162 to the second line in the other through hole 164. On layer 170.

同時參閱第1圖與第8圖,當積體電路210與軟性電路板220的接點分別設置於穿孔162、164中時,軟性電路板220可透過第一線路層120、第二線路層170及第一導電層180a電性連接積體電路210,使訊號在軟性電路板220與積體電路210之間傳遞。這樣的設計,即使第一線路層120、第二線路層170與第一導電層180a其中任一者或任兩者損壞時,積體電路210與軟性電路板220仍可導通。 Referring to FIG. 1 and FIG. 8 , when the contacts of the integrated circuit 210 and the flexible circuit board 220 are respectively disposed in the through holes 162 and 164 , the flexible circuit board 220 can pass through the first circuit layer 120 and the second circuit layer 170 . The first conductive layer 180a is electrically connected to the integrated circuit 210 to transmit signals between the flexible circuit board 220 and the integrated circuit 210. With such a design, even if either or both of the first wiring layer 120, the second wiring layer 170, and the first conductive layer 180a are damaged, the integrated circuit 210 and the flexible circuit board 220 can be turned on.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.

100C‧‧‧電連接結構 100C‧‧‧Electrical connection structure

110‧‧‧可撓基板 110‧‧‧Flexible substrate

114‧‧‧阻障層 114‧‧‧Barrier layer

120‧‧‧第一線路層 120‧‧‧First line layer

130‧‧‧有機緩衝層 130‧‧‧Organic buffer layer

132‧‧‧壁面 132‧‧‧ wall

134‧‧‧壁面 134‧‧‧ wall

140‧‧‧有機閘極隔離層 140‧‧‧Organic gate isolation

142‧‧‧壁面 142‧‧‧ wall

144‧‧‧壁面 144‧‧‧ wall

150‧‧‧有機保護層 150‧‧‧Organic protective layer

152‧‧‧壁面 152‧‧‧ wall

154‧‧‧壁面 154‧‧‧ wall

156‧‧‧表面 156‧‧‧ surface

162‧‧‧穿孔 162‧‧‧Perforation

164‧‧‧穿孔 164‧‧‧Perforation

170‧‧‧第二線路層 170‧‧‧Second circuit layer

180‧‧‧第一導電層 180‧‧‧First conductive layer

190‧‧‧第二導電層 190‧‧‧Second conductive layer

Claims (13)

一種電連接結構,位於一可撓顯示器的邊緣,該電連接結構包含:一可撓基板;一第一線路層,位於該可撓基板上且往該可撓基板的邊緣延伸;一有機緩衝層,位於該可撓基板與該第一線路層上,使得該第一線路層位於該有機緩衝層與該可撓基板之間;一有機閘極隔離層,位於該有機緩衝層上;一有機保護層,位於該有機閘極隔離層上,其中該有機保護層、該有機閘極隔離層與該有機緩衝層共同具有兩穿孔,使該第一線路層部分位於該些穿孔中;以及一第二線路層,位於該些穿孔中的該第一線路層上,且延伸至該有機緩衝層圍繞該些穿孔的壁面上與該有機緩衝層與該有機閘極隔離層之間。 An electrical connection structure is disposed at an edge of a flexible display, the electrical connection structure includes: a flexible substrate; a first circuit layer on the flexible substrate and extending toward an edge of the flexible substrate; an organic buffer layer On the flexible substrate and the first circuit layer, such that the first circuit layer is located between the organic buffer layer and the flexible substrate; an organic gate isolation layer is located on the organic buffer layer; an organic protection a layer on the organic gate isolation layer, wherein the organic protection layer, the organic gate isolation layer and the organic buffer layer have two perforations, such that the first circuit layer portion is located in the perforations; and a second A circuit layer is disposed on the first circuit layer of the vias and extends to the organic buffer layer between the sidewalls of the vias and the organic buffer layer and the organic gate isolation layer. 如請求項1所述的電連接結構,其中該第二線路層從該些穿孔其中之一中的該第一線路層上延伸至另一該穿孔中的該第一線路層上。 The electrical connection structure of claim 1, wherein the second circuit layer extends from the first circuit layer of one of the vias to the first circuit layer of the other of the vias. 如請求項1所述的電連接結構,更包含:一第一導電層,位於該些穿孔中的該第二線路層上,使該第二線路層位於該第一導電層與該第一線路層之間。 The electrical connection structure of claim 1, further comprising: a first conductive layer on the second circuit layer of the plurality of vias, the second circuit layer being located on the first conductive layer and the first line Between the layers. 如請求項3所述的電連接結構,其中該第一 導電層延伸至該有機閘極隔離層圍繞該些穿孔的壁面上與該有機閘極隔離層與該有機保護層之間。 The electrical connection structure of claim 3, wherein the first The conductive layer extends between the organic gate isolation layer and the organic gate isolation layer and the organic protective layer. 如請求項3所述的電連接結構,其中該第一導電層從該些穿孔其中之一中的該第二線路層上延伸至另一該穿孔中的該第二線路層上。 The electrical connection structure of claim 3, wherein the first conductive layer extends from the second circuit layer of one of the vias to the second circuit layer of the other of the vias. 如請求項3所述的電連接結構,更包含:一第二導電層,位於該些穿孔中的該第一導電層上,使該第一導電層位於該第二導電層與該第二線路層之間。 The electrical connection structure of claim 3, further comprising: a second conductive layer on the first conductive layer in the plurality of through holes, the first conductive layer being located on the second conductive layer and the second line Between the layers. 如請求項6所述的電連接結構,其中該第二導電層延伸至該有機保護層圍繞該些穿孔的壁面上與該有機保護層背對該有機閘極隔離層的表面上。 The electrical connection structure of claim 6, wherein the second conductive layer extends to the surface of the organic protective layer surrounding the organic gate layer and the organic protective layer surrounding the organic gate layer. 如請求項1所述的電連接結構,其中該可撓基板具有一阻障層,且至少部分該阻障層由該第一線路層覆蓋。 The electrical connection structure of claim 1, wherein the flexible substrate has a barrier layer, and at least a portion of the barrier layer is covered by the first circuit layer. 如請求項1所述的電連接結構,其中該有機閘極隔離層位於該有機保護層與該有機緩衝層之間。 The electrical connection structure of claim 1, wherein the organic gate isolation layer is between the organic protective layer and the organic buffer layer. 如請求項1所述的電連接結構,其中該第一線路層的厚度介於1500埃至2500埃。 The electrical connection structure of claim 1, wherein the first circuit layer has a thickness of between 1500 angstroms and 2,500 angstroms. 如請求項1所述的電連接結構,其中該第一線路層的材料包含鋁、鉬、鉻、鈦、銅、鎳或其合金。 The electrical connection structure of claim 1, wherein the material of the first circuit layer comprises aluminum, molybdenum, chromium, titanium, copper, nickel or an alloy thereof. 如請求項1所述的電連接結構,更包含:一積體電路,電性連接位在該些穿孔其中之一中的該第一線路層。 The electrical connection structure of claim 1, further comprising: an integrated circuit electrically connecting the first circuit layer in one of the through holes. 如請求項12所述的電連接結構,更包含:一軟性電路板,電性連接位在另一該穿孔中的該第一線路層。 The electrical connection structure of claim 12, further comprising: a flexible circuit board electrically connected to the first circuit layer located in the other of the through holes.
TW105121256A 2016-07-05 2016-07-05 Electrical connection structure TWI613942B (en)

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